Substrate support for a substrate processing chamber
Patent Information
- Authority / Receiving Office
- US · United States
- Patent Type
- Designs(United States)
- Current Assignee / Owner
- APPLIED MATERIALS INC
- Filing Date
- 2024-12-23
- Publication Date
- 2026-06-02
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Figure USD1128616-D00000_ABST
Description
[0001] FIG. 1 is a top isometric view of a substrate support for a substrate processing chamber, showing our new design.
[0002] FIG. 2 is a top plan view thereof.
[0003] FIG. 3 is the top plan view thereof shown in FIG. 2, further showing section line 9-9.
[0004] FIG. 4 is a bottom plan view thereof.
[0005] FIG. 5 is a front elevation view thereof.
[0006] FIG. 6 is a back elevation view thereof.
[0007] FIG. 7 is a left elevation view thereof.
[0008] FIG. 8 is a right elevation view thereof; and,
[0009] FIG. 9 is an enlarged cross-sectional view taken along line 9-9 in FIG. 3.
[0010] The dashed lines in FIGS. 1-9 represent portions of the substrate support for a substrate processing chamber that form no part of the claimed design.
Claims
The ornamental design for a substrate support for a substrate processing chamber, as shown and described.