Projected light system compensating for low accuracy manufacturing processes

Abstract

A method is provided including determining a first illumination pattern of a plurality of first optical components arranged in a first arrangement pattern on a common substrate, wherein the determined illumination pattern comprises a first deviation from a predetermined illumination pattern, determining an arrangement correction vector for each of the first optical components, form a plurality of second optical components in a second arrangement pattern on or above the plurality of first optical components, wherein the second arrangement pattern corresponds to the first arrangement pattern and the corresponding arrangement correction vectors for each of the first optical components, wherein the first optical components and the second optical components generate a second illumination pattern, wherein the second illumination pattern comprises a second deviation from the predetermined illumination pattern, wherein the second deviation is smaller than the first deviation.

Description

[0001] PROJECTED LIGHT SYSTEM COMPENSATING FOR LOW ACCURACY

[0002] MANUFACTURING PROCESSES

[0003] Description

[0004] This disclosure generally relates to a lens array, in particular a micro lens array (MLA) , and a method to manufacture the same.

[0005] Micro lens arrays (MLA) are used in various projected light system products. FIG.1A and FIG. IB illustrate a typically MLA 1. The MLA 1 usually includes a substrate 2 having a first lens layer 6 on a first side of the substrate 2 and a second lens layer 4 on a second side of the substrate 2 opposite to the first side. A chromium mask layer 3 having openings 5 is arranged between the substrate 2 and the second lens layer 4. Each of the first lens layer 6 and the second lens layer 4 includes a plurality on lens components. One lens component of the first lens layer 6 forms with a corresponding lens component of the second lens layer 4 a lenslet. Thus, the MLA 1 includes a plurality of lenslets.

[0006] A high positional accuracy of lenslets, e.g. of about 1 pm, is required for multiple images to overlap correctly in the final projection 7 of the MLA 1, as illustrated in FIG.1C. As an illustrative example, the mask layer 3 includes an opening 5 for each lenslet in the mask layer 3. Each opening 5 may be in the shape of an arrow that - when perfectly aligned - overlap to the final projection 7 of one arrow. Thus, the illumination pattern, e.g. the final projection 7, may be defined by the shape and alignment (e.g. pattern) of the openings 5.

[0007] However, any of the openings and lenslets can be displaced from their designated position to form the final projection, as illustrated by the arrows 9 in FIG. IE - note that the arrows are not to scale. The length has been multiplied by a factor of 100 for illustrative purposes. Misalignment of any of the lens components of the first lens layer 6 and the second lens layer 4 and openings 5 in the mask layer 3 can cause a blurry proj ection 8 due to the proj ection of nonoverlapping images of the individual openings 5 of the mask layer 3 , as illustrated in FIG . ID .

[0008] Some desirable methods for manufacturing MLAs 1 using a master can reach a required accuracy for aligning the openings 5 and lenslet only at high cost or on smaller areas that need to be combined for mass production formats .

[0009] Thus , a more cost-ef ficient array of optical components , e . g . a micro lens array, and, and a method to manufacture the same having an improved overall quality of the array of optical components are provided . The invention is set out in the appended set of claims .

[0010] In one aspect , a non-transitory computer readable medium is provided having instructions stored therein that when executed by a processor cause the processor to : determine using a first array a first illumination pattern, the first array having a first plurality of optical components arranged in a first pattern on a common ( also denoted as shared) first substrate , wherein the determined illumination pattern includes a first deviation from a predetermined illumination pattern, determine a correction vector ( also denoted as arrangement correction vector ) for each of the optical components of the first plurality of optical components , wherein the correction vectors are configured to cause a second illumination pattern including a second deviation from the predetermined illumination pattern, wherein the second deviation is smaller than the first deviation, and form a second array, the second array including a second plurality of optical components in a second pattern on a second common ( e . g . shared) substrate , wherein the second pattern corresponds to the first pattern and the corresponding correction vectors for each of the optical components . Note , the second substrate may include the first substrate and the first array . Thus , the second array may be formed on or above the first array .

[0011] Further note that the optical components may be the openings in the mask layer described before . This way, the method provides an improved way of manufacturing a micro lens array .

[0012] Further note that the first optical components in combination with the second optical components may form a desired optical device . In other words , the reducing the deviation from the predetermined illumination may not be the sole purpose of the second optical components . Thus , determined illumination pattern including the first deviation from a predetermined illumination pattern may be an intermediate pattern and not the pattern desired by the optical device including the first optical component and second optical component .

[0013] I llustratively, manufacturing methods with a lower required tolerance in the lateral position of the optical components , e . g . lenslet in the MLA, may be enabled . The lower accuracy of the position of the optical components can be determined and compensated for during the calculation of the correction vectors for the optical components .

[0014] Thus , lower accuracy of the optical components position can achieve a required optical performance . In particular, the characteri zation step for determining the first deviation uses the first array as test array to determine a deviation from a desired ( also denoted as designated or nominal ) position of each optical component . A correction vector, e . g . a correction factor, for each optical component may consider the deviation, and correct the deviation for subsequently manufactured arrays of optical components . Thus , the method applies a correction for manufacturing tolerances on the optical channels defined by the optical components . In other words , the method includes a calculation of the second pattern of optical components to include not j ust the theoretical position of the optical components , e . g . the first pattern, but includes correction vector for each optical component considering the measured position of the optical component in the first pattern . Determining the first deviation of the optical components from a predetermined position in the first pattern could be done with a first pattern before the MLA product goes to mass production using the second pattern of optical components . The resulting image of the first pattern allows to determine the actual positions of the optical components and to determine the correction vectors needed for each of the optical components in the design of the second pattern .

[0015] This correction may also be applied to calibrate the position of pixels of an active display . In this case , the proj ected images of selected pixels of the display as the optical components could be analysed to calculate the mapping of the pixels for each pixel in the final image .

[0016] Further, this correction method may also be applied on a first lens array that is arranged in front of a second lens array, wherein the first lens array corrects the proj ection of the second lens array .

[0017] In yet another aspect , an optical substrate having a mask layer is provided, the mask layer including a plurality of transmissive portions arranged in a pattern, wherein at least a part of an optical component is formed by at least one transmissive portion of the plurality of transmissive portions , wherein the transmissive portions are arranged based on a regular pattern, wherein each transmissive portion is displaced by a correction vector, wherein each correction vector is individual for each of the transmissive portions .

[0018] In the drawings , like reference characters generally refer to the same parts throughout the di f ferent views . The drawings are not necessarily to scale , emphasis instead generally being placed upon illustrating the principles of the invention . In the following description, various aspects of the invention are described with reference to the following drawings , in which :

[0019] FIG . 1A to FIG . IE show illustrations of known micro lens arrays ;

[0020] FIG . 2A to FIG . 2D show illustrations of a micro lens array;

[0021] FIG shows an application of a micro lens array;

[0022] FIG shows a flow diagram of a method to manufacture a micro lens array; and

[0023] FIG 5A to FIG . 5E show views illustrating a manufacturing method of a lens array using a mask .

[0024] The following detailed description refers to the accompanying drawings that show, by way of illustration, speci fic details and aspects in which the disclosure may be practiced . One or more aspects are described in suf ficient detail to enable those skilled in the art to practice the disclosure . Other aspects may be utili zed and structural , logical , and electrical changes may be made without departing from the scope of the disclosure . The various aspects described herein are not necessarily mutually exclusive , as some aspects can be combined with one or more other aspects to form new aspects . Various aspects are described in connection with methods and various aspects are described in connection with devices . However, it may be understood that aspects described in connection with methods may similarly apply to the devices , and vice versa . Throughout the drawings , it should be noted that like reference numbers are used to depict the same or similar elements , features , and structures .

[0025] FIG .2A and FIG .2B show schematic cross-sectional views of a lens array 100 used for an optical apparatus . FIG .2C illustrates a perspective exploded view of the lens array. In particular, FIG.2C illustrates lens components of the second lens structure layer 106.

[0026] While in this description, a lens array 100 having a mask layer 108 having plurality of openings 105 is described, the correction method can be applied in a light-emitting element array, e.g. a display, for each of the pixels. Further, wavelength selective portions, e.g. a light transmissive or absorbing pattern, or a wavelength conversion pattern can be used instead of openings 105 in the mask layer 108.

[0027] The lens array 100, e.g. a micro lens array 100, may include a substrate 110. The substrate may be transparent or translucent for the light used in the application. For example, the substrate 110 may be formed from a glass or plastic.

[0028] A first lens structure layer 112 may be formed on a first side 130 of the substrate 110. A second lens structure layer 106 may be formed on a second side 120 of the substrate 110. The second side 120 of the substrate 110 may be opposite to the first side 130 of the substrate 110.

[0029] The first lens structure layer 112 and the second lens structure layer 106 may include a plurality of lens components respectively. A lens component of the first lens structure layer 112 together with a lens component of the second lens structure layer 106 may form a lenslet of the lens array 100. In other words, the lens components of the first lens structure layer 112 and the lens components of the second lens structure layer 106 may be aligned to each other. A lenslet may be one optical channel of the lens array 100.

[0030] A mask layer 108 may be arranged between the substrate 110 and the second lens structure layer 106. The mask layer 108 may include transmissive portions 105, e.g. openings 105 in an opaque layer. The mask layer 108 may be formed from an opaque material, e.g. chromium, or any other kind of light absorbing material. The openings 105 may be configured to shape the light beam passing the lens array 100. Each of the openings 105 of the mask layer 108 may be defined in its shape and position regarding a predetermined illumination pattern (see FIG.1C) . Alternatively, the mask layer 108 may include or may be substituted for any of a beam forming structure or light emitting structure arranged in the light path of each of the lenslets. A light emitting structure may be any of a light emitting semiconductor component and a wavelength converting component, e.g. also denoted as phosphor.

[0031] As an example, light 102 incident from the second side 120 may pass the lens array 100 through a lens component of the second lens structure layer 106, a corresponding opening 105 in the mask layer 108, the substrate 110 and the corresponding lens component of the first lens structure layer 112, and may be transmitted light 104 emitted from the first side 130 of the lens array.

[0032] In other words, the openings 105 of the mask layer 108 may define the projected illumination pattern by blocking or letting through light impinging on the mask layer 108. However, instead of an opening, mask layer 108 could also be partially transparent letting only a certain wavelength or colour of light through. Alternatively, or in addition, the mask layer 108 could include beam forming components, e.g. a lens-type element or a diffractive-element, instead of openings.

[0033] FIG.2D illustrates an alignment position 144 of a lens component 140, e.g. of the second lens structure layer, relative to a designated position 142 defined by a corresponding lens component of the opposite of the lens structure layer, e.g. the first lens structure layer. The deviation vector between the lens components of a lenslet is a zero element in perfectly aligned lens components (see also FIG.5A to FIG.5E) . Thus, FIG.2D illustrates a possible calibration method using projection with a mask layer. The circles 142 are projected from lenslets as manufactured. The crosses 144 are reference targets for nominal lens positions. Offsets between the center of the circle 142 and the cross 144 may be determined and actual lenslet positions may be calculated .

[0034] This method may also be used to calibrate a projector using active pixels like micro light emitting diodes where the alignment of the lenslets to the pixels is unknown after assembly .

[0035] FIG.3 shows an application of a micro lens array 100, e.g. as described above, in an optical system 300. The optical system 100 may include a light source 304, e.g. a light emitting diode 302, emitting light 308 through a lens 302, e.g. a primary lens, through the lens array 100 described above and on to a projector 306.

[0036] FIG.4 shows a flow diagram of a method 400 to manufacture a micro lens array. FIG.5A to FIG.5E show views illustrating a manufacturing method of a lens array using a mask.

[0037] In general, the method 400 includes determining 402 a deviation vector of an illumination pattern for each of a plurality of lenslets of a lens array, determining 404 a correction vector of a first mask for each of the lenslets using the determined deviation vectors of the lenslets, and form 406 a second mask having a plurality of openings aligned using the correction vectors of the first mask.

[0038] Referring to FIG.5A, a first mask 504 (also denoted as first mask layer) is arranged above a substrate 110 and a first lens structure layer 112 with lens components is formed on the side of the substrate 110 opposite to the mask layer 108. The first lens structure layer 112 may be aligned based on the first mask 504. The lens components of the second lens structure layer are to be formed on or above the first mask 504 and inside the openings 105 of the first mask 504 on the substrate 110 - in FIG.5A illustrated by the arrow 510. The lens components of the second lens structure layer are formed corresponding to a designated pattern 502 of the first lens structure layer 112.

[0039] However, the corresponding illumination pattern of the resulting micro lens array 100 (illustrated in FIG.5B) may not be the desired illumination pattern (e.g. FIG. ID vs. FIG.1C) . The openings 105 of the first mask 504 may deviate from a designated pattern. Illustratively, the openings may be formed in the first mask 105 in a first pattern 511, e.g. having a particular size, shape, arrangement. The first pattern 511 causes the illumination pattern illustrated in FIG.1C. Thus, for each of the openings, a deviation vector 512 and a correction vector 513 can be determined resulting in a second pattern 515 based on the first pattern 511 and the correction vectors 513. The second pattern 515 causes the desired illumination pattern, e.g. as illustrated in FIG. ID, or is closer to the desired illumination pattern than the first pattern. Note that any of the second pattern 515 and the correction vector 513 does not necessarily have to align or correspond with the designated pattern axis 502 of the lenslets. Further note, that each of the correction vectors 513 for each of the openings of the first mask 504 may include any of a correction factor for the position of the opening, the shape of the opening, the size of the opening, an optical characteristic of the opening or mask, e.g. transmission factor .

[0040] As an illustrative example, the deviation vector 512 may be a deviation corresponding to a lateral offset between the opening and a designated pattern axis 502 of the lenslet. Illustratively, the designated pattern axis 502 may form a reference point to determine the deviation vector 512 of the opening of the first mask 504, respectively. A non-zero deviation vector 512 may be caused by various reasons that may be specific to a used tool to form the second lens structure layer and its current condition. The deviation vector 512 may be determined for each of the lenslets formed by the first lens structure layer 112 and the second lens structure layer

[0041] 106 .

[0042] A second mask 514 ( also denoted as second mask layer 514 ) may be provided on another substrate 110 , as illustrated in FIG . 5C . The second mask 514 may have a plurality of openings 518 in, on or above the second lens structure layer is formed ( illustrated by the arrow 510 ) . The second openings 518 may be formed in the corrected, second pattern 515 based on the first pattern and the correction vectors for each opening individually . FIG . 5D illustrates a top view of the second mask 514 . Note that the correction vectors 514 may be di f ferent for each opening 518 , and may be determined individually for each of the openings of the first mask . The correction vector 513 may correspond to the deviation vector 512 using a correction algorithm .

[0043] I llustratively, the second pattern 515 may depend on the relative position between the desired illumination pattern, e . g . the deviation of the individual proj ections illustrated in FIG . 1C, and the lenslet forming the MLA. Thus , in an exemplary application, to achieve a sharp illumination pattern, the proj ections coming from each lenslet in the MLA 100 are supposed to overlap, as illustrated in FIG . ID . Hence , relative positions between lenslets of the MLA 100 may be necessary information . The knowledge of the relative positions of the lenslets in the MLA 100 compared to the positions of the openings in the first mask and compared to the desired illumination pattern may be used to calculate the correction vectors to provide the second pattern .

[0044] This way, a lens array 100 having lens components of the first lens structure layer 112 and the second lens structure layer 106 can be formed that have an improved illumination pattern, as illustrated in FIG . 5E .

[0045] In other words , referring to FIG . 2A to FIG 5E , the method may include determining using a first array a first illumination pattern, the first array having a first plurality of optical components arranged in a first pattern on a common first substrate , wherein the determined illumination pattern includes a first deviation from a predetermined illumination pattern, determining a correction vector for each of the optical components of the first plurality of optical components , wherein the correction vectors are configured to cause a second illumination pattern including a second deviation from the predetermined illumination pattern, wherein the second deviation is smaller than the first deviation, and forming a second array, the second array including a second plurality of optical components in a second pattern on a second common substrate , wherein the second pattern corresponds to the first pattern and the corresponding correction vectors for each of the optical components .

[0046] The correction vector may include any of a lateral displacement of the optical component , a shape , a si ze , and an optical characteristic, respectively .

[0047] The optical component may include an optical channel may include a first lens component , the substrate and a second lens component . Each optical component may include a light emitting semiconductor component . The light emitting semiconductor component may include a light emitting diode . Each light emitting semiconductor component may be configured to emit a white light . The optical component may include a light transmissive portion in an opaque layer . The light transmissive portion may be an opening in the opaque layer .

[0048] An optical substrate may have a mask layer . The mask layer may include a plurality of transmissive portions arranged in a pattern, wherein at least a part of an optical component may be formed by at least one transmissive portion of the plurality of transmissive portions , wherein the transmissive portions may be arranged based on a regular pattern, wherein each transmissive portion may be displaced by a correction vector, wherein each correction vector may be individual for each of the transmissive portions .

[0049] The mask layer may include chromium or may be formed thereof . The transmissive portion may be an opening in the mask layer .

[0050] In the following some examples are described, which relate to what is described herein and shown in the figures .

[0051] Example 1 is a non-transitory computer readable medium having instructions stored therein that when executed by a processor cause the processor to : determine using a first array a first illumination pattern, the first array having a first plurality of optical components arranged in a first pattern on a common first substrate , wherein the determined illumination pattern includes a first deviation from a predetermined illumination pattern, determine a correction vector for each of the optical components of the first plurality of optical components , wherein the correction vectors are configured to cause a second illumination pattern including a second deviation from the predetermined illumination pattern, wherein the second deviation is smaller than the first deviation, and form a second array, the second array including a second plurality of optical components in a second pattern on a second common substrate , wherein the second pattern corresponds to the first pattern and the corresponding correction vectors for each of the optical components .

[0052] In other words , a method may include determining a first illumination pattern of a plurality of first optical components arranged in a first arrangement pattern on a common substrate , wherein the determined illumination pattern may include a first deviation from a predetermined illumination pattern . The method may further include determining an arrangement correction vector for each of the first optical components . The method may further include forming a plurality of second optical components in a second arrangement pattern on or above the plurality of first optical components , wherein the second arrangement pattern corresponds to the first arrangement pattern and the corresponding arrangement correction vectors for each of the first optical components . The first optical components and the second optical components may generate a second illumination pattern . The second illumination pattern may include a second deviation from the predetermined illumination pattern . The second deviation is smaller than the first deviation .

[0053] The arrangement correction vector may include any of a lateral displacement of the optical component , a shape , a si ze , and an optical characteristic, respectively . The first optical components may be apertures of a mask layer, and the second optical components may be lenses of a lens array . The first optical components may be light emitting semiconductor components . At least one of the first optical components and second optical components may include a light transmissive portion in an opaque layer . The second optical component may be arranged in an optical path of the first optical component respectively .

[0054] In Example 2 , the subj ect matter of Example 1 can optionally include that the correction vector includes any of a lateral displacement of the optical component , a shape , a si ze , and an optical characteristic, respectively .

[0055] In Example 3 , the subj ect matter of Example 1 or 2 can optionally include that the optical component includes an optical channel including a first lens component , the substrate and a second lens component .

[0056] In Example 4 , the subj ect matter of Example 1 or 2 can optionally include that each optical component includes a light emitting semiconductor component .

[0057] In Example 5 , the subj ect matter of Example 4 can optionally include that the light emitting semiconductor component includes a light emitting diode . In Example 6 , the subj ect matter of Example 4 or 5 can optionally include that each light emitting semiconductor component is configured to emit a white light .

[0058] In Example 7 , the subj ect matter of any one of Example 1 to 6 can optionally include that the optical component includes a light transmissive portion in an opaque layer .

[0059] In Example 8 , the subj ect matter of Example 7 can optionally include that the light transmissive portion is an opening in the opaque layer .

[0060] Example 9 is an optical substrate having a mask layer, the mask layer including a plurality of transmissive portions arranged in a pattern, wherein at least a part of an optical component is formed by at least one transmissive portion of the plurality of transmissive portions , wherein the transmissive portions are arranged based on a regular pattern, wherein each transmissive portion is displaced by a correction vector, wherein each correction vector is individual for each of the transmissive portions .

[0061] In other words , the mask layer may include a plurality of transmissive portions , wherein at least a part of an optical component may be formed by a transmissive portion of the plurality of transmissive portions , wherein the transmissive portions may be arranged in arrangement positions based on a regular arrangement pattern, wherein each transmissive portion may be displaced by an arrangement correction vector from the arrangement position of the arrangement pattern, wherein the arrangement correction vector may be individual for the transmissive portion, and wherein the optical substrate further may include a plurality of optical components , wherein a transmissive portion plurality of transmissive portions may be arranged in the optical path of an optical component of the plurality of optical components respectively .

[0062] The optical components may be lenses of a lens array . In Example 10, the subject matter of Example 9 can optionally include that the mask layer includes chromium or is formed thereof .

[0063] In Example 11, the subject matter of Example 9 or 10 can optionally include that the transmissive portion is an opening in the mask layer.

[0064] The word "exemplary" is used herein to mean "serving as an example, instance, or illustration." Any example or design described herein as "exemplary" is not necessarily to be construed as preferred or advantageous over other examples or designs .

[0065] The words "plurality" and "multiple" in the description or the claims expressly refer to a quantity greater than one. The terms "group (of) ", "set [of] ", "collection (of) ", "series (of)", "sequence (of)", "grouping (of)", etc., and the like in the description or in the claims refer to a quantity equal to or greater than one, i.e. one or more. Any term expressed in plural form that does not expressly state "plurality" or "multiple" likewise refers to a quantity equal to or greater than one .

[0066] The term "connected" can be understood in the sense of a (e.g. mechanical, optical and / or electrical) , e.g. direct or indirect, connection and / or interaction. For example, several elements can be connected together mechanically such that they are physically retained (e.g., a plug connected to a socket) and electrically such that they have an electrically conductive path (e.g., signal paths exist along a communicative chain) .

[0067] While the above descriptions and connected figures may depict optical device components as separate elements, skilled persons will appreciate the various possibilities to combine or integrate discrete optical functions into a single element. Such may include combining two or more components from a single component . Conversely, skilled persons will recogni ze the possibility to separate a single element into two or more discrete elements , such as splitting a single component into two or more separate component .

[0068] It is appreciated that implementations of methods detailed herein are exemplary in nature , and are thus understood as capable of being implemented in a corresponding device . Likewise , it is appreciated that implementations of devices detailed herein are understood as capable of being implemented as a corresponding method . It is thus understood that a device corresponding to a method detailed herein may include one or more components configured to perform each aspect of the related method .

[0069] All acronyms defined in the above description additionally hold in all claims included herein .

[0070] While the disclosure has been particularly shown and described with reference to speci fic embodiments , it should be understood by those skilled in the art that various changes in form and detail may be made therein without departing from the spirit and scope of the disclosure as defined by the appended claims . The scope of the disclosure is thus indicated by the appended claims and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced .

[0071] REFERENCE NUMERAL LIST micro lens array 300 optical system substrate 302 lens mask layer 304 light source lens layer 306 proj ector openings 308 light lens layer 400 , 402 , 404 , 406 method, pro j ection method steps pro j ection 502 designated pattern designated position ( axis ) lens array 504 first mask light 506 designated pattern light 508 openings openings 510 material deposition lens structure layer 511 determined pattern mask layer ( axis ) substrate 512 deviation vector lens structure layer 513 correction vector second side 514 second mask first side 515 correct ( ed) pattern lens component ( axis ) designated position 518 corrected openings axis alignment position

Claims

CLAIMS1 . A non-transitory computer readable medium having instructions stored therein that when executed by a processor cause the processor to : determine a first illumination pattern of a plurality of first optical components arranged in a first arrangement pattern on a common substrate , wherein the determined illumination pattern comprises a first deviation from a predetermined illumination pattern, determine an arrangement correction vector for each of the first optical components , form a plurality of second optical components in a second arrangement pattern on or above the plurality of first optical components , wherein the second arrangement pattern corresponds to the first arrangement pattern and the corresponding arrangement correction vectors for each of the first optical components , wherein the first optical components and the second optical components generate a second illumination pattern, wherein the second illumination pattern comprises a second deviation from the predetermined illumination pattern, wherein the second deviation is smaller than the first deviation .2 . The non-transitory computer readable medium of claim 1 , wherein the arrangement correction vector comprises any of a lateral displacement of the optical component , a shape , a si ze , and an optical characteristic, respectively .3 . The non-transitory computer readable medium of claim 1 or 2 , wherein the first optical components are apertures of a mask layer, and wherein the second optical components are lenses of a lens array .4 . The non-transitory computer readable medium of claim 1 or 2 , wherein the first optical components are light emitting semiconductor components .

5. The non-transitory computer readable medium of claim 4 , wherein the light emitting semiconductor component comprises a light emitting diode .

6. The non-transitory computer readable medium of claim 4 or 5 , wherein each light emitting semiconductor component is configured to emit a white light .7 . The non-transitory computer readable medium of any one of claims 1 to 6 , wherein at least one of the first optical components and second optical components comprises a light transmissive portion in an opaque layer .8 . The non-transitory computer readable medium of claim 7 , wherein the light transmissive portion is an opening in the opaque layer .

9. The non-transitory computer readable medium of any one of claims 1 to 8 , wherein the second optical component is arranged in an optical path of the first optical component respectively .10 . An optical substrate having a mask layer, the mask layer comprising a plurality of transmissive portions , wherein at least a part of an optical component is formed by a transmissive portion of the plurality of transmissive portions , wherein the transmissive portions are arranged in arrangement positions based on a regular arrangement pattern, wherein each transmissive portion is displaced by an arrangement correction vector from the arrangement position of the arrangement pattern, wherein the arrangement correction vector is individual for the transmissive portion, and wherein the optical substratefurther comprises a plurality of optical components , wherein a transmissive portion plurality of transmissive portions is arranged in the optical path of an optical component of the plurality of optical components respectively .11 . The optical substrate of claim 10 , wherein the mask layer comprises chromium or is formed thereof .12 . The optical substrate of claim 10 or 11 , wherein a transmissive portion is an opening in the mask layer .13 . The optical substrate of claim 11 or 12 , wherein the optical components are lenses of a lens array .

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