Cleaning device

Abstract

The present application discloses a cleaning device. The cleaning device at least comprises a case, the case is provided with an annular side wall, the annular side wall comprises first straight side walls and a second straight side wall, the first straight side walls extend along a first direction, the second straight side wall is connected to one end of each first straight side wall in the first direction, and the second straight side wall is bent relative to the first straight side walls, so that bent parts are formed between the first straight side walls and the second straight side wall; the second straight side wall extends along a second direction, and the second direction intersects with the first direction; front apexes of the cleaning device are formed at the bent part, the maximum circumscribed circle of the cleaning device and the maximum rotating circle of the cleaning device both pass through the front apexes, and the radius of the maximum rotating circle is greater than the radius of the maximum circumscribed circle. The technical solution provided by the present application can improve the escape capability of the cleaning device.

Description

cleaning equipment Technical Field

[0001] The embodiments of the present application relate to the technical field of cleaning equipment, and in particular to a cleaning equipment. Background Art

[0002] Cleaning equipment is mechanical equipment designed for cleaning. It reduces the labor cost of cleaning while improving work efficiency and cleanliness, and plays an indispensable role in modern society.

[0003] In related art, to minimize blind spots, cleaning devices are typically D-shaped. These cleaning devices have a square end and a curved end positioned opposite each other, with the square end located in front of the curved end—that is, on the side of the curved end in the direction of the cleaning device's movement. The side brush of the cleaning device is located at the square end. However, cleaning devices with this structure are difficult to free themselves from obstacles.

[0004] Summary of the Invention

[0005] The purpose of the present application is to provide a cleaning device that can improve the cleaning device's ability to escape from trouble.

[0006] To achieve the above-mentioned objectives, the present application provides a cleaning device on the one hand, which includes at least a chassis, and the chassis has an annular side wall, wherein the annular side wall includes a first straight side wall and a second straight side wall, the first straight side wall extends along a first direction, the second straight side wall is connected to the first straight side wall at one end in the first direction, and the second straight side wall is bent relative to the first straight side wall so that a bend is formed between the first straight side wall and the second straight side wall; the second straight side wall extends along a second direction, and the second direction intersects with the first direction; the front vertex of the cleaning device is formed at the bend, and the maximum circumscribed circle of the cleaning device and the maximum rotation circle of the cleaning device both pass through the front vertex, and the radius of the maximum rotation circle is greater than the radius of the maximum circumscribed circle.

[0007] It can be seen that the cleaning device provided in the embodiment of the present application is provided with a first straight side wall and a second straight side wall, the first straight side wall is connected to the second straight side wall and forms a bend, the side brush is provided at the bend, and the bend forms a front vertex of the cleaning device, the maximum circumscribed circle of the cleaning device and the maximum rotation circle of the cleaning device both pass through the front vertex of the bend, and by setting the radius of the maximum rotation circle to be larger than the radius of the maximum circumscribed circle, the distance between the front vertex and the rear vertex of the cleaning device can be shortened, thereby reducing the avoidance space required for the cleaning device when rotating, and ultimately improving the escape ability of the cleaning device. BRIEF DESCRIPTION OF THE DRAWINGS

[0008] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0009] FIG1 is a diagram of a cleaning process of a cleaning device of related art;

[0010] FIG2 is a schematic diagram of a cleaning device provided in an embodiment of the present application;

[0011] FIG3 is a schematic diagram of the cleaning device in FIG2 after being rotated 90 degrees counterclockwise around the rotation axis Q;

[0012] FIG4 is another schematic diagram of a cleaning device provided in an embodiment of the present application;

[0013] FIG5 is a schematic diagram of the cleaning device in FIG4 after being rotated 90 degrees counterclockwise around the rotation axis Q;

[0014] FIG6 is a process diagram of the cleaning device provided in an embodiment of the present application bypassing an obstacle. DETAILED DESCRIPTION

[0015] To make the purpose, technical solutions and advantages of the present application clearer, the embodiments of the present application will be described in further detail below with reference to the accompanying drawings. Terms such as "upper", "above", "lower", "below", "first end", "second end", "one end", "the other end" used in this application to express spatial relative positions are used to describe the relationship of one unit or feature relative to another unit or feature as shown in the accompanying drawings for the purpose of ease of explanation. Terms of spatial relative position may be intended to include different orientations of the device in use or work other than the orientation shown in the figures. For example, if the device in the figure is turned over, the unit described as being "below" or "below" other units or features will be "above" other units or features. Therefore, the exemplary term "below" can encompass both the above and below orientations. The device can be oriented in other ways (rotated 90 degrees or in other orientations), and the spatially related descriptive terms used herein are interpreted accordingly.

[0016] Furthermore, the terms "installed," "disposed," "provided with," "connected," "slidingly connected," "fixed," and "socketed" should be interpreted broadly. For example, "connected" can mean a fixed connection, a removable connection, or an integral structure; it can be a mechanical connection or an electrical connection; it can be a direct connection, an indirect connection through an intermediary, or internal communication between two devices, elements, or components. Those skilled in the art will understand the specific meanings of these terms in this application based on the specific circumstances.

[0017] Most current robot vacuums on the market are circular or quasi-circular. This design offers simple escape logic and ease of maneuvering, but it leaves significant blind spots when cleaning near walls and corners in a home. Furthermore, due to space constraints, the brush roller on a circular robot vacuum is typically located between the two drive wheels, making it only half the length of the robot itself, which impacts its efficiency.

[0018] To this end, some sweeping robots adopt a D-shaped structure. However, as described in the background art, D-shaped cleaning devices have the problem of being difficult to get out of trouble. The inventors of this application have found the following reasons through research:

[0019] Referring to Figure 1, the target surface may have an intersecting side a and side b, and side a and side b form an inner corner area. The D-shaped cleaning device may have state ①, state ②, and state ③. When the D-shaped cleaning device is in state ①, the square end of the D-shaped cleaning device faces side b. During the movement of the D-shaped cleaning device toward side b, the side brush 910 of the D-shaped cleaning device can clean side a along its forward direction. After cleaning side a, the D-shaped cleaning device can rotate 90 degrees counterclockwise around the rotation axis O to state ③, so that the square end of the D-shaped cleaning device faces away from side a. During the movement of the D-shaped cleaning device away from side a, the side brush 910 of the D-shaped cleaning device can clean side b along its forward direction. Among them, the rotation axis O is the axis where the center of the D-shaped cleaning device is located, and the distance from the center to the two intersecting sides of the D-shaped cleaning device is equal.

[0020] During the process of rotating the D-shaped cleaning device 90 degrees around the rotation axis O from state ① to state ③, it undergoes state ②. In state ②, the corner of the square end of the D-shaped cleaning device is located at the top of the cleaning device, and the distance between this corner and side b is the shortest. To prevent this corner from interfering with side b in state ②, a certain distance D1 must be maintained between the corner of the D-shaped cleaning device and side b in state ①.

[0021] Similarly, in state ③, the curved end of the D-shaped cleaning device is at its rightmost end, and the closest distance between this curved end and edge a is achieved. To prevent this curved end from interfering with edge a in state ③, a certain distance D2 must be maintained between the D-shaped cleaning device and edge a in state ①.

[0022] In summary, a large avoidance space is required between the D-shaped cleaning device of the related art and the edge of the target surface (such as side a and side b) for the D-shaped cleaning device to rotate, which makes it difficult for the cleaning device to escape.

[0023] In order to improve this problem, the inventors of this application conducted the following research:

[0024] When the D-shaped cleaning device rotates from state ① to state ②, the corner of the D-shaped cleaning device is raised by a certain height H1. If H1 can be reduced, the distance D1 can be reduced, thereby reducing the avoidance space required for the D-shaped cleaning device during rotation. Similarly, when the D-shaped cleaning device rotates from state ① to state ③, the curved end of the D-shaped cleaning device is shifted to the right by H2. If H2 can be reduced, the distance D2 can be reduced, thereby reducing the avoidance space required for the D-shaped cleaning device during rotation.

[0025] The inventors of this application have discovered that the further the corners of a D-shaped cleaning device are from the rotation axis, the smaller H1 becomes; and the closer the curved end of the D-shaped cleaning device is to the rotation axis, the smaller H2 becomes. In light of this, the present invention provides a cleaning device whose maximum rotation circle radius is greater than the radius of its maximum circumscribed circle, reducing the clearance required between the front and rear vertices of the cleaning device during rotation, thereby facilitating the cleaning device's escape.

[0026] In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments.

[0027] Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of this application. In the absence of conflict, the following embodiments and features in the embodiments can be combined with each other.

[0028] An embodiment of the present application provides a cleaning device 1000, which may be a floor scrubber, a sweeping robot, a sweeping and mopping robot, etc. Referring to Figure 2, the cleaning device 1000 provided in the embodiment of the present application may include a chassis 100, which may be a hollow prism, and the chassis 100 may include a bottom wall, an annular side wall, and a top wall. When the cleaning device 1000 cleans the target surface, the bottom wall of the chassis 100 may face the target surface. The top wall of the chassis 100 and the bottom wall of the chassis 100 may be arranged in parallel, and there may be a certain distance between the two. The annular side wall may be connected between the bottom wall of the chassis 100 and the top wall of the chassis 100, and the annular side wall, the top wall of the chassis 100, and the top wall of the chassis 100 may be enclosed to form an inner cavity of the chassis 100. It is understandable that when the cleaning device 1000 is moving on the target surface for cleaning, the sidewalls of the cleaning device 1000 may collide with obstacles on the target surface. Therefore, the embodiment of the present application mainly studies the sidewall structure of the chassis 100.

[0029] Continuing with reference to FIG2 , the annular sidewall may include a first straight sidewall 110 and a second straight sidewall 120 . The first straight sidewall 110 may extend along a first direction X. That is, the orthographic projection of the first straight sidewall 110 (along a straight line perpendicular to the top wall of the chassis 100 ) on the surface of the top wall of the chassis 100 is an elongated strip, with the length direction of the orthographic projection being the first direction X. In other words, by cutting the first straight sidewall 110 with a plane parallel to the top wall (or bottom wall) of the chassis 100 , a cross-section of the first straight sidewall 110 in the shape of an elongated strip can be obtained, and the length direction of the cross-section of the first straight sidewall 110 is the first direction X.

[0030] The cleaning device 1000 provided in the embodiment of the present application can move forward or backward along a first direction X. The positive direction of the first direction X (such as the direction indicated by the arrow X) can be the forward direction of the cleaning device 1000, and the reverse direction of the first direction X (such as the reverse direction of the direction indicated by the arrow X) can be the reverse direction of the cleaning device 1000. The cleaning device 1000 can have a front end and a rear end along the first direction X. The end of the cleaning device 1000 in the positive direction of the first direction X is the front end, and the end of the cleaning device 1000 in the reverse direction of the first direction X is the rear end.

[0031] Continuing with reference to FIG. 2 , the second straight sidewall 120 may extend along the second direction Y. That is, the orthographic projection of the second straight sidewall 120 (along a straight line perpendicular to the top wall of the chassis 100 ) onto the surface of the top wall of the chassis 100 is a long strip, with the length of the long strip being the second direction Y. In other words, by cutting the second straight sidewall 120 with a plane parallel to the top wall (or bottom wall) of the chassis 100 , a cross-section of the second straight sidewall 120 may be obtained, and the length of the cross-section of the second straight sidewall 120 may be the second direction Y.

[0032] The second direction Y and the first direction X may intersect, such that the first straight sidewall 110 and the second straight sidewall 120 may form a certain angle. FIG2 illustrates an example in which the second direction Y is perpendicular to the first direction X. Furthermore, the second straight sidewall 120 may be connected to the positive end of the first straight sidewall 110 in the first direction (as indicated by arrow X), and the second straight sidewall 120 may be bent relative to the first straight sidewall 110, thereby forming a bend 150 between the first straight sidewall 110 and the second straight sidewall 120.

[0033] Bend 150 can be a pointed tip, or it can be rounded as shown in Figure 2 . When bend 150 is rounded as shown in Figure 2 , the distance between the rounded corner and the rotation axis Q of cleaning device 1000 is small, minimizing the space occupied during rotation. Furthermore, the rounded corner has a large force-bearing surface, making it less likely to deform after impacting obstacle 2000.

[0034] In addition, the cleaning device 1000 provided in the embodiment of the present application may include a side brush assembly 400, which is rotatably arranged at the bottom end of the chassis 100 and is used to sweep up garbage on the target surface. The rotation axis of the side brush assembly 400 is parallel to the rotation axis Q of the cleaning device 1000. And the positive projection of the rotation axis of the side brush assembly 400 (along the straight line direction perpendicular to the bottom surface of the annular side wall) on the bottom surface of the annular side wall is located in the inner ring of the annular side wall. In other words, the rotation axis portion of the side brush assembly 400 is located inside the chassis 100, so as to hide at least part of the side brush assembly 400 and reduce the space occupied by the entire cleaning device 1000.

[0035] In order to reduce the blind spot area of ​​the side brush assembly 400, the rotation axis of the side brush assembly 400 is close to the bend 150. In other words, the rotation axis of the side brush assembly 400 is closer to the bend 150 than the roller brush assembly 700, the drive assembly 500, the navigation assembly 800, etc. mentioned below, and the side brush assembly 400 is the component closest to the bend 150. In this way, when the cleaning device 1000 reaches the corner area formed by the side a and the side b in Figure 2, the side brush assembly 400 can clean the corner area. Compared with the circular cleaning device 1000 of the related art, the blind spot area of ​​the side brush assembly 400 of the cleaning device 1000 provided in the embodiment of the present application is smaller and the cleaning effect is better.

[0036] In addition, the side brush assembly 400 may include a rotating shaft and at least one brush strip connected to the circumference of the rotating shaft. A driver such as a motor can drive the rotating shaft to rotate, thereby causing the brush strip to rotate. The edge of the brush strip away from one end of the rotating shaft can form a circular trajectory when rotating, and at least part of the circular trajectory can be located outside the first straight side wall 110 to facilitate cleaning the area outside the first straight side wall 110. It is worth noting that in order to ensure that the front vertex e mentioned below is formed at the bend 150, the circular trajectory formed by the brush strip (orthographic projection on the projection plane) does not exceed the bend 150 (orthographic projection on the projection plane).

[0037] When cleaning device 1000 cleans side a in Figure 2 , first straight sidewall 110 can be rotated parallel to side a, aligning first direction X along side a and, consequently, moving along side a. Furthermore, space can be left between first straight sidewall 110 and side a for a portion of the brush bar of side brush assembly 400 to extend and clean. As cleaning device 1000 moves along side a, the brush bar of side brush assembly 400 can clean side a.

[0038] Similarly, when cleaning device 1000 is cleaning side b in Figure 3 , first straight sidewall 110 can be rotated parallel to side b, so that first direction X is along side b and cleaning device 1000 is traveling along side b. Furthermore, space can be left between first straight sidewall 110 and side b for a portion of the brush bar of side brush assembly 400 to extend and clean. As cleaning device 1000 travels along side b, the brush bar of side brush assembly 400 can clean side b.

[0039] When cleaning device 1000 switches from cleaning side a in Figure 2 to cleaning side b in Figure 3 , cleaning device 1000 can rotate about its rotation axis Q within the space formed by side a and side b. Referring to Figure 2 , cleaning device 1000 can have a maximum circumscribed circle C1. A circumscribed circle is defined as a circle that intersects all vertices of a polygon.

[0040] The cleaning device 1000 may have an orthographic projection on the projection plane (along a straight line perpendicular to the projection plane), where the projection plane is an imaginary plane parallel to the top wall of the chassis 100, and the circumscribed circle of the outer contour of the cleaning device 1000 (the orthographic projection on the projection plane) is the maximum circumscribed circle C1 of the cleaning device 1000. It should be noted that since the chassis 100, the side brush assembly 400, and / or the rag assembly 600 of the cleaning device 1000 are not in the same plane, the projection plane mentioned above is introduced to facilitate explanation.

[0041] The bend 150 is located at the front end of the cleaning device 1000. The front vertex e of the bend 15 (orthographic projection on the projection plane) can be the front vertex e of the cleaning device 1000 (orthographic projection on the projection plane). When the bend 150 is a pointed tip, the front vertex e is a sharp vertex. When the bend 150 is a rounded corner as shown in FIG. 2 , the orthographic projection of the bend 150 on the projection plane can be tangent to the maximum circumscribed circle C1, with the tangent point being the front vertex e.

[0042] In addition, the cleaning device 1000 provided in the embodiment of the present application may further include a rag assembly 600, which is rotatably arranged at the bottom end of the chassis 100. At least part of the rag assembly 600 can extend from the rear end of the chassis 100 so as to wipe the wall and other locations of the target surface. In this case, the rear vertex f of the rag assembly 600 (orthographic projection on the projection plane) can be the rear vertex f of the cleaning device 1000 (orthographic projection on the projection plane). Wherein, when the rear end of the rag assembly 600 is in the shape of an arc as shown in Figure 2, the orthographic projection of the rear end of the rag assembly 600 on the projection plane can be tangent to the maximum circumscribed circle C1, and the tangent point is the rear vertex f. It is worth noting that the rag assembly 600 generally includes two rag discs 610, and the rotation axes of the two rag discs 610 are parallel to the rotation axis of the cleaning device 1000. The two rag discs 610 can be respectively formed with a rear vertex f. Thus, the maximum circumscribed circle C1 of the cleaning device 1000 may be a circle formed by the front vertex and the two rear vertices.

[0043] The above description describes the determination of the rear vertex f when the cleaning device 1000 is provided with a rag assembly 600 and the rag assembly 600 extends beyond the rear end of the chassis 100. When the cleaning device 1000 is not provided with a rag assembly 600, or when the cleaning device 1000 is provided with a rag assembly 600 but the rag assembly 600 does not extend beyond the rear end of the chassis 100, the rear vertex of the chassis 100 (in its orthographic projection on the projection plane) may be the rear vertex of the cleaning device 1000 (in its orthographic projection on the projection plane). Specifically, when the rear end of the chassis 100 is in an arc shape as shown in FIG2 , the orthographic projection of the rear end of the chassis 100 on the projection plane may be tangent to the maximum circumscribed circle C1, with the point of tangency being the rear vertex.

[0044] Continuing with reference to FIG. 2 , the cleaning device 1000 provided in an embodiment of the present application may include a drive assembly 500 that enables the cleaning device 1000 to rotate about a rotation axis Q on a target surface, move forward in a positive direction X, and move backward in a negative direction X. The drive assembly 500 and the side brush assembly 400 may be spaced apart along the first direction X, and an orthographic projection of the drive assembly 500 on the bottom surface of the annular sidewall may be located within the ring of the annular sidewall, thereby concealing the drive assembly 500 and reducing the space occupied by the entire cleaning device 1000.

[0045] In addition, the drive assembly 500 may include two drive wheels 510 spaced apart along the second direction Y, each drive wheel 510 being rollably disposed at the bottom end of the chassis 100, and the rolling axis of the drive wheel 510 being perpendicular to the rotation axis of the cleaning device 1000. The method of rotating and moving the cleaning device 1000 using the two drive wheels 510 may be any known method, and this embodiment of the present application does not specifically limit this method. The rotation axis Q of the cleaning device 1000 may be located between the two drive wheels 510, and the distance between each drive wheel 510 and the rotation axis Q is equal.

[0046] In a circular cleaning device (or D-shaped cleaning device) of the related art, the cleaning device rotates around the axis of its largest circumscribed circle. In Figure 1 , the distance between the front vertex e of the cleaning device and the rotation axis O is equal to the distance between the front vertex f of the cleaning device and the rotation axis O.

[0047] However, in the embodiment of the present application, referring to FIG. 2 , the center of the maximum circumscribed circle C1 is not on the rotation axis Q of the cleaning device 1000 provided in the embodiment of the present application, and the cleaning device 1000 may have a front rotating circle C2 and a rear rotating circle C3 .

[0048] Front rotation circle C2: With the orthographic projection of the rotation axis Q on the projection plane as the center and the distance from the front vertex e to the center as the radius, the front rotation circle C2 is the motion trajectory of the front vertex e when the cleaning device 1000 rotates around the rotation axis Q.

[0049] Rear rotation circle C3: The center of the circle is the orthographic projection of the rotation axis Q on the projection plane, and the radius is the distance from the rear vertex f to the center of the circle. In other words, the front rotation circle C2 is the motion trajectory of the rear vertex f when the cleaning device 1000 rotates around the rotation axis Q.

[0050] The rotation axis Q of the cleaning device 1000 provided in an embodiment of the present application is close to the rear vertex f and away from the front vertex e, so that the radius of the front rotating circle C2 is greater than the radius of the rear rotating circle C3, the radius of the front rotating circle C2 is greater than the radius of the maximum circumscribed circle C1, and the front rotating circle C2 is the maximum rotating circle of the cleaning device 1000.

[0051] In order to facilitate the rotation of the cleaning device 1000 and reduce the avoidance space required for the rotation of the cleaning device 1000, the center O of the maximum circumscribed circle C1 and the center Q of the front rotating circle C2 can be located on the same straight line set along the first direction X, and the distance between each driving wheel 510 and the straight line is equal, and the center Q of the front rotating circle C2 is farther away from the front vertex e than the center O of the maximum circumscribed circle C1.

[0052] In the positive direction of the first direction X (as indicated by arrow X), the maximum circumscribed circle C1 has a first, farthest point m1, and the front rotation circle C2 has a second, farthest point m2. As the cleaning device 1000 rotates 90 degrees counterclockwise about the rotation axis Q from Figure 2 to Figure 3 , the front vertex e in Figure 2 will pass through the second, farthest point m2. As long as the second, farthest point m2 is below side b, as shown in Figure 2 , the front vertex e will not interfere with side b during rotation.

[0053] Because the center O of the largest circumscribed circle C1 is closer to the front vertex e, and the rotation axis Q is farther from the front vertex e, the second farthest point m2 can be made lower than the first farthest point m1. The cleaning device 1000 provided in this embodiment of the application has a low elevation of the front vertex e during rotation, and the required clearance space between the cleaning device 1000 and the edge b is small during rotation, making it easier for the cleaning device 1000 to rotate in a narrow space and, in turn, easier for the cleaning device 1000 to escape.

[0054] Furthermore, in the positive direction of the second direction Y (as indicated by arrow Y), the maximum circumscribed circle C1 has a third-farthest point m3, and the front rotation circle C2 has a fourth-farthest point m4. After the cleaning device 1000 rotates 90 degrees counterclockwise about the rotation axis Q from Figure 2 to Figure 3 , the rear vertex f in Figure 2 moves to the fourth-farthest point m4. As long as the fourth-farthest point m4 is located to the left of edge a as shown in Figure 2 , the rear vertex f will not interfere with edge a during rotation.

[0055] Because the center O of the largest circumscribed circle C1 is farther from the rear vertex f, and the rotation axis Q is closer to the rear vertex f, the fourth farthest point m4 can be positioned further to the left than the third farthest point m3. The cleaning device 1000 provided in this embodiment of the present application has a small rightward displacement of the rear vertex f during rotation, and requires a small clearance space with respect to the side a during rotation, making it easier for the cleaning device 1000 to rotate in a narrow space and, in turn, easier for the cleaning device 1000 to escape from a jam.

[0056] During the process of the cleaning device 1000 rotating 90 degrees counterclockwise from FIG. 4 to FIG. 5 around the rotation axis Q, the front vertex e in FIG. 4 will pass through the second farthest point m2. As long as the second farthest point m2 is located to the right of the c-side as shown in FIG. 4, the front vertex e will not interfere with the c-side during the rotation process. Compared to the cleaning device of the related art that rotates counterclockwise around the axis where the center O of the largest circumscribed circle C1 is located, the cleaning device 1000 provided in the embodiment of the present application has a small left shift length of the front vertex e during rotation, and the avoidance space required between the front vertex e and the c-side during rotation is small, which facilitates the rotation of the cleaning device 1000 in a small space, thereby facilitating the cleaning device 1000 to escape from trouble.

[0057] Similarly, when the cleaning device 1000 rotates 90 degrees counterclockwise from FIG. 4 to FIG. 5 about the rotation axis Q, the rear vertex f in FIG. 4 will move to the fourth farthest point m4, and as long as the fourth farthest point m4 is located below the b side as shown in FIG. 4 , the rear vertex f will not interfere with the b side during the rotation. Compared to the cleaning device of the related art that rotates counterclockwise about the axis where the center O of the maximum circumscribed circle C1 is located, the cleaning device 1000 provided in the embodiment of the present application has a smaller upward displacement of the rear vertex f during rotation, and the required clearance space between the rear vertex f and the b side during rotation is smaller, making it easier for the cleaning device 1000 to rotate in a small space, thereby facilitating the cleaning device 1000 to escape from a difficult situation.

[0058] In summary, when the cleaning device 1000 provided in the embodiment of the present application cleans corner areas such as wall corners, the space on the corner side required for its rotation is small (i.e., the avoidance space is small), the rotation is flexible, and it is not easy to collide with the corners, which makes it easy to rotate in a narrow space, making it easy for the cleaning device 1000 to escape.

[0059] 6 , when there is an obstacle 2000 in front of the cleaning device 1000 , the cleaning device 1000 can bypass the obstacle 2000 through the following steps.

[0060] Step 1: The cleaning device 1000 rotates counterclockwise, changing its direction of travel from upward to upward left, and the front vertex of the cleaning device 1000 moves from e1 to e2. Because the rotation axis Q of the embodiment of the present application is away from the front end of the cleaning device 1000, the upward movement distance of the front vertex of the cleaning device 1000 is small, avoiding collision with the obstacle 2000 and facilitating the rotation of the cleaning device 1000.

[0061] Step 2: The cleaning device 1000 is translated a distance in the upper left direction, so that the front vertex of the cleaning device 1000 moves from e2 to e3;

[0062] Step 3: The cleaning device 1000 rotates clockwise, changing its direction of travel from the upper left to the upper right, and the front vertex of the cleaning device 1000 moves from e3 to e4. Because the rotation axis Q in this embodiment of the present application is away from the front end of the cleaning device 1000, a small clockwise rotation of the cleaning device 1000 about the rotation axis Q can move the front vertex of the cleaning device 1000 a greater distance to the right, making it easier for the cleaning device 1000 to return to its normal position, thereby improving avoidance efficiency.

[0063] Step 4: The cleaning device 1000 is translated a certain distance in the upper right direction, so that the front vertex of the cleaning device 1000 moves from e4 to e5;

[0064] Step 5: The cleaning device 1000 rotates clockwise, tilting its direction of travel further to the right. The front vertex of the cleaning device 1000 moves from e5 to e6. Because the rotation axis Q in this embodiment of the present application is away from the front end of the cleaning device 1000, a small clockwise rotation of the cleaning device 1000 about the rotation axis Q can move the front vertex of the cleaning device 1000 a greater distance to the right, making it easier for the cleaning device 1000 to return to its normal position, thereby improving avoidance efficiency.

[0065] Step 6: The cleaning device 1000 is translated a certain distance in the upper right direction, so that the front vertex of the cleaning device 1000 moves from e6 to e7. In this state, the cleaning device 1000 may be located in front of the obstacle 2000, or the rotation axis Q of the cleaning device 1000 in this state corresponds to the rotation axis Q of the cleaning device 1000 in the initial state.

[0066] Step 7: The cleaning device 1000 rotates counterclockwise, and the moving direction of the cleaning device 1000 changes from the upper right to the upper left, and the front vertex of the cleaning device 1000 moves from e7 to e8.

[0067] In summary, the cleaning device 1000 provided in the embodiment of the present application has the advantages of flexible rotation and easy return to the center when avoiding the obstacle 2000.

[0068] It is mentioned above that the radius of the front rotating circle C2 (maximum rotating circle) provided in the embodiment of the present application is greater than the radius of the maximum circumscribed circle C1. In order for the drive assembly 500 to drive the front end of the cleaning device 1000 to rotate around the rotation axis Q, the radius of the front rotating circle C2 cannot be too large, otherwise the machine will not be able to turn. In view of this, the radius of the front rotating circle C2 (maximum rotating circle) may be less than or equal to the sum of √2 / 2 times the width of the chassis 100 and the first preset value. Among them, the width of the chassis 100 is: the maximum length of the chassis 100 in the direction perpendicular to the first straight side wall 110. For example, in Figure 2, in the direction perpendicular to the first straight side wall 110, the distance between the fourth straight side wall 140 and the first straight side wall 110 is the farthest, and the distance between the two is the width of the cleaning device 1000.

[0069] Furthermore, the first preset value may be greater than or equal to 10mm±5mm. For example, the first preset value may be 5mm, and the radius of the front rotation circle C2 (maximum rotation circle) is less than or equal to the sum of √2 / 2 times the width of the chassis 100 and 5mm; the first preset value may be 10mm, and the radius of the front rotation circle C2 is less than or equal to the sum of √2 / 2 times the width of the chassis 100 and 10mm; the first preset value may be 15mm, and the radius of the front rotation circle C2 is less than or equal to the sum of √2 / 2 times the width of the chassis 100 and 15mm.

[0070] The cleaning device 1000 can enter the space formed by the legs of a table (or chair legs or sofa legs), etc., and can move or rotate within the space to clean the space. The cleaning device 1000 can be fully inserted into the space, or a portion of the cleaning device 1000 can be inserted into the space, while another portion of the cleaning device 1000 can be positioned outside the space. For example, in FIG4 , the cleaning device 1000 can fully enter the space enclosed by side a, side b, and side c from the open end, and can move or rotate within the space.

[0071] To enable the cleaning device 1000 to maneuver in a confined space, the radius of the maximum circumscribed circle C1 may optionally be less than or equal to the difference between √2 / 2 times the width of the chassis 100 and a second preset value. Specifically, the maximum width of the cleaning device 1000 is equal to the diameter of the maximum circumscribed circle C1. As long as the maximum circumscribed circle C1 is maneuverable in a confined space, the cleaning device 1000 can maneuver in a confined space.

[0072] Furthermore, the second preset value may be greater than or equal to 10 mm ± 5 mm. For example, the second preset value may be 5 mm, and the radius of the maximum circumscribed circle C1 is less than or equal to the difference between √2 / 2 times the width of the chassis 100 and 5 mm; the second preset value may be 10 mm, and the radius of the maximum circumscribed circle C1 is less than or equal to the difference between √2 / 2 times the width of the chassis 100 and 10 mm; the second preset value may be 15 mm, and the radius of the maximum circumscribed circle C1 is less than or equal to the difference between √2 / 2 times the width of the chassis 100 and 15 mm.

[0073] To facilitate the rotation of the cleaning device 1000, the difference between the radius of the front rotation circle C2 (maximum rotation circle) and the radius of the maximum circumscribed circle C1 may optionally be greater than or equal to a third preset value. Specifically, the smaller the radius of the maximum circumscribed circle C1, the smaller the space occupied by the cleaning device 1000 during rotation. By utilizing the small drop in the maximum circumscribed circle C1, the cleaning device 1000 can retreat a distance before rotating when encountering an obstacle 2000, allowing the cleaning device 1000 to successfully escape.

[0074] Furthermore, the third preset value may be greater than or equal to 10mm±5mm. For example, the third preset value may be 5mm, and the difference between the radius of the front rotating circle C2 (maximum rotating circle) and the radius of the maximum circumscribed circle C1 may be greater than or equal to 5mm. The third preset value may be 10mm, and the difference between the radius of the front rotating circle C2 and the radius of the maximum circumscribed circle C1 may be greater than or equal to 10mm; the third preset value may be 15mm, and the difference between the radius of the front rotating circle C2 and the radius of the maximum circumscribed circle C1 may be greater than or equal to 15mm. Among them, when the cleaning device 1000 encounters an obstacle 2000, it can retreat 10mm±5mm and then rotate.

[0075] In the cleaning equipment of the related art, the side wall surrounding the outside of the drive assembly is a curved wall with a large curvature, and the two drive wheels of the drive assembly are respectively arranged at the two ends of a certain radial direction of the curved wall. Since the drive wheel has a length perpendicular to the radial direction, the distance between the drive wheel and the radial edge of the cleaning equipment of the related art is large. To avoid the above-mentioned problem, in the embodiment of the present application, the orthographic projection of the drive assembly 500 (along the straight line direction perpendicular to the first straight side wall 110) on the surface of the first straight side wall 110 is located within the surface of the first straight side wall 110. In this way, the distance between the drive assembly 500 and the first straight side wall 110 is closer, and the distance between the two drive wheels 510 of the drive assembly 500 can be set farther, so that the drive assembly 500 drives the cleaning equipment 1000 to move.

[0076] Referring to Figure 2, the two drive wheels 510 of the drive assembly 500 can be spaced apart along the second direction Y, and a storage space can be formed between the two drive wheels 510. In cleaning devices of the related art, the roller brush assembly is disposed between the two drive assemblies, resulting in the length of the roller brush assembly being affected by the distance between the two drive wheels. To address the above-mentioned problem, the cleaning device 1000 provided in the embodiment of the present application can optionally further include a roller brush assembly 700, which is rollably disposed at the bottom end of the chassis 100, with the rotation axis of the roller brush assembly 700 being parallel to the rotation axis of the drive wheels 510. The bottom wall of the chassis 100 can be provided with an air inlet connected to the inner cavity of the chassis 100. The roller brush assembly 700 can be rollably disposed at the air inlet and can roll up garbage on the target surface. The fan can guide the rolled-up garbage, along with the surrounding air, into the inner cavity of the chassis 100 through the air inlet. Additionally, the roller brush assembly 700 can be positioned between the side brush assembly 400 and the drive assembly 500, with at least one end of the roller brush assembly 700 extending out of the storage space in the second direction Y. Thus, in this embodiment of the present application, the roller brush assembly 700 is positioned in front of the drive assembly 500, and the length of the roller brush assembly 700 is not affected by the distance between the two drive wheels 510. The roller brush assembly 700 can be lengthened to increase its cleaning range and enhance cleaning effectiveness. Furthermore, as shown in FIG2 , the storage space can contain a dust box 200 for collecting garbage.

[0077] Referring to FIG2 , the embodiment of the present application may further include a rag assembly 600. The rag assembly 600 may include two rag plates 610 rotatably disposed at the bottom end of the chassis 100. The target surface can be wiped by the rotation of the two rag plates 610. The inner cavity of the chassis 100 may be provided with a water tank, which may be provided with a diversion pipe. Water in the water tank may flow through the diversion pipe to the rag assembly 600 to soak the rag plates 610.

[0078] In cleaning devices of the related art, the sidewall located above the rag assembly and surrounding the outside of the rag assembly is a curved wall with a large curvature. As a result, when the cleaning device of the related art cleans along the edge, the distance between the rag assembly and the edge is large, making the area near the edge difficult to be wiped by the rag assembly. In the embodiment of the present application, in order to enable the rag assembly 600 to wipe along the edge, the rag assembly 600 and the side brush assembly 400 can optionally be arranged at both ends of the first straight sidewall 110 along the first direction X. The orthographic projections of the two ends of the rag assembly 600 along the second direction Y (along the straight line direction perpendicular to the bottom surface of the annular sidewall) on the bottom surface of the annular sidewall are located within the ring of the annular sidewall. In other words, the rag assembly 600 does not extend beyond the annular sidewall at both ends in the second direction Y, so that the first straight sidewall 110 remains the outermost structure of the cleaning device 1000 along the second direction Y.

[0079] When the cleaning device 1000 cleans an edge (such as edge a or edge b), the cleaning device 1000 is first moved to the vicinity of the edge, and the first straight side wall 110 of the cleaning device 1000 is directed toward the edge (that is, the extension direction of the cleaning device 1000 is along the extension direction of the edge, and the outer surface of the first straight side wall 110 is the surface of the cleaning device 1000 closest to the edge), and then moves along the extension direction of the edge to clean the edge. As can be seen from the above, when cleaning the edge, the outer surface of the first straight side wall 110 is the surface of the cleaning device 1000 closest to the edge. The distance between the rag assembly 600 and the edge is: the sum of the distance between the rag assembly 600 and the first straight side wall 110 and the distance between the first straight side wall 110 and the edge.

[0080] Compared with the cleaning equipment in the related art having a curved wall with a larger curvature, the first straight side wall 110 is a straight line extending along the first direction X, which can make the distance between the rag assembly 600 and the first straight side wall 110 smaller, the distance between the rag assembly 600 and the edge smaller, and the blind corner area of ​​the rag assembly 600 smaller.

[0081] Optionally, the side brush assembly 400, the roller brush assembly 700, the drive assembly 500 and the rag assembly 600 can be arranged in sequence at the bottom end of the chassis 100 along the first direction X to facilitate dry and wet separation and weight distribution with the drive assembly 500 (rotation axis Q) as the boundary.

[0082] Continuing with FIG. 2 , to prevent the rear end of the chassis 100 from colliding with an obstacle 2000 when the cleaning device 1000 rotates about the rotation axis Q, the annular sidewall may optionally further include a third sidewall 130. The third sidewall 130 and the second straight sidewall 120 are respectively connected to the ends of the first straight sidewall 110 along the first direction X, and the third sidewall 130 may extend along the second direction Y. In other words, the third sidewall 130 is connected to the end of the first straight sidewall 110 away from the second straight sidewall 120, and the length of the third sidewall 130 is oriented along the second direction Y. Furthermore, the rag assembly 600 may extend beyond the third sidewall 130 at one end in the first direction X, and the orthographic projection of the portion of the rag assembly 600 extending beyond the third sidewall 130 may have a rear vertex on the projection plane. The orthographic projection of the third side wall 130 on the projection plane can be located within the rear rotation circle to prevent the third side wall 130 from colliding with the obstacle 2000 during the rotation of the cleaning device 1000, thereby protecting the chassis 100 and extending the service life of the chassis 100.

[0083] Furthermore, the third side wall 130 is in an arc shape, and the arc center of the third side wall 130 faces the second straight side wall 120. Specifically, compared with configuring the third side wall 130 as a straight line, configuring the third side wall 130 as an arc has the advantage of forming a larger annular side wall, thereby increasing the capacity of the chassis 100.

[0084] In cleaning devices of the related art, the navigation assembly is often set on the top wall of the chassis, and the navigation assembly protrudes from the top wall of the chassis. This will make the overall height of the cleaning device of the related art relatively high, making it inconvenient for the device to enter lower spaces for cleaning, and limiting the cleaning range of the device. To solve this problem, the cleaning device 1000 provided in the embodiment of the present application may optionally include a navigation assembly 800 located in the inner cavity of the chassis 100. The chassis 100 may have a first end and a second end arranged relative to each other in the first direction X. The navigation assembly 800 and the side brush assembly 400 may be arranged at the first end of the chassis 100 at intervals along the second direction Y. The side wall of the chassis 100 may have a light-transmitting portion, and the navigation assembly 800 obtains the distance between the cleaning device 1000 and the target by light passing through the light-transmitting portion. Compared with the related art, the overall height of the cleaning device 1000 of the embodiment of the present application is low, making it easier for the cleaning device 1000 to clean lower spaces.

[0085] It is worth noting that the path planning mode of the cleaning device 1000 primarily achieves obstacle avoidance by measuring the distance to obstacles 2000. This distance measurement serves as the basis for obstacle avoidance and can be implemented using various technologies, such as radio frequency, ultrasonic, infrared, or laser. The navigation component 800 may include an LDS (laser distance sensor), an infrared sensor, or a radio frequency device. The LDS scans the distance from itself to the boundaries of a room by emitting laser light, thereby creating a digital map and storing the indoor layout within the digital map. The cleaning device 1000 can then plan a reasonable cleaning route based on the layout of furniture, wall boundaries, and other obstacles 2000 in the room to complete the cleaning task. Furthermore, the cleaning device 1000 can update the digital map in real time based on changes in the position of furniture within the room. Furthermore, the LDS emits a laser beam to illuminate a specific point on an object and, based on the reflected light, determines the distance between the cleaning device 1000 and the confined space. As the cleaning device 1000 approaches a confined space for cleaning, the LDS continuously provides feedback on the distance to the confined space. When the cleaning device 1000 moves to the point where part of the chassis 100 enters a narrow space, the LDS located at the front end of the cleaning device 1000 can be triggered in advance to change the direction of the sweeping robot to prevent more of the cleaning device 1000 from entering the narrow space. In addition, a universal wheel 300 can be provided between the navigation assembly 800 and the side brush assembly 400 to change the direction of the cleaning device 1000.

[0086] Optionally, to provide a more regular appearance and facilitate rotation of the cleaning device 1000, the shape of the cleaning device 1000 provided in the embodiment of the present application may be symmetrical about a central axis plane. The central axis plane may be located between the two drive wheels 510, with the axis of the center O of the aforementioned maximum circumscribed circle C1 and the rotation axis Q of the cleaning device 1000 both lying on the central axis plane.

[0087] Furthermore, the annular sidewall may also include a fourth straight sidewall 140. The fourth straight sidewall 140 may be connected to an end of the second straight sidewall 120 away from the first straight sidewall 110, and the fourth straight sidewall 140 and the first straight sidewall 110 are symmetrical about the central axis of the second straight sidewall 120. The fourth straight sidewall 140 may be bent relative to the second straight sidewall 120, and a bend 150 may be formed between the fourth straight sidewall 140 and the second straight sidewall 120. The orthographic projection of the bend 150 on the projection plane may have a front vertex e. In Figure 2, the first straight sidewall 110, the second straight sidewall 120, the fourth straight sidewall 140, and the third sidewall 130 are connected end to end to form the annular sidewall of the cleaning device 1000.

[0088] Optionally, at least part of the light-transmitting portion may be located on the second straight side wall 120 , and at least part of the light-transmitting portion may be located on the fourth straight side wall 140 , so as to increase the visual range of the navigation assembly 800 .

[0089] The following describes the working principle of a robot vacuum cleaner in detail using a specific application scenario as an example.

[0090] Person A wants to take advantage of the holiday to invite friends to his home for a small gathering. To impress his friends with the cleanliness and tidiness of his home, Person A activates a robot vacuum cleaner, opens his phone, taps the accompanying app, and selects deep cleaning mode. After the robot vacuum cleaner finishes its work, Person A goes about other tasks. Based on the deep cleaning command, the robot vacuum cleaner first activates the navigation component, which generates a dot cloud based on Person A's home environment. The robot vacuum cleaner then constructs a model of Person A's home based on this dot cloud. The robot vacuum cleaner then uses a path planning algorithm to calculate the optimal cleaning path.

[0091] When the robot vacuum cleaner is cleaning a corner, it first moves to the end of one of the sides of the corner to be cleaned, and then positions the first straight side wall of the robot vacuum cleaner along the side, with a cleaning space for the side brush assembly of the robot vacuum cleaner to extend between the first straight side wall and the side. As the robot vacuum cleaner moves along the side, the side brush assembly cleans the side closely. When the robot vacuum cleaner reaches the end of the side, the robot vacuum cleaner rotates so that the first straight side wall of the robot vacuum cleaner is positioned along the other side, with a cleaning space for the side brush assembly of the robot vacuum cleaner to extend between the first straight side wall and the other side. As the robot vacuum cleaner moves along the other side, the side brush assembly cleans the other side closely.

[0092] When the sweeping robot encounters an obstacle in front of it, it can first retreat a certain distance, then turn counterclockwise (or clockwise) so that the front end of the sweeping robot faces the left front (or right front) of the obstacle; after the sweeping robot travels a certain distance along the left front (or right front), it can turn clockwise (or counterclockwise) so that the front end of the sweeping robot faces the right front (or left front) of the obstacle; after the sweeping robot travels a certain distance along the right front (or left front), it can turn clockwise (or counterclockwise) so that the front end of the sweeping robot faces the right front (or left front) of the obstacle. The angle increases; wait for the sweeping robot to move a distance along the right front (or left front), observe whether the sweeping robot is in front of the obstacle, if the sweeping robot is in front of the obstacle, the sweeping robot rotates counterclockwise (or clockwise) to make the front end of the cleaning robot return to the center; if the sweeping robot is not in front of the obstacle, continue to move the sweeping robot forward, or rotate clockwise (or counterclockwise) again to increase the angle of the front end of the sweeping robot toward the right front (or left front) of the obstacle again, and then move a distance in the new direction until the sweeping robot is in front of the obstacle.

[0093] It can be seen that the technical solution provided by the present application is to set a first straight side wall and a second straight side wall, and the first straight side wall is connected to the second straight side wall to form a bend, and the side brush is set at the bend, and the front vertex of the cleaning device is formed at the bend, and the maximum circumscribed circle of the cleaning device and the maximum rotation circle of the cleaning device both pass through the front vertex of the bend. By setting the radius of the maximum rotation circle to be larger than the radius of the maximum circumscribed circle, the distance between the front vertex and the rear vertex of the cleaning device can be shortened, thereby reducing the avoidance space required for the cleaning device when rotating, and ultimately improving the escape ability of the cleaning device.

[0094] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present application should be included in the scope of protection of the present application.

Claims

1. A cleaning device, characterized in that: The cleaning device comprises at least a chassis having an annular side wall, wherein: The annular side wall includes a first straight side wall and a second straight side wall, the first straight side wall extends along a first direction, the second straight side wall is connected to one end of the first straight side wall in the first direction, and the second straight side wall is bent relative to the first straight side wall so that a bending portion is formed between the first straight side wall and the second straight side wall; The second straight side wall extends along a second direction, and the second direction intersects the first direction; The bending portion forms a front vertex of the cleaning device, the maximum circumscribed circle of the cleaning device and the maximum rotating circle of the cleaning device both pass through the front vertex, and the radius of the maximum rotating circle is greater than the radius of the maximum circumscribed circle.

2. The cleaning device according to claim 1, characterized in that The radius of the maximum rotating circle is less than or equal to the sum of √2 / 2 times the width of the chassis and a first preset value.

3. The cleaning device according to claim 1, characterized in that: The radius of the maximum circumscribed circle is less than or equal to √2 / 2 times the difference between the width of the chassis and a second preset value.

4. The cleaning device according to claim 2 or 3, characterized in that: A difference between the radius of the maximum rotating circle and the radius of the maximum circumscribed circle is greater than or equal to a third preset value.

5. The cleaning device according to claim 4, characterized in that The cleaning device also includes a side brush assembly, wherein: The side brush assembly is rotatably disposed at the bottom end of the chassis; The rotation axis of the side brush assembly is close to the bending part, and the orthographic projection of the rotation axis of the side brush assembly on the bottom surface of the annular side wall is located in the inner ring range of the annular side wall.

6. The cleaning device according to claim 5, characterized in that The track formed by the edge of the side brush assembly when rotating is at least partially located outside the first straight side wall.

7. The cleaning device according to claim 6, characterized in that The cleaning device also includes a drive assembly, wherein: The driving assembly is rollably disposed at the bottom end of the chassis, and the driving assembly and the side brush assembly are spaced apart along the first direction.

8. The cleaning device according to claim 7, characterized in that The orthographic projection of the driving component on the bottom surface of the annular sidewall is located within the inner ring range of the annular sidewall, and the orthographic projection of the driving component on the surface of the first straight sidewall is located within the surface range of the first straight sidewall.

9. The cleaning device according to claim 8, characterized in that The cleaning device also includes a roller brush assembly, wherein: The roller brush assembly is rollably disposed at the bottom end of the chassis, and the roller brush assembly is located between the side brush assembly and the driving assembly; The driving assembly comprises two driving wheels which are rollingly arranged at the bottom end of the chassis, the two driving wheels are spaced apart along the second direction, and a storage space is formed between the two driving wheels; In the second direction, at least one end of the roller brush assembly extends out of the storage space.

10. The cleaning device according to claim 5, characterized in that The cleaning device also includes a rag assembly, wherein: The rag assembly is rotatably disposed at the bottom end of the chassis, and the rag assembly and the side brush assembly are arranged at two ends of the first straight side wall along the first direction.

11. The cleaning device according to claim 10, characterized in that The orthographic projections of the two ends of the rag assembly along the second direction on the bottom surface of the annular side wall are located within the inner ring range of the annular side wall.

12. The cleaning device according to claim 11, characterized in that The annular side wall further includes a third side wall. The third side wall and the second straight side wall are respectively connected to two ends of the first straight side wall along the first direction, and the third side wall extends along the second direction.

13. The cleaning device according to claim 12, characterized in that In the first direction, one end of the rag assembly extends out of the third side wall and forms a rear vertex; The rear vertex is located on the maximum circumscribed circle, and the rear vertex rotates around the rotation axis of the cleaning device to form a rear rotation circle, and the third side wall is located in the rear rotation circle.

14. The cleaning device according to claim 13, characterized in that The third side wall is in an arc shape, and the arc center of the third side wall faces the second straight side wall.

15. The cleaning device according to claim 5, characterized in that The cleaning device further comprises a navigation assembly located in the inner cavity of the chassis, wherein: The chassis has a first end and a second end that are oppositely arranged in the first direction, and the navigation assembly and the side brush assembly are spaced apart and arranged at the first end of the chassis along the second direction; The side wall of the chassis has a light-transmitting portion, and the navigation component obtains the distance between the cleaning device and the target through the light passing through the light-transmitting portion.

16. The cleaning device according to claim 15, characterized in that The chassis further comprises a fourth straight side wall, wherein: The fourth straight side wall is connected to an end of the second straight side wall away from the first straight side wall, and the fourth straight side wall is symmetrical with the first straight side wall about the central axis of the second straight side wall; The light-transmitting portion is at least partially located on the second straight side wall, and the light-transmitting portion is at least partially located on the fourth straight side wall.

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