Plasma processing apparatus and program

Abstract

Provided is technology for facilitating updating of a recipe used in a plasma processing apparatus. A control unit of this plasma processing apparatus includes a storage unit and a processing unit. The storage unit is configured to store a first rule including a first change rule and a second change rule. The processing unit is provided with a first recipe acquisition unit and a second recipe acquisition unit that acquire a first recipe and a second recipe, a transition recipe generation unit that generates a transition recipe from the first recipe and the second recipe, a first recipe change unit and a second recipe change unit that change the first recipe and the second recipe over time in accordance with the operation time of an RF power supply, and a transition recipe change unit that changes the transition recipe.

Description

Plasma processing apparatus and program

[0001] An exemplary embodiment of the present disclosure relates to a plasma processing apparatus and a program.

[0002] Japanese Patent Laid-Open No. 2003-129999 discloses that a processor in a control unit controls each part of a plasma processing apparatus in accordance with recipe data, thereby executing various processes in the plasma processing apparatus.

[0003] Japanese Patent Application Laid-Open No. 2021-39924

[0004] The present disclosure provides a technique for facilitating updating of recipes used in plasma processing apparatuses.

[0005] In one exemplary embodiment of the present disclosure, a plasma processing system includes a chamber, a gas supply configured to supply a process gas into the chamber, an RF power supply configured to generate RF power to generate plasma from the process gas supplied into the chamber, and a controller configured to control the gas supply and the RF power supply, wherein the controller includes a memory unit and a processor, the memory unit is configured to store a first rule, the first rule including a first change rule and a second change rule, and the processor includes a first recipe acquisition unit configured to acquire a first recipe for performing a first plasma processing step, the first recipe including a first set power level of RF power and a first set flow rate of a process gas, a second recipe acquisition unit configured to acquire a second recipe for performing a second plasma processing step, the second recipe including a second set power level of RF power and a second set flow rate of the process gas, and a transition recipe generation unit configured to generate a transition recipe for performing a transition step between the first plasma processing step and the second plasma processing step, the transition recipe including a first set flow rate and a second set flow rate. a transition recipe generation unit including a plurality of transition flow rates that change according to a first change rule and a plurality of transition power levels that change according to a second change rule from a first set power level to a second set power level; a first recipe modification unit that modifies the first recipe over time according to an operation time of the RF power supply, the first recipe modification unit including modifying the first set power level and the first set flow rate over time; and a second recipe modification unit that modifies the second recipe over time according to an operation time of the RF power supply, the second recipe modification unit modifying the second set power level and the second set flow rate over time. a second recipe modification unit that modifies the first recipe and the second recipe over time, and a transition recipe modification unit that modifies a transition recipe according to the modified first recipe and the modified second recipe, the modified transition recipe including a plurality of modified transition flow rates that change from the modified first set flow rates toward the modified second set flow rates according to a first modification rule, and a plurality of modified transition power levels that change from the modified first set power level toward the modified second set power level according to a second modification rule.

[0006] According to one exemplary embodiment of the present disclosure, a technique for facilitating updating of a recipe used in a plasma processing apparatus can be provided.

[0007] 1 is a system configuration diagram showing an example of a plasma processing system; FIG. 2 is a diagram showing an example of a rule creating device; FIG. 3 is a diagram showing an example of a plasma processing apparatus; FIG. 4 is a diagram showing an example of a computer included in a control unit; FIG. 5 is a diagram showing an example of a setting recipe; FIG. 6 is a diagram showing an example of a setting recipe and a transition recipe; FIG. 7 is a diagram showing an example of a change in parameter value in a transition recipe; FIG. 8 is a diagram showing another example of a change in parameter value in a transition recipe; FIG. 9 is a diagram showing an example of a changed setting recipe and a changed transition recipe; FIG. 10 is a flowchart showing an example of a plasma processing method; FIG. 11 is a diagram showing another example of a setting recipe; FIG. 12 is a diagram showing another example of a setting recipe and a transition recipe; FIG. 13 is a diagram showing another example of a changed setting recipe and a changed transition recipe; FIG. 14 is a diagram showing a recipe according to a reference example;

[0008] Hereinafter, each embodiment of the present disclosure will be described.

[0009] In one exemplary embodiment, a plasma processing system includes a chamber, a gas supply configured to supply a process gas into the chamber, an RF power supply configured to generate RF power to generate plasma from the process gas supplied into the chamber, and a controller configured to control the gas supply and the RF power supply, wherein the controller includes a memory unit and a processor, the memory unit is configured to store a first rule, the first rule including a first change rule and a second change rule, and the processor includes a first recipe acquisition unit that acquires a first recipe for performing a first plasma processing step, the first recipe including a first set power level of RF power and a first set flow rate of a process gas, a second recipe acquisition unit that acquires a second recipe for performing a second plasma processing step, the second recipe including a second set power level of RF power and a second set flow rate of the process gas, and a transition recipe generation unit that generates a transition recipe for performing a transition step between the first plasma processing step and the second plasma processing step, the transition recipe including a first set flow rate to a second set flow rate from the first set flow rate to the second set flow rate. a transition recipe generation unit including a plurality of transition flow rates that change according to a change rule and a plurality of transition power levels that change according to a second change rule from a first set power level to a second set power level; a first recipe change unit that changes the first recipe over time according to an operation time of the RF power supply, the first recipe change unit including changing the first set power level and the first set flow rate over time; and a second recipe change unit that changes the second recipe over time according to an operation time of the RF power supply, the second recipe change unit including changing the second set power level and the second set flow rate. a second recipe modification unit that modifies the first recipe and the second recipe over time, the second recipe modification unit modifying a transition recipe in accordance with the modified first recipe and the modified second recipe, the modified transition recipe including a plurality of modified transition flow rates that change from the modified first set flow rates toward the modified second set flow rates according to a first modification rule, and a plurality of modified transition power levels that change from the modified first set power level toward the modified second set power level according to a second modification rule.

[0010] In one exemplary embodiment, the control unit further includes a rule acquisition unit configured to acquire the first rule from an external device via a network and store the first rule in the storage unit.

[0011] In one exemplary embodiment, the first recipe acquisition unit is configured to acquire a first recipe from an external device via a network and store it in the storage unit, and the second recipe acquisition unit is configured to acquire a second recipe from the external device via the network and store it in the storage unit.

[0012] In one exemplary embodiment, the memory unit is configured to further store a second rule, the first recipe modification unit modifies the first set power level and the first set flow rate over time based on the second rule, and the second recipe modification unit modifies the second set power level and the second set flow rate over time based on the second rule.

[0013] In one exemplary embodiment, the control unit further includes a rule acquisition unit configured to acquire the first rule and the second rule from an external device via a network and store them in the storage unit.

[0014] In one exemplary embodiment, a program for controlling a plasma processing apparatus includes: a plasma processing apparatus including a chamber; a gas supply unit configured to supply a process gas into the chamber; an RF power supply configured to generate RF power to generate plasma from the process gas supplied into the chamber; and a controller configured to control the gas supply unit and the RF power supply and including a memory unit and a processing unit. The program includes, in the processing unit of the controller, (a) a procedure for causing a first rule including a first change rule and a second change rule to be stored in the memory unit; (b) a procedure for acquiring a first recipe for performing a first plasma processing step, the first recipe including a first set power level of RF power and a first set flow rate of processing gas; (c) a procedure for acquiring a second recipe for performing a second plasma processing step, the second recipe including a second set power level of RF power and a second set flow rate of processing gas; and (d) a procedure for generating a transition recipe for performing a transition step between the first plasma processing step and the second plasma processing step. (e) a procedure for changing the first recipe over time in accordance with an operation time of the RF power supply, the procedure including changing the first set power level and the first set flow rate over time; (f) a procedure for changing the second recipe over time in accordance with an operation time of the RF power supply, the procedure including changing the second set power level and the second set flow rate over time; and (g) a procedure for changing the transition recipe in accordance with the changed first recipe and the changed second recipe, the changed transition recipe including a plurality of changed transition flow rates that change from the changed first set flow rate to the changed second set flow rate in accordance with the first change rule and a plurality of changed transition power levels that change from the changed first set power level to the changed second set power level in accordance with the second change rule.

[0015] In one exemplary embodiment, (a) includes obtaining the first rule from an external device via a network and storing the first rule in the storage unit.

[0016] In one exemplary embodiment, (b) includes obtaining a first recipe from an external device via a network and storing the first recipe in a storage unit, and (c) includes obtaining a second recipe from an external device via a network and storing the second recipe in a storage unit.

[0017] In one exemplary embodiment, (a) includes storing the second rule in a memory unit, (e) includes changing the first set power level and the first set flow rate over time based on the second rule, and (f) includes changing the second set power level and the second set flow rate over time based on the second rule.

[0018] In one exemplary embodiment, a) includes obtaining the first rule and the second rule from an external device via a network and storing them in the storage unit.

[0019] In one exemplary embodiment, a plasma processing system includes a chamber, an RF power supply configured to generate RF power to generate a plasma in the chamber, and a controller, wherein the controller includes a memory unit and a processor, wherein the memory unit is configured to store a first rule, and the processor includes a first recipe acquisition unit configured to acquire a first recipe for performing a first plasma processing step, the first recipe including a first setting level of a setting parameter, a second recipe acquisition unit configured to acquire a second recipe for performing a second plasma processing step, the second recipe including a second setting level of the setting parameter, and a transition recipe generation unit configured to generate a transition recipe for performing a transition step between the first plasma processing step and the second plasma processing step, the transition recipe being ... a first recipe modification unit that modifies the first recipe over time in accordance with an operation time of an RF power supply, the first recipe modification unit including changing the first setting level over time; a second recipe modification unit that modifies the second recipe over time in accordance with an operation time of the RF power supply, the second recipe modification unit including changing the second setting level over time; and a transition recipe modification unit that modifies the transition recipe in accordance with the modified first recipe and the modified second recipe, the modified transition recipe including a plurality of modified transition setting levels that change according to the first rule from the modified first setting level to the modified second setting level.

[0020] In one exemplary embodiment, the control unit further includes a rule acquisition unit configured to acquire the first rule from an external device via a network and store the first rule in the storage unit.

[0021] In one exemplary embodiment, the first recipe acquisition unit is configured to acquire the first recipe from an external device via a network and store it in the storage unit.

[0022] In one exemplary embodiment, the storage unit is configured to further store a second rule, the first recipe modification unit modifies the first setting level over time based on the second rule, and the second recipe modification unit modifies the second setting level over time based on the second rule.

[0023] In one exemplary embodiment, the control unit further includes a rule acquisition unit configured to acquire the first rule and the second rule from an external device via a network and store them in the storage unit.

[0024] In one exemplary embodiment, the setting parameters are at least one of the power level of the RF power, the flow rate of the process gas supplied to the chamber, and the pressure within the chamber.

[0025] Hereinafter, each embodiment of the present disclosure will be described in detail with reference to the drawings. In each drawing, the same or similar elements are designated by the same reference numerals, and redundant explanations will be omitted. Unless otherwise specified, the positional relationships, such as up, down, left, and right, will be described based on the positional relationships shown in the drawings. The dimensional ratios in the drawings do not represent actual ratios, and the actual ratios are not limited to the ratios shown in the drawings.

[0026] A plasma processing apparatus is composed of hardware and software. Some parts of the software can be adjusted by the user of the plasma processing apparatus, while others can be adjusted by the equipment manufacturer but not by the user. Furthermore, with the increasing complexity of processing processes and shorter delivery times for equipment in recent years, fine adjustments to processing are often made even after the hardware is completed, and software changes may be required after the hardware has been shipped.

[0027] An example of a portion of software that cannot be adjusted by the user is a portion that depends on the hardware. Such software includes rules for creating recipes that are automatically inserted between recipes created by the user. These rules are created by the manufacturer of the plasma processing apparatus and incorporated into the plasma processing apparatus, but may need to be modified during operation of the plasma processing apparatus. Modification of recipes or rules may be necessary, for example, when the hardware configuration of the plasma processing apparatus changes, or when conditions within the chamber change due to component wear or the like.

[0028] 1 is a system configuration diagram showing an example of a plasma processing system 1. The plasma processing system 1 includes a creation device 2 and a plasma processing device 3. The creation device 2 and the plasma processing device 3 communicate with each other via a network 4, and transmit and receive data to and from each other via the network 4. The creation device 2 is an example of a rule creation device.

[0029] The creation device 2 creates a setting recipe in response to a user's operation and transmits the created setting recipe to the plasma processing device 3 via the network 4. The creation device 2 also creates rules in response to a user's operation and transmits the created rules to the plasma processing device 3 via the network 4. The rules include a first rule and a second rule. The first rule is a rule used to generate a transition recipe for executing a transition process between a first plasma processing process and a second plasma processing process. The second rule is a rule used to change the values ​​of setting parameters for executing the first plasma processing process and the values ​​of setting parameters for executing the second plasma processing process in accordance with the operation time of the RF power supply.

[0030] The plasma processing apparatus 3 acquires the setting recipe and rules from the creation apparatus 2 via the network 4. The plasma processing apparatus 3 also generates a transition recipe in accordance with a first rule included in the acquired rules. The plasma processing apparatus 3 also changes the setting recipe in accordance with a second rule included in the acquired rules to generate a changed setting recipe. The plasma processing apparatus 3 also changes the transition recipe in accordance with the first and second rules included in the acquired rules to generate a changed transition recipe. The plasma processing apparatus 3 then performs processes such as film formation and etching on the substrate W in accordance with the setting recipe, transition recipe, changed setting recipe, and changed transition recipe.

[0031] 2 is a diagram showing an example of the creation device 2. The creation device 2 includes a storage unit 20, a processing unit 21, a user interface 22, and a communication unit 23.

[0032] The storage unit 20 stores rules 200 and set recipes 201. The rules 200 include a first rule and a second rule. The set recipes 201 include a first recipe including set parameter values ​​for performing a first plasma processing step, and a second recipe including set parameter values ​​for performing a second plasma processing step.

[0033] The processing unit 21 has a creating unit 210 and a transmitting unit 211. The creating unit 210 creates a first rule and a second rule in response to an operation from a user via the user interface 22, and stores a rule 200 including the created first rule and second rule in the storage unit 20. The creating unit 210 also creates a setting recipe 201 in response to an operation from a user via the user interface 22, and stores the created setting recipe 201 in the storage unit 20. The creating unit 210 is an example of a rule creating unit.

[0034] The communication unit 23 communicates with the plasma processing apparatus 3 via the network 4. The transmission unit 211 transmits the rule 200 and the set recipe 201 stored in the storage unit 20 to the plasma processing apparatus 3 via the communication unit 23 and the network 4.

[0035] [Configuration of Plasma Processing Apparatus 3] Fig. 3 is a diagram showing an example of the plasma processing apparatus 3. The plasma processing apparatus 3 is an example of a substrate processing apparatus. Fig. 3 shows a capacitively coupled plasma processing apparatus 3 as an example.

[0036] The capacitively coupled plasma processing apparatus 3 includes a plasma processing chamber 310, a gas supply 320, a power supply 330, and an exhaust system 340. The plasma processing apparatus 3 also includes a substrate support 311 and a gas inlet. The gas inlet is configured to introduce at least one process gas into the plasma processing chamber 310. The gas inlet includes a showerhead 313. The substrate support 311 is disposed within the plasma processing chamber 310. The showerhead 313 is disposed above the substrate support 311. In one embodiment, the showerhead 313 forms at least a portion of the ceiling of the plasma processing chamber 310. The plasma processing chamber 310 has a plasma processing space 310s defined by the showerhead 313, a sidewall 310a of the plasma processing chamber 310, and the substrate support 311. The plasma processing chamber 310 has at least one gas inlet for supplying at least one process gas to the plasma processing space 310s and at least one gas outlet for exhausting gas from the plasma processing space 310s. The plasma processing chamber 310 is grounded. The showerhead 313 and the substrate support 311 are electrically insulated from the housing of the plasma processing chamber 310.

[0037] The substrate support 311 includes a main body 3111 and a ring assembly 3112. The main body 3111 has a central region 3111a for supporting a substrate W and an annular region 3111b for supporting the ring assembly 3112. A wafer is an example of a substrate W. The annular region 3111b of the main body 3111 surrounds the central region 3111a of the main body 3111 in a plan view. The substrate W is disposed on the central region 3111a of the main body 3111, and the ring assembly 3112 is disposed on the annular region 3111b of the main body 3111 so as to surround the substrate W on the central region 3111a of the main body 3111. Therefore, the central region 3111a is also called a substrate support surface for supporting the substrate W, and the annular region 3111b is also called a ring support surface for supporting the ring assembly 3112.

[0038] In one embodiment, the main body 3111 includes a base 31110 and an electrostatic chuck 31111. The base 31110 includes a conductive member. The conductive member of the base 31110 can function as a lower electrode. The electrostatic chuck 31111 is disposed on the base 31110. The electrostatic chuck 31111 includes a ceramic member 31111a and an electrostatic electrode 31111b disposed within the ceramic member 31111a. The ceramic member 31111a has a central region 3111a. In one embodiment, the ceramic member 31111a also has an annular region 3111b. Note that another member surrounding the electrostatic chuck 31111, such as an annular electrostatic chuck or an annular insulating member, may also have the annular region 3111b. In this case, the ring assembly 3112 may be disposed on the annular electrostatic chuck or the annular insulating member, or may be disposed on both the electrostatic chuck 31111 and the annular insulating member. Furthermore, at least one RF / DC electrode coupled to an RF (Radio Frequency) power supply 331 and / or a DC (Direct Current) power supply 332 (described later) may be disposed within the ceramic member 31111a. In this case, the at least one RF / DC electrode functions as a lower electrode. When a bias RF signal and / or a DC signal (described later) is supplied to the at least one RF / DC electrode, the RF / DC electrode is also called a bias electrode. Note that the conductive member of the base 31110 and the at least one RF / DC electrode may function as multiple lower electrodes. Furthermore, the electrostatic electrode 31111b may function as a lower electrode. Therefore, the substrate support 311 includes at least one lower electrode.

[0039] The ring assembly 3112 includes one or more annular members. In one embodiment, the one or more annular members include one or more edge rings and at least one cover ring. The edge rings are formed of a conductive or insulating material, and the cover rings are formed of an insulating material.

[0040] The substrate support 311 may also include a temperature adjustment module configured to adjust at least one of the electrostatic chuck 31111, the ring assembly 3112, and the substrate to a target temperature. The temperature adjustment module may include a heater, a heat transfer fluid, a flow passage 31110a, or a combination thereof. A heat transfer fluid such as brine or a gas flows through the flow passage 31110a. In one embodiment, the flow passage 1110a is formed in the base 31110, and one or more heaters are disposed in the ceramic member 31111a of the electrostatic chuck 31111. The substrate support 311 may also include a heat transfer gas supply configured to supply a heat transfer gas to a gap between the back surface of the substrate W and the central region 3111a.

[0041] The shower head 313 is configured to introduce at least one process gas from the gas supply unit 320 into the plasma processing space 310s. The shower head 313 has at least one gas supply port 313a, at least one gas diffusion chamber 313b, and multiple gas inlets 313c. The process gas supplied to the gas supply port 313a passes through the gas diffusion chamber 313b and is introduced into the plasma processing space 310s from the multiple gas inlets 313c. The shower head 313 also includes at least one upper electrode. In addition to the shower head 313, the gas inlet may also include one or more side gas injectors (SGIs) attached to one or more openings formed in the sidewall 310a.

[0042] The gas supply unit 320 may include at least one gas source 321 and at least one flow controller 322. In one embodiment, the gas supply unit 320 is configured to supply at least one process gas from a corresponding gas source 321 through a corresponding flow controller 322 to the showerhead 13. Each flow controller 322 may include, for example, a mass flow controller or a pressure-controlled flow controller. Additionally, the gas supply unit 320 may include one or more flow modulation devices to modulate or pulse the flow rate of the at least one process gas.

[0043] The power source 330 includes an RF power source 331 coupled to the plasma processing chamber 310 via at least one impedance matching circuit. The RF power source 331 is configured to supply at least one RF signal (RF power) to at least one lower electrode and / or at least one upper electrode. This generates a plasma from at least one process gas supplied to the plasma processing space 310s. Therefore, the RF power source 331 can function as at least a part of a plasma generating unit configured to generate a plasma from one or more process gases in the plasma processing chamber 310s. In addition, by supplying a bias RF signal to the at least one lower electrode, a bias potential is generated on the substrate W, thereby attracting ion components in the formed plasma to the substrate W.

[0044] In one embodiment, the RF power supply 331 includes a first RF generator 331a and a second RF generator 331b. The first RF generator 331a is coupled to at least one lower electrode and / or at least one upper electrode via at least one impedance matching circuit and is configured to generate a source RF signal (source RF power) for plasma generation. In one embodiment, the source RF signal has a frequency in the range of 10 MHz to 150 MHz. In one embodiment, the first RF generator 331a may be configured to generate multiple source RF signals having different frequencies. The generated one or more source RF signals are supplied to at least one lower electrode and / or at least one upper electrode.

[0045] The second RF generator 331b is coupled to at least one lower electrode via at least one impedance matching circuit and is configured to generate a bias RF signal (bias RF power). The frequency of the bias RF signal may be the same as or different from the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency lower than the frequency of the source RF signal. In one embodiment, the bias RF signal has a frequency in the range of 100 kHz to 60 MHz. In one embodiment, the second RF generator 331b may be configured to generate multiple bias RF signals having different frequencies. The generated one or more bias RF signals are supplied to at least one lower electrode. In various embodiments, at least one of the source RF signal and the bias RF signal may be pulsed.

[0046] The power supply 330 may also include a DC power supply 332 coupled to the plasma processing chamber 310. The DC power supply 332 includes a first DC generator 332a and a second DC generator 332b. In one embodiment, the first DC generator 332a is connected to the at least one lower electrode and configured to generate a first DC signal. The generated first bias DC signal is applied to the at least one lower electrode. In one embodiment, the second DC generator 332b is connected to the at least one upper electrode and configured to generate a second DC signal. The generated second DC signal is applied to the at least one upper electrode.

[0047] In various embodiments, at least one of the first and second DC signals may be pulsed. In this case, a sequence of voltage pulses is applied to at least one lower electrode and / or at least one upper electrode. The voltage pulses may have a rectangular, trapezoidal, triangular, or combination thereof pulse waveform. In one embodiment, a waveform generator for generating the sequence of voltage pulses from the DC signal is connected between the first DC generator 332a and at least one lower electrode. Thus, the first DC generator 332a and the waveform generator constitute a voltage pulse generator. When the second DC generator 332b and the waveform generator constitute a voltage pulse generator, the voltage pulse generator is connected to at least one upper electrode. The voltage pulses may have either positive or negative polarity. Furthermore, the sequence of voltage pulses may include one or more positive voltage pulses and one or more negative voltage pulses within one period. The first and second DC generating units 332a and 332b may be provided in addition to the RF power supply 331, or the first DC generating unit 332a may be provided instead of the second RF generating unit 331b.

[0048] The exhaust system 340 may be connected to, for example, a gas exhaust port 310e provided at the bottom of the plasma processing chamber 10. The exhaust system 340 may include a pressure regulating valve and a vacuum pump. The pressure in the plasma processing space 10s is regulated by the pressure regulating valve. The vacuum pump may include a turbomolecular pump, a dry pump, or a combination thereof.

[0049] The plasma processing apparatus 3 includes a control unit 5. The control unit 5 processes computer-executable instructions that cause the plasma processing apparatus 3 to perform the various steps described in this disclosure. The control unit 5 may be configured to control each element of the plasma processing apparatus 3 to perform the various steps described herein. In one embodiment, part or all of the control unit 5 may be included in the plasma processing apparatus 3. The control unit 5 may include a processing unit 5a1, a storage unit 5a2, a communication unit 5a3, and a user interface 5a4. The control unit 5 is implemented, for example, by a computer 5a. The processing unit 5a1 may be configured to read a program from the storage unit 5a2 in response to a user's operation via the user interface 5a4 and execute the read program 5a25 to perform various control operations. In this embodiment, the program is stored in the storage unit 5a2 in advance. However, as another example, the program may be acquired via a medium when needed. The acquired program is stored in the storage unit 5a2 and is read from the storage unit 5a2 by the processing unit 5a1 and executed. The medium may be various storage media readable by the computer 5a, or may be the network 4 connected to the communication unit 5a3. The processing unit 5a1 may be a CPU (Central Processing Unit). The storage unit 5a2 may include a RAM (Random Access Memory), a ROM (Read Only Memory), a HDD (Hard Disk Drive), an SSD (Solid State Drive), or a combination thereof. The communication unit 5a3 may communicate with the plasma processing apparatus 3 via a network 4 such as a LAN (Local Area Network). The user interface 5a4 may include an input device such as a keyboard and an output device such as a display.

[0050] 4 is a diagram showing an example of the computer 5a included in the control unit 5. The computer 5a in this embodiment includes a processing unit 5a1, a storage unit 5a2, a communication unit 5a3, and a user interface 5a4.

[0051] Memory unit 5a2 stores rules 5a20, setting recipes 5a21, transition recipes 5a22, changed setting recipes 5a23, changed transition recipes 5a24, and programs 5a25. Processing unit 5a1 executes programs 5a25 read from memory unit 5a2 to implement acquisition unit 5a10, generation unit 5a11, change unit 5a12, and recipe execution unit 5a13.

[0052] Acquisition unit 5a10 acquires rules including a first rule and a second rule from creation device 2 via communication unit 5a3 and network 4, and stores the acquired rules as rules 5a20 in storage unit 5a2. Acquisition unit 5a10 also acquires a setting recipe from creation device 2 via communication unit 5a3 and network 4, and stores the acquired setting recipe as setting recipe 5a21 in storage unit 5a2. Acquisition unit 5a10 is an example of a first recipe acquisition unit, a second recipe acquisition unit, and a rule acquisition unit.

[0053] 5 is a diagram showing an example of a set recipe 5a21. In the example of FIG. 5, in process N, the flow rate of gas A is set to 200 sccm (3.3×10 -6 m 3 5 shows that the flow rate of Gas A is 100 sccm and the flow rate of Gas B is 50 sccm in Step N+1, which is performed after Step N. Gas A and Gas B are examples of process gases.

[0054] Step N is an example of a first plasma processing step, and step N+1 is an example of a second plasma processing step. Also, in Fig. 5, the flow rates of Gas A and Gas B associated with Step N are an example of a first recipe, and the flow rates of Gas A and Gas B associated with Step N+1 are an example of a second recipe. Also, the flow rates of Gas A and Gas B illustrated in Fig. 5 are an example of setting parameters. Other setting parameters include the magnitude (power level) of RF power and the pressure within the plasma processing chamber 10.

[0055] 4, the description will be continued. The generation unit 5a11 is configured to generate a transition recipe based on a first rule included in the rules 5a20 stored in the storage unit 5a2, and to store the generated transition recipe as a transition recipe 5a22 in the storage unit 5a2. The generation unit 5a11 is an example of a transition recipe generation unit.

[0056] 6 is a diagram showing an example of a set recipe 5a21 and a transition recipe 5a22. The transition recipe 5a22 is a process inserted between two processes to suppress fluctuations in the state of the plasma processing apparatus 3 that accompany switching between the two processes. In the example of FIG. 6, three transition processes T1, T2, and T3 are inserted between process N and process N+1.

[0057] 7, the flow rate of Gas A in each of the three transition steps T1, T2, and T3 is set so that the flow rate of Gas A gradually decreases from 200 sccm to 100 sccm. Also, the flow rate of Gas B in each of the three transition steps T1, T2, and T3 is set so that the flow rate of Gas B gradually increases from 0 to 50 sccm.

[0058] In the example of FIG. 6 , three transition steps T1, T2, and T3 are inserted between step N and step N+1, but the disclosed technology is not limited to this. As another example, the number of transition steps inserted between step N and step N+1 may be less than three or more than three. Furthermore, the execution time of each step inserted between step N and step N+1 may be set independently, as shown in FIG. 8 . In the example of FIG. 8 , among the three transition steps T1, T2, and T3, the execution time of transition step T2 is the longest, and the execution time of transition step T3 is the shortest. The number of transition steps, the execution time of each transition step, and the like are set by the user via the creation device 2.

[0059] 7 and 8, the gas flow rates in the transition steps are set to gradually change along a straight line, but the disclosed technology is not limited to this. As another example, the gas flow rates in the transition steps may be set to gradually change along an upwardly convex curve L1 or a downwardly convex curve L2, as shown in FIG.

[0060] Alternatively, the gas flow rate in the multiple transition steps may be set to gradually change along a curve L3, as shown in FIG. 9, in which the change becomes more gradual as the flow rate approaches the previous step (step N) and the next step (step N+1).

[0061] Alternatively, the gas flow rate in the plurality of transition steps may be set to gradually change along a curve L4 that includes a period during the transition step where the flow rate changes to an increase, rather than a monotonous decrease, as shown in Fig. 9. When the gas flow rate is increased, the gas flow rate may be set to gradually change along a curve that includes a period during the transition step where the flow rate changes to a decrease, rather than a monotonous increase.

[0062] 4 , the explanation will be continued. Based on a second rule included in rules 5a20 stored in memory 5a2, change unit 5a12 is configured to change the values ​​of setting parameters included in set recipe 5a21 in accordance with the operation time of RF power supply 331. For example, based on the second rule, change unit 5a12 changes the flow rates of Gas A and Gas B included in process N and process N+1 in accordance with the operation time of RF power supply 331. Then, change unit 5a12 stores the recipe including the changed flow rates of Gas A and Gas B in memory 5a2 as changed set recipe 5a23.

[0063] Furthermore, change unit 5a12 is configured to change transition recipe 5a22 based on a first rule included in rules 5a20 stored in memory unit 5a2 and on changed setting recipe 5a23. For example, change unit 5a12 changes transition recipe 5a22 based on the first rule so that the flow rates of gas A and gas B gradually change from process N to process N+1 after the change. Change unit 5a12 then stores changed transition recipe 5a22 in memory unit 5a2 as changed transition recipe 5a24. Change unit 5a12 is an example of a first recipe change unit, a second recipe change unit, and a transition recipe change unit.

[0064] As a result, for example, a changed setting recipe 5a23 and a changed transition recipe 5a24 are generated as shown in Fig. 10. Fig. 10 illustrates the changed setting recipe 5a23 and the changed transition recipe 5a24 after the RF power supply 331 has operated for a predetermined time.

[0065] 10, the flow rate of Gas A in the modified recipe 5a23 for process N is reduced from 200 sccm to 140 sccm, the flow rate of Gas A in the modified recipe 5a23 for process N+1 is reduced from 100 sccm to 90 sccm, and the flow rate of Gas B in the modified recipe 5a23 for process N+1 is reduced from 50 sccm to 40 sccm.

[0066] In addition, in the example of Figure 10, the gas flow rate is changed in the change setting recipe 5a23 of multiple transition processes T1 to T3 so that it gradually changes from the gas flow rate in the change setting recipe 5a23 of process N to the gas flow rate in the change setting recipe 5a23 of process N+1.

[0067] If the gas flow rates in the transition step between step N and step N+1 are fixed, unnecessary fluctuations in the gas flow rates will occur if the gas flow rates in step N and step N+1 are changed depending on the operating time of the RF power supply 331. For example, in FIG. 10, if the transition recipe 5a22 illustrated in FIG. 6 is left set instead of the modified transition recipe 5a24, the flow rate of Gas A will increase from 140 sccm to 175 sccm and then decrease. Furthermore, between transition step T3 and step N+1, the flow rate of Gas A will decrease significantly from 125 sccm to 90 sccm. This will result in significant fluctuations in the state of the plasma processing apparatus 3, which may cause problems such as plasma misfires.

[0068] 10, the gas flow rates are changed in the modified recipe setting 5a24 for the three transition processes T1, T2, and T3 so that the gas flow rates gradually change from process N to process N+1. This makes it possible to suppress fluctuations in the state of the plasma processing apparatus 3 and smoothly switch processes when two processes N and N+1 with different processing conditions are performed.

[0069] 4 , the recipe execution unit 5a13 controls each part of the plasma processing apparatus 3 in accordance with the set recipe 5a21 and the transition recipe 5a22 stored in the memory unit 5a2, thereby performing plasma processing on the substrate W. The recipe execution unit 5a13 also acquires a changed set recipe 5a23 and a changed transition recipe 5a24 from the memory unit 5a2 in accordance with the operation time of the RF power supply 331. The recipe execution unit 5a13 then controls each part of the plasma processing apparatus 3 in accordance with the acquired changed set recipe 5a23 and changed transition recipe 5a24, thereby performing plasma processing on the substrate W.

[0070] [Plasma Processing Method] Fig. 11 is a flowchart showing an example of a plasma processing method. Each step illustrated in Fig. 11 is realized by the control unit 5 of the plasma processing apparatus 3 controlling each part of the plasma processing apparatus 3.

[0071] First, a setting recipe and rules are acquired (step S10). In step S10, acquisition unit 5a10 acquires rules including a first rule and a second rule from creation device 2 via communication unit 5a3 and network 4, and stores the acquired rules as rules 5a20 in storage unit 5a2. Also in step S10, acquisition unit 5a10 acquires a setting recipe from creation device 2 via communication unit 5a3 and network 4, and stores the acquired setting recipe as setting recipe 5a21 in storage unit 5a2. Step S10 is an example of a first recipe acquisition procedure, a second recipe acquisition procedure, and a rule acquisition procedure.

[0072] Next, a transition recipe is generated (step S11). In step S11, generation unit 5a11 generates a transition recipe based on a first rule included in rule 5a20 stored in storage unit 5a2, and stores the generated transition recipe in storage unit 5a2 as transition recipe 5a22. Step S11 is an example of a transition recipe generation procedure.

[0073] Next, the set recipe is changed (step S12). In step S12, change unit 5a12 changes the values ​​of setting parameters included in set recipe 5a21 for each operation time of RF power supply 331 based on a second rule included in rule 5a20 stored in memory unit 5a2. Then, change unit 5a12 stores set recipe 5a21 with the changed setting parameters as changed set recipe 5a23 in memory unit 5a2. Step S12 is an example of a first recipe change procedure and a second recipe change procedure.

[0074] Next, the transition recipe is changed (step S13). In step S13, change unit 5a12 changes transition recipe 5a22 based on a first rule included in rules 5a20 stored in memory unit 5a2 and changed setting recipe 5a23. Then, change unit 5a12 stores transition recipe 5a22 with changed setting parameters in memory unit 5a2 as changed setting recipe 5a23. Step S13 is an example of a transition recipe change procedure.

[0075] Next, the substrate W is processed according to the recipe (step S14). In step S14, the recipe execution unit 5a13 controls each part of the plasma processing apparatus 3 according to the set recipe 5a21 and the transition recipe 5a22 stored in the memory unit 5a2, thereby processing the substrate W using plasma. The recipe execution unit 5a13 also acquires, from the memory unit 5a2, a changed set recipe 5a23 and a changed transition recipe 5a24 corresponding to the operation time of the RF power supply 331. The recipe execution unit 5a13 then controls each part of the plasma processing apparatus 3 according to the acquired changed set recipe 5a23 and changed transition recipe 5a24, thereby processing the substrate W using plasma.

[0076] Next, it is determined whether or not the processing of the substrate W is to be terminated (step S15). If the processing of the substrate W is not to be terminated (step S15: No), the processing shown in step S14 is executed again. On the other hand, if the processing of the substrate W is to be terminated (step S15), the plasma processing method shown in this flowchart is terminated.

[0077] The embodiment has been described above. As described above, the plasma processing apparatus (plasma processing apparatus 3) in this embodiment includes a chamber (plasma processing chamber 310), a gas supply unit (gas supply unit 320), an RF power supply (RF power supply 331), and a control unit (control unit 5). The gas supply unit is configured to supply a processing gas into the chamber. The RF power supply is configured to generate RF power to generate plasma from the processing gas supplied into the chamber. The control unit is configured to control the gas supply unit and the RF power supply. The control unit also includes a processing unit (processing unit 5a1) and a memory unit (memory unit 5a2). The memory unit is configured to store a first rule and a second rule. The first rule is used to generate a transition recipe for performing a transition process between a first plasma processing process and a second plasma processing process. The second rule is used to change the values ​​of setting parameters for performing the first plasma processing process and the second plasma processing process in accordance with the operation time of the RF power supply. The processing unit includes a first recipe acquisition unit (acquisition unit 5a10), a second recipe acquisition unit (acquisition unit 5a10), a rule acquisition unit (acquisition unit 5a10), a transition recipe generation unit (generation unit 5a11), a first recipe modification unit (modification unit 5a12), a second recipe modification unit (modification unit 5a12), and a transition recipe modification unit (modification unit 5a12). The first recipe acquisition unit is configured to acquire a first recipe including values ​​of setting parameters for performing a first plasma processing step. The second recipe acquisition unit is configured to acquire a second recipe including values ​​of setting parameters for performing a second plasma processing step. The rule acquisition unit is configured to acquire a first rule from an external device and store it in the storage unit. The transition recipe generation unit is configured to generate a transition recipe based on the first rule. The first recipe modification unit is configured to modify values ​​of setting parameters included in the first recipe in accordance with the operation time of the RF power supply based on the second rule. The second recipe modification unit is configured to modify the value of a setting parameter included in the second recipe in accordance with the operation time of the RF power supply based on a second rule.The transition recipe modification unit is configured to modify the transition recipe based on the first rule, the first recipe modified by the first recipe modification unit, and the second recipe modified by the second recipe modification unit, thereby making it possible to easily modify the rules used in the plasma processing apparatus outside the plasma processing apparatus.

[0078] In the above-described embodiment, the setting parameters are at least one of the magnitude of the RF power, the flow rate of the processing gas, and the pressure inside the chamber.

[0079] The above-described embodiment also relates to a program (5a25) for controlling a plasma processing apparatus. The plasma processing apparatus (plasma processing apparatus 3) includes a chamber (plasma processing chamber 310), a gas supply unit (gas supply unit 320), an RF power supply (RF power supply 331), and a control unit (control unit 5). The gas supply unit is configured to supply a processing gas into the chamber. The RF power supply is configured to generate RF power to generate plasma from the processing gas supplied into the chamber. The control unit is configured to control the gas supply unit and the RF power supply. The control unit also includes a processing unit (processing unit 5a1) and a memory unit (memory unit 5a2). The memory unit is configured to store a first rule and a second rule. The first rule is used to generate a transition recipe for executing a transition process between a first plasma processing process and a second plasma processing process. The second rule is used to change the values ​​of setting parameters for executing the first plasma processing process and the second plasma processing process in accordance with the operation time of the RF power supply. The program causes the processing unit to execute a first recipe acquisition procedure (step S10), a second recipe acquisition procedure (step S10), a rule acquisition procedure (step S10), a transition recipe generation procedure (step S11), a first recipe change procedure (step S12), a second recipe change procedure (step S12), and a transition recipe change procedure (step S13). In the first recipe acquisition procedure, a first recipe including setting parameter values ​​for performing a first plasma processing step is acquired. In the second recipe acquisition procedure, a second recipe including setting parameter values ​​for performing a second plasma processing step is acquired. In the rule acquisition procedure, a first rule is acquired from an external device and stored in the storage unit. In the transition recipe generation procedure, a transition recipe is generated based on the first rule. In the first recipe change procedure, a setting parameter value included in the first recipe is changed based on the second rule in accordance with the operation time of the RF power supply. In the second recipe change procedure, the values ​​of the setting parameters included in the second recipe are changed based on the second rule and in accordance with the operation time of the RF power supply.In the transition recipe change procedure, the transition recipe is changed based on the first rule, the first recipe changed by the first recipe change procedure, and the second recipe changed by the second recipe change procedure, thereby making it possible to easily modify the rules used in the plasma processing apparatus outside the plasma processing apparatus.

[0080] The plasma processing system 1 in the above-described embodiment includes a rule creation device (creation device 2) and a plasma processing device (plasma processing device 3). The rule creation device includes a rule creation unit (creation unit 210) and a transmission unit (transmission unit 211). The rule creation unit creates a first rule used to generate a transition recipe for executing a transition process between a first plasma processing process and a second plasma processing process. The transmission unit transmits the first rule to the plasma processing device. The plasma processing device includes a chamber (plasma processing chamber 310), a gas supply unit (gas supply unit 320), an RF power supply (RF power supply 331), and a control unit (control unit 5). The gas supply unit is configured to supply a processing gas into the chamber. The RF power supply is configured to generate RF power to generate plasma from the processing gas supplied into the chamber. The control unit is configured to control the gas supply unit and the RF power supply. The control unit also includes a processing unit (processing unit 5a1) and a memory unit (memory unit 5a2). The storage unit is configured to store a first rule and a second rule. The first rule is used to generate a transition recipe for executing a transition process between a first plasma processing process and a second plasma processing process. The second rule is used to change the values ​​of setting parameters for executing the first plasma processing process and the values ​​of setting parameters for executing the second plasma processing process according to the operation time of the RF power supply. The processing unit includes a first recipe acquisition unit (acquisition unit 5a10), a second recipe acquisition unit (acquisition unit 5a10), a rule acquisition unit (acquisition unit 5a10), a transition recipe generation unit (generation unit 5a11), a first recipe modification unit (modification unit 5a12), a second recipe modification unit (modification unit 5a12), and a transition recipe modification unit (modification unit 5a12). The first recipe acquisition unit is configured to acquire a first recipe including values ​​of setting parameters for executing the first plasma processing process. The second recipe acquisition unit is configured to acquire a second recipe including values ​​of setting parameters for performing a second plasma processing step. The rule acquisition unit is configured to acquire the first rule from the rule creation device and store it in the storage unit. The transition recipe generation unit is configured to generate a transition recipe based on the first rule.The first recipe modification unit is configured to modify the value of a setting parameter included in the first recipe based on the second rule and in accordance with the operation time of the RF power supply. The second recipe modification unit is configured to modify the value of a setting parameter included in the second recipe based on the second rule and in accordance with the operation time of the RF power supply. The transition recipe modification unit is configured to modify the transition recipe based on the first rule, the first recipe modified by the first recipe modification unit, and the second recipe modified by the second recipe modification unit. This allows the rules used in the plasma processing apparatus to be easily modified outside the plasma processing apparatus.

[0081] [Modifications] The technology disclosed in the present application is not limited to the above-described embodiment, and various modifications are possible within the scope of the gist thereof.

[0082] In the above embodiment, in step S12, the change unit 5a12 changes the values ​​of the setting parameters in the setting recipe 5a21 for each operation time of the RF power supply 331 based on the second rule, and stores the changed setting recipe 5a23. As a result, the setting levels of the setting parameters (e.g., the set power level of the RF power, the set flow rate of the process gas, etc.) are changed over time in accordance with the operation time of the RF power supply 331. However, the manner in which the setting levels of the setting parameters are changed over time is not limited to this.

[0083] For example, in step S12, acquisition unit 5a10 may acquire setting change recipe 5a23 from creation device 2 via communication unit 5a3 and network 4 for each operation time of the RF power supply. Then, change unit 512a may store setting change recipe 5a23 acquired by acquisition unit 5a10 in memory unit 5a2. In this way, the setting levels of the setting parameters may be changed over time in accordance with the operation time of RF power supply 331.

[0084] Furthermore, for example, in step S12, the acquiring unit 5a10 may acquire setting parameters from the user via the user interface 5a2 for each operating time of the RF power supply. Then, the changing unit 512a may update the setting recipe 5a21 based on the acquired setting parameters and store the updated setting recipe 5a23 in the storage unit 5a2. In this way, the setting levels of the setting parameters may be changed over time in accordance with the operating time of the RF power supply 331.

[0085] In the above embodiment, the setting recipe 5a21 (FIG. 5), transition recipe 5a22 (FIG. 6), changed setting recipe 5a23, and changed transition recipe 5a24 (FIG. 10) were described using gas A and gas B as setting parameters, but the setting parameters and each recipe are not limited to this.

[0086] For example, the setting parameters may include various control parameters included in the recipe, such as the power level of the RF power (source RF signal) and the pressure within the plasma processing chamber 10. In one example, the setting parameters include the power level of the bias RF power (bias RF signal). In one example, the setting parameters include the voltage level of the DC voltage applied to the lower electrode (first bias DC signal). In one example, the setting parameters include the voltage level of the DC voltage applied to the ring assembly 3112. In one example, the setting parameters include the voltage level of the DC voltage applied to the upper electrode (second DC signal). In one example, the setting parameters include the partial pressure ratio of the process gas in each region (e.g., a central region and a peripheral region surrounding the central region) within the plasma processing chamber.

[0087] In one embodiment, the plasma processing apparatus 3 includes an electromagnet assembly configured to generate a magnetic field within the chamber 310. The electromagnet assembly includes, for example, a plurality of electromagnets and bobbins (yokes) disposed above the showerhead 313. In one embodiment, the electromagnet assembly includes a plurality of annular electromagnets arranged concentrically above the plasma processing space 310s. By controlling the value of the current supplied to the electromagnet assembly, the radial distribution of the density of the plasma generated within the chamber 310 can be adjusted. The setting parameters can include the magnitude of the current supplied to the electromagnet assembly.

[0088] 12 is a diagram showing another example of the set recipe. In the example of FIG. 12, in process N, the flow rate of gas A is 200 sccm (3.3×10 -6 m 3 12 shows that the flow rate of Gas A is 100 sccm and the power level of the RF power (source RF signal) is 1100 W in step N+1, which is performed after step N. The flow rate of Gas A and the RF power level associated with step N+1 are an example of a first recipe. The example of FIG. 12 also shows that the flow rate of Gas A is 100 sccm and the power level of the RF power is 1100 W in step N+1, which is performed after step N. The flow rate of Gas A and the RF power level associated with step N+1 are an example of a second recipe.

[0089] FIG. 13 shows another example of a set recipe and a transition recipe. The transition recipe 5a22 is a process inserted between two processes to suppress fluctuations in the state of the plasma processing apparatus 3 associated with switching between the two processes. In the example of FIG. 13, three transition processes T1, T2, and T3 are inserted between process N and process N+1. Note that the number of transition processes inserted between process N and process N+1 may be less than three or more than three. Furthermore, the execution times of some or all of the transition processes inserted between process N and process N+1 may be the same, or may be different.

[0090] The flow rate of Gas A and the power level of RF power in the transition step are set based on a first rule included in rules 5a20 stored in memory unit 5a2. In one embodiment, the first rule includes a first change rule and a second change rule.

[0091] The first change rule is a rule for setting the flow rate of gas A in the transition steps. In one example, the first change rule is set to gradually change the flow rate of gas A from the flow rate of gas A associated with step N to the flow rate of gas A associated with step N+1. The first change rule may be set to gradually change the flow rate of gas A in the multiple transition steps along a straight line (see FIGS. 7 and 8), or may be set to gradually change along a curve (see FIG. 9).

[0092] The second change rule is a rule for setting the power level of the RF power in the transition steps. In one example, the second change rule is set to gradually change the power level of the RF power from the power level of the RF power associated with step N to the power level of the RF power associated with step N+1. The second change rule may be set to gradually change the power level of the RF power in the multiple transition steps along a straight line or along a curved line.

[0093] The transition recipe 5a22 may be generated by the generation unit 5a11 based on a first change rule and a second change rule of the first rule included in the rules 5a20 stored in the storage unit 5a2. In the example shown in Fig. 13, the flow rate of Gas A in each of the three transition steps T1, T2, and T3 is set so that the flow rate of Gas A gradually decreases from 200 sccm to 100 sccm according to the first change rule. Furthermore, the power level of the RF power in each of the three transition steps T1, T2, and T3 is set so that the power level of the RF power gradually increases from 1000 W to 1100 W according to the second change rule.

[0094] 14 is a diagram showing another example of a changed setting recipe and a changed transition recipe. In the example of FIG. 14, the flow rate of Gas A in the changed setting recipe 5a23 for process N is reduced from 200 sccm to 140 sccm. The flow rate of Gas A in the changed setting recipe 5a23 for process N+1 is 100 sccm, unchanged from the set recipe 5a21. Furthermore, the RF power level in the changed setting recipe 5a23 for process N+1 is increased from 1000 W to 1200 W. The RF power level in the changed setting recipe 5a23 for process N+1 is 1100 W, unchanged from the set recipe 5a21.

[0095] The modified transition recipe 5a24 may be generated by the modification unit 5a12 based on a first modification rule and a second modification rule of the first rule included in the rules 5a20 stored in the storage unit 5a2. In the example shown in Fig. 14, the flow rate of Gas A in each of the three transition steps T1, T2, and T3 is set so that the flow rate of Gas A gradually decreases from 140 sccm to 100 sccm according to the first modification rule. Furthermore, the power level of the RF power in each of the three transition steps T1, T2, and T3 is set so that the power level of the RF power gradually decreases from 1200 W to 1100 W according to the second modification rule.

[0096] However, if the gas flow rate and RF power level in the transition process between process N and process N+1 are set to fixed values, problems may occur if the gas flow rate in process N and process N+1 is changed depending on the operating time of the RF power supply 331.

[0097] FIG. 15 is a diagram showing a recipe according to a reference example. FIG. 15 illustrates an example in which the transition recipe 5a22 (see FIG. 13) remains fixed when the modified recipe 5a23 (see FIG. 14) is set. In the example shown in FIG. 15, the flow rate of gas A increases from 140 sccm in process N to 175 sccm in transition process T1, and then decreases toward 100 sccm in process N+1 in transition processes T2 and T3. Also, in transition process T1, the power level of the RF power decreases from 1200 W in process N to 1025 W, and then increases toward 1100 W in process N+1 in transition processes T2 and T3. This can cause significant fluctuations in the state of the plasma processing apparatus 3, potentially resulting in problems such as plasma misfires.

[0098] 14, the gas flow rate and the RF power level are changed in the modified recipe setting 5a23 for the three transition processes T1, T2, and T3 so that the gas A flow rate and the RF power level gradually change from process N to process N+1. This suppresses fluctuations in the state of the plasma processing apparatus 3 and enables smooth process switching when two processes N and N+1 with different processing conditions are performed.

[0099] In the plasma processing system 1 according to the above embodiment, the rules and the set recipe are transmitted from the creating device 2 to the plasma processing apparatus 3 by an electrical signal via the network 4, but the disclosed technology is not limited to this. As another example, the rules and the set recipe created by the creating device 2 may be stored in a portable storage medium such as a USB (Universal Serial Bus) memory or a DVD (Digital Versatile Disc). Then, this portable storage medium may be set in the control unit 5 of the plasma processing apparatus 3, and the control unit 5 may acquire the rules and the set recipe from this portable storage medium.

[0100] In the embodiment described above, the change unit 5a12 generates the changed setting recipe 5a23 and the changed transition recipe 5a24 for each operation time of the RF power supply 331 before the start of processing on the substrate W, but the disclosed technology is not limited to this. As another example, the change unit 5a12 may generate the changed setting recipe 5a23 and the changed transition recipe 5a24 each time the operation time of the RF power supply 331 reaches a predetermined time after the start of processing on the substrate W.

[0101] In the above embodiment, the plasma processing apparatus 3 is described as using a capacitively coupled plasma (CCP) as an example of a plasma source, but the plasma source is not limited to this. Examples of plasma sources other than the capacitively coupled plasma include inductively coupled plasma (ICP), microwave-excited surface wave plasma (SWP), electron cyclotron resonance plasma (ECP), and helicon wave-excited plasma (HWP).

[0102] In the above embodiment, the setting level of the setting parameter is changed over time depending on the operating time of the RF power supply 331, but this is not limiting. For example, the setting level of the setting parameter may be changed over time depending on the state of consumable parts (edge ​​ring, upper electrode, etc.) used in the plasma processing apparatus 3. The state of the consumable parts may be determined based not only on the operating time of the RF power supply 331 described above, but also on the operating time of the plasma processing apparatus 3 and measurement results of the consumable parts.

[0103] Although the above embodiment has been described using the plasma processing apparatus 3 as an example, the present invention is not limited thereto. For example, the present invention may also be applied to a substrate processing apparatus that does not use plasma. In this case, the substrate processing system includes a substrate processing apparatus and a controller, and the controller includes a storage unit and a processing unit. The processing unit includes a first recipe acquisition unit, a second recipe acquisition unit, a transition recipe generation unit, a first recipe modification unit, a second recipe modification unit, and a transition recipe modification unit. The first recipe acquisition unit acquires a first recipe for performing a first substrate processing step. The first recipe includes a first setting level of a setting parameter. In one embodiment, the first recipe includes a plurality of first setting levels corresponding to each of a plurality of setting parameters. The second recipe acquisition unit acquires a second recipe for performing a second substrate processing step. The second recipe includes a second setting level of a setting parameter. In one embodiment, the second recipe includes a plurality of second setting levels corresponding to each of a plurality of setting parameters. The transition recipe generation unit generates a transition recipe for performing a transition step between the first substrate processing step and the second substrate processing step. The transition recipe includes a plurality of transition setting levels that change for each setting parameter from a first setting level to a second setting level according to a first rule. The first recipe modification unit modifies the first recipe over time, for example, in accordance with an operating time of the substrate processing apparatus. In one embodiment, the first recipe modification unit modifies the first setting level over time for each setting parameter. The second recipe modification unit modifies the second recipe over time, for example, in accordance with an operating time of the substrate processing apparatus. In one embodiment, the second recipe modification unit modifies the second recipe over time for each setting parameter. The transition recipe modification unit modifies the transition recipe in accordance with the modified first recipe and the modified second recipe. The modified transition recipe includes a plurality of modified transition setting levels that change for each setting parameter from the modified first setting level to the modified second setting level according to a first rule.

[0104] According to the above-described embodiment, it is possible to provide a technique for easily updating a recipe used in a plasma processing apparatus.

[0105] Embodiments of the present disclosure further include the following aspects.

[0106] (Supplementary Note 1) A plasma processing apparatus comprising: a chamber; a gas supply unit configured to supply a process gas into the chamber; an RF power supply configured to generate RF power to generate plasma from the process gas supplied into the chamber; and a controller configured to control the gas supply unit and the RF power supply, wherein the controller includes a memory unit and a processor, and the memory unit is configured to store a first rule, the first rule including a first change rule and a second change rule, and the processor is: a first recipe acquisition unit configured to acquire a first recipe for performing a first plasma processing step, the first recipe including a first set power level of the RF power and a first set flow rate of the process gas; and a second recipe acquisition unit configured to acquire a second recipe for performing a second plasma processing step, the second recipe including a second set power level of the RF power and a second set flow rate of the process gas. a transition recipe generation unit that generates a transition recipe for executing a transition process between the first plasma processing process and the second plasma processing process, the transition recipe including a plurality of transition flow rates that change from the first set flow rate to the second set flow rate according to the first change rule, and a plurality of transition power levels that change from the first set power level to the second set power level according to the second change rule; a first recipe modification unit that modifies the first recipe over time in accordance with an operation time of the RF power supply, the first recipe modification unit including changing the first set power level and the first set flow rate over time; a second recipe modification unit that modifies the second recipe over time in accordance with an operation time of the RF power supply, the second recipe modification unit including changing the second set power level and the second set flow rate over time;a transition recipe modification unit that modifies the transition recipe according to the modified first recipe and the modified second recipe, the modified transition recipe including a plurality of modified transition flow rates that change from the modified first set flow rate toward the modified second set flow rate in accordance with the first modification rule, and a plurality of modified transition power levels that change from the modified first set power level toward the modified second set power level in accordance with the second modification rule.

[0107] (Supplementary Note 2) The plasma processing apparatus according to Supplementary Note 1, wherein the control unit further includes a rule acquisition unit configured to acquire the first rule from an external device via a network and store the first rule in the storage unit.

[0108] (Supplementary Note 3) The plasma processing apparatus according to Supplementary Note 2, wherein the first recipe acquisition unit is configured to acquire the first recipe from the external device via the network and store it in the memory unit, and the second recipe acquisition unit is configured to acquire the second recipe from the external device via the network and store it in the memory unit.

[0109] (Supplementary Note 4) The plasma processing apparatus according to any one of Supplementary Note 1 to Supplementary Note 3, wherein the memory unit is configured to further store a second rule, the first recipe modification unit changes the first set power level and the first set flow rate over time based on the second rule, and the second recipe modification unit changes the second set power level and the second set flow rate over time based on the second rule.

[0110] (Supplementary Note 5) The plasma processing apparatus according to Supplementary Note 4, wherein the control unit further includes a rule acquisition unit configured to acquire the first rule and the second rule from an external device via a network and store the first rule and the second rule in the storage unit.

[0111] (Supplementary Note 6) A program for controlling a plasma processing apparatus, the plasma processing apparatus comprising: a chamber; a gas supply unit configured to supply a processing gas into the chamber; an RF power supply configured to generate RF power to generate plasma from the processing gas supplied into the chamber; and a control unit configured to control the gas supply unit and the RF power supply, the control unit comprising a memory unit and a processing unit, the program causing the processing unit of the control unit to: (a) store a first rule including a first change rule and a second change rule in the memory unit; (b) obtain a first recipe for performing a first plasma processing step, the first recipe including a first set power level of the RF power and a first set flow rate of the processing gas; and (c) obtain a second recipe for performing a second plasma processing step, the second recipe including a second set power level of the RF power and a second set flow rate of the processing gas. (d) creating a transition recipe for executing a transition process between the first plasma processing process and the second plasma processing process, the transition recipe including a plurality of transition flow rates that change from the first set flow rate to the second set flow rate according to the first change rule, and a plurality of transition power levels that change from the first set power level to the second set power level according to the second change rule; (e) changing the first recipe over time according to an operation time of the RF power supply, the procedure including changing the first set power level and the first set flow rate over time; (f) changing the second recipe over time according to an operation time of the RF power supply, the procedure including changing the second set power level and the second set flow rate over time;(g) changing the transition recipe according to the changed first recipe and the changed second recipe, the changed transition recipe including a plurality of changed transition flow rates that change from the changed first set flow rate to the changed second set flow rate in accordance with the first change rule, and a plurality of changed transition power levels that change from the changed first set power level to the changed second set power level in accordance with the second change rule.

[0112] (Supplementary Note 7) The program according to Supplementary Note 6, wherein (a) includes obtaining the first rule from an external device via a network and storing the first rule in the storage unit.

[0113] (Appendix 8) The program described in Appendix 7, wherein (b) includes acquiring the first recipe from the external device via the network and storing it in the memory unit, and (c) includes acquiring the second recipe from the external device via the network and storing it in the memory unit.

[0114] (Supplementary Note 9) The program described in any one of Supplementary Note 6 to Supplementary Note 8, wherein (a) includes storing a second rule in the memory unit, (e) includes changing the first set power level and the first set flow rate over time based on the second rule, and (f) includes changing the second set power level and the second set flow rate over time based on the second rule.

[0115] (Supplementary Note 10) The program according to Supplementary Note 9, wherein (a) includes acquiring the first rule and the second rule from an external device via a network and storing them in the storage unit.

[0116] (Supplementary Note 11) A plasma processing apparatus comprising: a chamber; an RF power supply configured to generate RF power to generate plasma in the chamber; and a controller, wherein the controller includes a memory unit and a processor, wherein the memory unit is configured to store a first rule, and the processor includes: a first recipe acquisition unit configured to acquire a first recipe for performing a first plasma processing step, the first recipe including a first setting level of setting parameters; a second recipe acquisition unit configured to acquire a second recipe for performing a second plasma processing step, the second recipe including a second setting level of the setting parameters; and a transition recipe generation unit configured to generate a transition recipe for performing a transition step between the first plasma processing step and the second plasma processing step, the transition recipe including a plurality of transition setting levels that change from the first setting level to the second setting level according to the first rule. a first recipe modification unit that modifies the first recipe over time in accordance with an operation time of the RF power supply, the first recipe modification unit including changing the first setting level over time; a second recipe modification unit that modifies the second recipe over time in accordance with an operation time of the RF power supply, the second recipe modification unit including changing the second setting level over time; and a transition recipe modification unit that modifies the transition recipe in accordance with the modified first recipe and the modified second recipe, the modified transition recipe including a plurality of modified transition setting levels that change from the modified first setting level to the modified second setting level according to the first rule.

[0117] (Supplementary Note 12) The plasma processing apparatus according to Supplementary Note 11, wherein the control unit further includes a rule acquisition unit configured to acquire the first rule from an external device via a network and store the first rule in the storage unit.

[0118] (Supplementary Note 13) The plasma processing apparatus according to Supplementary Note 12, wherein the first recipe acquisition unit is configured to acquire the first recipe from the external device via the network and store the first recipe in the storage unit.

[0119] (Supplementary Note 14) The plasma processing apparatus according to any one of Supplementary Note 11 to Supplementary Note 13, wherein the memory unit is configured to further store a second rule, the first recipe modification unit changes the first setting level over time based on the second rule, and the second recipe modification unit changes the second setting level over time based on the second rule.

[0120] (Supplementary Note 15) The plasma processing apparatus according to Supplementary Note 14, wherein the control unit further includes a rule acquisition unit configured to acquire the first rule and the second rule from an external device via a network and store the first rule and the second rule in the storage unit.

[0121] (Supplementary Note 16) The plasma processing apparatus according to any one of Supplementary Note 11 to Supplementary Note 15, wherein the setting parameters are at least one of a power level of the RF power, a flow rate of a processing gas supplied to the chamber, and a pressure inside the chamber.

[0122] (Supplementary Note 17) A storage medium storing the program according to any one of Supplementary Note 6 to Supplementary Note 10.

[0123] (Supplementary Note 18) A method performed in a plasma processing apparatus, the plasma processing apparatus comprising: a chamber; a gas supply unit configured to supply a processing gas into the chamber; an RF power supply configured to generate RF power to generate plasma from the processing gas supplied into the chamber; and a controller configured to control the gas supply unit and the RF power supply, the controller comprising a memory unit and a processing unit; the method comprising: (a) storing a first rule including a first change rule and a second change rule in the memory unit; (b) obtaining a first recipe for performing a first plasma processing step, the first recipe including a first set power level of the RF power and a first set flow rate of the processing gas; and (c) obtaining a second recipe for performing a second plasma processing step, the second recipe including a second set power level of the RF power and a second set flow rate of the processing gas. (d) generating a transition recipe for executing a transition process between the first plasma processing process and the second plasma processing process, the transition recipe including a plurality of transition flow rates that change from the first set flow rate to the second set flow rate according to the first change rule, and a plurality of transition power levels that change from the first set power level to the second set power level according to the second change rule; (e) changing the first recipe over time in accordance with an operation time of the RF power supply, the step including changing the first set power level and the first set flow rate over time; (f) changing the second recipe over time in accordance with an operation time of the RF power supply, the step including changing the second set power level and the second set flow rate over time;(g) modifying the transition recipe according to the modified first recipe and the modified second recipe, the modified transition recipe including a plurality of modified transition flow rates that change from the modified first set flow rate toward the modified second set flow rate according to the first modification rule, and a plurality of modified transition power levels that change from the modified first set power level toward the modified second set power level according to the second modification rule.

[0124] (Supplementary Note 19) A plasma processing system including: the plasma processing apparatus according to any one of Supplementary Note 1 to Supplementary Note 5 and Supplementary Note 11 to Supplementary Note 16; and a rule creation device including a rule creation unit that creates the first rule and a transmission unit that transmits the first rule to the plasma processing apparatus.

[0125] (Supplementary Note 20) A plasma processing apparatus comprising: a chamber; a gas supply unit configured to supply a processing gas into the chamber; an RF power supply configured to generate RF power to generate plasma from the processing gas supplied into the chamber; and a controller configured to control the gas supply unit and the RF power supply, wherein the controller includes a processing unit and a storage unit, and the storage unit is configured to store: a first rule used to generate a transition recipe for performing a transition process between a first plasma processing process and a second plasma processing process; and a second rule used to change values ​​of setting parameters for performing the first plasma processing process and values ​​of setting parameters for performing the second plasma processing process according to an operation time of the RF power supply, wherein the processing unit includes: a first recipe acquisition unit configured to acquire a first recipe including values ​​of setting parameters for performing the first plasma processing process; a second recipe acquisition unit configured to acquire a second recipe including values ​​of setting parameters for performing the second plasma processing process; and a rule acquisition unit configured to acquire the first rule from an external device and store it in the storage unit. a transition recipe generation unit configured to generate the transition recipe based on the first rule; a first recipe modification unit configured to modify values ​​of setting parameters included in the first recipe according to the second rule and in accordance with an operation time of the RF power supply; a second recipe modification unit configured to modify values ​​of setting parameters included in the second recipe according to the second rule and in accordance with an operation time of the RF power supply; and a transition recipe modification unit configured to modify the transition recipe based on the first rule, the first recipe modified by the first recipe modification unit, and the second recipe modified by the second recipe modification unit.

[0126] (Supplementary Note 21) The plasma processing apparatus according to Supplementary Note 20, wherein the setting parameter is at least one of the magnitude of the RF power, the flow rate of the processing gas, and the pressure inside the chamber.

[0127] (Supplementary Note 22) A program for controlling a plasma processing apparatus, the plasma processing apparatus comprising: a chamber; a gas supply unit configured to supply a processing gas into the chamber; an RF power supply configured to generate RF power to generate plasma from the processing gas supplied into the chamber; and a control unit configured to control the gas supply unit and the RF power supply, the control unit including a processing unit and a storage unit, the storage unit being configured to store: a first rule for generating a transition recipe for executing a transition step between a first plasma processing step and a second plasma processing step; and a second rule for changing values ​​of setting parameters for executing the first plasma processing step and values ​​of setting parameters for executing the second plasma processing step according to an operation time of the RF power supply, the program causing the processing unit to a transition recipe generation procedure that generates the transition recipe based on the first rule; a first recipe change procedure that changes values ​​of setting parameters included in the first recipe according to an operation time of the RF power supply based on the second rule; a second recipe change procedure that changes values ​​of setting parameters included in the second recipe according to an operation time of the RF power supply based on the second rule; and a transition recipe change procedure that changes the transition recipe based on the first rule, the first recipe changed by the first recipe change procedure, and the second recipe changed by the second recipe change procedure.

[0128] (Supplementary Note 23) A rule creation device and a plasma processing device include: a rule creation unit that creates a first rule used to generate a transition recipe for performing a transition process between a first plasma processing process and a second plasma processing process; and a transmission unit that transmits the first rule to the plasma processing device; and the plasma processing device includes: a chamber; a gas supply unit configured to supply a processing gas into the chamber; an RF power supply configured to generate RF power to generate plasma from the processing gas supplied into the chamber; and a control unit that controls the gas supply unit and the RF power supply, and the control unit includes a processing unit and a storage unit, and the storage unit is configured to store the first rule and a second rule for changing values ​​of setting parameters for performing the first plasma processing process and values ​​of setting parameters for performing the second plasma processing process according to an operation time of the RF power supply, and the processing unit includes: a first recipe acquisition unit configured to acquire a first recipe including values ​​of setting parameters for performing the first plasma processing process; a second recipe acquisition unit configured to acquire a second recipe including values ​​of setting parameters for performing the second plasma processing step; a rule acquisition unit configured to acquire the first rule from the rule creation device and store the first rule in the storage unit; a transition recipe generation unit configured to generate the transition recipe based on the first rule; a first recipe modification unit configured to change values ​​of setting parameters included in the first recipe according to the second rule, in accordance with an operation time of the RF power supply; a second recipe modification unit configured to change values ​​of setting parameters included in the second recipe according to the operation time of the RF power supply, in accordance with the second rule; and a transition recipe modification unit configured to modify the transition recipe based on the first rule, the first recipe modified by the first recipe modification unit, and the second recipe modified by the second recipe modification unit.

[0129] The above embodiments are described for the purpose of explanation and are not intended to limit the scope of the present disclosure. Various modifications can be made to the above embodiments without departing from the scope and spirit of the present disclosure. For example, some components in one embodiment can be added to other embodiments. Also, some components in one embodiment can be replaced with corresponding components in other embodiments.

[0130] W...substrate, 1...plasma processing system, 2...creation device, 2...storage unit, 200...rule, 201...set recipe, 21...processing unit, 210...creation unit, 211...transmission unit, 22...user interface, 23...communication unit, 3...plasma processing device, 310...plasma processing chamber, 310a...side wall, 310e...gas exhaust port, 310s...plasma processing space, 311...substrate support unit, 3111...main body unit, 313...shower head, 320...gas supply unit, 330...power supply , 331...RF power supply, 332...DC power supply, 340...exhaust system, 4...network, 5...controller, 5a...computer, 5a1...processor, 5a10...acquisition unit, 5a11...generation unit, 5a12...change unit, 5a13...recipe execution unit, 5a2...storage unit, 5a20...rule, 5a21...set recipe, 5a22...transition recipe, 5a23...changed set recipe, 5a24...changed transition recipe, 5a25...program, 5a3...communication unit, 5a4...user interface

Claims

1. An apparatus comprising: a chamber; a gas supply unit configured to supply a process gas into the chamber; an RF power source configured to generate RF power to generate plasma from the process gas supplied into the chamber; and a controller configured to control the gas supply unit and the RF power source, wherein the controller includes a memory unit and a processor, wherein the memory unit is configured to store a first rule, the first rule including a first change rule and a second change rule, and the processor is: a first recipe acquisition unit configured to acquire a first recipe for performing a first plasma processing step, the first recipe including a first set power level of the RF power and a first set flow rate of the process gas; and a second recipe acquisition unit configured to acquire a second recipe for performing a second plasma processing step, the second recipe including a second set power level of the RF power and a second set flow rate of the process gas. a transition recipe generation unit that generates a transition recipe for executing a transition process between the first plasma processing process and the second plasma processing process, the transition recipe including a plurality of transition flow rates that change from the first set flow rate to the second set flow rate according to the first change rule, and a plurality of transition power levels that change from the first set power level to the second set power level according to the second change rule; a first recipe modification unit that modifies the first recipe over time in accordance with an operation time of the RF power supply, the first recipe modification unit including changing the first set power level and the first set flow rate over time; a second recipe modification unit that modifies the second recipe over time in accordance with an operation time of the RF power supply, the second recipe modification unit including changing the second set power level and the second set flow rate over time;a transition recipe modification unit that modifies the transition recipe in accordance with the modified first recipe and the modified second recipe, the modified transition recipe including a plurality of modified transition flow rates that change from the modified first set flow rate toward the modified second set flow rate in accordance with the first modification rule, and a plurality of modified transition power levels that change from the modified first set power level toward the modified second set power level in accordance with the second modification rule.

2. The plasma processing apparatus according to claim 1, wherein the control unit further comprises a rule acquisition unit configured to acquire the first rule from an external device via a network and store the first rule in the memory unit.

3. A plasma processing apparatus as described in claim 2, wherein the first recipe acquisition unit is configured to acquire the first recipe from the external device via the network and store it in the memory unit, and the second recipe acquisition unit is configured to acquire the second recipe from the external device via the network and store it in the memory unit.

4. The plasma processing apparatus of claim 1, wherein the memory unit is further configured to store a second rule, the first recipe modification unit changes the first set power level and the first set flow rate over time based on the second rule, and the second recipe modification unit changes the second set power level and the second set flow rate over time based on the second rule.

5. The plasma processing apparatus according to claim 4, wherein the control unit further comprises a rule acquisition unit configured to acquire the first rule and the second rule from an external device via a network and store them in the memory unit.

6. A program for controlling a plasma processing apparatus, the plasma processing apparatus comprising: a chamber; a gas supply unit configured to supply a processing gas into the chamber; an RF power source configured to generate RF power to generate plasma from the processing gas supplied into the chamber; and a control unit configured to control the gas supply unit and the RF power source and comprising a memory unit and a processing unit, the program causing the processing unit of the control unit to perform the following steps: (a) cause the processing unit to store a first rule including a first change rule and a second change rule in the memory unit; (b) obtain a first recipe for performing a first plasma processing step, the first recipe including a first set power level of the RF power and a first set flow rate of the processing gas; and (c) obtain a second recipe for performing a second plasma processing step, the second recipe including a second set power level of the RF power and a second set flow rate of the processing gas. (d) creating a transition recipe for executing a transition step between the first plasma processing step and the second plasma processing step, the transition recipe including a plurality of transition flow rates that change from the first set flow rate to the second set flow rate according to the first change rule, and a plurality of transition power levels that change from the first set power level to the second set power level according to the second change rule; (e) changing the first recipe over time in accordance with an operation time of the RF power supply, the procedure including changing the first set power level and the first set flow rate over time; (f) changing the second recipe over time in accordance with an operation time of the RF power supply, the procedure including changing the second set power level and the second set flow rate over time;(g) changing the transition recipe according to the changed first recipe and the changed second recipe, the changed transition recipe including a plurality of changed transition flow rates that change from the changed first set flow rate to the changed second set flow rate in accordance with the first change rule, and a plurality of changed transition power levels that change from the changed first set power level to the changed second set power level in accordance with the second change rule.

7. The program according to claim 6, wherein (a) includes obtaining the first rule from an external device via a network and storing the first rule in the storage unit.

8. The program described in claim 7, wherein (b) includes obtaining the first recipe from the external device via the network and storing it in the memory unit, and (c) includes obtaining the second recipe from the external device via the network and storing it in the memory unit.

9. The program of claim 6, wherein (a) includes storing a second rule in the memory unit, (e) includes changing the first set power level and the first set flow rate over time based on the second rule, and (f) includes changing the second set power level and the second set flow rate over time based on the second rule.

10. The program according to claim 9, wherein (a) includes obtaining the first rule and the second rule from an external device via a network and storing them in the memory unit.

11. A plasma processing apparatus comprising: a chamber; an RF power supply configured to generate RF power to generate a plasma in the chamber; and a controller, wherein the controller includes a memory unit and a processor, wherein the memory unit is configured to store a first rule, and the processor includes: a first recipe acquisition unit for acquiring a first recipe for performing a first plasma processing step, the first recipe including a first setting level of a setting parameter; a second recipe acquisition unit for acquiring a second recipe for performing a second plasma processing step, the second recipe including a second setting level of the setting parameter; and a transition recipe generation unit for generating a transition recipe for performing a transition step between the first plasma processing step and the second plasma processing step, the transition recipe including a plurality of transition setting levels that change from the first setting level to the second setting level according to the first rule.

1. A plasma processing apparatus comprising: a first recipe modification unit that modifies the first recipe over time in accordance with an operation time of the RF power supply, the first recipe modification unit including changing the first setting level over time; a second recipe modification unit that modifies the second recipe over time in accordance with an operation time of the RF power supply, the second recipe modification unit including changing the second setting level over time; and a transition recipe modification unit that modifies the transition recipe in accordance with the modified first recipe and the modified second recipe, the modified transition recipe including a plurality of modified transition setting levels that change from the modified first setting level to the modified second setting level according to the first rule.

12. The plasma processing apparatus according to claim 11, wherein the control unit further comprises a rule acquisition unit configured to acquire the first rule from an external device via a network and store the first rule in the storage unit.

13. The plasma processing apparatus according to claim 12, wherein the first recipe acquisition unit is configured to acquire the first recipe from the external device via the network and store it in the memory unit.

14. The plasma processing apparatus of claim 11, wherein the memory unit is further configured to store a second rule, the first recipe modification unit modifies the first setting level over time based on the second rule, and the second recipe modification unit modifies the second setting level over time based on the second rule.

15. The plasma processing apparatus according to claim 14, wherein the control unit further comprises a rule acquisition unit configured to acquire the first rule and the second rule from an external device via a network and store them in the memory unit.

16. The plasma processing apparatus according to claim 11, wherein the setting parameters are at least one of a power level of the RF power, a flow rate of a process gas supplied to the chamber, and a pressure within the chamber.

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