Reaction device

Abstract

Provided is a reaction device that can be prevented from becoming unable to operate normally, even when a reaction vessel deforms due to thermal expansion or thermal contraction. A reaction device (10) is provided with: a cylindrical reaction vessel including an intermediate part between a supply part and a delivery part; a plurality of heating parts disposed around a long axis of the reaction vessel so as to surround the intermediate part; a temperature control part for individually controlling temperatures of the plurality of heating parts; the supply part for supplying a treatment object to the reaction vessel; a delivery part for delivering a product from the reaction vessel; a transport mechanism for transporting the treatment object from the supply part side of the reaction vessel through the intermediate part to the delivery part side of the reaction vessel; a fluid supply port and a fluid discharge port communicating with a space between the plurality of heating parts and the reaction vessel; and a fluid supply part for supplying a fluid through the fluid supply port to the space so that the fluid passes through the space and is discharged through the fluid discharge port.

Description

Reactor

[0001] The present invention relates to a reactor.

[0002] There are reactors that produce desired products by providing a predetermined atmosphere to powdered or granular materials to be processed. For example, a reactor commonly known as a rotary kiln heats a hollow reaction vessel that rotates around a central axis and passes the material through the reaction vessel while rolling it, thereby producing the desired product. Another reactor known as a roller hearth kiln produces the desired product by passing the material or workpiece through a tunnel-shaped reaction vessel. Various other reactors have also been developed.

[0003] For example, Patent Document 1 discloses the following reactor. The reactor includes a screw feeder body serving as a pressure reactor, a catalyst supply section for introducing a catalyst into the screw feeder body, and a lower hydrocarbon supply section for introducing lower hydrocarbons into the screw feeder body. The reactor also includes a screw for transporting the generated nanocarbon, a solid delivery section for delivering the catalyst and nanocarbon transported by the screw, and a gas delivery section for delivering the generated hydrogen out of the feeder body.

[0004] Japanese Patent Application Laid-Open No. 2006-290682

[0005] However, in such a reaction apparatus, when the temperature of the reaction vessel is changed, the reaction vessel, the transport mechanism, etc. are deformed due to thermal expansion or thermal contraction, which hinders normal operation of the reaction apparatus.

[0006] Other objects and novel features will become apparent from the description of this specification and the accompanying drawings.

[0007] A reaction apparatus according to one embodiment includes a cylindrical reaction vessel including an intermediate section between a supply section and a discharge section, a plurality of heating sections arranged around the longitudinal axis of the reaction vessel so as to surround the intermediate section, a temperature control section which individually controls the temperatures of the plurality of heating sections, the supply section which supplies a material to be treated to the reaction vessel, the discharge section which discharges a product from the reaction vessel, a transport mechanism which transports the material to be treated from the supply section side of the reaction vessel through the intermediate section to the discharge section side of the reaction vessel, a fluid supply port and a fluid discharge port which communicate with the space between the plurality of heating sections and the reaction vessel, and a fluid supply section which supplies a fluid which is supplied from the fluid supply port to the space, passes through the space, and is discharged from the fluid discharge port.

[0008] According to the present disclosure, a reaction apparatus can be provided that can prevent a reaction vessel, a transport mechanism, etc. from being unable to operate normally due to deformation caused by thermal expansion or thermal contraction.

[0009] 1 is a side view of a reaction apparatus according to a first embodiment; FIG. 2 is a block diagram of a reaction apparatus according to a first embodiment; FIG. 3 is a flow chart of a process executed by a reaction apparatus; FIG. 4 is a side view of a reaction apparatus according to a second embodiment; １００ 1 is a diagram showing a specific example 1 in which the other end A2 of the reaction vessel 100 is supported in a state in which it can move in the long axis AX of the reaction vessel 100. １００ 1 is a diagram showing a second example of a reaction vessel 100 that is supported in a state that it can move in the direction of the long axis AX of the reaction vessel 100. １００ 5A is a diagram showing a specific example 3 in which the reaction vessel 100 is supported in a state in which it can move in the direction of the arrow AR2. FIG. 5B is a diagram showing a specific example 3 in which the reaction vessel 100 is supported in a state in which it can rotate in the direction of the arrow AR2. １００ In addition to the direction, the rotation axis AX Ｖ 1 is a schematic diagram of a fourth embodiment in which the reaction vessel 100 is supported in a state in which it can rotate about a longitudinal axis AX of the reaction vessel 100. １００ In addition to the direction, the rotation axis AX Ｖ10 is a schematic diagram of specific example 5 in which the reaction vessel 100 is supported in a state in which it can rotate about a vertical axis (vertical axis) and move in the minor axis direction (see arrow AR6 in FIG. 10 ). It is a diagram showing a state in which the reaction vessel 100 is twisted. It is a diagram showing a state in which the reaction vessel 100 is tilted. It is a diagram showing a state in which twisting of the reaction vessel 100 is suppressed. It is a diagram showing a state in which tilting of the reaction vessel 100 is suppressed. It is a perspective view of the furnace body (temperature control region 110). It is a diagram showing the relationship between the reaction vessel 100 and the furnace body (temperature control region 110). It is a block diagram showing the electrical connection relationship between heating units H1 to H4 and the temperature control unit 202. It is an example of a deformation pattern of the reaction vessel 100. It is another example of a deformation pattern of the reaction vessel 100. It is a diagram for explaining issues when controlling the temperature of the reaction vessel 100 (temperature increase control or temperature decrease control). It is a cross-sectional view (schematic diagram) taken along line XVII-XVII of FIG. 13. It is a cross-sectional view (schematic diagram) corresponding to the cross-section XVII-XVII of FIG. 13. 20 is a cross-sectional view (schematic diagram) corresponding to the XVII-XVII cross section of Fig. 13. FIG. 21 is a cross-sectional view (schematic diagram) corresponding to the XVII-XVII cross section of Fig. 13. FIG. 22 is a cross-sectional view (schematic diagram) corresponding to the XVII-XVII cross section of Fig. 13. FIG. 23 is an example in which the configuration shown in Fig. 17 and the configuration shown in Fig. 20 are combined.

[0010] The present invention will be described below through embodiments of the invention, but the invention according to the claims is not limited to the following embodiments. Furthermore, not all of the configurations described in the embodiments are necessarily essential means for solving the problems. For clarity of explanation, the following description and drawings have been omitted and simplified as appropriate. In each drawing, the same elements are assigned the same reference numerals, and duplicate explanations are omitted as necessary.

[0011] <Reference Example 1> The main configuration of a reaction apparatus according to Reference Example 1 will be described with reference to Fig. 1. Fig. 1 is a side view of a reaction apparatus 10 according to Reference Example 1. The reaction apparatus 10 shown in the figure is shown in a partially cutaway state for ease of understanding.

[0012] The reaction apparatus 10 is an apparatus for producing a product by applying conditions such as a predetermined physical stimulus to, for example, a powder or granular material to be treated. The reaction apparatus 10 includes a cylindrical reaction vessel 100 (reactor), a supply section (supply port 101) for supplying the material to be treated R10 to the reaction vessel 100, a delivery section (delivery port 102) for delivering the product from the reaction vessel 100, a transport mechanism 120 (e.g., a screw) for transporting the material to be treated R10 supplied to the reaction vessel 100 from the supply section of the reaction vessel 100 to the delivery section of the reaction vessel 100, a fluid supply section (a first fluid inlet 131, a first fluid outlet 132, a first valve 134, etc.) for supplying a fluid that comes into contact with the transported material to the reaction vessel 100, and a temperature control section (a temperature control section) for controlling the temperature of the reaction vessel 100 along the longitudinal axis AX of the reaction vessel 100. １００ The temperature control section (temperature control area 110, etc.) is provided to control each of the areas in different directions.

[0013] The physical stimulus is not particularly limited as long as it is a means used in the process of changing a processed material into a product. The physical stimulus is, for example, a temperature change such as heating or cooling. The physical stimulus is, for example, a stress transmission such as stirring, mixing, kneading, or pulverization. The physical stimulus is, for example, a reaction involving the exchange of electrons or radicals.

[0014] In the reaction apparatus 10, the material to be treated R10 supplied to the reaction vessel 100 is heated while being transported by the transport mechanism 120 to the outlet side of the reaction vessel 100, and a predetermined fluid that comes into contact with the transported material to be treated R10 is supplied into the reaction vessel 100, thereby continuously treating the material to be treated R10 (the material to be treated) at a predetermined temperature. The material to be treated may be a solid, a fluid, or a mixture of both. Note that in order to agitate the material to be treated while transporting it, the reaction vessel 100 itself may be rotatable, or a transport mechanism 120 having a rotatable structure may be provided within the reaction vessel 100.

[0015] The type and state of the processed material or product are not particularly limited, and may be an inorganic material such as a metal oxide or metal sulfide containing lithium as one of its components, or an organic material such as a hydrocarbon or food. The processed material may be a solid such as a powder or granular material, or a fluid such as a liquid or gas.

[0016] The processed material may pass through an intermediate in the process of changing into the product. The form or state of the intermediate is not particularly limited. The intermediate may be, for example, the product of each reaction when two or more reactions are carried out in stages. In this case, the intermediate is, for example, an anhydrous compound produced by heating a hydrated compound. Alternatively, the intermediate may be a monosaccharide produced by hydrolysis of a polysaccharide. The intermediate may be a fired product in which at least a portion of the processed material has grown into particles or been sintered. The intermediate may be in a state in which at least a portion of the processed material has been liquefied or vaporized. The intermediate may be in a state in which the temperature, hardness, etc. of the processed material has changed, although it appears unchanged. The intermediate may also be in a form or state other than those described above.

[0017] The type and state of the product are not particularly limited, and the product may be a solid such as a powder or a particulate material, or a fluid such as a liquid or gas. The product may also be a mixture containing components other than the processed material, such as a catalyst or a transport auxiliary member. The product may also be a mixture containing two or more compounds, such as a main product and a by-product.

[0018] The shape and size of the processed material or product are not particularly limited, but when the processed material or product is powder or granular, the particle diameter is preferably 50 mm or less, more preferably 0.005 to 20 mm. Furthermore, when the processed material or product is in the form of a block, the ratio of the diagonal lengths (aspect ratio) is preferably 1 to 10, more preferably 1.3 to 1.8.

[0019] The reaction device 10 mainly comprises a reaction vessel 100, a temperature control area 110, a transport mechanism 120, a first fluid control area 130, and a second fluid control area 140.

[0020] The reaction vessel 100 is, for example, cylindrical, and has a supply port 101 for receiving the material to be treated and a delivery port 102 for delivering the product. The supply port 101 is an example of a supply unit of the present disclosure. The shape and configuration of the reaction vessel 100 are not particularly limited. For example, the cross-sectional shape of the reaction vessel 100 may be circular or elliptical, or may be polygonal such as a square, or may be any other shape. For example, the reaction vessel 100 may be composed of a single member, or may be composed of two or more members connected together. When two or more members are connected together, for example, a fastening means such as a bolt may be used at the points where the members are connected.

[0021] The reaction vessel 100 has an intermediate section A3 between the supply port 101 and the delivery port 102. The number and arrangement of the supply ports 101, delivery ports 102, and intermediate section A3 are not particularly limited. For example, two or more supply ports 101 and delivery ports 102 may be provided at each end of the intermediate section A3.

[0022] The supply port 101 may be located in the middle of the reaction vessel 100, and may have an intermediate section A3 and an outlet 102 at both ends of the supply port 101. In this case, the material to be processed R10 may be supplied to the middle of the reaction vessel 100, and the product R11 may be delivered from one end side and the other end side of the reaction vessel 100, respectively. Furthermore, in this case, for example, a screw may be used as the conveying mechanism 120, and the direction of the spiral convex portion (spiral direction) on the screw may be reversed with the supply port 101 as the boundary, so that the material to be processed R10 may be branched and conveyed to one end side and the other end side of the reaction vessel 100, respectively, with the supply port 101 as the boundary. Alternatively, when the discharge port 102 is located in the middle of the reaction vessel 100 and the discharge port 102 is provided with an intermediate section A3 and a supply port 101 at both ends, respectively, a screw may be used as the conveying mechanism 120, and the direction of the spiral convex portion (spiral direction) on the screw may be reversed, for example, at the discharge port 102, so that the product R11 is conveyed so as to be gathered from one end side and the other end side of the reaction vessel 100 at the discharge port 102. In this way, a means for conveying the material R10 to be treated, the product R11, etc. so as to branch or gather the conveying directions is desirable, for example, when a plurality of reaction devices 10 are connected in parallel.

[0023] The reaction vessel 100 is made of a material that can tolerate temperature changes that occur during product production in the furnace and contact with materials (e.g., processed materials) supplied to the furnace and materials (e.g., products) produced. The reaction vessel 100 and the transport mechanism 120 can be made of, for example, alloys, ceramics, carbon, and composites containing two or more of these. Alloys are metal members containing at least one alloying element, such as nickel, cobalt, chromium, molybdenum, tungsten, tantalum, titanium, iron, copper, aluminum, silicon, boron, and carbon. Ceramics include ceramic members such as oxides (e.g., alumina and zirconia), carbides (e.g., silicon carbide and titanium carbide), nitrides (e.g., silicon nitride and titanium nitride), and borides (e.g., chromium boride), as well as glass materials having at least a partial amorphous structure. Carbon is a carbon member such as crystalline graphite or fiber-reinforced graphite.

[0024] The reaction apparatus 10 shown in FIG. 1 is horizontally laid, and has a supply port 101 at the upper left end and an outlet port 102 at the lower right end. The reaction vessel 100 shown in FIG. 1 receives a material R10 to be treated through the supply port 101. The reaction apparatus 10 transports the material R10 received in the reaction vessel 100 from the supply port 101 (A1) of the reaction vessel 100 through an intermediate section A3 to an outlet port 102 (A2) of the reaction vessel 100 using a transport mechanism 120 provided inside the reaction vessel 100. The reaction apparatus 10 produces a product R11 from the material R10 to be treated by passing the material R10 through the intermediate section A3 of the reaction vessel 100. The reaction vessel 100 then outputs the produced product R11 through the outlet port 102.

[0025] The temperature control region 110 includes a temperature control device, i.e., a heating device or a cooling device, and controls the temperature of the reaction vessel at a predetermined position in the intermediate region A3 between the supply port 101 and the discharge port 102. The temperature control region 110 is an example of a temperature control unit disclosed herein. The temperature control region 110 shown in FIG. 1 has a heating device surrounding the cylindrical reaction vessel 100 in the intermediate region A3 of the reaction vessel 100. The heating device includes any temperature-controllable heater, such as a sheath heater, coil heater, or ceramic heater. The heating device heats the reaction vessel 100 at a temperature ranging from room temperature to approximately 1000 degrees Celsius. The temperature control region 110 may be configured to surround the cylindrical reaction vessel 100 in the intermediate region A3 of the reaction vessel 100 using multiple heating devices. This allows different temperatures to be set individually in the upper, lower, left, and right regions around the reaction vessel 100, for example. Furthermore, the temperature of the intermediate region A3 can be controlled in different regions along the minor axis of the reaction vessel 100. The temperature control area 110 is arranged in each area of ​​the intermediate portion A3 of the reaction vessel 100, and is connected to the axis AX of the transport mechanism 120 (to be described later). １２０ For example, the temperature control region 110 can control the temperature change applied to the object to be treated R10 in the first fluid control region 130 and the second fluid control region 140 described below.

[0026] The temperature control area 110 may also include a control device for controlling a heating device or a cooling device. For example, the temperature control area 110 may have a thermometer for monitoring the temperature at a predetermined position in the reaction vessel 100. Furthermore, in the case where the heating device has a principle of heating by passing an electric current through it, the temperature of the reaction vessel 100 may be controlled by monitoring the electric current value.

[0027] The temperature control area 110 may be configured to perform heating or cooling by circulating water or oil, for example. The temperature control area 110 may also be configured to perform cooling by using a Peltier element, for example. With the above-mentioned configuration, the temperature control area 110 is configured to perform heating or cooling by circulating water or oil, for example, by using a Peltier element, for example. １２０ Various temperature distributions can be set along the direction.

[0028] As described above, the temperature control area 110 controls the temperature of the reaction vessel 100 (for example, the middle part A3) along the major axis AX of the reaction vessel 100. １００ It is possible to control each of the different regions in the direction.

[0029] The conveying mechanism 120 conveys the material to be treated R10 supplied from the supply port 101 toward the discharge port 102 by extending, for example, from one end side A1 to the other end side A2 of the reaction vessel 100. The shape and conveying method of the conveying mechanism 120 of the present disclosure are not limited as long as it is capable of conveying raw materials, products, etc. The conveying mechanism 120 may be a screw provided inside the reaction vessel 100 so as to extend from one end side to the other end side of the reaction vessel 100. The conveying mechanism 120 may be a drum provided inside the reaction vessel 100 so as to extend from one end side to the other end side of the reaction vessel 100. The conveying mechanism 120 may be a belt conveyor provided inside the reaction vessel 100 so as to extend from one end side to the other end side of the reaction vessel 100. The conveying mechanism 120 may be a blower provided inside the reaction vessel 100. The conveying mechanism 120 may be a vibration generator provided inside the reaction vessel 100. The transport mechanism 120 may be other than the above.

[0030] The size of the transport mechanism 120 is not particularly limited, and may be shorter than the overall length of the reaction vessel 100. The material from which the transport mechanism 120 is made is not particularly limited, but like the reaction vessel 100, the transport mechanism 120 is desirably made of a material that can tolerate temperature changes that occur during the production of a product and contact with substances (such as processed materials) supplied into the vessel and substances (such as products) produced. The transport mechanism may be made of, for example, an alloy, ceramics, carbon, or a composite material containing two or more of these materials.

[0031] 1 is an example of a screw conveying mechanism 120, in which a spiral convex portion 121 is formed around a main axis extending in the longitudinal direction of the reaction vessel 100. This convex portion 121 rotates while in contact with the material to be processed R10, so that the conveying mechanism 120 conveys the material to be processed R10 from the supply port side to the delivery port side.

[0032] The shape of the convex portion 121 shown in FIG. 1 is an example, and the shape of the convex portion 121 is not limited to this. The convex portion 121 may have different shapes in different regions of the reaction vessel 100. More specifically, for example, the helical pitch of the convex portion 121 may vary. The helical shape of the convex portion 121 may be two-stranded instead of one-stranded. The convex portion 121 may also have a portion that is not helical. The convex portion 121 may be provided in a direction such that the apex of the convex portion forms an angle of 90 degrees with respect to the longitudinal axis direction of the screw. Furthermore, the convex portion 121 may extend in a direction that forms an angle of 0 degrees with respect to the longitudinal axis direction of the screw. This allows the reaction apparatus 10 to set the movement speed and movement behavior of objects present inside the reaction vessel 100 for each region. More specifically, for example, the reaction apparatus 10 transports, stirs, mixes, retains, kneads, or pulverizes objects in the reaction vessel 100.

[0033] The transport mechanism 120 is supported on both ends (one end side A1, the other end side A2) of the reaction vessel 100. The transport mechanism 120 illustrated in FIG. 1 is a screw, and is connected (coupled) to a drive device 150 at one end side B1. The drive device 150 is an example of a drive device for the transport mechanism 120 in the present disclosure. The drive device 150 includes a motor 151 provided at one end side of the reaction vessel 100 and a reducer 152 provided between the motor 151 and one end side A1 of the reaction vessel 100. The reducer 152 includes an input shaft coupled to the rotating shaft of the motor 151 and an output shaft coupled to one end side B1 of the transport mechanism 120, and reduces the rotation of the rotating shaft of the motor 151 before transmitting it to the transport mechanism 120, thereby rotating the transport mechanism 120. The drive device 150 may be configured to be able to change the rotation speed of the transport mechanism 120. In this case, the driving device 150 may be a motor with a variable rotation speed, or may be a combination of a motor with a fixed rotation speed and a reducer with a variable reduction ratio.

[0034] First fluid control region 130 includes first fluid inlet 131 and first fluid outlet 132 for passing a first fluid through reaction vessel 100 in a predetermined region in intermediate section A3. First fluid control region 130 is provided in reaction vessel 100 between supply port 101 and second fluid control region 140. First fluid inlet 131 is connected to first fluid supply pipe 133 and supplies the first fluid supplied from first fluid supply pipe 133 to reaction vessel 100. First fluid supply pipe 133 includes first valve 134 for adjusting the flow rate of the first fluid. First fluid supply pipe 133 may also supply the first fluid to reaction vessel 100 intermittently in a time-controlled manner by opening and closing first valve 134. First fluid outlet 132, connected to first fluid discharge pipe 135, is a hole for discharging the fluid in first fluid control region 130 out of reaction vessel 100. The first fluid discharge pipe 135 may be equipped with a valve or discharge mechanism for adjusting the flow rate or flow velocity of the fluid discharged from the reaction vessel 100. The discharge mechanism is, for example, a suction mechanism such as a pump or an ejector utilizing the Venturi effect. Note that multiple first fluid inlets 131 and multiple first fluid outlets 132 may be provided. In the first fluid control region 130, the locations at which the first fluid inlets 131 and the first fluid outlets 132 are provided are not particularly limited, and they may be provided at the top, bottom, or side of the reaction vessel 100. Alternatively, the first fluid inlet 131 may be provided at the bottom of the reaction vessel 100 and the first fluid outlet 132 at the top of the reaction vessel 100, thereby generating an airflow in a predetermined direction within the reaction vessel. This facilitates contact of the first fluid with the treatment object, thereby enabling the treatment object to react favorably. Furthermore, by making the inner diameter of the first fluid inlet 131 smaller than the inner diameter of the first fluid supply pipe 133, the first fluid may be vaporized when it is supplied to the reaction vessel 100. In this way, the temperature of the atmosphere surrounding the object to be treated can be adjusted by the heat of vaporization, and the reaction of the object to be treated can be suitably controlled.

[0035] With the above-described configuration, the reaction apparatus 10 converts the treatment product R10 into an intermediate by contacting the treatment product R10 with the first fluid in the first fluid control region 130. The reaction apparatus 10 also discharges the fluid after contacting the treatment product R10 to the outside of the first fluid control region 130. The reaction apparatus 10 transports the treatment product R10 or the intermediate while the transport mechanism 120 rotates, and then contacts the first fluid, thereby promoting a reaction by the first fluid. The form and composition of the first fluid are not limited as long as it has fluidity. The first fluid may be a gas or a liquid. The first fluid may be a dispersion liquid in which a solid is dispersed in a liquid. Furthermore, by supplying the first fluid to the reaction apparatus 10, the temperature of the reaction vessel 100 and the transport mechanism 120 can be partially controlled. Therefore, the reaction apparatus 10 can efficiently control the temperature of the treatment product R10 and efficiently convert the treatment product R10 into an intermediate. Before supplying the first fluid to the reaction vessel 100, a mechanism for adjusting the temperature and pressure of the first fluid may be provided.

[0036] Second fluid control region 140 includes second fluid inlet 141 and second fluid outlet 142 for passing the second fluid in a region in intermediate portion A3 that is different from first fluid control region 130. In other words, second fluid control region 140 can have a configuration equivalent to that of first fluid control region 130 in a region that is different from first fluid control region 130.

[0037] The second fluid control region 140 is provided in the reaction vessel 100 between the first fluid control region 130 and the delivery port 102. The second fluid inlet 141 is connected to a second fluid supply pipe 143 and supplies the second fluid supplied from the second fluid supply pipe 143 to the reaction vessel 100. The second fluid supply pipe 143 includes a second valve 144 for adjusting the flow rate of the second fluid. The second fluid supply pipe 143 may supply the second fluid to the reaction vessel 100 while controlling the time timing of supplying the second fluid to the reaction vessel 100 to be an intermittent interval by opening and closing the second valve 144. The second fluid outlet 142 connected to the second fluid discharge pipe 145 is a hole for discharging the fluid in the second fluid control region 140 to the outside of the reaction vessel 100. The second fluid discharge pipe 145 may be equipped with a valve or discharge mechanism for adjusting the flow rate or flow velocity of the fluid discharged from the reaction vessel 100. The discharge mechanism is, for example, a suction mechanism such as a pump or an ejector. The first fluid inlet 131, the first fluid outlet 132, and the first valve 134 are an example of a fluid supply unit of the present disclosure.

[0038] With the above-described configuration, the reaction device 10 contacts the intermediate that has passed through the first fluid control region 130 with the second fluid in the second fluid control region 140 to produce the product R11. The reaction device 10 also discharges the fluid that has contacted the intermediate to the outside of the second fluid control region 140. The second fluid may be in any form or composition as long as it has fluidity. The second fluid may be a gas or a liquid. The second fluid may be a dispersion in which a solid is dispersed in a liquid. Furthermore, by supplying the second fluid to the reaction device 10, the temperature of the reaction vessel 100 and the transport mechanism 120 can be partially controlled. Therefore, the reaction device 10 can efficiently control the temperature of the intermediate, and efficiently convert the intermediate into the product R11.

[0039] The configuration of the reaction apparatus 10 has been described above, but the reaction apparatus 10 according to Reference Example 1 is not limited to the above configuration. For example, the number of transport mechanisms 120 may be one or more, or two or more. That is, the reaction apparatus 10 may have a plurality of transport mechanisms 120 arranged in parallel.

[0040] The cross-sectional shape of the reaction vessel 100 in a plane perpendicular to the axis of the transport mechanism 120 may have a combination defined by a Reuleaux constant width figure. In this case, the transport mechanism 120 is preferably a screw, and the cross-sectional shape of the screw convex portion 121 has a shape combining multiple arcs corresponding to the Reuleaux constant width figure. For example, if the cross-sectional shape of the inside of the reaction vessel 100 is circular, the cross-sectional shape of the screw may have a Reuleaux constant width figure composed of three arcs.

[0041] The reaction vessel 100 is not limited to one lying parallel to the horizontal direction, but may be one having a predetermined angle with respect to the horizontal plane, and the reaction vessel 100 may have an inclined surface. The reaction device 10 has the first fluid control region 130 and the second fluid control region 140 in the intermediate section A3, but may also have a configuration for passing another fluid. That is, the reaction device 10 may have three or more fluid control regions. Alternatively, the reaction device 10 may have only the first fluid control region 130 in the intermediate section A3. The reaction device 10 described above is controlled by a control device described later.

[0042] Next, the function of the reaction apparatus 10 will be described with reference to Fig. 2. Fig. 2 is a block diagram of the reaction apparatus 10 according to Reference Example 1. In addition to the configuration shown in Fig. 1, the reaction apparatus 10 has a control device 200, a temperature control device 210, a first fluid control device 230, a second fluid control device 240, and an information input / output device 250 (information input / output unit 250).

[0043] The control device 200 is a circuit board including a computing device such as a CPU (Central Processing Unit) and an MCU (Micro Controller Unit). The control device 200 is communicatively connected to each of the temperature control device 210, the first fluid control device 230, the second fluid control device 240, and the information input / output unit 250, and controls the configuration of each of these. The control device 200 realizes its functions using hardware and software implemented on the circuit board.

[0044] The control device 200 has, as its main functional components, an overall control unit 201, a temperature control unit 202, a transport control unit 203, a first fluid control unit 204, a second fluid control unit 205, an IF control unit 206, and a memory unit 207. These functional components of the control device 200 may be integrated or may be discrete. Furthermore, these functional components of the control device 200 may be realized by the interlocking of multiple separate devices.

[0045] The overall control unit 201 is connected to each functional configuration of the control device 200 and controls the overall operation of these functions. For example, the overall control unit 201 can perform an operation such as issuing an operation instruction to the transport control unit 203 depending on the state of the temperature supplied from the temperature control unit 202.

[0046] The temperature control section 202 is connected to the temperature control device 210 and controls the temperature of the reaction vessel 100 in the temperature control region 110. The temperature control section 202 has at least one of a heating device and a cooling device. The temperature control section 202 may also have one or more thermometers for controlling the temperature.

[0047] The transport control unit 203 is connected to the drive device 150 and controls the operation of the drive device 150. The transport control unit 203 may have, for example, a motor drive circuit for driving a motor (motor 151) included in the drive device 150. The transport control unit 203 may also have a rotation sensor for monitoring the number of rotations of the motor (motor 151).

[0048] The first fluid control section 204 controls the flow of the first fluid in the first fluid control region 130. More specifically, the first fluid control section 204 is connected to the first fluid control device 230 and controls the operation of the first fluid control device 230. The first fluid control device 230 includes a first valve 134 for pumping the first fluid. The second fluid control section 205 controls the flow of the second fluid in the second fluid control region 140. More specifically, the second fluid control section 205 is connected to the second fluid control device 240 and controls the operation of the second fluid control device 240. The second fluid control device 240 includes a second valve 144 for pumping the second fluid.

[0049] The IF control unit 206 (IF = Interface) is connected to the information input / output unit 250 and is an interface for exchanging information with the user via the information input / output unit 250. That is, the IF control unit 206 accepts operations from the user via the information input / output unit 250 and appropriately supplies information related to the accepted operations to each component of the control device 200. The IF control unit 206 also controls the state of a display unit included in the information input / output unit 250.

[0050] The storage unit 207 is a storage device including a non-volatile memory such as a flash memory or an SSD (Solid State Drive). The storage unit 207 stores a program for the reaction device 10 to realize the functions of the present disclosure. The storage unit 207 also includes a volatile memory and temporarily stores predetermined information when the control device 200 operates. The information input / output unit 250 has, for example, a button, a switch, a touch panel, or the like for accepting operations from a user. The information input / output unit 250 also includes a display device or the like for presenting information to the user.

[0051] The above describes the functional blocks of the reaction apparatus 10. With the above-described configuration, the reaction apparatus 10 transports the received treatment object R10 using the transport mechanism 120, controls the temperature of the reaction vessel 100, and controls the atmosphere in the first fluid control region 130 and the second fluid control region 140.

[0052] Next, a method for producing the product R11 (product production method) executed by the reaction apparatus 10 will be described with reference to Fig. 3. Fig. 3 is a flowchart of the process executed by the reaction apparatus 10. The flowchart shown in Fig. 3 starts, for example, by starting the supply of the material to be treated R10 to the reaction apparatus 10.

[0053] First, the reaction device 10 receives a predetermined material to be treated R10 from the supply port 101 (step S11).

[0054] Next, the control device 200 of the reaction device 10 controls the temperature by driving the heating device or the cooling device in the temperature control region 110 of the reaction vessel 100 via the temperature control section 202 (step S12).

[0055] Next, the control device 200 of the reaction device 10 drives the driving device 150 via the transport control unit 203. As a result, the driving device 150 drives the transport mechanism 120. Then, the transport mechanism 120 transports the received material to be processed R10 toward the outlet 102 (step S13).

[0056] Next, the control device 200 of the reaction device 10 controls the flow of the first fluid to be passed through the first fluid control region 130 (first atmosphere control region) via the first fluid control unit 204 (step S14).

[0057] Next, the control device 200 of the reaction device 10 controls the flow of the second fluid to be passed through the second fluid control region 140 (second atmosphere control region) via the second fluid control unit 205 (step S15).

[0058] Next, the reaction device 10 discharges the product R11 that has passed through the second fluid control region 140 from the discharge port 102 (step S16).

[0059] The above has described the reaction method (product production method) executed by the reaction apparatus 10. The above-mentioned method is shown along the flow from the reaction apparatus 10 producing the product R11 from the treated material R10 to discharging the produced product R11. However, the reaction apparatus 10 may perform the temperature control in step S12, for example, before step S11. Furthermore, for example, the reaction apparatus 10 may start steps S14 and S15 simultaneously.

[0060] The above has described Reference Example 1. In the above-described reaction device 10, the reaction device 10 has two fluid control regions (the first fluid control region 130 and the second fluid control region 140), but the reaction device 10 may have one or three or more fluid control regions. In addition, the reaction device 10 has a structure in which the axis AX of the transport mechanism 120 is １２０ The reactor 10 may have a plurality of temperature control regions 110 along the direction (longitudinal direction). The reactor 10 described above brings the object to be treated R10 received from the supply port 101 into contact with a plurality of fluids separately in the intermediate section A3. The reactor 10 also has a plurality of temperature control regions 110 along the axis AX of the transport mechanism 120 in the intermediate section A3. １２０The temperature of the reaction vessel 100 is controlled along the longitudinal direction (longitudinal direction). Furthermore, the reaction device 10 can transport an object inside the reaction vessel 100 and apply a physical stimulus to it. The reaction device 10 can simultaneously and accurately perform the above-mentioned atmosphere control, temperature control, and physical control. Therefore, according to Reference Example 1, a reaction device or the like that efficiently produces a desired product can be provided.

[0061] <Reference Example 2> Next, as Reference Example 2, a configuration example for supporting the reaction vessel 100 and a configuration example for supporting the transport mechanism 120 will be described with reference to Fig. 4. This configuration example can be applied to the above-mentioned Reference Example 2. Fig. 4 is a side view of a reaction apparatus according to Reference Example 2. Fig. 4 corresponds to Fig. 1 in which a first support part 103 and a second support part 104 are added. Other than that, the configuration is the same as Fig. 1. Below, the differences from Reference Example 1 will be mainly described.

[0062] <Example of a configuration for supporting the reaction vessel 100> As shown in Fig. 4, the reaction apparatus 10 includes a first support part 103 and a second support part 104 as a configuration for supporting the reaction vessel 100. The reaction vessel 100 in Fig. 4 is a cylindrical reaction vessel (furnace) including an intermediate part A3 between one end side A1 and the other end side A2, and is supported by the first support part 103 and the second support part 104 installed on a floor surface 170. The floor surface 170 may be the floor surface of a building in which the reaction apparatus 10 is installed, or may be a surface of a part of a structure constituting the reaction apparatus 10, such as the upper surface of a stand.

[0063] The first support part 103 is disposed on a floor surface 170 below one end side A1 of the reaction vessel 100, and supports the one end side A1 of the reaction vessel 100 from below. Specifically, the first support part 103 supports the one end side A1 of the reaction vessel 100 from below. １００The reaction vessel 100 is supported in a state where it cannot move in any direction. This is realized, for example, by fixing one end side A1 of the reaction vessel 100 supported by the first support part 103 to the first support part 103 by a direct fixing means such as a bolt or welding. Alternatively, instead of using a direct fixing means, for example, the reaction vessel 100 may be fixed indirectly by contacting one end side A1 of the reaction vessel 100 supported by the first support part 103 with a member such as a plate or wire material separately fixed to a stand or the like.

[0064] On the other hand, the second support part 104 is disposed on a floor surface 170 below the other end side A2 of the reaction vessel 100, and supports the other end side A2 of the reaction vessel 100 from below. Specifically, the second support part 104 supports the other end side A2 of the reaction vessel 100 from below. １００ This is realized, for example, by specific examples 1 to 3 described later.

[0065] The other end A2 of the reaction vessel 100 is aligned along the longitudinal axis AX of the reaction vessel 100. １００ The technical significance of supporting the device in a state where it can move in the direction is as follows.

[0066] That is, when the temperature of the reaction vessel 100 is controlled by the temperature control device 210 or the like as explained in the above-mentioned Reference Example 1 (for example, when the reaction vessel 100 is heated from room temperature to about 900 degrees), the reaction vessel 100 is rotated along its major axis AX １００ thermal expansion in the direction of the major axis AX １００ In this case, if the other end A2 of the reaction vessel 100 is in the direction of its major axis AX, the reaction vessel 100 will thermally expand by about 10 to 20 mm. １００ When the reaction vessel 100 cannot move in the direction of the long axis AX, １００ Thermal expansion in the direction of the arrows may act on the drive unit 150, causing a force to act on the drive unit 150 and possibly damaging the drive unit 150. For example, the rotation shaft of one or more gears constituting the drive unit 150 (e.g., a reducer) may be deformed, causing the drive unit 150 (e.g., a reducer) to be unable to operate normally. Alternatively, the transport mechanism 120 may be significantly deformed, causing it to be unable to transport normally.

[0067] Therefore, the reaction vessel 100 has a long axis AX １００In order to prevent the driving device 150 from being damaged due to the thermal expansion in the direction of the axis A of the reaction vessel 100, the second support portion 104 supports the other end A2 of the reaction vessel 100 in the direction of the longitudinal axis AX of the reaction vessel 100. １００ The support is supported in a state where it can move in any direction.

[0068] Next, the other end A2 of the reaction vessel 100 is aligned along the long axis AX of the reaction vessel 100. １００ A specific example of supporting the object in a state where it can move in the direction will be described.

[0069] <Specific Example 1> FIG. 5A shows the other end A2 of the reaction vessel 100, which is aligned with the long axis AX of the reaction vessel 100. １００ 5A is a view seen from the direction of arrow AR1 in FIG. 4. FIG.

[0070] As shown in FIG. 5A, in the first specific example, the other end A2 of the reaction vessel 100 is aligned along the long axis AX of the reaction vessel 100. １００ In this example, in order to make the reaction vessel 100 movable in the direction of the longitudinal axis AX of the reaction vessel 100, a flange portion 109 is provided on the other end side A2 of the reaction vessel 100, a recessed portion 109a is formed in the lower portion of the flange portion 109, and a protruding portion 104a that is inserted into the recessed portion 109a is provided on the upper portion of the second support portion 104, and the other end side A2 of the reaction vessel 100 is supported with the protruding portion 104a inserted into the recessed portion 109a. １００ The flange portion 109 extends in the direction perpendicular to the axis of the shaft 101. A gap G1 is formed between the lower surface 109b of the flange portion 109 and the upper surface 104b of the second support portion 104. Lubricating oil or the like may be supplied between the recessed portion 109a and the protruding portion 104a. Conversely, the protruding portion 104a may be provided at the bottom of the flange portion 109, and the recessed portion 109a into which the protruding portion 104a is inserted may be formed at the top of the second support portion 104.

[0071] <Specific Example 2> FIG. 5B shows the other end A2 of the reaction vessel 100, which is aligned with the long axis AX of the reaction vessel 100. １００ 5B is a view seen from the direction of arrow AR1 in FIG. 4. FIG.

[0072] As shown in FIG. 5B, in the second specific example, the other end A2 of the reaction vessel 100 is aligned along the long axis AX of the reaction vessel 100. １００In this example, a flange portion 109 is provided on the other end A2 of the reaction vessel 100 to enable movement in the direction of the reaction vessel 100, and a friction reduction member 111 is provided on the upper surface 104b of the second support portion 104, and the other end A2 of the reaction vessel 100 is supported with the lower surface 109b of the flange portion 109 in contact with the friction reduction member 111. The friction reduction member 111 is not particularly limited in its form, shape, or material as long as it allows smooth movement of the reaction vessel 100. The friction reduction member 111 may be a member having a rotating part, such as a roller or a belt. The friction reduction member 111 may be a member made of a high-hardness material, such as a tool steel that can be subjected to quenching heat treatment, a nitrided steel that can be subjected to nitriding heat treatment, a powder metallurgy material at least partially containing ceramic particles, or a steel material with a coating applied to its surface, in which the surface on which the friction reduction member 111 supports the reaction vessel 100 has a Vickers hardness (HV) of 450 or more or a Rockwell hardness (HRC) of 45 or more. The friction reducing member 111 is made of, for example, diamond-like carbon (DLC), titanium carbide (TiC), titanium carbonitride (TiBN), titanium boride (TiB ２ ), vanadium carbide (VC), alumina (Al ２ O ３ ) and zirconia (ZrO ２ The friction-reducing member 111 may be a member whose surface is coated with a metal such as titanium (Ti) or nickel (Ni-P or Ni-Co-W) by electroplating or electroless plating. The friction-reducing member 111 may be a member whose surface is coated with a compound having solid lubricating properties, such as molybdenum disulfide, by a coating method such as spraying. In other words, the chemical composition of the surface (support surface) of the friction-reducing member 111 that supports the reaction vessel 100 preferably contains at least one of the elements (chemical elements) B, C, N, Al, P, Ti, V, Cr, Co, Ni, Mo, and W.

[0073] <Specific Example 3> FIG. 5C shows the other end A2 of the reaction vessel 100, which is aligned with the long axis AX of the reaction vessel 100. １００ 5C is a view seen from the direction of arrow AR1 in FIG. 4. FIG.

[0074] As shown in FIG. 5C, in the third example, the other end A2 of the reaction vessel 100 is aligned along the long axis AX of the reaction vessel 100. １００ In this example, a flange portion 109 having protruding portions 109c and 109d protruding to both the left and right sides (protruding in a direction intersecting (e.g., perpendicular to) the longitudinal axis of the reaction vessel 100) is provided on the other end A2 of the reaction vessel 100 to enable movement in the longitudinal direction. Standing portions 104c and 104d are provided on the upper surface 104b of the second support portion 104, and the other end A2 of the reaction vessel 100 is supported with the protruding portions 109c and 109d placed on the standing portions 104c and 104d. A gap G2 is formed between the lower surface 109b of the flange portion 109 and the upper surface 104b of the second support portion 104, and gaps G3 and G4 are formed between the left and right sides of the flange portion 109 and the standing portions 104c and 104d. Lubricating oil or the like may be supplied between the protruding portions 109c and 109d and the standing portions 104c and 104d.

[0075] As in the above-mentioned specific examples 1 to 3, the other end A2 of the reaction vessel 100 is aligned with the long axis AX of the reaction vessel 100. １００ By supporting the reaction vessel 100 in a state where it can move in the direction of its long axis AX, １００ This can prevent the drive device 150 from being damaged or otherwise affected by a force acting on the drive device 150 due to thermal expansion (or thermal contraction) in the direction.

[0076] <Example of Configuration for Supporting the Conveying Mechanism 120> As shown in FIG. 4, the reaction apparatus 10 includes bearings 106 and 107 as a configuration for supporting the screw serving as the conveying mechanism 120.

[0077] The bearing 106 is provided at one end A1 of the reaction vessel 100, and rotatably supports one end B1 of the transport mechanism 120. The bearing 106 is, for example, a bearing or a bushing. The one end B1 of the transport mechanism 120 is connected (fixed) to the output shaft of the reducer 152. That is, the one end B1 of the transport mechanism 120 is rotatable and is connected to the axis AX of the transport mechanism 120. １２０ It is supported in a state where it cannot move in any direction.

[0078] On the other hand, the bearing 107 is provided at the other end A2 of the reaction vessel 100, and is capable of rotating the other end B2 of the transport mechanism 120 and is also rotatable about the axis AX of the transport mechanism 120. １２０The bearing 107 is an example of a third support portion and a sixth support portion of the present disclosure. The bearing 107 is, for example, a bearing or a bushing. The other end B2 of the transport mechanism 120 is supported on the axis AX of the transport mechanism 120. １２０ In order to allow the reaction vessel 100 to move in the direction of the arrow B2, the spiral convex portion 121 is not provided in a predetermined range (see the range indicated by the symbol L1 in FIG. 4) on the other end side B2 of the transport mechanism 120. In addition, the axis AX of the transport mechanism 120 is provided between the end of the other end side B2 of the transport mechanism 120 and the lid portion 108 provided on the other end side A2 of the reaction vessel 100. １２０ A space (see the range indicated by the symbol L2 in FIG. 4) is provided for the other end side B2 of the transport mechanism 120 moving in the direction (right side in FIG. 4) to enter.

[0079] The axis AX of the transport mechanism 120 supported as described above １２０ and the major axis AX of the reaction vessel 100 １００ are consistent (almost consistent).

[0080] The other end B2 of the transport mechanism 120 is connected to the axis AX of the transport mechanism 120. １２０ The technical significance of supporting the device in a state where it can move in the direction is as follows.

[0081] That is, when the temperature of the reaction vessel 100 is controlled by the temperature control device 210 or the like as explained in the above-mentioned Reference Example 1 (for example, when the reaction vessel 100 is heated from room temperature to about 900 degrees Celsius), the reaction vessel 100 is rotated along its major axis AX １００ thermal expansion in the direction of the major axis AX １００ (The transfer mechanism 120 also thermally expands in the AX direction by approximately 10 to 20 mm.) １２０ thermal expansion in the direction (e.g., axis AX １２０ In this case, if the other end B2 of the transport mechanism 120 is located in the direction of the axis AX, the １２０ When the transport mechanism 120 is unable to move in the AX direction, １２０ The thermal expansion in the direction may cause the transport mechanism 120 to deform, and the spiral convex portion 121 of the deformed transport mechanism 120 may come into contact with the inner wall of the reaction vessel 100, which may prevent the transport mechanism 120 from rotating normally.

[0082] In addition, one end side B1 of the transport mechanism 120 is connected to the axis AX of the transport mechanism 120.１２０ The other end B2 of the transport mechanism 120 is set to a state in which it can move in the direction of the axis AX of the transport mechanism 120. １２０ If the reaction vessel 100 is unable to move in the direction, the other end side B2 of the conveying mechanism 120 will move due to thermal expansion and contraction of the reaction vessel 100, making it difficult to control the positions of the convex and concave portions of the screw, which may result in the processed material not being able to react normally.

[0083] Therefore, the transport mechanism 120 is １２０ In order to prevent the transfer mechanism 120 from being deformed due to thermal expansion in the direction of the axis AX of the transfer mechanism 120, the other end B2 of the transfer mechanism 120 is rotatable by the bearing 107. １２０ The support is supported in a state where it can move in any direction.

[0084] As described above, the other end B2 of the transport mechanism 120 is rotatable, and the axis AX of the transport mechanism 120 is １２０ By supporting the transport mechanism 120 in a state where it can move in the direction of the axis AX, １２０ This can prevent the transfer mechanism 120 from being deformed due to thermal expansion in the direction.

[0085] As described above, according to Reference Example 2, the reaction vessel 100 has its major axis AX １００ Therefore, it is possible to provide a reaction device 10 that can prevent the device from being unable to operate normally even if thermal expansion occurs in the direction.

[0086] Next, a modified example will be described.

[0087] In the above-mentioned Reference Example 2, an example in which the reaction vessel 100 is supported so as not to be rotatable has been described, but the present invention is not limited to this. For example, a reaction vessel 100 supported so as to be rotatable may also be used.

[0088] FIG. 6 shows an example of a configuration for supporting the reaction vessel 100 so that it can rotate.

[0089] As shown in FIG. 6, the reaction apparatus 10 of this modification includes bearings 112 and 113 as a structure for rotatably supporting the reaction vessel 100 .

[0090] The bearing 112 is provided between the one end side A1 of the reaction vessel 100 and the first support part 103, and is capable of rotating the one end side A1 of the reaction vessel 100 and is also １００ The bearing 112 is, for example, a bearing or a bush. A flange portion 114 is provided on one end side A1 of the reaction vessel 100. When this flange portion 114 comes into contact with the bearing 112, the one end side A1 of the reaction vessel 100 is supported in a state where it cannot move in the longitudinal axis AX of the reaction vessel 100. １００ A plurality of flanges 114 and bearings 112 may be provided. For example, two bearings 112 are used for one flange 114, and the flange 114 is sandwiched between the bearings 112, so that one end A1 of the reaction vessel 100 is prevented from moving in the longitudinal axis AX of the reaction vessel 100. １００ The bearing 112 may be an annular bearing or bushing into which the one end side A1 of the reaction vessel 100 is inserted, or may be an arc-shaped bearing or bushing with a portion of the annular bearing or bushing cut out. Instead of the bearing 112, a member made of a lubricating material may be used to rotate the one end side A1 of the reaction vessel 100 and move in the direction of the long axis AX of the reaction vessel 100. １００ The bearing 112 and the flange portion 114 are an example of a fourth support portion of the present disclosure.

[0091] On the other hand, the bearing 113 is provided between the other end A2 of the reaction vessel 100 and the second support part 104, and is configured to rotate the other end A2 of the reaction vessel 100 and to rotate the long axis AX of the reaction vessel 100. １００ The bearing 113 is, for example, a bearing or a bushing. The bearing 113 may be an annular bearing or bushing into which the other end side A2 of the reaction vessel 100 is inserted, or may be an arc-shaped bearing or bushing with a portion of the annular bearing or bushing cut out. Instead of the bearing 113, a member made of a lubricating material may be used to rotate the other end side A2 of the reaction vessel 100 and move along the long axis AX of the reaction vessel 100. １００The reaction vessel 100 may be supported in a state in which it can move in the direction of the axis of rotation. The bearing 113 is an example of a fifth support portion of the present disclosure. The rotatably supported reaction vessel 100 of this modification is connected (coupled) at one end side A1 to a reaction vessel driving device 116 (not shown in FIG. 6 ) similar to the driving device 150 (screw driving device).

[0092] When using a configuration in which the reaction vessel 100 is rotatably supported as in this modified example, a rotatably supported transport mechanism 120 (see FIG. 4) may be used, or a non-rotatably supported transport mechanism 120 (not shown) may be used instead of the rotatably supported transport mechanism 120. Also, the transport mechanism 120 may be omitted.

[0093] In the above-described Reference Example 2, the first support portion is the first support portion 103 that supports the one end side A1 of the reaction vessel 100 from below, but the present invention is not limited to this. １００ For example, although not shown, the first support may be a first support that supports one end side A1 of the reaction vessel 100 in a manner that suspends it from above, or a first support that supports one end side A1 of the reaction vessel 100 from the side.

[0094] In the above-described second embodiment, the second support portion 104 is a support portion that supports the other end A2 of the reaction vessel 100 from below, but the present invention is not limited to this. １００ For example, although not shown, the second support may be a second support that supports the other end A2 of the reaction vessel 100 in a manner that suspends it from above, or a second support that supports the other end A2 of the reaction vessel 100 from the side.

[0095] In the above-mentioned reference example, as shown in FIGS. 5A and 7, the second support portion 104 supports the other end A2 of the reaction vessel 100 along the longitudinal axis AX of the reaction vessel 100. １００7 is a view seen from the direction of the arrow AR2 in FIG. 5A. For example, when the other end A2 of the reaction vessel 100 is supported in a state where it can move only in the direction of the long axis AX of the reaction vessel 100, １００ In addition to the direction, the rotation axis AX Ｖ The support may be rotatable about a vertical axis.

[0096] Next, the other end A2 of the reaction vessel 100 is aligned along the long axis AX of the reaction vessel 100. １００ In addition to the direction, the rotation axis AX Ｖ A fourth specific example will be described, in which the object is supported in a state in which it can rotate about a vertical axis.

[0097] 8 shows the other end A2 of the reaction vessel 100, which is parallel to the longitudinal axis AX of the reaction vessel 100. １００ In addition to the direction, the rotation axis AX Ｖ 10 is a schematic diagram of a fourth specific example in which the sensor is supported in a state in which it can rotate about a vertical axis.

[0098] As shown in FIG. 8, the protrusion 104a is connected to the rotation axis AX via a bearing or the like. Ｖ The rotation axis AX is provided on a base 104e supported by the second support portion 104 (upper surface 104b) so as to be rotatable around the rotation axis AX. Ｖ 8, the other end A2 of the reaction vessel 100 is aligned along the longitudinal axis AX of the reaction vessel 100. １００ In addition to the direction, the rotation axis AX Ｖ It is supported in a state where it can rotate around a vertical axis.

[0099] In this way, the other end A2 of the reaction vessel 100 is aligned along the longitudinal axis AX of the reaction vessel 100. １００ In addition to the direction, the rotation axis AX Ｖ The advantages of supporting the device in a rotatable state around the vertical axis are as follows.

[0100] That is, depending on the state of the reaction (state of the physical stimulus), the longitudinal axis AX of the reaction vessel 100 in FIG. １００ In this case, a temperature difference may occur between the left and right sides of the reaction vessel 100 (or a temperature difference may be intentionally created). １００ This results in a phenomenon where the amount of stretching differs between the left and right sides.

[0101] For example, in FIG. 7, the longitudinal axis AX of the reaction vessel 100 １００ When the temperature on the right side is higher and the temperature on the left side is lower, the longitudinal axis AX of the reaction vessel 100 １００ The right side stretches more and the left side stretches less. The lengths of the arrows AR3 and AR4 in Figure 7 indicate this.

[0102] As described above, the long axis AX of the reaction vessel 100 １００ If the left and right sides are stretched by different amounts, horizontal stress (see arrow AR5 in FIG. 7) may occur on the other end A2 of the reaction vessel 100.

[0103] When this stress occurs, friction occurs between the second support portion 104 (the convex portion 104a) and the flange portion 109 (the concave portion 109a), causing the reaction vessel 100 (the other end side A2) to rotate along the major axis AX. １００ Directional movement may be impeded.

[0104] Therefore, by adopting the configuration shown in FIG. 8, it becomes possible to appropriately respond to various physical stimulus situations.

[0105] In particular, when a state in which a temperature difference is intentionally created between the left and right sides of the reaction vessel 100 is applied to a twin-screw reaction vessel 100A (see FIG. 9), it is effective for controlling the reaction rate of the material to be treated. FIG. 9 shows an example of the twin-screw reaction vessel 100A.

[0106] Next, the other end A2 of the reaction vessel 100 is aligned along the long axis AX of the reaction vessel 100. １００ A fifth specific example will be described in which the support is movable not only in the direction but also in the minor axis direction (see arrow AR6 in FIG. 10).

[0107] Specific Example 5 FIG. 10 shows the other end A2 of the reaction vessel 100, which is aligned with the longitudinal axis AX of the reaction vessel 100. １００ 10 is a schematic diagram of a fifth example in which the support is movable in the minor axis direction (see arrow AR6 in FIG. 10) in addition to the minor axis direction.

[0108] As shown in FIG. 10, the protrusion 104a is connected to the rotation axis AX via a bearing or the like. ＶThe base 104e is mounted on a pedestal 104e supported on the second support portion 104 (upper surface 104b) so as to be rotatable around the rotation axis AX (vertical axis). The pedestal 104e is further mounted on a guide rail 104f (supported on the second support portion 104 (upper surface 104b)) so as to be movable in the minor axis direction (see arrow AR6 in FIG. 10). Ｖ 10. As a result, the other end A2 of the reaction vessel 100 is aligned along the long axis AX of the reaction vessel 100. １００ In addition to the direction, the rotation axis AX Ｖ The support is supported in a state in which it can rotate about the vertical axis and move in the minor axis direction (see arrow AR6 in FIG. 10).

[0109] In this way, the other end A2 of the reaction vessel 100 is aligned along the longitudinal axis AX of the reaction vessel 100. １００ In addition to the direction, the rotation axis AX Ｖ The advantages of supporting the sensor in a state in which it can rotate around the vertical axis and move in the minor axis direction (see arrow AR6 in FIG. 10) are as follows.

[0110] When the above stress (see arrow AR5 in FIG. 7) occurs, friction occurs between the second support portion 104 (convex portion 104a) and the flange portion 109 (concave portion 109a), causing the reaction vessel 100 (the other end side A2) to rotate along the major axis AX. １００ Directional movement may be impeded.

[0111] If the deformation becomes even larger (if the stress becomes even larger), the other end A2 of the reaction vessel 100 may tilt (see FIG. 11B) and the reaction vessel 100 may twist (see FIG. 11A). FIG. 11A is a diagram showing the reaction vessel 100 in a twisted state, and FIG. 11B is a diagram showing the reaction vessel 100 in a tilted state. Such twisting and tilting are likely to occur at the other end A2 or the middle portion A3.

[0112] 10, it is possible to suppress twisting of the reaction vessel 100 (see FIGS. 11C and 11D). Fig. 11C shows a state in which twisting of the reaction vessel 100 is suppressed, and Fig. 11D shows a state in which tilting of the reaction vessel 100 is suppressed.

[0113] In the above-mentioned Reference Examples 1 and 2, the temperature control section (temperature control area 110, etc.) controls the temperature of the reaction vessel 100 along the major axis AX of the reaction vessel 100. １００ Although an example of controlling each of the regions having different directions has been described, the present invention is not limited to this. That is, the number of regions for which the temperature control unit (such as the temperature control region 110) controls the temperature is not limited to a plurality of regions, and may be one region.

[0114] Furthermore, in the above-described Reference Examples 1 and 2, examples have been described in which the fluid supply units (first fluid inlet 131, first fluid outlet 132, first valve 134, etc.) are used, but the present invention is not limited to this. That is, some or all of the fluid supply units (first fluid inlet 131, first fluid outlet 132, first valve 134, etc.) may be omitted.

[0115] In addition, in the above-described Reference Examples 1 and 2, the driving device 150 is provided at one end A1 of the reaction vessel 100 and connected to one end B1 of the transport mechanism 120 (e.g., a screw), but this is not limiting. Another driving device may be used as the device that drives the transport mechanism 120.

[0116] <Embodiments> <Specific Examples of Furnace Body (Temperature Control Region 110)> First, a specific example of the furnace body (temperature control region 110) of the reaction apparatus 10 of the embodiments described below will be described.

[0117] Fig. 12 is a perspective view of the furnace body (temperature control region 110). Fig. 13 is a diagram showing the relationship between the reaction vessel 100 and the furnace body (temperature control region 110).

[0118] As shown in FIG. 12, the furnace body (temperature control region 110) is １００ The reactor is divided into a total of three zones D1 to D3 in the direction of the heating element. The number of zones is not limited to three, and the reactor may be divided into one, two, four, or more zones. As shown in FIG. 13 , the furnace body (temperature control region 110) is supported by a heater support 190 disposed on the equipment stand (floor surface 170). Meanwhile, the reactor 100 is supported by cylinder supports (e.g., first support 103, second support 104) disposed on the equipment stand (floor surface 170). The reactor 100 is supported while maintaining a space S0 (see FIG. 17 ) between the heating element H and the reactor 100 (all around).

[0119] The zone D1 is formed around the long axis AX of the reaction vessel 100 so as to surround the reaction vessel 100. １００ The wheel is divided into four zones D11 to D14 (see FIG. 12), one above, one below, one to three, or five or more zones, around the wheel (circumferential direction).

[0120] The four zones D11 to D14 are provided with a first heating section H1, a second heating section H2, a third heating section H3, and a fourth heating section H4. In this manner, the heating sections H1 to H4 are arranged along the major axis AX of the reaction vessel 100 so as to surround the reaction vessel 100. １００ are placed around it.

[0121] As the heating sections H1 to H4, it is desirable to use heaters including heating wires (electric heaters) in consideration of temperature controllability.

[0122] Fig. 14 is a block diagram showing the electrical connection relationship between the heating units H1 to H4 and the temperature control unit 202. As shown in Fig. 14, each heater is electrically connected to the temperature control unit 202. Note that the heating units H1 to H4 are not limited to heaters and may be other heating means.

[0123] Although not shown, temperature measurement units are arranged in the four zones D11 to D14. The temperature measurement units are provided in the reaction vessel 100 (for example, points A, B, C, and D in FIG. 12) rather than in the heating units H1 to H4. It is desirable to use, for example, a thermocouple as the temperature measurement unit. Each temperature measurement unit is electrically connected to the temperature control unit 202. Note that the temperature measurement unit is not limited to a thermocouple, and may be another temperature measurement unit (temperature sensor).

[0124] The temperature control unit 202 individually controls (e.g., PID control) the current passed through each heater (heating wire) to individually control the temperature of each of the multiple locations (12 locations) in the reaction vessel 100 (middle section A3) corresponding to each zone. In doing so, the temperature control unit 202 refers to the temperatures measured by each temperature measurement unit. For example, when the temperature control unit 202 controls the temperature of the location in the reaction vessel 100 corresponding to zone D11 by controlling the heater that is the first heating unit H1 in zone D11, the temperature control unit 202 refers to the temperature measured by the temperature measurement unit arranged in that zone D11. The same applies when controlling the other heaters that are the other heating units H2 to H4.

[0125] As described above, in the embodiment described below, the temperature control area 110 is divided into a total of 12 zones (3 x 4), and the temperature of each of the multiple locations (12 locations) in the reaction vessel 100 (middle section A3) corresponding to each zone can be individually controlled. This allows the reaction device 10 to more effectively carry out the reaction of the raw materials.

[0126] Next, problems that arise when controlling the temperature of the reaction vessel 100 (temperature increase control or temperature decrease control) will be described.

[0127] FIG. 15A shows an example of a deformation pattern of the reaction vessel 100, and FIG. 15B shows another example of a deformation pattern of the reaction vessel 100.

[0128] The reaction vessel 100 has its long axis AX １００ Both ends in the direction are supported, and the intermediate portion between the ends is not supported (see FIGS. 4 and 13). Therefore, as shown in FIG. 15A, the reaction vessel 100 is curved downward convexly due to its own weight. Note that when the reaction vessel 100 is heated, the rigidity (hardness) of the reaction vessel 100 decreases, and the downward convex deformation increases.

[0129] On the other hand, when the temperature of the reaction vessel 100 is controlled (temperature increase control or temperature decrease control), the reaction vessel 100 expands and contracts, causing the reaction vessel 100 to curve upwardly convexly (see FIG. 15B).

[0130] The reaction vessel 100 curves convexly upward because the temperature of the upper part of the reaction vessel 100 differs from the temperature of the lower part of the reaction vessel 100. Specifically, the temperature of the upper part A of the reaction vessel 100 becomes higher than the temperature of the lower part C of the reaction vessel 100. Therefore, the upper part A of the reaction vessel 100 expands more than the lower part C of the reaction vessel 100. As a result, the reaction vessel 100 curves convexly upward.

[0131] The reason why the temperature of the upper part A of the reaction vessel 100 is higher than the temperature of the lower part C of the reaction vessel 100 is because the first heating part H1 (see Figure 12) located in the upper zone D11 of the temperature control area 110 and the third heating part H3 (see Figure 12) located in the lower zone D13 of the temperature control area 110 are in different current output states.

[0132] For example, if the temperature of the lower portion C of the reaction vessel 100 is 400°C, the temperature of the upper portion A of the reaction vessel 100 will be (400 + Δ)°C. Here, when controlling the temperature of the reaction vessel 100 (temperature increase control or temperature decrease control) (for example, when controlling the temperature increase from 400°C to 405°C), the temperature of the lower portion C of the reaction vessel 100 (third heating part H3) is lower than the temperature of the upper portion A of the reaction vessel 100 (first heating part H1), so a larger current is passed through the third heating part H3 than through the first heating part H1. Therefore, the lower portion C of the reaction vessel 100 is heated more strongly than the upper portion A of the reaction vessel 100.

[0133] At this time, heat moves from bottom to top, and therefore the third heating part H3, to which a larger current than that of the first heating part H1 is applied as described above, heats not only the lower part C of the reaction vessel 100 but also the upper part A of the reaction vessel 100. As a result, the temperature difference between the upper part of the reaction vessel 100 and the lower part of the reaction vessel 100 becomes larger.

[0134] FIG. 16 is a diagram for explaining the problem that occurs when controlling the temperature of the reaction vessel 100 (temperature increase control or temperature decrease control).

[0135] When the temperature of the reaction vessel 100 is controlled (temperature increase control or temperature decrease control) as described above, the reaction vessel 100 curves upward in a convex shape due to the temperature difference (temperature difference) between the upper and lower parts of the reaction vessel 100 (see FIG. 15B). Meanwhile, the transport mechanism 120 (screw) curves downward in a convex shape due to its own weight (see FIG. 16). As a result, the buffer space S1 (see FIG. 16) between the transport mechanism 120 (screw) and the reaction vessel 100 gradually narrows, and eventually, the top of the flight of the transport mechanism 120 (screw) comes into contact with the inner wall of the reaction vessel 100. As a result, there is a problem that the normal operation of the reaction apparatus 10 may be hindered (the reaction apparatus 10 may break down).

[0136] <Desirable Temperature Conditions> Considering the above-mentioned issues, it is desirable that the temperature control unit 202 individually controls each heater (heating wire) so that the temperature difference between the upper part A, lower part C, left part D, and right part B (see FIG. 12) of the reaction vessel 100 is as small as possible.

[0137] Specifically, the temperature difference between the upper portion A, the lower portion C, the left portion D, and the right portion B of the reaction vessel 100 is preferably within ±10° C., and more preferably within ±5° C. This allows temperature adjustment while suppressing twisting and bending of the reaction vessel 100.

[0138] <Embodiment 1> Next, as embodiment 1, configuration example 1 for solving the above problem will be described. Hereinafter, as this configuration example 1, an example using a fluid supply unit that supplies a fluid to the space S0 between the first to fourth heating units H1 to H4 (one example of the plurality of heating units of the present disclosure) and the reaction vessel 100 will be described. This configuration example 1 can be applied, for example, to the reaction apparatus 10 of Reference Example 2 above. Hereinafter, the same components as those of Reference Example 2 above will be assigned the same reference numerals, and descriptions thereof will be omitted as appropriate. Hereinafter, an example will be described in which the fluid supply unit is an inert gas supply source and the fluid supplied by the fluid supply unit is an inert gas.

[0139] Fig. 17 is a cross-sectional view (schematic diagram) taken along line XVII-XVII in Fig. 13. Note that the transport mechanism 120 (screw) is omitted in Fig. 17.

[0140] As shown in FIG. 17, the heating unit H (first to fourth heating units H1 to H4) is arranged along the major axis AX of the reaction vessel 100 so as to surround the reaction vessel 100 (middle portion A3). １００ are placed around it.

[0141] A gas supply port 180 is provided at the top of the heating unit H, which communicates with the space S0 between the heating unit H and the reaction vessel 100. An inert gas supply source (not shown) is connected to the gas supply port 180 via a pipe 180a. The number of gas supply ports 180 is not particularly limited and may be one or more. For example, although not shown, the gas supply port 180 may be provided in each of the zones D1 to D3.

[0142] Meanwhile, a gas exhaust port 181 communicating with the space S0 between the heating part H and the reaction vessel 100 is provided at the bottom of the heating part H. The number of gas exhaust ports 181 is not particularly limited and may be one or more. For example, although not shown, the gas exhaust port 181 may be provided in each of the zones D1 to D3.

[0143] In the reaction apparatus 10, since the temperature tends to be higher at the upper part, it is desirable to provide the gas supply port 180 on the upper side of the heating section H, while it is desirable to provide the gas exhaust port 181 on the lower side of the heating section H in order to create a flow of inert gas from the upper side to the lower side.

[0144] An inert gas supply source (not shown) supplies (pressurizes) an inert gas that is supplied from a gas supply port 180 to the space S0 via a pipe 180a, passes through the space S0, and is discharged from a gas discharge port 181. At this time, the air in the space S0 between the heating part H and the reaction vessel 100 is agitated by the inert gas passing through the space S0.

[0145] This reduces the temperature difference between the upper and lower parts of the reaction vessel 100. As a result, it is possible to prevent the reaction vessel 100 from bending or twisting due to the temperature difference between the upper and lower parts of the reaction vessel 100, which can cause the top of the flight of the transport mechanism 120 (screw) to come into contact with the inner wall of the reaction vessel 100. In other words, the above-mentioned problem can be solved.

[0146] As described above, according to the first embodiment, by using an inert gas supply unit (fluid supply unit) that supplies an inert gas to the space S0 between the first to fourth heating units H1 to H4 (examples of the multiple heating units of the present disclosure) and the reaction vessel 100, it is possible to reduce the temperature difference (temperature difference) between the upper and lower parts of the reaction vessel 100. As a result, it is possible to prevent the reaction vessel 100 from bending or twisting due to the temperature difference (temperature difference) between the upper and lower parts of the reaction vessel 100, and to prevent the top of the flight of the transport mechanism 120 (screw) from coming into contact with the inner wall of the reaction vessel 100. In other words, the above-mentioned problem can be solved.

[0147] The space S0 between the heating unit H and the reaction vessel 100 is divided into two parts by one or more partition plates (not shown) along the major axis AX of the reaction vessel 100 (temperature control region 110). １００ The space may be partitioned in a direction parallel to the wall, and each of the partitioned spaces may be provided with a gas supply port 180 and a gas exhaust port 181. In this way, the air in each partitioned space can be more effectively agitated.

[0148] The supply temperature of the inert gas is not particularly limited. For example, the supply temperature of the inert gas may be room temperature or a preheated temperature. From the viewpoint of reducing the temperature difference (temperature difference) between the upper and lower parts of the reaction vessel 100, it is desirable that the supply temperature of the inert gas be the same as or lower than the set temperature of the reaction vessel 100.

[0149] The temperature difference between the upper and lower parts of the reaction vessel 100 is affected by the flow rate of the inert gas. Therefore, when the temperature difference between the upper and lower parts of the reaction vessel 100 is large, it is desirable to increase the flow rate of the inert gas. Conversely, when the temperature difference between the upper and lower parts of the reaction vessel 100 is small, it is desirable to decrease the flow rate of the inert gas. To achieve this, it is desirable to provide a valve (not shown) in the pipeline 180a connecting the gas supply port 180 and the inert gas supply source, and to adjust the opening of this valve (adjust the flow rate) according to the temperature difference between the upper and lower parts of the reaction vessel 100.

[0150] Although an example in which an inert gas is used as the fluid supplied by the fluid supply unit has been described above, this is not limiting. That is, the type of fluid in the present disclosure is not particularly limited. For example, the fluid supplied by the fluid supply unit may be a gas other than an inert gas, a liquid, or a solid having fluidity. The solid having fluidity may be, for example, spherical ceramic beads.

[0151] In order to prevent deterioration of the reaction vessel 100, it is desirable that the fluid supplied by the fluid supply unit be a fluid (component) that does not oxidize or corrode the reaction vessel 100. For example, it is desirable that the fluid supplied by the fluid supply unit be an inert gas or a reducing gas. Examples of inert gases include nitrogen and argon. Examples of reducing gases include hydrogen and carbon monoxide.

[0152] In the above-described first embodiment, the example in which the configuration example 1 for solving the above problem is applied to the reaction apparatus 10 of the above-described reference example 2 has been described, but the present invention is not limited thereto. For example, the configuration example 1 for solving the above problem may be applied to the reaction apparatus 10 including a reaction vessel (not shown) in which one end side A1 and the other end side A2 are each supported in a movably state (movably supported), or to other reaction apparatuses.

[0153] <Embodiment 2> Next, as embodiment 2, configuration example 2 for solving the above problem will be described. Hereinafter, as this configuration example 2, an example using first to seventh heating sections H1 to H7 (one example of the plurality of heating sections of the present disclosure) will be described. This configuration example 2 can be applied, for example, to the reaction device 10 of Reference Example 2 above. Hereinafter, the same components as those of Reference Example 2 above will be assigned the same reference numerals, and descriptions thereof will be omitted as appropriate.

[0154] Fig. 18 is a cross-sectional view (schematic diagram) corresponding to the cross section taken along line XVII-XVII in Fig. 13. Note that the transport mechanism 120 (screw) is omitted in Fig. 18.

[0155] As shown in FIG. 18, the heating units H (first to seventh heating units H1 to H7) are arranged along the major axis AX of the reaction vessel 100 so as to surround the reaction vessel 100 (middle section A3). １００ The heating units H (first to seventh heating units H1 to H7) are arranged unevenly around the reaction vessel 100. Specifically, the heating units H (first to seventh heating units H1 to H7) are arranged sparsely above the reaction vessel 100 and densely below the reaction vessel 100. The distance between the reaction vessel 100 and the heating units H (first to seventh heating units H1 to H7) is longer the higher up the reaction vessel 100 and shorter the lower down the reaction vessel 100. Distances L3 to L6 in FIG. 18 represent this. That is, the relationship between the distances L3 to L6 in FIG. 18 is L6 > L5 > L4 > L3.

[0156] In this way, the heating parts H (first to seventh heating parts H1 to H7) are arranged along the longitudinal axis AX of the reaction vessel 100. １００ The advantages of uneven distribution are as follows:

[0157] Fig. 19 is a cross-sectional view (schematic diagram) corresponding to the cross section taken along line XVII-XVII in Fig. 13. Note that the transport mechanism 120 (screw) is omitted in Fig. 19.

[0158] That is, as shown in FIG. 19, the heating section H (first to fourth heating sections H1 to H4) is arranged along the longitudinal axis AX of the reaction vessel 100. １００ If they are arranged evenly around the periphery, the distance between each heating unit H1 to H4 and the reaction vessel 100 will be equal, which will tend to increase the temperature difference between the upper and lower parts of the reaction vessel 100.

[0159] In contrast to this, as shown in FIG. 18, the heating parts H (first to seventh heating parts H1 to H7) are arranged along the major axis AX of the reaction vessel 100. １００ Arranging them unevenly around the reaction vessel 100 has the advantage that the distance between each of the heating units H1 to H7 and the reaction vessel 100 increases as the heating unit moves upward, thereby reducing the temperature difference between the upper and lower parts of the reaction vessel 100. As a result, it is possible to prevent the reaction vessel 100 from bending or twisting due to the temperature difference between the upper and lower parts of the reaction vessel 100, which could cause the top of the flight of the transport mechanism 120 (screw) to come into contact with the inner wall of the reaction vessel 100. In other words, the above-mentioned problem can be solved.

[0160] As described above, the heating units H (first to seventh heating units H1 to H7) are arranged along the longitudinal axis AX of the reaction vessel 100. １００ When the heating units H (the first to seventh heating units H1 to H7) are arranged unevenly around the reaction vessel 100, they may be arranged along the Cassini oval line (see FIG. 18). １００ is preferably located at or below the center of gravity of the heating units H (first to seventh heating units H1 to H7) arranged along the Cassini oval line.

[0161] As described above, according to the second embodiment, the heating units H (first to seventh heating units H1 to H7) are arranged along the longitudinal axis AX of the reaction vessel 100. １００ By arranging the screws unevenly around the reaction vessel 100, it is possible to reduce the temperature difference (temperature difference) between the upper part of the reaction vessel 100 and the lower part of the reaction vessel 100. As a result, it is possible to prevent the reaction vessel 100 from bending or twisting due to the temperature difference (temperature difference) between the upper part of the reaction vessel 100 and the lower part of the reaction vessel 100, and to prevent the top of the flight of the transport mechanism 120 (screw) from coming into contact with the inner wall of the reaction vessel 100. In other words, the above-mentioned problem can be solved.

[0162] The conditions for the placement of the heating units H (such as the number and density of heating units placed above the reaction vessel 100, the number and density of heating units placed below the reaction vessel 100, and the distance between each heating unit and the reaction vessel 100) vary depending on the size and shape of the reaction vessel 100. Therefore, it is difficult to express the conditions for the placement of the heating units H that reduce the temperature difference (temperature difference) between the upper and lower parts of the reaction vessel 100 in specific numerical values.

[0163] However, based on experiments and experience, it is possible to find conditions for arranging the heating units H (such as the number and density of heating units arranged above the reaction vessel 100, the number and density of heating units arranged below the reaction vessel 100, and the distance between each heating unit and the reaction vessel 100) that reduce the temperature difference (temperature difference) between the upper part of a reaction vessel 100 and the lower part of the reaction vessel 100 of a particular size and shape.

[0164] In the above-described second embodiment, the example in which the configuration example 2 for solving the above problem is applied to the reaction apparatus 10 of the above-described reference example 2 has been described, but the present invention is not limited thereto. For example, the configuration example 2 for solving the above problem may be applied to the reaction apparatus 10 including a reaction vessel (not shown) in which one end side A1 and the other end side A2 are supported in a movably state (movably supported), or to other reaction apparatuses.

[0165] <Embodiment 3> Next, as embodiment 3, configuration example 3 for solving the above problem will be described. Hereinafter, as this configuration example 3, an example will be described in which multiple layers with different thermal conductivities are stacked in the space between the first to fourth heating parts H1 to H4 (one example of the multiple heating parts of the present disclosure) and the reaction vessel 100. This configuration example 3 can be applied, for example, to the reaction device 10 of the above-mentioned reference example 2. Hereinafter, the same components as those in the above-mentioned reference example will be assigned the same reference symbols, and descriptions thereof will be omitted as appropriate.

[0166] Figure 20 is a cross-sectional view (schematic diagram) corresponding to the cross section taken along line XVII-XVII in Figure 13. Note that the transport mechanism 120 (screw) is omitted in Figure 20.

[0167] As shown in FIG. 20, the heating unit H (first to fourth heating units H1 to H4) is arranged along the major axis AX of the reaction vessel 100 so as to surround the reaction vessel 100 (middle unit A3).１００ are placed around it.

[0168] In the space S0 between the heating unit H and the reaction vessel 100, multiple layers E1 to E3 with different thermal conductivities are stacked vertically. Specifically, the thermal conductivities of the layers E1 to E3 decrease from bottom to top. That is, the relationship is: thermal conductivity of layer E1 > thermal conductivity of layer E2 > thermal conductivity of layer E3. The layers E1 to E3 are provided in the range indicated by the symbol L7 in FIG. 13.

[0169] The advantages of decreasing the thermal conductivity of each layer from bottom to top are as follows. In other words, in the case of the reaction apparatus 10, the amount of raw material in the reaction vessel 100 (cylinder) tends to be greater at the bottom and less at the ceiling, and the bottom of the reaction vessel 100 (cylinder) is the region through which relatively low-temperature raw material flows. Also, when the reaction gas flows from the ceiling to the bottom of the reaction vessel 100 (cylinder), the bottom of the reaction vessel 100 (cylinder) tends to be cooled more. In light of this, decreasing the thermal conductivity of each layer from bottom to top has the advantage of improving the temperature responsiveness of the bottom of the reaction vessel 100 (cylinder).

[0170] Layer E1 is a heat transfer material layer, and may be made of, for example, a nickel alloy or carbon. The heat transfer material layer may be omitted. Layer E2 is a heat insulating material layer, and may be made of, for example, ceramics such as mica. Layer E3 is an air layer (an example of a fluid layer of the present disclosure), and may contain, for example, nitrogen or argon. It is desirable to provide the air layer with a gas supply port and a gas exhaust port similar to those shown in FIG. 17 to allow air (gas) in the air layer to convect. Air (gas) whose temperature has been previously controlled by a heat exchanger (not shown) may be supplied to the air layer.

[0171] This reduces the temperature difference between the upper and lower parts of the reaction vessel 100. As a result, it is possible to prevent the reaction vessel 100 from bending or twisting due to the temperature difference between the upper and lower parts of the reaction vessel 100, which can cause the top of the flight of the transport mechanism 120 (screw) to come into contact with the inner wall of the reaction vessel 100. In other words, the above-mentioned problem can be solved.

[0172] As described above, according to the third embodiment, by using a plurality of layers E1 to E3 having different thermal conductivities stacked in the space between the first to fourth heating units H1 to H4 (one example of a plurality of heating units of the present disclosure) and the reaction vessel 100, it is possible to reduce the temperature difference (temperature difference) between the upper and lower parts of the reaction vessel 100. As a result, it is possible to prevent the reaction vessel 100 from bending or twisting due to the temperature difference (temperature difference) between the upper and lower parts of the reaction vessel 100, and to prevent the top of the flight of the transport mechanism 120 (screw) from coming into contact with the inner wall of the reaction vessel 100. In other words, the above-mentioned problem can be solved.

[0173] In the above-described third embodiment, the configuration example 3 for solving the above-described problems is described as being applied to the reaction apparatus 10 of the above-described reference example 2, but the present invention is not limited to this. For example, the configuration example 3 for solving the above-described problems may be applied to the reaction apparatus 10 including a reaction vessel (not shown) in which one end side A1 and the other end side A2 are supported in a movably state (movably supported), or to other reaction apparatuses.

[0174] The invention made by the inventor has been specifically described above based on the embodiments, but it goes without saying that the present invention is not limited to the embodiments already described, and various modifications are possible within the scope of the gist of the invention.

[0175] For example, in the above-described embodiments, examples have been described in which each of Configuration Examples 1 to 3 for solving the above-described problems is applied singly to the reaction apparatus 10 of Reference Example 2. However, the present invention is not limited to this. For example, Configuration Examples 1 to 3 for solving the above-described problems may be appropriately combined and applied to the reaction apparatus 10 of Reference Example 2 or other reaction apparatuses. This can also achieve the same effects as the above-described embodiments.

[0176] Moreover, the configuration shown in FIG. 17 and the configuration shown in FIG. 20 may be combined.

[0177] FIG. 21 shows an example in which the configuration shown in FIG. 17 and the configuration shown in FIG. 20 are combined.

[0178] 21 , a heating section, an air layer, a heat insulating material layer, and a heat transfer material layer may be arranged inside a heat insulating frame 300, and the inert gas that passes through the air layer and is discharged from a gas discharge port 181 may be supplied (pressurized) to a gas supply port 180. In this way, the temperature difference between the top and bottom of the reaction vessel 100 (cylinder) can be further reduced.

[0179] This application claims priority based on Japanese Patent Application No. 2023-148407, filed September 13, 2023, the disclosure of which is incorporated herein by reference in its entirety.

[0180] DESCRIPTION OF SYMBOLS 10, 10A, 10B, 10C...Reaction apparatus 100...Reaction vessel 101...Supply port 102...Delivery port 103...First support portion 104...Second support portion 104a...Convex portion 104b...Upper surface 104c, 104d...Upright portion 106, 107...Bearing 108...Lid portion 109...Flange portion 109a...Concave portion 109b...Lower surface 109c, 109d...Protrusion portion 110...Temperature control region 111...Friction reduction member 112, 113...Bearing 114...Flange portion 116...Reaction vessel drive device 120...Screw 121...Convex portion 130...First fluid control region 131...First fluid inlet 132...First fluid outlet 133...First fluid supply pipe 134...First valve DESCRIPTION OF SYMBOLS 140...Second fluid control area 141...Second fluid inlet 142...Second fluid outlet 143...Second fluid supply pipe 144...Second valve 150...Drive device 151...Motor 152...Reduction gear 170...Floor surface 200...Control device 201...Overall control unit 202...Temperature control unit 203...Screw rotation control unit 204...First fluid control unit 205...Second fluid control unit 206...IF control unit 207...Memory unit 210...Temperature control device 230...First fluid control device 240...Second fluid control device 250...Information input / output unit A1...One end side A2...Other end side A3...Intermediate section B1...One end side B2...Other end side E...Specific location G1 to G4...Gaps R10...Processed material R11...Product

Claims

1. A reaction apparatus comprising: a cylindrical reaction vessel including an intermediate section between a supply section and a discharge section; a plurality of heating sections arranged around the longitudinal axis of the reaction vessel so as to surround the intermediate section; a temperature control section which individually controls the temperatures of the plurality of heating sections; the supply section which supplies a material to be treated to the reaction vessel; the discharge section which discharges a product from the reaction vessel; a transport mechanism which transports the material to be treated from the supply section side of the reaction vessel through the intermediate section to the discharge section side of the reaction vessel; a fluid supply port and a fluid discharge port which communicate with a space between the plurality of heating sections and the reaction vessel; and a fluid supply section which supplies a fluid which is supplied from the fluid supply port to the space, passes through the space, and is discharged from the fluid discharge port.

2. The reaction apparatus described in claim 1, wherein the multiple heating units are arranged sparsely above the reaction vessel and densely below the reaction vessel, and the distance between the reaction vessel and the heating units is longer toward the top of the reaction vessel and shorter toward the bottom of the reaction vessel.

3. The reaction apparatus according to claim 1, wherein a plurality of layers having different thermal conductivities are stacked vertically in the space between the plurality of heating sections and the reaction vessel, and the thermal conductivities of the plurality of layers decrease from bottom to top.

4. The reactor of claim 3, wherein said plurality of layers includes at least an insulation layer and a fluid layer.

5. The reactor of claim 4, wherein said plurality of layers further comprises said heat transfer material layer.

6. A reaction apparatus according to any one of claims 1 to 5, wherein the fluid is an inert gas.

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