Compound, composition, surface treatment agent, pellet, article, and method for producing article

Abstract

Provided are: a compound by which a surface treatment layer having excellent acid resistance can be formed; a composition and a surface treatment agent which contain the compound; an article that has a surface treatment layer having excellent acid resistance; and a method for producing the article. The present invention provides a compound represented by formula (1).　(1): R1-L1-T1　In formula (1): R1 is [(CH3)3Q1-R2-]m1Q2(CH3)3-m1-; Q1 and Q2 are each independently C or Si; R2 is an alkylene group having 1-6 carbon atoms; m1 is an integer of 0-3; L1 is an alkylene group which has 13 or more carbon atoms and may have a specific bond or the like; T1 is -Si(R11)m2L3-m2; R11 is a hydrocarbon group; L is a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and m2 is an integer of 0-2.

Description

Compound, composition, surface treatment agent, pellet, article, and method for manufacturing article

[0001] The present disclosure relates to compounds, compositions, surface treatments, pellets, articles, and methods of making articles.

[0002] In recent years, there has been a demand for technologies that make surfaces of articles less susceptible to fingerprints and that make them easier to remove stains, in order to improve performance such as appearance and visibility. As a specific method, a method of performing a surface treatment on the surface of an article using a surface treatment agent is known.

[0003] Patent Document 1 describes, as a surface treatment agent, a specific siloxane group-containing silane compound having a divalent linear organopolysiloxane group and a hydrolyzable silyl group.

[0004] International Publication No. 2023 / 017830

[0005] From the viewpoint of durability of the surface treatment layer, further improvement in acid resistance is required.

[0006] The present disclosure aims to provide a compound capable of forming a surface treatment layer having excellent acid resistance, a composition and surface treatment agent containing the compound, an article having a surface treatment layer having excellent acid resistance, and a method for producing the same.

[0007] The present disclosure includes the following aspects: [1] A compound represented by the following formula (1): R １ -L １ -T １ ...(1) In formula (1), R １ is [(CH ３ ) ３ Q １ -R ２ -] ｍ１ Q ２ (CH ３ ) ３－ｍ１ - and Q １ and Q ２ are each independently C or Si, ２ are each independently an alkylene group having 1 to 6 carbon atoms, m1 is an integer of 0 to 3, and L １is an alkylene group having 13 or more carbon atoms, and has between its carbon atoms -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and phenylene group, １ is -Si(R １１ ) ｍ２ L ３－ｍ２ and R １１ are each independently a hydrocarbon group, each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and m2 is an integer of 0 to 2. [2] The L １ [3] The compound according to [1], wherein the number of carbon atoms in the L １ is an alkylene group having 13 to 36 carbon atoms. [4] The compound according to [1] or [2]. １ But, Q ２ (CH ３ ) ３ [5] The compound according to any one of [1] to [3], wherein L is represented by the following formula (G1): -O-R １２ -M １ R １３ ３ ...(G1) However, R １２ is an alkylene group, (Si(CH ３ ) ２ O) ｍ３ , or an alkylene group and (Si(CH ３ ) ２ O) ｍ３ It is a combination of M １ is a carbon atom or a silicon atom, R １３ are each independently a hydrogen atom or an alkyl group which may have a branch, and R １３ At least two of the R are alkyl groups which may have a branch, and m3 is an integer of 1 to 12. [6] １２[7] The compound according to [5], wherein M is a linear alkylene group. １ R １３ ３ But CH (CH ３ ) ２ , C(CH ３ ) ３ or Si(CH ３ ) ３ [8] The compound according to any one of [1] to [7], which is solid at 25°C. [9] The compound according to any one of [1] to [7], which is liquid at 25°C.

[10] A composition comprising the compound according to any one of [1] to [9] and a liquid medium.

[11] A surface treatment agent comprising the compound according to any one of [1] to [9].

[12] The surface treatment agent according to

[11] , which further comprises a liquid medium.

[13] The surface treatment agent according to

[11] or

[12] , which is for vacuum deposition.

[14] The surface treatment agent according to

[12] , which is for wet coating.

[15] A pellet containing the surface treatment agent according to

[11] or

[12] .

[16] A method for producing an article, comprising surface treating a substrate with the surface treatment agent according to any one of

[11] to

[14] , to produce an article having a surface treatment layer formed on the substrate.

[17] An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to any one of

[11] to

[14] .

[18] The article according to

[17] , which is an optical member.

[19] The article according to

[17] or

[18] , which is a display or a touch panel.

[20] A compound represented by the following formula (13): R １ -L ２ -CH=CH ２ ...(13) In formula (13), R １ is [(CH ３ ) ３ Q １ -R ２ -] ｍ１ Q ２ (CH ３ ) ３－ｍ１ - and Q １ and Q ２ are each independently C or Si, ２are each independently an alkylene group having 1 to 6 carbon atoms, m1 is an integer of 0 to 3, and L ２ is an alkylene group having 11 or more carbon atoms, and between carbon atoms there is one of -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, or -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ It may have one or more bonds selected from the group consisting of - and phenylene groups.

[0008] The present disclosure provides a compound capable of forming a surface treatment layer with excellent acid resistance, a composition and surface treatment agent containing the compound, an article having a surface treatment layer with excellent acid resistance, and a method for producing the same.

[0009] In this specification, numerical ranges indicated using "to" include the numerical values ​​before and after "to" as the minimum and maximum values, respectively. In numerical ranges described in stages in this specification, the upper or lower limit value described in one numerical range may be replaced with the upper or lower limit value of another staged numerical range. Furthermore, in numerical ranges described in this specification, the upper or lower limit value of that numerical range may be replaced with a value shown in the Examples. In this specification, the term "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. In this specification, "Me" may refer to a methyl group, "tBu" may refer to a tert-butyl group, and "TMS" may refer to a trimethylsilyl group. In this specification, when a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively. Note that when the same symbol exists in a single chemical formula, the same symbol may represent the same structure or different structures within the specified range.

[0010] The bonding direction of divalent groups represented in this specification is not limited unless otherwise specified. For example, when Y is -COO- in a compound represented by the formula "X-Y-Z", Y may be -CO-O- or -O-CO-. In addition, the compound may be "X-CO-O-Z" or "X-O-CO-Z".

[0011] [Compound] The compound of the present disclosure is a compound represented by formula (1) described below. When compound (1) is used as a surface treatment agent, a surface treatment layer with excellent acid resistance can be formed. The reason for this is unclear, but is presumed to be as follows. The compound of the present disclosure roughly has a structure of "a group containing TMS or tBu - a specific long-chain alkylene group - a reactive silyl group." The compound of the present disclosure contains a reactive silyl group that has high adhesion to the substrate, allowing it to form a surface treatment layer that adheres closely to the surface of the substrate. Furthermore, it is presumed that the compound of the present disclosure contains a long-chain alkylene having a reactive silyl group at its terminal, which allows it to be arranged at a higher density on the substrate. Furthermore, since TMS or tBu is arranged on the air-interface side of the surface treatment layer, the compound of the present disclosure exhibits excellent water- and oil-repellency and improved fingerprint wiping properties. For these reasons, even if acid adheres to the surface treatment layer, the acid is prevented from penetrating the substrate, improving the durability of the surface treatment layer, such as its acid resistance, water resistance, and hot water resistance. Furthermore, the high density arrangement of the compound on the substrate also further improves abrasion resistance. The compounds of the present disclosure will be described in detail below.

[0012] <Compound (1)> R １ -L １ -T １ ...(1) In formula (1), R １ is [(CH ３ ) ３ Q １ -R ２ -] ｍ１ Q ２ (CH ３ ) ３－ｍ１ - and Q １ and Q ２ are each independently C or Si, ２are each independently an alkylene group having 1 to 6 carbon atoms, m1 is an integer of 0 to 3, and L １ is an alkylene group having 13 or more carbon atoms, and has between its carbon atoms -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and phenylene group, １ is -Si(R １１ ) ｍ２ L ３－ｍ２ and R １１ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and m2 is an integer of 0 to 2.

[0013] In formula (1), R １ is [(CH ３ ) ３ Q １ -R ２ -] ｍ１ Q ２ (CH ３ ) ３－ｍ１ - is. ２ Is L １ Combine with. Q １ and Q ２ are each independently C or Si. ２ is an alkylene group having 1 to 6 carbon atoms. ２ By having (CH ３ ) ３ Q １ Even when two or more (CH ３ ) ３ Q １ Since rotation is ensured, a surface treatment layer with excellent water and oil repellency can be formed. ２ The alkylene group in R may be linear or branched. ２ Specific examples of the group include -CH２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -, -CH(CH ３ ) CH ２ CH ２ -, -CH(CH ２ CH ３ ) CH ２ CH ２ -, -CH ２ C(CH ２ ) ２ CH ２ -, -CH ２ CH (CH ３ ) CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH (CH ３ ) CH ２ CH ２ - etc. ２ When R is a branched alkylene group, the number of carbon atoms in the branched chain is preferably 1 to 2, and more preferably 1 (i.e., a methyl group), in order to further improve wear resistance. ２ The alkylene group in the formula (I) preferably has 1 to 5 carbon atoms, and more preferably 1 to 4 carbon atoms.

[0014] m1 is an integer of 0 to 3. From the viewpoint of further improving abrasion resistance, acid resistance, and hot water resistance, m1 is preferably an integer of 0 to 2, and more preferably an integer of 0 to 1. When m1 is 0, R １is represented by the following formula (2), and specifically, is TMS or tBu. ２ (CH ３ ) ３ - ... (2)

[0015] R １ Examples of the groups include the following: １ This is the bonding position with

[0016]

[0017] In formula (1), L １ is an alkylene group having 13 or more carbon atoms, and has between its carbon atoms -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ L may have one or more groups selected from the group consisting of -, and phenylene groups. １ When L is an alkylene group having 13 or more carbon atoms, it is possible to form a surface treatment layer that is excellent not only in acid resistance but also in hot water resistance and abrasion resistance. １ The number of carbon atoms in L may be 13 or more, and from the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer, it is preferably 15 or more, and more preferably 19 or more. １ The upper limit of the number of carbon atoms is not particularly limited, but may be, for example, 100 or less, and from the viewpoint of ease of production of compound (1), preferably 36 or less. The number of carbon atoms in the alkylene group does not include the carbon atoms in the above groups (for example, the carbon in -C(=O)O-).

[0018] L １ The alkylene group in L may be linear or branched. When branched, the branched chain preferably has 1 to 2 carbon atoms, more preferably 1 (i.e., a methyl group). On the other hand, from the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer, １ is preferably a straight chain alkylene group.

[0019] L １The alkylene group has, between carbon atoms, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, or -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and phenylene groups.

[0020] From the viewpoint of further improving the acid resistance, hot water resistance and abrasion resistance of the surface treatment layer, L １ The number of each of the above groups in L is preferably 0 to 2, and more preferably 0 to 1. １ When L has the above group, the group is preferably L １ T than the center １ It is preferable that it is located on the side of the

[0021] L １ is preferably a group represented by the following formula (3): ３ -L ３ -R ４ -**...(3) In formula (3), R ３ is a linear alkylene group having 6 or more carbon atoms, ４ is a single bond or a linear alkylene group having 1 to 6 carbon atoms; ３ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, ３ When is a single bond, R ４ is a single bond, and R ３ is a linear alkylene group having 13 or more carbon atoms; L ３ is other than a single bond, R ４ is a linear alkylene group having 1 to 6 carbon atoms, and R ３ and R ４The total number of carbon atoms in is 13 or more, and * is R １ is the bonding position of , and ** is T １ This is the bonding position with

[0022] L ３ When is a single bond, R ３ From the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer, the number of carbon atoms in R is preferably 13 or more, more preferably 15 or more, and even more preferably 17 or more. ３ The number of carbon atoms in L is preferably 36 or less. ３ In the case of various bonds other than a single bond, R ３ The number of carbon atoms in R is preferably 12 or more, more preferably 14 or more, and even more preferably 16 or more, from the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer. ４ The number of carbon atoms in L is preferably 2 to 6, more preferably 3 to 6, from the viewpoint of ease of production of compound (1). ３ is preferably a single bond from the viewpoint of further improving the acid resistance, hot water resistance, and abrasion resistance of the surface treatment layer.

[0023] L １ Examples of the groups include the following: １ is the bonding position of , and ** is T １ Each n1 is independently an integer of 5 or more, and preferably 32 or less.

[0024]

[0025] In formula (1), T １ is -Si(R １１ ) ｍ２ L ３－ｍ２ and R １１ are each independently a hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and m2 is an integer of 0 to 2.

[0026] R １１ are each independently a hydrocarbon group. １１Examples of the hydrocarbon group include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R １１ The hydrocarbon group represented by the formula (I) is more preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and even more preferably a methyl group.

[0027] Each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. A hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. That is, a hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si-OH through a hydrolysis reaction. The silanol groups further react with each other to form Si-O-Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0028] Examples of hydrolyzable groups include alkoxy groups, aryloxy groups, halogen atoms, acyl groups, acyloxy groups, dialkylamino groups, and isocyanato groups (-NCO). From the viewpoint of excellent reactivity, the alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.

[0029] In order to improve the storage stability of a liquid composition containing compound (1), L is preferably an alkoxy group having 5 or more carbon atoms, and among these, an alkoxy group having a tertiary carbon atom, a quaternary carbon atom, a trialkylsilyl group, or a polydimethylsiloxane group is preferred, and a group having a tBu group or a trimethylsilyl group is even more preferred. L may also be a group represented by the following formula (G1). Compound (1) having group (G1) tends to have a low melting point. -O-R １２ -M １ R １３ ３ ...(G1) However, R １２ is an alkylene group, (Si(CH ３ ) ２ O) ｍ３ , or an alkylene group and (Si(CH ３ ) ２ O) ｍ３ It is a combination of M １ is a carbon atom or a silicon atom, R １３ are each independently a hydrogen atom or an alkyl group which may have a branch, and R １３ At least two of the groups are alkyl groups which may have a branch; and m3 is an integer of 1 to 12.

[0030] R １２ The alkylene group in R may be linear or branched. １２ Specific examples of ２ Among these, a linear alkylene group is preferred. １３ The alkyl group in R may be linear or branched. １３ Specific examples of the group include -CH ３ , -CH ２ CH ３ , -CH ２ CH ２ CH ３ , -CH(CH ３ ) CH ２ C(CH ３ ) ３ , -CH ２ CH ２ CH (CH ３ ) CH ２C(CH ３ ) ３ Examples include:

[0031] R １２ and the alkylene group in (Si(CH ３ ) ２ O) ｍ３ As a combination with, for example, -R １４ -(Si(CH ３ ) ２ O) ｍ３ -, -(Si(CH ３ ) ２ O) ｍ３ -R １５ -, -R １４ -(Si(CH ３ ) ２ O) ｍ３ -R １５ -, where R １４ and R １５ are each independently an alkylene group, and specific examples include R ２ Among these, a straight chain alkylene group is preferred.

[0032] Said M １ R １３ ３ As the compound (1), CH(CH ３ ) ２ , C(CH ３ ) ３ or Si(CH ３ ) ３ may be.

[0033] Specific examples of the group (G1) include the following groups.

[0034]

[0035] The group having a hydrolyzable group may be, for example, any of the groups having a hydrolyzable group exemplified above. Ａ -L Ｂ is preferred. Ａ is an alkylene group, and L Ｂ is a hydrolyzable group. The alkylene group preferably has 1 to 10 carbon atoms. ＢThe hydrolyzable group represented by the formula (I) has the same meaning as the hydrolyzable group represented by L described above, and the preferred embodiments are also the same.

[0036] Among these, from the viewpoint of ease of production of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom. From the viewpoint of less outgassing during coating and superior storage stability of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms, and more preferably an ethoxy group or a methoxy group.

[0037] Each m2 is independently an integer of 0 to 2. m2 is preferably 0 or 1, and more preferably 0. The presence of a plurality of Ls strengthens the adhesion of the surface treatment layer to the substrate. When m2 is 1 or less, the plurality of Ls present in one molecule may be the same or different from each other. From the viewpoint of easy availability of raw materials and ease of production of the compound, it is preferable that the plurality of Ls are the same. When m2 is 2, the plurality of Rs present in one molecule １１ may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable to use a plurality of R １１ are preferably the same.

[0038] Compound (1) may be liquid or solid at 25°C. From the viewpoint of excellent storage stability of the surface treatment agent containing a liquid medium or the surface treatment agent containing a liquid medium described below, it is preferably liquid. By using compound (1) that is liquid at 25°C, the generation of foreign matter in the liquid composition is suppressed. On the other hand, from the viewpoint of excellent storage stability of compound (1) itself, it is preferable that compound (1) is solid at 25°C.

[0039] As a method for making compound (1) into a liquid at 25°C, for example, R １ and / or T １ Specifically, the L may be a group (G1), and the R １ In the formula, m1 may be set to 2 or 3.

[0040] The fact that compound (1) is a liquid is determined by the following test. Two test tubes, (a) and (b), marked with two lines A and B below, are prepared, and a sample is poured into each up to the height of the A line. One test tube (a) is sealed with a rubber stopper, and the other test tube (b) is sealed with a rubber stopper with a rod-shaped thermometer inserted through it. Test tubes (a) and (b) are placed upright in a thermostatic water bath with the B line below the water surface, and are maintained for 10 minutes after the thermometer in test tube (b) reaches the target temperature. After 10 minutes, test tube (a) is removed while still upright and immediately tilted horizontally on a table. The time from tilting test tube (a) until the tip of the sample liquid surface passes the B line is measured. If this measurement time is within 90 seconds, it is determined to be a liquid. The test tube used has an inner diameter of 30 mm and a height of 120 mm, with an A mark at a height of 55 mm from the bottom of the tube and a B mark at a height of 85 mm from the bottom of the tube.

[0041] Examples of compound (1) include the following compounds, but are not limited to these. １ R in １ The carbon atom at the side end is assigned the number "1" and L １ T in １ The carbon atom at the side end is L １ The number of carbon atoms (e.g., 13, 19, 21, etc.) constituting the group is indicated.

[0042]

[0043]

[0044] <Method for producing compound (1)> The method for producing compound (1) is not particularly limited, but an example thereof is a production method using a compound represented by the following formula (4) as a raw material: X １ -R ５ -CH=CH ２ ...(4) In formula (4), X １ is a halogen atom, preferably Br or Cl, R ５ represents the presence of -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) between carbon atoms. ２NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ -, and an alkylene group which may have one or more groups selected from a phenylene group. ５ is obtained by synthesizing compound (1) after L １ The number of carbon atoms is the desired L １ and the reaction pathway described below. Each synthesis step in the production method using compound (4) as a starting material will be described below. Examples of the synthesis pathway include a pathway in which Synthesis 1 described below is performed followed by Synthesis 3 described below, and a pathway in which Synthesis 2 described below is performed followed by Synthesis 3 described below. Details of the solvent, catalyst, heating temperature, etc. used in each of the syntheses described below can be appropriately selected with reference to the examples described below.

[0045] (Synthesis 1) Synthesis 1 is the compound (4) X １ R on the side １ Synthesis 1 is a method of introducing R. For example, the compound (4) is reacted with a compound represented by the following formula (5) to obtain a compound represented by the following formula (6). １ -CH ２ -MgX ２ …(5) R １ -CH ２ -R ５ -CH=CH ２ ... (6) In formula (5) and formula (6), R １ is the same as in the formula (1), and X ２ is a halogen atom, preferably Br or Cl, R ５ is the same as that in the formula (4). The above reaction 1 is １ R on the side １ This is a reaction that introduces

[0046] (Synthesis 2) Synthesis 2 is a method for synthesizing a compound (4) by adding R １ Synthesis 2 is carried out, for example, by combining the following Synthesis 2-1 to Synthesis 2-3.

[0047] Synthesis 2-1 For example, the compound (4) is reacted with a compound represented by the following formula (7) to obtain a compound represented by the following formula (8): SiH(X ３ ) ｍ１ (CH ３ ) ３－ｍ１ …(7) X １ -R ５ -CH ２ CH ２ -Si(X ３ ) ｍ１ (CH ３ ) ３－ｍ１ ... (8) In formula (7) and formula (8), X ３ is a halogen atom, preferably Br or Cl, m1 is the same as in the formula (1), X １ and R ５ is the same as in the above formula (4).

[0048] Synthesis 2-2 In the above compound (8), X ３ If there is an X, ３ By reacting with a compound represented by the following formula (9), a compound represented by the following formula (10) can be obtained. (CH ３ ) ３ Q １ -R ２ -MgX ４ …(9) X １ -R ５ -CH ２ CH ２ -Si[(CH ３ ) ３ Q １ -R ２ -] ｍ１ (CH ３ ) ３－ｍ１ ... (10) In the formulas (9) and (10), X ４ is a halogen atom, preferably Br or Cl, Q １ , R ２ , m1 is the same as in the formula (1), X １ and R ５ is the same as in the above formula (4). ３ ) ３ Q １ -R２ -] ｍ１ (CH ３ ) ３－ｍ１ is R in formula (1). １ is equivalent to

[0049] Synthesis 2-3: When m1 is 0, the above compound (8) or the above compound (10) is reacted with the following compound (11) to obtain the following compound (12): CH ２ =CH-R ６ -MgX ５ ... (11) CH ２ =CH-R ６ -R ５ -CH ２ CH ２ -R １ ... (12) In formula (11) and formula (12), X ５ is a halogen atom, preferably Br or Cl, R ５ is the same as in the formula (4), and R ６ represents the presence of -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) between carbon atoms. ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ -, and an alkylene group optionally having one or more groups selected from a phenylene group, １ is the same as in the formula (1). When compound (8) is used, R １ is Si(CH ３ ) ３ When compound (10) is used, R １ is Si[(CH ３ ) ３ Q １ -R ２ -] ｍ１ (CH ３ ) ３－ｍ１ is.

[0050] CH of the above compound (6) ２ -R ５ and R of the compound (12) ６ -R５ -CH ２ CH ２ L ２ In this case, the compound (6) and the compound (12) are both represented by the following formula (13). The compound (13) is a suitable precursor compound for producing the compound (1). １ -L ２ -CH=CH ２ ...(13) In formula (13), R １ is [(CH ３ ) ３ Q １ -R ２ -] ｍ１ Q ２ (CH ３ ) ３－ｍ１ - and Q １ and Q ２ are each independently C or Si, ２ are each independently an alkylene group having 1 to 6 carbon atoms, m1 is an integer of 0 to 3, and L ２ is an alkylene group having 11 or more carbon atoms, and between carbon atoms there is one of -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, or -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ L may have one or more bonds selected from the group consisting of -, and phenylene groups. ２ -CH=CH ２ is obtained by the following synthesis 3, L of compound 1 １ This is the part where

[0051] (Synthesis 3) Synthesis 3 is a method for introducing a reactive silyl group into the double bond of compound (13). For example, compound (1) can be obtained by reacting compound (13) with a compound represented by the following formula (14): HSi(R １１ ) ｍ２ L ３－ｍ２ ...(14) Each symbol in the formula (14) is the same as that in the formula (1) above.

[0052] [Composition] The composition of the present disclosure may contain the compound of the present disclosure, and components other than the compound of the present disclosure are not particularly limited. The composition of the present disclosure preferably contains the compound of the present disclosure and a liquid medium. When a liquid medium is contained, the composition of the present disclosure may be in a liquid state, and may be a solution or a dispersion. The composition of the present disclosure may contain the compound of the present disclosure, and may contain impurities such as by-products produced in the manufacturing process of the compound of the present disclosure.

[0053] The content of the compound of the present disclosure is preferably 0.001 to 40% by mass, more preferably 0.01 to 20% by mass, and even more preferably 0.1 to 10% by mass, relative to the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the compound of the present disclosure is preferably 0.01 to 10% by mass, more preferably 0.02 to 5% by mass, even more preferably 0.03 to 3% by mass, and particularly preferably 0.05 to 2% by mass, relative to the total amount of the composition of the present disclosure. The composition of the present disclosure may contain only one type of liquid medium, or two or more types.

[0054] The liquid medium is preferably an organic solvent.

[0055] Examples of organic solvents include compounds consisting of only hydrogen atoms and carbon atoms, and compounds consisting of only hydrogen atoms, carbon atoms, and oxygen atoms, and specific examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Among these, the organic solvent is preferably a hydrocarbon organic solvent or an ester organic solvent.

[0056] Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, and isophorone. Specific examples of ether organic solvents include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane.Specific examples of ester-based organic solvents include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monomethyl ether acetate, diethylene glycol Examples of the diol monoethyl ether acetate include propylene glycol monoethyl ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether acetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,3-butylene glycol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, and 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate.Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-tert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, and dipropylene glycol. Examples of the ethylene glycol dimethyl ether include dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, dipropylene glycol dimethyl ether pentane, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.Specific examples of alcohol-based organic solvents include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0057] Examples of the organic solvent include halogen-based organic solvents, nitrogen-containing compounds, sulfur-containing compounds, siloxane compounds, and fluorine-containing organic solvents.

[0058] Specific examples of halogen-based organic solvents include dichloromethane, chloroform, carbon tetrachloride, dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane.

[0059] Examples of the nitrogen-containing compound include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone.

[0060] Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide.

[0061] Examples of the siloxane compound include hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethyltrisiloxane, hexamethylcyclotrisiloxane, hexaethylcyclotrisiloxane, octamethylcyclotetrasiloxane, octaethylcyclotetrasiloxane, and decamethyltetrasiloxane.

[0062] Examples of the fluorine-containing organic solvent include polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C ６ F １３ CH ２ CH ３ (e.g., Asahiklin (registered trademark) AC-6000 manufactured by AGC Corporation), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Zeon Corporation); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C ３ F ７ OCH ３ ) (e.g., Novec™ 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C ４ F ９ O.C. ２ H ５ ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C ２ F ５ CF (OCH ３ ) C ３ F ７ ) (e.g., Novec™ 7300 manufactured by Sumitomo 3M Limited) and other alkyl perfluoroalkyl ethers (the perfluoroalkyl group and the alkyl group may be linear or branched), and CF ３ CH ２ OCF ２ CHF ２(for example, Asahiklin (registered trademark) AE-3000 manufactured by AGC Corporation); hydrofluoroolefins (HFOs) (for example, 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (for example, Amorea (registered trademark) AS-300 manufactured by AGC Corporation)).

[0063] The content of the liquid medium is preferably 60 to 99.999 mass%, more preferably 80 to 99.99 mass%, and even more preferably 90 to 99.9 mass%, based on the total amount of the composition of the present disclosure. In the case of a composition of the present disclosure used in a wet coating method, the content of the liquid medium is preferably 90 to 99.99 mass%, more preferably 95 to 99.98 mass%, even more preferably 97 to 99.97 mass%, and particularly preferably 98 to 99.95 mass%, based on the total amount of the composition of the present disclosure.

[0064] The composition of the present disclosure may contain other components in addition to the compound and liquid medium of the present disclosure, as long as the effects of the present disclosure are not impaired. Examples of other components include additives, and specific examples include catalysts such as acid catalysts and base catalysts that promote the hydrolysis and condensation reaction of reactive silyl groups.

[0065] Examples of the catalyst that can be used include any appropriate acid or base, transition metals (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having an unshared electron pair in their molecular structure, and nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, and urea compounds). Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine and diethylamine.

[0066] Other components also include metal compounds having a hydrolyzable group (hereinafter also referred to as "specific metal compounds"). When the composition of the present disclosure contains a specific metal compound, the slip properties and antifouling properties of the surface treatment layer can be further improved. Examples of the specific metal compounds include metal compounds represented by any of formulas (M1) to (M3).

[0067] M (X ｂ１ ) ｍ１１ (X ｂ２ ) ｍ１２ (X ｂ３ ) ｍ１３ ... (M1) Si (X ｂ４ ) (X ｂ５ ) ３ ... (M2) (X ｂ６ ) ３ Si-(Y ｂ１ )-Si(X ｂ７ ) ３ …(M3)

[0068] In formula (M1), M is a trivalent or tetravalent metal atom, and X ｂ１ are each independently a hydrolyzable group, ｂ２ are each independently a siloxane skeleton-containing group, ｂ３ are each independently a hydrocarbon chain-containing group, m11 is an integer of 2 to 4, m12 and m13 are each independently an integer of 0 to 2, and when M is a trivalent metal atom, m11 + m12 + m13 is 3, and when M is a tetravalent metal atom, m11 + m12 + m13 is 4.

[0069] In formula (M2), X ｂ４ is a hydrolyzable silane oligomer residue, and X ｂ５ are each independently a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0070] In formula (M3), X ｂ６ and X ｂ７ are each independently a hydrolyzable group or a hydroxyl group, and Y ｂ１ is a divalent organic group.

[0071] In formula (M1), the metal represented by M also includes semimetals such as Si and Ge. M is preferably a trivalent metal or a tetravalent metal, more preferably Al, Fe, In, Hf, Si, Ti, Sn, or Zr, still more preferably Al, Si, Ti, or Zr, and particularly preferably Si.

[0072] In formula (M1), X ｂ１ The hydrolyzable group represented by the formula (1) has the same meaning as the hydrolyzable group represented by L in the formula (1), and the preferred embodiments are also the same.

[0073] X ｂ２ The siloxane skeleton-containing group represented by the formula (I) has a siloxane unit (—Si—O—) and may be either linear or branched. Examples of the siloxane unit include a dialkylsilyloxy group, such as a dimethylsilyloxy group or a diethylsilyloxy group. The number of repeating siloxane units in the siloxane skeleton-containing group is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. The siloxane skeleton-containing group may contain a divalent hydrocarbon group as part of the siloxane skeleton. Specifically, some oxygen atoms in the siloxane skeleton may be replaced with a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include alkylene groups such as methylene, ethylene, propylene, and butylene. A hydrolyzable group, a hydrocarbon group (preferably an alkyl group), or the like may be bonded to the terminal silicon atom of the siloxane skeleton-containing group. The number of elements in the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. The upper limit of the number of elements is preferably 10 or more. Examples of the siloxane skeleton-containing group include *-(O-Si(CH ３ ) ２ ) ｎ CH ３ In this case, n is an integer of 1 to 5, and * represents a bonding site with an adjacent atom.

[0074] X ｂ３The hydrocarbon chain-containing group represented by the formula (I) may be a group consisting of only a hydrocarbon chain, or may be a group having an etheric oxygen atom between carbon atoms in the hydrocarbon chain. The hydrocarbon chain may be linear or branched, with linear being preferred. The hydrocarbon chain may be saturated or unsaturated, with saturated hydrocarbon chain being preferred. The hydrocarbon chain-containing group preferably has 1 to 3 carbon atoms, more preferably 1 to 2, and even more preferably 1. The hydrocarbon chain-containing group is preferably an alkyl group, more preferably a methyl group, an ethyl group, or a propyl group.

[0075] Preferably, m1 is 3 or 4.

[0076] The compound represented by formula (M1) is preferably a compound represented by any one of formulas (M1-1) to (M1-5) in which M is Si, and more preferably a compound represented by formula (M1-1). The compound represented by formula (M1-1) is preferably tetraethoxysilane, tetramethoxysilane, or triethoxymethylsilane.

[0077] Si(X ｂ１ ) ４ ... (M1-1) CH ３ -Si(X ｂ１ ) ３ …(M1-2) C ２ H ５ -Si(X ｂ１ ) ３ ...(M1-3) n-C ３ H ７ -Si(X ｂ１ ) ３ ...(M1-4) (CH ３ ) ２ CH—Si(X ｂ１ ) ３ …(M1-5)

[0078] In formula (M2), X ｂ４The number of silicon atoms contained in the hydrolyzable silane oligomer residue represented by the formula (I) is preferably 3 or more, more preferably 5 or more, and even more preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less. The hydrolyzable silane oligomer residue may have an alkoxy group bonded to a silicon atom. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, with a methoxy group or an ethoxy group being preferred. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one type. Examples of the hydrolyzable silane oligomer residue include (C ２ H ５ O) ３ Si-(OSi(OC) ２ H ５ ) ２ ) ４ O-*, etc. Here, * represents a bonding site with an adjacent atom.

[0079] In formula (M2), X ｂ５ Examples of the hydrolyzable group represented by X include the same hydrolyzable group represented by L in the above formula (1-1), a cyano group, a hydrogen atom, and an allyl group, and an alkoxy group or an isocyanato group is preferred. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. X ｂ５ As the group, a hydrolyzable group is preferred.

[0080] The compound represented by formula (M2) includes (H ５ C ２ O) ３ -Si-(OSi(OC) ２ H ５ ) ２ ) ４ O.C. ２ H ５ etc.

[0081] The compound represented by formula (M3) is a compound having reactive silyl groups at both ends of a divalent organic group, i.e., a bissilane. ｂ６ and X ｂ７Examples of the hydrolyzable group represented by formula (M3) include an alkoxy group, an acyloxy group, a ketoxime group, an alkenyloxy group, an amino group, an aminoxy group, an amide group, an isocyanato group, and a halogen atom, and an alkoxy group or an isocyanato group is preferred. As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferred, and a methoxy group or an ethoxy group is more preferred. In formula (M3), X ｂ６ and X ｂ７ may be the same group or different groups. ｂ６ and X ｂ７ are preferably the same group.

[0082] In formula (M3), Y ｂ１ is a divalent organic group that connects the reactive silyl groups at both ends. ｂ１ The number of carbon atoms in Y is preferably 1 to 8, and more preferably 1 to 3. ｂ１ Examples of the alkylene group include an alkylene group, a phenylene group, and an alkylene group having an etheric oxygen atom between carbon atoms. ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ C(CH ３ ) ２ CH ２ -, -C(CH ３ ) ２ CH ２ CH ２ C(CH ３ ) ２ -, -CH ２ CH ２ OCH ２ CH２ -, -CH ２ CH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH(CH ３ ) CH ２ OCH ２ CH (CH ３ ) - and -C ６ H ４ - are listed.

[0083] The compound represented by formula (M3) includes (CH ３ O) ３ Si(CH ２ ) ２ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ２ Si(OC ２ H ５ ) ３ , (OCN) ３ Si(CH ２ ) ２ Si(NCO) ３ , Cl ３ Si(CH ２ ) ２ SiCl ３ , (CH ３ O) ３ Si(CH ２ ) ６ Si(OCH ３ ) ３ , and (C ２ H ５ O) ３ Si(CH ２ ) ６ Si(OC ２ H ５ ) ３ Examples include:

[0084] The content of other components that may be included in the composition of the present disclosure is preferably 10% by mass or less, and more preferably 1% by mass or less, relative to the total amount of the composition of the present disclosure. When the composition of the present disclosure contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, relative to the total amount of the composition of the present disclosure.

[0085] The total content of the compound of the present disclosure and other components (hereinafter also referred to as "solid content concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the composition of the present disclosure. The solid content concentration of the composition of the present disclosure is a value calculated from the mass of the composition before heating and the mass after heating for 4 hours in a convection dryer at 120°C.

[0086] The composition of the present disclosure contains a liquid medium, and is therefore useful for coating applications and can be used as a coating liquid.

[0087] Other components include a compound represented by the following formula (15): [Y １ ３ Y ２ -(O) ｖ１ -Y ３ ] ｖ２ Y ４ (Si(Y ５ ) ｖ３ (Y ６ ) ３－ｖ３ ) ｖ４ ...(15) In formula 15, Y ２ is Si, Sn, or Ge, and Y １ are each independently a hydrocarbon group or a trialkylsilyloxy group, v1 is 0 or 1, and Y ３ are each independently an alkylene chain or a polyalkylene oxide chain, or a combination of an alkylene chain and a divalent polysiloxane residue; Y ４ represents a single bond or a (v2+v4)-valent linking group, and Y ５ are each independently a hydrocarbon group; ６are each independently a hydrolyzable group or a hydroxyl group; v3 is each independently an integer of 0 to 2; and v2 and v4 are each independently an integer of 1 or more.

[0088] Compound (15) includes Y ３ is an alkylene chain or a polyalkylene oxide chain. Specific examples of compound (15) include the following compounds: In the formula, γ is preferably 9 to 50, more preferably 11 to 30, and particularly preferably 11 to 25.

[0089]

[0090] When the other component in the present surface treatment agent is compound (15), the content of compound (15) is preferably 50 mass % or less, more preferably 40 mass % or less.

[0091] [Surface Treatment Agent] In one embodiment, the surface treatment agent of the present disclosure contains the compound of the present disclosure. Alternatively, the surface treatment agent of the present disclosure may contain the compound of the present disclosure and a liquid medium. The surface treatment agent of the present disclosure may be the composition of the present disclosure. A preferred embodiment of the liquid medium contained in the surface treatment agent of the present disclosure is the same as a preferred embodiment of the liquid medium contained in the composition of the present disclosure.

[0092] [Article] In one embodiment, the article of the present disclosure includes a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent of the present disclosure.

[0093] The surface treatment layer may be formed on a part of the surface of the substrate, or may be formed on the entire surface of the substrate. The surface treatment layer may be spread in the form of a film on the surface of the substrate, or may be scattered in the form of dots. In the surface treatment layer, the compound of the present disclosure is contained in a state in which hydrolysis of some or all of the reactive silyl groups has progressed and dehydration condensation reaction of the silanol groups has progressed.

[0094] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0095] The type of substrate is not particularly limited, and examples thereof include substrates that are required to be water-repellent. Examples of substrates include substrates that may be used by contacting other articles (e.g., stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., a mounting table). Examples of substrate materials include metal, resin, glass, sapphire, ceramic, semiconductor, stone, fiber, nonwoven fabric, paper, wood, fur, natural leather, artificial leather, ceramics, and composite materials thereof. Glass may be chemically strengthened.

[0096] Examples of the substrate include glass or resin used for building materials, decorative building materials, interior goods, transportation equipment (e.g., automobiles), signs, bulletin boards, drinking vessels, tableware, aquariums, ornamental equipment (e.g., frames, boxes), laboratory equipment, furniture, textile products, packaging containers, art, sports, games, etc., and glass or resin used for the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, remote controls, etc. The shape of the substrate may be a plate or a film.

[0097] The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The material of the substrate for a touch panel is preferably glass or a transparent resin.

[0098] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the surface treatment layer and further improved abrasion resistance of the surface treatment layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the surface treatment layer. Furthermore, when a base layer described below is provided on the surface-treated substrate, it has better adhesion to the base layer and further improved abrasion resistance of the surface treatment layer. Therefore, when a base layer is provided, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the base layer.

[0099] The surface treatment layer may be provided directly on the surface of the substrate, or a primer layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a primer layer disposed on the substrate, and a surface treatment layer surface-treated with the surface treatment agent of the present disclosure, disposed on the primer layer.

[0100] The underlayer is preferably a layer containing an oxide containing silicon and at least one specific element selected from the group consisting of Group 1 elements, Group 2 elements, Group 4 elements, Group 5 elements, Group 13 elements, and Group 15 elements of the periodic table.

[0101] The Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. As the Group 1 elements, lithium, sodium, and potassium are preferred, and sodium and potassium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 1 elements.

[0102] The Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. As the Group 2 elements, magnesium, calcium, and barium are preferred, and magnesium and calcium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 2 elements.

[0103] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. As the Group 4 elements, titanium and zirconium are preferred, and titanium is more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 4 elements.

[0104] The Group 5 elements of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. As the Group 5 element, vanadium is particularly preferred from the viewpoint of providing a surface treatment layer with better abrasion resistance. The underlayer may contain two or more Group 5 elements.

[0105] The Group 13 elements of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As the Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of enabling the surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 13 elements.

[0106] The Group 15 elements of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 elements, phosphorus, antimony, and bismuth are preferred, and phosphorus and bismuth are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 15 elements.

[0107] As the specific element contained in the underlayer, Group 1 elements, Group 2 elements, and Group 13 elements are preferred because they provide better abrasion resistance to the surface treatment layer, and Group 1 elements and Group 2 elements are more preferred, with Group 1 elements being even more preferred. The specific element may contain only one type of element or two or more types of elements.

[0108] The oxide contained in the underlayer may be a mixture of oxides of the above elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), a composite oxide containing two or more of the above elements, or a mixture of an oxide of the above elements alone and a composite oxide.

[0109] From the viewpoint of achieving superior abrasion resistance of the surface treatment layer, the ratio of the total molar concentration of the specific elements in the underlayer to the molar concentration of silicon in the underlayer (specific elements / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80. The molar concentrations (mol %) of each element in the underlayer can be measured, for example, by depth profile analysis by X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0110] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the above lower limit, the adhesion of the underlayer to the surface treatment layer is further improved, and the surface treatment layer has better abrasion resistance. When the thickness of the underlayer is equal to or less than the above upper limit, the underlayer itself has excellent abrasion resistance. The thickness of the underlayer is measured by observing the cross section of the underlayer using a transmission electron microscope (TEM).

[0111] The underlayer can be formed by, for example, a vapor deposition method using a vapor deposition material or a wet coating method.

[0112] The deposition material used in the deposition method preferably contains an oxide containing silicon and a specific element. Specific examples of the form of the deposition material include powder, melt, sintered body, granules, and crushed body, with melt, sintered body, and granules being preferred from the viewpoint of ease of handling. Here, the melt refers to a solid obtained by melting the powder of the deposition material at a high temperature and then cooling and solidifying it. The sintered body refers to a solid obtained by firing the powder of the deposition material. If necessary, a molded body obtained by pressing the powder may be used instead of the powder of the deposition material. The granule refers to a solid obtained by kneading the powder of the deposition material with a liquid medium (e.g., water, organic solvent) to obtain particles, and then drying the particles.

[0113] The vapor deposition material can be produced by, for example, the following methods: A method of mixing silicon oxide powder with a powder of an oxide of a specific element to obtain a vapor deposition material powder. A method of kneading the vapor deposition material powder with water to obtain particles, and then drying the particles to obtain granules of the vapor deposition material. A method of mixing a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel), a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element), and water, drying the mixture, and then firing the dried mixture or a compact obtained by pressing the dried mixture to obtain a sintered body. A method of melting a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel) and a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element) at a high temperature, and then cooling and solidifying the melt to obtain a melt.

[0114] A specific example of a vapor deposition method using a vapor deposition material is a vacuum vapor deposition method. The vacuum vapor deposition method is a method in which a vapor deposition material is evaporated in a vacuum chamber and attached to the surface of a substrate. The temperature during vapor deposition (for example, the temperature of the boat in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the pressure in the chamber in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming an underlayer using a vapor deposition material, one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used.

[0115] Specific examples of evaporation methods for the deposition material include a resistance heating method, in which the deposition material is melted and evaporated on a resistance heating boat made of a high-melting-point metal, and an electron gun method, in which the deposition material is irradiated with an electron beam to directly heat the deposition material, melting and evaporating the surface. The electron gun method is preferred as an evaporation method for the deposition material because it can evaporate high-melting-point substances due to its ability to locally heat the material, and because areas not irradiated by the electron beam are at low temperatures, eliminating the risk of reaction with the container or the inclusion of impurities. The evaporation method for the deposition material may use multiple boats, or all of the deposition materials may be placed in a single boat. The deposition method may be co-evaporation or alternating deposition. Specific examples include mixing silica and a specific source in the same boat, co-evaporating silica and a specific element source in separate boats, or similarly alternately depositing them in separate boats. The deposition conditions, order, etc., are appropriately selected depending on the composition of the underlayer.

[0116] In the wet coating method, it is preferable to form an undercoat layer on a substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0117] Specific examples of the silicon compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0118] Specific examples of compounds containing a specific element include oxides of the specific element, alkoxides of the specific element, carbonates of the specific element, sulfates of the specific element, nitrates of the specific element, oxalates of the specific element, and hydroxides of the specific element.

[0119] Examples of the liquid medium include the same liquid medium as that contained in the composition of the present disclosure.

[0120] The content of the liquid medium is preferably 0.01 to 20% by mass, more preferably 0.1 to 10% by mass, based on the total amount of the coating liquid used to form the underlayer.

[0121] Specific examples of wet coating methods for forming the underlayer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0122] After wet-coating the coating liquid, it is preferable to dry the coating film. The drying temperature for the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.

[0123] The article of the present disclosure may be an optical material having a surface treatment layer as the outermost layer. Examples of the optical material include optical materials related to displays and the like, as well as a wide variety of other optical materials. Examples of the optical material include displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic electroluminescent displays, inorganic thin-film electroluminescent dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), as well as protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0124] The article of the present disclosure is preferably an optical component. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. Examples of optical components include front protective plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MO discs; optical fibers; and the display surfaces of watches. In particular, the article of the present disclosure is preferably a display or a touch panel.

[0125] The article of the present disclosure may be a medical device or a medical material. The article of the present disclosure may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0126] When the article of the present disclosure is an optical component, the material constituting the surface of the substrate is a material for optical components, such as glass or transparent plastic. When the article of the present disclosure is an optical component, a functional layer such as a hard coat layer or an anti-reflection layer may be formed on the surface (outermost layer) of the substrate. The anti-reflection layer may be either a single-layer anti-reflection layer or a multi-layer anti-reflection layer. Examples of inorganic materials that can be used for the anti-reflection layer include SiO ２ , SiO, ZrO ２ , TiO ２ , TiO, Ti ２ O ３ , Ti ２ O ５ , Al ２ O ３ , Ta ２ O ５ , Ta ３ O ５, Nb ２ O ５ , HfO ２ , Si ３ N ４ , CeO ２ , MgO, Y ２ O ３ , SnO ２ , MgF ２ , and W.O. ３ These inorganic substances may be used alone or in combination of two or more (for example, as a mixture). When a multi-layer antireflection layer is formed, the outermost layer may contain SiO ２ and / or SiO is preferably used. When the article of the present disclosure is an optical glass component for a touch panel, a transparent electrode, for example, a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). Furthermore, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomization film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like, depending on its specific specifications.

[0127] [Method for manufacturing an article] The method for manufacturing an article according to the present disclosure is, for example, a method for manufacturing an article having a surface-treated layer formed on a substrate by performing a surface treatment on a substrate using the surface treatment agent according to the present disclosure. Examples of the surface treatment include a dry coating method and a wet coating method.

[0128] Dry coating methods include vacuum deposition, CVD, sputtering, and the like. Vacuum deposition is preferred as a dry coating method from the viewpoints of suppressing compound decomposition and simplifying the equipment. For vacuum deposition, a pellet-shaped substance may be used in which a metal porous body such as iron or steel is impregnated with the compound of the present disclosure. A composition containing the compound of the present disclosure and a liquid medium may be impregnated into a metal porous body such as iron or steel, and the liquid medium may be dried to use a pellet-shaped substance impregnated with the compound of the present disclosure. When a pellet-shaped substance is used, the molecular mobility of a compound that is solid at 25°C is lower, so deterioration of storage stability due to hydrolysis and condensation reactions is suppressed.

[0129] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0130] In order to improve the abrasion resistance of the surface treatment layer, an operation to promote the reaction between the compound of the present disclosure and the substrate may be performed as necessary. Examples of such an operation include heating, humidification, and light irradiation. For example, the substrate on which the surface treatment layer is formed can be heated in a humid atmosphere to promote reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds through the condensation reaction of silanol groups. After surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Examples of removal methods include pouring a solvent over the surface treatment layer and wiping with a cloth soaked in the solvent.

[0131] The present invention will be described in more detail below using examples, but the present invention is not limited to these examples. Examples 1 to 9 are working examples, and Examples 10 to 16 are comparative examples.

[0132] Synthesis Example 1 Synthesis of Compound (1a) Tetrahydrofuran (THF) (10 g) and copper(II) chloride (0.05 g) were added to 18-bromo-1-octadecene (1.0 g) and stirred at 25° C., and then a diethyl ether solution (1.0 mol / L) (10 mL) of 2,2-dimethylpropyl magnesium chloride was added, followed by stirring for 24 hours at 60° C. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.6 g of compound (1a).

[0133]

[0134] NMR of compound (1a) 1H-NMR (400 MHz, CDCl3) δ 5.80 (ddt, J = 17.2, 10.3, 7.0 Hz, 1H), 5.24 - 4.79 (m, 2H), 2.03 (tdt, J = 7.9, 6.9, 1.1 Hz, 2H), 1.53 - 1.10 (m, 32H), 0.85 (s, 9H).

[0135] Synthesis Example 2 Synthesis of Compound (I) To a solution of compound (1a) (0.6 g) in dichloromethane (10 g) was added a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g), followed by stirring for 2 hours at 50° C. The solvent was distilled off under reduced pressure to obtain 0.9 g of compound (I).

[0136]

[0137] NMR of Compound (I) 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 9H), 1.61 - 1.04 (m, 36H), 0.85 (s, 9H), 0.65 (t, J = 9.2 Hz, 2H).

[0138] Synthesis Example 3 Synthesis of Compound (2a) THF (10 g) and copper(II) chloride (0.05 g) were added to 18-bromo-1-octadecene (1.0 g) and stirred at 25° C., and then a diethyl ether solution (1.0 mol / L) (10 mL) of trimethylsilylmethylmagnesium chloride was added, followed by stirring for 24 hours at 60° C. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.5 g of compound (2a).

[0139]

[0140] NMR of compound (2a) 1H-NMR (400 MHz, CDCl3) δ 5.82 (ddt, J = 17.0, 10.2, 6.7 Hz, 1H), 5.19 - 4.75 (m, 2H), 2.04 (dt, J = 8.0, 6.7 Hz, 2H), 1.53 - 1.10 (m, 30H), 0.60 - 0.27 (m, 2H), -0.03(s, 9H)

[0141] Synthesis Example 4 Synthesis of Compound (II) To a solution of compound (2a) (0.5 g) in dichloromethane (10 g) was added a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g), followed by stirring for 2 hours at 50° C. The solvent was distilled off under reduced pressure to obtain 0.7 g of compound (II).

[0142]

[0143] NMR of Compound (II) 1 H-NMR (400 MHz, CDCl3) δ 3.57 (s, 9H), 1.53 - 1.05 (m, 34H), 0.74 - 0.59 (m, 2H), 0.47 (t, J = 7.3 Hz, 2H), -0.03(s, 9H)

[0144] Synthesis Example 5 Synthesis of Compound (3a) THF (10 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), and chlorodimethylsilane (10 g) were added to 18-bromo-1-octadecene (10 g), and the mixture was stirred for 24 hours at 25° C. Low-boiling point components were distilled off under reduced pressure to obtain 12 g of compound (3a).

[0145]

[0146] NMR of compound (3a) 1H-NMR (400 MHz, CDCl3) δ 3.40 (t, J = 6.9 Hz, 2H), 1.92 - 1.74 (m, 2H), 1.46 - 1.06 (m, 30H), 0.88 - 0.71 (m, 2H), 0.40 (s, 6H).

[0147] Synthesis Example 6 Synthesis of Compound (3b) THF (10 g) and a THF solution (1.0 mol / L) (40 mL) of methylmagnesium chloride were added to compound (3a) (12 g), and the mixture was stirred for 1 hour at 25° C. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 8 g of compound (3b).

[0148]

[0149] NMR of compound (3b) 1 H-NMR (400 MHz, CDCl3) δ 3.41 (t, J = 6.9 Hz, 2H), 1.85 (p, J = 7.0 Hz, 2H), 1.46 - 1.06 (m, 30H), 0.47 (t, J = 7.6 Hz, 2H), -0.03(s, 9H).

[0150] Synthesis Example 7 Synthesis of Compound (3c) THF (10 g), a THF solution of allyl magnesium chloride (1.0 mol / L) (5 mL), and copper(II) chloride (0.05 g) were added to compound (3b) (1 g), and the mixture was stirred for 24 hours at 60° C. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.6 g of compound (3c).

[0151]

[0152] NMR of compound (3c) 1H-NMR (400 MHz, CDCl3) δ 5.81 (ddt, J = 16.9, 10.2, 6.7 Hz, 1H), 5.10 - 4.77 (m, 2H), 2.11 - 1.82 (m, 2H), 1.46 - 1.06 (m, 34H), 0.48 (d, J = 8.0 Hz, 2H), -0.03(s, 9H).

[0153] Synthesis Example 8 Synthesis of Compound (III) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (3c) (0.6 g) dissolved in dichloromethane (10 g), and the mixture was stirred for 2 hours at 50° C. The solvent was distilled off under reduced pressure to obtain 0.8 g of compound (III).

[0154]

[0155] NMR of Compound (III) 1 H-NMR (400 MHz, CDCl3) δ 3.57 (s, 9H), 1.46 - 1.06 (m, 38H), 0.75 - 0.57 (m, 2H), 0.47 (t, J = 7.7 Hz, 2H), -0.03(s, 9H).

[0156] Synthesis Example 9 Synthesis of Compound (4a) THF (20 g) and magnesium (1.1 g) were added to 11-bromo-1-undecene (10 g) and the mixture was stirred at 60°C for 2 hours. The reaction solution was filtered to obtain 30 g of compound (4a). The concentration of the product was confirmed to be 0.8 mol / L by titration with 1,10-phenanthroline.

[0157]

[0158] Synthesis Example 10 Synthesis of Compound (4b) THF (10 g), compound (4a) (0.8 mol / L) (10 mL), and copper(II) chloride (0.05 g) were added to compound (3b) (1 g), and the mixture was stirred for 24 hours at 60° C. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using 10% silver nitrate silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.4 g of compound (4b).

[0159]

[0160] NMR of compound (4b) 1 H-NMR (400 MHz, CDCl3) δ 5.82 (ddt, J = 16.9, 10.2, 6.7 Hz, 1H), 5.09 - 4.78 (m, 2H), 2.04 (q, J = 7.1 Hz, 2H), 1.46 - 1.06 (m, 50H), 0.47 (t, J = 7.7 Hz, 2H), -0.03(s, 9H).

[0161] Synthesis Example 11 Synthesis of Compound (IV) To a solution of compound (4b) (0.4 g) in dichloromethane (10 g) was added a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g), followed by stirring for 2 hours at 50° C. The solvent was distilled off under reduced pressure to obtain 0.5 g of compound (IV).

[0162]

[0163] NMR of Compound (IV) 1 H-NMR (400 MHz, CDCl3) δ 3.57 (s, 9H), 1.46 - 1.06 (m, 54H), 0.72 - 0.59 (m, 2H), 0.48 (d, J = 8.0 Hz, 2H), -0.03(s, 9H).

[0164] Synthesis Example 12 Synthesis of Compound (5a) THF (40 g) and magnesium (0.9 g) were added to 18-bromo-1-octadecene (10 g) and the mixture was stirred at 60°C for 2 hours. The reaction solution was filtered to obtain 50 g of compound (5a). The concentration of the product was confirmed to be 0.4 mol / L by titration with 1,10-phenanthroline.

[0165]

[0166] Synthesis Example 13 Synthesis of Compound (5b) THF (10 g), compound (5a) (0.4 mol / L) (20 mL), and copper(II) chloride (0.05 g) were added to compound (3b) (1 g), and the mixture was stirred for 24 hours at 60° C. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using 10% silver nitrate silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.4 g of compound (5b).

[0167]

[0168] NMR of compound (5b) 1 H-NMR (400 MHz, CDCl3) δ 5.80 (ddt, J = 17.2, 10.2, 7.0 Hz, 1H), 5.21 - 4.83 (m, 2H), 2.03 (tdt, J = 7.8, 6.8, 1.1 Hz, 2H), 1.49 - 1.05 (m, 64H), 0.58 (t, J = 8.5 Hz, 2H), -0.03 (s, 9H).

[0169] Synthesis Example 14 Synthesis of Compound (V) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (5b) (0.4 g) dissolved in dichloromethane (10 g), and the mixture was stirred for 2 hours at 50° C. The solvent was distilled off under reduced pressure to obtain 0.4 g of compound (V).

[0170]

[0171] NMR of Compound (V) 1H-NMR (400 MHz, CDCl3) δ 3.59 (s, 9H), 1.46 - 1.06 (m, 68H), 0.72 - 0.59 (m, 2H), 0.53 - 0.38 (m, 2H), -0.03(s, 9H).

[0172] Synthesis Example 15 Synthesis of Compound (6a) THF (10 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), and dichloromethylsilane (10 g) were added to 18-bromo-1-octadecene (10 g), and the mixture was stirred for 24 hours at 25° C. Low-boiling point components were distilled off under reduced pressure to obtain 13 g of compound (6a).

[0173]

[0174] NMR of compound (6a) 1 H-NMR (400 MHz, CDCl3) δ 3.41 (t, J = 6.9 Hz, 2H), 1.85 (p, J = 7.0 Hz, 2H), 1.57 - 1.02 (m, 32H), 0.77 (s, 3H).

[0175] Synthesis Example 16 Synthesis of Compound (6b) THF (10 g) and a diethyl ether solution (1.0 mol / L) (10 mL) of trimethylsilylmethylmagnesium chloride were added to compound (6a) (1 g), and the mixture was stirred for 2 hours at 10° C. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.8 g of compound (6b).

[0176]

[0177] NMR of compound (6b) 1H-NMR (400 MHz, CDCl3) δ 3.41 (t, J = 6.9 Hz, 2H), 1.85 (dt, J = 14.4, 7.0 Hz, 2H), 1.57 - 1.02 (m, 30H), 0.61 - 0.40 (m, 2H), 0.06 (s, 21H), -0.20 - -0.38 (m, 4H).

[0178] Synthesis Example 17 Synthesis of Compound (6c) THF (10 g), a THF solution of allyl magnesium chloride (1.0 mol / L) (5 mL), and copper(II) chloride (0.05 g) were added to compound (6b) (0.8 g), and the mixture was stirred for 24 hours at 60° C. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.6 g of compound (6c).

[0179]

[0180] NMR of compound (6c) 1 H-NMR (400 MHz, CDCl3) δ 5.80 (ddt, J = 17.8, 10.6, 7.4 Hz, 1H), 5.19 - 4.77 (m, 2H), 1.98 (dt, J = 7.5, 1.3 Hz, 2H), 1.57 - 1.02 (m, 34H), 0.49 (d, J = 9.8 Hz, 2H), 0.06 (s, 21H), -0.28 (d, J = 1.7 Hz, 4H).

[0181] Synthesis Example 18 Synthesis of Compound (VI) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (6c) (0.6 g) dissolved in dichloromethane (10 g), and the mixture was stirred for 2 hours at 50° C. The solvent was distilled off under reduced pressure to obtain 0.7 g of compound (VI).

[0182]

[0183] NMR of Compound (VI) 1H-NMR (400 MHz, CDCl3) δ 3.56 (s, 9H), 1.38 - 0.96 (m, 38H), 0.65 - 0.35 (m, 4H), 0.15 - -0.07 (m, 21H), -0.28 (d, J = 1.7 Hz, 4H).

[0184] Synthesis Example 19 Synthesis of Compound (XIV) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), triacetoxymethylsilane (3 mg), and trichlorosilane (0.6 g) were added to compound (5b) (0.4 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 30° C. for 2 hours. The solvent was evaporated under reduced pressure, and then 2-(trimethylsilyl)ethanol (3.0 g), triethylamine (3.0 g), and dichloromethane (10 g) were added, and the mixture was stirred at 30° C. for 2 hours. The solvent was evaporated under reduced pressure, and then flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.7 g of compound (XIV).

[0185]

[0186] NMR of compound (XIV) 1 H-NMR (400 MHz, CDCl3) δ 4.08 - 3.58 (m, 6H), 1.47 - 0.78 (m, 60H), 0.70 - 0.54 (m, 2H), 0.46 (t, J = 7.3 Hz, 2H), -0.06 (s, 36H).

[0187] Synthesis Example 20 Synthesis of Compound (XV) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), triacetoxymethylsilane (3 mg), and trichlorosilane (0.6 g) were added to compound (5b) (0.4 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 30° C. for 2 hours. The solvent was evaporated under reduced pressure, and then ethanol (3.0 g), triethylamine (3.0 g), and dichloromethane (10 g) were added, and the mixture was stirred at 30° C. for 2 hours. The solvent was evaporated under reduced pressure, and then flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.6 g of compound (XV).

[0188]

[0189] NMR of compound (XV) 1 H-NMR (400 MHz, CDCl3) δ 3.82 (q, J = 7.0 Hz, 6H), 1.24 (d, J = 10.0 Hz, 63H), 0.70 - 0.56 (m, 2H), 0.47 (t, J = 7.7 Hz, 2H) -0.06 (s, 9H).

[0190] Synthesis Example 21 Synthesis of Compound (XVI) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), triacetoxymethylsilane (3 mg), and trichlorosilane (0.6 g) were added to compound (5b) (0.4 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 30° C. for 2 hours. The solvent was evaporated under reduced pressure, and then 3,3-dimethyl-1-butanol (3.0 g), triethylamine (3.0 g), and dichloromethane (10 g) were added, and the mixture was stirred at 30° C. for 2 hours. The solvent was evaporated under reduced pressure, and then flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.7 g of compound (XVI).

[0191]

[0192] NMR of compound (XVI) 1H-NMR (400 MHz, CDCl3) δ 3.68 (t, J = 8.1 Hz, 6H), 1.60 (t, J = 8.2 Hz, 6H), 1.50 - 0.42 (m, 85H), -0.13 (s, 9H).

[0193] Synthesis Example 22: Synthesis of compound (VII) The following compound (VII) was obtained by the method described in WO 2023 / 017830. The average number of repeating units, n, was 17.

[0194]

[0195] [Compound (VIII) and Compound (IX)] The following commercially available compounds were used as Compound (VIII) and Compound (IX): The average number n of repeating units of Compound (VIII) is 62.

[0196]

[0197]

[0198] Synthesis Example 23 Synthesis of Compound (10a) THF (10 g) and a diethyl ether solution (1.0 mol / L) (4 mL) of methyllithium were added to tris(trimethylsilyl)methane (1.0 g) and stirred at 50° C. for 1 hour, and then 18-bromo-1-octadecene (1.0 g) was added and stirred at 50° C. for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.3 g of compound (10a).

[0199]

[0200] NMR of compound (10a) 1 H-NMR (400 MHz, CDCl3) δ 5.80 (ddt, J = 17.2, 10.3, 7.0 Hz, 1H), 5.19 - 4.86 (m, 2H), 2.03 (tdt, J = 7.8, 6.8, 1.1 Hz, 2H), 1.56 - 0.70 (m, 30H), -0.01 (s, 27H).

[0201] Synthesis Example 24 Synthesis of Compound (X) To a solution of compound (10a) (0.3 g) in dichloromethane (10 g) was added a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3 mass%, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g), followed by stirring for 2 hours at 50° C. The solvent was distilled off under reduced pressure to obtain 0.4 g of compound (X).

[0202]

[0203] NMR of Compound (X) 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 9H), 1.53 - 0.51 (m, 36H), -0.01 (s, 27H).

[0204] Synthesis Example 25 Synthesis of Compound (11a) THF (10 g) and copper(II) chloride (0.05 g) were added to 7-bromo-1-heptene (1.0 g) and the mixture was stirred at 25° C., and then a diethyl ether solution (1.0 mol / L) (20 mL) of 2,2-dimethylpropyl magnesium chloride was added, followed by stirring for 24 hours at 60° C. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Then, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 0.5 g of Compound (11a).

[0205]

[0206] NMR of compound (11a) 1 H-NMR (400 MHz, CDCl3) δ 5.80 (ddt, J = 17.2, 10.3, 7.0 Hz, 1H), 5.21 - 4.70 (m, 2H), 2.03 (tdt, J = 7.7, 6.7, 1.0 Hz, 2H), 1.42 - 0.58 (m, 19H).

[0207] Synthesis Example 26 Synthesis of Compound (XI) To a solution of compound (11a) (0.5 g) in dichloromethane (10 g) was added a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g), followed by stirring for 2 hours at 50° C. The solvent was distilled off under reduced pressure to obtain 0.7 g of compound (XI).

[0208]

[0209] NMR of compound (XI) 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 9H), 1.53 - 1.11 (m, 14H), 0.85 (s, 9H), 0.65 (t, J = 9.2 Hz, 2H).

[0210] Synthesis Example 27 Synthesis of Compound (12a) A THF solution (0.8 mol / L) of compound (12a) was obtained by the method described in WO 2021 / 054413.

[0211]

[0212] Synthesis Example 28: Synthesis of compound (12b) 1,18-octadecanediol (25 g) was dissolved in toluene (1,000 mL). 48% hydrobromic acid (22 g) was added, and the mixture was stirred under reflux for 24 hours. After the reaction was completed, the layers were separated, and the aqueous layer was extracted with dichloromethane. The organic layers were combined and washed with saturated aqueous sodium bicarbonate. The mixture was dried over anhydrous magnesium sulfate and filtered. The filtrate was evaporated under reduced pressure and purified by silica gel column chromatography to obtain 22 g of compound (12b).

[0213]

[0214] NMR of compound (12b) 1 H-NMR (400 MHz, CDCl3) δ 3.57 (td, J = 5.8, 5.8 Hz, 2H), 3.42 (t, J = 4.7 Hz, 2H), 1.81 - 1.20 (m, 32H).

[0215] Synthesis Example 29: Synthesis of Compound (12c) Compound (12b) (21 g) was dissolved in THF (500 mL), and copper(II) chloride (0.4 g) and a tetrahydrofuran solution (0.8 mol / L) (200 mL) of compound (12a) were added, followed by stirring at 50°C for 24 hours. After completion of the reaction, hydrochloric acid was added, and the mixture was extracted with dichloromethane. The solvent and low-boiling components were distilled off under reduced pressure, and flash column chromatography using silica gel was performed to obtain 18 g of compound (12c).

[0216]

[0217] NMR of compound (12c) 1 H-NMR (400 MHz, CDCl3) δ 5.81 - 5.57 (m, 3H), 5.28 - 4.88 (m, 6H), 3.57 (td, J = 5.8, 5.8 Hz, 2H), 1.90 - 1.78 (m, 6H), 1.64 - 1.48 (m, 2H), 1.38 - 1.15 (m, 32H).

[0218] Synthesis Example 30: Synthesis of Compound (12d) Compound (12c) (17 g) was dissolved in THF (500 mL), and triphenylphosphine (20 g) was added. Carbon tetrabromide (20 g) was slowly added while stirring in an ice bath, and stirring was continued for 24 hours. Silica gel was added to the reaction solution, and the solvent was distilled off. Extraction with hexane yielded 14 g of compound (12d).

[0219]

[0220] NMR of compound (12d) 1 H-NMR (400 MHz, CDCl3) δ 5.80 - 5.59 (m, 3H), 5.23 - 4.90 (m, 6H), 3.42 (t, J = 4.7 Hz, 2H), 1.85 (d, J = 7.3 Hz, 6H), 1.82 - 1.10 (m, 36H).

[0221] Synthesis Example 31 Synthesis of Compound (12e) Compound (12d) (5.0 g) was dissolved in THF (100 mL), and copper(II) chloride (0.005 g) and a diethyl ether solution (1.0 mol / L) (16 mL) of trimethylsilylmethylmagnesium chloride were added, followed by stirring at 60°C for 24 hours. After completion of the reaction, hydrochloric acid was added, and the mixture was extracted with hexane. The solvent and low-boiling components were distilled off under reduced pressure, and flash column chromatography using silica gel was performed to obtain 2.5 g of compound (12e).

[0222]

[0223] NMR of compound (12e) 1 H-NMR (400 MHz, CDCl3) δ 5.70 (ddt, J = 16.8, 11.3, 7.4 Hz, 3H), 5.23 - 4.85 (m, 6H), 1.84 (dt, J = 7.3, 1.0 Hz, 6H), 1.45 - 1.10 (m, 38H), 0.58 (t, J = 8.5 Hz, 2H), -0.05 (s, 9H).

[0224] Synthesis Example 32 Synthesis of Compound (XII) To a solution of compound (12e) (0.5 g) in dichloromethane (10 g) was added a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (1.0 g), followed by stirring for 2 hours at 50° C. The solvent was distilled off under reduced pressure to obtain 0.7 g of compound (XII).

[0225]

[0226] NMR of compound (XII) 1 H-NMR (400 MHz, CDCl3) δ 3.58 (s, 27H), 1.51 - 1.08 (m, 50H), 0.77 - 0.46 (m, 8H), -0.05 (s, 9H).

[0227] Synthesis Example 33: Synthesis of compound (XIII) Compound (XIII) was obtained with reference to Synthesis Examples 1 to 11 of WO 2023 / 181867.

[0228]

[0229] [Production of Articles] A substrate was surface-treated using each of the compounds described above. The surface treatment method was a dry coating method. Chemically strengthened glass was used as the substrate.

[0230] <Dry Coating Method> Dry coating was performed using a vacuum deposition apparatus (product name "VTR-350M", manufactured by ULVAC Corporation). 30 g of silicon oxide was placed as a deposition source in a copper hearth inside the vacuum deposition apparatus ("VTR-350M", manufactured by ULVAC Kiko Co., Ltd.). A glass substrate was placed in the vacuum deposition apparatus, and the inside of the vacuum deposition apparatus was heated to 5 × 10 －３ The hearth was heated to approximately 2,000°C, and silicon oxide was vacuum-deposited on the surface of the substrate, producing a substrate with a silicon oxide layer having a thickness of approximately 20 nm. A 10% heptane solution (0.5 g) of each compound was filled into a molybdenum boat in a vacuum deposition apparatus, and the pressure in the vacuum deposition apparatus was reduced to 1 x 10 －３ The boat was evacuated to a pressure of 10 Pa or less. The boat was heated at a temperature increase rate of 10°C / min or less, and when the deposition rate measured by a quartz crystal oscillator film thickness meter exceeded 1 nm / sec, the shutter was opened to start film formation on the surface of the substrate. When the film thickness reached approximately 50 nm, the shutter was closed to terminate film formation on the surface of the substrate with a silicon oxide layer. The substrate on which the compound had been deposited was heat-treated at 200°C for 30 minutes, yielding an article having a surface-treated layer on the surface of the substrate.

[0231] [Evaluation] The articles obtained by the dry coating method were evaluated for water repellency, abrasion resistance, and fingerprint removability. The evaluation methods were as follows.

[0232] <Initial Contact Angle (Water Repellency)> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the article, and the initial water contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average value measured at five points on the surface treatment layer was taken as the water contact angle. The water repellency of the surface treatment layer was evaluated based on the following criteria. The 2θ method was used to calculate the water contact angle. A: Initial water contact angle of 105° or more B: Initial water contact angle of 100° or more but less than 105° C: Initial water contact angle of less than 100°

[0233] <Initial Contact Angle (Oil Repellency)> Approximately 2 μL of oleic acid was dropped onto the surface treatment layer of the article, and the initial oleic acid contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average value measured at five points on the surface treatment layer was taken as the oleic acid contact angle. The oil repellency of the surface treatment layer was evaluated based on the following evaluation criteria. The 2θ method was used to calculate the oleic acid contact angle. A: The initial oleic acid contact angle was 50° or more. B: The initial oleic acid contact angle was 40° or more and less than 50°. C: The initial oleic acid contact angle was less than 40°.

[0234] <Acid Resistance> The article was cut into a 1 cm x 1 cm square and immersed in an aqueous hydrochloric acid solution (0.1 mol / L) at 20°C for 100 hours. The article was then removed, washed with ethanol, dried, and the water contact angle was measured. The smaller the decrease in water repellency (water contact angle) after immersion, the smaller the decrease in performance due to acid, and the more excellent the acid resistance. The evaluation criteria are as follows: A: The decrease in water contact angle after immersion is 3° or less B: The decrease in water contact angle after immersion is more than 3° and less than 5° C: The decrease in water contact angle after immersion is more than 5° and less than 10° D: The decrease in water contact angle after immersion is more than 10°

[0235] <Hot water resistance> The article was cut into a 1 cm x 1 cm square and immersed in water (50 cc) at 80°C for 100 hours. Thereafter, the water contact angle was measured. The smaller the decrease in water repellency (water contact angle) after immersion, the smaller the decrease in performance due to hot water, and the more excellent the hot water resistance. The evaluation criteria are as follows: A: The decrease in water contact angle after immersion is 3° or less B: The decrease in water contact angle after immersion is more than 3° and not more than 5° C: The decrease in water contact angle after immersion is more than 5° and not more than 10° D: The decrease in water contact angle after immersion is more than 10°

[0236] The evaluation results are shown in Table 1.

[0237] As shown in Table 1, it was revealed that the articles of Examples 1 to 9 using compounds I to VI and XIV to XVI had excellent water and oil repellency, acid resistance, and hot water resistance of the surface treatment layer. Among compounds I to VI and XIV to XVI, compounds III to V and XV were solids at 25°C, and compounds I to II, VI to XIV, and XVI were liquids at 25°C.

[0238] The compounds of the present disclosure are useful as surface treatment agents. The surface treatment agents can be used, for example, for display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, and substrates used in nanoimprint technology. The surface treatment agents can also be used for the bodies, window glass (windshields, side glass, rear glass), mirrors, bumpers, and the like of transportation equipment such as trains, automobiles, ships, and aircraft. Furthermore, the surface treatment agents can be used for outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. The surface treatment agents can also be used for various indoor facilities such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. The surface treatment agents can also be used for antifouling treatment of jigs, interior walls, piping, and the like in factories. The surface treatment agents can also be used for goggles, eyeglasses, helmets, pachinko machines, textiles, umbrellas, playground equipment, and soccer balls. The surface treatment agents can also be used as anti-adhesion agents for various packaging materials such as food packaging, cosmetic packaging, and the inside of pots. The surface treatment agent can also be used for optical components such as car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio equipment, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical devices such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and antireflection films.

[0239] This application claims priority based on Japanese Patent Application No. 2023-150604 filed on September 15, 2023, Japanese Patent Application No. 2024-18476 filed on February 9, 2024, Japanese Patent Application No. 2024-60422 filed on April 3, 2024, and International Application No. PCT / JP2024 / 22675 filed on June 21, 2024, the disclosures of which are incorporated herein in their entireties.

Claims

1. A compound represented by the following formula (1): １ -L １ -T １ ...(1) In formula (1), R １ is [(CH ３ ) ３ Q １ -R ２ -] ｍ１ Q ２ (CH ３ ) ３－ｍ１ - and Q １ and Q. ２ are each independently C or Si; R ２ are each independently an alkylene group having 1 to 6 carbon atoms, m1 is an integer of 0 to 3, and L １ is an alkylene group having 13 or more carbon atoms, and has between its carbon atoms -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - and a phenylene group; T １ is -Si(R １１ ) ｍ２ L ３－ｍ２ And R １１ each independently represents a hydrocarbon group; each L independently represents a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and m2 is an integer of 0 to 2.

2. Said L １ The compound according to claim 1, wherein the number of carbon atoms is 36 or less.

3. Said L １ is an alkylene group having 13 to 36 carbon atoms.

4. The above R １ But, Q ２ (CH ３ ) ３ The compound according to claim 1, wherein 5. The compound according to claim 1, wherein L is represented by the following formula (G1): -O-R １２ -M １ R １３ ３ …(G1) where R １２ is an alkylene group, (Si(CH ３ ) ２ O) ｍ３ or an alkylene group and (Si(CH ３ ) ２ O) ｍ３ It is a combination of M １ is a carbon atom or a silicon atom; R １３ are each independently a hydrogen atom or an alkyl group which may have a branch; R １３ At least two of the groups are alkyl groups which may have a branch; and m3 is an integer of 1 to 12.

6. The above R １２ The compound of claim 5 , wherein is a straight chain alkylene group.

7. Said M １ R １３ ３ But CH (CH ３ ) ２ , C(CH ３ ) ３ or Si(CH ３ ) ３ 6. The compound of claim 5, 8. The compound of claim 1 which is a solid at 25°C.

9. The compound of claim 1, which is a liquid at 25°C.

10. A composition comprising a compound according to any one of claims 1 to 9 and a liquid medium.

11. A surface treatment agent comprising the compound according to any one of claims 1 to 9.

12. The surface treatment agent according to claim 11, further comprising a liquid medium.

13. The surface treatment agent according to claim 11, which is for vacuum deposition.

14. The surface treatment agent according to claim 12, which is for vacuum deposition.

15. The surface treatment agent according to claim 12, which is for wet coating.

16. A pellet containing the surface treatment agent according to claim 11.

17. A pellet containing the surface treatment agent according to claim 12.

18. A method for producing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 11; and producing an article having a surface treatment layer formed on the substrate.

19. A method for manufacturing an article, comprising: performing a surface treatment on a substrate using the surface treatment agent according to claim 12; and manufacturing an article having a surface treatment layer formed on the substrate.

20. An article comprising a substrate and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 11.

21. An article comprising a substrate, and a surface treatment layer disposed on the substrate and surface-treated with the surface treatment agent according to claim 12.

22. The article of claim 20 which is an optical component.

23. The article of claim 21 which is an optical component.

24. The article according to claim 20, which is a display or a touch panel.

25. The article of claim 21, which is a display or a touch panel.

26. A compound represented by the following formula (13): R １ -L ２ -CH=CH ２ ...(13) In formula (13), R １ is [(CH ３ ) ３ Q １ -R ２ -] ｍ１ Q ２ (CH ３ ) ３－ｍ１ - and Q １ and Q. ２ are each independently C or Si; R ２ are each independently an alkylene group having 1 to 6 carbon atoms, m1 is an integer of 0 to 3, and L ２ is an alkylene group having 11 or more carbon atoms, and has between its carbon atoms -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ It may have one or more bonds selected from the group consisting of -, and phenylene groups.

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