Mask case, transport carriage, mask buffer, and conveyance device

Abstract

This mask case comprises: a case body that houses a mask and has at least a portion thereof possessing conductivity; a conductive member that guides static electricity charged on the mask to the conductive portion of the case body; and a first static elimination member that is electrically connected to the conductive portion and that eliminates the static electricity charged on the conductive portion.

Description

Mask case, transport cart, mask buffer, and transport device

[0001] The present invention relates to a mask case, a transport cart, a mask buffer, and a transport device.

[0002] In the photolithography process for manufacturing semiconductor elements, liquid crystal display elements, etc., a step-and-repeat projection exposure apparatus (a so-called stepper) or a step-and-scan projection exposure apparatus (a so-called scanning stepper (also called a scanner)) is mainly used to transfer a pattern formed on a mask or reticle onto a glass substrate or wafer, etc., via a projection optical system.

[0003] In such an exposure apparatus, various countermeasures against static electricity are taken to remove static electricity that has accumulated on the substrate and mask (for example, see Japanese Patent Application Laid-Open No. 2003-144998).

[0004] Japanese Patent Application Publication No. 8-137112

[0005] According to an aspect of the disclosure, the mask case includes a case body having at least a portion thereof conductive and housing a mask, a conductive member that directs static electricity charged on the mask to the conductive portion of the case body, and a first static elimination member that is electrically connected to the conductive portion and eliminates static electricity charged on the conductive portion.

[0006] According to another aspect of the disclosure, the transport cart is a transport cart for transporting the mask case, and includes a loading section on which the mask case is placed, and a de-electrification mechanism for de-electrifying static electricity charged to the mask case placed on the loading section.

[0007] According to another disclosed aspect, the mask buffer is a mask buffer capable of storing a plurality of the above-mentioned mask cases, and includes a shelf portion on which the mask cases are placed, and a discharge mechanism that discharges static electricity charged to the mask cases placed on the shelf portion.

[0008] According to another disclosed aspect, the conveying device is a conveying device that conveys mask cases out of and into a mask buffer that stores the mask cases, and includes an arm unit that drives in a first direction parallel to the surface of the mask to remove the mask case from the mask buffer and insert the mask case into the mask buffer, and a de-electrification mechanism that de-electrifies static electricity charged to the arm unit, and the arm unit is electrically connected to the mask case while holding the mask case.

[0009] The configurations of the embodiments described below may be modified as appropriate, and at least a portion of the configuration may be replaced with other components. Furthermore, components that are not particularly limited in terms of their placement may be placed in any position that can achieve their function, not limited to the placement disclosed in the embodiments.

[0010] FIG. 1 is a schematic diagram showing the configuration of an exposure apparatus according to an embodiment. FIG. 2A is a schematic diagram showing the main body and substrate transport device as viewed from above, and FIG. 2B is a schematic diagram showing the main body and substrate transport device as viewed from the side. FIG. 3A is a top view of a substrate tray, and FIG. 3B is a side view of the substrate tray with a substrate placed on its upper surface. FIG. 4 is a view of the transport mechanism as viewed from the +X side. FIG. 5A is a diagram explaining the relationship between the substrate holder, the transport mechanism, and the charge-removing brush, and FIG. 5B is a diagram explaining the relationship between the charge-removing brush and the substrate tray. FIG. 6 is a diagram explaining another example of the installation location of the charge-removing brush. FIGS. 7A to 7C are diagrams explaining a robot hand according to a modified example of this embodiment. FIG. 8 is a diagram (part 1) explaining the configuration of a mask loader. FIG. 9 is a diagram (part 2) explaining the configuration of a mask loader. FIG. 10 is a flowchart showing a series of processes up to loading a mask onto a mask stage. FIG. 11 is a flowchart showing a series of processes after a mask is removed from a mask stage. FIG. 12 is a cross-sectional view illustrating the configuration of a mask case. FIG. 13 is a cross-sectional view illustrating another example of the configuration of a mask case. FIG. 14(A) is a diagram illustrating an overview of a transport cart, and FIG. 14(B) is an enlarged view of a mechanical stopper. FIGS. 15(A) and 15(B) are diagrams illustrating the structure of a static elimination mechanism provided on the transport cart. FIG. 16(A) is a schematic diagram of a shelf portion of a mask buffer as viewed from the +Z direction, and FIG. 16(B) is a cross-sectional view taken along line A-A in FIG. 16(A). FIG. 17 is a schematic diagram illustrating the configuration of a buffer arm. FIG. 18(A) is a diagram illustrating the appearance of a mask transport mechanism according to an embodiment, and FIG. 18(B) is a schematic diagram illustrating the configuration of the mask transport mechanism.

[0011] An exposure apparatus EX according to one embodiment will be described below with reference to Figures 1 to 18(B). Figure 1 is a schematic diagram showing the configuration of an exposure apparatus EX according to one embodiment.

[0012] The exposure apparatus EX is used, for example, when manufacturing an organic EL display, to form a TP (Touch Panel) circuit or a CF (Color Filter) circuit on the upper surface of a substrate P. The substrate P is, for example, a glass plate on which TFTs (Thin Film Transistors) are formed by vapor deposition or the like and then sealed, but is not limited to this.

[0013] As shown in FIG. 1, the exposure apparatus EX includes a main body 100 , a substrate transport apparatus 200 , and a mask loader 300 .

[0014] In the following description, the direction in which the mask M and substrate P, which will be described later, are scanned relative to the projection optical system 116 during exposure will be referred to as the X-axis direction, the direction perpendicular to the X-axis in the horizontal plane as the Y-axis direction, and the direction perpendicular to the X-axis and Y-axis as the Z-axis direction, and the directions of rotation (tilt) around the X-axis, Y-axis, and Z-axis will be referred to as the θx, θy, and θz directions, respectively.

[0015] Fig. 2(A) is a schematic diagram of the main body 100 and the substrate transfer device 200 as viewed from above, and Fig. 2(B) is a schematic diagram of the main body 100 and the substrate transfer device 200 as viewed from the side. As shown in Figs. 1, 2(A), and 2(B), the substrate transfer device 200 is disposed on the +X side of the main body 100. Note that the substrate transfer device 200 may also be disposed on the -X side of the main body 100.

[0016] <Substrate transport device 200> The substrate transport device 200 transfers the substrate P between an external device 1000 (see FIG. 2A ), such as a coater / developer, and the main body 100. The external device 1000 has, for example, a fork-shaped robot hand RH, and can transport the substrate P placed on the robot hand RH from the external device 1000 into the substrate transport device 200.

[0017] The substrate transfer device 200 includes a substrate tray (substrate support member) 201 , a transfer mechanism 202 , an alignment mechanism 203 , and a stand unit 204 .

[0018] A substrate tray 201 is placed on the stand 204. The substrate P placed on the robot hand RH is transported from the external device 1000 into the substrate transport device 200, and placed on the substrate tray 201 placed on the stand 204.

[0019] The substrate tray 201 is a carrier used when transporting and installing the substrate P inside the main body 100, and the substrate P is placed on its upper surface. Fig. 3(A) is a top view of the substrate tray 201, and Fig. 3(B) is a side view of the substrate tray 201 with the substrate P placed on its upper surface.

[0020] As shown in Fig. 3A, the substrate tray 201 is, for example, a lattice-shaped member. The substrate tray 201 includes a base member 201a and a support member 201b that is provided on the base member 201a and supports the substrate P. In this embodiment, the base member 201a and the support member 201b are conductive, and the base member 201a and the support member 201b are electrically connected. In this specification, "conductive" or "conductive" means having either electrostatic conductivity or electrostatic dissipation properties. An electrostatic conductive material has a surface resistance of 1 x 10 ２ ≦Rs<1×10 ４ Ω, and the static dissipative material has a surface resistance of 1×10 ４ ≦Rs<1×10 １１ It is a material that is Ω.

[0021] In this embodiment, the substrate tray 201 is provided with a charge removal mechanism 210 for removing static electricity that has accumulated on the substrate P.

[0022] The static elimination mechanism 210 includes a static elimination brush 210a and a discharge cord 210b. The static elimination brush 210a has conductive bristles (conductive fibers). The static elimination brush 210a is electrically connected to the base member 201a and guides static electricity charged on the substrate P supported by the support member 201b to the base member 201a. In this embodiment, the support member 201b is also conductive and electrically connected to the base member 201a, so that the support member 201b also guides static electricity charged on the substrate P to the base member 201a, but the support member 201b may be non-conductive.

[0023] The discharge cord 210b is electrically connected to the base member 201a. The discharge cord 210b is also called a static discharger, and discharges static electricity introduced to the base member 201a into the air. This makes it possible to remove static electricity that has accumulated on the substrate P placed on the substrate tray 201, thereby preventing devices such as TFTs formed on the substrate P from being destroyed by the electrostatic discharge phenomenon.

[0024] The substrate tray 201 is large enough to accommodate, for example, a G6 (1850 x 1500 mm) size substrate P without it protruding from the substrate tray 201. In other words, the substrate tray 201 is large enough to accommodate two G6 half-size substrates P, which are formed by dividing a G6 (1850 x 1500 mm) size substrate P in half. The size of the substrate P placed on the substrate tray 201 is not limited to the G6 size, and may be larger or smaller than the G6 size. When the size of the substrate P placed on the substrate tray 201 is larger than the G6 size, the size of the substrate tray 201 is designed so that the substrate P can be placed without protruding from the substrate tray 201. The number of substrates P placed on the substrate tray 201 is not limited to one or two, but may be three or more.

[0025] The alignment mechanism 203 positions the substrate P with respect to the substrate tray 201 based on the position of the substrate P detected by a position detection sensor (not shown). The substrate P is transported into the main body 100 while placed on the substrate tray 201. As the alignment mechanism 203, for example, the configuration described in Japanese Patent Application No. 2022-058723 can be adopted, although other configurations may also be adopted.

[0026] The transport mechanism 202 transports the substrate tray 201 holding the positioned substrate P to the main body 100. The transport mechanism 202 also removes the substrate tray 201 arranged inside the main body 100 from the main body 100.

[0027] 4 is a view of the transport mechanism 202 as seen from the +X side. The transport mechanism 202 has a transport arm 202a. The transport arm 202a grips the substrate tray 201, for example, from both sides in the Y-axis direction. In this state, the transport mechanism 202 moves along the X-axis direction by a movement mechanism (not shown). In this way, the transport mechanism 202 transports the substrate tray 201.

[0028] A conductive part 202b is attached to the transport arm 202a, and the conductive part 202b is grounded via wiring. As shown in Fig. 4, when the transport arm 202a grips the substrate tray 201, the conductive part 202b comes into contact with the base member 201a of the substrate tray 201. This electrically connects the conductive part 202b and the substrate tray 201, thereby removing static electricity that has been introduced to the base member 201a. This makes it possible to prevent the substrate P from becoming charged with static electricity while being transported by the transport mechanism 202, and to prevent devices such as TFTs formed on the substrate P from being destroyed by the static electricity discharge phenomenon.

[0029] <Main Body 100> Next, we will explain the configuration of the main body 100. As shown in Fig. 2(B) , the main body 100 includes an illumination system 112, a mask stage 114 that holds a mask M on which a circuit pattern or the like is formed, a projection optical system 116, an optical surface plate 118, and a substrate stage device 120 that holds a substrate P.

[0030] The illumination system 112 has a configuration similar to that of the illumination system disclosed in, for example, U.S. Patent No. 5,729,331, etc. The illumination system 112 irradiates the mask M with light emitted from a light source (e.g., a mercury lamp) (not shown) via a reflecting mirror, a dichroic mirror, a shutter, a wavelength selection filter, various lenses, etc. (not shown), as exposure illumination light (illumination light) IL.

[0031] The mask stage 114 holds a light-transmitting mask M. The mask stage 114 drives the mask M by a predetermined stroke in the X-axis direction (scanning direction) relative to the illumination system 112 (illumination light IL) via a drive system (not shown) including, for example, a linear motor, and also drives the mask M slightly in the Y-axis direction and the θz direction. Position information of the mask M in the horizontal plane is obtained by a mask stage position measurement system (not shown) including, for example, a laser interferometer or an encoder.

[0032] The projection optical system 116 is disposed below the mask stage 114. The projection optical system 116 is a so-called multi-lens projection optical system having a configuration similar to that of the projection optical system disclosed in, for example, U.S. Pat. No. 6,552,775, and includes, for example, a plurality of optical systems that form an erect, normal image in a double-telecentric, equal-magnification system.

[0033] In the main body 100, when an illumination area on the mask M is illuminated by illumination light IL from the illumination system 112, the illumination light that has passed through the mask M forms a projected image (partial erect image) of the circuit pattern of the mask M within that illumination area via the projection optical system 116 in an illumination light irradiation area (exposure area) that is conjugate to the illumination area on the substrate P. Then, as the mask M moves relative to the illumination area (illumination light IL) in the scanning direction and the substrate P moves relative to the exposure area (illumination light IL) in the scanning direction, scanning exposure of one shot area on the substrate P is performed, and the pattern formed on the mask M is transferred to that shot area.

[0034] The optical surface plate 118 supports the mask stage 114 and the projection optical system 116 .

[0035] The substrate stage device 120 is used to position the substrate P with high precision relative to the projection optical system 116 (illumination light IL), and includes a substrate holder 121 that holds the substrate P, and a substrate stage 122 .

[0036] 2A, the substrate holder 121 includes an accommodation portion 121a. The accommodation portion 121a is a groove provided in the substrate holder 121, and accommodates the substrate tray 201. As a result, the substrate tray 201 holding the substrate P is accommodated in the accommodation portion 121a, and the substrate P is placed on the upper surface of the substrate holder 121.

[0037] The substrate stage 122 is driven by a drive device (not shown) at a predetermined stroke along a horizontal plane (X-axis direction and Y-axis direction), and is also finely driven in six degrees of freedom. The configuration of the substrate stage device 120 is not particularly limited, but it is preferable to use a stage device with a so-called coarse / fine movement configuration, which includes a gantry-type two-dimensional coarse movement stage and a fine movement stage that is finely driven relative to the two-dimensional coarse movement stage, as disclosed in, for example, Japanese Patent Laid-Open No. 2004-14915 or U.S. Patent Application Publication No. 2012 / 0057140.

[0038] As shown in FIG. 2A, an X-movable mirror (bar mirror) 124X having a reflective surface perpendicular to the X-axis is fixed to the −X-side side of the substrate stage 122, and a Y-movable mirror 124Y having a reflective surface perpendicular to the Y-axis is fixed to the +Y-side side.

[0039] First and second laser interferometers (not shown) are attached to the optical surface plate 118 to measure the position in the X-axis direction and the Y-axis direction, respectively, of a substrate holder 121 that holds the substrate P.

[0040] The first laser interferometer irradiates a measurement beam onto X movable mirror 124X and an X fixed mirror (not shown) that is fixed near projection optical system 116. The first laser interferometer measures position information of substrate holder 121 in the X axis direction using the position of the X fixed mirror as a reference.

[0041] Furthermore, the second laser interferometer irradiates a measurement beam onto Y movable mirror 124Y and a Y fixed mirror (not shown) fixed near projection optical system 116. The second laser interferometer measures position information of substrate holder 121 in the Y axis direction using the position of the Y fixed mirror as a reference.

[0042] A control device (not shown) drives the substrate stage 122 based on the position information (including rotation information (yawing amount (amount of rotation in the θz direction θz), pitching amount (amount of rotation in the θy direction θy), and rolling amount (amount of rotation in the θx direction θx))) of the substrate stage 122 in the XY plane measured by the first laser interferometer and the second laser interferometer.

[0043] Prior to exposure, the main body 100 performs alignment measurement (for example, EGA, etc.), and then uses the results to expose the substrate P in the following procedure. First, in accordance with instructions from a control device (not shown), the mask stage 114 and the substrate stage 122 are synchronously driven in the X-axis direction. This performs scanning exposure on the first shot area on the substrate P. When scanning exposure on the first shot area is completed, the control device (not shown) moves (steps) the substrate stage 122 to a position corresponding to the second shot area. Then, scanning exposure is performed on the second shot area. Similarly, the control device (not shown) repeats stepping between shot areas on the substrate P and scanning exposure on the shot areas to transfer the pattern of the mask M to all shot areas on the substrate P.

[0044] In the exposure apparatus EX according to this embodiment, an X-ray ionizer is provided in the main body 100 to remove static electricity that has accumulated on the substrate P placed on the substrate holder 121. Also, an X-ray ionizer is provided in the substrate transport device 200 to remove static electricity that has accumulated on the substrate P placed on the substrate tray 201 held by the stand 204. Note that the X-ray ionizer may be provided in either the main body 100 or the substrate transport device 200.

[0045] However, if static electricity builds up on the substrate P while the transport mechanism 202 is transporting the substrate P between the pedestal 204 and the substrate holder 121 and the charged static electricity is then discharged, there is a risk that the discharge phenomenon could destroy devices such as TFTs formed on the substrate P. Therefore, in this embodiment, as shown in Fig. 2(B) , a discharging brush 500 is provided so that static electricity charged on the substrate P can be removed even while the substrate P is moving between the substrate holder 121 (first region) and the pedestal 204 (second region), more specifically so that static electricity led from the substrate P can be removed from the substrate tray 201.

[0046] Figure 5(A) is a diagram for explaining the relationship between the substrate holder 121, the transport mechanism 202, and the discharging brush 500, and Figure 5(B) is a diagram for explaining the relationship between the discharging brush 500 and the substrate tray 201.

[0047] As shown in Fig. 5(A), the static elimination brush 500 is provided in the region between the main body 100 and the stand 204 in the X-axis direction. As shown in Fig. 5(B), the static elimination brush 500 extends in a direction (Y-axis direction) perpendicular to the movement direction (X-axis direction) of the substrate tray 201. The static elimination brush 500 is provided so as to face the surface of the substrate tray 201 opposite to the surface that holds the substrate P while the substrate tray 201 is moving between the stand 204 and the substrate holder 121. The static elimination brush 500 is also grounded.

[0048] The discharging brush 500 has conductive bristle bundles 502 that extend toward the substrate tray 201 (extending in the +Z direction) when the substrate tray 201 is above the discharging brush 500, and removes static electricity conducted from the substrate P to the base member 201a of the substrate tray 201. This makes it possible to prevent devices such as TFTs formed on the substrate P from being destroyed by the discharge phenomenon of static electricity charged on the substrate P while the transport mechanism 202 is transporting the substrate P between the stand part 204 and the substrate holder 121.

[0049] As shown in FIG. 5B , the static elimination brush 500 is arranged so that the conductive bristle bundles 502 do not come into contact with the underside of the base member 201 a of the substrate tray 201 (the surface of the substrate tray 201 opposite the surface supporting the substrate P). The substrate tray 201 and the substrate P being transported by the transport mechanism 202 bend under their own weight. Therefore, the central portions of the substrate tray 201 and the substrate P in the Y-axis direction are located lower than the end portions. Therefore, the conductive bristle bundles 502 of the static elimination brush 500 are short in the central portion in the Y-axis direction and become longer toward the end portions. This prevents the conductive bristle bundles 502 of the static elimination brush 500 from coming into contact with the substrate tray 201. If the bristle bundles 502 come into contact with the substrate tray 201 and wear, dust may be generated inside the exposure apparatus EX due to the wear, and this dust may cause exposure defects. By configuring the length of the conductive bristle bundles 502 of the charge removal brush 500 as described above, it is possible to suppress the occurrence of poor exposure.

[0050] 6, in addition to or instead of the static elimination brush 500, a grounded static elimination brush 500A may be provided on the substrate stage 122. In this case, the static elimination brush 500A only needs to extend in a direction (Y-axis direction) perpendicular to the movement direction (X-axis direction) of the substrate tray 201 and be provided so as to face the surface of the substrate tray 201 opposite to the surface that holds the substrate P while the substrate tray 201 is moving between the stand part 204 and the substrate holder 121. Furthermore, to avoid contact with the substrate tray 201, the conductive bristle bundles of the static elimination brush 500A may be short in the center in the Y-axis direction and become longer toward both ends.

[0051] It should be noted that the substrate P may be transported to the substrate holder 121 by, for example, a fork-type robot hand RH shown in Fig. 2(A) instead of the substrate tray 201. When the substrate P is transported to the substrate holder 121 by the robot hand RH, the substrate transport device 200 is omitted.

[0052] Figures 7(A) to 7(C) are diagrams for explaining a robot hand RH-A according to a modified example of this embodiment. Figure 7(A) is a diagram of the robot hand RH-A viewed from the +Z direction, Figure 7(B) is a diagram of the robot hand RH-A on which a substrate P is placed viewed from the +Z direction, and Figure 7(C) is a diagram of the robot hand RH-A on which a substrate P is placed viewed from the +Z direction.

[0053] 7(A) and 7(C), the robot hand RH-A includes a conductive base member 801, a conductive support member 802 provided on the base member 801, and a discharging brush 803. The support member 802 is electrically connected to the base member 801. The discharging brush 803 has a conductive bristle bundle, which is electrically connected to the base member 801. As a result, static electricity charged on the substrate P is conducted to the base member 801 via the support member 802 and the discharging brush 803.

[0054] The static elimination brush 500 is disposed on the path along which the robot hand RH-A transports the substrate P to the main body 100, and on the path along which the substrate P is transported from the main body 100 to a predetermined position. This allows static electricity guided to the base member 801 to be released to the ground via the static elimination brush 500. This makes it possible to prevent devices such as TFTs formed on the substrate P from being destroyed by the discharge phenomenon of static electricity charged on the substrate P.

[0055] The support member 802 may be non-conductive. A discharge cable may be provided for electrical connection to the base member 801 of the robot hand RH-A.

[0056] <Mask Loader 300> Figures 8 and 9 are diagrams for explaining the configuration of the mask loader 300. Note that Figure 8 shows a cross-sectional view of part of the configuration.

[0057] As shown in FIGS. 8 and 9, the mask loader 300 includes a mask buffer 310 , a pellicle foreign substance inspection unit (hereinafter referred to as PPD) 390 , a buffer arm 330 , a relay table 350 , and a mask transport mechanism 370 .

[0058] The mask buffer 310 temporarily stores the mask case 600 that houses the mask M. The mask buffer 310 has a plurality of slots SLT for storing the mask case 600.

[0059] The PPD 390 is disposed above the mask buffer 310. The PPD 390 inspects whether or not there is any foreign matter adhering to the pellicle PLCL (see FIG. 12 ) of the mask M, and whether or not there is any foreign matter adhering to the surface of the mask M opposite to the surface on which the pellicle PLCL is provided. The PPD 390 has a PPD arm 391.

[0060] The relay table 350 temporarily holds the mask M being transported when exchanging the mask M. The relay table 350 has a table (not shown) on which the mask M to be loaded onto the mask stage 114 of the main body 100 is placed, and another table (not shown) on which the mask M unloaded from the mask stage 114 of the main body 100 is placed.

[0061] The buffer arm 330 transports and loads the mask case 600 to and from the mask buffer 310. The mask transport mechanism 370 transports the mask M from the relay table 350 to the main body 100, and vice versa. The mask transport mechanism 370 also transports the mask M to the PPD arm 391 and receives the mask M from the PPD arm 391. The mask transport mechanism 370 also delivers the mask M to and from the buffer arm 330.

[0062] The processing executed by the mask loader 300 will be described with reference to Figures 10 and 11. Figure 10 is a flowchart showing a series of processing steps up to the point where the mask M is mounted on the mask stage 114, and Figure 11 is a flowchart showing a series of processing steps after the mask M is removed from the mask stage 114.

[0063] 10 , first, the mask M on which a pattern is formed is stored in a mask case 600 (described later) (step S11). Next, the mask case 600 storing the mask M is loaded onto a transport cart 700 (described later) (step S13). The transport cart 700 on which the mask case 600 is placed is inserted into the mask buffer 310 (step S15). As a result, the mask case 600 is inserted into the mask buffer 310.

[0064] The mask case 600 inserted into the mask buffer 310 is stored in each slot SLT of the mask buffer 310 (step S17).

[0065] When the mask M stored in the mask case 600 stored in the mask buffer 310 is to be used, the mask M is transported together with the mask case 600 by the buffer arm 330 (step S19).

[0066] The mask transport mechanism 370 takes out and transports the mask M from the mask case 600 transported by the buffer arm 330 (step S20). The mask M is handed over to the PPD arm 391 of the PPD 390, and the PPD 390 inspects whether or not there is any foreign matter adhering to the pellicle PLCL of the mask M, and whether or not there is any foreign matter adhering to the surface of the mask M opposite to the surface on which the pellicle PLCL is provided (step S21).

[0067] When the inspection by the PPD 390 is completed, the mask M is transported by the mask transport mechanism 370 via the relay table 350 to the mask stage 114 (step S23). Thereafter, the mask M is mounted on the mask stage 114 (step S25), and the process of FIG. 10 is completed.

[0068] 11 starts when exposure of the substrate P is completed. First, the mask M is removed from the mask stage 114 (step S31).

[0069] Next, the removed mask M is transported by the mask transport mechanism 370 (step S33). The mask M transported by the mask transport mechanism 370 is stored in the mask case 600 (step S35).

[0070] The mask case 600 is transported by the buffer arm 330 and stored in the mask buffer 310 (step S37).

[0071] The mask case 600 stored in the mask buffer 310 is removed from the mask buffer 310 and loaded onto the transport cart 700 (step S39). The mask case 600 is transported to a predetermined location by the transport cart 700 and removed from the transport cart 700 (step S41). The mask M is removed from the mask case 600 removed from the transport cart 700 (step S43), and the processing of FIG. 11 is completed.

[0072] 10 and 11 , when the mask M is carried into the PPD 390 (step S21 in FIG. 10), when the mask M is mounted on the mask stage 114 (step S25 in FIG. 10), when the mask M is removed from the mask stage 114 (step S31 in FIG. 11), and when the mask M is taken out of the mask case 600 (step S43 in FIG. 11), static electricity charged on the mask M is conventionally removed using an X-ray ionizer or the like. In this embodiment, static electricity charged on the mask M is also removed in other steps, thereby further preventing the pattern formed on the mask M from being destroyed by static electricity discharge.

[0073] <Mask Case 600> Next, the mask case 600 according to this embodiment will be described. Fig. 12 is a cross-sectional view for explaining the structure of the mask case 600. Note that in Fig. 12, hatching of some elements has been omitted.

[0074] As shown in FIG. 12, the mask case 600 includes a case body 601 that houses the mask, and a discharge cord 602 .

[0075] The case body 601 includes a first case part 601a having a bottom surface BS, and a second case part 601b detachably provided to the first case part 601a and having a ceiling surface CS arranged opposite the bottom surface BS. The first case part 601a and the second case part 601b are electrically conductive.

[0076] The first case part 601a has legs 610, and a mask case support part 611 is attached to the legs 610. The mask case support part 611 is conductive and is electrically connected to the first case part 601a (legs 610).

[0077] A mask support member 603 that supports the mask M is provided on the bottom surface BS of the first case portion 601a. ​​The mask support member 603 supports the mask M so that the pellicle PLCL, which protects the area where a pattern is formed on the mask M, does not come into contact with the bottom surface BS. The mask support member 603 is conductive and is electrically connected to the first case portion 601a. ​​Therefore, the mask support member 603 and the mask case support portion 611 are electrically connected.

[0078] The discharge cord 602 is electrically connected to the first case portion 601a. ​​Therefore, the mask support member 603 and the discharge cord 602 are electrically connected. As a result, static electricity charged on the mask M is guided to the conductive first case portion 601a by the mask support member 603, and the static electricity charged on the first case portion 601a is discharged by the discharge cord 602. This makes it possible to prevent the pattern formed on the mask M from being destroyed by the discharge phenomenon of the static electricity charged on the mask M.

[0079] A static elimination brush 604 having conductive bristles is provided on the ceiling surface CS of the second case part 601b. The static elimination brush 604 is electrically connected to the second case part 601b. The static elimination brush 604 faces the mask M supported by the mask support member 603 and guides static electricity charged on the mask M to the second case part 601b.

[0080] When the second case part 601b is attached to the first case part 601a, the first case part 601a and the second case part 601b are electrically connected. As a result, static electricity conducted from the mask M to the second case part 601b is conducted by the first case part 601a to the discharge cord 602 and discharged from the discharge cord 602. This makes it possible to prevent the pattern formed on the mask M from being destroyed by the discharge phenomenon of static electricity charged on the mask M.

[0081] The first case part 601a and the second case part 601b are made of, for example, aluminum, and have a non-conductive coating (such as an anti-rust coating) formed on their surfaces. Therefore, in this embodiment, when the second case part 601b is attached to the first case part 601a, the coating is removed from the portion where the first case part 601a and the second case part 601b come into contact. Also, the coating is removed from the portion of the first case part 601a where the mask support member 603 is attached. Also, the coating is removed from the portion of the first case part 601a where the mask case support part 611 is attached. Also, the coating is removed from the portion of the second case part 601b where the anti-static brush 604 is disposed. This ensures electrical connection. In FIG. 12, the portion of the first case portion 601a where the coating has been removed is shown as a coating-removed region 615a, and the portion of the second case portion 601b where the coating has been removed is shown as a coating-removed region 615b.

[0082] It is to be noted that instead of removing the coating, a conductive electrode member such as a bus bar may be provided. Fig. 13 is a cross-sectional view showing another example of the configuration of the mask case 600.

[0083] 13, an electrode member 605a such as a bus bar is provided on a part of the bottom surface BS of the first case part 601a, and the mask support member 603 is electrically connected to the electrode member 605a. Also, an electrode member 605b such as a bus bar is provided to electrically connect the electrode member 605a provided on the first case part 601a and the discharge cord 602.

[0084] An electrode member 605c such as a bus bar is provided on the ceiling surface CS of the second case portion 601b, and the static elimination brush 604 is electrically connected to the electrode member 605c. An electrode member 605d such as a bus bar is provided to electrically connect the electrode member 605c and the electrode member 605a when the second case portion 601b is attached to the first case portion 601a. ​​The electrode member 605d has elasticity, which ensures a reliable electrical connection between the electrode member 605c and the electrode member 605a.

[0085] Furthermore, an electrode member 605e such as a bus bar is provided on the leg portion 610 of the first case portion 601a, and the mask case support portion 611 is electrically connected to the electrode member 605e. In this manner, electrical connection between the respective members is realized by the electrode member, and static electricity charged on the mask M may be discharged from the discharge cable 602.

[0086] The mask case 600 containing the mask M is transported to the mask buffer 310 by the transport cart 700 and stored in the mask buffer 310 .

[0087] <Transport cart 700> Fig. 14(A) is a diagram showing an overview of the transport cart 700. As shown in Fig. 14(A), the transport cart 700 includes a mounting section 701 on which the mask case 600 is placed, wheels 702 attached to the mounting section 701, a handle section 703 that an operator grips when moving the transport cart 700, and a mechanical stopper 704 arranged on the front side of the mounting section 701. The transport cart 700 further includes a static elimination mechanism 710 that eliminates static electricity that has accumulated on the mask case 600 placed on the mounting section 701.

[0088] The static elimination mechanism 710 includes a first electrode part 711 , a discharge cable 712 , and an electrode member 713 .

[0089] 15A and 15B are diagrams for explaining the structure of the static elimination mechanism 710. FIG.

[0090] 15A , the first electrode part 711 is, for example, a contact probe, and is biased upward by a biasing member 715 such as a compression spring, etc. As a result, the tip of the first electrode part 711 protrudes beyond a contact surface 701 a of the mounting part 701 that comes into contact with the mask case support part 611 of the mask case 600.

[0091] As shown in FIG. 15B, when the mask case 600 is placed on the placement portion 701, the first electrode parts 711 and the mask case support portions 611 come into contact with each other and are electrically connected.

[0092] The first electrode part 711 is electrically connected to the discharge cord 712. This allows static electricity charged on the mask case 600 to be guided to the discharge cord 712 by the first electrode part 711 and discharged from the discharge cord 712. This makes it possible to prevent the pattern formed on the mask M from being destroyed by the discharge phenomenon of static electricity charged on the mask M while the mask case 600 containing the mask M is being transported on the transport cart 700.

[0093] The first electrode part 711 is electrically connected to an electrode member 713 provided on the front side of the mechanical stopper 704. The electrode member 713 is a conductive member, such as a bus bar.

[0094] 9, when storing the mask case 600 in the mask buffer 310, the transport cart 700 is positioned by riding on a positioning frame 311 provided on the mask buffer 310. As shown in FIG. 14A, the positioning frame 311 is provided with a mechanical stopper 315. The transport cart 700 is positioned on the positioning frame 311 by the mechanical stopper 704 of the transport cart 700 coming into contact with the mechanical stopper 315 of the positioning frame 311.

[0095] 14B is an enlarged view of the mechanical stopper 315. The mechanical stopper 315 is provided with a second electrode part 312 and a shock absorbing part 313 such as a shock absorber.

[0096] The shock absorbing part 313 absorbs the shock when the mechanical stopper 704 of the transport cart 700 comes into contact with the mechanical stopper 315 .

[0097] The second electrode part 312 is, for example, a contact probe, and is electrically connected to an electrode member 713 of the transport cart 700 when the transport cart 700 is positioned on the positioning frame 311. In this embodiment, the second electrode part 312 is biased by a biasing member 316 such as a compression spring so that the tip of the second electrode part 312 protrudes beyond the mechanical stopper surface 315a. As a result, when the mechanical stopper 315 comes into contact with the mechanical stopper 704 and the transport cart 700 stops, even if the transport cart 700 is pushed back by the reaction force of the shock absorbing part 313, the contact (electrical connection) between the second electrode part 312 and the electrode member 713 can be maintained.

[0098] The second electrode part 312 is grounded. Therefore, when the transport cart 700 is positioned on the positioning frame 311, static electricity charged on the mask case 600 can be released to the ground via the first electrode part 711, the electrode member 713, and the second electrode part 312. This makes it possible to prevent the pattern formed on the mask M from being destroyed by the discharge of static electricity.

[0099] When the transport cart 700 is positioned on the positioning frame 311 , the mask case 600 placed on the placement section 701 is carried into the mask buffer 310 .

[0100] <Mask Buffer 310> As shown in FIG. 8, the mask buffer 310 includes a plurality of slots SLT in which the mask cases 600 are stored, and each slot SLT is provided with a shelf portion 320 on which the mask case 600 is placed.

[0101] Figures 16(A) and 16(B) are diagrams for explaining the configuration of each shelf portion 320, where Figure 16(A) is a schematic diagram of the shelf portion 320 of the mask buffer 310 as viewed from the +Z direction, and Figure 16(B) is a cross-sectional view along line A-A in Figure 16(A).

[0102] As shown in FIGS. 16A and 16B, the shelf portion 320 has a pair of support portions 320a that support the mask case 600, and a frame portion 320b to which the support portions 320a are fixed.

[0103] The pair of support parts 320a are spaced apart in the Y-axis direction, and each support part 320a extends in the X-axis direction. Each support part 320a is provided with a plurality of case support members 320c that come into contact with the mask case support parts 611 of the first case part 601a of the mask case 600 and support the mask case 600 from below.

[0104] The support portion 320a, the frame portion 320b, and the case support member 320c are electrically conductive. The support portion 320a and the frame portion 320b are electrically connected, and the case support member 320c and the support portion 320a are electrically connected. This electrically connects the case support member 320c and the frame portion 320b. In this embodiment, a non-conductive coating (e.g., an anti-corrosion coating) is formed on the surface of the support portion 320a and the surface of the frame portion 320b. Therefore, the coating is removed from the electrically connected portions of the support portion 320a and the frame portion 320b. In FIG. 16(B), the portion of the support portion 320a where the coating is removed is shown as a coating-removed region 321a, and the portion of the frame portion 320b where the coating is removed is shown as a coating-removed region 321b.

[0105] The frame portion 320b is grounded. As a result, when the mask case 600 is placed on the shelf portion 320, static electricity charged on the mask case 600 is guided to the frame portion 320b via the case support member 320c and the support portion 320a and then released to the ground. This makes it possible to prevent the mask M accommodated in the mask case 600 and the pattern formed on the mask M from being destroyed by a discharge phenomenon of static electricity charged on the mask case 600. That is, in the mask buffer 310, the case support member 320c that contacts the mask case 600, the support portion 320a that is electrically connected to the case support member 320c, and the frame portion 320b that is electrically connected to the support portion 320a and is grounded function as a static elimination mechanism that eliminates static electricity charged on the mask case 600.

[0106] For example, a static elimination brush having conductive bristles extending toward the mask case 600 may be provided on the surface of the support part 320a facing the mask case 600 (the surface on the +Z side). In this case, the conductive bristles are electrically connected to the support part 320a. This allows the static elimination brush to guide static electricity charged on the mask case 600 to the frame part 320b. When a static elimination brush is provided, the case support member 320c may be non-conductive.

[0107] <Buffer Arm 330> The mask cases 600 stocked in the mask buffer 310 are carried in and out by the buffer arm 330. Fig. 17 is a schematic diagram showing the configuration of the buffer arm 330. The buffer arm 330 includes an arm portion 331 that is driven in the X-axis direction to remove the mask cases 600 from the mask buffer 310 (more specifically, the shelf portion 320) and to insert the mask cases 600 into the mask buffer 310, and a static elimination mechanism 340 that eliminates static electricity charged on the arm portion 331.

[0108] The arm portion 331 includes a conductive main body portion 331a, a positioning mechanism 331b, and a base portion 331c. The base portion 331c supports the mask case support portion 611 of the mask case 600. The positioning mechanism 331b engages with a recess 612a provided in a positioning portion 612 of the mask case 600, and determines the position of the mask case 600 relative to the buffer arm 330 so that the mask case support portion 611 is supported by the base portion 331c. The positioning portion 612 is conductive and is electrically connected to the first case portion 601a of the mask case 600.

[0109] The arm portion 331 is driven in the X-axis direction as indicated by the arrow AR31 by a first drive mechanism 333, such as a linear guide, held by a conductive first frame 332. This allows the arm portion 331 to enter the slot SLT. The first frame 332 is driven in the Z-axis direction as indicated by the arrow AR32 by a second drive mechanism 335, such as a linear guide, held by a conductive second frame 334. This allows the mask case 600 to be removed from each slot SLT located at different positions in the Z-axis direction. When removing the mask M from the slot SLT, the second case portion 601b remains in the slot SLT, and only the first case portion 601a containing the mask M is removed by the arm portion 331.

[0110] The static elimination mechanism 340 includes a third electrode part 341 , a first static elimination brush 342 , and a second static elimination brush 343 .

[0111] The third electrode part 341 is, for example, a contact probe, which comes into contact with the mask case 600 (positioning portion 612) when the mask case 600 is placed on the arm portion 331. This electrically connects the mask case 600 and the third electrode part 341. The third electrode part 341 is biased by a biasing member 345, such as a compression spring, so that the tip of the third electrode part 341 is located above the position where the positioning portion 612 of the mask case 600 is located when the mask case 600 is placed on the arm portion 331. This more reliably ensures electrical continuity between the mask case 600 and the third electrode part 341. The third electrode part 341 is electrically connected to the main body portion 331a. This allows static electricity charged on the mask case 600 to be conducted to the main body portion 331a.

[0112] The first static elimination brush 342 has conductive bristles extending toward the main body 331a. The first static elimination brush 342 is electrically connected to the first frame 332. In this embodiment, a non-conductive coating is formed on the surface of the main body 331a of the arm 331, but the coating is removed in the areas indicated by dotted hatching in FIG. 17 . Specifically, the coating is removed from the underside of the end on the −X side and the underside near the center of the main body 331a, exposing the material of the main body 331a. If the area where the coating is removed on the underside of the end on the −X side is referred to as a coating removal area 336a and the area where the coating is removed on the underside near the center is referred to as a coating removal area 336b, the first static elimination brush 342 can conduct static electricity charged on the main body 331a to the first frame 332 when facing the coating removal area 336a and the coating removal area 336b. In other words, the first de-ionizing brush 342 guides the static electricity charged on the main body portion 331a (arm portion 331) to the first frame 332 when the arm portion 331 is positioned closest to the mask buffer 310 in the X-axis direction and when it is positioned closest to the second frame 334 in the X-axis direction.

[0113] The second static elimination brush 343 has conductive bristles extending toward the first frame 332. The second static elimination brush 343 is electrically connected to the second frame 334. In this embodiment, a non-conductive coating is formed on the surface of the first frame 332, but the coating has been removed in the areas indicated by dotted hatching in FIG. 17 . Specifically, the coating has been removed from the end of the first frame 332 on the −Z side, exposing the material of the first frame 332. If the area of ​​the first frame 332 from which the coating has been removed is referred to as the coating removal area 332a, then the second static elimination brush 343, when facing the coating removal area 332a, can conduct static electricity charged on the first frame 332 to the second frame 334. Although Figure 17 illustrates one second discharging brush 343, in this embodiment, the second discharging brush 343 is provided in at least two locations so as to face the coating removal area 332a of the first frame 332 when the first frame 332 is at its highest position and its lowest position in the Z-axis direction.

[0114] The second static elimination brush 343 may be provided to face the coating removal region 332a of the first frame 332 at least one of the times when the first frame 332 is at the highest position and the lowest position in the Z axis direction. The second static elimination brush 343 may be provided at a plurality of locations spaced apart in the Z axis direction to correspond to the stopping positions of the arm portion 331 in the Z axis direction (positions corresponding to the slots SLT).

[0115] The second frame 334 is grounded. This allows static electricity charged on the mask case 600 to be dissipated to the ground via the third electrode part 341, the main body 331a, the first charge-discharging brush 342, the first frame 332, the second charge-discharging brush 343, and the second frame 334. As described above, the first charge-discharging brush 342 guides static electricity charged on the main body 331a (arm 331) to the first frame 332 when the arm 331 is positioned closest to the mask buffer 310 in the X-axis direction and when the arm 331 is positioned closest to the second frame 334 in the X-axis direction. Therefore, when the mask case 600 is removed from the shelf 320 and when the mask case 600 is returned to the shelf 320, static electricity charged on the mask case 600 can be removed.

[0116] The mask M housed in the first case part 601a is transported by the buffer arm 330 to a predetermined position in the Z-axis direction and is then removed from the mask case 600 (first case part 601a) by the mask transport mechanism 370. The PPD arm 391 moves to a position below the mask transport mechanism 370, and the mask M is transferred from the mask transport mechanism 370 to the PPD arm 391. The PPD arm 391 carrying the mask M moves into the PPD 390. Inside the PPD 390, the presence or absence of foreign matter adhering to the pellicle PLCL of the mask M and the presence or absence of foreign matter adhering to the surface of the mask M opposite the surface on which the pellicle PLCL is provided are inspected. After the foreign matter inspection, the PPD arm 391 carrying the mask M moves below the mask transport mechanism 370, and the mask M is transferred from the PPD arm 391 to the mask transport mechanism 370.

[0117] The mask transport mechanism 370 holding the mask M moves the mask M to the mask stage 114 of the main body 100 .

[0118] <Mask transport mechanism 370> Figure 18(A) is a diagram showing the appearance of the mask transport mechanism 370 according to this embodiment, and Figure 18(B) is a schematic diagram showing the configuration of the mask transport mechanism 370. As shown in Figures 18(A) and 18(B), the mask transport mechanism 370 includes a pair of holders 371 that hold the mask M, and a static elimination mechanism 380 that eliminates static electricity charged to the holders 371. Note that Figure 18(B) shows one of the pair of holders 371.

[0119] The holder 371 includes a conductive support portion 371a that comes into contact with and supports the mask M, and an arm portion 371b that is connected to the support portion 371a and can be driven in the Y-axis direction. A portion of the arm portion 371b is housed in a housing 372. The arm portion 371b is driven in the Y-axis direction by an actuator 373, such as a guided cylinder. The actuator 373 is also housed in the housing 372.

[0120] The support portion 371 a and the arm portion 371 b are electrically conductive. The static elimination mechanism 380 includes a connection portion 381 that electrically connects the support portion 371 a and the arm portion 371 b and guides static electricity charged on the support portion 371 a to the arm portion 371 b, and a static elimination brush 382 that guides static electricity charged on the arm portion 371 b to the housing 372.

[0121] In this embodiment, the support portion 371a is rotatable around the axis 371c, as indicated by arrow AR41. Therefore, the connection portion 381 has elasticity to ensure a reliable electrical connection between the support portion 371a and the arm portion 371b. For example, a metal leaf spring can be used as the connection portion 381. The arm portion 371b is made of a conductive material with a non-conductive coating formed on its surface, but the coating is removed from the portion 371e to which the connection portion 381 is connected. This allows the connection portion 381 to conduct static electricity charged on the support portion 371a to the arm portion 371b.

[0122] Furthermore, for example, the coating of the arm portion 371b is removed from a portion 371f that faces the discharging brush 382 when the support portion 371a is holding the mask M. This allows the static electricity charged on the arm portion 371b to be conducted to the housing 372 when the support portion 371a is holding the mask M.

[0123] The housing 372 is conductive and grounded. Therefore, while the mask transport mechanism 370 transports the mask M, static electricity charged on the mask M is guided to the housing 372 via the support portion 371a, the arm portion 371b, and the charge removal brush 382, ​​and can be released from the housing 372 to the ground. This prevents the pattern formed on the mask M from being destroyed by the discharge of static electricity charged on the mask M. Note that if the arm portion 371b is made up of multiple components, the coating is removed from the connection portions of the multiple components to achieve electrical connection.

[0124] As described above in detail, according to this embodiment, the exposure apparatus EX is provided with a discharging brush 500 that dissipates static electricity that has accumulated on the substrate tray 201 while the substrate tray 201 that supports the substrate P is moving. The substrate tray 201 has a conductive base member 201a, a discharging brush 210a that faces the substrate P supported by the substrate tray 201 and guides static electricity that has accumulated on the substrate P to the base member 201a, and a conductive support member 201b, and the discharging brush 500 dissipates the static electricity that has been guided to the base member 201a. This makes it possible to prevent devices such as TFTs formed on the substrate P from being damaged by the discharge of static electricity that has accumulated on the substrate P while the substrate P is being transported using the substrate tray 201.

[0125] Furthermore, in this embodiment, the static elimination brush 500 is provided in an area located between the main body 100, which eliminates static electricity from the substrate P, and the stand 204, and eliminates static electricity that has accumulated on the substrate tray 201 while the substrate tray 201 moves through this area. In this embodiment, the substrate P placed on the substrate holder 121 is neutralized by an X-ray ionizer provided in the main body 100, but if the static elimination brush 500 is not provided, there is no means for dissipating the static electricity that has accumulated on the substrate P (static electricity that has accumulated on the substrate tray 201) while the substrate P is being transported between the main body 100 and the stand 204, and there is a risk that devices such as TFTs formed on the substrate P will be destroyed by the discharge phenomenon of the static electricity that has accumulated on the substrate P. By providing the anti-static brush 500 in the area located between the main body 100 and the stand 204, it is possible to eliminate static electricity conducted from the substrate P to the substrate tray 201 while the substrate P is being transported between the main body 100 and the stand 204, thereby preventing devices such as TFTs formed on the substrate P from being destroyed by the discharge phenomenon of static electricity charged on the substrate P.

[0126] Furthermore, in this embodiment, the discharging brush 500 is provided so as to face the surface of the substrate tray 201 opposite the surface that holds the substrate P. The surface of the substrate tray 201 that holds the substrate P is covered by the substrate P, and therefore even if the discharging brush 500 is provided so as to face the surface that holds the substrate P, there is a risk that static electricity charged to the substrate tray 201 may not be sufficiently removed. By providing the discharging brush 500 so as to face the surface of the substrate tray 201 opposite the surface that holds the substrate P, static electricity charged to the substrate tray 201 can be more reliably removed compared to when the discharging brush 500 is provided so as to face the surface that holds the substrate P.

[0127] Furthermore, in this embodiment, the discharging brush 500 does not come into contact with the substrate tray 201. If the discharging brush 500 comes into contact with the substrate tray 201 and becomes worn, the wear may cause dust to be generated inside the exposure apparatus EX, and this dust may cause exposure defects. Because the discharging brush 500 does not come into contact with the substrate tray 201, it is possible to prevent dust from being generated inside the exposure apparatus EX due to wear, and this dust from causing exposure defects.

[0128] Furthermore, the discharging brush 500 extends in a direction (Y-axis direction) that intersects with the movement direction (X-axis direction) of the substrate tray 201. This makes it possible to reduce the area that the discharging brush 500 occupies in the X-axis direction, and therefore to dissipate static electricity that has accumulated on the substrate tray 201 without increasing the size of the exposure apparatus EX.

[0129] In this embodiment, the substrate tray 201 is provided with a discharge cord 210b electrically connected to the base member 201a. This allows the discharge cord 210b to discharge the static electricity charged on the substrate tray 201 into the air even at times when the static electricity charged on the substrate tray 201 cannot be removed by the discharging brush 500.

[0130] Furthermore, according to this embodiment, the substrate tray 201 supports the substrate P to be moved, and includes a conductive base member 201a, a discharging brush 210a that faces the substrate P and guides static electricity charged on the substrate P to the base member 201a, and a discharge cord 210b electrically connected to the base member 201a. As a result, while the substrate P is supported on the substrate tray 201, the static electricity charged on the substrate P can be guided to the base member 201a by the discharging brush 210a and discharged by the discharge cord 210b, and therefore it is possible to prevent devices such as TFTs formed on the substrate P from being damaged by the discharge phenomenon of static electricity charged on the substrate P.

[0131] Furthermore, according to this embodiment, the mask case 600 includes a case body 601, at least a portion of which is conductive and which houses the mask M, a mask support member 603 and a discharging brush 604 which guide static electricity charged on the mask M to the conductive portion of the case body 601, and a discharge cord 602 which is electrically connected to the conductive portion and discharges static electricity charged on the conductive portion. As a result, while the mask M is stored in the mask case 600 (step S11 in FIG. 10 , step S35 in FIG. 11 , step S41 in FIG. 11 ), the static electricity charged on the mask M can be guided to the case body 601 by the mask support member 603 and the discharging brush 604 and discharged by the discharge cord 602, thereby preventing the pattern formed on the mask M from being destroyed by the discharge phenomenon of static electricity charged on the mask M.

[0132] In this embodiment, the case body 601 includes a first case portion 601a having a bottom surface BS and a second case portion 601b detachably attached to the first case portion 601a and having a ceiling surface CS disposed opposite the bottom surface BS. The first case portion 601a is conductive, and a mask support member 603 is provided on the bottom surface BS so as to face the mask M and guides static electricity charged on the mask M to the first case portion 601a. ​​The discharge cord 602 is provided on the outside of the first case portion 601a and neutralizes (discharges) static electricity charged on the first case portion 601a. ​​As a result, while the mask M is stored in the mask case 600, static electricity charged on the mask M is guided to the first case portion 601a by the mask support member 603 and discharged by the discharge cord 602, thereby preventing the pattern formed on the mask M from being destroyed by a discharge phenomenon of static electricity charged on the mask M.

[0133] In this embodiment, the second case part 601b is conductive, and the static electricity removal brush 604 is provided on the ceiling surface CS of the second case part 601b, faces the mask M, and guides static electricity charged on the mask M to the second case part 601b. The first case part 601a and the second case part 601b are electrically connected when the second case part 601b is attached to the first case part 601a. ​​This allows static electricity charged on the mask M to be guided to the second case part 601b by the static electricity removal brush 604 and discharged from the discharge cord 602 via the second case part 601b and the first case part 601a.

[0134] Furthermore, in this embodiment, the transport cart 700 that transports the mask case 600 includes a mounting section 701 on which the mask case 600 is placed, and a static elimination mechanism 710 that eliminates static electricity that has accumulated on the mask case 600 placed on the mounting section 701. This allows static electricity that has accumulated on the mask case 600 to be eliminated while the mask case 600 is being transported (step S13 in FIG. 10, step S39 in FIG. 11), thereby preventing the pattern formed on the mask M stored in the mask case 600 from being destroyed by the static electricity discharge phenomenon.

[0135] In addition, in this embodiment, the static elimination mechanism 710 includes a first electrode part 711 electrically connected to a conductive part (mask case support part 611) of the mask case 600, and a discharge cord 712 electrically connected to the first electrode part 711 and for eliminating static electricity charged to the mask case 600. As a result, static electricity charged to the mask case 600 can be discharged by the discharge cord 712 while the mask case 600 is being transported.

[0136] Furthermore, in this embodiment, the static elimination mechanism 710 includes an electrode member 713 electrically connected to the first electrode part 711, and the electrode member 713 is disposed on the positioning frame 311 and is electrically connected to the grounded second electrode part 312 when the transport cart 700 is positioned on the positioning frame 311. This allows static electricity charged on the mask case 600 to be released to the ground when the transport cart 700 is positioned on the positioning frame 311 (step S15 in FIG. 10).

[0137] In this embodiment, the mask buffer 310, which can store a plurality of mask cases 600, includes a shelf 320 on which the mask cases 600 are placed, and a static elimination mechanism that eliminates static electricity that has accumulated on the mask cases 600 placed on the shelf 320. Specifically, the shelf 320 includes a conductive case support member 320c that contacts a conductive portion (mask case support portion 611) of the mask case 600 and supports the mask case 600 from below, and a conductive frame 320b to which the case support member 320c is fixed. The static elimination mechanism electrically connects the case support member 320c to the frame 320b and grounds the frame 320b, thereby eliminating static electricity that has accumulated on the mask cases 600. This allows the static electricity charged on the mask case 600 to be discharged while the mask case 600 is stored in the mask buffer 310 (step S17 in Figure 10, step S37 in Figure 11), thereby preventing the pattern formed on the mask M stored in the mask case 600 from being destroyed by the static electricity discharge phenomenon.

[0138] In this embodiment, the buffer arm 330, which transports the mask case 600 from and into the mask buffer 310 that stocks the mask case 600, includes an arm unit 331 that moves in a direction parallel to the surface of the mask M to remove the mask case 600 from and insert the mask case 600 into the mask buffer 310, and a static elimination mechanism 340 that eliminates static electricity charged to the arm unit 331. The arm unit 331 is electrically connected to the mask case 600 while holding the mask case 600. This allows static electricity charged to the mask case 600 to be eliminated while the mask case 600 is being transported by the buffer arm 330 (step S19 in FIG. 10 ), thereby preventing the pattern formed on the mask M stored in the mask case 600 from being destroyed by static electricity discharge.

[0139] In this embodiment, the arm portion 331 includes a conductive main body portion 331a and a base portion 331c that is electrically connected to the main body portion 331a and supports the mask case 600. The static elimination mechanism 340 includes a third electrode component 341 that is electrically connected to the main body portion 331a and that contacts a conductive portion (positioning portion 612) of the mask case 600 supported by the base portion 331c to guide static electricity charged on the mask case 600 to the main body portion 331a. As a result, while the arm portion 331 supports the mask case 600, static electricity charged on the mask case 600 can be guided to the main body portion 331a.

[0140] In this embodiment, the buffer arm 330 includes a first frame 332 that holds a first drive mechanism 333 that drives the arm portion 331 in the X-axis direction, and a second frame 334 that holds a second drive mechanism 335 that drives the first frame 332 in the Y-axis direction that is substantially perpendicular to the surface of the mask M. The static elimination mechanism 340 includes a first static elimination brush 342 that faces the arm portion 331 and guides static electricity charged on the arm portion 331 (main body portion 331 a) to the first frame 332, and a second static elimination brush 343 that faces the first frame 332 and guides static electricity charged on the first frame 332 to the second frame 334, the second frame 334 being grounded. This allows static electricity guided from the mask case 600 to the main body portion 331 a to be released to the ground via the first static elimination brush 342, the first frame 332, the second static elimination brush 343, and the second frame 334.

[0141] Furthermore, in this embodiment, when the arm portion 331 is positioned closest to the mask buffer 310 in the X-axis direction, and when the arm portion 331 is positioned closest to the second frame 334 in the X-axis direction, the first discharging brush 342 guides static electricity charged on the arm portion 331 to the first frame 332. This makes it possible to discharge static electricity charged on the mask case 600 when removing the mask case 600 from the mask buffer 310 or when returning the mask case 600 to the mask buffer 310.

[0142] Furthermore, according to this embodiment, the mask transport mechanism 370 that transports the mask M to the main body 100 includes a holding unit 371 that holds the mask M, and a static elimination mechanism 380 that eliminates static electricity that has accumulated on the holding unit 371. As a result, while the mask M is being transported by the mask transport mechanism 370 (steps S20 and S23 in FIG. 10, step S33 in FIG. 11), static electricity that has accumulated on the mask case 600 can be eliminated, thereby preventing the pattern formed on the mask M stored in the mask case 600 from being destroyed by the static electricity discharge phenomenon.

[0143] 10 and 11 , when the mask M is carried into the PPD 390 (step S21 in FIG. 10 ), when the mask M is mounted on the mask stage 114 (step S25 in FIG. 10 ), when the mask M is removed from the mask stage 114 (step S31 in FIG. 11 ), and when the mask M is taken out of the mask case 600 (step S43 in FIG. 11 ), conventionally, static electricity charged on the mask M is removed using an X-ray ionizer or the like, but no process for removing static electricity charged on the mask M has been performed in other steps. According to this embodiment, measures are taken to remove static electricity charged on the mask M in each step other than step S21 in FIG. 10 , step S25 in FIG. 10 , step S31 in FIG. 11 , and step S43 in FIG. 11 , thereby making it possible to further prevent the pattern formed on the mask M from being destroyed by the discharge of static electricity.

[0144] In the above embodiment, an X-ray ionizer may be provided instead of the discharging brush 500. In this case, the X-ray ionizer may be provided so that X-rays are irradiated onto the surface of the substrate tray 201 opposite to the surface that holds the substrate P.

[0145] In the above embodiment, the first case part 601a is provided with the conductive mask support member 603, and the second case part 601b is provided with the static elimination brush 604. However, for example, the static elimination brush 604 may be omitted. Alternatively, when the static elimination brush 604 is provided, the mask support member 603 may be non-conductive.

[0146] In the above embodiment, a static elimination brush having conductive bristles that are electrically connected to the first case portion 601a and extend toward the mask M may be provided in the first case portion 601a.

[0147] In the buffer arm 330 of the above embodiment, the third electrode part 341 is electrically connected to the positioning part 612 of the mask case 600, but this is not limitative. For example, the third electrode part 341 may be provided on the base part 331c and electrically connected to the mask case support part 611 of the mask case 600.

[0148] Furthermore, in the above embodiment, the exposure apparatus EX has been described as an exposure apparatus that uses a mask M, but the mechanism for discharging static electricity charged on the substrate P can also be applied to a so-called maskless exposure apparatus that forms a pattern using, for example, a spatial light modulator instead of a mask M.

[0149] In the above embodiment, some of the static elimination mechanisms may be omitted.

[0150] In the above embodiment, a discharge cable may be provided on the grounded member so that the member is not grounded.

[0151] Furthermore, in the above embodiment, the exposure apparatus EX is described as an exposure apparatus that transfers the pattern of the mask M onto the substrate P, but the exposure apparatus EX may also be, for example, a semiconductor exposure apparatus that forms a pattern formed on a reticle onto a wafer.

[0152] The above-described embodiment is a preferred example of the present invention, but the present invention is not limited to this and can be modified in various ways without departing from the spirit of the present invention.

[0153] The following supplementary notes are further disclosed with respect to the above-described embodiment. [Supplementary Note 1] A transport device for transporting a mask to an exposure apparatus main body, comprising: a holding unit for holding the mask; and a static elimination mechanism for eliminating static electricity charged to the holding unit. [Supplementary Note 2] The transport device described in Supplementary Note 1, wherein the holding unit comprises a conductive support unit that comes into contact with the mask and supports the mask, and the static elimination mechanism eliminates static electricity charged to the holding unit by directing the static electricity charged to the support unit to another grounded member. [Supplementary Note 3] The transport device described in Supplementary Note 2, wherein the holding unit comprises an arm unit to which the support unit is fixed and that is drivable in a first direction parallel to the surface of the mask, and the static elimination mechanism includes: a connection unit that electrically connects the support unit and the arm unit and directs static electricity charged to the support unit to the arm unit, and a sixth static elimination member that directs static electricity charged to the arm unit to a housing that houses the arm unit and is grounded. [Supplementary Note 4] The transport device according to Supplementary Note 3, wherein the connecting portion is an elastic plate-like member. [Supplementary Note 5] The transport device according to Supplementary Note 3 or Supplementary Note 4, wherein the sixth charge eliminating member guides static electricity charged on the arm portion to the housing when the holding portion holds the mask. [Supplementary Note 6] The transport device according to any one of Supplementary Notes 3 to 5, wherein the sixth charge eliminating member is a charge eliminating brush having conductive bristles.

[0154] 100 Main body 114 Mask stage 310 Mask buffer 312 Second electrode part 320 Shelf part 320a Support part 320b Frame part 330 Buffer arm 331 Arm part 331a Main body 331c Base part 332 First frame 333 First drive mechanism 334 Second frame 335 Second drive mechanism 340 Discharge mechanism 341 Third electrode part 600 Mask case 601 Case main body 601a First case part 601b Second case part 602 Discharge cable 603 Mask support member 604 Discharge brush 605a to 605e Electrode member 700 Transporting cart 701 Placement part 710 Discharge mechanism 711 First electrode part 712 Discharge cable 713 Electrode member BS Bottom CS Ceiling EX Exposure device

Claims

1. A mask case comprising: a case body, at least a portion of which is conductive, for housing a mask; a conductive member that directs static electricity charged to the mask to the conductive portion of the case body; and a first static elimination member that is electrically connected to the conductive portion and eliminates static electricity charged to the conductive portion.

2. The mask case according to claim 1, wherein the first charge removing member is a discharge cord.

3. A mask case as described in claim 1 or claim 2, wherein the case body includes: a first case portion having a bottom surface; and a second case portion which is detachably attached to the first case portion and has a ceiling surface disposed opposite the bottom surface, and at least one of the first case portion and the second case portion has a portion having electrical conductivity.

4. The mask case according to claim 3, wherein the first case part is conductive, the conductive member is provided on the bottom surface facing the mask and includes a first conductive member that guides static electricity charged on the mask to the first case part, and the first static elimination member is provided on the outside of the first case part and eliminates static electricity charged on the first case part.

5. The mask case according to claim 4, wherein the first conductive member is electrically connected to the first case portion and includes a plurality of conductive support members that contact the mask and support the mask.

6. The mask case according to claim 5, comprising: a first electrode member electrically connecting the plurality of conductive support members and the first case portion; and a second electrode member electrically connecting the first case portion and the first static elimination member.

7. A mask case as described in any one of claims 4 to 6, wherein the first conductive member is electrically connected to the first case portion and includes an anti-static brush having a conductive bristles extending toward the mask.

8. The mask case according to claim 7, further comprising a third electrode member that electrically connects the static electricity removing brush and the first case portion.

9. A mask case as described in any one of claims 4 to 8, wherein the second case part is conductive, the conductive member includes a second conductive member that is provided on the ceiling surface of the second case part, faces the mask, and guides static electricity charged on the mask to the second case part, and the first case part and the second case part are electrically connected when the second case part is attached to the first case part.

10. The mask case according to claim 9, comprising: a fourth electrode member that electrically connects the second case portion and the second conductive member; and a fifth electrode member that electrically connects the first case portion and the second case portion.

11. A mask case as described in claim 9 or claim 10, wherein the second conductive member is an anti-static brush having a conductive bristles extending toward the first case portion.

12. A transport cart for transporting a mask case according to any one of claims 1 to 11, comprising: a mounting section on which the mask case is placed; and a static elimination mechanism for eliminating static electricity charged to the mask case placed on the mounting section.

13. The transport cart described in claim 12, wherein the de-electrification mechanism comprises: a first electrode part electrically connected to the conductive portion of the mask case; and a third de-electrification member electrically connected to the first electrode part and de-electrifying static electricity charged to the mask case.

14. A transport cart as described in claim 13, wherein the static elimination mechanism includes a fifth electrode member electrically connected to the first electrode part, and when the transport cart is positioned at a predetermined location, the fifth electrode member is disposed at the predetermined location and is electrically connected to a grounded second electrode part.

15. A mask buffer capable of storing a plurality of mask cases according to any one of claims 1 to 11, comprising: a shelf portion on which the mask cases are placed; and a static elimination mechanism that eliminates static electricity charged to the mask cases placed on the shelf portion.

16. A mask buffer as described in claim 15, wherein the shelf portion comprises: a conductive case support portion that contacts the conductive portion of the mask case and supports the mask case from below; and a conductive frame portion to which the case support portion is fixed; and the static electricity removal mechanism electrically connects the case support portion and the frame portion and grounds the frame portion to remove static electricity charged to the mask case.

17. A transport device for transporting a mask case from a mask buffer that stocks a mask case according to any one of claims 1 to 11 and transporting the mask case into the mask buffer, comprising: an arm section that is driven in a first direction parallel to a surface of the mask to remove the mask case from the mask buffer and insert the mask case into the mask buffer; and a static electricity removal mechanism that removes static electricity charged to the arm section, wherein the arm section is electrically conductive with the mask case while holding the mask case.

18. A conveying device as described in claim 17, wherein the arm portion comprises a conductive main body portion and a support member that supports the mask case, and the static elimination mechanism includes a third electrode component that is electrically connected to the main body portion and contacts the conductive portion of the mask case supported by the support member to guide static electricity charged on the mask case to the main body portion.

19. A conveying device as described in claim 17 or claim 18, comprising: a first frame holding a first drive mechanism that drives the arm portion in the first direction; and a second frame holding a second drive mechanism that drives the first frame in a second direction approximately perpendicular to the surface of the mask, wherein the static elimination mechanism includes: a fourth static elimination member that faces the arm portion and guides static electricity charged to the arm portion to the first frame; and a fifth static elimination member that faces the first frame and guides static electricity charged to the first frame to the second frame, and the second frame is grounded.

20. A conveying device as described in claim 19, wherein the fourth charge removal member guides static electricity charged in the arm portion to the first frame when the arm portion is positioned closest to the mask buffer in the first direction and when the arm portion is positioned closest to the second frame in the first direction.

21. A conveying device as described in claim 19 or claim 20, wherein the fifth de-ionizing member guides static electricity charged on the first frame to the second frame at least one of the times when the first frame is at the highest position and the lowest position in the second direction.

22. A conveying device according to any one of claims 19 to 21, wherein the fourth charge eliminating member and the fifth charge eliminating member are charge eliminating brushes having conductive bristles.

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