System for replicating an object in holography

Abstract

The present invention relates to a system for replicating an object in holography, comprising: means for irradiating the object with a beam at a set angle of incidence; means for adapting an extent of the beam before the beam is incident on the object, based at least in part on the set angle of incidence. Furthermore, the invention relates to a corresponding device and method and a corresponding computer program.

Description

[0001] SYSTEM FOR REPLICATION OF A HOLOGRAPHIC OBJECT

[0002] 1. Technical area

[0003] The present invention relates to systems, devices and methods for replicating a holographic object.

[0004] 2. State of the art

[0005] In the field of holography, holograms are typically recorded in a holographic storage device. For example, a holographic recording of an object can be made using an object wave and a reference wave, with the interference of the object wave and the reference wave being recorded in a suitable medium of the holographic storage device. The holographic recording of the holographic storage device can then usually be reconstructed by exposing the holographic storage device to a wave that should be essentially identical to the reference wave during recording.

[0006] Through the special recording and storage of wave fields in holography, a unique spatial impression of the reconstructed hologram can be created for the user. However, holograms can also be used to create optical components (e.g., lenses, mirrors, prisms). Holograms can therefore be useful for numerous applications.

[0007] In industrial settings, once created, holographic memories are usually duplicated. This way, for example, multiple holographic memories can be created from a master memory, from which the hologram of the master memory can be reconstructed. In the field of holography, the duplication of holographic memories can also be referred to as replication.

[0008] For example, WO2O23148375A1 and its priority-establishing DE 10 2022 102 646 Ai describe techniques for producing a holographic optical element (HOE) by replicating a master HOE. The replication process in the field of holography is technically complex, since the information from the holographic master memory cannot usually be easily transferred to another holographic memory. Rather, replication usually requires a complex exposure of the master memory. Furthermore, the replication must be performed in such a way that the copy of the master memory meets the desired requirements.

[0009] There is therefore a need to improve and / or further develop replication in the field of holography.

[0010] 3. Summary of the invention

[0011] This need is at least partially met by the various aspects of the present invention.

[0012] A first aspect relates to a system for replicating a holographic object, comprising: means for irradiating the object with a beam at a set angle of incidence; means for adapting an extension of the beam prior to impingement of the beam on the object based at least in part on the set angle of incidence.

[0013] The object of the holography can, for example, comprise a holographic memory in which one or more holograms are recorded. The recordings of the one or more holograms can be reconstructed, for example, using a corresponding holographic reconstruction process. This may require, for example, irradiating the object of the holography with light.

[0014] For example, the object of holography can also comprise a transparent substrate in which the holographic memories are located at one or more locations. Such a transparent substrate can, for example, be part of a display for a user, whereby the holograms in the holographic memories can be reconstructed during a display process.

[0015] For example, the object of holography can also comprise a holographic optical element (HOE). For example, the holographic element can comprise one or more holograms that are used or configured as optical components (e.g., as lenses, mirrors, prisms, etc.).

[0016] In one example, the object of the holography has a first dimension along a first direction of at least 10 mm, at least 50 mm, at least 100 mm, at least 200 mm, at least 300 mm, or at least 500 mm. The first dimension may, for example, include a length or width of the object. In one example, the first dimension is at most 1500 mm, at most 500 mm, at most 300 mm, at most 200 mm, or at most 100 mm.

[0017] Replication (or replication) according to the disclosure described herein can be understood as duplicating or copying. The system described herein can thus be configured to precisely duplicate or copy the holographic object, particularly if the object has the aforementioned large dimensions. The system described herein can thus represent a precise replication system in the field of holography.

[0018] For example, the holographic object can also be referred to as a master element. From this master element, one or more copy elements can then be created via replication with the system, which (essentially) exhibit the holographic properties of the master element.

[0019] During replication, it may be necessary to irradiate the object with a beam. For example, it may be necessary to direct the beam onto or into the object to cause a reflection. Typically, the reflection should occur at least where the hologram is recorded in the object (e.g., at a corresponding recording layer). The beam reflected by the object can then be used, for example, to replicate the holographic object.

[0020] For this purpose, the system comprises the means for irradiating the object. In particular, the means for irradiating the object is configured to irradiate the object at a set angle of incidence. For example, during replication it may be necessary to irradiate the object at a selected angle of incidence in order to achieve a desired quality of the copy. This can be ensured using the means for irradiation described herein. The means for irradiating the object can, for example, comprise an irradiation unit of the system with one or more optical components for irradiating the object with the beam at the selected angle of incidence. Using the means for irradiation, for example, a selected angle of incidence to the object can be set so that the beam strikes the object at this selected angle of incidence. The means for irradiation can, for example, be configured so that angles of incidence to the object can be set in a range of 0° - 90°.For example, the means for irradiating can be arranged so that the angle of incidence to the object is in a range of 0° - 89°, 0° - 8o°, 0° - 6o°, 0° - 45. 0 , or o 0 - 20° can be adjusted.

[0021] One concept of the present disclosure is that the beam is adapted depending on the set angle of incidence.

[0022] The system further comprises a means for adapting an extension of the beam prior to the beam impinging on the object based at least in part on the set angle of incidence. The means for adapting can, for example, comprise an adaptation unit with one or more optical components for adapting the extension of the beam based at least in part on the set angle of incidence. It should be noted that the adaptation unit can also be referred to as an adaptation system and / or adaptation module.

[0023] It was recognized that for replicating the object it may be beneficial to change the extent of the beam depending on the set angle of incidence.

[0024] For example, during a replication process of the object it may be necessary to change the set angle of incidence. However, changing the set angle of incidence may lead to an undesired change in the extent of the beam on or in the object. For example, the extent of the beam on or in the object can vary with the angle of incidence of the beam. A variation in the angle of incidence can therefore represent a distortion of the extent of the beam on or in the object. For a replication process it can, however, be useful to keep the extent of the beam on or in the object (essentially) the same or at least to bring the extent into a defined state. However, an uncontrolled change in the extent of the beam on or in the object when the angle of incidence changes is usually undesirable.The replication process of the object must usually take place under defined optical conditions to ensure the quality of a copy element. However, even a slight change in the beam's extension on or within the object can have a disruptive effect on the quality of the copy element.

[0025] With the means for adaptation described herein, the undesired side effect of changing the extent of the beam on or in the object when the angle of incidence changes can be at least partially counteracted.

[0026] For example, the means for irradiating can provide a substantially collimated beam at the set angle of incidence with respect to the object. With a collimated beam, for example, a comparatively large angle of incidence can result in a wide extension of the beam on or in the object, whereas a comparatively small angle of incidence can result in a smaller extension of the beam on or in the object. This can be the case, for example, with a (substantially) flat object, where the beam strikes a flat surface of the object for replication. Depending on the angle of incidence, the flat surface of the object can intersect a larger or smaller part of the collimated beam, resulting in a larger or smaller extension of the beam on the object. For example, an example is conceivable in which a collimated beam has a certain extension perpendicular to the beam direction.At a comparatively high angle of incidence of 89°, this beam would hit a much larger surface area of ​​the object than at an angle of incidence of 0°.

[0027] For example, the beam referred to herein may comprise a photon beam.

[0028] For example, the means for adaptation can comprise a unit that can receive the set angle of incidence (e.g., via a signal) and, based thereon, causes an adaptation of the beam extension (e.g., via a control signal that causes control of one or more optical components of the means for adaptation). A control and / or regulation can therefore be implemented via the means for adaptation and the means for irradiation, in which an adaptation of the beam extension takes place depending on the set angle of incidence. In one example, the means for adaptation can be configured to adapt, as the extension of the beam, a diameter of the beam along a beam cross-sectional axis that is perpendicular to the beam direction of the beam. The diameter of the beam along the beam cross-sectional axis can, for example,determined based on a beam intensity profile across a cross-section of the beam perpendicular to the beam direction. The adapting means can, for example, be configured to increase or decrease the diameter of the beam along a beam cross-section axis.

[0029] With regard to the adaptation of the diameter along a beam cross-section axis, various examples are conceivable, each of which allows a further degree of freedom during irradiation in a replication process.

[0030] In one example, the adapting means can be configured to adapt, as the beam extension, exclusively a first diameter of the beam along a first beam cross-sectional axis perpendicular to the beam direction of the beam, wherein a second diameter of the beam along a second beam cross-sectional axis, perpendicular to the first beam cross-sectional axis, is (substantially) not adapted. In this case, for example, an extension or compression of the intensity of the beam along the first beam cross-sectional axis can occur. In this case, for example, a (substantially) elliptical beam can be generated from a circular collimated beam by the adapting means.

[0031] In one example, the means for adapting can be configured to adapt the first diameter of the beam along the first beam cross-sectional axis perpendicular to the beam direction of the beam, wherein the second diameter of the beam along the second beam cross-sectional axis, perpendicular to the first beam cross-sectional axis, is also adapted. In this case, for example, an extension or compression of an intensity of the beam can occur along the first beam cross-sectional axis and the second beam cross-sectional axis. The adaptation along the first and second beam cross-sectional axes does not necessarily have to be the same. For example, after the adaptation, the first diameter can be different from the second diameter. In this case, for example, a (substantially) elliptical beam can be generated from a circular collimated beam by the means for adapting.

[0032] However, the adapting means can also be configured to adapt the diameter of the beam uniformly. For example, after adaptation, the first diameter can also (substantially) correspond to the second diameter. In this case, for example, a (substantially) circular beam with a different second diameter can be generated from a circular collimated beam with a first diameter by the adapting means.

[0033] For example, the adapting means may comprise the system for adapting a photon beam, which is described herein starting in Chapter 6. Furthermore, the adapting means may comprise two of the photon beam adapting systems (described starting in Chapter 6). The systems may, for example, be connected in series, with a first of these systems being used to adapt the diameter along the first beam cross-sectional axis, and a second of these systems being used to adapt the diameter along the second beam cross-sectional axis.

[0034] However, examples are also possible in which the aspects of the system mentioned herein are used without providing a means for adapting an extension of the beam prior to the beam impinging on the object based at least in part on the adjusted angle of incidence.

[0035] In one example, the irradiation means may be configured to irradiate the object via at least one reflection of the beam. In one example, the irradiation means may comprise one or more reflective elements for reflecting the beam.

[0036] A reflective element according to the disclosure described herein may, for example, comprise an optical element configured such that the beam, after being irradiated onto the reflective element, is reflected away from the reflective element in a targeted manner. A reflective element may, for example, not comprise a transparent medium for the beam through which the beam can be transmitted and refracted (such as a lens through which the beam could be refracted). A reflective element may, for example, comprise a mirror that causes a reflection with respect to one or more wavelengths of the beam. Via a reflective element, the beam can be directed in a targeted manner onto the object at an angle of incidence without, for example, optical errors being introduced into the beam through dispersion, as would be the case with a lens, for example. In one example, the means for irradiating can be configured to irradiate the object via at least two reflections of the beam.For example, when dimensioning the system, it may be useful to direct the beam onto the object via two reflections.

[0037] In one example, the means for irradiating can comprise two or more reflective elements for reflecting the beam. For example, the means for irradiating can comprise two or more mirrors at which the beam can be reflected. For example, when dimensioning the system, it can be useful to direct the beam onto the object via two or more reflective elements. Furthermore, two or more reflective elements can enable a higher degree of freedom and improved control when adjusting angles of incidence (as described herein). For example, a first set of one or more reflective elements can be used to adjust a first range of angles of incidence, whereas a second set of one or more reflective elements can be used to adjust a second range of angles of incidence. The first set and the second set can, for example,differ in at least one reflective element.

[0038] In one example, the irradiation means does not have an optically transparent element through which the beam is transmitted before impinging on the object. For example, the irradiation means in this case may represent a purely reflective system without a lens through which the beam is transmitted and refracted. Thus, optical errors introduced by dispersion can be counteracted. This is advantageous for replication, where chromatic aberration caused by dispersion can lead to undesired quality changes. In one example, the irradiation means in this example may consist of one or more reflective elements for reflecting the beam.

[0039] In one example, the means for irradiating may receive a collimated beam and direct it onto the object at the set angle of incidence, in which case the means for irradiating does not have an optically transparent element through which the collimated beam is transmitted before impinging on the object. However, in this case, an optically transparent element through which the beam of the system can be transmitted may be present elsewhere in the system. In one example, the system may be configured to rasterize the object with the beam. For example, the beam may have an extent such that a local portion of the object is irradiated when the beam impinges on or within the object. An extent of the local portion may, for example, define a raster width.Rasterization allows several local sections of the object to be exposed to the beam one after the other, resulting in a larger raster section of the object being exposed to the beam. For example, the object can be rasterized along a line, although any other raster pattern is also possible.

[0040] In one example, the system may be configured to rasterize the object with the beam, wherein the means for irradiating is configured: in a first raster mode, to irradiate the object at a first angle of incidence, and in a second raster mode, to irradiate the object at a second angle of incidence; wherein the means for adapting is configured: in the first raster mode, to adapt the beam to a first extent, and in the second raster mode, to adapt the beam to a second extent.

[0041] In this example, the second angle of incidence is different from the first angle of incidence, and the second extension is different from the first extension. The adaptation of the beam to the first and second extensions can occur before the beam strikes the object. It is evident from this example that a specific angle of incidence can also be associated with a corresponding adaptation of the beam extension, which is adjusted via the adaptation means. As described herein, by varying the extension of the beam before the beam strikes the object depending on the angle of incidence, unwanted distortion of the beam in or on the object can be at least partially counteracted.

[0042] For example, the first and second raster modes can be used when replicating the same object. For example, different holograms can be recorded in the object, and it may be necessary to use different angles of incidence for different holograms when replicating. This system can address such a situation. The first raster mode can be used for a first hologram of the object (which can be replicated using the first angle of incidence), whereas the second raster mode can be used for a second hologram of the object (which can be replicated using the second angle of incidence). For example, in the first raster mode, a first raster section of the object in which the first hologram is located can be rasterized, whereas in the second raster mode, a second raster section of the object in which the second hologram is located can be rasterized.In one example, the beam extension in a plane of the object may be (essentially) the same in the first scanning mode and the second scanning mode. For example, the plane may correspond to a plane of a recording layer of the object in which a hologram may be recorded. In this case, adapting the beam may enable the object to be scanned with (essentially) the same scan width, even though different angles of incidence are used to scan the object.

[0043] This allows the raster sections of the object to be reliably addressed with the beam, even if the angle of incidence changes. For example, if the beam were not adapted accordingly before it hits the object, this would cause a change in the raster width because the beam's extension on or within the object would be distorted (as described herein). In such a case, reliable addressing of a raster section could not always be guaranteed. For example, if the raster width is unintentionally increased, sections of the object that should not be irradiated could be irradiated, which could cause replication errors. This could be critical, for example, if the first and second raster sections are relatively close to each other.For example, an unintentional reduction in the grid width could also result in a grid section not being fully rasterized, which could lead to replication errors. These unwanted phenomena can be at least partially counteracted with the approach described here.

[0044] For example, the first raster mode can be used when replicating a first object, and the second raster mode can be used when replicating a second object. For example, replicating the first object may require rasterizing it (e.g., completely) with the beam at the first angle of incidence, whereas replicating the second object may require rasterizing it (e.g., completely) with the beam at the second angle of incidence.

[0045] It should be noted that the disclosure described herein is not limited to two scanning modes or two angles of incidence. Rather, the system can be configured accordingly for a third scanning mode with a third angle of incidence and an adaptation of the beam to a third extent, thus also for correspondingly additional scanning modes.

[0046] In one example, the means for irradiating the beam may comprise a first reflective element that is movable along a first translation axis. The first reflective element may, for example, comprise a mirror that is movable along the first translation axis. The first reflective element may be tilted such that the beam impinges on the first reflective element and is directed onto the object via reflection from the first reflective element.

[0047] In one example, the first reflective element may be rotatable about a first rotation axis. In one example, the first rotation axis may be perpendicular to the first translation axis. In one example, the first reflective element may be rotatable exclusively about the first rotation axis. However, examples are also conceivable in which the first reflective element is rotatable about multiple rotation axes (e.g., two or three rotation axes).

[0048] By rotating the first reflective element around the first rotation axis, the tilt of the first reflective element relative to the object can be varied. By tilting the first reflective element, a desired angle of incidence of the beam relative to the object can be set.

[0049] In one example, in the first scanning mode, the first reflective element may be used to illuminate the object at the first angle of incidence.

[0050] For example, tilting the first reflective element can enable a beam coming from an incidence vector to be reflected by the first reflective element in such a way that it strikes the object at the first angle of incidence. Moving the first reflective element along the first translation axis can then enable different areas of the object to be irradiated at the first angle of incidence. In one example, the system can be configured such that when moving the first reflective element along the first translation axis, the beam from the same incidence vector strikes the first reflective element. Thus, for different positions of the first reflective element along the first translation axis, the first angle of incidence with respect to the object can be enabled because the reflection vector of the beam reflected by the first reflective element does not change.However, a constant incidence vector of the beam onto the first reflective element during the movement of the first reflective element along the first translation axis does not always have to be implemented in the system. In one example, during the movement of the first reflective element along the first translation axis, a change in the incidence vector of the beam onto the first reflective element can occur, whereby a tilting of the first reflective element also occurs, so that different areas of the object are irradiated at the first angle of incidence. For example, during the movement of the first reflective element along the first translation axis in the system described herein, it may be necessary to adjust the incidence vector so that the beam continues to be incident on the first reflective element. The adjustment of the incidence vector of the beam can, for example, be carried out via another element of the irradiation means (e.g.a directional element, as described herein). A change in the incidence vector can be addressed by tilting the first reflective element. Thus, a change in the incidence vector would also mean a change in the reflection vector at the first reflective element, which would also mean a change in the angle of incidence of the beam with respect to the object. However, this effect can be compensated for by appropriately tilting the first reflective element, so that the beam reflected by the first reflective element strikes the object at the first angle of incidence even at different positions of the first reflective element along the first translation axis. The tilting can be achieved by rotating the first reflective element about the first rotation axis.

[0051] In one example, the first angle of incidence may represent an angle of incidence relative to a plane of the object and may range between 20° and 85°. For example, the first reflective element may be used for comparatively high angles of incidence.

[0052] In one example, the means for irradiating can comprise a second reflective element that is movable along a second translation axis that is perpendicular to the first translation axis. The second reflective element can, for example, comprise a mirror that is movable along the second translation axis. The second reflective element can be tilted such that the beam impinges on the second reflective element and is directed onto the object via reflection from the second reflective element. In one example, the second reflective element can be rotatable about a second axis of rotation. In one example, the second axis of rotation can be perpendicular to the second translation axis. In one example, the second reflective element can be rotatable exclusively about the second axis of rotation. However, examples are also conceivable in which the second reflective element is rotatable about multiple axes of rotation (e.g., two or three axes of rotation).

[0053] By rotating the second reflective element around the second rotation axis, the tilt of the second reflective element relative to the object can be varied. By tilting the second reflective element, a desired angle of incidence of the beam relative to the object can be set.

[0054] In one example, the second axis of rotation may be parallel to the first axis of rotation.

[0055] In one example, in the second scanning mode, the second reflective element may be used to illuminate the object at the second angle of incidence.

[0056] For example, tilting the second reflective element can enable a beam coming from an incidence vector to be reflected by the second reflective element such that it strikes the object at the second angle of incidence. Moving the second reflective element along the second translation axis can then enable different areas of the object to be irradiated at the second angle of incidence. In one example, the system can be configured such that when moving the second reflective element along the second translation axis, the beam from the same incidence vector strikes the second reflective element. Thus, for different positions of the second reflective element along the second translation axis, the second angle of incidence with respect to the object can be enabled because the reflection vector of the beam reflected by the second reflective element does not change.

[0057] However, a constant incidence vector of the beam onto the second reflective element during the movement of the second reflective element along the second translation axis does not always have to be implemented in the system. In one example, during the movement of the second reflective element along the second translation axis, a change in the incidence vector of the beam onto the second reflective element can occur, whereby a tilting of the second reflective element also occurs, so that different areas of the object are irradiated at the second angle of incidence. For example, during the movement of the second reflective element along the second translation axis in the system described herein, it may be necessary to adjust the incidence vector so that the beam continues to be incident on the second reflective element. The adjustment of the incidence vector of the beam can, for example, be carried out via another element of the irradiation means (e.g.a directional element, as described herein). A change in the incidence vector can be addressed by tilting the second reflective element. Thus, a change in the incidence vector would also mean a change in the reflection vector at the second reflective element, which would also mean a change in the angle of incidence of the beam with respect to the object. However, this effect can be compensated for by appropriately tilting the second reflective element, so that the beam reflected by the second reflective element strikes the object at the second angle of incidence even at different positions of the second reflective element along the second translation axis. The tilting can be achieved by rotating the second reflective element about the second rotation axis.

[0058] In one example, the second angle of incidence may represent an angle of incidence relative to a plane of the object and may range from 0° to 20°. For example, the second reflective element may be used for comparatively small angles of incidence.

[0059] In one example, the difference between the first and second angles of incidence may be at least 5 0 , at least 10°, at least 20°, at least 30° or at least 40°.

[0060] In one example, the means for irradiating may comprise a directing element, wherein the directing element is configured to direct the beam onto the one or more reflective elements of the means for irradiating.

[0061] In one example, the means for irradiating may comprise a directing element, wherein the directing element is configured to: direct the beam onto the first reflective element in the first scanning mode; and direct the beam onto the second reflective element in the second scanning mode.

[0062] The directing element can comprise, for example, a reflective element (e.g., a mirror). For example, the directing element can be mounted at a directing position, wherein the directing element is rotatable about a third rotation axis at the directing position. By rotating the directing element about the third rotation axis, the tilt of the directing element relative to the first and / or second reflective element can be varied, for example. The third rotation axis can be parallel to the first and second rotation axes.

[0063] For example, the system can be configured such that the beam is directed onto the directing element, wherein the beam can be directed onto the first reflective element or onto the second reflective element by tilting the directing element about the third rotation axis. The directing element can be configured to direct the beam onto the first element even at different positions of the first reflective element along the first translation axis. By, for example, stationary fixing of the rotation axis of the directing element at the directing position, a different incidence vector of the beam with respect to the first reflective element can be present at different positions of the first reflective element along the first translation axis (as described herein).Likewise, the directing element can be configured to direct the beam onto the second element, even at different positions of the second reflective element along the second translation axis. For example, by stationary fixation of the rotational axis of the directing element at the directing position, a different incidence vector of the beam with respect to the second reflective element can be present at different positions of the second reflective element along the second translation axis (as described herein).

[0064] In one example, the system may further comprise a means for coupling the beam into the means for irradiation, wherein the means for coupling is configured to couple the beam into the means for irradiation in a raster movement along a raster axis. For example, the raster movement of the beam along the raster axis may represent a parallel beam bundle on average over time. For example, the raster axis may be parallel to the first axis of rotation about which the first reflective element is rotatable. The means for irradiation may be configured such that the raster movement of the beam along the raster axis is also converted into a raster movement of the beam along the first axis of rotation. The beam can therefore impinge on the first reflective element in a raster movement along the first axis of rotation.Accordingly, reflection from the first reflective element causes a raster movement of the beam on or in the object. For example, the raster axis can be parallel to the second rotation axis, about which the second reflective element is rotatable. The irradiation means can be configured such that the raster movement of the beam along the raster axis is also converted into a raster movement of the beam along the second rotation axis. The beam can therefore impinge on the second reflective element in a raster movement along the second rotation axis. Accordingly, reflection from the second reflective element causes a raster movement of the beam on or in the object.

[0065] In one example, the coupling means may comprise a parabolic mirror, wherein the coupling means is configured to cause the beam to be incident on a plurality of positions of the parabolic mirror such that the corresponding reflections of the beam at the parabolic mirror cause the raster movement of the beam along the raster axis.

[0066] The coupling means can, for example, further comprise a raster element, wherein the raster element can allow the beam to be incident on the multiple positions of the parabolic mirror. The raster element can, for example, be positioned in the system such that the beam emanating from the raster element passes (essentially) through a focus of the parabolic mirror before the beam is incident on the parabolic mirror. This can ensure that when the beam is incident on multiple positions of the parabolic mirror, the corresponding reflections of the beam from the parabolic mirror are parallel to one another. This can generate a uniform and spatially limited raster movement of the beam along the raster axis. Thus, on average over time, a collimated beam bundle can be generated by the parallel arrangement of the beams reflected by the parabolic mirror. This can enable a defined coupling of the beam into the irradiation means.

[0067] In one example, the beam emanating from the raster element can be at the focus of the parabolic mirror. In this case, the beam can be directed directly from the focus of the parabolic mirror to the parabolic mirror at various angles, so that in this case, too, the rays reflected by the parabolic mirror are (essentially) parallel to each other.

[0068] The raster element can, for example, comprise at least one of the following: a galvanometer scanner, a polygon scanner, a MEMS scanner, or an acousto-optic deflector (AOD). In another example, any other mirror is also conceivable instead of the parabolic mirror.

[0069] In one example, the means for coupling can be configured to direct the beam onto the directing element of the means for irradiation so that the directing element is rasterized along the raster axis with the beam. For example, the directing element can serve in this respect as a receiver of the beam moved along the raster axis. The raster axis can, for example, be parallel to the third axis of rotation. As described herein, the directing element can then direct the beam received from the means for coupling to one or more components of the means for irradiation (e.g., via suitable tilting) so that a desired angle of incidence of the beam with respect to the object can be set. In one example, the means for irradiation can not be configured to rasterize the beam along the raster axis. For example, the means for coupling can be exclusively configured to cause the raster movement along the raster axis.The irradiation means can, for example, be configured exclusively to transmit the raster motion of the beam to the object. Since the raster motion of the beam can represent a (e.g., parallel) beam bundle when averaged over time, the irradiation means can, for example, be configured exclusively to allow this parallel beam bundle to impinge on the object at a specific angle of incidence.

[0070] In one example, the system may further comprise a means for modulating the power of the beam, so that the object can be irradiated with different beam powers. For example, replication may require irradiating different objects with different powers. This can be achieved via the means for modulation.

[0071] The modulation means can, for example, comprise an acousto-optical element (e.g., an acousto-optically tunable filter (AOTF)). Thus, the intensity of a beam can also be modulated via an AOTF. However, other intensity modulation techniques are also conceivable.

[0072] In one example, the means for modulating can be configured to vary the power of the beam depending on the point of incidence of the beam on the object. For example, replication may require irradiating different sections of the object with different power levels. This can be achieved via the means for modulating. For example, a first section of the object can be irradiated with a first power level, while a second section of the object can be irradiated with a different second power level.

[0073] In one example, the means for modulating the power can also be used to ensure that no power is applied to a specific section of the object. For example, the means for modulating can irradiate a first section of the object with a first power, while a second section of the object is irradiated with a power of essentially zero. For example, no hologram can be recorded in the second section, so irradiation of this area is not necessary.

[0074] In one example, the system may further comprise a beam unit for providing the beam to the system.

[0075] The beam unit can comprise, for example, a beam source and / or a beam coupler. The beam source can comprise, for example, a laser (e.g., a free-jet laser). The beam unit can also comprise a fiber-coupled laser, which can be coupled into the system via a coupling element.

[0076] The beam source can, for example, provide a beam with a wavelength between 3000 nm and 100 nm. For example, the wavelength can be between 100 nm and 380 nm. For example, the wavelength can be between 380 nm and 800 nm. For example, the wavelength can be between 800 nm and 3000 nm (e.g., between 800 nm and 1550 nm).

[0077] In one example, the beam unit may be configured to provide a first beam and a second beam, wherein the beam unit is configured: in a first beam mode, to provide exclusively the first beam as a beam of the system; in a second beam mode, to provide exclusively the second beam as a beam of the system.

[0078] For example, the first beam can have at least one different wavelength than the second beam. For example, replication may require irradiating different sections of the object with different wavelengths. This can be achieved via the beam unit. For example, the beam unit can enable a first section of the object to be irradiated with a first wavelength, while a second section of the object is irradiated with a different second wavelength.

[0079] For example, the first beam may be generated from a first beam source, whereas the second beam may be generated from a second, different beam source. For example, replication may require irradiating different sections of the object with different beams from different beam sources.

[0080] It should be noted that there may also be additional beam modes, for example, the beam unit may be configured to provide a third beam. In this case, the beam unit may be configured to provide exclusively the third beam as the system's beam in an additional beam mode.

[0081] In one example, the system may further comprise a means for filtering the wavelength of the beam so that the object can be irradiated with different wavelengths. For example, a beam coupled into the means for filtering may comprise multiple wavelengths. One or more wavelengths can then be filtered by the means for filtering, so that the means for filtering provides a corresponding beam in which only the filtered one or more wavelengths are present. This beam can be provided as the beam for the system described herein. For example, it may be necessary for replication to irradiate different objects with different wavelengths. This can be achieved via the means for filtering.

[0082] For example, the beam unit can comprise the means for filtering. For example, a beam with multiple wavelengths can be coupled into the beam unit. One or more beams can then be provided via the means for filtering, wherein the one or more beams can comprise different wavelengths or different sets of wavelengths. Via the means for filtering the beam unit, the beam unit can thus, for example, in a first beam mode, provide exclusively the first beam as the beam of the system; wherein in a second beam mode, exclusively the second beam is provided as the beam of the system. As mentioned, the first beam can have at least one different wavelength than the second beam. It is also conceivable for the first beam to have at least a different set of wavelengths than the second beam.

[0083] For example, the modulating means mentioned herein may also comprise the filtering means (or vice versa). For example, a power modulating means may also be configured to filter one or more wavelengths of a beam for the system. For example, a wavelength filtering means may also be configured to filter a beam's power or power ratios for multiple beams.

[0084] The filtering means may comprise, for example, an acousto-optically tunable filter (AOTF).

[0085] In one example, an acousto-optically tunable filter (AOTF) can be used as a means of modulation and as a means of filtering.

[0086] In one example, the beam unit may be further configured: in a third beam mode, to superimpose the first beam and the second beam, wherein the superimposition of the first and second beams is provided as a beam of the system.

[0087] For example, the beam unit can be configured so that light from multiple lasers is superimposed via a beam combiner and / or coupler.

[0088] For example, replication may require irradiating different sections of the object with a superposition of different beams. For example, it may be necessary to irradiate different sections of the object with multiple wavelengths simultaneously. This can be achieved using the beam unit.

[0089] For example, the beam unit may enable a first portion of the object to be irradiated with a superposition of the first and second beams, whereas a second portion of the object is not irradiated with a superposition of the first and second beams.

[0090] Furthermore, the beam unit can also be configured to provide a superposition of three or more beams in the system. Another example relates to the system of the first aspect, wherein the means for adapting the beam extension is not necessarily implemented in the system. According to the present disclosure, there may also be systems of the first aspect in which no beam extension is adapted based at least partially on the adjusted angle of incidence. However, the further features of the first aspect described herein can also apply or be applied to this example.

[0091] A second aspect relates to a device comprising a system of the first aspect and a holographic object.

[0092] For example, the device may comprise a holder for holding the holographic object. Furthermore, the features (and examples) of the system mentioned herein may also be applied or apply to the mentioned device in a corresponding manner.

[0093] A third aspect relates to a method for replicating an object for holography comprising:

[0094] Illuminating the object with a beam at a selected angle of incidence;

[0095] Adapting an extension of the beam before the beam strikes the object based at least in part on the selected angle of incidence.

[0096] The features (as well as examples) of the system mentioned herein can also be applied or apply to the mentioned method in a corresponding manner.

[0097] A fourth aspect concerns using a system of the first aspect for replicating an object of holography.

[0098] The features (as well as examples) of the system mentioned herein can also be applied or apply accordingly to the mentioned use of the system of the first aspect.

[0099] A fifth aspect relates to a computer program for carrying out a method of the third or fourth aspect. The computer program can alternatively or additionally comprise instructions for carrying out the further method steps described herein or for carrying out or implementing the functionalities of devices described herein. For example, the computer program can cause certain optical elements of the system to shift (e.g., components of the irradiation means and / or the adaptation means), resulting in an angle of incidence selected in the program and / or an extension of the beam before the beam strikes the object. The system can therefore be controlled based on a computer program and an interface to its optical elements.

[0100] The system and / or the device can further comprise means for executing the computer program. The system and / or the device can, for example, comprise one or more memories with a computer program of the fifth aspect. Alternatively, it is also possible for the computer program to be stored elsewhere (e.g. in a cloud). In such a case, the system and / or the device can have means for receiving instructions resulting from the execution of the program elsewhere. In either case, this can, for example, enable the method to run automatically or autonomously within the system and / or the device. Thus, intervention, for example via manual adjustment, can be minimized, so that the complexity of the method can be reduced.

[0101] It should also be noted that the features (and examples) of the method mentioned herein can be applied or applied accordingly to the system (or device and / or computer program) mentioned. Likewise, the features (and examples) of the system or device mentioned herein can be applied or applied accordingly to the methods or computer programs described herein.

[0102] 4. Short description of the characters

[0103] In the following detailed description, technical background information as well as embodiments of the invention are described with reference to the figures, which show the following: Fig. 1 schematically illustrates a part of one of the systems described herein, in particular an example of a means for irradiating the object of holography.

[0104] Fig. 2 schematically illustrates a part of one of the systems described herein, in particular another example of a means for irradiating the object of holography.

[0105] Fig. 3 schematically illustrates a part of one of the systems described herein, in particular another example of a means for irradiating the object of holography.

[0106] Fig. 4 schematically illustrates a part of one of the systems described herein, in particular an example of a means for coupling the beam into the means for irradiating the object of holography.

[0107] Fig. 5 schematically illustrates a portion of one of the systems described herein, particularly an example in which the beam can be altered prior to coupling into the means for irradiating.

[0108] Fig. 6 schematically illustrates a part of one of the systems described herein, in particular an exemplary beam path from a beam unit to the object of the holography is shown.

[0109] Fig. 7 schematically illustrates the variation of the extension of the beam on or in the object depending on the set angle of incidence.

[0110] Fig. 8 shows a schematic view of an example of a large-area rasterization of the object.

[0111] Fig. 9 shows a schematic view of an exemplary rasterization of various holographic recordings of the object with different powers.

[0112] 5- Detailed Description of the Figures and Possible Embodiments The following explains parts of exemplary systems for replicating holographic objects according to the disclosure described herein. The described systems are suitable, for example, for irradiating the object with a beam at a set angle of incidence, wherein an adaptation of the beam's extension occurs before the beam impinges on the object based at least in part on the set angle of incidence. For illustrative purposes, the irradiation of the object with a beam at a set angle of incidence will initially be discussed.

[0113] Fig. 1 schematically illustrates part of one of the systems described herein, in particular an example of a means for irradiating the holographic object. Shown is a beam unit which irradiates a holographic object O at a first angle of incidence ei. The irradiation can occur, for example, as part of the replication of the object O. Various replication methods are known in the field of holography, so these will not be discussed in detail. However, for various replication methods it may be necessary to irradiate the object O to be replicated (e.g. a master element) in a targeted manner at an angle of incidence. This can be done with the irradiation unit described herein.

[0114] In the example of Fig. 1, the irradiation unit comprises a directing element G. The directing element G can comprise a mirror. The directing element G can be rotatable about a directing rotation axis, such that the directing element G can be tilted about the directing rotation axis via a rotation RG. The irradiation unit can further comprise a first reflective element Mn. The first reflective element Mn can, for example, comprise a mirror. The first reflective element Mn can be rotatable about a first rotation axis, such that the first reflective element Mn can be tilted about the first rotation axis via a rotation Ri. The first reflective element Mn can be movable along a first translation axis Z. In the example of Fig. 1, the plane of the object O to be irradiated can be substantially perpendicular to the first translation axis Z.

[0115] Via the irradiation unit, a beam can be directed at the object O at a desired angle of incidence. In this way, a beam S can be coupled into the irradiation unit onto the directing element G. The beam S can, for example, also be coupled in such a way that light is spanned in a beam plane K. For example, in Fig. 1, the beam S can be spanned in the yx plane. By tilting the directing element G, the beam S can be directed onto the first reflective element Mn. The first reflective element Mn then receives the beam S. By tilting the first reflective element Mn, the first angle of incidence ei of the beam S with respect to the object can then be adjusted.

[0116] By moving the first reflective element Mn along the first translation axis Z, the object 0 can be scanned with the beam S along the x-direction of Fig. 1. The beam S can thus scan the object along the direction of movement 1000. In order to ensure a constant first angle of incidence ei of the beam S, the tilt of the first reflective element Mn can be adjusted when moving along the first translation axis Z. Changing the tilt may be necessary because the incidence vector of the beam S to the first reflective element Mn changes. This will be briefly explained below. For example, two positions of the first reflective element Mn are shown in Fig. 1. In the upper position along the z-axis, the first reflective element Mn is irradiated by the directing element G. The directing element G irradiates the first reflective element Mn via the first incidence vector Vi.As mentioned, to irradiate the object O, the first reflective element Mn can now be moved along the first translation axis Z. For this purpose, a lower position along the z-axis of the first reflective element is shown in Fig. i as an example. Since the directing element G is spatially fixed in this example of the irradiation unit, the directing element G must be tilted in order to be able to irradiate the first reflective element Mn in the lower position with the beam S. As a result, the directing element G irradiates the first reflective element Mn in a second incidence vector V2, which is different from the first incidence vector Vi. Without adjusting the first reflective element Mn, the angle of incidence of the beam with respect to the object would therefore change. In order to be able to ensure the first angle of incidence ei even in the lower position of the first reflective element Mn, the first reflective element Mn can be tilted accordingly about the first rotation axis.In order to allow the beam S to be incident along the x-direction at a constant first angle of incidence ei, the first reflective element Mn is moved along the first translation axis Z, whereby the angle of incidence ei is kept the same even at different points of impact on or in the object O by a defined tilting of the directional element RG and a defined tilting of the first reflective element Mn.

[0117] For example, with the arrangement shown in Fig. 1, comparatively large angles of incidence can be realized, e.g., in the range of 20° to 85°. Fig. 2 schematically illustrates a part of one of the systems described herein, in particular a further example of a means for irradiating the holographic object. Shown is another exemplary irradiation unit that irradiates a holographic object O at a second angle of incidence e2. In this example, the irradiation can also be performed as part of the replication of the object O.

[0118] In the example of Fig. 2, the irradiation unit also comprises a directing element G. The directing element G can comprise a mirror. The directing element G can be rotatable about a directing rotation axis, such that the directing element G can be tilted about the directing rotation axis via a rotation RG. The irradiation unit can further comprise a second reflective element M22. The second reflective element M22 can, for example, comprise a mirror. The second reflective element M22 can be rotatable about a second rotation axis, such that the second reflective element M22 can be tilted about the second rotation axis via a rotation R2. The second reflective element M22 can be movable along a second translation axis X. In the example of Fig. 2, the plane of the object O to be irradiated can be substantially parallel to the second translation axis.

[0119] Via the irradiation unit, a beam can be directed at a desired angle of incidence onto the object O. In this way, a beam S can be coupled into the irradiation unit onto the directing element G. The beam S can, for example, also be coupled in such a way that light is spanned in a beam plane K. For example, in Fig. 2, the beam S can be spanned in the yx plane. By tilting the directing element G, the beam S can be directed onto the second reflective element M22. The second reflective element M22 then receives the beam S. By tilting the second reflective element M22, the second angle of incidence e2 of the beam S with respect to the object can then be adjusted.

[0120] By moving the second reflective element M22 along the second translation axis X, the object O can be scanned with the beam S along the x-direction of Fig. 2. The beam S can thus scan the object along the direction of movement 1000. In order to ensure a constant second angle of incidence e2 of the beam S, the tilt of the second reflective element M22 can be adjusted when moving along the second translation axis X. Changing the tilt may be necessary because the incidence vector of the beam S to the second reflective element M22 changes. This will be briefly explained below. For example, two positions of the second reflective element M22 are shown in Fig. 2. In the left-hand position along the x-axis, the second reflective element M22 is irradiated by the directing element G. The directing element G irradiates the second reflective element M22 via the incidence vector V3.As mentioned, to irradiate the object O, the second reflective element M22 can now be moved along the second translation axis X. For this purpose, a right-hand position along the x-axis of the second reflective element M22 is shown in Fig. 2 as an example. Since the directing element G is spatially fixed in this example of the irradiation unit, the directing element G must be tilted in order to be able to irradiate the second reflective element M22 in the right-hand position with the beam S. As a result, the directing element G irradiates the second reflective element M22 at an incidence vector V4 that is different from the incidence vector V3. Without adjusting the second reflective element M22, the angle of incidence of the beam with respect to the object O would therefore change. In order to be able to ensure the second angle of incidence e2 even when the second reflective element M22 is in the right-hand position, the second reflective element M22 can be tilted accordingly about the second rotation axis.In order to allow the beam S to be incident along the x-direction at a constant second angle of incidence e2, the second reflective element M22 is moved along the second translation axis X, whereby the angle of incidence e2 is kept the same even at different points of impact on or in the object O by a defined tilting of the directional element RG and a defined tilting of the second reflective element M22.

[0121] For example, with the arrangement of Fig. 2, comparatively small angles of incidence can be realized, in the range of 0° to 25 0 .

[0122] Fig. 3 schematically illustrates a part of one of the systems described herein, in particular another example of a means for irradiating the object of holography.

[0123] In Fig. 3, the irradiation unit is a combination of the irradiation unit from Fig. 1 and the irradiation unit from Fig. 2. The aspects of the irradiation unit of Fig. 1 and Fig. 2 described herein can therefore also be applied to the example of Fig. 3.

[0124] It can be seen in the irradiation unit of Fig. 3 that the first reflective element M2 can be moved along the first translation axis Z, wherein the second reflective element M22 can be moved along the second translation axis X, wherein the second translation axis X is perpendicular to the first translation axis Z. The exemplary irradiation unit further comprises a directing element G. The directing element can be configured to direct the received beam S either onto the first reflective element Mn or onto the second reflective element M22. Thus, a selection can be made to irradiate the object O via the first reflective element Mn in a first mode, as explained for Fig. 1, or to irradiate the object O via the second reflective element M22 in a second mode, as explained for Fig. 2.

[0125] By arranging the first translation axis Z with respect to the object O, comparatively large angles of incidence can be realized by irradiating the first reflective element M11 (as described herein). Thus, comparatively large angles of incidence can be realized in the first mode of the irradiation unit.

[0126] By arranging the second translation axis X with respect to the object O, comparatively small angles of incidence can be realized by irradiating the second reflective element M22 (as described herein). Thus, comparatively small angles of incidence can be realized in the second mode of the irradiation unit.

[0127] It should also be noted that the first reflective element Mn and the second reflective element M22 can extend along the illustrated y-direction. To ensure that the second reflective element M22 does not interfere with the beam path to the first reflective element when irradiating the first reflective element Mn, the second reflective element M22 can be moved to a rest position. Likewise, the first reflective element M11 can be moved to a rest position if the second reflective element M22 is to be irradiated.

[0128] Fig. 4 schematically illustrates a part of one of the systems described herein, in particular an example of a means for coupling the beam into the means for irradiating the holographic object. The means for coupling can be designed, for example, as a coupling unit. For example, the coupling unit can comprise a raster element 3000. The raster element can comprise, for example, a galvo scanner, polygon scanner, MEMS scanner, or acousto-optical deflector (AOD). The raster element 3000 can be movable, for example, along a raster element axis (as indicated in Fig. 4 below the raster element 3000). Furthermore, the coupling unit can comprise a parabolic mirror 2000. A beam S can be incident on the raster element 3000, wherein the raster element can direct the beam S onto different positions of the parabolic mirror 2000. The parabolic mirror 2000 can be irradiated with the beam S at different angles via the raster element 3000.For example, the raster element 3000 can also be moved along the raster element axis. For example, the raster element 3000 can deflect the beam S in the xy plane so that different points on the parabolic mirror 2000 are exposed to the beam one after the other. The beams reflected by the parabolic mirror 2000 can then be coupled into the directing element G. The raster element 3000 can, for example, direct the beam through the focus of the parabolic mirror 2000 onto the parabolic mirror 2000. The beams reflected by the parabolic mirror 2000 can thus be parallel to one another. For example, the raster element 3000 can be moved along the raster element axis for this purpose so that the beam S emanating from the raster element 3000 is guided through the focus of the parabolic mirror 2000 even at different angles with respect to the parabolic mirror 2000.For example, it is also conceivable that the beam S emanating from the raster element 3000 also lies in the focus of the parabolic mirror 2000 (whereby this can also be adjusted, for example, by moving the raster element along the raster element axis). For example, the raster element 3000 can be comparatively small compared to the parabolic mirror 2000. In this case, the raster element 3000 can be arranged exactly in or approximately in the focus of the parabolic mirror 2000. Thus, the beam emanating from the raster element 3000 can be directed (approximately) from the focus of the parabolic mirror 2000 onto the parabolic mirror 2000. However, it is also conceivable that the raster element 3000 does not direct the beam through the focus of the parabolic mirror 2000 onto the parabolic mirror 2000 (or is not arranged in the focus of the parabolic mirror 2000). In this case too, the light reflected by the parabolic mirror 2000 can be used to couple into the irradiation medium.

[0129] Either way, the coupling unit can produce a (substantially) parallel beam in the xy plane, which can be directed in a defined manner onto the directional element G.

[0130] Thus, in a snapshot, a rasterization of the parabolic mirror 2000 with the beam S is present. Rays are therefore reflected one after the other from the parabolic mirror 2000, whereby these rays are parallel to one another. Thus, after the parabolic mirror 2000, a raster movement of the beam S occurs along a raster axis, whereby the raster axis in this case runs along the y-axis. On average over time, however, this represents an expanded parallel beam in the xy-plane. This parallel beam can then be directed onto the object at a specific angle of incidence, as described herein. For example, the parallel beam can be directed onto the object at the first angle of incidence ei or at the second angle of incidence e2.

[0131] For example, the dimensions of the parabolic mirror 2000 can be adapted to the dimensions of the object O (or correspondingly also to the dimensions of the directing element G). Thus, the extension of the parabolic mirror 2000 in the illustrated y-direction can essentially correspond to a dimension of the object O. This is because the extension of the parabolic mirror 2000 can limit the width of the parallel beam. If the width of the parallel beam corresponds to a dimension of the object O, the object O can be completely scanned with the beam S along that dimension or exposed to the parallel beam. A further optical adjustment of the width of the parallel beam with respect to the object therefore does not necessarily have to be carried out additionally via the irradiation unit.Furthermore, it should be mentioned that the width of the parallel beam can also be adapted via the raster element 3000, since the selected points of incidence of the beam S on the parabolic mirror 2000 also define the width of the parallel beam.

[0132] The parabolic mirror 2000 mentioned herein can, for example, have a minimum extension of 100 mm, 200 mm, 300 mm, or 400 mm along the illustrated y-direction. Furthermore, the parabolic mirror 2000 can, for example, have a maximum extension of 1500 mm, 1000 mm, 700 mm, or 600 mm along the illustrated y-direction.

[0133] Fig. 5 schematically illustrates a portion of one of the systems described herein, particularly an example in which the beam can be modified before being coupled into the irradiation means. Fig. 5 also shows the coupling unit of Fig. 4, via which the beam S is coupled to the directing element G in a raster motion. Fig. 5 illustrates further possible adaptations of the beam S before the beam S is introduced into the coupling unit.

[0134] The system can thus comprise a beam unit 6000. The beam unit can, for example, have a laser and / or beam coupler. The laser can, for example, be a free-jet laser or a fiber-coupled laser that is coupled into the beam unit 6000 via a coupling element. It is also conceivable for multiple lasers to be superimposed via a beam combiner and / or coupler. Fig. 5 shows three connections on the beam unit 6000. For example, three different beam sources can be coupled into the beam unit. For example, the three different beam sources can have different wavelengths.

[0135] In summary, a beam S can be provided to the system via the beam unit 6000. For example, the beam can have a diameter between 1 mm and 3 mm. For example, multiple beams can also be provided in parallel or sequentially by the beam unit 6000 as the system's beam.

[0136] This beam S can then be modified using a modulator 5000. The intensity of the beam S can be modulated using the modulator 5000. For example, the beam S can also be pulsed using the modulator 5000.

[0137] Furthermore, if several beams are provided in parallel or sequentially, it is also conceivable that the power ratios of the several beams are modulated via the modulator 5000.

[0138] The modulation frequency of the modulator 5000 can, for example, go up to the kHz range and be synchronized and / or coupled with the subsequent raster element 3000.

[0139] The modulator 5000 can, for example, comprise one or more acousto-optical elements (such as an AOTF (acousto-optically tunable filter)) to effect the modulation of the beam S. For example, an intensity modulation of a beam coupled into the AOTF can occur via an AOTF. Furthermore, the AOTF can also function as a filter for wavelengths of the beam coupled into the AOTF. In one example, a modulation of a beam coupled therein can occur via the AOTF, in which a modulation of the power and a modulation (or filtering) of the wavelength occurs. Thus, a beam with a specific intensity and a specific set of one or more wavelengths can be generated via the AOTF. In one example, only an intensity modulation or wavelength filtering can be carried out via the AOTF. Furthermore, the use of two or more AOTFs is also conceivable in order to provide orThe modulated beam can then be coupled into an adaptation module 4000 (or an adaptation system 4000), which can include a means for adapting an extension of the beam prior to the beam impinging on the object based at least in part on the set angle of incidence. The adaptation module 4000 can thus adapt the extension of the beam depending on the set angle of incidence (as described herein).

[0140] In particular, it should be noted that the adaptation module may comprise, as a means for adapting the extent of the beam, a system for adapting a diameter of a photon beam, as described in Chapters 6-8 herein.

[0141] The adaptation module 4000 can, for example, be communicatively coupled to the irradiation unit in order to adapt the beam extension based at least partially on the set angle of incidence. For example, this can be implemented via a computing unit that is communicatively coupled to the irradiation unit and the adaptation module. Thus, the computing unit can send a control signal to the irradiation unit to set a specific angle of incidence. Likewise, the computing unit can send a corresponding control signal to the adaptation module 4000 so that the beam extension is adapted based on the set angle of incidence.

[0142] As a result, the adaptation module 4000 can deform the beam S along one or two axes. The beam's shape can be dynamically changed via the adaptation module 4000. For example, the beam's extension along one or two beam cross-sectional axes can be changed by a factor of 1-10 over time. For example, the extension can be increased or decreased by this factor.

[0143] Adapting the beam extension as a function of the angle of incidence may be necessary to avoid distortions of the beam in or on the object O during replication. This will be briefly discussed below.

[0144] Fig. 6 schematically illustrates the variation of the beam extension on or within the object depending on the set angle of incidence. In this example, no corrective adaptation takes place depending on the angle of incidence. Thus, in the left part of Fig. 6, a second angle of incidence e2 is present. The upper part of the left part of the image shows a top view of object O during irradiation. The lower part of the left part of the image shows a side view of object O during irradiation.

[0145] In the left-hand part of the image, the second angle of incidence e2 is approximately 0°. As described herein, a raster movement of the beam S occurs (caused by the coupling unit). This raster movement is also directed onto the object O via the irradiation unit. Thus, in the top view of the object O in the left section, it can be seen that in a snapshot, the beam S would be spatially recognizable at various positions on the object. The beam S has a diameter Di in or on the object O along the x-direction. However, the raster movement of the beam S (caused by the coupling unit) creates, on average over time, a parallel beam L. The parallel beam L is shown in the right-hand section of the top view. Here, the parallel beam L can represent a raster line. The raster width of this raster line corresponds to the diameter Di of the beam along the x-direction.

[0146] However, the diameter Di can change with a change in the angle of incidence. This is illustrated in the right-hand part of Fig. 6. Thus, in the right-hand part of Fig. 6, there is a first angle of incidence ei that is different from the second angle of incidence ei. In particular, the first angle of incidence ei is greater than the second angle of incidence e2.

[0147] Due to the higher first angle of incidence ei, the beam S in or on the object O has a larger diameter D2 along the x-direction than at the second angle of incidence. Thus, the raster width of the parallel beam L is also larger.

[0148] However, this variation in the extent of the beam S in or on the object O depending on the angle of incidence is not always desired when replicating the object O. For example, an unintentional enlargement of the beam S can result in a section being rasterized that should not have been rasterized at all. Furthermore, it is also conceivable that a section is not completely rasterized due to the undesired reduction in the extent of the beam.

[0149] It is also conceivable that the distortion of beam S on or in object O, depending on the angle of incidence, can cause further optical disturbances. The change in beam S depending on the angle of incidence can therefore be counteracted with the adaptation module 4000.

[0150] As mentioned, the adaptation module 4000 can be configured to change the beam diameter along one or two beam cross-sectional axes. For example, with regard to Fig. 6, the adaptation module 4000 for the first angle of incidence e i could reduce the beam S along a beam cross-sectional axis such that the diameter D2 of the beam S on or in the object corresponds (substantially) to the diameter Di that the beam would have at the second angle of incidence. For example, the reverse case would also be conceivable, wherein the adaptation module for the second angle of incidence e 2 enlarges the beam S along a beam cross-sectional area such that the diameter Di of the beam on or in the substrate corresponds (substantially) to the diameter D2 that the beam would have at the first angle of incidence.

[0151] As mentioned, the adaptation module 4000 could also be configured to uniformly adapt the extent of the beam S. For example, the adaptation module 4000 could be configured to adapt a collimated beam S with a circular beam cross-section and a first diameter to a circular beam S having a circular beam cross-section with a second diameter. This approach can also at least partially counteract an unwanted change in the extent of the beam S on or in the object.

[0152] Furthermore, it is also conceivable for the adaptation module 4000 to vary the beam S independently of one another along two orthogonal beam cross-sectional axes. For example, the adaptation module 4000 can, on the one hand, change the diameter of the beam along a first beam cross-sectional axis by a first factor (e.g., enlarge or reduce it). On the other hand, the adaptation module 4000 can change the diameter of the beam along a second beam cross-sectional axis by a second factor (e.g., enlarge or reduce it). This can create a higher degree of freedom during replication. For example, different ellipses or beam cross-sections can be created on or in the object O during irradiation, so that optical features of the holographic recordings in the object O can be taken into account during replication (e.g., special scattering or diffraction effects). This can, for example,This can be useful for replicating diffuse elements that have different scattering lobes along both directions of extension. By specifically controlling the locally interfering region (where a small beam spot would correspond to a smaller angular range), the replicated angular range can also be manipulated.

[0153] In one example, the means for adapting a beam extension described herein may comprise two of the photon beam diameter adapting systems mentioned herein (wherein one photon beam diameter adapting system is described in Chapters 6-8). Thus, a first adapting system may initially be used to change the beam diameter along the first beam cross-sectional axis. The beam may then be coupled to a second adapting system, where the second adapting system is used to change the beam diameter along the second beam cross-sectional axis.

[0154] Fig. 7 schematically illustrates a portion of one of the systems described herein, in particular, showing an exemplary beam path from a beam unit to the holographic object. Fig. 7 is shown for illustrative purposes and represents a combination of Fig. 3 and Fig. 5.

[0155] Fig. 8 shows a schematic view of an example of a large-area rasterization of the object. In the upper section of Fig. 8, an object O of the holography is shown in a perspective side view. The object O has a large-area section H with a holographic recording. Also visible is the incidence of a parallel beam L at a specific angle of incidence to the object. The parallel beam is, on average over time, the result of the raster movement of the beam along the raster axis (as described herein). This is illustrated in the lower section of Fig. 8, which shows the beam incidence on the parabolic mirror 2000. The two outermost beams Si, S2 of the parallel beam L are marked. The parallel beam L is created by rasterizing the beam S between the first beam Si and the second beam S2. The two outermost beams Si, S2 are also shown in the upper section of Fig.8 for clarity. In the upper area, it can also be seen that the parallel beam L can be introduced in the direction of movement 1000 over the object O. The movement of the beam S or the parallel beam L along the direction of movement 1000 can be implemented via the irradiation means (as described herein). For example, this can be achieved by moving the first reflective element M along the first translation axis or by moving the second element M22 along the second translation axis.

[0156] For example, in Fig. 8, no change in the beam power can occur while the beam S is scanned across the parabolic mirror 2000. The scan area of ​​the holographic recording H is thus irradiated with the same power. In this case, the beam source (e.g., a laser) can be operated in CW mode, generating a uniform, parallel beam bundle L composed of beams with the same power.

[0157] Fig. 9 shows a schematic view of an exemplary rasterization of various holographic recordings of the object with different power levels. Fig. 9 also shows a holographic object in a perspective side view. However, the object O has five different sections H1, H2, H3, H4, H5, each containing a holographic recording. Furthermore, between the five sections H1, H2, H3, H4, H5, there are regions that do not contain a holographic recording and therefore do not need to be exposed to the beam S (e.g., during replication).

[0158] In this regard, Fig. 9 shows that different sections with holographic recordings are irradiated with different power levels, while sections without holographic recordings are not irradiated with any power level.

[0159] This illustrates a first rasterization I. In the lower section of Fig. 9 it can be seen that in the first rasterization I the beam is indeed rasterized via the parabolic mirror 2000. However, different powers of the beam S are present over different sections of the parabolic mirror 2000, whereby the different powers were set via the modulator 5000. Thus, a first section of the parabolic mirror is rasterized with a first power Pi and a second section of the parabolic mirror is rasterized with a second power P2. Furthermore, there are intermediate sections of the parabolic mirror which are not rasterized or are only rasterized with a very low power. The parallel beam L is introduced along the fifth section H5 and the third section H3 via the first rasterization I. The first power Pi is introduced along the fifth section H5 and the second power along the third section.In contrast, no power or only very little power is supplied over the intermediate section between the fifth section H5 and the third section H3.

[0160] For example, during replication, it may be useful to irradiate different holographic recordings with different power levels or different beam ratios (in the case of two or more beams). This can be achieved using the approach described here.

[0161] When modulating the power, the modulating element (e.g., an AOTF) can be operated synchronously with the raster element 3000. By pulsing the beam S with the modulator 5000 depending on the angular position of the raster element 3000, specific sections of the parallel beam L can be darkened. Furthermore, the beam intensity or the beam ratio (with two or more beams) can be adjusted locally.

[0162] Likewise, Fig. 9 shows a second rasterization II. In the second rasterization II, the parallel beam L is located at the other end of the object O, which is caused by a movement of the parallel beam L along the direction of movement 1000 (as described herein). Between the first rasterization I and the second rasterization II, the areas in between may also have already been scanned with the beam (as described herein). For example, the fourth section H4 (as well as the fifth section H5 and the third section H3) may have been rasterized between the first rasterization I and the second rasterization II. For example, the fourth section H4 may have been rasterized with a power that is different from the first power Pi and / or the second power P2.

[0163] For completeness, the second rasterization II is also briefly described. Thus, in the second rasterization II, a third section of the parabolic mirror 2000 is rasterized with a third power P3, and a fourth section of the parabolic mirror is rasterized with a fourth power P4. Furthermore, there are intermediate sections of the parabolic mirror that are not rasterized or are rasterized only with a very low power. Via the second rasterization II, the parallel beam L is introduced along the second section H2 and the first section H1. The third power P3 is introduced along the second section H2, and the first power is introduced along the first section. However, no power or only a very low power is introduced over the intermediate section between the second section H2 and the first section H1. Disclosure of the means for adapting an extension

[0164] Further features of the means for adapting a beam extension described herein are disclosed in Chapters 6-8. In particular, further details are disclosed. The means for adapting may also be referred to in Chapters 6-8 as a system for adapting a photon beam diameter. Figures 10-12 are presented accordingly in Chapters 7-8.

[0165] 6. Explanations

[0166] A first aspect relates to a system for adapting the diameter of a photon beam. The system comprises a first element with a curved surface, which has a first and a second focus. The system is configured to focus the photon beam into the first focus, so that the photon beam, after reflection from the surface of the first element, is focused onto the second focus.

[0167] This thus enables a defined guidance of the photon beam through the system for adapting its diameter, since the photon beam focused on the first focus is always output in a defined manner at the second focus of the first element via its reflection at the first element. The first element can thus be understood as a reflective deflection unit for the photon beam in the system. The deflection of the photon beam can therefore function without active adjustment of the first element, since the system can take advantage of the fact that the photon beam focused on the first focus is always output focused at the second focus. Targeted adjustment or focusing on the position of the second focus can therefore be omitted. The invention can therefore make it possible to reduce the complexity in a system for adapting a diameter of a photon beam. At the same time, the optical quality of the photon beam can be achieved with the defined guidance orRedirection can be ensured, since the first element can be configured such that no (significant) aberration is introduced onto the photon beam upon reflection of the photon beam at the first element. For example, in this respect, the invention can avoid an aberration that is typically associated with passing / transmitting a photon beam through two media (e.g., a lens). The optical quality of the photon beam focused at the first focus can thus (substantially) correspond to the optical quality of the reflected photon beam at the second focus. In one example, the first element can thus enable the wavefront of the photon beam to be guided from the first focus to the second focus without aberration, without the need for (e.g.,complex) adjustment or correction and at the same time the curved surface can be designed in such a way that a numerical aperture of the photon beam is changed upon reflection, so that after collimation a changed output diameter of the photon beam can be established (without requiring a movable collimator).

[0168] This makes it possible to provide a system for adapting the diameter of a photon beam that does not require lenses and thus does not incur significant chromatic aberration. It can thus be used over a wide wavelength range without the occurrence of aberrations. The system can, for example, operate exclusively with reflective elements.

[0169] In one example, the curved surface of the first element can be at least partially concave, whereby the system can be configured such that the photon beam impinges on a concave area. The photon beam can thus impinge on a concave portion of the surface of the first element via focusing on the first focus, which reflects or focuses the photon beam into the second focus of the first element. The curvature of the surface can, for example, be locally different or vary locally.

[0170] The curved surface may, for example, extend in a first plane, with the first element having no curvature along a second plane orthogonal thereto. The incident photon beam may, for example, lie in the first plane. In other examples, the curved surface is also curved in the second plane. The curvature in the second plane may, for example, substantially correspond to the curvature in the first plane.

[0171] In one example, the first element comprises an elliptical mirror. The elliptical mirror can have two focal points, which correspond to the first focus and the second focus of the first element. The elliptical mirror can have a concave region at least along one plane. For example, the elliptical mirror can be described exclusively along one plane via an elliptic curve. In another example, the elliptical mirror can have a concave region along each of two orthogonal planes. For example, the geometry of the surface of the mirror can be mathematically described via an ellipse (e.g., via an elliptic curve and / or an ellipsoidal surface).

[0172] In one example, the system comprises a first output coupler that collimates the photon beam to a first output diameter after reflection at the first output coupler. The photon beam collimated by the first output coupler can correspond to the photon beam previously reflected at the first element. The first output coupler can, for example, have a curved surface that receives the photon beam, so that the photon beam is reflected at the curved surface in such a way that the photon beam is collimated to a (defined) first output diameter after this reflection. In one example, the curved surface of the first output coupler can comprise a concave region onto which the incident photon beam falls. The geometry of the curved surface can, for example, be locally different and / or be mathematically described via a parabola (e.g., via a parabolic curve / surface).In one example, the first output coupler comprises a parabolic mirror. The parabolic mirror can have the corresponding curvature at least along one axis. For example, the parabolic mirror can have a concave region exclusively along one plane. In another example, the parabolic mirror can have a concave region along each of two orthogonal planes.

[0173] In one example, the output coupler is positioned after the second focus of the first element, so that the photon beam incident on the output coupler has previously been focused to the second focus of the first element. In this case, the photon beam diverging from the second focus can be incident on the output coupler and collimated to the first output diameter.

[0174] In another example, the first output coupler comprises an output coupler that collimates the photon beam to a first output diameter without reflection. In this example, the first output coupler may comprise, for example, a collimating lens, a collimating lens system, and / or a collimator, which does not necessarily have to include reflective elements.

[0175] In one example, the first element and the first output coupler are arranged relative to one another such that a focus of the first output coupler and the second focus of the first element are essentially at the same position. This can enable coordination of the first element with the first output coupler, as this ensures that the photon beam is not only focused into the second focus of the first element, but is also simultaneously focused into the focus of the first output coupler, and is thus always output collimated without the need for additional aids.

[0176] In one example, the first element and the first output coupler can be arranged in a fixed position relative to each other. The first element and the first output coupler can thus be configured to be immobile relative to each other, eliminating the need for local tuning of the two components (e.g., during photon radiation adaptation), thus reducing system complexity.

[0177] It should be noted that, in another example, the first output coupler can also be finely adjusted to suitably adjust the collimation of the first output diameter or to calibrate the overlap of the second focus of the first element with the focus of the first output coupler (e.g., this can be done by shifting / tilting the first output coupler, e.g., using suitable positioners). It is important, however, to note that calibration can be omitted during normal operation, as the system can be configured so that the optimal position between the first element and the first output coupler does not change, even if, for example, the wavelength and / or magnification of the system is changed.

[0178] In one example, the system is further configured such that the first output diameter is dependent on a numerical aperture of the photon beam focused into the first focus. The system can therefore be specifically designed such that, for a desired first output diameter, a predetermined numerical aperture of the photon beam focused into the first focus can be determined. Accordingly, there can be a direct relationship in the system between the numerical aperture of the photon beam focused into the first focus and the first output diameter. For example, the system can be designed such that a predetermined first output diameter is present, based on a predetermined numerical aperture of the photon beam in the first focus. The defined application of the numerical aperture can, for example,be predetermined through the design of various optical elements of the system, which guide the photon beam in a predefined manner with a desired numerical aperture into the first focus of the first element. Examples of this are described below. In one example, the system is further configured such that the first output diameter depends on an angle of incidence at which the focused photon beam is focused into the first focus. The system can therefore be specifically designed such that, for a desired first output diameter, a predetermined angle of incidence of the photon beam focused into the first focus can be determined. The angle of incidence of the photon beam into the first focus can be defined with respect to a line or a plane of the first element.For example, the angle of incidence can be defined relative to the line connecting the first and second focus of the first element (or the angle of incidence can also be related to a plane spanned by the first and second focus). The angle of incidence can be defined, for example, relative to a directional ray of the photon beam.

[0179] The inventor has identified a system arrangement with which, even with a (substantially) constant numerical aperture of the photon beam at the first focus, there can be a direct relationship between the angle of incidence of the photon beam at the first focus and the first output diameter. This is based on the fact that, via the system arrangement, the numerical aperture at the first focus (referred to herein as the first numerical aperture) also causes a numerical aperture of the photon beam at the second focus (referred to herein as the second numerical aperture). The system arrangement can be constructed in such a way that, even with a constant first numerical aperture, the angle of incidence at the first focus has a direct relationship with the magnitude of the second numerical aperture. The system can therefore make it possible to modulate a numerical aperture. For example, with a constant first numerical aperture, a variation orthe second numerical aperture can be specifically set at a predetermined angle of incidence. The second numerical aperture can be set differently from the first numerical aperture depending on the angle of incidence (e.g. larger, smaller, or even the same as the first numerical aperture). The system arrangement can make it possible for the dimension of the second numerical aperture to be directly related to the first output diameter. For example, depending on the dimension of the second numerical aperture of the photon beam, the first output coupler can cause a corresponding dimension of the first output diameter. This results in a system in which the angle of incidence at which the focused photon beam is focused into the first focus enables a modulation of the second numerical aperture, whereby the modulation of the second numerical aperture can subsequently define the first output diameter.For example, the system can be designed such that a predetermined first output diameter is present, based on a predetermined angle of incidence of the photon beam at the first focus. The defined application of the angle of incidence can be predetermined, for example, through the design of various optical elements of the system, which guide the photon beam at the desired angle of incidence into the first focus of the first element. Examples of this are described below.

[0180] In one example, the system further comprises a means for varying the numerical aperture of the photon beam focused into the first focus and / or the angle of incidence at which the focused photon beam is focused into the first focus. As described herein, the dependence of the output diameter of the photon beam on the first numerical aperture and the angle of incidence can therefore not only be static, but can also be used variably in the operation of the system. The variation can comprise that at least two numerical apertures of the photon beam focused into the first focus can be adjusted for the operation of the system. Furthermore, the variation can comprise that at least two angles of incidence at which the focused photon beam is focused into the first focus can be adjusted for the operation of the system. The variation can, for example,include the ability to specifically set a mode in the system that causes a desired output diameter. Thus, the variation can comprise setting at least two output diameters of the photon beam. For example, the angle of incidence (and / or the first numerical aperture) can be set to one of at least two predetermined values. The system can then be operated statically in one mode, for example, so that the photon beam is output with the set (constant) output diameter (for example, no further variation of the first numerical aperture and / or the angle of incidence occurs during output). In a further example, however, it is also conceivable for the variation to occur dynamically during the output of the photon beam. The output diameter (or the first numerical aperture and / or the angle of incidence) can be varied, for example, at a frequency.

[0181] The system can, for example, have a user interface that allows an output diameter to be specified. The system can then automatically adjust the numerical aperture and / or the angle of incidence to provide the specified output diameter. In one example, the system further comprises a first input coupler. The system can be configured such that the photon beam is received in collimated form at the first input coupler with an input diameter. The first input coupler can be configured such that, upon collimated reception, it focuses the photon beam onto the first focus (of the first element) by reflection at the first input coupler. For example, the first input coupler, the first element, and the first output coupler can be viewed as parts of a first subsystem of the system. The collimated photon beam with the input diameter can be viewed as the input (or input signal) of the first subsystem.The collimated photon beam with the first output diameter can be regarded as the output (or output signal) of the first subsystem.

[0182] The first coupler can, for example, have a curved and reflective surface which receives the collimated photon beam with the input diameter, such that the collimated photon beam is reflected by the curved surface of the first coupler in such a way that the photon beam is focused on the first focus. In one example, the curved surface of the first coupler can comprise a (locally different) concave region with respect to the incident collimated photon beam. The geometry of the curved surface can, for example, be mathematically described via a parabola (e.g., via a parabolic curve / surface). In one example, the first coupler comprises a parabolic mirror. The parabolic mirror can have the concave region at least along one plane. For example, the parabolic mirror can have a concave region exclusively along one plane.In another example, the parabolic mirror may have a concave region along each of two orthogonal planes.

[0183] In one example, the first element and the first coupler are arranged relative to each other such that a focus of the first coupler and the first focus of the first element are located at substantially the same position.

[0184] In one example, the first element and the first coupler can be arranged in a fixed position relative to one another. The first element and the first coupler can thus be configured to be immobile relative to one another, thereby reducing the complexity of the adjustment in the system for adapting the photon radiation. This exemplary arrangement can thus enable the photon beam to be precisely redirected to the first focus of the first element and thus also correspondingly precisely to the second focus of the first element, whereby in this example, no adjustment is required to implement this.

[0185] It should be noted that, in another example, the first input coupler can also be finely adjusted to appropriately adjust the focus to the first focus or to calibrate the overlap of the second focus of the first element with the focus of the first input coupler (e.g., this can be done by shifting / tilting the first input coupler, e.g., using suitable positioners). It is also important to note that calibration can be omitted during normal operation, as the system can be configured so that the optimal position between the first element and the first input coupler does not change, even if, for example, the wavelength and / or magnification of the system is changed.

[0186] In another example, the system comprises a first coupler, wherein the first coupler is configured to receive the photon beam collimated at an input diameter and to focus the photon beam to the first focus without reflection. In one example, the first coupler may comprise, for example, a focusing lens, a focusing lens system, and / or an optical focusing device.

[0187] In one example, the means for varying can be configured to direct the received collimated photon beam (within the input diameter) onto different segments of a surface of the first coupler. By directing the received collimated photon beam onto different segments, different angles of incidence of the photon beam onto the first focus can be set. A predetermined segment can be associated with a predetermined angle of incidence. The effect of adjusting the angle of incidence can be achieved during reflection at the first coupler by focusing the received collimated photon radiation into the first focus of the first element, regardless of the irradiated segment. However, the spatial separation of the irradiated segments results in spatially offset starting points of the reflected edge rays of the photon radiation on the surface of the first coupler.By focusing on the first focus, these (initially spatially offset) edge rays all converge at the first focus, resulting in different angles of incidence for differently irradiated segments. The means for varying the beam can, for example, be configured to direct the received collimated photon beam onto different segments of the surface of the first coupler by shifting it (e.g., a parallel shift). This can, for example, be implemented with a movable mirror. The means for varying the beam can comprise means for shifting the received collimated beam (e.g., a movable mirror, e.g., a flat mirror without curvature).The movable mirror (as a means for displacement) can be displaceable only along one axis, so that only a parallel displacement of the received collimated photon beam is possible and necessary to irradiate the segments of the first coupler. This can enable particularly simple adjustment and construction. In other examples, the means for displacement can be movable and / or pivotable in two and / or three axes.

[0188] In one example, the system is further configured such that the first output diameter is greater than or equal to the diameter of the input diameter. The system (as described herein) can therefore be adjusted such that the collimated photon beam undergoes adaptation with the input diameter such that the first output diameter of the photon beam is a certain factor higher than the input diameter. The system can thus be used as a beam expander. For example, this can be made possible by configuring or adjusting the system as described herein such that the second numerical aperture is larger than the first numerical aperture, which can be implemented, for example, via a suitable angle of incidence at the first focus.

[0189] In one example, the system is further configured such that at least two magnifications of the first output diameter can be set with respect to the input diameter. The system can thus be operated in at least two magnification modes, each magnification mode being associated with a specific magnification. The system can be operated in a magnification mode, for example, statically, so that the photon beam is coupled out with the set (constant) magnification (e.g. no further variation in the magnification occurs during coupling out). In a further example, however, it is also conceivable for the magnification to occur dynamically during coupling out of the photon beam. The magnification can, for example, be varied between different values ​​at a frequency.

[0190] In one example, the system is further configured such that the magnification of the first output diameter with respect to the input diameter comprises a factor of at least 1.4, preferably at least 1.7, more preferably at least 2.2, most preferably at least 3.2 or at least 4. For example, the magnification may also comprise at least the mathematical root of two, preferably at least the root of three, more preferably at least the root of five, most preferably at least the root of ten. The system may be configured such that it can vary the magnification in a range from, for example, 1 to at least 3.2 or from, for example, 1 to at least 4 or from 1 to at least 10.

[0191] The system can be configured for continuous magnification variation, e.g., within the specified ranges. Alternatively or additionally, it can also be configured so that at least two magnifications can be set as discrete values. e.g., it can be provided that at least one magnification value can be discretely switched to at least one other magnification value, which can, for example, be significantly larger or smaller.

[0192] In one example, the system is further configured such that the first output diameter is smaller than the diameter of the input diameter. The system (as described herein) can therefore be adjusted such that the collimated photon beam undergoes adaptation with the input diameter such that the first output diameter of the photon beam is smaller than the input diameter by a certain factor. The system can thus be used as a beam reducer. For example, this can be made possible by configuring or adjusting the system as described herein such that the second numerical aperture is smaller than the first numerical aperture, which can be implemented, for example, via a suitable angle of incidence at the first focus.

[0193] In one example, the system is further configured such that at least two reductions of the first output diameter can be set with respect to the input diameter. The system can thus be operated in at least two reduction modes, each reduction mode being associated with a specific reduction. The system can be operated in a reduction mode, for example, statically, so that the photon beam is coupled out with the set (constant) reduction (e.g. no further variation in the reduction occurs during coupling out). In a further example, however, it is also conceivable for the reduction to occur dynamically during the coupling out of the photon beam. The reduction can, for example, be varied between different values ​​at a frequency.

[0194] In one example, the system is further configured such that the reduction of the first output diameter with respect to the input diameter comprises a factor of at least 1.4, preferably at least 1.7, more preferably at least 2.2, most preferably at least 3.2 or at least 4. For example, the reduction may also comprise at least the mathematical root of two, preferably at least the root of three, more preferably at least the root of five, most preferably at least the root of ten. The system may be configured such that it can vary the reduction in a range from, for example, 1 to at least 3.2 or from, for example, 1 to at least 4 or from 1 to at least 10.

[0195] The system can be configured for continuous variation of the reduction, e.g., within the specified ranges. Alternatively or additionally, it can also be configured so that at least two reductions can be set as discrete values. e.g., it can be provided that a discrete switch can be made from at least one reduction value to at least one other reduction value, which can, for example, be considerably larger or smaller.

[0196] In another example, the first input coupler and the first element and the first output coupler are arranged in a fixed position relative to one another. In one example, this system can be controlled (solely) via the displacement means, which directs the received collimated photon beam with the input diameter onto the first input coupler (as described herein). In one example, the input diameter of the received collimated photon beam can thus be adapted to one or more first output diameters by simply parallel displacement of the displacement means. This eliminates the need to implement complex mechanics for adapting the beam diameter, which can reduce the requirements for control and regulation as well as calibration, thus reducing system complexity while ensuring the optical quality of the photon radiation.

[0197] In one example, the system further comprises a second element with a curved surface, which has a first and a second focus. The system can be configured such that the photon beam reflected at the first element is focused into the first focus of the second element, such that the photon beam, after reflection at the surface of the second element, is focused on the second focus of the second element. This example is to be understood such that the second element receives a photon beam that has already been guided or deflected via the first element (as described herein), i.e. a photon beam that was previously reflected at the first element. This example is also to be understood such that the photon beam could be exposed to further influences or one or more optical elements between the first and the second element (e.g. the first output coupler).The second element can therefore be arranged behind the first element with respect to the beam direction of the photon radiation. The properties (or features) of the second element can correspond to the properties (or features) of the first element described herein (and vice versa). In one example, the structure of the first and second elements in the system is (essentially) the same. For example, the first and second elements can be constructed in the same way, whereby the same optical properties of the first and second elements can be present. The second element can represent a second deflection unit in the system, which guides or deflects the photon beam from the first focus of the second element to the second focus of the second element.In one example, the photon beam collimated by the first output coupler is focused into the first focus of the second element with the first output diameter so that it is focused on the second focus of the second element.

[0198] In one example, the system further comprises a second output coupler that collimates the photon beam to a second output diameter after reflection from the second element. The properties (or characteristics) of the second output coupler can correspond to the properties (or characteristics) of the first output coupler described herein (or vice versa). In one example, the structure of the first and second output couplers is (substantially) the same.

[0199] In another example, the second output coupler comprises an output coupler that collimates the photon beam to the second output diameter without reflection. In this example, the second output coupler can comprise, for example, a collimating lens, a collimating lens system, and / or a collimator, which does not necessarily have to include reflective elements. In one example, the second element and the second output coupler are arranged relative to one another such that a focus of the second output coupler and the second focus of the second element are located at substantially the same position.

[0200] In one example, the system further comprises a second input coupler, wherein the second input coupler is configured to receive the photon beam collimated by the first output coupler and to focus it onto the first focus of the second element by reflection at the second input coupler. The properties (or features) of the second input coupler can correspond to the properties (or features) of the first input coupler described herein (and vice versa). In one example, the structure of the first and second input couplers is (substantially) the same.

[0201] The second input coupler, the second element, and the second output coupler can be considered parts of a second subsystem of the system. The collimated photon beam with the first output diameter can be considered, for example, the input (or input signal) of the second subsystem. The collimated photon beam with the second output diameter can be considered the output (or output signal) of the second subsystem. The output of the second subsystem can function as the output of the system. In one example, the parts of the second subsystem can correspond to the same structure as the parts of the first subsystem.

[0202] The second subsystem (or one or more parts of the second subsystem) can fulfill the functions as described herein for parts of the first subsystem. The second subsystem can thus serve to further adapt the collimated photon beam with the first output diameter in accordance with the mechanisms of the first subsystem. The second subsystem can, for example, further enlarge the first output diameter so that the second output diameter is larger than the first output diameter. The total magnification of the first and second subsystems can, for example, result from multiplying the magnifications of the first subsystem by the magnification of the second subsystem. In a further example, the second subsystem can also be set up merely as a deflection unit without a magnification function. The division of the magnification between two subsystems can, for example, meet the requirements for the production of the first or (if applicable) second subsystem.(identical) second element. For example, smaller curvatures may then be sufficient.

[0203] In one example, the second element can be configured to at least partially compensate for an asymmetric light distribution of the photon beam reflected by the first element. For example, depending on the angle of incidence at the first focus of the first element, a certain asymmetric light distribution of the partial beams of the photon beam reflected by the first element (i.e., the partial beams of the light bundle of the photon beam reflected by the first element) can occur. This can be caused by the different reflection angles of the partial beams of the photon beam at the first element, so that the distances of the partial beams vary across the photon beam after reflection at the first element. For example, this can occur if the second numerical aperture (at the second focus of the first element) is different from the first numerical aperture (at the first focus of the first element).The inventor has recognized that this actually parasitic effect during the reflection of the photon beam at the first element can be specifically used for compensation if the photon beam with the asymmetrical light distribution is refocused and reflected at an element that has similar reflective properties to the first element. According to the invention, the reflection at the second element can be used for this purpose. For this purpose, it can be helpful if the system is set up in such a way that the arrangement of the marginal rays of the photon beam is reversed when focused on the second element, compared to the arrangement of the marginal rays when focused on the first element. The marginal ray that is closer to the second focus when reflected at the first element can, for example, be further away from the second focus when reflected at the second element.This ensures that the described effect upon reflection of the photon beam at the second element drives together the partial beams of the photon beam that are further apart due to the asymmetry. Furthermore, it is also possible to ensure that the partial beams of the photon beam that are comparatively closer apart due to the asymmetry are driven apart. As a result, the light distribution of the photon beam reflected at the first and second elements can comprise a (substantially) symmetrical light distribution of the partial beams, or the asymmetrical light distribution can be significantly compensated to a certain extent. Furthermore, the system can be configured so that the photon beam is directed onto regions of the first and second elements that have a similar curvature, thus optimizing the compensation.It should also be noted that if the arrangement of the marginal rays in the system is not reversed, as explained, the asymmetric light distribution caused by reflection from the first element can be further amplified upon reflection from the second element. Using the second element as a means of compensating for the asymmetric light distribution can therefore make it possible to provide a system for adapting the diameter of the photon radiation that does not exhibit any noticeable distortion characteristics while still being controllable with low complexity.

[0204] In some examples, it may be provided that the elements of the second subsystem are a factor larger than the corresponding elements of the first subsystem, but otherwise have the same shape. The factor may, for example, correspond to an average magnification that can be achieved by the first subsystem. If, for example, the first subsystem can achieve a certain maximum magnification Vmax, then the elements of the second subsystem can be made larger by a factor of Vmax / 2, for example. When using a magnification of Vmax / 2 in the first subsystem, the photon beam could then pass through the correspondingly enlarged mirror surfaces in the second subsystem (where it is magnified by Vmax / 2) in an identical manner, but the shift in the symmetry of the light distribution could be compensated for in a practically identical way.

[0205] In further examples, more than two of the subsystems mentioned may be used. These may increase the size of their corresponding elements if necessary.

[0206] A second aspect relates to a device for projecting with a system according to one of the examples described herein. The device can, for example, comprise a replication system, an exposure system, a printer and / or another type of projection device. The photon beam with the first output diameter and / or the photon beam with the second output diameter can, for example, correspond to a field point or a part of an image which is to be imaged in a plane via the device. For this purpose, the device can have a corresponding light source whose collimated beam can then be adapted in diameter. Alternatively or additionally, the device can have one or more (movable) reflective elements in order to be able to scan the photon beam, for example, along one or two orthogonal directions.The device may also comprise one or more parabolic mirrors to direct the diameter-adapted scanned beam into a desired plane.

[0207] As described herein, the system can avoid aberration typically associated with passing / transmitting a photon beam through two media (e.g., a lens). For example, a corresponding aberration in the projection device comprising the system can thus also be avoided. For example, color aberrations (e.g., chromatic aberration) can be avoided, so that the projection device can function reliably for different wavelengths of photon radiation. For example, a replication system can thus be operated without (significant) color aberrations. For example, freedom from aberrations can be provided substantially over a wavelength range from 400 nm to 800 nm (and / or in another wavelength range as described herein).

[0208] A third aspect relates to a method for adapting a diameter of a photon beam, comprising: directing an incident photon beam onto a first element comprising a curved surface, wherein the first element has a first and a second focus. The directing is performed such that the received photon beam is focused into the first focus of the first element, wherein the directed photon beam, after reflection from the surface of the first element, is output in a focused manner at the second focus. The method may further comprise collimating the photon beam reflected from the first element to a first output diameter. The method may be carried out using a system according to one of the examples of the first aspect described herein.

[0209] In one example of the method, the incident photon beam comprises a collimated photon beam having a first input diameter, wherein the directing further comprises: varying a numerical aperture of the photon beam focused into the first focus and / or an angle of incidence at which the focused photon beam is focused into the first focus such that the first output diameter varies.

[0210] A fourth aspect relates to a computer program comprising instructions which, when executed by a computer, a system according to the first aspect and / or a device according to the second aspect, cause the computer, the system or the device to carry out a method according to the third aspect.

[0211] The computer program may alternatively or additionally comprise instructions for executing the further method steps described herein or for executing or implementing the functionalities of devices described herein. For example, the computer program may cause certain optical elements of the system to shift (e.g., components of the means for shifting), resulting in an optical magnification or zoom factor selected in the program for the system or device. The system can thus be controlled based on a computer program and an interface to its optical elements.

[0212] A further aspect relates to the mentioned system and / or device having a memory which comprises the computer program. The system and / or device can further comprise means for executing the computer program. Alternatively, it is also possible for the computer program to be stored elsewhere (e.g. in a cloud) and for the device to merely comprise means for receiving instructions which result from the execution of the program elsewhere. In either case, this can, for example, enable the method to run automatically or autonomously within the system and / or device. In this way, intervention, e.g. via manual adjustment, can be minimised, so that the complexity of adapting the beam diameter can be reduced.

[0213] The features (and examples) of the method mentioned herein can also be applied or apply accordingly to the system (or device and / or computer program) mentioned. Likewise, the features (and examples) of the system or device mentioned herein can also be applied or apply accordingly to the methods or computer programs described herein.

[0214] 7. Short description of the characters

[0215] In the following detailed description, technical background information as well as embodiments of the system for adapting a diameter of a photon radiation are described with reference to the figures, which show the following: Fig. 10 schematically illustrates in a side view an exemplary system for adapting a diameter of a photon radiation.

[0216] Fig. 11 shows schematically the beam distribution of the photon radiation as it passes through an exemplary system for adapting a diameter of a photon radiation.

[0217] Fig. 12 schematically illustrates in a side view another exemplary system for adapting a diameter of a photon radiation.

[0218] 8. Detailed description of the figures and possible embodiments

[0219] Fig. 10 schematically illustrates a side view of an exemplary system 100 for adapting a diameter of a photon radiation. The system 100 can be designed to adapt photon radiation with any wavelength. For example, the photon radiation can encompass the light range visible to humans. For example, the photon radiation can be in a wavelength range from 400 nm to 800 nm (which includes the RGB color space). However, it is also conceivable that the concepts and features of the system 100 and the invention mentioned herein can also be applied to photon radiation in the (E and / or D) UV range and / or the (near) infrared range. It is merely necessary to provide a reflectivity of the respective reflective surfaces of the system in the respective wavelength range. Regardless of the respective wavelength range, the photon beam can be provided, for example, as a laser beam.The use of the word "beam" does not imply that it can be a continuous-wave beam. Both a continuous-wave photon beam and, for example, a pulsed photon beam can be used.

[0220] The system 100 in Fig. 10 can comprise a first element 1 for adapting the photon radiation. The first element 1 can have a first focus Fi and a second focus F2. In one example, the first focus Fi and the second focus F2 can be designed such that photon radiation which emerges from one focus and is reflected by the first element 1 then enters the other focus. The photon radiation from one focus can thus be imaged onto the other focus. In one example, the first element 1 comprises an elliptical mirror, wherein the first focus Fi and the second focus F2 correspond to the two foci of the elliptical mirror. The elliptical mirror can comprise a section of a geometric ellipse, i.e. the ellipse of the elliptical mirror does not have to be completely geometric. This is shown, for example, in Fig.10, wherein the first element 1 represents an elliptical mirror, which is constructed from a partial section of the ellipse shown in dashed lines.

[0221] The system 100 can further comprise a first coupler E1. The first coupler E1 can serve to receive a photon beam and focus it onto the first focus Fi of the first element 1. The photon beam received at the first coupler E1 can also be considered an input of the system 100. In one example, the first coupler E1 can be configured to receive a collimated photon beam that is collimated to a defined diameter, wherein this diameter can also be referred to as the input diameter. For the description of the system 100, reference is first made, by way of example, to the beam path of the first photon beam S', which is incident on the first coupler E1 with the input diameter. The first photon beam S' can comprise a radiation bundle that includes several partial beams, wherein the edge rays and the directional beam are shown in Fig. 10.The first photon beam S' initially impinges on the first input coupler E1 as a collimated input beam with an input diameter. The first input coupler E1 can, for example, comprise a parabolic mirror (as shown in Fig. 10). The parabolic mirror can comprise a section of a geometric parabola, i.e. the parabola of the parabolic mirror does not have to be completely geometric. This can be seen, for example, in Fig. 10, where the first input coupler E1 represents a parabolic mirror which is constructed from a partial section of the parabola shown in dashed lines. In order to focus the received photon radiation S', the first input coupler E1 (e.g. the parabolic mirror) can have a focus which is aligned with the first focus Fi of the first element.The position of the focus of the first coupler Ei can essentially correspond to the position of the first focus Fi of the first element, so that these foci spatially overlap completely (or at least partially). In the case of a parabolic mirror as the first coupler Ei, it should be mentioned that axis-parallel rays, i.e. rays which are incident parallel to the ordinate (or the axis of symmetry or a directrix) of the geometrically / mathematically definable parabola, are incident into the focus of the parabolic mirror after reflection at the parabolic mirror. The system 100 can therefore be configured such that the first coupler Ei, when designed as a parabolic mirror, receives the collimated first photon radiation S' with the input diameter in this way parallel to the axis, so that the received photon radiation is (mainly) redirected into the focus of the parabolic mirror. The axis-parallel coupled first photon radiation S' can comprise a planar wavefront.Since the focus of the first coupler Ei (or the focus of its parabolic mirror) is at the same position as the first focus Fi of the first element, the first photon radiation S' with the input diameter is automatically focused on the first focus Fi of the first element i. This photon radiation can then be reflected by the first element i in order to be focused onto the second focus F2 of the first element 1. This defined "refocusing" can therefore be used to redirect photon radiation in the system 100 or a system of the invention.

[0222] The system 100 can further comprise a first output coupler Ai. The first output coupler Ai can, for example, comprise a parabolic mirror (as shown in Fig. 10). The parabolic mirror can comprise a section of a geometric parabola, i.e. the parabola of the parabolic mirror does not have to be completely geometric. This can be seen, for example, in Fig. 10, wherein the first output coupler Ai represents a parabolic mirror which is constructed from a partial section of the parabola shown in dashed lines. The first output coupler Ai can be configured to receive the radiation focused by the first element 1 at the second focus F2 and to collimate it to a first output diameter. For this purpose, the first output coupler Ai (for example constructed as a parabolic mirror) can have a focus which is aligned with the second focus F2 of the first element.The position of the focus of the first outcoupler Ai can essentially correspond to the position of the second focus F2 of the first element, so that these foci spatially overlap completely (or at least partially). In the case of a parabolic mirror as the first outcoupler Ai, it should be mentioned that focus rays, i.e. rays which are incident on the surface of the parabolic mirror from the focus of the parabola, are decoupled from the parabolic mirror in an axis-parallel manner after reflection at the parabolic mirror. This axis-parallel outcoupling can thus be ensured by the aforementioned overlap of the second focus F2 and the focus of the first outcoupler Ai. This makes it possible, as can be seen in Fig. 10, to "convert" the first photon beam S' back into a collimated beam and to couple it out as a collimated output beam with a first output diameter. The axis-parallel outcoupled first photon radiation can comprise a planar wavefront.

[0223] In the example in Fig. 10, the first output diameter of the first photon beam S' is equal to the input diameter of the photon beam S'. This is achieved by the photon beam S' striking an area around the minor axis of the ellipse of the first element 1 essentially symmetrically.

[0224] It should also be mentioned that, in one example, the parabolic mirror of the first input coupler Ei and the parabolic mirror of the first output coupler Ai can be described by the same parabola, whereby only different sections (e.g., different parabolic branches) of the parabola are used for the first input coupler Ei and the first output coupler Ai. The first input coupler Ei and the first output coupler Ai can be arranged symmetrically with respect to the first element 1. For example, the first input coupler El and the first output coupler can be arranged symmetrically with respect to a minor axis or major axis of the ellipse defined by the elliptical mirror of the first element i.

[0225] As described, the system 100 can therefore enable the photon radiation to be redirected in a targeted manner by converting a beam from a collimated to a focused state, subsequently focusing it at a different location, and then returning it to a defined collimated state without the need for complex adjustment. Implementing this deflection unit via reflective elements (e.g., with the elliptical mirror as the first element i, the parabolic mirror as the first input coupler Ei, and / or the parabolic mirror as the first output coupler Ai) can further enable light transmission of the photon radiation to be avoided during its deflection in the system 100 through two media, so that a corresponding aberration is also avoided (e.g., monochromatic and / or chromatic aberrations associated with lenses can be avoided).

[0226] As a further example, a possible mechanism for adapting the diameter of the photon radiation in the system 100 is explained. The system 100 can, for example, be set up or used in such a way that the first output diameter of the photon beam coupled out at the first output coupler is larger than the input diameter of the photon beam coupled in at the first input coupler E1. For this magnification effect, reference is now made to the beam path of the second photon beam S" shown in Fig. 10, in which the magnification effect occurs in contrast to the first photon beam S'. The second photon beam S" can comprise a radiation bundle which includes several partial beams, wherein the first marginal beam S1, the second marginal beam S2 and the directional beam S3 are marked in Fig. 10.The second photon beam S", which is axially parallel to the parabolic mirror of the first coupler, radiates onto a segment of the surface of the parabolic mirror of the first coupler E1, so that the second photon beam S" is focused at a specific angle of incidence α onto the first focus Fi of the first element. The irradiated segment of the first coupler Ei is different for the second photon beam S" than the irradiated segment for the first photon beam S'. For the second photon beam S", this results in a specific angle of incidence α, which is different from the angle of incidence of the first photon beam S', at which no magnification effect occurs. The angle of incidence can be defined in this example as the angle between the directional ray of a photon beam and the line connecting the first and second focus of the first element (i.e., the major axis of the ellipse, although other definitions are also possible).The angle of incidence α results in a beam path that is further defined by the reflection of the second photon beam S" at the first element i and the focusing onto the second focus F2. Due to the magnitude of the angle of incidence and the boundary conditions for reflection at the first element 1, the numerical aperture NA2" of the second photon beam S" at the second focus F2 is larger than the numerical aperture NA1" of the second photon beam S" at the first focus F1. This larger second numerical aperture NA2" then falls onto the surface of the first output coupler. The first output coupler Ai then collimates the second photon beam S" to the first output diameter. By increasing the numerical aperture NA2" at the second focus, the overall result in this example is that the collimated output beam of the second photon beam S" has a larger diameter than its collimated input beam.

[0227] In comparison, it should be mentioned that with the first photon beam S', no magnification effect occurs in the system 100, since there is no change in the numerical aperture upon reflection at the first element 1. Although the first (axis-parallel) photon beam S' has the same input diameter as the second photon beam S", the first photon beam S' irradiates a different segment of the parabolic mirror of the first coupler Ei, resulting in a different angle of incidence at the first focus Fi, which does not cause any change in the numerical aperture at the second focus. For the first photon beam S', the numerical aperture NA1' at the first focus Fi is therefore equal to the numerical aperture NA2' at the second focus F2.It should be noted that for the first photon beam S', the angle of incidence is selected such that the directional beam S3 of the second photon beam S" falls on a vertex of the minor axis of the ellipse formed by the elliptical mirror of the first element 1. The resulting beam path of the first photon beam S' is thus symmetrical with respect to the two foci Fi and F2 (or the minor axis), so that there is no change in the numerical aperture at the foci Fi and F2. Furthermore, it should be mentioned that in the example of Fig. 10, the first input coupler Ei and the first output coupler Ai are arranged symmetrically with respect to the minor axis of the ellipse, so that with the same numerical aperture NA1' and NA2' of the first photon beam S', its input diameter is directly transferred to the first output diameter.In other words, the magnification effect is caused by the "oblique" incidence of the second photon beam into the first element 1, so that the beam path is no longer symmetrical along the minor axis of the ellipse. The resulting change in the numerical aperture at the focuses F1 and F2 can thus be used to increase the output diameter of the photon beam relative to the input diameter.

[0228] By “parallel shifting” the incoming photon beam (e.g. by means of a mirror moving along an axis), the magnification of the system can be varied.

[0229] It should be noted that a zoom system is typically defined by a magnification of i / m to m. The zoom factor can be defined as: T = m m ax / m m in = m 2 , where m ma x and m mtypically represent the longest and shortest focal lengths of a zoom lens. The magnification of the system 100 can, in one example, reach values ​​that exceed the root of 10, e.g., greater than 4 (as already described herein). Using the typical definition of a zoom lens, this corresponds to a magnification m of greater than root of 10 (i.e., m at least 3.16), where the zoom factor m 2 then at least m 2 = 10. In other examples, the zoom factor of the system 100 is at least 2, 3, 5, or at least 20.

[0230] As indicated in Fig. 10, the magnification of the second photon beam S" leads to an asymmetrical light distribution of the partial beams Si, S2, S3. This indicates that the partial beams S2 and S3 are further apart in the collimated output diameter than the partial beams Si and S2. In system 100, the second photon beam S' is therefore magnified, but this results in an asymmetrical light distribution of the partial beams, which can, for example, represent a distortion. It should be mentioned that different reflection angles are present at the first element 1 for the partial beams Si, S2, S3. For example, after reflection at the first element 1, the marginal ray S2 has the shortest distance of the partial beams to the second focus F2 and is therefore focused most "strongly" on the second focus F2.The marginal ray Si has the longest distance of the partial rays to the second focus after being reflected at the first element 1 and is therefore focused “weakest” on the second focus F2.

[0231] The effect of the asymmetric light distribution when magnified is shown in more detail in Fig. 11. Fig. 11 schematically shows the beam distribution of the photon radiation as it travels through the exemplary system 100 of the invention. The beam distribution or arrangement of the partial beams of the second photon beam S" is schematically illustrated based on simulation results. Shown here is, on the one hand, the input beam distribution 201 of the collimated input beam of the second photon beam S" before coupling into the system 100. The input beam distribution 201 is shown in the x and y directions, while next to it the path of the partial beams in the system 100 is shown in the z and y directions. The input beam distribution 201 can, for example, correspond to the beam distribution of a homogeneous light source which is used as the source for the second photon beam S".In this example, the input diameter of the collimated input beam is 3.2 mm, with the beam cross-section being circular. Any other shape of the beam cross-section is also conceivable (e.g., rectangular, square, elliptical, etc.), as is any other (largest) input diameter (e.g., at least 0.5 mm, at least 1 mm, at least 2 mm, at least 5 mm, and / or less than 10 mm, less than 5 mm, less than 2 mm, etc.). The output beam distribution 202 of the collimated output beam of the second photon beam S" after passing through the system 100 with the first element 1, input coupler Ei, and output coupler Ai (which can be configured as described with reference to Fig. 10) is shown in the x and y directions. It can be seen that the first output diameter is approximately 30 mm, with the beam cross-section being circular, analogous to the input beam.This indicates that the magnification in system 100 has occurred, for example, in both the x and y directions. In the example in Fig. 11, the coupling (as described herein) has been performed in such a way that a magnification factor of approximately ten occurs.

[0232] In an alternative example, the magnification can also take place only along one axis, e.g., the y-axis. For this purpose, the mirrors of the first input coupler E1, the first element 1 and / or the first output coupler Ai can be manufactured to be curved in only one dimension, so that the light can only be magnified in one dimension, e.g., the y-axis. For example, the output beam in the x-direction would be just as wide as the input beam in the x-direction, whereby the diameter of the output beam in the y-direction would be, for example, approximately ten times as large as the diameter of the input beam in the y-direction (with a magnification factor of the system 100 of approximately ten). In this regard, reference is also made in advance to the beam distribution 302 in Fig. 12, which represents a corresponding beam distribution in which the magnification has only taken place along one axis. It can be seen that the enveloping shape of the beam distribution 302 essentially represents an ellipse.Even in a system such as that shown in Fig. 11, by limiting the magnification along one axis (e.g. the y-axis), an output beam distribution can be generated whose envelope essentially represents an ellipse.

[0233] It should be noted that, according to the disclosure, a (substantially) symmetric beam magnification can be generated (e.g., with equal magnification along the x- and y-axes). Likewise, according to the disclosure, a (substantially) asymmetric beam magnification can be generated (e.g., with magnification only along the y-axis).

[0234] For certain applications, it may be necessary to generate a symmetric beam magnification. For example, it may be technically required that the output beam be magnified symmetrically (as described herein). For example, if the input beam has a (substantially) circular envelope of the intensity distribution, it may be required that the output beam also has a (substantially) circular envelope.

[0235] For certain applications, however, it may also be necessary to generate an asymmetric beam magnification. For example, it may be technically required that the output beam is magnified asymmetrically (as described herein). For example, if the input beam has a (substantially) circular envelope of the intensity distribution, it may be required that the output beam has a (substantially) elliptical envelope. For example, this can ensure a higher light intensity of the output radiation, since the radiation is (comparatively) distributed over a smaller area than with symmetrical magnification. For example, asymmetric magnification can be advantageous when using the system in a projection device, where, for example, the elliptical output radiation can be further manipulated via the projection device.the elliptical output radiation can be rasterized along a line from the projection direction. From Fig. 11 the asymmetric light distribution of the partial beams can also be seen (for the symmetrical magnification along the x and y axes), as can be seen from the larger distances between the partial beams at higher y values ​​and the smaller distances between the partial beams at lower y values. Furthermore, the beam distribution in the y-z plane for ten partial beams is shown, in which the asymmetry of the distances between the partial beams can also be seen schematically. Along the x-axis, no significant asymmetry is recognizable (due to the optical design). This can be ensured, for example, by ensuring that the beam path is symmetrical to the yz plane.

[0236] Fig. 12 schematically illustrates, in a side view, another exemplary system 300 of the invention that can compensate for or minimize the asymmetry described with reference to Fig. 11. The system 100 described herein can be included as a subsystem in the system 300. Fig. 12 initially shows a photon beam input Si, which is redirected via a first deflection mirror Mi to a first translation mirror M2. The first translation mirror M2 can be translated along the y-axis shown. The first translation mirror M2 can serve to guide the photon beam input SI in a defined manner into a first subsystem Gl, which can correspond to the system 100 in terms of structure and operation.In this example, the first movable mirror M2 can introduce the photon beam input Si into the first subsystem Gl in such a way that the first photon radiation S' as well as the second photon radiation S" can be caused, depending on the position of the first movable mirror M2. The movable mirror can therefore be understood as a means for variation, whereby more than two positions of the first movable mirror M2 are conceivable, whereby different photon radiations with different angles of incidence and thus magnifications for the first subsystem Gl can be set. In this regard, the first input coupler Ei, the first element 1 and the first output coupler Ai of the first subsystem Gl (analogous to system 100) can be seen in Fig. 12. Accordingly, the photon beam S' (slightly enlarged) orthe photon beam S" (more magnified, but also with more asymmetric light distribution) is coupled out with the first output diameter.

[0237] In the example from Fig. 12, this decoupled photon radiation is then redirected via a second deflection mirror M3 to a second shifting mirror M4. The second shifting mirror M4 can serve to guide the photon radiation decoupled from the first subsystem G1 in a defined manner into a second subsystem G2 of the system 300. The second subsystem G2 can correspond in structure and function to the system 100. In this regard, Fig. 12 shows a second input coupler E2, a second element 2, and a second output coupler Ä2 of the second subsystem G2 (analogous to the system 100 or the subsystem G1).In particular, the second translation mirror M4 can also adapt the radiation coupled out by the first subsystem G1 such that it falls on different segments of the surface of the second input coupler E2, so that different angles of incidence and associated magnifications can be introduced onto the photon radiation in the system 300 (as described herein). In one example, the second translation mirror M4 and the first translation mirror M2 can be coupled to one another. The coupling can be designed such that the first and second translation mirrors M2, M4 cause the same magnification for each subsystem G1, G2. In the example shown in Fig. 12, the coupling can be such that the second translation mirror M4 always moves in the same direction as the first translation mirror M2, e.g.so that the photon beam is directed onto a segment of the second coupler E2 that corresponds to the segment of the first coupler E1 onto which the photon beam was directed. However, the second shifting mirror M4 can cover a distance many times greater than that of the first shifting mirror M2 (as indicated in Fig. 12, the shifting mirror M4 is shifted further for the photon beam S" than the shifting mirror M2, with respect to the mirror position in order to redirect the photon beam S'). For example, when the first shifting mirror M2 is shifted, the second shifting mirror M4 can cover a distance that is a certain multiplicative factor greater than the distance covered by the first shifting mirror M2.The zoom factor of the System 300 can therefore be adjusted via a single degree of freedom and yet can be varied over a wide range (at almost any wavelength) essentially without aberration.

[0238] The total magnification of system 300 can thus result from multiplying the magnification introduced at the first subsystem G1 by the magnification introduced at the second subsystem G2. The second subsystem G2 can thus be regarded as a further magnification unit. The total magnification of system 300 can, for example, comprise at least 5, at least 10, or at least 20, although higher total magnifications would also be conceivable. Furthermore, it is also conceivable for system 300 to comprise a zoom factor of at least 2, preferably at least 10, more preferably at least 50, and most preferably at least 100. In addition, however, the second subsystem G2 can also (simultaneously) compensate for the asymmetry of the light distribution that can occur during the magnification of the photon beam in the first subsystem G1 (as described herein).It should be noted that for this purpose, the components in system 300 should be configured for a beam path in which the arrangement of the marginal rays Si, S2 in the second subsystem G2 is interchanged with the arrangement of the marginal rays Si, S2 in the first subsystem G1. The arrangement of the marginal rays can be considered to be interchanged with regard to the coupling of the marginal rays into the respective subsystem. This is schematically illustrated in Fig. 12, in which the marginal rays Si and S2 are marked. In the first subsystem G1, the marginal ray Si is located in the section between the focus of the first coupler Ei and its reflection point on the first element 1 on the side of the photon beam S", which faces the first element 1.In the second subsystem G2, however, the marginal ray S2 is located in the section between the focus of the second coupler E2 and its reflection point on the second element 2 on the side of the photon beam S", which is facing the second element 2. This interchanging of the marginal rays Si, S2 upon incidence into the second subsystem G2 can be explained, for example, by the fact that the photon radiation enters the second subsystem G2 in a mirrored manner due to the beam path of the system 300, compared to the incidence of the photon radiation into the first subsystem Gl. This type of configuration can make it possible to (at least partially) compensate for the effect of the asymmetric light distribution of the first subsystem Gl via the second subsystem G2.This can be explained by the fact that the effect causing the asymmetry in the distribution of the partial beams acts in the opposite direction in the second subsystem G2 due to the reflection of the photon radiation, so that the asymmetry in the distribution of the partial beams is minimized after passing through the second subsystem G2. If the aforementioned compensation is not performed, the parasitic effect described here will further amplify the asymmetry of the light distribution.

[0239] The system 300 further comprises a third translation mirror M5, which is movable along the z-direction, after the second subsystem G2. The third translation mirror can thus adjust the position of the photon beam output by the second subsystem G2 on a plane. The photon beam output by the system 300 can also be referred to as the photon beam output SO. For example, the third translation mirror M5 can assume a position depending on the magnification caused by the system 300, so that the photon beam output SO emitted by the system 300 appears centered on a point, regardless of the magnification.

[0240] The possible photon beam output SO of the system 300 is given as an example with the beam distribution 301 and the beam distribution 302.

[0241] Beam distribution 301 specifies the beam distribution when the photon beam input SI is magnified and compensated via system 300 in the x- and y-directions. Thus, beam distribution 301 exhibits a symmetrical beam magnification (as described herein). Symmetrical beam magnification can, for example, be present in both subsystems, resulting in a symmetrical beam magnification at the photon beam output SO.

[0242] Beam distribution 302 indicates the beam distribution when the photon beam input SI is magnified and compensated across the system only in the y-direction. Thus, beam distribution 302 exhibits an asymmetric beam magnification (as described herein). It can be seen that the envelope of beam distribution 302 has an elliptical shape (in contrast to the circular distribution of the radiation of the photon beam input SI, which is indicated in a darker color). The asymmetric beam magnification can, for example, be present in both subsystems, so that the photon beam output SO exhibits an asymmetric beam magnification.

[0243] Further examples according to the disclosure described herein are explained below. These examples explained below can be combined with the further examples described herein (and vice versa). In particular, the examples explained below relate to possible embodiments of the means for adapting an extension of the beam before the beam impinges on the object based at least in part on the set angle of incidence.

[0244] Further examples:

[0245] 1. A system for replicating a holographic object (O) comprising: means for irradiating the object with a beam (S) at a set angle of incidence (ei, e2);

[0246] Means for adapting an extension (Di, D2) of the beam before the beam impinges on the object based at least in part on the set angle of incidence; wherein the beam comprises a photon beam; wherein the means for adapting comprises: an adaptation system (100, 300) for adapting a diameter of the photon beam (S', S") before the photon beam impinges on the object, comprising: a first element (1) with a curved surface, which has a first and a second focus (Fi, F2); wherein the adaptation system is configured to focus the photon beam into the first focus (Fi) such that the photon beam is focused onto the second focus (F2) after reflection at the surface of the first element (1).

[0247] 2. The system of example 1, wherein the adaptation system further comprises a first output coupler (Ai) that collimates the photon beam to a first output diameter after reflection at the first output coupler.

[0248] 3. System according to example 2, wherein the first element and the first output coupler are arranged relative to one another such that a focus of the first output coupler (Ai) and the second focus (F2) of the first element (1) are located at substantially the same position.

[0249] 4. System according to one of examples 2 or 3, wherein the first element (1) and the first output coupler (Ai) are arranged in a fixed position relative to one another.

[0250] 5. The system of any one of examples 2-4, wherein the adaptation system is further configured such that the first output diameter is dependent on a numerical aperture (NA1', NAi") of the photon beam (S', S") focused into the first focus (Fi).

[0251] 6. The system of any one of examples 2-5, wherein the adaptation system is further configured such that the first output diameter is dependent on an angle of incidence (et) at which the focused photon beam (S") is focused into the first focus (Fi). 7. The system of any one of examples 5 or 6, wherein the adaptation system further comprises means for varying the numerical aperture of the photon beam focused into the first focus and / or the angle of incidence at which the focused photon beam is focused into the first focus.

[0252] 8. The system according to any one of examples 1-7, further comprising a first coupler (El), wherein the first coupler is configured to focus the photon beam upon collimated reception with an input diameter by reflection at the first coupler onto the first focus (Fi).

[0253] 9. The system of example 8, wherein the adaptation system is configured to direct the received collimated photon beam onto different segments of a surface of the first coupler.

[0254] 10. The system of example 8 or 9, as relied upon in any of examples 2-7, wherein the adaptation system is further configured such that the first output diameter is larger than the input diameter.

[0255] 11. The system of example 10, wherein the adaptation system is further configured to adjust at least two magnifications of the first output diameter relative to the input diameter.

[0256] 12. The system according to any one of examples 10 or 11, wherein the adaptation system is further configured such that an increase in the first output diameter with respect to the input diameter comprises a factor of at least 1.4, preferably at least 1.7, more preferably at least 2.2, most preferably at least 3.2.

[0257] 13. System according to one of examples 8-12, wherein the first element (1) and the first coupler (El) are arranged in a fixed position relative to one another.

[0258] 14. The system of any one of examples 1-13, wherein the first element (1) comprises an elliptical mirror. 15- The system (300) of any one of examples 1-14, wherein the adaptation system further comprises a second element (2) with a curved surface, which has a first and a second focus; wherein the adaptation system is configured such that the photon beam reflected at the first element (1) is focused into the first focus of the second element (2), such that the photon beam, after reflection at the surface of the second element, is focused onto the second focus of the second element.

[0259] 16. The system of example 15, wherein the adaptation system further comprises a second output coupler (A2) that collimates the photon beam to a second output diameter after reflection at the second element.

[0260] 17. The system of example 16, wherein the second element (2) and the second output coupler (A2) are arranged relative to each other such that a focus of the second output coupler and the second focus of the second element are located at substantially the same position.

[0261] 18. The system according to any one of examples 15-17, wherein the adaptation system further comprises a second input coupler (E2), wherein the second input coupler is configured to receive the photon beam collimated by the first output coupler (Ai) and to focus it onto the first focus of the second element (2) by reflection at the second input coupler (E2).

[0262] 19. The system of any one of examples 15-18, wherein the second element (2) is configured to at least partially compensate for an asymmetric light distribution of the photon beam reflected by the first element (1).

[0263] 20. Device (400) for projecting with a system (100, 300) according to any one of examples 1-19.

[0264] 21. A method for replicating an object (O) for holography comprising:

[0265] irradiating the object with a beam (S) at a set angle of incidence (ei, e2);

[0266] Adapting an extension of the beam prior to impingement of the beam on the object based at least in part on the adjusted angle of incidence; wherein the beam comprises a photon beam; directing the photon beam, prior to impingement of the beam on the object, onto a first element (i) comprising a curved surface, the first element having a first and a second focus (Fi, F2); wherein the directing is performed such that the photon beam is focused into the first focus (Fi) of the first element, wherein the directed photon beam is output focused at the second focus (F2) after reflection at the surface of the first element.

[0267] 22. A computer program comprising instructions that, when executed by a computer, a system (100, 300) according to any one of Examples 1-19 and / or a device (400) according to Example 20, cause the computer, the system and / or the device to perform a method according to Example 21.

Claims

CLAIMS 1. System for replicating a holographic object (0) comprising: Means for irradiating the object with a beam (S) at a set angle of incidence (ei, e2); Means for adapting an extension (Di, D2) of the beam prior to the beam impinging on the object based at least in part on the set angle of incidence.

2. The system of claim 1, wherein the means for adapting is configured to adapt, as an extension of the beam, a diameter of the beam along an axis perpendicular to the beam direction of the beam.

3. The system of claim 1 or 2, wherein the means for irradiating is configured to irradiate the object via at least one reflection of the beam.

4. The system of claim 3, wherein the means for irradiating comprises two or more reflective elements for reflecting the beam.

5. A system according to any one of claims 1-4, wherein the means for irradiating does not comprise an optically transparent element through which the beam is transmitted before impinging on the object.

6. The system according to any one of claims 1-5, wherein the system is configured to scan the object with the beam, wherein the means for irradiating is configured: in a first scanning mode, to irradiate the object at a first angle of incidence (ei), and in a second scanning mode, to irradiate the object at a second angle of incidence (e2); wherein the means for adapting is configured: in the first scanning mode, to adapt the beam to a first extent, and in the second scanning mode, to adapt the beam to a second extent. 7- System according to claim 6, wherein the means for irradiating comprises a first reflective element (Mn) which is movable along a first translation axis (Z).

8. The system of claim 7, wherein the first reflective element is rotatable about a first axis of rotation.

9. System according to claim 7 or 8, wherein in the first scanning mode the first reflective element (Mit) is used to irradiate the object at the first angle of incidence (ei).

10. The system of claim 9, wherein the first angle of incidence (ei) represents an angle of incidence to a plane of the object and comprises a value between 20° and 85°.

11. System according to one of claims 7-10, wherein the means for irradiating comprises a second reflective element (M22) which is movable along a second translation axis (X), which is preferably perpendicular to the first translation axis (Z).

12. The system of claim 11, wherein the second reflective element is rotatable about a second axis of rotation.

13. The system of claim 11 or 12, wherein in the second scanning mode the second reflective element (M22) is used to irradiate the object at the second angle of incidence (e2).

14. The system of claim 13, wherein the second angle of incidence (e2) represents an angle of incidence to a plane of the object and comprises a value between 0° and 20°.

15. System according to any one of claims 6-14, wherein the system is arranged such that the difference between the first and the second angle of incidence is at least 5 0 , at least 10°, at least 20°, at least 30° or at least 40°.

16. System according to one of claims 11-15, wherein the means for irradiating comprises a directing element (G), the directing element being arranged: in the first scanning mode, direct the beam onto the first reflective element (Mn); and in the second scanning mode, direct the beam onto the second reflective element (M22).

17. The system of any one of claims 1-16, wherein the system further comprises means for coupling the beam into the means for irradiating, wherein the means for coupling is configured to couple the beam into the means for irradiating in a raster movement along a raster axis.

18. The system of claim 17, wherein the means for coupling comprises a parabolic mirror (2000), the means for coupling being arranged to make the beam incident on different positions of the parabolic mirror such that the respective reflections of the beam at the different positions of the parabolic mirror cause the raster movement of the beam along the raster axis.

19. System according to claim 17 or 18, based on claim 16, wherein the means for coupling is arranged to direct the beam onto the directing element (G) of the means for irradiating, so that the directing element is scanned along the scan axis with the beam.

20. The system of any one of claims 1-19, wherein the system further comprises means (5000) for modulating the power of the beam so that the object can be irradiated with different powers of the beam.

21. The system of claim 20, wherein the means (5000) for modulating is arranged to vary the power of the beam depending on a point of incidence of the beam on the object.

22. The system of any one of claims 1-21, further comprising: a beam unit (6000) for providing the beam to the system. 23- The system of claim 22, wherein the beam unit is configured to provide a first beam and a second beam, the beam unit being configured: in a first beam mode, to provide exclusively the first beam as a beam of the system; in a second beam mode, to provide exclusively the second beam as a beam of the system.

24. The system of claim 23, wherein the beam unit is further configured: in a third beam mode, to superimpose the first beam and the second beam, wherein the superimposition of the first and second beams is provided as a beam of the system.

25. Device comprising: A system according to any one of claims 1-24; and an object of holography.

26. A method for replicating an object (O) for holography comprising: irradiating the object with a beam (S) at a set angle of incidence (ei, e2); Adapting an extension of the beam before the beam strikes the object based at least in part on the set angle of incidence.

27. Using a system according to any one of claims 1-24 for replicating a holographic object.

28. A computer program for carrying out a method according to claim 26 or 27.

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