Cover plate and electronic device

Abstract

The present application relates to the technical field of electronic products, and provides a cover plate and an electronic device. The present application can improve the scratch resistance of the cover plate, while ensuring the appearance yield of the cover plate, and thus can give consideration to both the scratch resistance and the appearance yield of the cover plate The cover plate comprises a substrate and a scratch-resistant film layer, which are arranged in a stacked manner, and the scratch-resistant film layer includes silicon and a doping element, wherein the valence state of the doping element is +3 or +5, and the doping element does not include nitrogen.

Description

Covers and electronics

[0001] This application claims priority to the Chinese patent application filed with the State Intellectual Property Office on December 26, 2023, with application number 202311819284.2 and invention name “Cover and Electronic Device”, the entire contents of which are incorporated by reference into this application. Technical Field

[0002] The present application relates to the technical field of electronic products, and in particular to a cover plate and an electronic device. Background Art

[0003] When used without protective film, electronic devices like mobile phones and tablets typically develop visible scratches on the translucent cover and back cover within a month or so. Furthermore, as electronic devices age, these scratches will become more and more numerous. These scratches disrupt the stress balance of the cover, reducing its impact resistance. Furthermore, these scratches, even those that are less noticeable, can be unsightly and diminish the electronic device's reputation.

[0004] In the related art, the cover plate is usually provided with an anti-scratch film layer to improve the scratch resistance of the cover plate and reduce scratches on the cover plate. However, the cover plate in the related art cannot take into account both the scratch resistance and the appearance yield of the cover plate.

[0005] Summary of the Invention

[0006] The present application provides a cover plate and an electronic device, which can improve the scratch resistance of the cover plate while ensuring the appearance yield of the cover plate, and can take into account both the scratch resistance and appearance yield of the cover plate.

[0007] To achieve the above objectives, the embodiments of the present application adopt the following technical solutions:

[0008] In a first aspect, the present application provides a cover plate, which includes a stacked substrate and an anti-scratch film layer, the anti-scratch film layer including silicon and doping elements, wherein the valence state of the doping element is +3 or +5, and the doping element does not include nitrogen.

[0009] The cover plate in the present application, by providing an anti-scratch film layer including doped elements, can effectively avoid the accumulation of charges on the surface of the silicon target material during the sputtering process of the anti-scratch film layer, which is beneficial to reducing the probability of arc discharge during the sputtering process, and further avoiding the generation of large-particle sputtering materials during the sputtering process, and can effectively reduce the probability of "white spots" forming on the surface of the substrate, thereby improving the appearance yield of the cover plate.

[0010] In one possible implementation of the first aspect, the doping element includes at least one of boron, phosphorus, and aluminum. These elements can form covalent bonds with silicon, effectively reducing the probability of "white spots" forming on the substrate surface during sputtering of the scratch-resistant film. These elements are also low-cost and readily available.

[0011] In a possible implementation of the first aspect, the mass fraction of the doping element in the scratch-resistant film layer is greater than or equal to 0.2%, thereby effectively improving the conductivity of the silicon target material.

[0012] In a possible implementation of the first aspect, the mass fraction of the doping element in the anti-scratch film layer is less than or equal to 3%, thereby preventing the doping element from affecting the optical properties of the cover plate.

[0013] In one possible implementation of the first aspect, the Vickers hardness of the anti-scratch film layer is greater than or equal to 1100 HV. This can improve the wear resistance, corrosion resistance, drop resistance, and scratch resistance of the cover plate, thereby reducing scratches on the cover plate, improving the appearance of the cover plate and the electronic device including the cover plate, and extending the service life of the cover plate and the electronic device.

[0014] In one possible implementation of the first aspect, the scratch-resistant film layer includes a first material and a second material. The refractive index of the first material is greater than or equal to that of the substrate, and the refractive index of the second material is less than or equal to that of the substrate. Thus, after mixing the first and second materials, the refractive index of the scratch-resistant film layer is harmonized, reducing the difference between the refractive index of the scratch-resistant film layer and the refractive index of the substrate. This reduces the difficulty in adjusting the optical performance and color appearance of the cover panel, facilitates thinning the optical adjustment film layer, and further reduces the difference in optical thickness of the optical adjustment film layer at different incident angles. This effectively improves angular color shift and rainbow fringing issues. Therefore, the optical adjustment film layer is suitable not only for 2D cover panels, but also for 3D and 2.5D cover panels.

[0015] In a possible implementation of the first aspect, the substrate is a glass substrate, and the refractive index of the anti-scratch film layer is greater than or equal to 1.46 and less than or equal to 1.85. g It is about 1.52, by changing the refractive index n of the anti-scratch film layer k Setting it to be greater than or equal to 1.46 and less than or equal to 1.85 can reduce the difference between the refractive index of the anti-scratch film layer and the refractive index of the substrate, so that the material of the anti-scratch film layer and the material of the substrate are close to homogeneous, thereby reducing the difficulty of adjusting the optical performance and appearance color of the cover plate, and is conducive to thinning the thickness of the optical adjustment film layer, so that the angle color change problem and the rainbow edge problem can be effectively improved.

[0016] In a possible implementation of the first aspect, the refractive index of the anti-scratch film layer is greater than or equal to 1.65 and less than or equal to 1.85. This can improve the angular color change and rainbow edge problems while ensuring that the anti-scratch film layer has a high Vickers hardness.

[0017] In one possible implementation of the first aspect, the first material includes at least one of silicon nitride, aluminum nitride, niobium oxide, titanium oxide, and tantalum oxide. These materials have excellent optical properties and can meet the refractive index requirements for the first material. In addition, these materials have a high Vickers hardness, which can increase the hardness of the optical adjustment film layer, thereby further improving the scratch resistance of the cover plate.

[0018] In a possible implementation of the first aspect, the second material includes at least one of silicon oxide, magnesium fluoride, and calcium fluoride. These materials have excellent optical properties and can meet the refractive index requirements for the second material.

[0019] In a possible implementation of the first aspect, the first material includes at least one of silicon nitride, aluminum nitride, niobium oxide, titanium oxide, and tantalum oxide, and the second material includes at least one of silicon oxide, magnesium fluoride, and calcium fluoride.

[0020] In one possible implementation of the first aspect, the first material is silicon nitride, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and less than or equal to 80%. This allows the refractive index of the scratch-resistant film to be controlled within a range of 1.49 to 1.85, minimizing the difference between the refractive index of the scratch-resistant film and the substrate, and effectively alleviating angular discoloration and rainbow fringing issues on the cover plate.

[0021] In one possible implementation of the first aspect, the first material is silicon nitride, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and less than or equal to 50%. In this way, the refractive index of the scratch-resistant film layer can be controlled within a range of 1.49 to 1.66, further reducing the difference between the refractive index of the scratch-resistant film layer and the refractive index of the substrate.

[0022] In one possible implementation of the first aspect, the first material is aluminum oxide, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and less than 100%. This allows the refractive index of the scratch-resistant film to be controlled within a range of 1.47 to 1.7, minimizing the difference between the refractive index of the scratch-resistant film and the substrate, and effectively alleviating angular discoloration and rainbow fringing issues on the cover plate.

[0023] In one possible implementation of the first aspect, the first material is aluminum oxide, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 20% and less than 80%. In this way, the refractive index of the scratch-resistant film layer can be controlled within a range of 1.49 to 1.62, further reducing the difference between the refractive index of the scratch-resistant film layer and the refractive index of the substrate.

[0024] In a possible implementation of the first aspect, the thickness of the anti-scratch film layer is greater than or equal to 500 nm, thereby ensuring the anti-scratch function of the anti-scratch film layer.

[0025] In a possible implementation of the first aspect, the thickness of the anti-scratch film layer is less than or equal to 3000 nm. This ensures the anti-scratch function of the anti-scratch film layer, improves the anti-scratch performance of the cover plate, and reduces the overall thickness of the cover plate.

[0026] In one possible implementation of the first aspect, the cover plate includes an upper optical adjustment film layer disposed on a side of the anti-scratch film layer facing away from the substrate. The upper optical adjustment film layer is a single layer, and its refractive index is lower than that of the anti-scratch film layer. By designing the upper optical adjustment film layer as a single-layer system, the structure of the upper optical adjustment film layer can be simplified, the total thickness of the optical adjustment film layer can be reduced, and the difference in optical thickness of the optical adjustment film layer at different incident angles can be reduced, thereby improving angular color shift and rainbow fringing issues. Furthermore, the anti-scratch film layer and the upper optical adjustment film layer can form a composite film layer composed of a high-refractive-index film layer and a low-refractive-index film layer. Light reflected and refracted by the anti-scratch film layer and the upper optical adjustment film layer interfere with each other, thereby enhancing the reflectivity of light in a specific wavelength band within the emitted light, further improving the light transmittance of the cover plate, and achieving the purpose of optimizing the optical performance of the cover plate and adjusting the color of the cover plate.

[0027] In one possible implementation of the first aspect, the upper optical adjustment film layer includes at least one high-refractive-index material and at least one low-refractive-index material, wherein the refractive index of the high-refractive-index material is greater than that of the low-refractive-index material. In this manner, the upper optical adjustment film layer can have a corresponding refractive index by adjusting the mass ratio of the high-refractive-index material to the low-refractive-index material, thereby reducing the difficulty of processing the upper optical adjustment film layer.

[0028] In one possible implementation of the first aspect, the cover plate includes an upper optical adjustment film layer disposed on a side of the anti-scratch film layer facing away from the substrate. The upper optical adjustment film layer includes at least one first high-refractive-index film layer and at least one first low-refractive-index film layer stacked and alternately disposed in sequence, wherein the refractive index of the first high-refractive-index film layer is greater than that of the first low-refractive-index film layer. Another structure of the upper optical adjustment film layer is provided.

[0029] In one possible implementation of the first aspect, the physical thickness of the upper optical adjustment film layer is less than or equal to 300 nm. This can reduce the difference in optical thickness of the upper optical adjustment film layer at different incident angles, thereby improving angular color change and rainbow fringing issues of the cover plate.

[0030] In one possible implementation of the first aspect, a ratio of the physical thickness of the anti-scratch film layer to the physical thickness of the upper optical adjustment film layer is greater than or equal to 10. In this way, the significant difference in thickness between the anti-scratch film layer and the upper optical adjustment film layer allows the anti-scratch film layer and the upper optical adjustment film layer to be considered a single-layer film system, thereby further improving angular color change and rainbow fringing issues on the cover plate.

[0031] In one possible implementation of the first aspect, the refractive index of the upper optical adjustment film layer is greater than or equal to 1.55 and less than or equal to 1.65. This helps reduce variations in the optical thickness of the upper optical adjustment film layer at different incident angles, thereby improving angular color shift and rainbow fringing issues on the cover plate.

[0032] In one possible implementation of the first aspect, the cover plate includes a lower optical adjustment film layer, disposed on a side of the anti-scratch film layer facing the substrate. For example, the lower optical adjustment film layer can be disposed on a surface of the anti-scratch film layer facing the substrate. This can further improve the optical performance of the cover plate.

[0033] In a possible implementation of the first aspect, the lower optical adjustment film layer is a single layer, and the refractive index of the lower optical adjustment film layer is lower than the refractive index of the anti-scratch upper film layer. A specific structure of the lower optical adjustment film layer is provided.

[0034] In one possible implementation of the first aspect, the refractive index of the lower optical adjustment film layer is greater than or equal to 1.55 and less than or equal to 1.65. This helps reduce variations in the optical thickness of the lower optical adjustment film layer at different incident angles, improving the angular color shift and rainbow fringing issues of the cover plate. Furthermore, these materials are readily available, reducing the difficulty of manufacturing the cover plate.

[0035] In one possible implementation of the first aspect, the cover plate includes a hard, smooth layer disposed on the side of the scratch-resistant film layer facing away from the substrate. The hard, smooth layer can reduce the coefficient of kinetic friction on the cover plate surface, thereby reducing shear forces on the cover plate surface during friction. This prevents damage to the film layers of the cover plate when a user touches the cover plate. Furthermore, the cover plate provides a smooth, tactile feel, enhancing the user experience.

[0036] In one possible implementation of the first aspect, the hard and slippery layer includes one or more carbon materials containing SP2 bonds. These materials have high hardness and meet the requirements for the hard and slippery layer's dynamic friction coefficient, thereby reducing friction on the cover plate surface while further improving the cover plate's wear resistance and scratch resistance.

[0037] In one possible implementation of the first aspect, the coefficient of kinetic friction of the hard and smooth layer is less than or equal to 0.05. This prevents damage to the film layers of the cover plate when a user touches the cover plate, while also providing a smooth touch experience to the user, thereby enhancing the user experience.

[0038] In a possible implementation of the first aspect, the dynamic friction coefficient of the hard slippery layer may be greater than or equal to 0.01. This makes it easier to obtain the material for the hard slippery layer and reduces the difficulty of processing the hard slippery layer.

[0039] In a possible implementation of the first aspect, the physical thickness of the hard and smooth layer is less than or equal to 50 nm. In this way, the optical performance of the cover plate can be guaranteed while reducing the friction on the surface of the cover plate.

[0040] In a possible implementation of the first aspect, the cover plate further includes an anti-fingerprint layer, which is disposed on a side of the anti-scratch film layer facing away from the substrate, so that the exterior surface of the cover plate can have anti-fingerprint properties.

[0041] In a possible implementation of the first aspect, the anti-fingerprint layer is made of at least one of polytetrafluoroethylene and chlorofluanilide. These materials have hydrophobic and oleophobic properties, making the surface of the cover easy to clean and having excellent fingerprint resistance.

[0042] In one possible implementation of the first aspect, the cover plate includes a primer layer laminated on the surface of the substrate facing the scratch-resistant film layer; the primer layer is made of at least one of aluminum, chromium, titanium, silicon, and silicon oxide. The primer layer is used to increase adhesion between the film layer closest to the first surface of the substrate and the substrate, effectively preventing the film layer from falling off the substrate. Furthermore, the primer layer provides a cutoff interface for stripping defective film layers, preventing the stripping solution from damaging the substrate.

[0043] In one possible implementation of the first aspect, according to the International Commission on Illumination, under an incident angle of 60 degrees, the a and b values ​​of the reflected color of the cover plate in the Lab color space satisfy the following conditions: the a value is greater than or equal to -2 and less than or equal to 2, and the b value is greater than or equal to -2 and less than or equal to 2. In this way, the cover plate has a good appearance and color, and can be coated on 2.5D cover plates 50 and 3D cover plates. Furthermore, even if the curved surface of the edge of the cover plate reaches 90°, angular color change and rainbow fringing will not occur.

[0044] In a possible implementation of the first aspect, the cover plate has a Mohs hardness under a force of 500g greater than 7. Thus, the cover plate has high hardness and good wear and scratch resistance, which helps reduce scratches on the cover plate and extend the service life of the cover plate.

[0045] In a possible implementation manner of the first aspect, the substrate is a 2.5D substrate or a 3D substrate.

[0046] In the second aspect, the present application provides an electronic device, including a frame, a screen and a back cover, the screen including a stacked light-transmitting cover and a display screen, the light-transmitting cover being fixedly connected to the frame; the back cover is arranged on the side of the frame away from the light-transmitting cover; at least one of the back cover and the light-transmitting cover is a cover in any of the above-mentioned technical solutions.

[0047] Among them, the technical effects brought about by any design method in the second aspect can refer to the technical effects brought about by different design methods in the first aspect, and will not be repeated here. BRIEF DESCRIPTION OF THE DRAWINGS

[0048] FIG1 is a schematic diagram of the structure of an electronic device provided in some embodiments of the present application;

[0049] FIG2 is a cross-sectional view of the electronic device shown in FIG1 taken along line AA;

[0050] FIG3 is a side view of cover plates of different shapes;

[0051] FIG4 is a schematic diagram of a cross-sectional structure of a cover plate in the related art;

[0052] FIG5 is a schematic diagram showing changes in the spectrum of the cover plate shown in FIG4 at different incident angles;

[0053] FIG6 is a schematic diagram of a cross-sectional structure of another cover plate in the related art;

[0054] FIG7 is a partial cross-sectional view of a cover plate provided in some embodiments of the present application;

[0055] FIG8 is a partial cross-sectional view of a cover plate provided in some other embodiments of the present application;

[0056] FIG9 is a partial cross-sectional view of a cover plate provided in some other embodiments of the present application;

[0057] FIG10 is a partial cross-sectional view of a cover plate provided in some other embodiments of the present application;

[0058] FIG11 is a partial cross-sectional view of a cover plate provided in some other embodiments of the present application;

[0059] FIG12 is a flow chart of a method for processing a cover plate according to some embodiments of the present application;

[0060] FIG13 is a flow chart of a method for processing a cover plate provided in other embodiments of the present application;

[0061] FIG14 is a flow chart of a method for processing a cover plate according to yet other embodiments of the present application;

[0062] FIG15 is a flow chart of a method for processing the cover plate shown in FIG10 ;

[0063] FIG. 16 is a flow chart of a method for processing the cover plate shown in FIG. 11 .

[0064] Reference numerals:

[0065] 100, electronic device; 10, screen 10; 11, transparent cover; 12, display; 20, housing; 21, back cover; 22, frame; 23, middle plate; 30, circuit board; 31, main circuit board; 32, auxiliary circuit board; 40, battery; 50, cover; 501, middle portion; 502, edge portion; 50a, pit; 51, substrate; 511, first surface; 512, second surface; 52, coating layer; 52 1. Optical adjustment film layer; 5211. Upper optical adjustment film layer; 5211a. First high refractive index film layer; 5211b. Second low refractive index film layer; 5212. Lower optical adjustment film layer; 5212a. Second high refractive index film layer; 5212b. Second low refractive index film layer; 522. Anti-scratch film layer; 523. Base layer; 524. Anti-fingerprint layer; 525. Transition layer; 526. Hard and smooth layer; 53. Diamond-like carbon film layer. DETAILED DESCRIPTION

[0066] The technical solutions in the embodiments of the present application will be described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments.

[0067] In the embodiments of this application, the terms "exemplary" or "for example" are used to indicate an example, illustration, or description. Any embodiment or design described as "exemplary" or "for example" in the embodiments of this application should not be interpreted as being more preferred or advantageous over other embodiments or designs. Rather, the use of words such as "exemplary" or "for example" is intended to present the relevant concepts in a concrete manner.

[0068] In the embodiments of this application, the terms "first" and "second" are used for descriptive purposes only and should not be understood to indicate or imply relative importance or implicitly specify the number of technical features indicated. Therefore, features defined as "first" or "second" may explicitly or implicitly include one or more of the features.

[0069] In the description of the embodiments of this application, "and / or" is simply a description of the association relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent three situations: A exists alone, A and B exist simultaneously, and B exists alone. In addition, the character " / " in this application generally indicates that the related objects are in an "or" relationship.

[0070] In the embodiments of the present application, directional terms such as "inside", "outside", "upper" and "lower" may be defined including but not limited to the orientation relative to the components in the drawings. It should be understood that these directional terms may be relative concepts. They are used for relative description and clarification, and may change accordingly according to changes in the orientation of the components in the drawings.

[0071] In the description of the embodiments of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, "connected" can mean detachably connected or non-detachably connected; directly connected or indirectly connected through an intermediary. "Fixedly connected" means connected so that the relative positional relationship remains unchanged after connection.

[0072] In the description of the embodiments of the present application, the terms "directionally consistent", "perpendicular", "parallel", and "equal" include the situations described and situations similar to the situations described, and the range of the similar situations is within an acceptable deviation range, wherein the acceptable deviation range is as determined by a person of ordinary skill in the art taking into account the measurement being discussed and the errors associated with the measurement of a specific quantity (i.e., the limitations of the measurement system). For example, "parallel" includes absolute parallelism and approximate parallelism, wherein the acceptable deviation range of approximate parallelism can be, for example, a deviation within 5°, 8°, or 10°; "perpendicular" includes absolute perpendicularity and approximate perpendicularity, wherein the acceptable deviation range of approximate perpendicularity can also be, for example, a deviation within 5°, 8°, or 10°. "Equal" includes absolute equality and approximate equality, wherein the acceptable deviation range of approximate equality can be, for example, that the difference between the two equals is less than or equal to 5%, 8%, or 10% of either one.

[0073] For ease of understanding, before introducing the cover plate and the electronic device in the embodiments of the present application in detail, the relevant terms involved in the embodiments of the present application are first explained.

[0074] Physical thickness of the film layer: It is the actual thickness of the film layer, also known as "geometric thickness".

[0075] Optical thickness of the film: refers to the product of the refractive index of the film and the physical thickness of the film.

[0076] Physical vapor deposition (PVD): PVD is a process that uses physical methods under vacuum conditions to vaporize a material source (solid or liquid) into gaseous atoms or molecules, or partially ionize them into ions. Through this process, a thin film with specialized properties is deposited on the surface of a substrate. PVD techniques include vacuum evaporation and magnetron sputtering.

[0077] Sputtering is a PVD thin film deposition technique that is categorized into four main types: DC sputtering, AC sputtering, reactive sputtering, and magnetron sputtering. The principle of sputtering is that charged particles bombard a target material. When the accelerated ions strike a solid surface, surface atoms collide and transfer energy and momentum, causing target atoms to escape from the surface and deposit on the substrate.

[0078] The (L*, a*, b*) colorimetric system, also known as the Lab color space (also known as the CIELab color space), is a method of representing color. The Lab color space is a color model established by the International Commission on Illumination (also known as the CIE organization) that theoretically includes all colors visible to the human eye. The (L*, a*, b*) colorimetric system includes three elements: L value, a value, and b value. The L value represents brightness, ranging from pure black to pure white; the a value represents the range from red to green, ranging from [127 to -128]; and the b value represents the range from yellow to blue, ranging from [127 to -128]. All colors are composed of the interactive changes of these three values.

[0079] The L value, a value, and b value in the (L*, a*, b*) colorimetric system can be measured using a colorimeter, for example, a CM3600 colorimeter.

[0080] Covalent bonds: A strong interaction between adjacent atoms through shared electrons is called a covalent bond. Its essence is the electrical interaction between electrons that appear with high probability between two nuclei after atomic orbitals overlap.

[0081] An embodiment of the present application provides an electronic device including a cover plate, which can be used as a light-transmitting cover plate, back cover, or the like for the electronic device. The electronic device in the embodiment of the present application, by providing a scratch-resistant film layer on the substrate of the cover plate and providing a dopant element capable of forming a covalent bond with silicon in the scratch-resistant film layer, can reduce the rate of appearance defects generated during the coating process, thereby improving the scratch resistance of the cover plate while enhancing the aesthetic appearance of the electronic device.

[0082] The present application provides an electronic device, including but not limited to a mobile phone, a tablet computer, a notebook computer, a laptop computer, a personal digital assistant (PDA), a personal computer, a vehicle-mounted device, a wearable device, a walkman, a radio, a television, a speaker, etc. The wearable device includes but is not limited to a wristband, a watch, a smart head-mounted display, smart clothing, smart glasses, and smart headphones.

[0083] Please refer to Figures 1 and 2. Figure 1 is a schematic diagram of the structure of an electronic device 100 provided in some embodiments of the present application, and Figure 2 is a cross-sectional view of the electronic device 100 shown in Figure 1 taken along line AA. In this embodiment, the electronic device 100 is a candy-bar phone. Specifically, the electronic device 100 includes a screen 10, a housing 20, a circuit board 30, and a battery 40. Because the circuit board 30 and battery 40 are located inside the electronic device 100 and are not visible, they are represented by dashed lines in Figure 1.

[0084] It should be understood that Figures 1 and 2 and the following related figures only schematically illustrate some components of the electronic device 100, and the actual shape, size, position, and structure of these components are not limited by Figures 1 and 2 and the following figures. In some other embodiments, the electronic device 100 may not include the screen 10.

[0085] In the embodiment shown in FIG1 , the electronic device 100 is in the shape of a rectangular flat plate. To facilitate the description of the embodiments below, an XYZ coordinate system is established. Specifically, the width direction of the electronic device 100 is defined as the X-axis direction, the length direction of the electronic device 100 is defined as the Y-axis direction, and the thickness direction of the electronic device 100 is defined as the Z-axis direction. It is understood that the coordinate system setting of the electronic device 100 can be flexibly set according to actual needs and is not specifically limited here. In some other embodiments, the shape of the electronic device 100 can also be a square flat plate, a circular flat plate, an elliptical flat plate, etc.

[0086] The screen 10 is used to display images, videos, etc. Referring to FIG. 2 , the screen 10 may include a translucent cover plate 11 and a display screen 12. The display screen 12 may be a flexible display screen or a rigid display screen. The translucent cover plate 11 and the display screen 12 are stacked and fixedly connected. Specifically, the translucent cover plate 11 and the display screen 12 are stacked in the Z-axis direction. The translucent cover plate 11 is mainly used to protect the display screen 12 and prevent dust. The translucent cover plate 11 may be a 2D cover plate, a 2.5D cover plate, or a 3D cover plate.

[0087] Please refer to Figure 3, which is a side view of cover plates 50 of different shapes. Among them, (a) in Figure 3 is a side view of a 2D cover plate, (b) in Figure 3 is a side view of a 2.5D cover plate, and (c) in Figure 3 is a side view of a 3D cover plate. Specifically, as shown in (a) in Figure 3, the 2D cover plate is an ordinary pure flat plate without any curved design. As shown in (b) in Figure 3, the middle part of the 2.5D cover plate is a flat plate, but the edge has a certain curved design. Compared with the 2D cover plate, the 2.5D cover plate has curved edges based on the flat cover plate. As shown in (c) in Figure 3, the 3D cover plate adopts a curved design in both the middle and edge parts of the cover plate. The curved surface design in the 3D cover plate can increase the visible area, which is more in line with the curvature of the human eye's retina, bringing a better visual experience.

[0088] The housing 20 protects the internal electronic components of the electronic device 100. Referring to Figure 2 , the housing 20 includes a back cover 21 and a frame 22. The frame 22 is located between the back cover 21 and the transparent cover 11, and both the back cover 21 and the transparent cover 11 are fixed to the frame 22. The transparent cover 11, back cover 21, and frame 22 enclose the internal storage space of the electronic device 100. The back cover 21 can be a 2D cover, a 2.5D cover, or a 3D cover.

[0089] In some embodiments, as shown in FIG2 , the housing 20 further includes a mid-plate 23 . The mid-plate 23 is fixed to the inner surface of the frame 22 . The mid-plate 23 serves as the structural "support frame" of the electronic device 100 , and components such as the circuit board 30 and the battery 40 can be fixed to the mid-plate 23 .

[0090] Referring to Figure 1 , the circuit board 30 may include a main circuit board 31 and a secondary circuit board 32. The main circuit board 31 may be used to integrate a control chip. The control chip may include, for example, an application processor (AP), double data rate synchronous dynamic random access memory (DDR), and universal flash storage (UFS). In some embodiments, the main circuit board 31 is electrically connected to the screen 10.

[0091] The secondary circuit board 32 can be used to integrate electronic components such as the RF front end of an antenna (such as a 5G antenna), a universal serial bus (USB) device, and a vibrator. The secondary circuit board 32 is electrically connected to the primary circuit board 31. It is understood that in other embodiments, the circuit board 30 may include only the primary circuit board 31.

[0092] The battery 40 is used to provide power to electronic components such as the display screen 12 and the circuit board 30 in the electronic device 100. In some embodiments, the battery 40 may be disposed between the main circuit board 31 and the auxiliary circuit board 32.

[0093] When the electronic device 100 is used without a protective film, visible scratches will generally appear on the cover plates such as the transparent cover plate 11 and the back cover 21 after about a month of use. Moreover, as the use time of the electronic device 100 increases, the scratches on the cover plates will increase. The presence of these scratches will destroy the stress balance of the cover plate, resulting in a decrease in the impact resistance of the cover plate. At the same time, these scratches, even those that are not so obvious, will be unsightly and reduce the reputation of the electronic device 100. In addition, since scratches will increase the scattering of light, when scratches appear on the transparent cover plate 11, it will also cause the brightness, clarity and contrast of the image displayed on the screen 10 to be significantly reduced, affecting the display effect of the screen 10.

[0094] In order to improve the scratch resistance of the cover plate, please refer to Figure 4, which is a schematic diagram of the cross-sectional structure of a cover plate 50 in the related art. The cover plate 50 includes a substrate 51 and a coating layer 52. Specifically, the substrate 51 includes a middle portion 501 and an edge portion 502. The edge portion 502 is arc-shaped. That is, the cover plate 50 is a 3D cover plate or a 2.5D cover plate. The coating layer 52 is arranged on the outer surface of the substrate 51. The "outer surface of the substrate 51" refers to the surface of the substrate 51 facing the outside of the electronic device 100.

[0095] The coating layer 52 includes an anti-scratch layer 522 and an optical adjustment layer 521. The optical adjustment layer 521 includes an upper optical adjustment layer 5211 and a lower optical adjustment layer 5212. The lower optical adjustment layer 5212 is disposed on the surface of the anti-scratch layer 522 that is closest to the substrate 51, while the upper optical adjustment layer 5211 is disposed on the surface of the anti-scratch layer 522 that is away from the substrate 51. Both the upper optical adjustment layer 5211 and the lower optical adjustment layer 5212 include at least one high-refractive index layer and at least one low-refractive index layer stacked and alternating in sequence. The refractive index of the high-refractive index layer is greater than that of the low-refractive index layer. This allows light in a specific wavelength range to be reflected and refracted by the upper and lower optical adjustment layers 5211 and 5212, where it is enhanced or weakened by the interference of light. This reduces the reflectivity of the cover plate 50 to visible light, thereby adjusting the optical performance of the cover plate 50.

[0096] The anti-scratch film layer 522 is made of a high-hardness, high-refractive-index material and is the main film layer for improving the scratch resistance of the cover plate 50. To ensure the scratch resistance of the cover plate 50, the thickness of the anti-scratch film layer 522 is generally greater than or equal to 500 nm.

[0097] The coating layer 52 has strong scratch resistance and can significantly improve the scratch resistance of the cover plate 50. Therefore, the cover plate 50 (such as a glass cover plate) including the coating layer 52 can meet the requirements of an external cover plate 50. At the same time, the coating layer 52 can reduce the reflectivity of the substrate 51, increase the transmittance of the cover plate 50, and improve the optical performance of the cover plate 50. For example, when the substrate 51 is glass, the reflectivity of glass is about 8.4% and the transmittance is about 92%. After the above-mentioned coating layer 52 is set on a single side of the substrate 51 (that is, single-sided coating), the reflectivity of the cover plate 50 can reach less than or equal to 5.2%, and the transmittance can reach greater than or equal to 95%. After the above-mentioned coating layer 52 is set on both sides of the substrate 51 (that is, double-sided coating), the reflectivity of the cover plate 50 can reach less than or equal to 1%, and the transmittance can reach greater than or equal to 98%.

[0098] However, the scratch-resistant film layer 522 is typically formed using a sputtering process. Sputtering is a process in which charged particles bombard a target material, causing target atoms to escape from the surface and deposit on the substrate material. The target material has poor electrical conductivity, which can cause charge to accumulate on the target surface. When the charge accumulates to a certain amount, it is released at the point where the surface resistance of the target material is lowest, causing an arc discharge phenomenon (also known as a "flash target"). At the same time, large particles of sputtered material are generated and sputtered onto the surface of the substrate 51. These large particles of sputtered material are easily dislodged during the subsequent cleaning process, forming pits 50a (commonly known as white spots) on the surface of the cover plate 50, resulting in appearance defects.

[0099] Specifically, when the anti-scratch film layer 522 is deposited to a certain thickness, the charge accumulated on the target surface may be released, resulting in "target flashing", causing the cover plate 50 to have appearance defects. In addition, the probability of appearance defects during the coating process will increase linearly with the increase in the thickness of the film layer, resulting in an increase in the appearance defect rate of the cover plate 50, causing the product yield to decrease. In other words, the greater the thickness of the anti-scratch film layer 522, the greater the probability of appearance defects of the cover plate 50 caused by "target flashing". For example, when the cover plate 50 does not include the anti-scratch film layer 522, the appearance yield of the cover plate 50 can reach more than 95%. The cover plate 50 includes the anti-scratch film layer 522, and when the thickness of the anti-scratch film layer 522 reaches more than 500nm, the appearance yield of the cover plate 50 will drop to below 60%.

[0100] Furthermore, since the scratch-resistant material in the anti-scratch film layer 522 is typically a high-hardness material, and high-hardness materials generally have a high refractive index, potentially exceeding 1.9, the thickness of the optical adjustment film layer 521 must be sufficient to adjust the cover plate 50's exterior color to the target color. For example, the target color could be colorless, where the corresponding a value is 0 and the b value is 0 in the (L*, a*, b*) colorimetric system.

[0101] Thus, at different observation angles, the optical thickness of the optical adjustment film layer 521 through which the light passes is different, that is, the optical path of the light is different. Then, the optical adjustment film layer 521 absorbs light differently, and the wavelength of the reflected light is also different. Therefore, at different observation angles, the cover plate 50 will appear different colors, causing the problem of angle discoloration. The essence of the angle discoloration problem is that the change of the incident angle (also called the observation angle) affects the optical thickness of the film layer, and the impact on the optical thickness of the film layer causes the wavelength to drift. This effect is particularly prominent when the film layer is thicker. In particular, when the cover plate 50 is used as a translucent cover plate 11, the light of the display screen 12 needs to be emitted outward through the translucent cover plate 11. The angle discoloration problem will also affect the display effect of the screen 10. Among them, the incident angle is the angle between the incident light and the normal of the cover plate 50.

[0102] Please refer to Figure 5, which illustrates the spectrum of cover plate 50 shown in Figure 4 at different incident angles. The abscissa in Figure 5 represents the wavelength of light (in nm). The ordinate represents the reflectivity (in %). Curve L1 in Figure 5 represents the spectrum of cover plate 50 at an incident angle of 0 degrees, Curve L2 represents the spectrum of cover plate 50 at an incident angle of 35 degrees, and Curve L3 represents the spectrum of cover plate 50 at an incident angle of 70 degrees.

[0103] As can be seen from FIG. 5 , the larger the incident angle of the cover plate 50 is, the greater the reflectivity of the cover plate 50 to light is, and the more obvious the angular discoloration problem is.

[0104] In addition, the optical adjustment film layer 521 is usually formed using processes such as physical vapor deposition, chemical vapor deposition, and atomic deposition. When the cover plate 50 is a 3D cover plate or a 2.5D cover plate, please refer to Figure 4. The thickness d2 of the coating layer 52 at the edge portion 502 of the substrate 51 is less than the thickness d1 of the coating layer 52 at the middle portion 501 of the substrate 51. Therefore, after coating, a rainbow edge is easily generated at the junction of the middle portion 501 and the edge portion 502 of the cover plate 50, affecting the appearance of the cover plate 50 and the display effect of the screen 10.

[0105] Please refer to Figure 6, which is a schematic cross-sectional view of another cover plate 50 in the related art. The cover plate 50 includes a substrate 51 and a diamond-like carbon (DLC) film layer 53. The DLC film layer 53 is disposed on the surface of the substrate 51.

[0106] The diamond-like carbon film layer 53 has a high hardness, reaching a Mohs hardness of 10, which improves the overall hardness of the cover panel 50. Furthermore, the diamond-like carbon film layer 53 has a low coefficient of dynamic friction, typically less than 0.05, providing a smooth touch when touching the cover panel 50, thereby enhancing the user experience. Furthermore, the diamond-like carbon film layer 53 is physically thin, preventing cosmetic defects during processing. Furthermore, coating on 2.5D and 3D cover panels prevents angular discoloration and rainbow fringing.

[0107] However, because the diamond-like carbon film 53 contains black graphite molecules that strongly absorb light, the film thickness cannot be too large, otherwise the optical performance of the cover plate 50 will be affected. Specifically, after a diamond-like carbon film 53 with a thickness of less than 15 nm is applied to the glass substrate, the light transmittance of the cover plate 50 will drop to 90%. Moreover, since the diamond-like carbon film 53 is relatively thin in this case, it is easily punctured, and the improvement in the scratch resistance of the cover plate 50 is not significant.

[0108] Therefore, the cover plate 50 in the related art cannot achieve both scratch resistance and appearance yield. On this basis, in order to improve the scratch resistance of the cover plate 50 while improving the appearance yield of the cover plate 50, please refer to Figure 7, which is a partial cross-sectional view of the cover plate 50 provided in some embodiments of the present application. The cover plate 50 in this embodiment can be used as the light-transmitting cover plate 11 of the electronic device 100, or as the back cover 21 of the electronic device 100. In the following embodiments, the cover plate 50 is used as the light-transmitting cover plate 11 of the electronic device 100 as an example.

[0109] Referring to Figure 7 , the cover plate 50 includes a substrate 51, an optical adjustment film layer 521, and an anti-scratch film layer 522. The substrate 51 includes a first surface 511 and a second surface 512 that face each other in the thickness direction (i.e., the Z-axis direction shown in Figure 7 ). The first surface 511 may be the outer surface of the substrate 51, and the second surface 512 may be the inner surface of the substrate 51. In other words, the first surface 511 may face the exterior of the electronic device 100, while the second surface 512 may face the interior of the electronic device 100.

[0110] In some embodiments, substrate 51 is a glass substrate. For example, substrate 51 may be an inorganic glass substrate such as a glass-ceramic substrate, a soda-lime glass substrate, or an aluminosilicate glass substrate. In other embodiments, substrate 51 may be an organic substrate such as a polymethyl methacrylate (PMMA) substrate or a polycarbonate (PC) substrate. In still other embodiments, substrate 51 may be a ceramic substrate.

[0111] The anti-scratch film layer 522 is stacked with the substrate 51. For example, the anti-scratch film layer 522 can be provided on the first surface 511 of the substrate 51. Specifically, the anti-scratch film layer 522 can be formed directly on the first surface 511 of the substrate 51, or it can be formed on the surface of another film layer located on the first surface 511 of the substrate 51. The anti-scratch film layer 522 includes silicon (Si) and doping elements, the doping elements can form covalent bonds with silicon, and the doping elements do not include nitrogen (N). It is understood that the anti-scratch film layer 522 may include nitrogen or may not include nitrogen. When the anti-scratch film layer 522 includes nitrogen, it is not considered as a doping element.

[0112] The doping element includes at least one +3 valence element and / or at least one +5 valence element, and the doping element does not include nitrogen. Specifically, the doping element may include at least one element of the 13th group in the periodic table and / or at least one element of the 15th group in the periodic table, and the doping element does not include nitrogen. Exemplary, the doping element may include at least one element of boron (B), aluminum (Al), gallium (Ga), indium (In), thallium (Tl), phosphorus (P), arsenic (As), antimony (Sb), and tellurium (Te). The doping element may include one element or multiple elements.

[0113] Doping elements form covalent bonds with silicon. Since silicon has four electrons in its outer shell, and +3-valent elements have three, a +3-valent element creates a hole when it forms a covalent bond with silicon. +5-valent elements have five electrons in their outer shell, creating a free electron when they form a covalent bond with silicon. Both holes and free electrons improve the conductivity of a material.

[0114] In this way, when processing the scratch-resistant film layer 522, the aforementioned doping elements can be added to the silicon target to improve the conductivity of the silicon target. This effectively prevents the accumulation of charge on the surface of the silicon target during the sputtering process of the scratch-resistant film layer 522, thereby reducing the probability of arc discharge during the sputtering process. This further prevents the generation of large-particle sputtering particles during the sputtering process, effectively reduces the probability of "white spots" forming on the surface of the cover plate 50, and improves the appearance yield of the cover plate 50. Therefore, the cover plate 50 in the embodiment of the present application, by providing the scratch-resistant film layer 522 including silicon and doping elements, can effectively prevent the formation of "white spots" on the surface of the cover plate 50, thereby improving the appearance yield of the cover plate 50.

[0115] In some embodiments, the mass fraction w1 of the doping element in the anti-scratch film layer 522 is greater than or equal to 0.2%. The mass fraction w1 of the doping element refers to the ratio of the mass m1 of the doping element to the total mass m of the anti-scratch film layer 522. The mass fraction of the doping element can be measured using an energy dispersive spectrometer (EDS).

[0116] For example, the mass fraction w1 of the doping element can be 0.2%, 0.25%, 0.3%, 0.35%, 0.4%, 0.45%, 0.5%, 0.6%, 0.7%, 0.8%, 0.9%, 1.0%, 1.2%, 1.5%, 1.8%, 2.0%, 2.1%, 2.2%, 2.3%, 2.5%, 2.8%, 3.0%, 3.5%, 4%, etc. In this way, the conductive performance of the silicon target can be effectively improved.

[0117] On this basis, in order to prevent the doping elements from affecting the optical properties of the cover plate 50 , the mass fraction w1 of the doping elements in the anti-scratch film layer 522 is less than or equal to 3%.

[0118] In some embodiments, the physical thickness t1 of the anti-scratch film layer 522 is greater than or equal to 500 nm and less than or equal to 3000 nm. For example, the physical thickness t1 of the anti-scratch film layer 522 can be 500 nm, 600 nm, 700 nm, 800 nm, 900 nm, 1000 nm, 1100 nm, 1200 nm, 1300 nm, 1400 nm, 1500 nm, 1600 nm, 1700 nm, 1750 nm, 1800 nm, 1850 nm, 1900 nm, 1950 nm, 2000 nm, 2100 nm, 2200 nm, 2300 nm, 2400 nm, 2500 nm, 2600 nm, 2700 nm, 2800 nm, 2900 nm, 3000 nm, etc. In this way, the anti-scratch function of the anti-scratch film layer 522 can be ensured, and the overall thickness of the cover plate 50 can be reduced.

[0119] It should be noted that the “physical thickness of the film layer” described in the embodiment of the present application refers to the distance between the surface of the film layer facing away from the substrate 51 and the surface of the film layer facing the substrate 51 .

[0120] In some embodiments, the Vickers hardness (HV) of the anti-scratch film layer 522 is greater than or equal to 1100 HV. Specifically, when a hardness test is performed on the cover plate 50 including the anti-scratch film layer 522 using a Vickers indenter, when the indentation depth on the surface of the cover plate 50 is approximately 100 nanometers (nm), the measured Vickers hardness is greater than or equal to 1100 HV. Exemplary, the Vickers hardness of the anti-scratch film layer 522 can be 1100 HV, 1200 HV, 1300 HV, 1400 HV, 1500 HV, 1600 HV, 1700 HV, 1800 HV, 1900 HV, 2000 HV, 2200 HV, 2500 HV, 3000 HV, etc. In this way, the wear resistance, corrosion resistance, drop resistance and scratch resistance of the cover plate 50 can be improved, which is conducive to reducing scratches on the cover plate 50, improving the appearance of the cover plate 50 and the electronic device 100 including the cover plate 50, and extending the service life of the cover plate 50 and the electronic device 100.

[0121] Based on any of the above embodiments, to address the angular discoloration and rainbow fringing issues of the cover plate 50, in some embodiments, the anti-scratch film layer 522 includes a first material and a second material. That is, the anti-scratch film layer 522 is a mixture of multiple materials. The first and second materials can be mixed at the atomic level. The refractive index of the first material is greater than or equal to that of the substrate 51, while the refractive index of the second material is less than or equal to that of the substrate 51. This mixing of the first and second materials harmonizes the refractive index of the anti-scratch film layer 522, reducing the difference between the refractive index of the anti-scratch film layer 522 and the refractive index of the substrate 51. This reduces the difficulty in adjusting the optical performance and color of the cover plate 50, facilitates thinning the optical adjustment film layer 521, and further reduces the difference in optical thickness of the optical adjustment film layer 521 at different incident angles. This effectively alleviates the angular discoloration and rainbow fringing issues, making the optical adjustment film layer 521 suitable not only for 2D cover plates, but also for 3D and 2.5D cover plates.

[0122] Specifically, the Vickers hardness of the first material can be greater than or equal to 1100 HV. For example, the Vickers hardness of the first material can be 1100 HV, 1200 HV, 1300 HV, 1400 HV, 1500 HV, 1600 HV, 1700 HV, 1800 HV, 1900 HV, 2000 HV, 2200 HV, 2500 HV, 3000 HV, etc. In this way, the Vickers hardness of the anti-scratch film layer 522 can be increased, thereby improving the wear resistance, corrosion resistance, drop resistance, and scratch resistance of the cover plate 50.

[0123] In some embodiments, the substrate 51 is a glass substrate, and the refractive index n of the anti-scratch film layer 522 is kGreater than or equal to 1.46 and less than or equal to 1.85. k The refractive index n of the glass substrate can be 1.46, 1.5, 1.52, 1.58, 1.6, 1.62, 1.65, 1.7, 1.72, 1.75, 1.78, 1.8, or 1.85. g is about 1.52, by adjusting the refractive index n of the anti-scratch film layer 522 to k Setting it to be greater than or equal to 1.46 and less than or equal to 1.85 can reduce the refractive index n of the anti-scratch film layer 522 k The refractive index n of the substrate 51 g The difference between them makes the material of the anti-scratch film layer 522 and the material of the substrate 51 almost homogeneous, thereby reducing the difficulty of adjusting the optical performance and appearance color of the cover plate 50, and is conducive to thinning the thickness of the optical adjustment film layer 521, so that the angle color change problem and the rainbow edge problem can be effectively improved.

[0124] Furthermore, the refractive index n of the anti-scratch film layer 522 is k In this way, the angular discoloration problem and the rainbow edge problem can be improved while ensuring that the anti-scratch film layer 522 has a greater Vickers hardness.

[0125] In some embodiments, the first material may include at least one of silicon nitride (Si3N4), aluminum nitride (AlN), niobium oxide (Nb2O5), titanium oxide (TiO2), tantalum oxide (Ta2O5), and aluminum oxide (Al2O3). The second material may include at least one of silicon oxide (SiO2), magnesium fluoride (MgF2), and calcium fluoride (CaF2). These materials have excellent optical properties and can meet the refractive index requirements for the first and second materials. Furthermore, these materials have a high Vickers hardness, which can increase the hardness of the optical adjustment film layer 521, thereby further improving the scratch resistance of the cover plate 50.

[0126] According to the Lorentz-Lorentz dispersion theory formula of the refractive index and component ratio of the multi-material mixture of the film, the refractive index n of the anti-scratch film layer 522 after the multi-material mixture is k Satisfy the following formula (1):

[0127] Wherein, N is the number of types of materials in the anti-scratch film layer 522. Specifically, N is the sum of the number of types of materials in the first material and the number of types of materials in the second material; i =(n i 2 +2) -1 ,ρ i is the density of the i-th material, C iis the mass fraction of the i-th material, n i is the refractive index of the i-th material. According to the mass ratio of different materials in the mixture, the refractive index n of the anti-scratch film layer 522 can be calculated. k .

[0128] Exemplarily, when the first material includes one material and the second material includes one material, the mass fraction of the first material is c H , the density of the first material is ρ H , the refractive index of the first material is n H ; The mass fraction of the second material is c L , the density of the second material is ρ L , the refractive index of the second material is n L The mass fraction of the first material c H The mass fraction of the second material c L The sum is 1, so c L =1-c H . L =1-c H Substituting into the above formula (1), formula (1) can be simplified to the following formula (2):

[0129] For example, in some embodiments, the first material is silicon nitride (Si3N4) and the second material is silicon oxide (SiO2). The substance formed by the atomic mixing of the first material and the second material can be called silicon oxynitride (SiO x N y ), and the refractive index n of the anti-scratch film layer 522 can be adjusted by adjusting the mass ratio of silicon nitride and silicon oxide k . Wherein, x and y are both positive numbers. For example, in some other embodiments, the first material is aluminum oxide (Al2O3) and the second material is silicon oxide (SiO2). The substance formed by the atomic-level mixing of the first material and the second material can be called aluminum oxynitride (AlO m N n ), and the refractive index n of the anti-scratch film layer 522 can be adjusted by adjusting the mass ratio of aluminum oxide and silicon oxide k . Wherein, m and n are both positive numbers.

[0130] Specifically, when the first material is silicon nitride (Si3N4) and the second material is silicon oxide (SiO2), the refractive index n of the anti-scratch film 522 corresponding to different mass fractions of silicon nitride is k When the first material is aluminum oxide (Al2O3) and the second material is silicon oxide (SiO2), the refractive index n of the anti-scratch film layer 522 corresponding to different mass fractions of aluminum oxide is k As shown in Table 1.

[0131] Table 1

[0132] As can be seen from Table 1, when the first material is silicon nitride (Si3N4), the second material is silicon oxide (SiO2), and the mass fraction of silicon nitride is greater than or equal to 10% and less than or equal to 80%, the refractive index n of the anti-scratch film layer 522 can be k By controlling the refractive index between 1.49 and 1.85, the difference between the refractive index of the anti-scratch film layer 522 and the refractive index of the substrate 51 can be reduced, so that the anti-scratch film layer 522 and the substrate 51 can be close to homogeneous, which is beneficial to thinning the thickness of the optical adjustment film layer 521 and can effectively improve the angle color change problem and rainbow edge problem of the cover plate 50.

[0133] Furthermore, when the first material is silicon nitride (Si3N4) and the second material is silicon oxide (SiO2), and the mass fraction of silicon nitride is greater than or equal to 10% and less than or equal to 50%, the refractive index n of the anti-scratch film layer 522 can be increased. k By controlling the refractive index between 1.49 and 1.66, the difference between the refractive index of the anti-scratch film layer 522 and the refractive index of the substrate 51 can be further reduced, so that the anti-scratch film layer 522 and the substrate 51 can be closer to homogeneity, which is conducive to further thinning the thickness of the optical adjustment film layer 521, and can further improve the angle color change problem and rainbow edge problem of the cover plate 50.

[0134] When the first material is aluminum oxide (Al2O3) and the second material is silicon oxide (SiO2), and the mass fraction of aluminum oxide is greater than or equal to 10% and less than 100%, the refractive index n of the anti-scratch film layer 522 can be k By controlling the refractive index between 1.47 and 1.7, the difference between the refractive index of the anti-scratch film layer 522 and the refractive index of the substrate 51 can be reduced, so that the anti-scratch film layer 522 and the substrate 51 can be close to homogeneous, which is beneficial to thinning the thickness of the optical adjustment film layer 521 and can effectively improve the angle color change problem and rainbow edge problem of the cover plate 50.

[0135] Furthermore, when the first material is aluminum oxide (Al2O3) and the second material is silicon oxide (SiO2), and the mass fraction of aluminum oxide is greater than or equal to 20% and less than 80%, the refractive index of the anti-scratch film layer can be controlled within a range of 1.49 to 1.62, which can further reduce the difference between the refractive index of the anti-scratch film layer 522 and the refractive index of the substrate 51, so that the anti-scratch film layer 522 and the substrate 51 can be closer to homogeneity, which is conducive to further thinning the thickness of the optical adjustment film layer 521, and can further improve the angle color change problem and rainbow edge problem of the cover plate 50.

[0136] In some embodiments, as shown in FIG7 , the optical adjustment film layer 521 includes an upper optical adjustment film layer 5211 and a lower optical adjustment film layer 5212. The upper optical adjustment film layer 5211 is disposed on the surface of the anti-scratch film layer 522 facing away from the substrate 51. The lower optical adjustment film layer 5212 is disposed on the surface of the anti-scratch film layer 522 facing toward the substrate 51. The optical adjustment film layer 521 can be made of a dielectric material. Optionally, both the upper optical adjustment film layer 5211 and the lower optical adjustment film layer 5212 are colorless and transparent.

[0137] Optical technicians can design the film system of the optical adjustment film layer 521 using optical thin film software (such as TFCale software, Macleod software, etc.). It is understood that in other embodiments, the optical adjustment film layer 521 may include only the upper optical adjustment film layer 5211 and not the lower optical adjustment film layer 5212, or the optical adjustment film layer 521 may include only the lower optical adjustment film layer 5212 and not the upper optical adjustment film layer 5211.

[0138] Specifically, in some embodiments, the upper optical adjustment film layer 5211 is a single-layer film layer, and the refractive index of the upper optical adjustment film layer 5211 is lower than the refractive index of the anti-scratch film layer 522. Thus, by designing the upper optical adjustment film layer 5211 as a single-layer film system, the structure of the upper optical adjustment film layer 5211 can be simplified, the total thickness of the optical adjustment film layer 521 can be reduced, and the difference in optical thickness of the optical adjustment film layer 521 at different incident angles can be reduced, thereby improving the angular color shift and rainbow fringing problems. Furthermore, the anti-scratch film layer 522 and the upper optical adjustment film layer 5211 can form a composite film layer composed of a high-refractive index film layer and a low-refractive index film layer. The light reflected and refracted by the anti-scratch film layer 522 and the upper optical adjustment film layer 5211 interfere with each other, thereby enhancing the reflectivity of light in a specific wavelength band in the output light, further improving the light transmittance of the cover plate 50, and achieving the purpose of optimizing the optical performance of the cover plate 50 and adjusting the appearance color of the cover plate 50.

[0139] In some embodiments, the refractive index of the upper optical adjustment film layer 5211 is greater than or equal to 1.55 and less than or equal to 1.65. For example, the refractive index of the upper optical adjustment film layer 5211 can be 1.55, 1.56, 1.57, 1.58, 1.59, 1.6, 1.61, 1.62, 1.63, 1.64, 1.65, etc. This helps reduce the difference in optical thickness of the upper optical adjustment film layer 5211 at different incident angles, thereby improving the angular color change and rainbow fringing problems of the cover plate 50.

[0140] In some embodiments, the upper optical adjustment film layer 5211 can be made of one or more materials. When the upper optical adjustment film layer 5211 is made of multiple materials, the upper optical adjustment film layer 5211 includes at least one high-refractive index material and at least one low-refractive index material. The refractive index of the high-refractive index material is greater than that of the low-refractive index material. In this way, by adjusting the mass ratio of the high-refractive index material to the low-refractive index material, the upper optical adjustment film layer 5211 can have a corresponding refractive index, thereby reducing the difficulty of processing the upper optical adjustment film layer 5211.

[0141] In some embodiments, the refractive index of the high-refractive-index material is greater than or equal to 1.6, and the refractive index of the low-refractive-index material is greater than or equal to 1.4 and less than 1.6. In this way, both high-refractive-index and low-refractive-index materials are readily available and can easily meet the refractive index requirements of the upper optical adjustment film layer 5211.

[0142] For example, the high refractive index material may be silicon nitride (Si3N4), aluminum nitride (AlN), niobium oxide (Nb2O5), titanium oxide (TiO2), tantalum oxide (Ta2O5), zirconium oxide (ZrN), silicon oxynitride (SiO x N y ), aluminum oxynitride (AlO m N n ). Low-refractive-index materials can include silicon oxide (SiO2) and magnesium fluoride (MgF2). These materials have excellent optical properties and can meet the refractive index requirements. In addition, these materials are readily available, which can reduce the difficulty of processing the upper optical adjustment film layer 5211.

[0143] In some embodiments, referring to FIG. 7 , the physical thickness t2 of the upper optical adjustment film layer 5211 is less than or equal to 300 nm. Furthermore, the physical thickness t2 of the upper optical adjustment film layer 5211 is greater than or equal to 30 nm. For example, the physical thickness t2 of the upper optical adjustment film layer 5211 can be 300 nm, 280 nm, 260 nm, 250 nm, 240 nm, 220 nm, 200 nm, 180 nm, 160 nm, 150 nm, 130 nm, 120 nm, 100 nm, 90 nm, 80 nm, 70 nm, 60 nm, 50 nm, 30 nm, etc. This can reduce the difference in optical thickness of the upper optical adjustment film layer 5211 at different incident angles, thereby improving the angular color change and rainbow fringing issues of the cover plate 50.

[0144] Based on any of the above embodiments, the ratio B1 of the physical thickness t1 of the anti-scratch film layer 522 to the physical thickness t2 of the upper optical adjustment film layer 5211 is greater than or equal to 10. Furthermore, B1 is greater than or equal to 10. Exemplarily, B1 can be 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 25, 26, 30, 35, 40, 50, 60, 70, etc. Thus, the thickness difference between the anti-scratch film layer 522 and the upper optical adjustment film layer 5211 is large, so that the anti-scratch film layer 522 and the upper optical adjustment film layer 5211 can be considered a single-layer film system, thereby further improving the angular color change and rainbow fringing problems of the cover plate 50.

[0145] In some embodiments, the lower optical adjustment film layer 5212 is a single layer, and its refractive index is lower than that of the scratch-resistant upper film layer. Designing the lower optical adjustment film layer 5212 as a single layer simplifies its structure, reduces the total thickness of the optical adjustment film layer 521, and thus reduces the difference in optical thickness of the optical adjustment film layer 521 at different incident angles, thereby improving the angular color shift and rainbow fringing issues of the cover plate 50. Furthermore, the scratch-resistant film layer 522 and the lower optical adjustment film layer 5212 can form a composite film layer composed of a high-refractive index layer and a low-refractive index layer. The interference of light reflected and refracted by the scratch-resistant film layer 522 and the lower optical adjustment film layer 5212 can enhance the reflectivity of specific wavelengths of light within the emitted light, further improving the light transmittance of the cover plate 50 and optimizing the optical performance and color of the cover plate 50.

[0146] In some embodiments, the refractive index of the lower optical adjustment film layer 5212 is greater than or equal to 1.55 and less than or equal to 1.65. For example, the refractive index of the lower optical adjustment film layer 5212 can be 1.55, 1.56, 1.57, 1.58, 1.59, 1.6, 1.61, 1.62, 1.63, 1.64, 1.65, etc. This helps reduce the difference in optical thickness of the lower optical adjustment film layer 5212 at different incident angles, improving the angular color change and rainbow fringing issues of the cover plate 50. Furthermore, these materials are readily available, reducing the difficulty of manufacturing the cover plate 50.

[0147] The material of the lower optical adjustment film layer 5212 may include one or more materials. When the lower optical adjustment film layer 5212 includes multiple materials, the lower optical adjustment film layer 5212 includes at least one high-refractive-index material and at least one low-refractive-index material. The refractive index of the high-refractive-index material is greater than that of the low-refractive-index material. The material of the lower optical adjustment film layer 5212 can be designed with reference to the material of the upper optical adjustment film layer 5211 and will not be described in detail here. It should be understood that the material of the lower optical adjustment film layer 5212 can be the same as or different from that of the upper optical adjustment film layer 5211.

[0148] In some embodiments, referring to FIG. 7 , the physical thickness t3 of the lower optical adjustment film layer 5212 is less than or equal to 300 nm. Furthermore, the physical thickness t3 of the upper optical adjustment film layer 5211 is greater than or equal to 30 nm. For example, the physical thickness t3 of the lower optical adjustment film layer 5212 can be 300 nm, 280 nm, 260 nm, 250 nm, 240 nm, 220 nm, 200 nm, 180 nm, 160 nm, 150 nm, 130 nm, 120 nm, 100 nm, 90 nm, 80 nm, 70 nm, 60 nm, 50 nm, 30 nm, etc. This can reduce the difference in optical thickness of the lower optical adjustment film layer 5212 at different incident angles, thereby improving the angular color change and rainbow fringing issues of the cover plate 50.

[0149] The ratio B2 of the physical thickness t1 of the anti-scratch film layer 522 to the physical thickness t3 of the lower optical adjustment film layer 5212 is greater than or equal to 10. For example, B2 may be 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 25, 26, 30, 35, 40, 50, 60, 70, etc. Thus, the thickness difference between the anti-scratch film layer 522 and the lower optical adjustment film layer 5212 is large, so that the anti-scratch film layer 522 and the lower optical adjustment film layer 5212 can be considered a single-layer film system as a whole, thereby further improving the angular color change and rainbow fringing problems of the cover lens 50.

[0150] In other embodiments, please refer to Figure 8, which is a partial cross-sectional view of a cover plate 50 provided in other embodiments of the present application. The cover plate 50 in this embodiment differs from the cover plate 50 in the embodiment shown in Figure 7 in that the upper optical adjustment film layer 5211 of the cover plate 50 in this embodiment includes at least one first high-refractive-index film layer 5211a and at least one first low-refractive-index film layer 5211b stacked and alternately arranged in sequence, with the refractive index of the first high-refractive-index film layer 5211a being greater than the refractive index of the first low-refractive-index film layer 5211b.

[0151] Specifically, there may be one or more first high-refractive-index film layers 5211a. When there are multiple first high-refractive-index film layers 5211a, the refractive indices of the multiple first high-refractive-index film layers 5211a may be the same or different. Similarly, there may be one or more first low-refractive-index film layers 5211b. When there are multiple first low-refractive-index film layers 5211b, the refractive indices of the multiple first low-refractive-index film layers 5211b may be the same or different.

[0152] In practical applications, the thickness and refractive index of each layer in the upper optical adjustment film layer 5211 can be designed to cause interference between different emitted light rays, thereby adjusting the optical performance and color of the cover plate 50. The specific structural design of the upper optical adjustment film layer 5211 can be performed using optical software (such as TFCale software or Macleod software).

[0153] Furthermore, referring to FIG8 , the layer closest to the anti-scratch film layer 522 in the upper optical adjustment film layer 5211 is the first low-refractive-index film layer 5211b , and the refractive index of the first low-refractive-index film layer 5211b closest to the anti-scratch film layer 522 in the upper optical adjustment film layer 5211 is lower than that of the anti-scratch film layer 522. Thus, the anti-scratch film layer 522 and the upper optical adjustment film layer 5211 form alternating high-refractive-index film layers and low-refractive-index film layers. The interference of light reflected and refracted by the anti-scratch film layer 522 and the upper optical adjustment film layer 5211 enhances the reflectivity of light of specific wavelengths within the emitted light, further improving the light transmittance of the cover plate 50 and thereby optimizing the optical performance and adjusting the color of the cover plate 50.

[0154] In some embodiments, please continue to refer to Figure 8, the lower optical adjustment film layer 5212 includes at least one second high refractive index film layer 5212a and at least one second low refractive index film layer 5212b stacked in sequence and alternately arranged, and the refractive index of the second high refractive index film layer 5212a is greater than the refractive index of the second low refractive index film layer 5212b.

[0155] Referring to FIG8 , the layer closest to the anti-scratch film layer 522 in the lower optical adjustment film layer 5212 is the second low-refractive-index film layer 5212b, and the refractive index of the second low-refractive-index film layer 5212b closest to the anti-scratch film layer 522 in the lower optical adjustment film layer 5212 is lower than that of the anti-scratch film layer 522. Thus, the anti-scratch film layer 522 and the lower optical adjustment film layer 5212 form alternating high-refractive-index film layers and low-refractive-index film layers. The light reflected and refracted by the anti-scratch film layer 522 and the upper optical adjustment film layer 5211 interfere with each other, enhancing the reflectivity of light of specific wavelengths in the emitted light and further improving the light transmittance of the cover plate 50, thereby optimizing the optical performance of the cover plate 50 and adjusting the color of the cover plate 50.

[0156] It is understood that the upper optical adjustment film layer 5211 in this embodiment can be applied to the cover plate 50 in any embodiment of the present application. Similarly, the lower optical adjustment film layer 5212 in this embodiment can be applied to the cover plate 50 in any embodiment of the present application.

[0157] Please refer to Figure 9, which is a partial cross-sectional view of a cover plate 50 provided in yet another embodiment of the present application. In this embodiment, the cover plate 50 includes, in addition to a substrate 51, an anti-scratch film layer 522, and an optical adjustment film layer 521, a primer layer 523. The primer layer 523 can be laminated on the surface of the substrate 51 facing the anti-scratch film layer 522. For example, the primer layer 523 can be disposed between the first surface 511 of the substrate 51 and the lower optical adjustment film layer 5212.

[0158] The material of the primer layer 523 includes at least one of aluminum, chromium, titanium, silicon, and silicon oxide. The primer layer 523 is used to increase the adhesion between the film layer closest to the first surface 511 of the substrate 51 and the substrate 51, effectively preventing the film layer from falling off the substrate 51. Furthermore, the primer layer 523 provides a cutoff interface for the stripping of defective film layers, preventing the stripping solution from damaging the substrate 51. The primer layer 523 in this embodiment can be applied to the cover plate 50 in any embodiment of the present application.

[0159] The number of layers of the base layer 523 can be one or more. In practical applications, the specific material and number of layers of the base layer 523 can be selected based on the material of the substrate 51. For example, when the material of the substrate 51 is glass or ceramic, the base layer 523 can be set as a single layer, and the material of the base layer 523 includes silicon oxide (SiO2). When the material of the substrate 51 is plastic, the base layer 523 can be set as a single layer, and the base layer 523 includes elemental silicon (Si). When the material of the substrate 51 is stainless steel, the base layer 523 can be set as a single layer, and the material of the base layer 523 includes chromium silicon. When the material of the substrate 51 is aluminum alloy, the base layer 523 can be set as two layers. In this case, the base layer 523 includes a first base layer and a second base layer. The first base layer is provided on the first surface 511 of the substrate 51, and the second base layer is provided on the side surface of the first base layer facing away from the substrate 51. The material of the first base layer includes metallic aluminum, and the material of the second base layer includes metallic chromium (Gr). When the substrate 51 is made of titanium alloy, the primer layer 523 may be provided as a layer, and the material of the primer layer 523 includes metallic titanium.

[0160] In some embodiments, as shown in FIG9 , the physical thickness t4 of the base layer 523 is greater than or equal to 10 nm and less than or equal to 50 nm. Specifically, the physical thickness t4 of the base layer 523 can be 10 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, or 50 nm. Thus, the moderate physical thickness t4 of the base layer 523 can increase the adhesion between the lower optical adjustment film layer 5212 and the substrate 51, while also helping to reduce the overall thickness of the cover plate 50.

[0161] Based on any of the above embodiments, in order to provide anti-fingerprint properties on the exterior surface of the cover plate 50, in some embodiments, please refer to Figure 10, which is a partial cross-sectional view of the cover plate 50 provided in some other embodiments of the present application. In this embodiment, the cover plate 50 includes, in addition to the substrate 51, the anti-scratch film layer 522, the optical adjustment film layer 521, and the primer layer 523, an anti-fingerprint (AF) layer 524. The anti-fingerprint layer 524 in this embodiment can be applied to the cover plate 50 in any of the embodiments of the present application.

[0162] Please refer to Figure 10. The anti-fingerprint layer 524 is arranged on the side of the anti-scratch film layer 522 that is away from the substrate 51. Specifically, the anti-fingerprint layer 524 can be arranged on the surface of the upper optical adjustment film layer 5211 that is away from the substrate 51. The anti-fingerprint layer 524 includes an organic or inorganic material with low surface energy, and has hydrophobic and oleophobic properties, so that the surface of the cover plate 50 is easy to clean and has excellent fingerprint resistance. Specifically, the material of the anti-fingerprint layer 524 includes but is not limited to fluorine-containing compounds. For example, the material of the anti-fingerprint layer 524 can be polytetrafluoroethylene (PTFE), cloflucarban, etc. Fluorine-containing compounds have low surface energy and can achieve the purpose of hydrophobicity, oleophobicity and anti-fingerprint residue.

[0163] Referring to FIG10 , the physical thickness t5 of the anti-fingerprint layer 524 is greater than 0 nm and less than or equal to 50 nm. For example, the physical thickness t5 of the anti-fingerprint layer 524 can be 2 nm, 3 nm, 5 nm, 8 nm, 10 nm, 12 nm, 15 nm, 16 nm, 18 nm, 20 nm, 22 nm, 25 nm, 28 nm, 29 nm, 30 nm, 32 nm, 35 nm, 38 nm, 40 nm, 42 nm, 45 nm, 48 nm, 50 nm, etc. In this way, the overall thickness of the cover plate 50 can be reduced while ensuring the protective effect of the anti-fingerprint layer 524.

[0164] On this basis, in order to improve the adhesion between the anti-fingerprint layer 524 and the upper optical adjustment film layer 5211, please continue to refer to Figure 10. A transition layer 525 is provided between the upper optical adjustment film layer 5211 and the anti-fingerprint layer 524. The material of the transition layer 525 can include silicon oxide (SiO2).

[0165] Referring to FIG. 10 , the physical thickness t6 of the transition layer 525 is greater than 0 nm and less than or equal to 50 nm. For example, the physical thickness t6 of the transition layer 525 can be 2 nm, 3 nm, 5 nm, 8 nm, 10 nm, 12 nm, 15 nm, 16 nm, 18 nm, 20 nm, 22 nm, 25 nm, 28 nm, 29 nm, 30 nm, 32 nm, 35 nm, 38 nm, 40 nm, 42 nm, 45 nm, 48 nm, 50 nm, etc. This improves the adhesion between the anti-fingerprint layer 524 and the lower optical adjustment film layer 5212 while reducing the overall thickness of the cover plate 50.

[0166] Of course, it is understandable that in other embodiments, the cover plate 50 may not include the above-mentioned transition layer 525 .

[0167] In yet other embodiments, please refer to Figure 11, which is a partial cross-sectional view of a cover plate 50 provided in yet other embodiments of the present application. In this embodiment, the cover plate 50 includes, in addition to a substrate 51, an anti-scratch film layer 522, an optical adjustment film layer 521, a primer layer 523, and an anti-fingerprint layer 524, a hard and smooth layer 526. The hard and smooth layer 526 in this embodiment can be applied to the cover plate 50 in any of the embodiments of the present application.

[0168] The hard and slippery layer 526 is used to reduce the coefficient of dynamic friction on the surface of the cover plate 50, thereby reducing shear forces on the surface of the cover plate 50 during friction. The hard and slippery layer 526 is disposed on the side of the anti-scratch film layer 522 facing away from the substrate 51. Specifically, the hard and slippery layer 526 can be disposed on the side of the upper optical adjustment film layer 5211 facing away from the substrate 51. It is understood that in other embodiments, the hard and slippery layer 526 can also be disposed directly on the side of the anti-scratch film layer 522 facing away from the substrate 51.

[0169] In some embodiments, the kinetic friction coefficient of the hard and smooth layer 526 is less than or equal to 0.05. For example, the kinetic friction coefficient of the hard and smooth layer 526 can be 0.05, 0.04, 0.03, 0.02, 0.01, etc. When the user touches the cover plate 50, friction is generated between the finger and the cover plate 50, and this friction will damage the various film layers of the cover plate 50. According to the friction formula: f = μ × Fn, where f is the friction force, Fn is the positive pressure, and μ is the friction coefficient. Therefore, by setting the kinetic friction coefficient of the hard and smooth layer 526 to be less than or equal to 0.05, the friction on the surface of the cover plate 50 can be reduced, avoiding damage to the various film layers of the cover plate 50 when the user touches the cover plate 50. At the same time, the user can have a smooth touch when touching the cover plate 50, which is conducive to improving the user experience.

[0170] Furthermore, the dynamic friction coefficient of the hard slippery layer 526 may be greater than or equal to 0.01. This makes it easier to obtain the material for the hard slippery layer 526 and reduces the difficulty of processing the hard slippery layer 526.

[0171] In some embodiments, the hard slippery layer 526 includes one or more carbon materials containing sp2 bonds. Exemplary materials include one or more of diamond-like carbon (DLC), graphite, and carbon nitride (CN). These materials have high hardness and meet the dynamic friction coefficient requirements of the hard slippery layer 526. This reduces friction on the surface of the cover plate 50 while further improving the wear resistance and scratch resistance of the cover plate 50.

[0172] In some embodiments, referring to FIG. 11 , the physical thickness t7 of the hard slippery layer 526 is less than or equal to 200 nm. Furthermore, the physical thickness t7 of the hard slippery layer 526 is less than or equal to 50 nm. For example, the physical thickness t7 of the hard slippery layer 526 can be 200 nm, 180 nm, 150 nm, 120 nm, 100 nm, 80 nm, 60 nm, 50 nm, 40 nm, 30 nm, 20 nm, 10 nm, 9 nm, 8 nm, 7 nm, 6 nm, 5 nm, etc. This can reduce the friction on the surface of the cover plate 50 while maintaining the optical performance of the cover plate 50.

[0173] The cover plate 50 in the embodiment of the present application has the following advantages:

[0174] (1) The appearance defect rate caused by "flash target" can be reduced by 80%, which can greatly improve the production yield of the hard coating section.

[0175] (2) The light transmittance of the cover plate 50 in the wavelength range of 380 nm to 780 nm is measured by a spectrophotometer to be greater than or equal to 85%, and the reflectivity is less than or equal to 15%, indicating excellent optical performance.

[0176] (3) A Vickers indentation test was performed on the cover plate 50. When the indentation depth of the cover plate 50 was approximately 100 nanometers, the measured Vickers hardness was greater than or equal to 1100 HV. A Mohs hardness test was performed on the cover plate 50 using a Mohs hardness pen. Under a force of 500 g, the Mohs hardness was greater than 7. The cover plate 50 has high hardness and strong scratch and puncture resistance.

[0177] (IV) According to the International Commission on Illumination, under normal incidence, in the (L*, a*, b*) colorimetric system, when the cover plate 50 is tested using a colorimeter, its reflected color value a is greater than or equal to -2 and less than or equal to 2, and its b value is greater than or equal to -2 and less than or equal to 2; its transmitted color value a is greater than or equal to -2 and less than or equal to 2, and its b value is greater than or equal to -2 and less than or equal to 2. Under conditions of an incident angle of 60 degrees, in the (L*, a*, b*) colorimetric system, when the cover plate 50 is tested using a colorimeter, its reflected color value a is greater than or equal to -2 and less than or equal to 2, and its b value is greater than or equal to -2 and less than or equal to 2. The cover plate 50 has a good appearance and color, and can be coated on 2.5D cover plates 50 and 3D cover plates 50. Moreover, even if the curved surface of the edge portion of the cover plate 50 reaches 90°, there will be no angular color change or rainbow edge problems.

[0178] (5) The dynamic friction coefficient of the cover plate 50 surface is less than or equal to 0.05. Using a Minorle eraser, the test was performed at a force of 1000g, a speed of 40 cycles / min, and a stroke of 4200 cycles. After the cycle test, the water drop angle was greater than 100°. This prevents damage to the various film layers of the cover plate 50 when the user touches the cover plate 50. At the same time, the user can experience a smooth touch when touching the cover plate 50, which is conducive to improving the user experience.

[0179] The present application also provides a method for processing the cover plate 50. Please refer to FIG12, which is a flow chart of the method for processing the cover plate 50 provided in some embodiments of the present application. The cover plate 50 may be the cover plate 50 in any of the above embodiments. The method for processing the cover plate 50 includes:

[0180] Step S100: providing a substrate 51, wherein the substrate 51 includes a first surface 511;

[0181] The substrate 51 may be made of glass, ceramic, plastic or metal.

[0182] Step S101: cleaning the substrate 51 to remove pollutants and adsorbed gases on the surface of the substrate 51;

[0183] It is understood that, in other embodiments, the method for processing the cover plate 50 may not include step S101. In this case, the substrate 51 provided in step S100 may be a substrate 51 that has been cleaned.

[0184] Step S300: forming an anti-scratch film layer 522 on the side of the substrate 51 facing the first surface 511, wherein the anti-scratch film layer 522 includes silicon and a doping element, wherein the doping element can form a covalent bond with the silicon element; the valence state of the doping element is +3 or +5, and the doping element does not include nitrogen;

[0185] The material, refractive index, physical thickness and other parameters of the anti-scratch film layer 522 can be designed with reference to the anti-scratch film layer 522 in any of the above embodiments and will not be described in detail here.

[0186] In some embodiments, the scratch-resistant film layer 522 can be formed by a sputtering process. Exemplarily, the scratch-resistant film layer 522 can be formed by a magnetron sputtering process. Specifically, forming the scratch-resistant film layer 522 by the sputtering process includes providing a target material, wherein the target material is a silicon target, and the target material includes a doping element, wherein the doping element can form a covalent bond with silicon, wherein the valence state of the doping element is +3 or +5, and the doping element does not include nitrogen.

[0187] In this way, by adding the above-mentioned doping elements to the silicon target material, the conductivity of the silicon target material can be improved, so that during the sputtering process of the anti-scratch film layer 522, the accumulation of charges on the surface of the silicon target material can be effectively avoided, which is beneficial to reducing the probability of arc discharge during the sputtering process, and thus avoiding the generation of large-particle sputtering materials during the sputtering process, and can effectively reduce the probability of "white spots" forming on the surface of the substrate 51, and can improve the appearance yield of the cover plate 50.

[0188] Please refer to FIG13, which is a flow chart of a method for processing a cover plate 50 according to another embodiment of the present application. The method for processing the cover plate 50 in this embodiment differs from the method for processing the cover plate 50 in the embodiment shown in FIG12 in that, before forming the anti-scratch film layer 522 on the side facing the first surface 511 of the substrate 51, the method further includes:

[0189] Step S200 : forming a lower optical adjustment film layer 5212 on the side of the substrate 51 facing the first surface 511 ;

[0190] In this case, the anti-scratch film layer 522 may be formed on a surface of the lower optical adjustment film layer 5212 that is away from the substrate 51 .

[0191] Further, referring to FIG. 13 , after forming the anti-scratch film layer 522 on the side facing the first surface 511 of the substrate 51 , that is, after step S300 , the processing method of the cover plate 50 further includes:

[0192] Step S400: forming an upper optical adjustment film layer 5211 on the surface of the anti-scratch film layer 522 facing away from the substrate 51;

[0193] Specifically, both the upper optical adjustment film layer 5211 and the lower optical adjustment film layer 5212 can be formed using a PVD process (e.g., a magnetron sputtering process). Thus, the lower optical adjustment film layer 5212 has a higher hardness and is more resistant to corrosion, drops, and scratches.

[0194] Among them, the number of layers, material, refractive index, physical thickness, Vickers hardness and other parameters of the upper optical adjustment film layer 5211 in this embodiment can be designed with reference to the upper optical adjustment film layer 5211 in any embodiment of the present application, and the number of layers, material, refractive index, physical thickness, Vickers hardness and other parameters of the lower optical adjustment film layer 5212 in this embodiment can be designed with reference to the lower optical adjustment film layer 5212 in any embodiment of the present application, and will not be repeated here.

[0195] On this basis, in order to improve the adhesion between the lower optical adjustment film layer 5212 and the substrate 51, referring to FIG. 13 , before forming the lower optical adjustment film layer 5212 on the side facing the first surface 511 of the substrate 51, the following steps are further included:

[0196] Step S102: forming a base layer 523 on the first surface 511 of the cover plate 50;

[0197] Specifically, the base layer 523 can be formed on the first surface 511 of the substrate 51 using a PVD process (e.g., a magnetron sputtering process, a vacuum evaporation process, etc.). The specific material of the base layer 523 can be selected based on the material of the substrate 51. The number of layers, material, physical thickness, and other parameters of the base layer 523 in this embodiment can be designed with reference to the base layer 523 in any embodiment of this application, and will not be further described here.

[0198] It is understandable that, in other embodiments, the method for processing the cover plate 50 may not include step S102 . Alternatively, in other embodiments, the method for processing the cover plate 50 may only include one of step S200 and step 400 .

[0199] Continuing to refer to FIG. 13 , after the anti-scratch film layer 522 is formed on the side facing the first surface 511 of the substrate 51 , that is, after step S300 , the processing method of the cover plate 50 further includes:

[0200] Step S500: forming an anti-fingerprint layer 524 on the side of the anti-scratch film layer 522 facing away from the substrate 51;

[0201] Specifically, in this embodiment, the anti-fingerprint layer 524 is formed on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51. It is understood that in other embodiments, the anti-fingerprint layer 524 can also be provided on the surface of other film layers on the side of the anti-scratch film layer 522 facing away from the substrate 51.

[0202] In some embodiments, the anti-fingerprint layer 524 can be formed by a PVD process (eg, a vacuum evaporation process). The anti-fingerprint layer 524 formed by the vacuum evaporation process has a greater hardness and better scratch resistance.

[0203] The material, physical thickness, Vickers hardness and other parameters of the anti-fingerprint layer 524 in this embodiment can be designed with reference to the anti-fingerprint layer 524 in any embodiment of this application, and will not be repeated here.

[0204] Please refer to Figure 13. Before forming the anti-fingerprint layer 524 on the side of the anti-scratch film layer 522 facing away from the substrate 51, that is, before step S500, the processing method may further include: step S401: forming a transition layer 525 on the side of the anti-scratch film layer 522 facing away from the substrate 51.

[0205] Specifically, the transition layer 525 can be formed using a PVD process (e.g., a magnetron sputtering process, a vacuum evaporation process, etc.). In this embodiment, the anti-scratch film layer 522 can be formed on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51. This can improve the adhesion between the anti-fingerprint layer 524 and the upper optical adjustment film layer 5211.

[0206] It is understood that step S500 and step S401 in the embodiment of the present application can be applied to the processing method in any embodiment of the present application. In addition, the processing method in the embodiment of the present application may not include step S500, or may not include step S500 and step S401.

[0207] Please refer to Figure 14, which is a flow chart of the processing method of the cover plate 50 provided in some other embodiments of the present application. The processing method of the cover plate 50 in this embodiment differs from the processing method of the cover plate 50 in the embodiment shown in Figure 13 in that, in the processing method of the cover plate 50 in this embodiment, after forming the anti-scratch film layer 522 on the side facing the first surface 511 of the substrate 51, the method further includes: Step S402: forming a hard and smooth layer 526 on the side of the anti-scratch film layer 522 facing away from the substrate 51. It is understood that Step S402 in the embodiment of the present application can be applied to the processing method of the cover plate 50 in any embodiment of the present application.

[0208] The hard and smooth layer 526 can be formed by a PVD process (for example, a magnetron sputtering process). The hard and smooth layer 526 formed by the PVD process has a greater hardness and better scratch resistance.

[0209] In some embodiments, a hard and slippery layer 526 can be formed on the surface of the upper optical adjustment film 5211 facing away from the substrate 51. The material, dynamic friction coefficient, physical thickness, and other parameters of the hard and slippery layer 526 can be designed with reference to the hard and slippery layer 526 in any of the aforementioned embodiments and will not be described in detail here.

[0210] Two specific embodiments of the cover plate 50 and the processing method thereof in the present application are described below.

[0211] Example 1

[0212] Please refer to FIG15, which is a flow chart of a method for processing the cover plate 50 in the embodiment shown in FIG10. Specifically, the method for processing the cover plate 50 includes:

[0213] Step S100a: providing a substrate 51, wherein the substrate 51 includes a first surface 511; the material of the substrate 51 is glass;

[0214] Step S101a: cleaning the substrate 51 to remove pollutants and adsorbed gases on the surface of the substrate 51;

[0215] Specifically, step S101a includes: placing the substrate 51 in a PVD furnace and performing argon ion cleaning. The specific cleaning process can be: the background vacuum degree in the PVD furnace is about 4*10 -4 Pa, first introduce Ar gas into the PVD furnace to reach 0.3Pa~0.8Pa (for example, 0.5Pa), and use capacitive coupling or hot filament plasma source to generate Ar + The sample surface is plasma cleaned for 8 minutes to 15 minutes (eg, 10 minutes) to remove pollutants and adsorbed gases on the surface of the substrate 51 .

[0216] Step S102a: A magnetron sputtering process is used to form a base layer 523 on the first surface 511 of the substrate 51. The base layer 523 is made of silicon oxide (SiO2), that is, the base layer 523 is a silicon oxide layer.

[0217] Specifically, the process parameters of step S102a can be: background vacuum is 5*10 -4Pa, the temperature is set to 80 degrees Celsius (℃), and the process parameters of the coating machine are set as follows: the power of the inductively coupled plasma generator is 3500W; the flow rate of argon (Ar) is 200sccm (volume flow unit), the flow rate of oxygen (O2) is 120sccm, and the coating time is 2min, obtaining a silicon oxide base with a thickness of 10nm to 50nm.

[0218] Step S200 a : forming a lower optical adjustment film layer 5212 on the surface of the bottom layer 523 facing away from the substrate 51 by using a magnetron sputtering process.

[0219] In this embodiment, the lower optical adjustment film layer 5212 is a single layer, and the material of the lower optical adjustment film layer 5212 includes a mixture of silicon nitride (Si3N4) and silicon oxide (SiO2) at the atomic level. x N y The mass fractions of silicon nitride (Si3N4) and silicon oxide (SiO2) are calculated according to Table 1, and the refractive index of the lower optical adjustment film layer 5212 is controlled to be 1.55-1.65.

[0220] Specifically, the process parameters of step S200a can be: background vacuum is 5*10 -4 Pa, the temperature is set to 80 degrees Celsius (℃), and the process parameters of the coating machine are set as follows: the power of the inductively coupled plasma generator is 3500W, the flow rate of argon (Ar) is 200sccm (volume flow unit), the flow rate of oxygen (O2) is 120sccm, and the flow rate of nitrogen (N2) is 50-200sccm; the nitrogen (N2) bias is 0.05-0.1Pa, and the coating time is 3-10min. Silicon oxynitride (SiO) with a thickness of 100nm-300nm is obtained. x N y )layer.

[0221] Step S300 a : forming an anti-scratch film layer 522 on the surface of the lower optical adjustment film layer 5212 facing away from the substrate 51 by using a magnetron sputtering process.

[0222] In this embodiment, the thickness of the anti-scratch film layer 522 is 500nm to 3000nm. The material of the anti-scratch film layer 522 includes silicon nitride (Si3N4) and silicon oxide (SiO2) atomic-level mixed mixture of silicon nitride (SiO x N y ), and the anti-scratch film layer 522 includes the doping element boron (B). The mass fraction of boron is 0.4%. The mass fractions of silicon nitride (Si3N4) and silicon oxide (SiO2) are calculated according to Table 1, and the refractive index of the anti-scratch film layer 522 is controlled to be 1.65-1.80.

[0223] The process parameters of step S300a can be: background vacuum is 5*10 -4 Pa; the target material is a silicon target, the doping element in the target material is boron, and the mass fraction of boron is 0.4%; the sputtering power of the target material is 8500W; the flow rate of argon is 120sccm; the flow rate of nitrogen is 80sccm; the flow rate of oxygen is 30sccm; the power of the inductively coupled plasma generator is 4500W.

[0224] Step S400 a : forming an upper optical adjustment film layer 5211 on the surface of the anti-scratch film layer 522 facing away from the substrate 51 by using a magnetron sputtering process.

[0225] In this embodiment, the upper optical adjustment film layer 5211 is a single layer, and the thickness of the upper optical adjustment film layer 5211 is 60nm to 120nm. The material of the upper optical adjustment film layer 5211 includes a mixture of silicon nitride (Si3N4) and silicon oxide (SiO2) at the atomic level. x N y The mass fractions of silicon nitride (Si3N4) and silicon oxide (SiO2) are calculated according to Table 1, and the refractive index of the upper optical adjustment film layer 5211 is controlled to be 1.55-1.65.

[0226] Specifically, the process parameters of step S400a can be: background vacuum is 5*10 -4 Pa, the temperature is set to 80 degrees Celsius (℃), and the process parameters of the coating machine are set as follows: the power of the inductively coupled plasma generator is 3500W; the flow rate of argon (Ar) is 200sccm (volume flow unit), the flow rate of oxygen (O2) is 120sccm, and the flow rate of nitrogen (N2) is 50-200sccm; the nitrogen (N2) bias is 0.05-0.1Pa, and the coating time is 0.5-2min. Silicon oxynitride (SiO) with a thickness of 60nm-120nm is obtained. x N y )layer.

[0227] Step S401 a : forming a transition layer 525 on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51 by using a magnetron sputtering process.

[0228] In this embodiment, the material of the transition layer 525 is silicon oxide (SiO 2 ), that is, the transition layer 525 is a silicon oxide (SiO 2 ) film layer.

[0229] The process parameters of step S401a can be: sputtering power of silicon target is 8KW, flow rate of Ar is 250sccm, flow rate of O2 is 120sccm, coating time is 0.5min-4min, and a silicon oxide film layer with a thickness of 8nm-13nm is obtained.

[0230] To improve adhesion between the transition layer 525 and the upper optical adjustment film 5211, the surface of the upper optical adjustment film 5211 was subjected to an anodic plasma treatment prior to forming the transition layer 525. Specific parameters were: power of 1 kW to 5 kW, an Ar flow rate of 200 sccm, an O2 flow rate of 80 sccm, and a treatment time of 240 seconds.

[0231] Step S500 a : forming an anti-fingerprint layer 524 on the surface of the transition layer 525 facing away from the substrate 51 by a magnetron sputtering process, thereby obtaining a cover plate 50 .

[0232] In order to obtain an anti-pollution anti-fingerprint layer 524, polyperfluoroether siloxane is used as the raw material, and the coating parameters are set as follows: coating current is 260A, argon (Ar) flow rate is 220sccm (volume flow unit), oxygen (O2) flow rate is 220sccm, and coating time is 3min, obtaining an anti-fingerprint layer 524 with a thickness of 10nm to 30nm.

[0233] When the cover plate 50 is manufactured using the processing method of this embodiment, the appearance defect rate caused by "flash target" can be reduced by 80%, and the cover plate 50 has better optical properties, greater hardness, and stronger scratch resistance.

[0234] Specifically, the optical performance of the cover plate 50 was tested by a spectrophotometer. The cover plate 50 in this embodiment had a transmittance of 91.7% and a reflectivity of 7.8% in the wavelength range of 380 nm to 780 nm, indicating relatively good optical performance.

[0235] The color of the cover plate 50 was tested using a colorimeter. According to the International Commission on Illumination, under normal incidence, in the (L*, a*, b*) colorimetric system, the reflected color value a was -0.01, and the b value was 0.23. The transmitted color value a was 0.03, and the b value was 0.65. At an incident angle of 30 degrees, the reflected color value a was 0.967, and the b value was -0.45. At an incident angle of 60 degrees, the reflected color value a was 0.449, and the b value was 0.907. The cover plate 50 exhibits a good color appearance, and both angular color shift and rainbow fringing issues have been effectively addressed.

[0236] A Vickers indentation test was conducted on the cover plate 50, and the measured Vickers hardness was 1200-1340 when the indentation depth was approximately 100 nanometers. A Mohs hardness test was also conducted on the cover plate 50, and the Mohs hardness was greater than 7 under a force of 500g. This high hardness of the cover plate 50 provides excellent wear and scratch resistance, helping to reduce scratches on the cover plate 50 and extend its service life.

[0237] The cover plate 50 was subjected to an eraser friction test: using a minor eraser, with a force of 1000 g, a speed of 40 cycles / min, and a test stroke of 4200 cycles. After the cycle test, the water drop angle was greater than 100°. The dynamic friction coefficient of the cover plate 50 was less than or equal to 0.05.

[0238] It is understandable that when the cover plate 50 in the embodiment shown in FIG. 10 is manufactured by other processing methods, it can also have the above-mentioned excellent performance.

[0239] Example 2

[0240] Please refer to FIG16, which is a flow chart of the processing method of the cover plate 50 shown in FIG11. Specifically, the processing method of the cover plate 50 in this embodiment differs from the processing method of the cover plate 50 in the embodiment shown in FIG16 in that, in addition to including the above-mentioned steps S100a to S500a, the processing method of the cover plate 50 in this embodiment further includes the following before step S500a:

[0241] Step S402 a : forming a hard and smooth layer 526 on the surface of the upper optical adjustment film layer 5211 facing away from the substrate 51 .

[0242] The material of the hard and smooth layer 526 is diamond-like carbon. The physical thickness of the hard and smooth layer 526 is less than or equal to 15 nm. The coating parameters are: DC power of 200 W, sputtering pressure of 0.4 Pa, sputtering time of 20 to 40 minutes, and argon flow rate of 20 sccm.

[0243] The other steps of the processing method of the cover plate 50 in this embodiment may be the same as the processing method of the cover plate 50 in the embodiment shown in FIG. 16 , and will not be described in detail here.

[0244] When the cover plate 50 is manufactured using the processing method of this embodiment, the appearance defect rate caused by "flash target" can also be reduced by 80%, and the cover plate 50 has better optical properties, greater hardness, and stronger scratch resistance.

[0245] Specifically, the optical performance of the cover plate 50 was tested by a spectrophotometer. The cover plate 50 in this embodiment had a transmittance of 91.1% and a reflectivity of 8.4% in the wavelength range of 380 nm to 780 nm, indicating relatively good optical performance.

[0246] The color of the cover plate 50 was tested using a colorimeter. According to the International Commission on Illumination, under normal incidence, in the (L*, a*, b*) colorimetric system, the reflected color value a was -0.34, and the b value was 0.1. The transmitted color values ​​a and b were 0.23 and 0.73, respectively. At an incident angle of 30 degrees, the reflected color values ​​a and b were 0.88 and 0.34, respectively. At an incident angle of 60 degrees, the reflected color values ​​a and b were 0.35 and 1.1, respectively. The cover plate 50 exhibits a good color appearance, and both angular color shift and rainbow fringing issues have been effectively addressed.

[0247] A Vickers indentation test was conducted on the cover plate 50, and the measured Vickers hardness was 1100-1280 when the indentation depth was approximately 100 nanometers. A Mohs hardness test was also conducted on the cover plate 50, and the Mohs hardness was greater than 7 under a force of 500g. This high hardness of the cover plate 50 provides excellent wear and scratch resistance, helping to reduce scratches on the cover plate 50 and extend its service life.

[0248] The cover plate 50 was subjected to an eraser friction test: using a minor eraser, with a force of 1000 g, a speed of 40 cycles / min, and a test stroke of 4200 cycles. After the cycle test, the water drop angle was greater than 100°. The dynamic friction coefficient of the cover plate 50 was less than or equal to 0.05.

[0249] It is understandable that when the cover plate 50 in the embodiment shown in FIG. 11 is manufactured by other processing methods, it can also have the above-mentioned excellent performance.

[0250] According to the description of the above embodiments, when the cover plate 50 is applied to an electronic device 100 and used as the light-transmitting cover plate 11 or back cover 21 of the electronic device 100, the appearance yield of the electronic device 100 can be improved, the scratch resistance of the cover plate 50 can be improved, and scratches on the light-transmitting cover plate 11 or back cover 21 can be effectively reduced. In addition, the optical performance of the cover plate 50 can be optimized, the appearance color of the cover plate 50 can be adjusted, the angular discoloration problem and rainbow edge problem of the cover plate 50 can be improved, and the performance of the electronic device 100 can be improved.

[0251] In the description of this specification, specific features, structures, materials or characteristics may be combined in an appropriate manner in any one or more embodiments or examples.

[0252] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present application, rather than to limit them. Although the present application has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or make equivalent replacements for some of the technical features therein. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims

1. A cover plate, characterized in that, include: The substrate and the anti-scratch film layer are stacked. The anti-scratch film layer includes silicon and doping elements, the valence state of the doping elements is +3 or +5, and the doping elements do not include nitrogen.

2. The cover plate according to claim 1, characterized in that, The doping element includes at least one of boron, phosphorus and aluminum.

3. The cover plate according to claim 1 or 2, characterized in that, The mass fraction of the doping element in the anti-scratch film layer is greater than or equal to 0.2%.

4. The cover plate according to any one of claims 1-3, characterized in that The mass fraction of the doping element in the anti-scratch film layer is less than or equal to 3%.

5. The cover plate according to any one of claims 1-4, characterized in that The Vickers hardness of the anti-scratch film layer is greater than or equal to 1100 HV.

6. The cover plate according to any one of claims 1-5, characterized in that, The anti-scratch film layer includes a first material and a second material, wherein the refractive index of the first material is greater than or equal to the refractive index of the substrate, and the refractive index of the second material is less than or equal to the refractive index of the substrate.

7. The cover plate according to claim 6, characterized in that, The substrate is a glass substrate, and the refractive index of the anti-scratch film layer is greater than or equal to 1.46 and less than or equal to 1.

85.

8. The cover plate according to claim 6 or 7, characterized in that, The first material includes at least one of silicon nitride, aluminum nitride, niobium oxide, titanium oxide, and tantalum oxide; and / or The second material includes at least one of silicon oxide, magnesium fluoride, and calcium fluoride.

9. The cover plate according to any one of claims 6-8, characterized in that, The first material is silicon nitride, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and or equal to 80%; or The first material is aluminum oxide, the second material is silicon oxide, and the mass fraction of the first material is greater than or equal to 10% and less than 100%.

10. The cover plate according to any one of claims 1-9, characterized in that, The thickness of the anti-scratch film layer is greater than or equal to 500 nm and less than or equal to 3000 nm.

11. The cover plate according to any one of claims 1-10, characterized in that, It comprises an upper optical adjustment film layer, which is arranged on the side of the anti-scratch film layer away from the substrate, is a single layer, and has a refractive index lower than that of the anti-scratch film layer.

12. The cover plate according to claim 11, characterized in that, The upper optical adjustment film layer includes at least one high refractive index material and at least one low refractive index material, and the refractive index of the high refractive index material is greater than the refractive index of the low refractive index material.

13. The cover plate according to any one of claims 1-12, characterized in that, It includes an upper optical adjustment film layer, which is arranged on the side of the anti-scratch film layer away from the substrate, and the upper optical adjustment film layer includes at least one first high refractive index film layer and at least one first low refractive index film layer stacked in sequence and alternately arranged, and the refractive index of the first high refractive index film layer is greater than the refractive index of the first low refractive index film layer.

14. The cover plate according to any one of claims 11-13, characterized in that, The physical thickness of the upper optical adjustment film layer is less than or equal to 300 nm.

15. The cover plate according to any one of claims 11-14, characterized in that, The ratio of the physical thickness of the anti-scratch film layer to the physical thickness of the upper optical adjustment film layer is greater than or equal to 10.

16. The cover plate according to any one of claims 1-15, characterized in that, It comprises a lower optical adjustment film layer, and the lower optical adjustment film layer is arranged on a side of the anti-scratch film layer facing the substrate.

17. The cover plate according to any one of claims 1-16, characterized in that, It comprises a hard and smooth layer, and the hard and smooth layer is arranged on the side of the anti-scratch film layer away from the substrate.

18. The cover plate according to claim 17, wherein The hard and slippery layer includes one or more carbon materials containing SP2 bonds.

19. The cover plate according to claim 17 or 18, characterized in that, The dynamic friction coefficient of the hard and smooth layer is less than or equal to 0.

05.

20. The cover plate according to any one of claims 17-19, characterized in that, The physical thickness of the hard and smooth layer is less than or equal to 50 nm.

21. The cover plate according to any one of claims 1-20, characterized in that, Also includes: The anti-fingerprint layer is arranged on a side of the anti-scratch film layer away from the substrate.

22. The cover plate according to claim 21, wherein, The material of the anti-fingerprint layer includes at least one of polytetrafluoroethylene and chlorofluanilide.

23. The cover plate according to any one of claims 1-22, characterized in that, include: A base layer, the base layer being stacked on a surface of the substrate facing the anti-scratch film layer; The material of the base layer includes at least one of aluminum, chromium, titanium, silicon, and silicon oxide.

24. The cover plate according to any one of claims 1-23, characterized in that, According to the International Commission on Illumination, under the condition of an incident angle of 60 degrees, the a value and b value of the reflected color of the cover plate in the Lab color space satisfy: the a value is greater than or equal to -2 and less than or equal to 2, and the b value is greater than or equal to -2 and less than or equal to 2.

25. The cover plate according to any one of claims 1-24, characterized in that, The cover plate has a Mohs hardness greater than 7 under a force of 500 g.

26. The cover plate according to any one of claims 1-25, characterized in that, The substrate is a 2.5D substrate or a 3D substrate.

27. An electronic device, characterized in that, include: frame; A screen, the screen comprising a light-transmitting cover plate and a display screen which are stacked, the light-transmitting cover plate being fixedly connected to the frame; A back cover, the back cover being arranged on a side of the frame away from the light-transmitting cover plate; At least one of the back cover and the light-transmitting cover plate is the cover plate according to any one of claims 1-26.

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