Primary and secondary double-row shallow groove mechanical seal end surface structure suitable for laser processing
By designing a main and secondary double-row shallow groove structure suitable for laser processing in a mechanical sealing device, combining the hydrostatic pressure and dynamic pressure effects, the problem of high wear and leakage rates is solved, and zero-speed opening is achieved at low speed, extending service life and reducing leakage rates.
Patent Information
- Application Number
- PCT/CN2024/127034
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-12-27
- Filing Date
- 2024-10-24
- Publication Date
- 2025-07-03
AI Technical Summary
The existing mechanical sealing devices have shortcomings in taking into account both low leakage and wear, and are prone to serious wear or high leakage rates, which affects the service life.
The main and auxiliary double-row shallow groove mechanical sealing end surface structure suitable for laser processing is adopted, and combined with the hydrostatic pressure effect and dynamic pressure effect, a combined groove structure of the sector-shaped main groove and the reverse groove is designed. Through the coordination of the step groove and the reverse groove, the static pressure effect and the reverse pumping effect are enhanced, and friction wear and leakage are reduced.
It realizes opening of the lower end face at low speed, taking into account the small wear and low leakage rate of the seal ring end face, extends the service life, is suitable for laser processing, and meets the performance requirements of long life and low leakage.
Smart Images

Figure CN2024127034_03072025_PF_FP_ABST
Abstract
Description
Main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing
[0001] CROSS-REFERENCE TO RELATED APPLICATIONS
[0002] This application is based on the Chinese patent application with application number: 202311826452.0 and application date of December 27, 2023, and claims the priority of the Chinese patent application. The entire content of the Chinese patent application is hereby introduced into this application as a reference. Technical Field
[0003] The present invention relates to the technical field of fluid sealing, in particular to a main-sub double-row shallow groove mechanical sealing end face structure suitable for laser processing. Background Art
[0004] Currently, common groove seals utilize static pressure and fluid dynamic pressure to generate load-bearing capacity, utilizing the pumping effect of the reverse groove. A specific geometric shape is formed between the seal end faces. The pressure drop of the pressurized fluid across the end faces generates a hydrostatic effect. This hydrostatic effect is dependent solely on pressure and is independent of speed. In reverse groove seals, the tangential angle of the weir area induces fluid flow in the groove area, generating a dynamic pressure effect, which generates additional pressure and, in turn, load-bearing capacity and a dynamic pressure effect. Seals that rely on static pressure have the advantage of being able to open the end faces at zero speed and have a relatively thick film, which facilitates the removal of particulate matter. However, seals that rely on dynamic pressure require a certain speed to open the end faces. Before opening, the end faces are subject to wear, which reduces the lifespan of the seal. Current mechanical seals fail to balance the advantages of wear and low leakage in engineering applications, resulting in two potential scenarios: low leakage, but severe wear and a shortened seal life; or reduced wear but a high leakage rate.
[0005] Summary of the Invention
[0006] The present invention aims to solve at least one of the technical problems existing in the prior art. To this end, one object of the present invention is to provide a primary and secondary double-row shallow groove mechanical seal end face structure suitable for laser processing, which simultaneously achieves the advantages of low seal end face leakage rate and minimal wear, has a long service life, and is suitable for laser processing.
[0007] According to an embodiment of the present invention, a main-sub double-row shallow groove mechanical seal end face structure suitable for laser processing includes a double-row groove structure arranged on the end face of the sealing ring and distributed in a centrally symmetrical manner. The double-row groove structure includes a plurality of fan-shaped main grooves and a plurality of reverse grooves. The plurality of fan-shaped main grooves are located on the high-pressure side of the sealing ring end face, and each of the fan-shaped main grooves converges from the high-pressure side to the low-pressure side. Each of the fan-shaped main grooves includes a plurality of stepped grooves distributed from the high-pressure side to the low-pressure side and suitable for laser processing. The depth of each fan-shaped main groove increases at equal intervals from the high-pressure side to the low-pressure side. The plurality of reverse grooves are located on the low-pressure side of the sealing ring end face, and the depth of each reverse groove remains unchanged.
[0008] The working principle of the sealing end face structure of the main and sub-row shallow groove mechanical seal end face suitable for laser processing in an embodiment of the present invention is: when the dynamic ring is in a stationary state or a normal operating state, since a plurality of fan-shaped main grooves are provided on the high-pressure side of the sealing ring end face, each fan-shaped main groove converges from the high-pressure side to the low-pressure side, and each fan-shaped main groove includes a plurality of stepped grooves distributed from the high-pressure side to the low-pressure side, the high-pressure fluid can enter the sealing ring end face through the stepped grooves on the sealing ring, which can effectively generate and enhance the static pressure effect, so that the fluid film thickness between the dynamic ring and the static ring is thickened, thereby effectively avoiding friction and wear between the dynamic ring end face and the static ring end face. The leaked fluid enters the end face of the sealing ring through the stepped groove and flows into the reverse groove on the end face of the sealing ring. When the dynamic ring rotates, the reverse groove pumps the fluid radially and tangentially under the throttling effect of the second dam area and the second weir area, so that the fluid pressure on the low-pressure side increases, thereby effectively reducing the sealing leakage and maintaining a relatively large fluid film thickness to avoid collision and wear between the sealing rings. It also has good rigidity, and as the speed increases, the reverse pumping effect on the low-pressure side is enhanced, and the leakage rate will be further reduced.
[0009] According to the embodiment of the present invention, the main and secondary double-row shallow groove mechanical seal end face structure suitable for laser processing, by combining the fluid dynamic pressure effect and the fluid static pressure effect, on the one hand, when the dynamic ring is in a stationary state or a normal operating state, a fluid film with a larger film thickness can be obtained, which can effectively avoid the friction and wear of the dynamic ring end face and the static ring end face, thereby extending the service life of the sealing device. On the other hand, through the reverse pumping action of the reverse groove on the low-pressure side, the leakage of the sealing device is suppressed, and the sealing leakage rate is effectively reduced, thereby achieving a good sealing effect. Therefore, the main and secondary double-row shallow groove mechanical seal end face structure suitable for laser processing in the embodiment of the present invention is suitable for low-speed working conditions, can realize end face opening at zero speed, can simultaneously take into account the advantages of small wear of the sealing ring end face and low leakage rate, meet the performance requirements of long service life, high rigidity and low leakage of the sealing device, and is suitable for laser processing and easy to manufacture.
[0010] In some embodiments, the size of a single reverse groove is smaller than the size of a single fan-shaped main groove.
[0011] In some embodiments, the radial proportion of the reverse groove is 0.1 to 0.15, and the radial proportion of the fan-shaped main groove is 0.6 to 0.8.
[0012] In some embodiments, a single step groove has a depth of 2 to 5 μm, and a single reverse groove has a depth of 15 to 25 μm.
[0013] In some embodiments, the radial groove wall line of the stepped groove is a straight line, an arc line or a spiral line.
[0014] In some embodiments, the helix angle of the helix is 80° to 90°.
[0015] In some embodiments, the curvature of the inner wall line of the circumferential groove of the stepped groove is greater than or equal to the curvature of the sealing ring.
[0016] In some embodiments, the radial groove wall line of the reverse groove is a logarithmic spiral line, an Archimedean spiral line, a straight line or a circular arc line.
[0017] In some embodiments, the number of the fan-shaped main grooves is 12 to 24, the number of the stepped grooves in a single fan-shaped main groove is 8 to 12, and the number of the reverse grooves is 48 to 96.
[0018] In some embodiments, in the radial direction of the sealing ring end face, a first dam area is formed between the annular area where the fan-shaped main groove is located and the annular area where the reverse groove is located, and a second dam area is formed on the inner side of the annular area where the reverse groove is located; in the circumferential direction of the sealing ring end face, a first weir area is formed between two adjacent fan-shaped main grooves, and a second weir area is formed between two adjacent reverse grooves.
[0019] Additional aspects and advantages of the present invention will be set forth in part in the description which follows and, in part, will be obvious from the description which follows, or may be learned by practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS
[0020] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the following description of the embodiments with reference to the accompanying drawings, in which:
[0021] FIG1 is a schematic structural diagram of a primary and secondary double-row shallow groove mechanical seal end face suitable for laser processing according to an embodiment of the present invention.
[0022] FIG2 is a schematic structural diagram of a primary and secondary double-row shallow groove mechanical seal end face suitable for laser processing according to another embodiment of the present invention.
[0023] FIG3 is a schematic structural diagram of a primary and secondary double-row shallow groove mechanical seal end face suitable for laser processing according to another embodiment of the present invention.
[0024] Reference numerals: main and secondary double-row shallow groove mechanical seal end face structure 1000 ; double-row groove structure 100 ; fan-shaped main groove 101 ; stepped groove 1011 ; reverse groove 102 ; first dam area 103 ; second dam area 104 ; first weir area 105 ; second weir area 106 . DETAILED DESCRIPTION
[0025] The following describes embodiments of the present invention in detail. Examples of the embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions. The embodiments described below with reference to the accompanying drawings are exemplary and are intended only to explain the present invention and are not to be construed as limiting the present invention.
[0026] As shown in Figures 1 to 3, a main and secondary double-row shallow groove mechanical seal end face sealing end face structure 1000 suitable for laser processing according to an embodiment of the present invention includes a double-row groove structure 100 arranged on the end face of the sealing ring and distributed in a centrally symmetrical manner. The double-row groove structure 100 includes a plurality of fan-shaped main grooves 101 and a plurality of reverse grooves 102. The plurality of fan-shaped main grooves 101 are located on the high-pressure side of the end face of the sealing ring, and each fan-shaped main groove 101 converges from the high-pressure side to the low-pressure side. Each fan-shaped main groove 101 includes a plurality of stepped grooves 1011 distributed from the high-pressure side to the low-pressure side and suitable for laser processing. The depth of each fan-shaped main groove 101 increases at equal intervals from the high-pressure side to the low-pressure side. The plurality of reverse grooves 102 are located on the low-pressure side of the end face of the sealing ring, and the depth of each reverse groove 102 remains unchanged.
[0027] Specifically, the sealing ring end face can be understood as either the dynamic ring end face or the static ring end face, and the double-row groove structure 100 can be centrally symmetrically arranged on either the static ring end face or the dynamic ring end face. The radially outer side of the sealing ring is the high-pressure side, i.e., the upstream side; the radially inner side of the sealing ring is the low-pressure side, i.e., the downstream side. The double-row groove structure 100 includes multiple fan-shaped main grooves 101 and multiple reverse grooves 102. For example, the number of fan-shaped main grooves 101 can be 12 to 24 to ensure the sealing effect of the mechanical seal device; the number of reverse grooves 102 can be 48 to 96 to ensure the pumping capacity of the reverse grooves 102. The multiple fan-shaped main grooves 101 are located on the high-pressure side of the sealing ring end face. Each fan-shaped main groove 101 converges from the high-pressure side to the low-pressure side, i.e., the radial width of the fan-shaped main groove 101 gradually decreases from the high-pressure side to the low-pressure side. This creates a static pressure effect on the fan-shaped main grooves 101, preventing friction and wear on the sealing ring end face. Each fan-shaped main groove 101 includes a plurality of stepped grooves 1011 distributed from the high-pressure side to the low-pressure side and suitable for laser processing. The number of stepped grooves 1011 in a single fan-shaped main groove 101 is 8 to 12. The more stepped grooves 1011 there are, the better the enhancement effect on the static pressure effect, which can ensure the stability of the fluid film; the depth of a single stepped groove 1011 (that is, the step height of a single stepped groove) can be 2 to 5 μm. The stepped grooves 1011 within this depth range are suitable for laser processing and have good sealing performance. The radial groove wall line of the stepped groove 1011 can be a straight line, a circular arc line or a spiral line. When the radial groove wall line of the stepped groove 1011 is a spiral line, the spiral angle of the spiral line is 80° to 90°, which can increase the dynamic pressure effect of the high-pressure side stepped groove 1011, thereby improving the bearing capacity of the sealing ring. Through reasonable design, the leakage rate can be maintained within a relatively stable range under variable speed. The depth of each fan-shaped main groove 101 increases at equal intervals from the high-pressure side to the low-pressure side, so that a fluid film with a larger film thickness can be obtained. Among them, the equal-interval increase in the depth of the fan-shaped main groove 101 is suitable for laser processing, which is convenient and fast; multiple reverse grooves 102 are located on the low-pressure side of the end face of the sealing ring, and are separated from the fan-shaped main groove 101 by the first dam area 103. The reverse groove 102 can radially and tangentially pump the fluid when the dynamic ring rotates, so that the fluid pressure on the low-pressure side increases, thereby effectively reducing sealing leakage; the radial groove wall line of the reverse groove 102 is a logarithmic spiral, an Archimedean spiral, a straight line or a circular arc; the groove depth of the reverse groove 102 is 15 to 25 μm, and the depth of each reverse groove 102 remains unchanged.
[0028] The working principle of the main and sub-row shallow groove mechanical seal end face sealing end face structure 1000 suitable for laser processing in an embodiment of the present invention is: when the dynamic ring is in a stationary state or a normal operating state, since a plurality of fan-shaped main grooves 101 are provided on the high-pressure side of the sealing ring end face, each fan-shaped main groove 101 converges from the high-pressure side to the low-pressure side, and each fan-shaped main groove 101 includes a plurality of stepped grooves 1011 distributed from the high-pressure side to the low-pressure side, the high-pressure fluid can enter the sealing ring end face through the stepped grooves 1011 on the sealing ring, which can effectively generate and enhance the static pressure effect, so that the fluid film thickness between the dynamic ring and the static ring is thickened, thereby effectively avoiding friction and wear between the dynamic ring end face and the static ring end face. The leaked fluid enters the end face of the sealing ring through the stepped groove 1011 and flows into the reverse groove 102 on the end face of the sealing ring. When the dynamic ring rotates, the reverse groove 102 pumps the fluid radially and tangentially under the throttling effect of the second dam area 104 and the second weir area 106, so that the fluid pressure on the low-pressure side increases, thereby effectively reducing the sealing leakage and maintaining a relatively large fluid film thickness to avoid collision and friction between the sealing rings. It also has good rigidity, and as the speed increases, the reverse pumping effect on the low-pressure side is enhanced, and the leakage rate will be further reduced.
[0029] According to the embodiment of the present invention, the main and secondary double-row shallow groove mechanical seal end face structure 1000 suitable for laser processing, by combining the fluid dynamic pressure effect and the fluid static pressure effect, on the one hand, when the dynamic ring is in a stationary state or a normal operating state, a fluid film with a larger film thickness can be obtained, which can effectively avoid friction and wear between the end faces of the dynamic ring and the end faces of the static ring, thereby extending the service life of the sealing device. On the other hand, through the reverse pumping action of the reverse groove 102 on the low-pressure side, the leakage of the sealing device is suppressed, and the sealing leakage rate is effectively reduced, thereby achieving a good sealing effect. Therefore, the main and secondary double-row shallow groove mechanical seal end face structure 1000 suitable for laser processing according to the embodiment of the present invention is suitable for low-speed working conditions, can realize end face opening at zero speed, can simultaneously take into account the advantages of small wear on the sealing ring end face and low leakage rate, meet the performance requirements of long service life, high rigidity and low leakage of the sealing device, and is suitable for laser processing and easy to manufacture.
[0030] In some embodiments, the size of a single reversal groove 102 is smaller than that of a single sector-shaped main groove 101. This can maintain the stability of the liquid film and the reversal groove 102 is smaller in size, thus saving space.
[0031] In some embodiments, the radial proportion of the reverse groove 102 is 0.1-0.15, and the radial proportion of the fan-shaped main groove 101 is 0.6-0.8.
[0032] Specifically, the radial proportion of the reverse groove 102 is 0.1 to 0.15, that is, the ratio of the width of the reverse groove 102 along the radial direction to the width of the sealing ring surface along the radial direction is in the range of 0.1 to 0.15, which can ensure the pumping capacity of the low-pressure side fluid; the radial proportion of the fan-shaped main groove 101 is 0.6 to 0.8, that is, the ratio of the width of the fan-shaped main groove 101 along the radial direction to the width of the sealing ring surface along the radial direction is in the range of 0.6 to 0.8, which can ensure the stability of the fluid film and the sealing effect of the mechanical sealing device.
[0033] In some embodiments, the depth of a single stepped groove 1011 is 2 to 5 μm. The stepped groove 1011 within this depth range is convenient for laser processing and has good sealing performance. The depth of the reverse groove 102 is 15 to 25 μm, which is a reasonable design.
[0034] In some embodiments, the radial groove wall line of the stepped groove 1011 is a straight line, an arc line, or a spiral line.
[0035] Specifically, the laser-processable primary and secondary double-row shallow groove mechanical seal end face structure 1000 of the present invention is applicable to shaft end seals of various rotating machinery such as pumps, compressors, agitators, and reactors. The radial groove wall line of the stepped groove 1011 can be selected according to actual needs, providing wide applicability.
[0036] In some embodiments, as shown in FIG2 , the helix angle of the helix is 80° to 90°, which can increase the dynamic pressure effect of the high-pressure side stepped groove 1011 and thereby improve the bearing capacity of the sealing ring. Through reasonable design, the leakage rate can be maintained within a relatively stable range under variable speed.
[0037] In some embodiments, as shown in FIG3 , the curvature of the inner wall line of the circumferential groove of the stepped groove 1011 is greater than or equal to the curvature of the sealing ring.
[0038] Specifically, the curvature of the inner wall line of the circumferential groove of the stepped groove 1011 is greater than or equal to the curvature of the sealing ring. When the curvature of the inner wall line of the circumferential groove of the stepped groove 1011 is greater than the curvature of the sealing ring, the center of the inner wall line of the circumferential groove of the stepped groove 1011 does not coincide with the center of the sealing ring, but is offset by a certain distance in the radial direction of the sealing ring. Through reasonable design, the static pressure effect of the high-pressure side stepped groove 1011 can be adjusted.
[0039] In some embodiments, the radial groove wall line of the reverse groove 102 is a logarithmic spiral line, an Archimedean spiral line, a straight line, or a circular arc line.
[0040] Specifically, the laser-processable primary and secondary double-row shallow groove mechanical seal end face structure 1000 of the present invention is applicable to shaft end seals of various rotating machinery such as pumps, compressors, agitators, and reactors. The radial groove wall line of the reverse groove 102 can be selected according to actual needs, thus providing wide applicability.
[0041] In some embodiments, the number of fan-shaped main grooves 101 is 12 to 24, which can ensure the sealing effect of the mechanical sealing device; the number of stepped grooves 1011 in a single fan-shaped main groove 101 is 8 to 12, and the more stepped grooves 1011 there are, the better the enhancement effect on the static pressure effect, which can ensure the stability of the fluid film; the number of reverse grooves 102 is 48 to 96, which can ensure the ability of the reverse groove 102 to pump fluid.
[0042] In some embodiments, in the radial direction of the sealing ring end face, a first dam area 103 is formed between the annular area where the fan-shaped main groove 101 is located and the annular area where the reverse groove 102 is located, and a second dam area 104 is formed on the inner side of the annular area where the reverse groove 102 is located; in the circumferential direction of the sealing ring end face, a first weir area 105 is formed between two adjacent fan-shaped main grooves 101, and a second weir area 106 is formed between two adjacent reverse grooves 102.
[0043] Specifically, the first dam area 103 can separate the fan-shaped main groove 101 and the reverse groove 102; when the reverse groove 102 pumps the fluid radially and tangentially, the second dam area 104 and the second weir area 106 can play a throttling role, thereby increasing the fluid pressure on the low-pressure side, thereby effectively reducing sealing leakage.
[0044] Throughout this specification, references to terms such as "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" indicate that the specific features, structures, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
[0045] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to the embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the claims and their equivalents.
Claims
1. A main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing, characterized in that, It includes a double-row groove structure symmetrically distributed at the center on the end face of the sealing ring. The double-row groove structure includes a plurality of fan-shaped main grooves and a plurality of reverse grooves. The plurality of fan-shaped main grooves are located on the high-pressure side of the end face of the sealing ring. Each fan-shaped main groove converges from the high-pressure side to the low-pressure side. Each fan-shaped main groove includes a plurality of stepped grooves distributed from the high-pressure side to the low-pressure side and suitable for laser processing. The depth of each fan-shaped main groove increases at equal intervals from the high-pressure side to the low-pressure side. The plurality of reverse grooves are located on the low-pressure side of the end face of the sealing ring, and the depth of each reverse groove remains unchanged.
2. The main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing according to claim 1, characterized in that, The size of a single reverse groove is smaller than that of a single fan-shaped main groove.
3. The main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing according to claim 2, characterized in that, The radial proportion of the reverse groove is 0.1 - 0.15, and the radial proportion of the fan-shaped main groove is 0.6 - 0.
8.
4. The main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing according to any one of claims 1-3, characterized in that, The groove depth of a single stepped groove is 2 - 5μm, and the groove depth of the reverse groove is 15 - 25μm.
5. The main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing according to any one of claims 1-4, characterized in that, The radial groove wall line of the stepped groove is a straight line, an arc line or a spiral line.
6. The main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing according to claim 5, characterized in that, The spiral angle of the spiral line is 80° - 90°.
7. The main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing according to any one of claims 1-5, characterized in that, The curvature of the circumferential groove inner wall line of the stepped groove is greater than or equal to the curvature of the sealing ring.
8. The main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing according to any one of claims 1-7, characterized in that, The radial groove wall line of the reverse groove is a logarithmic spiral line, an Archimedes spiral line, a straight line or an arc line.
9. The main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing according to any one of claims 1-8, characterized in that, The number of the fan-shaped main grooves is 12 - 24, the number of the stepped grooves in a single fan-shaped main groove is 8 - 12, and the number of the reverse grooves is 48 - 96.
10. The main and auxiliary double-row shallow groove mechanical seal end face structure suitable for laser processing according to any one of claims 1-9, characterized in that, In the radial direction of the end face of the sealing ring, a first dam area is formed between the circular ring area where the fan-shaped main grooves are located and the circular ring area where the reverse grooves are located, and a second dam area is formed inside the circular ring area where the reverse grooves are located; in the circumferential direction of the end face of the sealing ring, a first weir area is formed between two adjacent fan-shaped main grooves, and a second weir area is formed between two adjacent reverse grooves.
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