Recovery system, cell culture system, and recovery method

Abstract

A recovery system according to the present disclosure comprises: a wall that extends in the horizontal direction, partitions a clean space and an external space, and has a discharge port formed to penetrate therethrough in the up-down direction, the external space being located below the clean space and having a negative pressure with respect to the clean space; and a recovery device that is provided in the external space below the wall and recovers, from the clean space, a workpiece capable of containing a culture solution. The recovery device includes: an elevator having a platform on which the workpiece can be placed and that is movable in the up-down direction from the discharge port to a predetermined height in the external space; and a shelf that is positioned side by side with the elevator in a horizontal first direction and can store the workpiece placed on the platform. The platform is provided so that the platform can be positioned in the discharge port with a predetermined gap from the discharge port.

Description

Recovery system, cell culture system, and recovery method

[0001] This application claims priority to Japanese Patent Application No. 2023-219772, filed on December 26, 2023, the contents of which are incorporated herein by reference.

[0002] Patent Document 1 discloses a biomanufacturing device for cell culture.

[0003] Patent No. 6966049

[0004] Workpieces that have completed the cell culture process or that do not have sufficient culture performance are collected and discarded. In automating this collection process, it was necessary to avoid liquid transfer between workpieces due to splashing and internal contamination of the automated cell culture device.

[0005] The present disclosure has been made to solve the above-mentioned problems, and aims to provide a recovery system and a cell culture system that can automatically recover workpieces while suppressing internal contamination.

[0006] In order to solve the above problems, the recovery system of the present disclosure comprises a wall extending horizontally, separating a clean space from an external space located below the clean space and having a negative pressure relative to the clean space, and having an outlet formed therethrough in the vertical direction; and a recovery device located in the external space below the wall, which recovers work capable of containing culture medium from the clean space, the recovery device comprising an elevator on which the work can be placed and which has a base that can be moved vertically from the outlet to a predetermined height in the external space, and a shelf arranged alongside the elevator in a first horizontal direction and capable of storing the work on the base, the base being arranged so that it can be positioned within the outlet with a predetermined gap from the outlet.

[0007] The cell culture system according to the present disclosure includes the above-described recovery system, a clean bench that forms the clean space inside and performs dispensing operations on the work within the clean space, and an incubator that forms a culture area where culture operations are performed on the work.

[0008] The recovery method according to the present disclosure includes a wall extending in a horizontal direction, separating a clean space from an external space located below the clean space and having a negative pressure relative to the clean space, the wall having an outlet penetrating in a vertical direction, and a recovery device provided in the external space below the wall and recovering a workpiece capable of containing a culture medium from the clean space, the recovery device including an elevator having a base on which the workpiece can be placed and which can move in a vertical direction from the outlet to a predetermined height in the external space, and a recovery device arranged in a horizontal first direction with the elevator. a shelf capable of storing the workpiece on the pedestal, the pedestal being arranged so as to be able to be positioned within the discharge outlet with a predetermined gap from the discharge outlet, the recovery method using a recovery system including a preparation step of placing the pedestal within the discharge outlet with a predetermined gap from the discharge outlet and placing the workpiece on the pedestal, a lowering step of lowering the pedestal from the discharge outlet and arranging the shelf and the pedestal opposite each other in the horizontal first direction, and a storage step of storing the workpiece on the pedestal opposite the shelf in the horizontal first direction.

[0009] According to the recovery system, cell culture system, and recovery method of the present disclosure, the workpiece can be automatically recovered while suppressing internal contamination.

[0010] FIG. 1 is a schematic plan view showing a general configuration of a cell culture system according to an embodiment of the present disclosure. FIG. 2 is a view of a recovery system according to an embodiment of the present disclosure as viewed from a second horizontal direction. FIG. 3 is a plan view of a recovery system according to an embodiment of the present disclosure as viewed from the clean space side above. FIG. 4 is a front view of a shelf according to an embodiment of the present disclosure as viewed from the elevator side in a first horizontal direction. FIG. 5 is a view of a first tilt mechanism and a second tilt mechanism according to an embodiment of the present disclosure as viewed from a second horizontal direction. FIG. 6 is a functional block diagram of a control device according to an embodiment of the present disclosure. FIG. 7 is a flowchart showing the steps of a recovery method according to an embodiment of the present disclosure. FIG. 8 is a hardware configuration diagram according to an embodiment of the present disclosure.

[0011]

[0016] The present disclosure will be described in detail below with reference to the accompanying drawings. A cell culture system 100 according to the present embodiment, shown in Fig. 1, is a system that performs cell culture and post-culture cell analysis using a work unit 1 (see Fig. 2) as a processing unit, and these processes are performed, for example, unmanned and automatically.

[0012] 2 and 3, the work unit 1 has a work 2 capable of containing a culture solution and a work tray 3 on which the work 2 is placed. For example, a flask 2a is used as the work 2. When the work 2 is a flask 2a, a plurality of flasks 2a (for example, two in this embodiment) are placed on one work tray 3. The two flasks 2a and the work tray 3 constitute one work unit 1. The flask 2a contains cells and a culture solution containing a medium to which nutrients necessary for cell growth have been added. For example, a well plate or the like is used as the other work 2b (see FIG. 3).

[0013] <Cell Culture System> As shown in FIG. 1, the cell culture system 100 includes a first stocker 110, a second stocker 120, an incubator 130, a clean bench 140, and a pass box 150.

[0014] <First Stocker> The first stocker 110 is a facility for storing a plurality of work units 1. The area within the first stocker 110 is designated as a first storage area R1.

[0015] <Second Stocker> The second stocker 120 is provided adjacent to the first stocker 110. The second stocker 120 is provided with equipment such as a base on which the work unit 1 can be placed and a refrigerator / freezer in which the culture medium can be stored. The area within the second stocker 120 is designated as a second storage area R2.

[0016] <Incubator> The incubator 130 is a facility for growing cells in a culture solution. The incubator 130 has formed therein a culture area R3 where a culture operation is performed on the work 2. The atmosphere in the culture area R3 is controlled to a temperature, humidity, and carbon dioxide concentration suitable for cell culture.

[0017] <Clean bench> The clean bench 140 is a facility for performing various liquid manipulations and processes on the work unit 1. The clean bench 140 forms a clean space S1 inside, and a liquid manipulation area R4 inside the clean space S1 where dispensing operations and the like are performed on the work 2 (see FIG. 2). The liquid manipulation area R4 is a highly clean, sterile space (a bio-clean room). Air circulates within the liquid manipulation area R4 as a downflow (descending air current).

[0018] Various equipment such as a dispensing device, a filtering device, a sealing device, a waste liquid draining device, and a recovery system 10 (described later) are provided inside the clean bench 140. Outside the clean bench 140, a culture medium supplying device capable of supplying culture medium to the dispensing device, a cell analysis device capable of analyzing the culture medium dispensed by the dispensing device, and the like are provided.

[0019] Here, the clean bench 140 is disposed adjacent to the first stocker 110 and the second stocker 120. A first stocker door 110a is provided within the first stocker 110, separating the first storage area R1 from the liquid handling area R4. When the first stocker door 110a is in an open state, the first storage area R1 and the liquid handling area R4 are in a connected state, allowing the work unit 1 to move between these areas. When the first stocker door 110a is in a closed state, the first storage area R1 and the liquid handling area R4 are not in a connected state, and these areas are isolated from each other.

[0020] A second stocker door 120a is provided in the second stocker 120 to separate the second storage area R2 and the liquid handling area R4. When the second stocker door 120a is in an open state, the second storage area R2 and the liquid handling area R4 are in a connected state, allowing the work unit 1 to move between these areas. When the first stocker door 110a is in a closed state, the first storage area R1 and the liquid handling area R4 are not in a connected state, and these areas are isolated from each other.

[0021] <Pass Box> The pass box 150 is installed between the incubator 130 and the clean bench 140 so as to be in contact with them. The pass box 150 has a first pass door 150a and a second pass door 150b. When the first pass door 150a is open, the incubation area R3 and the area inside the pass box 150 are in communication with each other. When the second pass door 150b is open, the liquid handling area R4 and the area inside the pass box 150 are in communication with each other. Therefore, opening and closing the first pass door 150a and the second pass door 150b switches between an isolated state for the incubation area R3 and the liquid handling area R4 and a state where the work unit 1 can move between these areas. Note that the first pass door 150a and the second pass door 150b are never open at the same time. Therefore, the incubation area R3 and the liquid handling area R4 do not communicate with each other, and the atmospheric conditions of each area are maintained.

[0022] <Positive Pressure Maintaining Device> A positive pressure maintaining device 4 is provided in each of the first stocker 110, the second stocker 120, the incubator 130, and the clean bench 140. The positive pressure maintaining device 4 is, for example, a HEPA filter (High Efficiency Particulate Air Filter), and removes dirt, dust, and the like from the sucked outside air and introduces clean air into the room. By introducing the clean air, the air pressure inside the room becomes higher than the air pressure outside the room. In this way, each of the first stocker 110, the second stocker 120, the incubator 130, and the clean bench 140 is maintained at a positive pressure by the positive pressure maintaining device 4. In this embodiment, the air pressure in the first stocker 110 is maintained at the highest pressure (positive pressure) among the rooms.

[0023] <Transport Device> A transport robot that can move horizontally, for example, is provided as a transport device in each of the first storage area R1, second storage area R2, culture area R3, and liquid handling area R4. This allows the work unit 1 to move between each area. The opening and closing of each door is coordinated with the operation of the transport robot, allowing the work unit 1 to move between each area.

[0024] <Detailed Structure of Clean Bench> Next, a detailed structure of the clean bench 140 will be described. The clean bench 140 is maintained at a positive pressure by the above-mentioned positive pressure maintaining device 4 (HEPA filter), and serves as a clean space S1 with little dust. The clean bench 140 includes a recovery system 10 that recovers unnecessary workpieces 2.

[0025] 2 to 4, the recovery system 10 includes the above-described positive pressure maintenance device 4, a wall 11, and a recovery device 20. Hereinafter, one of the horizontal directions perpendicular to the up-down direction Dv will be referred to as the "horizontal first direction Dh1," and the horizontal direction intersecting with the horizontal first direction Dh1 will be referred to as the "horizontal second direction Dh2." In this embodiment, the horizontal first direction Dh1 and the horizontal second direction Dh2 are perpendicular to each other.

[0026] <Wall> The wall 11 is part of the bottom wall of the clean bench 140 and extends horizontally. The wall 11 separates the above-mentioned clean space S1 from the external space S2 located below the clean space S1. The clean space S1 is maintained at a positive pressure by the positive pressure maintenance device 4. As a result, the external space S2 below the wall 11 is at a negative pressure relative to the clean space S1 above the wall 11. The wall 11 is formed with an exhaust port 12 that penetrates the wall 11 in the vertical direction Dv. Work trays 3 containing workpieces 2 that are no longer needed in the clean bench 140 are discharged from the clean space S1 to the external space S2 through the exhaust port 12. The exhaust port 12 is formed in a rectangular shape extending in the horizontal second direction Dh2 when viewed from above.

[0027] <Recovery Device> The recovery device 20 recovers the work unit 1 from the clean space S1. The recovery device 20 is provided in the external space S2 below the wall 11. The recovery device 20 is provided in the clean bench 140 at a position separated from the first stocker 110, the second stocker 120, and the incubator 130. The recovery device 20 includes an elevator 30, a shelf 40, and a control device 50. The elevator 30 and the shelf 40 are arranged opposite each other in the horizontal first direction Dh1. In the following description, the direction from the elevator 30 toward the shelf 40 in the horizontal first direction Dh1 is referred to as the front, and the direction from the shelf 40 toward the elevator 30 in the horizontal first direction Dh1 is referred to as the rear.

[0028] <Elevator> The elevator 30 is disposed below the discharge port 12. The elevator 30 includes a base 31, a movement mechanism 32, and a first tilt mechanism .

[0029] <Base> The base 31 is formed in the shape of a rectangular plate extending in the horizontal second direction Dh2. A plurality of work units 1 can be placed on the base 31, arranged in the horizontal second direction Dh2. The base 31 is installed so as to be movable in the vertical direction Dv from the discharge outlet 12 to a predetermined height in the external space S2. The base 31 in this embodiment is formed in the same shape as the discharge outlet 12 when viewed from above. The base 31 is positioned within the discharge outlet 12 with a predetermined gap S3 from the discharge outlet 12, and blocks most of the discharge outlet 12. A stopper 36 protruding upward is provided at the rear end of the base 31. The stopper 36 prevents the work units 1 from falling backward. The stopper 36 prevents the work units 1 placed on the base 31 from falling backward.

[0030] <Moving Mechanism> The moving mechanism 32 moves the base 31 in the up-down direction Dv. The moving mechanism 32 includes a guide 32 a and an actuator 33 .

[0031] The guide 32a extends in the vertical direction Dv. The guide 32a is positioned at the rear end of the discharge port 12 when viewed from above. The upper end of the guide 32a is located within the discharge port 12. Fixed brackets 35 are provided at the upper and lower ends of the guide 32a. The fixed brackets 35 are positioned to protrude rearward from the guide 32a. The fixed bracket 35 at the upper end of the guide 32a secures the guide 32a to the wall 11. The fixed bracket 35 at the lower end of the guide 32a secures the guide 32a to a bottom wall 5 located below the recovery device 20. The bottom wall 5 is positioned above the floor and supported by legs 6 extending upward from the floor. The actuator 33 moves vertically along the guide 32a. A base 31 and a first tilting mechanism 34 (described later) are attached to the actuator 33 as an integrated unit.

[0032] <First Tilt Mechanism> The first tilt mechanism 34 changes the first tilt angle θ1 of the base 31 with respect to the first horizontal direction Dh1. The first tilt mechanism 34 moves together with the base 31 in the up-down direction Dv along the guide 32a by the power of the actuator 33. As shown in FIG. 5 , the first tilt mechanism 34 has a support bracket 37 and a cylinder 38.

[0033] The support bracket 37 is provided to protrude forward from the actuator 33. The upper end of the support bracket 37 extends in the horizontal first direction Dh1. The base 31 is placed on the support bracket 37. The support bracket 37 is installed so as to be movable together with the base 31 in the up-down direction Dv along the guide 32a by the power of the actuator 33. The front end of the base 31 is attached to the front end of the support bracket 37 via an attachment piece 31a. The base 31 is installed so as to be rotatable about a first rotation axis O1 that passes through the attachment piece 31a and extends in the horizontal second direction Dh2.

[0034] The cylinder 38 is attached to the support bracket 37 and is located below the base 31. The cylinder 38 extends in the vertical direction Dv and is tilted so that it is positioned further rearward as it extends upward. The tip of the cylinder 38 is connected to the rear end of the base 31. The cylinder 38 extends and contracts in the vertical direction Dv. As the cylinder 38 extends and contracts, the base 31 rotates around the first rotation axis O1, and the base 31 tilts with respect to the horizontal first axis. In this manner, the first tilting mechanism 34 can adjust the first tilt angle θ1 of the base 31 with respect to the horizontal first direction Dh1 by extending and contracting the cylinder 38. Note that FIG. 5 illustrates a case in which the cylinder 38 extends and the base 31 tilts so that the rear end of the base 31 is positioned upward. However, the base 31 may also tilt so that the cylinder 38 retracts and the front end of the base 31 is positioned downward.

[0035] 2 to 4 , the shelf 40 is placed on the bottom wall 5 and is arranged alongside the elevator 30 in the first horizontal direction Dh1. The shelf 40 is located forward of the discharge port 12. The shelf 40 is capable of storing the work units 1 on the bases 31. The shelf 40 has a casing 41, a mounting plate 42, a second tilting mechanism 43, and a roller mat 44.

[0036] <Casing> The casing 41 has a bottom plate 41a and partition plates 41b. The bottom plate 41a is arranged to extend horizontally on the bottom wall 5. The bottom plate 41a is formed in a rectangular shape with one side in the horizontal first direction Dh1 when viewed from the vertical direction Dv. The partition plates 41b are provided on the upper surface of the bottom plate 41a and extend in the vertical direction Dv and the horizontal first direction Dh1. A plurality of partition plates 41b are provided at intervals in the horizontal second direction Dh2. Each partition plate 41b is formed in a rectangular shape with one side in the horizontal first direction Dh1 when viewed from the horizontal second direction Dh2.

[0037] <Placement Plate> The placement plate 42 is formed in the shape of a rectangular plate extending in the horizontal first direction Dh1. A work unit 1 is placed on the placement plate 42. A plurality of placement plates 42 are arranged between adjacent partition plates 41b at intervals in the vertical direction Dv. That is, a plurality of placement plates 42 are provided lined up in the vertical direction Dv and the horizontal second direction Dh2. Each placement plate 42 extends in the horizontal first direction Dh1 to an extent that multiple workpieces 2 can be placed thereon. A storage chamber 46 is formed by these multiple placement plates 42 and the casing 41. The storage chamber 46 extends in the horizontal first direction Dh1 and is capable of storing multiple work units 1. The multiple storage chambers 46 are formed in a lattice pattern when viewed from the horizontal first direction Dh1.

[0038] Furthermore, a stopper 42a that protrudes upward is provided at the front end of the mounting plate 42. The stopper 42a prevents the work unit 1 placed on the mounting plate 42 from falling forward.

[0039] <Second Tilt Mechanism> As shown in Figure 5, the second tilt mechanism 43 changes the second tilt angle θ2 of the support plate 42 with respect to the horizontal first direction Dh1. The second tilt angle θ2 is preferably smaller than the first tilt angle θ1. The second tilt mechanism 43 has a motor 43a. The motor 43a is provided at the rear end of each support plate 42. The motor 43a rotates the support plate 42 around a second rotation axis O2 that passes through the motor 43a and extends in the horizontal second direction Dh2. This adjusts the second tilt angle θ2 of the support plate 42 with respect to the horizontal first direction Dh1 to an appropriate angle.

[0040] <Roller Mat> The roller mat 44 is provided on the upper surface of the mounting plate 42. The roller mat 44 has a plurality of rollers 45 aligned in a first horizontal direction Dh1. The rollers 45 are provided rotatably around a roller axis O3 extending in a second horizontal direction Dh2 perpendicular to the first horizontal direction Dh1.

[0041] <Control Device> The control device 50 controls the driving of various devices such as the moving mechanism 32, the first tilting mechanism 34, and the second tilting mechanism 43. For example, the control device 50 controls the first tilting mechanism 34 and the second tilting mechanism 43 according to the size and weight of the work unit 1.

[0042] 6, the control device 50 has functional units, namely, an elevator unit 51, a first tilt unit 52, and a second tilt unit 53. The elevator unit 51 drives the actuator 33 to raise and lower the base 31. The first tilt unit 52 extends and retracts the cylinder 38 to tilt the base 31. The second tilt unit 53 drives the motor 43a to tilt the mounting plate 42.

[0043] <Work Unit Recovery Method> Next, a method for recovering the work unit 1 will be described with reference to the flow of Fig. 6. The recovery method of this embodiment includes a preparation step S11, a lowering step S12, and a storage step S13.

[0044] In preparation step S11, the lifting unit 51 operates the actuator 33 to position the pedestal 31 with a predetermined gap S3 from the discharge port 12. The pedestal 31 installed inside the discharge port 12 blocks the discharge port 12. At this time, the upper surface of the pedestal 31 extends horizontally and is flush with the upper surface of the wall 11. Work units 1 that have been subjected to various liquid operations such as dispensing and analysis within the clean bench 140 and are no longer needed are transported to the recovery system 10 by a transport device. The transport device places this work unit 1 to be discarded on the pedestal 31. Multiple work units 1 are placed on the pedestal 31.

[0045] At this time, a predetermined gap S3 is left between the pedestal 31 and the exhaust port 12. Furthermore, the external space S2 below the wall 11 is at a negative pressure relative to the clean space S1 above the wall 11. Therefore, air in the clean space S1 is exhausted to the external space S2 below through the gap S3 between the pedestal 31 and the exhaust port 12. The downflow (descending air current) thus generated exhausts dust and the like in the clean space S1 through the gap S3 between the pedestal 31 and the exhaust port 12. As a result, even if the culture solution in the work 2 leaks due to vibration, for example, the leaked culture solution is exhausted to the external space S2 through the gap S3 between the pedestal 31 and the exhaust port 12.

[0046] After the preparation step S11, a lowering step S12 is performed. In the lowering step S12, the lifting unit 51 drives the actuator 33 to lower the base 31 from the exhaust port 12. At this time, the base 31 moves downward from the exhaust port 12, and the exhaust port 12 is completely opened. This increases the downflow (downward air current) from the clean space S1 to the external space S2 through the exhaust port 12. This downflow prevents dust and the like from entering the upper clean space S1 from the external space S2.

[0047] If the vibration transmitted to the work unit 1 is large when the pedestal 31 descends, the cylinder 38 may be contracted to tilt the pedestal 31 so that the rear end of the pedestal 31 is positioned lower than the front end of the pedestal 31. This prevents the work unit 1 from falling toward the shelf 40 due to the vibration.

[0048] The base 31 is lowered to a position opposite the shelf 40 in the horizontal first direction Dh1. More specifically, the base 31 is lowered to the height of the target mounting plate 42 on which the work unit 1 is to be placed. As a result, the upper surface of the base 31 is positioned near the upper surface of the target mounting plate 42 and higher than the upper surface of the mounting plate 42. In this embodiment, the upper surface of the base 31 is positioned higher than the upper surface of the roller mat 44. At this time, the distance in the vertical direction Dv between the upper surface of the base 31 and the upper surface of the mounting plate 42 is equal to or less than the thickness of the base 31.

[0049] After the lowering step S12, a storing step S13 is performed. In the storing step S13, the work unit 1 on the base 31 facing the shelf 40 in the horizontal first direction Dh1 is stored on the shelf 40. Specifically, the storing step S13 is performed in the following procedure.

[0050] In the storage step S13, the first tilting unit 52 extends the cylinder 38, tilting the base 31 so that the front end of the base 31 is positioned lower than the rear end of the base 31. Then, the work unit 1 moves from the base 31 onto the mounting plate 42 (more precisely, onto the roller mat 44) under its own weight. At this time, the mounting plate 42 is tilted so that the front end of the mounting plate 42 is positioned lower than the rear end of the mounting plate 42. Therefore, the work unit 1 that has moved onto the mounting plate 42 also moves forward on the mounting plate 42 under its own weight. In this embodiment, the roller mat 44 is installed on the mounting plate 42, so the rollers 45 rotate and the work unit 1 slides down smoothly. At this time, the first tilting unit 52 controls the cylinder 38 to adjust the first tilt angle θ1 of the base 31 with respect to the horizontal first direction Dh1, and the second tilting unit 53 controls the motor 43a to adjust the second tilt angle θ2 of the mounting plate 42 with respect to the horizontal first direction Dh1. The second tilt angle θ2 of the mounting plate 42 with respect to the first horizontal direction Dh1 is adjusted to be smaller than the first tilt angle θ1 of the base 31 with respect to the first horizontal direction Dh1.

[0051] When the work unit 1 moves to the front end of the mounting plate 42, it hits the stopper 42a and stops. In this way, multiple work units 1 are stored in the storage chamber 46 in order, starting from the back of the storage chamber 46 on the stopper 42a side. By following the above procedure, work units 1 are stored in all of the storage chambers 46. These work units 1 are then collected, for example, manually by an operator. By following the above procedure, the collection of unnecessary work units 1 is completed.

[0052] <Effects> In this embodiment, the recovery system 10 includes a wall 11 and a recovery device 20. The wall 11 extends horizontally and separates the clean space S1 from an external space S2 located below the clean space S1 and having a negative pressure relative to the clean space S1. The wall 11 is formed with an outlet 12 penetrating in the vertical direction Dv. The recovery device 20 is provided in the external space S2 below the wall 11 and recovers, from the clean space S1, a work unit 1 on which a culture medium-containing work unit 1 is installed. The recovery device 20 includes an elevator 30 and a shelf 40. The elevator 30 has a base 31 on which the work unit 1 can be placed and which can move in the vertical direction Dv from the outlet 12 to a predetermined height in the external space S2. The shelf 40 is arranged alongside the elevator 30 in the horizontal first direction Dh1 and is capable of storing the work unit 1 on the base 31. The base 31 is provided so as to be able to be placed inside the discharge port 12 with a predetermined gap S3 from the discharge port 12 .

[0053] The pedestal 31 of the elevator 30 is placed within the discharge port 12, and the work unit 1 in the clean space S1 is placed on the pedestal 31. The pedestal 31 is then lowered and the work unit 1 is stored on the shelf 40. This allows the work unit 1 that is no longer needed in the clean space S1 to be automatically collected. The pedestal 31 is also placed within the discharge port 12 with a predetermined gap S3 from the discharge port 12, and blocks the discharge port 12. Furthermore, the external space S2 is under negative pressure relative to the clean space S1. Therefore, even if the culture medium unintentionally spills from the work 2 in the clean space S1, the spilled culture medium is sucked into the external space S2 through the gap S3 between the pedestal 31 and the discharge port 12. Furthermore, even if the base 31 on which the work unit 1 is placed is lowered to store the work unit 1 on the shelf 40, the external space S2 is at a negative pressure relative to the clean space S1, so the air flow from the clean space S1 toward the external space S2 at the exhaust port 12 increases, and the intrusion of foreign matter from the external space S2 into the clean space S1 is suppressed. Therefore, according to this embodiment, internal contamination of the clean space S1 can be suppressed.

[0054] The elevator 30 further includes a first tilt mechanism 34 that can change a first tilt angle θ1 of the base 31 with respect to the first horizontal direction Dh1.

[0055] As a result, when moving the work unit 1 from the pedestal 31 to the shelf 40, the work unit 1 can be moved by its own weight in the horizontal first direction Dh1 simply by tilting the pedestal 31. At this time, by adjusting the first tilt angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1 to an appropriate angle, it is possible to reduce vibrations during movement of the work unit 1 and suppress splashing of liquid from the work unit 1. Therefore, internal contamination of the clean space S1 can be further suppressed.

[0056] The shelf 40 has a loading plate 42 that extends in a horizontal first direction Dh1 and on which the work unit 1 is placed, and a second tilting mechanism 43 that can change the second tilt angle θ2 of the loading plate 42 relative to the horizontal first direction Dh1.

[0057] As a result, the work unit 1 on the pedestal 31 can be moved onto the loading plate 42 of the shelf 40, and by simply tilting the storage plate, the work unit 1 can be moved by its own weight in the horizontal first direction Dh1, and can be moved to the back of the shelf 40. At this time, by adjusting the second tilt angle θ2 of the loading plate 42 with respect to the horizontal first direction Dh1 to an appropriate angle, it is possible to reduce vibrations when the work unit 1 is moved and suppress splashing of liquid from the work unit 1. This makes it possible to further suppress internal contamination of the clean space S1.

[0058] The shelf 40 has a plurality of mounting plates 42, and each mounting plate 42 extends in the horizontal first direction Dh1 to an extent that a plurality of work units 1 can be placed thereon.

[0059] This allows a plurality of work units 1 to be stored on the shelf 40. Therefore, after a plurality of work units 1 are stored on the shelf 40 up to the storage limit, these plurality of work units 1 can be removed collectively from the shelf 40. Therefore, the efficiency of collecting the work units 1 can be improved.

[0060] The shelf 40 further includes a roller mat 44 provided on the upper surface of the mounting plate 42 and having a plurality of rollers 45 aligned in a horizontal first direction Dh1. The rollers 45 are rotatable about a roller axis O3 extending in a horizontal second direction Dh2 perpendicular to the horizontal first direction Dh1.

[0061] As a result, when the mounting plate 42 is tilted with the work unit 1 placed on it, the roller 45 unit rotates due to the weight of the work unit 1. As a result, the second tilt angle θ2 of the mounting plate 42 with respect to the horizontal first direction Dh1 can be minimized, and the work unit 1 can be moved smoothly in the horizontal first direction Dh1 by the rotation of the roller 45 unit.

[0062] In the lowering step S12, the base 31 is lowered so that the upper surface of the base 31 is positioned near the upper surface of the mounting plate 42 and above the upper surface of the mounting plate 42. In the storing step S13, the base 31 is tilted downward as it approaches the mounting plate 42 in the horizontal first direction Dh1, and the mounting plate 42 is tilted downward as it moves away from the base 31 in the horizontal first direction Dh1.

[0063] In this embodiment, by simply tilting the base 31 and the mounting plate 42, the work unit 1 on the base 31 can be smoothly moved onto the mounting plate 42 by the weight of the work unit 1. Therefore, it is possible to stably collect the work unit 1 while suppressing splashing.

[0064] In the storing step S13, the base 31 and the placement plate 42 are tilted so that the first tilt angle θ1 is greater than the second tilt angle θ2.

[0065] In this embodiment, the work unit 1 can be moved more smoothly from the base 31 to the mounting plate 42. Therefore, splashing can be further suppressed when the work unit 1 is collected.

[0066] <Hardware Configuration> The control device 50 of the above-described embodiments and modifications is implemented in a computer 1100 shown in Fig. 8. Fig. 14 is a schematic block diagram showing the configuration of a computer according to each embodiment. The computer 1100 includes a processor 1110, a main memory 1120, a storage 1130, and an interface 1140.

[0067] The operation of each of the above functional units of the control device 50 is stored in the form of a program in the storage 1130. The processor 1110 reads the program from the storage 1130, loads it into the main memory 1120, and executes the above processing in accordance with the program. The processor 1110 also allocates a storage area in the main memory 1120 in accordance with the program.

[0068] The program may be for realizing some of the functions to be performed by the computer 1100. For example, the program may be combined with other programs already stored in the storage 1130 or other programs implemented in other devices to perform the functions. Furthermore, the computer 1100 may include a custom large-scale integrated circuit (LSI) such as a programmable logic device (PLD) in addition to or instead of the above configuration. Examples of PLDs include programmable array logic (PAL), generic array logic (GAL), complex programmable logic device (CPLD), and field programmable gate array (FPGA). In this case, some or all of the functions realized by the processor 1110 may be realized by the integrated circuit.

[0069] Examples of storage 1130 include a magnetic disk, a magneto-optical disk, and a semiconductor memory. Storage 1130 may be an internal medium directly connected to the bus of computer 1100, or an external medium connected to computer 1100 via interface 1140 or a communication line. Furthermore, when this program is distributed to computer 1100 via a communication line, computer 1100 that receives the program may load the program into main memory 1120 and execute the above-mentioned processing. Storage 1130 may also be a non-transitory tangible storage medium.

[0070] The program may also be a program for realizing part of the above-described functions. Furthermore, the program may be a so-called differential file (differential program) that realizes the above-described functions in combination with another program already stored in storage 1130.

[0071] <Other Embodiments> Although the embodiments of the present disclosure have been described in detail above with reference to the drawings, the specific configuration is not limited to this embodiment, and design changes and the like are also included within the scope that does not deviate from the gist of the present disclosure.

[0072] In the above embodiment, the case where the work unit 1 is used as the processing unit has been described, but the work 2 may not be accommodated in the work tray 3 and may be processed as the processing unit.

[0073] In the above-described embodiment, the base 31 is formed long in the horizontal second direction Dh2, and multiple work units 1 are placed on the base 31, but this is not limited to this. The base 31 may be designed to be shorter in the horizontal second direction Dh2 than in this embodiment, and to be approximately the width of one work unit 1, so that the work units 1 can be moved individually in the up-down direction Dv. In this case, for example, multiple guides 32a are provided at intervals in the horizontal second direction Dh2. One actuator 33 and one support bracket 37 are provided for each guide 32a.

[0074] <Additional Notes> The recovery system 10, the cell culture system 100, and the recovery method described in each embodiment can be understood, for example, as follows.

[0075] (1) The recovery system 10 of the first aspect includes a wall 11 extending horizontally and separating a clean space S1 from an external space S2 located below the clean space S1 and having a negative pressure relative to the clean space S1, the wall 11 having an outlet 12 formed therethrough in the vertical direction Dv, and a recovery device 20 provided in the external space S2 below the wall 11 and recovering a work 2 capable of containing a culture medium from the clean space S1. The recovery device 20 includes an elevator 30 having a base 31 on which the work 2 can be placed and which can move in the vertical direction Dv from the outlet 12 to a predetermined height in the external space S2, and a shelf 40 arranged alongside the elevator 30 in a horizontal first direction Dh1 and capable of storing the work 2 on the base 31. The base 31 is arranged so that it can be positioned within the outlet 12 with a predetermined gap S3 from the outlet 12.

[0076] The pedestal 31 of the elevator 30 is placed inside the discharge port 12, and the workpiece 2 in the clean space S1 is placed on the pedestal 31. The pedestal 31 is then lowered and the workpiece 2 is stored on the shelf 40. This allows the unnecessary workpiece 2 in the clean space S1 to be automatically collected. The pedestal 31 is also placed inside the discharge port 12 with a predetermined gap S3 from the discharge port 12, and blocks the discharge port 12. Furthermore, the external space S2 is under negative pressure relative to the clean space S1. Therefore, even if the culture medium unintentionally spills from the workpiece 2 in the clean space S1, the spilled culture medium is sucked into the external space S2 through the gap S3 between the pedestal 31 and the discharge port 12. Furthermore, even if the pedestal 31 on which the workpiece 2 is placed is lowered to store the workpiece 2 on the shelf 40, the external space S2 is under negative pressure relative to the clean space S1, so the air flow from the clean space S1 toward the external space S2 increases at the exhaust port 12, and foreign matter is prevented from entering the clean space S1 from the external space S2. Therefore, according to this embodiment, internal contamination of the clean space S1 can be prevented.

[0077] (2) A second aspect of the recovery system 10 is the recovery system 10 of (1), wherein the elevator 30 may further have a first tilting mechanism 34 capable of changing the first tilt angle θ1 of the base 31 relative to the horizontal first direction Dh1.

[0078] As a result, when moving the workpiece 2 from the pedestal 31 to the shelf 40, the workpiece 2 can be moved in the horizontal first direction Dh1 by its own weight simply by tilting the pedestal 31. At this time, by adjusting the first tilt angle θ1 of the pedestal 31 with respect to the horizontal first direction Dh1 to an appropriate angle, it is possible to reduce vibrations during movement of the workpiece 2 and suppress splashing of the workpiece 2.

[0079] (3) A third aspect of the recovery system 10 is the recovery system 10 of (1) or (2), wherein the shelf 40 may have a loading plate 42 extending in the horizontal first direction Dh1 on which the work 2 is placed, and a second tilting mechanism 43 capable of changing the second tilt angle θ2 of the loading plate 42 relative to the horizontal first direction Dh1.

[0080] As a result, the workpiece 2 on the pedestal 31 can be moved onto the loading plate 42 of the shelf 40, and by simply tilting the storage plate, the workpiece 2 can be moved by its own weight in the horizontal first direction Dh1, and can be moved to the back of the shelf 40. At this time, by adjusting the second tilt angle θ2 of the loading plate 42 with respect to the horizontal first direction Dh1 to an appropriate angle, it is possible to reduce vibrations during movement of the workpiece 2 and suppress splashing of the workpiece 2.

[0081] (4) A fourth aspect of the recovery system 10 is the recovery system 10 of (3), wherein the shelf 40 has a plurality of the above-described loading plates 42, and each of the above-described loading plates 42 may extend in the horizontal first direction Dh1 to an extent that multiple workpieces 2 can be placed on it.

[0082] This allows a plurality of works 2 to be stored on the shelf 40.

[0083] (5) A fifth aspect of the recovery system 10 is the recovery system 10 of (3) or (4), wherein the shelf 40 further has a roller mat 44 provided on the upper surface of the loading plate 42 and having a plurality of rollers 45 arranged in the horizontal first direction Dh1, and the rollers 45 may be rotatably arranged around a roller axis O3 extending in a horizontal second direction Dh2 perpendicular to the horizontal first direction Dh1.

[0084] As a result, when the mounting plate 42 is tilted with the workpiece 2 placed on it, the rollers 45 rotate due to the weight of the workpiece 2. As a result, the second tilt angle θ2 of the mounting plate 42 with respect to the horizontal first direction Dh1 can be minimized, and the workpiece 2 can be smoothly moved in the horizontal first direction Dh1 by the rotation of the rollers 45.

[0085] (6) A sixth aspect of the cell culture system 100 includes a recovery system 10 of any one of (1) to (5), a clean bench 140 that forms the clean space S1 inside and performs dispensing operations on the work 2 within the clean space S1, and an incubator 130 that forms a culture area R3 that performs culture operations on the work 2.

[0086] (7) A seventh aspect of the recovery method includes a wall 11 that extends in a horizontal direction, partitions a clean space S1 from an external space S2 that is located below the clean space S1 and has a negative pressure relative to the clean space S1, and has a discharge port 12 that penetrates in a vertical direction Dv formed therein, and a recovery device 20 that is provided in the external space S2 below the wall 11 and recovers a work 2 that can contain a culture solution from the clean space S1, the recovery device 20 including an elevator 30 that can place the work 2 thereon and has a pedestal 31 that can move in the vertical direction Dv from the discharge port 12 to a predetermined height in the external space S2, and a lifting mechanism that is arranged alongside the elevator 30 in a horizontal first direction Dh1 and that lifts the work 2 from the pedestal 31. A recovery method using a recovery system 10, comprising: a shelf 40 capable of storing the work 2 on the base 31; and the base 31 being arranged so that it can be positioned within the discharge outlet 12 with a predetermined gap S3 from the discharge outlet 12, the recovery method including a preparation step S11 in which the base 31 is positioned within the discharge outlet 12 with a predetermined gap S3 from the discharge outlet 12 and the work 2 is placed on the base 31; a lowering step S12 in which the base 31 is lowered from the discharge outlet 12 and the shelf 40 and the base 31 are opposed to each other in the horizontal first direction Dh1; and a storage step S13 in which the work 2 on the base 31 opposed to the shelf 40 in the horizontal first direction Dh1 is stored on the shelf 40.

[0087] (8) The recovery method of the eighth aspect is the recovery method of (7), wherein the elevator 30 further has a first tilting mechanism 34 capable of changing the first tilt angle θ1 of the base 31 relative to the horizontal first direction Dh1, the shelf 40 has a loading plate 42 extending in the horizontal first direction Dh1 on which the work 2 is placed, and a second tilting mechanism 43 capable of changing the second tilt angle θ2 of the loading plate 42 relative to the horizontal first direction Dh1, and in the lowering step S12, the base 31 is lowered so that the upper surface of the base 31 is positioned near the upper surface of the loading plate 42 and above the upper surface of the loading plate 42, and in the storage step S13, the base 31 is tilted so that it is positioned downward as it approaches the loading plate 42 in the horizontal first direction Dh1, and the loading plate 42 is tilted so that it is positioned downward as it moves away from the base 31 in the horizontal first direction Dh1.

[0088] In this embodiment, the workpiece 2 on the base 31 can be smoothly moved onto the mounting plate 42 by the weight of the workpiece 2 itself, by simply tilting the base 31 and the mounting plate 42 .

[0089] (9) The recovery method of the ninth aspect is the recovery method of (8), and in the storage step S13, the base 31 and the loading plate 42 may be inclined so that the first tilt angle θ1 is greater than the second tilt angle θ2.

[0090] In this embodiment, the workpiece 2 can be moved more smoothly from the base 31 to the mounting plate 42 .

[0091] According to the recovery system, cell culture system, and recovery method of the present disclosure, the workpiece can be automatically recovered while suppressing internal contamination.

[0092] REFERENCE SIGNS LIST 1 Work unit 2 Work 2a Flask 2b Other work 3 Work tray 4 Positive pressure maintenance device 5 Bottom wall 6 Leg 10 Recovery system 11 Wall 12 Discharge port 20 Recovery device 30 Elevator 31 Base 31a Mounting piece 32 Movement mechanism 32a Guide 33 Actuator 34 First tilt mechanism 35 Fixing bracket 36 Stopper 37 Support bracket 38 Cylinder 40 Shelf 41 Casing 41a Bottom plate 41b Partition plate 42 Placement plate 42a Stopper 43 Second tilt mechanism 43a Motor 44 Roller mat 45 Roller 46 Storage chamber 50 Control device 51 Lifting section 52 First tilt section 53 Second tilt section 100 Cell culture system 110 First stocker 110a First stocker door 120 Second stocker 120a Second stocker door 130 Incubator 140 Clean bench 150 Pass box 150a First pass door 150b Second pass door 1100 Computer 1110 Processor 1120 Main memory 1130 Storage 1140 Interface Dv Up-down direction Dh1 First horizontal direction Dh2 Second horizontal direction O1 First rotation axis O2 Second rotation axis O3 Roller axis R1 First storage area R2 Second storage area R3 Cultivation area R4 Liquid handling area S1 Clean space S2 External space S3 Gap S11 Preparation step S12 Descent step S13 Storage step θ1 First tilt angle θ2 Second tilt angle

Claims

1. A recovery system comprising: a wall extending horizontally, partitioning a clean space and an external space located below the clean space and having a negative pressure with respect to the clean space, and having a discharge port penetrating in the vertical direction; a recovery device provided in the external space below the wall for recovering a work capable of accommodating a culture solution from the clean space; the recovery device includes an elevator having a pedestal on which the work can be placed and which is movable in the vertical direction from the discharge port to a predetermined height in the external space, and a shelf arranged side by side with the elevator in a first horizontal direction and capable of accommodating the work on the pedestal, and the pedestal is provided so as to be arranged in the discharge port with a predetermined gap from the discharge port.

2. The recovery system according to claim 1, wherein the elevator further has a first inclination mechanism capable of changing a first inclination angle of the pedestal with respect to the first horizontal direction.

3. The recovery system according to claim 1 or 2, wherein the shelf has a placement plate extending in the first horizontal direction on which the work is placed, and a second inclination mechanism capable of changing a second inclination angle of the placement plate with respect to the first horizontal direction.

4. The recovery system according to claim 3, wherein the shelf has a plurality of the placement plates, and each of the placement plates extends in the first horizontal direction to such an extent that a plurality of works can be placed.

5. The recovery system according to claim 3, wherein the shelf further has a roller mat provided on an upper surface of the placement plate and having a plurality of rollers arranged in the first horizontal direction, and the rollers are rotatably provided around a roller axis extending in a second horizontal direction orthogonal to the first horizontal direction.

6. A cell culture system comprising: a clean bench forming the clean space therein and performing a dispensing operation on the work in the clean space, and an incubator forming a culture area for performing a culture operation on the work, the cell culture system comprising the recovery system according to claim 1 or 2.

7. A recovery method using a recovery system, comprising: a wall extending horizontally, partitioning a clean space and an external space located below the clean space and having a negative pressure with respect to the clean space, and having a discharge port penetrating in the vertical direction; a recovery device provided in the external space below the wall for recovering a work capable of accommodating a culture solution from the clean space; the recovery device includes an elevator having a pedestal on which the work can be placed and which can move vertically from the discharge port to a predetermined height in the external space, and a shelf arranged side by side with the elevator in a first horizontal direction and capable of accommodating the work on the pedestal; the pedestal is provided so as to be arranged in the discharge port with a predetermined gap from the discharge port, the method comprising: a preparation step of arranging the pedestal in the discharge port with a predetermined gap from the discharge port and placing the work on the pedestal; a lowering step of lowering the pedestal from the discharge port and opposing the shelf and the pedestal in the first horizontal direction; and a storage step of storing the work on the pedestal opposed to the shelf in the shelf.

8. The recovery method according to claim 7, wherein the elevator further includes a first inclination mechanism capable of changing a first inclination angle of the pedestal with respect to the first horizontal direction, the shelf includes a placement plate extending in the first horizontal direction on which the work is placed, and a second inclination mechanism capable of changing a second inclination angle of the placement plate with respect to the first horizontal direction; in the lowering step, the pedestal is lowered so that the upper surface of the pedestal is in the vicinity of the upper surface of the placement plate and above the upper surface of the placement plate; in the storage step, the pedestal is inclined so as to be positioned downward as it approaches the placement plate in the first horizontal direction, and the placement plate is inclined so as to be positioned downward as it separates from the pedestal in the first horizontal direction.

9. The recovery method according to claim 8, wherein in the storage step, the pedestal and the placement plate are inclined so that the first inclination angle is larger than the second inclination angle.

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