Method for controlled multi-frequency irradiation of a surface, and corresponding system

Abstract

The present invention relates to a method for the controlled selective irradiation of a surface, in order to allow the irradiation of this surface with a view to obtaining a target effect, this method being implemented by a system comprising an emitter device and a controller device, the emitter device comprising a first emitter source and at least one second emitter source, these being configured to irradiate the surface with energy radiations respectively associated with first and second irradiation frequency ranges, the method comprising a step of irradiating the surface using the first and second emitter sources in order to obtain the target effect, this irradiation being controlled by the controller device so that the first emitter source emits energy radiation in the irradiation frequency range associated with this first emitter source, for a predetermined duration, and so that the second emitter source, independently of the first emitter source, emits energy radiation in the irradiation frequency range associated with this second emitter source, for a predetermined duration.

Description

[0001] DESCRIPTION

[0002] TITLE: Method for controlled multi-frequency irradiation of a surface, and corresponding system

[0003] Technical field of the invention

[0004] The present invention relates to the general field of irradiation of surfaces by energetic radiation.

[0005] The invention relates more particularly to a method for controlled multi-frequency irradiation of a surface, as well as a system configured to implement this method.

[0006] Technical background

[0007] The general principle of the process of irradiating surfaces with energetic radiation is based on the emission of energetic radiation of all types, such as gamma, alpha, ultraviolet (UV) or infrared (IR) radiation, towards a surface, with the aim of obtaining a predetermined result at this surface. The surface in question may be, for example, a layer of material, and the predetermined result may be the polymerization of this layer of material, in particular with a view to solidifying it. Another application for such an irradiation process may be the disinfection and / or sterilization of a surface by irradiation, by eradicating the germs or bacteria present on this surface. Other applications may also concern the fields of cosmetology, aesthetics, medicine and paramedical fields.

[0008] In particular, systems and methods for irradiating a surface are known, particularly adapted to the field of additive manufacturing, and configured to emit at least two distinct types of energy, for example in order to obtain the complete polymerization of an irradiated layer of material. These multi-energy systems and methods can also be used in the field of surface disinfection.

[0009] However, currently implemented multi-energy irradiation systems are disadvantageously complex and bulky / cumbersome. Indeed, they typically comprise several energy-emitting devices, each of which emits energy at a particular frequency, each of these frequencies being necessary to ensure the complete implementation of the irradiation process.

[0010] Also, according to a known specific configuration, these systems configured to emit at least one energy in several frequencies implement such multi-frequency energy irradiation through broad spectrum emitters using Mercury arc lamp technology. However, these Mercury arc lamps have many disadvantages. Their manufacture is dangerous, because it involves the use of Mercury, which is a toxic compound, thus having a negative impact on the health of users and the environment. In addition, the repair index of these lamps is poor since their repair is impossible, and their recyclability is very complex and dangerous.

[0011] Another disadvantage of these multi-energy irradiation systems is that the lifetime of mercury arc lamps is short, and their luminous efficacy is low. This implies the implementation of many emitting devices (for example, lamps) in an irradiation system, like the bulky multi-energy irradiation systems presented above, resulting in very high energy consumption, inevitably generating harmful and costly energy losses.

[0012] An additional disadvantage of broad spectrum emission sources is the imposed quantitative correlation of each frequency with no possibility of variation other than the use of filters.

[0013] There is therefore a need to provide a multi-energy irradiation method making it possible to implement in a controlled manner all the steps of the irradiation method, involving several irradiation frequencies, in a simplified manner, while guaranteeing irradiation efficiency, i.e. making it possible to obtain the expected result at the level of the irradiated surface, at least equivalent to that obtained by the implementation of known multi-energy irradiation methods.

[0014] There is also a need to provide a process that has a positive impact on the environment, through the use of a greener energy emitting source, while reducing its implementation costs.

[0015] There is also a need to decouple frequency control from each transmitted frequency.

[0016] Summary of the invention

[0017] For this purpose, the invention proposes a method for controlled multi-frequency irradiation of a surface to enable the irradiation of this surface in order to obtain a target effect, this method being implemented by a controlled multi-frequency irradiation system comprising an emitting device, a controller device and an analysis device, the emitting device comprising a first emitting source comprising at least one emitting element, and at least one second emitting source comprising at least one emitting element, the first and second emitting sources being configured to irradiate the surface with energetic radiations respectively associated with first and second irradiation frequency ranges, this method comprising the following steps:

[0018] - input into the controller device:

[0019] -- of first and second predetermined energy parameters, respectively comprising energy thresholds and respectively associated with at least two irradiation frequencies making it possible to obtain the target effect,

[0020] -- of time parameters respectively associated with the predetermined energy parameters and corresponding to durations, and

[0021] -- of the target effect to be obtained;

[0022] - irradiation of the surface by the first and second emitting sources in order to obtain the target effect;

[0023] - analysis and recording in real time by the analysis device of the actual effect at the irradiated surface, and measurement and recording in real time by the analysis device of the actual energy generated on the surface by the energy radiation;

[0024] - transmission to the controller device, by the analysis device, of the actual effect analyzed and the actual energy;

[0025] - control of this irradiation by the controller device with a view to an emission by the first emitting source of an energetic radiation at the irradiation frequency associated with the first predetermined energetic parameter, in the irradiation frequency range associated with the first emitting source, during the duration associated with the first predetermined energetic parameter, and with a view to an emission by the second emitting source, independently of the first emitting source, of an energetic radiation at the irradiation frequency associated with the second predetermined energetic parameter, in the irradiation frequency range associated with the second emitting source, during the duration associated with the second predetermined energetic parameter, and also taking into account the actual effect and the actual energy, the actual effect being compared to the target effect and the actual energy being compared to the energetic thresholds, so that:

[0026] Bl- if the energy thresholds are not reached and the target effect is not obtained, the emission of energetic radiation on the surface continues, and the irradiation frequency and / or the duration of the energetic radiation are modulated in order to obtain the target effect;

[0027] B2- if the energy thresholds are reached but the target effect is not obtained, the emission of energy radiation on the surface continues, and the irradiation frequency and / or the duration of the energy radiation are modulated in order to obtain the target effect;

[0028] B3- if the energy thresholds are reached and the target effect is obtained, the emission of energy radiation on the surface is stopped;

[0029] B4- if the energy thresholds are not reached but the target effect is obtained, the emission of energetic radiation on the surface is stopped.

[0030] Thus, the method according to the invention makes it possible to irradiate a surface with several distinct irradiation frequencies, with dose control by frequency range, via the use of a system comprising a single emitting device. Such a system according to the invention, and in particular such an emitting device, is simple to implement, and its impact on the environment and the health of users is much less harmful than the irradiation systems of the prior art. Indeed, in particular when these prior systems implement a fixed spectrum using an emitter including a Mercury lamp, necessary to obtain the expected effect (for example, to completely polymerize a surface), they are particularly polluting.In addition to being energy-intensive, these earlier broad-spectrum systems are not in line with the guidelines for the use of Mercury: it is therefore necessary to obtain a usage exemption for their use, as there is currently no technological solution available to replace them. Such an approach is very inconvenient for users.

[0031] Furthermore, the independent control of the different emitting sources of the emitting device of the invention, which can irradiate concomitantly, advantageously allows for energy savings. Indeed, the irradiation system as a whole can be activated over a shorter period if the different irradiation frequencies are emitted at the same time on the surface. For example, LED or laser type emitting technologies can be used for the emitting device of the invention, the latter having an energy consumption versus radiation efficiency that is significantly higher than Mercury lamp technology.

[0032] The system according to the invention therefore advantageously makes it possible to eliminate the use of such Mercury lamps, and to replace them with a single emitting device equipped with several emitting sources, each source being associated with a precise range of irradiation frequency. It also makes it possible, more generally, to eliminate the use, in prior multi-frequency irradiation systems, of a multitude of emitting devices, each being associated with a precise frequency.

[0033] Furthermore, the irradiation system implemented in the invention allows homogeneity of the irradiation at the level of the irradiated surface, because it is possible to distribute the emitting elements of each emitting source homogeneously in the emitting device, so that each emitting source covers the entire surface to be irradiated.

[0034] Furthermore, the method according to the invention makes it possible to control the irradiation in real time of the irradiated surface, taking into account the target effect which must theoretically be obtained by several predetermined irradiation frequencies, but also taking into account the actual effect obtained at this surface. This method therefore allows an optimized irradiation, which is controlled on demand according to what is actually obtained at the surface studied. Thus, and unlike the irradiation methods of the prior art, according to the method of the invention, the predetermined energy parameters, which serve as a guide for conducting the irradiation process, are not necessarily reached when this is not useful: in fact, this method according to the invention is capable of determining that the irradiation can be stopped because the target effect is already obtained, although the basic energy parameters entered in the controller device are not reached.Conversely, it may be determined that the actual irradiation of the surface must continue, although the predetermined parameters have already been achieved, because the expected effect could not be achieved on the basis of these predetermined parameters.

[0035] The modulation of the emitting sources in real time, and in particular the stopping of the emission of energetic radiation as soon as it is determined that the target effect is obtained, advantageously makes it possible to reduce the energy and financial losses usually linked to conventional irradiation processes, since the continuous and unnecessary irradiation of the surface for which the target effect is already achieved is limited, or even eliminated.

[0036] Additionally, the method according to the invention, in addition to taking into account the actual effect obtained at the irradiated surface, is capable of taking into account the actual energy generated at this surface. This actual energy parameter is an additional guide to further optimize the control of the different emitting sources on demand, to obtain the expected target effect in the most efficient, rapid and precise way possible.

[0037] According to one embodiment, the method according to the invention further comprises the following steps, when the surface is deposited on a substrate:

[0038] - entry into the controller device of a maximum energy threshold associated with the substrate;

[0039] - measurement and recording in real time, by the analysis device, of the effective energy generated at the substrate level;

[0040] - transmission of the effective energy measurement to the controller device;

[0041] - real-time control of the emitting device by the controller device during the irradiation process, taking into account the measurement of the effective energy, the measurement of the effective energy being compared to the maximum energy threshold, so that, if the effective energy is greater than the maximum energy threshold, the power and / or intensity of the energetic radiation irradiating the surface are modulated to reduce the effective energy at the substrate level.

[0042] Thus, the method according to the invention is able to analyze the state of the area of ​​the surface which is irradiated (and which is for example a layer of material), and simultaneously to analyze the state of the substrate on which this surface is deposited. This method therefore advantageously makes it possible to irradiate an area of ​​a layer of a first material (the irradiated surface) by taking into account the state of a layer of a second material present in the environment of this first layer (the substrate), and to modulate this irradiation operation in order to preserve this second layer of material. For example, in the case where the layer of irradiated material is deposited on an electronic substrate, to form an electronic compound, this irradiation method taking into account the electronic substrate makes it possible to polymerize the layer of material on the surface and not to damage the electronic compound.

[0043] According to one embodiment, the first and second emitting sources each comprise a plurality of emitting elements, the controller device controlling each of the plurality of emitting elements independently of one another.

[0044] According to one embodiment, the emitting device is a matrix, and the emitting elements of the matrix are LEDs.

[0045] The use of LEDs as emitting elements of different irradiation frequencies allows for a very high robustness of the system, ensuring in particular several years of operation. Also, the irradiance is optimized immediately, because it is not necessary to provide a stabilization time for these LEDs. Furthermore, the LEDs are devices easy to integrate into the system of the invention, simple to implement and handle, and inexpensive.

[0046] According to one embodiment, the controller device is a Human-Machine interface.

[0047] Such an interface is easy to integrate into the system of the invention, and simple to implement and manipulate.

[0048] According to one embodiment, the energy radiation is chosen from visible light, infrared, gamma, ultraviolet, laser radiation, microwaves, X-rays, sound waves and convective or conductive thermal deployment.

[0049] The method according to the invention can thus advantageously be adapted to any type of irradiation, and can, according to at least one embodiment, combine them.

[0050] According to one embodiment, the analysis device is chosen from an image sensor, for example a camera, or a thermal and / or radiative imaging sensor associated with an image analysis module.

[0051] Thus, the analysis device implemented in the irradiation method according to the invention is capable both of measuring the actual energy at the irradiated surface, or even the actual energy at the zones adjacent to a target zone specifically irradiated at the surface, or even the actual energy at a substrate on which the irradiated surface is deposited, and of analyzing the progress of the actual effect at the target zone, while avoiding damaging it. It can therefore transmit this energy data to the controller device, which is then able to determine how to control the emitting device to achieve the predetermined energy parameters / thresholds and at the same time the expected target effect, and not to damage the substrate if it is present at the irradiated object.

[0052] According to a second object, the invention proposes a system for controlled multi-frequency irradiation of a surface of a product, this system implementing the controlled multi-frequency irradiation method as defined above, this system comprising: - an emitting device, comprising:

[0053] -- a first emitting source, comprising at least one emitting element, the first emitting source being configured to irradiate the surface with energy radiation associated with a first frequency range, and

[0054] -- at least one second emitting source, comprising at least one emitting element, the second emitting source being configured to irradiate the surface with energy radiation associated with a second frequency range;

[0055] - an analysis device, configured to measure the actual energy generated on the surface by the energy radiation, as well as to analyze the actual effect obtained at the irradiated surface; and

[0056] - a controller device, configured to receive:

[0057] -- first and second predetermined energy parameters, respectively comprising energy thresholds and respectively associated with at least two frequencies making it possible to obtain a target effect, as well as time parameters respectively associated with the predetermined energy parameters and corresponding to durations,

[0058] -- a target effect to be obtained,

[0059] -- the measurement of real energy, and

[0060] -- analysis of the actual effect, the controller device comprising means for comparing the energy thresholds with the actual energy and means for comparing the target effect with the actual effect, the controller device being further configured to control the first emitting source with a view to emitting energy radiation at the frequency associated with the first predetermined energy parameter, for the duration associated with the first predetermined energy parameter, and to control the second emitting source, independently of the first emitting source, with a view to emitting energy radiation at the frequency associated with the second predetermined energy parameter, for the duration associated with the second predetermined energy parameter, taking into account the actual effect and the actual energy.

[0061] This system has at least the same advantages as those presented in relation to the corresponding method. It corresponds to a closed loop, which is advantageously fully traceable. According to one embodiment, the analysis device is further configured to measure the effective energy at a substrate on which the surface has been deposited, and the controller device is further configured to receive a maximum energy threshold associated with the substrate, the controller device further comprising means for comparing the effective energy measurement with the maximum energy threshold.Thus, the system according to the invention is able to analyze the irradiated surface (layer of material) and simultaneously analyze the substrate on which it rests, and this in a precise manner, in order to allow real-time control of the irradiation by the emitting device making it possible to polymerize the layer of material on the surface without damaging the substrate, or even without damaging the element or compound which comprises this object layer of irradiated material / substrate.

[0062] According to one embodiment, the analysis device comprises:

[0063] - an analysis and recording means configured to analyze the actual effect obtained at the surface level and to transmit this actual effect to the controller device, and

[0064] - a measuring and recording means configured to measure the actual energy generated on the surface by the energy radiation and to transmit this actual energy to the controller device.

[0065] According to one embodiment, this measuring and recording means is further configured to measure the effective energy at the substrate level and to transmit this effective energy to the controller device.

[0066] Brief description of the figures

[0067] Other characteristics and advantages of the invention will appear during the reading of the detailed description which follows, for the understanding of which reference will be made to the attached drawing in which:

[0068] [Fig.l] - Figure 1 shows a diagram of the controlled multi-frequency irradiation system according to an exemplary embodiment of the invention;

[0069] [Fig.2] - Figure 2 shows a diagram of an irradiation surface divided into several zones, with at least one irradiated target zone;

[0070] [Fig.3] - Figure 3 shows schematically the controlled multi-frequency irradiation system according to Figure 1, comprising an irradiation surface according to Figure 2, where only the radiations from the first emitting source are represented, in which the analysis device is furthermore capable of measuring the real collateral energy of at least one zone adjacent to the irradiated target zone;

[0071] [Fig.4] - Figure 4 shows a diagram of the controlled selective irradiation system according to another exemplary embodiment of the invention.

[0072] Detailed description of the invention

[0073] The controlled selective irradiation method according to the invention is implemented by an irradiation system as illustrated in Figure 1.

[0074] Such a system comprises an emitting device 11, for irradiating a surface S, which communicates with a controller device 12. Generally, the controller device 12 controls the emitting device 11 by modulating the energy parameters of the energy radiation emitted by it, which are of at least two different frequencies, taking into account the predetermined parameters loaded into this controller device 12 (in particular, emission frequencies and emission durations necessary to obtain the expected result at the irradiated surface). In the embodiment of FIG. 1, the emitting device 11 comprises a plurality of emitting sources, which are grouped by group, each group of emitting sources being capable of emitting energy radiation in a very specific frequency range. In this embodiment, the emitting device 11 comprises two groups of emitting sources S111 and S112.The first group Sl11 comprises a plurality of emitting elements 111a, 111b, l11n, which are identical and all capable of emitting in the irradiation frequency range fill, and the second group S112 comprises a plurality of emitting elements 112a, 112b, 112n, which are identical and all capable of emitting in the irradiation frequency range f112, distinct from the frequency range fill. It is understood that more than two emitting sources could be provided within the emitting device 11.

[0075] According to one example, it may be imagined to provide a first group of emitting sources capable of emitting in the frequency range 250-270 nm (corresponding to ultraviolet A (UV-A)), a second group of emitting sources capable of emitting in the frequency range 340-370 nm (corresponding to ultraviolet C (UV-C)), a third group of emitting sources capable of emitting in the frequency range 380-410 nm (corresponding to ultraviolet C2 (UV-C2)), and finally a fourth group of emitting sources capable of emitting in the frequency range 550-900 nm (corresponding to infrared (IR)).

[0076] Generally speaking, the emitting device according to the invention is able to cover a broad spectrum, including UV-A, UV-B, UV-C, as well as IR. Indeed, the objective of the invention being to replace the disadvantageous use of Mercury lamps, it is important to duplicate a radiative spectrum representative of this technology. Mercury lamps naturally and unintentionally emit IR in an uncontrolled manner, simply linked to the excitation of Mercury. This collateral radiation is an integral part of the spectrum and negatively impacts the polymerization results. On the contrary, the invention covers the entire spectrum, and in a perfectly controlled manner.

[0077] According to the embodiment illustrated in Figure 1, the emitting device 11 corresponds to a matrix which comprises a plurality of emitting elements 111a, 111b, llln, 112a, 112b, 112n, these emitting elements being grouped into two emitting sources 111 and 112. Each element of an emitting source is identical to the other elements of this source. But the elements of one source are different from the elements of another source. Each emitting source 111 and 112 can be activated and controlled independently of the other source. In addition, according to one embodiment, each emitting element of a source can also be activated and controlled independently of the other elements of this same emitting source. According to one example, these emitting elements 111a, 111b, llln, 112a, 112b, 112n are LEDs.

[0078] According to a particular example, the emitting device 11 according to the invention is a digital emitting device. Such a digital emitting device makes it possible to irradiate with energy radiation the area of ​​the surface (for example the surface of a varnish) which must be, for example, polymerized, in a gradual and repetitive manner: the area to be irradiated is artificially segmented into several portions, in particular equivalent to the size of a “spot” (“point”, in French), and the digital emitting device irradiates each spot one after the other, until the entire area is irradiated. With the high-resolution laser technology of the invention, this spot can notably achieve a resolution of the order of a micron.

[0079] On each of these spots, it is therefore possible to deliver both a specific spectrum and a specific dose (corresponding to so-called "primary" parameters), i.e. a specific frequency (wavelength) for a specific duration, and this while respecting so-called "secondary" parameters, such as the control of the temperature of the material to be polymerized, the control of the temperature of the substrate on which the layer of material to be irradiated is possibly deposited, as well as the control of EMC radiation ("ElectroMagnetic Compatibility" in English, for "electromagnetic compatibility" in French).

[0080] This digital implementation of the irradiation operation, for example for the purpose of polymerization, advantageously allows a more precise and more efficient polymerization than a polymerization obtained following the implementation of a continuous polymerization operation, and which in particular makes it possible not to impact the areas of the surface not requiring energy input.

[0081] In this embodiment, the controller device 12 is loaded with predetermined energy parameters associated with the two irradiation frequency ranges fill and fll2, these predetermined energy parameters being those making it possible to obtain the expected result at the surface S to be irradiated. The controller device 12 therefore comprises the predetermined energy parameter E-lllx corresponding to the frequency flllx that the first emitting source Slll must emit, and the predetermined energy parameter E-112x corresponding to the frequency fll2x that the second emitting source S112 must emit. Each of these predetermined energy parameters is associated in the controller device 12 with a duration, necessary for obtaining the expected final result on the surface S. The parameter E-lllx is therefore associated with the duration Tlllx, and the parameter E-112x is associated with the duration T112x.

[0082] Thus, during the controlled multi-frequency irradiation process at the surface S, the controller device 12 controls the first source Sl11 so that it emits energy radiation R-lllx, according to the predetermined energy parameter E-lllx, and for the duration Tlllx, and it controls the second source S112 so that it emits energy radiation R- 112x, according to the predetermined energy parameter E-112x, and for the duration T112x. The system 1 therefore operates as a closed loop.

[0083] The two emitting sources Slll and S112 can emit radiation simultaneously or sequentially. Also, each of the emitting elements constituting the two emitting sources Slll and S112 can emit simultaneously or sequentially.

[0084] In this embodiment, the controller device 12 also takes into account the real effect obtained in real time at the irradiated surface S, to more precisely control the emitting device 11. For this, the system 1 further comprises an analysis device 13, which comprises a module A configured to analyze and record the real effect OR at the irradiated surface S, either at the areas of this surface S on which the R-112x radiation associated with the first frequency range f11 is emitted, or at the areas on which the R-112x radiation associated with the second frequency range f112 is emitted, or at all of these areas of the surface S. According to a particular example, the analysis device 13 corresponds to an image sensor, for example a camera.

[0085] After recording this real effect OR, the analysis device 13 transmits this data to the controller device 12. The latter has been loaded upstream with the target effect O expected for the irradiated zone S. It is then able to take this information into account to control the different emitting sources Sill, S112 of the system 1 in an even more precise and optimal manner. For this, it includes means for comparing the target effect O and the real effect OR at the level of the surface S, and depending on the results of this comparison, it adapts its control of the emitting device 11.

[0086] Thus, if the result of the comparison target effect O VS actual effect OR corresponds to the fact that the target effect O is achieved by the actual effect OR, the controller device 12 controls the emitting device 11 so that it stops the emission of energy radiation on the surface S.

[0087] On the contrary, if the result of this comparison of target effect O VS actual effect OR corresponds to the fact that the target effect O is not achieved by the actual effect OR, the controller device 12 modulates the irradiation frequency flllx, fll2x and / or the duration Tlllx, T112x of the energy radiation R-lllx, R- 112x emitted by one and / or the other of the emitting sources Sill, S112, at the surface S, so that the target effect O is obtained.

[0088] In this embodiment, the controller device 12 also takes into account the real energy generated at the irradiated surface S, to further optimize the control of the emitting device 11. For this, the analysis device 13 of the system 1 further comprises a module M configured to measure and record the real energy G-lllx, G-112x generated at the irradiated surface S, either at the zones of this surface S on which the radiation R-lllx associated with the first frequency range fill is emitted, or at the zones on which the radiation R-112x associated with the second frequency range fll2 is emitted, or at the level of all of these zones of the surface S. This real energy can be, for example, the temperature.

[0089] According to a particular example, the analysis device 13 corresponds to a thermal imaging sensor, for measuring the temperature at the irradiated surface S, which temperature corresponds to the real energy at this surface, and / or a radiative sensor, for measuring any type of energy radiation emitted by the emitting device 11. These devices can also be associated with an image analysis module, such as a camera.

[0090] After recording this real energy, the analysis device 13 transmits this data to the controller device 12. In this case, the energy parameters E-lllx, E-112x include, in addition to the necessary irradiation frequencies, energy thresholds S-lllx, S-112x. It is able to take into account both the real effect OR and the real energy G-lllx, G-112x of the irradiated surface to control with optimal precision the different emitting sources Sill, S112 of the system 1. For this, in addition to the means for comparing the target effect O and the real effect OR at the surface S, it includes means for comparing the different energy thresholds S-lllx, S-112x with the real energy G-lllx, G-112x at the surface S, and depending on the results of this comparison, it adapts its control of the emitting device 11.

[0091] Thus, if the result of the comparison of target effect O VS actual effect OR and energy thresholds S-lllx, S- 112x VS actual energy G-lllx, G-112x corresponds to the fact that the energy thresholds S-lllx, S-112x are not reached and the target effect O is not obtained, the controller device 12 modulates the irradiation frequency flllx, fll2x and / or the duration Tlllx, T112x of the energy radiations R-lllx, R- 112x emitted by one and / or the other of the emitting sources Sill, S112, at the surface S, so that the target effect O is obtained.

[0092] If the result of this comparison corresponds to the fact that the energy thresholds S-lllx, S-112x are reached but the target effect O is not obtained, the controller device 12 also modulates the irradiation frequency flllx, fll2x and / or the duration Tlllx, T112x of the energy radiations R- lllx, R-112x emitted by one and / or the other of the emitting sources Sill, S112, at the surface S, so that the target effect O is obtained. It can in particular increase the irradiation frequencies, and their duration.

[0093] If the result of this comparison corresponds to the fact that the energy thresholds S-lllx, S-112x are reached and the target effect O is obtained, the controller device 12 controls the emitting device 11 so that it stops the emission of energy radiation on the surface S.

[0094] And finally, if the result of this comparison corresponds to the fact that the energy thresholds S-lllx, S-112x are not reached but the target effect O is obtained, the controller device 12 also controls the emitting device 11 so that it stops the emission of the energetic radiation on the surface S, since the radiations R-lllx, R-112x actually emitted have made it possible to reach the target effect O (it does not matter that the predetermined energy thresholds are not reached).

[0095] The controller device 12 thus allows an advantageous energy gain, since it is capable of stopping the irradiation of the surface S irradiated by the emitting device 11 when it is determined that the expected effect is obtained, independently of the basic energy thresholds entered in the controller device 12. The emission of unnecessary radiation is therefore advantageously limited, as soon as the target effect O is obtained, which is very interesting from a financial and environmental point of view.

[0096] The controller device 12 is also capable of independently controlling the plurality of emitting elements 111a, 111b, 111n, 112a, 111b, 112n of each emitting source S111 and S112 of the emitting device 11, according to the actual effect OR analyzed at the irradiated surface S throughout the irradiation process, to adapt the irradiation process to what is actually obtained at this surface S.For example, if the controller device 12 determines that the actual effect OR at the surface S corresponds to the target effect O on only a portion of this surface S, but that this target effect O is not yet obtained on the entirety of this surface S, it can act on the emitting device 11 to deactivate the emitting elements located above the zone or zones of the surface S for which the target effect O is obtained, and modulate the irradiation frequency of the emitting elements located above the zone or zones of the surface S for which the target effect O is not yet obtained.This modulation of irradiation frequencies may consist of modifying the specific irradiation frequency of the emitting elements concerned: for example, if the emitting elements in question are capable of emitting radiation in the frequency range 250-270nm, and they initially emitted at 250nm, the controller device 12 can control them so that they emit specifically at 260nm, for a certain duration. Thus, the surface S is advantageously not always irradiated as a whole.

[0097] According to one embodiment, the controller device 12 is a Human-Machine interface, which may for example be a computer, a tablet or a smartphone, or even an automaton.

[0098] Generally, the analysis device 13 may comprise analysis means which are of the spectrometer, temperature sensor, infrared imaging, or even microphone type.

[0099] The surface S can be divided into a plurality of zones SI, S2...Si...Sn, as illustrated in Figure 2. The irradiation by the emitting sources Sill, S112 can concern a target zone, which can correspond to a single zone of the plurality of zones SI, S2...Si...Sn, to the combination of several zones of the plurality of zones SI, S2...Si...Sn, or even to the entire surface S, that is to say include the entire plurality of zones which compose this surface S. According to another embodiment, illustrated in Figure 3, when the surface S is divided into a plurality of zones SI, S2...Si...Sn, and at least one target zone Si of this surface S is irradiated, for example by at least one emitting element 111a of the first irradiation source Slll, the analysis device 13 is also capable of measuring the real collateral energy of one or more zones, for example the real collateral energy l-lllx of a Sn area, which is adjacent to the irradiated Si target area.This measurement is recorded by the analysis device 13, which transmits it to the controller device 12. In the latter, secondary energy thresholds associated with each of the zones constituting the surface S have previously been entered, in particular the secondary energy threshold H- lllx associated with the zone Sn: the controller device 12 is then able to compare the collateral energy l- lllx measured at the level of the zone Sn adjacent to the irradiated target zone Si with the predetermined secondary energy threshold H- lllx of this zone. Depending on the result of this comparison, it can modulate the emitting elements of the first emitting source Slll which are able to irradiate the target zone Si to impact in one direction or the other the real collateral energy l- lllx of the zone Sn adjacent to the target zone Si.In particular, it can reduce the irradiation frequency of these emitting elements, to reduce this collateral energy l-lllx, if it is determined that it has reached the predetermined secondary energy threshold H-lllx of this zone, or on the contrary it can increase the irradiation frequency of these emitting elements, to increase this collateral energy l-lllx, if it is determined that it has not yet reached the predetermined secondary energy threshold H-lllx of this zone. Thus, the interpretation of the measurements from secondary sensors linked to the energies generated collaterally to the irradiated target zone makes it possible to preserve the integrity of the target.

[0100] It is therefore understood that, according to the invention, each of the zones constituting the surface S to be irradiated is associated with two types of predetermined energy thresholds, entered into the controller device 12: first predetermined energy thresholds S-lllx, S-112x, called main energy thresholds, and second predetermined energy thresholds H-lllx, H-112x, called secondary energy thresholds.

[0101] Although Figure 3 only represents the irradiation of the surface by the first emitting source Sl11, the second emitting source S112 operates in the same way in the system 1, and more than two emitting sources could also be provided within the emitting device 11. Other so-called secondary parameters can also be taken into account by the multi-frequency irradiation system of the invention.

[0102] For the purposes of the invention, secondary parameters are parameters that are dissociated from the emitting device 11, but which still have an impact on the completeness of the expected final result, or on the integrity of the system during the implementation of the irradiation process. An example of a secondary parameter is humidity: this can have an impact on the quality of the polymerization by irradiation. The invention therefore makes it possible to dynamically control the hygrometry in the system 1.

[0103] Another example of a secondary parameter is the temperature perceived at the level of the material to be irradiated, in particular for the purpose of polymerizing it. Indeed, certain materials, such as resins, need to reach and / or not exceed threshold temperatures during the irradiation phase by UV radiation. Thus, according to one embodiment of the system of the invention, this system combines a thermo-vision approach with a supply of IR radiation: it is thus possible to guarantee heating of the material to be irradiated, thanks to controlled digital IR irradiation (direct thermodynamic effect), while ensuring that the temperature associated with this irradiation remains below a predefined temperature threshold, thanks to the modulation of the power of the UV radiation (exothermic effect).

[0104] Another example of a secondary parameter is ESD radiation (Electrostatic Discharge) and EMC radiation. In particular, the controlled irradiation method according to the invention, with the aim of polymerizing the irradiated material, can be implemented on semiconductor or electronic devices, which are sensitive to electrical radiation. However, through the embedded technologies and the execution of the method itself, the invention can generate ESD and EMC emissions. The system according to the invention is therefore able to control this radiation, which makes it possible to ensure that the radiation thresholds potentially destructive for these electrical devices are not reached.

[0105] An additional example of a secondary parameter is the temperature of the substrate on which the layer of material to be irradiated rests. Particularly in printed electronics applications, the substrate used may be paper, textile, or even plastic, and therefore be sensitive to a rise in temperature. Thus, according to one embodiment of the system of the invention, it is able to provide thermal vision at the periphery of the polymerization zones of the surface of the material to be irradiated, in order to guarantee that, by conduction effect between the material to be irradiated and the substrate on which this material is deposited, there is no excessive rise in temperature. For this, the system of the invention combines a global thermal vision approach with modulation of the emitting device, both in power and location.

[0106] This aspect is illustrated in Figure 4. In this case, the surface S to be irradiated is deposited on a substrate Sub. Upstream of the operation of the emitting device 11, the controller device 12 has been loaded with a maximum energy threshold EMSub associated with the substrate Sub, which corresponds for example to a maximum temperature for this substrate. During the irradiation of the surface S by the emitting device 11, the analysis device 13, and in particular its measurement and analysis device M, measures the real energy EISub at the substrate Sub, in parallel with the measurement of the real energy G-111x, G-112X at the directly irradiated surface S.The analysis device 13 transmits this measurement to the controller device 12, which compares this real energy EISub with the maximum energy EMSub, and which possibly adapts in return the parameters of the emitting device 11 in order to ensure that the temperature of the substrate EISub during the irradiation process does not exceed the maximum threshold temperature EMSub associated with the latter, so that this substrate is not damaged by the irradiation of the surface S.

[0107] The energy radiation R-lllx, R-112x emitted by the emitting device 11 can be visible light, infrared, gamma, ultraviolet, laser radiation, microwaves, X-rays, sound waves or even convective or conductive thermal deployment.

[0108] According to one embodiment, the emitting device 11 and the surface S to be irradiated can be integrated into a chamber under a controlled atmosphere, insulated for example with nitrogen or argon, or having a high humidity level, in order to optimize the expected result at the surface level, in particular when the irradiation system is used to polymerize the latter.

[0109] Below are presented several examples of implementation of the method and the irradiation system according to the invention for different applications. It is understood that these examples are not limiting, and that the invention can be implemented for any type of application involving the energy irradiation of a surface to obtain a given effect.

[0110] First example of realization

[0111] The method and system according to the invention can be implemented in the case of the polymerization of resins by irradiation.

[0112] It is known to polymerize resins by irradiation using mercury lamps. However, as presented above, it has been recognized that these mercury lamps are dangerous for the health of users and for the environment, because they are highly polluting. Such lamps also have low integrity durability, and do not allow for the dissociation of energy variants: it is a broad spectrum technology.

[0113] In the early 2000s, Europe banned the sale of high-pressure mercury vapor lamps at government level, as these lamps were deemed to be among the most polluting.

[0114] However, these mercury lamps are still used in industry today, thanks to a European exemption.

[0115] The invention therefore aims, among other things, to replace mercury lamps, for polymerizing resins by irradiation, with a more ecological and more economical emitting system.

[0116] Thus, as developed further, the principle of the invention consists of integrating on a single emitting matrix all the required irradiation frequencies allowing a complete irradiation polymerization process to be carried out. Each frequency is implemented through a specific emitting source. A controller and its associated software allow the irradiation frequencies to be combined by providing power and time regulation for each frequency. A concrete application is the polymerization of tropicalization varnish on electronic cards.

[0117] According to this example, the emitting device 11 is a matrix, for example having the shape of a panel, in which a plurality of emitting elements are arranged, for example emitting diodes, to cover a wide spectrum of radiation, typically ranging from 250 nm to 800 nm, i.e. from ultraviolet UVA (UV-A) radiation to infrared (IR) radiation.

[0118] This type of varnish polymerizes thanks to photoinitiators targeted around 265 nm and 395 nm. A panel 11, for example 400 mm wide and 500 mm long, is therefore used, incorporating a first emitting source Sl11 comprising a plurality of 265 nm LEDs, for example 1200 LEDs, and a second emitting source S112 comprising a plurality of 395 nm LEDs, for example 600 LEDs. The two emitting sources Sl11 and S112 are combined to allow perfectly homogeneous coverage of the two frequencies 265 nm and 395 nm.

[0119] In this example, each LED can be controlled independently of another LED, in the two emitting sources Slll and S112.

[0120] This radiant panel 11 is positioned above a conveyor on which electronic cards pass. When a card is positioned under the radiant panel 11, the controller device 12 of the system, which may be a computer and which communicates with the panel 11, controls for a predetermined duration, respectively T112x and Tlllx, first the irradiation of the LEDs 112 at 395 nm, then the irradiation of the LEDs 111 at 265 nm.

[0121] Since each frequency is controlled separately, it is possible to combine each polymerization mode independently. For example, it is possible to first apply IR radiation for an initial temperature increase, then UV-A radiation for core polymerization. It is also possible to apply ultraviolet-C (UV-C) radiation for surface polymerization, at the same time as the UV-A radiation, or subsequently.

[0122] An analysis device 13 is also integrated into the system. It is configured to measure the actual effect obtained at the level of the polymerized varnish layer, and transmit this data to the controller device 12 so that it adapts the control of the radiant panel 11 accordingly. For this, this analysis device 13 comprises a camera, or any other visual analysis module.

[0123] It can thus be determined that the predetermined energy parameters entered into the controller device 12 have not allowed the complete polymerization of the varnish layer, and that the controller device 12 must modulate these parameters, in terms of irradiation frequency and duration, to obtain complete polymerization. Also, on the contrary, it can be determined that the complete polymerization of the varnish layer is obtained, although the predetermined duration of irradiation of one or more emitting sources Sill, S112 of the radiating panel 11 is not reached. In this case, the controller device 12 can completely stop the irradiation by the radiating panel 11.

[0124] This analysis device 13 is also configured to measure the actual energy felt at the irradiated varnish layer, in addition to the analysis of the actual effect, and transmit this data to the controller device 12 so that it adapts the control of the radiant panel 11 accordingly. As for the actual effect above, the controller device 12 is capable of modulating the frequency and duration of irradiation of the different emitting sources Sill, S112 of the panel 11 so that the actual energy at the polymerized varnish layer approaches the predetermined energy thresholds entered in the controller device 12, in order to obtain the expected effect. In this case, the analysis device 13 further comprises a thermal camera, or any other module capable of measuring the radiation dose and / or the temperature.

[0125] The analysis device 13 can also, if necessary, measure the collateral energy around the target area of ​​the irradiated surface S, or at the level of a substrate on which the material of this target area would rest, relative to secondary energy thresholds associated with the areas adjacent to this target area, or to the substrate in question.

[0126] Thus, the replacement of mercury lamps with such a unique radiant panel 11, which in particular allows selective radiation control, makes it possible to irradiate a surface with several irradiation frequencies in a simple and practical manner. This also makes it possible to no longer use mercury, which has a positive impact on the environment and the health of users. In addition, this selective radiation control makes it possible to minimize the overall temperature rise of the irradiated surface, which has a direct impact on the integrity of the electronic boards.

[0127] Second example of realization

[0128] The method and system according to the invention can also be implemented in the case of the polymerization of layers of varnish on the nails, with the aim of obtaining a target effect which corresponds to the complete solidification / drying of the layer of varnish.

[0129] In this case, the emitting device 11 is a lamp which emits UV radiation, consisting of a multitude of UV LEDs grouped into at least two distinct groups of emitting sources Sill, S112, associated respectively with two irradiation frequency ranges fill, fll2.

[0130] The controller device 12 is a computer, into which the target visual state of the final polymerization of the layers of varnish has been entered, and possibly the predetermined temperature which a priori allows the total polymerization of these layers of varnish to be obtained. The analysis device 13 comprises a module for visual analysis of the state of the polymerization of the layers of varnish, and possibly a UV radiation probe combined with a thermal camera, which comprises a module for measuring the UV dose and the actual temperature at the surface of the irradiated nails covered with varnish. The computer 12 also comprises means for comparing the actual temperature data with the predetermined temperature data for the surface S to be irradiated, as well as means for comparing the actual state of the polymerization of the layers of varnish with the expected state of polymerization for this surface S.

[0131] In this example of application of the invention, the irradiation method comprises the same steps as the irradiation method of the previous example.

[0132] Thus, the irradiation method and system according to the invention advantageously allow a substantial energy and financial gain in the field of cosmetics, in particular nail care, because the control of the different emitting sources of the emitting device 11 used to polymerize the layers of varnish on the nails can be adapted to the demand in a closed loop, depending on the evolution of the actual situation, and in a simple manner. They also make it possible to minimize the risks of skin cancer linked to UV exposure and the risks of burning linked to adjacent UV or IR radiation, and they are not harmful to the environment.

Claims

CLAIMS 1. Method for controlled multi-frequency irradiation of a surface (S), this surface being for example a layer of varnish or a layer of resin, to allow the irradiation of said surface (S) in order to obtain a target effect (O) consisting of the polymerization of said surface (S), said method being implemented by a system (1) for controlled multi-frequency irradiation comprising an emitting device (11), a controller device (12) and an analysis device (13), said emitting device (11) comprising a first emitting source (S11) comprising at least one emitting element (111a, 111b, l11n), and at least one second emitting source (S112) comprising at least one emitting element (112a, 112b, 112n), said first and second emitting sources (S112, S112) being configured to irradiate said surface (S) with energetic radiations respectively associated with first and second irradiation frequency ranges (fill, fll2),said method comprising the following steps:, - input into said controller device (12): -- of first and second predetermined energy parameters (E-lllx, E-112x), respectively comprising energy thresholds (S-lllx, S-112x) and respectively associated with at least two irradiation frequencies making it possible to obtain said target effect (O), -- of temporal parameters (Tlllx, T112x) respectively associated with said predetermined energy parameters and corresponding to durations, and -- said target effect (O) to be obtained; - irradiation of said surface (S) by said first and second emitting sources (S111, S112) in order to obtain said target effect (O); - analysis and recording in real time by said analysis device (13) of the real effect (OR) at said irradiated surface (S), and measurement and recording in real time by said analysis device (13) of the real energy (G-lllx, G-112x) generated on said surface (S) by the energetic radiations (R-lllx, R-112x); - transmission to said controller device (12), by said analysis device (13), of said analyzed real effect (OR) and of said real energy (G-lllx, G-112x); - control of said irradiation by said controller device (12) with a view to emission by said first emitting source (Slll) of energetic radiation (R-lllx) at the irradiation frequency associated with said first predetermined energetic parameter (E- lllx), in the irradiation frequency range (f 111) associated with said first emitting source (Slll), for the duration (Tlllx) associated with said first energetic parameter predetermined (E-lllx), and with a view to emission by said second emitting source (S112), independently of said first emitting source (Slll), of an energetic radiation (R-112x) at the irradiation frequency associated with said second predetermined energetic parameter (E-112x), in the irradiation frequency range (f 112) associated with said second emitting source (S112), during the duration (T112x) associated with said second predetermined energetic parameter (E-112x), and also taking into account said real effect (OR) and said real energy (G-lllx, G-112x), said real effect (OR) being compared to said target effect (O) and said real energy (G-lllx, G- 112x) being compared to said energetic thresholds (S-lllx, S-112x), so that: Bl- if said energetic thresholds (S-lllx, S-112x) are not achieved and said target effect (O) is not obtained, the emission of energetic radiation on said surface (S) continues,and the irradiation frequency and / or the duration of the energy radiation (R-lllx, R-112x) are modulated in order to obtain said target effect (O);, B2- if said energy thresholds (S-lllx, S-112x) are reached but said target effect (O) is not obtained, the emission of energetic radiation on said surface (S) continues, and the irradiation frequency and / or the duration of the energetic radiation (R-lllx, R-112x) are modulated in order to obtain said target effect (O); B3- if said energy thresholds (S-lllx, S-112x) are reached and said target effect (O) is obtained, the emission of energy radiation on said surface (S) is stopped; B4- if said energy thresholds (S-lllx, S-112x) are not reached but said target effect (O) is obtained, the emission of energetic radiation on said surface (S) is stopped.

2. Method of controlled multi-frequency irradiation according to claim 1, further comprising the following steps, when said surface (S) is deposited on a substrate (Sub): - input into said controller device (12) of a maximum energy threshold (EMSub) associated with said substrate (Sub); - measurement and recording in real time, by said analysis device (13), of the effective energy (EISub) generated at said substrate (Sub); - transmission of the measurement of said effective energy (EISub) to said controller device (12) - real-time control of said emitting device (11) by said controller device (12) during the irradiation process, taking into account the measurement of said effective energy (EISub), the measurement of said effective energy (EISub) being compared to said maximum energy threshold (EMSub), so that, if said effective energy (EISub) is greater at said maximum energy threshold (EMSub), the power and / or intensity of said energy radiation (R-lllx, R-112x) irradiating said surface (S) are modulated to reduce said effective energy (EISub) at the level of said substrate (Sub).

3. A method of controlled multi-frequency irradiation according to claim 1 or 1, wherein said first and second emitting sources (Sill, S112) each comprise a plurality of emitting elements (111a, 111b...llln, 112a, 112b...112n), said controller device (12) controlling each element of said plurality of emitting elements independently of each other.

4. A method of controlled multi-frequency irradiation according to claim 3, wherein said emitting device (11) is a matrix, and said emitting elements (111a, 111b... llln, 112a, 112b...112n) of said matrix are LEDs.

5. Controlled multi-frequency irradiation method according to any one of claims 1 to 4, wherein said controller device (12) is a Human-Machine interface.

6. Controlled multi-frequency irradiation method according to any one of claims 1 to 5, wherein said energetic radiations (R-lllx, R-112x) are chosen from visible light, infrared, gamma, ultraviolet, laser radiations, microwaves, X-rays, sound waves and convective or conductive thermal deployment.

7. Method of controlled multi-frequency irradiation according to any one of claims 1 to 6, in which said analysis device (13) is chosen from an image sensor, for example a camera, or a thermal and / or radiative imaging sensor associated with an image analysis module.

8. System (1) for controlled multi-frequency irradiation of a surface (S) of a product, this surface being for example a layer of varnish or a layer of resin, said system (1) implementing the controlled multi-frequency irradiation method according to any one of claims 1 to 7, said system (1) comprising: - a transmitting device (11), comprising: -- a first emitting source (Slll), comprising at least one emitting element (111), said first emitting source (Slll) being configured to irradiate said surface (S) with energetic radiation associated with a first frequency range (fill), and -- at least one second emitting source (S112), comprising at least one emitting element (112), said second emitting source (S112) being configured to irradiate said surface (S) with energetic radiation associated with a second frequency range (fll2); - an analysis device (13), configured to measure the actual energy (G-112x, G-112x) generated on said surface (S) by the energetic radiations (R-lllx, R-112x), as well as to analyze the real effect (OR) obtained at the level of said irradiated surface (S); and - a controller device (12), configured to receive: -- first and second predetermined energy parameters (E-lllx, E-112x), respectively comprising energy thresholds (S-lllx, S-112x) and respectively associated with at least two frequencies making it possible to obtain a target effect (O), as well as time parameters (Tlllx, T112x) respectively associated with said predetermined energy parameters and corresponding to durations, -- a target effect (O) to be obtained, -- the measurement of said real energy (G-lllx, G-112x), and -- analyzing said actual effect (OR), said controller device (12) comprising means for comparing said energy thresholds (S-lllx, S-112x) with said actual energy (G-lllx, G-112x) and means for comparing said target effect (O) with said actual effect (OR), said controller device (12) being further configured to control said first emitting source (Slll) for the purpose of emitting an energetic radiation (R-lllx) at the frequency associated with said first predetermined energy parameter (E-lllx), for the duration (Tlllx) associated with said first predetermined energy parameter (E-lllx), and to control said second emitting source (S112), independently of said first emitting source (Slll), for the purpose of emitting an energetic radiation (R-112x) at the frequency associated with said second predetermined energy parameter (E-lllx), for the duration (T112x) associated with said second predetermined energy parameter (E-lllx), 112x),taking into account said real effect (OR) and said real energy (G-lllx, G-112x)., 9. Controlled multi-frequency irradiation system according to claim 8, wherein said analysis device (13) is further configured to measure the effective energy (EISub) at a substrate (Sub) on which said surface (S) has been deposited, and wherein said controller device (12) is further configured to receive a maximum energy threshold (EMSub) associated with said substrate (Sub), said controller device (12) further comprising means for comparing said effective energy measurement (EISub) with said maximum energy threshold (EMSub).

10. Controlled multi-frequency irradiation system according to claim 8 or 9, wherein said analysis device (13) comprises: - an analysis and recording means (A) configured to analyze said real effect (OR) obtained at said surface (S) and to transmit this real effect (OR) to said controller device (12), and - a measuring and recording means (M) configured to measure said actual energy (G-lllx, G-112x) generated on said surface (S) by the energetic radiations (R-lllx, R-112x) and to transmit said actual energy (G-lllx, G-112x) to said controller device (12).

11. Controlled multi-frequency irradiation system according to claim 10, wherein said measuring and recording means (M) is further configured to measure said effective energy (EISub) at said substrate (Sub) and to transmit said effective energy (EISub) to the controller device (12).

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