Photocurable composition, pixel manufacturing method, film, solid-state imaging element, image display device, and photopolymerization initiator

Abstract

Provided is a photocurable composition comprising a photopolymerization initiator and a radically polymerizable compound, wherein the photopolymerization initiator includes a compound A in which a group represented by formula (1) is fused to a ring A of a ring-containing group containing at least one ring A selected from among aromatic rings and heterocyclic rings. Also, provided are a pixel manufacturing method, a film, a solid-state imaging element, and an image display device which use said photocurable composition.

Description

Photocurable composition, pixel manufacturing method, film, solid-state imaging device, image display device, and photopolymerization initiator

[0001] The present invention relates to a photocurable composition containing a photopolymerization initiator and a radically polymerizable compound. The present invention also relates to a pixel manufacturing method, a film, a solid-state imaging device, and an image display device using the photocurable composition. The present invention also relates to a photopolymerization initiator.

[0002] Photocurable compositions containing a photopolymerization initiator and a radically polymerizable compound can be polymerized and cured by irradiation with light, and are therefore used in optical filters, photocurable inks, photosensitive printing plates, various photoresists, and the like.

[0003] Known photopolymerization initiators include oxime compounds, etc. Patent Document 1 discloses a carbazole oxime ester photopolymerization initiator having a specific structure.

[0004] Special Publication No. 2013-543875

[0005] When forming pixels by forming a pattern using a curable composition by photolithography, the formed pixels are required to have excellent rectangular cross-sectional shapes.

[0006] According to the investigations of the present inventors, it has been found that the rectangularity of the cross-sectional shape of the obtained pixels is insufficient when using the photocurable composition using the photopolymerization initiator disclosed in Patent Document 1, and there is room for further improvement.

[0007] Therefore, an object of the present invention is to provide a photocurable composition capable of forming pixels having excellent cross-sectional rectangularity. Another object of the present invention is to provide a pixel manufacturing method, a film, a solid-state imaging device, an image display device, and a photopolymerization initiator.

[0008] The present inventors have found through their investigations that the above object can be achieved by using a photocurable composition as described below, and have thus completed the present invention.

[0009] <1> A photocurable composition comprising a photopolymerization initiator and a radically polymerizable compound, wherein the photopolymerization initiator comprises a compound A in which a group represented by formula (1) is fused to the ring A of a ring-containing group containing at least one ring A selected from an aromatic ring and a heterocycle; In formula (1), *1 represents the position of the fused ring with the ring A, １ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryloxy group, an alkoxy group, an aryloxy group, or a heteroaryloxy group; L １ represents a single bond or an alkylene group; Y １ is -CR Ｙ１ R Ｙ２ -, -O-, -S-, or -NR Ｙ３ represents -, R Ｙ１ ~R Ｙ３ each independently represents a hydrogen atom, an alkyl group, or an aryl group; R ２ represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a group represented by formula (Z-1); Z １ represents a group represented by formula (Z-1); In formula (Z-1), * represents a bond; Ｚ１ represents a single bond or an alkylene group; Ｚ２ ~L Ｚ４ are each independently -CR Ｌ１ R Ｌ２ -, -O-, -S- or -NR Ｌ３ represents -, and R Ｌ１ ~R Ｌ３ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ may be bonded via a single bond or a linking group to form a ring; Ｚ２ ~L Ｚ４ At least two of them are -CR Ｌ１ R Ｌ２ <2> L in the above formula (Z-1) Ｚ３and L Ｚ４ are each independently -CR Ｌ１ R Ｌ２ - and R Ｌ１ and R Ｌ２ are each independently a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ are each independently a hydrogen atom or an alkyl group, and R Ｚ１ and R Ｚ２ may be bonded to each other via a single bond or a linking group to form a ring. Ｚ１ and R Ｚ２ <4> The photocurable composition according to <1> or <2>, wherein L in formula (Z-1) is bonded via a single bond or a linking group to form a ring. Ｚ１ is a single bond or a methylene group, and L Ｚ２ Ga-CR Ｌ１ R Ｌ２ - and R Ｌ１ and R Ｌ２ are each independently a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group. <5> The photocurable composition according to any one of <1> to <4>, wherein the ring-containing group contains a ring represented by formula (A-1) or formula (A-2). In formula (A-1), *1 represents the position of the fused ring with the group represented by formula (1), ｘ１ and R ｘ２ are each independently an alkyl group, an aryl group, a heteroaryl group, or —OR ｘ1０１ , -SR ｘ１０１ , -COR ｘ１０１ , -SO ２ R ｘ１０１ , -NR ｘ１０２ R ｘ１０３ , -CONR ｘ１０２ R ｘ１０３ , -NR ｘ１０４ COR ｘ１０５ , -OCOR ｘ１０１ , -COOR ｘ１０１ , -SCOR ｘ１０１ , -OCSR ｘ１０１ , -COSRｘ１０１ , -CSOR ｘ１０１ , a cyano group, a nitro group, a hydroxyl group, a thiol group, a carboxyl group, a halogen atom or a bond, and R ｘ１０１ ~R ｘ１０５ each independently represents a monovalent organic group; s and t each independently represent 0 or 2, and at least one of s and t is 2; m1 represents an integer of 0 to (4-s); m2 represents an integer of 0 to (4-t); and when m1 is 2 or more, a plurality of R ｘ１ may be the same or different, and multiple R ｘ１ may be bonded to each other via a single bond or a linking group to form a ring, and when m2 is 2 or more, a plurality of R ｘ２ may be the same or different, and multiple R ｘ２ may be bonded to each other via a single bond or a linking group to form a ring, ｘ３ and R ｘ４ each independently represents a single bond, —CR ｘ１１ R ｘ１２ -, -O-, -S-, -NR ｘ１３ - or -C(=O)-, R ｘ１１ ~R ｘ１３ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; n represents an integer of 0 or 1; when n is 0, R ｘ３ does not exist; In formula (A-2), *1 represents the position of the fused ring with the group represented by formula (1), R ｘ５ represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R ｘ６ represents an alkyl group, an aryl group, a heteroaryl group, or a bond, p1 represents an integer of 0 to 2, and when p1 is 2, there are multiple R ｘ６ may be the same or different, and multiple R ｘ６ <6> R in the above formula (A-2) may be bonded to each other via a single bond or a linking group to form a ring. ｘ５ is a group represented by formula (Rx-50); In formula (Rx-50), * represents a bond,ｘ５１ is a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -OR ｘ５０１ , -SR ｘ５０１ , -COR ｘ５０１ , -SO ２ R ｘ５０１ , -NR ｘ５０２ R ｘ５０３ , -CONR ｘ５０２ R ｘ５０３ , -NR ｘ５０４ COR ｘ５０５ , -OCOR ｘ５０１ , -COOR ｘ５０１ , -SCOR ｘ５０１ , -OCSR ｘ５０１ , -COSR ｘ５０１ , -CSOR ｘ５０１ , a cyano group, a nitro group, a hydroxyl group, a thiol group, a carboxyl group, or a halogen atom; R ｘ５０１ ~R ｘ５０５ each independently represents a monovalent organic group; ｘ５２ represents an alkyl group, an aryl group, or a halogen atom; k represents an integer of 0 to 4; when k is 2 or more, a plurality of R ｘ５２ may be the same or different, and multiple R ｘ５２Two of them may be bonded via a single bond or a divalent linking group to form a ring. <7> The photocurable composition according to any one of <1> to <6>, further comprising a colorant. <8> The photocurable composition according to any one of <1> to <7>, further comprising a resin. <9> The photocurable composition according to <8>, wherein the resin comprises a graft polymer. <10> The photocurable composition according to any one of <1> to <9>, further comprising a chain transfer agent. <11> A method for manufacturing a pixel, comprising: forming a composition layer on a support using the photocurable composition according to any one of <1> to <10>; patternwise exposing the composition layer by irradiating it with light having a wavelength of 150 to 300 nm; and developing and removing the unexposed areas of the composition layer. <12> A film obtained by curing the photocurable composition according to any one of <1> to <10>. <13> A solid-state imaging device comprising the film according to <12>. <14> An image display device comprising the film according to <12>. <15> A photopolymerization initiator containing a compound A in which a group represented by formula (1) is fused to the ring A of a ring-containing group containing at least one ring A selected from an aromatic ring and a heterocyclic ring; In formula (1), *1 represents the position of the fused ring with the ring A, １ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryloxy group, an alkoxy group, an aryloxy group, or a heteroaryloxy group; L １ represents a single bond or an alkylene group; Y １ is -CR Ｙ１ R Ｙ２ -, -O-, -S-, or -NR Ｙ３ represents -, R Ｙ１ ~R Ｙ３ each independently represents a hydrogen atom, an alkyl group, or an aryl group; R ２ represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a group represented by formula (Z-1); Z １ represents a group represented by formula (Z-1); In formula (Z-1), * represents a bond; Ｚ１ represents a single bond or an alkylene group; Ｚ２ ~L Ｚ４are each independently -CR Ｌ１ R Ｌ２ -, -O-, -S- or -NR Ｌ３ represents -, and R Ｌ１ ~R Ｌ３ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ may be bonded via a single bond or a linking group to form a ring; Ｚ２ ~L Ｚ４ At least two of them are -CR Ｌ１ R Ｌ２ - is.

[0010] According to the present invention, it is possible to provide a photocurable composition capable of forming pixels having excellent cross-sectional rectangularity. The present invention also provides a pixel manufacturing method, a film, a solid-state imaging device, an image display device, and a photopolymerization initiator.

[0011] FIG. 10 is a schematic diagram showing measurement points for the taper angle of a pixel and the length of a notch at the bottom in an example.

[0012] The present invention will be described in detail below. In this specification, the term "to" is used to mean that the numerical values ​​before and after the term are included as the lower and upper limits. In the description of groups (atomic groups) in this specification, a term without specifying whether it is substituted or unsubstituted encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only unsubstituted alkyl groups (unsubstituted alkyl groups) but also substituted alkyl groups (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. As used herein, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. In the structural formulae herein, Me refers to a methyl group, Et refers to an ethyl group, Bu refers to a butyl group, and Ph refers to a phenyl group. As used herein, the weight-average molecular weight and number-average molecular weight are polystyrene-equivalent values ​​measured by GPC (gel permeation chromatography). As used herein, the term "total solids" refers to the total mass of all components of a composition excluding the solvent. As used herein, the term "pigment" refers to a coloring material that is difficult to dissolve in a solvent. As used herein, the term "process" refers not only to an independent process, but also to a process that cannot be clearly distinguished from other processes, as long as the intended effect of the process is achieved.

[0013] <Photocurable composition> The photocurable composition of the present invention is a photocurable composition comprising a photopolymerization initiator and a radically polymerizable compound, characterized in that the photopolymerization initiator comprises a compound A in which a group represented by formula (1) is fused to ring A of a ring-containing group containing at least one ring A selected from an aromatic ring and a heterocycle.

[0014] The photocurable composition of the present invention can form pixels with excellent cross-sectional rectangularity. The reason for this effect is presumed to be as follows. The compound A used as the photopolymerization initiator in the photocurable composition of the present invention is a compound in which a group represented by formula (1) is fused to the ring A, and this compound has a cyclic oxime moiety in a ring structure formed by including an oxime group. That is, the compound A has a structure in which an oxime group is incorporated into a ring structure (hereinafter also referred to as a cyclic oxime structure). The cyclic oxime structure in compound A has a group represented by formula (Z-1), which is a substituent having a branched structure, at the α-position of the oxime group. It is presumed that having the group represented by formula (Z-1) at the α-position of the oxime group shortens and fixes the steric distance between the oxime group and the branched structure, thereby increasing the decomposition efficiency by light irradiation. It is presumed that this allows radicals to be efficiently generated by exposure, thereby allowing the interior of the film to be sufficiently cured. Therefore, when forming a pattern by photolithography using the photocurable composition of the present invention to form pixels, it is presumed that the composition layer in the exposed portion can be sufficiently cured during exposure, and therefore, when forming a pattern by developing and removing the composition layer in the unexposed portion, it is presumed that removal of the composition layer in the exposed portion can be suppressed, and as a result, it is presumed that pixels with excellent rectangular cross-sectional shapes can be formed.

[0015] According to the photocurable composition of the present invention, the polymerization reaction can be sufficiently promoted even at the bottom of the film (on the support side) by exposure, so that a film having excellent adhesion to the support can be formed.

[0016] The photocurable composition of the present invention preferably further contains a colorant. The photocurable composition containing a colorant is preferably used as a photocurable composition for an optical filter. Examples of the optical filter include a color filter, an infrared transmission filter, and an infrared cut filter, and a color filter is preferred.

[0017] The color filter may have colored pixels that transmit light of a specific wavelength. Examples of the colored pixels include red, green, blue, magenta, cyan, and yellow pixels. The colored pixels of the color filter may be formed using a photocurable composition containing a chromatic colorant.

[0018] The infrared cut filter preferably has a maximum absorption wavelength in the wavelength range of 700 to 1800 nm, more preferably in the wavelength range of 700 to 1300 nm, and even more preferably in the wavelength range of 700 to 1000 nm. The transmittance of the infrared cut filter over the entire wavelength range of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and even more preferably 90% or more. The transmittance at at least one point in the wavelength range of 700 to 1800 nm is preferably 20% or less. The ratio of the absorbance Amax at the infrared cut filter's maximum absorption wavelength to the absorbance A550 at a wavelength of 550 nm (absorbance Amax / absorbance A550) is preferably 20 to 500, more preferably 50 to 500, even more preferably 70 to 450, and particularly preferably 100 to 400. The infrared cut filter can be formed using a photocurable composition containing an infrared-absorbing colorant.

[0019] The infrared transmission filter is a filter that transmits at least a portion of infrared light. The infrared transmission filter is preferably a filter that blocks at least a portion of visible light and transmits at least a portion of infrared light. Examples of the infrared transmission filter include a filter that satisfies the spectral characteristics of a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1300 nm. The infrared transmission filter is preferably a filter that satisfies any one of the following spectral characteristics (1) to (5): (1): A filter that has a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 800 to 1500 nm. (2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 750 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 900 to 1500 nm. (3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 830 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. (4): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. (5): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm.

[0020] The photocurable composition of the present invention can also be used as a light-shielding film.

[0021] The solids concentration of the photocurable composition of the present invention is preferably 5 to 30% by mass. The lower limit is preferably 7.5% by mass or more, more preferably 10% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less.

[0022] The photocurable composition of the present invention exhibits high sensitivity when exposed to light having a wavelength of 150 to 300 nm. Therefore, the photocurable composition of the present invention is preferably used as a curable composition for exposure to light having a wavelength of 150 to 300 nm. Examples of light having a wavelength of 150 to 300 nm include KrF radiation (wavelength 248 nm) and ArF radiation (wavelength 193 nm), with KrF radiation (wavelength 248 nm) being preferred. The light having a wavelength of 150 to 300 nm is preferably excimer laser light having a wavelength of 150 to 300 nm.

[0023] Each component used in the photocurable composition of the present invention will now be described.

[0024] <<Photopolymerization Initiator>> The photocurable composition of the present invention contains a photopolymerization initiator. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0025] (Specific Compound) In the photocurable composition of the present invention, the photopolymerization initiator used contains a compound A in which a group represented by formula (1) is fused to ring A of a ring-containing group containing at least one ring A selected from an aromatic ring and a heterocyclic ring. The compound A is also referred to as a specific compound. In formula (1), *1 represents the position of the fused ring with ring A, １ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryloxy group, an alkoxy group, an aryloxy group, or a heteroaryloxy group; L １ represents a single bond or an alkylene group; Y １ is -CR Ｙ１ R Ｙ２ -, -O-, -S-, or -NR Ｙ３ represents -, R Ｙ１ ~R Ｙ３each independently represents a hydrogen atom, an alkyl group, or an aryl group; R ２ represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a group represented by formula (Z-1); Z １ represents a group represented by formula (Z-1); In formula (Z-1), * represents a bond; Ｚ１ represents a single bond or an alkylene group; Ｚ２ ~L Ｚ４ are each independently -CR Ｌ１ R Ｌ２ -, -O-, -S- or -NR Ｌ３ represents -, and R Ｌ１ ~R Ｌ３ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ may be bonded via a single bond or a linking group to form a ring; Ｚ２ ~L Ｚ４ At least two of them are -CR Ｌ１ R Ｌ２ - is.

[0026] -Regarding the group represented by formula (1)- R in formula (1) １ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryloxy group, an alkoxy group, an aryloxy group, or a heteroaryloxy group. ２ represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a group represented by formula (Z-1). The group represented by formula (Z-1) will be described later. R in formula (1) １ is preferably an alkyl group. ２ is preferably a hydrogen atom.

[0027] R １ and R ２ The alkyl group represented by R preferably has 1 to 15 carbon atoms, and more preferably has 1 to 10 carbon atoms. １The alkyl group represented by R is preferably an alkyl group having 2 or more carbon atoms. In this embodiment, the upper limit of the number of carbon atoms in the alkyl group is preferably 15 or less, more preferably 10 or less, and even more preferably 4 or less. １ and R ２ The alkyl group represented by may be straight-chain, branched, or cyclic, but is preferably straight-chain or branched, and more preferably straight-chain.

[0028] R １ and R ２ The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, more preferably 2 to 10. The alkenyl group is preferably linear or branched, more preferably linear.

[0029] R １ The number of carbon atoms in the alkoxy group represented by is preferably 1 to 15, more preferably 1 to 10. The alkoxy group is preferably linear or branched, more preferably linear.

[0030] R １ and R ２ and an aryl group represented by R １ The aryloxy group represented by the formula (I) preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, still more preferably 6 to 10 carbon atoms, and particularly preferably 6 or 7 carbon atoms.

[0031] R １ The number of carbon atoms constituting the ring of the heteroaryl group and heteroaryloxy group represented by is preferably 1 to 15, and more preferably 1 to 10. Types of heteroatoms constituting the ring of the heteroaryl group and heteroaryloxy group include a nitrogen atom, an oxygen atom, and a sulfur atom. The number of heteroatoms constituting the ring of the heteroaryl group and heteroaryloxy group is preferably 1 to 3, and more preferably 1 or 2. The heteroaryl group and heteroaryloxy group may be a monocyclic ring or a condensed ring.

[0032] L in formula (1) １ represents a single bond or an alkylene group. １The alkylene group represented by the formula (1) preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, and even more preferably 1 or 2 carbon atoms. １ is preferably a single bond or a methylene group.

[0033] Y in formula (1) １ is -CR Ｙ１ R Ｙ２ -, -O-, -S-, or -NR Ｙ３ represents -, R Ｙ１ ~R Ｙ３ R each independently represents a hydrogen atom, an alkyl group, or an aryl group. Ｙ１ ~R Ｙ３ The number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. Ｙ１ ~R Ｙ３ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6 or 7. １ is -CR Ｙ１ R Ｙ２ It is preferable that −.

[0034] -Regarding the group represented by formula (Z-1)- Next, R in formula (1) ２ and Z １ The group represented by formula (Z-1) will be explained.

[0035] L in formula (Z-1) Ｚ１ represents a single bond or an alkylene group. Ｚ１ The alkylene group represented by preferably has 1 to 10 carbon atoms, more preferably 1 to 5 carbon atoms, even more preferably 1 to 3 carbon atoms, still more preferably 1 or 2 carbon atoms, and particularly preferably 1 carbon atom. Ｚ１ is preferably a single bond or a methylene group, and more preferably a single bond.

[0036] L in formula (Z-1) Ｚ２ ~L Ｚ４ are each independently -CRＬ１ R Ｌ２ -, -O-, -S- or -NR Ｌ３ represents -, and R Ｌ１ ~R Ｌ３ R each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group. Ｌ１ ~R Ｌ３ The number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. Ｌ１ ~R Ｌ３ The number of carbon atoms in the aryl group represented by R is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. Ｌ１ ~R Ｌ３ The number of carbon atoms constituting the ring of the heteroaryl group represented by is preferably 1 to 15, more preferably 1 to 10. The types of heteroatoms constituting the ring of the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3, more preferably 1 or 2. The heteroaryl group may be a monocyclic ring or a condensed ring. R Ｌ１ ~R Ｌ３ are each preferably independently a hydrogen atom or an alkyl group, more preferably a hydrogen atom.

[0037] In formula (Z-1), L Ｚ２ ~L Ｚ４ At least two of them are -CR Ｌ１ R Ｌ２ In a preferred embodiment, L Ｚ２ But, -CR Ｌ１ R Ｌ２ In this embodiment, L Ｚ２ Represents -CR Ｌ１ R Ｌ２ R in - Ｌ１ and R Ｌ２ is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom. Ｚ３ and LＺ４ are each independently -CR Ｌ１ R Ｌ２ In this embodiment, L Ｚ３ and L Ｚ４ Represents -CR Ｌ１ R Ｌ２ R in - Ｌ１ and R Ｌ２ is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom.

[0038] L in formula (Z-1) Ｚ２ ~L Ｚ４ are each independently -CR Ｌ１ R Ｌ２ It is particularly preferred that -.

[0039] In formula (Z-1), L Ｚ１ is a single bond or a methylene group, and L Ｚ２ Ga-CR Ｌ１ R Ｌ２ - is preferred, and L Ｚ１ is a single bond, and L Ｚ２ Ga-CR Ｌ１ R Ｌ２ It is more preferable that it is -.

[0040] R in formula (Z-1) Ｚ１ and R Ｚ２ R each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group. Ｚ１ and R Ｚ２ The number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. Ｚ１ and R Ｚ２ The number of carbon atoms in the aryl group represented by R is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. Ｚ１ and R Ｚ２The number of carbon atoms constituting the ring of the heteroaryl group represented by is preferably 1 to 15, more preferably 1 to 10. The types of heteroatoms constituting the ring of the heteroaryl group include nitrogen atoms, oxygen atoms, and sulfur atoms. The number of heteroatoms constituting the ring of the heteroaryl group is preferably 1 to 3, more preferably 1 or 2. The heteroaryl group may be a monocyclic ring or a condensed ring. R Ｚ１ and R Ｚ２ are preferably each independently a hydrogen atom or an alkyl group.

[0041] R in formula (Z-1) Ｚ１ and R Ｚ２ may be bonded via a single bond or a linking group to form a ring. Examples of the linking group when forming the ring include -O-, -S-, -NR Ｌ１１ -, -CR Ｌ１２ R Ｌ１３ - is mentioned. Ｌ１１ ~R Ｌ１３ R each independently represents a hydrogen atom, an alkyl group, or an aryl group, and is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom. Ｌ１１ ~R Ｌ１３ The number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. Ｌ１１ ~R Ｌ１３ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. The ring formed is preferably a 3- to 8-membered ring, more preferably a 4- to 7-membered ring, and even more preferably a 5- or 6-membered ring. The ring formed is preferably a non-aromatic ring, and more preferably an aliphatic hydrocarbon ring. The ring formed is particularly preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0042] A preferred embodiment of the group represented by formula (Z-1) is Ｚ１ is a single bond or a methylene group, and L Ｚ２ ~LＺ４ are each independently -CR Ｌ１ R Ｌ２ - and R Ｌ１ and R Ｌ２ are each independently a hydrogen atom or an alkyl group, and R Ｚ１ and R Ｚ２ are each independently a hydrogen atom or an alkyl group. Ｌ１ , R Ｌ２ , R Ｚ１ and R Ｚ２ are each preferably a hydrogen atom.

[0043] Another preferred embodiment of the group represented by formula (Z-1) is Ｚ１ is a single bond or a methylene group, and L Ｚ２ ~L Ｚ４ are each independently -CR Ｌ１ R Ｌ２ - and R Ｌ１ and R Ｌ２ are each independently a hydrogen atom or an alkyl group, and R Ｚ１ and R Ｚ２ In this embodiment, R Ｌ１ and R Ｌ２ are preferably each a hydrogen atom. Ｚ１ and R Ｚ２ The ring formed by bonding is preferably an aliphatic hydrocarbon ring, more preferably a 3- to 8-membered aliphatic hydrocarbon ring, still more preferably a 4- to 7-membered aliphatic hydrocarbon ring, and particularly preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0044] -Regarding the Ring-Containing Group- The ring-containing group condensed with the group represented by formula (1) above contains at least one ring A selected from an aromatic ring and a heterocyclic ring.

[0045] The number of carbon atoms in the aromatic ring in ring A is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6. The aromatic ring may be a monocyclic ring or a fused ring. The heterocyclic ring in ring A is preferably a 5- or 6-membered ring. The heteroatom in the heterocyclic ring is preferably an oxygen atom, a nitrogen atom, or a sulfur atom. The number of heteroatoms in the heterocyclic ring is preferably 1 to 3. The heterocyclic group may be a monocyclic ring or a fused ring.

[0046] The aromatic ring and the heterocyclic ring may be a monocyclic aromatic ring or heterocyclic ring, or may be a condensed aromatic ring or heterocyclic ring in which two or more rings are condensed. An example of the monocyclic aromatic group is a benzene ring group. The benzene ring group preferably has a substituent. Examples of the substituent include the following substituents, such as an aryl group, -OR ｘ1０１ , -SR ｘ１０１ , -COR ｘ１０１ or -NR ｘ１０２ R ｘ１０３ The aromatic ring and the heterocyclic ring are preferably aromatic rings or heterocyclic rings each having two or more fused rings, and more preferably aromatic rings or heterocyclic rings each having three or more fused rings. Examples of aromatic rings or heterocyclic rings each having two or more fused rings include a naphthalene ring, a benzofuran ring, a benzothiophene ring, a naphthyl ring, a quinolyl ring, a quinoxaline ring, a carbazole ring, a dibenzothiophene ring, a dibenzofuran ring, a fluorene ring, a naphthocarbazole ring, and an indolyl ring. These may have a substituent. Examples of the substituent include an alkyl group, an aryl group, a heteroaryl group, -OR ｘ1０１ , -SR ｘ１０１ , -COR ｘ１０１ , -SO ２ R ｘ１０１ , -NR ｘ１０２ R ｘ１０３ , -CONR ｘ１０２ R ｘ１０３ , -NR ｘ１０４ COR ｘ１０５ , -OCOR ｘ１０１ , -COOR ｘ１０１ , -SCOR ｘ１０１ , -OCSR ｘ１０１, -COSR ｘ１０１ , -CSOR ｘ１０１ , a cyano group, a nitro group, a hydroxy group, a thiol group, a carboxy group, and a halogen atom. ｘ１０１ ~R ｘ１０５ R each independently represents a monovalent organic group. ｘ１０１ ~R ｘ１０５ The monovalent organic group represented by is an alkyl group, an aromatic ring group, a heterocyclic group, -OR ｘ２０１ , -SR ｘ２０１ , -COR ｘ２０１ , -SO ２ R ｘ２０１ , -NR ｘ２０２ R ｘ２０３ , -CONR ｘ２０２ R ｘ２０３ , -NR ｘ２０４ COR ｘ２０５ , -OCOR ｘ２０１ , -COOR ｘ２０１ , -SCOR ｘ２０１ , -OCSR ｘ２０１ , -COSR ｘ２０１ , -CSOR ｘ２０１ , a cyano group, a nitro group, a hydroxy group, a thiol group, a carboxy group, and a halogen atom. ｘ２０１ ~R ｘ２０５ R each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group. ｘ１０１ ~R ｘ１０５ The aromatic ring group and heterocyclic ring group shown as the monovalent organic group represented by may be a monocyclic aromatic ring group or heterocyclic ring group, or may be a condensed ring aromatic ring group or heterocyclic ring group in which two or more rings are condensed. ｘ１０１ ~R ｘ１０５ The alkyl group, aromatic ring group, and heterocyclic group shown as the monovalent organic group represented by may further have a substituent, such as an alkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkylthio group, an arylthio group, a dialkylamino group, a diarylamino group, an acyl group, or an acyloxy group.

[0047] Examples of aromatic or heterocyclic rings that are fused rings formed by condensing three or more rings include the rings shown below. Ring A is preferably a ring represented by formula (Ar-1), (Ar-2), (Ar-3), (Ar-4), (Ar-6), (Ar-10), (Ar-11), (Ar-14), (Ar-15), (Ar-19), (Ar-21), (Ar-23), (Ar-24), (Ar-26), (Ar-27) or (Ar-29), and more preferably a ring represented by formula (Ar-1), (Ar-2), (Ar-3) or (Ar-4).

[0048]

[0049] In the above formula, R ａ１ ~R ａ３２ and R ｂ１ ~R ｂ３２ each independently represents a substituent or a bond, *1 represents the position of the fused ring with the group represented by formula (1), R ａｒ１ ~R ａｒ２５ each independently represents a hydrogen atom, an alkyl group, or an aryl group; k1 to k32 each independently represent an integer of 0 to (4-s); n1 to n32 each independently represent an integer of 0 to (4-t); s and t each independently represent 0 or 2; and at least one of s and t is 2. R ａ１ ~R ａ３２ and R ｂ１ ~R ｂ３２ Examples of the substituent represented by include the substituents described above.

[0050] The ring-containing group may consist of only the above-mentioned ring A, or may be a group in which a plurality of aromatic rings, a plurality of heterocyclic rings, or an aromatic ring and a heterocyclic ring are bonded together via a single bond or a linking group. Examples of the linking group include -O-, -CR Ａ１０１ R Ａ１０２ -, -S-, -CO-, -N<, etc. Ａ１０１ and R Ａ１０２ each independently represents a hydrogen atom or an alkyl group.

[0051] The ring-containing group preferably contains a ring represented by formula (A-1) or formula (A-2), more preferably a ring represented by formula (A-2). The specific compound is preferably a compound having a structure in which a group represented by formula (1) is condensed with a ring represented by formula (A-2).

[0052] In formula (A-1), *1 represents the position of the fused ring with the group represented by formula (1), ｘ１ and R ｘ２ are each independently an alkyl group, an aryl group, a heteroaryl group, or —OR ｘ１０１ , -SR ｘ１０１ , -COR ｘ１０１ , -SO ２ R ｘ１０１ , -NR ｘ１０２ R ｘ１０３ , -CONR ｘ１０２ R ｘ１０３ , -NR ｘ１０４ COR ｘ１０５ , -OCOR ｘ１０１ , -COOR ｘ１０１ , -SCOR ｘ１０１ , -OCSR ｘ１０１ , -COSR ｘ１０１ , -CSOR ｘ１０１ , a cyano group, a nitro group, a hydroxyl group, a thiol group, a carboxyl group, a halogen atom or a bond, and R ｘ１０１ ~R ｘ１０５ each independently represents a monovalent organic group; s and t each independently represent 0 or 2, and at least one of s and t is 2; m1 represents an integer of 0 to (4-s); m2 represents an integer of 0 to (4-t); and when m1 is 2 or more, a plurality of R ｘ１ may be the same or different, and multiple R ｘ１ may be bonded to each other via a single bond or a linking group to form a ring, and when m2 is 2 or more, a plurality of R ｘ２ may be the same or different, and multiple R ｘ２ may be bonded to each other via a single bond or a linking group to form a ring, ｘ３ and R ｘ４each independently represents a single bond, —CR ｘ１１ R ｘ１２ -, -O-, -S-, -NR ｘ１３ - or -C(=O)-, R ｘ１１ ~R ｘ１３ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; n represents an integer of 0 or 1; when n is 0, R ｘ３ does not exist; In formula (A-2), *1 represents the position of the fused ring with the group represented by formula (1), R ｘ５ represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R ｘ６ represents an alkyl group, an aryl group, a heteroaryl group, or a bond, p1 represents an integer of 0 to 2, and when p1 is 2, there are multiple R ｘ６ may be the same or different, and multiple R ｘ６ They may be bonded to each other via a single bond or a linking group to form a ring.

[0053] R ｘ１０１ ~R ｘ１０５ Examples of the monovalent organic group represented by include the monovalent organic groups described above.

[0054] In formula (A-1), it is preferable that m1 and m2 each independently represent 0 or 1.

[0055] In formula (A-1), when m1 is 2 or more, a plurality of R ｘ１ They may be bonded to each other via a single bond or a linking group to form a ring. ｘ２ In addition, in formula (A-2), when p1 is 2, a plurality of R ｘ６ They may be bonded to each other via a single bond or a linking group to form a ring, and preferably form a ring. The linking group when forming the ring is —O—, —S—, —NR Ｌ１ -, -CR Ｌ２ R Ｌ３ -, -CR Ｌ４ =CR Ｌ５ -CR Ｌ６ =CRＬ７ - is mentioned. Ｌ１ ~R Ｌ７ R each independently represents a hydrogen atom, an alkyl group, or an aryl group, and is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom. Ｌ１ ~R Ｌ７ The number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. Ｌ１ ~R Ｌ７ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6 or 7. The ring formed is preferably a 5-membered or 6-membered ring. The ring formed may be an aromatic ring or a non-aromatic ring.

[0056] In formula (A-2), when p1 is 2, there are a plurality of R ｘ６ They are preferably bonded to each other to form an aromatic ring, more preferably a benzene ring.

[0057] R in formula (A-2) ｘ５ represents a hydrogen atom, an alkyl group, an aryl group or a heteroaryl group, preferably an aryl group, and more preferably a group represented by formula (Rx-50).

[0058] In formula (Rx-50), * represents a bond, ｘ５１ is a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -OR ｘ５０１ , -SR ｘ５０１ , -COR ｘ５０１ , -SO ２ R ｘ５０１ , -NR ｘ５０２ R ｘ５０３ , -CONR ｘ５０２ R ｘ５０３ , -NR ｘ５０４ COR ｘ５０５ , -OCOR ｘ５０１ , -COOR ｘ５０１ , -SCOR ｘ５０１ , -OCSR ｘ５０１, -COSR ｘ５０１ , -CSOR ｘ５０１ , a cyano group, a nitro group, a hydroxyl group, a thiol group, a carboxyl group, or a halogen atom; R ｘ５０１ ~R ｘ５０５ each independently represents a monovalent organic group; ｘ５２ represents an alkyl group, an aryl group, or a halogen atom; k represents an integer of 0 to 4; when k is 2 or more, a plurality of R ｘ５２ may be the same or different, and multiple R ｘ５２ Two of these may be bonded via a single bond or a divalent linking group to form a ring.

[0059] R in formula (Rx-50) ｘ５１ is a hydrogen atom, -COR ｘ５０１ or -SO ２ R ｘ５０１ Preferably, -COR ｘ５０１ or -SO ２ R ｘ５０１ More preferably, -COR ｘ５０１ It is more preferable that:

[0060] R ｘ５０１ ~R ｘ５０５ The monovalent organic group represented by is an alkyl group, an aromatic ring group, a heterocyclic group, -OR ｘ１００１ , -SR ｘ１００１ , -COR ｘ１００１ , -SO ２ R ｘ１００１ , -NR ｘ１００２ R ｘ１００３ , -CONR ｘ１００２ R ｘ１００３ , -NR ｘ１００４ COR ｘ１００５ , -OCOR ｘ１００１ , -COOR ｘ１００１ , -SCOR ｘ１００１ , -OCSR ｘ１００１ , -COSR ｘ１００１ , -CSOR ｘ１００１ , a cyano group, a nitro group, a hydroxy group, a thiol group, a carboxy group, and a halogen atom. ｘ１００１ ~R ｘ１００５R each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group. ｘ５０１ ~R ｘ５０５ The aromatic ring group and heterocyclic ring group shown as the monovalent organic group represented by may be a monocyclic aromatic ring group or heterocyclic ring group, or may be a condensed ring aromatic ring group or heterocyclic ring group in which two or more rings are condensed. ｘ５０１ ~R ｘ５０５ The alkyl group, aromatic ring group, and heterocyclic group shown as the monovalent organic group represented by may further have a substituent, such as an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio group, an arylthio group, a heteroarylthio group, an alkylamino group, an arylamino group, a nitro group, a halogen atom, an acyl group, or an acyloxy group.

[0061] -COR ｘ５０１ In R ｘ５０１ The monovalent organic group represented by is preferably an aromatic ring group or a heterocyclic group, and more preferably an aromatic ring group or a heterocyclic group having three or more fused rings. Examples of aromatic ring groups include a phenyl group, a naphthyl group, an anthranyl group, a pyrenyl group, and a biphenyl group. Examples of heterocyclic groups include a furyl group, a thiophenyl group, a pyrrole group, a benzofuryl group, a benzothiophenyl group, and an indole group. Specific examples of aromatic ring groups or heterocyclic groups having three or more fused rings include a dibenzofuran group, a dibenzothiophene group, a carbazole group, and a fluorene group. These groups may further have a substituent. Examples of the substituent include an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, a heteroaryloxy group, an alkylthio group, an arylthio group, a heteroarylthio group, an alkylamino group, an arylamino group, a nitro group, a halogen atom, an acyl group, and an acyloxy group.

[0062] In formula (Rx-50), k represents an integer of 0 to 4, preferably 0 or 1, and more preferably 0.

[0063] When k is 2 or more, multiple R ｘ５２Two of them may be bonded to each other via a single bond or a linking group to form a ring. Examples of the linking group include —O—, —S—, —NR Ｌ１ -, -CR Ｌ２ R Ｌ３ -, -CR Ｌ４ =CR Ｌ５ -CR Ｌ６ =CR Ｌ７ - is mentioned. Ｌ１ ~R Ｌ７ R each independently represents a hydrogen atom, an alkyl group, or an aryl group, and is preferably a hydrogen atom or an alkyl group, and more preferably a hydrogen atom. Ｌ１ ~R Ｌ７ The number of carbon atoms in the alkyl group represented by R is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. Ｌ１ ~R Ｌ７ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, even more preferably 6 to 10, and particularly preferably 6 or 7. The ring formed is preferably a 3- to 7-membered ring, more preferably a 5- or 7-membered ring, and even more preferably a 5- or 6-membered ring. The ring formed may be an aromatic ring or a non-aromatic ring.

[0064] When n in formula (A-1) is 0, R ｘ３ does not exist, the group represented by formula (A-1) becomes a group represented by formula (A-1a) shown below.

[0065] In the specific compound, the ring (cyclic oxime structure) formed by condensing the group represented by formula (1) with the ring A is preferably a 5- to 8-membered ring, more preferably a 5- to 7-membered ring, and even more preferably a 5- or 6-membered ring.

[0066] The specific compound is preferably a compound having 1 to 3 rings (cyclic oxime structures) formed by condensing the group represented by formula (1) with the ring A, and more preferably a compound having 1 or 2 rings.

[0067] The specific compound is preferably a compound represented by any one of formulas (2)-1 to (2)-3.

[0068] In formula (2)-1, R １１ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryloxy group, an alkoxy group, an aryloxy group, or a heteroaryloxy group; L １１ represents a single bond or an alkylene group; Y １１ is -CR Ｙ１ R Ｙ２ -, -O-, -S-, or -NR Ｙ３ represents -, R Ｙ１ ~R Ｙ３ each independently represents a hydrogen atom, an alkyl group, or an aryl group; R １２ represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a group represented by formula (Z-1); Z １ represents a group represented by formula (Z-1), １１ represents a ring-containing group containing at least one ring A selected from an aromatic ring and a heterocyclic ring.

[0069] In formula (2)-2 and formula (2)-3, R ２１ and R ２２ each independently represents an alkyl group, an alkenyl group, an aryl group, a heteroaryloxy group, an alkoxy group, an aryloxy group, or a heteroaryloxy group; L ２１ and L ２２ each independently represents a single bond or an alkylene group; ２１ and Y ２２ are each independently -CR Ｙ１ R Ｙ２ -, -O-, -S-, or -NR Ｙ３ represents -, R Ｙ１ ~R Ｙ３ each independently represents a hydrogen atom, an alkyl group, or an aryl group; R ２３ and R ２４ each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a group represented by formula (Z-1), ２１ and Z２２ each independently represents a group represented by formula (Z-1), １２ represents a ring-containing group containing at least one ring A selected from an aromatic ring and a heterocyclic ring.

[0070] R in formula (2)-1 to formula (2)-3 １１ , R ２１ and R ２２ is R in formula (1). １ The R in formula (2)-1 to formula (2)-3 has the same meaning as above, and the preferred range is also the same. １２ , R ２３ and R ２４ is R in formula (1). ２ The L in formulas (2)-1 to (2)-3 has the same meaning as above, and the preferred range is also the same. １１ , L ２１ and L ２２ is L in formula (1). １ The meanings and preferred ranges of Y in formulas (2)-1 to (2-3) are the same as those of Y in formulas (2)-1 to (2-3). １１ , Y ２１ and Y ２２ is Y in formula (1). １ The Z in formula (2)-1 to formula (2)-3 has the same meaning as above, and the preferred range is also the same. １１ , Z ２１ and Y ２２ is Z in formula (1). １ The same applies to the preferred range.

[0071] X in formula (2)-1 to formula (2)-3 １１ and X １２ The ring-containing groups are listed above, and the preferred ranges are also the same.

[0072] The molecular weight of the specific compound is preferably 200 to 2000. The upper limit is preferably 1000 or less, more preferably 900 or less. The lower limit is preferably 300 or more, more preferably 400 or more.

[0073] The molar absorption coefficient of a specific compound at a wavelength of 365 nm is 20,000 L mol －１ ・cm －１ It is preferable that the concentration is less than 15,000 L mol －１・cm －１ More preferably, it is less than 10,000 L mol －１ ・cm －１ More preferably, it is less than 5000 L mol －１ ・cm －１ The lower limit is most preferably less than 100 L mol －１ ・cm －１ It can be 500 L mol or more. －１ ・cm －１ When the molar absorption coefficient of the specific compound at a wavelength of 365 nm is high, a large amount of radicals are generated in the initial stage of exposure, and the radicals tend to easily diffuse toward the film surface side, which may result in insufficient curing at the bottom of the film. －１ ・cm －１ This allows the diffusion of radicals generated during exposure in the film to be appropriately suppressed, further enhancing the curability inside the film, which allows the film to be thoroughly cured all the way to the bottom, resulting in the formation of pixels with more excellent rectangular cross-sectional shapes.

[0074] From the viewpoint of sensitivity, the molar absorption coefficient of the specific compound at a wavelength of 248 nm is 5000 L mol －１ ・cm －１ More than 10,000 L mol is preferable. －１ ・cm －１ More preferably, 20,000 L mol or more －１ ・cm －１ More preferably, 30,000 L mol or more －１ ・cm －１ The upper limit of the molar absorption coefficient at a wavelength of 248 nm is not particularly limited, but is preferably 200,000 L mol －１ ・cm －１ It is preferable that:

[0075] The specific compound is absorbed at the long wavelength end (molar absorption coefficient is 100 L mol －１ ・cm －１The longest wavelength (the wavelength at which the absorption peak is shorter than the longest wavelength) is preferably 450 nm or less, more preferably 400 nm or less, and even more preferably 380 nm or less. When the long wavelength end of absorption is in the above-mentioned range, yellow light fogging is prevented and the light stability during synthesis is excellent. Furthermore, when the specific compound is applied to an optical filter such as a color filter, the color reproducibility is good because the specific compound does not exhibit yellow color.

[0076] The molar absorption coefficient of a specific compound is measured by the following method: 12.5 mg of the specific compound is weighed out and placed in a 100 mL volumetric flask. Acetonitrile is added to this and completely dissolved. 2 mL of this solution is taken with a volumetric pipette and made up to a 25 mL volumetric flask. This is the measurement sample. The measurement sample is placed in a 5 mL quartz glass cell, 1 cm square, and the absorbance is measured in air to calculate the molar absorption coefficient. Examples of measurement devices include an ultraviolet-visible-near-infrared spectrophotometer (UH4150, manufactured by Hitachi High-Tech Corporation).

[0077] When a specific compound has E- and Z-geometric isomers, the specific compound may be the E-geometric isomer, the Z-geometric isomer, or a mixture of the E- and Z-geometric isomers.

[0078] The synthesis method of the specific compound is not particularly limited, and the specific compound can be synthesized by referring to a known method. For example, the specific compound can be synthesized by a general synthesis method of an oxime ester or a ketoxime ester. Specific synthesis methods that can be referred to include those disclosed in Japanese Patent Publication No. 2012-519191, which uses hydroxylamine hydrochloride, and Japanese Patent Publication No. 2012-526185, which uses isoamyl nitrite.

[0079] The specific compound can also be synthesized by the following synthesis method 1 or synthesis method 2.

[0080] (Synthesis Method 1) The α-position of a cyclic ketone compound is anionized with a base (sodium hydroxide, potassium hydroxide, sodium methoxide, potassium t-butoxide, sodium hydride, lithium diisopropylamide, triethylamine, diazabicycloundecene, etc.), and then reacted with a halogenated alkyl group having a branched structure, etc., to form a SＮ２ A nucleophilic substitution reaction is carried out to obtain a cyclic ketone having a branched alkyl structure at the α-position. This cyclic ketone having a branched alkyl structure at the α-position is converted into an oxime with hydroxylamine hydrochloride, and then esterified with a carboxylic acid chloride or the like to synthesize a specific compound.

[0081] (Synthesis Method 2) The α-position of a cyclic ketone compound is anionized with a base (sodium hydroxide, potassium hydroxide, sodium methoxide, potassium t-butoxide, sodium hydride, lithium diisopropylamide, triethylamine, diazabicycloundecene, etc.), and the anionized compound is reacted with dimethyl carbonate, etc., to obtain an active methine compound having an ester group at the α-position of the cyclic ketone. The active hydrogen of this active methine compound is anionized with the base, etc., to obtain a halogenated alkyl group having a branched structure, etc., and a S-type alkyl group. Ｎ２ A nucleophilic substitution reaction is carried out, and the ester is hydrolyzed under acidic conditions and heated for decarboxylation to obtain a cyclic ketone with a branched alkyl group at the α-position. This cyclic ketone with a branched alkyl group at the α-position is converted into an oxime with hydroxylamine hydrochloride, and then esterified with a carboxylic acid chloride or the like to synthesize a specific compound.

[0082] When a compound having multiple carbonyl groups in one molecule is used as an intermediate, the carbonyl group to be oximed does not have to be only one. For example, a dioxime in which two carbonyl groups are oximed or a trioxime in which three carbonyl groups are oximed may be present. These dioximes and trioximes are converted into dioxime esters and trioxime esters through an esterification step. When these are present, the total amount of dioxime esters and trioxime esters is preferably 0.001 to 10% by mass, more preferably 0.001 to 8% by mass, and even more preferably 0.001 to 5% by mass of the specific compound.

[0083] The photocurable composition of the present invention may contain an oxime precursor and a ketone precursor before oximation. When these are contained, the content of each of the oxime precursor and the ketone precursor is preferably 0.001 to 10% by mass, more preferably 0.001 to 8% by mass, and even more preferably 0.001 to 5% by mass, of the mass of the specific compound.

[0084] Specific examples of the specific compounds include compounds A-1 to A-223 shown below. The molar absorption coefficient of each compound at a wavelength of 365 nm is shown in the "Molar absorption coefficient" column of the table below. The unit of the values ​​shown in the "Molar absorption coefficient" column is L mol －１ ・cm －１ is.

[0085]

[0086] X in the above table １１ , Z １１ , X １２ , Z ２１ , Z ２１ The structures abbreviated in the column are as follows: １１ , R １２ , R ２１ ~R ２４ In the column, Me represents a methyl group, Et represents an ethyl group, Pr represents a propyl group, Bu represents a butyl group, iPr represents an isopropyl group, tBu represents a tert-butyl group, Hex represents a hexyl group, EtE represents an ethenyl group, iPrE represents an isopropenyl group, OMe represents a methoxy group, OEt represents an ethoxy group, OtBu represents a tert-butoxy group, Ph represents a phenyl group, OPh represents a phenoxy group, Fr represents a furyl group, and OFr represents a furyloxy group. Note that * and wavy lines in the structural formulas shown below each represent a bond. In formulas (X1-1) to (X1-41), * represents a bond to the oxime group in formula (2)-1, and the wavy line represents Y in formula (2)-1. １１The * on the right side in formulas (X2-1) to (X1-19) represents the bond to the right side (R ２１ The wavy line represents the bond to the oxime group of the Y ２１ The * on the left side in formulas (X2-1) to (X1-19) represents the bond to the left side (R ２２ The wavy line represents the bond to the oxime group of the Y ２２ It is a combination of.

[0087] The photocurable composition of the present invention may contain only one of the specific compounds described above, or two or more of them in combination. By using two or more of them in combination, it is possible to obtain an effect of achieving a better balance between resolution and sensitivity, whether the exposure light source is KrF line or i-line.

[0088] The impurities that may be contained in the specific compound are described below. The content of water contained in the specific compound is preferably 10 parts by mass or less, more preferably 5 parts by mass or less, more preferably 3 parts by mass or less, and particularly preferably 1 part by mass or less, relative to 100 parts by mass of the specific compound. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. The content of organic solvent contained in the specific compound is preferably 10 parts by mass or less, more preferably 5 parts by mass or less, more preferably 3 parts by mass or less, and particularly preferably 1 part by mass or less, relative to 100 parts by mass of the specific compound. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. The content of organic acid and organic acid anhydride contained in the specific compound is preferably 10 parts by mass or less, more preferably 5 parts by mass or less, more preferably 3 parts by mass or less, and particularly preferably 1 part by mass or less, relative to 100 parts by mass of the specific compound. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. Examples of organic acids include formic acid, acetic acid, propionic acid, pivalic acid, succinic acid, phthalic acid, and benzoic acid. Examples of organic acid anhydrides include anhydrides of these acids. The content of the organic base contained in the specific compound is preferably 10 parts by mass or less, more preferably 5 parts by mass or less, more preferably 3 parts by mass or less, and particularly preferably 1 part by mass or less, per 100 parts by mass of the specific compound. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. Examples of organic bases include triethylamine, dimethylamine, diethylamine, pyridine, piperidine, pyrrolidine, morpholine, and amines used in the production of the specific compound.The content of halogen contained in the specific compound is preferably 5 parts by mass or less, more preferably 3 parts by mass or less, and even more preferably 1 part by mass or less, per 100 parts by mass of the specific compound. The lower limit can be 0 parts by mass, 0.0001 parts by mass, 0.001 parts by mass, or 0.01 parts by mass. Examples of halogen include Cl, Br, F, and I, and may be organic compounds containing these halogen atoms. Ions of these halogens may also be used. The content of residual metal contained in the specific compound is preferably 0.1 parts by mass or less, more preferably 0.01 parts by mass or less, and even more preferably 0.001 parts by mass or less, per 100 parts by mass of the specific compound. Less than 0.0001 parts by mass is even more preferable, and it is particularly preferable that the content be below the detection limit. The type of residual metal is not particularly limited, but examples include Li, Na, Mg, Al, K, Ca, Cr, Mn, Fe, Co, Ni, Cu, Zn, Cd, Pb, Ti, V, As, Ag, Sn, Ba, W, Au, and Zr.

[0089] (Other Photopolymerization Initiators) The photocurable composition of the present invention may further contain a photopolymerization initiator other than the specific compound described above (hereinafter also referred to as other photopolymerization initiator). When the specific compound described above is used in combination with the other photopolymerization initiator, the content of the other photopolymerization initiator is preferably 1 to 1,000 parts by mass per 100 parts by mass of the specific compound. The upper limit is preferably 500 parts by mass or less, and more preferably 200 parts by mass or less. The lower limit is preferably 10 parts by mass or more, and more preferably 50 parts by mass or more.

[0090] Examples of the other photopolymerization initiator include halogenated hydrocarbon derivatives (e.g., compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, etc. The other photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, or a 3-aryl-substituted coumarin compound, more preferably an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, or an acylphosphine compound, even more preferably an α-aminoketone compound or an oxime compound, and particularly preferably an oxime compound.

[0091] Other photopolymerization initiators include the compounds described in paragraphs 0065 to 0111 of JP-A-2014-130173, the compounds described in Japanese Patent No. 6301489, and the compounds described in MATERIAL STAGE 37-60pp, vol. 19, No. 3,peroxide-based photopolymerization initiators described in WO 2019, photopolymerization initiators described in WO 2018 / 221177, photopolymerization initiators described in WO 2018 / 110179, photopolymerization initiators described in JP 2019-043864 A, photopolymerization initiators described in JP 2019-044030 A, peroxide-based initiators described in JP 2019-167313 A, aminoacetophenone-based initiators having an oxazolidine group described in JP 2020-055992 A, oxime-based photopolymerization initiators described in JP-A-2020-172619, polymers described in JP-A-2020-172619, compounds represented by formula 1 described in WO 2020 / 152120, compounds described in JP-A-2021-181406, photopolymerization initiators described in JP-A-2022-013379, compounds represented by formula (1) described in JP-A-2022-015747, fluorine-containing fluorene oxime ester-based photoinitiators described in JP-T-2021-507058, and those described in Chinese Patent Application Publication No. 110764367. Initiators described in JP-A-2022-518535, initiators described in WO 2021 / 175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP-A-2022-078550, compounds described in Korean Patent Publication No. 10-2017-0087330, compounds described in WO 2022 / 075452, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, Korean Patent Publication No. 10-2022-0076157 Compounds described in WO 2019 / 013112, compounds having a triarylamine or N-arylcarbazole skeleton described in paragraphs 0042 to 0062, oxime ester photopolymerization initiators described in Japanese Patent No. 7219378, photopolymerization initiators described in Korean Patent Publication No. 10-2021-0146174, photopolymerization initiators described in WO 2019 / 013112, photopolymerization initiators described in JP 2023-033731, initiators described in JP 2022-515524, initiators described in JP 2023-517304, initiators described in Chinese Patent Publication No. 114149517 and initiators described in Japanese Patent No. 7267532, etc.

[0092] Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0093] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (all manufactured by IGM Resins B.V.), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF), etc.

[0094] Examples of the oxime compound include the compounds described in paragraph 0142 of WO 2022 / 085485, the compounds described in Japanese Patent No. 5430746, the compounds described in Japanese Patent No. 5647738, the compounds represented by the general formula (1) of JP-A-2021-173858, and the compounds described in paragraphs 0022 to 0024, and the compounds represented by the general formula (1) of JP-A-2021-170089 and the compounds described in paragraphs 0117 to 0120. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), etc. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04, Irgacure OXE05, Irgacure OXE06, Irgacure OXE07, Irgacure OXE08, Irgacure OXE09, Irgacure OXE10, Irgacure OXE11, Irgacure OXE12, Irgacure OXE13, Irgacure OXE14, Irgacure OXE15, Irgacure OXE16, Irgacure OXE17, Irgacure OXE18, Irgacure OXE19, Irgacure OXE20, Irgacure OXE21, Irgacure OXE22, Irgacure OXE23, Irgacure OXE24, Irgacure OXE25, Irgacure OXE26, Irgacure OXE27, Irgacure OXE28, Irgacure OX OXE04 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, TR-PBG-305, TR-PBG-309, TR-PBG-3054, TR-PBG-3057, TR-PBG-314, TR-PBG-327, TR-PBG-345, TR-PBG-346, TR- Examples of the oxime compound include PBG-358, TR-PBG-365, TR-PBG-380, TR-PBG-610, TR-PBG-A, and TR-PBG-B (all manufactured by TRONLY Corporation), and ADEKA OPTOMER N-1919 (manufactured by ADEKA Corporation; photopolymerization initiator 2 described in JP 2012-014052 A). In addition, it is also preferable to use, as the oxime compound, a compound that is not colorable or a compound that is highly transparent and does not easily discolor. Commercially available products include ADEKA ARCLES NCI-730, NCI-831, NCI-831E, and NCI-930 (all manufactured by ADEKA Corporation).

[0095] Other photopolymerization initiators that can be used include oxime compounds having a fluorene ring, oxime compounds having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, oxime compounds having a fluorine atom, oxime compounds having a nitro group, oxime compounds having a benzofuran skeleton, oxime compounds in which a substituent having a hydroxy group is bonded to a carbazole skeleton, and the compounds described in paragraphs 0143 to 0149 of WO 2022 / 085485.

[0096] As another photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0097] In formula (OX-1), X １ａ represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocyclic ring; １ａ represents a hydrogen atom or an acyl group; R ２ａ represents an alkyl group or an aryl group; R ３ａ and R ４ａ each independently represents a hydrogen atom or an alkyl group; Alk １ and Alk ２ each independently represents an alkyl group; R ３ａ and R ４ａ may be bonded to form a ring, Alk １ and Alk ２ may be bonded to form a ring, and n represents 0 or 1.

[0098] X in formula (OX-1) １ａ Examples of the divalent linking group represented by include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic rings are bonded via a single bond or a linking group, a divalent group in which two or more heterocycles are bonded via a single bond or a linking group, and a divalent group in which an aromatic ring and a heterocycle are bonded via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic rings, heterocyclic groups, or aromatic rings and heterocycles include -CH ２ -, -O-, -CO-, -S-, -NR ｘ - and groups combining these. ｘrepresents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0099] X in formula (OX-1) １ａ is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6).

[0100] In the formula R Ｘ１ ~R Ｘ９ each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group, and * represents a bond.

[0101] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0102] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0103] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkynyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0104] R Ｘ１ ~R Ｘ９The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group.

[0105] R Ｘ１ ~R Ｘ９ The heteroaryl group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heteroaryl group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heteroaryl group is preferably 1 to 3. The heteroaryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0106] R in formula (OX-1) １ａ represents a hydrogen atom or an acyl group, and is preferably an acyl group.

[0107] R in formula (OX-1) ２ａ represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high. ２ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ２ａ The alkyl group represented by R is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. ２ａ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

[0108] R in formula (OX-1) ３ａ and R ４ａR each independently represents a hydrogen atom or an alkyl group, and is preferably a hydrogen atom. ３ａ and R ４ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ３ａ and R ４ａ may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0109] Alk of formula (OX-1) １ and Alk ２ each independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. Alk １ and Alk ２ may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

[0110] In formula (OX-1), n ​​represents 0 or 1, and is preferably 0.

[0111] Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP-A No. 2012-113104 and the compound described in paragraph 0041 of JP-A No. 2012-189997.

[0112] As another photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0113]

[0114] In formula (OX-2), R １ｂ and R ２ｂ each independently represents a substituent, R ３ｂ ~R ７ｂ each independently represents a hydrogen atom or a substituent, Ar １ｂ represents an aryl group which may have a substituent or a heteroaryl group which may have a substituent; n represents 0 or 1;

[0115] R １ｂ and R ２ｂ Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heteroaryl group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group.

[0116] R ３ｂ ~R ７ｂ Examples of the substituent represented by R include a halogen atom, an alkyl group, and an aryl group. Examples of the alkyl group and the aryl group include those described above. ３ｂ ~R ７ｂ is preferably a hydrogen atom.

[0117] Ar １ｂ represents an aryl group which may have a substituent or a heteroaryl group which may have a substituent, Ar １ｂis preferably an aryl group which may have a substituent. The number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferred.

[0118] As another photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0119]

[0120] In formula (OX-3), Ar １ｃ represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group; Ar ２ｃ represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group; R １ｃ ~R ３ｃ each independently represents a substituent; １ｃ is a single bond or CR １１ｃ R １２ｃ represents R １１ｃ and R １２ｃ each independently represents a hydrogen atom, an alkyl group, or an aryl group; １ｃ Ha-CH ２ represents -, -N-, -O- or -S-; k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

[0121] R １ｃ and R ２ｃExamples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heteroaryl group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group. R ２ｃ is preferably an alkyl group having a branched or cyclic structure.

[0122] R ３ｃ Examples of the substituent represented by include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group and an acyl group, and an acyl group is preferred.

[0123] L １ｃ is a single bond or CR １１ｃ R １２ｃ represents R １１ｃ and R １２ｃ R each independently represents a hydrogen atom, an alkyl group, or an aryl group. １１ｃ and R １２ｃ The alkyl group and aryl group in R １ｃ and R ２ｃ When k is 1, L １ｃ is preferably a single bond.

[0124] X １ｃ is -CH ２ It represents -, -N-, -O- or -S-, and is preferably -O- or -S-.

[0125] Ar １ｃrepresents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0126] Ar ２ｃ represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0127] k represents 0 or 1, and is preferably 0. m represents an integer of 0 to 4, and is preferably 0 or 1, and more preferably 1. n represents 0 or 1, and is preferably 0.

[0128] Specific examples of the oxime compound include the compounds shown below.

[0129]

[0130]

[0131]

[0132]

[0133]

[0134] As the other photopolymerization initiator, a bifunctional or trifunctional or higher functional photopolymerization initiator may be used. Specific examples of the bifunctional or trifunctional or higher functional photopolymerization initiator include the compounds described in paragraph 0148 of WO 2022 / 065215.

[0135] The content of the photopolymerization initiator in the total solid content of the photocurable composition is preferably 1 to 20% by mass. The lower limit is preferably 1.5% by mass or more, and more preferably 2% by mass or more. The upper limit is preferably 15% by mass or less, more preferably 10% by mass or less, and even more preferably 8% by mass or less. In the photocurable composition of the present invention, only one type of photopolymerization initiator may be used, or two or more types may be used. When two or more types are used, the total amount thereof preferably falls within the above range.

[0136] The content of the specific compound in the photopolymerization initiator is preferably 50% by mass or more, more preferably 80% by mass or more, and even more preferably 90% by mass or more.

[0137] The content of the specific compound in the total solid content of the photocurable composition is preferably 0.1 to 50% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 45% by mass or less, more preferably 40% by mass or less, and even more preferably 30% by mass or less. In the photocurable composition of the present invention, only one type of specific compound may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

[0138] <<Radical Polymerizable Compound>> The photocurable composition of the present invention contains a radical polymerizable compound. Examples of the radical polymerizable compound include a compound having an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group.

[0139] The radical polymerizable compound may be a monomer or a polymer such as a resin. Hereinafter, a monomer-type radical polymerizable compound may also be referred to as a radical polymerizable monomer. A polymer-type radical polymerizable compound may also be referred to as a radical polymerizable polymer.

[0140] The radical polymerizable compound preferably uses a combination of a radical polymerizable monomer and a radical polymerizable polymer. According to this embodiment, pixels having excellent rectangular cross-sectional shapes can be formed. When a radical polymerizable monomer and a radical polymerizable polymer are used in combination, the photocurable composition preferably contains 1 to 5,000 parts by mass of the radical polymerizable monomer per 100 parts by mass of the radical polymerizable polymer. The upper limit is preferably 1,000 parts by mass or less, and more preferably 500 parts by mass or less. The lower limit is preferably 5 parts by mass or more, more preferably 10 parts by mass or more, and even more preferably 20 parts by mass or more.

[0141] (Radical Polymerizable Monomer) The molecular weight of the radical polymerizable monomer is preferably 100 to 2500. The upper limit is preferably 2000 or less, more preferably 1500 or less. The lower limit is preferably 150 or more, more preferably 250 or more.

[0142] The ethylenically unsaturated bond-containing group value (hereinafter referred to as C═C value) of the radical polymerizable monomer is preferably 2 to 14 mmol / g from the viewpoint of the storage stability of the photocurable composition. The lower limit is preferably 3 mmol / g or more, more preferably 4 mmol / g or more, and even more preferably 5 mmol / g or more. The upper limit is preferably 12 mmol / g or less, more preferably 10 mmol / g or less, and even more preferably 8 mmol / g or less. The C═C value of the radical polymerizable monomer is a value calculated by dividing the number of ethylenically unsaturated bond-containing groups contained in one molecule of the radical polymerizable monomer by the molecular weight of the radical polymerizable monomer.

[0143] The radical polymerizable monomer is preferably a compound containing three or more ethylenically unsaturated bond-containing groups, more preferably a compound containing 3 to 15 ethylenically unsaturated bond-containing groups, and even more preferably a compound containing 3 to 6 ethylenically unsaturated bond-containing groups. Furthermore, the radical polymerizable monomer is preferably a trifunctional to 15-functional (meth)acrylate compound, and more preferably a trifunctional to hexafunctional (meth)acrylate compound. Specific examples of radical polymerizable monomers include the compounds described in paragraphs 0075 to 0083 of WO 2022 / 065215 and the compounds described in Taiwan Patent Application Publication No. 201832008.

[0144] Preferred radical polymerizable monomers include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds having a structure in which the (meth)acryloyl group is bonded via an ethylene glycol and / or propylene glycol residue (e.g., SR454, SR499, commercially available from Sartomer).Examples of radical polymerizable monomers include diglycerin EO (ethylene oxide) modified (meth)acrylate (commercially available product: M-460, manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT, manufactured by Shin-Nakamura Chemical Co., Ltd.), and 1,6-hexanediol diacrylate (KAYARAD, manufactured by Nippon Kayaku Co., Ltd.). HDDA), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, LINC-202UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1 006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), Aronix MT-3041, 3042 (manufactured by Toagosei Co., Ltd., polymerizable compounds containing amines), Aronix M-510, 520 (manufactured by Toagosei Co., Ltd., polymerizable compounds having an acidic group), Etercure 6361-100 (Eternal Materials, polymerizable compound having a hyperbranched structure), EBECRYL80 (amine-containing tetrafunctional monomer, manufactured by Daicel-Olknes Co., Ltd.), EBECRYL7100 (amine-containing bifunctional monomer, manufactured by Daicel-Olknes Co., Ltd.), CN371NS (amine-containing bifunctional monomer, manufactured by Arkema), HOA-MPL (2-acryloyloxyethyl-phthalic acid: manufactured by Kyoeisha Chemical Co., Ltd.), HOA-MPE (2-acryloyloxyethyl-2-hydroxyethyl-phthalic acid: manufactured by Kyoeisha Chemical Co., Ltd.), polymerizable compounds having a dendrimer structure or hyperbranched structure described in JP-A No. 2023-043479, and polymerizable compounds described in JP-A No. 2023-529984 can also be used.

[0145] The radical polymerizable monomer may also be a radical polymerizable monomer having an ethylene oxide repeating chain. Examples of the compound having an ethylene oxide repeating chain include a compound represented by formula (EO-1).

[0146] R in formula (EO-1)Ｅ１ represents a hydrogen atom or a methyl group.

[0147] L in formula (EO-1) Ｅ１ represents an m-valent linking group. Ｅ１ The m-valent linking group represented by is a hydrocarbon group, a heterocyclic group, —O—, —S—, —NR Ａ１ -, -CO-, -COO-, -OCO-, -SO ２ - and groups formed by combining two or more of these groups. Ａ１ represents a hydrogen atom, an alkyl group, or an aryl group, with a hydrogen atom being preferred. The hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The aliphatic hydrocarbon group may be cyclic or acyclic. The acyclic aliphatic hydrocarbon group may be a straight-chain aliphatic hydrocarbon group or a branched aliphatic hydrocarbon group. The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. The hydrocarbon group may have a substituent or may not have a substituent. The cyclic aliphatic hydrocarbon group and the aromatic hydrocarbon group may be a monocyclic ring or a fused ring. The heterocyclic group may be a monocyclic ring or a fused ring. The heterocyclic group is preferably a 5- or 6-membered ring. The heterocyclic group may be an aliphatic heterocyclic group or an aromatic heterocyclic group. Examples of heteroatoms constituting the heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom.

[0148] In formula (EO-1), n ​​represents an integer of 1 to 20, and m represents an integer of 2 to 10. n is preferably an integer of 1 to 15, and more preferably an integer of 1 to 10. m is preferably an integer of 2 to 8, and more preferably an integer of 2 to 6.

[0149] As the radical polymerizable monomer, a radical polymerizable monomer having a fluorene skeleton can also be used. The radical polymerizable monomer having a fluorene skeleton is preferably a bifunctional radical polymerizable monomer. Examples of the radical polymerizable monomer having a fluorene skeleton include compounds having a partial structure represented by the following formula (Fr):

[0150] In the formula, * represents a bond, and R ｆ１ and R ｆ２ each independently represents a substituent, and m and n each independently represent an integer of 0 to 5. When m is 2 or more, m R ｆ１ may be the same or different, and m R ｆ１ Two of the R ｆ１ When n is 2 or more, n R ｆ２ may be the same or different, and n R ｆ２ Two of the R ｆ２ They may be bonded to each other to form a ring. ｆ１ and R ｆ２ The substituent represented by is a halogen atom, a cyano group, a nitro group, an alkyl group, an aryl group, a heteroaryl group, -OR ｆ１１ , -COR ｆ１２ , -COOR ｆ１３ , -OCOR ｆ１４ , -NR ｆ１５ R ｆ１６ , -NHCOR ｆ１７ , -CONR ｆ１８ R ｆ１９ , -NHCONR ｆ２０ R ｆ２１ , -NHCOOR ｆ２２ , -SR ｆ２３ , -SO ２ R ｆ２４ , -SO ２ OR ｆ２５ , -NHSO ２ R ｆ２６ or -SO ２ NR ｆ２７ R ｆ２８ Examples include: R ｆ１１ ~R ｆ２８ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group.

[0151] Commercially available radically polymerizable monomers having a fluorene skeleton include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0152] (Radical Polymerizable Polymer) The weight average molecular weight of the radical polymerizable polymer is preferably 3,000 or more, and more preferably 3,000 to 300,000. The upper limit is preferably 200,000 or less, and more preferably 100,000 or less. The lower limit is preferably 5,000 or more, and more preferably 10,000 or more.

[0153] The ethylenically unsaturated bond-containing group value (C=C value) of the radical polymerizable polymer is preferably 0.1 to 5.0 mmol / g. The upper limit is preferably 4.0 mmol / g or less, more preferably 3.0 mmol / g or less. The lower limit is preferably 0.2 mmol / g or more, more preferably 0.2 mmol / g or more. The C=C value of the radical polymerizable polymer is a numerical value representing the molar amount of the ethylenically unsaturated bond-containing group value per 1 g of solid content of the radical polymerizable polymer. When the C=C value can be calculated from the structural formula of the radical polymerizable polymer, the value calculated from the structural formula is used. Furthermore, when the C=C value cannot be calculated from the structural formula but can be calculated from the raw materials used in the synthesis of the radical polymerizable polymer, the value calculated from the raw materials charged is used. Furthermore, when the ethylenically unsaturated bond-containing group value of the radical polymerizable polymer cannot be calculated from the raw materials used in the synthesis of the radical polymerizable polymer, the value measured using a hydrolysis method is used. Specifically, component (a) at the ethylenically unsaturated bond-containing group site is extracted from the radical polymerizable polymer by alkali treatment, its content is measured by high performance liquid chromatography (HPLC), and the content is calculated from the following formula: When component (a) cannot be extracted from the radical polymerizable polymer by alkali treatment, a value measured by NMR (nuclear magnetic resonance) is used. Ethylenically unsaturated bond-containing group value of radical polymerizable polymer [mmol / g] = (content of component (a) [ppm] / molecular weight of component (a) [g / mol]) / (weighed value of radical polymerizable polymer [g] × (solids concentration of radical polymerizable polymer [mass%] / 100) × 10

[0154] The radical polymerizable polymer is also preferably a compound containing an acid group. Examples of the acid group include a carboxy group, a sulfo group, and a phosphate group, and a carboxy group is preferred. The acid value of the radical polymerizable polymer is preferably 20 to 200 mgKOH / g. The upper limit is preferably 150 mgKOH / g or less, and more preferably 100 mgKOH / g or less. The lower limit is preferably 30 mgKOH / g or more, and more preferably 35 mgKOH / g or more.

[0155] The radical polymerizable polymer is preferably a compound containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. Examples of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain include a repeating unit represented by formula (b1-1).

[0156] In the formula, A ｂ１１ represents a trivalent linking group, L ｂ１１ represents a single bond or an (n+1)-valent linking group, Y ｂ１１ represents an ethylenically unsaturated bond-containing group, and n represents 1 or 2.

[0157] A ｂ１１ Examples of the trivalent linking group represented by are a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linking group, a polyurea linking group, a polyamide linking group, a polyether linking group, and a polystyrene linking group. A poly(meth)acrylic linking group or a polyalkyleneimine linking group is preferred, and a poly(meth)acrylic linking group is more preferred.

[0158] L ｂ１１ The n+1-valent linking group represented by the formula (I) includes an aliphatic hydrocarbon group (preferably an aliphatic hydrocarbon group having 1 to 12 carbon atoms), an aromatic hydrocarbon group (preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms), —NH—, —SO—, —SO ２ Examples thereof include -, -CO-, -O-, -COO-, -OCO-, -S- and groups combining two or more of these groups.

[0159] Y ｂ１１Examples of the ethylenically unsaturated bond-containing group represented by include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, and a (meth)acryloyloxy group, and a (meth)acryloyloxy group is preferred.

[0160] In the radical polymerizable polymer, the content of repeating units having an ethylenically unsaturated bond-containing group in a side chain is preferably 1 mol% or more, more preferably 1 to 80 mol%, of all repeating units of the radical polymerizable polymer. The upper limit is preferably 70 mol% or less, more preferably 60 mol% or less. The lower limit is preferably 2 mol% or more, more preferably 5 mol% or more.

[0161] The radical polymerizable polymer preferably further contains a repeating unit having a graft chain in addition to the repeating unit having an ethylenically unsaturated bond-containing group in its side chain. In this specification, the graft chain refers to a polymer chain that branches off from the main chain of the repeating unit. The graft chain preferably has 40 to 10,000 atoms excluding hydrogen atoms, more preferably 50 to 2,000 atoms excluding hydrogen atoms, and even more preferably 60 to 500 atoms excluding hydrogen atoms.

[0162] The graft chain preferably contains a repeating unit of at least one structure selected from the group consisting of a polyester structure, a polyether structure, a poly(meth)acrylic structure, a polystyrene structure, a polyurethane structure, a polyurea structure, and a polyamide structure, more preferably contains a repeating unit of at least one structure selected from the group consisting of a polyester structure, a polyether structure, a poly(meth)acrylic structure, and a polystyrene structure, even more preferably contains a repeating unit of at least one structure selected from the group consisting of a polyester structure, a polyether structure, and a poly(meth)acrylic structure, still more preferably contains a repeating unit of a polyester structure or a polyether structure, and particularly preferably contains a repeating unit of a polyester structure.

[0163] Examples of repeating units of polyester structures include repeating units of structures represented by the following formula (G-1), formula (G-4), or formula (G-5). Examples of repeating units of polyether structures include repeating units of structures represented by the following formula (G-2). Examples of repeating units of poly(meth)acrylic structures include repeating units of structures represented by the following formula (G-3). Examples of repeating units of polystyrene structures include repeating units of structures represented by the following formula (G-6).

[0164] In the above formula, R Ｇ１ and R Ｇ２ R each independently represents an alkylene group. Ｇ１ The number of carbon atoms in the alkylene group represented by R is preferably 1 to 20, more preferably 2 to 16, and even more preferably 2 to 12. The alkylene group is preferably linear or branched, and more preferably linear. Ｇ２ The number of carbon atoms in the alkylene group represented by is preferably 1 to 10, more preferably 1 to 5, even more preferably 2 to 5, and still more preferably 2 or 3. The alkylene group is preferably linear or branched, and more preferably linear.

[0165] In the above formula, R Ｇ３ represents a hydrogen atom or a methyl group, and Q Ｇ１ represents —O— or —NH—, L Ｇ１ represents a single bond or a divalent linking group, R Ｇ４ represents a hydrogen atom or a substituent. Ｇ１ Examples of the divalent linking group represented by include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an alkyleneoxy group (preferably an alkyleneoxy group having 1 to 12 carbon atoms), an oxyalkylenecarbonyl group (preferably an oxyalkylenecarbonyl group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH-, -SO-, -SO ２ -, -CO-, -O-, -COO-, -OCO-, -S-, and groups combining two or more of these. Ｇ４Examples of the substituent represented by include a hydroxy group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthioether group, an arylthioether group, and a heterocyclic thioether group.

[0166] R Ｇ５ represents a hydrogen atom or a methyl group, R Ｇ６ represents an aryl group. Ｇ６ The number of carbon atoms in the aryl group represented by R is preferably 6 to 30, more preferably 6 to 20, and even more preferably 6 to 12. Ｇ６ The aryl group represented by may have a substituent, such as a hydroxy group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthioether group, an arylthioether group, or a heterocyclic thioether group.

[0167] The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of the substituent include a hydroxy group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthioether group, an arylthioether group, and a heterocyclic thioether group. Among these, a group having a steric repulsion effect is preferred, and an alkyl group or an alkoxy group having 5 to 24 carbon atoms is preferred. The alkyl group and the alkoxy group may be linear, branched, or cyclic, and linear or branched groups are preferred.

[0168] The graft chain preferably has a structure represented by the following formula (G-1a), (G-2a), (G-3a), (G-4a), (G-5a) or (G-6a), and more preferably has a structure represented by formula (G-1a), (G-4a) or (G-5a).

[0169] In the above formula, R Ｇ１ and R Ｇ２ each represents an alkylene group, and R Ｇ３ represents a hydrogen atom or a methyl group, and Q Ｇ１ represents —O— or —NH—, L Ｇ１represents a single bond or a divalent linking group, R Ｇ４ represents a hydrogen atom or a substituent, R Ｇ５ represents a hydrogen atom or a methyl group, R Ｇ６ represents an aryl group; W １００ represents a hydrogen atom or a substituent, and n1 to n6 each independently represent an integer of 2 or more. Ｇ１ ~R Ｇ６ , Q Ｇ１ , L Ｇ１ Regarding the formula (G-1) to (G-6), Ｇ１ ~R Ｇ６ , Q Ｇ１ , L Ｇ１ The same applies to the preferred range.

[0170] In formulae (G-1a) to (G-6a), W １００ is preferably a substituent. Examples of the substituent include a hydroxy group, a carboxy group, an alkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a heterocyclic oxy group, an alkylthioether group, an arylthioether group, and a heterocyclic thioether group. Among these, a group having a steric repulsion effect is preferred, and an alkyl group or an alkoxy group having 5 to 24 carbon atoms is preferred. The alkyl group and the alkoxy group may be linear, branched, or cyclic, and linear or branched groups are preferred.

[0171] In formulae (G-1a) to (G-6a), n1 to n6 are each preferably an integer of 2 to 100, more preferably an integer of 2 to 80, and even more preferably an integer of 8 to 60.

[0172] In formula (G-1a), when n1 is 2 or more, R Ｇ１ may be the same or different. Ｇ１ In the case where the repeating unit has two or more different repeating units, the arrangement of the repeating units is not particularly limited and may be random, alternating, or block. The same applies to formulas (G-2a) to (G-6a). The graft chain has a structure represented by formula (G-1a), formula (G-4a), or formula (G-5a), and R Ｇ１It is also preferable that the repeating unit has a structure containing two or more different repeating units.

[0173] Examples of the repeating unit having a graft chain include a repeating unit represented by formula (b1-2).

[0174] In the formula, A ｂ１２ represents a trivalent linking group, L ｂ１２ represents a single bond or a divalent linking group, Y ｂ１２ represents a graft chain.

[0175] A ｂ１２ Examples of the trivalent linking group represented by are a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linking group, a polyurea linking group, a polyamide linking group, a polyether linking group, and a polystyrene linking group. A poly(meth)acrylic linking group or a polyalkyleneimine linking group is preferred, and a poly(meth)acrylic linking group is more preferred.

[0176] L ｂ１２ Examples of the divalent linking group represented by include an alkylene group (preferably an alkylene group having 1 to 12 carbon atoms), an arylene group (preferably an arylene group having 6 to 20 carbon atoms), -NH-, -SO-, -SO ２ Examples thereof include -, -CO-, -O-, -COO-, -OCO-, -S- and groups combining two or more of these groups.

[0177] Y ｂ１２ Examples of the graft chain represented by include the graft chains described above.

[0178] In the radical polymerizable polymer, the weight-average molecular weight of the repeating unit having a graft chain is preferably 1,000 or more, more preferably 1,000 to 10,000, and even more preferably 1,000 to 7,500. In this specification, the weight-average molecular weight of the repeating unit having a graft chain is a value calculated from the weight-average molecular weight of the raw material monomers used in the polymerization of the repeating unit. For example, the repeating unit having a graft chain can be formed by polymerizing a macromonomer. Here, the macromonomer refers to a polymeric compound in which a polymerizable group is introduced at the polymer terminal. When the repeating unit having a graft chain is formed using a macromonomer, the weight-average molecular weight of the macromonomer corresponds to the repeating unit having a graft chain.

[0179] When the radical polymerizable polymer contains a repeating unit having a graft chain, the content of the repeating unit having a graft chain is preferably 1 to 60 mol % of all repeating units of the radical polymerizable polymer. The upper limit is preferably 50 mol % or less, more preferably 40 mol % or less. The lower limit is preferably 2 mol % or more, more preferably 5 mol % or more.

[0180] The radical polymerizable polymer preferably further contains a repeating unit having an acid group, such as a carboxy group, a sulfo group, or a phosphate group, in addition to the repeating unit having an ethylenically unsaturated bond-containing group in the side chain.

[0181] Examples of the repeating unit having an acid group include a repeating unit represented by formula (b1-3).

[0182] In the formula, A ｂ１３ represents a trivalent linking group, L ｂ１３ represents a single bond or an (n+1)-valent linking group, Y ｂ１３ represents an acid group, and n represents 1 or 2.

[0183] A ｂ１３Examples of the trivalent linking group represented by are a poly(meth)acrylic linking group, a polyalkyleneimine linking group, a polyester linking group, a polyurethane linking group, a polyurea linking group, a polyamide linking group, a polyether linking group, and a polystyrene linking group. A poly(meth)acrylic linking group or a polyalkyleneimine linking group is preferred, and a poly(meth)acrylic linking group is more preferred.

[0184] L ｂ１３ The n+1-valent linking group represented by the formula (I) includes an aliphatic hydrocarbon group (preferably an aliphatic hydrocarbon group having 1 to 12 carbon atoms), an aromatic hydrocarbon group (preferably an aromatic hydrocarbon group having 6 to 20 carbon atoms), —NH—, —SO—, —SO ２ Examples thereof include -, -CO-, -O-, -COO-, -OCO-, -S- and groups combining two or more of these groups.

[0185] Y ｂ１３ Examples of the acid group represented by include a carboxy group, a sulfo group, and a phosphate group.

[0186] When the radical polymerizable polymer contains a repeating unit having an acid group, the content of the repeating unit having an acid group is preferably 1 to 80 mol %, more preferably 5 to 80 mol %, and even more preferably 10 to 80 mol %, of all repeating units of the radical polymerizable polymer.

[0187] The radically polymerizable polymer may contain a repeating unit derived from a monomer component containing a compound represented by formula (ED1) and / or a compound represented by formula (ED2) (hereinafter, these compounds may be referred to as "ether dimers").

[0188]

[0189] In formula (ED1), R １ and R ２ each independently represents a hydrogen atom or a hydrocarbon group having 1 to 25 carbon atoms which may have a substituent. In formula (ED2), R represents a hydrogen atom or an organic group having 1 to 30 carbon atoms. For details of formula (ED2), reference can be made to the description in JP-A-2010-168539, the contents of which are incorporated herein by reference.

[0190] Specific examples of ether dimers can be found in, for example, paragraph 0317 of JP-A-2013-029760, the contents of which are incorporated herein by reference.

[0191] The radically polymerizable polymer may contain a repeating unit derived from the compound represented by formula (X). In the formula, R １ represents a hydrogen atom or a methyl group, R ２１ and R ２２ each independently represents an alkylene group, and n represents an integer of 0 to 15. ２１ and R ２２ The number of carbon atoms in the alkylene group represented by is preferably 1 to 10, more preferably 1 to 5, even more preferably 1 to 3, and particularly preferably 2 or 3. n represents an integer of 0 to 15, preferably an integer of 0 to 5, more preferably an integer of 0 to 4, and even more preferably an integer of 0 to 3.

[0192] The radically polymerizable polymer is also preferably a resin containing a repeating unit represented by formula (Ac-2). In formula (Ac-2), Ar １０ represents a group containing an aromatic carboxy group, L １１ represents —COO— or —CONH—, L １２ represents a trivalent linking group, P １０ represents a polymer chain containing a repeating unit having an ethylenically unsaturated bond-containing group in the side chain.

[0193] Ar in formula (Ac-2) １０ Examples of the group containing an aromatic carboxy group represented by the formula (I) include a structure derived from an aromatic tricarboxylic acid anhydride, a structure derived from an aromatic tetracarboxylic acid anhydride, etc. Examples of the aromatic tricarboxylic acid anhydride and the aromatic tetracarboxylic acid anhydride include compounds having the following structures:

[0194] In the above formula, Q １ represents a single bond, -O-, -CO-, -COOCH ２ CH ２ OCO-, -SO ２ -, -C(CF ３ ) ２ -, a group represented by the following formula (Q-1) or a group represented by the following formula (Q-2).

[0195] Ar １０ The group containing an aromatic carboxy group represented by Ar may have an ethylenically unsaturated bond-containing group. １０ Specific examples of the group containing an aromatic carboxy group represented by formula (Ar-11), a group represented by formula (Ar-12), a group represented by formula (Ar-13), etc.

[0196] In formula (Ar-11), n1 represents an integer of 1 to 4, preferably 1 or 2, and more preferably 2. In formula (Ar-12), n2 represents an integer of 1 to 8, preferably an integer of 1 to 4, more preferably 1 or 2, and even more preferably 2. In formula (Ar-13), n3 and n4 each independently represent an integer of 0 to 4, preferably an integer of 0 to 2, more preferably 1 or 2, and even more preferably 1. However, at least one of n3 and n4 is an integer of 1 or greater. In formula (Ar-13), Q １ represents a single bond, -O-, -CO-, -COOCH ２ CH ２ OCO-, -SO ２ -, -C(CF ３ ) ２ -, a group represented by the above formula (Q-1) or a group represented by the above formula (Q-2). １０ represents the bonding position with

[0197] L in formula (Ac-2) １１ represents —COO— or —CONH—, and is preferably —COO—.

[0198] L in formula (Ac-2)１２ Examples of the trivalent linking group represented by include hydrocarbon groups, -O-, -CO-, -COO-, -OCO-, -NH-, -S-, and groups combining two or more of these. Examples of the hydrocarbon group include aliphatic hydrocarbon groups and aromatic hydrocarbon groups. The aliphatic hydrocarbon group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, and even more preferably 1 to 15. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The aromatic hydrocarbon group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 10. The hydrocarbon group may have a substituent. Examples of the substituent include a hydroxy group. L １２ The trivalent linking group represented by formula (L12-1) is preferably a group represented by formula (L12-1), and more preferably a group represented by formula (L12-2).

[0199] In formula (L12-1), L １２ｂ represents a trivalent linking group, and X １ represents S, *1 represents L in formula (Ac-2). １１ *2 represents the bonding position of P in formula (Ac-2). １０ represents the bonding position with １２ｂ Examples of the trivalent linking group represented by the formula (I) include a hydrocarbon group; and a group in which a hydrocarbon group is combined with at least one selected from -O-, -CO-, -COO-, -OCO-, -NH-, and -S-, and a hydrocarbon group or a group in which a hydrocarbon group is combined with -O- is preferred.

[0200] In formula (L12-2), L １２ｃ represents a trivalent linking group, and X １ represents S, *1 represents L in formula (Ac-2). １１ *2 represents the bonding position of P in formula (Ac-2). １０ represents the bonding position with L １２ｃ Examples of the trivalent linking group represented by the formula (I) include a hydrocarbon group; and a group formed by combining a hydrocarbon group with at least one selected from —O—, —CO—, —COO—, —OCO—, —NH—, and —S—, and a hydrocarbon group is preferred.

[0201] P in formula (Ac-2) １０represents a polymer chain containing a repeating unit having an ethylenically unsaturated bond-containing group in the side chain.

[0202] P １０ Examples of the polymer chain represented by formula (G) include polymer chains containing a repeating unit of at least one structure selected from the group consisting of a polyester structure, a polyether structure, a poly(meth)acrylic structure, a polystyrene structure, a polyurethane structure, a polyurea structure, and a polyamide structure. Examples of the repeating unit of the polyester structure include a repeating unit of the structure represented by formula (G-1), formula (G-4), or formula (G-5) above. Examples of the repeating unit of the polyether structure include a repeating unit of the structure represented by formula (G-2) above. Examples of the repeating unit of the poly(meth)acrylic structure include a repeating unit of the structure represented by formula (G-3) above. Examples of the repeating unit of the polystyrene structure include a repeating unit of the structure represented by formula (G-6) above.

[0203] P １０ Examples of the repeating unit having an ethylenically unsaturated bond-containing group on the side chain that is contained in the polymer chain represented by formula (b1-1) include the repeating unit represented by formula (b1-1) above. １０ The proportion of repeating units having an ethylenically unsaturated bond-containing group in a side chain among all repeating units constituting the copolymer is preferably 1 mol % or more, more preferably 1 to 80 mol %. The upper limit is preferably 70 mol % or less, more preferably 60 mol % or less. The lower limit is preferably 2 mol % or more, more preferably 5 mol % or more.

[0204] P １０ It is also preferable that the polymer chain represented by P has a repeating unit containing an acid group. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. Examples of the repeating unit having an acid group include the repeating unit represented by the above formula (b1-3). １０ When the polymer chain represented by contains a repeating unit having an acid group, P １０The proportion of repeating units having an acid group in all repeating units constituting the formula (I) is preferably 1 to 80 mol %, more preferably 5 to 80 mol %, and even more preferably 10 to 80 mol %.

[0205] P １０ The weight average molecular weight of the polymer chain represented by is preferably 500 to 20,000. The lower limit is preferably 1,000 or more. The upper limit is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0206] The content of the radical polymerizable compound in the total solid content of the photocurable composition is preferably 1 to 99 mass %.

[0207] When the photocurable composition further contains a colorant, the content of the radical polymerizable compound in the total solid content of the photocurable composition is preferably 1 to 60% by mass. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more, even more preferably 15% by mass or more, and particularly preferably 20% by mass or more. The upper limit is preferably 50% by mass or less, more preferably 40% by mass or less. Furthermore, when the photocurable composition further contains a colorant, the radical polymerizable compound preferably contains a radical polymerizable monomer. The content of the radical polymerizable monomer in the total solid content of the photocurable composition is preferably 1 to 30% by mass. The upper limit is preferably 20% by mass or less, more preferably 15% by mass or less, and even more preferably 10% by mass or less. The lower limit is preferably 3% by mass or more, and more preferably 5% by mass or more.

[0208] The photocurable composition of the present invention may contain only one radical polymerizable compound or may contain two or more radical polymerizable compounds. When two or more radical polymerizable compounds are contained, the total amount thereof is preferably within the above range.

[0209] <<Resin>> The photocurable composition of the present invention can further contain a resin other than the above-described radically polymerizable compound. The resin is blended, for example, for the purpose of dispersing pigments and the like in the photocurable composition or for the purpose of using as a binder. Note that a resin used mainly for dispersing pigments and the like in the photocurable composition is also called a dispersant. However, such uses of the resin are only examples, and the resin can also be used for purposes other than these uses.

[0210] Examples of the resin include (meth)acrylic resin, epoxy resin, (meth)acrylamide resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, siloxane resin, etc. Examples of the resin include resins described in the examples of WO 2016 / 088645, resins described in JP 2017-057265 A, resins described in JP 2017-032685 A, resins described in JP 2017-075248 A, resins described in JP 2017-066240 A, resins described in JP 2017-167513 A, and resins described in JP 2017-173787 A. Resins described in JP-A-2017-206689, resins described in paragraphs 0041 to 0060 of JP-A-2017-206689, resins described in paragraphs 0022 to 0071 of JP-A-2018-010856, blocked polyisocyanate resins described in JP-A-2016-222891, resins described in JP-A-2020-122052, resins described in JP-A-2020-111656, Resins described in JP 2020-139021 A, resins containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain described in JP 2017-138503 A, resins described in paragraphs 0199 to 0233 of JP 2020-186373 A, alkali-soluble resins described in JP 2020-186325 A, and resins described in Korean Patent Publication No. 10-2020-0078339 Resins represented by formula 1, copolymers containing epoxy groups and acid groups described in WO 2022 / 030445, resins described in WO 2021 / 182268, resins described in WO 2021 / 187257, resins described in WO 2022 / 019253, resins described in WO 2022 / 019254, and resins described in WO 2022 / 019255 can also be used.

[0211] The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

[0212] As the resin, it is preferable to use a resin having an acid group. Examples of the acid group include a carboxy group, a phosphate group, a sulfo group, and a phenolic hydroxy group. As the specific compound described later, A of formula (1) １ is a group containing a basic group, it is preferable to use a resin having an acid group as the resin. According to this embodiment, the storage stability of the photocurable composition can be further improved.

[0213] The acid value of the resin having acid groups is preferably 30 to 500 mgKOH / g. The lower limit is more preferably 40 mgKOH / g or more, and particularly preferably 50 mgKOH / g or more. The upper limit is more preferably 400 mgKOH / g or less, even more preferably 300 mgKOH / g or less, and particularly preferably 200 mgKOH / g or less. The weight average molecular weight (Mw) of the resin having acid groups is preferably 5,000 to 100,000, and more preferably 5,000 to 50,000. The number average molecular weight (Mn) of the resin having acid groups is preferably 1,000 to 20,000.

[0214] The resin having an acid group preferably contains a repeating unit having an acid group on a side chain, and more preferably contains 5 to 70 mol% of the repeating units having an acid group on a side chain based on all repeating units of the resin. The upper limit of the content of repeating units having an acid group on a side chain is preferably 50 mol% or less, more preferably 30 mol% or less. The lower limit of the content of repeating units having an acid group on a side chain is preferably 10 mol% or more, more preferably 20 mol% or more.

[0215] For resins having acid groups, please refer to the descriptions in paragraphs

[0558] to

[0571] of JP 2012-208494 A (corresponding to paragraphs

[0685] to

[0700] of U.S. Patent Application Publication No. 2012 / 0235099 A) and paragraphs

[0076] to

[0099] of JP 2012-198408 A, the contents of which are incorporated herein by reference. Alternatively, commercially available resins having acid groups can be used. There are no particular limitations on the method for introducing acid groups into the resin, and examples include the method described in Japanese Patent No. 6,349,629 A. Furthermore, examples of methods for introducing acid groups into the resin include a method in which an acid anhydride is reacted with a hydroxy group generated by a ring-opening reaction of an epoxy group to introduce the acid group.

[0216] A resin having a basic group can also be used as the resin. The resin having a basic group is preferably a resin containing a repeating unit having a basic group in the side chain, more preferably a copolymer having a repeating unit having a basic group in the side chain and a repeating unit not containing a basic group, and even more preferably a block copolymer having a repeating unit having a basic group in the side chain and a repeating unit not containing a basic group. The resin having a basic group can also be used as a dispersant. The amine value of the resin having a basic group is preferably 5 to 300 mgKOH / g. The lower limit is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more. The upper limit is preferably 200 mgKOH / g or less, more preferably 100 mgKOH / g or less.

[0217] Commercially available resins having basic groups include DISPERBYK-161, 162, 163, 164, 166, 167, 168, 174, 182, 183, 184, 185, 2000, 2001, 2050, 2150, 2163, 2164, and BYK-LPN6919 (all manufactured by BYK-Chemie), and Solsperse 112. 00, 13240, 13650, 13940, 24000, 26000, 28000, 32000, 32500, 32550, 32600, 33000, 34750, 35100, 35200, 37500, 38500, 39000, 53095, 56000, 7100 (all manufactured by The Lubrizol Group, Japan), Efka PX 4300, 4330, 4046, 4060, 4080 (all manufactured by BASF), and the like. In addition, the resin having a basic group may be the block copolymer (B) described in paragraphs 0063 to 0112 of JP-A-2014-219665, the block copolymer A1 described in paragraphs 0046 to 0076 of JP-A-2018-156021, or the vinyl resin having a basic group described in paragraphs 0150 to 0153 of JP-A-2019-184763, the contents of which are incorporated herein by reference.

[0218] It is also preferable to use a resin having an acid group and a resin having a basic group. According to this embodiment, the storage stability of the photocurable composition can be further improved. When a resin having an acid group and a resin having a basic group are used in combination, the content of the resin having a basic group is preferably 20 to 500 parts by mass, more preferably 30 to 300 parts by mass, and even more preferably 50 to 200 parts by mass, per 100 parts by mass of the resin having an acid group.

[0219] It is also preferable to use a resin having an aromatic carboxy group as the resin. In a resin having an aromatic carboxy group, the aromatic carboxy group may be contained in the main chain of a repeating unit or in a side chain of the repeating unit. It is preferable that the aromatic carboxy group is contained in the main chain of a repeating unit. In this specification, an aromatic carboxy group refers to a group having a structure in which one or more carboxy groups are bonded to an aromatic ring. In the aromatic carboxy group, the number of carboxy groups bonded to the aromatic ring is preferably 1 to 4, and more preferably 1 to 2.

[0220] The resin is preferably at least one selected from the group consisting of graft polymers, star polymers, block copolymers, and resins in which at least one end of the polymer chain is capped with an acid group. Such resins are preferably used as dispersants.

[0221] Examples of graft polymers include resins having repeating units with graft chains. Examples of graft chains include graft chains containing at least one structure selected from a polyester structure, a polyether structure, a polystyrene structure, and a poly(meth)acrylic structure. The terminal structure of the graft chain is not particularly limited. It may be a hydrogen atom or a substituent. Examples of the substituent include an alkyl group, an alkoxy group, and an alkylthioether group. Of these, from the viewpoint of improving the dispersibility of the pigment, groups having a steric repulsion effect are preferred, and alkyl or alkoxy groups having 5 to 30 carbon atoms are preferred. The alkyl and alkoxy groups may be linear, branched, or cyclic, with linear or branched being preferred.

[0222] Specific examples of the graft polymer include the resins described in paragraphs 0025 to 0094 of JP-A-2012-255128, paragraphs 0022 to 0097 of JP-A-2009-203462, and paragraphs 0102 to 0166 of JP-A-2012-255128.

[0223] Examples of star polymers include resins having a structure in which multiple polymer chains are bonded to a core portion. Specific examples of star polymers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP 2013-043962 A.

[0224] The block copolymer is preferably a block copolymer of a polymer block having a repeating unit containing an acid group or a basic group (hereinafter also referred to as block A) and a polymer block having a repeating unit not containing an acid group or a basic group (hereinafter also referred to as block B). As the block copolymer, the block copolymer (B) described in paragraphs 0063 to 0112 of JP-A No. 2014-219665 and the block copolymer A1 described in paragraphs 0046 to 0076 of JP-A No. 2018-156021 can also be used, the contents of which are incorporated herein by reference.

[0225] The resin having at least one end of the polymer chain capped with an acid group includes a resin having a structure in which at least one end of the polymer chain containing at least one structure selected from a polyester structure, a polyether structure, and a poly(meth)acrylic structure is capped with an acid group. The acid group capping the end of the polymer chain includes a carboxy group, a sulfo group, and a phosphate group.

[0226] The resin can also be used as a dispersant. Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the term "acidic dispersant (acidic resin)" refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol% or more is preferred when the total amount of the acid groups and the basic groups is taken as 100 mol%. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxy group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the term "basic dispersant (basic resin)" refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups is greater than 50 mol% is preferred when the total amount of the acid groups and the basic groups is taken as 100 mol%. The basic group possessed by the basic dispersant is preferably an amino group.

[0227] Dispersants are also commercially available, and specific examples thereof include the Disperbyk series manufactured by BYK-Chemie (e.g., Disperbyk-111, 161, 2001, etc.), the Solsperse series manufactured by Lubrizol Japan Co., Ltd. (e.g., Solsperse 20000, 76500, etc.), the Ajisper series manufactured by Ajinomoto Fine-Techno Co., Ltd., A208F (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.), H-3606 (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd.), and Sandet ET (manufactured by Sanyo Chemical Industries, Ltd.). In addition, the products described in paragraph 0129 of JP-A No. 2012-137564 and the products described in paragraph 0235 of JP-A No. 2017-194662 can also be used as dispersants.

[0228] The content of the resin in the total solid content of the photocurable composition is preferably 1 to 99 mass %. The total content of the radical polymerizable compound and the resin in the total solid content of the photocurable composition is preferably 1 to 99 mass %.

[0229] When the photocurable composition further contains a colorant, the content of the resin in the total solid content of the photocurable composition is preferably 1 to 50% by mass. The upper limit is preferably 40% by mass or less, more preferably 30% by mass or less. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more. The total content of the radical polymerizable polymer and resin in the total solid content of the photocurable composition is preferably 1 to 50% by mass. The upper limit is preferably 40% by mass or less, more preferably 30% by mass or less. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more. The photocurable composition preferably contains a total of 100 to 1,000 parts by mass of the radical polymerizable polymer and resin per 100 parts by mass of the polymerizable monomer. The lower limit is preferably 150 parts by mass or more, more preferably 200 parts by mass or more. The upper limit is preferably 600 parts by mass or less, more preferably 500 parts by mass or less.

[0230] The photocurable composition of the present invention may contain only one resin or two or more resins. When two or more resins are contained, the total amount thereof is preferably within the above range.

[0231] <<Colorant>> The photocurable composition of the present invention preferably contains a colorant. Examples of the colorant include a white colorant, a black colorant, a chromatic colorant, and an infrared-absorbing colorant. In the present invention, the white colorant includes not only pure white colorants but also light gray colorants close to white (e.g., off-white, light gray, etc.).

[0232] The coloring material may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment, but is preferably an organic pigment from the viewpoints of a wide range of color variations, ease of dispersion, safety, etc. The coloring material preferably contains a pigment.

[0233] The average primary particle diameter of the pigment is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment can be determined from a photograph obtained by observing the primary particles of the pigment with a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment.

[0234] The crystallite size of the pigment, determined from the half-width of a peak derived from any crystal plane in an X-ray diffraction spectrum obtained using CuKα radiation as an X-ray source, is preferably 0.1 to 100 nm, more preferably 0.5 to 50 nm, even more preferably 1 to 30 nm, and particularly preferably 5 to 25 nm.

[0235] The specific surface area of ​​the pigment is 1 to 300 m ２ / g. The lower limit is 10 m ２ / g or more, and ２ / g or more is more preferable. ２ / g or less, and ２The value of the specific surface area can be determined according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: Determination of the specific surface area of ​​solids by gas adsorption.

[0236] (Chromatic Colorant) Examples of chromatic colorants include colorants having a maximum absorption wavelength in the wavelength range of 400 to 700 nm, such as green colorants, red colorants, yellow colorants, purple colorants, blue colorants, and orange colorants.

[0237] Examples of the red colorant include a diketopyrrolopyrrole compound, an anthraquinone compound, an azo compound, a naphthol compound, an azomethine compound, a xanthene compound, a quinacridone compound, a perylene compound, and a thioindigo compound, and the like, preferably a diketopyrrolopyrrole compound, an anthraquinone compound, or an azo compound, and more preferably a diketopyrrolopyrrole compound. The red colorant is preferably a pigment (red pigment), and more preferably a diketopyrrolopyrrole pigment.

[0238] Specific examples of red colorants include C.I. (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, Examples of red pigments include 150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291,294,295,296,297. In addition, as a red colorant, a compound described in paragraph number 0034 of WO 2022 / 085485, or a brominated diketopyrrolopyrrole compound described in JP-A-2020-085947 can also be used.

[0239] As the red colorant, C.I. Pigment Red 122, 177, 224, 254, 255, 264, 269, 272, and 291 are preferred, C.I. Pigment Red 254, 264, and 272 are more preferred, and C.I. Pigment Red 254 and 264 are even more preferred.

[0240] Examples of the green colorant include phthalocyanine compounds and squarylium compounds, and the phthalocyanine compounds are preferred. The green colorant is preferably a pigment (green pigment), and more preferably a phthalocyanine pigment.

[0241] Specific examples of green colorants include green pigments such as C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. Furthermore, halogenated zinc phthalocyanine pigments having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used as green colorants. Specific examples include the compounds described in WO 2015 / 118720. Furthermore, compounds described in paragraph 0029 of WO 2022 / 085485, aluminum phthalocyanine compounds described in JP-A 2020-070426, and diarylmethane compounds described in JP-A 2020-504758 can also be used as green colorants.

[0242] As the green colorant, C.I. Pigment Green 7, 36, 58, 62, and 63 are preferred.

[0243] Examples of orange colorants include diketopyrrolopyrrole compounds and azo compounds. The orange colorant is preferably a pigment (orange pigment). Specific examples of orange colorants include orange pigments such as C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, and 73.

[0244] Examples of the yellow colorant include an azo compound, an azomethine compound, an isoindoline compound, a pteridine compound, a quinophthalone compound, and a perylene compound. The yellow colorant is preferably a pigment (yellow pigment). Specific examples of the yellow colorant include C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125 , 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236 and the like.

[0245] As the yellow coloring material, an azobarbituric acid nickel complex having the following structure can also be used.

[0246] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of WO 2022 / 085485, the methine dyes described in JP-A 2019-073695, and the methine dyes described in JP-A 2019-073696 can be used.

[0247] Examples of the purple colorant include an oxazine compound, a quinacridone compound, a perylene compound, and an indigo compound, and the oxazine compound is preferred. The purple colorant is preferably a pigment (purple pigment). Specific examples of the purple colorant include purple pigments such as C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

[0248] Examples of blue colorants include phthalocyanine compounds and squarylium compounds, with phthalocyanine compounds being preferred. The blue colorant is preferably a pigment (blue pigment). Specific examples of blue colorants include blue pigments such as C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, and 88. Furthermore, aluminum phthalocyanine compounds having phosphorus atoms can also be used as blue colorants. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0249] Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes.

[0250] A dye polymer can also be used as a chromatic colorant. The dye polymer is preferably a dye dissolved in a solvent when used. The dye polymer may also form particles. When the dye polymer is particulate, it is typically used in a dispersed state in a solvent. A particulate dye polymer can be obtained, for example, by emulsion polymerization, and specific examples of the compounds and production methods described in JP-A 2015-214682 include those described in JP-A 2015-214682. The dye polymer has two or more dye structures in one molecule, preferably three or more dye structures. The upper limit is not particularly limited, but can be 100 or less. The multiple dye structures in one molecule may be the same dye structure or different dye structures. The weight-average molecular weight (Mw) of the dye polymer is preferably 2,000 to 50,000. The lower limit is more preferably 3,000 or more, and even more preferably 6,000 or more. The upper limit is more preferably 30,000 or less, and even more preferably 20,000 or less. As the dye multimer, compounds described in JP-A-2011-213925, JP-A-2013-041097, JP-A-2015-028144, JP-A-2015-030742, WO 2016 / 031442, etc. can also be used.

[0251] As chromatic colorants, triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in JP 2020-117638 A, phthalocyanine compounds described in WO 2020 / 174991 A, isoindoline compounds described in JP 2020-160279 A or salts thereof, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069442 A, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069070 A Compounds represented by the formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by the formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in JP-A-2020-180176, phenothiazine compounds described in JP-A-2021-187913, halogenated zinc phthalocyanines described in WO 2022 / 004261, and halogenated zinc phthalocyanines described in WO 2021 / 250883 can be used. The chromatic colorant may be a rotaxane, and the dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-shaped structure, or in both structures. As chromatic colorants, quinophthalone compounds represented by formula 1 in Korean Patent Publication No. 10-2020-0030759, polymer dyes described in Korean Patent Publication No. 10-2020-0061793, chromatic colorants described in JP-A-2022-029701, isoindoline compounds described in WO 2022 / 014635, aluminum phthalocyanine compounds described in WO 2022 / 024926, and JP-A-2022-045 Compounds described in Patent Publication No. 895, compounds described in WO 2022 / 050051, compounds described in JP 2020-090676, compounds described in JP 2020-055956, compounds described in JP 2021-031681, compounds described in JP 2022-056354, compounds described in US Patent Application Publication No. 2021 / 0355327, compounds described in WO 2022 / 065357,Compounds described in JP 2020-045436 A, compounds described in Korean Patent Publication No. 10-2021-0146726 A, compounds described in JP 2018-178039 A, compounds described in Chinese Patent Application Publication No. 113881244 A, compounds described in Chinese Patent Application Publication No. 113881245 A, compounds described in Chinese Patent Application Publication No. 113881246 A, compounds described in JP 2022-104822 A, compounds described in JP 2022-096701 A, compounds described in JP 2020- Compounds described in JP-A-023652, green pigments described on pages 80 to 84 of the Journal of the Color Materials Association (published in 2022), compounds described in JP-A-2022-143135, compounds described in JP-A-2022-140287, compounds described in WO 2022 / 136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, cyan pigments described in Korean Patent Publication No. 10-2017-0018993, isoindoline compounds described in JP-A-2020-180176, Compounds described in JP-A-3-013209, compounds described in JP-A-2023-013166, xanthene compounds described in WO 2023 / 286526, compounds described in JP-A-2021-155746, compounds described in JP-A-2021-155747, compounds described in JP-A-2021-155748, compounds described in JP-A-2021-155749, compounds described in WO 2018 / 051876, compounds described in JP-A-2020-083981, JP-A-2023-05 Compounds described in JP-A-6463, compounds described in JP-T-2023-515473, dioxane compounds described in JP-T-2022-549530, pigment preparations described in JP-A-2022-061494, diketopyrrolopyrrole pigments described in JP-A-2023-057917, diketopyrrolopyrrole compounds described in JP-A-2023-061273, phthalocyanines described in JP-T-2023-519314, and quinophthalones described in JP-A-2023-080419 can also be used.

[0252] Two or more chromatic colorants may be used in combination. When two or more chromatic colorants are used in combination, the combination of the two or more chromatic colorants may form a black color. Examples of such combinations include the following embodiments (1) to (7). When the photocurable composition contains two or more chromatic colorants and exhibits a black color through the combination of the two or more chromatic colorants, the photocurable composition of the present invention can be preferably used as a photocurable composition for forming an infrared transmission filter. (1) An embodiment containing a red colorant and a blue colorant. (2) An embodiment containing a red colorant, a blue colorant, and a yellow colorant. (3) An embodiment containing a red colorant, a blue colorant, a yellow colorant, and a purple colorant. (4) An embodiment containing a red colorant, a blue colorant, a yellow colorant, a purple colorant, and a green colorant. (5) An embodiment containing a red colorant, a blue colorant, a yellow colorant, and a green colorant. (6) An embodiment containing a red color material, a blue color material, and a green color material. (7) An embodiment containing a yellow color material and a purple color material.

[0253] (White coloring material) Examples of the white coloring material include inorganic pigments such as titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, and zinc sulfide. As the white coloring material, the white pigments described in paragraphs 0040 to 0043 of WO 2022 / 085485 can be used.

[0254] (Black Colorant) The black colorant is not particularly limited, and known materials can be used. The black colorant may be an inorganic black colorant or an organic black colorant. The black colorant is preferably a pigment. In this specification, the black colorant refers to a colorant that exhibits absorption over the entire wavelength range of 400 to 700 nm.

[0255] Examples of inorganic black colorants include carbon black, titanium black, graphite, etc., with carbon black and titanium black being preferred, and titanium black being more preferred. Titanium black is a black particle containing titanium atoms, and low-order titanium oxide or titanium oxynitride is preferred. As the titanium black, the titanium black described in paragraph 0044 of WO 2022 / 085485 can be used. As the inorganic black colorant, zirconium nitride powder described in JP 2023-048173 A can also be used.

[0256] Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. The organic black colorant may be a compound described in paragraph 0166 of International Publication No. 2022 / 065215. Furthermore, examples of organic black colorants include perylene black (such as Lumogen Black FK4280) described in paragraphs 0016 to 0020 of JP-A-2017-226821 and black azo pigments described in JP-A-2022-121935.

[0257] The black coloring material may be any of those described in pages 294 to 307 of the Journal of the Color Materials Association, Vol. 96, No. 9, 2023.

[0258] (Infrared absorbing colorant) The infrared absorbing colorant is preferably a compound having a maximum absorption wavelength longer than 700 nm. The infrared absorbing colorant is preferably a compound having a maximum absorption wavelength in the wavelength range of more than 700 nm to 1800 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of more than 700 nm to 1400 nm, even more preferably a compound having a maximum absorption wavelength in the wavelength range of more than 700 nm to 1200 nm, and particularly preferably a compound having a maximum absorption wavelength in the wavelength range of more than 700 nm to 1000 nm. In addition, the absorbance A of the infrared absorbing colorant at a wavelength of 500 nm is １ and absorbance A at the maximum absorption wavelength ２ Ratio A １ / A ２is preferably 0.08 or less, and more preferably 0.04 or less. The infrared absorbing colorant is preferably a pigment, and more preferably an organic pigment.

[0259] Examples of infrared absorbing colorants include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, metal borides, etc. Specific examples of these include the compounds described in paragraph 0114 of WO 2022 / 065215.Examples of infrared absorbing colorants include the compounds described in paragraph 0121 of WO 2022 / 065215, squarylium compounds described in JP 2020-075959 A, copper complexes described in Korean Patent Publication No. 10-2019-0135217, croconic acid compounds described in JP 2021-195515 A, infrared absorbing dyes described in JP 2022-022070 A, croconium compounds described in WO 2019 / 021767, compounds described in JP 2019-127549 A, compounds described in WO 2022 / 059619, and compounds described in JP Compounds described in JP-A-2022-151682, squarylium compounds described in JP-A-2022-188858, compounds described in JP-A-2022-184710, compounds described in JP-A-2022-189736, squarylium compounds described in JP-A-2023-004570, squarylium compounds described in WO 2019 / 230660, squarylium compounds described in WO 2020 / Compounds described in JP-A-2023-068643, diiminium compounds described in JP-A-2023-068643, squarylium compounds described in JP-A-2023-052770, phthalocyanine compounds described in Korean Patent Publication No. 10-2022-0163680, indigo monoboron complexes described in JP-A-2023-073064, phthalocyanine compounds described in JP-A-2023-066025 It is also possible to use the following compounds: phthalocyanine compounds described in JP 2020-041127 A; indigo compounds described in JP 2023-073064 A; indigo compounds described in Korean Patent Publication No. 10-2023-0016355 A; squarylium compounds described in WO 2019 / 230570 A; and diiminium compounds described in JP 2023-095824 A.

[0260] The content of the colorant in the total solid content of the photocurable composition is preferably 30 to 80% by mass, with the upper limit being preferably 70% by mass or less, and more preferably 65% ​​by mass or less, and the lower limit being preferably 35% by mass or more, and more preferably 40% by mass or more.

[0261] The content of the pigment in the total solid content of the photocurable composition is preferably 20 to 80% by mass. The upper limit is preferably 75% by mass or less, more preferably 65% ​​by mass or less, and even more preferably 63% by mass or less. The lower limit is preferably 25% by mass or more, more preferably 30% by mass or more, and even more preferably 35% by mass or more.

[0262] The content of the pigment in the coloring material is preferably 20 to 100% by mass, more preferably 50 to 100% by mass, and even more preferably 70 to 100% by mass.

[0263] <<Chain Transfer Agent>> The photocurable composition of the present invention preferably contains a chain transfer agent. According to this embodiment, it is possible to further increase the sensitivity when exposed to light having a wavelength of 150 to 300 nm, such as KrF radiation. Examples of the chain transfer agent include a thiol compound, a thiocarbonylthio compound, and a dimer of an aromatic α-methylalkenyl, and a thiol compound is preferred. Examples of the chain transfer agent include the compounds described in paragraphs 0093 to 0113 of WO 2019 / 188652.

[0264] The thiol compound used as a chain transfer agent is a compound having one or more thiol groups, preferably a compound having two or more thiol groups. The upper limit of the number of thiol groups contained in the thiol compound is preferably 10 or less, more preferably 6 or less, and even more preferably 4 or less. The thiol compound is particularly preferably a compound having two thiol groups.

[0265] The thiol compound is preferably a compound represented by the following formula (SH-1): Ｓ１ - (SH) ｎ Formula (SH-1) (wherein SH represents a thiol group, L １ represents an n-valent group, where n is an integer of 1 or more.

[0266] L in formula (SH-1) Ｓ１ The n-valent group represented by is a hydrocarbon group, a heterocyclic group, —O—, —S—, —NR Ｓ１-, -CO-, -COO-, -OCO-, -SO ２ - or a group consisting of a combination thereof. Ｓ１ represents a hydrogen atom, an alkyl group, or an aryl group, with a hydrogen atom being preferred. The hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The aliphatic hydrocarbon group may be cyclic or acyclic. The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. The hydrocarbon group may have a substituent or may not have a substituent. The cyclic aliphatic hydrocarbon group and the aromatic hydrocarbon group may be a monocyclic or fused ring. The heterocyclic group may be a monocyclic or fused ring. The heterocyclic group is preferably a 5- or 6-membered ring. The heterocyclic group may be an aliphatic heterocyclic group or an aromatic heterocyclic group. Examples of heteroatoms constituting the heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom. L １ The number of carbon atoms constituting the group is preferably 3 to 100, and more preferably 6 to 50.

[0267] In formula (SH-1), n ​​represents an integer of 1 or more. The upper limit of n is preferably 10 or less, more preferably 6 or less, and even more preferably 4 or less. The lower limit of n is preferably 2 or more.

[0268] Specific examples of thiol compounds include the compounds described in the Examples below and the compounds described in paragraphs 0100 to 0103 of WO 2019 / 188652. Commercially available thiol compounds include PEMP (manufactured by SC Organic Chemical Co., Ltd.), Suncera M (manufactured by Sanshin Chemical Industry Co., Ltd.), Karenz MTBD1, Karenz MTPE1, Karenz MTNR1, and Karenz MTTPMB (all manufactured by Resonac Corporation). The thiol compounds described in JP 2020-109068 A can also be used as chain transfer agents.

[0269] The molecular weight of the chain transfer agent is preferably 200 or more. The upper limit is preferably 1000 or less, more preferably 800 or less, and even more preferably 600 or less, because the SH valence per weight can be increased.

[0270] The content of the chain transfer agent in the total solid content of the photocurable composition is preferably 0.001 to 5% by mass. The upper limit is preferably 3% by mass or less, and more preferably 1% by mass or less. The lower limit is preferably 0.05% by mass or more, and more preferably 0.01% by mass or more. Only one type of chain transfer agent may be used, or two or more types may be used. When two or more types are used, the total amount thereof preferably falls within the above range.

[0271] <<Amine Compound>> The curable compound of the present invention preferably contains an amine compound. According to this embodiment, the efficiency of radical generation from the photopolymerization initiator during exposure can be further improved, and the polymerization reaction of the polymerizable compound can be further promoted.

[0272] The molecular weight of the amine compound is preferably 100 to 1000. The upper limit is preferably 800 or less, more preferably 500 or less. The lower limit is preferably 150 or more, more preferably 200 or more.

[0273] The amine compound is preferably a compound having 1 to 8 amino groups in one molecule, more preferably a compound having 1 to 4 amino groups, and even more preferably a compound having 1 or 2 amino groups.

[0274] The amine compound is preferably colorless. That is, the molar absorption coefficient of the amine compound at wavelengths of 400 to 700 nm is 200 L mol －１ ・cm －１ It is preferable that the concentration is less than 100 L mol －１ ・cm －１ It is more preferable that it is less than 10 ...

[0275] The amine compound may be a primary, secondary or tertiary amine, but is preferably a tertiary amine.

[0276] In the amine compound, the three groups connected to the nitrogen atom are preferably selected from a hydrogen atom, an alkyl group, an aryl group, and a heteroaryl group, and a combination of an alkyl group and an aryl group is most preferred.

[0277] The amine compound preferably has any one of a carboxy group, a sulfonic acid group, a phosphoric acid group, and a hydroxy group, for the purpose of improving alkaline developability and reducing residues.

[0278] The amine compound is preferably a compound represented by formula (B-1). In formula (B-1), R ａ and R ｂ each independently represents a monovalent organic group having 1 to 10 carbon atoms which may contain a heteroatom; R ｃ represents a monovalent organic group which may contain a heteroatom; m represents an integer of 0 to 5;

[0279] R ａ , R ｂ and R ｃ Examples of the organic group represented by include an alkyl group, an aryl group, and a heteroaryl group, and an alkyl group is preferred. The alkyl group, the aryl group, and the heteroaryl group may have a substituent. Examples of the substituent include a carboxy group, a sulfonic acid group, a phosphate group, and a hydroxy group, and a hydroxy group is preferred. m represents an integer of 0 to 5, and is preferably an integer of 0 to 3, more preferably 0 or 1, and even more preferably 0.

[0280] Specific examples of the amine compound include compounds T-5 and T-6 described in the Examples below, Michler's ketone, 4,4'-bis(diethylamino)benzophenone, 2,5-bis(4'-diethylaminobenzal)cyclopentane, 2,6-bis(4'-diethylaminobenzal)cyclohexanone, 2,6-bis(4'-diethylaminobenzal)-4-methylcyclohexanone, 4,4'-bis(dimethylamino)chalcone, 4,4'-bis(diethylamino)chalcone, p -dimethylaminocinnamylidene indanone, p-dimethylaminobenzylidene indanone, 2-(p-dimethylaminophenylbiphenylene)-benzothiazole, 2-(p-dimethylaminophenylvinylene)benzothiazole, 2-(p-dimethylaminophenylvinylene)isonaphthothiazole, 1,3-bis(4'-dimethylaminobenzal)acetone, 1,3-bis(4'-diethylaminobenzal)acetone, 3,3'-carbonyl-bis(7-diethylaminobenzal)acetone coumarin), 3-acetyl-7-dimethylaminocoumarin, 3-ethoxycarbonyl-7-dimethylaminocoumarin, 3-benzyloxycarbonyl-7-dimethylaminocoumarin, 3-methoxycarbonyl-7-diethylaminocoumarin, 3-ethoxycarbonyl-7-diethylaminocoumarin, N-phenyl-N'-ethylethanolamine, N-phenyldiethanolamine, N-p-tolyldiethanolamine, N-phenylethanolamine, 4-morpholino Examples thereof include benzophenone, isoamyl dimethylaminobenzoate, isoamyl diethylaminobenzoate, 2-mercaptobenzimidazole, 1-phenyl-5-mercaptotetrazole, 2-mercaptobenzothiazole, 2-(p-dimethylaminostyryl)benzoxazole, 2-(p-dimethylaminostyryl)benzthiazole, 2-(p-dimethylaminostyryl)naphtho(1,2-d)thiazole, and 2-(p-dimethylaminobenzoyl)styrene. These may be used alone or in combination of, for example, 2 to 5 types.

[0281] The content of the amine compound is preferably 5 to 1,000 parts by mass relative to 100 parts by mass of the specific compound. The upper limit is preferably 500 parts by mass or less, and more preferably 200 parts by mass or less. The lower limit is preferably 10 parts by mass or more, and more preferably 20 parts by mass or more. Only one type of amine compound may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof falls within the above range.

[0282] <<Acid Anhydride>> The photocurable composition of the present invention may contain an acid anhydride. Even if the specific compound is hydrolyzed to a free OH form, the presence of the acid anhydride allows it to be restored to a photodecompositionally active oxime compound again. This makes it possible to suppress a decrease in sensitivity over time.

[0283] Examples of the acid anhydride include carboxylic acid anhydrides and sulfonic acid anhydrides, and carboxylic acid anhydrides are preferred. Specific examples of the acid anhydride include acetic anhydride, propionic acid anhydride, isobutyric acid anhydride, butyric acid anhydride, 2-methylbutyric acid anhydride, pivalic acid anhydride, isovaleric acid anhydride, valeric acid anhydride, 2-methylvaleric acid anhydride, 3-methylvaleric acid anhydride, 4-methylvaleric acid anhydride, hexanoic acid anhydride, 2-methylhexanoic acid anhydride, 3-methylhexanoic acid anhydride, 4-methylhexanoic acid anhydride, 5-methylhexanoic acid anhydride, heptanoic acid anhydride, 2-methylheptanoic acid anhydride, 3-methylheptanoic acid anhydride, 4-methylheptanoic acid anhydride, 5-methylheptanoic acid anhydride, Examples of the anhydride include aliphatic carboxylic acid anhydrides such as 6-methylheptanoic anhydride, 3-phenylpropionic anhydride, phenylacetic anhydride, methacrylic anhydride, acrylic anhydride, trichloroacetic anhydride, trifluoroacetic anhydride, tetrahydrophthalic anhydride, succinic anhydride, maleic anhydride, itaconic anhydride, and glutaric anhydride; aromatic carboxylic acid anhydrides such as benzoic anhydride, phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, and naphthalic anhydride; and sulfocarboxylic acid anhydrides such as 2-sulfobenzoic anhydride.

[0284] The content of the acid anhydride is preferably 1 to 200 parts by mass relative to 100 parts by mass of the specific compound. The upper limit is preferably 100 parts by mass or less, more preferably 50 parts by mass or less. The lower limit is preferably 5 parts by mass or more, more preferably 10 parts by mass or more. Only one type of acid anhydride may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

[0285] <<Pigment Derivative>> The photocurable composition of the present invention may contain a pigment derivative. The pigment derivative is used, for example, as a dispersing aid. A dispersing aid is a material that enhances the dispersibility of a colorant such as a pigment in the photocurable composition.

[0286] Examples of the pigment derivative include a compound having at least one structure selected from the group consisting of a dye structure and a triazine structure, and an acid group or a basic group.

[0287] Examples of the dye structure include a quinoline dye structure, a benzimidazolone dye structure, a benzisoindole dye structure, a benzothiazole dye structure, an iminium dye structure, a squarylium dye structure, a croconium dye structure, an oxonol dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, an azo dye structure, an azomethine dye structure, a phthalocyanine dye structure, a naphthalocyanine dye structure, an anthraquinone dye structure, a quinacridone dye structure, a dioxazine dye structure, a perinone dye structure, a perylene dye structure, a thiazineindigo dye structure, a thioindigo dye structure, an isoindoline dye structure, an isoindolinone dye structure, a quinophthalone dye structure, a dithiol dye structure, a triarylmethane dye structure, and a pyrromethene dye structure.

[0288] Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphate group, a boronic acid group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li ＋ , Na ＋ , K. ＋ etc.), alkaline earth metal ions (Ca ２＋ , Mg ２＋Examples of the imide acid group include an ammonium ion, an imidazolium ion, a pyridinium ion, and a phosphonium ion. ２ NHSO ２ R Ｘ１ , -CONHSO ２ R Ｘ２ , -CONHCOR Ｘ３ or -SO ２ NHCOR Ｘ４ A group represented by the formula: ２ NHSO ２ R Ｘ１ , -CONHSO ２ R Ｘ２ , or -SO ２ NHCOR Ｘ４ A group represented by the formula: ２ NHSO ２ R Ｘ１ or -CONHSO ２ R Ｘ２ is more preferred. Ｘ１ ~R Ｘ４ R each independently represents an alkyl group or an aryl group. Ｘ１ ~R Ｘ４ The alkyl group and aryl group represented by R may have a substituent. The substituent is preferably a halogen atom, more preferably a fluorine atom. Ｘ１ ~R Ｘ４ are each independently preferably an alkyl group containing a fluorine atom or an aryl group containing a fluorine atom, and more preferably an alkyl group containing a fluorine atom. The number of carbon atoms in the alkyl group containing a fluorine atom is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The number of carbon atoms in the aryl group containing a fluorine atom is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6.

[0289] Examples of basic groups possessed by the pigment derivative include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0290] The amino group is —NR ｘ１１ R ｘ１２ and a cyclic amino group.

[0291] -NR ｘ１１ R ｘ１２ In the group represented by ｘ１１ and R ｘ１２ are each independently a hydrogen atom, an alkyl group, or an aryl group, and are preferably an alkyl group. That is, the amino group is preferably a dialkylamino group. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. An example of the substituent is the substituent T. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent. An example of the substituent is the substituent T.

[0292] Examples of the cyclic amino group include a pyrrolidine group, a piperidine group, a piperazine group, a morpholine group, etc. These groups may further have a substituent.

[0293] The pigment derivative may be a pigment derivative having excellent visible transparency (hereinafter also referred to as a transparent pigment derivative). The maximum molar absorption coefficient (εmax) of the transparent pigment derivative in the wavelength range of 400 to 700 nm is 3000 L mol －１ ・cm －１ It is preferable that the concentration is 1000 L mol or less. －１ ・cm －１ More preferably, it is 100 L mol or less. －１ ・cm －１ The lower limit of εmax is, for example, 1 L mol －１ ・cm －１ or more, and 10 L mol －１ ・cm －１ More than that is fine.

[0294] Specific examples of pigment derivatives include the compounds described in the examples below, the compounds described in paragraph 0124 of WO 2022 / 085485, the benzimidazolone compounds or salts thereof described in JP 2018-168244 A, compounds having an isoindoline skeleton described in general formula (1) of Japanese Patent No. 6996282, compounds described in JP 2019-172968 A, and compounds described in the specification of Chinese Patent Application Publication No. 115124889.

[0295] The content of the pigment derivative is preferably 1 to 30 parts by mass, and more preferably 3 to 20 parts by mass, relative to 100 parts by mass of the pigment. The total content of the pigment derivative and colorant is preferably 40% by mass or more, more preferably 50% by mass or more, and even more preferably 60% by mass or more, based on the total solids content of the photocurable composition. The upper limit is preferably 80% by mass or less, and more preferably 70% by mass or less. Only one type of pigment derivative may be used, or two or more types may be used in combination.

[0296] <<Polyalkyleneimine>> The photocurable composition of the present invention can also contain a polyalkyleneimine. The polyalkyleneimine is used, for example, as a dispersing aid for pigments. A dispersing aid is a material for improving the dispersibility of coloring materials such as pigments in a photocurable composition. The polyalkyleneimine is a polymer obtained by ring-opening polymerization of an alkyleneimine. The polyalkyleneimine is preferably a polymer having a branched structure containing a primary amino group, a secondary amino group, and a tertiary amino group. The alkyleneimine preferably has 2 to 6 carbon atoms, more preferably 2 to 4 carbon atoms, even more preferably 2 or 3 carbon atoms, and particularly preferably 2 carbon atoms.

[0297] The molecular weight of the polyalkyleneimine is preferably 200 or more, more preferably 250 or more. The upper limit is preferably 100,000 or less, more preferably 50,000 or less, even more preferably 10,000 or less, and particularly preferably 2,000 or less. Regarding the molecular weight value of the polyalkyleneimine, if the molecular weight can be calculated from the structural formula, the molecular weight of the polyalkyleneimine is the value calculated from the structural formula. On the other hand, if the molecular weight of the specific amine compound cannot be calculated from the structural formula or calculation is difficult, the number average molecular weight value measured by the boiling point elevation method is used. If the number average molecular weight cannot be measured by the boiling point elevation method or is difficult to measure, the number average molecular weight value measured by the viscosity method is used. If the number average molecular weight cannot be measured by the viscosity method or is difficult to measure, the number average molecular weight value measured in terms of polystyrene by GPC (gel permeation chromatography) is used.

[0298] The amine value of the polyalkyleneimine is preferably 5 mmol / g or more, more preferably 10 mmol / g or more, and even more preferably 15 mmol / g or more.

[0299] Specific examples of alkyleneimines include ethyleneimine, propyleneimine, 1,2-butyleneimine, and 2,3-butyleneimine, with ethyleneimine or propyleneimine being preferred, and ethyleneimine being more preferred. It is particularly preferred that the polyalkyleneimine be polyethyleneimine. Furthermore, the polyethyleneimine preferably contains primary amino groups in an amount of 10 mol% or more, more preferably 20 mol% or more, and even more preferably 30 mol% or more, based on the total of primary amino groups, secondary amino groups, and tertiary amino groups. Commercially available polyethyleneimines include Epomin SP-003, SP-006, SP-012, SP-018, SP-200, and P-1000 (all manufactured by Nippon Shokubai Co., Ltd.).

[0300] The content of the polyalkyleneimine in the total solids content of the photocurable composition is preferably 0.1 to 5% by mass. The lower limit is preferably 0.2% by mass or more, more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is preferably 4.5% by mass or less, more preferably 4% by mass or less, and even more preferably 3% by mass or less. The content of the polyalkyleneimine is preferably 0.5 to 20 parts by mass per 100 parts by mass of the pigment. The lower limit is preferably 0.6 parts by mass or more, more preferably 1 part by mass or more, and even more preferably 2 parts by mass or more. The upper limit is preferably 10 parts by mass or less, and even more preferably 8 parts by mass or less. Only one type of polyalkyleneimine may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

[0301] <<Solvent>> The photocurable composition of the present invention preferably contains a solvent. Examples of the solvent include organic solvents. The type of solvent is basically not particularly limited as long as the solubility of each component and the coatability of the composition are satisfied. Examples of organic solvents include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. For details of these, please refer to paragraph

[0223] of WO 2015 / 166779, the contents of which are incorporated herein by reference. Furthermore, ester-based solvents substituted with a cyclic alkyl group and ketone-based solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... Examples of suitable ethylene glycol monomethyl ether acetate include 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, it may be preferable to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, the amount may be 50 ppm by mass (parts per million) or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

[0302] The metal content of the organic solvent is preferably low. The metal content of the organic solvent is preferably, for example, 10 parts per billion (ppb) by mass or less. If necessary, an organic solvent having a metal content of ppt (parts per trillion) by mass may be used, and such an organic solvent is provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0303] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0304] The organic solvent may contain isomers (compounds having the same number of atoms but different structures). The organic solvent may contain only one type of isomer or multiple types of isomers.

[0305] The organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0306] The content of the solvent in the photocurable composition is preferably from 10 to 95% by mass, more preferably from 20 to 90% by mass, and even more preferably from 30 to 90% by mass.

[0307] From the viewpoint of environmental regulations, the photocurable composition of the present invention preferably does not substantially contain environmentally restricted substances. In the present invention, "substantially does not contain environmentally restricted substances" means that the content of environmentally restricted substances in the photocurable composition is 50 ppm by mass or less, preferably 30 ppm by mass or less, more preferably 10 ppm by mass or less, and particularly preferably 1 ppm by mass or less. Examples of environmentally restricted substances include benzene; alkylbenzenes such as toluene and xylene; and halogenated benzenes such as chlorobenzene. These substances are registered as environmentally restricted substances under the REACH (Registration Evaluation Authorization and Restriction of Chemicals) regulations, the PRTR (Pollutant Release and Transfer Register) Act, the VOC (Volatile Organic Compounds) regulations, etc., and their usage amounts and handling methods are strictly regulated. These compounds may be used as solvents when producing the components used in the photocurable composition, and may be mixed into the photocurable composition as residual solvents. From the viewpoints of human safety and environmental considerations, it is preferable to reduce these substances as much as possible. Examples of methods for reducing environmentally restricted substances include heating or reducing the pressure in the system to a temperature above the boiling point of the environmentally restricted substance, thereby distilling off the environmentally restricted substance from the system. Furthermore, when distilling off a small amount of environmentally regulated substances, it is useful to perform azeotropy with a solvent having a boiling point equivalent to that of the solvent in question in order to increase efficiency. Furthermore, when a radically polymerizable compound is contained, a polymerization inhibitor or the like may be added prior to distillation under reduced pressure to prevent intermolecular crosslinking due to the progress of a radical polymerization reaction during distillation under reduced pressure. These distillation methods can be used at any stage, such as the stage of raw materials, the stage of a product obtained by reacting the raw materials (e.g., a resin solution or a polyfunctional monomer solution after polymerization), or the stage of a photocurable composition prepared by mixing these compounds.

[0308] <<Compound Having a Cyclic Ether Group>> The photocurable composition of the present invention can contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. The epoxy group may be an alicyclic epoxy group. The alicyclic epoxy group refers to a monovalent functional group having a cyclic structure in which an epoxy ring and a saturated hydrocarbon ring are condensed. The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter also referred to as an epoxy compound). Examples of epoxy compounds include compounds having one or more epoxy groups per molecule, and compounds having two or more epoxy groups are preferred. The epoxy compound is preferably a compound having 1 to 100 epoxy groups per molecule. The upper limit of the number of epoxy groups contained in the epoxy compound can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups contained in the epoxy compound is preferably 2 or more.

[0309] Examples of compounds having a cyclic ether group include the compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, 0147 to 0156 of JP-A-2014-043556, and 0085 to 0092 of JP-A-2014-089408, and the compounds described in JP-A-2017-179172, the xanthene epoxy resins described in JP-A-2021-195421, and the xanthene epoxy resins described in JP-A-2021-195422 can be used.

[0310] The compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 2000, or even less than 1000) or a high molecular weight compound (macromolecule) (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more). The weight average molecular weight of the compound having a cyclic ether group is preferably 200 to 100,000, and more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0311] Commercially available examples of compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (all manufactured by NOF Corporation, epoxy group-containing polymers).

[0312] The content of the compound having a cyclic ether group in the total solid content of the photocurable composition is preferably 0.1 to 20% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less. Only one type of compound having a cyclic ether group may be used, or two or more types may be used. When two or more types are used, the total amount thereof preferably falls within the above range.

[0313] <<UV Absorber>> The photocurable composition of the present invention may contain an UV absorber. Examples of UV absorbers include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and dibenzoyl compounds. Specific examples of such compounds include the compound described in paragraph 0179 of WO 2022 / 085485, the reactive triazine UV absorber described in JP 2021-178918 A, the UV absorber described in JP 2022-007884 A, the compound described in Korean Patent Publication No. 10-2022-0014454, and the compound described in JP 2023-013321 A can also be used. The content of the UV absorber in the total solids content of the photocurable composition is preferably 0.01 to 10% by mass, more preferably 0.01 to 5% by mass. The ultraviolet absorber may be used alone or in combination of two or more kinds. When two or more kinds are used, the total amount thereof is preferably in the above range.

[0314] <<Polymerization Inhibitor>> The photocurable composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.). Of these, p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solids content of the photocurable composition is preferably 0.0001 to 5 mass%. One type of polymerization inhibitor may be used alone, or two or more types may be used. When two or more types are used, the total amount preferably falls within the above range.

[0315] <<Silane Coupling Agent>> The photocurable composition of the present invention may contain a silane coupling agent. Examples of the silane coupling agent include silane compounds having a hydrolyzable group, and preferably silane compounds having both a hydrolyzable group and another functional group. The hydrolyzable group refers to a substituent directly bonded to a silicon atom that can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, with an alkoxy group being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than the hydrolyzable group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a thiol group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, with an amino group, a (meth)acryloyl group, and an epoxy group being preferred. Specific examples of the silane coupling agent include the compound described in paragraph 0177 of WO 2022 / 085485 and the compound described in JP 2019-183020 A. The content of the silane coupling agent in the total solid content of the photocurable composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. Only one type of silane coupling agent may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount be in the above range.

[0316] <<Surfactant>> The photocurable composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant can be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant, and more preferably a silicone-based surfactant. For details of the surfactant, reference can be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779, the contents of which are incorporated herein by reference.

[0317] As the fluorine-based surfactant, compounds described in paragraphs 0167 to 0173 of WO 2022 / 085485 can be used.

[0318] Examples of nonionic surfactants include the compounds described in paragraph 0174 of WO 2022 / 085485.

[0319] Silicone surfactants include DOWSIL SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. OIL (all manufactured by Dow Toray Industries, Inc.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie). Furthermore, compounds having the following structure can also be used as the silicone surfactant.

[0320] The content of the surfactant in the total solid content of the photocurable composition is preferably 0.001% by mass to 5.0% by mass, more preferably 0.005% by mass to 3.0% by mass. Only one type of surfactant may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is in the above range.

[0321] <<Antioxidant>> The photocurable composition of the present invention may contain an antioxidant. Examples of the antioxidant include phenolic antioxidants, amine antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of the phenolic antioxidant include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxy group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Commercially available antioxidants include, for example, ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330 (manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). Antioxidants include the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, the compounds described in WO 2017 / 006600, the compounds described in WO 2017 / 164024, and the compounds described in Korean Patent Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the photocurable composition is preferably 0.01 to 20 mass %, more preferably 0.3 to 15 mass %. Only one type of antioxidant may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

[0322] <<Other Components>> The photocurable composition of the present invention may contain, as necessary, a sensitizer, a plasticizer, and other auxiliaries (for example, conductive particles, fillers, antifoaming agents, flame retardants, leveling agents, peeling promoters, fragrances, surface tension modifiers, chain transfer agents, etc.). By appropriately incorporating these components, properties such as film physical properties can be adjusted. As these components, the compounds described in paragraph 0182 of WO 2022 / 085485 can be used.

[0323] The photocurable composition of the present invention may contain a metal oxide in order to adjust the refractive index of the resulting film. Examples of the metal oxide include TiO ２ , ZrO ２ , Al ２ O ３ , SiO ２ The primary particle size of the metal oxide is preferably 1 to 100 nm, more preferably 3 to 70 nm, and even more preferably 5 to 50 nm. The metal oxide may have a core-shell structure. In this case, the core may be hollow.

[0324] The photocurable composition of the present invention may contain a light resistance improver. Examples of the light resistance improver include the compounds described in paragraph 0183 of WO 2022 / 085485.

[0325] It is also preferable that the photocurable composition of the present invention is substantially free of terephthalic acid esters. Here, "substantially free" means that the content of terephthalic acid esters in the total amount of the photocurable composition is 1,000 ppb by mass or less, more preferably 100 ppb by mass or less, and particularly preferably zero.

[0326] In view of environmental regulations, the photocurable composition of the present invention preferably has a melamine content of 10,000 ppm by mass or less.

[0327] The photocurable composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing the free metals and halogens in the photocurable composition include washing with ion-exchanged water, filtration, ultrafiltration, and purification with ion-exchange resins.

[0328] From the standpoint of environmental regulations, the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts may be restricted. When the content of the above-mentioned compounds in the photocurable composition of the present invention is reduced, the content of perfluoroalkyl sulfonic acids (particularly perfluoroalkyl sulfonic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts, and perfluoroalkyl carboxylic acids (particularly perfluoroalkyl carboxylic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts is preferably in the range of 0.01 ppb to 1000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, relative to the total solids content of the photocurable composition. The photocurable composition of the present invention may be substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. For example, by using a compound that can replace perfluoroalkyl sulfonic acid and its salt, and a compound that can replace perfluoroalkyl carboxylic acid and its salt, a photocurable composition that is substantially free of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt may be selected. Examples of compounds that can replace restricted compounds include compounds that are exempt from restrictions due to differences in the number of carbon atoms in the perfluoroalkyl group. However, the above does not preclude the use of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt. The photocurable composition of the present invention may contain perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt, within the maximum allowable range.

[0329] The water content of the photocurable composition of the present invention is usually 3% by mass or less, preferably 0.01 to 1.5% by mass, and more preferably 0.1 to 1.0% by mass. The water content can be measured by the Karl Fischer method.

[0330] The photocurable composition of the present invention can be used by adjusting its viscosity for the purposes of adjusting the film surface state (flatness, etc.), film thickness, etc. The viscosity value can be appropriately selected as needed, but is preferably 0.3 mPa·s to 50 mPa·s, and more preferably 0.5 mPa·s to 20 mPa·s at 25°C. The viscosity can be measured, for example, using a cone-plate type viscometer at a temperature adjusted to 25°C.

[0331] <<Storage Container>> The container for storing the photocurable composition is not particularly limited, and any known container can be used. Furthermore, the container described in paragraph 0187 of WO 2022 / 085485 can be used as the storage container.

[0332] <Method for preparing photocurable composition> The photocurable composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the photocurable composition, all components may be simultaneously dissolved and / or dispersed in a solvent to prepare the photocurable composition, or, if necessary, each component may be prepared as two or more appropriate solutions or dispersions, which are mixed at the time of use (application) to prepare the photocurable composition.

[0333] The preparation of the photocurable composition preferably includes a process for dispersing the pigment. In the process for dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. Furthermore, when grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads, increase the bead packing ratio, or otherwise increase the grinding efficiency under such conditions. Furthermore, it is preferable to remove coarse particles after the grinding process by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, for example, the process and disperser described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System) - Comprehensive Data Collection," published by the Management Development Center Publishing Department, October 10, 1978, and paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, particle refinement may be performed in a salt milling process. For details on the materials, equipment, processing conditions, etc. used in the salt milling process, see, for example, JP 2015-194521 A and JP 2012-046629 A. Examples of materials for beads used in dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of an inorganic compound having a Mohs hardness of at least 2. The photocurable composition may contain 1 to 10,000 ppm of the beads.

[0334] When preparing the photocurable composition, it is preferable to filter the photocurable composition with a filter for the purpose of removing foreign matter, reducing defects, etc. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022 / 085485.

[0335] <Film> The film of the present invention is a film obtained from the photocurable composition of the present invention described above. The film of the present invention can be used in optical filters such as color filters, infrared transmission filters, and infrared cut filters.

[0336] The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. For example, the thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.3 μm or more.

[0337] When the film of the present invention is used as a color filter, the film of the present invention preferably has a green, red, blue, cyan, magenta, or yellow hue. The film of the present invention can also be preferably used as a color pixel of a color filter. Examples of the color pixel include a red pixel, a green pixel, a blue pixel, a magenta pixel, a cyan pixel, and a yellow pixel.

[0338] <Pixel Manufacturing Method> A pixel manufacturing method using the photocurable composition of the present invention will be described. The pixel manufacturing method includes the steps of forming a composition layer on a support using the photocurable composition of the present invention, exposing the composition layer to light in a pattern, and developing and removing the unexposed areas of the composition layer. If necessary, a step of drying the composition layer (pre-baking step) and a step of heat-treating the developed pattern (pixel) (post-baking step) may also be provided.

[0339] In the step of forming a composition layer, a composition layer is formed on a support using the photocurable composition of the present invention. The support is not particularly limited and can be appropriately selected depending on the application. Examples include a glass substrate and a silicon substrate, with a silicon substrate being preferred. The silicon substrate may also be formed with a charge-coupled device (CCD), a complementary metal-oxide semiconductor (CMOS), a transparent conductive film, or the like. A black matrix is ​​sometimes formed on the silicon substrate to isolate each pixel. The silicon substrate may also be provided with an underlayer to improve adhesion with an upper layer, prevent diffusion of substances, or flatten the substrate surface. The surface contact angle of the underlayer is preferably 20 to 70° when measured with diiodomethane. It is also preferably 30 to 80° when measured with water.

[0340] As the coating method of the photocurable composition, known methods can be used. For example, a dropping method (drop casting); a slit coating method; a spray method; a roll coating method; a rotary coating method (spin coating); a casting coating method; a slit and spin method; a pre-wetting method (for example, the method described in JP 2009-145395 A); inkjet (for example, an on-demand method, a piezo method, a thermal method), various printing methods such as nozzle jet ejection printing, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing; a transfer method using a mold or the like; a nanoimprint method, etc. can be mentioned. In addition, the coating method described in paragraph 0207 of WO 2022 / 085485 can also be used.

[0341] The composition layer formed on the support may be dried (prebaked). When a film is produced by a low-temperature process, prebaking may not be performed. When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can also be 80°C or higher. The prebaking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and even more preferably 80 to 220 seconds. Prebaking can be performed using a hot plate, an oven, or the like.

[0342] Next, the composition layer is exposed to light in a pattern (exposure step). For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0343] Examples of radiation (light) that can be used for exposure include g-line and i-line. Light with a wavelength of 150 to 300 nm can also be used. Examples of light with a wavelength of 150 to 300 nm include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Light with a wavelength of 150 to 300 nm is preferably excimer laser light with a wavelength of 150 to 300 nm. A long-wavelength light source of 300 nm or more can also be used for exposure.

[0344] In the exposure step, it is preferable to irradiate the composition layer with light having a wavelength of 150 to 300 nm (preferably excimer laser light having a wavelength of 150 to 300 nm) to expose it in a pattern.

[0345] The exposure may be performed by continuous irradiation with light or by pulsed irradiation (pulse exposure), which is an exposure method in which light is repeatedly irradiated and paused in a short cycle (for example, on the order of milliseconds or less).

[0346] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm ２ is preferred, and 0.05 to 1.0 J / cm ２ The oxygen concentration during exposure can be appropriately selected. In addition to being performed in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m ２ ~100000W / m ２ (For example, 5000 W / m ２ , 15000W / m ２, or 35,000 W / m ２ The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m ２ , oxygen concentration 35% by volume, illuminance 20,000 W / m ２ etc.

[0347] Next, the unexposed portions of the composition layer are developed and removed to form a pattern (pixels). The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, leaving only the photocured portions. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, to improve residue removability, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0348] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the washing (rinsing) method after development, the developer and washing method described in paragraph 0214 of WO 2022 / 085485 can be used.

[0349] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is, for example, preferably 100 to 300°C, more preferably 200 to 270°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to achieve the above conditions for the developed film. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0350] <Optical Filter> The film of the present invention can be used in an optical filter. Types of optical filters include color filters, infrared cut filters, and infrared transmission filters, and a color filter is preferred. The color filter preferably has the film of the present invention as its pixel, and more preferably has the film of the present invention as a colored pixel.

[0351] The optical filter may have a protective layer provided on the surface of the film of the present invention. By providing a protective layer, various functions can be imparted, such as oxygen blocking, low reflectivity, hydrophilicity / hydrophobicity, and blocking of light of specific wavelengths (ultraviolet rays, infrared rays, etc.). The thickness of the protective layer is preferably 0.01 to 10 μm, more preferably 0.1 to 5 μm. Methods for forming the protective layer include a method of applying a resin composition for forming the protective layer, a chemical vapor deposition method, and a method of attaching a molded resin with an adhesive. Components constituting the protective layer include (meth)acrylic resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, polyol resin, polyvinylidene chloride resin, melamine resin, urethane resin, aramid resin, polyamide resin, alkyd resin, epoxy resin, modified silicone resin, fluororesin, polyacrylonitrile resin, cellulose resin, Si, C, W, Al ２ O ３ , Mo, SiO ２ , Si ２ N ４ For example, in the case of a protective layer intended to block oxygen, the protective layer may contain a polyol resin and SiO ２ and Si ２ N ４ In the case of a protective layer intended to reduce reflection, the protective layer preferably contains a (meth)acrylic resin and a fluorine resin.

[0352] When forming a protective layer by applying a resin composition, known methods such as spin coating, casting, screen printing, and inkjet printing can be used as the method for applying the resin composition. Known organic solvents (e.g., propylene glycol 1-monomethyl ether 2-acetate, cyclopentanone, ethyl lactate, etc.) can be used as the organic solvent contained in the resin composition. When forming the protective layer by chemical vapor deposition, known chemical vapor deposition methods (thermal chemical vapor deposition, plasma chemical vapor deposition, photochemical vapor deposition) can be used as the chemical vapor deposition method.

[0353] The protective layer may contain additives such as organic or inorganic fine particles, absorbers for light of specific wavelengths (e.g., ultraviolet light, infrared light, etc.), refractive index adjusters, antioxidants, adhesives, and surfactants, as needed. Examples of organic or inorganic fine particles include polymeric fine particles (e.g., silicone resin fine particles, polystyrene fine particles, and melamine resin fine particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, titanium nitride, titanium oxynitride, magnesium fluoride, hollow silica, silica, calcium carbonate, and barium sulfate. Known absorbers for light of specific wavelengths can be used. The content of these additives can be adjusted as appropriate, but is preferably 0.1 to 70% by mass, and more preferably 1 to 60% by mass, of the total mass of the protective layer.

[0354] As the protective layer, the protective layers described in paragraphs 0073 to 0092 of JP-A-2017-151176 can also be used.

[0355] The optical filter may have a structure in which each pixel is embedded in a space partitioned by partition walls, for example, in a grid pattern.

[0356] <Solid-state imaging device> The solid-state imaging device of the present invention has the above-described film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has the film of the present invention and functions as a solid-state imaging device, but examples thereof include the following configurations.

[0357] The substrate includes a plurality of photodiodes constituting a light-receiving area of ​​a solid-state imaging device (such as a CCD (charge-coupled device) image sensor or a CMOS (complementary metal-oxide semiconductor) image sensor) and transfer electrodes made of polysilicon or the like. A light-shielding film is formed on the photodiodes and transfer electrodes, with only the light-receiving portions of the photodiodes exposed. A device protection film made of silicon nitride or the like is formed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes. A color filter is also provided on the device protection film. Furthermore, the device protection film may include a light-collecting means (e.g., a microlens, etc.; the same applies hereinafter) below the color filter (on the side closer to the substrate), or on the color filter. The color filter may have a structure in which each color pixel is embedded in a space partitioned by partition walls, for example, in a grid pattern. In this case, the partition walls preferably have a lower refractive index than the color pixels. Examples of imaging devices having such a structure include those described in JP 2012-227478 A, JP 2014-179577 A, and WO 2018 / 043654 A. Furthermore, as shown in JP 2019-211559 A, an ultraviolet absorbing layer may be provided within the structure of the solid-state imaging element to improve light resistance. An imaging device equipped with the solid-state imaging element of the present invention can be used for digital cameras, electronic devices with imaging functions (such as mobile phones), as well as in-vehicle cameras and surveillance cameras.

[0358] <Image Display Device> The image display device of the present invention has the above-described film of the present invention. Examples of image display devices include liquid crystal display devices and organic electroluminescence display devices. Definitions of image display devices and details of each image display device are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). There are no particular limitations on the liquid crystal display device to which the present invention can be applied, and the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology."

[0359] <Photopolymerization Initiator> The photopolymerization initiator of the present invention contains the specific compound described above.

[0360] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In the structural formulas shown below, Me is a methyl group, Ph is a phenyl group, and iPr is an isopropyl group.

[0361] <Synthesis Examples> (Synthesis Example 1) Synthesis of Compound (A-1)

[0362] 13.2 g of 1-indanone was dissolved in 100 mL of tetrahydrofuran and 20 mL of methanol and cooled to 0°C. 4.8 g of sodium methoxide was added to this, and the mixture was stirred for an additional 2 hours at 0°C. 10.7 g of 1-bromo-2-methylpropane was added to this, and the mixture was stirred for an additional 2 hours at 25°C. The reaction solution was separated with ethyl acetate / water, the organic layer was concentrated, and the concentrate was purified by silica gel column chromatography (hexane / ethyl acetate = 10 / 1) to obtain 9.4 g of intermediate (A-1-b) as a pale yellow liquid. 9.4 g of intermediate (A-1-b) was dissolved in 100 mL of pyridine, and 13.8 g of hydroxylamine hydrochloride was added and stirred at room temperature for 24 hours. The resulting reaction solution was crystallized with 300 mL of 1 M aqueous hydrochloric acid cooled to 0°C, and the resulting solid was collected by filtration. This solid was recrystallized from 100 mL of acetonitrile to obtain 8.9 g of intermediate (A-1-a) as a pale yellow solid. 8.9 g of intermediate (A-1-a) was dissolved in 100 mL of ethyl acetate, and 15.8 g of pyridine was added and stirred at 0°C. 10.3 g of acetyl chloride was added dropwise to the solution, and the mixture was stirred at 0°C for 1 hour, and then stirred at room temperature for a further 2 hours. The resulting reaction solution was separated into ethyl acetate and pure water, and the organic layer was concentrated to obtain a pale yellow viscous liquid. This was purified by silica gel column chromatography (hexane / ethyl acetate = 10 / 1) to obtain 6.5 g of compound A-1 as a pale yellow viscous liquid. The structure of the compound is １The geometric isomers of the oxime moiety were identified by H NMR, with E / Z = 72 / 28 based on the proton ratio of NMR. １ H NMR (CDCl ３ ): 0.91 (d, 6H), 1.37 (m, 2H), 1.62 (m, 1H), 2.21 (s, 3H), 2.33 (m, 1H), 2.58 (m, 1H), 2.66 (m, 1H), 7.3-7.5 (m, 4H)

[0363] (Synthesis Example 2) Synthesis of Compound A-9 In the synthesis of compound A-1, 6.7 g of compound A-9 was obtained as a pale yellow solid in the same manner as in the synthesis of compound A-1, except that 1-indanone was replaced with 5-(isopropylthio)-2,3-dihydro-1H-cyclopenta[a]naphthalen-1-one and 1-bromo-2-methylpropane was replaced with cyclopentylmethyl bromide. The structure of compound A-9 is １ The geometric isomers of the oxime moiety were identified by H NMR, with E / Z = 65 / 35 based on the proton ratio of NMR. １ H NMR (CDCl ３ ): 1.31 (d, 3H), 1.4-2.0 (m, 11H), 2.26 (s, 3H), 2.33 (m, 1H), 2.6-3.0 (m, 2H), 7.5-8.0 (m, 8H)

[0364] (Synthesis Example 3) Synthesis of Compound A-85 In the synthesis of compound A-1, 12.1 g of compound A-85 was obtained as a pale yellow solid in the same manner except that 1-indanone was replaced with 5-((4-(benzofuran-2-carbonyl)phenyl)thio)-2,3-dihydro-1H-indan-1-one and 1-bromo-2-methylpropane was replaced with cyclohexylmethyl bromide. The structure of compound A-85 is １ The geometric isomers of the oxime moiety were identified by HNMR, and the proton ratio of the NMR showed E / Z = 80 / 20. １ H NMR (CDCl ３ ): 1.0-2.0 (m, 13H), 2.25 (s, 3H), 2.3-3.0 (m, 3H), 7.0-8.0 (m, 12H)

[0365] (Synthesis Example 4) Synthesis of Compound A-87 In the synthesis of compound A-1, 10.1 g of compound A-87 was obtained as a pale yellow solid in the same manner as in the synthesis of compound A-1, except that 1-indanone was replaced with 6-ethyl-9-(2,4,6-trimethylbenzoyl)-1,6-dihydrocyclopenta[c]carbazol-3(2H)-one and 1-bromo-2-methylpropane was replaced with cyclopentylethyl bromide. The structure of compound A-87 is １ The geometric isomers of the oxime moiety were identified by H NMR, with E / Z = 84 / 16 based on the proton ratio of NMR. １ H NMR (CDCl ３ ): 1.37 (t, 3H), 1.4-2.0 (m, 13H), 2.20 (s, 3H), 2.30 (s, 3H), 2.48 (s, 6H), 2.4-3.0 (m, 3H), 4.53 (q, 2H), 7.12 (s, 2H), 7.5-8.2 (m, 4H), 8.49 (s, 1H)

[0366] Synthesis Example 5: Synthesis of Compound A-114 In the synthesis of compound A-1, 16.3 g of compound A-114 was obtained as a pale yellow solid in the same manner as in the synthesis of compound A-1, except that 1-indanone was replaced with (4-methoxynaphthalen-1-yl)(2-methyl-4-(1,2,3,4-tetrahydro-9H-carbazol-9-yl)phenyl)methanone and 1-bromo-2-methylpropane was replaced with cyclopentylmethyl bromide. The structure of compound A-114 is １ The geometric isomers of the oxime moiety were identified by H NMR, with E / Z = 76 / 24 based on the proton ratio of NMR. １ H NMR (CDCl ３ ): 1.0-2.0 (m, 13H), 2.21 (s, 3H), 2.26 (m, 1H), 2.44 (s, 3H), 2.5-2.7 (m, 2H), 3. 79 (s, 3H), 6.56 (s, 1H), 7.2-8.0 (m, 9H), 8.38 (d, 1H), 8.48 (d, 1H), 9.12 (d, 1H)

[0367] Synthesis Example 6: Synthesis of Compound A-147 In the synthesis of Compound A-1, 12.9 g of Compound A-147 was obtained as a pale yellow solid in the same manner as in the synthesis of Compound A-1, except that 1-indanone was changed to 5,5-dipropyl-2H-fluoreno[3,2-b:6,7-b']difuran-3,7(5H,8H)-dione. The structure of Compound A-147 is １ The geometric isomers of the oxime moiety were identified by HNMR, with E / Z = 92 / 8 based on the proton ratio of NMR. １ H NMR (CDCl ３ ): 0.89 (t, 6H), 0.91 (d, 12H), 1.32 (m, 4H), 1.81 (m, 4H), 1.83 (t, 4H), 2.24 (s, 6H), 4.16 (t, 2H), 7.56 (s, 2H), 8.09 (s, 2H)

[0368] (Synthesis Example 7) Synthesis of Compound A-166 In the synthesis of Compound A-1, 13.0 g of Compound A-166 was obtained as a pale yellow solid in the same manner as in the synthesis of Compound A-1, except that 1-indanone was changed to 9,9'-(carbonylbis(4,1-phenylene))bis(1,2,3,9-tetrahydro-4H-carbazol-4-one). The structure of Compound A-166 is １ The geometric isomers of the oxime moiety were identified by HNMR. The proton ratio of NMR showed E / Z = 95 / 5. １ H NMR (CDCl ３ ): 1.2-2.0 (m, 28H), 2.21 (s, 6H), 2.30 (m, 2H), 2.5-2.6 (m, 4H), 7.2-7.6 (m, 6H), 7.83 (d, 4H), 7.88 (d, 4H), 8.49 (d, 2H)

[0369] <Preparation of Dispersion> The materials listed in the Dispersion column of the table below were mixed to obtain a mixture. The obtained mixture was subjected to a dispersion treatment using an Ultra Apex Mill manufactured by Kotobuki Industries Co., Ltd. as a circulating dispersion device (bead mill) to produce a dispersion. When two or more materials are listed in the "Type" column of the table, the total amount of each material used in equal amounts is listed in the "Parts by mass" column.

[0370]

[0371] <Preparation of Photocurable Composition> Photocurable compositions were prepared by mixing the types of materials shown in the table below with 0.2 parts by mass of KF-6001 (manufactured by Shin-Etsu Chemical Co., Ltd.) as a surfactant, 0.2 parts by mass of Adekastab AO-80 (manufactured by ADEKA Corporation) as an antioxidant, and 0.01 parts by mass of p-methoxyphenol as a polymerization inhibitor. When two or more types of materials are listed in the "Type" column of the table, the total amount of each material, using equal amounts, is listed in the "Parts by mass" column.

[0372]

[0373] Details of the materials listed in the table above are as follows:

[0374] (Colorants) PG36: C.I. Pigment Green 36 (green pigment) PG58: C.I. Pigment Green 58 (green pigment) PY129: C.I. Pigment Yellow 129 (yellow pigment) PY138: C.I. Pigment Yellow 138 (yellow pigment) PY139: C.I. Pigment Yellow 139 (yellow pigment) PY150: C.I. Pigment Yellow 150 (yellow pigment) PY185: C.I. Pigment Yellow 185 (yellow pigment) PY215: C.I. Pigment Yellow 215 (yellow pigment) PR177: C.I. Pigment Red 177 (red pigment) PR254: C.I. C.I. Pigment Red 254 (red pigment) PR264: C.I. Pigment Red 264 (red pigment) PR272: C.I. Pigment Red 272 (red pigment) PR291: C.I. Pigment Red 291 (red pigment) PO71: C.I. Pigment Orange 71 (orange pigment) PB15:6: C.I. Pigment Blue 15:6 (blue pigment) PV23: C.I. Pigment Violet 23 (purple pigment) P-1: Compound having the following structure (pyrrolopyrrole compound, infrared absorbing pigment) P-2: Compound having the following structure (squarylium compound, infrared absorbing pigment) P-3: Titanium black (TiOxNy) (black pigment, manufactured by Mitsubishi Materials Corporation) P-4: Titanium oxide (white pigment, TTO-51(C), manufactured by Ishihara Sangyo Kaisha, Ltd.) P-5: Compound having the following structure (magenta dye)

[0375] (Dispersing Aids) Syn-1, Syn-2, Syn-4 to Syn-7: Compounds having the following structure Syn-3: Compound having the following structure (a / b / c=10 / 70 / 20 (mol %), weight average molecular weight 600)

[0376] (Resin) C2-1: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 20,000, acid value: 67 mg KOH / g, radical polymerizable compound) C2-2: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 23,000, acid value: 59 mg KOH / g, radical polymerizable compound) C2-3: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 18,000, acid value: 69 mg KOH / g, radical polymerizable compound) C2-4: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 23,000, acid value: 67 mg KOH / g) C2-5: Resin having the following structure (weight average molecular weight 10,000, acid value 85 mgKOH / g) C2-6: Resin having the following structure (weight average molecular weight 18,000, acid value 82 mgKOH / g, radical polymerizable compound) C2-7: Resin having the following structure (weight average molecular weight 8000, acid value 50 mgKOH / g) C2-8: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 28,000, acid value: 95 mg KOH / g)

[0377] B-1: Resin having the following structure (the numerical values ​​attached to the main chain are molar ratios; weight-average molecular weight: 11,000; acid value: 69 mg KOH / g; radically polymerizable compound) B-2: Resin having the following structure (the number attached to the main chain is the molar ratio, and the number attached to the side chain is the number of repeating units. Weight-average molecular weight: 21,000, radically polymerizable compound) B-3: Resin having the following structure (the numerical values ​​attached to the main chain are molar ratios; weight-average molecular weight: 12,000; acid value: 80 mg KOH / g; radically polymerizable compound)

[0378] (Monomer) M-1: a mixture of compounds having the following structure (a mixture of the compound on the left (a hexafunctional (meth)acrylate compound) and the compound on the right (a pentafunctional (meth)acrylate compound) in a molar ratio of 7:3, a radically polymerizable compound) M-2: Compound having the following structure (radical polymerizable compound) M-3: Compound having the following structure (radical polymerizable compound) M-4: Compound having the following structure (radical polymerizable compound) M-5: Compound having the following structure (radical polymerizable compound)

[0379] (Photopolymerization initiator) A-1 to A-187: Compounds A-1 to A-187 shown as specific examples of the specific compounds described above. cA-1: Compound having the following structure (comparison compound): I-1 to I-14: Compounds having the following structures (other photopolymerization initiators) I-15: A 14-kind equal weight mixture of TR-PBG-301, TR-PBG-304, TR-PBG-305, TR-PBG-309, TR-PBG-3054, TR-PBG-3057, TR-PBG-314, TR-PBG-327, TR-PBG-345, TR-PBG-346, TR-PBG-358, TR-PBG-365, TR-PBG-380, and TR-PBG-610 (all manufactured by TRONLY) (other photopolymerization initiators) I-16: A mixture of equal amounts of three types of photopolymerization initiators: NCI-730, NCI-831E, and NCI-930 (all manufactured by ADEKA Corporation) (another photopolymerization initiator)

[0380] (Additives) T-1 to T-8: Compounds having the following structures

[0381] (Solvents) S-1: Propylene glycol monomethyl ether acetate (PGMEA) S-2: Propylene glycol monomethyl ether (PGME) S-3: Cyclopentanone S-4: 3-methoxybutanol S-5: Cyclohexanone S-6: 3-methoxypropanol

[0382] <Evaluation of Rectangularity> An undercoat agent (CT-4000L, manufactured by FUJIFILM Electronic Materials Co., Ltd.) was applied to an 8-inch (20.32 cm) silicon wafer using a spin coater so that the thickness after post-baking would be 0.1 μm, and the wafer was heated on a hot plate at 220°C for 300 seconds to form an undercoat layer, thereby obtaining a silicon wafer with an undercoat layer. Each of the photocurable compositions obtained above was applied by spin coating onto the undercoat layer of the undercoat layer-containing silicon wafer so that the film thickness after application would be 1.0 μm, and then the wafer was heated on a hot plate at 110°C for 2 minutes to form a composition layer. Next, the obtained composition layer was exposed to light (KrF radiation) with a wavelength of 248 nm through a mask having a 0.56 μm square pattern using a KrF scanner exposure machine at an illuminance of 35,000 W / m ２ , pulse width 20 nanoseconds, frequency 50 kHz, exposure dose 30 mJ / cm ２ Next, the composition layer after exposure was subjected to shower development at 23°C for 60 seconds using a 0.3 mass% aqueous solution of tetramethylammonium hydroxide (TMAH) as a developer. Thereafter, water droplets adhering to the pattern surface were removed with air, and the pattern was allowed to dry naturally to form a pattern (pixel), and the taper angle and edge shape were evaluated by the following methods.

[0383] To evaluate the taper angle, a silicon wafer on which pixels were formed was cut, and the cross section of the cut pixel was observed at a magnification of 20,000 times using a scanning electron microscope (S-4800H, manufactured by Hitachi High-Technologies Corporation). The taper angle of the top of the pixel was measured and evaluated according to the following criteria. The taper angle of the top of the pixel is the angle formed by the top of the pixel and the edge of the pixel, as shown in Figure 1, and is θ in Figure 1.

[0384] To evaluate the edge shape, a silicon wafer on which pixels were formed was cut, and the cross section of the cut pixel was observed at a magnification of 20,000 times using a scanning electron microscope (S-4800H, manufactured by Hitachi High-Technologies Corporation). As shown in FIG. 1, the length T of the bottom notch in the edge portion 2 of the pixel formed on the silicon wafer 10 was measured, and the edge shape was evaluated according to the following criteria.

[0385] In FIG. 1, reference numeral 1 denotes a pixel, reference numeral 2 denotes the top of the pixel, reference numeral 3 denotes the edge of the pixel, reference numeral 10 denotes a silicon wafer, θ denotes the taper angle of the top of the pixel, and T denotes the length of the notch at the bottom.

[0386] -Evaluation criteria for taper angle- A: The taper angle at the top of the pixel is 85° or more and less than 95°. B: The taper angle at the top of the pixel is 80° or more and less than 85°, or 95° or more and less than 100°. C: The taper angle at the top of the pixel is 70° or more and less than 80°, or 100° or more and less than 110°. D: The taper angle at the top of the pixel is 60° or more and less than 70°, or 110° or more and less than 120°. E: The taper angle at the top of the pixel is less than 60° or 120° or more.

[0387] -Evaluation of edge shape- A: The length of the bottom notch is 0.005 μm or less, or the edge of the pixel is in smooth contact with the silicon wafer and there is no bottom notch. B: The length of the bottom notch is more than 0.005 μm and less than 0.010 μm. C: The length of the bottom notch is more than 0.010 μm and less than 0.025 μm. D: The length of the bottom notch is more than 0.025 μm and less than 0.050 μm. E: The length of the bottom notch is more than 0.050 μm.

[0388] <Sensitivity Evaluation> Each of the photocurable compositions obtained above was applied by spin coating onto the undercoat layer of the undercoat layer-attached silicon wafer so that the film thickness after application would be 0.6 μm, and then heated at 110° C. for 2 minutes using a hot plate to form a composition layer. Next, using a KrF scanner exposure machine, the obtained composition layer was irradiated with light (KrF rays) with a wavelength of 248 nm through a mask having a 0.5 μm square pattern at an illuminance of 35,000 W / m ２ , pulse width 20 nanoseconds, frequency 50 kHz, exposure dose 20 mJ / cm ２ ~300 mJ / cm ２The exposure was carried out by changing the irradiation amount within the range. Next, the composition layer after exposure was subjected to shower development at 23°C for 60 seconds using a 0.3 mass% aqueous solution of tetramethylammonium hydroxide (TMAH) as a developer. Thereafter, water droplets adhering to the pattern surface were removed with air, and the pattern was allowed to dry naturally to form a pattern (pixels). The silicon wafer on which pixels had been formed was observed at a magnification of 20,000 times using a scanning electron microscope (S-4800H, manufactured by Hitachi High-Technologies Corporation). The exposure amount required for the pattern line width to reach 0.6 μm in the observed pixels was calculated, and the sensitivity was evaluated according to the following evaluation criteria. - Evaluation criteria - A: Exposure amount of 50 mJ / cm ２ B: The exposure amount is 50 mJ / cm or less ２ exceeding 70 mJ / cm ２ C: The exposure amount is 70 mJ / cm or less ２ exceeding 100 mJ / cm ２ D: The exposure amount is 100 mJ / cm or less ２ exceeding 150 mJ / cm ２ E: The exposure amount is 150 mJ / cm or less ２ exceed

[0389] <Evaluation of Adhesion> Each of the photocurable compositions obtained above was applied by spin coating onto the undercoat layer of the undercoat-coated silicon wafer so that the film thickness after application was 0.6 μm, and then heated at 100° C. for 2 minutes using a hot plate to form a composition layer. Next, using a KrF scanner exposure machine, the obtained composition layer was irradiated with light (KrF line) having a wavelength of 248 nm through a mask engraved with a 0.6 μm square checkered pattern at an illuminance of 35,000 W / m2, a pulse width of 20 nanoseconds, a frequency of 50 kHz, and an exposure dose of 30 mJ / cm. ２The composition layer was then exposed to light at 23°C for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH) as the developer. The exposed composition layer was then subjected to puddle development at 23°C for 60 seconds. The layer was then rinsed with pure water for 20 seconds using a spin shower, and then washed with pure water. Water droplets adhering to the pattern surface were then removed with air, and the pattern was allowed to dry naturally to form a pattern (pixels). The silicon wafer with the formed pixels was observed at a magnification of 20,000 times using a scanning electron microscope (S-4800H, manufactured by Hitachi High-Technologies Corporation). The ratio of missing pixels among 100 pixels was observed from the scanning electron microscope photograph to evaluate adhesion. The evaluation criteria are as follows: -Evaluation criteria- A: The ratio of missing pixels is 0% B: The ratio of missing pixels is more than 0% but not more than 10% C: The ratio of missing pixels is more than 10% but not more than 20% D: The ratio of missing pixels is more than 20% but not more than 50% E: The ratio of missing pixels is more than 50%

[0390]

[0391] As shown in the above table, the examples were superior to the comparative examples in the evaluations of rectangularity, sensitivity and adhesion.

[0392] In the evaluations of rectangularity, sensitivity and adhesion, the same effects were obtained even when the exposure light source was changed to i-line (wavelength 365 nm).

[0393] 1: Pixel 2: Top of pixel 3: Edge of pixel 10: Silicon wafer θ: Taper angle T: Length of bottom notch

Claims

1. A photocurable composition comprising a photopolymerization initiator and a radically polymerizable compound, wherein the photopolymerization initiator comprises a compound A in which a group represented by formula (1) is fused to the ring A of a ring-containing group containing at least one ring A selected from an aromatic ring and a heterocyclic ring; In formula (1), *1 represents the position of the fused ring with the ring A, １ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryloxy group, an alkoxy group, an aryloxy group, or a heteroaryloxy group; L １ represents a single bond or an alkylene group; Y １ is -CR Ｙ１ R Ｙ２ -, -O-, -S-, or -NR Ｙ３ represents -, R Ｙ１ ~R Ｙ３ each independently represents a hydrogen atom, an alkyl group, or an aryl group; R ２ represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a group represented by formula (Z-1); Z １ represents a group represented by formula (Z-1); In formula (Z-1), * represents a bond; Ｚ１ represents a single bond or an alkylene group; Ｚ２ ~L Ｚ４ are each independently -CR Ｌ１ R Ｌ２ -, -O-, -S- or -NR Ｌ３ represents -, and R Ｌ１ ~R Ｌ３ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ may be bonded via a single bond or a linking group to form a ring; Ｚ２ ~L Ｚ４ At least two of them are -CR Ｌ１ R Ｌ２ - is.

2. L in the formula (Z-1) Ｚ３ and L Ｚ４ are each independently -CR Ｌ１ R Ｌ２ - and R Ｌ１ and R Ｌ２ are each independently a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ are each independently a hydrogen atom or an alkyl group, and R Ｚ１ and R Ｚ２ The photocurable composition according to claim 1 , wherein the groups may be bonded via a single bond or a linking group to form a ring.

3. R in the formula (Z-1) Ｚ１ and R Ｚ２ The photocurable composition according to claim 1 or 2, wherein: are bonded via a single bond or a linking group to form a ring.

4. L in the formula (Z-1) Ｚ１ is a single bond or a methylene group, and L Ｚ２ Ga-CR Ｌ１ R Ｌ２ - and R Ｌ１ and R Ｌ２ The photocurable composition according to claim 1 or 2, wherein each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group.

5. The photocurable composition according to claim 1 or 2, wherein the ring-containing group contains a ring represented by formula (A-1) or formula (A-2); In formula (A-1), *1 represents the position of the fused ring with the group represented by formula (1), ｘ１ and R ｘ２ are each independently an alkyl group, an aryl group, a heteroaryl group, or —OR ｘ1０１ , -SR ｘ１０１ , -COR ｘ１０１ , -SO ２ R ｘ１０１ , -NR ｘ１０２ R ｘ１０３ , -CONR ｘ１０２ R ｘ１０３ , -NR ｘ１０４ COR ｘ１０５ , -OCOR ｘ１０１ , -COOR ｘ１０１ , -SCOR ｘ１０１ , -OCSR ｘ１０１ , -COSR ｘ１０１ , -CSOR ｘ１０１ , a cyano group, a nitro group, a hydroxyl group, a thiol group, a carboxyl group, a halogen atom or a bond, and R ｘ１０１ ~R ｘ１０５ each independently represents a monovalent organic group; s and t each independently represent 0 or 2, and at least one of s and t is 2; m1 represents an integer of 0 to (4-s); m2 represents an integer of 0 to (4-t); and when m1 is 2 or more, a plurality of R ｘ１ may be the same or different, and multiple R ｘ１ may be bonded to each other via a single bond or a linking group to form a ring, and when m2 is 2 or more, a plurality of R ｘ２ may be the same or different, and multiple R ｘ２ may be bonded to each other via a single bond or a linking group to form a ring, ｘ３ and R ｘ４ each independently represents a single bond, —CR ｘ１１ R ｘ１２ -, -O-, -S-, -NR ｘ１３ - or -C(=O)-, R ｘ１１ ~R ｘ１３ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; n represents an integer of 0 or 1; when n is 0, R ｘ３ does not exist; In formula (A-2), *1 represents the position of the fused ring with the group represented by formula (1), R ｘ５ represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R ｘ６ represents an alkyl group, an aryl group, a heteroaryl group, or a bond, p1 represents an integer of 0 to 2, and when p1 is 2, there are multiple R ｘ６ may be the same or different, and multiple R ｘ６ They may be bonded to each other via a single bond or a linking group to form a ring.

6. R in the formula (A-2) ｘ５ is a group represented by formula (Rx-50); In formula (Rx-50), * represents a bond, ｘ５１ is a hydrogen atom, an alkyl group, an aryl group, a heteroaryl group, -OR ｘ５０１ , -SR ｘ５０１ , -COR ｘ５０１ , -SO ２ R ｘ５０１ , -NR ｘ５０２ R ｘ５０３ , -CONR ｘ５０２ R ｘ５０３ , -NR ｘ５０４ COR ｘ５０５ , -OCOR ｘ５０１ , -COOR ｘ５０１ , -SCOR ｘ５０１ , -OCSR ｘ５０１ , -COSR ｘ５０１ , -CSOR ｘ５０１ , a cyano group, a nitro group, a hydroxyl group, a thiol group, a carboxyl group, or a halogen atom; R ｘ５０１ ~R ｘ５０５ each independently represents a monovalent organic group; ｘ５２ represents an alkyl group, an aryl group, or a halogen atom; k represents an integer of 0 to 4; when k is 2 or more, a plurality of R ｘ５２ may be the same or different, and multiple R ｘ５２ Two of these may be bonded via a single bond or a divalent linking group to form a ring.

7. The photocurable composition according to claim 1 or 2, further comprising a coloring material.

8. The photocurable composition according to claim 1 or 2, further comprising a resin.

9. The photocurable composition of claim 8, wherein the resin comprises a graft polymer.

10. The photocurable composition according to claim 1 or 2, further comprising a chain transfer agent.

11. A method for manufacturing a pixel, comprising the steps of: forming a composition layer on a support using the photocurable composition according to claim 1 or 2; exposing the composition layer in a pattern by irradiating it with light having a wavelength of 150 to 300 nm; and developing and removing the unexposed areas of the composition layer.

12. A film obtained by curing the photocurable composition according to claim 1 or 2.

13. A solid-state imaging device comprising the film according to claim 12.

14. An image display device comprising the film according to claim 12.

15. A photopolymerization initiator comprising a compound A in which a group represented by formula (1) is fused to a ring A of a ring-containing group containing at least one ring A selected from an aromatic ring and a heterocyclic ring; In formula (1), *1 represents the position of the fused ring with the ring A, １ represents an alkyl group, an alkenyl group, an aryl group, a heteroaryloxy group, an alkoxy group, an aryloxy group, or a heteroaryloxy group; L １ represents a single bond or an alkylene group; Y １ is -CR Ｙ１ R Ｙ２ -, -O-, -S-, or -NR Ｙ３ represents -, R Ｙ１ ~R Ｙ３ each independently represents a hydrogen atom, an alkyl group, or an aryl group; R ２ represents a hydrogen atom, an alkyl group, an alkenyl group, an aryl group, or a group represented by formula (Z-1); Z １ represents a group represented by formula (Z-1); In formula (Z-1), * represents a bond; Ｚ１ represents a single bond or an alkylene group; Ｚ２ ~L Ｚ４ are each independently -CR Ｌ１ R Ｌ２ -, -O-, -S- or -NR Ｌ３ represents -, and R Ｌ１ ~R Ｌ３ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ each independently represents a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group; R Ｚ１ and R Ｚ２ may be bonded via a single bond or a linking group to form a ring; Ｚ２ ~L Ｚ４ At least two of them are -CR Ｌ１ R Ｌ２ - is.

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