Optical structure and electronic device

Abstract

An optical structure (100) and an electronic device, which belong to the field of electronic devices. The optical structure (100) comprises: a substrate (20), and first anti-reflection film layers (10) arranged on one side of the substrate (20), wherein each first anti-reflection film layer (10) comprises a first film sub-layer (11) and a second film sub-layer (12), which are alternately arranged, the refractive index of the first film sub-layer (11) is greater than the refractive index of the second film sub-layer (12), and the second film sub-layer (12) is in contact with the substrate (20); and the first film sub-layer (11) contains Si3N4, and the second film sub-layer (12) contains SiOxNy, where 0<x<4, and 0<y<2.

Description

Optical structures and electronic equipment

[0001] CROSS-REFERENCE TO RELATED APPLICATIONS

[0002] This application claims priority to the Chinese patent application filed with the China Patent Office on February 7, 2024, with application number 202410175032.9 and entitled “Optical Structure and Electronic Device,” the entire contents of which are incorporated by reference into this application. Technical Field

[0003] The present application belongs to the field of electronic equipment, and specifically relates to an optical structure and electronic equipment. Background Art

[0004] With the development of science and technology, electronic devices have become indispensable items in daily life. Through electronic devices, we can shoot images, watch videos, communicate remotely, etc. Usually, electronic devices are provided with a display screen and a camera module. The display screen and the camera module are both provided with an optical structure, wherein the optical structure can be a protective glass of the camera module, and the optical structure can also be the glass in the display screen. For example, the optical structure is provided on the camera module, and after the light passes through the optical structure, the photosensitive chip in the camera module can convert the light into an image. However, in the related art, in order to ensure the hardness of the optical structure, its refractive index presentation effect is poor, which affects the performance of the electronic device.

[0005] Application Contents

[0006] The purpose of the embodiments of the present application is to provide an optical structure, a camera module, a display screen and an electronic device, which at least solve the problem that the hardness and refractive index of the optical structure are poor, affecting the performance of the electronic device.

[0007] In a first aspect, an embodiment of the present application provides an optical structure, comprising: a substrate and a first anti-reflection film layer provided on one side of the substrate;

[0008] The first anti-reflection film layer includes a first sub-film layer and a second sub-film layer that are alternately arranged, the refractive index of the first sub-film layer is greater than the refractive index of the second sub-film layer, and the second sub-film layer is in contact with the substrate;

[0009] The first sub-film layer includes Si3N4, and the second sub-film layer includes SiO x N y , where 0<x<4, 0<y<2.

[0010] In a second aspect, an embodiment of the present application provides an electronic device, which includes the optical structure described in the first aspect.

[0011] In the embodiment of the present application, since the refractive index of the first sub-film layer is greater than that of the second sub-film layer, multiple first sub-film layers and multiple second sub-film layers are stacked and alternately distributed, and the second sub-film layer contacts one side of the substrate. Therefore, it is equivalent to stacking the first sub-film layer and the second sub-film layer on the substrate, so that when light is irradiated to the substrate, the light will pass through the first sub-film layer and the second sub-film layer in sequence. Since the refractive index of the first film layer and the second film layer is different, the light is less reflected when passing through the first sub-film layer and the second sub-film layer, so that more light passes through the first anti-reflection film layer, and then the light passes through the substrate. The first sub-film layer includes Si3N4, and the second sub-film layer includes SiO x N y The combination of Si3N4 and SiOxNy makes the hardness of the first anti-reflection film layer greater. That is, in the embodiment of the present application, by alternately stacking the first sub-film layer and the second sub-film layer on the substrate, the refractive indexes of the first sub-film layer and the second sub-film layer are different, so that when the light passes through the first sub-film layer and the second sub-film layer, the light can be less reflected and more refracted, so that more light passes through the first sub-film layer and the second sub-film layer, that is, more light passes through the first anti-reflection film layer, that is, the refractive index of the optical structure is improved, so that the refractive index of the optical structure is better. In addition, the first sub-film layer includes Si3N4, and the second sub-film layer includes SiO x N y , Si3N4 and SiO x N y The hardness of the first sub-film layer and the second sub-film layer is relatively large, so the hardness of the optical structure can be improved.

[0012] Additional aspects and advantages of the present application will become apparent in the following description or may be learned through practice of the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] The above and / or additional aspects and advantages of the present application will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:

[0014] FIG1 is a schematic diagram of an optical structure provided in an embodiment of the present application;

[0015] FIG2 is a spectrum diagram showing the transmittance of an optical structure provided in an embodiment of the present application;

[0016] FIG3 is a schematic diagram showing the reflectivity of the first anti-reflection film layer when light is irradiated onto the first anti-reflection film layer at different angles according to an embodiment of the present application;

[0017] FIG4 is a schematic diagram showing the reflectivity of the second anti-reflection film layer when light is irradiated onto the second anti-reflection film layer at different angles according to an embodiment of the present application;

[0018] FIG5 is a schematic diagram showing the transmittance of an optical structure when light is irradiated onto the first anti-reflection film layer at different angles according to an embodiment of the present application;

[0019] FIG6 is a schematic diagram of an electronic device provided in an embodiment of the present application.

[0020] Reference numerals: 100: optical structure; 10: first anti-reflection film layer; 11: first sub-film layer; 12: second sub-film layer; 20: substrate; 201: front surface; 202: back surface; 30: second anti-reflection film layer; 31: third sub-film layer; 32: fourth sub-film layer; 33: fifth sub-film layer. Specific embodiments

[0021] The terms "first" and "second" in the specification and claims of this application may explicitly or implicitly refer to one or more of the features. Throughout the description of this application, unless otherwise specified, "plurality" means two or more. Furthermore, "and / or" in the specification and claims refers to at least one of the connected entities, and the character " / " generally indicates an "or" relationship between the connected entities.

[0022] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present application.

[0023] In the description of this application, it should be noted that, unless otherwise expressly specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; mechanical connections or electrical connections; direct connections or indirect connections through an intermediate medium; and internal connections between two components. Those skilled in the art will understand the specific meanings of the above terms in this application based on the specific circumstances.

[0024] As shown in FIG. 1 to FIG. 5 , the optical structure includes: a substrate 20 and a first anti-reflection film layer 10 disposed on one side of the substrate 20 .

[0025] The first anti-reflection film layer 10 includes a first sub-film layer 11 and a second sub-film layer 12 that are alternately arranged. The refractive index of the first sub-film layer 11 is greater than the refractive index of the second sub-film layer 12, and the second sub-film layer 12 is in contact with the substrate 20. The first sub-film layer 11 includes Si3N4, and the second sub-film layer 12 includes SiO x N y , where 0<x<4, 0<y<2.

[0026] In the embodiment of the present application, since the refractive index of the first sub-film layer 11 is greater than the refractive index of the second sub-film layer 12, the first sub-film layer 11 and the second sub-film layer 12 are alternately arranged, and the second sub-film layer 12 is in contact with the substrate 20. Therefore, it is equivalent to stacking the first sub-film layer 11 and the second sub-film layer 12 on the front surface 201 of the substrate 20. When light is irradiated onto the front surface 201 of the substrate 20, the light will pass through the first sub-film layer 11 and the second sub-film layer 12 in sequence. The refractive index of the first sub-film layer 11 and the second sub-film layer 12 is different, so that when the light passes through the first sub-film layer 11 and the second sub-film layer 12, the light is less reflected, so that the light passes through the first anti-reflection film layer 10 more, and then the light passes through the substrate 20. The first sub-film layer 11 includes Si3N4, and the second sub-film layer 12 includes SiO x N y , Si3N4 and SiO x N y The combination of the first sub-film layer 11 and the second sub-film layer 12 makes the hardness of the first anti-reflection film layer 10 greater. That is, in the embodiment of the present application, by stacking the first sub-film layer 11 and the second sub-film layer 12 on the substrate 20, the refractive index of the first sub-film layer 11 and the second sub-film layer 12 is different, so that when the light passes through the first sub-film layer 11 and the second sub-film layer 12, the light can be less reflected and more refracted, so that more light passes through the first sub-film layer 11 and the second sub-film layer 12, that is, more light passes through the first anti-reflection film layer 10, that is, the refractive index of the optical structure is improved, so that the refractive index of the optical structure is better. In addition, the first sub-film layer 11 includes Si3N4, and the second sub-film layer 12 includes SiO x N y , Si3N4 and SiO x N y The hardness of the first sub-film layer 11 and the second sub-film layer 12 is relatively large, so the hardness of the optical structure can be improved.

[0027] In addition, in an embodiment of the present application, the substrate 20 is formed of a light-transmitting material, that is, the substrate 20 is light-transmitting. Specifically, the substrate 20 may include any one of glass and sapphire. Among them, the substrate 20 may be formed only of glass, and the substrate 20 may also be formed only of sapphire. When the optical structure 100 is applied to the camera module, at this time, the optical structure 100 is equivalent to a protective member for protecting the lens on the camera module. When the user touches the camera module, the user will first touch the optical structure 100, and the optical structure 100 has a good hardness, so that the lens in the camera module can be better protected, and the optical structure 100 has a good refractive index, so that when shooting through the camera module, more light can pass through the optical structure 100, avoiding more reflection of the optical structure 100, thereby improving the shooting effect of the camera module. When the optical structure 100 is applied to a display screen, the optical structure 100 is equivalent to the outermost layer of glass of the display screen. When a user touches the display screen, the user will first touch the optical structure 100. The optical structure 100 has good hardness, thereby providing better protection for the display module in the display screen.

[0028] In addition, in the embodiment of the present application, the refractive index of the first sub-film layer 11 is in the range of 1.95 to 2.05, and the refractive index of the second sub-film layer 12 is in the range of 1.53 to 1.70.

[0029] Through such an arrangement, light can be better interfered when passing through the first sub-film layer 11 and the second sub-film layer 12 , so that more light can pass through the first anti-reflection film layer 10 .

[0030] It should be noted that the refractive index of the first sub-film layer 11 can be any value between 1.95 and 2.05. For example, the refractive index of the first sub-film layer 11 is 1.95. For another example, the refractive index of the first sub-film layer 11 is 1.97. For another example, the refractive index of the first sub-film layer 11 is 1.99. For another example, the refractive index of the first sub-film layer 11 is 2.01. The specific value of the refractive index of the first sub-film layer 11 is not limited in this embodiment of the present application. In addition, the refractive index of the second sub-film layer 12 can be any value between 1.53 and 1.70. For example, the refractive index of the second sub-film layer 12 is 1.53. For another example, the refractive index of the second sub-film layer 12 is 1.58. For another example, the refractive index of the second sub-film layer 12 is 1.63. For another example, the refractive index of the second sub-film layer 12 is 1.68. For another example, the refractive index of the second sub-film layer 12 is 1.70. The specific value of the refractive index of the second sub-film layer 12 is not limited in this embodiment of the present application.

[0031] In addition, in an embodiment of the present application, the thickness of the first sub-membrane layer 11 is not equal to the thickness of the second sub-membrane layer 12, and the number of first sub-membrane layers 11 is multiple, and the thicknesses of at least two first sub-membrane layers 11 are not equal, and the number of second sub-membrane layers 12 is multiple, and the thicknesses of at least two second sub-membrane layers 12 are not equal to each other.

[0032] Through such a setting, when light passes through the first sub-film layer 11 and the second sub-film layer 12 in sequence, the light can be better interfered. Among them, when the light passes through the first sub-film layer 11, the light is refracted in the first sub-film layer 11, and then the light passes through the second sub-film layer 12, and the light is refracted in the second sub-film layer 12. The refractive index of the first sub-film layer 11 is different from the refractive index of the second sub-film layer 12, and the thickness is different. Therefore, when the light passes through the first sub-film layer 11 and the second sub-film layer 12, the light is refracted by materials with different refractive indices, and the length of the path taken by the light in each film layer is different, so that the light is better interfered, so that more light passes through the first sub-film layer 11 and the second sub-film layer 12, that is, more light passes through the first anti-reflection film layer 10, and less reflection on the first anti-reflection film layer 10. That is, through such a setting, when the light passes through the first anti-reflection film layer 10, the light is less reflected, so that more light passes through the first anti-reflection film layer 10.

[0033] For example, as shown in Table 1, in Table 1, layer represents the film layer, Material represents the material, n represents the refractive index, K represents the extinction coefficient, and Thickness represents the thickness. Layers 1 to 23 are all the first anti-reflection film layer 10, Si3N4 represents the first sub-film layer 11, and SiO x N y Represents the second sub-film layer 12. As can be seen from Table 1, the thicknesses of the first sub-film layers 11 are different from each other, the thicknesses of the second sub-film layers 12 are different from each other, and the thickness of the first sub-film layer 11 is different from the thickness of the second sub-film layer 12.

[0034] Table 1

[0035] In addition, in the embodiment of the present application, the thicknesses of at least two first sub-film layers 11 are unequal, wherein only two first sub-film layers 11 may have unequal thicknesses, while the thicknesses of the remaining first sub-film layers 11 are equal. Of course, the thicknesses of more than two first sub-film layers 11 may be unequal, or the thicknesses of all first sub-film layers 11 may be unequal. This embodiment of the present application does not limit this. In addition, the thicknesses of at least two second sub-film layers 12 are unequal, wherein only two second sub-film layers 12 may have unequal thicknesses, while the thicknesses of the remaining second sub-film layers 12 are equal. Of course, the thicknesses of more than two second sub-film layers 12 may be unequal, or the thicknesses of all second sub-film layers 12 may be unequal. This embodiment of the present application does not limit this.

[0036] In addition, in the embodiment of the present application, the thickness of the first anti-reflection film layer 10 is 1150 nm. This configuration reduces the thickness of the first anti-reflection film layer 10, thereby reducing the cost of forming the first anti-reflection film layer 10 and the cost of the optical structure 100.

[0037] In addition, in the embodiment of the present application, when forming the first anti-reflection film layer 10, it can be formed on the substrate 20 by ionization. The specific process parameters can be shown in Table 2:

[0038] Table 2

[0039] In addition, in the embodiment of the present application, the hardness of the first anti-reflection film layer 10 is 15.535 GPa. This configuration makes the hardness of the first anti-reflection film layer 10 relatively high, thereby better protecting the substrate 20 and making the optical structure 100 relatively hard.

[0040] In addition, in some embodiments, the optical structure 100 may further include a second anti-reflection film layer 30 arranged on a side of the substrate 20 away from the first anti-reflection film layer 10; the second anti-reflection film layer 30 includes a third sub-film layer 31 and a fourth sub-film layer 32 alternately arranged, the refractive index of the third sub-film layer 31 is greater than the refractive index of the fourth sub-film layer 32, and the fourth sub-film layer 32 is in contact with the back side 202 of the substrate 20; the third sub-film layer 31 includes any one of Ta2O5 and Ti3O5, and the fourth sub-film layer 32 includes any one of SiO2 and Al2O3.

[0041] With this arrangement, after light passes through the first anti-reflection film layer 10 and the substrate 20, it passes through the second anti-reflection film layer 30. In the second anti-reflection film layer 30, multiple third sub-film layers 31 and multiple fourth sub-film layers 32 are stacked, and the third sub-film layers 31 and the fourth sub-film layers 32 are alternately distributed. The fourth sub-film layer 32 contacts the back surface 202 of the substrate 20. This can further reduce the reflection of light, allowing more light to pass through the second anti-reflection film layer 30. In addition, by providing the second anti-reflection film layer 30, the hardness of the optical structure 100 can be further improved.

[0042] It should be noted that, in the embodiment of the present application, according to the formula of the anti-reflection film, β represents the low reflectivity bandwidth, λ max Indicates the maximum wavelength in the low reflection area, λ min Indicates the minimum wavelength in the low reflection area. In addition, according to the formula, Where L is the refractive index of the outermost film; D = n H -n L , D can be defined as: the difference in high refractive index except the outermost layer, n represents the refractive index; T is the total optical thickness of the film system, expressed as a multiple of the average wavelength. According to this formula, in order to obtain a lower average reflectivity, it is necessary to satisfy D is larger, L is as small as possible, and T is as large as possible. Therefore, in the embodiment of the present application, the refractive index of the third sub-film layer 31 can be set to 2.41, and the refractive index of the fourth sub-film layer 32 can be set to 1.46.

[0043] In addition, in the embodiment of the present application, the fourth sub-film layer 32 may include only SiO2 or only Al2O3. The third sub-film layer 31 may include only Ta2O5 or only Ti3O5.

[0044] In addition, in the embodiment of the present application, among the multiple first sub-film layers 11 and the multiple second sub-film layers 12 stacked, the film layer with the greatest distance from the front surface 201 of the substrate 20 is the second sub-film layer 12. With this arrangement, when light is irradiated onto the first anti-reflection film layer 10, the light is first irradiated onto the second sub-film layer 12. The refractive index of the second sub-film layer 12 is lower than that of the first sub-film layer 11, thereby causing less light to be reflected and allowing more light to pass through the first anti-reflection film layer 10.

[0045] In addition, in some embodiments, the second anti-reflection film layer 30 may further include a fifth sub-film layer 33; the refractive index of the fifth sub-film layer 33 is less than the refractive index of the fourth sub-film layer 32, and among the multiple third sub-film layers 31 and the multiple fourth sub-film layers 32 stacked, the film layer with the largest distance from the back side 202 of the substrate 20 is the third sub-film layer 31, and the fifth sub-film layer 33 is arranged on the surface of the third sub-film layer 31 away from the substrate 20; the fifth sub-film layer 33 includes MgF2.

[0046] Through such a setting, the fifth sub-film layer 33 can ensure the stability of the third sub-film layer 31 and the fourth sub-film layer 32. Moreover, by setting the fifth sub-film layer 33, after the light passes through the third sub-film layer 31 and the fourth sub-film layer 32, the light will pass through the fifth sub-film layer 33. Therefore, the existence of the fifth sub-film layer 33 makes the reflectivity of the optical structure 100 meet the requirements, and thus more light passes through the optical structure 100 and less light is reflected.

[0047] In addition, in the embodiment of the present application, the refractive index of the fifth sub-layer 33 may be 1.38.

[0048] In addition, in some embodiments, the thickness of the third sub-membrane layer 31, the thickness of the fourth sub-membrane layer 32, and the thickness of the fifth sub-membrane layer 33 are not equal to each other, and there are multiple third sub-membrane layers 31 and fourth sub-membrane layers 32. The thicknesses of at least two third sub-membrane layers 31 are not equal, and the thicknesses of at least two fourth sub-membrane layers 32 are not equal.

[0049] Through such a configuration, when light sequentially passes through the third sub-film layer 31 and the fourth sub-film layer 32, the light can be better interfered. Specifically, when the light passes through the third sub-film layer 31, the light is refracted in the third sub-film layer 31, and then the light passes through the fourth sub-film layer 32, the light is refracted in the fourth sub-film layer 32. The refractive index of the third sub-film layer 31 is different from the refractive index of the fourth sub-film layer 32, and the thickness is different. Therefore, when the light passes through the third sub-film layer 31 and the fourth sub-film layer 32, the light is refracted by materials with different refractive indices, and the length of the path taken by the light in each film layer is different, so that the light is better interfered, so that more light passes through the third sub-film layer 31 and the fourth sub-film layer 32, that is, more light passes through the second anti-reflection film layer 30, and less light is reflected on the second anti-reflection film layer 30.

[0050] For example, as shown in Table 1, in Table 1, SiO 2 represents the fourth sub-film layer 32 , and Ti 3 O 5 represents the third sub-film layer 31 .

[0051] For another example, as shown in Table 3, in Table 3, SiO 2 represents the fourth sub-film layer 32 , Ti 3 O 5 represents the third sub-film layer 31 , and MgF 2 represents the fifth sub-film layer 33 .

[0052] Table 3

[0053] In addition, in the embodiment of the present application, the thicknesses of at least two third sub-film layers 31 are unequal, wherein only two third sub-film layers 31 may have unequal thicknesses, while the thicknesses of the remaining third sub-film layers 31 are equal. Of course, the thicknesses of more than two third sub-film layers 31 may be unequal, or the thicknesses of all third sub-film layers 31 may be unequal. This embodiment of the present application does not limit this. In addition, the thicknesses of at least two fourth sub-film layers 32 are unequal, wherein only two fourth sub-film layers 32 may have unequal thicknesses, while the thicknesses of the remaining fourth sub-film layers 32 are equal. Of course, the thicknesses of more than two fourth sub-film layers 32 may be unequal, or the thicknesses of all fourth sub-film layers 32 may be unequal. This embodiment of the present application does not limit this.

[0054] In addition, in some embodiments, the thickness of the second anti-reflection film layer 30 is in the range of 450 nm to 600 nm. This configuration can reduce the thickness of the second anti-reflection film layer 30 and reduce the cost of the optical structure 100.

[0055] It should be noted that the thickness of the second anti-reflection film layer 30 can be any value between 450 nm and 600 nm. For example, the thickness of the second anti-reflection film layer 30 is 450 nm. Another example is that the thickness of the second anti-reflection film layer 30 is 480 nm. Another example is that the thickness of the second anti-reflection film layer 30 is 510 nm. Another example is that the thickness of the second anti-reflection film layer 30 is 550 nm. Another example is that the thickness of the second anti-reflection film layer 30 is 600 nm. This embodiment of the present application is not limited to this.

[0056] In addition, in the embodiment of the present application, when forming the second anti-reflection film layer 30, it can be formed on the substrate 20 by ionization. The specific process parameters can be shown in Table 4:

[0057] Table 4

[0058] In addition, in the embodiment of the present application, the average reflectivity of the optical structure 100 is less than 1.5%, and the transmittance of the optical structure 100 is greater than 96.5%.

[0059] When light is irradiated at 0° on the optical structure 100, which is equivalent to the light being perpendicular to the first anti-reflection film 10 and irradiating the first anti-reflection film 10, the average reflectivity of the optical structure 100 is less than 1.5%. When light is irradiated at 30° on the optical structure 100, which is equivalent to the angle between the light and the first anti-reflection film 10 is 60°, the average reflectivity of the optical structure 100 is less than 1.5%. The light refers to visible light, and the wavelength of visible light is between 420nm and 680nm.

[0060] In addition, when light is irradiated onto the optical structure 100 at an angle of 0°, which is equivalent to the light being perpendicular to the first anti-reflection film layer 10 and irradiating the first anti-reflection film layer 10, the transmittance of the optical structure 100 can be greater than 97.5%. When light is irradiated onto the optical structure 100 at an angle of 30°, which is equivalent to the angle between the light and the first anti-reflection film layer 10 being 60°, the transmittance of the optical structure 100 can be greater than 96.5%.

[0061] In addition, in the embodiment of the present application, optical ring measurement is performed on the optical structure 100 provided in the embodiment of the present application. After the optical ring measurement, the spectral shift is less than 10 nm, which can meet actual needs.

[0062] In the embodiment of the present application, since the refractive index of the first sub-film layer 11 is greater than the refractive index of the second sub-film layer 12, multiple first sub-film layers 11 and multiple second sub-film layers 12 are stacked, and the first sub-film layers 11 and the second sub-film layers 12 are alternately distributed, and the second sub-film layer 12 is in contact with the front surface 201 of the substrate 20. Therefore, it is equivalent to stacking the first sub-film layer 11 and the second sub-film layer 12 on the front surface 201 of the substrate 20, so that when light is irradiated on the front surface 201 of the substrate 20, the light will pass through the first sub-film layer 11 and the second sub-film layer 12 in sequence, so that the refractive index of the first sub-film layer 11 and the second sub-film layer 12 is different, so that when the light passes through the first sub-film layer 11 and the second sub-film layer 12, the light is less reflected, so that more light passes through the first anti-reflection film layer 10, and then the light passes through the substrate 20. The first sub-film layer 11 includes Si3N4, and the second sub-film layer 12 includes SiO x N y , Si3N4 and SiO x N yThe combination of the first anti-reflection film layer 10 and the second sub-film layer 12 makes the hardness of the first anti-reflection film layer 10 greater. That is, in the embodiment of the present application, by stacking the first sub-film layer 11 and the second sub-film layer 12 on the front surface 201 of the substrate 20, the refractive index of the first sub-film layer 11 and the second sub-film layer 12 is different, so that when the light passes through the first sub-film layer 11 and the second sub-film layer 12, the light can be less reflected and more refracted, so that more light passes through the first sub-film layer 11 and the second sub-film layer 12, that is, more light passes through the first anti-reflection film layer 10, that is, the refractive index of the optical structure is improved, so that the refractive index of the optical structure is better. In addition, the first sub-film layer 11 includes Si3N4, and the second sub-film layer 12 includes SiO x N y , Si3N4 and SiO x N y The hardness of the first sub-film layer 11 and the second sub-film layer 12 is relatively large, so the hardness of the optical structure can be improved.

[0063] An embodiment of the present application provides a camera module, which includes the optical structure 100 in any of the above embodiments.

[0064] An embodiment of the present application provides a display screen, which includes the optical structure 100 in any of the above embodiments.

[0065] An embodiment of the present application provides an electronic device, as shown in FIG6 , which includes the camera module in the above embodiment and / or the display screen in the above embodiment.

[0066] It should be noted that in the embodiments of the present application, electronic devices include but are not limited to controllers, smart devices, terminal products and other devices, among which smart devices are, for example, smart phones, smart TVs, smart speakers, smart robots, VR devices, AR devices, XR devices and other devices, and terminal products include personal computers, tablets and other products.

[0067] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present application. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0068] Although the embodiments of the present application have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions, and variations may be made to the embodiments without departing from the principles and purpose of the present application, and that the scope of the present application is defined by the claims and their equivalents.

Claims

1. An optical structure, comprising: A substrate and a first anti-reflection film layer disposed on one side of the substrate; The first anti-reflection film layer includes a first sub-film layer and a second sub-film layer that are alternately arranged, the refractive index of the first sub-film layer is greater than the refractive index of the second sub-film layer, and the second sub-film layer is in contact with the substrate; The first sub-film layer includes Si3N4, and the second sub-film layer includes SiO x N y , where 0<x<4, 0<y<2.

2. The optical structure according to claim 1, wherein The optical structure further includes a second anti-reflection film layer disposed on a side of the substrate away from the first anti-reflection film layer; The second anti-reflection film layer includes a third sub-film layer and a fourth sub-film layer that are alternately arranged, the refractive index of the third sub-film layer is greater than the refractive index of the fourth sub-film layer, and the fourth sub-film layer is in contact with the substrate; The third sub-film layer includes any one of Ta2O5 and Ti3O5, and the fourth sub-film layer includes any one of SiO2 and Al2O3.

3. The optical structure according to claim 2, wherein: The second anti-reflection film layer further includes a fifth sub-film layer; The refractive index of the fifth sub-film layer is smaller than the refractive index of the fourth sub-film layer. Among the plurality of the third sub-film layers and the plurality of the fourth sub-film layers stacked, the film layer with the greatest distance from the substrate is the third sub-film layer. The fifth sub-film layer is arranged on a surface of the third sub-film layer facing away from the substrate. The fifth sub-layer includes MgF2.

4. The optical structure according to claim 1, wherein: Among the plurality of first sub-film layers and the plurality of second sub-film layers stacked, the film layer with the largest distance from the substrate is the second sub-film layer.

5. The optical structure according to claim 1, wherein The thickness of the first sub-film layer is not equal to the thickness of the second sub-film layer. There are multiple first sub-film layers and second sub-film layers, and the thicknesses of at least two of the first sub-film layers are not equal, and the thicknesses of at least two of the second sub-film layers are not equal to each other.

6. The optical structure according to claim 1, wherein: The refractive index of the first sub-film layer ranges from 1.95 to 2.05, and the refractive index of the second sub-film layer ranges from 1.53 to 1.

70.

7. The optical structure according to claim 3, wherein: The thickness of the third sub-membrane layer, the thickness of the fourth sub-membrane layer and the thickness of the fifth sub-membrane layer are not equal to each other. There are multiple third sub-membrane layers and multiple fourth sub-membrane layers, and the thicknesses of at least two of the third sub-membrane layers are not equal, and the thicknesses of at least two of the fourth sub-membrane layers are not equal.

8. The optical structure according to claim 3, wherein: The average reflectivity of the optical structure is less than 1.5%.

9. The optical structure according to any one of claims 1 to 8, wherein: The substrate includes any one of glass and sapphire.

10. An electronic device, wherein: The electronic device comprises the optical structure according to any one of claims 1-9.

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