Laminate and display device

Abstract

The purpose of the present invention is to provide a display device using a quantum dot organic EL panel, wherein is provided a laminate capable of achieving both suppression of reflective appearance caused by light reflection inside and outside the panel during black display and improvement of luminance during white display. Provided is a laminate including a low-reflection film and a functional layer, wherein the low reflection film has an average luminous reflectance of 0.05-5% and a total light transmittance of 93% or more, and the functional layer includes at least one type of dye and satisfies expression (I): (Tt50° / Tt0°) × 100 ≥ 60 (In the formula, Tt50° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 0°.).

Description

Laminate and display device

[0001] The present invention relates to a laminate and a display device including the laminate.

[0002] Organic EL display devices using organic electroluminescence (organic EL or OLED) elements can be made lighter and thinner than liquid crystal display devices and the like, and can also achieve high image quality such as a wide viewing angle, fast response speed, and high contrast, and are therefore used in a variety of fields such as smartphones, televisions, digital cameras, etc. In organic EL display devices, in order to suppress deterioration of visibility due to light reflection at electrodes constituting the device or reflection of external light, a circular polarizing plate, which is an optical member formed by laminating a polarizing film and a retardation film, as disclosed in Patent Document 1, for example, is used.

[0003] Japanese Patent Application Laid-Open No. 2020-095255

[0004] In recent years, development of quantum dot organic EL panels using quantum dots (QDs) as a material for the light-emitting layer of organic EL elements has progressed. Compared to conventional organic EL panels, quantum dot organic EL panels have a sharper emission spectrum, which allows for excellent color reproducibility and a wider color gamut, drawing attention. As with conventional organic EL displays, display devices using such quantum dot organic EL panels must suppress external light reflection during black display and light reflection at the electrodes to ensure high visibility. Conventional organic EL display panels solve the problem of light reflection by using a circular polarizer. However, quantum dot organic EL panels have lower emission intensity than conventional organic EL panels, making it difficult to ensure sufficient brightness using a circular polarizer that, in principle, absorbs light. For this reason, it is difficult to ensure anti-reflection function using a circular polarizer in quantum dot organic EL panels, and generally, an anti-reflection film (AR (Anti-Reflection) film or LR (Low-Reflection) film) that reduces reflected light by utilizing the interference effect of light is laminated on the viewing side of the light-emitting layer to suppress external light reflection on the display screen and improve visibility.

[0005] However, this phenomenon, which occurs specifically when using quantum dot organic EL panels, is that external light taken into the display device is reflected by the electrodes during black display, and the reflected light is scattered by the light diffusing agent contained in the QD filter, causing the reflected light to appear whitish on the panel. This phenomenon cannot be resolved by anti-reflection films that aim to prevent light reflection from outside the screen. For this reason, display devices using quantum dot organic EL panels require technology to suppress the decrease in visibility caused by light reflection inside and outside the panel during black display, without using circular polarizers, which, due to their structure, lead to a decrease in brightness during white display.

[0006] The present invention aims to provide a laminate that can suppress the reflective appearance caused by light reflection inside and outside the panel during black display and improve the luminance during white display in a display device using a quantum dot organic EL panel. Hereinafter, in this specification, the term "reflective appearance" will be used to refer to both external light reflection, such as glare on the display screen, and the phenomenon in which reflected light appears whitish on the panel due to light reflection at the electrodes. Expressions such as "suppressing the reflective appearance," "improving the reflective appearance," and "having a (high or excellent) reflective appearance effect" refer to the effect of suppressing or preventing the reflective appearance phenomenon.

[0007] The present inventors conducted extensive research to solve the above-mentioned problems, and as a result, they have completed the present invention. That is, the present invention includes the following preferred embodiments. [1] A laminate including a low-reflection film and a functional layer, wherein the low-reflection film has an average luminous reflectance of 0.05% to 5% and a total light transmittance of 93% or more, and the functional layer includes at least one dye, and satisfies the following formula (I): (Tt50° / Tt0°)×100≧60 Formula (I) [wherein Tt50° is the transmittance of light with a wavelength of 550 nm incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light with a wavelength of 550 nm incident on the functional layer at an incident angle of 0°]. [2] The laminate according to the above item [1], wherein the low-reflection film includes a low-reflection layer and a substrate. [3] The laminate according to the above item [2], wherein the low-reflection film includes a low-reflection layer and a substrate. [4] The laminate according to [1] above, wherein the low-reflection film includes a low-reflection layer, and no substrate is laminated between the low-reflection layer and the functional layer. [5] The laminate according to any one of [1] to [4] above, wherein the dye is one or more selected from the group consisting of black dyes and dichroic dyes. [6] The laminate according to any one of [1] to [5] above, wherein the functional layer satisfies the following formula (II): (Tt50° / Tt0°)×100≧80 Formula (II). [7] The laminate according to any one of [1] to [6] above, wherein the laminate from the low-reflection film to the functional layer has an average luminous reflectance of 0.01% or more and 1% or less, and a total light transmittance of 75% or more. [8] The laminate according to any one of [1] to [7] above, which is used in a quantum dot organic EL display device. [9] A display device comprising the laminate according to any one of [1] to [8] above and a quantum dot organic EL light-emitting panel.

[10] The display device according to [9], wherein the low-reflection film is located on the viewing side of the functional layer.

[0008] According to the present invention, a laminate can be provided that can suppress the reflective appearance caused by light reflection inside and outside the panel when displaying black, and can also improve the brightness when displaying white, in a display device using a quantum dot organic EL panel.

[0009] Hereinafter, embodiments of the present invention will be described in detail. Note that the scope of the present invention is not limited to the embodiments described here, and various modifications can be made without departing from the spirit of the present invention.

[0010] [Laminate] The laminate of the present invention includes a low-reflection film and a functional layer. The low-reflection film has an average luminous reflectance of 0.05% or more and 5% or less and a total light transmittance of 93% or more, the functional layer includes at least one dye, and satisfies the following formula (I): (Tt50° / Tt0°)×100≧60 formula (I), where Tt50° is the transmittance of light with a wavelength of 550 nm that is incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light with a wavelength of 550 nm that is incident on the functional layer at an incident angle of 0°.

[0011] By using the laminate in a quantum dot organic EL display device (QD-OLED) having the above-described configuration, it is possible to reduce the reflection of external light, as well as the reflected light caused by the reflection of external light from the OLED electrode and the scattered light caused by the scattering of the reflected light, without reducing the luminance (or luminance) during white display. As a result, it is possible to reduce the whitish blur seen in conventional QD-OLEDs while maintaining a sufficient luminance level equivalent to or higher than that of conventional organic EL display devices.

[0012] <Low-Reflection Film> A low-reflection film, commonly referred to as an AR film or LR film, is a film that has the function of preventing or reducing reflection through the light interference effect. When the laminate contains a low-reflection film and the laminate is used in a display device in combination with a QD-OLED panel, the decrease in visibility due to external light being reflected and reflected on the display screen during black display can be suppressed, and the reflective appearance can be improved. The low-reflection film may have a single-layer structure or a multi-layer structure, but the low-reflection film contains at least one low-reflection layer. That is, when the low-reflection film has a single-layer structure, the layer is a low-reflection layer. When the low-reflection film has a multi-layer structure, the multi-layer structure contains at least one low-reflection layer at any position, and when it contains multiple low-reflection layers, the low-reflection layers may be the same or different from each other. The low-reflection film or the layers that constitute the low-reflection film do not contain dyes.

[0013] The average luminous reflectance of the low-reflection film is 0.05 to 5%. If the average luminous reflectance is less than 0.05%, an additional high-reflection layer and / or low-reflection layer must be layered to achieve high anti-reflection performance, resulting in poor cost and thinness. If the average luminous reflectance is greater than 5%, anti-reflection performance may be reduced, resulting in the occurrence of glare from external light. The average luminous reflectance is preferably 0.05 to 2%, more preferably 0.05 to 1%, and particularly preferably 0.05 to 0.5%. When the average luminous reflectance is within the above range, desired or higher anti-reflection performance can be achieved while ensuring acceptable cost and good thinness. The average luminous reflectance can be adjusted within the above range by adjusting the composition of the layers or materials constituting the low-reflection film and / or the thickness and / or layer structure of the low-reflection film. The average luminous reflectance of the low-reflection film and the laminate described below can be calculated according to the method described in JIS Z 8722. In detail, it can be measured by the method described in the Examples described below.

[0014] The low-reflection film has a total light transmittance of 93% or more. If the total light transmittance is less than 93%, the film is not suitable for application to the surface of a display device. The total light transmittance of the low-reflection film is preferably 94% or more, more preferably 95% or more, and particularly preferably 96% or more, but 100% or less. If the total light transmittance is equal to or greater than the lower limit, a laminate having high transparency and excellent optical properties can be constructed, and when incorporated into a display device, a sufficient amount of light can be introduced into the display device. The total light transmittance can be adjusted to equal to or greater than the lower limit by adjusting the composition of the materials constituting the layers or films contained in the low-reflection film and / or the thickness and / or layer structure of the low-reflection film. The total light transmittance of the low-reflection film and the laminate described below can be measured, for example, according to the method described in JIS K 7361. Specifically, it can be measured by the method described in the Examples described below.

[0015] (Low-reflection layer) The low-reflection layer is a layer having a function of reducing or preventing light reflection by the light interference effect. Examples of the low-reflection layer include a cured layer of a curable composition containing low-refractive index particles having a low-reflection function and a curable material, an inorganic layer having a low-reflection function, and an organic low-reflection layer such as a fluorine-based or silicone-based organic compound, a thermoplastic resin, a thermosetting resin, or an ultraviolet-curable resin.

[0016] First, the cured layer of the curable composition containing low refractive index particles having low reflection function and a curable material will be described. The cured layer of the curable composition containing low refractive index particles having low reflection function and a curable material can be preferably formed by a method including the steps of applying a composition containing an active energy ray curable material, low refractive index particles, and a solvent (hereinafter also referred to as "low reflection layer forming composition") to an adjacent layer or film (for example, a substrate or a hard coat layer) or a release film in the low reflection film to be produced to form a coating film, a drying step of drying the coating film, and an active energy ray irradiation step of irradiating the coating film with active energy rays.

[0017] As the active energy ray-curable material contained in the composition for forming a low-reflection layer, curable resins, active energy ray-curable compounds, etc. commonly used in the technical field can be used, as long as they can form a low-reflection layer having the desired properties upon curing. Among them, from the viewpoints of transparency, handleability, etc., active energy ray-curable compounds that have the property of being cured by irradiation with active energy rays such as ultraviolet rays, electron beams, visible light, or X-rays are preferred. Examples of active energy ray-curable compounds include cationically polymerizable compounds and radically polymerizable compounds.

[0018] In one embodiment of the present invention, a radically polymerizable compound is preferably used as the active energy ray-curable compound forming the low-reflection layer. The radically polymerizable compound refers to a compound that undergoes a radical polymerization reaction and hardens when irradiated with active energy rays or heated. Specific examples include (meth)acrylic materials, such as polyfunctional (meth)acrylate compounds such as (meth)acrylic acid esters of polyhydric alcohols, and monofunctional or polyfunctional urethane (meth)acrylate compounds synthesized from polyisocyanates, polyhydric alcohols, and hydroxyl group-containing (meth)acrylates (e.g., hydroxy esters of (meth)acrylic acid). In addition to acrylic materials, polyether resins, polyester resins, epoxy resins, alkyd resins, spiroacetal resins, polybutadiene resins, polythiolpolyene resins, and the like, each having an acrylate functional group, can also be used. Among these, (meth)acrylic compounds and compounds having an ethylenically unsaturated bond, such as vinyl compounds such as styrene, styrene sulfonic acid, vinyl acetate, vinyl propionate, and N-vinyl-2-pyrrolidone, are preferred, with (meth)acrylic compounds being more preferred. These materials can be used alone or in combination of two or more. In this specification, (meth)acrylic refers to both acrylic and methacrylic, and (meth)acrylate refers to both acrylate and methacrylate.

[0019] The (meth)acrylic compound is a compound having at least one (meth)acryloyloxy group in the molecule, and may be a monomer, oligomer, or polymer. Examples of the (meth)acrylic compound include (meth)acrylate compounds such as monofunctional (meth)acrylate compounds and polyfunctional (meth)acrylate compounds; urethane (meth)acrylate compounds such as polyfunctional urethane (meth)acrylate compounds; epoxy (meth)acrylate compounds such as polyfunctional epoxy (meth)acrylate compounds; carboxyl group-modified epoxy (meth)acrylate compounds, polyester (meth)acrylate compounds, etc. The (meth)acrylic compound may be used alone or in combination of two or more.

[0020] Examples of the (meth)acrylate compound include a monofunctional (meth)acrylate compound having one (meth)acryloyloxy group in the molecule and a polyfunctional (meth)acrylate compound having two or more (meth)acryloyloxy groups in the molecule. From the viewpoint of increasing the crosslink density of the cured resin layer, the polyfunctional (meth)acrylate compound may be more preferable.

[0021] Examples of monofunctional (meth)acrylate compounds include 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, t-butyl (meth)acrylate, glycidyl (meth)acrylate, acryloylmorpholine, N-vinylpyrrolidone, tetrahydrofurfuryl acrylate, cyclohexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, and isobornyl (meth)acrylate. acrylate, isodecyl (meth)acrylate, lauryl (meth)acrylate, tridecyl (meth)acrylate, cetyl (meth)acrylate, stearyl (meth)acrylate, benzyl (meth)acrylate, 2-ethoxyethyl (meth)acrylate, 3-methoxybutyl (meth)acrylate, ethyl carbitol (meth)acrylate, phosphate (meth)acrylate, ethylene oxide-modified phosphate (meth)acrylate, phenoxy (meth)acrylate, ethylene oxide-modified phenoxy (meth)acrylate, propylene oxide-modified phenoxy (meth)acrylate Phenoxy (meth)acrylate, nonylphenol (meth)acrylate, ethylene oxide modified nonylphenol (meth)acrylate, propylene oxide modified nonylphenol (meth)acrylate, methoxydiethylene glycol (meth)acrylate, methoxypolyethylene glycol (meth)acrylate, methoxypropylene glycol (meth)acrylate, 2-(meth)acryloyloxyethyl-2-hydroxypropyl phthalate, 2-hydroxy-3-phenoxypropyl (meth)acrylate, 2-(meth)acryloyloxyethyl diethyl hydrogen phthalate, 2-(meth)acryloyloxypropyl hydrogen phthalate, 2-(meth)acryloyloxypropyl hexahydrohydrogen phthalate, 2-(meth)acryloyloxypropyl tetrahydrohydrogen phthalate, dimethylaminoethyl (meth)acrylate, trifluoroethyl (meth)acrylate, tetrafluoropropyl (meth)acrylate, hexafluoropropyl (meth)acrylate, octafluoropropyl (meth)acrylate, octafluoropropyl (meth)acrylate,adamantane derivative mono(meth)acrylates such as adamantyl acrylate having a monovalent mono(meth)acrylate derived from 2-adamantane and adamantanediol, etc.

[0022] Examples of the polyfunctional (meth)acrylate compound include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, butanediol di(meth)acrylate, hexanediol di(meth)acrylate, nonanediol di(meth)acrylate, ethoxylated hexanediol di(meth)acrylate, propoxylated hexanediol di(meth)acrylate, diethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, Bifunctional (meth)acrylate compounds such as di(meth)acrylates such as ricol di(meth)acrylate, polypropylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, ethoxylated neopentyl glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, and hydroxypivalic acid neopentyl glycol di(meth)acrylate; and, for example, trimethylolpropane tri(meth)acrylate, ethoxylated trimethylolpropane tri(meth)acrylate, tri(meth)acrylates such as propoxylated trimethylolpropane tri(meth)acrylate, tris-2-hydroxyethyl isocyanurate tri(meth)acrylate, and glycerin tri(meth)acrylate; trifunctional (meth)acrylate compounds such as pentaerythritol tri(meth)acrylate, dipentaerythritol tri(meth)acrylate, and ditrimethylolpropane tri(meth)acrylate; pentaerythritol tetra(meth)acrylate, ditrimethylol Examples of the polyfunctional (meth)acrylate compound include tri- or higher functional polyfunctional (meth)acrylate compounds such as propane tetra(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, ditrimethylolpropane penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, and ditrimethylolpropane hexa(meth)acrylate, as well as polyfunctional (meth)acrylate compounds in which a portion of these (meth)acrylates is substituted with an alkyl group or ε-caprolactone.

[0023] The urethane (meth)acrylate compound generally refers to a reaction product of an isocyanate compound, a polyol compound, and a (meth)acrylate compound, and is preferably a polyfunctional urethane (meth)acrylate compound having two or more (meth)acryloyloxy groups in the molecule. As the polyfunctional urethane (meth)acrylate compound, a polyfunctional urethane acrylate obtained by reacting a polyhydric alcohol, a polyisocyanate, and a hydroxyl group-containing acrylate can be suitably used.

[0024] Commercially available polyfunctional urethane acrylates may also be used. Specific examples of commercially available polyfunctional urethane acrylates include UA-306H, UA-306T, and UA-3061 manufactured by Kyoeisha Chemical Co., Ltd., UV-1700B, UV-6300B, UV-7600B, UV-7605B, UV-7640B, and UV-7650B manufactured by Nippon Synthetic Chemical Industry Co., Ltd., and U-4HA and U-6HA manufactured by Shin-Nakamura Chemical Co., Ltd. , UA-100H, U-6LPA, U-15HA, UA-32P, and U-324A, etc., Ebecryl-1290, Ebecryl-1290K, and Ebecryl-5129, etc., manufactured by Daicel Allnex Co., Ltd., and UN-3220HA, UN-3220HB, UN-3220HC, and UN-3220HS, etc., manufactured by Negami Chemical Industrial Co., Ltd.

[0025] The content of the curable material in the composition for forming a low-reflection layer can be appropriately determined depending on the type and combination of the curable materials used, and is, for example, preferably 10 to 80 mass%, more preferably 20 to 75 mass%, and even more preferably 30 to 70 mass%, relative to the solid content of the composition for forming a low-reflection layer. In this specification, the solid content of the composition for forming a low-reflection layer means the total amount of components excluding volatile substances such as solvents from the composition. Hereinafter, the solid content of other compositions, etc., similarly refers to the total amount of components excluding volatile substances such as solvents from the target composition, etc.

[0026] The composition for forming a low-reflection layer usually contains low-refractive-index particles as a component for controlling the refractive index of the low-reflection layer. As the low-refractive-index particles, nanoparticles having a refractive index lower than that of the optical resin can generally be used. Specifically, for example, LiF, MgF ２ , 3NaF·AlF ３ or AlF ３ (both have a refractive index of 1.4), Na ３ AlF ６ Low refractive index particles made of low refractive index materials such as cryolite (refractive index 1.33) can be used.

[0027] Low refractive index particles having voids inside the particles can also be used. In these low refractive index particles, the voids can be made to have the refractive index of air (≒1), so the low refractive index particles can have a very low refractive index. Specific examples of such low refractive index particles include low refractive index silica particles having voids inside, such as porous silica particles and silica particles having a shell structure. Low refractive index silica particles having voids inside are preferably used in terms of the low refractive index particles' sufficient scratch resistance and sufficiently low refractive index. The low refractive index particles can be used alone or in combination of two or more types.

[0028] The particle size of the low-refractive-index particles is preferably 1 to 100 nm, more preferably 10 to 90 nm, and particularly preferably 20 to 80 nm. When the particle size is equal to or less than the upper limit, light reflection due to Rayleigh scattering can be sufficiently reduced, and whitening of the low-refractive-index layer and a decrease in the transparency of the low-refractive-index film can be suppressed. When the particle size is equal to or greater than the lower limit, problems such as non-uniformity of the low-refractive-index particles in the low-refractive-index layer due to aggregation of the low-refractive-index particles are less likely to occur. Furthermore, using low-refractive-index silica particles having internal voids is advantageous in terms of the low-refractive-index particles' sufficient scratch resistance and sufficiently low refractive index.

[0029] The voids in the low refractive index particles having voids therein are preferably 20 to 80 nm in size from the viewpoint of sufficient scratch resistance and a sufficiently low refractive index of the low refractive index particles.

[0030] The amount of low refractive index particles contained in the composition for forming a low reflection layer can be appropriately determined depending on the type of low refractive index particles used, etc. From the viewpoint of obtaining sufficient anti-reflection or anti-reflection function while ensuring the transparency of the low reflection film, the content of the low refractive index particles is, for example, 50 to 300 parts by mass, preferably 80 to 250 parts by mass, more preferably 100 to 200 parts by mass, and even more preferably 120 to 180 parts by mass relative to 100 parts by mass of the active energy ray-curable material contained in the composition for forming a low reflection layer.

[0031] The solvent contained in the composition for forming a low-reflection layer can be selected from known solvents commonly used in the field depending on the type of curable material and low refractive index particles used, the thickness of the low-reflection layer, the configuration of the layer on which the low-reflection layer is formed, and the like. Specific examples of the solvent include alcohol solvents such as methanol, ethanol, ethylene glycol, isopropyl alcohol, propylene glycol, ethylene glycol methyl ether, ethylene glycol butyl ether, and propylene glycol monomethyl ether; ester solvents such as ethyl acetate, butyl acetate, ethylene glycol methyl ether acetate, γ-butyrolactone or propylene glycol methyl ether acetate, and ethyl lactate; ketone solvents such as acetone, methyl ethyl ketone, cyclopentanone, cyclohexanone, 2-heptanone, and methyl isobutyl ketone; aliphatic hydrocarbon solvents such as pentane, hexane, and heptane; aromatic hydrocarbon solvents such as toluene and xylene; nitrile solvents such as acetonitrile; ether solvents such as tetrahydrofuran and dimethoxyethane; chlorine-containing solvents such as chloroform and chlorobenzene; amide solvents such as N,N-dimethylacetamide and N,N-dimethylformamide; sulfur-containing solvents such as dimethyl sulfone, dimethyl sulfoxide, and sulfolane; carbonate solvents such as ethylene carbonate and propylene carbonate; and pyrrolidone solvents such as N-methylpyrrolidone. These solvents may be used alone or in combination of two or more.

[0032] The amount of solvent contained in the composition for forming a low-reflection layer may be appropriately selected depending on the coatability of the composition for forming a low-reflection layer, etc. From the viewpoints of handleability, coatability, etc., the amount is preferably 50 to 99 mass%, more preferably 70 to 98 mass%, and particularly preferably 80 to 97 mass%, relative to the total mass of the composition for forming a low-reflection layer. Therefore, the solid content per 100 parts by mass of the composition for forming a low-reflection layer is preferably 1 to 50 parts by mass.

[0033] The composition for forming a low-reflection layer may contain, in addition to the curable material, low-refractive-index particles, and solvent, other components commonly used to form a low-reflection layer, such as a silicone-based material, a polymerization initiator, a leveling agent, a colorant, an antioxidant, a dispersant, etc.

[0034] When a silicone-based material is added to the composition for forming a low-reflection layer, the low-reflection layer can also have antifouling properties.As such a silicone-based material, silicone oil or modified silicone oil can be used, and preferably alkylaralkyl-modified silicone oil, alkyl-modified silicone oil, polyether-modified silicone oil, or alkylpolyether-modified silicone oil is used.As the silicone-based material, an organosilicon compound that does not contain fluorine and does not have a (meth)acrylic group can also be used.Specific examples thereof include alkylalkoxysilane compounds, silane siloxane compounds, silane compounds containing polyester groups, silane compounds having polyether groups, and siloxane compounds.The silicone-based material can be used alone or in combination of two or more.

[0035] When the silicone-based material is used, the amount thereof is preferably 1 to 20 parts by mass, more preferably 5 to 20 parts by mass, and even more preferably 10 to 15 parts by mass, relative to 100 parts by mass of the active energy ray-curable material contained in the composition for forming a low-reflection layer.

[0036] The composition for forming a low-reflection layer may contain a polymerization initiator depending on the type of curable material used, the type of active energy ray, etc. When ultraviolet light or visible light is used as the active energy ray, a photopolymerization initiator is usually used as the polymerization initiator. As the photopolymerization initiator, for example, acetophenones, benzoins, benzophenones, phosphine oxides, ketals, anthraquinones, and thioxanthones can be used alone or in combination of two or more. The photopolymerization initiator may be used in combination with a dye sensitizer. Examples of dye sensitizers include xanthene, thioxanthene, coumarin, ketocoumarin, and combinations of two or more thereof. On the other hand, when electron beams or gamma rays are used as the active energy ray, it is not necessary to include a polymerization initiator.

[0037] When a photopolymerization initiator is used, the amount thereof is preferably 1 to 20 parts by mass, more preferably 3 to 15 parts by mass, based on 100 parts by mass of the active energy ray-curable material.

[0038] The composition for forming a low-reflection layer may contain a leveling agent depending on the type of curable material used, the type of active energy ray, etc. Preferred examples of the leveling agent include organically modified polysiloxanes, which can be used alone or in combination of two or more. Specific examples of organically modified polysiloxanes include polydimethylsiloxanes having polyether-modified acrylic groups, polydimethylsiloxanes having polyester-modified acrylic groups, polydimethylsiloxanes having polyether-modified hydroxyl groups, and aralkyl-modified polymethylalkylsiloxanes.

[0039] By adding an organically modified polysiloxane to the composition for forming a low-reflection layer, the surface tension can be reduced during the drying process of the composition for forming a low-reflection layer. When an organically modified polysiloxane is used, the amount thereof is, for example, 0.1 to 2.0 mass % relative to the total mass of the composition for forming a low-reflection layer.

[0040] The composition for forming a low reflection layer can be applied using a known tool, such as a roll coater, reverse roll coater, gravure coater, microgravure coater, knife coater, bar coater, wire bar coater, die coater, or dip coater. When the composition for forming a low reflection layer is applied to a release film, a known release film that is generally used in this technical field can be used, and such release films are commercially available.

[0041] The thickness of the applied low-reflection layer-forming composition may be adjusted so that a cured resin layer having a thickness (thickness of one layer) of preferably 0.01 to 10 μm, more preferably 0.05 to 8 μm, and particularly preferably 0.1 to 5 μm is obtained after drying and curing of the low-reflection layer-forming composition. The thicknesses of the cured resin layer, the applied low-reflection layer-forming composition, and the functional layer, etc., described below, can be measured using a laser microscope, an ellipsometer, or the like.

[0042] Methods for drying and removing the solvent contained in the composition for forming a low-reflection layer include natural drying, ventilation drying, heat drying, and reduced-pressure drying. The temperature when drying the coating film obtained by applying the composition for forming a low-reflection layer is preferably ±30°C, more preferably ±20°C, of ​​the boiling point of the solvent contained in the composition for forming a low-reflection layer. When the drying temperature is within the above range, the solvent is less likely to remain in the obtained low-reflection layer.

[0043] By irradiating the coating film with active energy rays, for example, electron beams or ultraviolet rays, a cured resin layer having low reflection function as a low reflection layer can be obtained. As a device for generating electron beams, various electron beam accelerators such as Cockcroft-Wald type, Van de Graaff type, resonant transformer type, insulating core transformer type, linear type, dynamitron type, and high frequency type can be used. As a light source for generating ultraviolet rays, low pressure mercury lamp, medium pressure mercury lamp, high pressure mercury lamp, carbon arc lamp, metal halide lamp, xenon lamp, electrodeless discharge tube, etc. can be used. The cumulative light amount of the active energy rays to be irradiated can be appropriately determined depending on the composition of the composition for forming a low reflection layer. The cumulative light amount of the ultraviolet rays to be irradiated is, for example, 100 to 400 mJ / cm. ２ is.

[0044] Next, the inorganic layer having a low reflection function will be described. The inorganic layer having a low reflection function is preferably made of aluminum, silver, copper, rhodium, titanium, platinum, cobalt, copper aluminum (AlCu), and magnesium fluoride (MgF ２ ) by a method including the step of sputtering or chemical vapor deposition of one or more metallic materials selected from the group consisting of:

[0045] Since the thickness of a low-reflection layer effective for reducing the reflection of light of a certain wavelength is preferably equal to or greater than that wavelength, the thickness of the inorganic layer having low reflection function can be appropriately determined according to the wavelength of light for which reflection is to be reduced. On the other hand, a low-reflection layer having a thickness of 10 nm can achieve a certain level of low reflection effect. In addition, it is preferable that the refractive index gradually changes in the thickness direction of the low-reflection layer. Specifically, when a laminate including a low-reflection layer is placed in a display device, it is preferable that the refractive index on the side opposite the front side is greater than the refractive index on the side corresponding to the viewing side (hereinafter sometimes referred to as the "front side").

[0046] The refractive index of the low-reflection layer in the thickness direction can be changed, for example, by using the metal material as a sputtering target and gradually changing the flow rate of oxygen or nitrogen introduced into the chamber during layering; by using a multi-target sputtering device to simultaneously form layers using multiple targets and gradually changing the ratio of the targets during layering; by gradually changing the flow rate of gas introduced into the chamber in CVD (chemical vapor deposition); or by heat treating the layer by CVD or the like in a diffusion furnace to change the concentration (content) of the metal material in the thickness direction of the low-reflection layer. Alternatively, the refractive index of the low-reflection layer in the thickness direction can be changed by layering multiple times under different layering conditions using sputtering or CVD to stack multiple layers of the metal material. In the case of sputtering, the target may be changed for each layering condition. Alternatively, the refractive index of the low-reflection layer in the thickness direction can be changed by using a gas (Ar or N) during layering by sputtering or the like. ２ This can be achieved by varying the amount of inert gas (such as argon) introduced or by varying the degree of vacuum, thereby gradually changing the density of the layer.

[0047] When the substrate and the low-reflection layer are laminated adjacent to each other, the low-reflection layer can be formed on the substrate surface by ion implantation of an inert gas, instead of lamination. The density of the low-reflection layer is preferably in the range of 59 to 100% of the true density of the substrate. The low-reflection layer may also have a porous structure having pores.

[0048] Whether the low-reflection layer is a cured layer of a curable composition containing low-refractive-index particles and a curable material that have low reflection properties, an inorganic layer that has low reflection properties, or an organic low-reflection layer made of a fluorine-based or silicone-based organic compound, a thermoplastic resin, a thermosetting resin, or an ultraviolet-curable resin, its refractive index is preferably 1.0 to 1.5, more preferably 1.0 to 1.45, and particularly preferably 1.0 to 1.4. When the refractive index is within this range, the low-reflection layer can exhibit higher anti-reflection performance. The refractive index of the low-reflection layer can be adjusted within this range by adjusting the composition of the composition that constitutes the low-reflection layer and / or the thickness of the low-reflection layer.

[0049] The low-reflection film may have a multilayer structure. In this case, the low-reflection film may include, in addition to at least one low-reflection layer, one or more layers selected from the group consisting of a substrate, a hard coat layer, a pressure-sensitive adhesive layer, and an antifouling layer. When the low-reflection film has a multilayer structure, its refractive index is preferably 1.0 to 1.5, more preferably 1.0 to 1.3, and particularly preferably 1.0 to 1.2. When the refractive index is within this range, the low-reflection film can exhibit higher anti-reflection performance. The refractive index of the low-reflection film can be adjusted within the above range by adjusting the composition of the materials constituting the layers contained in the low-reflection film and / or the thickness of the low-reflection film and / or the layer structure of the low-reflection film.

[0050] (Substrate) The low-reflection film may include one or more substrates at any position. As the substrate that can constitute the low-reflection film, for example, a resin film conventionally known in the field of optical films can be used. Specific examples of the resin contained in the substrate include polyolefins such as polyethylene, polypropylene, and norbornene-based polymers; cyclic olefin-based resins; polyvinyl alcohol; polyesters such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate; polymethacrylic acid esters; polyacrylic acid esters; cellulose-based resins such as triacetyl cellulose, diacetyl cellulose, and cellulose acetate propionate; polycarbonate; polysulfone; polyethersulfone; polyetherketone; polyurethane; fluorine-based resins such as polytetrafluoroethylene; vinyl compounds such as polyvinyl chloride; vinylidene compounds such as polyvinylidene chloride; copolymers of vinyl compounds or fluorine-based compounds such as vinylidene fluoride / trifluoroethylene copolymer and ethylene / vinyl acetate copolymer; and resins such as polyphenylene sulfide and polyphenylene oxide. Among them, from the viewpoint of smoothness and quality as a substrate, at least one selected from cellulose-based resins, cyclic olefin-based resins, and polyethylene terephthalate resins is preferred, and cellulose-based resins and cyclic olefin-based resins are more preferred. These may be used alone or in combination of two or more. Such resins can be formed into a resin film by known means such as solvent casting or melt extrusion. When the low-reflection film includes multiple substrates, the substrates may be the same or different.

[0051] The thickness of the substrate is not particularly limited. From the viewpoint of suitability as a low-reflection film, the thickness of one substrate is preferably 10 to 200 μm, more preferably 15 to 100 μm.

[0052] Such substrates are known in the art and are commercially available, and such commercially available products can be used as substrates in the present invention.

[0053] (Hard Coat Layer) The low-reflection film may include a hard coat layer at any position. The hard coat layer mainly improves the surface hardness of the adjacent layer or film, imparts scratch resistance or chemical resistance to the surface of the layer or film, and improves the mechanical strength of the layer or film and the low-reflection film. When the low-reflection film includes a hard coat layer, it is preferable that a low-reflection layer is included adjacent to the hard coat layer. When the low-reflection film includes a substrate and a hard coat layer, it is preferable that the hard coat layer is stacked adjacent to the substrate, and it is also preferable that the hard coat layer is stacked adjacent to the substrate and the low-reflection layer is stacked adjacent to the hard coat layer. The hard coat layer may be stacked at a position that is not adjacent to the substrate. The low-reflection film may include one or two or more hard coat layers, and when it includes two or more hard coat layers, they may be the same or different from each other.

[0054] The hard coat layer can be preferably formed by a method including a step of applying a hard coat layer-forming composition containing an active energy ray-curable material and a solvent to an adjacent layer or film (e.g., substrate) or release film in the reflective film to form a coating film, a drying step of drying the coating film, and an active energy ray irradiation step of irradiating the coating film with active energy rays.

[0055] As the active energy ray-curable material, the same material as the active energy ray-curable material contained in the composition for forming a low reflection layer can be used.

[0056] The solvent may be the same as the solvent contained in the composition for forming a low-reflection layer. The amount of the solvent contained in the composition for forming a hard coat layer may be appropriately selected depending on the coatability of the composition for forming a hard coat layer, and is preferably 50 to 200 parts by mass, more preferably 70 to 150 parts by mass, and particularly preferably 80 to 120 parts by mass relative to 100 parts by mass of the active energy ray-curable material contained in the composition for forming a hard coat layer.

[0057] The hard coat layer-forming composition may contain one or more polymerization initiators and / or various additives, if necessary.

[0058] As the polymerization initiator, the same agent as the polymerization initiator contained in the composition for forming a low reflection layer can be used. When a photopolymerization initiator is used as the polymerization initiator, the amount thereof is preferably 0.1 to 10 parts by mass, more preferably 1 to 7 parts by mass, relative to 100 parts by mass of the active energy ray-curable material.

[0059] Examples of various additives include a surface conditioner (for example, a leveling agent that may be contained in the composition for forming a low-reflection layer), a refractive index adjuster, an adhesion improver, a curing agent, and an antistatic agent (for example, fine particles of metal oxides such as antimony-doped tin oxide, indium oxide tin oxide, tin oxide, titanium oxide, and antimony pentoxide, quaternary ammonium salts, and conductive polymers).

[0060] The thickness of the hard coat layer (thickness of one layer) is not particularly limited, but is preferably 0.1 to 50 μm, more preferably 0.5 to 20 μm, and even more preferably 1 to 10 μm.

[0061] (Adhesive Layer) The low-reflection film may include an adhesive layer at any position other than the outermost layer. The adhesive layer is formed of an adhesive or a pressure-sensitive adhesive. In this specification, the adhesive for forming the adhesive layer may be, for example, an adhesive having a storage modulus of 1.0 × 10 at 25°C measured under the following conditions using a dynamic viscoelasticity measuring device. ７ Pa or more, and ８ The pressure-sensitive adhesive preferably has a storage modulus of 1.0×10 Pa or more at 25° C. as measured under the following conditions using a dynamic viscoelasticity measuring device. ３ Pa ~ 1.0 x 10 ６ Examples of the agent include an agent having a viscosity of 100 Pa or more. Sample dimensions: width 10 mm, length 30 mm Clamp distance: 20 mm Measurement mode: tension Frequency: 1 Hz Heating rate: 5°C / min

[0062] The thickness of the adhesive layer formed by the adhesive is not particularly limited, but is preferably 0.01 to 3 μm, more preferably 0.05 to 2 μm. The thickness of the adhesive layer formed by the pressure-sensitive adhesive is not particularly limited, but is preferably 5 to 100 μm, more preferably 5 to 25 μm.

[0063] The adhesive or pressure-sensitive adhesive may be one commonly used in the art, and such adhesives or pressure-sensitive adhesives are commercially available. For example, a thermosetting or photocurable resin composition may be applied to an adjacent layer or film by a conventionally known method (e.g., a method using a known tool such as a roll coater as described above), and then another adjacent layer or film may be placed on top of the adhesive or pressure-sensitive adhesive. The adhesive layer may also be a pressure-sensitive adhesive (PSA), which is a layer that is attached to an object by pressing. The pressure-sensitive adhesive may be a pressure-sensitive adhesive that is "a substance that is sticky at room temperature and adheres to an adherend with light pressure" (JIS K 6800), or it may be a capsule-type adhesive that is "an adhesive in which a specific component is contained in a protective coating (microcapsules) and that can maintain stability until the coating is destroyed by appropriate means (pressure, heat, etc.)" (JIS K 6800).

[0064] (Anti-fouling layer) The low-reflection film may include an anti-fouling layer. The anti-fouling layer is a layer that exhibits a function of preventing contamination from the surroundings, such as water repellency, oil repellency, sweat resistance, anti-fouling property, or fingerprint resistance. In addition, the anti-fouling layer can improve the slipperiness of the surface.

[0065] The antifouling layer may be any material commonly used in the art. Specifically, the material for forming the antifouling layer may be either an organic compound or an inorganic compound. Examples of materials that provide high water and oil repellency include fluorine-containing organic compounds and organosilicon compounds. Examples of fluorine-containing organic compounds include fluorocarbons, perfluorosilanes, and polymeric compounds thereof. From the perspective of easily enhancing the effect of preventing stain adhesion, materials that provide a contact angle of the antifouling layer surface with pure water of 90° or more, and even 100° or more, are preferred. Depending on the material used, physical vapor deposition (e.g., vapor deposition or sputtering), chemical vapor deposition, wet coating, and other methods can be used to form the antifouling layer. The average thickness of the antifouling layer is not particularly limited and is typically about 1 to 50 nm, preferably 3 to 35 nm.

[0066] The layer structure of the low-reflection film is not particularly limited as long as it satisfies the average luminous reflectance and total light transmittance required for the low-reflection film of the present invention. For example, it may consist of a single low-reflection layer, or may have a multilayer structure including a low-reflection layer and other layers such as a substrate.

[0067] When the low-reflection film has a multi-layer structure, for example, in the low-reflection film, a hard coat layer and / or an antifouling layer may be laminated adjacent to the low-reflection layer, optionally via an adhesive layer.

[0068] In a preferred embodiment, the low-reflection film comprises a low-reflection layer and a substrate. In this embodiment, the low-reflection layer and the substrate may be adjacent to each other, or an adhesive layer and / or a hard coat layer may be optionally disposed between the low-reflection layer and the substrate. Furthermore, an anti-fouling layer may be laminated on the surface of a layer or film constituting the low-reflection film, for example, on the surface of the low-reflection layer. In a preferred embodiment, the low-reflection film comprises a low-reflection layer, a hard coat layer, and a substrate, in this order, preferably adjacent to each other. In another preferred embodiment, the low-reflection film comprises a low-reflection layer, a hard coat layer, and a substrate, laminated in the aforementioned order. An anti-fouling layer may be laminated on the surface of the low-reflection layer. In one embodiment of the present invention, the low-reflection film comprises a low-reflection layer. In this embodiment, an anti-fouling layer may be laminated on the surface of the low-reflection film. In these embodiments, when the laminate is used in a QD-OLED, the laminate can achieve an improved reflective appearance while providing suitable luminance.

[0069] The thickness of the low-reflection film may be appropriately determined depending on the layer structure of the low-reflection film, the configuration of the QD-OLED panel display device into which it is incorporated, and other factors. The thickness of the low-reflection film may be, for example, 0.05 to 500 μm, preferably 0.1 to 300 μm, more preferably 0.1 to 200 μm, and even more preferably 0.1 to 100 μm. The thickness of the low-reflection film and the substrate described below can be measured using known instruments such as a contact film thickness meter. In the laminate of the present invention, layers necessary for ensuring, maintaining, and / or reinforcing the function of the low-reflection layer, as well as layers formed integrally with the low-reflection layer, specifically, for example, a substrate for forming and maintaining the low-reflection layer, a hard coat layer adjacent to or close to the low-reflection layer, an antifouling layer, and adhesive layers for bonding these layers, are considered to be components constituting the low-reflection film. On the other hand, in the present invention, adhesive layers for bonding the low-reflection film to other layers such as functional layers are generally not considered to be components of the low-reflection film. Therefore, for example, when a low-reflection layer is formed on a substrate and is provided with a hard coat layer, an antifouling layer, etc., the average luminous reflectance, total light transmittance, and thickness of the low-reflection film mean values ​​measured as a film with a multilayer structure including the substrate, the low-reflection layer, the hard coat layer, and the antifouling layer.

[0070] A low-reflection film can be produced by laminating layers or films constituting the low-reflection film. For example, when the low-reflection film includes a substrate, the low-reflection film can be produced by a method including applying, drying, and curing a composition for forming a layer other than the substrate (for example, a low-reflection layer-forming composition, a hard coat layer-forming composition, and an antifouling layer-forming composition) to the substrate in a single layer, or in the case of multiple layers, sequentially; a method including applying, drying, and curing each of the compositions to a release film to individually produce layers other than the substrate, and laminating the produced layers and the substrate via a pressure-sensitive adhesive layer; or a method combining the steps of the two methods (for example, a method including applying, drying, and curing a hard coat layer-forming composition to the substrate, applying, drying, and curing a low-reflection layer-forming composition to a release film, adhering the hard coat layer side of a laminate consisting of a substrate / hard coat layer to the low-reflection layer side of a laminate consisting of a release film / low-reflection layer via a pressure-sensitive adhesive layer, and removing the release film). For example, when the low-reflection film does not include a substrate, a low-reflection film can be produced by a method comprising applying, drying, and curing a composition for forming a layer constituting the low-reflection film (e.g., a low-reflection layer-forming composition, a hard coat layer-forming composition, and an antifouling layer-forming composition) to a release film in one layer, or in the case of multiple layers, successively; a method comprising applying, drying, and curing each of the compositions to a release film to individually produce the layers constituting the low-reflection film, and laminating the produced layers via an adhesive layer; or a method combining the steps of the above two methods (e.g., applying, drying, and curing a hard coat layer-forming composition to a release film, and then applying, drying, and curing a low-reflection layer-forming composition thereon; applying, drying, and curing a antifouling layer-forming composition to another release film; bonding the low-reflection layer side of a laminate consisting of a release film / hard coat layer / low-reflection layer to the antifouling layer side of a laminate consisting of a release film / antifouling layer via an adhesive layer, and removing the release film). In another embodiment of the present invention, a single-layer low-reflection layer (low-reflection film) can be obtained by forming a low-reflection layer directly on the surface on which the low-reflection layer is to be provided (for example, on the functional layer in the present invention).On the single-layer low-reflection layer thus obtained, a composition for forming a layer constituting a low-reflection film other than the low-reflection layer (for example, a composition for forming a hard coat layer, a composition for forming an antifouling layer) can be applied, dried, and cured in one layer, or in the case of multiple layers, successively, to obtain a multilayer low-reflection film. Furthermore, as the low-reflection film, a commercially available product commonly used in the field of optical films may be used. In order to improve adhesion between adjacent layers or films, the substrate or each of the above layers before lamination may be subjected to a known pretreatment such as corona treatment or low-temperature plasma treatment.

[0071] <Functional Layer> The laminate of the present invention includes a functional layer in addition to a low-reflection film. The functional layer in the present invention is a layer that contains at least one dye and satisfies the following formula (I): (Tt50° / Tt0°)×100≧60 Formula (I) [wherein Tt50° is the transmittance of light with a wavelength of 550 nm incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light with a wavelength of 550 nm incident on the functional layer at an incident angle of 0°]. In display devices that use QD-OLED panels containing quantum dots, which are nanoparticles, a phenomenon occurs that occurs specifically when using quantum dot organic EL panels: external light taken into the display device is reflected by the OLED electrode during black display, and the reflected light is scattered by a diffusing agent or the like in the QD filter, causing the reflected light to appear whitish on the panel. When the laminate of the present invention is placed on the viewing side of the OLED electrode in a QD-OLED, the functional layer contained in the low-reflection film can prevent or reduce the appearance of whitish light on the QD-OLED panel when black is displayed, which is caused by external light reflected by the OLED electrode and scattered light generated when the reflected external light is scattered by a diffusing agent or the like in the QD filter.

[0072] From the viewpoint of more effectively preventing or reducing the occurrence of the above-mentioned external light and scattered light on the QD-OLED panel, it is preferable that the functional layer can effectively absorb light near the emission spectrum (reflection spectrum) of the light-emitting panel. For example, when the light-emitting panel is a QD-OLED panel, it is preferable that the functional layer can effectively absorb light near wavelengths of 440 to 460 nm, 530 to 550 nm, and 640 to 660 nm. By including a dye having a maximum absorption wavelength (λmax) in these wavelength ranges in the functional layer, it is possible to obtain a laminate that suppresses or reduces the whitishness of the display screen during black display and neutralizes the display screen during white display. In this specification, reducing the yellowish or blueish tinge of the display screen during white display is also referred to as "neutral graying," which means that when the laminate of the present invention is laminated on a QD-OLED display device and viewed from an oblique angle during white display, it appears gray with no hue and only brightness.

[0073] The functional layer contains one or more dyes, preferably selected from the group consisting of black dyes and dichroic dyes. While the inclusion of one or more dyes in the functional layer can prevent or reduce the occurrence of the above-mentioned external light and scattered light on the QD-OLED panel, it was surprising that this prevention or reduction could not be achieved when the functional layer contains one or more pigments instead of dyes. While not intending to be bound by the following reasons, it is believed that the presence of particles such as pigments in the functional layer can cause scattering of reflected light, inhibiting the effect of reducing reflected light measured by the SCE (specularly-excluded) method. Therefore, in a preferred embodiment of the present invention, the functional layer does not contain an amount of pigment that would reduce the anti-reflection performance of the present invention, and particularly preferably does not contain any pigment.

[0074] The functional layer can be preferably formed by a method including the steps of: applying a functional layer-forming composition containing an active energy ray-curable material, a dye, and a solvent to an adjacent layer or film in the laminate to be produced, or to a release film, to form a coating film; drying the coating film; and irradiating the coating film with active energy rays. Since the black pigment contained in the functional layer is a dye, the black pigment can be dissolved in the functional layer-forming composition, allowing the low-reflection film to exhibit the desired anti-reflection performance.

[0075] The functional layer-forming composition may be prepared by mixing an active energy ray-curable material, a dye, a solvent, and optional materials (initiators and various additives) using a known mixer. The order in which the materials are added to the mixer is not particularly limited. For example, all materials may be added to the mixer all at once or in any order and mixed. Alternatively, a mixture of the active energy ray-curable material, a solvent, and optional materials as needed may be prepared, and a mixture of the dye, a solvent, and optional materials as needed may be prepared, and then these mixtures may be mixed.

[0076] The black dye may be a dye that exhibits black color alone (black dye in the narrow sense) or a mixed dye that does not exhibit black color alone but exhibits black color when combined with two or more other dyes. The mixed dye may be a mixture of a black dye in the narrow sense with a dye of another color. Black dyes, whether alone, as a mixture, or as a mixture with a dichroic dye, preferably have an absorption maximum wavelength in the range of 300 to 700 nm. Examples of dyes that constitute such black dyes include azo dyes, anthraquinone dyes, perinone dyes, perylene dyes, methine dyes, quinoline dyes, azine dyes, metal complexes, metal salts, amine compounds, organic acids, and mixtures thereof. Among these, azo dyes and mixtures of azo dyes and amine compounds are preferred. When a black dye and a dichroic dye are used in combination as dyes contained in the functional layer, the ratio of the black dye to the dichroic dye is preferably selected so that the absorption maximum wavelength of the mixture is in the range of 300 to 700 nm. Such a ratio, expressed as a mass ratio of the black dye to the dichroic dye (mass of the black dye:mass of the dichroic dye), is, for example, 1:10 to 10:1, preferably 1:5 to 5:1, and more preferably 1:1 to 4:1. The absorbance of the dye can be measured with a spectrophotometer in a state where the dye is dissolved in a solvent that dissolves the dye, such as methyl ethyl ketone.

[0077] A dichroic dye is a dye that has different absorbance in the long axis direction of the molecule and in the short axis direction. Dichroic dyes, whether used alone, as a mixture, or as a mixture with a black dye, preferably have a maximum absorption wavelength in the range of 300 to 700 nm. Examples of such dichroic dyes include acridine dyes, oxazine dyes, cyanine dyes, naphthalene dyes, azo dyes, anthraquinone dyes, phthalocyanine dyes, and nitro dyes. Among these, azo dyes are preferred.

[0078] Examples of azo dyes include monoazo dyes, bisazo dyes, trisazo dyes, tetrakis azo dyes, and stilbene azo dyes. Among them, bisazo dyes and trisazo dyes are preferred, and examples thereof include those represented by the following formula (I): １ (-N=N-K ２ ) ｐ-N=N-K ３ (I) [wherein, K １ and K. ３ represent, independently of each other, an optionally substituted phenyl group, an optionally substituted naphthyl group, an optionally substituted benzoic acid phenyl ester group, or an optionally substituted monovalent heterocyclic group; K ２ represents a p-phenylene group which may have a substituent, a naphthalene-1,4-diyl group which may have a substituent, a 4,4'-stilbenylene group which may have a substituent, or a divalent heterocyclic group which may have a substituent, p represents an integer of 0 to 4, and when p is an integer of 2 or more, a plurality of K ２ may be the same or different, and an —N═N— bond may be replaced by a —C═C—, —COO—, —NHCO—, or —N═CH— bond as long as the compound shows absorption in the visible region (hereinafter, also referred to as “compound (I)”).

[0079] Examples of monovalent heterocyclic groups include groups in which one hydrogen atom has been removed from a heterocyclic compound such as quinoline, thiazole, benzothiazole, thienothiazole, imidazole, benzimidazole, oxazole, benzoxazole, etc. Examples of divalent heterocyclic groups include groups in which two hydrogen atoms have been removed from the above heterocyclic compounds.

[0080] K １ and K. ３ a phenyl group, a naphthyl group, a benzoic acid phenyl ester group, and a monovalent heterocyclic group in the above formula (I), and K ２Examples of the substituents that the p-phenylene group, naphthalene-1,4-diyl group, 4,4'-stilbenylene group, and divalent heterocyclic group in the formula (I) may optionally have include alkyl groups having 1 to 20 carbon atoms, alkyl groups having 1 to 20 carbon atoms and having a polymerizable group, alkenyl groups having 1 to 4 carbon atoms, alkoxycarbonyl groups having 1 to 20 carbon atoms, alkoxy groups having 1 to 20 carbon atoms such as methoxy, ethoxy, and butoxy groups, alkoxy groups having 1 to 20 carbon atoms and having a polymerizable group, and trifluoromethyl groups. fluorinated alkyl groups having 1 to 4 carbon atoms; cyano groups; nitro groups; halogen atoms; substituted or unsubstituted amino groups such as amino groups, diethylamino groups, and pyrrolidino groups (a substituted amino group means an amino group having one or two alkyl groups having 1 to 6 carbon atoms, an amino group having one or two alkyl groups having 1 to 6 carbon atoms and a polymerizable group, or an amino group in which two substituted alkyl groups are bonded to each other to form an alkanediyl group having 2 to 8 carbon atoms. An unsubstituted amino group is -NH ２ Examples of the polymerizable group include a (meth)acryloyl group and a (meth)acryloyloxy group.

[0081] Among the compounds (I), compounds represented by any one of the following formulas (I-1) to (I-8) are preferred. In formulas (I-1) to (I-8), B １ ~B ３０ are each independently a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 1 to 6 carbon atoms, an alkoxycarbonyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a cyano group, a nitro group, a substituted or unsubstituted amino group (the definitions of a substituted amino group and an unsubstituted amino group are as described above), a chlorine atom, or a trifluoromethyl group. n1 to n4 are each independently an integer of 0 to 3. When n1 is 2 or more, multiple B ２ may be the same or different, and when n2 is 2 or more, a plurality of B ６ may be the same or different, and when n3 is 2 or more, a plurality of B ９ may be the same or different, and when n4 is 2 or more, a plurality of B １４ may be the same or different from each other.

[0082] When the functional layer contains one or more dyes selected from the group consisting of black dyes and dichroic dyes, it may further contain one or more dyes that do not have dichroic or orientation properties. When the functional layer contains a combination of a dye selected from the group consisting of black dyes and dichroic dyes and a dye that does not have dichroic or orientation properties, the ratio of the dye selected from the group consisting of black dyes and dichroic dyes to the dye that does not have dichroic or orientation properties is preferably selected so that the absorption maximum wavelength of the mixture is in the range of 300 to 700 nm. Such a ratio is, in terms of the mass ratio of the dye selected from the group consisting of black dyes and dichroic dyes to the dye that does not have dichroic or orientation properties (mass of the dye selected from the group consisting of black dyes and dichroic dyes:mass of the dye that does not have dichroic or orientation properties), for example, 10:1 to 1:10, preferably 5:1 to 1:5.

[0083] In one embodiment, it is preferable to select a dye so that the functional layer exhibits a black (neutral gray) color. This can be achieved by using a black dye, a dichroic dye, a combination of a black dye and a dichroic dye, a combination of a black dye and a dye that is neither dichroic nor orientable, a combination of a dichroic dye and a dye that is neither dichroic nor orientable, or a combination of a black dye, a dichroic dye, and a dye that is neither dichroic nor orientable. The black (neutral gray) color of the functional layer can be confirmed using, for example, a spectrophotometer, a colorimeter, or the like.

[0084] From the viewpoint of good antireflection performance, the total amount of dyes contained in the functional layer is usually 0.1 to 8 parts by mass, preferably 0.5 to 5 parts by mass, and more preferably 1 to 3 parts by mass, relative to 100 parts by mass of the active energy ray-curable material.

[0085] The functional layer satisfies the following formula (I): (Tt50° / Tt0°) × 100≧60 Formula (I), and preferably satisfies the following formula (II): (Tt50° / Tt0°) × 100≧80 Formula (II). In the above formula, Tt50° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light having a wavelength of 550 nm incident on the functional layer at an incident angle of 0°. A transmittance ratio of 60 or more or 80 or more indicates that the angle relative to the laminate has little effect on the transmittance, which indicates that the angle relative to the laminate has little effect on the anti-reflection performance of the laminate, and is therefore preferred. The transmittance ratio is more preferably 85 or more, even more preferably 90 or more, and particularly preferably 95 or more, with the upper limit being 100. The transmittance ratio can be adjusted to be equal to or greater than the lower limit by adjusting the type and / or amount of dye contained in the functional layer, the thickness of the functional layer, and / or the surface shape. The transmittance ratio can be measured by the method described in the Examples below.

[0086] The functional layer has an average luminous reflectance of more than 5% and a total light transmittance of less than 93%.

[0087] From the viewpoint of good thinness and good anti-reflection performance, the thickness of the functional layer is preferably 0.01 to 5 μm, more preferably 0.01 to 3 μm, and particularly preferably 0.01 to 2 μm.

[0088] The active energy ray-curable material preferably used in forming the functional layer can be the same as the active energy ray-curable material contained in the low-reflection layer-forming composition. The solvent preferably used in forming the functional layer can be the same as the solvent contained in the low-reflection layer-forming composition. The amount of solvent used in the functional layer-forming composition can be appropriately selected depending on the coatability of the functional layer-forming composition, but is preferably 30 to 100 parts by mass, more preferably 40 to 90 parts by mass, and particularly preferably 50 to 80 parts by mass, per 100 parts by mass of the active energy ray-curable material contained in the functional layer-forming composition. The functional layer-forming composition preferably used in forming the functional layer may contain a polymerization initiator and / or various additives as needed. The polymerization initiator and various additives can be the same as those used in the hard coat layer-forming composition. When a photopolymerization initiator is used as the polymerization initiator, the amount is preferably 0.1 to 10 parts by mass, more preferably 1 to 7 parts by mass, per 100 parts by mass of the active energy ray-curable material.

[0089] When forming a functional layer using a composition for forming a functional layer, the coating process of the composition for forming a functional layer, the drying process of the resulting coating film, and the irradiation process of irradiating the coating film with active energy rays may be carried out in the same manner as the coating process, drying process, and irradiation process when forming a low-reflection layer using a composition for forming a low-reflection layer.

[0090] [Laminate manufacturing method] As the manufacturing method of laminate, known methods can be adopted.Examples of such methods include: manufacturing low-reflection film by the method exemplified in the previous paragraph, and applying, drying and irradiating the composition for forming functional layer on the low-reflection film manufactured by the method exemplified in the previous paragraph; manufacturing low-reflection film by the method exemplified in the previous paragraph, and applying, drying and irradiating the composition for forming functional layer on the release film by the method exemplified in the previous paragraph to manufacture functional layer, and bonding the obtained low-reflection film and functional layer via a pressure-sensitive adhesive layer.

[0091] In a preferred embodiment, the outermost layer of the laminate, particularly the layer located on the most visible side when the laminate is used in a display device, is an anti-fouling layer. In this embodiment, the anti-fouling layer is, for example, included as part of a low-reflection film or laminated adjacent to a functional layer, preferably included as part of a low-reflection film, and more preferably laminated adjacent to a low-reflection layer.

[0092] The adhesive layer that can be used to bond the low-reflection film and the functional layer can be the same as the adhesive layer that may be included in the low-reflection film. The thickness of the adhesive layer formed from an adhesive is not particularly limited, but is preferably 0.01 to 3 μm, more preferably 0.05 to 2 μm. The thickness of the adhesive layer formed from a pressure-sensitive adhesive is not particularly limited, but is preferably 5 to 100 μm, more preferably 5 to 25 μm.

[0093] In one embodiment in which the low-reflection film includes a low-reflection layer and a substrate, the laminate including the low-reflection film and the functional layer preferably includes the low-reflection layer, the substrate, and the functional layer in this order.

[0094] In one embodiment of the present invention, the low-reflection film includes a low-reflection layer, and in a laminate including the low-reflection film and the functional layer, no substrate is laminated between the low-reflection layer and the functional layer. In this embodiment, an adhesive layer and / or a hard coat layer may be optionally disposed between the low-reflection layer and the functional layer.

[0095] Examples of specific layer configurations of the laminate of the present invention include the following. The following configurations are listed starting from the layer that will be visible when incorporated into a QD-OLED: low-reflection layer / hard-coat layer / substrate / functional layer, low-reflection layer / hard-coat layer / substrate / adhesive layer / functional layer, anti-fouling layer / low-reflection layer / hard-coat layer / substrate / functional layer, anti-fouling layer / low-reflection layer / hard-coat layer / substrate / adhesive layer / functional layer, functional layer / substrate / hard-coat layer / low-reflection layer, anti-fouling layer / functional layer / substrate / hard-coat layer / low-reflection layer, low-reflection layer / functional layer, anti-fouling layer / low-reflection layer / functional layer, low-reflection layer / adhesive layer / functional layer, anti-fouling layer / low-reflection layer / functional layer, low-reflection layer / adhesive layer / functional layer, anti-fouling layer / low-reflection layer / adhesive layer / functional layer, low-reflection layer / substrate ....

[0096] In a preferred embodiment, the laminate from the low-reflection film to the functional layer has a luminous average reflectance of 0.01% or more and 1% or less, and a total light transmittance of 75% or more. The luminous average reflectance is preferably 0.01 to 1%, more preferably 0.01 to 0.5%, and particularly preferably 0.01 to 0.4%. When the luminous average reflectance is within the above range, higher anti-reflection performance can be achieved while ensuring acceptable cost and good thinness. The luminous average reflectance can be adjusted within the above range by adjusting the composition of the composition constituting the film or layer included in the laminate and / or the thickness of the film or layer. The total light transmittance is preferably 75% or more, more preferably 78% or more, and particularly preferably 80% or more and 100% or less. When the total light transmittance is equal to or greater than the above lower limit, higher transparency can be achieved. The total light transmittance can be adjusted to equal to or greater than the above lower limit by adjusting the composition of the composition constituting the layer included in the low-reflection film and the functional layer and / or the thickness of the layer.

[0097] In this preferred embodiment, the laminate to be measured for average luminous reflectance and total light transmittance refers to a laminate incorporated into a QD-OLED. That is, for example, in Example 1, the laminate to be measured ranges from the low-reflectivity layer located on the viewing side when incorporated into a display device sample to the functional layer located on the panel side, and does not include a pressure-sensitive adhesive layer or the like for attaching the laminate to the panel.

[0098] The laminate includes the low-reflection film and functional layer as described above, and thus can suppress the reflective appearance caused by light reflection inside and outside the panel during black display and improve the brightness during white display in a display device using a quantum dot organic EL panel. Therefore, the present invention also covers the laminate for use in a quantum dot organic EL display device (QD-OLED).

[0099] [Display Device] The laminate of the present invention, even when used with a QD-OLED, can improve the reflective appearance while maintaining suitable luminance, and therefore can be suitably used as an anti-reflection layer in the QD-OLED. Accordingly, the present invention also covers a display device including the laminate and a quantum dot organic EL light-emitting panel. A display device such as a quantum dot organic EL display device generally comprises a light-emitting panel, a phosphor layer disposed on the light-emitting surface side of the light-emitting panel and having a reflective film on the side, an anti-reflection layer disposed on the phosphor layer, and a sealing member containing the phosphor layer and the anti-reflection layer. Adhesives or pressure-sensitive adhesives may be used to bond each component, and examples of such adhesives or pressure-sensitive adhesives that can be used for the adhesive layer described above can be used. The light-emitting panel, phosphor layer, and sealing member included in the display device of the present invention can be light-emitting panels, phosphor layers, and sealing members commonly used in the art.

[0100] Quantum dot organic EL light-emitting panels generally include a blue organic EL light-emitting layer provided on a TFT substrate, and a quantum dot filter (also referred to as a QD filter or quantum dot light-emitting layer) containing red and green quantum dots. These panels have a top-emission device structure. The QD filter contains quantum dots, semiconductor nanoparticles made from semiconductor materials containing zinc, cadmium, sulfur, etc. The use of multiple quantum dots of different sizes enables displays that emit (or emit) light of multiple wavelengths. However, when light reflected from an electrode strikes the quantum dot nanoparticles, the reflected light can be scattered within the QD filter, resulting in a deterioration in the reflective appearance. By laminating the laminate of the present invention to the viewing side of such a QD-OLED panel, the scattered light generated by the QD filter can be effectively absorbed, improving the reflective appearance caused by light reflection inside and outside the panel during black display. Furthermore, the laminate of the present invention is less likely to cause a decrease in luminance during white display compared to circular polarizers used in conventional OLED panels, and therefore can achieve both suppression of the reflective appearance caused by light reflection inside and outside the panel during black display and improvement of luminance during white display without using a circular polarizer.

[0101] In a preferred embodiment, in the laminate included in the display device, the low-reflection film is located closer to the viewer than the functional layer. In this embodiment, the presence of the low-reflection layer at or near the outermost surface can further suppress interfacial reflection at the outermost surface, and the presence of the functional layer on the light-emitting panel side can efficiently remove reflected light from the light-emitting panel and scattered light caused by light diffusing agents contained in the QD filter. Examples of specific laminate configurations include a laminate in which, from the viewer's side, a low-reflection layer, a hard coat layer, a substrate, and a functional layer are stacked in this order, optionally with an adhesive layer interposed therebetween, or a laminate in which a low-reflection layer and a functional layer are stacked in this order, optionally with an adhesive layer interposed therebetween. The laminate may also include an antifouling layer on the outermost viewer's side, i.e., adjacent to the low-reflection layer.

[0102] In one embodiment, the laminate included in the display device may have a functional layer, a substrate, a hard coat layer, and a low-reflection layer laminated in this order from the viewing side, optionally with an adhesive layer interposed therebetween. The laminate may also have an antifouling layer on the viewing side, i.e., adjacent to the functional layer.

[0103] [Method for Producing Display Device] The display device of the present invention can be produced by a method commonly used in the art, except that the laminate of the present invention is used as the antireflection layer.

[0104] The present invention will be described in more detail below with reference to examples. Measurement methods for the physical properties of the low-reflection film, functional layer, and laminate will be described below, and the physical property values ​​described in this specification, including the examples, are based on values ​​determined by the following methods.

[0105] <Average Luminous Reflectance> A measurement sample was prepared by bonding the side corresponding to the visible side and the opposite side of the low-reflection films and laminates in the examples and comparative examples (the substrate side for the low-reflection films of Examples 1 to 4 and Comparative Examples 1 and 3, the low-reflection layer side for the low-reflection film of Example 5, the low-reflection layer side for the low-reflection films of Examples 6 and 7 (the laminate 6A from which the one-side release-treated PET film was removed), the functional layer side for the laminates of Examples 1 to 4, 6 to 7, and Comparative Example 4, the low-reflection layer side for the laminate of Example 5, the substrate side for the laminate of Comparative Example 1, the polymerizable liquid crystal compound cured layer side for the laminate of Comparative Example 2, and the cyclic olefin resin film side for the laminate of Comparative Example 3) to a black acrylic plate (Sumipex, manufactured by Sumitomo Chemical Co., Ltd.) via a 25 μm-thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation). Using a spectrophotometer (CM-3700A, manufactured by Konica Minolta, Inc.), light from a D65 light source was incident from a direction of 8° from the surface of the low-reflection film side or the laminate side of the measurement sample, and measurement was carried out in the specular reflection excluded mode (SCE mode). From the reflection spectrum obtained by the measurement, the luminosity-corrected reflectance Y value calculated according to the method described in JIS Z 8722 was adopted as the luminous average reflectance of the measurement sample.

[0106] <Total Light Transmittance> The total light transmittance of the low-reflection films and laminates in the examples and comparative examples was measured using a haze meter (HZ-2, manufactured by Suga Test Instruments Co., Ltd.) In this case, the measurement was performed by irradiating light perpendicularly to the surface of the low-reflection film or laminate from the side corresponding to the viewing side of the low-reflection film or laminate.

[0107] <Transmittance Ratio> In the examples and comparative examples, the functional layer side of the laminate (except the polymerizable liquid crystal compound cured layer side in Comparative Example 2) was attached to a 4 cm x 4 cm x 0.7 mm thick glass plate via a 25 μm thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation) to prepare a measurement sample. The measurement sample was set in an ultraviolet-visible spectrophotometer (UV-2700i, manufactured by Shimadzu Corporation) so that light was irradiated onto the glass side of the measurement sample. The transmittance (Tt50°) of light with a wavelength of 550 nm incident on the functional layer (except the circular polarizer in Comparative Example 2) at an incident angle of 50° and the transmittance (Tt0°) of light with a wavelength of 550 nm incident on the functional layer at an incident angle of 0° were measured, and the ratio (Tt50° / Tt0°) x 100 (transmittance ratio) was calculated. In the measurement sample, the x-axis is an arbitrary direction within the plane of the functional layer, the y-axis is a direction perpendicular to the x-axis within the plane, and the z-axis is the thickness direction of the functional layer. Tt50° and Tt0° are both the transmittance at the absorption maximum wavelength of 550 nm of the functional layer. Tt0° represents the transmittance when light is incident perpendicular to the x-axis direction (i.e., z = 0), and Tt50° represents the transmittance when light is incident after rotating the functional layer 50° around the y-axis as the rotation axis (i.e., Z = 50). Furthermore, the transmittance measurements were performed after confirming that the layers or films other than the functional layer, as well as the pressure-sensitive adhesive layer and the glass contained in the laminates in the examples and comparative examples, do not have significant absorption between 400 and 750 nm. Therefore, the Tt50° and Tt0° of the functional layer in the laminate can be measured using the above method.

[0108] In the examples and comparative examples, the following dyes were used: Dichroic dye B1 (cyan dye 1) Has a maximum absorption wavelength in the range of 600 to 650 nm. Dichroic dye B2 (cyan dye 2) has a maximum absorption wavelength in the range of 600 to 650 nm. Dichroic dye B3 (magenta dye) has a maximum absorption wavelength in the range of 500 to 550 nm. Dichroic dye B4 (orange dye) has a maximum absorption wavelength in the range of 440 to 490 nm. Dichroic dye B5 (yellow dye) has a maximum absorption wavelength in the range of 380 to 430 nm. Black dye 1: OIL BLACK 860 manufactured by Orient Chemical Industries Co., Ltd. Has a maximum absorption wavelength in the range of 550 to 680 nm. Black dye 2: VARIFAST BLACK 3830 manufactured by Orient Chemical Industries Co., Ltd. Has a maximum absorption wavelength in the range of 550 to 680 nm. Carbon black: Aqua-Black (registered trademark) 001 manufactured by Tokai Carbon Co., Ltd. Has an absorption in the range of 400 to 700 nm.

[0109] Example 1 Preparation of a Low-Reflection Film Including a Low-Reflection Layer (LR) and a Substrate (TAC) A 40 μm-thick triacetyl cellulose film (KC4UY-TAC, manufactured by Konica Minolta, Inc.) was prepared as the substrate. Next, 100 parts by mass of UV-7605B (manufactured by Nippon Synthetic Chemical Industry Co., Ltd.), 4 parts by mass of Irgacure 184 (manufactured by Ciba-Geigy Japan Ltd.), 50 parts by mass of methyl acetate, and 50 parts by mass of methyl ethyl ketone were mixed to prepare a hard coat layer-forming composition. The hard coat layer-forming composition was applied onto the triacetyl cellulose film substrate, followed by drying and ultraviolet irradiation, thereby forming a 10 μm-thick hard coat layer. Subsequently, 2.4 parts by mass of low refractive index silica particles (average particle diameter 30 nm), 1.6 parts by mass of dipentaerythritol hexaacrylate (active energy ray curable material), 0.2 parts by mass of TSF44 (silicone material, manufactured by Momentive Performance Materials Japan LLC), 0.2 parts by mass of Irgacure 184 (photopolymerization initiator, manufactured by Ciba-Geigy Japan Ltd.), 72.2 parts by mass of isopropyl alcohol (solvent), and 13.8 parts by mass of methyl isobutyl ketone (solvent) were mixed to prepare a low reflection layer forming composition. The low reflection layer forming composition was applied onto the above hard coat layer with a die coater, dried in an oven set at 80 ° C., and the accumulated light amount was 384 mJ / cm ２ A low-reflection layer with a thickness of 125 nm was formed by irradiating the film with ultraviolet light at a temperature of 100°C. In this manner, a low-reflection film (LR-TAC) was produced, which had a hard coat layer and a low-reflection layer (LR) on one side of a triacetyl cellulose film (TAC). The low-reflection film had an average luminous reflectance of 0.45% and a total light curing rate of 96.3%.

[0110] <Preparation of composition for forming functional layer and production of laminate> The following components were stirred at 25°C for 5 hours to obtain a binder composition. The following components were stirred at 90° C. for 2 hours to obtain dye solution 1. The binder composition and the dye solution 1 were mixed and stirred at 25°C for 30 minutes to obtain a functional layer-forming composition 1. The functional layer-forming composition 1 was applied to the TAC side of the LR-TAC using a bar coater, and then dried at 25°C for 3 minutes. Next, a UV irradiation device (SPOT CURE SP-7, manufactured by Ushio Inc.) was used to apply the functional layer-forming composition 1 to the TAC side of the LR-TAC, and the applied composition was dried at 25°C for 3 minutes. ２ Functional layer 1 was formed by irradiating ultraviolet light (365 nm standard) to obtain laminate 1 consisting of low-reflection layer / hard coat layer / substrate / functional layer 1. The thickness of functional layer 1 was measured using a laser microscope (OLS3000 manufactured by Olympus Corporation) and was found to be 2.0 μm. The measurement results of functional layer 1 and laminate 1 are shown in Table 1.

[0111] <Evaluation of Reflective Appearance, Emitted Light Brightness, and Oblique Hue> A 10 cm x 10 cm functional layer side of the laminate 1 was attached to a panel (hereinafter abbreviated as "QD-OLED panel") obtained by removing the LR-TAC and adhesive layer from the outermost surface of a 4K organic EL television (A95K, manufactured by Sony Corporation) via a 25 μm thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation). This resulted in a display device sample for evaluating reflective appearance and luminous brightness, consisting of a low-reflectivity layer / hard coat layer / substrate / functional layer 1 / pressure-sensitive adhesive layer / QD-OLED panel from the viewing side. (i) Reflective Appearance Under fluorescent lighting, a penlight was irradiated so that the distance between the low-reflectivity layer and the sample was 5 cm, and the reflective appearance with the television off was visually confirmed. The evaluation criteria for reflective appearance were as follows: (Evaluation criteria for reflective appearance) AA: Best, no blurring A: Good, no blurring B: Fair, mostly no blurring C: Poor, blurring present (ii) Luminance Next, the luminance was visually confirmed under fluorescent lighting with the television on. The evaluation criteria for luminance were as follows: (Evaluation criteria for luminance) A: Good, bright B: Fair, mostly no blurring C: Poor, dark (iii) Oblique hue The hue of the above sample was visually confirmed from an oblique direction under fluorescent lighting with the television on, and evaluated according to the following evaluation criteria: (Evaluation criteria for oblique hue) A: No hue, appeared gray with only brightness. B: Coloring other than gray was observed. The evaluation results for the reflective appearance, luminance, and oblique hue of the above sample are shown in Table 1.

[0112] Example 2 The following components were stirred at 60° C. for 2 hours to obtain dye solution 2. A functional layer-forming composition 2 was prepared in the same manner as in Example 1, except that dye solution 2 was used instead of dye solution 1. A functional layer 2 was formed, and a laminate 2 consisting of a low-reflection layer, a hard coat layer, a substrate, and a functional layer 2 was obtained. A sample for evaluating reflective appearance and luminance was prepared, consisting of a low-reflection layer, a hard coat layer, a substrate, a functional layer 2, a pressure-sensitive adhesive layer, and a QD-OLED panel from the viewing side. The thickness of the functional layer 2 was measured using a laser microscope (OLS3000 manufactured by Olympus Corporation) and found to be 2.0 μm. The measurement results of the functional layer 2 and the laminate 2, as well as the evaluation results of the reflective appearance and luminance of the sample, are shown in Table 1.

[0113] Example 3 The following components were stirred at 60° C. for 2 hours to obtain dye solution 3. A functional layer-forming composition 3 was prepared in the same manner as in Example 1, except that dye solution 3 was used instead of dye solution 1. A functional layer 3 was formed, and a laminate 3 consisting of a low-reflection layer / hard coat layer / substrate / functional layer 3 was obtained. A sample for evaluating reflective appearance and luminance was prepared, consisting of a low-reflection layer / hard coat layer / substrate / functional layer 3 / pressure-sensitive adhesive layer / QD-OLED panel from the viewing side. The thickness of functional layer 3 was measured using a laser microscope (OLS3000 manufactured by Olympus Corporation) and was found to be 2.0 μm. The measurement results of functional layer 3 and laminate 3, as well as the evaluation results of the reflective appearance and luminance of the above sample, are shown in Table 1.

[0114] Example 4 The following components were stirred at 60° C. for 2 hours to obtain dye solution 4. A functional layer-forming composition 4 was prepared in the same manner as in Example 1, except that dye solution 4 was used instead of dye solution 1. A functional layer 4 was formed, and a laminate 4 consisting of a low-reflection layer / hard coat layer / substrate / functional layer 4 was obtained. A sample for evaluating reflective appearance and luminance was prepared, consisting of a low-reflection layer / hard coat layer / substrate / functional layer 4 / pressure-sensitive adhesive layer / QD-OLED panel from the viewing side. The thickness of functional layer 4 was measured using a laser microscope (OLS3000 manufactured by Olympus Corporation) and was found to be 2.0 μm. The measurement results of functional layer 4 and laminate 4, as well as the evaluation results of the reflective appearance and luminance of the above sample, are shown in Table 1.

[0115] Example 5 A laminate 1 (hereinafter referred to as "Laminate 5") consisting of a low-reflection layer / hard coat layer / substrate / functional layer 1 was obtained in the same manner as in Example 1. The thickness of Functional Layer 5 was measured using a laser microscope (OLS3000 manufactured by Olympus Corporation) and found to be 2.0 μm. Next, a sample for evaluating reflective appearance and luminance was obtained in the same manner as in Example 1, except that the viewing side was treated as the functional layer 1 side rather than the low-reflection layer side (i.e., by bonding the low-reflection layer side of Laminate 5 to a QD-OLED panel via a 25 μm-thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation)). The sample consisted of Functional Layer 1 / substrate / hard coat layer / low-reflection layer / pressure-sensitive adhesive layer / QD-OLED panel from the viewing side. The measurement results of Functional Layer 1 and Laminate 5, as well as the evaluation results of the reflective appearance and luminance of the sample, are shown in Table 1.

[0116] Comparative Example 1 A low-reflection film having a hard coat layer and a low-reflection layer on one surface of a substrate (TAC) was produced in the same manner as in Example 1. Next, a sample for evaluating the reflective appearance and luminance was obtained, consisting of the low-reflection layer / hard coat layer / substrate / pressure-sensitive adhesive layer / QD-OLED panel from the viewing side, in the same manner as in Example 1, except that the low-reflection film was used instead of Laminate 1. The measurement results of the low-reflection film and the evaluation results of the reflective appearance and luminance of the sample are shown in Table 1.

[0117] Comparative Example 2: A circularly polarizing plate was obtained with a polarizer in which iodine was adsorbed and aligned on a polyvinyl alcohol resin film, following Example 1 of JP 2020-095255 A. The polymerizable liquid crystal compound cured layer side of the circularly polarizing plate was then bonded to a QD-OLED panel via a 25 μm-thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation). This resulted in a sample for evaluating the reflective appearance and luminance of the circularly polarizing plate / pressure-sensitive adhesive layer / QD-OLED panel. The evaluation results for the reflective appearance and luminance of the sample are shown in Table 1.

[0118] Comparative Example 3 The following components were stirred at room temperature for 5 hours to obtain a composition 5 for forming a functional layer. In the same manner as in Example 1, a hard coat layer and a low-reflection layer were formed on the substrate to obtain a low-reflection film consisting of a low-reflection layer / hard coat layer / substrate. Next, a cyclic olefin resin (COP) film was subjected to plasma treatment, and the prepared functional layer-forming resin compound 5 was applied to the plasma-treated surface using a bar coater, followed by drying at 70 ° C. for 3 minutes to obtain a laminate 8A consisting of a cyclic olefin resin (COP) film / functional layer 5. Subsequently, the substrate side of the low-reflection film and the functional layer 5 side of the laminate 8A were bonded via a 25 μm-thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation) to obtain a laminate 8B consisting of a low-reflection layer / hard coat layer / substrate / pressure-sensitive adhesive layer / functional layer 5 / COP film. Next, the COP film side of the laminate 8B was bonded to the QD-OLED panel via a 25 μm thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation) to obtain a sample for evaluating reflective appearance and luminance, which consisted of a low-reflection layer / hard coat layer / substrate / pressure-sensitive adhesive layer / functional layer 5 / COP film / pressure-sensitive adhesive layer / QD-OLED panel. The measurement results of the functional layer 5 and the laminate 8B, as well as the evaluation results of the reflective appearance and luminance of the sample, are shown in Table 1.

[0119] Comparative Example 4 Laminate 9 was obtained in the same manner as in Example 4, except that TAC was used instead of LR-TAC. The functional layer side of laminate 9 was then bonded to a QD-OLED panel via a 25 μm-thick pressure-sensitive adhesive layer (manufactured by Lintec Corporation) to obtain a sample for evaluating reflective appearance and luminance, consisting of substrate / functional layer 4 / pressure-sensitive adhesive layer / QD-OLED panel. The measurement results for functional layer 4 and laminate 9, as well as the evaluation results for reflective appearance and luminance of the sample, are shown in Table 1.

[0120]

[0121] The laminate of the present invention can suppress the reflective appearance caused by light reflection inside and outside the panel during black display and improve the brightness during white display in a QD-OLED. Therefore, it can be suitably used as a laminate included in a QD-OLED and located on the viewing side of the QD filter.

Claims

1. A laminate comprising a low-reflection film and a functional layer, wherein the low-reflection film has an average luminous reflectance of 0.05% or more and 5% or less and a total light transmittance of 93% or more, and the functional layer contains at least one dye, and satisfies the following formula (I): (Tt50° / Tt0°)×100≧60 formula (I) [wherein Tt50° is the transmittance of light with a wavelength of 550 nm that is incident on the functional layer at an incident angle of 50°, and Tt0° is the transmittance of light with a wavelength of 550 nm that is incident on the functional layer at an incident angle of 0°].

2. The laminate of claim 1, wherein the low-reflection film comprises a low-reflection layer and a substrate.

3. The laminate according to claim 2, comprising a low-reflection layer, a substrate, and a functional layer in this order.

4. The laminate according to claim 1, wherein the low-reflection film includes a low-reflection layer, and no substrate is laminated between the low-reflection layer and the functional layer.

5. The laminate according to claim 1, wherein the dye is at least one selected from the group consisting of a black dye and a dichroic dye.

6. The laminate according to claim 1, wherein the functional layer satisfies the following formula (II): (Tt50° / Tt0°)×100≧80 Formula (II).

7. The laminate according to claim 1, wherein the laminate from the low-reflection film to the functional layer has an average luminous reflectance of 0.01% or more and 1% or less, and a total light transmittance of 75% or more.

8. The laminate according to claim 1 for use in a quantum dot organic EL display device.

9. A display device comprising the laminate according to claim 1 and a quantum dot organic EL light-emitting panel.

10. The display device according to claim 9, wherein the low-reflection film is located on the viewing side of the functional layer.

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