A method and system for the measurement of wavefronts
By employing optical vortex beams with stable phase discontinuities, the method addresses scintillation and shot noise issues in wavefront measurement, achieving improved precision and replicability through dark point tracking.
WO2025206963A1PCT designated stage Publication Date: 2025-10-02POLITECHNA WROCLAWSKA +1
Patent Information
- Application Number
- PCT/PL2025/050021
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-03-26
- Filing Date
- 2025-03-17
- Publication Date
- 2025-10-02
Smart Images
Figure PL2025050021_02102025_PF_FP_ABST
Abstract
In one embodiment, a method of measurement of wavefronts according to the invention, wherein a beam emitted by coherent light source 1 passes through a system that forms it into a widened light beam, which system comprises first microscopic lens 2 and first lens 3, wherein the beam then illuminates analysed object 4 that modifies the wavefront of the light beam, the beam subsequently passes through an array of vortex lenses 5, which divides the beam into smaller fragments and introduces optical vortex beams with topological charges m into each fragment, simultaneously focusing them on detector 6 that analyses the image by recording the distribution of intensity and visualises the focused optical vortex beams with a characteristic point of discontinuity with a zero level of intensity in its centre.
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Citation Information
Patent Citations
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