Polymeric composition having resistance to both NOX discoloration and extrusion-processing degradation
WO2025207074A3PCT designated stage expired Publication Date: 2025-10-30SUMITOMO CHEM CO LTD +1
Patent Information
- Application Number
- PCT/US2024/010898
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-01-10
- Filing Date
- 2024-01-09
- Publication Date
- 2025-10-30
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Figure US2024010898_30102025_PF_FP_ABST
Abstract
A composition having: a themophastic; a first chemical compound having the structure: wherein, each R1, R2, R4, and R5 is independently selected and is a hydrogen atom, a C1-8 alkyl moiety, a C5-8 cycloalkyl moiety, a C6-12 alkylcycloalkyl moiety, a C7-12 arylalkyl moiety, or a C6-14 aryl moiety; each R3 is independently selected and is a hydrogen atom or a C1-8 alkyl moiety; X is a single bond, a sulfur atom, or a CHR6 moiety, wherein R6 is a hydrogen atom, a C1-8 alkyl moiety, or a C5-8 cycloalkyl moiety; A is a C2-8 alkylene moiety or an *COR7 moiety, wherein R7 is a single bond or a C1-8 alkylene moiety, and wherein the "*" character is used to confirm the positional understanding that the "C" atom in the "*COR7 moiety" is bonded to the adjacent "O" atom shown in the main structure; and one of Y and Z is a hydroxy moiety, a C1-8 alkoxy moiety or a C7-12 arylalkyloxy moiety, and the other is a hydrogen atom or a C1-8 alkyl moiety, and a second chemical compound having the structure: wherein each R1, R2, R3, R4 and R5 is independently selected and is a C10-18 alkyl moiety; n is an integer ranging from 3 to 11; and the sum of x1 + x2 is an integer ranging from 1-1000.
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Citation Information
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