System for collecting waste gas containing rare gas, and method for collecting waste gas containing rare gas

Abstract

The present invention relates to collecting rare gas, and more specifically to a system for collecting waste gas containing rare gas, and a method for collecting waste gas containing rare gas, the waste gas containing rare gas being discharged from a semiconductor manufacturing facility. The present invention provides a system for collecting waste gas containing rare gas, the system comprising: one or more first buffer tanks (100) connected to one or more exhaust lines (11) for discharging waste gas containing rare gas generated as a result of performing a semiconductor process, and temporarily storing the waste gas discharged through the exhaust lines (11); one or more first compressors (210) receiving the waste gas stored in the first buffer tanks (110) so as to primarily compress same, and one or more purification units (220) receiving first compressed waste gas compressed in the first compressors (210) so as to remove therefrom one or more predetermined materials to be removed; one or more second buffer tanks (300) receiving and temporarily storing purified waste gas purified in the purification units (220); one or more second compressors (410) for secondarily compressing the purified waste gas from the second buffer tanks (300); and one or more waste gas discharge units (540) for discharging second compressed waste gas compressed by the second compressors (410) to a waste gas collection tank (510).

Description

Waste gas recovery system and waste gas recovery method containing rare gases

[0001] The present invention relates to the recovery of rare gases, and more particularly, to a waste gas recovery system and a waste gas recovery method containing rare gases discharged from semiconductor manufacturing facilities.

[0002] As IT technologies such as smartphones, IoT, and artificial intelligence develop, demand for semiconductors is rapidly increasing.

[0003] Semiconductors are divided into memory and non-memory, and semiconductor manufacturing is done through various processes such as exposure, deposition, etching, and heat treatment, and metals, organic substances, and gases are used depending on each process.

[0004] In particular, semiconductor processes use expensive materials depending on specific processes, such as exposure processes that use rare gases such as neon as laser gas. Therefore, for productivity and profitability, it is highly desirable to recycle waste gases containing rare gases through recovery, separation, and purification.

[0005] However, there is a problem in that the recovery, separation, and purification processes of waste gas cannot be effectively performed due to the absence of a system for efficiently recovering waste gas containing rare gases such as neon for recycling of rare gases.

[0006] The purpose of the present invention is to provide a waste gas recovery system and a waste gas recovery method capable of efficiently recovering waste gas containing a rare gas by storing the waste gas in a rare gas recovery tank through compression and purification and then recompression, in order to solve the above-mentioned problems.

[0007] The present invention has been created to achieve the above-described object of the present invention, and the present invention comprises: at least one first buffer tank (100) connected to at least one exhaust line (11) for discharging waste gas containing a rare gas generated by performing a semiconductor process and temporarily storing the waste gas discharged through the exhaust line (11); at least one first compressor (210) for receiving the waste gas stored in the first buffer tank (110) and compressing it in the first stage; at least one purification unit (220) for receiving the first compressed waste gas compressed in the first compressor (210) and removing at least one predetermined target substance to be removed; at least one second buffer tank (300) for receiving the purified waste gas purified in the purification unit (220) and temporarily storing it; at least one second compressor (410) for secondarily compressing the purified waste gas from the second buffer tank (300); A waste gas recovery system including a rare gas is provided, characterized in that it includes at least one waste gas discharge unit (540) that discharges the second compressed waste gas compressed by the second compressor (410) into a waste gas recovery tank (510).

[0008] The above exhaust gas may contain neon.

[0009] And the substance to be removed may be at least one of H20 and CO2.

[0010] It may include one or more vacuum pumps (20) installed between the exhaust line (11) and the first buffer tank (100).

[0011] The above vacuum pumps (20) can be installed in multiple numbers in series or parallel.

[0012] The above purification unit (220) may be connected to a detection unit (230) to check whether the target substance to be removed is sufficiently removed.

[0013] The waste gas recovery system according to the present invention may include one or more moisture removal units (240) installed on the path of the waste gas flow from the upstream of the first buffer tank (100) to the downstream of the waste gas discharge unit (540) to remove moisture contained in the waste gas.

[0014] The above moisture removal unit (240) can perform primary moisture removal, and the above purification unit (220) can perform secondary moisture removal.

[0015] A detection unit (230) to check whether the target substance to be removed is sufficiently removed may be installed between the downstream of the moisture removal unit (240) and the upstream of the purification unit (220).

[0016] The above exhaust line (11) may be equipped with an exhaust blocking means to block exhaust when the pressure falls below a preset allowable pressure.

[0017] The above exhaust line (11) is additionally equipped with a pressure measuring sensor (11P) for measuring exhaust pressure, and when the pressure measured by the pressure measuring sensor (11P) falls below the allowable pressure, a valve connected to the exhaust line (11) can be operated to block exhaust through the exhaust line (11).

[0018] The present invention also provides a method for recovering waste gas containing a rare gas, characterized in that it comprises: a first temporary storage step of temporarily storing waste gas discharged through the exhaust line (11) by being connected to one or more exhaust lines (11) for discharging waste gas containing a rare gas generated by performing a semiconductor process; a first compression step of receiving the waste gas temporarily stored in the first temporary storage step and compressing it for the first time; a purification step of purifying the first compressed waste gas compressed in the first compression step by removing one or more predetermined removal target substances; a second temporary storage step of temporarily storing the purified waste gas purified in the purification step; a second compression step of secondarily compressing the purified waste gas stored in the second temporary storage step; and a discharge step of discharging the second compressed waste gas compressed in the second compression step to a waste gas recovery tank (510).

[0019] The above first temporary storage step can be performed by storing the waste gas discharged through the exhaust line (11) in the first buffer tank (100) by one or more vacuum pumps (20).

[0020] The method for recovering waste gas containing a rare gas according to the present invention may additionally include a moisture removal step for removing moisture contained in the waste gas.

[0021] The above moisture removal step can be performed between the first compression step and the purification step.

[0022] The above purification step may be performed as a second moisture step following the first moisture step performed in the above moisture removal step.

[0023] The method for recovering waste gas containing a rare gas according to the present invention may include an exhaust blocking step for blocking exhaust through the exhaust line (11) when the pressure in the exhaust line (11) falls below a preset allowable pressure before the first temporary storage step.

[0024] The waste gas recovery system and waste gas recovery method according to the present invention contain a rare gas, and have the advantage of efficiently recovering the waste gas by storing it in a rare gas recovery tank through recompression after compression and purification.

[0025] In particular, the waste gas recovery system and waste gas recovery method according to the present invention can maximize the recovery efficiency of waste gas by storing waste gas discharged through primary compression, purification, and secondary compression of waste gas containing rare gas in a large-capacity rare gas recovery tank and delivering the rare gas recovery tank to a rare gas extraction facility located at a remote location.

[0026] In addition, the rare gas recovery tank is configured as a high-pressure tank mounted on a high-pressure gas transport vehicle, so that delivery to a rare gas extraction facility located in a remote location can be performed more efficiently.

[0027] In addition, the recovery efficiency of waste gas can be maximized by setting the compression ratio of the first and second compression to an appropriate value according to the amount of waste gas discharged and the discharge speed.

[0028] FIG. 1 is a conceptual diagram showing an example of a configuration from a waste gas exhaust line to a first buffer tank as part of a waste gas recovery system containing a rare gas according to the present invention.

[0029] FIG. 2 is a conceptual diagram showing an example of a configuration up to the second buffer tank, connected to the first buffer tank illustrated in FIG. 1, as part of a waste gas recovery system containing a rare gas according to the present invention.

[0030] FIG. 3 is a conceptual diagram showing an example of a configuration up to a rare gas recovery tank in which waste gas is stored, connected to the gas pipe shown in FIG. 2, as part of a waste gas recovery system containing a rare gas according to the present invention.

[0031] Fig. 4 is a conceptual diagram showing a variation of the configuration example from the exhaust gas exhaust line illustrated in Fig. 1 to the first buffer tank.

[0032] Figure 5 is a conceptual diagram showing a modification of the configuration example up to the second buffer tank connected to the first buffer tank illustrated in Figure 2.

[0033] Figure 6 is a conceptual diagram showing a modification of the configuration example shown in Figure 3, including a rare gas recovery tank in which waste gas is stored and connected to the gas pipe.

[0034] Hereinafter, a waste gas recovery system and a waste gas recovery method containing a rare gas according to the present invention will be described with reference to the attached drawings.

[0035] A waste gas recovery system including a rare gas according to the present invention, as illustrated in FIGS. 1 to 3, comprises: at least one first buffer tank (100) connected to at least one exhaust line (11) for discharging waste gas including a rare gas generated by performing a semiconductor process and temporarily storing the waste gas discharged through the exhaust line (11); at least one first compressor (210) for receiving the waste gas stored in the first buffer tank (110) and compressing it in the first stage; at least one purification unit (220) for receiving the first compressed waste gas compressed in the first compressor (210) and removing at least one predetermined target substance to be removed; at least one second buffer tank (300) for receiving the purified waste gas purified in the purification unit (220) and temporarily storing it; at least one second compressor (410) for secondarily compressing the purified waste gas from the second buffer tank (300); It includes one or more waste gas discharge units (540) that discharge the second compressed waste gas compressed by the second compressor (410) into a rare gas recovery tank.

[0036] Here, the above exhaust line (11) is configured to discharge waste gas containing rare gases generated during semiconductor processing, and any gas line installed in a semiconductor production facility to discharge waste gas generated during semiconductor processing can be used.

[0037] And the above exhaust line (11) can be configured in various ways, such as having a vacuum pump of its own or being connected to a vacuum pump (20) of a waste gas recovery system containing a rare gas according to the present invention.

[0038] In addition, considering that it is desirable for the waste gas containing rare gases recovered by the waste gas recovery system according to the present invention to be large in volume, it is preferable that a plurality of the exhaust lines (11) are connected to the first buffer tank (100) described later.

[0039] For example, the exhaust gas recovery system according to the present invention may be connected to two exhaust lines (11) as shown in FIG. 1, and four exhaust lines (11) as shown in FIG. 3.

[0040] In addition, in order to increase the recovery efficiency when the waste gas recovery system according to the present invention is connected to a plurality of exhaust lines (11), it is preferable that an even number of exhaust lines (11), such as two exhaust lines, are connected.

[0041] For example, the exhaust gas recovery system according to the present invention can connect two exhaust lines (11) by a joining line (111), as shown in FIG. 4.

[0042] Meanwhile, the waste gas discharged from the exhaust line (11) may be discharged intermittently, repeatedly discharged during the first cycle (seconds to minutes) and then discharged to the atmosphere during the second cycle (seconds to minutes), rather than continuously discharged, depending on the characteristics of the process / equipment, such as the exposure process.

[0043] At this time, if the waste gas recovery system according to the present invention is continuously operated, the pressure of the exhaust line (11) may drop rapidly and fall below the allowable pressure range of the process / equipment such as the exposure process, which may cause malfunction or damage to the equipment.

[0044] Accordingly, the exhaust line (11) may be equipped with an exhaust blocking means, such as a check valve (not shown), that blocks exhaust when the pressure falls below a preset allowable pressure.

[0045] In addition, as shown in FIG. 4, the exhaust line (11) additionally installs a pressure measuring sensor (11P) for measuring exhaust pressure, and when the pressure measured by the pressure measuring sensor (11P) falls below the allowable pressure, exhaust through the exhaust line (11) can be blocked by blocking at least one of the valves (911, 921, 922, 931 to 937, 941, 942, 951, 952, 960, 961, 963, 981) described below.

[0046] Meanwhile, the waste gas recovered by the waste gas recovery system according to the present invention may be a gas containing a rare gas, and may be a variety of substances depending on the recovery target, such as a single element or a compound in which multiple elements are combined.

[0047] In particular, the waste gas recovered by the waste gas recovery system containing a rare gas according to the present invention may contain a rare gas such as neon.

[0048] Neon is used in various ways depending on the purpose of use in semiconductor processes, and can be used in lasers for performing exposure processes, and repeated exposure processes generate large amounts of neon-containing waste gas.

[0049] Meanwhile, waste gas containing neon can contain many substances, including neon, argon, H20, CO2, O2, NF3, and rare substances such as Xe.

[0050] The above first buffer tank (100) is connected to one or more exhaust lines (11) that discharge waste gas containing rare gases generated by performing a semiconductor process, and is configured to temporarily store the waste gas discharged through the exhaust lines (11), and various configurations are possible depending on the properties of the waste gas to be stored.

[0051] In particular, the first buffer tank (100) may have an appropriate capacity selected by considering the number of connected exhaust lines (11) and the amount of exhaust gas discharged, for example, the amount of exhaust gas discharged per hour.

[0052] Meanwhile, one or more vacuum pumps (20) may be installed between the exhaust line (11) and the first buffer tank (100).

[0053] The vacuum pump (20) is installed between the exhaust line (11) and the first buffer tank (100) and is configured to form a flow of waste gas so that the waste gas discharged through the exhaust line (11) can be stored in the first buffer tank (100). Appropriate specifications can be selected by considering the number of exhaust lines (11) and the amount of waste gas discharged, for example, the amount of discharged gas per hour.

[0054] And the above vacuum pump (20) can be connected in series and / or parallel to each exhaust line (11).

[0055] Meanwhile, in order to ensure smooth flow of exhaust gas when the above exhaust lines (11) are installed in multiple numbers, an upstream connection line (21) connecting multiple exhaust lines (11) and a downstream connection line (22) connecting multiple vacuum pumps (20) may be provided on the upstream and downstream sides based on the vacuum pump (20).

[0056] The above-mentioned upstream connection line (21) is a line that connects a plurality of exhaust lines (11) on the upstream side based on the vacuum pump (20), and various configurations are possible.

[0057] In addition, the above-mentioned upstream connection line (21) can be connected to the joining line (111) described above, as shown in FIG. 4.

[0058] At this time, the above-mentioned joining line (111) may be installed with a valve (981) for gas discharge / blocking for the upstream connection line (21).

[0059] The above downstream connection line (22) is a line that connects multiple vacuum pumps (20) on the downstream side based on the vacuum pump (20), and various configurations are possible.

[0060] Meanwhile, the upstream side connecting line (21) and the downstream side connecting line (22) may be connected by an auxiliary vacuum pump (30) that is separate from the vacuum pump (20) that is arranged in parallel with each other and connected to each exhaust line (11).

[0061] The above auxiliary vacuum pump (30) is a vacuum pump that connects the upstream connection line (21) and the downstream connection line (22) separately from the vacuum pump (20) connected to each exhaust line (11), and can be configured to operate when one of the vacuum pumps (20) connected to each exhaust line (11) is difficult to operate, such as when it breaks down.

[0062] Meanwhile, the vacuum pump (20) can be arranged in various ways considering the flow of waste gas between the exhaust line (11) and the first buffer tank (100), and can be installed in multiple numbers in series or parallel.

[0063] Meanwhile, as shown in FIG. 4, the exhaust line (11) may have two exhaust lines (11) connected to one merging line (111), and each merging line (111) may be connected to each upstream connection line (21).

[0064] At this time, if the above-mentioned joining line (111) is configured in multiple numbers, the upstream connecting line (21) to which each joining line (111) is connected can be connected to each other by an adjacent upstream connecting line (21) and a bypass line (112) for the purpose of ensuring the desired flow, blocking, and bypass of gas.

[0065] And, the above-mentioned bypass line (112) may be installed with one or more valves (982) so that it can be selectively bypassed to an adjacent upstream connection line (21).

[0066] The above first compressor (210) is configured to receive the waste gas stored in the first buffer tank (110) and compress it for the first time. Any configuration that can compress the waste gas is possible.

[0067] Meanwhile, it is preferable that the first compressor (210) is configured in multiple units for stable compression of the waste gas, and it is preferable that the multiple first compressors (210) are arranged in parallel with each other.

[0068] And the downstream side of the plurality of first compressors (210) can be connected by a connecting line (991) for bypassing of waste gas, etc.

[0069] Additionally, the downstream side of the plurality of first compressors (210) can be connected to one joining line (993), as shown in FIG. 5.

[0070] The above purification unit (220) is configured to receive the first compressed waste gas compressed in the first compressor (210) and remove one or more predetermined target substances to be removed, and various configurations are possible depending on the properties of the target substances to be removed.

[0071] Here, the substance to be removed may be at least one of H20 and CO2 when the waste gas is a neon-containing gas.

[0072] Meanwhile, the above purification unit (220) can be installed in series to correspond to each of the first compressors (210).

[0073] And the purification unit (220) may be connected to a detection unit (230) to check whether the target substance to be removed is sufficiently removed.

[0074] The above detection unit (230) is configured to check whether the target substance to be removed is sufficiently removed by the purification unit (220), and can have various configurations depending on the properties of the target substance to be removed.

[0075] For example, the detection unit (230) may be an analyzer that detects H20 and CO2 when the substances to be removed are H20 and CO2.

[0076] Meanwhile, the recovered waste gas may contain moisture (H20), and the waste gas contained in the waste gas may be liquefied through a compression process, etc., thereby reducing compression efficiency, or may accumulate in pipes or tanks located downstream, especially in the waste gas recovery tank (510), which may corrode the inside of the pipe or tank.

[0077] Accordingly, the waste gas recovery system according to the present invention may additionally include a moisture removal unit (240) for removing moisture contained in the waste gas.

[0078] The above moisture removal unit (240) is configured to remove moisture contained in waste gas and can have various configurations.

[0079] And the above moisture removal unit (240) can be installed one or more times at appropriate locations on the path of the waste gas flow from the upstream of the first buffer tank (100) to the downstream of the waste gas discharge unit (540).

[0080] In particular, the moisture removal unit (240) may be installed between the downstream of the first compressor (210) and the upstream of the purification unit (220), as shown in FIG. 5, in order to maximize moisture removal efficiency.

[0081] And, the moisture removal unit (240) may have one or more valves (935, 936) installed on the upstream and downstream sides to control the flow of waste gas.

[0082] In addition, the number of moisture removal units (240) installed may vary depending on the moisture removal capacity, and may be installed corresponding to the number of the first compressor (210).

[0083] Meanwhile, when the moisture removal unit (240) is installed, the detection unit (230) may be installed between the downstream of the moisture removal unit (240) and the upstream of the purification unit (220) in order to increase the efficiency of moisture detection and the operating efficiency of the purification unit (220) accordingly.

[0084] And, the detection unit (230) has valves (231, 232) installed on the upstream and downstream sides to control the flow of waste gas, and the downstream side of the detection unit (230) can be connected to the purification unit (220) so that the waste gas tested in the detection unit (230) flows back into the purification unit (220).

[0085] As described above, when the purification unit (220) is installed between the downstream of the moisture removal unit (240) and the upstream of the purification unit (220), the moisture removal result value of the moisture removal unit (240) is checked to control the moisture removal unit (240), and by controlling the amount of moisture removal in the purification unit (220) located on the downstream side, the operating efficiency of the purification unit (220) can be greatly increased.

[0086] For reference, the moisture removal unit (240) can maximize the moisture removal effect by first removing moisture (first removal amount) from 1000 PPM to 20 PPM among the moisture contained in the waste gas (first moisture removal), and the purification unit (220) can secondarily remove moisture (second removal amount) from 20 PPM to 0.1 PPM among the moisture contained in the waste gas (second moisture removal).

[0087] The above second buffer tank (300) is configured to temporarily store the purified waste gas delivered to the purification unit (220), and can have various configurations.

[0088] For example, the second buffer tank (300) may have an appropriate capacity selected in consideration of the discharge amount of the purified waste gas purified in the purification unit (220), for example, the discharge amount per hour.

[0089] In particular, considering that the volume of the waste gas is reduced as it is compressed in the first compressor (210), it is preferable to use a container having a smaller volume than that of the first buffer tank (100) for the second buffer tank (300).

[0090] For example, the volume of the second buffer tank (300) is preferably 0.5 to 0.75 times that of the first buffer tank (100), taking into account the compression ratio by the first compressor (210) and the volume change due to the removal of the target substance in the purification unit (220).

[0091] The above second compressor (410) is configured to secondarily compress the purified waste gas from the second buffer tank (300), and any configuration that can compress the waste gas is possible.

[0092] Meanwhile, it is preferable that the second compressor (410) is configured in multiple units for stable compression of the waste gas, and it is preferable that the multiple second compressors (410) are arranged in parallel.

[0093] And the downstream side of the plurality of second compressors (410) can be connected to one joining line (992), as shown in FIG. 3.

[0094] Meanwhile, the waste gas discharge unit (540) is configured to discharge the second compressed waste gas compressed by the second compressor (410) to the waste gas recovery tank (510), and various configurations described below are possible depending on the number of waste gas recovery tanks (510) installed and the gas supply structure to the waste gas recovery tank (510).

[0095] For example, the above-mentioned waste gas recovery tank (510) may be configured as a high-pressure tank mounted on a high-pressure gas transport vehicle.

[0096] At this time, the waste gas discharge unit (540) may be configured to be connected to the waste gas recovery tank (510).

[0097] And, the above waste gas discharge unit (540) may be installed with a valve (961) for gas discharge / blocking to the waste gas recovery tank (510).

[0098] Meanwhile, the above-mentioned joining line (992) can be connected to a temporary recovery tank (530) that can temporarily store the second compressed waste gas compressed by the second compressor (410).

[0099] The above temporary recovery tank section (530) is a separate configuration from the waste gas recovery tank (510), and is a configuration that temporarily stores the second compressed waste gas compressed by the second compressor (410) in the temporary recovery tank (520), and various configurations are possible.

[0100] In particular, the temporary recovery tank section (530) can be used to temporarily store initial waste gas generated during the operation of the waste gas recovery system containing a rare gas according to the present invention, or waste gas when replacing the waste gas recovery tank (510).

[0101] In addition, the above joining line (992) may be combined with a sample gas extraction unit (550) for extracting a portion of the second compressed waste gas compressed by the second compressor (410) in order to test the composition, quality, etc. of the waste gas recovered to the waste gas recovery tank (510).

[0102] The above sample gas extraction unit (550) is configured to extract a portion of the second compressed waste gas compressed by the second compressor (410) in order to test the composition, quality, etc. of the waste gas recovered by the waste gas recovery tank (510), and can be configured in various ways, such as by being configured as a cylinder in which a small amount of gas is stored.

[0103] Here, the above joining line (992) may be installed with a valve (964) for opening and closing the gas flow to the sample gas extraction unit (550).

[0104] Meanwhile, in FIGS. 1 to 6, a number of valves (911 to 916, 921, 922, 931 to 937, 941, 942, 951, 952, 960, 961, 963) may be installed at appropriate locations to ensure the desired flow, blocking, and bypass of gas.

[0105] The above valves (911 to 916, 921, 922, 931 to 937, 941, 942, 951, 952, 960, 961, 963) are configured to be installed in appropriate locations for the smooth flow, blocking, and bypass of gas, and can be configured in various ways, such as being automatically controlled by a control unit (not shown) or manually controlled.

[0106] The waste gas recovery system containing a rare gas according to the present invention having the above configuration can discharge waste gas discharged through the exhaust line (11) through primary compression, purification after primary compression, and secondary compression after purification to a waste gas recovery tank (510).

[0107] Meanwhile, when a sufficient amount of waste gas is stored, the waste gas recovery tank (510) is moved to the installation location of a rare gas extraction facility for extracting rare gases contained in the waste gas installed at a remote location, and is connected to the rare gas extraction facility to recover a preset type of component from the waste gas.

[0108] For example, the above-mentioned noble gas extraction facility is a facility that extracts a noble gas from waste gas containing a noble gas such as neon, and can have various configurations depending on the type of noble gas to be extracted. For example, it can be a facility that extracts neon.

[0109] Meanwhile, according to another aspect of the present invention, a waste gas recovery method can be implemented, characterized by including: a first temporary storage step of temporarily storing waste gas discharged through the exhaust line (11) by being connected to one or more exhaust lines (11) for discharging waste gas containing a rare gas generated by performing a semiconductor process; a first compression step of receiving the waste gas temporarily stored in the first temporary storage step and compressing it for the first time; a purification step of purifying the first compressed waste gas compressed in the first compression step by removing one or more predetermined removal target substances; a second temporary storage step of temporarily storing the purified waste gas purified in the purification step; a second compression step of secondarily compressing the purified waste gas stored in the second temporary storage step; and a discharge step of discharging the second compressed waste gas compressed in the second compression step to a waste gas recovery tank (510).

[0110] Meanwhile, the first temporary storage step can be performed by storing the waste gas discharged through the exhaust line (11) in the first buffer tank (100) by one or more vacuum pumps (20).

[0111] The method for recovering waste gas containing a rare gas according to the present invention may additionally include a moisture removal step for removing moisture contained in the waste gas.

[0112] The above moisture removal step can be performed between the first compression step and the purification step.

[0113] The above purification step may be performed as a second moisture step following the first moisture step performed in the above moisture removal step.

[0114] The method for recovering waste gas containing a rare gas according to the present invention may include an exhaust blocking step for blocking exhaust through the exhaust line (11) when the pressure in the exhaust line (11) falls below a preset allowable pressure before the first temporary storage step.

[0115] The above is only a description of some of the preferred embodiments that can be implemented by the present invention, and as is well known, the scope of the present invention should not be construed as being limited to the above embodiments, and the technical ideas of the present invention described above and the technical ideas that are fundamental to the present invention are all included in the scope of the present invention.

Claims

1. One or more first buffer tanks (100) connected to one or more exhaust lines (11) for discharging waste gas containing rare gases generated by performing a semiconductor process and temporarily storing the waste gas discharged through the exhaust lines (11); One or more first compressors (210) that receive the waste gas stored in the first buffer tank (110) and compress it for the first time, One or more purification units (220) that receive the compressed first compressed waste gas from the first compressor (210) and remove one or more predetermined target substances; One or more second buffer tanks (300) for temporarily storing the purified waste gas delivered to the above purification unit (220); One or more second compressors (410) for secondarily compressing the purified waste gas from the second buffer tank (300); A waste gas recovery system containing a rare gas, characterized in that it includes at least one waste gas discharge unit (540) that discharges the second compressed waste gas compressed by the second compressor (410) to a waste gas recovery tank (510).

2. In claim 1, A waste gas recovery system containing a rare gas, characterized in that the waste gas contains neon.

3. In claim 1 or claim 2, A waste gas recovery system containing a rare gas, characterized in that the substance to be removed is at least one of H20 and CO2.

4. In claim 1, A waste gas recovery system containing a rare gas, characterized in that it includes at least one vacuum pump (20) installed between the exhaust line (11) and the first buffer tank (100).

5. In claim 4, A waste gas recovery system containing a rare gas, characterized in that the above vacuum pump (20) is installed in multiple numbers in series or parallel.

6. In claim 1, A waste gas recovery system characterized in that the above purification unit (220) is connected to a detection unit (230) for checking whether the target substance to be removed is sufficiently removed.

7. In claim 1, One or more moisture removal units (240) installed on the path of waste gas flow from the upstream of the first buffer tank (100) to the downstream of the waste gas discharge unit (540) to remove moisture contained in the waste gas.

8. In claim 7, A waste gas recovery system characterized in that the above moisture removal unit (240) performs primary moisture removal, and the above purification unit (220) performs secondary moisture removal.

9. In claim 7, A waste gas recovery system characterized in that a detection unit (230) for checking whether the target substance to be removed is sufficiently removed is installed between the downstream of the moisture removal unit (240) and the upstream of the purification unit (220).

10. In claim 1, A waste gas recovery system characterized in that the above exhaust line (11) is equipped with an exhaust blocking means that blocks exhaust when the pressure falls below a preset allowable pressure.

11. In claim 1, The above exhaust line (11) is A pressure measuring sensor (11P) is additionally installed to measure exhaust pressure, A waste gas recovery system characterized in that when the pressure measured by the pressure measuring sensor (11P) falls below the allowable pressure, the valve connected to the exhaust line (11) is operated to block exhaust through the exhaust line (11).

12. A first temporary storage step that is connected to one or more exhaust lines (11) that discharge waste gas containing rare gases generated by performing a semiconductor process and temporarily stores the waste gas discharged through the exhaust lines (11); A first compression step for receiving the waste gas temporarily stored in the first temporary storage step and compressing it for the first time; A purification step for purifying the first compressed waste gas compressed in the first compression step by removing one or more preset removal target substances; A second temporary storage step for temporarily storing the purified waste gas purified in the above purification step; A second compression step for secondarily compressing the purified waste gas stored in the second temporary storage step; A method for recovering waste gas containing a rare gas, characterized in that it includes a discharge step of discharging the second compressed waste gas compressed in the second compression step to a waste gas recovery tank (510).

13. In claim 12, A method for recovering waste gas containing a rare gas, characterized in that the waste gas contains neon.

14. In claim 12 or claim 13, A method for recovering waste gas containing a rare gas, wherein the substance to be removed is at least one of H20 and O2.

15. In claim 12, The above first temporary storage step is, A method for recovering waste gas containing a rare gas, characterized in that the waste gas discharged through the exhaust line (11) is stored in a first buffer tank (100) by one or more vacuum pumps (20).

16. In claim 15, A method for recovering waste gas containing a rare gas, characterized in that the above vacuum pump (20) is installed in multiple numbers in series or parallel.

17. In claim 12, A method for recovering waste gas containing a rare gas, characterized in that it additionally includes a moisture removal step for removing moisture contained in the waste gas.

18. In claim 17, The above moisture removal step is, A method for recovering waste gas containing a rare gas, characterized in that it is performed between the first compression step and the purification step.

19. In claim 18, A method for recovering waste gas containing a rare gas, characterized in that the above purification step is performed as a second moisture step following the first moisture step performed in the above moisture removal step.

20. In claim 17, A method for recovering waste gas containing a rare gas, characterized in that it includes an exhaust blocking step for blocking exhaust through the exhaust line (11) when the pressure in the exhaust line (11) falls below a preset allowable pressure before the first temporary storage step.

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