Improvements in relation to microlithography or nanolithography apparatus' and processes

Abstract

A roller arrangement (10; 110) for a microlithography or nanolithography apparatus (1000) comprises a roller (12; 112) configured and / or operable to form a microscale or nanoscale pattern on a substrate (S). The roller (12;112) comprises a pattern layer (14; 114) configured and / or operable to form the microscale or nanoscale pattern on the substrate (S) and one or more inflatable elements (16; 116) reconfigurable between a first configuration in which the inflatable element (16; 116) defines a first outer diameter and a second configuration in which the inflatable element (16; 116) defines a second, larger, outer diameter. Reconfiguration of at least one of the inflatable elements (16; 116) from its first configuration to its second configuration urges the pattern layer (14; 114) radially outwards. A gas arrangement (1016) is configured and / or operable to direct a gas towards and / or into an interface between the roller (12; 112) and the substrate (S).

Description

[0001] IMPROVEMENTS IN RELATION TO MICROLITHOGRAPHY OR

[0002] NANOLITHOGRAPHY APPARATUS’ AND PROCESSES

[0003] FIELD

[0004] This relates to improvements in relation to microlithography or nanolithography apparatus’ and processes.

[0005] BACKGROUND

[0006] Lithographic processes and equipment are used extensively in microelectronics industries, perhaps most notably in the semiconductor industry in the construction of integrated circuits and related components.

[0007] Currently, photolithography is the predominant method of construction of microscale and, more recently, nanoscale fabrications. However, with the continuing development of nanotechnology a number of alternative processes and equipment have been developed, including Extreme Ultraviolet Lithography (EUVL), Electron Beam Lithography (EBL), Directed Self Assembly (DSA), Scanning Probe Lithography (SPL), Nanoimprint Lithography (NIL) and Nanoelectrode nanolithography (NEL).

[0008] However, while each of the above techniques offers advantages over conventional photolithography they also have drawbacks. For example, EUVL systems suffer from source reliability, line edge roughness and detectivity issues. EBL and SPL systems are limited by low throughput. DSA systems suffer from overlay, detectivity, tool design and placement accuracy issues. NIL and NEL systems also provide low throughput, high detectivity and / or are ineffective for use with non-planar substrates.

[0009] SUMMARY

[0010] Aspects of the present disclosure relate to improvements in relation to microlithography or nanolithography apparatus’ and processes, and include a roller arrangement for a microlithography or nanolithography apparatus; a gas supply arrangement for a microlithography or nanolithography apparatus; a microlithography or nanolithography apparatus comprising said roller arrangement and / or said gas supply arrangement; and associated microlithography or nanolithography processes.

[0011] According to a first aspect, there is provided a roller arrangement for a microlithography or nanolithography apparatus, the roller arrangement comprising: a roller configured and / or operable to form a microscale or nanoscale pattern on a substrate, the roller comprising: a pattern layer configured and / or operable to form the microscale or nanoscale pattern on the substrate; and one or more inflatable elements, wherein the roller is reconfigurable, by inflation of at least one of said inflatable elements, from a first configuration in which the roller defines a first outer diameter to a second configuration in which the roller defines a second, larger, outer diameter.

[0012] In use, and as will be described further below, the roller arrangement forms part of a microlithography or nanolithography apparatus, the roller being reconfigurable, by virtue of the inflation of at least one of said inflatable elements, from a first configuration in which the roller defines a first outer diameter to a second configuration in which the roller defines a second, larger, outer diameter. In the second, larger diameter, configuration, the pattern layer engages or moves further into engagement with a substrate so as to facilitate the formation of a microscale or nanoscale pattern on the substrate.

[0013] Beneficially, the roller arrangement may significantly improve pattern transfer uniformity and / or significantly increased throughput (and consequential reduced manufacturing cost) in comparison to conventional technologies. The roller arrangement may permit even pressure distribution over the whole contact area between the roller and the substrate. When used in an Nanoelectrode nanolithography (NEL) apparatus, for example, this permits oxidation to occur uniformly over the substrate. Moreover, the roller arrangement permits a uniform pattern to be formed over a larger area than, e g. conventional flat stamps. The roller arrangement may facilitate continuous or near continuous production runs.

[0014] Moreover, the roller arrangement may facilitate increased conformance between the roller and the substrate and / or may prevent or at least mitigate air becoming trapped between the roller and the substrate during production, which may otherwise increase the likelihood of defects in the resulting product.

[0015] Alternatively or additionally, the provision of a roller arrangement having a roller which is reconfigurable from a first configuration in which the roller defines a first outer diameter and a second configuration in which the roller defines a second, larger, outer diameter may facilitate the patterning of non-planar substrates, such as may be used in the optics field for example.

[0016] The above factors, amongst others, may facilitate the manufacture of products or devices - in particular but not exclusively larger area nanoscale patterned products - at an industrial scale / level of throughput not previously achievable with conventional technologies, thereby encouraging greater adoption and proliferation of nanoscale products and / or devices such as next-generation quantum technologies, heat-assisted magnetic recording (HAMR) hard disks, atomic clocks, photonic integrated circuits (PICs), plasmonic solar cells, light detection and ranging (LIDAR) devices and solid-state nanopore-based DNA, for example.

[0017] As described above, the roller arrangement comprises one or more inflatable elements.

[0018] The inflatable elements may, for example, comprise or define a chamber for receiving an inflation fluid. The inflation fluid may comprise or take the form of a gas, e.g. air. Alternatively, the inflation fluid may comprise or take the form of a liquid.

[0019] In use, a pressure force resulting from the pressure of the inflation fluid acting on an area of a wall of the chamber, more particularly the circumferential wall of the chamber, may radially expand the inflatable element from its first configuration to its second configuration. The roller may comprise a core.

[0020] In some embodiments, the one or more inflatable elements may be formed by or in the core.

[0021] The core may be constructed, e.g. partially or wholly constructed, from an elastomeric material. For example, at least a circumferential wall of the core may be constructed from the elastomeric material, so as to facilitate radial expansion of the core. The elastomeric material may comprise or take the form of a synthetic rubber, e.g. EPDM or Nitrile Rubber. Beneficially, the elastomeric material may provide chemical resistance and / or durability.

[0022] Alternatively, one or more of the inflatable elements may be formed by or in an inflatable member disposed on and / or at least partially around the core.

[0023] In such embodiments, the one or more inflatable members may be separate from the core. The inflatable members may be disposed radially outwardly, e.g. disposed at least partially around, the core. The inflatable member may be coupled to the core.

[0024] In embodiments where the one or more inflatable elements are formed by or in an inflatable member, the core may be solid e.g. may comprise or take the form of a nonhollow construction.

[0025] The one or more inflatable members may be constructed from any suitable material. For example, one or more of the inflatable members may be constructed, e.g. partially or wholly constructed, from an elastomeric material. At least a circumferential wall of one or more of the inflatable members may be constructed from the elastomeric material, so as to facilitate expansion of the inflatable member. The elastomeric material may comprise or take the form of Fluoroelastomer e.g, FKM or Viton or Silicone rubber. Beneficially, the elastomeric material may provide chemical resistance, durability, high elasticity, and / or resilience.

[0026] As described above, the roller comprises a pattern layer configured and / or operable to form the microscale or nanoscale pattern on the substrate. The pattern layer may be disposed outwardly of, e.g. may be disposed around, the core.

[0027] Where the roller comprises one or more inflatable members, the pattern layer may be disposed radially outwardly of, e.g. may be disposed around, the inflatable member or members.

[0028] The pattern layer may comprise one or more protrusions, more particularly a plurality of protrusions, formed in an outer surface of the pattern layer.

[0029] The protrusions may be provided on all or a part of the pattern layer.

[0030] The protrusions may comprise or take the form of microscale protrusions.

[0031] The protrusions may comprise or take the form of nanoscale protrusions.

[0032] The protrusions may be formed by any suitable process.

[0033] For example, the protrusions may be created by diamond turning or electron beam lithography.

[0034] Alternatively, the pattern layer may be formed by additive manufacturing techniques.

[0035] The one or more protrusions may be formed directly onto the outer surface, e.g. outer circumferential surface, of the pattern layer.

[0036] Alternatively, the pattern layer may be formed as a planar member onto which the one or more protrusions are formed, the pattern layer then being configured and / or operable to be formed, e.g. wrapped, around the core and / or inflatable member.

[0037] It will be understood that the pattern layer may comprise a separate element from the one or more inflatable elements or alternatively may be integrally formed with the one or more inflatable elements. For example, the pattern layer may comprise or may be provided on the outer circumferential surface of the one or more inflatable elements. The roller may comprise an outer layer.

[0038] It will be understood that the term “outer layer” means the radially outermost or further layer from the core of the roller.

[0039] In particular embodiments, the outer layer may comprise or take the form of an electrically conductive layer.

[0040] The outer layer may be constructed, e.g. wholly or partially constructed, from an electrically conductive material. More particularly, the outer layer may be constructed, e.g. wholly or partially constructed, from an electrically conductive metal such as copper.

[0041] Beneficially, the provision of an electrically conductive outer layer facilitates use of the roller arrangement in a Nanoelectrode nanolithography (NEL) apparatus, whereby a voltage is applied between the electrically conductive outer layer of the roller and the substrate on contact therebetween.

[0042] In particular embodiments, the outer layer may comprise or take the form of a coating or film, e.g. a thin film.

[0043] The outer layer may be flexible.

[0044] Beneficially, the provision of a flexible outer layer may facilitate improved conformance between the roller and the substrate.

[0045] It will be understood that the outer layer may comprise a separate element from the pattern layer or alternatively may be integrally formed with the pattern layer. For example, the outer layer may comprise or may be provided on the outer circumferential surface of the pattern layer.

[0046] The roller may comprise one or more elastomeric layers. The one or more elastomeric layers may be configured and / or operable to increase the elasticity of the roller and / or increase the contact area between the roller and the substrate.

[0047] The one or more elastomeric layers may be disposed outwardly, e.g. may be disposed at least partially around, the core. The one or more elastomeric layers may be disposed outwardly, e.g. may be disposed at least partially around, the inflatable member. The one or more elastomeric layers may be disposed inwardly, e.g. below, the pattern layer. The one or more elastomeric layers may be interposed between the core and the pattern layer.

[0048] The one or more elastomeric layers are constructed from an elastomeric material, such as synthetic rubber or the like.

[0049] The roller arrangement may comprise, may be coupled to or operatively associated with a fluid communication arrangement.

[0050] The fluid communication arrangement may be configured and / or operable to supply the inflation fluid to the roller, e.g. to the chambers of the one or more inflatable elements.

[0051] The fluid communication arrangement may comprise a fluid passage formed or otherwise provided in or on the roller.

[0052] According to a second aspect, there is provided a microlithography or nanolithography apparatus comprising: the roller arrangement of the first aspect; and a support arrangement configured and / or operable to carry and / or facilitate movement of the roller arrangement relative to the substrate.

[0053] Beneficially, the apparatus may significantly improve pattern transfer uniformity and / or significantly increased throughput (and consequential reduced manufacturing cost) in comparison to conventional technologies. The apparatus may permit even pressure distribution over the whole contact area between the roller and the substrate. When used in an NEL apparatus, for example, this permits oxidation to occur uniformly over the substrate. Moreover, the apparatus permits a uniform pattern to be formed over a larger area than, e.g. conventional flat stamps. The apparatus may facilitate continuous or near continuous production runs.

[0054] Moreover, the apparatus may facilitate increased conformance between the roller and the substrate and / or may prevent or at least mitigate air becoming trapped between the roller and the substrate during production, which may otherwise increase the likelihood of defects in the resulting product.

[0055] Alternatively or additionally, the apparatus may facilitate the patterning of non- planar substrates, such as may be used in the optics field for example.

[0056] The above factors, amongst others, may facilitate the manufacture of products or devices - in particular but not exclusively larger area nanoscale patterned products - at an industrial scale / level of throughput not previously achievable with conventional technologies, thereby encouraging greater adoption and proliferation of nanoscale products and / or devices such as next-generation quantum technologies, heat-assisted magnetic recording (HAMR) hard disks, atomic clocks, photonic integrated circuits (PICs), plasmonic solar cells, light detection and ranging (LIDAR) devices and solid-state nanopore-based DNA, for example.

[0057] As described above, the support arrangement is configured and / or operable to carry the roller arrangement.

[0058] The support arrangement may comprise a coupling arrangement configured and / or operable to couple the roller arrangement to the support arrangement.

[0059] The coupling arrangement may be configured and / or operable to rotatably couple the roller arrangement to the support arrangement.

[0060] The coupling arrangement may comprise a bearing arrangement. The bearing arrangement may comprise one or more bearings. In particular embodiments, the bearing arrangement may comprise or take the form of an air bearing, air bushing or the like. Beneficially, the provision of an air bearing, air bushing or the like may permit the roller to rotate about its longitudinal axis frictionlessly or near frictionlessly.

[0061] As described above, the support arrangement is configured and / or operable to facilitate movement of the roller arrangement.

[0062] The support arrangement may comprise or take the form of a motion control system.

[0063] The support arrangement may be configured and / or operable to move the roller arrangement linearly relative to the substrate.

[0064] In particular embodiments, the support arrangement may be configured and / or operable to move the roller arrangement vertically up and / or down, which movement may be defined as along a z-axis.

[0065] The support arrangement may comprise, may be coupled to or operatively associated with an actuator arrangement configured and / or operable to move the roller arrangement.

[0066] In particular embodiments, the actuator arrangement may comprise a carriage. The roller arrangement may be carried by the carriage. The actuator arrangement may comprise a track. The carriage may be carried by the track.

[0067] In use, the carriage may be disposed on and configured and / or operable to move linearly, e.g. slide, along the track.

[0068] However, it will be understood that alternative arrangements for moving the roller arrangement relative to the substrate may be provided.

[0069] The support arrangement may be configured and / or operable to carry and / or facilitate movement of the substrate.

[0070] The support arrangement may comprise a base onto which the substrate is disposed, e.g. mounted. The support arrangement may be configured and / or operable to move the substrate along one or more axes. In particular embodiments, the support arrangement may be configured and / or operable to move the substrate in a horizontal plane, which movement may be defined as along x and / or y axes.

[0071] The support arrangement may comprise an actuator arrangement configured and / or operable to move the base along the x and / or y axes.

[0072] The apparatus may comprise, may be coupled to or operatively associated with a control system.

[0073] In use, amongst other things, the control system may be configured and / or operable to control the position of the roller arrangement and / or the support arrangement.

[0074] The apparatus may comprise, may be coupled to and / or operatively associated with a gas supply arrangement.

[0075] The gas supply arrangement may be configured and / or operable to direct a gas, e.g. gaseous ethyl alcohol, towards and / or into an interface between the roller and the substrate.

[0076] Beneficially, the supply of the gas e.g. gaseous ethyl alcohol, towards and / or into an interface between the roller and the substrate facilitates a significantly increased rate of oxidation in comparison to conventional NEL systems. This in turn facilitates a reduction in the time taken for the completion of the process, such that higher levels of throughput can be achieved. For example, testing has shown that oxidation rate may be increased by 10 times compared to conventional systems, facilitating a throughput of up to and including 1013pm2per hour.

[0077] The gas supply arrangement may comprise an outlet arrangement.

[0078] The outlet arrangement may comprise one or more outlets. At least one of the outlets may comprise or take the form of a nozzle. The gas supply arrangement may comprise, may be coupled to a gas supply. The gas supply may comprise a gas container, e.g. a pressurised gas container.

[0079] The gas supply arrangement may comprise a conduit.

[0080] The conduit may be configured and / or operable to communicate the gas from the gas supply to the outlet arrangement.

[0081] The conduit may extend at least partially along the length of the roller.

[0082] The conduit may extend from the support arrangement. For example, the conduit may be cantilevered from the support arrangement.

[0083] A third aspect relates to a method of roller-type nanoimprint lithography (RNIL) using the roller arrangement of the first aspect and / or the apparatus of the second aspect.

[0084] According to a fourth aspect, there is provided a gas arrangement for a microlithography or nanolithography apparatus, wherein the gas arrangement is configured and / or operable to direct a gas, e.g. gaseous ethyl alcohol, towards and / or into an interface between the roller and the substrate.

[0085] Beneficially, the supply of the gas e.g. gaseous ethyl alcohol, towards and / or into an interface between the roller and the substrate facilitates a significantly increased rate of oxidation in comparison to conventional NEL systems. This in turn facilitates a reduction in the time taken for the completion of the process, such that higher levels of throughput can be achieved. For example, testing has shown that oxidation rate may be increased by 10 times compared to conventional systems, facilitating a throughput of up to and including 1013pm2per hour.

[0086] The invention is defined by the appended claims. However, for the purposes of the present disclosure it will be understood that any of the features defined above or described below may be utilised in isolation or in combination. For example, features described above in relation to one of the above aspects or below in relation to the detailed description may be utilised in any other aspect, or together form a new aspect.

[0087] BRIEF DESCRIPTION OF DRAWINGS

[0088] These and other aspects will now be described with reference to the accompanying drawings, of which:

[0089] Figure 1 shows a perspective view of a microlithography or nanolithography apparatus comprising a roller arrangement according to the present disclosure;

[0090] Figure 2 shows a cross-sectional view of the roller of the roller arrangement shown in Figure 1;

[0091] Figure 3 shows an enlarged view of region A of the roller shown in Figure 2;

[0092] Figure 4 shows a longitudinal section view of the roller shown in Figure 2;

[0093] Figure 5 shows a cross-sectional view of an alternative arrangement according to the present disclosure;

[0094] Figure 6 shows an enlarged view of region A’ of the roller shown in Figure 5; and Figure 7 shows a longitudinal section view of the roller shown in Figure 5.

[0095] DETAILED DESCRIPTION OF DRAWINGS

[0096] Figures 1 to 4 of the accompanying drawings illustrate a roller arrangement, generally denoted 10, according to a first embodiment of the present disclosure.

[0097] In use, and as will be described further below, the roller arrangement 10 forms part of a microlithography or nanolithography apparatus (1000, Figure 1), and has a roller 12 comprising a pattern layer (14, Figures 2 & 3) configured and / or operable to form the microscale or nanoscale pattern on a substrate S and an inflatable element (16, Figures 2 & 3). The roller 12 is reconfigurable, by virtue of the inflation of the inflatable element 16, from a first configuration in which the roller 12 defines a first outer diameter to a second configuration in which the roller 12 defines a second, larger, outer diameter. In the second, larger diameter, configuration, the pattern layer 14 engages or moves further into engagement with the substrate S so as to facilitate the formation of a microscale or nanoscale pattern on the substrate S.

[0098] Beneficially, the roller arrangement 10 significantly improves pattern transfer uniformity and / or significantly increased throughput (and consequential reduced manufacturing cost) in comparison to conventional technologies. The roller arrangement 10 permits even pressure distribution over the whole contact area between the roller 12 and the substrate S. When used in an NEL apparatus, for example, this permits oxidation to occur uniformly over the substrate. Moreover, the roller arrangement 10 permits a uniform pattern to be formed over a larger area than, e.g. conventional flat stamps. The roller arrangement 10 facilitates continuous or near continuous production runs.

[0099] Moreover, the roller arrangement 10 facilitates increased conformance between the roller 12 and the substrate S and / or may prevent or at least mitigate air becoming trapped between the roller 12 and the substrate S during production, which may otherwise increase the likelihood of defects in the resulting product.

[0100] Alternatively or additionally, the provision of a roller arrangement 10 having a roller 12 which is reconfigurable facilitates the patterning of non-planar substrates, such as may be used in the optics field for example.

[0101] The above factors, amongst others, may facilitate the manufacture of products or devices - in particular but not exclusively larger area nanoscale patterned products - at an industrial scale / level of throughput not previously achievable with conventional technologies, thereby encouraging greater adoption and proliferation of nanoscale products and / or devices such as next-generation quantum technologies, heat-assisted magnetic recording (HAMR) hard disks, atomic clocks, photonic integrated circuits (PICs), plasmonic solar cells, light detection and ranging (LIDAR) devices and solid-state nanopore-based DNA, for example.

[0102] As shown, the inflatable element 16 comprises or defines a chamber 18 for receiving an inflation fluid, which in the illustrated roller arrangement 10 take the form of pressurised air.

[0103] In use, a force F resulting from the pressure of the inflation fluid acting on the chamber 18, more particularly the inner circumferential wall 20 of the chamber 18, radially expands the inflatable element 16 from its first configuration to its second configuration.

[0104] Beneficially, reconfiguration of the inflatable element 16 urges the pattern layer 14 into engagement or enhance engagement with the substrate S.

[0105] As shown in Figures 2 and 3, in the illustrated roller arrangement 10 the roller 12 comprise a core 22, the inflatable element 16 being disposed on and around the core 22. However, as will be described further below, the inflatable element 16 may alternatively be formed by or in the core itself.

[0106] The inflatable element 16 is constructed from the elastomeric material.

[0107] Beneficially, the provision of an inflatable element 16 constructed from the elastomeric material facilitates radial expansion of the inflatable element 16 from its first configuration to its second configuration.

[0108] As shown, the pattern layer 14 is disposed outwardly of, i.e. is disposed around, the inflatable element 16 and comprises microscale or nanoscale protrusions (shown diagrammatically as 24 in Figure 3) formed in its outer surface.

[0109] In the illustrated roller arrangement 10, the protrusions 24 take the form of nanoscale protrusions.

[0110] The protrusions 24 may be formed by any suitable process. For example, the protrusions may be created by diamond turning or electron beam lithography. Alternatively, the pattern layer 14 may be formed by additive manufacturing techniques. The protrusions 24 may be formed directly onto the outer surface, e.g. outer circumferential surface, of the pattern layer 14. Alternatively, the pattern layer 14 may be formed as a planar member onto which the one or more protrusions 24 are formed, the pattern layer 14 then being configured and / or operable to be formed, e.g. wrapped, around the core 22.

[0111] As shown, the roller 12 comprises an outer layer 26.

[0112] In the illustrated roller arrangement 10, the outer layer 26 comprises or takes the form of an electrically conductive layer, the outer layer 26 being constructed from an electrically conductive material. In the illustrated roller arrangement 10, the outer layer 26 is constructed from copper.

[0113] Beneficially, the provision of an electrically conductive outer layer 26 facilitates use of the roller arrangement 10 in an NEL apparatus, whereby a voltage is applied between the electrically conductive outer layer of the roller 12 and the substrate S on contact therebetween.

[0114] In the illustrated roller arrangement 10, the outer layer 26 comprises or takes the form of a coating or film, e.g. a thin film.

[0115] Beneficially, the provision of an outer layer 26 in the form of coating of film, results in the outer layer 26 being flexible, thereby facilitating improved conformance between the roller 12 and the substrate S.

[0116] In the illustrated roller arrangement 10, the roller 12 comprises an elastomeric layer 28.

[0117] The elastomeric layer 28 is configured and / or operable to increase the elasticity of the roller 12 and / or increase the contact area between the roller 12 and the substrate S.

[0118] As shown, the elastomeric layer 28 is interposed between the core 22 and the pattern layer 14.

[0119] In the illustrated roller arrangement 10, the elastomeric layer 28 is constructed synthetic rubber. However, it will be understood that the elastomeric layer 28 may be constructed from any suitable elastomeric material.

[0120] While the illustrated roller arrangement 10 comprises an elastomeric layer 28, in other embodiments the elastomeric layer 28 may be omitted.

[0121] As shown, the roller arrangement 10 comprises a fluid communication arrangement, generally denoted 30, configured and / or operable to supply the inflation fluid to the chamber 18 of the roller 12.

[0122] The fluid communication arrangement 30 comprises a fluid passage 32 formed or otherwise provided in the core 22 of the roller 12 and which communicates with the chamber 18. Referring again in particular to Figure 1 of the accompany drawings, the roller arrangement 10 form part of a microlithography or nanolithography apparatus 1000, the roller 12 being reconfigurable from a first configuration in which the roller 12 defines a first outer diameter to a second configuration in which the roller 12 defines a second, larger, outer diameter. In the second, larger diameter, configuration, the roller 12 engages or moves further into engagement with a substrate S so as to facilitate the formation of a microscale or nanoscale pattern on the substrate S.

[0123] Beneficially, the apparatus 1000 significantly improves pattern transfer uniformity and / or significantly increased throughput (and consequential reduced manufacturing cost) in comparison to conventional technologies. The apparatus 1000 permits even pressure distribution over the whole contact area between the roller 12 and the substrate S. When used in an NEL apparatus, for example, this permits oxidation to occur uniformly over the substrate S. Moreover, the apparatus 1000 permits a uniform pattern to be formed over a larger area than, e.g. conventional flat stamps. The apparatus 1000 facilitates continuous or near continuous production runs.

[0124] Moreover, the apparatus 1000 facilitates increased conformance between the roller 12 and the substrate S and / or may prevent or at least mitigate air becoming trapped between the roller 12 and the substrate S during production, which may otherwise increase the likelihood of defects in the resulting product.

[0125] Alternatively or additionally, the apparatus 1000 facilitates the patterning of non- planar substrates, such as may be used in the optics field for example.

[0126] The above factors, amongst others, may facilitate the manufacture of products or devices - in particular but not exclusively larger area nanoscale patterned products - at an industrial scale / level of throughput not previously achievable with conventional technologies, thereby encouraging greater adoption and proliferation of nanoscale products and / or devices such as next-generation quantum technologies, heat-assisted magnetic recording (HAMR) hard disks, atomic clocks, photonic integrated circuits (PICs), plasmonic solar cells, light detection and ranging (LIDAR) devices and solid-state nanopore-based DNA, for example. As shown in Figure 1, the apparatus 1000 comprises a support arrangement, generally denoted 1002, configured and / or operable to carry the roller arrangement 12.

[0127] The support arrangement 1002 comprises a coupling arrangement, generally denoted 1004, the coupling arrangement 1002 configured and / or operable to rotatably couple the roller arrangement 12 to the support arrangement 1002.

[0128] In the illustrated apparatus 1000, the coupling arrangement 1004 takes the form of an air bushing.

[0129] Beneficially, the provision of an air bushing permits the roller 12 to rotate about its longitudinal axis x frictionlessly or near frictionlessly.

[0130] As described above, the support arrangement 1002 is configured and / or operable to facilitate movement of the roller arrangement 10.

[0131] In the illustrated apparatus 1000, the support arrangement 1002 comprises or take the form of a motion control system.

[0132] The support arrangement 1002 is configured and / or operable to move the roller arrangement 10 linearly relative to the substrate S and, in the illustrated apparatus 1000, the support arrangement 1002 is configured and / or operable to move the roller arrangement 10 vertically up and / or down, which movement may be defined as along a z-axis.

[0133] As shown, the support arrangement 1002 comprises an actuator arrangement 1006 configured and / or operable to move the roller arrangement 10.

[0134] In the illustrated apparatus 1000, the actuator arrangement 1006 comprises a carriage 1008 which carries the roller arrangement 12 and a track 1010 which carries the carriage 1008.

[0135] In use, the carriage 1008 is disposed on and configured and / or operable to move linearly, e.g. slide, along the track 1010. However, it will be understood that alternative arrangements for moving the roller arrangement 10 relative to the substrate S may be provided.

[0136] The support arrangement 1002 is also configured and / or operable to carry and / or facilitate movement of the substrate S.

[0137] As shown, the support arrangement 1002 comprises a base 1012 onto which the substrate S is mounted.

[0138] The support arrangement 1002 is configured and / or operable to move the substrate S along one or more axes. In the illustrated apparatus 1000, the support arrangement 1002 is configured and / or operable to move the substrate S in a horizontal plane, which movement may be defined as along x and / or y axes.

[0139] The apparatus 1000 comprises a control system, shown diagrammatically as 1014.

[0140] In use, amongst other things, the control system 1014 may be configured and / or operable to control the position of the roller arrangement 10 and / or the support arrangement 1002.

[0141] As shown in Figure 1 , the apparatus 1000 comprises, is coupled to and / or operatively associated with a gas supply arrangement, generally denoted 1016.

[0142] The gas supply arrangement 1016 is configured and / or operable to direct a gas, e.g. gaseous ethyl alcohol, towards and / or into an interface between the roller 12 and the substrate S.

[0143] Beneficially, the supply of the gas e.g. gaseous ethyl alcohol, towards and / or into an interface between the roller 12 and the substrate S facilitates a significantly increased rate of oxidation in comparison to conventional NEL systems. This in turn facilitates a reduction in the time taken for the completion of the process, such that higher levels of throughput can be achieved. For example, testing has shown that oxidation rate may be increased by 10 times compared to conventional systems, facilitating a throughput of up to and including 1013pm2per hour. As shown, the gas supply arrangement 1016 comprise an outlet arrangement, generally denoted 1018, comprising one or more outlets 1020 in the form of nozzles.

[0144] The gas supply arrangement 1016 comprises or is coupled to a gas supply (not shown).

[0145] It will be understood that various modifications may be made without departing from the scope of the invention as defined in the claims.

[0146] For example, Figures 5, 6 and 7 of the accompanying drawings show an alternative roller arrangement 110.

[0147] As shown, the roller arrangement 110 has a roller 112 comprising a pattern layer 114 configured and / or operable to form the microscale or nanoscale pattern on a substrate S and an inflatable element 116. The roller 112 is reconfigurable, by virtue of the inflation of the inflatable element 116, from a first configuration in which the roller 112 defines a first outer diameter to a second configuration in which the roller 112 defines a second, larger, outer diameter. In the second, larger diameter, configuration, the pattern layer 114 engages or moves further into engagement with the substrate S so as to facilitate the formation of a microscale or nanoscale pattern on the substrate S.

[0148] As shown, the inflatable element 116 comprises or defines a chamber 118 for receiving an inflation fluid, which in the illustrated roller arrangement 110 take the form of pressurised air.

[0149] In use, a force F resulting from the pressure of the inflation fluid acting on the chamber 118, more particularly the inner circumferential wall 120 of the chamber 118, radially expands the inflatable element 116 from its first configuration to its second configuration.

[0150] Beneficially, reconfiguration of the inflatable element 116 urges the pattern layer 114 into engagement or enhance engagement with the substrate S. As shown in Figures 5 and 7, whereas in the roller arrangement 10 the inflatable element 116 is formed as a separate inflatable member, in the roller arrangement 110 the inflatable element 116 forms the core of the roller 112.

[0151] The inflatable element 116 is constructed from the elastomeric material.

[0152] Beneficially, the provision of an inflatable element 116 constructed from the elastomeric material facilitates radial expansion of the inflatable element 116 from its first configuration to its second configuration.

[0153] As shown, the pattern layer 114 is disposed outwardly of, i.e. is disposed around, the inflatable element 116 and comprises microscale or nanoscale protrusions (shown diagrammatically as 124 in Figure 6) formed in its outer surface.

[0154] In the illustrated roller arrangement 110, the protrusions 124 take the form of nanoscale protrusions.

[0155] As shown, the roller 112 comprises an outer layer 126.

[0156] In the illustrated roller arrangement 110, the outer layer 126 comprises or takes the form of an electrically conductive layer, the outer layer 126 being constructed from an electrically conductive material. In the illustrated roller arrangement 110, the outer layer 126 is constructed from copper.

[0157] Beneficially, the provision of an electrically conductive outer layer 126 facilitates use of the roller arrangement 110 in an NEL apparatus, whereby a voltage is applied between the electrically conductive outer layer of the roller 112 and the substrate S on contact therebetween.

[0158] In the illustrated roller arrangement 110, the outer layer 126 comprises or takes the form of a coating or film, e.g. a thin film.

[0159] Beneficially, the provision of an outer layer 126 in the form of coating of film, results in the outer layer 126 being flexible, thereby facilitating improved conformance between the roller 112 and the substrate S. In the illustrated roller arrangement 110, the roller 112 comprises an elastomeric layer 128.

[0160] The elastomeric layer 128 is configured and / or operable to increase the elasticity of the roller 112 and / or increase the contact area between the roller 112 and the substrate S.

[0161] In the illustrated roller arrangement 110, the elastomeric layer 128 is constructed synthetic rubber. However, it will be understood that the elastomeric layer 128 may be constructed from any suitable elastomeric material.

[0162] As shown, the roller arrangement 110 comprises a fluid communication arrangement, generally denoted 130, configured and / or operable to supply the inflation fluid to the chamber 118 of the roller 112.

[0163] The fluid communication arrangement 130 comprises a fluid passage 132 formed or otherwise provided in the core 22 of the roller 12 and which communicates with the chamber 18.

Claims

CLAIMS1. A roller arrangement for a microlithography or nanolithography apparatus, the roller arrangement comprising: a roller configured and / or operable to form a microscale or nanoscale pattern on a substrate, the roller comprising: a pattern layer configured and / or operable to form the microscale or nanoscale pattern on the substrate; and one or more inflatable elements reconfigurable between a first configuration in which the inflatable element defines a first outer diameter and a second configuration in which the inflatable element defines a second, larger, outer diameter, wherein reconfiguration of at least one of the inflatable elements from its first configuration to its second configuration urges the pattern layer radially outwards.

2. The roller arrangement of claim 1 , wherein the roller comprises a core.

3. The roller arrangement of claim 2, wherein one or more of the inflatable elements is formed by or in the core.

4. The roller arrangement of claim 2, wherein one or more of the inflatable elements is formed by or in an inflatable member disposed on and / or at least partially around the core.

5. The roller arrangement of any preceding claim, wherein the roller comprises an outer layer disposed on the pattern layer.

6. The roller arrangement of claim 5, wherein the outer layer comprises or takes the form of an electrically conductive layer.

7. The roller arrangement of claim 5 or 6, wherein the outer layer comprises or takes the form of a coating or film.

8. The roller arrangement of claim 5, 6 or 7, wherein the outer layer is flexible.

9. The roller arrangement of any preceding claim, comprising one or more elastomeric layers.

10. The roller arrangement of claim 9, wherein the one or more elastomeric layers are interposed between the core and the pattern layer.

11. The roller arrangement of any preceding claim, wherein the roller comprises, is coupled to or is operatively associated with a fluid communication arrangement configured and / or operable to supply inflation fluid to the one or more inflatable elements.

12. A microlithography or nanolithography apparatus comprising: the roller arrangement of any preceding claim; and a support arrangement configured and / or operable to carry and / or facilitate movement of the roller arrangement relative to the substrate.

13. The apparatus of claim 12, wherein the support arrangement comprises or takes the form of a motion control system.

14. The apparatus of claim 12 or 13, wherein the support arrangement comprises a coupling arrangement configured and / or operable to couple the roller arrangement to the support arrangement.

15. The apparatus of claim 14, wherein the coupling arrangement comprises a bearing arrangement, and wherein the bearing arrangement comprises or takes the form of an air bearing or air bushing.

16. The apparatus of any one of claims 12 to 15, wherein the apparatus comprises, is coupled to and / or operatively associated with a gas supply arrangement configured and / or operable to direct a gas towards and / or into an interface between the roller and the substrate, the gas arrangement comprising: an outlet arrangement comprising one or more outlets; a conduit configured and / or operable to communicate the gas from a gas supply to the outlet arrangement.

17. A method of roller-type nanoimprint lithography (RNIL) using the roller arrangement of any one of claims 1 to 11 and / or the apparatus of any one of claims 12 to 16.

18. A gas arrangement for a microlithography or nanolithography apparatus, wherein the gas arrangement is configured and / or operable to direct a gas towards and / or into an interface between the roller and the substrate, the gas arrangement comprising: an outlet arrangement comprising one or more outlets; a conduit configured and / or operable to communicate the gas from a gas supply to the outlet arrangement.

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