Article and method for manufacturing article

Abstract

Provided are an article having a surface treatment layer excellent in wear resistance, and a method for manufacturing same.　This article has a surface treatment layer (20) on a base material (10). The surface treatment layer has a peak in an infrared absorption spectrum within a wave number range of 2, 850.6 to 2,851.1 cm-1, said spectrum being obtained through ATR measurement.

Description

Article and method for manufacturing article

[0001] The present disclosure relates to articles and methods of making articles.

[0002] In recent years, technologies for making the surfaces of optical articles less susceptible to fingerprints and easier to remove dirt in order to improve appearance and visibility have become widespread in eyeglass lenses, wearable devices, touch panel displays, etc. As a specific method for improving performance such as appearance and visibility, a method of performing a surface treatment on the surface of an article using a surface treatment agent is known.

[0003] For example, Patent Document 1 describes an article including a layer formed from a specific siloxane group-containing silane compound having a divalent linear organopolysiloxane group and a hydrolyzable silyl group.

[0004] International Publication No. 2023 / 017830

[0005] Furthermore, there is a demand for an article having a surface treatment layer with excellent abrasion resistance.

[0006] The present disclosure has been made in view of the above circumstances, and aims to provide an article having a surface treatment layer with excellent abrasion resistance and a method for manufacturing the same.

[0007] The present disclosure includes the following aspects: <1> An article having a surface treatment layer on a substrate, wherein the surface treatment layer has an infrared absorption spectrum measured by a total reflection measurement method with a wave number of 2,850.6 to 2,851.1 cm －１ <2> An article having a peak within the range of (R １０ ) ３ Si-, (R １０ ) ３ Ge-, (R １０ ) ３ Sn-, (R １０ ) ３ C- and CF ３ O-, provided that R １０and each independently represent an alkyl group. <3> The article according to <1> or <2>, wherein the surface treatment layer contains a hydrocarbon chain having 19 or more carbon atoms. <4> The article according to any one of <1> to <3>, wherein the surface treatment layer is formed using a surface treatment agent, and the surface treatment agent contains a compound (A) having a group represented by the following formula (T) and a group represented by the following formula (S). (R １ ) ３ M １ -Q １ -(SiR ２ ２ -O) ｐ１ -...(T) -Si(R ６ ) ｎ L ３－ｎ …(S) However, R １ are each independently an alkyl group or (R ４ ) ３ M １ -R ５ - and R ４ are each independently an alkyl group; R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １ are each independently Si, Sn, Ge or C, and Q １ are each independently a single bond, an oxygen atom, or an alkylene group; R ２ are each independently an alkyl group, p1 is each independently an integer of 0 to 500, R ６ are each independently a monovalent hydrocarbon group, L is each independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group, and n is an integer of 0 to 2. <5> The article according to <4>, wherein the compound (A) is represented by the following formula (A1): (T １ ) ｑ１ -Q ２ -R ７ -Q ３ -Si(R ６ ) ｎ L ３－ｎ ...(A1) However, T １is a group represented by the formula (T), and Q ２ represents a single bond or a (q1+1)-valent linking group other than an alkylene group, ３ is a single bond or a divalent linking group other than an alkylene group, and R ７ is an alkylene group having 19 or more carbon atoms, and q1 is an integer of 1 to 3. <6> The article according to any one of <1> to <5>, wherein the surface treatment layer does not contain fluorine atoms. <7> The article according to any one of <1> to <6>, wherein the surface treatment layer has a thickness of 1 to 100 nm. <8> The article according to any one of <1> to <7>, which is an optical member. <9> The article according to any one of <1> to <8>, which is a display or a touch panel. <10> A method for producing an article, comprising surface treating a substrate with a surface treatment agent to produce an article having a surface treatment layer formed on the substrate, wherein the surface treatment agent contains a compound (A) having a group represented by the following formula (T) and a group represented by the following formula (S). (R １ ) ３ M １ -Q １ -(SiR ２ ２ -O) ｐ１ -...(T) -Si(R ６ ) ｎ L ３－ｎ …(S) However, R １ are each independently an alkyl group or (R ４ ) ３ M １ -R ５ - and R ４ are each independently an alkyl group; R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １ are each independently Si, Sn, Ge or C, and Q １ are each independently a single bond, an oxygen atom, or an alkylene group; R ２ are each independently an alkyl group, p1 is each independently an integer of 0 to 500, R ６are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n is an integer of 0 to 2.

[0008] The present disclosure provides an article having a surface treatment layer with excellent abrasion resistance and a method for manufacturing the same.

[0009] 1 is a schematic diagram used to explain the relationship between the state of a surface treatment agent in a surface treatment layer and an infrared absorption spectrum. 2 is a schematic diagram used to explain the relationship between the state of a surface treatment layer and an infrared absorption spectrum.

[0010] In the present disclosure, when a numerical range is indicated using "to", the numerical values ​​before and after "to" are included as the minimum and maximum values, respectively. In the present disclosure, when a numerical range is indicated in a stepped manner, the upper or lower limit value of one numerical range may be replaced with the upper or lower limit value of another stepped numerical range. Furthermore, in the numerical ranges described herein, the upper or lower limit value of that numerical range may be replaced with a value shown in the Examples. In the present disclosure, the term "surface treatment layer" refers to a layer formed on the surface of a substrate by surface treatment. In the present disclosure, when a compound or group is represented by a specific formula (X), the compound or group represented by the formula (X) may be referred to as compound (X) or compound X, and group (X) or group X, respectively. In the present disclosure, the term "organo(poly)siloxane residue" refers to an organosiloxane residue or organopolysiloxane residue. In the present disclosure, "Me" represents a methyl group, and "Et" represents an ethyl group. In the present disclosure, when a chemical formula contains a plurality of identical symbols, the identical symbols may represent the same structure as each other, or may represent different structures within a specified range.

[0011] [Article] The article of the present disclosure is an article having a surface treatment layer on a substrate, wherein the surface treatment layer has an infrared absorption spectrum measured by an attenuated total reflectance (ATR) method, the infrared absorption spectrum having a wave number of 2,850.6 to 2,851.1 cm －１ The peak is in the range of

[0012] The article of the present disclosure has particularly excellent abrasion resistance when the infrared absorption spectrum obtained from the surface treatment layer has the above-mentioned specific peak. The reason for this is unclear, but is presumed as follows. Refer to FIGS. 1A and 1B. FIGS. 1A and 1B are both schematic cross-sectional views of an article having a surface treatment layer 20 containing a surface treatment agent 21 on a substrate 10. In the example of FIG. 1B, the surface treatment agent 21 exists with its base end attached to the substrate side and its carbon chain bent. On the other hand, in the example of FIG. 1A, the surface treatment agent 21 exists with its base end attached to the substrate side and its carbon chain extended. In the surface treatment layer 20 of FIG. 1A, the surface treatment agent 21 is likely to be aligned on the substrate surface, and the surface treatment agent 21 is likely to be arranged at a high density. As a result, the durability, such as abrasion resistance, and the liquid repellency, such as water repellency and oil repellency, of the surface treatment layer are superior to the example of FIG. 1B. Here, in the infrared absorption spectrum (ATR-IR) obtained by measuring by the ATR method, the wave number is 2,850 to 2,854 cm －１ The peaks in the range are CH ２ This peak corresponds to symmetric stretching. The longer the alkyl chain to be measured is stretched, the smaller the wave number of this peak tends to be. ２ The wave number of the peak corresponding to the symmetric stretching is presumed to be correlated with the state of the molecules in the surface treatment layer. ２ As described above, the peak corresponding to symmetric stretching has a relatively small wavenumber. Therefore, it is presumed that the surface treatment agent in the surface treatment layer exists in a stretched state and is aligned as shown in Figure 1A. Therefore, the present article having a surface treatment layer having the above-mentioned specific peak has excellent abrasion resistance, water repellency, oil repellency, fingerprint wiping removability, and durability.

[0013] In this disclosure, the IR spectrum used is that obtained by measurement using the ATR method. Unlike the KBr tablet method, which uses a crushed sample, the ATR method obtains a spectrum that reflects the state of the surface treatment agent in the surface treatment layer. ATR-IR can be measured, for example, using an FT-IR device to which an ATR accessory can be connected. Examples of such FT-IR devices include the Nicolet is5 manufactured by Thermo Fisher Scientific. More specifically, a crystal is placed on the surface treatment layer of the article, and the spectrum is measured at an incident angle of 60 to 65°. To obtain a clear peak, it is preferable to use a germanium crystal.

[0014] <Surface Treatment Layer> The surface treatment layer may be formed on a part of the surface of the substrate, or may be formed on the entire surface of the substrate. The surface treatment layer may be spread in the form of a film on the surface of the substrate, or may be scattered in the form of dots.

[0015] The thickness of the surface treatment layer is preferably 1 to 100 nm, more preferably 1 to 50 nm. If the thickness of the surface treatment layer is 1 nm or more, the effect of the surface treatment is likely to be sufficient. If the thickness of the surface treatment layer is 100 nm or less, the utilization efficiency is high. The thickness of the surface treatment layer can be calculated from the oscillation period of the interference pattern obtained by X-ray reflectivity using a thin film analysis X-ray diffractometer (product name "ATX-G", manufactured by RIGAKU Corporation).

[0016] The surface treatment layer is (R １０ ) ３ Si-, (R １０ ) ３ Ge-, (R １０ ) ３ Sn-, (R １０ ) ３ C- and CF ３ O-, where R １０ are each independently an alkyl group. By arranging any of the above groups on the air interface side of the surface treatment layer, water repellency, oil repellency, and fingerprint wiping removability are further improved. In addition, the surface treatment layer may be in an embodiment that does not contain fluorine atoms. １０The alkyl group in may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R １０ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0017] In one embodiment, the surface treatment layer is a layer that has been surface-treated with a surface treatment agent and is disposed on a substrate. The configuration of the surface treatment agent will be described below with an example.

[0018] <<Surface Treatment Agent>> In one embodiment, the surface treatment agent may be composed of the compound (A) described below, may be a composition containing the compound (A) and a liquid medium, or may further contain other components in addition to the compound (A) and the liquid medium. A surface treatment agent containing the compound (A) makes it easier to obtain a surface treatment layer having the specific infrared absorption spectrum. However, in the article of the present disclosure, the compound (A) is only an example, and the surface treatment agent is not limited to one containing the compound (A). In addition, the compound (A) is contained in the surface treatment layer in a state in which hydrolysis of some or all of the reactive silyl groups has progressed and a dehydration condensation reaction of the silanol groups has progressed.

[0019] (Compound (A)) Compound (A) has a group represented by the following formula (T) and a group represented by the following formula (S). (R １ ) ３ M １ -Q １ -(SiR ２ ２ -O) ｐ１ -...(T) -Si(R ６ ) ｎ L ３－ｎ …(S) However, R １ are each independently an alkyl group or (R ４ ) ３ M１ -R ５ - and R ４ are each independently an alkyl group; R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １ are each independently Si, Sn, Ge or C, and Q １ are each independently a single bond, an oxygen atom, or an alkylene group; R ２ are each independently an alkyl group, p1 is each independently an integer of 0 to 500, R ６ are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n is an integer of 0 to 2.

[0020] R １ is an alkyl group, or (R ４ ) ３ M １ -R ５ - is. R １ The alkyl group in may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R １ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0021] The above R ４ The alkyl group of the above R １ In order to further improve the liquid repellency, R ４ The alkyl group in M ​​is preferably a methyl group or an ethyl group, and more preferably a methyl group. １ is Si, Sn, Ge or C. In terms of availability of raw materials, M １ is preferably Si or C.

[0022] The above R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms. ５ The alkylene group of R may be linear or branched. ５ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -, -CH(CH ３ ) CH ２ CH ２ -, -CH(CH ２ CH ３ ) CH ２ CH ２ -, -CH ２ C(CH ２ ) ２ CH ２ -, -CH ２ CH (CH ３ ) CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH (CH ３ ) CH ２ CH ２ - etc. ５ When R is a branched alkylene group, the number of carbon atoms in the branched chain is preferably 1 to 2, and more preferably 1 (i.e., a methyl group), in order to further improve wear resistance. ５From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or an alkylene group having 1 to 5 carbon atoms, and even more preferably an oxygen atom or an alkylene group having 1 to 4 carbon atoms.

[0023] Q １ is a single bond, an oxygen atom, or an alkylene group. １ The alkylene group may be linear or branched. １ The alkylene group in Q is preferably a linear alkylene group, more preferably a linear alkylene group having 1 to 6 carbon atoms. １ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ - etc. １ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or a straight-chain alkylene group having 1 to 6 carbon atoms, and even more preferably an oxygen atom or a straight-chain alkylene group having 1 to 4 carbon atoms.

[0024] (SiR ２ ２ -O) ｐ１ represents an organo(poly)siloxane residue. ２ The alkyl group in R may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. ２Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0025] p1 is an integer of 0 to 500. From the viewpoint of improving liquid repellency, p1 is preferably 1 to 500, more preferably 3 to 350, even more preferably 3 to 200, particularly preferably 9 to 50, extremely preferably 11 to 30, and most preferably 11 to 25. On the other hand, from the viewpoint of improving durability, p1 is preferably 0 to 25, more preferably 0 to 10, even more preferably 0 to 2, particularly preferably 0 to 1, and extremely preferably 0.

[0026] The group (T) may be a group consisting of only hydrocarbons, or may be a group containing one or more elements selected from O, Si, Sn, and Ge.

[0027] The number of groups (T) in the compound (A) may be 1 or more, and preferably 1 to 3. When the compound (A) has two or more groups (T), it may have a structure in which one atom has multiple groups (T) as substituents, for example, as in the following group (T1): T ｑ１ -M ２ R ３ ３－ｑ１ -* (T1) where T is a group represented by the formula (T), and M ２ is Si, Sn, Ge or C, R ３ are each independently a hydrogen atom or an alkyl group, and q1 is an integer of 2 to 3. ２ R ３ ３－ｑ１ Q ２ constitutes part or all of the

[0028] The above M ２ is Si, Sn, Ge or C. In terms of availability of raw materials, M ２ is preferably Si or C. ３ The alkyl group of R １ The alkyl group may be the same as the alkyl group in the above, and preferred embodiments are also the same.

[0029] Examples of the group (T1) include the following groups: where p is an integer of 1 to 500. Also, * indicates the bonding position to other groups.

[0030]

[0031] In the group (S), R ６ is a hydrocarbon group. ６ Examples of the hydrocarbon group include an aliphatic hydrocarbon group and an aromatic hydrocarbon group. Among these, the hydrocarbon group is preferably an aliphatic hydrocarbon group, and more preferably an alkyl group. The alkyl group may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group, but a linear alkyl group is preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R ６ The hydrocarbon group is preferably a methyl group, an ethyl group, an n-propyl group, or an n-butyl group, and more preferably a methyl group.

[0032] Each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group. A hydrolyzable group is a group that becomes a hydroxyl group through a hydrolysis reaction. That is, a hydrolyzable silyl group represented by Si-L becomes a silanol group represented by Si-OH through a hydrolysis reaction. The silanol groups further react with each other to form Si-O-Si bonds. Furthermore, the silanol groups can undergo a dehydration condensation reaction with silanol groups derived from oxides present on the surface of the substrate to form Si-O-Si bonds.

[0033] Examples of hydrolyzable groups include alkoxy groups, aryloxy groups, halogen atoms, acyl groups, acyloxy groups, dialkylamino groups, and isocyanato groups (-NCO). The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. The aryloxy group is preferably an aryloxy group having 3 to 10 carbon atoms. However, the aryl group of the aryloxy group includes a heteroaryl group. The halogen atom is preferably a chlorine atom. The acyl group is preferably an acyl group having 1 to 6 carbon atoms. The acyloxy group is preferably an acyloxy group having 1 to 6 carbon atoms.

[0034] The group having a hydrolyzable group may be, for example, any of the groups having a hydrolyzable group exemplified above. Ａ -L Ｂ is preferred. Ａ is an alkylene group, and L Ｂ is a hydrolyzable group. The alkylene group preferably has 1 to 10 carbon atoms. Ｂ The hydrolyzable group represented by the formula (I) has the same meaning as the hydrolyzable group represented by L described above, and the preferred embodiments are also the same.

[0035] Among these, from the viewpoint of ease of production of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms or a halogen atom. From the viewpoint of less outgassing during coating and superior storage stability of the compound, L is preferably an alkoxy group having 1 to 4 carbon atoms, and more preferably an ethoxy group or a methoxy group.

[0036] Each n is independently an integer of 0 to 2. n is preferably 0 or 1, and more preferably 0. The presence of a plurality of Ls strengthens the adhesion of the surface treatment layer to the substrate. When n is 1 or less, the plurality of Ls present in one molecule may be the same or different from each other. From the viewpoint of easy availability of raw materials and ease of production of the compound, it is preferable that the plurality of Ls are the same. When n is 2, the plurality of Rs present in one molecule ６ may be the same or different from each other. From the viewpoint of availability of raw materials and ease of production of the compound, it is preferable to use a plurality of R ６ are preferably the same.

[0037] The compound (A) preferably contains an alkylene group having 19 or more carbon atoms. It is presumed that the inclusion of such a relatively long-chain alkylene group in the compound (A) facilitates the formation of a densely aligned array of compounds (A) in which the group (S) is located on the substrate surface side and the group (T) is located on the air-interface side in the surface treatment layer. As a result, the liquid repellency and fingerprint wiping ability are further improved, and the abrasion resistance is also improved.

[0038] In the alkylene group having 19 or more carbon atoms, the upper limit of the carbon number is not particularly limited, but may be, for example, 100 or less, and is preferably 36 or less from the viewpoint of ease of production of compound (A). The alkylene group having 19 or more carbon atoms may be linear or branched, but is preferably a linear alkylene group from the viewpoint of facilitating high-density alignment of compound (A). In the case of a branched alkylene group, the number of carbon atoms excluding the branch carbons (the number of secondary carbons linked) is preferably 19 or more.

[0039] The compound (A) is preferably a compound represented by the following formula (A1) from the viewpoint of further improving liquid repellency, fingerprint wiping properties, and abrasion resistance: １ ) ｑ１ -Q ２ -R ７ -Q ３ -Si(R ６ ) ｎ L ３－ｎ ...(A1) However, T １ is a group represented by the formula (T), and Q ２ represents a single bond or a (q1+1)-valent linking group other than an alkylene group, ３ is a single bond or a divalent linking group other than an alkylene group, and R ７ is an alkylene group having 19 or more carbon atoms, q1 is an integer of 1 to 3, and R ６ , L and n are the same as those in the group (S).

[0040] R ７ is a group containing an alkylene group having 19 or more carbon atoms. ７ The number of carbon atoms in R is preferably 19 to 100, and more preferably 19 to 36. ７ The alkylene group in R may be linear or branched. ７ is preferably a straight-chain alkylene group.

[0041] The above Q ２ is preferably a group represented by the following formula (Q2): (**) ｑ１ -M ２ R ３ ３－ｑ１ -R ２２-Q ２２ -* ... (Q2) However, M ２ is Si, Sn, Ge or C, R ３ are each independently a hydrogen atom or an alkyl group, ２２ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２２ is a single bond or an alkylene group, and q1 is an integer of 1 to 3. * is R ７ ** is the bonding position with T １ This is the bonding position with

[0042] M ２ is Si, Sn, Ge or C, and in terms of availability of raw materials, M ２ is preferably Si or C. In addition, from the viewpoint of the stability of the compound, T １ M ２ When the atom at the bonding position with M is an oxygen atom, ２ is preferably Si. ３ The alkyl group of R １ The alkyl groups are the same as those in the alkyl groups in M. ２ If C, then R ３ is preferably a hydrogen atom or an alkyl group having 1 to 10 carbon atoms. ２ When is Si, Sn or Ge, R ３ is preferably an alkyl group having 1 to 10 carbon atoms.

[0043] The above Q ３ is preferably a group represented by the following formula (Q3): ２３ -R ２３ -** ... (Q3) However, Q ２３ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O)２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or a phenylene group, R ２３ is a single bond or an alkylene group, * is R ７ ** is the bonding position with Si(R ６ ) ｎ L ３－ｎ This is the bonding position with

[0044] R ２２ and R ２３ The alkylene group in R may be linear or branched, but is preferably a linear alkylene group in that the compound (A) is easily aligned at high density. ２２ and R ２３ The number of carbon atoms in the alkylene group may be 1 or more. The number of carbon atoms may be 1 to 100, 1 to 36, or 1 to 12.

[0045] "-R ２２ -Q ２２ -R ７ -Q ２３ -R ２３ Examples of the group represented by "-" include the following: where n1 is an integer of 18 or more, and * is M ２ R ３ ３－ｑ１ ** is the bonding position with Si(R ６ ) ｎ L ３－ｎ This is the bonding position with

[0046]

[0047] Specific examples of compound (A) include the following, where n2 is an integer of 0 to 500. In the formula below, the carbon atom at one end of the alkylene group is assigned the number "1," and the carbon atom at the other end is assigned the number of carbon atoms in the alkylene group (e.g., 19, 21, 29, 36, etc.).

[0048]

[0049]

[0050] When the surface treatment agent is a composition, the content of compound (A) is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, based on the total amount of the surface treatment agent.

[0051] (Liquid Medium) In one embodiment, the surface treatment agent may contain a liquid medium. The surface treatment agent containing a liquid medium may be in a liquid state, and may be a solution or a dispersion.

[0052] The liquid medium is preferably an organic solvent.

[0053] Examples of organic solvents include compounds consisting of only hydrogen atoms and carbon atoms, and compounds consisting of only hydrogen atoms, carbon atoms, and oxygen atoms, and specific examples include hydrocarbon organic solvents, ketone organic solvents, ether organic solvents, ester organic solvents, glycol organic solvents, and alcohol organic solvents. Among these, the organic solvent is preferably a hydrocarbon organic solvent or an ester organic solvent.

[0054] Specific examples of hydrocarbon organic solvents include pentane, hexane, heptane, octane, hexadecane, isohexane, isooctane, isononane, cycloheptane, cyclohexane, bicyclohexyl, benzene, toluene, ethylbenzene, o-xylene, m-xylene, p-xylene, o-diethylbenzene, m-diethylbenzene, p-diethylbenzene, n-butylbenzene, sec-butylbenzene, and tert-butylbenzene. Specific examples of ketone organic solvents include acetone, methyl ethyl ketone, methyl isobutyl ketone, diisobutyl ketone, cyclohexanone, 2-heptanone, 4-heptanone, 3,5,5-trimethyl-2-cyclohexen-1-one, 3,3,5-trimethylcyclohexanone, and isophorone. Specific examples of ether organic solvents include diethyl ether, cyclopentyl methyl ether, tetrahydrofuran, and 1,4-dioxane.Specific examples of ester-based organic solvents include methyl acetate, ethyl acetate, propyl acetate, isopropyl acetate, butyl acetate, isobutyl acetate, tert-butyl acetate, amyl acetate, isoamyl acetate, ethyl 3-ethoxypropionate, ethyl lactate, ethylene glycol monobutyl ether acetate, diethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, 3-methoxy-3-methylbutyl acetate, 3-methoxybutyl acetate, propylene glycol monomethyl acetate, propylene glycol dimethyl acetate, and ethylene glycol monoethyl ether acetate. ester, ethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, cyclohexanol acetate, propylene glycol diacetate, propylene glycol monomethyl ether propionate, propylene glycol monoethyl ether acetate, propylene glycol monobutyl ether acetate, propylene glycol monopropyl ether acetate, 1,3-butylene glycol diacetate, 1,4-butanediol diacetate, 1,6-hexanediol diacetate, γ-butyrolactone, triacetin, 2,2,4-trimethyl-1,3-pentanediol monoisobutyrate.Specific examples of glycol-based organic solvents include ethylene glycol, ethylene glycol monobutyl ether, diethylene glycol monobutyl ether, triethylene glycol monobutyl ether, tetraethylene glycol monobutyl ether, ethylene glycol monohexyl ether, diethylene glycol monohexyl ether, ethylene glycol mono-2-ethylhexyl ether, diethylene glycol mono-2-ethylhexyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, propylene glycol monopropyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-tert-butyl ether, ethylene glycol monopropyl ether, ethylene glycol monomethyl ether, diethylene glycol monoisopropyl ether, diethylene glycol monomethyl ether, dipropylene glycol monoethyl ether, and dipropylene glycol monobutyl. ether, dipropylene glycol monopropyl ether, dipropylene glycol monomethyl ether, tripropylene glycol monobutyl ether, tripropylene glycol monomethyl ether, propylene glycol monophenyl ether, 1,3-butylene glycol, propylene glycol n-propyl ether, propylene glycol n-butyl ether, diethylene glycol monoethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol methyl ether, tripropylene glycol n-butyl ether, ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, dipropylene glycol dimethyl ether, diethylene glycol dibutyl ether, tetraethylene glycol dimethyl ether, triethylene glycol dimethyl ether, and polyethylene glycol dimethyl ether.Specific examples of alcohol-based organic solvents include methanol, ethanol, 1-propanol, isopropyl alcohol, n-butanol, diacetone alcohol, isobutanol, sec-butanol, tert-butanol, pentanol, 3-methyl-1,3-butanediol, 1,3-butanediol, 1,3-butylene glycol, octanediol, 2,4-diethylpentanediol, butylethylpropanediol, 2-methyl-1,3-propanediol, 4-hydroxy-4-methyl-2-pentanone, 2-ethyl-1-hexanol, 3,5,5-trimethyl-1-hexanol, isodecanol, isotridecanol, 3-methoxy-3-methyl-1-butanol, 2-methoxybutanol, 3-methoxybutanol, cyclohexanol, furfuryl alcohol, tetrahydrofurfuryl alcohol, benzyl alcohol, and methylcyclohexanol.

[0055] Examples of the organic solvent include halogen-based organic solvents, nitrogen-containing compounds, sulfur-containing compounds, siloxane compounds, and fluorine-containing organic solvents.

[0056] Specific examples of halogen-based organic solvents include dichloromethane, chloroform, carbon tetrachloride, 1,2-dichloroethane, chlorobenzene, o-chlorotoluene, m-chlorotoluene, p-chlorotoluene, m-dichlorobenzene, and 1,2,3-trichloropropane.

[0057] Examples of the nitrogen-containing compound include nitrobenzene, acetonitrile, benzonitrile, N,N-dimethylformamide, N,N-dimethylacetamide, N-methylpyrrolidone, and 1,3-dimethyl-2-imidazolidinone.

[0058] Examples of sulfur-containing compounds include carbon disulfide and dimethyl sulfoxide.

[0059] Examples of the siloxane compound include hexamethyldisiloxane, hexaethyldisiloxane, octamethyltrisiloxane, octaethyltrisiloxane, hexamethylcyclotrisiloxane, hexaethylcyclotrisiloxane, octamethylcyclotetrasiloxane, octaethylcyclotetrasiloxane, and decamethyltetrasiloxane.

[0060] Examples of the fluorine-containing organic solvent include polyfluoroaromatic hydrocarbons (e.g., 1,3-bis(trifluoromethyl)benzene); polyfluoroaliphatic hydrocarbons (e.g., C ６ F １３ CH ２ CH ３ (e.g., Asahiklin (registered trademark) AC-6000 manufactured by AGC Corporation), 1,1,2,2,3,3,4-heptafluorocyclopentane (e.g., Zeorora (registered trademark) H manufactured by Zeon Corporation); hydrofluoroethers (HFEs) (e.g., perfluoropropyl methyl ether (C ３ F ７ OCH ３ ) (e.g., Novec (trademark) 7000 manufactured by Sumitomo 3M Limited), perfluorobutyl methyl ether (C ４ F ９ OCH ３ ) (e.g., Novec (trademark) 7100 manufactured by Sumitomo 3M Limited), perfluorobutyl ethyl ether (C ４ F ９ O.C. ２ H ５ ) (e.g., Novec (trademark) 7200 manufactured by Sumitomo 3M Limited), perfluorohexyl methyl ether (C ２ F ５ CF (OCH ３ ) C ３ F ７ ) (e.g., Novec™ 7300 manufactured by Sumitomo 3M Limited) and other alkyl perfluoroalkyl ethers (the perfluoroalkyl group and the alkyl group may be linear or branched), and CF ３ CH ２ OCF ２ CHF ２(for example, Asahiklin (registered trademark) AE-3000 manufactured by AGC Corporation); hydrofluoroolefins (HFOs) (for example, 1-chloro-2,3,3-trifluoro-1-propene (HCFO-1233yd) (for example, Amorea (registered trademark) AS-300 manufactured by AGC Corporation)).

[0061] The content of the liquid medium is preferably 60 to 99.999 mass%, more preferably 80 to 99.99 mass%, and even more preferably 90 to 99.9 mass%, based on the total amount of the surface treatment agent. In the case of a surface treatment agent used in a wet coating method, the content of the liquid medium may be 90 to 99.99 mass%, 95 to 99.98 mass%, 97 to 99.97 mass%, or 98 to 99.95 mass%, based on the total amount of the surface treatment agent.

[0062] The surface treatment agent may further contain the following compound (B) or compound (E). A surface treatment agent containing compound (B) facilitates the arrangement of compound (A) at a higher density in the surface treatment layer, resulting in superior abrasion resistance, water repellency, oil repellency, fingerprint wiping ability, and durability. Furthermore, when the surface treatment agent contains compound (E), compound (E) has a high affinity with the group (T) of compound (A), and compound (A) is more likely to be arranged with the group (T) side facing the air interface together with compound (E). Compound (B) may be present in a compatible state with compound (A) in the surface treatment layer, or at least a portion of compound (B) may be removed, for example, by a post-process after the formation of the surface treatment layer. The surface treatment agent may contain only compound (B), only compound (E), or both compound (B) and compound (E). The above-described effect is exhibited even when compound (B) and compound (E) are contained.

[0063] (Compound (B)) Compound (B) is a compound represented by the following formula: (T １１ ) ｑ１１ -Q １２ -R １６ -Q １３ - (T １２ ) ｑ１２ …(B) However, T １１ and T １２are each independently a hydrogen atom, an alkyl group, an alkenyl group, or (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ -, and R １１ are each independently a hydrogen atom, an alkyl group, or (R １４ ) ３ M １１ -R １５ - and R １４ are each independently an alkyl group; R １５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １１ are each independently Si, Sn, Ge or C, and Q １１ are each independently a single bond, an oxygen atom, or an alkylene group; R １２ are each independently an alkyl group, p11 are each independently an integer of 0 to 500, q11 are each independently an integer of 1 to 3, q12 are each independently an integer of 1 to 3, R １６ is an alkylene group, and Q １２ represents a single bond or a (q11+1)-valent linking group other than an alkylene group, １３ is a single bond or a (q12+1)-valent linking group excluding an alkylene group, provided that compound (B) has a hydrocarbon chain having 18 or more carbon atoms.

[0064] T １１ and T １２ are each independently a hydrogen atom, an alkyl group, an alkenyl group, or (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ - is a group represented by T １１ and T １２The alkyl group in may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. T １１ and T １２ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0065] T １１ and T １２ The alkenyl group in the formula (I) includes the above alkyl groups in which any carbon atom-carbon atom bond is a double bond. The alkenyl group has 2 or more carbon atoms, preferably 2 to 10. Specific examples of the alkenyl group include a vinyl group, an allyl group, and a propenyl group.

[0066] R １１ is a hydrogen atom, an alkyl group, or (R １４ ) ３ M １１ -R １５ - is. R １１ and R １４ The alkyl group of the above T １１ and T １２ In order to further improve the liquid repellency, R １１ and R １４ The alkyl group in M ​​is preferably a methyl group or an ethyl group, and more preferably a methyl group. １１ is Si, Sn, Ge or C. In terms of availability of raw materials, M １１ is preferably Si or C.

[0067] In addition, the above R １５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms. １５ The alkylene group of R may be linear or branched. １５ The alkylene group is —CH ２ -, -CH ２ CH２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -, -CH(CH ３ ) CH ２ CH ２ -, -CH(CH ２ CH ３ ) CH ２ CH ２ -, -CH ２ C(CH ２ ) ２ CH ２ -, -CH ２ CH (CH ３ ) CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH (CH ３ ) CH ２ CH ２ - etc. １５ When R is a branched alkylene group, the number of carbon atoms in the branched chain is preferably 1 to 2, and more preferably 1 (i.e., a methyl group), in order to further improve wear resistance. １５ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or an alkylene group having 1 to 5 carbon atoms, and even more preferably an oxygen atom or an alkylene group having 1 to 4 carbon atoms.

[0068] Q １１ is a single bond, an oxygen atom, or an alkylene group. １１The alkylene group may be linear or branched. １１ The alkylene group in Q is preferably a linear alkylene group, more preferably a linear alkylene group having 1 to 6 carbon atoms. １１ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ - etc. １１ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or a straight-chain alkylene group having 1 to 6 carbon atoms, and even more preferably an oxygen atom or a straight-chain alkylene group having 1 to 4 carbon atoms.

[0069] (SiR １２ ２ -O) ｐ１１ represents an organo(poly)siloxane residue. １２ The alkyl group in R may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. １２ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0070] p11 is an integer of 0 to 500. From the viewpoint of improving liquid repellency, p11 is preferably 1 to 500, more preferably 3 to 350, even more preferably 3 to 200, particularly preferably 9 to 50, extremely preferably 11 to 30, and most preferably 11 to 25. On the other hand, from the viewpoint of improving durability, p1 is preferably 0 to 25, more preferably 0 to 10, even more preferably 0 to 2, particularly preferably 0 to 1, and extremely preferably 0.

[0071] q11 and q12 are T １１ and T １２ Each independently represents an integer of 1 to 3. １１ When there are a plurality of groups, one atom may have a plurality of groups (T １１ ) may be a structure having T １１ ｑ１１ -M １２ R １３ ３－ｑ１１ -* ... (T11) where M １２ is Si, Sn, Ge or C, R １３ are each independently a hydrogen atom or an alkyl group, and q11 is an integer of 2 to 3. １２ R １３ ３－ｑ１１ is the above Q １２ constitutes part or all of the

[0072] T １２ When there are a plurality of groups, one atom may have a plurality of groups (T １２ ) may be a structure having T １２ ｑ１２ -M １２ R １３ ３－ｑ１２ -* ... (T12) where M １３ is Si, Sn, Ge or C, R １４ are each independently a hydrogen atom or an alkyl group, and q12 is an integer of 2 to 3. １２ R １３ ３－ｑ１１ is the above Q １３ It constitutes part or all of the T１２ is preferably a hydrogen atom, a methyl group, a tert-butyl group, or a trimethylsilyl group.

[0073] Examples of the group (T11) and the group (T12) include the following groups: where p is an integer of 1 to 500. Also, * indicates the bonding position to other groups.

[0074]

[0075] R １６ is an alkylene group. When the compound (B) contains the relatively long-chain alkylene group, the compound (A) is easily aligned and arranged at high density in the surface treatment layer. １６ is an alkylene group. １６ The alkylene group in R preferably has 18 or more carbon atoms. １６ In the formula (B), the upper limit of the number of carbon atoms is not particularly limited, but may be, for example, 100 or less, and is preferably 36 or less from the viewpoint of ease of production of compound (B). In compound (B), the number of carbon atoms in the alkylene group having 18 or more carbon atoms may be linear or branched, but linear alkylene groups are preferred from the viewpoint of facilitating high-density alignment of compound (A). In the case of a branched alkylene group, the number of carbon atoms including the carbon atoms in the branch is preferably 19 or more.

[0076] Q １２ and Q １３ are each independently a single bond or a divalent linking group. １２ and Q １３ are each preferably independently a group represented by the following formula (Q1): ２１ -R ２１ -M １２ R １３ ３－ｑ２１ (-**) ｑ２１ …(Q1) However, Q ２１ represents a single bond, -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O)２ - or a phenylene group, R ２１ is a single bond or an alkylene group, provided that Q ２１ When is a single bond, R ２１ is a single bond, and M １２ is Si, Sn, Ge or C, R １３ are each independently a hydrogen atom or an alkyl group, q21 is an integer of 1 to 3, * is R １６ ** is the bonding position with T １１ or T １２ This is the bonding position with

[0077] -Q in compound (B) １２ -R １６ -Q １３ Examples of - include the following: where n1 is an integer of 18 or more, and * is T １１ ** is the bonding position with T １２ This is the bonding position with

[0078]

[0079] In compound (B), R １６ is an alkylene group having 19 or more carbon atoms is a novel compound. That is, the compound represented by the following formula (B3) is a novel compound that can be suitably applied to the surface treatment layer of the present disclosure. Compound represented by the following formula (B3). T １１ -Q １２ -R ３１ -Q １３ -T １２ ...(B3) However, T １１ is (R １１ ) ３ M １１ -Q １１ -(SiR １２ ２ -O) ｐ１１ -, and R １１ are each independently an alkyl group or (R １４ ) ３ M １１ -R １５ - and R １４ are each independently an alkyl group; R１５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １１ are each independently Si, Sn, Ge or C, and Q １１ are each independently a single bond, an oxygen atom, or an alkylene group; R １２ are each independently an alkyl group, p11 are each independently an integer of 0 to 500, R ３１ is an alkylene group having 19 or more carbon atoms, and Q １２ and Q １３ are each independently a single bond or a divalent linking group other than an alkylene group, １２ is a hydrogen atom, a methyl group, a tert-butyl group, or a trimethylsilyl group.

[0080] (Method for Producing Compound (B)) The method for producing compound (B) is not particularly limited. One example is a method in which the following compound (D1) is reacted with compound (D2): X １１ -R ５１ -T １１ ... (D1) X １２ -R ５２ -T １２ ...(D2) However, X １１ and X １２ is a halogen atom on one side and MgX (X is a halogen atom) on the other side, and R ５１ and R ５２ each independently represents a group between a carbon-carbon bond, such as -O-, -S-, -C(=O)NH-, -NHC(=O)-, -C(=O)O-, -OC(=O)-, -C(=O)S-, -SC(=O)-, or -S(=O) ２ NH-, -NHS (=O) ２ -, -S(=O) ２ O-, -OS (=O) ２ - or an alkylene group which may have a phenylene group. ５１ -R ５２ is the "Q" of compound (B). １２ -R １６ -Q １３ The reaction conditions for the above reaction can be seen in the examples described below.

[0081] Specific examples of the compound (B) include the following:

[0082]

[0083]

[0084] When compound (B) is used, the mass ratio of compound (A) to compound (B) is preferably 5:95 to 95:5. From the viewpoint of superior abrasion resistance, the mass ratio is more preferably 10:90 to 90:10, still more preferably 10:90 to 70:30, and particularly preferably 10:90 to 50:50.

[0085] (Compound (E)) Compound (E) is a compound represented by the following formula: (R ｅ１ ) ３ M ｅ１ -Z ｅ１ -M ｅ２ (R ｅ２ ) ３ ...(E) However, R ｅ１ and R ｅ２ are each independently an alkyl group or (R ｅ４ ) ３ M ｅ１ -R ｅ５ - and R ｅ４ are each independently an alkyl group; R ｅ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M ｅ１ and M ｅ２ are each independently Si, Sn, Ge or C, ｅ１ represents a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms.

[0086] In the above formula (E), R ｅ１ and R ｅ２ are each independently an alkyl group or (R ｅ４ ) ３ M ｅ１ -R ｅ５ - is. R ｅ１ and R ｅ２The alkyl group in may be any of a linear alkyl group, a branched alkyl group, and a cyclic alkyl group. From the viewpoint of improving liquid repellency, a linear alkyl group or a branched alkyl group is preferred, and a linear alkyl group is more preferred. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 6, and even more preferably 1 to 4. R ｅ１ and R ｅ２ Specific examples of the alkyl group include a methyl group, an ethyl group, an n-propyl group, an n-butyl group, and a tert-butyl group. From the viewpoint of further improving liquid repellency, a methyl group or an ethyl group is preferred, and a methyl group is more preferred.

[0087] R ｅ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms. ｅ５ The alkylene group of R may be linear or branched. ｅ５ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH(CH ３ ) -, -CH(CH ３ ) CH ２ -, -CH(CH ３ ) CH ２ CH ２ -, -CH(CH ２ CH ３ ) CH ２ CH ２ -, -CH ２ C(CH ２ ) ２ CH ２ -, -CH２ CH (CH ３ ) CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH (CH ３ ) CH ２ CH ２ - etc. ｅ５ When R is a branched alkylene group, the number of carbon atoms in the branched chain is preferably 1 to 2, and more preferably 1 (i.e., a methyl group), in order to further improve wear resistance. ｅ５ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or an alkylene group having 1 to 5 carbon atoms, and even more preferably an oxygen atom or an alkylene group having 1 to 4 carbon atoms.

[0088] M ｅ１ and M ｅ２ are each independently Si, Sn, Ge or C. In view of the availability of raw materials, M ｅ１ and M ｅ２ is preferably Si or C.

[0089] Z ｅ１ represents a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms. ｅ１ The alkylene group of Z may be linear or branched. ｅ１ The alkylene group of Z is preferably a linear alkylene group. ｅ１ The alkylene group is —CH ２ -, -CH ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２- etc. ｅ１ From the viewpoint of further improving liquid repellency, is preferably an oxygen atom or an alkylene group having 1 to 6 carbon atoms, more preferably an oxygen atom or a straight-chain alkylene group having 1 to 6 carbon atoms, and even more preferably an oxygen atom or a straight-chain alkylene group having 1 to 4 carbon atoms.

[0090] The compound (E) may be obtained by synthesis or may be a commercially available product. Specific examples of the compound (E) include the following.

[0091]

[0092] When compound (E) is used, the mass ratio of compound (A) to compound (E) is preferably 5:95 to 95:5. From the viewpoint of superior abrasion resistance, the mass ratio is more preferably 10:90 to 90:10, still more preferably 10:90 to 70:30, and particularly preferably 10:90 to 50:50.

[0093] Furthermore, when compound (B) and compound (E) are used in combination, it is preferable that the ratio of the mass of compound (A) to the total mass of compound (B) and compound (E) be within the above range.

[0094] (Other Components) The surface treatment agent may further contain other components, such as known additives such as acid catalysts and basic catalysts that promote the hydrolysis and condensation reaction of reactive silyl groups.

[0095] The catalyst may be any appropriate acid or base, transition metal (e.g., Ti, Ni, Sn, Zr, Al, B, etc.), sulfur-containing compounds having an unshared electron pair in their molecular structure, nitrogen-containing compounds (e.g., sulfoxide compounds, aliphatic amine compounds, aromatic amine compounds, phosphoric acid amide compounds, amide compounds, urea compounds), etc. Examples of acid catalysts include acetic acid, formic acid, trifluoroacetic acid, hydrochloric acid, nitric acid, sulfuric acid, phosphoric acid, sulfonic acid, methanesulfonic acid, and p-toluenesulfonic acid. Examples of base catalysts include ammonia, sodium hydroxide, potassium hydroxide, and organic amines such as triethylamine and diethylamine.

[0096] Other components also include metal compounds having a hydrolyzable group (hereinafter, metal compounds having a hydrolyzable group are also referred to as "specific metal compounds"). When the surface treatment agent contains a specific metal compound, the slip properties and antifouling properties of the surface treatment layer can be further improved. Examples of the specific metal compounds include those represented by the following formulae (M1) to (M3).

[0097] M (X ｂ１ ) ｍ１１ (X ｂ２ ) ｍ１２ (X ｂ３ ) ｍ１３ ... (M1) Si (X ｂ４ ) (X ｂ５ ) ３ ... (M2) (X ｂ６ ) ３ Si-(Y ｂ１ )-Si(X ｂ７ ) ３ …(M3)

[0098] In formula (M1), M represents a trivalent or tetravalent metal atom. ｂ１ Each of X independently represents a hydrolyzable group. ｂ２ Each of X independently represents a siloxane skeleton-containing group. ｂ３ each independently represents a hydrocarbon chain-containing group, m11 is an integer of 2 to 4, m12 and m13 are each independently an integer of 0 to 2, when M is a trivalent metal atom, m11 + m12 + m13 is 3, and when M is a tetravalent metal atom, m11 + m12 + m13 is 4.

[0099] In formula (M2), X ｂ４ represents a hydrolyzable silane oligomer residue. ｂ５ each independently represents a hydrolyzable group or an alkyl group having 1 to 4 carbon atoms.

[0100] In formula (M3), X ｂ６ and X ｂ７ each independently represents a hydrolyzable group or a hydroxyl group. ｂ１ represents a divalent organic group.

[0101] In formula (M1), the metal represented by M also includes semimetals such as Si and Ge. M is preferably a trivalent metal or a tetravalent metal, more preferably Al, Fe, In, Hf, Si, Ti, Sn, or Zr, still more preferably Al, Si, Ti, or Zr, and particularly preferably Si.

[0102] In formula (M1), X ｂ１ The hydrolyzable group represented by the formula (S) is [—Si(R ６ ) ｎ L ３－ｎ Examples of the hydrolyzable group include the same as the hydrolyzable group represented by L in the formula (1).

[0103] X ｂ２ The siloxane skeleton-containing group represented by the formula (I) has a siloxane unit (—Si—O—) and may be linear or branched. Examples of the siloxane unit include a dialkylsilyloxy group, such as a dimethylsilyloxy group or a diethylsilyloxy group. The number of repeating siloxane units in the siloxane skeleton-containing group is 1 or more, preferably 1 to 5, more preferably 1 to 4, and even more preferably 1 to 3. The siloxane skeleton-containing group may contain a divalent hydrocarbon group as part of the siloxane skeleton. Specifically, some oxygen atoms in the siloxane skeleton may be replaced with a divalent hydrocarbon group. Examples of the divalent hydrocarbon group include alkylene groups such as methylene, ethylene, propylene, and butylene. A hydrolyzable group, a hydrocarbon group (preferably an alkyl group), or the like may be bonded to the terminal silicon atom of the siloxane skeleton-containing group. The number of elements in the siloxane skeleton-containing group is preferably 100 or less, more preferably 50 or less, and even more preferably 30 or less. The number of elements is preferably 10 or more. Examples of the siloxane skeleton-containing group include: ＊ -(O-Si(CH ３ ) ２ ) ｎ CH ３ In this case, n is an integer of 1 to 5, and * represents a bonding site with an adjacent atom.

[0104] X ｂ３The hydrocarbon chain-containing group represented by the formula (I) may be a group consisting of only a hydrocarbon chain, or may be a group having an etheric oxygen atom between carbon atoms in the hydrocarbon chain. The hydrocarbon chain may be a straight chain or a branched chain, with a straight chain being preferred. The hydrocarbon chain may be a saturated hydrocarbon chain or an unsaturated hydrocarbon chain, with a saturated hydrocarbon chain being preferred. The number of carbon atoms in the hydrocarbon chain-containing group is preferably 1 to 3, more preferably 1 to 2, and even more preferably 1. The hydrocarbon chain-containing group is preferably an alkyl group, and more preferably a methyl group, an ethyl group, or a propyl group.

[0105] Preferably, m1 is 3 or 4.

[0106] As the compound represented by formula (M1), compounds represented by the following formulas (M1-1) to (M1-5) in which M is Si are preferred, and the compound represented by formula (M1-1) is more preferred. As the compound represented by formula (M1-1), tetraethoxysilane, tetramethoxysilane, and triethoxymethylsilane are preferred.

[0107] Si(X ｂ１ ) ４ ... (M1-1) CH ３ -Si(X ｂ１ ) ３ …(M1-2) C ２ H ５ -Si(X ｂ１ ) ３ ...(M1-3) n-C ３ H ７ -Si(X ｂ１ ) ３ ...(M1-4) (CH ３ ) ２ CH—Si(X ｂ１ ) ３ …(M1-5)

[0108] In formula (M2), X ｂ４The number of silicon atoms contained in the hydrolyzable silane oligomer residue represented by the formula (I) is preferably 3 or more, more preferably 5 or more, and even more preferably 7 or more. The number of silicon atoms is preferably 15 or less, more preferably 13 or less, and even more preferably 10 or less. The hydrolyzable silane oligomer residue may have an alkoxy group bonded to a silicon atom. Examples of the alkoxy group include a methoxy group, an ethoxy group, a propoxy group, and a butoxy group, with a methoxy group and an ethoxy group being preferred. The hydrolyzable silane oligomer residue may have one or more of these alkoxy groups, and preferably has one type. Examples of the hydrolyzable silane oligomer residue include (C ２ H ５ O) ３ Si-(OSi(OC) ２ H ５ ) ２ ) ４ O- ＊ Here, * represents a bonding site with an adjacent atom.

[0109] In formula (M2), X ｂ５ The hydrolyzable group represented by the formula (S) is [—Si(R ６ ) ｎ L ３－ｎ Examples of the hydrolyzable group include the same as the hydrolyzable group represented by L in X, a cyano group, a hydrogen atom, and an allyl group, and an alkoxy group or an isocyanato group is preferred. The alkoxy group is preferably an alkoxy group having 1 to 4 carbon atoms. ｂ５ As the group, a hydrolyzable group is preferred.

[0110] The compound represented by formula (M2) includes (H ５ C ２ O) ３ -Si-(OSi(OC) ２ H ５ ) ２ ) ４ O.C. ２ H ５ etc.

[0111] The compound represented by formula (M3) is a compound having reactive silyl groups at both ends of a divalent organic group, i.e., a bissilane. ｂ６ and Xｂ７ Examples of the hydrolyzable group represented by formula (M3) include an alkoxy group, an acyloxy group, a ketoxime group, an alkenyloxy group, an amino group, an aminoxy group, an amide group, an isocyanato group, and a halogen atom, and an alkoxy group and an isocyanato group are preferred. As the alkoxy group, an alkoxy group having 1 to 4 carbon atoms is preferred, and a methoxy group and an ethoxy group are more preferred. In formula (M3), X ｂ６ and X ｂ７ may be the same group or different groups. ｂ６ and X ｂ７ are preferably the same group.

[0112] In formula (M3), Y ｂ１ is a divalent organic group that connects the reactive silyl groups at both ends. ｂ１ The number of carbon atoms in Y is preferably 1 to 8, and more preferably 1 to 3. ｂ１ Examples of the alkylene group include an alkylene group, a phenylene group, and an alkylene group having an etheric oxygen atom between carbon atoms. ２ CH ２ -, -CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ CH ２ CH ２ CH ２ CH ２ CH ２ -, -CH ２ C(CH ３ ) ２ CH ２ -, -C(CH ３ ) ２ CH ２ CH ２ C(CH ３ ) ２ -, -CH ２ CH ２ OCH２ CH ２ -, -CH ２ CH ２ CH ２ OCH ２ CH ２ CH ２ -, -CH(CH ３ ) CH ２ OCH ２ CH (CH ３ ) -, -C ６ H ４ - are listed.

[0113] The compound represented by formula (M3) includes (CH ３ O) ３ Si(CH ２ ) ２ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ２ Si(OC ２ H ５ ) ３ , (OCN) ３ Si(CH ２ ) ２ Si(NCO) ３ , Cl ３ Si(CH ２ ) ２ SiCl ３ , (CH ３ O) ３ Si(CH ２ ) ６ Si(OCH ３ ) ３ , (C ２ H ５ O) ３ Si(CH ２ ) ６ Si(OC ２ H ５ ) ３ Examples include:

[0114] The content of other components that may be contained in the surface treatment agent is preferably 10% by mass or less, more preferably 1% by mass or less, based on the total amount of the surface treatment agent. When the surface treatment agent contains a specific metal compound, the content of the specific metal compound is preferably 0.01 to 30% by mass, more preferably 0.01 to 10% by mass, and even more preferably 0.05 to 5% by mass, based on the total amount of the surface treatment agent.

[0115] The total content of compound (A), compound (B), compound (E), and other components (hereinafter also referred to as "solids concentration") is preferably 0.001 to 40 mass%, more preferably 0.01 to 20 mass%, and even more preferably 0.1 to 10 mass%, relative to the total amount of the surface treatment agent. The solids concentration of the surface treatment agent is a value calculated from the mass before heating and the mass after heating for 4 hours in a convection dryer under conditions of a temperature 50°C higher than the boiling point of the solvent contained in the composition.

[0116] <Substrate> The type of substrate is not particularly limited, and examples thereof include substrates that are required to be water-repellent. Examples of substrates include substrates that may be used by contacting other articles (e.g., stylus) or human fingers; substrates that may be held by human fingers during operation; and substrates that may be placed on other articles (e.g., mounting table). Examples of substrate materials include metal, resin, glass, sapphire, ceramic, semiconductor, stone, fiber, nonwoven fabric, paper, wood, fur, natural leather, artificial leather, ceramics, and composite materials thereof. Glass may be chemically strengthened.

[0117] Examples of the substrate include glass or resin used for building materials, decorative building materials, interior goods, transportation equipment (e.g., automobiles), signs, bulletin boards, beverage containers, tableware, aquariums, ornamental equipment (e.g., frames, boxes), laboratory equipment, furniture, textile products, packaging containers, art, sports, games, etc., and glass or resin used for the exterior parts (excluding display parts) of devices such as mobile phones (e.g., smartphones), personal digital assistants, game consoles, remote controls, etc. The shape of the substrate may be a plate or a film.

[0118] The substrate is preferably a substrate for a touch panel, a substrate for a display, or a lens for glasses, and is particularly preferably a substrate for a touch panel.The material of the substrate for a touch panel is preferably glass or a transparent resin.

[0119] The substrate may be a substrate whose one or both surfaces have been subjected to a surface treatment such as corona discharge treatment, plasma treatment, or plasma graft polymerization treatment. A surface-treated substrate has better adhesion to the surface treatment layer and further improved abrasion resistance of the surface treatment layer. Therefore, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the surface treatment layer. Furthermore, when a base layer described below is provided on the surface-treated substrate, it has better adhesion to the base layer and further improved abrasion resistance of the surface treatment layer. Therefore, when a base layer is provided, it is preferable to perform the surface treatment on the surface of the substrate that comes into contact with the base layer.

[0120] The surface treatment layer may be provided directly on the surface of the substrate, or a primer layer may be provided between the substrate and the surface treatment layer. From the viewpoint of further improving the water repellency and abrasion resistance of the surface treatment layer, the article of the present disclosure preferably includes a substrate, a primer layer disposed on the substrate, and a surface treatment layer surface-treated with a surface treatment agent disposed on the primer layer.

[0121] The underlayer is preferably a layer containing an oxide containing silicon and at least one specific element selected from the group consisting of Group 1 elements, Group 2 elements, Group 4 elements, Group 5 elements, Group 13 elements, and Group 15 elements of the periodic table.

[0122] The Group 1 elements of the periodic table (hereinafter also referred to as "Group 1 elements") refer to lithium, sodium, potassium, rubidium, and cesium. As the Group 1 elements, lithium, sodium, and potassium are preferred, and sodium and potassium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 1 elements.

[0123] The Group 2 elements of the periodic table (hereinafter also referred to as "Group 2 elements") refer to beryllium, magnesium, calcium, strontium, and barium. As the Group 2 elements, magnesium, calcium, and barium are preferred, and magnesium and calcium are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 2 elements.

[0124] The Group 4 elements of the periodic table (hereinafter also referred to as "Group 4 elements") refer to titanium, zirconium, and hafnium. As the Group 4 elements, titanium and zirconium are preferred, and titanium is more preferred, from the viewpoint of being able to form a surface treatment layer on the underlayer more uniformly without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more types of Group 4 elements.

[0125] The Group 5 elements of the periodic table (hereinafter also referred to as "Group 5 elements") refer to vanadium, niobium, and tantalum. As the Group 5 element, vanadium is particularly preferred from the viewpoint of providing a surface treatment layer with better abrasion resistance. The underlayer may contain two or more Group 5 elements.

[0126] The Group 13 elements of the periodic table (hereinafter also referred to as "Group 13 elements") refer to boron, aluminum, gallium, and indium. As the Group 13 elements, boron, aluminum, and gallium are preferred, and boron and aluminum are more preferred, from the viewpoint of enabling the surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 13 elements.

[0127] The Group 15 elements of the periodic table (hereinafter also referred to as "Group 15 elements") refer to nitrogen, phosphorus, arsenic, antimony, and bismuth. As the Group 15 elements, phosphorus, antimony, and bismuth are preferred, and phosphorus and bismuth are more preferred, from the viewpoint of enabling a surface treatment layer to be formed more uniformly on the underlayer without defects, or from the viewpoint of further suppressing variation in the composition of the underlayer between samples. The underlayer may contain two or more Group 15 elements.

[0128] As the specific element contained in the underlayer, Group 1 elements, Group 2 elements, and Group 13 elements are preferred because they provide better abrasion resistance to the surface treatment layer, and Group 1 elements and Group 2 elements are more preferred, with Group 1 elements being even more preferred. The specific element may contain only one type of element or two or more types of elements.

[0129] The oxide contained in the underlayer may be a mixture of oxides of the above elements (silicon and the specific element) alone (for example, a mixture of silicon oxide and an oxide of the specific element), a composite oxide containing two or more of the above elements, or a mixture of an oxide of the above elements alone and a composite oxide.

[0130] From the viewpoint of achieving superior abrasion resistance of the surface treatment layer, the ratio of the total molar concentration of the specific elements in the underlayer to the molar concentration of silicon in the underlayer (specific elements / silicon) is preferably 0.02 to 2.90, more preferably 0.10 to 2.00, and even more preferably 0.20 to 1.80. The molar concentrations (mol %) of each element in the underlayer can be measured, for example, by depth profile analysis by X-ray photoelectron spectroscopy (XPS) using ion sputtering.

[0131] The underlayer may be a single layer or multiple layers. The underlayer may have an uneven surface. The thickness of the underlayer is preferably 1 to 100 nm, more preferably 1 to 50 nm, and even more preferably 2 to 20 nm. When the thickness of the underlayer is equal to or greater than the above lower limit, the adhesion of the underlayer to the surface treatment layer is further improved, and the surface treatment layer has better abrasion resistance. When the thickness of the underlayer is equal to or less than the above upper limit, the underlayer itself has excellent abrasion resistance. The thickness of the underlayer is measured by observing the cross section of the underlayer using a transmission electron microscope (TEM).

[0132] The underlayer can be formed by, for example, a vapor deposition method using a vapor deposition material or a wet coating method.

[0133] The deposition material used in the deposition method preferably contains an oxide containing silicon and a specific element. Specific examples of the form of the deposition material include powder, melt, sintered body, granules, and crushed body, with melt, sintered body, and granules being preferred from the viewpoint of ease of handling. Here, the melt refers to a solid obtained by melting the powder of the deposition material at a high temperature and then cooling and solidifying it. The sintered body refers to a solid obtained by firing the powder of the deposition material. If necessary, a molded body obtained by pressing the powder may be used instead of the powder of the deposition material. The granule refers to a solid obtained by kneading the powder of the deposition material with a liquid medium (e.g., water, organic solvent) to obtain particles, and then drying the particles.

[0134] The vapor deposition material can be produced by, for example, the following methods: A method of mixing silicon oxide powder with a powder of an oxide of a specific element to obtain a vapor deposition material powder. A method of kneading the vapor deposition material powder with water to obtain particles, and then drying the particles to obtain granules of the vapor deposition material. A method of mixing a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel), a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element), and water, drying the mixture, and then firing the dried mixture or a compact obtained by pressing the dried mixture to obtain a sintered body. A method of melting a powder containing silicon (e.g., silicon oxide powder, silica sand, silica gel) and a powder containing a specific element (e.g., oxide powder, carbonate, sulfate, nitrate, oxalate, hydroxide of the specific element) at a high temperature, and then cooling and solidifying the melt to obtain a melt.

[0135] A specific example of a vapor deposition method using a vapor deposition material is a vacuum vapor deposition method. The vacuum vapor deposition method is a method in which a vapor deposition material is evaporated in a vacuum chamber and attached to the surface of a substrate. The temperature during vapor deposition (for example, the temperature of the boat in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 100 to 3,000°C, and more preferably 500 to 3,000°C. The pressure during vapor deposition (for example, the pressure in the chamber in which the vapor deposition material is placed when a vacuum vapor deposition apparatus is used) is preferably 1 Pa or less, and more preferably 0.1 Pa or less. When forming an underlayer using a vapor deposition material, one vapor deposition material may be used, or two or more vapor deposition materials containing different elements may be used.

[0136] Specific examples of evaporation methods for the deposition material include a resistance heating method, in which the deposition material is melted and evaporated on a resistance heating boat made of a high-melting-point metal, and an electron gun method, in which the deposition material is irradiated with an electron beam to directly heat the deposition material, melting and evaporating the surface. The electron gun method is preferred as an evaporation method for the deposition material because it can evaporate high-melting-point substances due to its ability to locally heat the material, and because areas not irradiated by the electron beam are at low temperatures, eliminating the risk of reaction with the container or the inclusion of impurities. The evaporation method for the deposition material may use multiple boats, or all of the deposition materials may be placed in a single boat. The deposition method may be co-evaporation or alternating deposition. Specific examples include mixing silica and a specific element source in the same boat, placing silica and a specific element source in separate boats and co-evaporating them, or similarly placing them in separate boats and alternatingly depositing them. The deposition conditions, order, etc., are appropriately selected depending on the composition of the underlayer.

[0137] In the wet coating method, it is preferable to form an undercoat layer on a substrate by a wet coating method using a coating liquid containing a silicon-containing compound, a compound containing a specific element, and a liquid medium.

[0138] Specific examples of the silicon-containing compound include silicon oxide, silicic acid, partial condensates of silicic acid, alkoxysilanes, and partial hydrolysis condensates of alkoxysilanes.

[0139] Specific examples of compounds containing a specific element include oxides of the specific element, alkoxides of the specific element, carbonates of the specific element, sulfates of the specific element, nitrates of the specific element, oxalates of the specific element, and hydroxides of the specific element.

[0140] Examples of the liquid medium include the same liquid medium that may be contained in the surface treatment agent.

[0141] The content of the liquid medium is preferably 80 to 99.99% by mass, more preferably 90 to 99.9% by mass, based on the total amount of the coating liquid used to form the underlayer.

[0142] Specific examples of wet coating methods for forming the underlayer include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0143] After wet-coating the coating liquid, it is preferable to dry the coating film. The drying temperature for the coating film is preferably 20 to 200°C, more preferably 80 to 160°C.

[0144] The article of the present disclosure may be an optical material having a surface treatment layer as the outermost layer. Examples of the optical material include optical materials related to displays and the like, as well as a wide variety of other optical materials. Examples of the optical material include displays such as cathode ray tubes (CRTs; for example, personal computer monitors), liquid crystal displays, plasma displays, organic electroluminescent displays, inorganic thin-film electroluminescent dot matrix displays, rear projection displays, fluorescent display tubes (VFDs), and field emission displays (FEDs), as well as protective plates for such displays, or displays whose surfaces have been treated with an anti-reflection film.

[0145] The article of the present disclosure is preferably an optical component. Examples of optical components include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, and anti-reflection films. Examples of optical components include front protective plates, anti-reflection plates, polarizing plates, and anti-glare plates for displays such as PDPs and LCDs; disc surfaces of optical discs such as Blu-ray (registered trademark) discs, DVD discs, CD-Rs, and MO discs; optical fibers; and the display surfaces of watches. In particular, the article of the present disclosure is preferably a display or a touch panel.

[0146] The article of the present disclosure may be a medical device or a medical material. The article of the present disclosure may also be an automobile interior or exterior component. Examples of exterior components include windows, light covers, and exterior camera covers. Examples of interior components include instrument panel covers, navigation system touch panels, and decorative interior components.

[0147] When the article of the present disclosure is an optical component, the material constituting the surface of the substrate is a material for optical components, such as glass or transparent plastic. When the article of the present disclosure is an optical component, a functional layer such as a hard coat layer or an anti-reflection layer may be formed on the surface (outermost layer) of the substrate. The anti-reflection layer may be either a single-layer anti-reflection layer or a multi-layer anti-reflection layer. Examples of inorganic materials that can be used for the anti-reflection layer include SiO ２ , SiO, ZrO ２ , TiO ２ , TiO, Ti ２ O ３ , Ti ２ O ５ , Al ２ O ３ , Ta ２ O ５ , Ta ３ O ５, Nb ２ O ５ , HfO ２ , Si ３ N ４ , CeO ２ , MgO, Y ２ O ３ , SnO ２ , MgF ２ , and W.O. ３ These inorganic substances may be used alone or in combination of two or more (for example, as a mixture). When a multi-layer antireflection layer is formed, the outermost layer may contain SiO ２ and / or SiO is preferably used. When the article of the present disclosure is an optical glass component for a touch panel, a transparent electrode, for example, a thin film using indium tin oxide (ITO) or indium zinc oxide, may be provided on a portion of the surface of the substrate (glass). Furthermore, the substrate may have an insulating layer, an adhesive layer, a protective layer, a decorative frame layer (I-CON), an atomization film layer, a hard coating film layer, a polarizing film, a phase difference film, a liquid crystal display module, or the like, depending on its specific specifications.

[0148] [Method for manufacturing an article] The method for manufacturing an article comprises performing a surface treatment on a substrate using a surface treatment agent to manufacture an article having a surface treatment layer formed on the substrate, and is characterized in that the surface treatment agent contains the compound (A). By using the surface treatment agent containing the compound (A), it is possible to obtain an article having an ATR-IR spectrum with a wave number of 2,850.6 to 2,851.1 cm. －１ The surface treatment layer has a peak within the range of 100 to 1500 nm, and is excellent in abrasion resistance, water repellency, oil repellency, fingerprint wiping property, and durability. The surface treatment can be performed by a dry coating method or a wet coating method.

[0149] Examples of the dry coating method include vacuum deposition, CVD, sputtering, and the like. As the dry coating method, vacuum deposition is preferred from the viewpoint of suppressing decomposition of the compound and simplifying the equipment. During vacuum deposition, a pellet-like substance obtained by impregnating a porous metal body such as iron or steel with a surface treatment agent may be used. A pellet-like substance obtained by impregnating a porous metal body such as iron or steel with the surface treatment agent, drying the liquid medium, and then impregnating the compound (A) may be used.

[0150] Examples of wet coating methods include spin coating, wipe coating, spray coating, squeegee coating, dip coating, die coating, inkjet coating, flow coating, roll coating, casting, Langmuir-Blodgett coating, and gravure coating.

[0151] In order to improve the abrasion resistance of the surface treatment layer, an operation to promote the reaction between the compound (A) and the substrate may be performed as necessary. Examples of such an operation include heating, humidification, and light irradiation. For example, the substrate on which the surface treatment layer is formed can be heated in a humid atmosphere to promote reactions such as the hydrolysis reaction of hydrolyzable groups, the reaction between hydroxyl groups on the surface of the substrate and silanol groups, and the formation of siloxane bonds through the condensation reaction of silanol groups. After the surface treatment, compounds in the surface treatment layer that are not chemically bonded to other compounds or the substrate may be removed as needed. Examples of removal methods include pouring a solvent over the surface treatment layer and wiping with a cloth soaked in the solvent.

[0152] The present invention will be described in more detail below using examples, but the present invention is not limited to these examples. Examples 1 and 2 are comparative examples, and Examples 3 to 15 are working examples.

[0153] Synthesis Example 1 Synthesis of Compound (1) THF (tetrahydrofuran, 10 g), a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), and chlorodimethylsilane (10 g) were added to 18-bromo-1-octadecene (10 g), and the mixture was stirred at 25°C for 24 hours. Low-boiling point components were distilled off under reduced pressure to obtain 12 g of compound (1). The structure of compound (1) was confirmed from the following NMR data.

[0154]

[0155] 1 H NMR (400 MHz, CDCl3) δ 3.40 (t, J = 6.9 Hz, 2H), 1.92 - 1.74 (m, 2H), 1.46 - 1.06 (m, 30H), 0.88 - 0.71 (m, 2H), 0.40 (s, 6H).

[0156] Synthesis Example 2: Synthesis of Compound (2) THF (10 g) and a methylmagnesium chloride tetrahydrofuran solution (approximately 1 M) (40 mL) were added to compound (1) (12 g), and the mixture was stirred at 25° C. for 1 hour. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 8 g of compound (2). The structure of compound (2) was confirmed by the following NMR data.

[0157]

[0158] 1 H-NMR (400 MHz, CDCl3) δ 3.41 (t, J = 6.9 Hz, 2H), 1.85 (m, 2H), 1.46 - 1.06 (m, 30H), 0.47 (t, J = 7.6 Hz, 2H), -0.03(s, 9H).

[0159] ​​Synthesis Example 3 Synthesis of Compound (3) Dichloromethane (10 g), 1,1,1,3,3-pentamethyldisiloxane (15 g), and a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 50 mg) were added to 18-bromo-1-octadecene (10 g), and the mixture was stirred at 25°C for 24 hours. After removing the low-boiling point components by distillation under reduced pressure, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 12 g of compound (3). The structure of compound (3) was confirmed by the following NMR data.

[0160]

[0161] 1 H NMR (400 MHz, CDCl3) δ 3.41 (t, J = 6.9 Hz, 2H), 1.85 (m, 2H), 1.49 - 1.04 (m, 30H), 0.50 (t, J = 7.6 Hz, 2H), 0.25 - -0.19 (m, 15H).

[0162] Synthesis Example 4 Synthesis of Compound (4) THF (15 g) and magnesium (0.4 g) were added to 16-bromohexadec-1-ene (2 g), and the mixture was stirred at 50°C for 2 hours. After filtering the reaction solution, compound (3) (1.0 g) and copper(II) chloride (0.05 g) were added, and the mixture was stirred at 50°C for 2 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. 0.5 g of compound (4) was obtained by flash column chromatography using 10% silver nitrate silica gel (developing solvent: hexane / dichloromethane). The structure of compound (4) was confirmed by the following NMR data.

[0163]

[0164] 1 ​​H NMR (400 MHz, CDCl3) δ 5.80 (ddt, J = 17.2, 10.2, 7.0 Hz, 1H), 5.23 - 4.82 (m, 2H), 2.16 - 1.87 (m, 2H), 1.57 - 1.10 (m, 60H), 0.69 (t, J = 8.3 Hz, 2H), 0.25 - -0.19 (m, 15H).

[0165] Synthesis Example 5 Synthesis of Compound (5) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (4) (0.5 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50° C. for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.5 g of compound (5). The structure of compound (5) was confirmed by the following NMR data.

[0166]

[0167] 1 H NMR (400 MHz, CDCl3) δ 3.57 (s, 9H), 1.25 (s, 64H), 0.74 - 0.58 (m, 2H), 0.50 (t, J = 7.6 Hz, 2H), 0.06 (s, 15H).

[0168] Synthesis Example 6 Synthesis of Compound (6) THF (20 g) and magnesium (1.1 g) were added to 11-bromo-1-undecene (10 g) and the mixture was stirred at 60°C for 2 hours. The reaction solution was filtered to obtain 30 g of compound (6). The concentration of the product was confirmed to be 0.8 M by titration with 1,10-phenanthroline.

[0169]

[0170] ​Synthesis Example 7 Synthesis of Compound (7) THF (10 g), compound (6) (0.8 mol / L) (10 mL), and copper(II) chloride (0.05 g) were added to compound (2) (1 g), and the mixture was stirred at 60° C. for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using 10% silver nitrate silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.4 g of compound (7). The structure of compound (7) was confirmed by the following NMR data.

[0171]

[0172] 1 H NMR (400 MHz, CDCl3) δ 5.82 (ddt, J = 16.9, 10.2, 6.7 Hz, 1H), 5.09 - 4.78 (m, 2H), 2.04 (q, J = 7.1 Hz, 2H), 1.46 - 1.06 (m, 50H), 0.47 (t, J = 7.7 Hz, 2H), -0.03(s, 9H).

[0173] Synthesis Example 8 Synthesis of Compound (8) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (7) (0.4 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50° C. for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.5 g of compound (8). The structure of compound (8) was confirmed by the following NMR data.

[0174]

[0175] 1 H NMR (400 MHz, CDCl3) δ 3.57 (s, 9H), 1.46 - 1.06 (m, 54H), 0.72 - 0.59 (m, 2H), 0.48 (d, J = 8.0 Hz, 2H), -0.03(s, 9H).

[0176] ​​Synthesis Example 9: Synthesis of Compound (9) THF (10 g) and magnesium (0.21 g) were added to compound (2) (1 g) and stirred at 50° C. for 4 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.6 g of compound (9). The structure of compound (9) was confirmed by the following NMR data.

[0177]

[0178] 1 H NMR (400 MHz, CDCl3) δ 1.25 (s, 32H), 0.98 - 0.74 (m, 3H), 0.47 (dd, J = 10.0, 5.7 Hz, 2H), -0.03 (s, 9H).

[0179] Synthesis Example 10: Synthesis of Compound (10) THF (10 g) and magnesium (0.21 g) were added to compound (3) (1 g) and stirred at 50° C. for 4 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.6 g of compound (10). The structure of compound (10) was confirmed by the following NMR data.

[0180]

[0181] 1 H NMR (400 MHz, CDCl3) δ 1.25 (s, 32H), 0.98 - 0.80 (m, 3H), 0.50 (t, J = 7.5 Hz, 2H), 0.06 (d, J = 1.1 Hz, 15H).

[0182] ​​Synthesis Example 11 Synthesis of Compound (11) THF (10 g) and copper(II) chloride (0.05 g) were added to 1,18-dibromooctadecane (1.0 g) and stirred at 25°C. 20 mL of trimethylsilylmethylmagnesium chloride (20% ethyl ether solution, approximately 1 mol / L) was then added, and the mixture was stirred at 60°C for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were removed by distillation under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.8 g of compound (11). The structure of compound (11) was confirmed by the following NMR data.

[0183]

[0184] 1 H NMR (400 MHz, CDCl3) δ 1.25 (s, 36H), 0.47 (dd, J = 9.6, 5.1 Hz, 4H), 0.14--0.22 (m, 18H).

[0185] Synthesis Example 12 Synthesis of Compound (12) THF (10 g) and magnesium (0.13 g) were added to 1-bromononane (1.0 g), and the mixture was stirred at 50°C for 4 hours. The reaction solution was filtered, and then compound (11) (1.0 g) and copper(II) chloride (0.05 g) were added, followed by stirring at 50°C for 4 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. 1.1 g of compound (12) was obtained by flash column chromatography using silica gel (developing solvent: hexane / dichloromethane). The structure of compound (12) was confirmed by the following NMR data.

[0186] 1 H NMR (400 MHz, CDCl3) δ 1.29 (s, 50H), 0.98 - 0.80 (m, 3H), 0.50 (t, J = 7.8 Hz, 2H), -0.03 (s, 9H).

[0187] ​​Synthesis Example 13 Synthesis of Compound (13) THF (10 g), pentylmagnesium bromide (18% tetrahydrofuran solution, approximately 1 mol / L) (15 mL), and copper(II) chloride (0.05 g) were added to compound (3) (1 g), and the mixture was stirred at 50° C. for 4 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.5 g of compound (13). The structure of compound (13) was confirmed by the following NMR data.

[0188]

[0189] 1 H NMR (400 MHz, CDCl3) δ 1.50 - 1.20 (m, 42H), 0.98 - 0.80 (m, 3H), 0.50 (t, J = 7.5 Hz, 2H), 0.06 (d, J = 1.1 Hz, 15H).

[0190] Synthesis Example 14 Synthesis of Compound (14) Dichloromethane (10 g), 1,1,3,3,5,5,5-heptamethyl-2,4-dioxa-1,3,5-trisilapentane (15 g), and a toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 50 mg) were added to 18-bromo-1-octadecene (10 g), and the mixture was stirred at 25° C. for 24 hours. After distilling off low-boiling components under reduced pressure, flash column chromatography using silica gel (developing solvent: hexane / dichloromethane) was performed to obtain 13 g of compound (14). The structure of compound (14) was confirmed by the following NMR data.

[0191]

[0192] 1 H NMR (400 MHz, CDCl3) δ 3.41 (t, J = 6.9 Hz, 2H), 1.85 (p, J = 6.9 Hz, 2H), 1.49 - 1.00 (m, 30H), 0.52 (t, J = 7.7 Hz, 2H), 0.07 (d, J = 11.9 Hz, 21H). ​​

[0193] Synthesis Example 15 Synthesis of Compound (15) THF (40 g) and magnesium (0.9 g) were added to 18-bromo-1-octadecene (10 g) and the mixture was stirred at 60°C for 2 hours. The reaction solution was filtered to obtain 50 g of compound (15). The concentration of the product was confirmed to be 0.4 M by titration with 1,10-phenanthroline.

[0194]

[0195] Synthesis Example 16: Synthesis of Compound (16) To compound (14) (1 g), THF (10 g), compound (15) (0.4 mol / L) (20 mL), and copper(II) chloride (0.05 g) were added, and the mixture was stirred at 60° C. for 24 hours. Hydrochloric acid and hexane were added for extraction, and low-boiling components were distilled off under reduced pressure. Flash column chromatography using 10% silver nitrate silica gel (developing solvent: hexane / dichloromethane) was then performed to obtain 0.4 g of compound (16). The structure of compound (16) was confirmed by the following NMR data.

[0196]

[0197] 1 H NMR (400 MHz, CDCl3) δ 5.81 (ddt, J = 17.0, 10.3, 6.6 Hz, 1H), 5.18 - 4.77 (m, 2H), 2.04 (q, J = 7.0 Hz, 2H), 1.25 (s, 64H), 0.51 (d, J = 8.4 Hz, 2H), 0.07 (d, J = 11.9 Hz, 21H).

[0198] Synthesis Example 17 Synthesis of Compound (17) A toluene solution of platinum / 1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex (platinum content: 3% by mass, 5 mg), aniline (3 mg), and trimethoxysilane (0.60 g) were added to compound (16) (0.4 g) dissolved in dichloromethane (10 g), and the mixture was stirred at 50° C. for 2 hours. The solvent was distilled off under reduced pressure to obtain 0.5 g of compound (17). The structure of compound (17) was confirmed by the following NMR data.

[0199] ​

[0200] 1 H NMR (400 MHz, CDCl3) δ 3.57 (s, 9H), 1.25 (s, 68H), 0.75 - 0.59 (m, 2H), 0.52 (t, J = 7.7 Hz, 2H), 0.07 (d, J = 11.8 Hz, 21H).

[0201] Synthesis Example 18: Synthesis of compound (18) Compound (18) was obtained by the method described in WO 2023 / 017830. The average number of repeating units, n, was 17.

[0202]

[0203] [Compounds (19) to (20)] The following compounds were prepared as compounds (19) to (20).

[0204] [Preparation of surface treatment agent and manufacturing of article] As shown in Table 1, the first compound alone or the first compound and the second compound were mixed, and heptane was further added as a liquid medium to obtain a surface treatment agent with a solid content of 20 mass%. Note that in Table 1, "first compound" represents a compound belonging to the above-mentioned compound (A) except for compound (18), and "second compound" represents a compound belonging to the above-mentioned compound (B) or compound (E). Furthermore, the "content ratio of second compound" indicates the mass of the second compound relative to the total mass of the first compound and the second compound.

[0205] Next, the substrate was subjected to a surface treatment using a surface treatment agent. A dry coating method was used as the surface treatment method. Chemically strengthened glass was used as the substrate. 30 g of silicon dioxide was placed as a deposition source in a copper hearth in a vacuum deposition apparatus ("VTR-350M" manufactured by ULVAC Kiko Co., Ltd.). The glass substrate was placed in the vacuum deposition apparatus, and the interior of the vacuum deposition apparatus was heated to 5 × 10 －３ The hearth was then evacuated to a pressure of 10 Pa or less. The hearth was heated to approximately 2,000°C, and silicon oxide was vacuum-deposited on the surface of the substrate, producing a substrate with a silicon oxide layer having a thickness of approximately 20 nm. 0.5 g of each surface treatment agent was placed in a molybdenum boat in a vacuum deposition apparatus, and the interior of the vacuum deposition apparatus was heated to 1 × 10 －３ ​The boat containing the surface treatment agent was heated at a temperature increase rate of 10°C / min or less, and when the deposition rate measured by a quartz crystal oscillator film thickness meter exceeded 1 nm / sec, the shutter was opened to start film formation on the surface of the substrate. When the film thickness reached approximately 50 nm, the shutter was closed to terminate film formation on the surface of the substrate with a silicon oxide layer. The substrate on which the compound or composition had been deposited was heat-treated at 140°C for 30 minutes and washed with ethanol to obtain an article having a surface treatment layer on the surface of the substrate.

[0206] <Initial Contact Angle (Water Repellency)> Approximately 2 μL of distilled water was dropped onto the surface treatment layer of the article, and the initial water contact angle was measured using a contact angle measuring device (product name "DM-500", manufactured by Kyowa Interface Science Co., Ltd.). The average value measured at five points on the surface treatment layer was taken as the water contact angle. The 2θ method was used to calculate the water contact angle.

[0207] <Wear resistance> Using a triple-type flat surface abrasion tester (product name "PA-300A", manufactured by Daiei Scientific Instruments Co., Ltd.), a friction durability test was conducted using a 6 mmφ eraser manufactured by Minoan Co., Ltd. under friction conditions of 24 ° C, 40% RH atmosphere, 1,000 g load, 40 rpm rotation speed, and 40 mm stroke length. The water contact angle was measured every 100 strokes, and the abrasion continued until the water contact angle was 103 ° or less. (Evaluation criteria) AA: Water contact angle after 1,000 strokes was greater than 103 °. A: Water contact angle after 500 strokes was greater than 103 ° and after 1,000 strokes was less than 103 °. B: Water contact angle after 100 strokes was greater than 103 ° and after 500 strokes was less than 103 °. C: Water contact angle after 100 strokes was less than 103 °.

[0208] <ATR-IR analysis> Infrared total reflection absorption measurement was performed under the following conditions at 24°C and 40% RH using the following equipment, accessories, and analytical conditions. ２ The wave number of the symmetric stretching peak was observed. Apparatus: Nicolet FT-IR OMNIC9 Standard manufactured by Thermo Fisher Scientific Accessory: Vari GATR Incident angle: 60° Detector IR: MCT / A Resolution: 2.0 cm －１ Polarizer angle: 90° Number of scans: 500 scans

[0209]

[0210] As shown in Table 1, the infrared absorption spectrum obtained by total reflection measurement has a wave number of 2,850.6 to 2,851.1 cm －１ The articles of Examples 3 to 15, which had the surface treatment layer having a peak within the range of 1.0, 1.5, 1.6, 1.7, 1.8, 1.9, 1.10, 1.11, 1.20, 1.30, 1.40, 1.50, 1.60, 1.75, 1.85, 1.90, 1.95, 1.90,

[0211] The article of the present disclosure can be used, for example, in display devices such as touch panel displays, optical elements, semiconductor elements, building materials, automotive parts, nanoimprint technology, and the like. The article can also be used as bodies, window glass (windshields, side glass, rear glass), mirrors, bumpers, and the like for transportation equipment such as trains, automobiles, ships, and aircraft. The article can also be used as outdoor items such as building exterior walls, tents, solar power generation modules, soundproofing panels, and concrete; fishing nets, insect nets, and aquariums. The article can also be used as various indoor equipment such as kitchens, bathrooms, sinks, mirrors, and toilet peripherals; ceramics such as chandeliers and tiles; artificial marble, and air conditioners. The article can also be used as jigs, interior walls, piping, and the like in factories. The article can also be used as goggles, eyeglasses, helmets, pachinko machines, textiles, umbrellas, play equipment, and soccer balls. The article can also be used as various packaging materials such as food packaging, cosmetic packaging, and the interior of pots. The article can also be used as an optical component in car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio, game machines, eyeglass lenses, camera lenses, lens filters, sunglasses, medical equipment such as gastroscopes, copiers, PCs, displays (e.g., liquid crystal displays, organic EL displays, plasma displays, touch panel displays), touch panels, protective films, anti-reflection films, and the like.

[0212] This application claims priority based on Japanese Patent Application No. 2024-107365, filed on July 3, 2024, the disclosure of which is incorporated herein by reference in its entirety.

[0213] 10: Substrate 20: Surface treatment layer 21: Surface treatment agent

Claims

1. An article having a surface treatment layer on a substrate, wherein the surface treatment layer has an infrared absorption spectrum measured by total reflection measurement method with a wave number of 2,850.6 to 2,851.1 cm －１ The article has a peak in the range of 2. The surface treatment layer is (R １０ ) ３ Si-, (R １０ ) ３ Ge-, (R １０ ) ３ Sn-, (R １０ ) ３ C- and CF ３ O-, provided that R １０ The article of claim 1 , wherein each is independently an alkyl group.

3. The article according to claim 1, wherein the surface treatment layer contains a hydrocarbon chain having 19 or more carbon atoms.

4. The article according to claim 1, wherein the surface treatment layer is formed using a surface treatment agent, and the surface treatment agent contains a compound (A) having a group represented by the following formula (T) and a group represented by the following formula (S). (R １ ) ３ M １ -Q １ -(SiR ２ ２ -O) ｐ１ -...(T) -Si(R ６ ) ｎ L ３－ｎ …(S) However, R １ are each independently an alkyl group or (R ４ ) ３ M １ -R ５ - and R ４ are each independently an alkyl group; R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １ are each independently Si, Sn, Ge or C, and Q １ are each independently a single bond, an oxygen atom, or an alkylene group; R ２ are each independently an alkyl group, p1 is each independently an integer of 0 to 500, R ６ are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n is an integer of 0 to 2.

5. The article according to claim 4, wherein the compound (A) is represented by the following formula (A1): (T １ ) ｑ１ -Q ２ -R ７ -Q ３ -Si(R ６ ) ｎ L ３－ｎ ...(A1) where T １ is a group represented by the formula (T), and Q ２ represents a single bond or a (q1+1)-valent linking group other than an alkylene group, ３ is a single bond or a divalent linking group other than an alkylene group, and R ７ is an alkylene group having 19 or more carbon atoms; and q1 is an integer of 1 to 3.

6. The article according to claim 1, wherein the surface treatment layer does not contain fluorine atoms.

7. The article according to claim 1, wherein the surface treatment layer has a thickness of 1 to 100 nm.

8. The article of claim 1, which is an optical component.

9. The article according to claim 1, which is a display or a touch panel.

10. A method for producing an article, comprising: performing a surface treatment on a substrate using a surface treatment agent to produce an article having a surface treatment layer formed on the substrate; wherein the surface treatment agent contains a compound (A) having a group represented by the following formula (T) and a group represented by the following formula (S): (R １ ) ３ M １ -Q １ -(SiR ２ ２ -O) ｐ１ -...(T) -Si(R ６ ) ｎ L ３－ｎ …(S) However, R １ are each independently an alkyl group or (R ４ ) ３ M １ -R ５ - and R ４ are each independently an alkyl group; R ５ is a single bond, an oxygen atom, or an alkylene group having 1 to 6 carbon atoms; M １ are each independently Si, Sn, Ge or C, and Q １ are each independently a single bond, an oxygen atom, or an alkylene group; R ２ are each independently an alkyl group, p1 is each independently an integer of 0 to 500, R ６ are each independently a monovalent hydrocarbon group; each L is independently a hydrolyzable group, a group having a hydrolyzable group, or a hydroxyl group; and n is an integer of 0 to 2.

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