Plastic substrate with at least one hydrophilic surface portion

WO2026022349A3PCT designated stage Publication Date: 2026-04-02EUROPLASMA
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-07-25
Publication Date
2026-04-02

AI Technical Summary

Technical Problem

Existing plastic substrates lack sufficient hydrophilicity and stability over time, leading to inadequate adhesion and culturing of biological materials, and existing methods are complex and potentially harmful.

Method used

A plastic substrate with a hydrophilic surface portion treated by radio-frequency plasma under vacuum, using a gas mixture of oxidizing gases like N2O and hydrocarbon compounds, achieving a static contact angle of less than 80° and specific elemental composition for stable adhesion.

Benefits of technology

The substrate provides excellent and lasting adhesion for biological materials, ensuring stable culturing without deterioration, with minimal chamber fouling and enabling continuous high-quality treatment of large-scale surfaces.

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Abstract

The invention relates to a plastic substrate which has at least one hydrophilic surface portion and is arranged to allow the culturing of a biological material selected from the group comprising cells, bacteria, yeasts, fungi, biological tissues, materials derived from biological samples or from histological sections and proteins, characterized in that said at least one hydrophilic surface portion is obtained by means of a plasma process and has: - a static water contact angle of less than 80°, preferably of between 5° and 80°, preferably between 10° and 70°, and - an oxygen content of between 5% and 40%, a carbon content of between 50% and 95%, a nitrogen content of between 0.5% and 10%, preferably between 0.5% and 8%, more preferentially between 0.5% and 6%, measured by XPS.
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Description

[0001] A PLASTIC SUBSTRATE WITH AT LEAST A HYDROPHILIC SURFACE PORTION

[0002] The present invention relates to a plastic substrate with at least a hydrophilic surface area arranged to allow the cultivation of biological material.

[0003] Generally, plastic substrates have a surface that is not conducive to the adhesion of biological material, such as cells, bacteria, proteins, microbes, or tissues. Consequently, culturing biological material on plastic substrates is not easy. Culturing biological material is achieved through its adhesion to the substrate surface.

[0004] There are methods to make a substrate hydrophilic and compatible with cultivation to allow the reproduction of biological matter.

[0005] For example, Corning's CelIBIND surface uses a plasma process to increase the oxygen content of a polymer surface to improve its hydrophilicity and wettability. The plasma process utilizes a high-energy microwave source, a vacuum chamber, and at least one gas. The proposed process reduces aromatic groups present on the initial surface of the polystyrene substrate and increases the number of oxygen-containing functional groups (e.g., -COOH). US patent 2008 / 0003663 describes a similar process.

[0006] There are also processes that involve adding a coating to the substrate to increase its adhesion.

[0007] Other solutions focus on adding amine groups to the surface of the substrate to increase adhesion.

[0008] The techniques currently proposed must be applicable by proposing compounds that are not harmful to health and that allow for efficient reproduction of biological matter over time.

[0009] However, it appears that the known solutions do not provide sufficient adhesion to the substrate over time and that the processes used are complex to implement.

[0010] Therefore, there is a need to provide an improved solution for a substrate with a portion of its surface that remains sufficiently hydrophilic over time to allow for the successful reproduction of biological material without deteriorating it. To address this problem, the present invention provides a plastic substrate having at least a hydrophilic surface portion and arranged to allow the culture of selected biological material from the group comprising cells, bacteria, yeasts, fungi, biological tissues, materials from biological samples or histological sections, and proteins, characterized in that said at least a hydrophilic surface portion is obtained by means of a plasma process and exhibits:

[0011] - a static contact angle (of the water) of less than 80°, preferably between 5 and 80°, preferably between 10 and 70°, more preferably between 20 and 60°, and even more preferably between 30 and 60°, and

[0012] - an oxygen content between 5% and 40%, a carbon content between 50% and 95%, a nitrogen content between 0.5 and 10%, preferably between 0.5 and 8%, more preferably between 0.5 and 6%, measured by XPS.

[0013] The plastic substrate offers excellent and lasting adhesion, ensuring the stability of the treatment and enabling the effective reproduction of biological material without deterioration. Indeed, the surface energy remains stable over time, which is advantageous compared to prior art techniques. In other words, the static contact angle (of the water) changes very little over time, unlike a substrate modified with oxygen where the contact angle varies significantly, for example, within a week, making it impossible to reproduce the tests performed. Furthermore, the substrate according to the invention can be stored for a longer period.

[0014] The static contact angle is preferably between 30 and 60°, in order to preserve, without denaturing, the biological matter, for example when the matter is a protein.

[0015] Also, a change in the static contact angle (of the water) over time can lead to a variation in the number of cells that can grow, which is not necessarily advantageous.

[0016] Thus, the invention has demonstrated durability with respect to the modification of the treated surface, which is particularly advantageous. The nature of the groups, in particular the fact that the nitrogen atoms originate from an oxidizing gas, makes it possible to obtain the effects achieved within the framework of the invention. Preferably, said at least one hydrophilic surface portion has an oxygen content of between 5% and 40%, preferably between 5% and 20%, more preferably between 5% and 18%, more preferably still between 5% and 15%, advantageously between 8% and 20%, more advantageously between 9% and 17%, as measured by XPS.

[0017] Advantageously, said at least one hydrophilic surface portion has a carbon content between 50% and 95%, preferably between 65% and 95%, more preferably between 70% and 90%, advantageously between 75% and 90%, measured by XPS.

[0018] More advantageously, said at least a hydrophilic surface part has a nitrogen content of between 0.5% and 10%, preferably between 0.5% and 8%, more preferably between 0.5% and 6%, advantageously between 1.5% and 5%, more advantageously between 1.5% and 4% measured by XPS.

[0019] Advantageously, the nitrogen is obtained from an oxidizing gas chosen from the group including N2O, N2O2, NO2 and their combinations.

[0020] Preferably, said substrate is obtained by means of radio-frequency (RF) plasma treatment applied under vacuum.

[0021] Thus, RF plasma treatment applied under vacuum makes it possible to modify surface properties in a homogeneous, reproducible and uniform manner.

[0022] More preferably, said plasma treatment comprises an injection into a chamber of a gas mixture comprising predominantly by volume said oxidizing gas relative to the volume of said mixture, preferably in a volume ratio of said oxidizing gas to the volume of said gas of said hydrocarbon compound between 70 / 30 and 95 / 5, preferably a volume ratio of 80 / 20, more preferably of 90 / 10.

[0023] Advantageously, said oxidizing gas comprises at least one nitrogen atom and is preferably chosen from the group comprising N2O, N2O2, NO2 and their combinations.

[0024] More advantageously, said gas of a hydrocarbon compound has the structure CxH yin which x is equal to at least 1 and H is equal to at least 2, preferably at least 4, preferably selected from the group comprising acetylene, ethylene, ethane, methane, propane, butane and their combinations.

[0025] The hydrocarbon compound can preferentially be an alkane, an alkene, an alkyne, or combinations thereof. A mixture comprising N2O and methane is particularly preferred.

[0026] Even more advantageously, said plasma treatment is generated at a frequency between 5 kHz and 2.45 GHz.

[0027] Preferably, said plasma treatment is carried out over a period of time between 5 and 2000 s.

[0028] Preferably, said plastic substrate is chosen from the group comprising, in woven or non-woven form, polylactic acid (PLA), polycarbonate, polystyrene, polyethylene terephthalate (PET), polymethyl methacrylate (PMMA) and their combinations.

[0029] More preferably, the substrate according to the invention further comprises, after plasma treatment, a biological material is deposited on said substrate to allow culture of said biological material adhering to said substrate.

[0030] The invention also relates to a plasma device for producing said substrate according to the invention and having: a chamber having a transverse plane including at least a first set of longitudinal electrodes extending from a lower part of said chamber to an upper part of said chamber and comprising a plurality of electrode pairs (Px and Mx) each formed of a power electrode (hereinafter referred to as Electrode PI) and a ground electrode (hereinafter referred to as Electrode Ml), said electrode pairs being aligned perpendicularly to the transverse plane of said chamber, said Electrodes PI and Ml being parallel and separated from each other by a distance d,and a second set of longitudinal electrodes extending from a lower part of said chamber to an upper part of said chamber and comprising a plurality of electrode pairs (Px and Mx) each formed of a power electrode (hereinafter referred to as Electrode P2) and a ground electrode (hereinafter referred to as Electrode M2), said electrode pairs being aligned perpendicularly to the transverse plane of said chamber, said Electrodes P2 and M2 being separated from each other by a distance d', said first set of electrodes being separated from said second set of electrodes by a space E forming a three-dimensional receiving zone intended to receive said substrate and, an inlet arranged for injecting a gas mixture containing an oxidizing gas and a gas of a hydrocarbon compound,characterized in that each set of electrodes referred to above is arranged to provide a voltage between the electrodes leading to the formation of an after-discharge in said three-dimensional receiving zone with chemical modification of said at least a portion of the surface of said substrate.

[0031] In a preferred realization, the distance d or d' is between 0.1 cm and 2 cm.

[0032] Advantageously d and d' have equal or different values.

[0033] Advantageously, said space E is between 0.5 cm and 100 cm, preferably between 1 cm and 80 cm, more preferably between 4 and 40 cm, more preferably still between 4 and 20 cm, advantageously between 4 and 10 cm.

[0034] Advantageously, the electrodes (Px, Mx electrodes) are parallel to each other; preferably, the electrodes of a pair of electrodes (Px and Mx) are parallel to each other. This also applies when several pairs of electrodes are part of the chamber.

[0035] More preferably still, said substrate is moved into said space E which is located between each set of electrodes during plasma treatment.

[0036] Advantageously, said chamber includes a roller conveying system which extends in space E and on which said substrate to be treated is transported.

[0037] The invention also relates to a substrate that can be obtained by a process comprising the following steps:

[0038] - To supply the plastic substrate to a chamber of the plasma device according to the invention,

[0039] Injection into said chamber of a gas mixture containing an oxidizing gas and a gas of a hydrocarbon compound,

[0040] Treatment of said substrate by applying a voltage between the electrodes of each set of electrodes mentioned above, leading to the formation of an after-discharge in said receiving zone with chemical modification of said at least a portion of the surface of said substrate,

[0041] Obtaining a substrate in which said at least a surface part has groups containing at least one nitrogen atom resulting from a vacuum plasma polymerization carried out in the presence of said gas mixture.

[0042] The process described in the present invention uses a vacuum plasma that is less aggressive than those described in the prior art due to the use of afterdischarge, which reduces ion bombardment. Furthermore, there is little or no fouling in the chamber, enabling a continuous process for high-quality treatment of large-scale surfaces.

[0043] More preferably, said mixture comprises predominantly by volume said oxidizing gas relative to the volume of said mixture, preferably in a ratio by volume of said oxidizing gas to the volume of said gas of said hydrocarbon compound between 70 / 30 and 95 / 5, preferably a volume ratio of 80 / 20, more preferably of 90 / 10.

[0044] In a particularly advantageous manner, said oxidizing gas comprises at least one nitrogen atom and is preferably chosen from the group comprising N2O, N2O2, NO2 and their combinations.

[0045] In a preferred configuration, said gas of a hydrocarbon compound has the structure CxH y in which x is equal to at least 1 and H is equal to at least 2, preferably at least 4, preferably selected from the group comprising acetylene, ethylene, ethane, methane, propane, butane and their combinations.

[0046] The hydrocarbon compound can preferentially be an alkane, an alkene, an alkyne or combinations thereof.

[0047] According to the invention, the mixture comprising N2O and methane is particularly preferred.

[0048] Preferably, said plastic substrate is chosen from the group comprising, in woven or non-woven form, polylactic acid (PLA), polycarbonate, polystyrene, polyethylene terephthalate (PET), polymethyl methacrylate (PMMA) and their combinations.

[0049] More preferably, the substrate according to the invention further comprises, after obtaining the plasma-treated substrate, a step of culturing a biological material carried out on said substrate.

[0050] More preferably still, said substrate is moved into said space E which is located between each set of electrodes during plasma treatment.

[0051] Advantageously, the chamber includes a roller conveyor system extending into space E, over which the substrate to be treated is transported. All the aforementioned features can also be combined with this embodiment, particularly those relating to the substrate and the production process.

[0052] The invention also relates to a method for manufacturing the substrate according to the invention, which comprises the following steps:

[0053] - Provide the plastic substrate,

[0054] Injection into said chamber of a gas mixture containing an oxidizing gas and a gas of a hydrocarbon compound,

[0055] Treatment of said substrate by applying a voltage between the electrodes of each set of electrodes mentioned above, leading to the formation of an after-discharge in said receiving zone with chemical modification of said at least a portion of the surface of said substrate,

[0056] Obtaining a substrate in which said at least a surface part has groups containing at least one nitrogen atom resulting from a vacuum plasma polymerization carried out in the presence of said gas mixture.

[0057] All the characteristics mentioned above for other embodiments can also be combined with the process described above, particularly the characteristics related to the substrate and the device according to the invention.

[0058] The term "culturing of biological material" refers, within the context of the present invention, to any material capable of being cultured, including cellular, bacterial, microbial, tissue, or protein material. The culture is established following the adhesion of the biological material described in the invention.

[0059] A biological material within the meaning of the present invention means a biological material selected from the group comprising cells, bacteria, yeasts, fungi, biological tissues, materials from biological samples or histological sections and proteins.

[0060] The expression "under vacuum" refers to a low-pressure atmosphere, lower than atmospheric pressure.

[0061] The phrase "said at least one surface of the substrate" can also be replaced by "the entire surface of the substrate".

[0062] The atomic percentages of the elements C, O, and N were determined by X-ray induced photoelectron spectroscopy (XPS) on the substrate obtained after treatment. Flyover spectra were obtained using a Nova-Kratos™ instrument and an Al-K source. a monochromatic (225 W) over an area of ​​300 m x 700 m |Jir 2 normal detection (detection angle 0 = 0°) were carried out.

[0063] The static contact angle of the water according to the invention was determined at 23°C and 50% relative humidity using a Krüss DSA 25 apparatus. Several 1 L water drops were deposited onto the treated surface of the film using a syringe. A lateral image was captured with a camera to clearly show the droplet profile. The angle formed at the point where the droplet meets the surface was determined from the tangent at the point of contact between the droplet and the surface.

[0064] The surface energy used in the context of the present invention can be calculated from the contact angle measurements of two liquids (water and diiodomethane) according to the Owens, Wendt, Rabel and Kaelble (OWRK) model.

[0065] The present invention provides a plastic substrate, part of whose surface exhibits sufficient adhesion over time to allow the reproduction of biological matter.

[0066] The substrate according to the invention can be supplied using a vacuum plasma.

[0067] The chamber used in the context of the invention comprises at least a first set of longitudinal electrodes extending from a lower part of said chamber to an upper part of said chamber and comprising a plurality of electrode pairs, each consisting of a power electrode (hereinafter referred to as Electrode PI) and a ground electrode (hereinafter referred to as Electrode M1), said electrode pairs being aligned perpendicularly to the transverse plane of said chamber, said Electrodes PI and M1 being parallel and separated from each other by a distance d, and a second set of longitudinal electrodes extending from a lower part of said chamber to an upper part of said chamber and comprising a plurality of electrode pairs, each consisting of a power electrode (hereinafter referred to as Electrode P2) and a ground electrode (hereinafter referred to as Electrode M2).said electrodes P2 and M2 being separated from each other by a distance of...

[0068] Thus, each electrode set as defined in the invention may advantageously comprise a series of longitudinal electrode pairs (Px and Mx), where each electrode pair consists of a power electrode (Px) and a ground electrode (Mx) that are parallel to each other, and x represents the number of electrode sets. Therefore, x is equal to 1 for the first electrode set, x is equal to 2 for the second electrode set, and so on, depending on the number of electrode sets in the plasma chamber.

[0069] In the designation M1, for example, the number 1 refers to the first set of electrodes. This logic is repeated for the designation M2, which relates to the ground electrode of the second set of electrodes, and so on for the other sets of electrodes, depending on the number of sets of electrodes included in the plasma chamber.

[0070] The number of electrode sets is preferably at least 2, preferably at least 4, more preferably at least 8, advantageously at least 12, preferably at least 100 electrodes.

[0071] Each set of electrodes comprises at least 2, preferably at least 4, more preferably at least 100 electrodes.

[0072] Preferably, each set of electrodes comprises a number of electrode pairs, preferably at least 2.

[0073] Advantageously, for the first electrode set, the electrode pair P1 and M1 is adjacent to the next electrode pair P2 and M2, and so on (in the order of enumeration of the electrode pairs). This is applicable to each electrode set depending on the configuration of the plasma chamber. Furthermore, the electrode pairs of a given set are linked and / or connected to each other, preferably at each of their ends.

[0074] The electrodes according to the invention can be supplied in various forms, including "L" shapes, bars, pipes, plates, etc.

[0075] According to a preferred mode, each pair of electrodes in a given electrode set comprises a power electrode and a ground electrode, said power electrode has at least one surface facing one of the surfaces of said ground electrode, and are preferably parallel to each other.

[0076] Advantageously, for a given electrode pair, the power electrode has a first surface parallel to a first surface of a ground electrode. Also, the aforementioned power electrode may have a second surface that is parallel to a second surface of said ground electrode, particularly when the electrode is L-shaped.

[0077] Advantageously, each pair of electrodes is separated from an adjacent pair of electrodes by a predetermined distance. According to a preferred mode, each set of electrodes extends along a vertical axis on the transverse plane AL- Y , where y corresponds to the enumeration of the electrode sets. Thus, y is equal to 1 for the first electrode set, y is equal to 2 for the second electrode set, etc. The electrode sets are separated from each other and extend along their axis Ai_- y corresponding.

[0078] More preferably, the vertical axes Ai-y are parallel to each other and possibly separated from said space E.

[0079] According to an advantageous embodiment, the chamber of the invention having a transverse plane includes at least a first set of longitudinal electrodes extending from a lower part of the chamber to an upper part of the chamber and comprising at least one pair of electrodes formed by Electrode PI and Electrode M1. Electrodes PI and M1 are aligned perpendicular to the transverse plane and separated from each other by a distance d. The chamber may also include a second set of electrodes: Electrode P2 and Electrode M2, which are separated from each other by a distance d'.

[0080] Said first set of electrodes is preferably separated from said second set of electrodes by a three-dimensional space E forming a reception area into which said substrate is introduced, for example on a support which can move from bottom to top (and vice versa) or from left to right (and vice versa).

[0081] Thus, by way of example, a chamber according to an embodiment of the invention may contain a first set of electrodes, extending along an AL-I axis, containing 10 pairs of electrodes P1 and M1, and a second set of electrodes containing 10 pairs of electrodes P2 and M2, extending along an AL-2 axis, said space E being located between these two sets of electrodes in order to provide the three-dimensional substrate reception area. This configuration can be repeated to form several three-dimensional reception areas within the chamber.

[0082] Each set of electrodes can extend from a lower part of the chamber to an upper part of it.

[0083] The chamber can advantageously include several sets of electrodes (4 for example), preferably parallel to each other, in order to form several E spaces and thus several three-dimensional reception zones within the chamber. This makes it possible to increase production capacities.

[0084] The chamber as defined in the invention may comprise at least two sets of electrodes. It is also envisaged that the chamber may comprise several sets of electrodes. By way of example, Figure 1 is a plan view and illustrates, in a non-limiting manner, a device for the plasma treatment of a substrate. The device consists of a chamber 7 in which a first set of longitudinal electrodes 4 is aligned perpendicularly to the transverse plane. This first set of electrodes 4 comprises twelve pairs of electrodes, each consisting of a ground electrode 2 and a power electrode 3 separated by a distance 1 (d). Each electrode has an "L" shape. This set of electrodes extends from the lower part of the chamber 7 to an upper part delimited by a rail shown in dashed lines.Opposite the first set of electrodes is a second set of electrodes 5, also consisting of twelve pairs of ground and power electrodes separated by a distance 1'. Between these two sets of electrodes is space E6, which forms a three-dimensional receiving area into which a substrate can be introduced. A support is arranged within this space E6, allowing at least one substrate to be deposited on it. The device also includes an inlet (not shown) designed to inject a gas mixture into chamber 7.

[0085] Figure 2 shows a slanted view of chamber 7 of the device described above. The L-shaped ground electrode 2 and the L-shaped power electrode 3 have facing surfaces and thus adopt a configuration that forms an open-edged rectangle whose longer sides are separated by a distance 1.

[0086] Figure 3 represents a device which includes several plasma treatment chambers 7 comprising within each inner wall a set of electrodes 4,5 composed of twelve pairs.

[0087] Thus, a substrate to be treated can be introduced into the chamber, for example EMMA or PS.

[0088] A vacuum sealing process is carried out.

[0089] An oxidizing gas such as N2O and a hydrocarbon compound gas, methane, can be introduced into the plasma chamber. A mixture containing N2O and methane is particularly preferred.

[0090] Applying a voltage is advantageously achieved by connecting the power electrodes to an electrical generator that can apply a voltage at a frequency ranging from kHz to MHz, advantageously from kHz to several hundred MHz, for example between 100 and 999 MHz. The frequency applied within the framework of the invention can be between 2 and 900 kHz or between 1 and 500 MHz.

[0091] Applying voltage to the electrodes allows for the formation of an afterdischarge in the receiving area with chemical modification of said at least a part of the surface of said substrate, preferably the entire surface of the substrate.

[0092] This makes it possible to provide a hydrophilic substrate which has groups containing at least one nitrogen atom (preferably from an oxidizing gas chosen from the group including N2O, N2O2, NO2 and their combinations) resulting from a vacuum plasma polymerization carried out in the presence of said gas mixture.

[0093] All the characteristics mentioned relating to a set of electrodes are transposable to a system which includes several sets of electrodes in which each set of electrodes includes a series of pairs of electrodes as defined within the framework of the present invention.

[0094] The invention makes it possible to treat several types of substrates, in this case a petri dish, the internal surface of a bottle or any other material which must exhibit a certain adhesion, particularly in the field of cell biology.

[0095] Example 1

[0096] A polystyrene substrate is treated according to the plasma process according to the invention and comprises between 78.5 and 86.4% carbon, between 11.4 and 15.4% oxygen and between 1.9 and 3.6% nitrogen, determined by XPS. The contact angle being approximately 35°.

[0097] Adhesion is clearly observed in the presence of a protein with efficient replication.

[0098] Example 2

[0099] A PS substrate was treated according to the invention by plasma with a (90 / 10) mixture of N2O / CH4 made with post-discharge. It was observed that the static contact angle of the water is between 30 and 60° immediately after treatment. The observed value stabilizes after 1-3 days and is maintained over time, for example, after 1 week, while maintaining the static contact angle.

[0100] Comparative example

[0101] A PS substrate was plasma-treated for 1000 seconds with a 1'02" beam under the same conditions as those described in Example 2. It was found that the static contact angle was less than 30°. Furthermore, over time, the contact angle increased by at least 300%, and after one week of treatment, the value remained below 30°. This indicates a lack of stability and inefficiency compared to the effects achieved under the present invention.

[0102] The articles "a" and "an" are used here to refer to one or more of one (i.e., at least one) of the grammatical objects of the article and can be replaced by an article that denotes a plural such as "at least 2", "at least 3", "several", etc.

[0103] The expressions "in one embodiment," "according to one embodiment," and other equivalent expressions generally mean that the particular feature, structure, or characteristic referred to in the expression is included in at least one embodiment of this disclosure, and may be included in more than one embodiment of this disclosure. It is important to note that such expressions do not necessarily refer to the same embodiment.

[0104] If the text indicates that a component or feature "may" or "could" be included or have a feature, it is not necessary that this particular component or feature be included or have the feature.

[0105] If it appears here, the term "comprising" or "containing" and derivatives thereof are not intended to exclude the presence of any additional component, step, or procedure, whether or not disclosed herein. For the avoidance of doubt, the term "comprising" may include any additional element / additive, adjuvant, or compound unless otherwise specified. By contrast, the term "essentially consisting of," if it appears here, excludes from the scope of any subsequent quotation any other component, step, or procedure except those not essential to operability, and the term "consisting of," if used, excludes any component, step, or procedure not specifically defined or indicated. The terms "or" and "and / or," unless otherwise specified, refer to the members indicated individually as well as in any combination. For example, the expression A and / or B refers to A alone, B alone, or A and B.Within the framework of the present invention, any singular article such as for example, "a", "an", "the", "of", "of" can be replaced by an article which designates a plural such as for example "at least 2", "at least 3", "several" etc.

[0106] The word "include", "contains" or any equivalent or derived term may be replaced by "consisting of" in order to define a list or exclusive selection possibilities so as not to encompass other elements not mentioned in the expression used.

[0107] Also, the terms "obtainable" or "can be obtained" or any similar or derived expression may be replaced by "directly obtained".

[0108] It is understood that the present invention is in no way limited to the embodiments described above and that many modifications can be made to it without departing from the scope of the attached claims.

Claims

DEMANDS 1. A plastic substrate having at least a hydrophilic surface area and arranged to permit the culturing of selected biological material from the group comprising cells, bacteria, yeasts, fungi, biological tissues, materials from biological samples or histological sections, and proteins, characterized in that said at least a hydrophilic surface area is obtained by means of a plasma process and exhibits: - a static contact angle of less than 80°, preferably between 5 and 80°, preferably between 10 and 70°, more preferably between 20 and 60°, and even more preferably between 30 and 60°, and - an oxygen content between 5% and 40%, a carbon content between 50% and 95%, a nitrogen content between 0.5% and 10%, preferably between 0.5% and 8%, more preferably between 0.5% and 6%, measured by XPS.

2. Substrate according to claim 1, characterized in that said substrate is obtained by means of a radio-frequency (RF) plasma treatment applied under vacuum 3. Substrate according to claim 1 or 2, characterized in that said plasma treatment comprises an injection into a chamber (7) of a gas mixture containing an oxidizing gas and a gas of a hydrocarbon compound, comprising predominantly by volume said oxidizing gas relative to the volume of said mixture, preferably in a volume ratio of said oxidizing gas to the volume of said gas of said hydrocarbon compound of between 70 / 30 and 95 / 5, preferably a volume ratio of 80 / 20, more preferably of 90 / 10.

4. Substrate according to any one of the preceding claims, characterized in that said oxidizing gas comprises at least one nitrogen atom and is preferably selected from the group comprising N2O, N2O2, NO2 and their combinations.

5. Substrate according to any one of the preceding claims, characterized in that said gas of a hydrocarbon compound has the structure CxH y in which x is equal to at least 1 and H is equal to at least 2, preferably at least 4, preferably selected from the group comprising acetylene, ethylene, ethane, methane, propane, butane and their combinations.

6. Substrate according to any one of the preceding claims, characterized in that said plasma treatment is generated at a frequency between 5 kHz and 2.45 GHz.

7. Substrate according to any one of the preceding claims, characterized in that said plasma treatment is carried out for a period of time between 5 and 2000 s.

8. Substrate according to any one of the preceding claims, characterized in that said plastic substrate is selected from the group comprising, in woven or non-woven form, polylactic acid (PLA), polycarbonate, polystyrene, polyethylene terephthalate (PET), polymethyl methacrylate (PMMA) and their combinations.

9. Substrate according to any one of the preceding claims, characterized in that, after plasma treatment, biological material is deposited on said substrate to allow culture of said biological material adhering to said substrate.

10. Plasma device arranged to produce the substrate according to any one of the preceding claims, characterized in that it has: - a chamber (7) having a transverse plane including at least a first set of longitudinal electrodes (4) extending from a lower part of said chamber (7) to an upper part of said chamber and comprising a plurality of electrode pairs (Px and Mx) each formed of a power electrode (3) (hereinafter referred to as Electrode PI) and a ground electrode (2) (hereinafter referred to as Electrode Ml), said electrode pairs being aligned perpendicularly to the transverse plane of said chamber (7), said Electrodes PI and Ml being parallel and separated from each other by a distance d (1 ),and a second set of longitudinal electrodes (5) extending from a lower part of said chamber to an upper part of said chamber and comprising a plurality of electrode pairs (Px and Mx), each consisting of a power electrode (3) (hereinafter referred to as Electrode P2) and a ground electrode (2) (hereinafter referred to as Electrode M2), said electrode pairs being aligned perpendicularly to the transverse plane of said chamber, said Electrodes P2 and M2 being separated from each other by a distance of (1'), said first set of electrodes being separated from said second set of electrodes by a space E (6) forming a three-dimensional receiving zone, intended to receive said substrate and, An inlet arranged to inject a gas mixture containing an oxidizing gas and a gas of a hydrocarbon compound, characterized in that each set of electrodes referred to above is arranged to provide a voltage between the electrodes leading to the formation of an after-discharge in said three-dimensional receiving zone with chemical modification of said at least a portion of the surface of said substrate. 1 1. Plasma device according to claim 10, characterized in that the distance d (1 ) or d' (1 ') is between 0.1 cm and 2 cm.

12. Plasma device according to claim 10 or 11, characterized in that said space E (6) is between 0.5 cm and 100 cm, preferably between 1 cm and 80 cm, more preferably between 4 and 40 cm, more preferably still between 4 and 20 cm, advantageously between 4 and 10 cm.

13. Plasma device according to any one of claims 10 to 12, characterized in that the electrodes (Electrodes Px, Mx) are parallel to each other, preferably the electrodes of a pair of electrodes (Px and Mx) are parallel to each other.

14. Plasma device according to any one of claims 10 to 13, characterized in that said substrate is moved into said space E (6) which is located between each set of electrodes during plasma treatment.

15. Plasma device according to any one of claims 10 to 14, characterized in that said chamber (7) comprises a roller conveying system which extends into space E (6) and on which said substrate to be treated is transported.

16. A method for manufacturing the substrate according to any one of claims 1 to 9 comprising the following steps: Providing a plastic substrate in a chamber (7) of the plasma device according to any one of claims 10 to 15, Injection into said chamber of a gas mixture containing an oxidizing gas and a gas of a hydrocarbon compound, Treatment of said substrate by applying a voltage between the electrodes of each set of electrodes (4,5) referred to above, leading to the formation of an after-discharge in said receiving zone with chemical modification of said at least a part of the surface of said substrate, Obtaining a substrate in which said at least a surface part has groups containing at least one nitrogen atom resulting from a vacuum plasma polymerization carried out in the presence of said gas mixture.

Citation Information

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