Display substrate and display apparatus

Abstract

A display substrate and a display apparatus. The display substrate comprises a base substrate (01), and a plurality of rings of first isolation columns (100), a first organic layer (410), an inorganic layer (500), and a second organic layer (420) that are located on the base substrate (01); the first isolation columns (100) surround a hole area; the first isolation columns (100) at least comprise a first isolation layer (110) and a second isolation layer (120) that are stacked; the edge of the second isolation layer (120) protrudes relative to the edge of the first isolation layer (110); the first isolation layer (110) and the second isolation layer (120) are both made of conductive materials; a second isolation column (200) surrounds the first isolation columns (100); the second isolation column (200) comprises a third isolation layer (210) and a fourth isolation layer (220) that are stacked; the third isolation layer (210) is a structure in the first organic layer (410); the fourth isolation layer (220) is a structure in the inorganic layer (500); the edge of the fourth isolation layer (220) protrudes relative to the edge of the third isolation layer (210); the first isolation column (100) among the first isolation columns (100) closest to the second isolation column (200) is a first inner-ring isolation column (101); the first inner-ring isolation column (101) is not in contact with the second organic layer (420). Therefore, the present application is conducive to mitigating the phenomenon of black spots when the display substrate is illuminated.

Description

Display substrate and display device

[0001] This application claims priority to Chinese Patent Application No. 202411064901.7, filed August 5, 2024, the disclosure of which is incorporated herein in its entirety by this reference as part of this application. TECHNICAL FIELD

[0002] Embodiments of the present disclosure relate to a display substrate and a display device. BACKGROUND

[0003] Organic light emitting diode (OLED) display products have a wide range of applications due to their rich colors, fast response time, foldability, and other advantages. Organic light emitting diode display devices include tandem light emitting devices, which improve the lifetime and brightness of light emitting devices and reduce power consumption by providing at least two layers of light emitting layers in the tandem light emitting device to meet user demands for display device service life, power consumption, and good display quality. SUMMARY

[0004] Embodiments of the present disclosure provide a display substrate and a display device.

[0005] Embodiments of the present disclosure provide a display substrate, comprising: a substrate substrate and a plurality of first isolation columns, a first organic layer, an inorganic layer, and a second organic layer located on the substrate substrate. The substrate substrate includes a first region and a second region, the first region surrounds at least part of the second region, the first region includes a display region, and the second region includes a hole region and a non-hole region surrounding the hole region; a plurality of first isolation columns are located on the non-hole region of the substrate substrate and surround the hole region, the first isolation columns at least include a first isolation layer and a second isolation layer stacked, the second isolation layer is located on the side of the first isolation layer away from the substrate substrate, the edge of the second isolation layer protrudes relative to the edge of the first isolation layer, and the materials of the first isolation layer and the second isolation layer are both conductive materials; the inorganic layer is located on the side of the first organic layer away from the substrate substrate; and the second organic layer is located on the side of the inorganic layer away from the substrate substrate. The non-hole region is provided with at least one circle of second isolation columns, the at least one circle of second isolation columns surrounds the plurality of first isolation columns, the second isolation columns include a third isolation layer and a fourth isolation layer stacked, the third isolation layer is located between the fourth isolation layer and the substrate substrate, the third isolation layer is a structure in the first organic layer, the fourth isolation layer is a structure in the inorganic layer, and the edge of the fourth isolation layer protrudes relative to the edge of the third isolation layer; the first isolation column closest to the second isolation column in the plurality of first isolation columns is a first inner ring isolation column, and the first inner ring isolation column does not contact the second organic layer.

[0006] For example, according to an embodiment of the present disclosure, the display substrate further comprises an interlayer insulating layer between the first isolation column and the substrate, and in contact with the first isolation column. The second organic layer comprises a residual portion between the second isolation column and the first inner ring isolation column, and in contact with the interlayer insulating layer, and a gap is provided between the residual portion and the first inner ring isolation column.

[0007] For example, according to an embodiment of the present disclosure, a distance between the first organic layer and edges of the first inner ring isolation column close to each other is greater than 10 microns.

[0008] For example, according to an embodiment of the present disclosure, the first organic layer comprises at least one film layer, the first organic layer comprises a flat portion on a side of the fourth isolation layer away from the first isolation column, the flat portion is located in the non-hole area, and a thickness of the flat portion is 2.5-5 microns.

[0009] For example, according to an embodiment of the present disclosure, the first organic layer comprises a slope close to the first isolation column, and an angle of the slope is less than 30 degrees.

[0010] For example, according to an embodiment of the present disclosure, the first organic layer comprises at most two film layers.

[0011] For example, according to an embodiment of the present disclosure, the fourth isolation layer has a ring shape, and a ring width of the fourth isolation layer is 10-100 microns.

[0012] For example, according to an embodiment of the present disclosure, the fourth isolation layer has a ring shape, a ring width of the fourth isolation layer is 50-200 microns, and the fourth isolation layer is provided with at least one slot exposing the third isolation layer.

[0013] For example, according to an embodiment of the present disclosure, a maximum dimension of the slot in a direction parallel to the substrate is 5-15 microns.

[0014] For example, according to an embodiment of the present disclosure, the second organic layer comprises at least one organic block covering the at least one slot.

[0015] For example, according to an embodiment of the present disclosure, the second organic layer comprises a covering portion covering the fourth isolation layer, an edge of a protruding portion of the fourth isolation layer protruding relative to the third isolation layer is exposed by the covering portion, and a distance between the edge of the protruding portion and an edge of the covering portion is greater than 5 microns.

[0016] For example, according to an embodiment of the present disclosure, the second isolation column closest to the display area in the at least one circle of second isolation columns is a second inner ring isolation column, and a distance between an edge of the covering portion covering the second inner ring isolation column and away from the display area and a boundary of the display area is not less than 150 microns.

[0017] For example, according to an embodiment of the present disclosure, the at least one circle of second isolation columns includes multiple circles of second isolation columns, and a distance between adjacent fourth isolation layers in adjacent second isolation columns is 5-15 microns.

[0018] For example, according to an embodiment of the present disclosure, the display substrate further includes at least one circle of blocking portions between the at least one circle of second isolation columns and the hole area. The blocking portion includes at least one blocking layer, which is a structure in at least one of the first organic layer and the second organic layer, and a distance between an edge of the blocking portion closest to the second isolation column and an edge of the covering portion covering the second inner ring isolation column and away from the display area is greater than 30 microns.

[0019] For example, according to an embodiment of the present disclosure, a depth of the third isolation layer is 1500 angstroms-4000 angstroms.

[0020] For example, according to an embodiment of the present disclosure, a size of an edge of the fourth isolation layer protruding relative to an edge of the third isolation layer is 50-200 nanometers.

[0021] For example, according to an embodiment of the present disclosure, a portion of the second organic layer located in the display area includes a pixel definition pattern.

[0022] For example, according to an embodiment of the present disclosure, the display area includes multiple sub-pixels, each sub-pixel including a first electrode, a light-emitting functional layer, and a second electrode stacked, the first electrode being between the light-emitting functional layer and the substrate, the light-emitting functional layer including multiple film layers; the pixel definition pattern is on a side of the first electrode away from the substrate, the pixel definition pattern including multiple openings and a pixel definition portion surrounding the multiple openings, the multiple openings being configured to expose the first electrode of the multiple sub-pixels; the display substrate includes a definition structure between adjacent sub-pixels and configured to block at least one layer of the light-emitting functional layer; the definition structure includes an inorganic definition layer, the inorganic definition layer including a structure of the inorganic layer between adjacent sub-pixels.

[0023] For example, according to an embodiment of the present disclosure, a portion of the first organic layer located in the display area is between the first electrode and the substrate.

[0024] For example, according to an embodiment of the present disclosure, the display substrate further comprises at least one third isolation column filling a gap between two adjacent first isolation columns. The third isolation column comprises an insulating material.

[0025] For example, according to an embodiment of the present disclosure, the display substrate further comprises at least one pad between the plurality of first isolation columns and the substrate. The at least one pad overlaps with at least one first isolation column in a direction perpendicular to the substrate.

[0026] Another embodiment of the present disclosure provides a display device comprising the display substrate provided by any one of the examples. BRIEF DESCRIPTION OF DRAWINGS

[0027] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings of the embodiments will be briefly introduced as follows. Obviously, the drawings in the following description are only related to some embodiments of the present disclosure and are not a limitation on the present disclosure.

[0028] FIG. 1 is a focused ion beam microscope image of the peripheral isolation columns, metal isolation columns and the area therebetween in a display substrate.

[0029] FIG. 2 is a plan view of a display substrate.

[0030] FIG. 3 is a schematic view of a partial cross-sectional structure along the line BB' in FIG. 2.

[0031] FIG. 4 is a focused ion beam microscope image of a partial position of the display substrate in FIG. 3.

[0032] FIG. 5 is a schematic view of a partial cross-sectional structure of a partial area in a first region.

[0033] FIG. 6 is a schematic view of a partial cross-sectional structure along the line BB' in FIG. 2 according to another example of an embodiment of the present disclosure.

[0034] FIG. 7 is a schematic view of a partial planar structure of a display substrate according to another example of an embodiment of the present disclosure.

[0035] FIG. 8 is a focused ion beam microscope image of a second isolation column in the display substrate in FIG. 7.

[0036] FIG. 9 is a schematic view of a partial planar structure of a display substrate according to another example of an embodiment of the present disclosure.

[0037] FIG. 10 is a partial enlarged view of the display substrate in FIG. 9.

[0038] FIG. 11 is a focused ion beam microscope image of a fourth isolation layer, a slot and an organic block in the display substrate in FIG. 9.

[0039] FIG. 12 is a schematic diagram of a partial planar structure of a display substrate according to another example provided by embodiments of the present disclosure.

[0040] FIG. 13 is an enlarged view of the region E shown in FIG. 12.

[0041] FIG. 14 is a schematic block diagram of a display device according to another embodiment of the present disclosure. DETAILED DESCRIPTION

[0042] In order to make the objects, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions of the embodiments of the present disclosure will be described clearly and completely below with reference to the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are some but not all of the embodiments of the present disclosure. Based on the described embodiments of the present disclosure, all other embodiments obtained by those of ordinary skill in the art without creative effort belong to the scope of the present disclosure.

[0043] Unless otherwise defined, technical terms or scientific terms used in the present disclosure should be understood as having the same meaning as commonly understood by one of ordinary skill in the art to which the present disclosure belongs. The terms "first", "second", and similar terms used in the present disclosure do not denote any order, quantity, or importance, but are used to distinguish different components. The terms "include", "contain", and similar terms mean that the elements or objects before the terms encompass the elements or objects listed after the terms and their equivalents, and do not exclude other elements or objects.

[0044] The terms "parallel", "perpendicular", and "same" and the like used in at least one embodiment of the present disclosure include the strict "parallel", "perpendicular", "same" and the like, and "approximately parallel", "approximately perpendicular", "approximately same" and the like with a certain error, which, considering the measurement and the error related to the measurement of a specific value (for example, the limitation of the measurement system), represents the acceptable deviation range for the specific value determined by those of ordinary skill in the art. For example, "approximately" can mean within one or more standard deviations, or within 10% or 5% of the value. When the quantity of a component is not specifically indicated in the following embodiments of the present disclosure, it means that the component can be one or more, or can be understood as at least one. "At least one" means one or more, and "multiple" means at least two. The "same layer" referred to in the disclosure means that two (or more) structures are formed by the same deposition process and patterned by the same patterning process, and their materials can be the same or different. The "integrally arranged structure" in the present disclosure means that two (or more) structures are formed by the same deposition process and patterned by the same patterning process, and are connected to each other, and their materials can be the same or different.

[0045] The light-emitting functional layer of the sub-pixel can include a plurality of light-emitting layers arranged in a stack, such as a tandem device. The tandem device has the characteristics of low power consumption and long service life. However, at least two layers of the plurality of light-emitting layers in the tandem device are provided with a charge generation layer (CGL). The charge generation layer has a relatively large conductivity. For example, when the charge generation layer is a full-area film layer, the charge generation layers of different color sub-pixels are continuous film layers, and there is a phenomenon of lateral migration of charges, which causes the display substrate to deviate in low gray scale monochromatic chroma, such as causing crosstalk between adjacent sub-pixels of different colors, such as between a red sub-pixel and a blue sub-pixel, or between a red sub-pixel and a green sub-pixel, or between a blue sub-pixel and a green sub-pixel, resulting in color deviation of the display substrate. For example, the charge generation layer can cause crosstalk between sub-pixels of different colors at low brightness, resulting in low gray scale color deviation.

[0046] By providing a partition structure between adjacent sub-pixels of different colors, the crosstalk between the sub-pixels can be reduced. For example, the partition structure can be a partition structure made of inorganic material.

[0047] In research, the inventors of the present application found that the peripheral area is provided with a light-transmitting hole area and a metal isolation column surrounding the hole area. The metal isolation column is used to partition the part of the light-emitting functional layer in the peripheral area. The cross section of the partitioned charge generation layer in the light-emitting functional layer will be electrically connected with the metal material in the metal isolation column, such as aluminum or titanium, resulting in incomplete power-off of the charge generation layer. For example, when the display panel is lit in a high temperature and high humidity or low temperature and high humidity test environment, the electric field generated by the above-mentioned electrical connection causes the water and oxygen in the environment to form an electrochemical electrolyte, which can cause the corrosion of oxygen silicon compounds or nitrogen silicon compounds in the packaging layer.

[0048] The peripheral area outside the display area can also be provided with a peripheral area isolation column formed by the same patterning process as the partition structure between the adjacent sub-pixels. The peripheral area isolation column can surround the hole area and the metal isolation column. By providing the peripheral area isolation column, the electrical connection of the cathode material of the light-emitting functional layer and the side of the light-emitting functional layer away from the substrate from the display area to the metal isolation column can be effectively partitioned, thereby solving the problem of Grow Dark Spot in Hole (GDSH) in the reliability environment caused by the large Tandem cross voltage and the incomplete power-off of the metal isolation column.

[0049] FIG. 1 is a focused ion beam (FIB) microscope image of a peripheral area isolation column, a metal isolation column and an intermediate area in a display substrate.

[0050] As shown in FIG. 1, in the study, the inventors of the present application also found that the partition structure using inorganic materials is provided with a pixel definition layer (PDL) on the side away from the substrate, and due to the partition structure, the exposure dose of the pixel definition layer in the display area is reduced, so that there is serious pixel definition layer residue 014 between the peripheral area isolation column 012 and the metal isolation column 011 in the non-display area, which causes the formation of a communication channel at the pixel definition layer residue 014 position after the subsequent light-emitting functional layer evaporation, and the water and oxygen release at this position is aggravated in the reliability process, thereby causing high incidence of GDSH defects in the subsequent reliability environment process.

[0051] As shown in FIG. 1, the reasons for the generation of the pixel definition layer residue 014 include: the exposure dose of the pixel definition layer in the display area is reduced; the organic layer 013 includes a large number of layers, such as three layers, so that the organic layer 013 has a large step at the boundary in the non-display area; in the case that the boundary of the organic layer 013 has a large step, the spacing between the boundary of the organic layer 013 and the metal isolation column 011 (such as 7.5 microns) is small, and the margin is insufficient in the exposure process.

[0052] For example, as shown in FIG. 1, the metal isolation column 011 is provided with an encapsulation layer 015 on the side away from the substrate.

[0053] The present disclosure provides a display substrate and a display device. The display substrate includes a substrate, a plurality of first isolation columns, a first organic layer, an inorganic layer, and a second organic layer on the substrate. The substrate includes a first area and a second area, the first area surrounds at least part of the second area, the first area includes a display area, and the second area includes a hole area and a non-hole area surrounding the hole area; the plurality of first isolation columns are located on the non-hole area of the substrate and surround the hole area, the first isolation column includes at least a first isolation layer and a second isolation layer stacked, the second isolation layer is located on the side away from the substrate of the first isolation layer, the edge of the second isolation layer protrudes relative to the edge of the first isolation layer, and the materials of the first isolation layer and the second isolation layer are conductive materials; the inorganic layer is located on the side away from the substrate of the first organic layer; and the second organic layer is located on the side away from the substrate of the inorganic layer. The non-hole area is provided with at least one second isolation column, the at least one second isolation column surrounds the plurality of first isolation columns, the second isolation column includes a third isolation layer and a fourth isolation layer stacked, the third isolation layer is located between the fourth isolation layer and the substrate, the third isolation layer is a structure in the first organic layer, the fourth isolation layer is a structure in the inorganic layer, and the edge of the fourth isolation layer protrudes relative to the edge of the third isolation layer; the first isolation column closest to the second isolation column in the plurality of first isolation columns is a first inner ring isolation column, and the first inner ring isolation column does not contact the second organic layer.

[0054] The display substrate provided by the present disclosure is beneficial to relieving the phenomenon of black spots when the display substrate is lighted by setting the second organic layer and the first inner ring isolation column without contact.

[0055] The display substrate and the display device provided by the embodiments of the present disclosure are described below with reference to the drawings.

[0056] FIG. 2 is a schematic plan view of a display substrate. FIG. 3 is a schematic view of a partial cross-sectional structure along the line BB' in FIG. 2. FIG. 4 is a focused ion beam (FIB) microscope view of a partial position of the display substrate in FIG. 3.

[0057] As shown in FIG. 3, the display substrate includes a substrate 01 and a plurality of first isolation columns 100, a first organic layer 410, an inorganic layer 500, and a second organic layer 420 on the substrate 01.

[0058] As shown in FIG. 2, the substrate 01 includes a first area A1 and a second area A2, the first area A1 surrounds at least part of the second area A2, the first area A1 includes a display area, and the second area A2 includes a hole area A21 and a non-hole area A22 surrounding the hole area A21. For example, the second area A2 includes a non-display area. For example, the display area is an area for displaying an image, and the non-display area is an area for not displaying an image. For example, the hole area A21 can be a light-transmitting area for setting a light sensor such as an infrared sensor, an ultrasonic sensor, a LIDAR (Light Detection and Ranging) sensor, a radar sensor, a camera, a distance sensor, but is not limited thereto; the non-hole area A22 can be a non-light-transmitting area for setting a blocking portion 710 and the like. For example, the second area A2 can also be an AA hole area. FIG. 2 schematically shows that the second area A2 includes one hole area A21, but is not limited thereto, and can include two or more hole areas A21.

[0059] FIG. 5 is a schematic view of a partial cross-sectional structure of a partial area in the first area.

[0060] As shown in FIGS. 2 and 3, the plurality of first isolation columns 100 are located on the non-hole area A22 of the substrate 01 and surround the hole area A21. FIGS. 2 and 3 schematically show that the number of the first isolation columns 100 is six, but is not limited thereto, and the number of the first isolation columns 100 can be set according to product requirements, such as nine, eight, or seven, and the number of the first isolation columns 100 can be less than six.

[0061] In some examples, as shown in FIG. 3, the display area includes a plurality of sub-pixels 460, each of which includes a first electrode 461, a light-emitting functional layer 463, and a second electrode 462 arranged in a stack, the first electrode 461 is located between the light-emitting functional layer 463 and the substrate 01, and the light-emitting functional layer 463 includes a plurality of film layers. For example, the non-hole area A22 does not arrange the sub-pixel 460 for display, and the first isolation column 100 can be a structure for isolating at least one film layer of the light-emitting functional layer 463 in the non-hole area A22 to prevent water and oxygen from invading the light-emitting functional layer 463 in the display area through the film layer in the non-hole area A22. For example, the first isolation column 100 can be a structure for isolating the film layer where the second electrode 462 is located in the non-hole area A22, so as to avoid affecting the electrical performance of the second electrode 462 in the display area.

[0062] For example, as shown in FIG. 3, the first isolation column 100 further includes a fifth isolation layer 130 located between the first isolation layer 110 and the substrate 01, and the material of the fifth isolation layer 130 includes a conductive material. For example, the materials of the first isolation layer 110 and the fifth isolation layer 130 are the same, and the material of the first isolation layer 110 is different from the material of the second isolation layer 120. For example, the edges of the first isolation layer 110 and the fifth isolation layer 130 are both protruded relative to the edge of the second isolation layer 120. For example, the isolation column 100 includes three metal layers, such as a titanium / aluminum / titanium structure.

[0063] As shown in FIG. 3, the first isolation column 100 at least includes the first isolation layer 110 and the second isolation layer 120 arranged in a stack, the second isolation layer 120 is located on the side of the first isolation layer 110 away from the substrate 01, the edge of the second isolation layer 120 is protruded relative to the edge of the first isolation layer 110, and the materials of the first isolation layer 110 and the second isolation layer 120 are both conductive materials. For example, the edge of the second isolation layer 120 is protruded relative to the edge of the first isolation layer 110 to isolate the part of the light-emitting functional layer 463 located in the non-hole area A22.

[0064] As shown in FIG. 3, the inorganic layer 500 is located on the side of the first organic layer 410 away from the substrate 01, and the second organic layer 420 is located on the side of the inorganic layer 500 away from the substrate 01. For example, the inorganic layer 500 is located between the first organic layer 410 and the second organic layer 420. For example, the material of the inorganic layer 500 can include inorganic materials such as silicon oxide, silicon nitride, or silicon oxynitride.

[0065] As shown in FIG. 3, the non-hole area is provided with at least one circle of second isolation columns 200 (not shown in FIG. 2), which surrounds the plurality of circles of first isolation columns 100. The second isolation column 200 includes a third isolation layer 210 and a fourth isolation layer 220 which are stacked, the third isolation layer 210 is located between the fourth isolation layer 220 and the substrate 01, the third isolation layer 210 is a structure in the first organic layer 410, the fourth isolation layer 220 is a structure in the inorganic layer 500, and the edge of the fourth isolation layer 220 protrudes relative to the edge of the third isolation layer 210. For example, the second isolation column 200 assists the first isolation column 100 to block at least one film layer of the light-emitting functional layer 463 in the non-hole area, so as to prevent water and oxygen from invading the light-emitting functional layer 463 in the display area through the film layer in the non-hole area and affecting the display. For example, the second isolation column 200 assists the first isolation column 100 to block the film layer where the second electrode 462 is located in the non-hole area, so as to avoid affecting the electrical performance of the second electrode 462 in the display area.

[0066] For example, one circle of second isolation columns 200 can be one circle of continuous isolation columns, but is not limited thereto, and one circle of second isolation columns 200 can also be one circle of structures which are arranged at intervals.

[0067] As shown in FIG. 3, one circle of first isolation columns 100 closest to the second isolation column 200 in the plurality of circles of first isolation columns 100 is a first inner ring isolation column 101, and the first inner ring isolation column 101 does not contact the second organic layer 420. For example, an interval is arranged between the first inner ring isolation column 101 and the second organic layer 420.

[0068] In the display substrate provided by the present disclosure, by arranging the second organic layer and the first inner ring isolation column to be in contact, the phenomenon of black spots appearing when the display substrate is lighted up can be alleviated.

[0069] In some examples, as shown in FIG. 3, the display substrate further includes an interlayer insulating layer 600 located between the first isolation column 100 and the substrate 01, the first isolation column 100 contacts the interlayer insulating layer 600, the second organic layer 420 includes a residual portion 421 located between the second isolation column 200 and the first inner ring isolation column 101 and contacting the interlayer insulating layer 600, and an interval is arranged between the residual portion 421 and the first inner ring isolation column 101. For example, the second organic layer 420 does not contact the first inner ring isolation column 101, that is, the residual portion 421 included in the second organic layer 420 does not contact the first inner ring isolation column 101.

[0070] The residual portion 421 is a process residue formed in the process of the second organic layer 420 due to a decrease in the exposure dose of the second organic layer 420, a large boundary segment difference of the first organic layer 410, and the like. For example, the size of the residual portion 421 in the Y direction can be greater than 7 microns, such as not less than 7.5 microns.

[0071] In some examples, as shown in FIGS. 3 and 4, the distance D1 between the first organic layer 410 and the edge of the first inner ring isolation column 101 close to each other is greater than 10 microns. For example, the edge of the first inner ring isolation column 101 can be the edge of one of the isolation layers closest to the substrate 01, such as the fifth isolation layer 130, but is not limited thereto. When the first inner ring isolation column 101 only includes the first isolation layer 110 and the second isolation layer 120, the edge of the first inner ring isolation column 101 can be the edge of the first isolation layer 110.

[0072] With respect to the case where the spacing between the organic layer and the metal isolation column shown in FIG. 1 is 7.5 microns, in the display substrate provided by the present disclosure, by adjusting the distance between the first organic layer 410 and the first inner ring isolation column 101 to be greater than 10 microns, such as increasing the distance between the boundary of the first organic layer 410 and the edge of the first inner ring isolation column 101, it is beneficial to improve the exposure process margin of the second organic layer 420, prevent the process residue formed in the process of the second organic layer 420 from contacting the first isolation column 100, and thus improve the impact of the residual portion 421 on the subsequent reliability environment process.

[0073] For example, as shown in FIGS. 3 and 4, the distance between the first organic layer 410 and the edge of the first inner ring isolation column 101 close to each other is less than 50 microns. For example, the distance between the first organic layer 410 and the edge of the first inner ring isolation column 101 close to each other is 12-20 microns. For example, the distance between the first organic layer 410 and the edge of the first inner ring isolation column 101 close to each other is 15-25 microns. For example, the distance between the first organic layer 410 and the edge of the first inner ring isolation column 101 close to each other is 19-19.5 microns.

[0074] For example, as shown in FIG. 3, the first inner ring isolation column 101 can be moved away from the second isolation column 200 to increase the distance between the first inner ring isolation column 101 and the boundary of the first organic layer 410. For example, the distance between adjacent first isolation columns 100 can be reduced to increase the distance between the first inner ring isolation column 101 and the second isolation column 200. For example, the edge of the first organic layer 410 can be moved away from the first inner ring isolation column 101, such as reducing the thickness of the edge of the first organic layer 410, to increase the distance between the two.

[0075] For example, as shown in FIG. 3, the distance between the first inner ring isolation column 101 and the boundary of the first organic layer 410 is greater than the distance between adjacent first isolation columns 100, so as to prevent the process residue of the second organic layer 420 from being formed between the adjacent first isolation columns 100.

[0076] For example, as shown in FIG. 3, the first organic layer 410 can be a flat layer. For example, the first organic layer 410 includes a plurality of film layers, such as three film layers arranged in a stack. For example, the boundary of one of the film layers farthest away from the substrate substrate 01 side of the first organic layer 410 is the boundary of the first organic layer 410, which includes a slope with a slope angle a1 of 15-50 degrees. For example, the slope angle a1 is greater than 30 degrees.

[0077] For example, the first organic layer 410 shown in FIG. 3 includes a flat portion 411 located on the side of the fourth isolation layer 220 away from the first isolation column 100, and the thickness H1 of the flat portion 411 is greater than 5 microns. For example, the thickness H1 of the flat portion 411 can be 6 microns. The above-mentioned flat portion 411 refers to the portion of the first organic layer 410 having a flat surface and located in the non-hole region, which is located on the side of the second isolation column 200 away from the first isolation column 100. For example, in the direction perpendicular to the substrate substrate 01, the flat portion 411 does not substantially overlap with the inorganic layer 500.

[0078] The thickness of the flat portion 411 in the display substrate shown in FIG. 3 can be equal to the thickness of the flat portion in the organic layer 013 in the display substrate shown in FIG. 1. In the display substrate provided by the present disclosure, by increasing the distance between the edge of the first organic layer 410 and the first inner ring isolation column 101 to increase the distance between the residual portion 421 and the first inner ring isolation column 101 while keeping the thickness of the first organic layer 410 unchanged, the residual portion 421 is prevented from contacting the first isolation column 100. Of course, the embodiments of the present disclosure are not limited thereto, and the distance between the edge of the first organic layer 410 and the first inner ring isolation column 101 can also be increased while reducing the thickness of the first organic layer 410, so as to further improve the influence of the residual portion 421 on the subsequent reliability environment process.

[0079] For example, as shown in FIG. 3, the display substrate further includes a buffer layer and a shielding layer 02 and a gate insulating layer 03 located between the substrate substrate 01 and the interlayer insulating layer 600. For example, the film layer 040 shown in FIG. 5 includes a film layer between the interlayer insulating layer 600 and the substrate substrate 01.

[0080] In some examples, as shown in FIG. 3, the display substrate further includes at least one row of spacers 720 between the plurality of rows of first isolation columns 100 and the substrate 01, the at least one row of spacers 720 overlaps the at least one row of first isolation columns 100 in a direction perpendicular to the substrate 01, so as to elevate the first isolation columns 100, thereby further improving the effect of the first isolation columns 100 in blocking the film layers.

[0081] For example, as shown in FIG. 3, the spacers 720 can include at least one pad layer. For example, the spacers 720 can include at least one of a first metal pad layer 721 and a second metal pad layer 722. For example, the first metal pad layer 721 is arranged between the gate insulating layer 03 and the first isolation column 100, and / or the second metal pad layer 722 is arranged between the buffer layer and the barrier layer 02 and the first isolation column 100. For example, the first metal pad layer 721 and the second metal pad layer 722 both overlap the isolation column 100 in a direction perpendicular to the substrate 01. For example, the first metal pad layer 721 and the second metal pad layer 722 are both annular in shape. For example, at least one of the first metal pad layer 721 and the second metal pad layer 722 can be a film layer in which the gate lines in the display area are located. FIG. 3 schematically shows that the first metal pad layer and the second metal pad layer can be arranged between the first isolation column 100 and the substrate 01 at the same time, but are not limited thereto, and one of the first metal pad layer and the second metal pad layer can be arranged between the first isolation column 100 and the substrate 01, i.e., the spacers 720 can include one pad layer.

[0082] In some examples, as shown in FIG. 3, the display substrate further includes at least one row of third isolation columns 300 filling the gap between two adjacent rows of first isolation columns 100, and the material of the third isolation columns 300 includes an insulating material, which is beneficial to prevent the first isolation columns 100 from being electrically connected to the film layers such as the light-emitting functional layer 463.

[0083] For example, as shown in FIG. 3, the third isolation columns 300 can be the same material as the spacers (PS) in the first area, such as being formed in the same patterning process.

[0084] In some examples, as shown in FIG. 5, the part of the second organic layer 420 located in the display area includes a pixel definition pattern 430.

[0085] In some examples, as shown in FIG. 5, the pixel definition pattern 430 is located on the side of the first electrode 461 away from the substrate 01, the pixel definition pattern 430 includes a plurality of openings 431, such as a plurality of first openings 431, and a pixel definition portion 432 surrounding the plurality of openings 431, the plurality of openings 431 are configured to expose the first electrodes 461 of the plurality of sub-pixels 460. The display substrate includes a limiting structure 450 between adjacent sub-pixels 460 and configured to block at least one layer of the light-emitting functional layer 463.

[0086] For example, as shown in FIG. 5, the pixel defining pattern 430 further includes a plurality of second openings 433 configured to expose the limiting structure 450. For example, one sub-pixel 460 corresponds to at least one first opening 431, at least part of the light emitting functional layer 463 of the sub-pixel 460 is located in the first opening 431 corresponding to the sub-pixel 460, and the first opening 431 is configured to expose the first electrode 461. For example, one sub-pixel 460 corresponds to one first opening 431, and the light emitting functional layer 463 located in the first opening 431 realizes light emission by contacting the first electrode 461 and the second electrode 462. For example, the first opening 431 is used to define the light emitting area of the sub-pixel 460. For example, the light emitting functional layer 463 can include parts located in the first opening 431, the pixel defining part 432, and the second opening 433, and is disconnected at the edge of the limiting structure 450. For example, the light emitting layer in the light emitting functional layer 463 can be located only in the first opening 431, or located in the first opening 431 and on the pixel defining part 432, but not in the second opening 433.

[0087] For example, as shown in FIG. 5, the material of the pixel defining part 432 includes an organic material. For example, the material of the pixel defining part 432 can include polyimide, acrylic, polyethylene terephthalate, etc. For example, the spacer can have the same material as the pixel defining part. For example, the spacer and the pixel defining part can be an integrated structure. For example, the third isolation column can have the same material as the pixel defining part.

[0088] For example, as shown in FIG. 5, the light emitting functional layer 463 includes a charge generation layer. For example, the light emitting functional layer 463 can be the light emitting functional layer 463 included in the organic light emitting element. For example, each sub-pixel 460 located in the display area includes a light emitting element.

[0089] For example, as shown in FIG. 5, the light emitting functional layer 463 can include a first light emitting layer (EML), a charge generation layer (CGL), and a second light emitting layer (EML) stacked, and the charge generation layer is located between the first light emitting layer and the second light emitting layer. The charge generation layer has strong conductivity, which can make the light emitting functional layer 463 have the advantages of long service life, low power consumption, and high brightness. For example, compared with the light emitting functional layer 463 without the charge generation layer, the sub-pixel 460 can increase the light emitting brightness by nearly one time by setting the charge generation layer in the light emitting functional layer 463.

[0090] For example, the same sub-pixel 460 can be a tandem structure, such as Tandem OLED.

[0091] For example, the charge generation layer can include an N-type charge generation layer and a P-type charge generation layer.

[0092] For example, the light-emitting functional layer 463 in each sub-pixel 460 can further include a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL).

[0093] For example, the hole injection layer, the hole transport layer, the electron transport layer, the electron injection layer, and the charge generation layer are common film layers of the plurality of sub-pixels 460, which can be referred to as common layers. For example, the common layers and the second electrode 462 can be film layers formed using an open mask.

[0094] For example, the second light-emitting layer can be located between the first light-emitting layer and the second electrode 462, and the hole injection layer can be located between the first electrode 461 and the first light-emitting layer. For example, an electron transport layer can be further provided between the charge generation layer and the first light-emitting layer. For example, a hole transport layer can be provided between the second light-emitting layer and the charge generation layer. For example, an electron transport layer and an electron injection layer can be provided between the second light-emitting layer and the second electrode 462.

[0095] For example, in the same sub-pixel 460, the first light-emitting layer and the second light-emitting layer can be light-emitting layers that emit the same color light. For example, in the same sub-pixel 460, the first light-emitting layer and the second light-emitting layer can be light-emitting layers that emit different colors of light. By providing light-emitting layers that emit different colors of light in the same sub-pixel 460, the light emitted by the multiple light-emitting layers included in the sub-pixel 460 can be mixed to white light. The color of the light emitted by each sub-pixel 460 can be adjusted by providing a color filter layer.

[0096] For example, the material of the electron transport layer can include an aromatic heterocyclic compound, such as a benzimidazole derivative, an imidazopyridine derivative, a benzimidazophenanthroline derivative, and other imidazole derivatives; a pyrimidine derivative, a triazine derivative, and other azine derivatives; a quinoline derivative, an isoquinoline derivative, a phenanthroline derivative, and other compounds containing a nitrogen-containing six-membered ring structure (including compounds having a phosphine oxide group as a substituent on the heterocycle); and the like.

[0097] For example, the material of the charge generation layer can be a material containing a phosphorus oxygen group or a material containing a triazine.

[0098] For example, the ratio of the electron mobility of the charge generation layer to the electron mobility of the electron transport layer is 10 -2 ~ 10 2 .

[0099] For example, the first electrode 461 can be an anode, and the second electrode 462 can be a cathode. For example, the cathode can be formed of a material with high conductivity and a low work function, for example, the cathode can be made of a metal material. For example, the anode can be formed of a transparent conductive material with a high work function.

[0100] For example, as shown in FIG. 5, the orthogonal projection of the second electrode 462 in at least part of the sub-pixel 460 on the substrate 01 is a full-area structure. For example, the second electrode 462 can be a common electrode shared by multiple sub-pixels 460.

[0101] For example, as shown in FIG. 5, the limiting structure 450 can isolate the charge generation layer to prevent crosstalk between adjacent sub-pixels 460 of different colors. For example, all film layers in the light-emitting functional layer 463 between the charge generation layer and the substrate 01 can be isolated at the edge of the limiting structure 450. For example, all film layers in the light-emitting functional layer 463 can be isolated at the edge of the limiting structure 450. For example, the second electrode 462 can be continuous or isolated at the edge of the limiting structure 450.

[0102] In some examples, as shown in FIGS. 3 and 5, the limiting structure 450 includes an inorganic limiting layer 451, and the inorganic limiting layer 451 includes a structure of the inorganic layer 500 between adjacent sub-pixels 460. For example, the inorganic layer 500 includes a film layer in the limiting structure 450 and a fourth isolation layer 220 in the second isolation column 200. For example, the inorganic limiting layer 451 can also include a structure between the first electrode 461 and the substrate 01 to improve the flatness of the first electrode 461.

[0103] In some examples, as shown in FIG. 5, a part of the first organic layer 410 in the display area is between the first electrode 461 and the substrate 01 to serve as a flat layer.

[0104] For example, as shown in FIG. 5, the limiting structure 450 further includes at least one first protrusion 413 of the first organic layer 410 in contact with the surface of the inorganic limiting layer 451, and the included angle between the side surface of the first protrusion 413 and the surface of the part of the first organic layer 410 other than the first protrusion 413 away from the substrate 01 side is 80-110 degrees, and the surface is parallel to the substrate 01. For example, the included angle of the side surface of the first protrusion 413 can be 90-100 degrees, or 85-105 degrees, etc., and the specific angle of the included angle is not listed one by one in the embodiments of the present disclosure, which can be any angle in 80-110 degrees.

[0105] For example, as shown in FIG. 5, the structure in the first organic layer 410 and the structure in the inorganic layer 500 respectively serve as the inorganic limiting layer 451 and the first protrusion 413 in the limiting structure 450, and the setting of the side surface angle of the first protrusion 413 can isolate at least one layer of the light-emitting functional layer 463 of the adjacent sub-pixel 460.

[0106] For example, as shown in FIG. 5, the edge of the inorganic limiting layer 451 protrudes relative to the edge of the first protrusion 413 to achieve the effect of cutting off at least one layer of the light-emitting functional layer 463. By setting at least one of the included angle of the first protrusion and the protrusion of the edge of the inorganic limiting layer relative to the edge of the first protrusion, the edge of the limiting structure can be made to cut off at least one layer of the light-emitting functional layer.

[0107] For example, as shown in FIG. 3 and FIG. 5, the first organic layer 410 includes a film layer in the limiting structure 450 and a third isolation layer 210 in the second isolation column 200.

[0108] For example, as shown in FIG. 3, the fourth isolation layer 220 is provided with a wire 04 around the hole area between the substrate 01, such as a signal line for a data line. For example, the wire 04 and the first isolation column 100 can be a structure provided in the same layer.

[0109] In some examples, as shown in FIG. 3, the display substrate further includes at least one dam 710 between the at least one second isolation column 200 and the hole area. The dam 710 can be used to prevent the organic layer in the encapsulation layer 05 (as shown in FIG. 4) from overflowing the substrate 01 during the manufacturing process. For example, the dam 710 can be located between two first isolation columns 100.

[0110] In some examples, as shown in FIG. 3, the dam 710 includes at least one barrier layer 711, and the at least one barrier layer 711 is a structure in at least one of the first organic layer 410 and the second organic layer 420. For example, the dam 710 can include at least two barrier layers 711, and the two barrier layers 711 are structures in the first organic layer 410 and the second organic layer 420, respectively.

[0111] In some examples, as shown in FIG. 3, the third isolation layer 210 has a depth of 1500 angstroms to 4000 angstroms.

[0112] In some examples, as shown in FIG. 3, the edge of the fourth isolation layer 220 protrudes relative to the edge of the third isolation layer 210 by a size of 50 to 200 nanometers.

[0113] By setting the depth of the third isolation layer in the second isolation column and the size of the edge of the fourth isolation layer protruding relative to the edge of the third isolation layer, it is beneficial to ensure that the light-emitting functional layer and the second electrode are cut off at the edge of the second isolation column to assist the first isolation column in cutting off the second electrode and the part of the light-emitting functional layer located in the encapsulation area.

[0114] For example, as shown in FIG. 3, the third isolation layer 210 has a depth of 2000-2500 angstroms. For example, the third isolation layer 210 has a depth of 1800-3000 angstroms. The specific depth of the third isolation layer 210 is not limited herein and can be any value within 1500-4000 angstroms.

[0115] For example, as shown in FIG. 3, the fourth isolation layer 220 has an edge protruding from the edge of the third isolation layer 210 by 100-150 nanometers. For example, the fourth isolation layer 220 has an edge protruding from the edge of the third isolation layer 210 by 120-160 nanometers. For example, the fourth isolation layer 220 has an edge protruding from the edge of the third isolation layer 210 by 130-170 nanometers. The specific size of the edge of the fourth isolation layer 220 protruding from the edge of the third isolation layer 210 is not limited herein and can be any value within 50-200 nanometers.

[0116] For example, as shown in FIG. 3, the second isolation column 200 can have a plurality of second isolation columns 200, each of which includes a ring of third isolation layers 210 and a ring of fourth isolation layers 220, and the adjacent third isolation layers 210 have a groove 041 therebetween.

[0117] FIG. 6 is a schematic diagram of a partial cross-sectional structure of the line BB' shown in FIG. 2 according to another example provided by the present disclosure. The display substrate shown in FIG. 6 is different from the display substrate shown in FIG. 3 in the distance between the first organic layer 410 and the first inner ring isolation column 101, the thickness of the first organic layer 410, and the slope angle of the slope at the boundary position.

[0118] In some examples, as shown in FIG. 6, the first organic layer 410 includes at least one film layer, and the first organic layer 410 includes a flat portion 411 on the side of the fourth isolation layer 220 away from the first isolation column 100. The flat portion 411 is located in the non-hole region, and the thickness H2 of the flat portion 411 is 2.5-5 micrometers. For example, the thickness H2 of the flat portion 411 is 3-4 micrometers. The thickness of the flat portion 411 is not limited herein and can be any value within 2.5-5 micrometers.

[0119] The thickness of the flat portion 411 in the display substrate shown in FIG. 6 is less than the thickness of the flat portion in the organic layer 013 shown in FIG. 1. By reducing the thickness of the flat portion 411 of the first organic layer 410 located at the edge, the display substrate provided by the embodiments of the present disclosure is advantageous to reduce the edge step of the first organic layer 410 close to the first inner ring isolation column 101, and effectively solve the residual situation of the second organic layer 420 after exposure at the edge position of the first organic layer 410, such as reducing the length of the residual portion 421, increasing the interval between the residual portion 421 of the second organic layer 420 and the first inner ring isolation column 101, and preventing the residual portion 421 of the second organic layer 420 from contacting the first isolation column 100.

[0120] For example, the thickness H1 of the flat portion 411 shown in FIG. 3 is greater than the thickness H2 of the flat portion 411 shown in FIG. 6, and the distance D1 between the edges of the first organic layer 410 and the first inner ring isolation column 101 close to each other shown in FIG. 3 is greater than the distance D2 between the edges of the first organic layer 410 and the first inner ring isolation column 101 close to each other shown in FIG. 6.

[0121] For example, the distance D2 between the edges of the first organic layer 410 and the first inner ring isolation column 101 close to each other shown in FIG. 6 can be 7.5 microns. For example, the thickness of the flat portion 411 in the first organic layer 410 and the portion between the flat portion 411 and the first isolation column 100 can be thinned by using a half-tone mask process.

[0122] In some examples, as shown in FIG. 6, the first organic layer 410 includes a slope close to the first isolation column 100, and the angle α2 of the slope is less than 30 degrees. For example, the angle α2 is 10-25 degrees. For example, the angle α2 is 12-15 degrees. For example, the angle α2 is 13-20 degrees. In the display substrate provided by the embodiments of the present disclosure, by reducing the thickness of the first organic layer 410, the angle of the slope is advantageously reduced.

[0123] In some examples, as shown in FIG. 6, the first organic layer 410 includes at most two film layers. For example, the first organic layer 410 includes two film layers. However, the first organic layer 410 can also include only one film layer. Compared with the case that the first organic layer 410 includes three film layers shown in FIG. 3, the display substrate provided by the present example reduces the number of film layers included in the first organic layer 410, is advantageous to reduce the thickness of the first organic layer 410, and further reduces the step at the edge position of the first organic layer 410, and effectively reduces the size of the residual portion 421 of the second organic layer 420 after exposure at the position.

[0124] The structures other than the first organic layer 410 in the display substrate shown in FIG. 6 can have the same features as the corresponding structures shown in FIG. 3, and will not be described here.

[0125] The scheme of thinning the thickness of the first organic layer shown in FIG. 6 can be applied to the display substrate shown in FIG. 3 to further increase the distance between the first organic layer and the first inner ring isolation column. Of course, the embodiments of the present disclosure are not limited thereto. In the case of thinning the thickness of the first organic layer shown in FIG. 3, the distance between the first organic layer and the first inner ring isolation column can be less than 10 microns and greater than 7.5 microns.

[0126] FIG. 7 is a partial planar structure schematic diagram of a display substrate provided according to another example of an embodiment of the present disclosure. FIG. 8 is a focused ion beam (FIB) microscope diagram of a second isolation column in the display substrate shown in FIG. 7.

[0127] In some examples, as shown in FIG. 7 and FIG. 8, the fourth isolation layer 220 has a ring shape, and the ring width RW1 of the fourth isolation layer 220 is 10-100 microns. For example, the ring width RW1 of the fourth isolation layer 220 is 30-70 microns. For example, the ring width RW1 of the fourth isolation layer 220 is 20-50 microns. For example, the ring width RW1 of the fourth isolation layer 220 is 40-60 microns. The embodiments of the present disclosure do not enumerate the ring width of the fourth isolation layer 220 one by one, which can be any value in 10-100 microns.

[0128] In research, the inventors of the present application also found that when the width of the fourth isolation layer using inorganic material arranged on the first organic layer is set to be larger, such as greater than 100 microns, the water oxygen release in the first organic layer is insufficient, causing peeling between the fourth isolation layer and the third isolation layer. By setting the width of the fourth isolation layer to be less than 100 microns, the embodiments of the present disclosure facilitate the water oxygen release of the first organic layer and prevent the fourth isolation layer from being peeled off from the first organic layer.

[0129] For example, as shown in FIG. 7, the number of second isolation columns 200 can be multiple, and three circles of second isolation columns 200 are schematically shown in the figure, but the present disclosure is not limited thereto, and can also be one circle, two circles, or more circles. For example, a gap is provided between adjacent fourth isolation layers 220 of adjacent second isolation columns 200. For example, FIG. 7 schematically shows a structure in which each circle of second isolation columns 200 is continuously arranged, but the present disclosure is not limited thereto, and the structure can also be arranged with a gap to further improve the water oxygen release effect of the first organic layer 410.

[0130] For example, as shown in FIG. 7, the one layer of barrier layer 711 included in the barrier portion 710 is a structure in the second organic layer 420. For example, in the direction perpendicular to the substrate 01, at least one circle of first isolation columns 100 does not overlap with the second organic layer 420.

[0131] For example, FIG. 7 shows that the second organic layer 420 covers the boundary 4201 of the fourth isolation layer 220, and the second organic layer 420 is arranged on the side of the boundary away from the hole area.

[0132] FIG. 7 shows that the topography of the fourth isolation layer 220 in the display substrate can be applied to the display substrate in any of the above examples.

[0133] FIG. 9 is a partial planar structure schematic diagram of a display substrate provided according to another example in an embodiment of the present disclosure. FIG. 10 is a partial enlarged view of the display substrate shown in FIG. 9. FIG. 11 is a focused ion beam (FIB) microscope diagram of the fourth isolation layer, the slot, and the organic block in the display substrate shown in FIG. 9.

[0134] In some examples, as shown in FIGS. 9-11, the fourth isolation layer 220 has a ring shape, the ring width RW2 of the fourth isolation layer 220 is 50-200 microns, and the fourth isolation layer 220 is provided with at least one slot 221 exposing the third isolation layer 210.

[0135] In the display substrate provided by the embodiments of the present disclosure, when the width of the fourth isolation layer is 50-200 microns, the fourth isolation layer is provided with a slot exposing the third isolation layer, which effectively improves the peeling problem between the fourth isolation layer and the first organic layer caused by insufficient water and oxygen release of the first organic layer.

[0136] For example, as shown in FIGS. 9-11, the ring width RW2 of the fourth isolation layer 220 is 60-150 microns. For example, the ring width RW2 of the fourth isolation layer 220 is 80-100 microns. For example, the ring width RW2 of the fourth isolation layer 220 is 70-120 microns. For example, the ring width RW2 of the fourth isolation layer 220 is 55-105 microns. For example, the ring width RW2 of the fourth isolation layer 220 is 65-85 microns. The embodiments of the present disclosure do not enumerate the ring width of the fourth isolation layer one by one, which can be any value in 50-200 microns.

[0137] In some examples, as shown in FIGS. 9-11, the maximum dimension of the slot 221 in the direction parallel to the substrate 01 is 5-15 microns. By setting the maximum dimension of the slot 221, the influence of the blocking effect of the fourth isolation layer 220 can be reduced while preventing the fourth isolation layer 220 from being peeled off on the basis of achieving sufficient water and oxygen release of the first organic layer 410.

[0138] For example, as shown in FIGS. 9-11, the slot 221 can have a quadrilateral shape, such as a rectangle or a square, and the length of a side of the slot 221 can be 5-10 microns. For example, the length of a side of the slot 221 can be 7-9 microns. For example, the length of a side of the slot 221 can be 8.5 microns. For example, when the slot 221 has a quadrilateral shape, the maximum dimension of the slot 221 can be the length of a diagonal. The embodiments of the present disclosure are not limited to this, and the slot 221 can also have a circular shape, an elliptical shape, or other polygonal shapes. When the slot 221 has a circular shape, the maximum dimension of the slot 221 described above can be the diameter of the circle. When the slot 221 has an elliptical shape, the maximum dimension of the slot 221 described above can be the length of the major axis of the ellipse.

[0139] For example, as shown in FIGS. 9-11, the maximum dimension of the slot 221 in the direction parallel to the substrate 01 can be 7-12 microns. For example, the maximum dimension of the slot 221 in the direction parallel to the substrate 01 can be 6-14 microns. For example, the maximum dimension of the slot 221 in the direction parallel to the substrate 01 can be 8-10 microns. For example, the maximum dimension of the slot 221 in the direction parallel to the substrate 01 can be 9-12 microns. The embodiments of the present disclosure do not limit the maximum dimension of the slot 221, which can be any value in the range of 5-15 microns.

[0140] For example, as shown in FIGS. 9-11, the number of second isolation columns 200 can be multiple turns, and each turn of the fourth isolation layer 220 is provided with multiple slots 221. For example, the number of slots 221 in each turn of the fourth isolation layer 220 can be set according to the ring width of the fourth isolation layer 220. For example, when the ring width of the fourth isolation layer 220 is small, only one turn of slots 221 can be provided. When the ring width of the fourth isolation layer 220 is large, two or more turns of slots 221 can be provided. For example, when at least two turns of slots 221 are provided in one turn of the fourth isolation layer 220, the adjacent two turns of slots 221 can be staggered, which is beneficial to maintaining the stability of the width of the fourth isolation layer 220. For example, the slots 221 provided in each turn of the fourth isolation layer 220 can be uniformly distributed.

[0141] In some examples, as shown in FIGS. 9-11, the second organic layer 420 includes at least one organic block 422 covering at least one slot 221. In the display substrate provided by the embodiments of the present disclosure, by providing the organic block 422 covering the slot 221, not only can the water and oxygen release of the first organic layer 410 be maintained, but the fourth isolation layer 220 can also be prevented from being peeled off.

[0142] For example, as shown in FIGS. 9-11, the orthographic projection of the slot 221 on the substrate 01 can be completely within the orthographic projection of the organic block 422 covering it, such as the organic block 422 not only completely covers the slot 211, but the boundary of the organic block 422 also exceeds the boundary of the slot 211. For example, the same organic block 422 can cover one slot 221, such as the slot 221 and the organic block 422 are one-to-one corresponding, but not limited to this, the same organic block 422 can also cover multiple slots 221, but the same organic block 422 only covers the slots 221 in the same fourth isolation layer.

[0143] For example, as shown in FIGS. 9-11, along the direction perpendicular to the substrate 01, the spacing between the organic block 422 and the adjacent fourth isolation layer 220 does not overlap, so as to prevent the organic block 422 from affecting the isolation effect of the fourth isolation layer 220.

[0144] For example, as shown in FIGS. 9-11, the shape of the organic block 422 can be similar to the shape of the slot 221, such as a quadrilateral, such as a rectangle or a square. For example, the side length of the organic block 422 can be 10-20 microns. For example, the side length of the organic block 422 can be 12-15 microns. For example, the side length of the organic block 422 can be 13-17 microns. For example, the side length of the organic block 422 can be 19.5 microns. For example, the edges of the two orthographic projections of the same organic block 422 and the slots 211 covered thereby on the substrate 01 form a ring shape, which can be a shape with a uniform ring width.

[0145] For example, as shown in FIGS. 9-11, the same fourth isolation layer 220 is provided with multiple slots 221, and at least part of the slots 221 are covered by the organic block 422. For example, the same fourth isolation layer 220 is provided with multiple slots 221, and each slot 221 is covered by an organic block 422. For example, the distance between adjacent organic blocks 422 can be 3.5 microns or more, such as 8.5 microns or the like.

[0146] For example, as shown in FIGS. 9-11, the distance between adjacent fourth isolation layers 220 can be 2.5-140 microns. For example, the distance between adjacent fourth isolation layers 220 can be 5-100 microns. For example, the distance between adjacent fourth isolation layers 220 can be 20-80 microns. For example, the distance between adjacent fourth isolation layers 220 can be 30-70 microns. For example, the distance between adjacent fourth isolation layers 220 can be 10 microns. For example, the ring width of the fourth isolation layer 220 can be greater than 100 microns.

[0147] The topography of the fourth isolation layer 220 in the substrate shown in FIGS. 9-11 can be applicable to the display substrate shown in FIGS. 3-6.

[0148] FIG. 12 is a schematic diagram of a partial planar structure of a display substrate according to another example provided by embodiments of the present disclosure. FIG. 13 is an enlarged view of region E shown in FIG. 12.

[0149] In some examples, as shown in FIGS. 12 and 13, the second organic layer 420 includes a covering portion 423 covering the fourth isolation layer 220, an edge of the protruding portion of the fourth isolation layer 220 relative to the third isolation layer 210 is exposed by the covering portion 423, and a distance D4 between the edge of the protruding portion and an edge 4201 of the covering portion 423 is greater than 5 microns.

[0150] By setting the distance between the edge of the covering portion of the second organic layer and the edge of the fourth isolation layer, it can be avoided that the process and the alignment fluctuation cause the edge of the fourth isolation layer for separating the light-emitting functional layer and the second electrode and the spacing between adjacent fourth isolation layers to be covered by the second organic layer, so that the fourth isolation layer cannot completely separate the light-emitting functional layer and the second electrode.

[0151] For example, as shown in FIGS. 12 and 13, the distance D4 between the edge of the protruding portion of the fourth isolation layer 220 relative to the third isolation layer 210 and the edge 4201 of the covering portion 423 is greater than 10 microns. For example, the distance D4 between the edge of the protruding portion of the fourth isolation layer 220 relative to the third isolation layer 210 and the edge 4201 of the covering portion 423 is greater than 15 microns.

[0152] In some examples, as shown in FIGS. 12 and 13, the second isolation column 200 closest to the display area among the at least one circle of second isolation columns 200 is a second inner ring isolation column 201, and a distance D3 between an edge 4201 of the covering portion 423 covering the second inner ring isolation column 201 away from the display area and a boundary BL of the display area is not less than 150 microns.

[0153] By setting the distance between the edge of the covering portion of the second organic layer and the boundary of the display area, it can be avoided that the influence caused by the patterning process of the fourth isolation layer on the first organic layer extends to the boundary of the display area, so that the flatness of the first electrode bottom film layer of the sub-pixel located in the display area is poor, and then the light-emitting effect of the sub-pixel located at the edge of the display area is affected.

[0154] For example, as shown in FIGS. 12 and 13, the distance between the edge 4201 of the covering portion 423 covering the second inner ring isolation column 201 away from the display area and the boundary BL of the display area is not less than 180 microns. For example, the distance between the edge 4201 of the covering portion 423 covering the second inner ring isolation column 201 away from the display area and the boundary BL of the display area is not less than 200 microns.

[0155] The edge position of the covering part covering the second inner ring isolation column needs to be set in combination with the edge of the fourth isolation layer and the boundary of the display area.

[0156] In some examples, as shown in FIGS. 12 and 13, the at least one ring of second isolation columns 200 includes multiple rings of second isolation columns 200, and the distance D5 between adjacent fourth isolation layers 220 in adjacent second isolation columns 200 is 5-15 microns. In this way, the edges of adjacent fourth isolation layers 220 are blocked from the light-emitting functional layer 463 and the second electrode 462.

[0157] For example, as shown in FIGS. 12 and 13, the distance D5 between adjacent fourth isolation layers 220 in adjacent second isolation columns 200 is 6-8 microns. For example, the distance D5 between adjacent fourth isolation layers 220 in adjacent second isolation columns 200 is 7-10 microns, and the like. The specific values of the distance are not listed one by one in the embodiments of the present disclosure, and can be any value in the range of 5-15 microns.

[0158] In some examples, as shown in FIG. 12, the distance D6 between the edge of the blocking part 710 closest to the second isolation column 200 and the edge 4201 of the covering part 423 covering the second inner ring isolation column 201 away from the display area is greater than 30 microns.

[0159] The distance between the edge of the blocking part and the edge of the second organic layer is set to provide space for setting the second isolation column.

[0160] For example, as shown in FIG. 12, the distance D6 between the edge of the blocking part 710 closest to the second isolation column 200 and the edge 4201 of the covering part 423 covering the second inner ring isolation column 201 away from the display area is greater than 40 microns. For example, the distance D6 between the edge of the blocking part 710 closest to the second isolation column 200 and the edge 4201 of the covering part 423 covering the second inner ring isolation column 201 away from the display area is greater than 50 microns. For example, the distance D6 between the edge of the blocking part 710 closest to the second isolation column 200 and the edge 4201 of the covering part 423 covering the second inner ring isolation column 201 away from the display area is greater than 60 microns.

[0161] For example, as shown in FIG. 12, the shape of the blocking part 710 is annular, and the ring width of the blocking part 710 is greater than 25 microns. For example, the ring width of the blocking part 710 is 40 microns.

[0162] The topography of the fourth isolation layer 220 in the display substrate shown in FIGS. 12-13 can be applied to the display substrate shown in any of the examples of FIGS. 3-11.

[0163] FIG. 14 is a schematic block diagram of a display device according to another embodiment of the present disclosure. As shown in FIG. 14, the display device according to an embodiment of the present disclosure includes any one of the display substrates described above.

[0164] For example, the display substrate according to an embodiment of the present disclosure can be an organic light emitting diode display substrate. For example, the display substrate can or can not be provided with a color filter layer.

[0165] For example, the display device further includes a cover plate located on the light emitting side of the display substrate.

[0166] For example, the display device can be a display device such as an organic light emitting diode display device, and any product or component having a display function such as a television, a digital camera, a mobile phone, a watch, a tablet computer, a notebook computer, a navigator, and the like, but the present embodiment is not limited thereto.

[0167] The following points need to be explained:

[0168] (1) In the drawings of the embodiments of the present disclosure, only the structures related to the embodiments of the present disclosure are involved, and other structures can be referred to the general design.

[0169] (2) In the case of no conflict, the features in the same and different embodiments of the present disclosure can be combined with each other.

[0170] The above description is only exemplary embodiments of the present disclosure, and is not intended to limit the protection scope of the present disclosure, and the protection scope of the present disclosure is determined by the appended claims.

Claims

1. A display substrate, comprising: a substrate substrate comprising a first region and a second region, the first region surrounding at least part of the second region, the first region comprising a display region, the second region comprising an aperture region and a non-aperture region surrounding the aperture region; a plurality of rings of first isolation columns on the non-aperture region of the substrate substrate and surrounding the aperture region, the first isolation columns comprising at least a first isolation layer and a second isolation layer arranged in a stack, the second isolation layer being on a side of the first isolation layer away from the substrate substrate, an edge of the second isolation layer being protruded relative to an edge of the first isolation layer, and the first isolation layer and the second isolation layer both being conductive material; a first organic layer on the substrate substrate; an inorganic layer on a side of the first organic layer away from the substrate substrate; a second organic layer on a side of the inorganic layer away from the substrate substrate, wherein the non-aperture region is provided with at least one ring of second isolation columns surrounding the plurality of rings of first isolation columns, the second isolation columns comprising a third isolation layer and a fourth isolation layer arranged in a stack, the third isolation layer being between the fourth isolation layer and the substrate substrate, the third isolation layer being a structure in the first organic layer, the fourth isolation layer being a structure in the inorganic layer, an edge of the fourth isolation layer being protruded relative to an edge of the third isolation layer; a first inner ring isolation column of the plurality of rings of first isolation columns being closest to the second isolation columns, the first inner ring isolation column not being in contact with the second organic layer. 2.The display substrate of claim 1, further comprising: an interlayer insulating layer between the first isolation columns and the substrate substrate and in contact with the first isolation columns, wherein the second organic layer comprises a residual portion between the second isolation columns and the first inner ring isolation column and in contact with the interlayer insulating layer, a gap being provided between the residual portion and the first inner ring isolation column. 3.The display substrate according to claim 1 or 2, wherein, a distance between edges of the first organic layer and the first inner ring isolation column close to each other is greater than 10 microns. 4.The display substrate of any one of claims 1-3, wherein, the first organic layer comprises at least one film layer, the first organic layer comprising a flat portion on a side of the fourth isolation layer away from the first isolation columns, the flat portion being on the non-aperture region, and a thickness of the flat portion being 2.5-5 microns. 5.The display substrate of claim 4, wherein, the first organic layer comprises a slope close to the first isolation columns, an angle of the slope being less than 30 degrees. 6.The display substrate according to claim 4 or 5, wherein the first organic layer comprises at most two film layers. 7.The display substrate of any one of claims 1-6, wherein, the fourth isolation layer is annular in shape, and a ring width of the fourth isolation layer is 10-100 microns. 8.The display substrate of any one of claims 1-7, wherein, the fourth isolation layer is annular in shape, a ring width of the fourth isolation layer is 50-200 microns, and the fourth isolation layer is provided with at least one slot exposing the third isolation layer. 9.The display substrate of claim 8, wherein, a maximum dimension of the slot in a direction parallel to the substrate substrate is 5-15 microns. 10.The display substrate of any one of claims 1-8, wherein, the second organic layer comprises at least one organic block covering the at least one slot. 11.The display substrate of any one of claims 1-10, wherein, The second organic layer includes a covering portion covering the fourth isolation layer, an edge of a protruding portion of the fourth isolation layer protruding relative to the third isolation layer is exposed by the covering portion, and a distance between the edge of the protruding portion and an edge of the covering portion is greater than 5 microns. 12.The display substrate of claim 11, wherein, A second inner ring isolation column closest to the display area among the at least one circle of second isolation columns is a second inner ring isolation column, and a distance between an edge of the covering portion covering the second inner ring isolation column and a boundary of the display area away from the display area is not less than 150 microns. 13.The display substrate of claim 11, wherein, The at least one circle of second isolation columns includes multiple circles of second isolation columns, and a distance between adjacent fourth isolation layers in adjacent second isolation columns is 5-15 microns.

14. The display substrate of claim 12, further comprising: at least one circle of blocking portions between the at least one circle of second isolation columns and the hole area, wherein the blocking portions include at least one blocking layer, the at least one blocking layer is a structure in at least one of the first organic layer and the second organic layer, and a distance between an edge of the second isolation column closest to the second isolation column and an edge of the covering portion covering the second inner ring isolation column away from the display area is greater than 30 microns. 15.The display substrate of any one of claims 1-14, wherein, The third isolation layer has a depth of 1500 angstroms-4000 angstroms. 16.The display substrate of claim 15, wherein, An edge of the fourth isolation layer protrudes relative to an edge of the third isolation layer by a size of 50-200 nanometers.

17. The display substrate according to any one of claims 1-16, wherein, A portion of the second organic layer located in the display area includes a pixel definition pattern. 18.The display substrate of claim 17, wherein, The display area includes multiple sub-pixels, each sub-pixel includes a first electrode, a light-emitting functional layer, and a second electrode stacked, the first electrode is located between the light-emitting functional layer and the substrate, and the light-emitting functional layer includes multiple film layers. The pixel definition pattern is located on a side of the first electrode away from the substrate, and the pixel definition pattern includes multiple openings and a pixel definition portion surrounding the multiple openings, the multiple openings are configured to expose the first electrodes of the multiple sub-pixels. The display substrate includes a definition structure located between adjacent sub-pixels and configured to separate at least one layer of the light-emitting functional layer. The definition structure includes an inorganic definition layer, and the inorganic definition layer includes a structure in which the inorganic layer is located between adjacent sub-pixels.

19. The display substrate of claim 18, wherein, A portion of the first organic layer located in the display area is located between the first electrode and the substrate.

20. The display substrate of any one of claims 1-19, further comprising: at least one circle of third isolation columns filling a gap between two adjacent circles of first isolation columns, wherein a material of the third isolation columns includes an insulating material.

21. The display substrate of any one of claims 1-20, further comprising: at least one circle of spacers between the multiple circles of first isolation columns and the substrate, wherein the at least one circle of spacers overlaps the at least one circle of first isolation columns in a direction perpendicular to the substrate.

22. A display device comprising the display substrate of any one of claims 1-21.

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