Heating apparatus for reel-to-reel continuous deposition

Abstract

The present invention relates to a heating apparatus applied to a deposition process and, more specifically, to a heating apparatus for reel-to-reel continuous deposition, which heats substrates continuously supplied in a non-contact manner. According to the present invention, a heating apparatus for reel-to-reel continuous deposition comprises: a support which provides a substrate transfer path for continuous deposition inside a deposition chamber and forms an arrangement structure of a heating means for heating a substrate at a position spaced apart from the transferred substrate; a heat shielding unit provided to surround the heating means together with the support to block the thermal influence applied to the deposition chamber by the heating means; and an electrode unit connected to the heating means from the outside of the heat shielding unit to supply power, wherein multiple heating means insertion holes in which the heating means is installed are formed in the support, and the heating means insertion holes are formed in a shape of surrounding an upper side of the substrate transfer path from a position lower than a horizontal extension line of the substrate transfer path. According to the present invention, a heat effect applied to the chamber can be controlled without a separate water cooling device, and thus, the apparatus for continuous deposition can be operated with a more compactly configured structure.

Description

Heating device for reel-to-reel continuous deposition

[0001] The present invention relates to a technology for a heating device applied to a deposition process, and relates to a heating device for reel-to-reel continuous deposition that heats continuously supplied substrates in a non-contact manner.

[0002]

[0003] In general, silicon carbide or halogen lamps are used as substrate heating devices in vacuum deposition processes, including pulsed laser deposition (PLD) processes.

[0004] Heating devices using silicon carbide are used for heating single specimens in high-temperature processes due to their advantages such as excellent high-temperature durability, chemical stability, and non-toxicity. However, since heating is achieved by direct contact with the specimen, they are not suitable for heating substrates continuously supplied in a reel-to-reel manner.

[0005] The heating device using a halogen lamp is applied in a reel-to-reel manner because heating is achieved by the light emitted from the heating device, but if the surface of the heating device is contaminated with flying substances during deposition, a rapid decline in performance occurs.

[0006] Therefore, when applying halogen lamps, contaminated halogen lamps are periodically replaced, which increases maintenance costs.

[0007] In addition, since the electrode portion is vulnerable to oxidation, a performance degradation problem occurs in terms of durability in the reel-to-reel PLD continuous deposition process that requires long-term heating in an atmosphere with relatively high oxygen partial pressure.

[0008] Meanwhile, as an example of a reel-to-reel type continuous deposition device, U.S. Patent No. 750,1145 B2, “High throughput continuous pulsed laser deposition process and apparatus,” discloses a device for PLD continuous deposition in a reel-to-reel manner.

[0009] FIG. 1 is a drawing showing one embodiment of a reel-to-reel continuous deposition device according to the prior art, in which the substrate is heated by a heater on the upper side of the substrate that is continuously supplied by a payout spool and a take-up spool, and substrate deposition is performed by forming a plume-shaped plasma by energy irradiated to a target on the lower side of the substrate.

[0010] However, when the substrate is heated by a heater arranged flatly on the upper side of the substrate as shown, there is a problem in that, as the deposition of a material with low thermal conductivity progresses, heat conduction from the rear surface of the substrate to the front surface is not smooth, resulting in differences in characteristics or performance between the initially deposited thin film and the thin film deposited subsequently.

[0011] In addition, if the heater for substrate heating is operated for a long time, the temperature inside the deposition chamber may rise along with the substrate heating, which may deteriorate the deposition quality.

[0012] In addition, if a cooling water circulation device is not installed outside the deposition chamber, there is a problem that direct heat influence is applied to the deposition chamber, which may cause distortion due to thermal contraction and expansion of the deposition chamber itself and subsequent leakage.

[0013] Therefore, in the conventional technology, a cooling water circulation device is additionally provided together with a heating device to control the heat influence by the heater. However, this not only complicates the structure of the continuous deposition device, but also has the problem of causing moisture to form inside the deposition chamber due to condensation when the deposition chamber is opened, resulting in a deterioration in the deposition quality.

[0014]

[0015] An object of the present invention is to provide a heating device for reel-to-reel continuous deposition applicable at relatively high oxygen partial pressures by applying a heating means having oxidation resistance and high temperature durability.

[0016] Another object of the present invention is to provide a heating device for reel-to-reel continuous deposition that reduces contamination applied to a heating means during substrate deposition and is easy to maintain.

[0017] Another object of the present invention is to provide a heating device for reel-to-reel continuous deposition, which can control the thermal effect applied to the chamber by the heating device without a cooling water circulation device.

[0018] Another object of the present invention is to provide a heating device for reel-to-reel continuous deposition that can reduce the difference in characteristics or performance between a first deposited thin film and a subsequently deposited thin film through the arrangement structure of a heating means.

[0019]

[0020] A heating device for reel-to-reel continuous deposition according to the present invention provides a substrate transport path for continuous deposition inside a deposition chamber, and includes a support that forms a structure for arranging a heating means for heating a substrate at a position spaced apart from the transported substrate, a heat shield that is provided to surround the heating means together with the support to shield the heat influence of the heating means applied to the deposition chamber, and an electrode that is connected to the heating means from the outside of the heat shield to supply power, and a plurality of heating means insertion holes in which the heating means is installed are formed in the support, and the heating means insertion holes are characterized in that they are formed in a shape that surrounds the upper side of the substrate transport path from a position lower than a horizontal extension line of the substrate transport path.

[0021] The above heating means is characterized by comprising a plurality of heating tubes mounted in the heating means insertion holes, and a resistance heating wire connected to the electrode portion via the plurality of heating tubes.

[0022] The above heat shield is characterized by including an inner shield that surrounds the support and heating means, but has one lower side and one front and rear side open to allow deposition and substrate transfer, an external shield that surrounds the inner shield at a position spaced apart from the inner shield, but has one lower side and one front and rear side open to correspond to the inner shield, and at least one middle shield that forms a predetermined gap between the inner shield and the external shield, but has one lower side and one front and rear side open.

[0023] The inner shield, middle shield, and external shield are characterized in that slits are formed on the sides for laser incidence and plume confirmation.

[0024] The above middle shield is characterized in that it is divided into at least two parts along the substrate transfer direction and assembled, and the divided parts are arranged in a partially overlapping state to prevent thermal deformation, and a long hole-shaped fastening hole for thermal deformation compensation and a hole-shaped fastening hole corresponding to the long hole are provided in the overlapping portion, and are fastened to each other by a fixing pin while corresponding to each other.

[0025] The above middle shield includes a first middle shield that surrounds the inner shield and a second middle shield that surrounds the first middle shield, and the inner shield, the first middle shield, the second middle shield and the external shield are characterized in that a certain interval is maintained by a hollow bolt that provides a path for electrical connection between the heating means and the electrode part and an insulating bead that is fastened to the hollow bolt.

[0026] It is characterized in that a contamination prevention screen is further provided between the substrate transfer path and the heating means to block deposition particles from entering the heating means.

[0027] The above contamination prevention screen is characterized by including a flat portion formed parallel to the substrate transfer path, a first inclined portion formed to extend in one direction at a predetermined incline from one side of the flat portion, and a second inclined portion formed to extend in the other direction at a corresponding incline to the first inclined portion from the other side of the flat portion.

[0028] The above contamination prevention screen is characterized in that the intersection angle (θ) formed by the first inclined portion and the second inclined portion is formed to be 100° or more and less than 180°.

[0029] The above support is characterized in that at least two of the above support members are provided in a flat shape in which the heating means insertion holes are formed and are arranged at a certain interval along the length direction of the heating means.

[0030] A contamination prevention screen is installed on the support main body forming the above support to block deposition particles flowing into the heating means through the lower side of the heating means insertion hole, and the contamination prevention screen is characterized in that it is detachably provided on the lower side of the heating means by a screen mounting portion that extends downward from one side of the support main body and on which one end of the contamination prevention screen is mounted, and a fixing pin installation portion that extends downward from the other side of the support main body and on which a screen fixing pin is installed through so that the other end of the contamination prevention screen is mounted.

[0031]

[0032] The present invention comprises a heating device for heating a substrate, which comprises a linear resistance heating wire having high oxidation resistance and high temperature durability wound in a coil shape and accommodated so as to pass through the interior of a plurality of heat pipes.

[0033] Therefore, it is relatively inexpensive compared to conventional halogen lamp heaters, and has the advantages of high oxygen partial pressure and long-term use.

[0034] In addition, since the heating means configured as described above is placed on a support so as to be able to heat up to the side of the substrate, the substrate can be heated more effectively, thereby reducing the difference in characteristics or performance between the first deposited thin film and the subsequently deposited thin film in a continuous process.

[0035] In addition, the heating means placed on the support as described above is surrounded by a heat shielding part composed of a plurality of shields to block the heat influence of the heating means into the chamber, and the degree of heat shielding can be controlled by adjusting the number of middle shields.

[0036] In other words, since the thermal influence applied to the chamber can be controlled without a separate water cooling device, the structure of the continuous deposition device can be configured and operated more compactly, and it has the advantage of not causing condensation due to the cooling water circulation flow.

[0037] In addition, the support is further provided with a contamination prevention screen to block deposition particles generated during the vacuum deposition process from flying to the heating means, and the contamination prevention screen is configured to be mounted and detached by a screen fixing pin fitted on one side of the heat shield.

[0038] Accordingly, contamination of the heating means can be reduced by the contamination prevention screen, thereby improving the lifespan of the heating means. In addition, the contamination prevention screen has the advantage of being easily detachable and mountable using the screen fixing pin, thereby facilitating easier maintenance.

[0039]

[0040] Figure 1 is a drawing showing one embodiment of a reel-to-reel continuous deposition device according to the prior art.

[0041] FIG. 2 is a drawing showing one embodiment of a heating device for reel-to-reel continuous deposition according to the present invention.

[0042] Figure 3 is a cross-sectional view of section AA of Figure 2.

[0043] Fig. 4 is a drawing showing the pollution prevention screen and heating means illustrated in Fig. 3 installed on a support.

[0044] Figure 5 is a drawing showing one embodiment of a heating means arrangement structure using a plurality of supports and a connecting frame.

[0045] FIG. 6 is a drawing showing one embodiment of the pollution prevention screen illustrated in FIG. 4.

[0046] FIG. 7 is a drawing showing a structure for arranging a pollution prevention screen and a heating means installed on a support according to another embodiment of the present invention.

[0047] FIG. 8 is a drawing showing one embodiment of a heat shield structure of a heating device for reel-to-reel continuous deposition according to the present invention.

[0048] Fig. 9 is a drawing showing one embodiment of a shield thermal deformation compensation assembly structure constituting a heat shield, which is a key component of the present invention.

[0049] FIG. 10 is a drawing showing the transport path of a substrate in a heating device for reel-to-reel continuous deposition according to the present invention.

[0050] Figure 11 is a drawing for explaining the power supply structure of a heating device for reel-to-reel continuous deposition according to the present invention.

[0051]

[0052] Before explaining, it should be noted that the description of the present invention is merely an example for structural or functional explanation, and therefore the scope of the present invention should not be construed as being limited by the embodiments described in the text. That is, since the embodiments can be modified in various ways and can take various forms, the scope of the present invention should be understood to include equivalents that can realize the technical idea.

[0053] In addition, the purpose or effect presented in the present invention does not mean that a specific embodiment must include all of them or only include such effects, and therefore, the scope of the present invention should not be understood as being limited thereby.

[0054] All terms used in the description of the present invention have the same meaning as commonly understood by a person of ordinary skill in the art to which the present invention belongs, unless otherwise defined.

[0055] Terms defined in commonly used dictionaries should be interpreted as having a meaning consistent with the contextual meaning of the relevant technology, and cannot be interpreted as having an ideal or overly formal meaning unless explicitly defined in the present invention.

[0056] Additionally, in describing components of embodiments of the present invention, terms such as first, second, A, B, (a), (b), etc. may be used. These terms are only intended to distinguish the components from other components, and the nature, order, or sequence of the components are not limited by the terms.

[0057] In this specification, terms such as “include” or “have” are intended to specify the presence of a feature, number, step, operation, component, part, or combination thereof described in the specification, but should be understood not to exclude in advance the possibility of the presence or addition of one or more other features, numbers, steps, operations, components, parts, or combinations thereof.

[0058] Hereinafter, some embodiments of the present invention will be described in detail with reference to exemplary drawings. When designating components in each drawing, identical components are designated with the same reference numerals whenever possible, even if they appear in different drawings. Furthermore, in the description of the embodiments, if a detailed description of a related known configuration or function is deemed to impede understanding of the embodiments of the present invention, the description has been simplified.

[0059] FIG. 2 is a drawing showing one embodiment of a heating device for reel-to-reel continuous deposition according to the present invention, FIG. 3 is a cross-sectional view taken along line AA of FIG. 2, FIG. 4 is a drawing showing the contamination prevention screen and heating means shown in FIG. 3 installed on a support, and FIG. 5 is a drawing showing one embodiment of a heating means arrangement structure using a plurality of supports and connecting frames.

[0060] Referring to these drawings, a heating device for reel-to-reel continuous deposition according to the present invention (hereinafter referred to as 'heating device (100)') heats a substrate continuously transported in a reel-to-reel manner in a non-contact manner, and includes a support (600), a heating means (800), and a heat shield (400) for this purpose.

[0061] The above support (600) provides a substrate transport path for continuous deposition inside the deposition chamber, and forms a structure for arranging a heating means (800) for heating the substrate at a position spaced apart from the substrate being transported.

[0062] In detail, the support (600) is composed of a flat support main body (620) having a predetermined thickness, and a plurality of heating means insertion holes (622) in which heating means (800) are mounted are formed in the support main body (620).

[0063] The above heating means insertion hole (622) can be formed in a shape that surrounds the upper side of the substrate transport path from a position lower than the horizontal extension line of the substrate transport path, and when the heating means (800) is mounted to correspond to such an arrangement shape, the upper surface and side surface of the substrate being transported can be heated simultaneously.

[0064] Due to this heating structure, the difference in characteristics or performance between the first deposited thin film and the subsequently deposited thin film in the continuous deposition process is effectively reduced, enabling stable thin film deposition.

[0065] In addition, the support (600) on which the heating means (800) is placed as described above is surrounded by the heat shield (400), so that the heat influence of the heating means (800) applied to the deposition chamber can be shielded.

[0066] The detailed structure of the heat shield (400) with this function is described in more detail with reference to the attached drawing below.

[0067] Meanwhile, an electrode part (200) for supplying power to the heating means (800) is provided on the outside of the heat shield part (400).

[0068] The above electrode part (200) includes an anode (220) and a cathode (240) arranged on the upper front surface of the heat shield part (400), and is connected to a hollow bolt (210) penetrating the heat shield part (400) so as to be electrically connected to the heating means (800).

[0069] That is, the hollow bolt (210) is installed from the inside to the outside of the heat shield (400), so that one end is located inside the heat shield (400), and the other end is exposed to the outside of the heat shield (400).

[0070] The hollow bolt (210) installed as described above has a hollow interior and provides a power supply path through which a resistance heating wire (820, see FIG. 11) to be described below is connected to an electrode and a heating means (800). The power supply path supplied to the heating means (800) and the detailed configuration of the heating means (800) are described in more detail with reference to the attached drawings below.

[0071] Meanwhile, at least two of the above supports (600) may be provided and spaced apart from each other at regular intervals along the heating means (800), and the spaced apart supports (600) may be fixed by a connecting frame.

[0072] For example, the support main body (620) may have frame fixing parts (630) formed at multiple locations on the upper and lower sides, and an upper connecting frame (160) may be installed on the upper frame fixing part (630), and a lower connecting frame (140) may be installed on the lower frame fixing part (630).

[0073] In addition, a contamination prevention screen (700) may be installed on the support (600) to block deposition particles generated during substrate deposition from flowing into the heating means (800). For this purpose, a screen mounting portion (640) and a fixing pin mounting portion (660) are further formed on the support main body (620).

[0074] FIG. 6 is a drawing showing one embodiment of the contamination prevention screen illustrated in FIG. 4, wherein the contamination prevention screen (700) is formed by including a flat portion (720) formed parallel to the substrate transfer path, a first inclined portion (740) formed to extend in one direction at a predetermined incline from one side of the flat portion (720), and a second inclined portion (760) formed to extend in the other direction at a corresponding incline to the first inclined portion (740) from the other side of the flat portion (720).

[0075] That is, the anti - contamination screen (700) forms a downward slope such that the ends of the first inclined part (740) and the second inclined part (760) are farther apart from each other starting from the flat part (720), and the intersection angle (θ) formed by the first inclined part (740) and the second inclined part (760) can be formed to be 100° or more and less than 180°.

[0076] The anti - contamination screen (700) having the above - described shape can be applied with a quartz plate, and as it is formed within the above - described intersection angle (θ) range, it can be formed in a shape approximately like the Chinese character '八' (eight).

[0077] The anti - contamination screen (700) having the above - described shape is installed on the support (600) and disposed between the substrate and the heating means (eighty).

[0078] For this purpose, the lower shape of the heating means insertion hole (622) of the support main body (620) corresponds to the anti - contamination screen (700), and a screen seating part (640) is formed to extend downward from one side of the support main body (620) so that one end of the anti - contamination screen (700) can be seated, and a fixing pin installation part (660) is formed to extend downward from the other side and through which a screen fixing pin (780) is installed so that the other end of the anti - contamination screen (700) can be mounted.

[0079] When a plurality of supports (600) having the above - described structure are arranged, as shown in FIG. 5, the first support (600a), the second support (600b), and the third support (600c) are arranged at regular intervals along the longitudinal direction of the heating means (800), fixed by the upper connection frame (160) and the lower connection frame (140), and the heating means (800) can be inserted and mounted in the heating means insertion holes (622) formed in each support (hundred).

[0080] Meanwhile, at the lower side of the heating means (800) mounted as described above, the contamination prevention screen (700) is mounted on a support (600), and a substrate transfer part (120) is formed through which the substrate is transferred to the lower side of the flat part (720) of the contamination prevention screen (700) mounted on the support (600).

[0081] In addition, the installation of the contamination prevention screen (700) can be completed by first placing one end of the contamination prevention screen (700) on the screen mounting portion (640), inserting the screen fixing pin (780) into the fixing pin installation portion (660), and positioning the other end on the upper side of the screen fixing pin (780).

[0082] In addition, when separating the contamination prevention screen (700), the screen fixing pin (780) is first separated from the fixing pin installation part (660) to release the fixation of the other end, and one end of the contamination prevention screen (700) is separated from the screen mounting part (640) so that the contamination prevention screen (700) can be separated.

[0083]

[0084] Meanwhile, FIG. 7 is a drawing showing a structure for arranging a pollution prevention screen and a heating means installed on a support according to another embodiment of the present invention.

[0085] Referring to this, in the present embodiment, the support main body (640) is formed in a shape roughly like “n”, a frame fixing part (630) is formed on the upper side, and only a fixing pin installation part (660) is formed on the lower side, so that the contamination prevention screen (700) can be formed in a form in which it is fixed by two screen fixing pins (780).

[0086] And, corresponding to the shape of the support main body (640), the heating means (800) is mounted in the heating means insertion hole (622) in an “n” shape, and the contamination prevention screen (700) is installed so as to protrude upward from the center of the support main body (620), so that the substrate can be simultaneously heated by the heating means (800) on the upper surface and the side surface.

[0087] Meanwhile, when the substrate transfer unit (120) is formed in the heat shield (400), a space for substrate movement is formed in the front and rear sides, and heat loss of the heating means (800) may occur through this space.

[0088] In addition, since the heat emitted through this can increase the temperature inside the deposition chamber, a shield front cover (492) and a shield rear cover (494) may be further provided on the front and rear sides of the heat shield (400), respectively, to control the heat influence applied to the deposition chamber by the heating means (800).

[0089] The above shield front cover (492) and shield rear cover (494) are formed to a size that shields a portion of the lower side of the space formed on the front and rear sides of the heat shield (400) and can be mounted on the heat shield (400).

[0090] For example, a projection protruding toward the rear is formed on the back surface of the shield front cover (492) and the shield rear cover (494), and a fixing hole into which the projection is inserted is formed on the front and rear sides of the heat shield (400). The fixing hole may be formed in a form in which a hole having a larger diameter than the outer diameter of the projection and a hole having a smaller diameter are connected to each other.

[0091] Accordingly, by inserting the protrusion into the large diameter of the above-mentioned fixing hole and moving the protrusion in the direction of the small diameter hole, the shield front cover (492) and the shield rear cover (494) are fixed, and by moving in the opposite direction, the shield front cover (492) and the shield rear cover (494) can be separated.

[0092] FIG. 8 is a drawing showing an embodiment of a heat shield structure of a heating device for reel-to-reel continuous deposition according to the present invention.

[0093] Referring to this, in the present embodiment, the heat shield (400) is composed of an inner shield (420), a middle shield (470), and an external shield (440), and the middle shield (470) is divided into a first middle shield (430) and a second middle shield (450) and is provided to surround the support (600) and the heating means (800) arranged on the support (600).

[0094] Each shield constituting the above heat shielding member (400) can be formed of a heat-resistant, corrosion-resistant metal alloy, and in the present embodiment, a nickel alloy, inconel 600, is applied to form a double heat shielding structure in the direction of the wire being transported and in the direction of the wire being transported in the four-layer thickness direction.

[0095] First, the inner shield (420) is formed to surround the support (600) and heating means (800), but with the lower and front and rear sides open to enable deposition and substrate transfer.

[0096] That is, the inner shield (420) is composed of an inner shield front surface (422), an inner shield plane (424), an inner shield side surface (426), and an inner shield rear surface (428), and an inner shield front slit (422a) and an inner shield rear slit (428a) are formed in the inner shield front surface (422) and the inner shield rear surface (428) to form a substrate transfer path.

[0097] In addition, an inner shield side slit (426a) may be further formed on the inner shield side (426) to confirm the laser incidence path and plume for deposition.

[0098] The external shield (440) surrounds the inner shield (420) at a position spaced apart from the inner shield (420) by a predetermined distance, and is composed of an external shield front (442), an external shield plane (441), an external shield side (446), and an external shield rear (448).

[0099] In addition, an external shield front slit (442a) and an external shield rear slit (448a) are formed on the external shield front (442) and the external shield rear (448) to correspond to the inner shield (420), so that the substrate can be transported through the inside of the heat shield (400).

[0100] In addition, the external shield (440) is formed with a front cover fastening hole (444) and a rear cover fastening hole (444) for installing the shield front cover (492) and the shield rear cover (494), and each fastening hole is formed with two holes of different diameters connected as described above, so that they can be easily fastened and separated.

[0101] The above middle shield (470) forms a certain gap between the inner shield (420) and the external shield (440), and is provided with at least one middle shield, but the lower part and the front and rear sides are open, and are respectively composed of a first middle shield plane (432), a first middle shield side (434), a second middle shield plane (452), and a second middle shield side (454). A first middle shield side slit (434a) and a second middle shield side slit (454a) for confirming a laser incident path and plume may also be formed on the first middle shield side (434) and the second middle shield side (454).

[0102] That is, a slit for laser incidence and plume confirmation is formed on the side of each shield constituting the heat shield (400), so that laser deposition and deposition status can be confirmed.

[0103] Each shield formed as described above forms a heat shield (400) with a certain interval as shown in (b) of FIG. 8 by a plurality of insulating beads (230) mounted on a hollow bolt (210) as described above, and forms a heat shield (400) with complete insulation between chambers, and the heat shield (400) formed as described above forms a four-layer heat shield structure in the thickness direction of the substrate and a double heat shield structure in the substrate transport direction.

[0104] In addition, the middle shield (470) is divided into at least two parts along the substrate transfer direction and assembled, and the divided parts are arranged and combined in a partially overlapping state to prevent thermal deformation.

[0105] FIG. 9 is a drawing showing one embodiment of a shield thermal deformation compensation assembly structure constituting a heat shield, which is a key component of the present invention. In this embodiment, the middle shield (470) is divided into three parts and combined.

[0106] In detail, in this embodiment, the middle shield (470) is divided into a middle shield first part (472), a middle shield second part (474), and a middle shield third part (476).

[0107] In addition, a first part fastening hole (472a) and a third part fastening hole (476a) are formed in the first part of the middle shield (472) and the third part of the middle shield (476), respectively, and the portion where each fastening hole is formed overlaps with the second part of the middle shield (474).

[0108] The second part (474) of the middle shield is formed with a second part fastening hole (474a) that is fastened to the first part (472) of the middle shield and the third part (476) of the middle shield, and is formed as a long hole that is longer than the first part fastening hole (472a) and the third part fastening hole (476a).

[0109] That is, the first part fastening hole (472a) and the third part fastening hole (476a) are formed in the shape of holes with a diameter corresponding to the fixed pin, and the second part fastening holes (474a) formed at the four corners of the second part (474) of the middle shield are formed as long holes for thermal deformation compensation, so that warping due to thermal shrinkage and expansion can be reduced.

[0110]

[0111] Meanwhile, FIG. 10 is a drawing for showing a transport path of a substrate in a heating device for reel-to-reel continuous deposition according to the present invention, and FIG. 11 is a drawing for explaining a power supply structure of a heating device for reel-to-reel continuous deposition according to the present invention.

[0112] Referring to these drawings, the heat shield (400) having the above structure may further include thermocouples along the path of the substrate (S) being transported in a reel-to-reel manner.

[0113] To this end, the heat shield (400) is further provided with a plurality of thermocouple installation parts (900) so that the temperature can be measured at the location where the substrate (S) is initially introduced, the location where it is finally discharged, and during deposition.

[0114] Meanwhile, the heating means (800) arranged to heat the upper and side surfaces of the substrate (S) together by the support (600) inside the heat shield (400) is connected to the electrode part (200) through the hollow bolt (210) as described above.

[0115] In detail, the heating means (800) is configured to include a plurality of heating tubes (840) mounted in the heating means insertion holes (622), and a resistance heating wire (820) connected to the electrode part (200) via the plurality of heating tubes (840).

[0116] The above resistance heating wire (820) may be applied with a metal wire having high oxidation resistance and high temperature durability, and in the present embodiment, a ferrite-chromium-aluminum alloy wire is applied.

[0117] For example, the resistance heating wire (820) may be a “Kanthal A1 Resistance Wire” having a temperature rating of up to 1400°C (2550°F), excellent oxidation resistance, and melting temperature of 1500°C (2732°F), and tensile strength of 680 n / mm².

[0118] In addition, the resistance heating wire (820) having the above characteristics is coiled and accommodated inside the heating tube (840), thereby improving the heat integration.

[0119] In addition, the resistance heating wire (820) accommodated inside the heating tube (840) as described above is connected via a plurality of heating tubes (840).

[0120] That is, as illustrated in FIG. 11, the resistance heating wire (820) passing through the hollow bolt (210) at the anode (220) of the electrode portion (200) is connected to the resistance heating wire (820) coiled at the front side of the first heating tube (841) arranged on one side of the support (600), and the rear end of the first heating tube (841) is connected to the rear side of the second heating tube (not given a drawing symbol).

[0121] In the same manner as above, when the resistance heating wire (820) is connected to the front and rear sides of adjacent heating tubes up to the Nth heating tube (846) and the connection to the cathode (240) is completed, a stable power supply can be achieved to the heating means (800).

[0122] Based on the structural features described above, the heating device (100) according to the present invention can continuously heat a substrate (S) transported in a reel-to-reel manner under a relatively high oxygen partial pressure.

[0123] That is, the resistance heating wire (820) has high oxidation resistance and high temperature durability, and is operated in a coiled state inside the heating tube (840), thereby ensuring the operational stability of the heating means (800) and improving its lifespan.

[0124] In addition, contamination of the heating means (800) is reduced by the contamination prevention screen (700) provided between the heating means (800) and the substrate (S).

[0125] In addition, the contamination prevention screen (700) can be separated and mounted using a screen fixing pin (780) on one side of the heat shield (400) during maintenance, so that maintenance can be performed more easily.

[0126]

[0127] The above-described embodiments are merely examples of the cryogenic high-voltage insulation test device according to the present invention, and the present invention is not limited to the above-described embodiments, and it will be understood that the technical spirit of the present invention exists to the extent that anyone with ordinary skill in the art to which the present invention pertains can make various modifications and implement the present invention without departing from the gist of the present invention claimed in the following claims.

[0128]

[0129] The present invention enables stable continuous operation for a long time compared to conventional halogen lamps, and allows both the upper and lower surfaces of the substrate to be heated, thereby enabling deposition of a thin film of superior quality. Therefore, it is a technology with very high industrial applicability in industrial fields such as semiconductors, displays, solar panels, electric vehicle batteries, medical devices, aerospace, and superconducting applications, and an increase in demand for the technology is expected.

Claims

1. A support that provides a substrate transport path for continuous deposition inside a deposition chamber and forms a structure for arranging a heating means for heating the substrate at a location spaced apart from the substrate being transported; A heat shield provided to surround the heating means together with the support to shield the heat influence of the heating means applied to the deposition chamber; and An electrode part connected to the heating means outside the heat shield and supplying power; On the above support, A heating device for reel-to-reel continuous deposition, characterized in that a plurality of heating means insertion holes in which the heating means is installed are formed, and the heating means insertion holes are formed in a shape that surrounds the upper side of the substrate transport path from a position lower than the horizontal extension line of the substrate transport path.

2. In paragraph 1, The above heating means, A plurality of heating tubes mounted in the above heating means insertion hole, A heating device for reel-to-reel continuous deposition, characterized in that it comprises a resistance heating wire connected to the electrode section via the plurality of heating tubes.

3. In paragraph 1, In the above heat shield, An inner shield that surrounds the above support and heating means, but is open at the bottom and front and rear sides to enable deposition and substrate transfer; An external shield that surrounds the inner shield at a predetermined distance from the inner shield, but has the lower and front and rear sides open to correspond to the inner shield. A heating device for reel-to-reel continuous deposition, characterized in that it includes at least one middle shield that forms a certain gap between the inner shield and the outer shield and is open at the bottom and front and rear.

4. In paragraph 3, A heating device for reel-to-reel continuous deposition, characterized in that slits are formed on the sides of the inner shield, middle shield, and external shield for laser incidence and plume confirmation.

5. In paragraph 3, The above middle shield, It is divided into at least two parts along the substrate transfer direction and assembled, but the divided parts are placed in a partially overlapping state to prevent thermal deformation. A heating device for reel-to-reel continuous deposition, characterized in that a long hole-shaped fastening hole for thermal deformation compensation and a hole-shaped fastening hole corresponding to the long hole are provided in overlapping portions and fastened to each other by a fixing pin.

6. In paragraph 3, The above middle shield, The first middle shield that surrounds the inner shield, It includes a second middle shield surrounding the first middle shield, A heating device for reel-to-reel continuous deposition, characterized in that the inner shield, the first middle shield, the second middle shield, and the external shield are maintained at a certain interval by a hollow bolt for providing a path for electrical connection between the heating means and the electrode part, and an insulating bead fastened to the hollow bolt.

7. In paragraph 1, A heating device for reel-to-reel continuous deposition, characterized in that a contamination prevention screen is further provided between the substrate transfer path and the heating means to block deposition particles from entering the heating means.

8. In paragraph 7, In the above pollution prevention screen, A flat portion formed parallel to the substrate transfer path, A first inclined portion formed to extend in one direction at a predetermined incline on one side of the above-mentioned flat portion, and A heating device for reel-to-reel continuous deposition, characterized in that a second inclined portion is formed extending in the other direction with a slope corresponding to the first inclined portion on the other side of the flat portion.

9. In paragraph 8, The above anti-contamination screen is A heating device for reel-to-reel continuous deposition, characterized in that the intersection angle (θ) formed by the first inclined portion and the second inclined portion is formed to be 100° or more and less than 180°.

10. In paragraph 1, The above support is, A heating device for reel-to-reel continuous deposition, characterized in that at least two heating means insertion holes are formed in a flat shape and are arranged at a certain interval along the length direction of the heating means.

11. In paragraph 10, In the main body of the support forming the above support, A contamination prevention screen is installed on the lower side of the heating means insertion hole to block deposition particles flowing into the heating means. The above pollution prevention screen is, A screen mounting portion formed by extending downward from one side of the above-mentioned support main body and on which one end of the above-mentioned contamination prevention screen is mounted, A heating device for reel-to-reel continuous deposition, characterized in that it is detachably provided on the lower side of the heating means by a fixing pin installation portion that extends downward from the other side of the main body of the support and has a screen fixing pin installed through it so that the other end of the contamination prevention screen is placed.

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