Plasma generation apparatus and electrical device

Abstract

The present application relates to the technical field of plasma, and discloses a plasma generation apparatus and an electrical device. The plasma generation apparatus comprises a dielectric layer, a first electrode, and a second electrode; the dielectric layer has a first plane and a second plane that are arranged opposite to each other; at least part of the first electrode is configured as a first extension section, and the first extension section is arranged on the first plane or spaced apart from the first plane; at least part of the second electrode is configured as a second extension section, the second extension section has a plane attached to the second plane or arranged opposite to the second plane, and the first extension section is spaced apart from the second extension section by means of the dielectric layer.

Description

Plasma generating device and electric appliance

[0001] Related applications

[0002] This application claims priority to Chinese Patent Application No. 202411119963.3, filed on August 14, 2024, and Chinese Patent Application No. 202421976331.4, filed on August 14, 2024, the contents of which are incorporated herein by reference in their entirety. TECHNICAL FIELD

[0003] The present application relates to the technical field of plasma, in particular to a plasma generating device and an electric appliance. BACKGROUND

[0004] Plasma sterilization and purification utilizes the energy and active components generated by discharge between two electrodes to kill VOC (volatile organic compounds) and viruses and bacteria in the air, generate water and carbon dioxide, and has advantages over other air purification technologies. SUMMARY

[0005] The main purpose of the present application is to provide a plasma generating device, which aims to control the position of plasma generation in the plasma generating device.

[0006] To achieve the above-mentioned purpose, the plasma generating device provided by the present application comprises a dielectric layer, a first electrode and a second electrode, the dielectric layer has a first plane and a second plane arranged back to back;

[0007] At least part of the first electrode is arranged as a first extension, the first extension is arranged on the first plane or spaced apart from the first plane, and the first extension and the second extension are arranged separately by the dielectric layer;

[0008] At least part of the second electrode is arranged as a second extension, the second extension has a plane which is attached to the second plane or arranged opposite to the second plane.

[0009] The present application also provides a plasma generating device, comprising a dielectric layer, a first electrode and a second electrode, the dielectric layer has a first plane and a second plane arranged back to back;

[0010] At least part of the first electrode is arranged as a first extending section, the first extending section is arranged on or spaced from the first plane, at least part of the second electrode is arranged as a second extending section, the second extending section is arranged on or spaced from the second plane, the first extending section and the second extending section are arranged spaced by the dielectric layer, shapes of the first extending section and the second extending section are different.

[0011] When a voltage is applied to the first electrode and the second electrode, a field intensity of a discharge electric field of the first extending section is higher than a field intensity of a discharge electric field of the second extending section.

[0012] In an embodiment, the first extending section and the second extending section overlap in a projection part of the dielectric layer.

[0013] Or, the first extending section and the second extending section meet at a projection edge of the dielectric layer.

[0014] Or, the first extending section and the second extending section are arranged in a misaligned manner in a projection of the dielectric layer.

[0015] In an embodiment, an end part of the first extending section is located in a region where the first plane is located, and an end part of the second extending section is blunt to the end part of the first extending section.

[0016] In an embodiment, the first extending section is a wire.

[0017] In an embodiment, a cross-sectional dimension of the end part of the first extending section is arranged in a tapered manner, and at least one side surface of the first extending section is arranged as an inclined surface inclined to an extending direction of the first extending section.

[0018] In an embodiment, the end part of the first extending section forms a pointed end.

[0019] In an embodiment, at least in an end part region of the first extending section, a width of the first extending section is arranged in a tapered manner along an extending direction of the first extending section.

[0020] And / or, at least in an end part region of the first extending section, a thickness of the end part of the first extending section is arranged in a tapered manner along an extending direction of the first extending section.

[0021] In an embodiment, the first extending section is a conductive sheet.

[0022] Or, the first extending section is a conductive film.

[0023] Or, the first extending section is a conductive plating layer arranged on a surface of the dielectric layer.

[0024] Or, the plasma generating device further comprises a first carrier arranged opposite to the dielectric layer, and the first extending segment is a conductive plating layer arranged on a surface of the first carrier.

[0025] Or, the first extending segment is a conductive needle.

[0026] In an embodiment, the first extending segment is a wire, and an end of the first extending segment extends outward from the first plane, and the first extending segment is arranged at an angle to the central axis of the second extending segment.

[0027] In an embodiment, a projection profile of the end surface of the second extending segment on the second plane is arc-shaped.

[0028] And / or, a cross-sectional profile of the end surface of the second extending segment in the thickness direction is arc-shaped.

[0029] In an embodiment, the end surface of the second extending segment is arc-shaped.

[0030] Or, the second extending segment is a flat structure with an arc-shaped end profile.

[0031] In an embodiment, the second extending segment is a conductive sheet.

[0032] Or, the second extending segment is a conductive film.

[0033] Or, the second extending segment is a conductive plating layer arranged on a surface of the dielectric layer.

[0034] Or, the plasma generating device further comprises a second carrier arranged opposite to the dielectric layer, and the second extending segment is a conductive plating layer arranged on a surface of the second carrier.

[0035] In an embodiment, the dielectric layer is an insulating plate.

[0036] And / or, the dielectric layer is an insulating coating arranged on a surface of the second extending segment.

[0037] In an embodiment, the dielectric layer covers an outer surface of the second extending segment.

[0038] In an embodiment, the first electrode has at least two first extending segments.

[0039] And / or, the plasma generating device is provided with at least two first electrodes, and each of the at least two first electrodes is provided with the first extending segment arranged opposite to the dielectric layer.

[0040] In an embodiment, the plasma generating device further comprises a housing, and the housing forms a placement space therein and is provided with at least one outlet communicating with the placement space.

[0041] The dielectric layer, at least part of the first electrode and at least part of the second electrode are arranged in the accommodation space, and the first extending section is arranged to extend towards one of the outlets.

[0042] In one embodiment, one of the outlets is arranged opposite to the first plane, and the first extending section is exposed to the outlet.

[0043] In one embodiment, the shell is further provided with a flow guide structure extending from the edge of the outlet to the outside of the shell, and the end of the first extending section is arranged towards the flow guide structure.

[0044] In one embodiment, the shell is provided with at least two outlets, and the two outlets are respectively arranged on two sides of the dielectric layer and opposite to the first extending section and the second extending section.

[0045] In one embodiment, the inner surface of the shell is provided with a first mounting groove, and at least part of the first extending section is arranged in the first mounting groove.

[0046] In one embodiment, the inner surface of the shell is provided with a first limiting groove, and the first electrode is provided with a first limiting portion connected to the side edge of the first extending section, and the first limiting portion is arranged in the first limiting groove.

[0047] In one embodiment, the inner surface of the shell is provided with a second mounting groove, and at least part of the second electrode is arranged in the second mounting groove.

[0048] In one embodiment, the inner surface of the shell is provided with a second limiting groove, and the second electrode is provided with a second limiting portion connected to the side edge of the second extending section, and the second limiting portion is arranged in the second limiting groove.

[0049] In one embodiment, part of the first electrode extends to the outside of the shell to form a first power connection section.

[0050] In one embodiment, part of the second electrode extends to the outside of the shell to form a second power connection section.

[0051] The application further provides an electric appliance provided with the plasma generating device as described in any one of the preceding embodiments.

[0052] The technical scheme of the present application sets the first extension section on the first electrode of the plasma generating device, so that the first extension section is separated from the second electrode by the insulating dielectric layer. In application, alternating current can be applied to the first electrode and the second electrode. Due to the blockage of the dielectric layer, direct breakdown discharge cannot occur, so that surface dielectric barrier discharge can be formed on the surface of the dielectric layer to ionize air and generate plasma. Through the setting of the first extension section, on the side of the first electrode, plasma can be concentrated in the edge region of the first extension section, so that the position of plasma generation on the side of the first electrode in the plasma generating device is controllable, facilitating the utilization of the plasma generated on the side of the first electrode and achieving better sterilization and purification effect. BRIEF DESCRIPTION OF DRAWINGS

[0053] In order to more clearly illustrate the technical scheme in the embodiments of the present application or the prior art, the drawings needed to be used in the embodiments or the prior art description will be briefly introduced. Obviously, the drawings in the following description are only some embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of the drawings shown.

[0054] Fig. 1 is a structural diagram of a first embodiment of the plasma generating device provided by the present application;

[0055] Fig. 2 is an exploded view of the plasma generating device in Fig. 1;

[0056] Fig. 3 is a schematic diagram of a second embodiment of the plasma generating device provided by the present application;

[0057] Fig. 4 is a side sectional view of a third embodiment of the plasma generating device provided by the present application;

[0058] Fig. 5 is a side sectional view of a fourth embodiment of the plasma generating device provided by the present application;

[0059] Fig. 6 is a side sectional view of a fifth embodiment of the plasma generating device provided by the present application;

[0060] Fig. 7 is a side sectional view of a sixth embodiment of the plasma generating device provided by the present application;

[0061] Fig. 8 is a schematic diagram of a seventh embodiment of the plasma generating device provided by the present application;

[0062] Fig. 9 is an exploded view of an eighth embodiment of the plasma generating device provided by the present application;

[0063] Fig. 10 is a schematic diagram of a ninth embodiment of the plasma generating device provided by the present application;

[0064] Fig. 11 is a schematic view of a tenth embodiment of the plasma generating device provided by the present application;

[0065] Fig. 12 is a schematic view of an eleventh embodiment of the plasma generating device provided by the present application;

[0066] Fig. 13 is a side sectional view of the plasma generating device in Fig. 12;

[0067] Fig. 14 is a structural view of a first half-shell of a housing in the plasma generating device provided by the present application.

[0068] Brief Description of the Drawings: 100, plasma generating device; 1, dielectric layer; 11, first plane; 12, second plane; 2, first electrode; 21, first extension section; 22, first power connection section; 23, first limiting portion; 3, second electrode; 31, second extension section; 32, second power connection section; 33, second limiting portion; 4, housing; 41, accommodating space; 42, outlet; 43, first half-shell; 44, second half-shell; 45, first mounting groove; 46, second mounting groove; 47, first limiting groove; 48, second limiting groove; 49, flow guide structure.

[0069] The implementation, functional features and advantages of the present application will be further described with reference to the embodiments and the accompanying drawings. DETAILED DESCRIPTION

[0070] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the scope of protection of the present application.

[0071] Plasma sterilization and purification is to use the energy and active components generated by discharge between two electrodes to kill VOC (volatile organic compounds) and viruses and bacteria in the air, generate water and carbon dioxide, and has the advantage of being different from other air purification technologies. In the related art, most plasma generating devices use two plate-shaped electrodes arranged on the two sides of a dielectric (insulator) to discharge between the two plate-shaped electrodes. In this structure, plasma is randomly generated near the two electrodes, and the generation position of the plasma cannot be controlled in a finer scale. Moreover, the generation of plasma requires a local electric field strength to reach the breakdown electric field strength of the gas, and most plasma generating devices generate more plasma by increasing the voltage, which requires a larger excitation voltage.

[0072] In order to solve the above problems, the application provides a plasma generating device 100, which is used for oxidizing organic pollutants such as VOC and killing bacteria and viruses to purify air and other gases, and can also be used for purifying some non-conductive liquids.

[0073] Please refer to FIG. 1 to FIG. 4, in an embodiment of the application, the plasma generating device 100 comprises a dielectric layer 1, a first electrode 2 and a second electrode 3, the dielectric layer 1 has a first plane 11 and a second plane 12 arranged oppositely; at least part of the first electrode 2 is arranged as a first extending section 21, the first extending section 21 is arranged on the first plane 11 or is arranged spaced apart from the first plane 11, and at least part of the second electrode 3 is arranged as a second extending section 31, the second extending section 31 has a plane arranged in contact with or opposite to the second plane 12, and the first extending section 21 and the second extending section 31 are arranged spaced apart by the dielectric layer 1.

[0074] In the embodiment, the plasma generating device 100 comprises the first electrode 2, the second electrode 3 and the dielectric layer 1 for separating the first electrode 2 and the second electrode 3, wherein the first electrode 2 at least partially forms the first extending section 21 with a certain length, the first extending section 21 can be a linear structure or a strip structure with a certain width; the second electrode 3 at least partially forms the second extending section 31 with a certain length, and the second extending section 31 has a strip structure with a certain width, and the second extending section 31 has two planes arranged oppositely. At least part of the dielectric layer is arranged as a planar dielectric structure, and has the first plane 11 and the second plane 12 arranged oppositely, the first extending section 21 can be arranged on the first plane 11 or spaced apart from the first plane 11, one side plane of the second extending section 31 is arranged in contact with or opposite to the second plane 12, the dielectric layer 1 can be made of insulating materials such as quartz and ceramic; can be a plate structure arranged between the first electrode 2 and the second electrode 3, can be an insulating coating coated on the surface of the second extending section 31, or the dielectric layer 1 can be arranged as an insulating sleeve covering the second extending section 31.

[0075] Please refer to FIG. 4 and FIG. 5, in the embodiment, the second extending section 31 can be arranged on the surface of the dielectric layer 1, for example, the second electrode 3 is arranged in contact with the dielectric layer 1, or the second electrode 3 is arranged as a conductive plating layer on the surface of the dielectric layer 1, which can reduce the overall thickness of the second electrode 3 and the dielectric layer 1, thereby reducing the thickness of the plasma generating device 100, and reducing the linear distance between the first electrode 2 and the second electrode 3, thereby reducing the excitation voltage of the plasma generating device 100 and improving the safety in use.

[0076] In some embodiments, the second electrode 3 can also be spaced apart from the dielectric layer 1. In this way, the distance between the second electrode 3 and the first electrode 2 is relatively increased, the insulation performance between the first electrode 2 and the second electrode 3 is improved, the risk of voltage breakdown and other problems is reduced, and the use safety is improved.

[0077] The first electrode 2 and the second electrode 3 are separated by the dielectric layer 1, and a dielectric barrier discharge can be formed between the first electrode 2 and the second electrode 3. When the power supply supplies power to any one of the first electrode 2 and the second electrode 3, alternating current is input to the first electrode 2 and the second electrode 3, a voltage difference is generated between the first electrode 2 and the second electrode 3, a dielectric barrier discharge is formed on the surface of the dielectric layer 1, and acts on the fluid (such as air, exhaust gas of some processes, or liquid) flowing through the first electrode 2 and the second electrode 3, so that the fluid and the substances in the fluid are charged and become plasma, to generate plasma, kill VOC and viruses and bacteria in the fluid, generate water and carbon dioxide, and achieve purification.

[0078] Compared with the mode in which plate-shaped electrodes are arranged on both sides of the dielectric layer 1, the plasma generated on the side of the first electrode 2 is concentrated in the edge region or the end region of the first extension segment 21, so that the generation region and the diffusion region of the plasma on the side of the first electrode 2 can be controlled, and the utilization of the plasma is facilitated.

[0079] In some embodiments, the shape of the second extension segment 31 is different from that of the first extension segment 21. In this way, the shape of the first extension segment 21 and the second extension segment 31 can be set according to actual needs, so that when a voltage is applied to the first electrode 2 and the second electrode 3, the field strength of the discharge electric field on the side of the first extension segment 21 is higher than that on the side of the second extension segment 31, so that the plasma is generated more on the side with higher field strength. For example, in the following embodiments, the end of the second extension segment 31 of the second electrode 3 opposite to the dielectric layer 1 is blunt than the end of the first extension segment 21; or the first extension segment 21 is arranged as a wire, and the extension direction of the first extension segment 21 is perpendicular or substantially perpendicular to the extension direction of the second extension segment 31, and at this time, the first extension segment 21 forms a linear discharge region. In this way, when a voltage is applied to the first electrode 2 and the second electrode 3, the field strength of the discharge electric field on the side of the first extension segment 21 is higher than that on the side of the second extension segment 31, so that the plasma is generated on the side of the first extension segment 21, and the amount of plasma generated on the side of the first extension segment 21 is increased. This arrangement is beneficial to reduce the excitation voltage of the plasma generating device 100.

[0080] The first extending section 21 can be arranged on the first plane 11 of the dielectric layer 1, for example, the first extending section 21 is attached to the first plane 11, which can reduce the overall thickness of the first extending section 21 and the dielectric layer 1, thereby facilitating the reduction of the thickness of the plasma generating device 100; and can also reduce the straight-line distance between the first extending section 21 and the second electrode 3, thereby reducing the excitation voltage of the plasma generating device 100 and improving the safety in use.

[0081] In some embodiments, the first extending section 21 is arranged spaced apart from the first plane 11 of the dielectric layer 1, and there is an air gap between the first extending section 21 and the dielectric layer 1. At this time, the contact area of the first extending section 21 with air is increased, which can increase the ionization efficiency, improve the generation efficiency and amount of plasma, and facilitate the improvement of the sterilization and purification effect. In addition, the insulation performance between the first electrode 2 and the second electrode 3 can be improved, the risk of problems such as voltage breakdown can be reduced, and the safety in use can be improved.

[0082] The technical scheme of the present application provides the first extending section 21 on the first electrode 2 of the plasma generating device 100, so that the first extending section 21 and the second extending section 31 are separated by the insulating dielectric layer 1. In application, alternating current can be applied to the first electrode 2 and the second electrode 3. Due to the blocking of the dielectric layer 1, direct breakdown discharge is not possible, so that dielectric barrier discharge can be formed on the surface of the dielectric layer 1 to ionize air and generate plasma. Through the arrangement of the first extending section 21, the plasma can be concentrated on the edge area of the first extending section 21 on the side of the first electrode 2, so that the plasma generation position in the plasma generating device 100 is controlled at the position of the first extending section 21, which facilitates the utilization of the plasma generated on the side of the first electrode 2 and achieves better sterilization and purification effect.

[0083] Please refer to FIG. 6. In an embodiment, the first extending section 21 and the second extending section 31 are arranged in a position offset from the orthographic projection of the dielectric layer 1. That is, the first extending section 21 and the second extending section 31 do not overlap, which can increase the creepage distance between the first extending section 21 and the second extending section 31 along the surface of the dielectric layer 1 and ensure the insulation of the first extending section 21 and the second extending section 31 from each other.

[0084] Please refer to FIG. 3 and FIG. 4. In an embodiment, the first extending section 21 and the second extending section 31 partially overlap in the orthographic projection of the dielectric layer 1.

[0085] Compared with the way of making the projections of the first extending section 21 and the second extending section 31 staggered with each other, making the first extending section 21 and the second extending section 31 overlap in the orthographic projection part of the dielectric layer 1 can make the shortest distance D between the first extending section 21 and the second extending section 31 minimum, thereby reducing the excitation voltage, improving the use safety, and reducing the overall thickness of the plasma generating device 100, reducing the volume, and being beneficial to the application of the plasma generating device 100 in a small space.

[0086] Please refer to FIG. 5. In an embodiment, the first extending section 21 and the second extending section 31 are connected at the orthographic projection edge of the dielectric layer 1. This arrangement can also make the shortest distance D between the first extending section 21 and the second extending section 31 minimum, so as to reduce the excitation voltage of the plasma generating device 100 and reduce the overall thickness of the plasma generating device 100, reduce the volume, and improve the use safety.

[0087] Please refer to FIG. 3, FIG. 8 to FIG. 10. In an embodiment, the end of the first extending section 31 is located in the area where the first plane 11 is located, and the end of the second extending section 31 is blunt to the end of the first extending section 21.

[0088] In this embodiment, the end of the first extending section 21 is located in the area where the first plane 11 is located, and the end of the second extending section 31 is blunt to the end of the first extending section 21. For example, the end of the first extending section 21 can be arranged as a sharp end, and the end of the second extending section 31 can be arranged as a flat surface, a straight edge or an arc surface. Alternatively, the end of the second extending section 31 can have a larger curvature radius than the end of the first extending section 21. In this way, when a voltage is applied to the first electrode 2 and the second electrode 3, the local field strength of the first extending section 21 can be greater than that of the second extending section 31, so that the plasma can be concentrated to generate on the side of the first extending section 21.

[0089] Please refer to FIG. 10. In some embodiments, the first extending section 21 is a wire. The wire can be a metal wire. In this arrangement, the end of the first extending section 21 is approximately a sharp end, which can also make the field strength of the discharge electric field of the first extending section 21 higher than that of the second extending section 31, so that the plasma can be concentrated to generate in the end region of the first extending section 21.

[0090] Please refer to FIG. 3, FIG. 8 and FIG. 9. In an embodiment, the cross-sectional size of the end of the first extending section 21 is tapered, and at least one side surface of the first extending section 21 is arranged as an inclined surface inclined to the extending direction of the first extending section 21.

[0091] In the embodiment, one side surface of the first extending section 21 is an inclined surface inclined relative to the extending direction of the first extending section 21, and the cross-sectional dimension of the end portion of the first extending section 21 is gradually reduced; at this time, the end portion of the first extending section 21 can be substantially in the shape of a circular truncated cone, a prismatic truncated cone, a trapezoid or a pointed end. In this way, the radius of curvature of the end portion of the first extending section 21 can be reduced, the local field intensity of the first extending section 21 can be increased, and the plasma in the plasma generating device 100 can be better concentrated on the side of the first electrode 2. At the same time, by designing the shape of the end portion of the first extending section 21, the plasma generated in the region of the first extending section 21 can diffuse towards the end portion of the first extending section 21, i.e. the diffusion direction of the ion wind generated by the plasma aerodynamic effect can be controlled, so that directional ion wind is formed, and thus the diffusion of the plasma generated by the plasma generating device 100 from the side of the first electrode 2 to the outer diffusion region can be controlled, the plasma generated by the plasma generating device 100 can diffuse to the required region according to the requirement, and better sterilization and purification effect can be achieved.

[0092] In some embodiments, the end portion of the first extending section 21 is formed as a pointed end. In this way, the radius of curvature of the end portion of the first extending section 21 is further reduced, which is beneficial to increasing the field intensity difference between the first electrode 2 and the second electrode 3, so that the field intensity of the first electrode 2 is higher than that of the second electrode 3, and thus the plasma in the plasma generating device 100 can be concentrated on the side of the first electrode 2.

[0093] In some embodiments, the end portion of the first extending section 21 is formed as a pointed end. In this way, the radius of curvature of the end portion of the first extending section 21 is further reduced, which is beneficial to increasing the field intensity difference between the first electrode 2 and the second electrode 3, so that the field intensity of the first electrode 2 is higher than that of the second electrode 3, and thus the plasma in the plasma generating device 100 can be concentrated on the side of the first electrode 2.

[0094] In some embodiments, the end portion of the first extending section 21 is formed as a pointed end. In this way, the radius of curvature of the end portion of the first extending section 21 is further reduced, which is beneficial to increasing the field intensity difference between the first electrode 2 and the second electrode 3, so that the field intensity of the first electrode 2 is higher than that of the second electrode 3, and thus the plasma in the plasma generating device 100 can be concentrated on the side of the first electrode 2.

[0095] In the embodiment, the width direction of the first extending section 21 is perpendicular to the length direction of the first extending section 21 and is in the planar direction of the dielectric layer 1. The projection of the first extending section 21 on the dielectric layer 1 is substantially a strip-shaped profile with a certain width, and has two side edges arranged at intervals in the width direction. At least in a certain length range near the end of the first extending section 21, at least one side edge gradually extends in a direction close to the other side edge, so that the width and cross-sectional dimension of the first extending section 21 gradually shrink. This can reduce the curvature radius of the end of the first extending section 21, increase the local field strength of the first extending section 21, better enable the plasma to be concentrated on the side of the first electrode 2 in the plasma generating device 100, and control the diffusion of the plasma to the end of the first extending section 21.

[0096] In the embodiment, the first extending section 21 can be a sheet-shaped electrode, a conductive film or a columnar electrode independent of the dielectric layer 1, and can be arranged at intervals from the dielectric layer 1 or combined with the dielectric layer 1 by adhesion or the like. The first extending section 21 can also be a conductive plating layer arranged on the surface of the dielectric layer 1. In the embodiment, only the projection of the first extending section 21 on the dielectric layer 1 needs to be a strip-shaped structure, and the width of the end of the first extending section 21 needs to gradually shrink.

[0097] Please refer to FIG. 4. In an embodiment, the thickness of the end of the first extending section 21 gradually shrinks along the extending direction of the first extending section 21.

[0098] In the embodiment, the first extending section 21 has a certain thickness, and at least in a certain length range near the end of the first extending section 21, the thickness of the first extending section 21 gradually shrinks in a direction close to the end surface. At least one of the two surfaces in the thickness direction of the first extending section 21 can be arranged to tilt in a direction close to the other surface. This can reduce the thickness of the end of the first extending section 21, which is conducive to reducing the overall thickness of the plasma generating device 100, and can control the diffusion of the plasma to the end of the first extending section 21, so as to realize controllable ion wind flow direction. In the embodiment, the two surfaces in the thickness direction of the first extending section 21 can converge to form an edge at the end, or the two surfaces can be connected by the end surface.

[0099] In some embodiments, the surface of the first extending section 21 away from the dielectric layer 1 is arranged to tilt in a direction close to the dielectric layer 1, and the surface of the first extending section 21 close to the dielectric layer 1 is attached to or parallel to the dielectric layer 1. This can gradually shrink the thickness of the first extending section 21 while avoiding increasing the distance between the first extending section 21 and the second electrode 3, which is conducive to reducing the excitation voltage of the plasma generating device 100 and improving the safety in use.

[0100] In an embodiment, the first extension section 21 is a conductive sheet; or, the first extension section 21 is a conductive film; or, the first extension section 21 is a conductive plating layer arranged on the surface of the dielectric layer 1; or, the plasma generating device 100 further comprises a first carrier arranged opposite to the dielectric layer 1, and the first extension section 21 is a conductive plating layer arranged on the surface of the first carrier; or, the first extension section 21 is a conductive needle.

[0101] In the embodiment, at least the first extension section 21 of the first electrode 2 is arranged in one of the following forms: a conductive sheet, a conductive film, a conductive plating layer, and a conductive needle. When the first extension section 21 is a conductive sheet, the thickness of the first extension section 21 can be set according to actual requirements, and the first extension section 21 can be made of metal materials such as silver, gold, and copper, carbon materials, conductive polymers, or other materials, so that the structural strength and performance stability of the first extension section 21 are relatively good. When the first extension section 21 is made of a conductive film or a conductive plating layer, the thickness of the first extension section 21 is small, which is conducive to reducing the thickness and volume of the plasma generating device 100, facilitating the application of the plasma generating device 100 in small spaces, and improving the applicability and use flexibility. The conductive plating layer can be directly arranged on the surface of the dielectric layer 1, further reducing the overall thickness of the first extension section 21 and the dielectric layer 1, and the first carrier can also be arranged to arrange the conductive plating layer to form the first extension section 21. The conductive sheet, the conductive film, and the conductive plating layer can be arranged in the required shape and structure according to actual requirements, for example, the end portion of the first extension section 21 is arranged in a tapered structure in the above embodiment, which can be arranged as a sharp end, so as to increase the field strength on one side of the first extension section 21, and further control the plasma generation area and diffusion direction. When the conductive needle is used as the first extension section 21, the end portion of the first extension section 21 is a sharp end, which is also conducive to making the discharge electric field of the first extension section 21 stronger than the discharge electric field of the second extension section 31, and improving the plasma generation efficiency and amount on one side of the first extension section 21.

[0102] In some embodiments, the first electrode 2 further comprises a first power connection section 22 connected to the first extension section 21. The first power connection section 22 can be made of the same material and structure as the first extension section 21, which is convenient for manufacturing the first electrode 2, for example, the first power connection section 22 and the first extension section 21 are both conductive sheets or both conductive films or both wires. The first power connection section 22 can also be different from the first extension section 21, for example, the first extension section 21 can be arranged as a conductive sheet, and the first power connection section 22 can be arranged as a wire.

[0103] Please refer to FIG. 3. In an embodiment, the projection profile of the end surface of the second extension section 31 on the surface of the dielectric layer 1 is arc-shaped.

[0104] The width direction of the second extending section 31 is perpendicular to the extending direction of the second extending section 31 and parallel to the surface of the dielectric layer 1. In the embodiment, the projection of the second extending section 31 on the dielectric layer 1 is substantially a strip profile with a certain width, and the end surface of the second extending section 31 is an arc profile. The second extending section 31 can be a sheet electrode, a conductive film or a conductive plating layer arranged on the surface of the dielectric layer 1, and the profile of the second extending section 31 is also substantially a strip structure with an arc end surface. The second extending section 31 can also be a column electrode, and the end surface of the second extending section 31 can be a spherical surface, an arc column surface curved along the width direction of the second extending section 31, or a torus surface curved along the width direction and the thickness direction of the second extending section 31. In this way, the end of the second extending section 31 is relatively blunt, the curvature radius of the end of the second extending section 31 is increased, and the field intensity difference between the first electrode 2 and the second electrode 3 is increased, so that the field intensity of the first electrode 2 is higher than that of the second electrode 3, the plasma in the plasma generating device 100 is mainly generated on the side of the first electrode 2, and the main plasma generation area is controlled.

[0105] Please refer to FIG. 4, in an embodiment, the end surface of the second extending section 31 is an arc profile in the thickness direction.

[0106] In the embodiment, the second extending section 31 can be a sheet electrode with a certain thickness, or a column structure, so that the second extending section 31 has a relatively obvious and curved end surface. The end surface of the second extending section 31 can be a spherical surface, an arc column surface curved along the thickness direction of the second extending section 31, or a torus surface curved along the width direction and the thickness direction of the second extending section 31. In this way, the end of the second extending section 31 is relatively blunt, the curvature radius of the end of the second extending section 31 is increased, and the field intensity difference between the first electrode 2 and the second electrode 3 is increased, so that the field intensity of the first electrode 2 is higher than that of the second electrode 3, the plasma in the plasma generating device 100 is mainly generated on the side of the first electrode 2, and the main plasma generation area is controlled.

[0107] Please refer to FIG. 3 and FIG. 4, in an embodiment, the end surface of the second extending section 31 is an arc surface.

[0108] In the embodiment, the end surface of the second extending section 31 is arc-shaped, which can make the end of the second extending section 31 relatively blunt, increase the curvature radius of the end of the second extending section 31, and thus be beneficial to increase the field intensity difference between the first electrode 2 and the second electrode 3, make the field intensity of the first electrode 2 higher than that of the second electrode 3, and thus make the plasma in the plasma generating device 100 mainly generated on the side of the first electrode 2, so as to achieve the purpose of controlling the main plasma generation area. The end surface of the second extending section 31 can be a spherical surface, an arc-shaped cylindrical surface curved along the width direction of the second extending section 31, an arc-shaped cylindrical surface curved along the thickness direction of the second extending section 31, or a torus surface curved along the width direction and the thickness direction of the second extending section 31.

[0109] In an embodiment, the second extending section 31 is a flat structure with an arc-shaped end profile. The second extending section 31 can be a conductive sheet, a conductive film or a conductive coating, and the arc-shaped end profile of the second extending section 31 can also make the end of the second extending section 31 relatively blunt, increase the curvature radius of the end of the second extending section 31, and thus be beneficial to increase the field intensity difference between the first electrode 2 and the second electrode 3, make the field intensity of the first electrode 2 higher than that of the second electrode 3, and thus make the plasma in the plasma generating device 100 mainly generated on the side of the first electrode 2, so as to achieve the purpose of controlling the main plasma generation area.

[0110] Please refer to FIG. 7. In an embodiment, the extending directions of the first extending section 21 and the second extending section 31 are the same. In this way, the plasma generated in the areas of the first extending section 21 and the second extending section 31 can diffuse in the same direction, so that the plasma generated on both sides of the dielectric layer 1 can be concentrated for use. For example, in some embodiments, the plasma generating device 100 is provided with a housing 4, and the dielectric layer 1, the first extending section 21 and the second extending section 31 are all arranged in the housing 4. In this way, the first extending section 21 and the second extending section 31 can be arranged to point to the outlet 42 of the housing 4, so that the plasma generated in the areas of the first extending section 21 and the second extending section 31 can diffuse to the outlet 41 and flow out of the outlet 42, which is beneficial to the diffusion and use of the plasma.

[0111] Please refer to Fig. 11, in an embodiment, the first extending section 21 is a wire, the end of the first extending section 21 extends out of the first plane 11, and the first extending section 21 is arranged at an angle with the central axis of the second extending section 31. In the embodiment of the application, the first extending section 21 is a wire, and the second extending section 31 is a strip structure with a certain length, wherein the direction of the central axis of the second extending section 31 is the length direction of the second extending section 31; the first extending section 21 can be perpendicular to the central axis of the second extending section 31, or the first extending section 21 can be arranged at an acute angle with the central axis of the second extending section 31, i.e. the included angle a between the central axis of the first extending section 21 and the central axis of the second extending section 31 can be 5°, 10°, 20°, 30°, 40°, 50°, 60°, 70°, 80°, 90° or any value less than 90°. The end of the first extending section 21 extends out of the first plane 11, so that the first extending section 21 forms a linear discharge area on one side of the first plane 11, and the first extending section 21 is arranged as a wire, so that it is relatively thin compared with the second extending section 31, thereby the field strength of the discharge electric field on one side of the first extending section 21 is higher than that on one side of the second extending section 31, so that the plasma is concentrated to generate on one side of the first extending section 21.

[0112] In an embodiment, the second extending section 31 is a conductive sheet; or, the second extending section 31 is a conductive film; or, the second extending section 31 is a conductive plating layer arranged on the surface of the dielectric layer 1; or, the plasma generating device 100 further comprises a second carrier arranged opposite to the dielectric layer 1, and the second extending section 31 is a conductive plating layer arranged on the surface of the second carrier.

[0113] In the embodiment, the second extending section 31 can be made of one of a conductive sheet, a conductive film, and a conductive plating layer. When the second extending section 31 is made of a conductive sheet, the thickness of the second extending section 31 can be set according to actual requirements, and the second extending section 31 can be made of metal materials such as silver, gold, and copper, carbon materials, conductive polymers, or other materials, so that the second extending section 31 has relatively good structural strength and good performance stability. When the second extending section 31 is made of a conductive film or a conductive plating layer, the thickness of the second extending section 31 is small, which is conducive to reducing the thickness and volume of the plasma generating device 100, facilitating the application of the plasma generating device 100 in a small space, and improving the applicability and use flexibility. The conductive plating layer can be directly arranged on the surface of the dielectric layer 1, further reducing the overall thickness of the second extending section 31 and the dielectric layer 1, and a second carrier can also be arranged to arrange the conductive plating layer to form the second extending section 31 arranged opposite to the dielectric layer 1. The conductive sheet, the conductive film, and the conductive plating layer can be set to a required shape and structure according to actual requirements, for example, the end of the second extending section 31 is arranged in an arc shape in the above embodiment, so that the field strength on one side of the second extending section 31 is lower than that of the first extending section 21, thereby playing a role in controlling the plasma generating area.

[0114] In some embodiments, the second electrode 3 further includes a second power connection section 32 extending to the outside of the dielectric layer 1. The second power connection section 32 can be made of the same material and structure as the first extending section 21, facilitating the manufacturing of the second electrode 3, for example, the second electrode 3 is made of a conductive sheet or a conductive film. The second power connection section 32 can also be arranged in other structures, for example, the part of the second electrode 3 arranged opposite to the dielectric layer 1 can be arranged as a conductive sheet, and the second power connection section 32 can be arranged as a wire.

[0115] Please refer to FIGS. 2 to 4. In an embodiment, the dielectric layer 1 is an insulating plate. The insulating plate can be made of ceramic or quartz, and has a certain structural strength and is not easy to deform and damage. The thickness of the insulating plate can be set according to actual requirements and the installation space of the plasma generating device 100 in the application environment or the required working voltage and other conditions. In some embodiments, the insulating plate can also be used as a carrier of the first electrode 2 and the second electrode 3 to reduce the thickness of the plasma generating device 100.

[0116] In an embodiment, the dielectric layer 1 is an insulating coating arranged on the surface of the second extending section 31. The insulating coating can be a polytetrafluoroethylene coating or insulating paint. The dielectric layer 1 can include only one layer of insulating coating arranged on the surface of the second electrode 3, which is conducive to reducing the thickness and volume of the plasma generating device 100, facilitating the application of the plasma generating device 100 in a small space, and improving the applicability and use flexibility.

[0117] The dielectric layer 1 can also include an insulating carrier layer and at least one insulating coating layer. The insulating carrier layer can be the insulating plate in the foregoing embodiments. The insulating coating layer is provided on at least one surface of the insulating carrier layer. The insulating coating layer can improve the insulation performance of the dielectric layer 1 and reduce the thickness of the dielectric layer 1, thereby reducing the thickness and volume of the plasma generating device.

[0118] Please refer to FIG. 12 and FIG. 13. In an embodiment, the dielectric layer 1 is wrapped around the outer surface of the second extending section 31. The dielectric layer can be formed by coating an insulating coating layer on the surface of the second extending section 31, or by wrapping an insulating sleeve around the second extending section 31. For example, a glass cover can be wrapped around the second extending section 31, or an insulating sleeve can be injection molded on the second extending section 31. In this way, the creepage distance between the first extending section 21 and the second extending section 31 can be increased, thereby improving the insulation between the first extending section 21 and the second extending section 31.

[0119] In an embodiment, the first electrode 2 has at least two first extending sections 21.

[0120] In this embodiment, the first electrode 2 has at least two first extending sections 21. The at least two first extending sections 21 can be arranged side by side or in a circumferential array. When the first extending sections 21 are arranged in a circumferential array, the at least two first extending sections 21 can be arranged in a radial manner, or arranged along a plasma concentration area, and each first extending section 21 points to the plasma concentration area. In this way, the amount of generated plasma on one side of the first electrode 2 can be increased, thereby improving the sterilization and purification effect. Moreover, at least two plasma generation areas can be arranged on one side of the first electrode 2 according to the requirements, thereby improving the flexibility of the arrangement.

[0121] In some embodiments, the plasma generating device 100 has at least two first electrodes 2, and each first electrode 2 has a first extending section 21 arranged opposite to the dielectric layer 1.

[0122] In the embodiment, at least two first electrodes 2 can be provided, and the first extending sections 21 of the respective first electrodes 2 can be respectively arranged in the region where plasma is required to be generated, and can be irregularly distributed, or regularly arranged in parallel or in a circumferential array, wherein when the first extending sections 21 of the respective first electrodes 2 are arranged in a circumferential array, the first extending sections 21 can be directed to the central region enclosed by the first extending sections 21, or the first extending sections 21 of the at least two first electrodes 2 can be arranged in a radial manner. In this way, the amount of plasma generated on one side of the first electrode 2 can be increased, and the sterilization and purification effects can be improved. In addition, the plasma generated on one side of the first electrode 2 can be concentrated in different regions according to requirements, and the flexibility of arrangement can be improved.

[0123] Please refer to FIG. 1 and FIG. 2, in an embodiment, the plasma generating device 100 further comprises a housing 4, the housing 4 forms a placement space inside, and at least one outlet 42 communicating with the placement space is formed, the dielectric layer 1, at least part of the first electrode 2 and at least part of the second electrode 3 are arranged in the placement space, and the first extending section 21 extends towards one of the outlets 42.

[0124] In the embodiment, the plasma generating device 100 is provided with the housing 4, the housing 4 forms the accommodation space 41 inside for integrating the first electrode 2, the second electrode 3 and the dielectric layer 1 and the like into a whole structure, and can protect the first electrode 2, the second electrode 3 and the dielectric layer 1 and the like. In addition, the outlet 42 communicating with the accommodation space 41 is formed on the housing 4, and the generated plasma can diffuse outwardly from the outlet 42, so that the plasma diffusion area of the plasma generating device 100 can be controlled.

[0125] The outlet 42 on the housing 4 can be arranged opposite to the surface of the dielectric layer 1, or the outlet 42 can be arranged beside the dielectric layer 1, for example, formed on the side of the housing 4 directed by the first extending section 21. In addition, one outlet 42 can be formed on the housing 4, and the end of the first extending section 21 extends towards the direction close to the outlet 42, so that the plasma diffused to the end of the first extending section 21 can diffuse to the outlet 42 and then diffuse outwardly.

[0126] In some embodiments, two or more outlets 42 can be formed, for example, two outlets 42 can be formed and arranged opposite to the first extending section 21 and the second extending section 31 on the two sides of the dielectric layer 1 respectively. When the plasma generating device 100 is in the energized state, there is also part of plasma generated in the region of the second extending section 31, and the outlet 42 corresponding to the second electrode 3 is arranged to facilitate the outward diffusion of the plasma generated on one side of the second electrode 3, improve the efficiency of the outward discharge of the plasma and improve the utilization rate of the plasma.

[0127] Please refer to Figure 2, in some embodiments, the shell 4 comprises a first half shell 43 and a second half shell 44 arranged oppositely, the first half shell 43 and the second half shell 44 can be opened and closed relative to each other to facilitate disassembly of the first electrode 2, the second electrode 3 and the dielectric layer 1 and the like structure.

[0128] Please refer to Figure 1, in an embodiment, an outlet 42 is arranged opposite to the first plane 11, and the end of the first extension section 21 is exposed to the outlet 42. In this way, it is beneficial to discharge the plasma outward from the outlet 42, improve the plasma discharge efficiency, and improve the sterilization and purification effect of the plasma generating device 100.

[0129] Please refer to Figure 1, in an embodiment, the shell 4 is further provided with a flow guide structure 49, the flow guide structure 49 extends from the edge of the outlet 42 to the outside of the shell 4, and the end of the first extension section 21 is arranged towards the flow guide structure 49.

[0130] In this embodiment, the flow guide structure 49 is arranged on the shell 4, the flow guide structure 49 is located in front of the end of the first extension section 21, and extends away from the shell 4 from the edge of the outlet 42. In this way, when the plasma diffuses from the first extension section 21 to the end and continues to diffuse forward, it will be blocked by the flow guide structure 49, and then diffuse along the surface of the flow guide structure 49 away from the shell 4; wherein the extension direction of the flow guide structure 49 can be consistent with the axial direction of the outlet 42, or can be arranged inclined relative to the axial direction of the outlet 42, which is not limited herein. The arrangement of the flow guide structure 49 further adjusts the diffusion direction of the plasma, which can make the application of the plasma generating device 100 more flexible.

[0131] Please refer to Figures 2 and 14, in an embodiment, the inner surface of the shell 4 is provided with a first mounting groove 45, and at least part of the first extension section 21 is arranged in the first mounting groove 45.

[0132] In this embodiment, the first mounting groove 45 can be arranged on the inner surface of the shell 4 for mounting the first extension section 21, so as to limit the position of the first extension section 21, improve the stability of the mounting position of the first extension section 21, and accurately control the plasma generation and diffusion area.

[0133] In some embodiments, the inner surface of the shell 4 is provided with a second mounting groove 46, and at least part of the second extension section 31 is arranged in the second mounting groove 46. In this way, the position installation accuracy of the second electrode 3 can be improved, and the second electrode 3 can be prevented from being deviated.

[0134] Please refer to Figures 2 and 14, in an embodiment, the inner surface of the shell 4 is provided with a first limiting groove 47, the first electrode 2 is provided with a first limiting part 23, the first limiting part 23 is connected with the side edge of the first extension section 21, and the first limiting part 23 is arranged in the first limiting groove 47.

[0135] In the embodiment, the first electrode 2 is provided with a first limiting part 23 connected to the side of the first extending section 21, and the inner surface of the shell 4 is provided with a first limiting groove 47 for limiting the installation of the first limiting part 23, so as to improve the bonding strength between the first electrode 2 and the shell 4, limit the first electrode 2, and improve the installation position stability of the first extending section 21, thereby accurately controlling the plasma generation and diffusion area.

[0136] In some embodiments, the inner surface of the shell 4 is provided with a second limiting groove 48, and the second electrode 3 is provided with a second limiting part 33 connected to the edge of the second extending section 31. The second limiting part 33 is arranged in the second limiting groove 48. Alternatively, the second limiting part 33 is arranged on the second electrode 3 and connected to the side of the second extending section 31. Correspondingly, the inner surface of the shell 4 is provided with the second limiting groove 48, so that the second limiting part 33 is limited and installed in the second limiting groove 48. Thus, the bonding strength between the second electrode 3 and the shell 4 can be improved, the problems such as deflection and shaking of the second electrode 3 in the shell 4 can be avoided, and the overall structural problem and performance stability of the plasma generating device 100 are improved.

[0137] Please refer to FIG. 1. In an embodiment, part of the first electrode 2 extends to the outside of the shell 4 to form a first power connection section 22.

[0138] In the embodiment, the first electrode 2 is arranged in the shell 4, and the part of the first electrode 2 located outside the shell 4 forms the first power connection section 22 for connecting an external power supply to apply voltage to the first electrode 2. In this way, when the plasma generating device 100 is applied, the shell 4 does not need to be disassembled to connect the first electrode 2 and the external power supply. When the plasma generating device 100 needs to be disassembled, the connection between the first electrode 2 and the external power supply outside the shell 4 can be directly disconnected, thereby improving the use convenience of the plasma generating device 100.

[0139] Please refer to FIG. 1. In an embodiment, part of the second electrode 3 extends to the outside of the shell 4 to form a second power connection section 32. In some embodiments, the second electrode 3 is arranged in the shell 4, and the part of the second electrode 3 located outside the shell 4 forms the second power connection section 32 for connecting an external power supply to apply voltage to the second electrode 3. In this way, when the plasma generating device 100 is applied, the shell 4 does not need to be disassembled to connect the second electrode 3 and the external power supply. When the plasma generating device 100 needs to be disassembled, the connection between the second electrode 3 and the external power supply outside the shell 4 can be directly disconnected, thereby improving the use convenience of the plasma generating device 100.

[0140] In an embodiment, referring to FIG. 7, the first power connection section 22 and the second power connection section 32 have the same extension direction, which facilitates the power connection of the plasma generating device.

[0141] In some embodiments, referring to FIGS. 4 and 8, the extension directions of the first and second electrical connection sections 22 and 32 are different. For example, the first and second electrical connection sections 22 and 32 can be oppositely extended, or the extension directions of the first and second electrical connection sections 22 and 32 can be perpendicular to each other or at an angle. In this way, the first and second electrical connection sections 22 and 32 can be arranged on different sides to avoid short circuit caused by too short distance between the first and second electrical connection sections 22 and 32, and improve the safety in use.

[0142] The application also provides an electric appliance provided with the plasma generating device 100 according to any one of the above embodiments. The specific structure of the plasma generating device 100 is described above. Since the electric appliance adopts all the technical solutions of the above embodiments, it has all the beneficial effects of the technical solutions of the above embodiments, which will not be described here. The electric appliance can be, but is not limited to, an air conditioner, an air purifier, a floor cleaning machine, etc. The plasma generated by the plasma generating device 100 arranged in the electric appliance can reduce the toxic and harmful substances contained in the air blown by the air conditioner and the air purifier, and can purify, sterilize and disinfect the water used for cleaning in the floor cleaning machine.

[0143] The above are only exemplary embodiments of the application, and do not limit the patent scope of the application. Any equivalent structural transformation, direct / indirect application in other related technical fields based on the technical concept of the application, and the contents of the specification and drawings are included in the patent protection scope of the application.

Claims

1. A plasma generating device, wherein, The plasma generating device comprises a dielectric layer, a first electrode and a second electrode, the dielectric layer has a first plane and a second plane arranged oppositely; At least part of the first electrode is arranged as a first extending section, the first extending section is arranged on the first plane or is arranged spaced apart from the first plane; At least part of the second electrode is arranged as a second extending section, the second extending section has a plane which is attached to the second plane or is arranged oppositely to the second plane, the first extending section and the second extending section are arranged spaced apart by the dielectric layer.

2. A plasma generating device, wherein, The plasma generating device comprises a dielectric layer, a first electrode and a second electrode, the dielectric layer has a first plane and a second plane arranged oppositely; At least part of the first electrode is arranged as a first extending section, the first extending section is arranged on the first plane or is arranged spaced apart from the first plane, at least part of the second electrode is arranged as a second extending section, the second extending section is arranged on the second plane or is arranged spaced apart from the second plane, the first extending section and the second extending section are arranged spaced apart by the dielectric layer, shapes of the first extending section and the second extending section are different; When a voltage is applied to the first electrode and the second electrode, a field strength of a discharge electric field of the first extending section is higher than a field strength of a discharge electric field of the second extending section.

3. The plasma generating device of claim 1 or 2, wherein, The first extending section and the second extending section overlap in a projection part of the dielectric layer; Or, the first extending section and the second extending section are connected at a projection edge of the dielectric layer; Or, the first extending section and the second extending section are arranged in a misaligned manner in a projection of the dielectric layer.

4. The plasma generating device of claim 1 or 2, wherein, An end part of the first extending section is located in an area where the first plane is located, and an end part of the second extending section is blunt to the end part of the first extending section.

5. The plasma generating device of claim 4, wherein, A cross-sectional dimension of the end part of the first extending section is arranged in a tapered manner, and at least one side surface of the first extending section is arranged as an inclined surface which is inclined relative to an extending direction of the first extending section.

6. The plasma generating device of claim 5, wherein, The end part of the first extending section forms a sharp end.

7. The plasma generating device of claim 5, wherein, At least in an end part area of the first extending section, a width of the first extending section is arranged in a tapered manner along an extending direction of the first extending section; And / or, at least in the end part area of the first extending section, a thickness of the end part of the first extending section is arranged in a tapered manner along the extending direction of the first extending section.

8. The plasma generating device of claim 6, wherein, The first extending section is a conductive sheet; Or, the first extending section is a conductive film; Or, the first extending section is a conductive plating layer arranged on a surface of the dielectric layer; Or, the plasma generating device further comprises a first bearing arranged oppositely to the dielectric layer, and the first extending section is a conductive plating layer arranged on a surface of the first bearing; Or, the first extending section is a conductive needle.

9. The plasma generating device of claim 4, wherein, The first extending section is a conductive wire.

10. The plasma generating device of claim 4, wherein, A projection profile of an end surface of the second extending section on the second plane is arc-shaped; And / or, a cross-sectional profile of the end surface of the second extending section in a thickness direction is arc-shaped.

11. The plasma generating device of claim 4, wherein, The end surface of the second extending section is arc-shaped; Or, the second extending section is a flat structure with an arc-shaped end profile.

12. The plasma generating device of claim 1 or 2, wherein, The first extension section is a wire, and an end of the first extension section extends outward from the first plane, and the first extension section is arranged at an angle to the central axis of the second extension section.

13. The plasma generating device of claim 1 or 2, wherein, The second extension section is a conductive sheet. Or, the second extension section is a conductive film. Or, the second extension section is a conductive plating layer arranged on the surface of the dielectric layer. Or, the plasma generating device further comprises a second carrier arranged opposite to the dielectric layer, and the second extension section is a conductive plating layer arranged on the surface of the second carrier.

14. The plasma generating device of claim 1 or 2, wherein, The dielectric layer is an insulating plate. Or, the dielectric layer is an insulating coating arranged on the surface of the second extension section.

15. The plasma generating device of claim 1 or 2, wherein, The dielectric layer covers the outer surface of the second extension section.

16. The plasma generating device of claim 1 or 2, wherein, The first electrode has at least two first extension sections. And / or, the plasma generating device is provided with at least two first electrodes, and each of the at least two first electrodes is provided with the first extension section arranged opposite to the dielectric layer.

17. The plasma generating device of claim 4, wherein, The plasma generating device further comprises a housing, the housing forms a placement space inside, and at least one outlet is arranged to communicate with the placement space. The dielectric layer, at least part of the first electrode, and at least part of the second electrode are arranged in the placement space, and the first extension section is arranged to extend towards one of the outlets.

18. The plasma generating device of claim 17, wherein, One of the outlets is arranged opposite to the first plane, and the first extension section is exposed to the outlet.

19. The plasma generating device of claim 18, wherein, The housing is further provided with a flow guide structure, the flow guide structure extends outward from the edge of the outlet to the outside of the housing, and the end of the first extension section is arranged towards the flow guide structure.

20. The plasma generating device of claim 17, wherein, The housing is provided with at least two outlets, and the two outlets are respectively arranged on the two sides of the dielectric layer and opposite to the first extension section and the second extension section.

21. The plasma generating device of claim 17, wherein, The inner surface of the housing is provided with a first mounting groove, and at least part of the first extension section is arranged in the first mounting groove. And / or, the inner surface of the housing is provided with a first limiting groove, the first electrode is provided with a first limiting portion, the first limiting portion is connected to the side edge of the first extension section, and the first limiting portion is arranged in the first limiting groove.

22. The plasma generating device of claim 17, wherein, The inner surface of the housing is provided with a second mounting groove, and at least part of the second extension section is arranged in the second mounting groove. And / or, the inner surface of the housing is provided with a second limiting groove, the second electrode is provided with a second limiting portion, the second limiting portion is connected to the side edge of the second extension section, and the second limiting portion is arranged in the second limiting groove.

23. The plasma generating device of claim 17, wherein, Part of the first electrode extends outward from the housing to form a first power connection section. And / or, part of the second electrode extends outward from the housing to form a second power connection section.

24. An electrical appliance wherein, The electric appliance is provided with the plasma generating device as claimed in any one of claims 1 to 23.

Images