Line assembly for an installation for semiconductor technology, installation for semiconductor technology, and method for setting a pressure in the line assembly

Abstract

The invention relates to a line assembly (70) for an installation (1, 101) for semiconductor technology, comprising at least one elastic fluid line section (76) for conveying a fluid (40, 79) at a nominal operating line pressure, and a casing (75, 78) surrounding the elastic fluid line section (76), wherein the casing (75, 78) and the elastic fluid line section (76) are connected to one another via at least one connection adapter (74.1, 74.2) and / or at least one line connector (73.1, 73.2) of the line assembly (70). The casing (75, 78), the elastic fluid line section (76) and the at least one connection adapter (74.1, 74.2) and / or the at least one line connector (73.1, 73.2) enclose a pressurised gas space (77). The invention is characterised in that the pressure in the gas space (77) is designed such that, during operation, the elastic fluid line section (76) exhibits a maximum permissible extension or contraction of less than 60%, preferably of less than 30%, and particularly preferably of less than 15%. The invention also relates to an installation for semiconductor technology (1, 101) comprising a line assembly (70) according to any one of the described embodiments. The invention also relates to a method for setting the pressure in a line assembly (70) according to any one of the described embodiments. The method comprises the following method steps: - specifying the nominal operating line pressure, - determining the corresponding pressure in the gas space (77) on the basis of the maximum permissible extension or contraction of the fluid line section (76), and - setting the determined pressure in the gas space (77).

Description

[0001] Line assembly for a semiconductor technology plant, semiconductor technology plant and method for adjusting pressure in the line assembly

[0002] The present application claims priority over German patent application DE 10 2024 207 792.5 of 15 August 2024, the contents of which are hereby incorporated in full by reference.

[0003] The invention relates to a conduit assembly, in particular for use in a projection exposure system for semiconductor technology, and to a system for semiconductor technology, in particular a projection exposure system. The invention further relates to a method for adjusting a pressure, in particular the pressure in a gas space of the conduit assembly.

[0004] To enable ever smaller feature sizes on semiconductor devices, in accordance with Moore's Law, the demands on the equipment used to manufacture them are also increasing, particularly projection exposure systems for semiconductor technology. Current systems of this kind feature fluid-cooled temperature control systems for the thermal stabilization of the optics and structures used, which can include both cooling and targeted heating of the optics and structures, depending on location and time.

[0005] The fluid lines or channels used in the temperature control system can be routed through both the optical elements and the structural components of the system. Typically, the structures to be temperature-controlled are interconnected by pipe assemblies and networks, which are in turn mounted on the system structures themselves. Active temperature control ensures both maximum heat dissipation and heat input, as well as precise controllability of the system. The flowing fluid also promotes improved heat transfer across the surfaces it passes through (forced convection).

[0006] Due to its high heat capacity and availability, highly purified water is usually used as the fluid; however, other fluids are also conceivable.

[0007] ZEISS Classification: Secret Specifically, in the development of water-flow optical elements for projection exposure systems, their supporting structures and infrastructure, pressure fluctuations / waves transported and transmitted via the fluid play a crucial role in the performance of the overall system, particularly the imaging projection optics, and the image quality on a wafer. These pressure waves, which propagate through the fluid at the speed of sound (e.g., approximately 1500 m / s in acoustically hard environments such as stainless steel), are referred to below as WLA – Water Line Acoustics.

[0008] The sources and triggering mechanisms for thermal turbulence (WLA) are diverse. One example is flow-induced vibrations (FIV), which arise from persistent periodic and random fluctuations in the flow, i.e., turbulence, depending on local geometric boundary conditions and the upstream and downstream flow conditions. These hydrodynamic fluctuations lead to the coupling of acoustic pressure waves or vibrations, which propagate as WLA both downstream and upstream in the fluid and, depending on the geometry of the temperature control circuit, can lead to standing waves.

[0009] Another triggering mechanism involves transmitted mechanical structural vibrations and the interaction between structural components and the fluid. Both the mechanical structural vibrations themselves and the interaction exhibit frequency-dependent amplitudes. For example, in current systems, mechanical structural vibrations are transmitted via pipe supports to the pipe walls and thus directly into the fluid. Fluid channels integrated directly into structural components can also absorb mechanical structural vibrations directly through the fluid itself. Additionally, acoustic vibrations (disturbances) from the environment can also affect the fluid. WLA (Water-Loaded Airflow) is only triggered by FIV (Fluid Induction Vibration) in actively flowed temperature control systems. The other mechanisms already mentioned also occur in systems simply filled with fluid, without active flow.This also creates a countermeasure, such as switching off the active Tempe-.

[0010] - 2 -

[0011] ZEISS Classification: Secretion and thus the shutdown of the flow does not provide a complete remedy against WLA, but only against FIV as a source.

[0012] To reduce the pressure fluctuations introduced into the fluid system, which manifest as acoustic vibrations, to a specified level, (hardware) measures are required. These can be actively operated / controlled or, preferably, passive measures. One solution for reducing, suppressing, or damping acoustic vibrations in the fluid column (WLA) is the use of piping assemblies made of a viscoelastic material with an adjacent gas space.

[0013] The gas space corresponds to a spatial area designed in such a way that the damping elements, manufactured as fluid line sections from the viscoelastic material, have sufficient space (volume) for deformation or expansion. This space (volume) is necessary to ensure free deformation of the damping element and thus the best possible damping effect.

[0014] The function of the viscoelastic material depends essentially on the material properties of the fluid line section designed as an elastic or viscoelastic hose. Due to their particularly suitable damping properties, soft materials with a high damping factor, the so-called loss factor, are preferred. However, these soft materials in particular exhibit parasitic effects such as high creep rates. Especially at high pressure differentials between the gas space and the fluid within the temperature control system, significant deformations and stresses occur in the viscoelastic hose. When the pressure within the fluid in the temperature control system is higher than the pressure in the gas space, the hose expands radially, similar to a balloon, and is subjected to continuous static stress. Conversely, when the pressure is lower, a corresponding contraction occurs, which also results in static stress on the hose.Due to the high creep rate of the material, such as TPU or FFKM, and the resulting plastic deformation of the hose, the viscoelastic hose continues to deform under stress. This occurs in the described overpressure load case.

[0015] - 3 -

[0016] ZEISS Classification: Secret. After a certain time, the hose becomes embedded in the outer shell of the assembly, which can be designed, for example, as a corrugated hose or a rigid (smooth) tube. As soon as the viscoelastic hose comes into contact with the outer shell, the damping effect, which is the main function of the viscoelastic hose, is severely restricted, since the inner hose can no longer move or "breathe" freely.

[0017] In the described low-pressure load case, the hose collapses after a certain time, significantly reducing the flow cross-section. This results in high pressure losses and high FIV values ​​due to the generated turbulence and is therefore undesirable.

[0018] When using a viscoelastic material with an adjacent gas space, permeation of water or another fluid into the gas space and vice versa can occur. This permeation process, in which a substance (permeate) penetrates or passes through a solid, is fundamentally dependent on the gradient of the permeate's chemical potential. However, in the case described here, it can be reduced to a dependence on the primary influence of the partial pressure difference between the fluid and the surrounding space. This partial pressure difference, in turn, depends directly on the temperature difference between the fluid volume and the gas space. Since the temperature in a projection exposure system is maintained at a very precise, constant value, and the temperature control fluid can simultaneously have a higher temperature, this permeation process is sometimes significantly accelerated.Furthermore, the lower dew point leads to condensation of water vapor within the gas space. This has the disadvantage that water can penetrate the gas space over several months or years. Additionally, gas from the gas space can enter the fluid. Both effects lead to a change in the pressure ratio between the gas space and the fluid line section, and potentially also to a reduction in the gas space of the viscoelastic hose. This can result in changes in the damping effect of the viscoelastic hose, which generally reduces its damping capacity.

[0019] - 4 -

[0020] ZEISS Classification: Secret The object of the present invention is to provide a device for eliminating the disadvantages of the prior art explained above. Furthermore, the object of the invention is to provide a method for adjusting the pressure in the gas space of a piping assembly.

[0021] This problem is solved by a device and a method having the features of the independent claims. The dependent claims relate to advantageous embodiments and variants of the invention.

[0022] A piping assembly according to the invention for a semiconductor technology system comprises at least one elastic fluid line section for guiding a fluid at a nominal operating line pressure and a casing surrounding the elastic fluid line section. The casing and the fluid line section are connected to each other via at least one connecting adapter and / or at least one line connection of the piping assembly such that the casing, the fluid line section, and the at least one connecting adapter and / or the at least one line connection enclose a gas space. The invention is characterized in that the pressure in the gas space is configured such that the elastic fluid line section exhibits a maximum expansion or contraction of less than 60%, preferably less than 30%, and particularly preferably less than 15% during operation.The elongation refers to the change in diameter of the hose from its undeveloped state, whereby higher elongations can occur locally in the hose, such as at the clamping point of the elastic fluid line section.

[0023] Within the scope of the invention, the nominal operating line pressure is defined as the operating pressure present in the fluid line section or in the fluid line comprising the line assembly during operation, wherein this pressure is free of disturbances, i.e., it does not include any acoustic vibrations (WLA) and can therefore be considered constant. In other words, it is assumed that the operating pressure is much higher than the acoustic vibrations (WLA), meaning that the vibrations are negligibly small with regard to creep.

[0024] - 5 -

[0025] ZEISS Classification: Secret. The elastic fluid line section may, in particular, consist of a viscoelastic material characterized by a high damping factor or a high loss factor, making it especially suitable for attenuating acoustic disturbances. The casing may be designed as a corrugated hose, a relatively rigid tube, or another component, which protects the fluid line section (e.g., designed as a viscoelastic hose) from damage and, at the same time, protects the surroundings, especially the optical elements, from substances or fluid potentially outgassing from the viscoelastic material of the hose.

[0026] In the context of the present invention, elongation and contraction are defined as elastic deformations of the fluid line section from a force-free and stress-free state. In contrast, creep of the fluid line section material results in a plastic, i.e., permanent, deformation of the fluid line section. The total deformation of the fluid line section at nominal operating line pressure and corresponding pressure in the gas space, which is decisive for the damping effect, is therefore composed of elastic and plastic deformation. The maximum permissible elongation can be determined, in particular, based on the creep of the fluid line section material caused by the elongation or contraction of the fluid line section over time.Creep manifests itself as a plastic and therefore permanent deformation of the fluid line section, resulting in a total deformation of the fluid line section that exceeds the elastic deformation, particularly radial deformation. The maximum permissible plastic deformation due to creep of the material can be less than 50%, preferably less than 25%, and most preferably less than 15%. The predetermined period used to determine the creep can be 30 years, preferably 15 years, and most preferably 10 years. The strain is based on the change in diameter of the hose from its unstrained state, whereby higher strains can also occur locally within the hose, such as at the clamping point of the elastic fluid line section.

[0027] - 6 -

[0028] ZEISS Classification: Secret. In a first embodiment of the invention, at least one device for filling the gas space with a substance or a mixture of substances and for adjusting the pressure in the gas space may be provided. The device may comprise parts of the piping assembly, in particular the at least one connecting adapter and / or the at least one piping connection or the casing.

[0029] In a further embodiment of the invention, the material can have a permeability through the viscoelastic material into the fluid that is 25 times smaller, preferably 50 times smaller, and particularly preferably 100 times smaller, compared to air.

[0030] In particular, the substance may be at least partially composed of a compressible fluid, wherein the fluid comprises one of the following substances:

[0031] Tetrafluoromethane (CF4), alkanes (methane, ethane, propane, butane, isobutane), noble gases (helium, neon, argon, krypton, xenon) or fluorine-containing gases, such as SF6, CF 4I C5-FN, C4-FN, and all fluorinated refrigerants.

[0032] The permeation of gas present in the headspace into the fluid line section can be advantageously reduced by using a substance like the one mentioned above, which, under the given circumstances, has a low permeability compared to gases typically present in the headspace, such as dry air, extremely clean dry air (XCDA), nitrogen, or carbon dioxide. The reduced permeation can be attributed, on the one hand, to the larger molecules of these gases compared to air. On the other hand, the permeation is reduced by a polar material used for the hose, such as fluororubber, or, in the case of noble gases, by their nonpolar properties. This advantageously reduces the pressure drop in the headspace caused by permeation from the headspace into the fluid line section.In the case of a deliberate contraction of the hose to dampen vibrations in the fluid column (WLA), this leads to an advantageous extension of the initial target state and thus of the damping effect of such a pipe assembly.

[0033] Furthermore, the gas space may contain at least a portion of a compressible foam, which may comprise one of the following materials:

[0034] - 7 -

[0035] ZEISS Classification: Secret Polyurethane (PUR / Pll) - flexible foam, acrylonitrile butadiene rubber (NBR), fluororubber (FKM), perfluororubber (FFKM), polyethylene (PE), silicone foam, polystyrene foams (such as PS-E, XPS), polyphenylene ether (PP-E) and polyvinyl chloride (PVC-E), sponge rubber or cellular rubber. Other thermoplastic foams and elastomeric foams are also conceivable.

[0036] A compressible foam has the advantage that the material used for the foam can have a comparatively low permeation coefficient compared to the viscoelastic material of the fluid line section, which further slows down the permeation of the gas into the fluid line section. The gas in the foam can be one of the gases mentioned above.

[0037] In a further embodiment of the invention, the device can have at least one passage into the gas space. This passage can, for example, extend through at least one connecting adapter and / or at least one line connection or through the outer casing of the line assembly. The passage can extend, at least partially, radially and / or tangentially to the fluid line section and / or in the direction of the fluid line section or in any other direction.

[0038] Furthermore, the device may have at least one connection for linking to a gas supply device for supplying the substance and adjusting the pressure in the gas space. The gas supply device is a device for supplying a predetermined substance, in particular gas, for filling the gas space and for adjusting and optionally regulating the pressure in the gas space before and / or during operation or the service life of the piping assembly. Filling can be carried out, for example, by a regulated pressure reservoir, such as a pressure tank.

[0039] In a further embodiment of the invention, the device can include a pressure chamber for mounting the pipe assembly. In this case, the pipe assembly is mounted in the pressure chamber, which is filled with the previously determined gas and pressurized to the previously determined pressure in the gas space.

[0040] - 8 -

[0041] ZEISS Classification: Secret. The openings of the elastic fluid line section can, for example, be located outside the pressure chamber.

[0042] Alternatively, the openings can also be located within the pressure chamber, in which case the pressure differential only establishes itself after the pipe assembly is removed from the pressure chamber. To prevent creep after removal, the pipe assemblies can, for example, be stored in pressure chambers, or the elastic fluid pipe section can be pressurized to a pressure corresponding to the pressure in the gas space.

[0043] Alternatively, if an overpressure is set within the gas space, a dome or a pressurized hose can be temporarily inserted into the fluid section to prevent collapse or overloading of the elastic fluid line section.

[0044] Furthermore, the ends of the fluid line section can be sealed or encapsulated, at least temporarily, for example, during assembly or until installation in a projection exposure system. A desired pressure inside the fluid line section can be preset. For all variants, the influence of permeation must be taken into account.

[0045] During operation, the fluid line section is pressurized with a fluid, which is usually high-purity water, at the previously defined operating line pressure, thereby establishing a pressure equilibrium that ensures compliance with the maximum permissible expansion or contraction of the elastic fluid line section during operation.

[0046] In another embodiment, the device can include a sealing element, which can be designed as a sealing screw, sealing plunger, sealing pressure pin, or weld. The sealing element serves to close the passage into the gas space after a filling process and pressure adjustment.

[0047] - 9 -

[0048] ZEISS Classification: Secret. Furthermore, the sealing element can be connected to the pipe assembly by friction and / or form-fitting. Examples of a friction-fitting connection are a crimp sleeve or a dowel pin. An example of a form-fitting connection is a bayonet fitting. Screws can be designed as either a friction-fitting or a form-fitting connection.

[0049] In particular, the sealing element can be materially bonded to the pipe assembly. In this case, a sealing element used to close the penetration or a connection associated with the penetration is created by a weld, solder, or adhesive. Optionally, the sealing elements can be closed on the outside with a cover.

[0050] Furthermore, the sealing element can be inserted into the device perpendicular to the feedthrough or in the direction of a first section of the feedthrough viewed from the outside. The sealing element is thus inserted either into the feedthrough intended for filling with gas or into an additional second recess or bore in the device, formed perpendicular to the feedthrough. In principle, arrangements of the additional recess or bore at an angle greater than 30°, preferably greater than 60°, and particularly preferably greater than 75°, and generally within a range of 0° to 180° to the feedthrough, are also conceivable.

[0051] In a further embodiment of the invention, the sealing element can have at least one seal.

[0052] Furthermore, the seal can be designed as a sealing disc and / or seal and / or sealing body and / or O-ring and / or metal seal.

[0053] In particular, the seal can be designed as a fit. This has the advantage that no additional sealing element is required and a properly designed fit can maintain a high level of tightness over time.

[0054] Furthermore, the seal can be designed as a weld or adhesive bond. The weld or adhesive bond can be added to a seal as described above to improve the seal, particularly over a long period of time, for example, several years, especially 10 years. Al-

[0055] - 10 -

[0056] ZEISS Classification: Secret. Alternatively, the weld or adhesive bond can also act as the sole seal. In appropriately designed embodiments, a weld or adhesive bond can therefore function as a seal and as a sealing element, as explained above.

[0057] In an advantageous embodiment of the invention, a temporary seal of the gas space to the outside can be achieved by covering at least one feedthrough at its opening facing the gas space with a portion of the elastic fluid line section that is designed to be liftable from the opening. In other words, the fluid line section rests against the opening of the feedthrough on one side from the inside of the line assembly and, without further measures and under appropriate pressure conditions, prevents the escape of the gas contained in the gas space. If an external pressure is now applied to the feedthrough that exceeds the pressure prevailing in the temperature control fluid, the fluid line section lifts off in the region of the inner opening of the feedthrough and forms a gap through which a connection to the gas space is established.

[0058] This allows the pressure in the gas space to be easily increased as needed by applying appropriate external pressure. Furthermore, the gap can also be created by using a pin or capillary to lift the fluid line section away from the inner opening of the feedthrough. For example, a capillary can also be used to supply fresh gas to the gas space. Conversely, the gap created by the capillary or pin can also be used to generate a negative pressure in the gas space, enabling gas to be extracted from it.

[0059] A further improved variant for effective gas exchange in the gas space can be achieved, in particular, by providing at least one passage at each of the longitudinally opposite ends of the gas space. In this case, the first passage can be used to supply fresh gas to the gas space; the gas to be exchanged can escape from the gas space to the outside or be extracted through the second passage. For this purpose, the elastic fluid line section can be routed through the second passage.

[0060] - 11 -

[0061] ZEISS Classification: Secret, for example, by means of a pin, it can be slightly lifted so that a gap forms from the inner opening of the feedthrough into the gas space.

[0062] Connection adapters have proven to be an advantageous choice for positioning the feedthrough(s). Of course, it is also conceivable to route the feedthrough through another component of the cable assembly.

[0063] An inventive system for semiconductor technology can comprise a conductor assembly according to one of the preceding embodiments.

[0064] In particular, the system can be designed as a projection exposure system.

[0065] A method according to the invention for adjusting the pressure in a gas space of a piping assembly as described above comprises the following method steps:

[0066] - Determination of the nominal operating line pressure,

[0067] - Determination of the corresponding pressure in the gas space based on the maximum permissible expansion or contraction of the fluid line section,

[0068] - Adjusting the determined pressure in the gas space.

[0069] In particular, the gas space can be filled with the gas supply device described above before the pressure in the gas space is set.

[0070] In addition, the gas space can be evacuated before filling. Alternatively, the gas space of a piping assembly can be filled using a second feedthrough that allows the gas space to be purged. The gas space can be purged until it is completely filled with the desired substance.

[0071] Furthermore, the gas chamber can be sealed after the pressure has been set.

[0072] In particular, the gas space can be permanently sealed.

[0073] - 12 -

[0074] ZEISS Classification: Secret Permanent, as used in the invention, means that the sealing element can no longer be removed without damage, i.e., the pressure set in the gas chamber can no longer be actively changed from the outside. Alternatively, the gas chamber can be temporarily sealed by a sealing element, thereby enabling pressure control in the gas chamber as explained below. Furthermore, the pressure can also be adjusted to the desired value during maintenance and / or repair of the piping assembly.

[0075] In a further embodiment of the invention, the pressure in the gas space can be offset from a pressure set under the assumption of a permeation-free piping assembly in the case of a permanently sealed gas space. This offset can be selected depending on the permeability of the material of the fluid piping section and the associated changes in pressure in the gas space over the service life of the piping assembly caused by permeation of gas from the gas space into the fluid piping section and of fluid from the fluid piping section into the gas space.

[0076] The offset can be configured as either overpressure or underpressure. This depends on the corresponding expected change in pressure in the gas space over time. If the gas space loses pressure over time due to gas permeation into the fluid line section, the offset is configured as overpressure, and vice versa. In both cases, the pressure difference between the gas space and the fluid line section is always within a range that does not exceed the maximum permissible expansion of the fluid line section, thus reducing or completely preventing creep over time. Ideally, the time-averaged pressure difference between the gas space and the fluid line section is zero, further minimizing creep.

[0077] In particular, the offset can be formed in a range of less than 100% of the operating line pressure, preferably less than 50% of the operating line pressure, and especially preferably less than 25% of the operating line pressure.

[0078] In a further embodiment of the invention, the gas and the material of the fluid line section can be selected such that the change in the

[0079] - 13 -

[0080] ZEISS Classification: Secret. This design compensates for pressure changes in the gas space due to gas permeation from the gas space into the fluid line section and pressure changes due to fluid permeation from the fluid line section into the gas space. Ideally, in this case, the deformation of the fluid line section can be zero or nearly zero over its entire service life, thus virtually eliminating creep of the viscoelastic material.

[0081] In another embodiment, the pressure in the gas space can be regulated during operation by means of the gas supply device. In this case, the regulation can be active or semi-active, so that the pressure can be regulated or controlled either continuously or at specific times. The semi-active regulation can also include a temporary connection of the device to the gas supply device, whereas the active regulation requires a permanent connection to the gas space.

[0082] The gas supply device itself can be connected to the piping assembly via the connection arranged on the piping assembly using a temporarily or permanently connected connecting element, such as a hose or a pipe.

[0083] Alternatively, the gas supply device can also be permanently or temporarily arranged directly at the connection of the piping assembly or integrated into the piping assembly.

[0084] Exemplary embodiments and variants of the invention are explained in more detail below with reference to the drawing. The drawing shows

[0085] Figure 1 schematically shows a projection exposure system for EUV projection lithography in meridional section.

[0086] Figure 2 schematically shows a projection exposure system for DUV projection lithography in meridional section.

[0087] Figure 3 shows a schematic representation of a part of an EUV projection exposure system known from the prior art,

[0088] - 14 -

[0089] ZEISS Classification: Secret Figure 4 an embodiment of the invention,

[0090] Figure 5a-c Embodiments of a detail of the invention,

[0091] Figures 6a, b show further embodiments of a detail of the invention.

[0092] Figure 7 shows a further embodiment of a detail of the invention,

[0093] Figures 8a, b show further embodiments of a detail of the invention.

[0094] Figures 9a-c show further embodiments of a detail of the invention,

[0095] Figure 10 shows another embodiment of the invention,

[0096] Figure 11 shows a variant of the invention with temporary sealing,

[0097] Figure 12 shows another variant of the invention,

[0098] Figure 13 shows an embodiment of the invention which enables rapid gas exchange, and

[0099] Figure 14 shows a flowchart for a manufacturing process according to the invention.

[0100] The following section describes, with reference to Figure 1, the essential components of a projection exposure system 1 for microlithography in which the invention can be applied. The description of the basic structure of the projection exposure system 1 and its components is not intended to be restrictive.

[0101] One embodiment of a lighting system 2 of the projection exposure system 1 has, in addition to a radiation source 3, a lighting optic 4 for illuminating an object field 5 in an object plane 6. In an alternative embodiment, the light source 3 can also be provided as a separate module from the rest of the lighting system. In this case, the lighting system does not include the light source 3.

[0102] - 15 -

[0103] ZEISS Classification: Secret. A reticle 7 arranged in the object field 5 is illuminated. The reticle 7 is held by a reticle holder 8. The reticle holder 8 can be moved, particularly in one scanning direction, via a reticle displacement drive 9.

[0104] Figure 1 shows a Cartesian xyz coordinate system for illustrative purposes. The x-direction runs perpendicular to the plane of the drawing. The y-direction runs horizontally, and the z-direction runs vertically. In Figure 1, the scan direction runs along the y-direction. The z-direction runs perpendicular to the object plane 6.

[0105] The projection exposure system 1 comprises a projection optic 10. The projection optic 10 serves to image the object field 5 onto an image field 11 in an image plane 12. The image plane 12 is parallel to the object plane 6. Alternatively, an angle other than 0° between the object plane 6 and the image plane 12 is also possible.

[0106] A structure on the reticulum 7 is imaged onto a photosensitive layer of a wafer 13 located in the image plane 12 within the image field 11. The wafer 13 is held by a wafer holder 14. The wafer holder 14 can be moved, particularly along the y-direction, via a wafer transfer drive 15. The movement of the reticulum 7 via the reticulum transfer drive 9 and of the wafer 13 via the wafer transfer drive 15 can be synchronized.

[0107] Radiation source 3 is an EUV radiation source. Specifically, radiation source 3 emits EUV radiation 16, which is also referred to below as useful radiation, illumination radiation, or illumination light. The useful radiation has a wavelength in the range between 5 nm and 30 nm. Radiation source 3 can be a plasma source, for example, an LPP source (laser-produced plasma) or a DPP source (gas-discharged produced plasma). It can also be a synchrotron-based radiation source. Radiation source 3 can be a free-electron laser (FEL).

[0108] - 16 -

[0109] ZEISS Classification: Secret. The illumination radiation 16 emanating from the radiation source 3 is focused by a collector 17. The collector 17 can be a collector with one or more ellipsoidal and / or hyperboloid reflective surfaces. The at least one reflective surface of the collector 17 can be illuminated by the illumination radiation 16 at grazing incidence (Gl), i.e., with angles of incidence greater than 45° relative to the normal direction of the mirror surface, or at normal incidence (NI), i.e., with angles of incidence less than 45°. The collector 17 can be structured and / or coated to optimize its reflectivity for the useful radiation and to suppress stray light.

[0110] After the collector 17, the illumination radiation 16 propagates through an intermediate focus in an intermediate focal plane 18. The intermediate focal plane 18 can represent a separation between a radiation source module, comprising the radiation source 3 and the collector 17, and the illumination optics 4.

[0111] The illumination optics 4 comprise a deflecting mirror 19 and, downstream in the beam path, a first faceted mirror 20. The deflecting mirror 19 can be a planar deflecting mirror or, alternatively, a mirror with an effect that influences the beam beyond the mere deflection effect. Alternatively or additionally, the deflecting mirror 19 can be designed as a spectral filter that separates a useful wavelength of the illumination radiation 16 from stray light of a different wavelength. If the first faceted mirror 20 is arranged in a plane of the illumination optics 4 that is optically conjugate to the object plane 6 as the field plane, it is also referred to as a field faceted mirror. The first faceted mirror 20 comprises a plurality of individual first facets 21, which are hereinafter also referred to as field facets. Only a few of these facets 21 are shown in Fig. 1 as examples.

[0112] The first facets 21 can be designed as macroscopic facets, in particular as rectangular facets or as facets with an arcuate or semicircular border contour. The first facets 21 can be designed as planar facets or alternatively as convexly or concavely curved facets.

[0113] - 17 -

[0114] ZEISS Classification: Secret. As is known, for example, from DE 10 2008 009 600 A1, the first facets 21 themselves can each be composed of a plurality of individual mirrors, in particular a plurality of micromirrors. The first facet mirror 20 can in particular be designed as a microelectromechanical system (MEMS system). For details, reference is made to DE 10 2008 009 600 A1.

[0115] Between the collector 17 and the deflecting mirror 19, the illumination radiation 16 runs horizontally, i.e. along the y-direction.

[0116] In the beam path of the illumination optics 4, a second faceted mirror 22 is arranged downstream of the first faceted mirror 20. If the second faceted mirror 22 is arranged in a pupil plane of the illumination optics 4, it is also referred to as a pupil faceted mirror. The second faceted mirror 22 can also be arranged at a distance from a pupil plane of the illumination optics 4. In this case, the combination of the first faceted mirror 20 and the second faceted mirror 22 is also referred to as a specular reflector. Specular reflectors are known from US 2006 / 0132747 A1, EP 1 614 008 B1, and US 6,573,978.

[0117] The second facet mirror 22 comprises a plurality of second facets 23. In the case of a pupil facet mirror, the second facets 23 are also referred to as pupil facets.

[0118] The second facets 23 can also be macroscopic facets, which may, for example, have round, rectangular, or hexagonal edges, or alternatively, facets composed of micromirrors. Reference is also made to DE 102008 009 600 A1 in this regard.

[0119] The second facets 23 can have planar or alternatively convex or concave curved reflective surfaces.

[0120] The illumination optics 4 thus form a double-faceted system. This basic principle is also known as a honeycomb condenser (Fly's Eye Integrator).

[0121] It can be advantageous not to arrange the second faceted mirror 22 exactly in a plane that is optically conjugate to a pupil plane of the projection optics 10. In particular, the pupil faceted mirror 22 can be positioned opposite a pupil-

[0122] - 18 -

[0123] ZEISS Classification: Secret next to the projection optics 10 may be arranged tilted, as described for example in DE 10 2017 220 586 A1.

[0124] With the aid of the second faceted mirror 22, the individual first facets 21 are imaged into the object field 5. The second faceted mirror 22 is the last beam-shaping, or indeed the last, mirror for the illumination radiation 16 in the beam path before the object field 5.

[0125] In another embodiment of the illumination optics 4, not shown, a transmission optic can be arranged in the beam path between the second faceted mirror 22 and the object field 5, which contributes in particular to imaging the first facets 21 into the object field 5. The transmission optic can have exactly one mirror, or alternatively two or more mirrors, which are arranged one behind the other in the beam path of the illumination optics 4. The transmission optic can in particular comprise one or two mirrors for normal incidence (Nl mirrors, normal incidence mirrors) and / or one or two mirrors for grazing incidence (Gl mirrors, grazing incidence mirrors).

[0126] In the embodiment shown in Fig. 1, the lighting optics 4 has exactly three mirrors after the collector 17, namely the deflecting mirror 19, the field facet mirror 20 and the pupil facet mirror 22.

[0127] In a further embodiment of the lighting optics 4, the deflecting mirror 19 can also be omitted, so that the lighting optics 4 after the collector 17 can then have exactly two mirrors, namely the first faceted mirror 20 and the second faceted mirror 22.

[0128] The mapping of the first facets 21 by means of the second facets 23 or with the second facets 23 and a transmission optic into the object plane 6 is regularly only an approximate mapping.

[0129] The projection optics 10 comprise a plurality of mirrors Mi, which are numbered according to their arrangement in the beam path of the projection exposure system 1.

[0130] - 19 -

[0131] ZEISS Classification: Secret. In the example shown in Figure 1, the projection optics 10 comprises six mirrors M1 to M6. Alternatives with four, eight, ten, twelve, or any other number of mirrors Mi are also possible. The penultimate mirror M5 and the last mirror M6 each have a passage for the illumination radiation 16. The projection optics 10 is a double-obscured optic. The projection optics 10 has an image-side numerical aperture greater than 0.5, and which can also be greater than 0.6, for example, 0.7 or 0.75.

[0132] The reflective surfaces of the mirrors Mi can be designed as freeform surfaces without an axis of rotational symmetry. Alternatively, the reflective surfaces of the mirrors Mi can be designed as aspherical surfaces with exactly one axis of rotational symmetry of the reflective surface shape. The mirrors Mi, like the mirrors of the illumination optics 4, can have highly reflective coatings for the illumination radiation 16. These coatings can be designed as multilayer coatings, in particular with alternating layers of molybdenum and silicon.

[0133] The projection optics 10 have a large object-image offset in the y-direction between a y-coordinate of a center of the object field 5 and a y-coordinate of the center of the image field 11. This object-image offset in the y-direction can be approximately as large as a z-distance between the object plane 6 and the image plane 12.

[0134] The projection optics 10 can be anamorphic. In particular, they have different image scales βx, βy in the x and y directions. The two image scales βx, βy of the projection optics 10 are preferably (βx, βy) = (+ / - 0.25, + / - 0.125). A positive image scale β indicates an image without image inversion. A negative sign for the image scale β indicates an image with image inversion.

[0135] The projection optics 10 thus lead to a reduction in the x-direction, that is, in the direction perpendicular to the scan direction, in a ratio of 4:1.

[0136] The projection optics 10 lead to a reduction of 8:1 in the y-direction, that is, in the scan direction.

[0137] - 20 -

[0138] ZEISS Classification: Secret. Other magnification ratios are also possible. Magnification ratios with the same sign and absolute values ​​in the x and y directions are also possible, for example with absolute values ​​of 0.125 or 0.25.

[0139] The number of intermediate image planes in the x- and y-directions in the beam path between the object field 5 and the image field 11 can be the same or, depending on the design of the projection optics 10, different. Examples of projection optics with different numbers of such intermediate images in the x- and y-directions are known from US 2018 / 0074303 A1.

[0140] Each pupil facet 23 is assigned to exactly one of the field facets 21 to form an illumination channel for illuminating the object field 5. This can result, in particular, in illumination according to Köhler's principle. The far field is divided into a multitude of object fields 5 by means of the field facets 21. The field facets 21 generate a plurality of images of the intermediate focus on the pupil facets 23 assigned to each of them.

[0141] The field facets 21 are each superimposed on the reticulum 7 by an associated pupil facet 23 to illuminate the object field 5.

[0142] The illumination of object field 5 is particularly homogeneous. It preferably exhibits a uniformity error of less than 2%. Field uniformity can be achieved by superimposing different illumination channels.

[0143] The illumination of the entrance pupil of the projection optics 10 can be geometrically defined by the arrangement of the pupil facets. By selecting the illumination channels, in particular the subset of pupil facets that guide light, the intensity distribution in the entrance pupil of the projection optics 10 can be adjusted. This intensity distribution is also referred to as the illumination setting.

[0144] Another preferred pupil uniformity in the area of ​​defined illuminated sections of an illumination pupil of the illumination optics 4 can be achieved by a redistribution of the illumination channels.

[0145] Further aspects and details of the illumination of the object field 5 and, in particular, the entrance pupil of the projection optics 10 are described below.

[0146] - 21 -

[0147] ZEISS Classification: Secret. The projection optics 10 may, in particular, have a homocentric entrance pupil. This may be accessible. It may also be inaccessible.

[0148] The entrance pupil of the projection optics 10 cannot be precisely illuminated by the pupil facet mirror 22. When the projection optics 10 image the center of the pupil facet mirror 22 telecentrically onto the wafer 13, the aperture rays often do not intersect at a single point. However, a surface can be found where the pairwise determined separation of the aperture rays is minimized. This surface represents the entrance pupil or a surface conjugate to it in real space. In particular, this surface exhibits a finite curvature.

[0149] The projection optics may have different entrance pupil positions for the tangential and sagittal beam paths. In this case, an imaging element, in particular an optical component of the transmission optics, should be provided between the second faceted mirror 22 and the reticle 7. This optical element can accommodate the different positions of the tangential and sagittal entrance pupils.

[0150] In the arrangement of the components of the illumination optics 4 shown in Figure 1, the pupil facet mirror 22 is arranged in a plane conjugate to the entrance pupil of the projection optics 10. The field facet mirror 20 is arranged tilted relative to the object plane 6. The first facet mirror 20 is arranged tilted relative to an arrangement plane defined by the deflecting mirror 19.

[0151] The first faceted mirror 20 is arranged at an angle to an arrangement plane defined by the second faceted mirror 22.

[0152] Figure 2 schematically shows in meridional section another projection exposure system 101 for DUV projection lithography, in which the invention can also be applied.

[0153] The construction of the projection exposure system 101 and the principle of the illustration are comparable to the construction and procedure described in Figure 1. Same construction-

[0154] - 22 -

[0155] ZEISS Classification: Secret parts are designated with a reference numeral increased by 100 compared to Figure 1; the reference numerals in Figure 2 therefore begin with 101.

[0156] In contrast to an EUV projection exposure system 1 as described in Figure 1, due to the longer wavelength of the DUV radiation 116 used as useful light in the range of 100 nm to 300 nm, in particular 193 nm, refractive, diffractive and / or reflective optical elements 117, such as lenses, mirrors, prisms, end plates and the like, can be used in the DUV projection exposure system 101 for imaging or illumination.The projection exposure system 101 essentially comprises a lighting system 102, a reticule holder 108 for receiving and precisely positioning a reticule 107 provided with a structure, by which the subsequent structures on a wafer 113 are determined, a wafer holder 114 for holding, moving and precisely positioning this wafer 113 and a projection lens 110, with several optical elements 117, which are held in a lens housing 119 of the projection lens 110 via mounts 118.

[0157] The illumination system 102 provides DUV radiation 116 required for imaging the reticulum 107 on the wafer 113. A laser, a plasma source, or the like can be used as the source for this radiation 116. In the illumination system 102, the radiation 116 is shaped by optical elements such that, upon striking the reticulum 107, the DUV radiation 116 exhibits the desired properties with respect to diameter, polarization, wavefront shape, and the like.

[0158] The construction of the following projection optics 101 with the lens housing 119 differs in principle from the construction described in Figure 1, except for the additional use of refractive optical elements 117 such as lenses, prisms, end plates, and is therefore not described further.

[0159] Figure 3 shows a schematic representation of a projection exposure system 1 known from the prior art, as explained in Figure 1. The EUV projection exposure system 1 shown in Figure 3 comprises a machine bed.

[0160] - 23 -

[0161] ZEISS Classification: Secret 30 and a base frame 31, which is connected to the base frame 31 by a decoupling device 49 to prevent the transmission of mechanical vibrations from the machine bed 30 to the base frame 31. For the sake of simplicity, all decoupling devices 49 listed below, which have no specific significance for the invention, will be designated by reference numeral 49, whereas relevant decoupling devices will each receive a separate reference numeral.

[0162] The base frame 31 is connected via a further decoupling 49 to an intermediate frame 32, on which the projection optics 10 and a reference frame 34 are arranged. The projection optics 10 comprise a module frame 33 for receiving mirror modules 35, the module frame 33 and the reference frame 34 each being connected to the intermediate frame 32 via a decoupling 49. The decoupling 49s thus minimize the transmission of mechanical vibrations to the mirrors arranged on the mirror modules 35.1, 35.2, 35.3, 35.4, 35.5, 35.6 (not specifically labeled in the figure). It is well known to those skilled in the art that the decoupling 49s are not identical, but are each designed to meet the specific requirements placed upon them. The mirror modules 35.1, 35.2, 35.3, 35.4, 35.5, 35.6 are connected to the module frame 33 via connections 36. The mirror modules 35.1, 35.2, 35.3, 35.4, 35.5, 35.6 further include sensors 38 which detect the position of the mirrors relative to the reference frame 34, whereby the position of the individual mirrors relative to each other and to other components of the projection exposure system 1, such as the reticule 7 and the wafer 13 (both not shown) explained in Figure 1, can be controlled via a control system not shown.

[0163] In the example shown, the mirror module 35.3 is connected via a line 47 to a control unit 46 for positioning the mirrors. The line 47 has a decoupling loop 44 between the base frame 31 and the intermediate frame 32, between the intermediate frame and the module frame 33, and between the module frame and the mirror module 35.3. This decoupling loop serves to minimize the transmission of mechanical vibrations to the mirror modules 35.1, 35.2, 35.3, 35.4, 35.5, and 35.6.

[0164] - 24 -

[0165] ZEISS Classification: Secret The mirror module 35.3 further includes, by way of example, fluid lines 39 for thermalizing the mirror with a fluid 40, such as pure water. The fluid 40 is supplied from a first area 41.1 of a water cabinet 41 for the provision and conditioning of the fluid 40, which is connected to the base frame 31 and the machine bed 30 via decoupling devices 49, via a supply line 42 to the fluid line 39 of the mirror arranged on the mirror module 35.3 and via a discharge line 43 back into a second area 41.2 of the water cabinet 41, the two areas 41.1, 41.2 being connected to each other via a connecting line 45. The supply line 42 and the discharge line 43, as well as the line 47, point between the base frame 31 and the intermediate frame 32, this and the module frame 33, and between this and the mirror module 35.3 each includes a decoupling loop 44, which serves to minimize the transmission of mechanical vibrations to the mirror modules 35.1, 35.2, 35.3, 35.4, 35.5, 35.6. To illustrate the excitation path 48 of the acoustic vibrations from the water cabinet 41 to the mirrors, this is shown as a dashed line in Figure 3, where the points represent positions at which acoustic vibrations can be generated by the transmission of mechanical vibrations to the fluid 40. The supply line 42 and the return line 43 also include both line dampers 50 for damping the mechanical vibrations transmitted via the lines 42, 43, and fluid dampers 60 for damping acoustic vibrations (WLA) transmitted via the fluid 40.These are arranged at different points along the lines 42, 43 due to space constraints, which means that even after the dampers 50, 60 there can be an interaction of the mechanical or acoustic vibrations transmitted via the lines 42, 43 and the fluid 40.

[0166] Figure 4 shows a line assembly 70 according to the invention, which can be used in a fluid line 39, 42, 43 as described in Figure 3. The line assembly 70 is part of a fluid line 71 and includes a damping element designed as a damping section 72. The damping section 72 is connected at both ends to a line connection 73.1, 73.2 via a connecting adapter 74.1, 74.2, the connection being made by welding or clamping.

[0167] - 25 -

[0168] ZEISS Classification: Secret or any other suitable connection technology or a combination thereof. The connection adapter 74.1, 74.2 and the cable connector 73.1, 73.2 are shown as a single piece in the embodiment shown in Figure 4, although two-piece or multi-piece embodiments are also conceivable.

[0169] The damping section 72 comprises an elastic fluid line section of the fluid line 71 designed as a viscoelastic hose 76. In the embodiment shown in Figure 4, the viscoelastic hose 76 is surrounded by a sheath of the damping section 72 designed as a flexible corrugated hose 75. Alternatively, the sheath can also be designed as a tube 78 with a constant diameter, as shown by the dashed line in Figure 4, wherein the tube 78 is comparatively rigid in contrast to the corrugated hose 75. A combination of a corrugated hose 75 with a tube 78 is also conceivable. The corrugated hose 75, the viscoelastic hose 76, and the connecting adapters 74.1, 74.2 enclose a sealed gas space 77. The fluid 79 of the fluid line 71 flows through the viscoelastic hose 76, with the connecting adapters 74.1, 74.22. Ensure that no fluid 79 enters the formed gas space 77 of the damping section 72 or the surrounding area of ​​the damping section 72.

[0170] Due to its radially elastic properties (i.e., perpendicular to the flow direction), the damping section 72 can also be used to compensate for tolerances between components connected by the pipe assembly 70 or between other interfaces of the fluid piping system connected to the pipe assembly 70. The flow direction is shown as an arrow in Figure 4.

[0171] According to the invention, the line assembly 70 comprises devices 80.1, 80.2 for filling the gas space 77 with a gas, wherein, in the embodiment shown in Figure 4, one device 80.1, 80.2 is arranged at each end of the line assembly 70. The devices 80.1, 80.2 each have a passage 81.1, 81.2, which, in the illustrated embodiment, extend through the line connection 73.1 and the connecting adapter 74.1 or through the connecting adapter 74.2, respectively, and each have a connection 82.1, 82.2, which are arranged on the line connection 73.1 or the connecting adapter 74.2, respectively.

[0172] - 26 -

[0173] ZEISS Classification: Secret. Connections 82.1, 82.2 are used to connect the device 80.1, 80.2 to a gas supply device (not shown). The connection can be made directly or via a connecting element, such as a hose. Depending on the embodiment of the invention, the connection can be temporary or permanent. The gas supply device can not only fill the gas chamber 77 with a specific gas, which will be explained further below, but also set a predetermined pressure in the gas chamber 77. According to the invention, the pressure in the gas chamber 77 can be set such that, during operation of the projection exposure system 1 shown in Figure 1, the pressure in the gas chamber corresponds to the nominal operating line pressure, hereinafter also simply referred to as the operating line pressure, in the fluid line 71.This has the advantage that the viscoelastic hose 76 is not permanently stressed by the operating line pressure and thus not elastically deformed, which reduces or even completely prevents creep of the viscoelastic material of the hose 76 caused by the static load over time, i.e. a plastic deformation of the hose 76.

[0174] Alternatively, the routing 81.1, 81.2 of the devices 80.1, 80.2 can also extend, at least partially, directly through the outer casing 75 of the conduit assembly 70. This also applies to all embodiments described in the further figures.

[0175] The nominal operating line pressure is the fluid pressure generated by a water cabinet 41 (Figure 3) used to supply water to the fluid lines 71, excluding the acoustic disturbances described above. This pressure is predetermined based on the required thermal performance, the geometry of the fluid lines in the fluid line system, and other parameters. The line assembly 70 is therefore already designed with a corresponding pressure in the gas space 77 during assembly. Depending on the applied pressure, the substance used in the gas space 77 (which can be a fluid, gas, or foam), and the permeability of the material used for the viscoelastic hose 76, the pressure in the gas space 77 can be adjusted to differ from the operating line pressure in the fluid 79 by up to 100%, preferably up to 50%, and particularly preferably up to 25%. A slight differential pressure between

[0176] - 27 -

[0177] ZEISS Classification: Secret. With regard to the gas space 77 and fluid line 71, it can be ensured that the mean differential pressure over the predetermined service life of the line assembly 70, for example, 10 years, is zero or nearly zero over time, taking into account the exchange of fluid 79 and / or gas between the fluid line 71 and the gas space 77 caused by permeability. Thus, in one embodiment, the pressure in the gas space 77 at assembly may be 10% below the nominal operating line pressure of the fluid line 71. Due to permeation of the fluid 79, typically high-purity water, into the gas space 77, the pressure in the gas space 77 may increase over the service life due to the reduction in volume caused by the water and may be 10% above the nominal operating line pressure after 10 years. Assuming constant permeation over time, the mean differential pressure over time is zero.In the event of permeation of the gas into the viscoelastic hose 76, the pressure in the gas space 77 decreases over time and the initial pressure during assembly is then set above the nominal operating line pressure.

[0178] The gas space 77 can be filled with a substance designed as a compressible fluid (gas), which may comprise one of the following fluids:

[0179] Tetrafluoromethane (CF4), alkanes (methane, ethane, propane, butane, isobutane), noble gases (helium, neon, argon, krypton, xenon) or fluorinated gases, such as SF6, CF4 C5-FN, C4-FN, as well as all fluorinated refrigerants. These gases are characterized by their comparatively large molecules, which reduces permeation through the viscoelastic hose 76 and advantageously reduces pressure loss in the gas space 77 over time.

[0180] Alternatively, gas space 77 can also be filled with dry air, extremely clean dry air (XCDA), nitrogen, oxygen or carbon dioxide, these gases having a higher permeation.

[0181] Furthermore, the gas space 77 may at least partially contain a compressible foam, the foam being one of the following materials:

[0182] - 28 -

[0183] ZEISS Classification: Secret Polyurethane (PUR / Pll) - flexible foam, acrylonitrile butadiene rubber (NBR), fluororubber (FKM), perfluororubber (FFKM), polyethylene (PE), silicone foam, polystyrene foams (such as PS-E, XPS), polyphenylene ether (PP-E) and polyvinyl chloride (PVC-E), sponge rubber or cellular rubber. Other thermoplastic foams and elastomer foams are also conceivable. A compressible foam has the advantage that the material used for the foam can have a comparatively low permeation coefficient compared to the viscoelastic material of the viscoelastic hose 76, which further slows down the permeation of the gas from the gas space 77 into the fluid line 71. The gas in the foam can correspond to one of the gases described above.

[0184] Based on the permeability of the viscoelastic hose 76, the gas used and the operating line pressure, an equilibrium can at least theoretically be established over time, i.e. the pressure reduction in the gas space 77 by permeation of the gas into the viscoelastic hose 76 is balanced by the pressure increase in the gas space 77 by permeation of the water into the gas space, without the entire gas space 77 being filled with water 79.

[0185] The devices 80.1 and 80.2 can be detachably or permanently closed, as explained in the following figures, and the sealing elements used for closure can be force-fit, form-fit, and / or material-fitted to the device. Furthermore, as explained above, some of the described devices for active, semi-active, or manual control of the pressure in the gas space 77 during operation can be connected to the gas supply device, whereby the connection can also be either temporary or permanent.

[0186] Figure 5a shows a first embodiment of a device 90 for filling the gas space 77 with a gas. The device 90 has a sealing element designed as a sealing screw 93, which is threaded 96 in the direction of the gas space 77 perpendicular to a filling direction shown by an arrow in Figure 5a and inserted into a passage 91 through the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2 described in Figure 4.

[0187] - 29 -

[0188] ZEISS Classification: Secret. On the side of the sealing screw 93 facing the passage 91, a seal designed as a sealing washer 94, which can alternatively also be designed as a gasket, is arranged on the end face of the sealing screw 93. Upon contact with the sealing surface 95 formed in the passage 91, which bends at a right angle towards the gas chamber 77, the sealing washer 94 causes a gas-tight seal of the gas chamber 77.

[0189] The device 90 further has a connection 92 for connection to a gas supply device of the device 90 (not shown), to which the gas space 77 can be temporarily or permanently connected.

[0190] Figure 5b shows a further embodiment of a device 120 for filling the gas chamber 77 with a gas. The device 120 has a sealing element designed as a sealing screw 123, which can be screwed into a passage 121 leading through the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2 described in Figure 4 via a thread 126 in the direction of the gas chamber 77 perpendicular to a filling direction shown by an arrow in Figure 5b. A seal designed as an O-ring 124.1 is arranged on the circumference of the sealing screw 123 on the side facing the passage 121. Alternatively, a so-called double O-ring seal can be formed by means of a second O-ring 124.2, shown with dashed lines in Figure 5b, in which two O-rings 124.1, 124.2 are arranged in series one behind the other on the sealing screw 123. The O-rings 124.1, 124.2, upon contact with the sealing surface 125 formed in the inner diameter of the section of the passage 121 pointing towards the gas space 77 in the passage 121 which bends at a right angle towards the gas space 77, cause a gas-tight closure of the gas space 77.

[0191] The device 120 further has a connection 122 for connection with a gas supply device of the device 120 (not shown), with which the gas space 77 can be temporarily or permanently connected.

[0192] Figure 5c shows a further embodiment of a device 130 for filling the gas space 77 with a gas via a feedthrough 131. The device 130 has a sealing element designed as a sealing screw 133, which is connected via a Ge-

[0193] - 30 -

[0194] ZEISS Classification: Secret. The winding 136 can be screwed into the passage 131 leading through the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2 shown in Figure 4, with the sealing screw 133 being screwed in in the direction of the filling direction of the gas chamber 77 shown by an arrow in Figure 5c. On the end face of the sealing screw 133 facing the passage 131, a seal designed as a sealing washer 134, which can alternatively also be designed as a gasket, is arranged. The sealing disc 134, upon contact with a sealing surface 135 formed on a reduction 137 of the passage 131, causes a gas-tight closure of the gas space 77. In Figure 5c, the position of the sealing screw 133 during filling of the gas space 77 is shown in solid lines, and the closed position after filling and pressure adjustment in the gas space 77 is shown in dashed lines.After filling and adjusting the predefined pressure in the gas chamber 77, the sealing screw 133 can optionally be sealed by a weld 138 formed on a flange 139 of the sealing screw 133, thereby ensuring virtually 100% gas tightness even over extended periods, such as 10 years. Alternatively, bonding can achieve the same effect instead of welding.

[0195] The device 130 further has a connection 132 for connection with a gas supply device of the device 130 (not shown), with which the gas space 77 can be temporarily or permanently connected.

[0196] Figure 6a shows a further embodiment of a device 140 for filling the gas space 77 with a gas via a feedthrough 141. The device 140 has a sealing element designed as a sealing pressure pin 143, which, in the embodiment shown in Figure 6a, is pressed into the feedthrough 141 perpendicular to the feedthrough used for filling through the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2 described in Figure 4. In the embodiment shown, the sealing pressure pin 143 is sealed by a seal designed as a fit 145. Alternatively, sufficient tightness can also be achieved by suitable radially arranged seals, such as one or more metallic and / or O-ring seals.

[0197] - 31 -

[0198] ZEISS Classification: Secret. Optionally, after filling and adjusting the predefined pressure in the gas chamber 77, the sealing pressure pin 143 can be closed by a closure 149. This closure can be screwed or crimped, and is designed to be releasable. Alternatively, the closure can also be designed to be non-releasable, i.e., fixed, for example, by a weld or adhesive bond, as shown in other embodiments.

[0199] The device 140 further has a connection 142 for connection with a gas supply device of the device 140 (not shown), with which the gas space 77 can be temporarily or permanently connected.

[0200] Figure 6b shows a further embodiment of the device 140 for filling the gas chamber 77 with a gas via a passage 141. In the embodiment shown in Figure 6b, the sealing element, designed as a sealing pressure pin 143, is closed after filling and setting the predetermined pressure in the gas chamber 77 by one or optionally two welds 148.1, 148.2 acting as a seal, in contrast to the embodiment shown in Figure 6a. These are formed at least at the outwardly pointing end of the sealing pressure pin 143 and can additionally be formed in the passage 141.

[0201] The device 140 further has a connection 142 for filling and adjusting the pressure in the gas space 77 to a gas supply device (not shown), with which the device 140 is expediently only temporarily connected in this embodiment.

[0202] Figure 7 shows a further embodiment of a device 150 for filling the gas space 77 with a gas via a feedthrough 151. The device 150 has a sealing element designed as a sealing screw 153, which, in the embodiment shown in Figure 7, is screwed into a thread 156 formed in the feedthrough 151 used for filling through the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2 explained in Figure 4. In the embodiment shown in Figure 7, the sealing screw 153 has a Y-shaped filling channel 157. The openings 157.1 of the filling channel 157, which are directed towards the gas space 77, reach in a

[0203] - 32 -

[0204] ZEISS Classification: Secret. In Figure 7, the gas chamber 77 is shown in the open position with solid lines. In the closed position, shown with dashed lines, the openings 157.1 are retracted into the thread 156. The passage 151 is sealed towards the gas chamber 77 by a seal 154 formed on a flange 153.1 of the sealing screw 153, which is drawn against a sealing surface 155 formed in a recess 159. Alternatively, the sealing screw 153 can also be sealed radially by a suitable seal, such as one or more metallic and / or O-ring seals with sufficient tightness.

[0205] Optionally, the thread 156 can be omitted and the sealing screw 153 can be designed as a sealing pressure pin, which, after filling and adjusting the pressure, pulls the seal 154 with the flange 153.1 against the sealing surface 155 in the recess 159 and is welded or glued in this position.

[0206] The device 150 further has a connection 152 for connection to a gas supply device of the device 150 (not shown), to which the gas space 77 can be temporarily or permanently connected.

[0207] Figure 8a shows another device 160 for filling the gas chamber 77 with a gas, comparable to the embodiment described in Figure 5a. The device 160 has a sealing element designed as a sealing plunger 163, which is pressed into a passage 161 leading through the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2 described in Figure 4, via a fit 166 in the direction of the gas chamber 77, perpendicular to a filling direction indicated by an arrow in Figure 8a. A seal designed as a sealing element 164 is arranged on the end face of the sealing plunger 163 on the side facing the passage 161. The beveled sides of the sealing body 164, when in contact with the corresponding sealing surfaces 165 formed in the passage 161 which bends at a right angle towards the gas space 77, cause a gas-tight closure of the gas space 77.

[0208] - 33 -

[0209] ZEISS Classification: Secret The device 160 further has a connection 162 for connection to a gas supply device of the device 160 (not shown), to which the gas space 77 can be temporarily or permanently connected.

[0210] Figure 8b shows a further embodiment of a device 170 for filling the gas space 77 with a gas via a passage 171. The device 170 has a sealing element designed as a sealing plunger 173, which can be pressed against the device 170 into the passage 171 leading through the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2 described in Figure 4, whereby the sealing plunger 173 is inserted in the direction of filling the gas space 77, indicated by an arrow in Figure 8b. A seal designed as a sealing body 174 is arranged on the circumference of the side of the sealing plunger 173 facing the passage 171. Upon contact with a sealing surface 175 formed on a tapered section 177 of the passage 171, the sealing body 174 causes a gas-tight closure of the gas space 77.After filling and adjusting the pressure in the gas chamber 77 to the predetermined level, the sealing piston 173 is sealed by a weld 178 formed on a flange 179.1 of the sealing piston 173, thus ensuring virtually 100% gas tightness even over extended periods, such as 10 years. The flange 179.1 can optionally be covered with a lid 179.2.

[0211] The device 170 further has a connection 172 for connection with a gas supply device of the device 170 (not shown), with which the gas space 77 can be temporarily or permanently connected.

[0212] Figure 9a shows a further embodiment of a device 180 for filling the gas space 77 and for adjusting the pressure in the gas space 77 in a piping assembly 70 according to the invention. The device 180 has a connection 182 for connection to a gas supply device of the device 180 (not shown). The connection 182 is connected to the embodiment shown in Figure 9a only by the through-passage 181 described in Figure 4, via the connecting adapter 74.1. After filling with gas and adjusting the pressure in the gas space 77 by the gas supply device,

[0213] - 34 -

[0214] ZEISS Classification: Secret The connection 182 is deformed or compressed by a clamping device 183 and the part of the connection 182 directed away from the device 180 is separated by a separating device 184.

[0215] Figure 9b shows the same device 180 in a subsequent state, wherein the compressed connection 182 is gas-tightly sealed by a seal formed as a weld 188, which in the illustrated embodiment is produced by a laser welding device 185. The laser beam is moved in the direction of the arrow shown in Figure 9b over the clamped part of the connection 181. Alternatively, the clamped part can also be gas-tightly sealed by a weld 188 made on the circumference of the connection 181.

[0216] Figure 9c shows a comparable device 190, wherein the connection 192 is pressed together by two spaced-apart clamping devices 193.1, 193.2, and the connection 192 between the two clamping devices 193.1, 193.2 is gas-tightly sealed by a seal 198 formed as a weld seam 195 produced by resistance welding. The part of the connection 192 facing away from the device 190 can subsequently be cut off by a separating device 194, as explained in Figure 9a.

[0217] As an alternative to resistance welding 195, the weld seam 198 can also be produced by a friction welding device.

[0218] For all the devices described above, especially the sealing elements with their seals, the following applies: the sealing types, such as O-rings or sealing discs, can be double or multiple and / or combined with one another. A sealing element can therefore, for example, have a seal and an additional double O-ring seal, i.e., two O-rings arranged one behind the other.

[0219] Figure 10 shows a further device 200 for filling the gas space 77 of a piping assembly 70, wherein the device comprises a pressure chamber 201. The piping assembly 70 is mounted in the pressure chamber 201, the pressure chamber 201 having a pressure corresponding to the nominal operating line pressure.

[0220] The fluid line section 76 therefore exhibits a after assembly in the gas space 77

[0221] - 35 -

[0222] ZEISS Classification: Secret. The pressure corresponds to the nominal operating line pressure. This enables the production of a line assembly 70 without feedthroughs 81.1, 81.2 leading through the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2 shown in Figure 4. The gas space 77 is sealed gas-tight from the environment by a weld seam 208, acting as a sealing element, between the corrugated hose 75 or the pipe 78 and the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2, and by seals 204, also acting as sealing elements, arranged between the line connections 73.1, 73.2 and / or the connecting adapters 74.1, 74.2 and the viscoelastic hose 76.

[0223] Optionally, the fluid line section 76 can also be connected to the environment of the pressure chamber 201, or the line connections 73.1 , 73.2 can penetrate the walls of the pressure chamber 201.

[0224] Alternatively, instead of the sealing elements described in the figures, the feedthroughs can also be closed with a sealing element or connection known from the prior art, such as a conventional valve or check valve. Furthermore, press-fit clamp connections, which achieve a high radial tightness by screwing a nut onto two rings arranged one behind the other and sliding one ring onto the other, are also conceivable for ensuring a tight seal between the device and the connection to the gas supply system.

[0225] Alternatively, the nut of the press clamping device can be designed, for example, as a cover or cap nut, so that the connection can be closed by the cover / cap after filling and applying the previously determined pressure in the gas space 77.

[0226] Figure 11 shows a variant of the invention in which the viscoelastic hose 76 itself can be used for temporary sealing between a feedthrough 210 and the gas space 77. The feedthrough 210 is designed such that it opens onto the inside of the connecting adapter 74.3 in an area which is covered by the viscoelastic hose 76, but which is visco-

[0227] - 36 -

[0228] ZEISS Classification: Secret. However, the elastic hose 76 can, under appropriate conditions or when the feedthrough 210 is pressurized from the outside inwards, i.e., towards the interior of the fluid line 71, so that a gap 86 opens between an inner surface of the connecting adapter 74.3 and the outer surface of the elastic hose 76, through which the gas space 77 becomes accessible for adjusting the pressure therein. The gap 86 can be created, for example, by applying external pressure to the feedthrough 210 sufficient to force the viscoelastic hose 76 out of the inner opening of the feedthrough 210. This pressure depends essentially on the pressure in the fluid line 71 and the pressure in the gas space 77. The direction of gas flow is illustrated in the figure by arrows that are not specifically labeled in the figure.

[0229] In other words, in this embodiment of the invention, the viscoelastic hose 76 fulfills the function of a temporary seal.

[0230] Figure 12 shows a variant in which the viscoelastic hose 76 is lifted from the inside of the connecting adapter 74.3 by means of a capillary 209 or an opening pin (Fig. 13). This enables improved gas exchange in the gas chamber 77. Firstly, it allows the gas in the gas chamber 77 to be exchanged through the same feedthrough 210. In this case, fresh gas would typically be introduced into the gas chamber 77 through the capillary 209, gradually displacing the stale gas already present in the gas chamber 77. The endpoint of the filling process can then be determined by measuring the concentration of the outgoing gas. The gas flow in the capillary 209 and the feedthrough 210 is again illustrated by the arrows in the figure, which are not specifically labeled.

[0231] One possibility for accelerating gas exchange is shown in Figure 13. In the embodiment of the invention shown in Figure 13, two feedthroughs 210 are provided at opposite ends of the gas space 77. In the example shown, the feedthroughs 210 are depicted at the same azimuthal position for illustrative purposes. It is, of course, also conceivable to arrange the feedthroughs 210 at different azimuthal positions or

[0232] - 37 -

[0233] ZEISS Classification: Secret. More than one feedthrough 210 is provided on each side. Similar to Figure 12, the viscoelastic hose 76 is lifted from the inside of the connection adapter 74.3 on the left side. Fresh gas is supplied through the feedthrough 210 in the connection adapter 74.4 on the right side by applying an overpressure, which displaces the old gas from the gas space 77 through the left feedthrough 210. In this way, the gas space 77 can be effectively purged, thus accelerating the gas exchange. The direction of gas flow is also illustrated in this figure by arrows that are not specifically labeled in the figure. To lift the viscoelastic hose...

[0234] In this case, a simple pin 220, as shown, is sufficient for connection adapter 74.3. In principle, it is also conceivable that the viscoelastic hose 76 lifts off from the opening of the left feedthrough 210 solely due to the overpressure generated in the gas chamber 77; in this case, pin 220 could be omitted.

[0235] To the person skilled in the art, the embodiments described above represent only a selection of the possible combinations of bushings, sealing elements, and gaskets. In other words, the bushings, sealing elements, and gaskets shown in the embodiments described above can also be used in virtually any other combination.

[0236] Figure 14 shows a possible method for adjusting the pressure in a gas space.

[0237] 77 of a previously described line assembly 70.

[0238] In a first process step 211, the nominal operating line pressure is determined.

[0239] In a second process step 212, the corresponding pressure in the gas space 77 is determined on the basis of the maximum permissible expansion or contraction of the fluid line section 76.

[0240] In a third process step 213, the determined pressure in the gas space 77 is set.

[0241] - 38 -

[0242] ZEISS Classification: Secret Reference List

[0243] 1 projection monitoring system

[0244] 2 Lighting system

[0245] 3. Radiation source

[0246] 4 Lighting optics

[0247] 5 object field

[0248] 6 Object level

[0249] 7 reticles

[0250] 8 label holders

[0251] 9 Reticle displacement drive

[0252] 10 Projection optics

[0253] 11 Image field

[0254] 12 Image plane

[0255] 13 wafers

[0256] 14 wafer holders

[0257] 15 wafer transfer drive

[0258] 16 EUV radiation

[0259] 17 Collector

[0260] 18 Intermediate focus plane

[0261] 19 deflecting mirrors

[0262] 20 faceted mirrors

[0263] 21 facets

[0264] 22 faceted mirrors

[0265] 23 facets

[0266] 30 machine bed

[0267] 31 Basic frame

[0268] 32 intermediate frames

[0269] 33 module frames

[0270] 34 Reference framework

[0271] - 39 -

[0272] ZEISS Classification: Secret mirror module

[0273] Mirror connection

[0274] sensor

[0275] Fluid line

[0276] Fluid, 41.1, 41.2 Water Cabinet

[0277] supply line

[0278] Derivation

[0279] Decoupling loop fluid line

[0280] Connecting line to fluid reservoir

[0281] control unit

[0282] Line

[0283] Decoupling in general

[0284] Line damper

[0285] Fluid damper

[0286] Cable assembly

[0287] Fluid line

[0288] Attenuation section (damping element).1 ,73.2 Line connections .1 ,74.2,74.3,74.4 Connection adapter

[0289] Corrugated hose

[0290] Viscoelastic hose (fluid line section)

[0291] Gas space

[0292] Pipe

[0293] Fluid .1 ,80.2 Device for adjusting the pressure in the gas space.1 ,81.2 Feedthrough .1 82.2 Connection of gas supply device

[0294] Device for adjusting the pressure in the gas space Procedure

[0295] Connection for gas supply device

[0296] ZEISS Classification: Secret Sealing Screw

[0297] Sealing washer / ring

[0298] Sealing surface

[0299] thread

[0300] Projection exposure system

[0301] Lighting system

[0302] Reticles

[0303] Label holder

[0304] Projection optics

[0305] Wafer

[0306] Wafer holder

[0307] DUV radiation optical element

[0308] Versions

[0309] lens housing

[0310] Device for adjusting the pressure in the gas space

[0311] implementation

[0312] Connection for gas supply device

[0313] Sealing pin (optional sealing screw)

[0314] O-rings

[0315] Sealing surface

[0316] thread

[0317] Device for adjusting the pressure in the gas space

[0318] implementation

[0319] Connection for gas supply device

[0320] Sealing screw

[0321] Sealing washer / ring

[0322] Sealing surface

[0323] thread

[0324] Tapering to create sealing surfaces

[0325] weld

[0326] - 41 -

[0327] ZEISS Classification: Secret Flange

[0328] Device for adjusting the pressure in the gas space

[0329] implementation

[0330] Connection for gas supply device

[0331] Sealing pressure pin

[0332] Fit .1 ,148.2 weld

[0333] Closure

[0334] Device for adjusting the pressure in the gas space

[0335] implementation

[0336] Gas supply device connection, 153.1 Sealing screw; Flange sealing screw (optional sealing screw)

[0337] Sealing washer / ring

[0338] Sealing surface

[0339] Thread ,157.1 Filling channel; Filling channel opening

[0340] weld

[0341] recess

[0342] Device for adjusting the pressure in the gas space

[0343] implementation

[0344] Connection for gas supply device

[0345] Sealing stamp

[0346] Sealing body

[0347] Sealing surface

[0348] Fit

[0349] Device for adjusting the pressure in the gas space

[0350] implementation

[0351] Connection for gas supply device

[0352] Sealing stamp

[0353] Sealing body

[0354] Sealing surface

[0355] - 42 -

[0356] ZEISS Classification: Secret 178 weld

[0357] 179.1, 179.2 Flange; Cover

[0358] 180 Device for adjusting the pressure in the gas space

[0359] 181 Implementation

[0360] 182 Connection of gas supply device

[0361] 183 Clamping device

[0362] 184 Separating device

[0363] 185 Welding device

[0364] 188 weld seam

[0365] 190 Device for adjusting the pressure in the gas space

[0366] 191 Implementation

[0367] 192 Connection of gas supply device

[0368] 193.1, 193.2 Clamping device

[0369] 194 Separating device

[0370] 195 Resistance welding device

[0371] 198 weld seam

[0372] 200 Device for adjusting the pressure in the gas space

[0373] 201 pressure housings

[0374] 204 Seal

[0375] 208 weld seam

[0376] 209 capillaries

[0377] 210 Implementation

[0378] 220 pen

[0379] 211 Procedure step 1

[0380] 212 Procedure Step 2

[0381] 213 Procedure Step 3

[0382] M1-M6 mirrors

[0383] ZEISS Classification: Secret

Claims

Patent claims 1. Line assembly (70) for a system (1, 101) for semiconductor technology, comprising at least one elastic fluid line section (76) for guiding a fluid (40, 79) with a nominal operating line pressure and a shell (75, 78) surrounding the elastic fluid line section (76), wherein the shell (75, 78) and the elastic fluid line section (76) are connected to each other via at least one connection adapter (74.1, 74.2) and / or at least one line connection (73.1, 73.2) of the line assembly (70) such that the shell (75, 78), the elastic fluid line section (76) and the at least one connection adapter (74.1, 74.2) and / or the at least one line connection (73.1, 73.2) of the line assembly (70) are connected to each other such that the shell (75, 78), the elastic fluid line section (76) and the at least one connection adapter (74.1, 74.2) and / or the at least one line connection (73.1, 73.1) are connected to each other.2) enclose a pressurized gas space (77), characterized in that the pressure in the gas space (77) is such that the elastic fluid line section (76) has a maximum expansion or contraction of less than 60%, preferably less than 30%, particularly preferably less than 15% during operation.

2. Conduit assembly (70) according to claim 1 , characterized in that the elastic fluid conduit section (76) comprises a viscoelastic material.

3. Conduit assembly (70) according to one of claims 1 or 2, characterized in that at least one device (80.1 ,80.2,90, 120, 130, 140, 150, 160, 170, 180, 190, 200) is provided for filling the gas space (77) with a substance or mixture of substances and for adjusting the pressure in the gas space (77).

4. Conduit assembly (70) according to claim 3, characterized in that the material has a permeability across the viscoelastic material of the fluid conduit section that is 25 times smaller, preferably 50 times smaller and particularly preferably 100 times smaller than that of air. - 44 - ZEISS Classification: Secret (76) into the fluid (40,79).

5. Conduit assembly (70) according to one of claims 3 or 4, characterized in that the material is at least partially designed as a compressible fluid, wherein the fluid comprises one of the following materials: Tetrafluoromethane (CF4), alkanes (methane, ethane, propane, butane, isobutane), noble gases (helium, neon, argon, krypton, xenon) or fluorinated gases, such as SF6, CF4 C5-FN, C4-FN, and all fluorinated refrigerants.

6. Conduit assembly (70) according to one of the preceding claims, characterized in that the gas space (77) has at least partially a compressible foam, wherein the foam comprises one of the following materials: polyurethane (PUR / PU) - soft foam, acrylonitrile butadiene rubber (NBR), fluororubber (FKM), perfluororubber (FFKM), polyethylene (PE), silicone foam, polystyrene foams (such as PS-E, XPS), polyphenylene ether (PP-E) and polyvinyl chloride (PVC-E), sponge rubber or sponge rubber.

7. Conduit assembly (70) according to one of claims 3 to 6, characterized in that the device (80.1 ,80.2,90,120,130,140,150,160,170,180,190) has at least one passage (81.1 ,81.2,91 ,121 ,131 ,141 ,151 ,161 ,171 ,181 ,191 ) into the gas space (77).

8. Conduit assembly (70) according to one of claims 3 to 7, characterized in that the device (80.1 ,80.2,90,120,130,140,150,160,170,180,190) has at least one connection for connection to a gas supply device of the device (80.1 ,80.2,90, 120, 130, 140, 150, 160, 170, 180, 190) for supplying the substance and adjusting the pressure in the gas space (77).

9. Pipe assembly (70) according to one of claims 3 to 6, characterized in that the device (200) has a pressure chamber for mounting the pipe assembly (70). - 45 - ZEISS Classification: Secret 10. Conduit assembly (70) according to one of claims 3 to 8, characterized in that the device (80.1 ,80.2,90,120,130,140,150,160,170,180,190) has a sealing element (93,123,133,143,153,163,173,188,198,).

11. Pipe assembly (70) according to claim 10, characterized in that the sealing element is designed as a sealing screw (93, 123, 133, 153), or sealing plunger (153, 163, 173) or sealing pressure pin (143) or weld seam (188, 198).

12. Conduit assembly (70) according to one of claims 10 or 11, characterized in that the sealing element (93, 123, 133, 143, 153, 163, 173, 188, 198) is inserted into the device (80.1, 80.2, 91, 121, 131, 141, 151, 161, 171, 181, 191) perpendicular to the passage (81.1, 81.2, 91, 121, 131, 141, 151, 161, 171, 181, 191) either perpendicular to the passage (81.1, 81.2, 91, 121, 131, 141, 151, 161, 171, 181, 191) as viewed from the outside. 170, 180, 190).

13. Conduit assembly (70) according to one of claims 10 to 12, characterized in that the sealing element (93, 123, 133, 143, 153, 163, 173, 188, 198) has at least one seal (94, 124, 134, 145, 154, 164, 174, 188, 198).

14. Conduit assembly (70) according to claim 13, characterized in that the seal is designed as a sealing disc (94, 134, 154) or seal (94, 134, 154) or sealing body (164, 174) or O-ring (124.1 , 124.2) or metal seal.

15. Conduit assembly (70) according to claim 13, characterized in that the seal is designed as a fit (145).

16. Conductor assembly (70) according to claim 13, characterized in that - 46 - ZEISS Classification: Secret the seal is formed as a weld (138,148.1 ,148.2, 158, 178, 188, 198) or bond.

17. Conduit assembly (70) according to one of claims 7 to 16, characterized in that at least one passage (210) is covered at its opening facing the gas space (77) by a region of the elastic fluid conduit section (76) which is designed to be liftable from the opening.

18. Conduit assembly (70) according to claim 17, characterized in that at least one through-passage (210) is formed at each of the longitudinally opposite ends of the gas space (77).

19. Conductor assembly (70) according to one of claims 17 or 18, characterized in that at least one passage (210) passes through the connecting adapter (74.3, 74.4).

20. System (1 ,101 ) for semiconductor technology comprising a conductor assembly (70) according to one of the preceding claims.

21. System (1 ,101 ) according to claim 20, characterized in that the system is designed as a projection exposure system (1 ,101 ).

22. Method for adjusting the pressure in a gas space (77) of a piping assembly (70) according to any one of claims 1 to 19, comprising the following method steps: - Determination of the nominal operating line pressure, - Determination of the corresponding pressure in the gas space (77) based on the maximum permissible expansion or contraction of the fluid line section (76), - Adjusting the determined pressure in the gas space (77).

23. Method according to claim 22, characterized in that - 47 - ZEISS Classification: Secret The gas space (77) is filled by means of a gas supply device before the pressure in the gas space (77) is set.

24. Method according to one of claims 22 or 23, characterized in that the gas space (77) is closed after the pressure has been set.

25. Method according to one of claims 22 to 24, characterized in that the gas space (77) is permanently sealed.

26. Method according to one of claims 22 to 25, characterized in that, in the case of a permanently sealed gas space (77), the pressure in the gas space (77) receives an offset over its lifetime compared to a pressure set under the assumption of a permeation-free line assembly (70), depending on the permeability of the material of the fluid line section (76) and the associated change in pressure in the gas space (77) caused by permeation of gas from the gas space (77) into the fluid line section (76) and of fluid (40, 79) from the fluid line section (76) into the gas space (77).

27. Method according to claim 26, characterized in that the offset is in a range less than 100% of the operating line pressure, preferably less than 50% of the operating line pressure, particularly preferably less than 25% of the operating line pressure.

28. Method according to one of claims 22 to 25, characterized in that the gas and the material of the fluid line section (76) are selected such that the change in pressure in the gas space (77) due to the permeation of the gas from the gas space (77) into the fluid line section (76) and the change in pressure in the gas space (77) due to the permeation of the fluid (40,79) from the fluid line section (76) into the gas space (77) balance. - 48 - ZEISS Classification: Secret 9. Method according to one of claims 22 to 24, 26 to 28, characterized in that the pressure during operation is regulated by means of the gas supply device. - 49 - ZEISS Classification: Secret

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