Photocurable composition, film, optical filter, solid-state imaging element, and image display device

Abstract

This photocurable composition contains a polymerizable monomer and a photopolymerization initiator. The polymerizable monomer contains a compound represented by formula (1). Further provided are: a film that uses the aforementioned photocurable composition; an optical filter; a solid-state imaging element; and an image display device.

Description

Photocurable composition, film, optical filter, solid-state imaging device and image display device

[0001] The present invention relates to a photocurable composition containing a photopolymerization initiator and a polymerizable monomer, and also to a film, an optical filter, a solid-state imaging device, and an image display device using the photocurable composition.

[0002] Photocurable compositions containing a photopolymerization initiator and a polymerizable monomer can be polymerized and cured by irradiation with light, and are therefore used in optical filters, photocurable inks, photosensitive printing plates, various photoresists, and the like.

[0003] Patent Document 1 discloses that a photocurable composition containing a photopolymerization initiator and a polymerizable monomer is used to form a pattern by photolithography to form pixels.

[0004] Japanese Patent Application Laid-Open No. 2022-063556

[0005] There is a demand for further improvement in the sensitivity to exposure light of photocurable compositions containing a photopolymerization initiator and a polymerizable monomer.

[0006] According to the investigations of the present inventors, it has been found that there is room for further improvement in these properties of the photocurable composition disclosed in Patent Document 1.

[0007] Therefore, an object of the present invention is to provide a photocurable composition having excellent sensitivity. Another object of the present invention is to provide a film, an optical filter, a solid-state imaging device, and an image display device using the photocurable composition.

[0008] The present invention provides the following:

[0009] <1> A photocurable composition containing a polymerizable monomer and a photopolymerization initiator, wherein the polymerizable monomer contains a compound represented by formula (1); In formula (1), n1 and n2 each independently represent 1 or 2, n1+n2 is 3, m represents an integer of 1 to 5, and A １ represents a group represented by formula (A-1), and L １ represents an (m+1)-valent linking group; Y１ represents —O— or —NH—; １ represents a hydrocarbon group which may have a substituent, and the substituent is a group constituted of at least one element selected from the group consisting of a hydrogen atom, a carbon atom, a nitrogen atom, an oxygen atom, a sulfur atom and a halogen atom, and R １ and L １ may be bonded, R ２ represents a hydrogen atom or a substituent, and when n1 is 2, there are a plurality of R １ may be the same or different, R １ When n2 is 2, a plurality of A １ , L １ , Y １ , R ２ and m may be the same or different, and when m is 2 or more, a plurality of A １ may be the same or different; In formula (A-1), R ａ１ represents a hydrogen atom or a substituent, and Y ａ１ represents —O— or —NH—, and * represents a bond. <2> R in the above formula (1) １ <3> The photocurable composition according to <1>, wherein R in the above formula (1) is an unsubstituted alkyl group having 8 or more carbon atoms. １ <4> The photocurable composition according to <1>, wherein L in the above formula (1) has a ClogP value of 3 to 12. １The photocurable composition according to <1> or <2>, wherein n1 represents an alkyleneoxy group. <5> The photocurable composition according to any one of <1> to <4>, wherein the compound represented by formula (1) contains 3 to 10 groups represented by formula (A-1). <6> The photocurable composition according to any one of <1> to <5>, wherein the compound represented by formula (1) has a pKaH of 7.5 or higher. <7> The photocurable composition according to any one of <1> to <6>, wherein n1 is 1 and n2 is 2 in formula (1). <8> The photocurable composition according to any one of <1> to <6>, wherein n1 is 1, n2 is 2, and m is 2 or 3 in formula (1), or wherein n1 is 2, n2 is 1, and m is 3 or 4 in formula (1). <9> The photocurable composition according to any one of <1> to <8>, further comprising a colorant. <10> The photocurable composition according to any one of <1> to <9>, wherein the total content of the polymerizable monomer and the photopolymerization initiator in the total solid content of the photocurable composition is 20 mass% or less. <11> A film obtained using the photocurable composition according to any one of <1> to <10>. <12> An optical filter having the film according to <11>. <13> A solid-state imaging device having the film according to <11>. <14> An image display device having the film according to <11>.

[0010] According to the present invention, a photocurable composition having excellent sensitivity can be provided. The present invention also provides a film, an optical filter, a solid-state imaging device, and an image display device using the photocurable composition.

[0011] The present invention will be described in detail below. In this specification, the term "to" is used to mean that the numerical values ​​before and after the term are included as the lower and upper limits. In the description of groups (atomic groups) in this specification, a term without specifying whether it is substituted or unsubstituted encompasses both unsubstituted groups (atomic groups) and substituted groups (atomic groups). For example, the term "alkyl group" encompasses not only unsubstituted alkyl groups (unsubstituted alkyl groups) but also substituted alkyl groups (substituted alkyl groups). In this specification, unless otherwise specified, "exposure" includes not only exposure using light but also drawing using particle beams such as electron beams and ion beams. Examples of light used for exposure include the bright line spectrum of a mercury lamp, far ultraviolet light typified by excimer lasers, extreme ultraviolet light (EUV light), X-rays, electron beams, and other actinic rays or radiation. As used herein, "(meth)acrylate" refers to either or both of acrylate and methacrylate, "(meth)acrylic" refers to either or both of acrylic and methacrylic, and "(meth)acryloyl" refers to either or both of acryloyl and methacryloyl. In the structural formulae herein, Me refers to a methyl group, Et refers to an ethyl group, Bu refers to a butyl group, and Ph refers to a phenyl group. As used herein, the weight-average molecular weight and number-average molecular weight are polystyrene-equivalent values ​​measured by GPC (gel permeation chromatography). As used herein, the term "total solids" refers to the total mass of all components of a composition excluding the solvent. As used herein, the term "pigment" refers to a coloring material that is difficult to dissolve in a solvent. As used herein, the term "process" refers not only to an independent process, but also to a process that cannot be clearly distinguished from other processes, as long as the intended effect of the process is achieved.

[0012] <Photocurable composition> The photocurable composition of the present invention is a photocurable composition containing a polymerizable monomer and a photopolymerization initiator, wherein the polymerizable monomer contains a compound represented by formula (1).

[0013] The photocurable composition of the present invention has excellent sensitivity. The reason for this effect is presumed to be as follows: In radical polymerization, polymerization is inhibited by oxygen (oxygen inhibition). Because oxygen is in a triplet state at ground state, it is highly reactive with radicals and readily reacts with radical active species to form hydroxyperoxy radicals. These hydroxyperoxy radicals have poor reactivity with polymerizable groups such as (meth)acryloyl groups, inhibiting the progress of the polymerization reaction. Because the compound represented by formula (1) contains a nitrogen atom in its molecule, it is presumed to easily abstract hydrogen to generate carbon radicals. Therefore, it is presumed that the generated hydroxyperoxy radical abstracts hydrogen from the compound represented by formula (1), thereby initiating polymerization with the newly generated carbon radical. It is also presumed that the generated carbon radical can capture oxygen and reduce the oxygen concentration. These mechanisms are presumed to enable the photocurable composition of the present invention to suppress polymerization inhibition by oxygen and exhibit high sensitivity.

[0014] The photocurable composition of the present invention has excellent sensitivity, and therefore can sufficiently promote polymerization reaction even at the bottom of the film (on the support side) upon exposure, thereby forming a film having excellent adhesion to the support.

[0015] The photocurable composition of the present invention preferably further contains a colorant. The photocurable composition containing a colorant is preferably used as a photocurable composition for an optical filter. Examples of the optical filter include a color filter, an infrared transmission filter, and an infrared cut filter, and a color filter is preferred.

[0016] The color filter may have colored pixels that transmit light of a specific wavelength. Examples of the colored pixels include red, green, blue, magenta, cyan, and yellow pixels. The colored pixels of the color filter may be formed using a photocurable composition containing a chromatic colorant.

[0017] The infrared cut filter preferably has a maximum absorption wavelength in the wavelength range of 700 to 1800 nm, more preferably in the wavelength range of 700 to 1300 nm, and even more preferably in the wavelength range of 700 to 1000 nm. The transmittance of the infrared cut filter over the entire wavelength range of 400 to 650 nm is preferably 70% or more, more preferably 80% or more, and even more preferably 90% or more. The transmittance at at least one point in the wavelength range of 700 to 1800 nm is preferably 20% or less. The ratio of the absorbance Amax at the infrared cut filter's maximum absorption wavelength to the absorbance A550 at a wavelength of 550 nm (absorbance Amax / absorbance A550) is preferably 20 to 500, more preferably 50 to 500, even more preferably 70 to 450, and particularly preferably 100 to 400. The infrared cut filter can be formed using a photocurable composition containing an infrared-absorbing colorant.

[0018] The infrared transmission filter is a filter that transmits at least a portion of infrared light. The infrared transmission filter is preferably a filter that blocks at least a portion of visible light and transmits at least a portion of infrared light. Examples of the infrared transmission filter include a filter that satisfies the spectral characteristics of a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1300 nm. The infrared transmission filter is preferably a filter that satisfies any one of the following spectral characteristics (1) to (5): (1): A filter that has a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 640 nm and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 800 to 1500 nm. (2): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 750 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 900 to 1500 nm. (3): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 830 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1000 to 1500 nm. (4): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 950 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1100 to 1500 nm. (5): A filter having a maximum transmittance of 20% or less (preferably 15% or less, more preferably 10% or less) in the wavelength range of 400 to 1050 nm, and a minimum transmittance of 70% or more (preferably 75% or more, more preferably 80% or more) in the wavelength range of 1200 to 1500 nm.

[0019] The photocurable composition of the present invention can also be used as a light-shielding film.

[0020] The solids concentration of the photocurable composition of the present invention is preferably 5 to 30% by mass. The lower limit is preferably 7.5% by mass or more, more preferably 10% by mass or more. The upper limit is preferably 25% by mass or less, more preferably 20% by mass or less, and even more preferably 15% by mass or less.

[0021] Each component used in the photocurable composition of the present invention will now be described.

[0022] <<Polymerizable Monomer>> The photocurable composition of the present invention contains a polymerizable monomer. Examples of the polymerizable monomer include a compound having an ethylenically unsaturated bond-containing group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, an allyl group, a (meth)acryloyl group, and a styrene group. The polymerizable monomer used in the present invention is preferably a radically polymerizable monomer.

[0023] (Compound Represented by Formula (1) (Specific Amine Monomer)) In the photocurable composition of the present invention, a polymerizable monomer containing a compound represented by formula (1) is used. Hereinafter, the compound represented by formula (1) is also referred to as a specific amine monomer.

[0024]

[0025] In formula (1), n1 and n2 each independently represent 1 or 2, n1+n2 is 3, m represents an integer of 1 to 5, and A １ represents a group represented by formula (A-1), and L １ represents an (m+1)-valent linking group; Y １ represents —O— or —NH—; １ represents a hydrocarbon group which may have a substituent, and the substituent is a group constituted of at least one element selected from the group consisting of a hydrogen atom, a carbon atom, a nitrogen atom, an oxygen atom, a sulfur atom and a halogen atom, and R １ and L １ may be bonded, R ２ represents a hydrogen atom or a substituent, and when n1 is 2, there are a plurality of R１ may be the same or different, R １ When n2 is 2, a plurality of A １ , L １ , Y １ , R ２ and m may be the same or different, and when m is 2 or more, a plurality of A １ may be the same or different;

[0026]

[0027] In formula (A-1), R ａ１ represents a hydrogen atom or a substituent, and Y ａ１ represents —O— or —NH—, and * represents a bond.

[0028] —Regarding n1, n2, and m— In formula (1), n1 and n2 each independently represent 1 or 2, and n1+n2 equals 3. m represents an integer of 1 to 5.

[0029] In formula (1), n1 is preferably 1 and n2 is preferably 2. In this embodiment, the presence of groups represented by formula (A-1) on both sides of the amine increases the distance between the groups represented by formula (A-1). This makes it possible to obtain a film that is suitably flexible even after polymerization, and further improves adhesion to the support.

[0030] In formula (1), m represents an integer of 1 to 5, and preferably 2 to 4.

[0031] One preferred embodiment of the combination of n1, n2, and m in formula (1) is one in which n1 is 1, n2 is 2, and m is 2 or 3. According to this embodiment, the polymerization reaction can be sufficiently carried out even at the bottom of the film, and the adhesion to the support can be further improved.

[0032] Another preferred embodiment of the combination of n1, n2, and m in formula (1) is one in which n1 is 2, n2 is 1, and m is 3 or 4. According to this embodiment, the polymerization reaction can be sufficiently carried out even at the bottom of the film, and the adhesion to the support can be further improved.

[0033] -L １ About - L １ represents an (m+1)-valent linking group. １ The m+1 valent linking group represented by the formula (I) includes an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, —O—, —S—, —CO—, —COO—, —OCO—, —SO ２ Examples thereof include -, -NH-, -NHCO-, -CONH-, -NHCONH-, -NHCOO-, -OCONH-, and groups formed by combining two or more of these groups.

[0034] The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The aliphatic hydrocarbon group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, even more preferably 1 to 10, and particularly preferably 1 to 5. The aromatic hydrocarbon group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, and even more preferably 6. The heterocyclic group is preferably a monocyclic ring or a fused ring with 2 to 4 rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12. The aliphatic hydrocarbon group, aromatic hydrocarbon group, and heterocyclic group may have a substituent. Examples of the substituent include a hydroxy group, an alkyl group, an alkoxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, a halogen atom, a cyano group, and a nitro group.

[0035] L １ Preferably, L contains an alkyleneoxy group. The alkyleneoxy group can suppress oxygen inhibition, thereby achieving even higher sensitivity. １ However, by including an alkyleneoxy group, the distance between the groups represented by formula (A-1) becomes longer, which makes it possible to obtain a film that is suitably flexible even after polymerization, and also makes it possible to further improve adhesion to the support.

[0036] The number of carbon atoms in the alkyleneoxy group is preferably 2 or more, more preferably 2 to 10, even more preferably 2 to 5, and even more preferably 2 or 3. The alkyleneoxy group is preferably linear or branched, and more preferably linear.

[0037] L １ It is also preferable that the polyalkyleneoxy group has a polyalkyleneoxy group. In this specification, the polyalkyleneoxy group refers to a group in which two or more alkyleneoxy groups are directly bonded. The alkylene groups in the multiple alkyleneoxy groups contained in the polyalkyleneoxy group may be the same or different. When the polyalkyleneoxy group contains multiple types of alkyleneoxy groups with different alkylene groups, the arrangement of the alkyleneoxy groups in the polyalkyleneoxy group may be a random arrangement, an arrangement having blocks, or an arrangement having a pattern such as alternating.

[0038] L １ preferably contains a group represented by formula (L-1).

[0039] - (L ２ ) ｓ -...(L-1)

[0040] In formula (L-1), L ２ represents an alkyleneoxy group, s represents an integer of 1 or more, and s L ２ may be the same or different.

[0041] L in formula (L-1) ２ The number of carbon atoms in the alkyleneoxy group represented by is preferably 2 or more, more preferably 2 to 10, even more preferably 2 to 5, and even more preferably 2 or 3. The alkyleneoxy group is preferably linear or branched, and more preferably linear.

[0042] In formula (L-1), s is preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 10.

[0043] L １is also preferably a group containing a ring structure. Examples of the ring structure include an aliphatic ring and an aromatic ring, preferably an aromatic ring, and more preferably an aromatic hydrocarbon ring.

[0044] L １ is also preferably a group containing an alkyleneoxy group and a ring structure.

[0045] -Y １ Regarding Y in formula (1) １ represents —O— or —NH—, and is preferably —O—.

[0046] -R １ Regarding - R in formula (1) １ represents a hydrocarbon group which may have a substituent, and the substituent is a group constituted of at least one element selected from the group consisting of a hydrogen atom, a carbon atom, a nitrogen atom, an oxygen atom, a sulfur atom and a halogen atom.

[0047] R １ Examples of the hydrocarbon group represented by include an alkyl group, an alkenyl group, an alkynyl group, and an aryl group. The number of carbon atoms in the alkyl group is preferably 1 to 30. The upper limit is preferably 25 or less, and more preferably 20 or less. The lower limit is preferably 3 or more, more preferably 5 or more, and even more preferably 8 or more. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The number of carbon atoms in the alkenyl group is preferably 2 to 30. The upper limit is preferably 25 or less, and more preferably 20 or less. The lower limit is preferably 3 or more, more preferably 5 or more, and even more preferably 8 or more. The number of carbon atoms in the alkynyl group is preferably 2 to 30. The upper limit is preferably 25 or less, and more preferably 20 or less. The lower limit is preferably 3 or more, more preferably 5 or more, and even more preferably 8 or more. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20 carbon atoms, even more preferably 6 to 12 carbon atoms, and most preferably 6 carbon atoms.

[0048] The substituents that the hydrocarbon group may have include a halogen atom, a cyano group, a nitro group, -ORt １ , -CORt １ , -COORt １ , -OCORt １ , -NRt １ Rt ２ , -NHCORt １ , -CONRt １ Rt ２ , -NHCONRt １ Rt ２ , -NHCOORt １ , -SRt １ , -SO ２ Rt １ , -SO ２ ORt １ , -NHSO ２ Rt １ or -SO ２ NRt １ Rt ２ Examples include: Rt １ and Rt ２ Rt each independently represents a hydrogen atom, an alkyl group, or an aryl group. １ and Rt ２ may be bonded to form a ring.

[0049] R in formula (1) １ The ClogP value of R is preferably 3 to 12. １ When the ClogP value of R is 3 or more, the film obtained using the photocurable composition has good resistance to a developer, and a film with excellent adhesion can be formed. １ When the ClogP value of R is 12 or less, the amount of dissolved oxygen in the specific amine monomer is high, and the sensitivity of the photocurable composition can be further increased. １ The upper limit of the ClogP value of R is preferably 11.5 or less, and more preferably 11 or less. １ The lower limit of the ClogP value of R is preferably 3.5 or more, more preferably 4 or more. １ The ClogP value of is a value calculated by replacing the bonds with hydrogen atoms. Examples of groups having a ClogP value of 3 to 12 include the groups shown below.

[0050] R １ is preferably an unsubstituted alkyl group having 8 or more carbon atoms, more preferably an unsubstituted alkyl group having 8 to 30 carbon atoms, still more preferably an unsubstituted alkyl group having 8 to 25 carbon atoms, and even more preferably an unsubstituted alkyl group having 8 to 20 carbon atoms, because this improves the resistance of the film to a developer and allows the formation of a film with better adhesion.

[0051] When n1 in formula (1) is 2, there are multiple R １ may be the same or different, R １ They may be bonded to each other to form a ring, which is preferably a 5- or 6-membered ring.

[0052] In formula (1), R １ and L １ may be bonded to each other, but it is preferable that they are not bonded to each other.

[0053] -R ２ Regarding - R in formula (1) ２ represents a hydrogen atom or a substituent. ２ The substituent represented by R in formula (1) is an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 3, and even more preferably 1. ２ is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom or a methyl group, and even more preferably a hydrogen atom.

[0054] -A １ About - A １ represents the group represented by the above formula (A-1). The group represented by formula (A-1) will be explained below.

[0055] R in formula (A-1) ａ１ represents a hydrogen atom or a substituent. ａ１ The substituent represented by R in formula (A-1) is an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 10, more preferably 1 to 3, and even more preferably 1. ａ１is preferably a hydrogen atom or an alkyl group, more preferably a hydrogen atom or a methyl group, and even more preferably a hydrogen atom.

[0056] Y in formula (A-1) ａ１ represents —O— or —NH—, and is preferably —O—.

[0057] The specific amine monomer is preferably a compound represented by formula (2).

[0058] In formula (2), n1 and n2 each independently represent 1 or 2, n1+n2 is 3, m represents an integer of 1 to 5, s represents an integer of 1 or more, and A １ represents a group represented by the above formula (A-1), and L １０ represents an (m+1)-valent linking group; １１ represents an alkyleneoxy group; １２ represents a single bond or a divalent linking group; Y １ represents —O— or —NH—; １ represents a hydrocarbon group which may have a substituent, and the substituent is a group constituted of at least one element selected from the group consisting of a hydrogen atom, a carbon atom, a nitrogen atom, an oxygen atom, a sulfur atom and a halogen atom, and R １ and L １ may be bonded, R ２ represents a hydrogen atom or a substituent, and when n1 is 2, there are a plurality of R １ may be the same or different, R １ When n2 is 2, a plurality of A １ , L １ , Y １ , R ２ and m may be the same or different, and when m is 2 or more, a plurality of A １ may be the same or different.

[0059] n1, n2, m, and A in formula (2) １ , Y １ , R １ and R２ are n1, n2, m, and A in formula (1). １ , Y １ , R １ and R ２ The same applies to the preferred range.

[0060] In formula (2), s represents an integer of 1 or more, preferably 1 to 30, more preferably 1 to 20, and even more preferably 1 to 10.

[0061] L in formula (2) １０ The m+1 valent linking group represented by the formula (I) includes an aliphatic hydrocarbon group, an aromatic hydrocarbon group, a heterocyclic group, —O—, —S—, —CO—, —COO—, —OCO—, —SO ２ -, -NH-, -NHCO-, -CONH-, -NHCONH-, -NHCOO-, -OCONH-, and groups combining two or more of these groups. １０ is preferably an aliphatic hydrocarbon group; a group in which an aliphatic hydrocarbon group and —O— are combined; a group in which an aliphatic hydrocarbon group and —COO— are combined; a group in which an aliphatic hydrocarbon group and —OCO— are combined; or a group in which an aromatic hydrocarbon group, an aliphatic hydrocarbon group, and an alkyleneoxy group are combined.

[0062] The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. The aliphatic hydrocarbon group may be linear, branched, or cyclic. The aliphatic hydrocarbon group preferably has 1 to 30 carbon atoms, more preferably 1 to 20, even more preferably 1 to 10, and particularly preferably 1 to 5. The aromatic hydrocarbon group preferably has 6 to 20 carbon atoms, more preferably 6 to 12, and even more preferably 6. The heterocyclic group is preferably a monocyclic ring or a fused ring with 2 to 4 rings. The number of heteroatoms constituting the ring of the heterocyclic group is preferably 1 to 3. The heteroatoms constituting the ring of the heterocyclic group are preferably nitrogen atoms, oxygen atoms, or sulfur atoms. The number of carbon atoms constituting the ring of the heterocyclic group is preferably 3 to 30, more preferably 3 to 18, and even more preferably 3 to 12. The aliphatic hydrocarbon group, aromatic hydrocarbon group, and heterocyclic group may have a substituent. Examples of the substituent include a hydroxy group, an alkyl group, an alkoxy group, an acyl group, an acyloxy group, an alkoxycarbonyl group, a halogen atom, a cyano group, and a nitro group.

[0063] L in formula (2) １１ The number of carbon atoms in the alkyleneoxy group represented by is preferably 2 or more, more preferably 2 to 10, even more preferably 2 to 5, and even more preferably 2 or 3. The alkyleneoxy group is preferably linear or branched, and more preferably linear.

[0064] L in formula (2) １１ The divalent linking group represented by the formula (I) includes an alkylene group, an arylene group, —O—, —S—, —CO—, —COO—, —OCO—, —SO ２ -, -NH-, -NHCO-, -CONH-, -NHCONH-, -NHCOO-, -OCONH-, and groups formed by combining two or more of these groups. １１ is preferably a single bond.

[0065] The specific amine monomer preferably contains 1 to 10 groups represented by the above formula (A-1), more preferably 2 to 10, and even more preferably 3 to 10, because this can further enhance the sensitivity of the photocurable composition. The upper limit of the number of groups represented by the above formula (A-1) contained in the specific amine monomer is preferably 9 or less, more preferably 8 or less, because this can form a film with better adhesion.

[0066] The specific amine monomer is also preferably a compound containing an aromatic ring. According to this embodiment, the sensitivity of the photocurable composition can be further increased. When the specific amine monomer is a compound containing an aromatic ring, the number of aromatic rings contained in the specific amine monomer is preferably 1 to 30. The lower limit is preferably 2 or more, and more preferably 4 or more. From the viewpoint of adhesion, the upper limit is preferably 20 or less, and more preferably 15 or less.

[0067] The pKaH of the specific amine monomer is preferably 5.5 or more, more preferably 6.5 or more, and even more preferably 7.5 or more because the effect of suppressing oxygen inhibition by the amine is high and the sensitivity of the photocurable composition can be further increased. Note that pKaH is a value representing the pKa of the conjugate acid of the base. In this specification, the pKaH value of the specific amine monomer is a value calculated in accordance with the method described in A Web Server for Small Molecule pKa Prediction Using a Graph-Convolutional Neural Network J. Chem. Inf. Model. 2021, 61, 7, 3159-3165.

[0068] The ethylenically unsaturated bond-containing group value (C=C value) of the specific amine monomer is preferably 0.5 to 11 mmol / g, because this allows the formation of a film with superior adhesion. The upper limit is preferably 10 mmol / g or less, and more preferably 9 mmol / g or less. The lower limit is preferably 1 mmol / g or more, and more preferably 2 mmol / g or more. The ethylenically unsaturated bond-containing group value of the specific amine monomer is a numerical value representing the molar amount of the ethylenically unsaturated bond-containing group per gram of solid content of the specific compound.

[0069] The amine value of the specific amine monomer is preferably 1 to 150 mgKOH / g. If the amine value is 1 mgKOH / g or more, the sensitivity of the photocurable composition can be further increased. If the amine value is 150 mgKOH / g or less, a film with better adhesion can be formed. The lower limit of the amine value of the specific amine monomer is preferably 2.5 mgKOH / g or more, and more preferably 5 mgKOH / g or more. The upper limit of the amine value of the specific amine monomer is preferably 125 mgKOH / g or less, and more preferably 100 mgKOH / g or less.

[0070] The ratio of the C═C value to the amine value of the specific amine monomer (amine value / C═C value) is preferably 0.5 to 250. When the ratio is 0.5 or more, the sensitivity of the photocurable composition can be further increased. When the ratio is 250 or less, a film with better adhesion can be formed. The lower limit of the ratio is preferably 1 or more, and more preferably 3 or more. The upper limit of the ratio is preferably 100 or less, and more preferably 50 or less.

[0071] The hydroxyl value of the specific amine monomer is preferably 75 mgKOH / g or less, more preferably 50 mgKOH / g or less, and even more preferably 30 mgKOH / g or less, because this allows the formation of a film with better adhesion.

[0072] The molecular weight of the specific amine monomer is preferably 100 to 5,000, and more preferably 200 to 3,000.

[0073] It is also preferable to use the specific amine monomer in combination with compounds having different numbers of groups represented by the above formula (A-1). One preferred embodiment is a combination of a compound having four or fewer groups represented by the above formula (A-1) and a compound having five or more groups represented by the above formula (A-1). Another preferred embodiment is a combination of a compound having three or fewer groups represented by the above formula (A-1) and a compound having five or more groups represented by the above formula (A-1). Another preferred embodiment is a combination of a compound having three or fewer groups represented by the above formula (A-1) and a compound having six or more groups represented by the above formula (A-1).

[0074] The specific amine monomer has a primary amino group (-NH ２ The specific amine monomer can be synthesized by subjecting a compound having a primary amino group (-NH-) or a secondary amino group (-NH-) (hereinafter also referred to as the raw material amine) to a Michael addition reaction with a compound having two or more groups represented by the above formula (A-1) per molecule (hereinafter also referred to as the raw material polyfunctional monomer). The specific amine monomer can also be synthesized by reacting an amino group-containing polyfunctional alcohol with a (meth)acrylic acid chloride compound or a (meth)acrylic acid isocyanate compound. The specific amine monomer can also be synthesized by dehydration condensation of an amino group-containing polyfunctional carboxylic acid with an alcohol compound having an ethylenically unsaturated bond-containing group. The specific amine monomer can also be synthesized by dehydration condensation of an amino group-containing polyfunctional alcohol with a carboxylic acid compound having an ethylenically unsaturated bond-containing group.

[0075] Specific examples of the specific amine monomer include compounds having structures represented by M1 to M57 and M101 to M256 described in the Examples below, and compounds having structures obtained by reacting a plurality of raw material polyfunctional monomers with a plurality of raw material amines, as shown below.

[0076] The specific amine monomer may contain a by-product produced during the synthesis of the specific amine monomer. That is, the photocurable composition of the present invention may contain a by-product produced during the synthesis of the specific amine monomer. Examples of the by-product include compounds having a structure obtained by reacting one raw material polyfunctional monomer with multiple raw material amines, as shown below.

[0077] (Other Polymerizable Monomers) The photocurable composition of the present invention may contain polymerizable monomers other than the above-mentioned specific amine monomers (hereinafter also referred to as other polymerizable monomers).

[0078] The molecular weight of the other polymerizable monomer is preferably 100 to 3000. The upper limit is more preferably 2000 or less, and even more preferably 1500 or less. The lower limit is more preferably 150 or more, and even more preferably 250 or more.

[0079] The other polymerizable monomer is preferably a compound containing two or more ethylenically unsaturated bond-containing groups, more preferably a compound containing 2 to 15 ethylenically unsaturated bond-containing groups, and even more preferably a compound containing 2 to 6 ethylenically unsaturated bond-containing groups. Furthermore, the other polymerizable monomer is preferably a difunctional to 15-functional (meth)acrylate compound, and more preferably a difunctional to hexafunctional (meth)acrylate compound. Specific examples of the other polymerizable monomer include the compounds described in paragraphs 0075 to 0083 of WO 2022 / 065215 and the compounds described in Taiwan Patent Application Publication No. 201832008.

[0080] Preferred examples of other polymerizable monomers include dipentaerythritol tri(meth)acrylate (commercially available product: KAYARAD D-330, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol tetra(meth)acrylate (commercially available product: KAYARAD D-320, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol penta(meth)acrylate (commercially available product: KAYARAD D-310, manufactured by Nippon Kayaku Co., Ltd.), dipentaerythritol hexa(meth)acrylate (commercially available products: KAYARAD DPHA, manufactured by Nippon Kayaku Co., Ltd., and NK Ester A-DPH-12E, manufactured by Shin-Nakamura Chemical Co., Ltd.), and compounds having a structure in which the (meth)acryloyl group is bonded via an ethylene glycol and / or propylene glycol residue (e.g., SR454, SR499, commercially available from Sartomer).Other polymerizable monomers include diglycerin EO (ethylene oxide) modified (meth)acrylate (commercially available product is M-460; manufactured by Toagosei Co., Ltd.), pentaerythritol tetraacrylate (NK Ester A-TMMT manufactured by Shin-Nakamura Chemical Co., Ltd.), 1,6-hexanediol diacrylate (KAYARAD HDDA manufactured by Nippon Kayaku Co., Ltd.), RP-1040 (manufactured by Nippon Kayaku Co., Ltd.), Aronix TO-2349 (manufactured by Toagosei Co., Ltd.), NK Oligo UA-7200 (manufactured by Shin-Nakamura Chemical Co., Ltd.), DPHA-40H (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600, and LINC-20. 2UA (manufactured by Kyoeisha Chemical Co., Ltd.), 8UH-1006, 8UH-1012 (all manufactured by Taisei Fine Chemical Co., Ltd.), Light Acrylate POB-A0 (manufactured by Kyoeisha Chemical Co., Ltd.), Aronix M-510, 520 (manufactured by Toagosei Co., Ltd., polymerizable monomers having an acidic group), Etercure 6361-100 (manufactured by External Materials, polymerizable monomers having a hyperbranched structure), EBECRYL 80 (tetrafunctional monomer containing amine, manufactured by Daicel-Olknes Co., Ltd.), EBECRYL 7100 (bifunctional monomer containing amine, manufactured by Daicel-Olknes Co., Ltd.), CN371NS (bifunctional monomer containing amine, manufactured by Arkema), HOA-MPL (2-acryloyloxyethyl-phthalic acid: manufactured by Kyoeisha Chemical Co., Ltd.), HOA-MPE (2- Acryloyloxyethyl-2-hydroxyethyl-phthalic acid: manufactured by Kyoeisha Chemical Co., Ltd.), polymerizable monomers having a dendrimer structure or hyperbranched structure described in JP-A-2023-043479, polymerizable monomers described in JP-T-2023-529984, polymerizable monomers described in WO 2023 / 190562, (meth)acrylate compounds described in JP-A-2023-173204, and the like can also be used.

[0081] As the other polymerizable monomer, a polymerizable monomer having a fluorene skeleton can also be used. The polymerizable monomer having a fluorene skeleton is preferably a bifunctional polymerizable monomer. Commercially available polymerizable monomers having a fluorene skeleton include OGSOL EA-0200 and EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd., (meth)acrylate monomers having a fluorene skeleton).

[0082] The content of the polymerizable monomer in the total solid content of the photocurable composition is preferably 1 to 20% by mass. The upper limit is preferably 15% by mass or less, more preferably 12% by mass or less. The lower limit is preferably 3% by mass or more, more preferably 5% by mass or more.

[0083] The content of the specific amine monomer in the polymerizable monomer is preferably 10% by mass or more, more preferably 20% by mass or more, even more preferably 30% by mass or more, and still more preferably 50% by mass or more.

[0084] The photocurable composition of the present invention may contain only one polymerizable monomer or two or more polymerizable monomers. When two or more polymerizable monomers are contained, the total amount thereof is preferably within the above range.

[0085] <<Photopolymerization Initiator>> The photocurable composition of the present invention contains a photopolymerization initiator. The photopolymerization initiator is preferably a photoradical polymerization initiator.

[0086] Examples of the photopolymerization initiator include halogenated hydrocarbon derivatives (for example, compounds having a triazine skeleton, compounds having an oxadiazole skeleton, etc.), acylphosphine compounds, hexaarylbiimidazole compounds, oxime compounds, organic peroxides, thio compounds, ketone compounds, aromatic onium salts, α-hydroxyketone compounds, α-aminoketone compounds, and glyoxylate compounds. The photopolymerization initiator is preferably a trihalomethyltriazine compound, a benzyl dimethyl ketal compound, an α-hydroxyketone compound, an α-aminoketone compound, an acylphosphine compound, a phosphine oxide compound, a metallocene compound, an oxime compound, a hexaarylbiimidazole compound, an onium compound, a benzothiazole compound, a benzophenone compound, an acetophenone compound, a cyclopentadiene-benzene-iron complex, a halomethyloxadiazole compound, a glyoxylate compound, or a 3-aryl-substituted coumarin compound, more preferably an oxime compound, an α-hydroxyketone compound, an α-aminoketone compound, or an acylphosphine compound, still more preferably an α-aminoketone compound or an oxime compound, and particularly preferably an oxime compound.

[0087] Examples of the photopolymerization initiator include the compounds described in paragraphs 0065 to 0111 of JP-A No. 2014-130173, the compounds described in Japanese Patent No. 6301489, and the compounds described in MATERIAL STAGE 37-60pp, vol. 19, No. peroxide-based photopolymerization initiators described in JP-A-2019-3, 2019, photopolymerization initiators described in WO 2018 / 221177, photopolymerization initiators described in WO 2018 / 110179, photopolymerization initiators described in JP-A-2019-043864, photopolymerization initiators described in JP-A-2019-044030, peroxide-based initiators described in JP-A-2019-167313, aminoacetophenone-based initiators having an oxazolidine group described in JP-A-2020-055992, Oxime-based photopolymerization initiators described in JP-A-2020-190459, polymers described in JP-A-2020-172619, compounds represented by formula 1 described in WO 2020 / 152120, compounds described in JP-A-2021-181406, photopolymerization initiators described in JP-A-2022-013379, compounds represented by formula (1) described in JP-A-2022-015747, fluorine-containing fluorene oxime ester-based photoinitiators described in JP-T-2021-507058, Chinese Patent Application Publication No. 11 Initiators described in Patent Publication No. 0764367, initiators described in JP-T-2022-518535, initiators described in WO 2021 / 175855, compounds described in Taiwan Patent Application Publication No. 202200534, compounds described in JP-A-2022-078550, compounds described in Korean Patent Publication No. 10-2017-0087330, compounds described in WO 2022 / 075452, oxime ester compounds described in Chinese Patent Application Publication No. 110066225, Compounds described in Japanese Patent Application Laid-Open No. 10-2022-0076157, compounds having a triarylamine or N-arylcarbazole skeleton described in paragraphs 0042 to 0062 of International Publication No. 2019 / 013112, oxime ester-based photopolymerization initiators described in Japanese Patent Application Laid-Open No. 7219378, photopolymerization initiators described in Korean Patent Publication No. 10-2021-0146174, photopolymerization initiators described in International Publication No. 2019 / 013112, photopolymerization initiators described in JP-A No. 2023-033731,Initiators described in JP-T-2022-515524, initiators described in JP-T-2023-517304, initiators described in Chinese Patent Application Publication No. 114149517, aminoketone compounds described in Chinese Patent Application Publication No. 115925596, compounds described in JP-A-2023-159489, compounds described in JP-A-2023-159487, compounds described in Taiwan Patent Application Publication No. 202336003, compounds described in Chinese Patent Application Publication No. 113527138, organosilicon compounds described in JP-T-2022-502526, and the like.

[0088] Specific examples of hexaarylbiimidazole compounds include 2,2',4-tris(2-chlorophenyl)-5-(3,4-dimethoxyphenyl)-4,5-diphenyl-1,1'-biimidazole.

[0089] Commercially available α-hydroxyketone compounds include Omnirad 184, Omnirad 1173, Omnirad 2959, and Omnirad 127 (all manufactured by IGM Resins B.V.), and Irgacure 184, Irgacure 1173, Irgacure 2959, and Irgacure 127 (all manufactured by BASF). Commercially available α-aminoketone compounds include Omnirad 907, Omnirad 369, Omnirad 369E, Omnirad 379EG (all manufactured by IGM Resins B.V.), Irgacure 907, Irgacure 369, Irgacure 369E, Irgacure 379EG (all manufactured by BASF), etc. Commercially available acylphosphine compounds include Omnirad 819, Omnirad TPO (all manufactured by IGM Resins B.V.), Irgacure 819, Irgacure TPO (all manufactured by BASF), etc. Commercially available glyoxylate compounds include Esacure 563 (manufactured by IGM Resins B.V.).

[0090] Examples of the oxime compound include the compounds described in paragraph 0142 of WO 2022 / 085485, the compounds described in Japanese Patent No. 5430746, the compounds described in Japanese Patent No. 5647738, the compounds represented by the general formula (1) of JP-A-2021-173858, and the compounds described in paragraphs 0022 to 0024, and the compounds represented by the general formula (1) of JP-A-2021-170089 and the compounds described in paragraphs 0117 to 0120. Specific examples of the oxime compound include 3-benzoyloxyiminobutan-2-one, 3-acetoxyiminobutan-2-one, 3-propionyloxyiminobutan-2-one, 2-acetoxyiminopentan-3-one, 2-acetoxyimino-1-phenylpropan-1-one, 2-benzoyloxyimino-1-phenylpropan-1-one, 3-(4-toluenesulfonyloxy)iminobutan-2-one, 2-ethoxycarbonyloxyimino-1-phenylpropan-1-one, 1-[4-(phenylthio)phenyl]-3-cyclohexyl-propane-1,2-dione-2-(O-acetyloxime), and the like. Commercially available products include Irgacure OXE01, Irgacure OXE02, Irgacure OXE03, Irgacure OXE04, Irgacure OXE05 (all manufactured by BASF), TR-PBG-301, TR-PBG-304, TR-PBG-305, TR-PBG-309, TR-PBG-3054, TR-PBG-3057, TR-PBG-314, TR-PBG-327, TR-PBG-345, TR-PBG-346, TR- Examples of the oxime compound include PBG-358, TR-PBG-365, TR-PBG-380, TR-PBG-610, TR-PBG-A, and TR-PBG-B (all manufactured by TRONLY Corporation), and ADEKA OPTOMER N-1919 (manufactured by ADEKA Corporation; photopolymerization initiator 2 described in JP 2012-014052 A). In addition, it is also preferable to use, as the oxime compound, a compound that is not colorable or a compound that is highly transparent and does not easily discolor. Commercially available products include ADEKA ARCLES NCI-730, NCI-831, NCI-831E, and NCI-930 (all manufactured by ADEKA Corporation).

[0091] As the photopolymerization initiator, an oxime compound having a fluorene ring, an oxime compound having a skeleton in which at least one benzene ring of a carbazole ring is replaced with a naphthalene ring, an oxime compound having a fluorine atom, an oxime compound having a nitro group, an oxime compound having a benzofuran skeleton, an oxime compound in which a substituent having a hydroxy group is bonded to a carbazole skeleton, or a compound described in paragraphs 0143 to 0149 of WO 2022 / 085485 can also be used.

[0092] As the photopolymerization initiator, a compound represented by formula (OX-1) can also be used.

[0093] In formula (OX-1), X １ａ represents a divalent linking group containing at least one ring selected from the group consisting of an aromatic ring and a heterocyclic ring; １ａ represents a hydrogen atom or an acyl group; R ２ａ represents an alkyl group or an aryl group; R ３ａ and R ４ａ each independently represents a hydrogen atom or an alkyl group; Alk １ and Alk ２ each independently represents an alkyl group; R ３ａ and R ４ａ may be bonded to form a ring, Alk １ and Alk ２ may be bonded to form a ring, and n represents 0 or 1.

[0094] X in formula (OX-1) １ａ Examples of the divalent linking group represented by include a divalent aromatic ring group, a divalent heterocyclic group, a divalent group in which two or more aromatic ring groups are bonded together via a single bond or a linking group, a divalent group in which two or more heterocyclic groups are bonded together via a single bond or a linking group, and a divalent group in which an aromatic ring group and a heterocyclic group are bonded together via a single bond or a linking group. Examples of the linking group that bonds the above-mentioned aromatic ring groups together, heterocyclic groups together, or an aromatic ring group and a heterocyclic group include -CH ２ -, -O-, -CO-, -S-, -NR ｘ - and groups combining these. ｘrepresents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heterocyclic group.

[0095] X in formula (OX-1) １ａ is preferably a group represented by any one of formulas (X-1) to (X-13), more preferably a group represented by formula (X-1), formula (X-2), formula (X-4), formula (X-6) or formula (X-8), and further preferably a group represented by formula (X-2) or formula (X-6).

[0096] In the formula R Ｘ１ ~R Ｘ９ each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, or a heteroaryl group, and * represents a bond.

[0097] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, and more preferably 1 to 10. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0098] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkenyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkenyl group may be linear, branched, or cyclic. The alkenyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0099] R Ｘ１ ~R Ｘ９ The number of carbon atoms in the alkynyl group represented by is preferably 2 to 15, and more preferably 2 to 10. The alkynyl group may be linear, branched, or cyclic. The alkynyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, and a heteroaryl group.

[0100] R Ｘ１ ~R Ｘ９The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group.

[0101] R Ｘ１ ~R Ｘ９ The heteroaryl group represented by is preferably a 5-membered or 6-membered ring. The heteroatoms contained in the heteroaryl group are preferably oxygen atoms, nitrogen atoms, and sulfur atoms. The number of heteroatoms contained in the heteroaryl group is preferably 1 to 3. The heteroaryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and an aryl group.

[0102] R in formula (OX-1) １ａ represents a hydrogen atom or an acyl group, and is preferably an acyl group.

[0103] R in formula (OX-1) ２ａ represents an alkyl group or an aryl group, and is preferably an alkyl group because the reactivity of the generated radical is high. ２ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ２ａ The alkyl group represented by R is preferably an unsubstituted linear or branched alkyl group, and more preferably an unsubstituted linear alkyl group. ２ａ The number of carbon atoms in the aryl group represented by is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. The aryl group may have a substituent, but is preferably an unsubstituted aryl group.

[0104] R in formula (OX-1) ３ａ and R ４ａR each independently represents a hydrogen atom or an alkyl group, and is preferably a hydrogen atom. ３ａ and R ４ａ The number of carbon atoms in the alkyl group represented by is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. R ３ａ and R ４ａ may be bonded to form a ring. The ring formed is preferably a 5- or 6-membered ring, and more preferably a 5- or 6-membered aliphatic hydrocarbon ring.

[0105] Alk of formula (OX-1) １ and Alk ２ each independently represents an alkyl group. The number of carbon atoms in the alkyl group is preferably 1 to 15, more preferably 1 to 10, even more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent, but is preferably an unsubstituted alkyl group. Alk １ and Alk ２ may be bonded to form a ring, and preferably form a ring. The ring formed is preferably a 5- or 6-membered ring, more preferably a 5- or 6-membered aliphatic hydrocarbon ring, and more preferably a cyclopentane ring or a cyclohexane ring.

[0106] In formula (OX-1), n ​​represents 0 or 1, and is preferably 0.

[0107] Specific examples of the compound represented by formula (OX-1) include the compounds described in paragraphs 0092 to 0096 of JP-A No. 2012-113104 and the compound described in paragraph 0041 of JP-A No. 2012-189997.

[0108] As the photopolymerization initiator, a compound represented by formula (OX-2) can also be used.

[0109]

[0110] In formula (OX-2), R １ｂ and R ２ｂ each independently represents a substituent, R ３ｂ ~R ７ｂ each independently represents a hydrogen atom or a substituent, Ar １ｂ represents an aryl group which may have a substituent or a heteroaryl group which may have a substituent; n represents 0 or 1;

[0111] R １ｂ and R ２ｂ Examples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heteroaryl group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group.

[0112] R ３ｂ ~R ７ｂ Examples of the substituent represented by R include a halogen atom, an alkyl group, and an aryl group. Examples of the alkyl group and the aryl group include those described above. ３ｂ ~R ７ｂ is preferably a hydrogen atom.

[0113] Ar １ｂ represents an aryl group which may have a substituent or a heteroaryl group which may have a substituent, Ar １ｂis preferably an aryl group which may have a substituent. The number of carbon atoms in the aryl group is preferably 6 to 20, more preferably 6 to 12, still more preferably 6 to 10, and particularly preferably 6. Examples of the substituent include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, a nitro group, and an acyl group, and an acyl group is preferred.

[0114] As the photopolymerization initiator, a compound represented by formula (OX-3) can also be used.

[0115]

[0116] In formula (OX-3), Ar １ｃ represents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group; Ar ２ｃ represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group; R １ｃ ~R ３ｃ each independently represents a substituent; １ｃ is a single bond or CR １１ｃ R １２ｃ represents R １１ｃ and R １２ｃ each independently represents a hydrogen atom, an alkyl group, or an aryl group; １ｃ Ha-CH ２ represents -, -N-, -O- or -S-; k represents 0 or 1; m represents an integer of 0 to 4; and n represents 0 or 1.

[0117] R １ｃ and R ２ｃExamples of the substituent represented by include an alkyl group and an aryl group, and an alkyl group is preferred. The alkyl group preferably has 1 to 15 carbon atoms, and more preferably 1 to 10 carbon atoms. The alkyl group may be linear, branched, or cyclic. The alkyl group may have a substituent. Examples of the substituent include a halogen atom, an aryl group, an alkenyl group, an alkynyl group, and a heteroaryl group. The aryl group preferably has 6 to 20 carbon atoms, more preferably 6 to 12 carbon atoms, even more preferably 6 to 10 carbon atoms, and particularly preferably 6 carbon atoms. The aryl group may have a substituent. Examples of the substituent include a halogen atom, an alkyl group, an alkenyl group, an alkynyl group, and a heteroaryl group. R ２ｃ is preferably an alkyl group having a branched or cyclic structure.

[0118] R ３ｃ Examples of the substituent represented by include a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group and an acyl group, and an acyl group is preferred.

[0119] L １ｃ is a single bond or CR １１ｃ R １２ｃ represents R １１ｃ and R １２ｃ R each independently represents a hydrogen atom, an alkyl group, or an aryl group. １１ｃ and R １２ｃ The alkyl group and aryl group in R １ｃ and R ２ｃ When k is 1, L １ｃ is preferably a single bond.

[0120] X １ｃ is -CH ２ It represents -, -N-, -O- or -S-, and is preferably -O- or -S-.

[0121] Ar １ｃrepresents a (k+m+1)-valent aromatic ring group or a (k+m+1)-valent heterocyclic group, and is preferably a (k+m+1)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0122] Ar ２ｃ represents a (k+2)-valent aromatic ring group or a (k+2)-valent heterocyclic group, and is preferably a (k+2)-valent aromatic ring group. The aromatic ring group is preferably a benzene ring group or a naphthalene ring group, and more preferably a benzene ring group.

[0123] k represents 0 or 1, and is preferably 0. m represents an integer of 0 to 4, and is preferably 0 or 1, and more preferably 1. n represents 0 or 1, and is preferably 0.

[0124] As the photopolymerization initiator, a ketoxime ester compound having an aryloxy group at the ortho position, represented by formula (OX-4), can also be suitably used. Examples of such compounds include the compounds described in Chinese Patent Application Publication No. 117342977.

[0125] In formula (OX-4), R １ｄ and R ２ｄ each independently represents an alkyl group, an aryl group, or a heterocyclic group; R ３ｄ , R ４ｄ , R ５ｄ , R ６ｄ are each independently a hydrogen atom, a halogen atom, CN, NO ２ , C.F. ３ ,R,OR,SR,SOR,SO ２ R or NRR', R and R' each independently represent an alkyl group or an aryl group, and when R and R' are present at the same time, R and R' may be bonded to form a ring, and one or more -CH in the alkyl group or aryl group represented by R and R' ２ - may be independently substituted with -O-, -N-, -S-, -CO-, -COO-, -OCO- or a benzene ring; R ７ｄ , R８ｄ and R ９ｄ each independently represents a hydrogen atom or a methyl group.

[0126] The photopolymerization initiator may also be a compound represented by formula (OX-5). Examples of such a compound include the compounds described in WO 2024 / 101219.

[0127] In formula (OX-5), R １ｅ ~R ５ｅ each independently represents a hydrocarbon group which may have a substituent; n represents an integer of 0 to 4.

[0128] Specific examples of the oxime compound include the compounds shown below.

[0129]

[0130]

[0131]

[0132]

[0133]

[0134] As the photopolymerization initiator, a bifunctional or trifunctional or higher functional photopolymerization initiator may be used. Specific examples of the bifunctional or trifunctional or higher functional photopolymerization initiator include the compounds described in paragraph 0148 of WO 2022 / 065215.

[0135] The content of the photopolymerization initiator in the total solid content of the photocurable composition is preferably 0.1 to 15% by mass. From the viewpoint of sensitivity, the lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. From the viewpoint of adhesion, the upper limit is preferably 10% by mass or less, more preferably 8% by mass or less, and even more preferably 6% by mass or less. In the photocurable composition of the present invention, only one type of photopolymerization initiator may be used, or two or more types may be used. When two or more types are used, the total amount thereof preferably falls within the above range.

[0136] The total content of the polymerizable monomer and the photopolymerization initiator in the total solid content of the photocurable composition is preferably 25% by mass or less, more preferably 20% by mass or less, even more preferably 17.5% by mass or less, and particularly preferably 15% by mass or less. The lower limit is preferably 0.1% by mass or more, more preferably 1% by mass or more, and even more preferably 3% by mass or more.

[0137] <<Solvent>> The photocurable composition of the present invention preferably contains a solvent. Examples of the solvent include organic solvents. The type of solvent is basically not particularly limited as long as the solubility of each component and the coatability of the composition are satisfied. Examples of organic solvents include ester-based solvents, ketone-based solvents, alcohol-based solvents, amide-based solvents, ether-based solvents, and hydrocarbon-based solvents. For details of these, please refer to paragraph

[0223] of WO 2015 / 166779, the contents of which are incorporated herein by reference. Furthermore, ester-based solvents substituted with a cyclic alkyl group and ketone-based solvents substituted with a cyclic alkyl group can also be preferably used. Specific examples of organic solvents include polyethylene glycol monomethyl ether, dichloromethane, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, 2-pentanone, 3-pentanone, 4-heptanone, cyclohexanone, 2-methylcyclohexanone, 3-methylcyclohexanone, 4-methylcyclohexanone, cycloheptanone, cyclooctanone, cyclohexyl acetate, cyclopentanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol monomethyl ether ... Examples of suitable ethylene glycol monomethyl ether acetate include 3-methoxy-N,N-dimethylpropanamide, 3-butoxy-N,N-dimethylpropanamide, propylene glycol diacetate, 3-methoxybutanol, methyl ethyl ketone, gamma butyrolactone, sulfolane, anisole, 1,4-diacetoxybutane, diethylene glycol monoethyl ether acetate, butane-1,3-diyl diacetate, dipropylene glycol methyl ether acetate, diacetone alcohol (also known as diacetone alcohol, 4-hydroxy-4-methyl-2-pentanone), 2-methoxypropyl acetate, 2-methoxy-1-propanol, and isopropyl alcohol.However, it may be preferable to reduce the amount of aromatic hydrocarbons (benzene, toluene, xylene, ethylbenzene, etc.) used as organic solvents for environmental reasons (for example, the amount may be 50 ppm by mass (parts per million) or less, 10 ppm by mass or less, or 1 ppm by mass or less, relative to the total amount of organic solvents).

[0138] The metal content of the organic solvent is preferably low. The metal content of the organic solvent is preferably, for example, 10 parts per billion (ppb) by mass or less. If necessary, an organic solvent having a metal content of ppt (parts per trillion) by mass may be used, and such an organic solvent is provided, for example, by Toyo Gosei Co., Ltd. (The Chemical Daily, November 13, 2015).

[0139] Methods for removing impurities such as metals from organic solvents include, for example, distillation (molecular distillation, thin-film distillation, etc.) and filtration using a filter. The pore size of the filter used for filtration is preferably 10 μm or less, more preferably 5 μm or less, and even more preferably 3 μm or less. The filter material is preferably polytetrafluoroethylene, polyethylene, or nylon.

[0140] The organic solvent may contain isomers (compounds having the same number of atoms but different structures). The organic solvent may contain only one type of isomer or multiple types of isomers.

[0141] The organic solvent preferably has a peroxide content of 0.8 mmol / L or less, and more preferably contains substantially no peroxide.

[0142] The content of the solvent in the photocurable composition is preferably from 10 to 95% by mass, more preferably from 20 to 90% by mass, and even more preferably from 30 to 90% by mass.

[0143] From the viewpoint of environmental regulations, the photocurable composition of the present invention preferably does not substantially contain environmentally restricted substances. In the present invention, "substantially does not contain environmentally restricted substances" means that the content of environmentally restricted substances in the photocurable composition is 50 ppm by mass or less, preferably 30 ppm by mass or less, more preferably 10 ppm by mass or less, and particularly preferably 1 ppm by mass or less. Examples of environmentally restricted substances include benzene; alkylbenzenes such as toluene and xylene; and halogenated benzenes such as chlorobenzene. These substances are registered as environmentally restricted substances under the REACH (Registration Evaluation Authorization and Restriction of Chemicals) regulations, the PRTR (Pollutant Release and Transfer Register) Act, the VOC (Volatile Organic Compounds) regulations, etc., and their usage amounts and handling methods are strictly regulated. These compounds may be used as solvents when producing the components used in the photocurable composition, and may be mixed into the photocurable composition as residual solvents. From the viewpoints of human safety and environmental considerations, it is preferable to reduce these substances as much as possible. Examples of methods for reducing environmentally restricted substances include heating or reducing the pressure in the system to a temperature above the boiling point of the environmentally restricted substance, thereby distilling off the environmentally restricted substance from the system. Furthermore, when distilling off a small amount of environmentally regulated substances, it is useful to perform azeotropy with a solvent having a boiling point equivalent to that of the solvent in question in order to increase efficiency. Furthermore, when a radically polymerizable compound is contained, a polymerization inhibitor or the like may be added prior to distillation under reduced pressure to prevent intermolecular crosslinking due to the progress of a radical polymerization reaction during distillation under reduced pressure. These distillation methods can be used at any stage, such as the stage of raw materials, the stage of a product obtained by reacting the raw materials (e.g., a resin solution or a polyfunctional monomer solution after polymerization), or the stage of a photocurable composition prepared by mixing these compounds.

[0144] <<Colorant>> The photocurable composition of the present invention preferably contains a colorant. Examples of the colorant include a white colorant, a black colorant, a chromatic colorant, and an infrared-absorbing colorant. Pigment derivatives can also be used as the colorant. Examples of pigment derivatives include compounds having a structure in which an acid group or a basic group is bonded to a dye skeleton. Details of pigment derivatives will be described later. In the present invention, the white colorant includes not only pure white colorants but also light gray colorants close to white (e.g., off-white, light gray, etc.).

[0145] The colorant may be a pigment or a dye. A pigment and a dye may be used in combination. The pigment may be either an inorganic pigment or an organic pigment, but organic pigments are preferred from the viewpoints of a wide range of color variations, ease of dispersion, safety, and the like. When a pigment and a dye are used in combination, the content of the dye is preferably 5 to 100 parts by mass per 100 parts by mass of the pigment. The upper limit is preferably 80 parts by mass or less, and more preferably 60 parts by mass or less. The lower limit is preferably 10 parts by mass or more, and more preferably 15 parts by mass or more.

[0146] The colorant preferably contains a pigment, and more preferably contains a pigment and a pigment derivative. In particular, when a chromatic pigment or an infrared-absorbing pigment is used as the pigment, the colorant contained in the photocurable composition preferably contains a pigment and a pigment derivative. Furthermore, when a chromatic colorant is used as the colorant, the colorant contained in the photocurable composition preferably contains a pigment, a dye, and a pigment derivative. The content of the pigment derivative is preferably 1 to 30 parts by mass, more preferably 3 to 20 parts by mass, per 100 parts by mass of the pigment. Only one type of pigment derivative may be used, or two or more types may be used in combination.

[0147] The average primary particle diameter of the pigment and pigment derivative is preferably 1 to 200 nm. The lower limit is preferably 5 nm or more, more preferably 10 nm or more. The upper limit is preferably 180 nm or less, more preferably 150 nm or less, and even more preferably 100 nm or less. In this specification, the primary particle diameter of the pigment and pigment derivative can be determined from a photograph obtained by observing the primary particles of the pigment and pigment derivative using a transmission electron microscope. Specifically, the projected area of ​​the primary particles of the pigment is determined, and the corresponding circle-equivalent diameter is calculated as the primary particle diameter of the pigment. In addition, the average primary particle diameter in the present invention is the arithmetic mean value of the primary particle diameters of 400 primary particles of the pigment. Furthermore, primary particles of the pigment refer to independent particles without aggregation. The same applies to the average primary particle diameter of pigment derivatives.

[0148] The crystallite size of the pigment and pigment derivative is preferably 0.1 to 50 nm, more preferably 0.5 to 30 nm, and even more preferably 1 to 15 nm. The crystallite size can be determined from the half-width of the diffraction angle peak using an X-ray diffractometer and calculated using the Scherrer equation. The crystallite size of the pigment and pigment derivative can be adjusted by known methods such as adjusting the production conditions or pulverizing the pigment after production.

[0149] The specific surface area of ​​pigments and pigment derivatives is 1 to 300 m ２ / g. The lower limit is 10 m ２ / g or more, and ２ / g or more is more preferable. ２ / g or less, and ２ The value of the specific surface area can be determined according to the BET (Brunauer, Emmett and Teller) method in accordance with DIN 66131: Determination of the specific surface area of ​​solids by gas adsorption.

[0150] (Chromatic Colorant) Examples of chromatic colorants include colorants having a maximum absorption wavelength in the wavelength range of 400 to 700 nm, such as green colorants, red colorants, yellow colorants, purple colorants, blue colorants, and orange colorants.

[0151] Examples of the red colorant include a diketopyrrolopyrrole compound, an anthraquinone compound, an azo compound, a naphthol compound, an azomethine compound, a xanthene compound, a quinacridone compound, a perylene compound, and a thioindigo compound, and the like, preferably a diketopyrrolopyrrole compound, an anthraquinone compound, or an azo compound, and more preferably a diketopyrrolopyrrole compound. The red colorant is preferably a pigment (red pigment), and more preferably a diketopyrrolopyrrole pigment.

[0152] Specific examples of red colorants include C.I. (Color Index) Pigment Red 1, 2, 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 31, 38, 41, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52:2, 53:1, 57:1, 60:1, 63:1, 66, 67, 81:1, 81:2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, Examples of red pigments include 150,155,166,168,169,170,171,172,175,176,177,178,179,184,185,187,188,190,200,202,206,207,208,209,210,216,220,224,226,242,246,254,255,264,269,270,272,279,291,294,295,296,297. In addition, as a red colorant, a compound described in paragraph 0034 of WO 2022 / 085485, or a brominated diketopyrrolopyrrole compound described in JP-A-2020-085947 can also be used.

[0153] As the red colorant, C.I. Pigment Red 122, 177, 224, 254, 255, 264, 269, 272, and 291 are preferred, C.I. Pigment Red 254, 264, and 272 are more preferred, and C.I. Pigment Red 254 and 264 are even more preferred.

[0154] Examples of the green colorant include phthalocyanine compounds and squarylium compounds, and the phthalocyanine compounds are preferred. The green colorant is preferably a pigment (green pigment), and more preferably a phthalocyanine pigment.

[0155] Specific examples of green colorants include green pigments such as C.I. Pigment Green 7, 10, 36, 37, 58, 59, 62, 63, 64, 65, and 66. Furthermore, as a green colorant, a halogenated zinc phthalocyanine pigment having an average of 10 to 14 halogen atoms, an average of 8 to 12 bromine atoms, and an average of 2 to 5 chlorine atoms per molecule can also be used. Specific examples include the compounds described in WO 2015 / 118720. Furthermore, as a green colorant, the compounds described in paragraph 0029 of WO 2022 / 085485, the aluminum phthalocyanine compounds described in JP-A 2020-070426, and the diarylmethane compounds described in JP-A 2020-504758 can also be used.

[0156] As the green colorant, C.I. Pigment Green 7, 36, 58, 62, and 63 are preferred.

[0157] Examples of orange colorants include diketopyrrolopyrrole compounds and azo compounds. The orange colorant is preferably a pigment (orange pigment). Specific examples of orange colorants include orange pigments such as C.I. Pigment Orange 2, 5, 13, 16, 17:1, 31, 34, 36, 38, 43, 46, 48, 49, 51, 52, 55, 59, 60, 61, 62, 64, 71, and 73.

[0158] Examples of the yellow colorant include an azo compound, an azomethine compound, an isoindoline compound, a pteridine compound, a quinophthalone compound, and a perylene compound. The yellow colorant is preferably a pigment (yellow pigment). Specific examples of the yellow colorant include C.I. Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81, 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 116, 117, 118, 119, 120, 123, 125 , 126, 127, 128, 129, 137, 138, 139, 147, 148, 150, 151, 152, 153, 154, 155, 156, 161, 162, 164, 166, 167, 168, 169, 170, 171, 172, 173, 174, 175, 176, 177, 179, 180, 181, 182, 185, 187, 188, 193, 194, 199, 213, 214, 215, 228, 231, 232, 233, 234, 235, 236 and the like.

[0159] As the yellow coloring material, an azobarbituric acid nickel complex having the following structure can also be used.

[0160] As the yellow colorant, the compounds described in paragraphs 0031 to 0033 of WO 2022 / 085485, the methine dyes described in JP-A 2019-073695, and the methine dyes described in JP-A 2019-073696 can be used.

[0161] Examples of the purple colorant include an oxazine compound, a quinacridone compound, a perylene compound, and an indigo compound, and the oxazine compound is preferred. The purple colorant is preferably a pigment (purple pigment). Specific examples of the purple colorant include purple pigments such as C.I. Pigment Violet 1, 19, 23, 27, 32, 37, 42, 60, and 61.

[0162] Examples of blue colorants include phthalocyanine compounds and squarylium compounds, with phthalocyanine compounds being preferred. The blue colorant is preferably a pigment (blue pigment). Specific examples of blue colorants include blue pigments such as C.I. Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 22, 29, 60, 64, 66, 79, 80, 87, and 88. Furthermore, aluminum phthalocyanine compounds having phosphorus atoms can also be used as blue colorants. Specific examples include the compounds described in paragraphs 0022 to 0030 of JP-A No. 2012-247591 and paragraph 0047 of JP-A No. 2011-157478.

[0163] Dyes can also be used as chromatic colorants. There are no particular limitations on the dyes, and known dyes can be used. Examples include pyrazole azo dyes, anilino azo dyes, triarylmethane dyes, anthraquinone dyes, anthrapyridone dyes, benzylidene dyes, oxonol dyes, pyrazolotriazole azo dyes, pyridone azo dyes, cyanine dyes, phenothiazine dyes, pyrrolopyrazole azomethine dyes, xanthene dyes, phthalocyanine dyes, benzopyran dyes, indigo dyes, and pyrromethene dyes. The dye is preferably a xanthene dye.

[0164] A dye polymer can also be used as a chromatic colorant. The dye polymer is preferably a dye dissolved in a solvent when used. The dye polymer may also form particles. When the dye polymer is particulate, it is typically used in a dispersed state in a solvent. A particulate dye polymer can be obtained, for example, by emulsion polymerization, and specific examples of the compounds and production methods described in JP-A 2015-214682 include those described in JP-A 2015-214682. The dye polymer has two or more dye structures in one molecule, preferably three or more dye structures. The upper limit is not particularly limited, but can be 100 or less. The multiple dye structures in one molecule may be the same dye structure or different dye structures. The weight-average molecular weight (Mw) of the dye polymer is preferably 2,000 to 50,000. The lower limit is more preferably 3,000 or more, and even more preferably 6,000 or more. The upper limit is more preferably 30,000 or less, and even more preferably 20,000 or less. As the dye multimer, compounds described in JP-A-2011-213925, JP-A-2013-041097, JP-A-2015-028144, JP-A-2015-030742, WO 2016 / 031442, etc. can also be used.

[0165] Examples of chromatic colorants include triarylmethane dye polymers described in Korean Patent Publication No. 10-2020-0028160, xanthene compounds described in JP 2020-117638 A, phthalocyanine compounds described in WO 2020 / 174991 A, isoindoline compounds or salts thereof described in JP 2020-160279 A, ​​compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069442 A, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A, and compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069730 A. Compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069070, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069067, compounds represented by formula 1 described in Korean Patent Publication No. 10-2020-0069062, halogenated zinc phthalocyanine pigments described in Japanese Patent No. 6809649, isoindoline compounds described in JP 2020-180176, phenothiazine compounds described in JP 2021-187913, halogenated zinc phthalocyanines described in WO 2022 / 004261, WO Halide zinc phthalocyanine described in Korean Patent Publication No. 10-2020-0030759, quinophthalone compound represented by formula 1 in Korean Patent Publication No. 10-2020-0061793, polymer dye described in Korean Patent Publication No. 10-2020-0061793, chromatic colorant described in JP-A-2022-029701, isoindoline compound described in WO 2022 / 014635, aluminum phthalocyanine compound described in WO 2022 / 024926, compound described in JP 2022-045895, WO 2022 / 05005 Compounds described in JP-A-2020-090676, compounds described in JP-A-2020-055956, compounds described in JP-A-2021-031681, compounds described in JP-A-2022-056354, compounds described in US Patent Application Publication No. 2021 / 0355327, compounds described in WO 2022 / 065357, compounds described in JP-A-2020-045436, compounds described in Korean Patent Publication No. 10-2021-0146726, compounds described in JP-A-2018-178039,Compounds described in Chinese Patent Application Publication No. 113881244, compounds described in Chinese Patent Application Publication No. 113881245, compounds described in Chinese Patent Application Publication No. 113881246, compounds described in JP 2022-104822 A, compounds described in JP 2022-096701 A, compounds described in JP 2020-023652 A, green pigments described in the Journal of the Japan Color Materials Association (published in 2022) pages 80 to 84, compounds described in JP 2022-143135 A, compounds described in JP 2022-140287 A, compounds described in WO 2014 / 014906 Compounds described in Patent Publication No. 2022 / 136308, perylene compounds described in Chinese Patent Application Publication No. 113061349, cyan pigments described in Korean Patent Publication No. 10-2017-0018993, isoindoline compounds described in JP 2020-180176, compounds described in JP 2023-013209, compounds described in JP 2023-013166, xanthene compounds described in WO 2023 / 286526, compounds described in JP 2021-155746, compounds described in JP 2021-155747, JP Compounds described in JP-A-2021-155748, compounds described in JP-A-2021-155749, compounds described in WO 2018 / 051876, compounds described in JP-A-2020-083981, compounds described in JP-A-2023-056463, compounds described in JP-T-2023-515473, dioxane compounds described in JP-T-2022-549530, pigment preparations described in JP-A-2022-061494, diketopyrrolopyrrole pigments described in JP-A-2023-057917, and JP-A-2023-061273 Diketopyrrolopyrrole compounds described in JP-A-2023-519314, phthalocyanines described in JP-A-2023-080419, quinophthalones described in JP-A-2023-103177, phthalocyanine compounds described in JP-A-2023-103177, isoindoline compounds described in JP-A-2020-026521, squarylium compounds described in Korean Patent Publication No. 10-2023-0043000, squarylium compounds described in Korean Patent Publication No. 10-2023-0050069, diketopyrrolopyrrole compounds described in JP-A-2023-127878,Triarylmethane compounds described in JP 2023-150459 A, triarylmethane compounds described in JP 2023-149735 A, core-shell dyes described in JP 2023-123349 A, xanthene compounds described in JP-T-2023-543717 A, compounds described in Chinese Patent Application Publication No. 116102441 A, compounds described in JP 2023-150459 A, compounds described in JP 2023-167345 A, Korean Patent Publication Compounds described in Japanese Patent No. 10-2023-0061078, compounds described in Japanese Patent Application Publication No. 2020-183509, colorants described in Japanese Patent Application Publication No. 2020-079395, compounds represented by formula (1) described in U.S. Patent Application Publication No. 2022 / 0119643, dyes described in Japanese Patent Application Publication No. 2023-048989, compounds described in Japanese Patent Application Publication No. 2024-014738, pigments described in Chinese Patent Application Publication No. 115873417, and the like can also be used. Furthermore, the chromatic colorant may be a rotaxane. The dye skeleton may be used in the cyclic structure of the rotaxane, in the rod-shaped structure, or in both structures.

[0166] Two or more chromatic colorants may be used in combination. When two or more chromatic colorants are used in combination, the combination of the two or more chromatic colorants may form a black color. Examples of such combinations include the following embodiments (1) to (7). When the photocurable composition contains two or more chromatic colorants and exhibits a black color through the combination of the two or more chromatic colorants, the photocurable composition can be preferably used as a photocurable composition for forming an infrared transmission filter. (1) An embodiment containing a red colorant and a blue colorant. (2) An embodiment containing a red colorant, a blue colorant, and a yellow colorant. (3) An embodiment containing a red colorant, a blue colorant, a yellow colorant, and a purple colorant. (4) An embodiment containing a red colorant, a blue colorant, a yellow colorant, a purple colorant, and a green colorant. (5) An embodiment containing a red colorant, a blue colorant, a yellow colorant, and a green colorant. (6) An embodiment containing a red color material, a blue color material, and a green color material. (7) An embodiment containing a yellow color material and a purple color material.

[0167] (White coloring material) Examples of the white coloring material include inorganic pigments such as titanium oxide, strontium titanate, barium titanate, zinc oxide, magnesium oxide, zirconium oxide, aluminum oxide, barium sulfate, silica, talc, mica, aluminum hydroxide, calcium silicate, aluminum silicate, and zinc sulfide. As the white coloring material, the white pigments described in paragraphs 0040 to 0043 of WO 2022 / 085485 can be used.

[0168] (Black Colorant) The black colorant is not particularly limited, and known materials can be used. The black colorant may be an inorganic black colorant or an organic black colorant. The black colorant is preferably a pigment. In this specification, the black colorant refers to a colorant that exhibits absorption over the entire wavelength range of 400 to 700 nm.

[0169] Examples of inorganic black colorants include carbon black, titanium black, graphite, etc., with carbon black and titanium black being preferred, and titanium black being more preferred. Titanium black is a black particle containing titanium atoms, and low-order titanium oxide or titanium oxynitride is preferred. As the titanium black, the titanium black described in paragraph 0044 of WO 2022 / 085485 can be used. As the inorganic black colorant, zirconium nitride powder described in JP 2023-048173 A can also be used.

[0170] Examples of organic black colorants include bisbenzofuranone compounds, azomethine compounds, perylene compounds, and azo compounds, with bisbenzofuranone compounds and perylene compounds being preferred. The organic black colorant may be a compound described in paragraph 0166 of International Publication No. 2022 / 065215. Furthermore, as the organic black colorant, perylene black (such as Lumogen Black FK4280) described in paragraphs 0016 to 0020 of JP-A-2017-226821 or a black azo pigment described in JP-A-2022-121935 may also be used.

[0171] The black coloring material may be any of those described in pages 294 to 307 of the Journal of the Color Materials Association, Vol. 96, No. 9, 2023.

[0172] (Infrared absorbing colorant) The infrared absorbing colorant is preferably a compound having a maximum absorption wavelength longer than 700 nm. The infrared absorbing colorant is preferably a compound having a maximum absorption wavelength in the wavelength range of more than 700 nm to 1800 nm, more preferably a compound having a maximum absorption wavelength in the wavelength range of more than 700 nm to 1400 nm, even more preferably a compound having a maximum absorption wavelength in the wavelength range of more than 700 nm to 1200 nm, and particularly preferably a compound having a maximum absorption wavelength in the wavelength range of more than 700 nm to 1000 nm. In addition, the absorbance A of the infrared absorbing colorant at a wavelength of 500 nm is １ and absorbance A at the maximum absorption wavelength ２ Ratio A １ / A ２ is preferably 0.08 or less, more preferably 0.04 or less. The infrared absorbing colorant is preferably a pigment, more preferably an organic pigment.

[0173] Examples of infrared absorbing colorants include pyrrolopyrrole compounds, cyanine compounds, squarylium compounds, phthalocyanine compounds, naphthalocyanine compounds, quaterrylene compounds, merocyanine compounds, croconium compounds, oxonol compounds, iminium compounds, dithiol compounds, triarylmethane compounds, pyrromethene compounds, azomethine compounds, anthraquinone compounds, dibenzofuranone compounds, dithiolene metal complexes, metal oxides, and metal borides. Specific examples of these include the compounds described in paragraph 0114 of WO 2022 / 065215. Examples of infrared absorbing colorants include the compounds described in paragraph 0121 of WO 2022 / 065215, squarylium compounds described in JP 2020-075959 A,Copper complexes described in Korean Patent Publication No. 10-2019-0135217, croconic acid compounds described in JP 2021-195515, infrared absorbing dyes described in JP 2022-022070, croconium compounds described in WO 2019 / 021767, compounds described in JP 2019-127549, compounds described in WO 2022 / 059619, compounds described in JP 2022-151682, squarylium compounds described in JP 2022-188858, and compounds described in JP 2022-184710 Compounds described in JP 2022-189736 A, squarylium compounds described in JP 2023-004570 A, squarylium compounds described in WO 2019 / 230660 A, compounds described in WO 2020 / 218615 A, diiminium compounds described in JP 2023-068643 A, squarylium compounds described in JP 2023-052770 A, phthalocyanine compounds described in Korean Patent Publication No. 10-2022-0163680 A, indium compounds described in JP 2023-073064 A Gomonoboron complexes, phthalocyanine compounds described in JP 2023-066025 A, phthalocyanine compounds described in JP 2020-041127 A, indigo compounds described in JP 2023-073064 A, indigo compounds described in Korean Patent Publication No. 10-2023-0016355 A, squarylium compounds described in WO 2019 / 230570 A, diiminium compounds described in JP 2023-095824 A, compounds described in JP 2023-159964 A, compounds described in JP 2023-176615 A Compounds, compounds described in JP-T-2024-500537, phthalocyanine compounds described in JP-A-2024-019936, compounds described in Korean Patent Registration No. 10-2575190, polymethine compounds described in JP-A-2024-017061, boron derivatives described in Chinese Patent Application Publication No. 116715690, phthalocyanine compounds described in JP-A-2024-020454, compounds described in Chinese Patent Application Publication No. 116891482, compounds described in JP-T-2024-511242 can also be used.

[0174] (Pigment Derivative) In the present invention, a pigment derivative can also be used as the colorant. In the present invention, it is preferable to use a pigment and a pigment derivative in combination. Examples of the pigment derivative include compounds having a structure in which an acid group or a basic group is bonded to a colorant skeleton.

[0175] Examples of the dye structure include a quinoline dye structure, a benzimidazolone dye structure, a benzisoindole dye structure, a benzothiazole dye structure, an iminium dye structure, a squarylium dye structure, a croconium dye structure, an oxonol dye structure, a pyrrolopyrrole dye structure, a diketopyrrolopyrrole dye structure, an azo dye structure, an azomethine dye structure, a phthalocyanine dye structure, a naphthalocyanine dye structure, an anthraquinone dye structure, a quinacridone dye structure, a dioxazine dye structure, a perinone dye structure, a perylene dye structure, a thiazineindigo dye structure, a thioindigo dye structure, an isoindoline dye structure, an isoindolinone dye structure, a quinophthalone dye structure, a dithiol dye structure, a triarylmethane dye structure, and a pyrromethene dye structure.

[0176] Examples of the acid group possessed by the pigment derivative include a carboxy group, a sulfo group, a phosphate group, a boronic acid group, an imidic acid group, and salts thereof. Examples of the atom or atomic group constituting the salt include an alkali metal ion (Li ＋ , Na ＋ , K. ＋ etc.), alkaline earth metal ions (Ca ２＋ , Mg ２＋ Examples of the imide acid group include an ammonium ion, an imidazolium ion, a pyridinium ion, and a phosphonium ion. ２ NHSO ２ R Ｘ１ , -CONHSO ２ R Ｘ２ , -CONHCOR Ｘ３ or -SO ２ NHCOR Ｘ４ A group represented by the formula: ２ NHSO ２ R Ｘ１ , -CONHSO ２ R Ｘ２ , or -SO ２ NHCORＸ４ A group represented by the formula: ２ NHSO ２ R Ｘ１ or -CONHSO ２ R Ｘ２ is more preferred. Ｘ１ ~R Ｘ４ R each independently represents an alkyl group or an aryl group. Ｘ１ ~R Ｘ４ The alkyl group and aryl group represented by R may have a substituent. The substituent is preferably a halogen atom, and more preferably a fluorine atom. Ｘ１ ~R Ｘ４ are each independently preferably an alkyl group containing a fluorine atom or an aryl group containing a fluorine atom, and more preferably an alkyl group containing a fluorine atom. The number of carbon atoms in the alkyl group containing a fluorine atom is preferably 1 to 10, more preferably 1 to 5, and even more preferably 1 to 3. The number of carbon atoms in the aryl group containing a fluorine atom is preferably 6 to 20, more preferably 6 to 12, and even more preferably 6.

[0177] Examples of basic groups possessed by the pigment derivative include amino groups, pyridinyl groups and their salts, ammonium salts, and phthalimidomethyl groups. Examples of atoms or atomic groups that constitute the salts include hydroxide ions, halogen ions, carboxylate ions, sulfonate ions, and phenoxide ions.

[0178] The amino group is —NR ｘ１１ R ｘ１２ and a cyclic amino group.

[0179] -NR ｘ１１ R ｘ１２ In the group represented by ｘ１１ and R ｘ１２are each independently a hydrogen atom, an alkyl group, or an aryl group, and are preferably an alkyl group. That is, the amino group is preferably a dialkylamino group. The alkyl group preferably has 1 to 10 carbon atoms, more preferably 1 to 5, and even more preferably 1 to 3. The alkyl group may be linear, branched, or cyclic, but is preferably linear or branched, and more preferably linear. The alkyl group may have a substituent. The aryl group preferably has 6 to 30 carbon atoms, more preferably 6 to 20, and even more preferably 6 to 12. The aryl group may have a substituent.

[0180] Examples of the cyclic amino group include a pyrrolidine group, a piperidine group, a piperazine group, a morpholine group, etc. These groups may further have a substituent.

[0181] Specific examples of pigment derivatives include the compounds described in paragraph 0124 of WO 2022 / 085485, the benzimidazolone compounds or salts thereof described in JP 2018-168244 A, the compounds having an isoindoline skeleton described in general formula (1) of Japanese Patent No. 6996282 A, the compounds described in JP 2019-172968 A, and the compounds described in Chinese Patent Publication No. 115124889 A.

[0182] The content of the colorant in the total solid content of the photocurable composition is preferably 50% by mass or more, more preferably 60% by mass or more, and even more preferably 70% by mass or more, and the upper limit is preferably 80% by mass or less, more preferably 77.5% by mass or less, and even more preferably 75% by mass or less.

[0183] The content of the pigment in the total solid content of the photocurable composition is preferably 30% by mass or more, more preferably 45% by mass or more, and even more preferably 55% by mass or more, and the upper limit is preferably 80% by mass or less, more preferably 77.5% by mass or less, and even more preferably 75% by mass or less.

[0184] The content of the pigment in the colorant is preferably 20 to 100% by mass, more preferably 50 to 100% by mass, and even more preferably 70 to 100% by mass. The total content of the pigment and pigment derivative in the colorant is preferably 25 to 100% by mass, more preferably 55 to 100% by mass, and even more preferably 75 to 100% by mass.

[0185] <<Resin>> The photocurable composition of the present invention preferably contains a resin. The resin is blended, for example, to disperse pigments and the like in the photocurable composition or as a binder. A resin used mainly to disperse pigments and the like in the photocurable composition is also called a dispersant. However, these uses of resins are only examples, and resins can also be used for purposes other than these uses. The photocurable composition of the present invention preferably contains a resin as a binder.

[0186] The weight average molecular weight (Mw) of the resin is preferably 3,000 to 2,000,000. The upper limit is preferably 1,000,000 or less, and more preferably 500,000 or less. The lower limit is preferably 4,000 or more, and more preferably 5,000 or more.

[0187] Examples of resins include (meth)acrylic resins, epoxy resins, (meth)acrylamide resins, ene-thiol resins, polycarbonate resins, polyether resins, polyarylate resins, polysulfone resins, polyethersulfone resins, polyphenylene resins, polyarylene ether phosphine oxide resins, polyimide resins, polyamideimide resins, polyolefin resins, cyclic olefin resins, polyester resins, styrene resins, siloxane resins, and urethane resins. Urethane resins are polymeric compounds formed by the reaction of an isocyanate group with an alcohol group. Specifically, they are polymeric compounds having a urethane bond (or carbamate bond) formed by the reaction of a compound having an isocyanate group (polyisocyanate) with a compound having an alcohol group (polyol). The urethane value of the urethane resin is preferably 0.5 to 6.0 mmol / g. The lower limit is preferably 1.0 mmol / g or more, more preferably 1.5 mmol / g or more, and even more preferably 2.0 mmol / g or more. The upper limit is preferably 5.0 mmol / g or less, more preferably 4.5 mmol / g or less, and even more preferably 4.0 mmol / g or less. The urethane value of the urethane resin is particularly preferably 2.0 to 4.0 mmol / g. The urethane value of the urethane resin is a numerical value representing the molar amount of urethane bonds per 1 g of the solid content of the urethane resin.

[0188] Further, examples of the resin include the resins described in paragraphs 0091 to 0099 of WO 2022 / 065215, the blocked polyisocyanate resins described in JP 2016-222891 A, the resins described in JP 2020-122052 A, the resins described in JP 2020-111656 A, the resins described in JP 2020-139021 A, the resins described in JP 2017-138503 A containing a structural unit having a ring structure in the main chain and a structural unit having a biphenyl group in the side chain, the resins described in paragraphs 0199 to 0233 of JP 2020-186373 A, the alkali-soluble resins described in JP 2020-186325 A, and Korean Patent Publication No. 10-2020-0078339 Resins represented by formula 1 described in the publication, copolymers containing epoxy groups and acid groups described in WO 2022 / 030445, resins described in JP 2018-135514 A, copolymers described in JP 2020-041046 A, resins described in JP 2023-033156 A, resins described in JP 2023-030386 A, resins described in JP 2023-027753 A, resins described in JP 2020-139021 A, resins described in JP 2023-074038 A, resins described in JP 2023-079666 A, cardo resins described in China Patent Application Publication No. 115947929, copolymers described in JP 2024-014141 A can also be used.

[0189] The resin to be used is preferably a resin having an acid group, such as a carboxy group, a phosphate group, a sulfo group, or a phenolic hydroxy group.

[0190] The acid value of the resin having acid groups is preferably 30 to 500 mgKOH / g. The lower limit is preferably 40 mgKOH / g or more, and more preferably 50 mgKOH / g or more. The upper limit is preferably 400 mgKOH / g or less, more preferably 300 mgKOH / g or less, and even more preferably 200 mgKOH / g or less. The weight average molecular weight (Mw) of the resin having acid groups is preferably 5,000 to 100,000, and more preferably 5,000 to 50,000. The number average molecular weight (Mn) of the resin having acid groups is preferably 1,000 to 20,000.

[0191] The resin having an acid group preferably contains a repeating unit having an acid group on a side chain, and more preferably contains 5 to 70 mol% of the repeating units having an acid group on a side chain based on all repeating units of the resin. The upper limit of the content of repeating units having an acid group on a side chain is preferably 50 mol% or less, more preferably 30 mol% or less. The lower limit of the content of repeating units having an acid group on a side chain is preferably 10 mol% or more, more preferably 20 mol% or more.

[0192] For resins having acid groups, please refer to the descriptions in paragraphs

[0558] to

[0571] of JP 2012-208494 A (corresponding to paragraphs

[0685] to

[0700] of U.S. Patent Application Publication No. 2012 / 0235099 A) and paragraphs

[0076] to

[0099] of JP 2012-198408 A, the contents of which are incorporated herein by reference. Commercially available resins having acid groups can also be used. There are no particular limitations on the method for introducing acid groups into the resin, and examples include the method described in Japanese Patent No. 6,349,629 A. Furthermore, examples of methods for introducing acid groups into the resin include a method in which an acid anhydride is reacted with a hydroxy group generated by a ring-opening reaction of an epoxy group to introduce the acid group.

[0193] The photocurable composition of the present invention also preferably contains a resin having a basic group. The resin having a basic group is preferably a resin containing a repeating unit having a basic group in a side chain, more preferably a copolymer having a repeating unit having a basic group in a side chain and a repeating unit not containing a basic group, and even more preferably a block copolymer having a repeating unit having a basic group in a side chain and a repeating unit not containing a basic group. The resin having a basic group can also be used as a dispersant. The amine value of the resin having a basic group is preferably 5 to 300 mgKOH / g. The lower limit is preferably 10 mgKOH / g or more, more preferably 20 mgKOH / g or more. The upper limit is preferably 200 mgKOH / g or less, more preferably 100 mgKOH / g or less.

[0194] Commercially available resins having basic groups include DISPERBYK-161, 162, 163, 164, 166, 167, 168, 174, 182, 183, 184, 185, 2000, 2001, 2050, 2150, 2163, 2164, and BYK-LPN6919 (all manufactured by BYK-Chemie), and Solsperse 112. 00, 13240, 13650, 13940, 24000, 26000, 28000, 32000, 32500, 32550, 32600, 33000, 34750, 35100, 35200, 37500, 38500, 39000, 53095, 56000, 7100 (all manufactured by The Lubrizol Group, Japan), Efka PX 4300, 4330, 4046, 4060, 4080 (all manufactured by BASF), and the like. In addition, the resin having a basic group may be the block copolymer (B) described in paragraphs 0063 to 0112 of JP-A-2014-219665, the block copolymer A1 described in paragraphs 0046 to 0076 of JP-A-2018-156021, or the vinyl resin having a basic group described in paragraphs 0150 to 0153 of JP-A-2019-184763, the contents of which are incorporated herein by reference.

[0195] The photocurable composition of the present invention preferably contains both a resin having an acid group and a resin having a basic group. This embodiment further improves the storage stability of the photocurable composition. When a resin having an acid group and a resin having a basic group are used in combination, the content of the resin having a basic group is preferably 20 to 500 parts by mass, more preferably 30 to 300 parts by mass, and even more preferably 50 to 200 parts by mass per 100 parts by mass of the resin having an acid group.

[0196] It is also preferable to use a resin having an aromatic carboxy group as the resin. In a resin having an aromatic carboxy group, the aromatic carboxy group may be contained in the main chain of the repeating unit or may be contained in a side chain of the repeating unit. It is preferable that the aromatic carboxy group is contained in the main chain of the repeating unit. In this specification, an aromatic carboxy group refers to a group having a structure in which one or more carboxy groups are bonded to an aromatic ring. In the aromatic carboxy group, the number of carboxy groups bonded to the aromatic ring is preferably 1 to 4, and more preferably 1 to 2. Examples of resins having an aromatic carboxy group include the resins described in paragraphs 0082 to 0107 of WO 2021 / 166858.

[0197] It is also preferable to use a resin having a crosslinkable group as the resin. Examples of the crosslinkable group include an ethylenically unsaturated bond-containing group and a cyclic ether group. Examples of the ethylenically unsaturated bond-containing group include a vinyl group, an allyl group, a (meth)acryloyl group, and a styrene group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. When a resin having a crosslinkable group is used, the content of the resin having the crosslinkable group in the resin contained in the photocurable composition is preferably 30% by mass or more, more preferably 50% by mass or more, and even more preferably 70% by mass or more.

[0198] The resin preferably contains a graft resin. Examples of the graft resin include a resin having a repeating unit with a graft chain. In this specification, the term "graft chain" refers to a polymer chain that branches off from the main chain of the repeating unit. The graft chain preferably has 40 to 10,000 atoms excluding hydrogen atoms, more preferably 50 to 2,000 atoms excluding hydrogen atoms, and even more preferably 60 to 500 atoms excluding hydrogen atoms.

[0199] The graft chain preferably contains a repeating unit of at least one structure selected from the group consisting of a polyester structure, a polyether structure, a poly(meth)acrylic structure, a polystyrene structure, a polyurethane structure, a polyurea structure, and a polyamide structure, more preferably contains a repeating unit of at least one structure selected from the group consisting of a polyester structure, a polyether structure, a poly(meth)acrylic structure, and a polystyrene structure, even more preferably contains a repeating unit of at least one structure selected from the group consisting of a polyester structure, a polyether structure, and a poly(meth)acrylic structure, still more preferably contains a repeating unit of a polyester structure or a polyether structure, and particularly preferably contains a repeating unit of a polyester structure.

[0200] When a pigment-containing colorant is used, the photocurable composition of the present invention preferably also contains a resin as a dispersant. The content of the dispersant is preferably 1 to 45 parts by mass per 100 parts by mass of the pigment. The upper limit is preferably 40 parts by mass or less, and more preferably 35 parts by mass or less. The lower limit is preferably 5 parts by mass or more, and more preferably 10 parts by mass or more.

[0201] Examples of dispersants include acidic dispersants (acidic resins) and basic dispersants (basic resins). Here, the term "acidic dispersant (acidic resin)" refers to a resin in which the amount of acid groups is greater than the amount of basic groups. As the acidic dispersant (acidic resin), a resin in which the amount of acid groups is 70 mol% or more is preferred, assuming that the total amount of acid groups and basic groups is 100 mol%. The acid group possessed by the acidic dispersant (acidic resin) is preferably a carboxy group. The acid value of the acidic dispersant (acidic resin) is preferably 10 to 105 mgKOH / g. Furthermore, the term "basic dispersant (basic resin)" refers to a resin in which the amount of basic groups is greater than the amount of acid groups. As the basic dispersant (basic resin), a resin in which the amount of basic groups is greater than 50 mol% is preferred, assuming that the total amount of acid groups and basic groups is 100 mol%. The basic group possessed by the basic dispersant is preferably an amino group.

[0202] The resin used as the dispersant is preferably a graft resin, and is preferably a resin having an aromatic carboxy group.

[0203] The resin used as the dispersant is preferably a polyimine-based dispersant containing a nitrogen atom in at least one of the main chain and the side chain. The polyimine-based dispersant is preferably a resin having a main chain with a partial structure having a functional group with a pKa of 14 or less, and a side chain having 40 to 10,000 atoms, and having a basic nitrogen atom in at least one of the main chain and the side chain. There are no particular restrictions on the basic nitrogen atom, as long as it is a nitrogen atom that exhibits basicity. For details about polyimine-based dispersants, please refer to the descriptions in paragraphs 0102 to 0166 of JP 2012-255128 A, the contents of which are incorporated herein by reference.

[0204] The resin used as a dispersant is preferably a resin having a structure in which multiple polymer chains are bonded to a core portion. Examples of such resins include dendrimers (including star-shaped polymers). Specific examples of dendrimers include polymer compounds C-1 to C-31 described in paragraphs 0196 to 0209 of JP-A-2013-043962.

[0205] The resin used as a dispersant is also preferably a resin containing a repeating unit having an ethylenically unsaturated bond-containing group in a side chain. The content of the repeating unit having an ethylenically unsaturated bond-containing group in a side chain is preferably 10 mol % or more, more preferably 10 to 80 mol %, and even more preferably 20 to 70 mol %, of all repeating units of the resin.

[0206] As the dispersant, the resin described in JP 2018-087939 A, the block copolymers (EB-1) to (EB-9) described in paragraphs 0219 to 0221 of Japanese Patent No. 6432077 A, polyethyleneimine having a polyester side chain described in WO 2016 / 104803, block copolymers described in WO 2019 / 125940 A, block polymers having an acrylamide structural unit described in JP 2020-066687 A, block polymers having an acrylamide structural unit described in JP 2020-066688 A, dispersants described in WO 2016 / 104803, and the like can also be used.

[0207] Dispersants are also available as commercially available products, and specific examples thereof include the DISPERBYK series manufactured by BYK Chemie, the SOLSPERSE series manufactured by Lubrizol Japan, the Efka series manufactured by BASF, and the AJISPER series manufactured by Ajinomoto Fine-Techno Co., Ltd. In addition, the products described in paragraph 0129 of JP 2012-137564 A and the products described in paragraph 0235 of JP 2017-194662 A can also be used as dispersants.

[0208] The resin content of the photocurable composition is preferably 1 to 50% by mass of the total solid content. The upper limit is preferably 40% by mass or less, more preferably 30% by mass or less. The lower limit is preferably 5% by mass or more, more preferably 10% by mass or more.

[0209] The content of the polymerizable monomer in the total of the resin as a binder and the polymerizable monomer is preferably 10% by mass or more, more preferably 20% by mass or more, and even more preferably 30% by mass or more, and the upper limit can be set to 100% by mass or less, or can be set to 95% by mass or less.

[0210] The curable composition of the present invention may contain only one type of resin or may contain two or more types of resins. When two or more types of resins are contained, the total amount thereof is preferably within the above range.

[0211] <<Chain Transfer Agent>> The photocurable composition of the present invention may contain a chain transfer agent. Examples of the chain transfer agent include a thiol compound, a thiocarbonylthio compound, and an aromatic α-methylalkenyl dimer, and a thiol compound is preferred. Examples of the chain transfer agent include the compounds described in paragraphs 0093 to 0113 of WO 2019 / 188652.

[0212] The thiol compound used as a chain transfer agent is a compound having one or more thiol groups, preferably a compound having two or more thiol groups. The upper limit of the number of thiol groups contained in the thiol compound is preferably 10 or less, more preferably 6 or less, and even more preferably 4 or less. The thiol compound is particularly preferably a compound having two thiol groups.

[0213] The thiol compound is preferably a compound represented by the following formula (SH-1): Ｓ１ - (SH) ｎ Formula (SH-1) (wherein SH represents a thiol group, L １ represents an n-valent group, where n is an integer of 1 or more.

[0214] L in formula (SH-1) Ｓ１ The n-valent group represented by is a hydrocarbon group, a heterocyclic group, —O—, —S—, —NR Ｓ１ -, -CO-, -COO-, -OCO-, -SO ２ - or a group consisting of a combination thereof. Ｓ１represents a hydrogen atom, an alkyl group, or an aryl group, with a hydrogen atom being preferred. The hydrocarbon group may be an aliphatic hydrocarbon group or an aromatic hydrocarbon group. The aliphatic hydrocarbon group may be cyclic or acyclic. The aliphatic hydrocarbon group may be a saturated aliphatic hydrocarbon group or an unsaturated aliphatic hydrocarbon group. The hydrocarbon group may have a substituent or may not have a substituent. The cyclic aliphatic hydrocarbon group and the aromatic hydrocarbon group may be a monocyclic or fused ring. The heterocyclic group may be a monocyclic or fused ring. The heterocyclic group is preferably a 5- or 6-membered ring. The heterocyclic group may be an aliphatic heterocyclic group or an aromatic heterocyclic group. Examples of heteroatoms constituting the heterocyclic group include a nitrogen atom, an oxygen atom, and a sulfur atom. L １ The number of carbon atoms constituting the group is preferably 3 to 100, and more preferably 6 to 50.

[0215] In formula (SH-1), n ​​represents an integer of 1 or more. The upper limit of n is preferably 10 or less, more preferably 6 or less, and even more preferably 4 or less. The lower limit of n is preferably 2 or more.

[0216] Specific examples of thiol compounds include the compounds described in paragraphs 0100 to 0103 of WO 2019 / 188652. Commercially available thiol compounds include PEMP (manufactured by SC Organic Chemical Co., Ltd.), Suncera M (manufactured by Sanshin Chemical Industry Co., Ltd.), Karenz MTBD1, Karenz MTPE1, Karenz MTNR1, and Karenz MTTPMB (all manufactured by Resonac Corporation). The thiol compounds described in JP 2020-109068 A can also be used as chain transfer agents.

[0217] The molecular weight of the chain transfer agent is preferably 200 or more. The upper limit is preferably 1000 or less, more preferably 800 or less, and even more preferably 600 or less, because the SH valence per weight can be increased.

[0218] The content of the chain transfer agent in the total solid content of the photocurable composition is preferably 0.001 to 5% by mass. The upper limit is preferably 3% by mass or less, and more preferably 1% by mass or less. The lower limit is preferably 0.05% by mass or more, and more preferably 0.01% by mass or more. Only one type of chain transfer agent may be used, or two or more types may be used. When two or more types are used, the total amount thereof preferably falls within the above range.

[0219] <<Polyalkyleneimine>> The photocurable composition of the present invention can contain a polyalkyleneimine. The polyalkyleneimine is used, for example, as a dispersing aid for pigments. A dispersing aid is a material for improving the dispersibility of coloring materials such as pigments in a photocurable composition. The polyalkyleneimine is a polymer obtained by ring-opening polymerization of an alkyleneimine. The polyalkyleneimine is preferably a polymer having a branched structure containing a primary amino group, a secondary amino group, and a tertiary amino group. The alkyleneimine preferably has 2 to 6 carbon atoms, more preferably 2 to 4 carbon atoms, even more preferably 2 or 3 carbon atoms, and particularly preferably 2 carbon atoms.

[0220] The molecular weight of the polyalkyleneimine is preferably 200 or more, more preferably 250 or more. The upper limit is preferably 100,000 or less, more preferably 50,000 or less, even more preferably 10,000 or less, and particularly preferably 2,000 or less. Regarding the molecular weight value of the polyalkyleneimine, if the molecular weight can be calculated from the structural formula, the molecular weight of the polyalkyleneimine is the value calculated from the structural formula. On the other hand, if the molecular weight of the specific amine compound cannot be calculated from the structural formula or calculation is difficult, the number average molecular weight value measured by the boiling point elevation method is used. If the number average molecular weight cannot be measured by the boiling point elevation method or is difficult to measure, the number average molecular weight value measured by the viscosity method is used. If the number average molecular weight cannot be measured by the viscosity method or is difficult to measure, the number average molecular weight value measured in terms of polystyrene by GPC (gel permeation chromatography) is used.

[0221] The amine value of the polyalkyleneimine is preferably 5 mmol / g or more, more preferably 10 mmol / g or more, and even more preferably 15 mmol / g or more.

[0222] Specific examples of alkyleneimines include ethyleneimine, propyleneimine, 1,2-butyleneimine, and 2,3-butyleneimine, with ethyleneimine or propyleneimine being preferred, and ethyleneimine being more preferred. It is particularly preferred that the polyalkyleneimine be polyethyleneimine. Furthermore, the polyethyleneimine preferably contains primary amino groups in an amount of 10 mol% or more, more preferably 20 mol% or more, and even more preferably 30 mol% or more, based on the total of primary amino groups, secondary amino groups, and tertiary amino groups. Commercially available polyethyleneimines include Epomin SP-003, SP-006, SP-012, SP-018, SP-200, and P-1000 (all manufactured by Nippon Shokubai Co., Ltd.).

[0223] The content of the polyalkyleneimine in the total solids content of the photocurable composition is preferably 0.1 to 5% by mass. The lower limit is preferably 0.2% by mass or more, more preferably 0.5% by mass or more, and even more preferably 1% by mass or more. The upper limit is preferably 4.5% by mass or less, more preferably 4% by mass or less, and even more preferably 3% by mass or less. The content of the polyalkyleneimine is preferably 0.5 to 20 parts by mass per 100 parts by mass of the pigment. The lower limit is preferably 0.6 parts by mass or more, more preferably 1 part by mass or more, and even more preferably 2 parts by mass or more. The upper limit is preferably 10 parts by mass or less, and even more preferably 8 parts by mass or less. Only one type of polyalkyleneimine may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

[0224] <<Compound Having a Cyclic Ether Group>> The photocurable composition of the present invention can contain a compound having a cyclic ether group. Examples of the cyclic ether group include an epoxy group and an oxetanyl group. The epoxy group may be an alicyclic epoxy group. The alicyclic epoxy group refers to a monovalent functional group having a cyclic structure in which an epoxy ring and a saturated hydrocarbon ring are condensed. The compound having a cyclic ether group is preferably a compound having an epoxy group (hereinafter also referred to as an epoxy compound). Examples of epoxy compounds include compounds having one or more epoxy groups per molecule, and compounds having two or more epoxy groups are preferred. The epoxy compound is preferably a compound having 1 to 100 epoxy groups per molecule. The upper limit of the number of epoxy groups contained in the epoxy compound can be, for example, 10 or less, or 5 or less. The lower limit of the number of epoxy groups contained in the epoxy compound is preferably 2 or more.

[0225] Examples of compounds having a cyclic ether group include the compounds described in paragraphs 0034 to 0036 of JP-A-2013-011869, paragraphs 0147 to 0156 of JP-A-2014-043556, and paragraphs 0085 to 0092 of JP-A-2014-089408, compounds described in JP-A-2017-179172, xanthene-type epoxy resins described in JP-A-2021-195421, and xanthene-type epoxy resins described in JP-A-2021-195422.

[0226] The compound having a cyclic ether group may be a low molecular weight compound (for example, a molecular weight of less than 2000, or even less than 1000) or a high molecular weight compound (macromolecule) (for example, a molecular weight of 1000 or more, and in the case of a polymer, a weight average molecular weight of 1000 or more). The weight average molecular weight of the compound having a cyclic ether group is preferably 200 to 100,000, and more preferably 500 to 50,000. The upper limit of the weight average molecular weight is preferably 10,000 or less, more preferably 5,000 or less, and even more preferably 3,000 or less.

[0227] Commercially available examples of compounds having a cyclic ether group include EHPE3150 (manufactured by Daicel Corporation), EPICLON N-695 (manufactured by DIC Corporation), Marproof G-0150M, G-0105SA, G-0130SP, G-0250SP, G-1005S, G-1005SA, G-1010S, G-2050M, G-01100, and G-01758 (all manufactured by NOF Corporation, epoxy group-containing polymers).

[0228] The content of the compound having a cyclic ether group in the total solid content of the photocurable composition is preferably 0.1 to 20% by mass. The lower limit is preferably 0.5% by mass or more, and more preferably 1% by mass or more. The upper limit is preferably 15% by mass or less, and more preferably 10% by mass or less. Only one type of compound having a cyclic ether group may be used, or two or more types may be used. When two or more types are used, the total amount thereof preferably falls within the above range.

[0229] <<UV Absorber>> The photocurable composition of the present invention may contain an UV absorber. Examples of UV absorbers include conjugated diene compounds, aminodiene compounds, salicylate compounds, benzophenone compounds, benzotriazole compounds, acrylonitrile compounds, hydroxyphenyltriazine compounds, indole compounds, triazine compounds, and dibenzoyl compounds. Specific examples of such compounds include the compounds described in paragraph 0179 of WO 2022 / 085485, the reactive triazine UV absorbers described in JP 2021-178918 A, the UV absorbers described in JP 2022-007884 A, the compounds described in Korean Patent Publication No. 10-2022-0014454, the compounds described in JP 2023-013321 A, and the compounds described in JP 2023-178225 A can also be used. The content of the ultraviolet absorber in the total solid content of the photocurable composition is preferably 0.01 to 10 mass %, more preferably 0.01 to 5 mass %. Only one type of ultraviolet absorber may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is in the above range.

[0230] <<Polymerization Inhibitor>> The photocurable composition of the present invention may contain a polymerization inhibitor. Examples of polymerization inhibitors include hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, pyrogallol, tert-butylcatechol, benzoquinone, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl-6-t-butylphenol), and N-nitrosophenylhydroxyamine salts (ammonium salts, cerous salts, etc.). Of these, p-methoxyphenol is preferred. The content of the polymerization inhibitor in the total solids content of the photocurable composition is preferably 0.0001 to 5 mass%. One type of polymerization inhibitor may be used alone, or two or more types may be used. When two or more types are used, the total amount preferably falls within the above range.

[0231] <<Silane Coupling Agent>> The photocurable composition of the present invention may contain a silane coupling agent. Examples of the silane coupling agent include silane compounds having a hydrolyzable group, and preferably silane compounds having both a hydrolyzable group and another functional group. The hydrolyzable group refers to a substituent directly bonded to a silicon atom that can form a siloxane bond by at least one of a hydrolysis reaction and a condensation reaction. Examples of the hydrolyzable group include a halogen atom, an alkoxy group, and an acyloxy group, with an alkoxy group being preferred. That is, the silane coupling agent is preferably a compound having an alkoxysilyl group. Examples of functional groups other than the hydrolyzable group include a vinyl group, a (meth)allyl group, a (meth)acryloyl group, a thiol group, an epoxy group, an oxetanyl group, an amino group, a ureido group, a sulfide group, an isocyanate group, and a phenyl group, with an amino group, a (meth)acryloyl group, and an epoxy group being preferred. Specific examples of the silane coupling agent include the compound described in paragraph 0177 of WO 2022 / 085485 and the compound described in JP 2019-183020 A. The content of the silane coupling agent in the total solid content of the photocurable composition is preferably 0.1 to 15% by mass. The upper limit is preferably 10% by mass or less, more preferably 5% by mass or less. The lower limit is preferably 0.5% by mass or more, more preferably 1% by mass or more. Only one type of silane coupling agent may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount be in the above range.

[0232] <<Surfactant>> The photocurable composition of the present invention may contain a surfactant. As the surfactant, various surfactants such as a fluorine-based surfactant, a nonionic surfactant, a cationic surfactant, an anionic surfactant, and a silicone-based surfactant may be used. The surfactant is preferably a silicone-based surfactant or a fluorine-based surfactant, and more preferably a silicone-based surfactant. For details of the surfactant, reference may be made to the surfactants described in paragraphs 0238 to 0245 of WO 2015 / 166779, the contents of which are incorporated herein by reference.

[0233] As the fluorine-based surfactant, the compounds described in paragraphs 0167 to 0173 of WO 2022 / 085485 can be used.

[0234] Examples of nonionic surfactants include the compounds described in paragraph 0174 of WO 2022 / 085485.

[0235] Silicone surfactants include DOWSIL SH8400, SH8400 FLUID, FZ-2122, 67 Additive, 74 Additive, M Additive, and SF 8419. OIL (all manufactured by Dow Toray Industries, Inc.), TSF-4300, TSF-4445, TSF-4460, TSF-4452 (all manufactured by Momentive Performance Materials), KP-341, KF-6000, KF-6001, KF-6002, KF-6003 (all manufactured by Shin-Etsu Chemical Co., Ltd.), BYK-307, BYK-322, BYK-323, BYK-330, BYK-333, BYK-3760, BYK-UV3510 (all manufactured by BYK-Chemie). Furthermore, compounds having the following structure can also be used as the silicone surfactant.

[0236] The content of the surfactant in the total solid content of the photocurable composition is preferably 0.001% by mass to 5.0% by mass, more preferably 0.005% by mass to 3.0% by mass. Only one type of surfactant may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount is in the above range.

[0237] <<Antioxidant>> The photocurable composition of the present invention may contain an antioxidant. Examples of the antioxidant include phenolic antioxidants, amine antioxidants, phosphorus-based antioxidants, and sulfur-based antioxidants. Examples of the phenolic antioxidant include hindered phenol compounds. The phenolic antioxidant is preferably a compound having a substituent at the position adjacent to the phenolic hydroxy group (ortho position). The substituent is preferably a substituted or unsubstituted alkyl group having 1 to 22 carbon atoms. The antioxidant is also preferably a compound having a phenol group and a phosphite ester group in the same molecule. Examples of phosphorus-based antioxidants include tris[2-[[2,4,8,10-tetrakis(1,1-dimethylethyl)dibenzo[d,f][1,3,2]dioxaphosphepin-6-yl]oxy]ethyl]amine, tris[2-[(4,6,9,11-tetra-tert-butyldibenzo[d,f][1,3,2]dioxaphosphepin-2-yl)oxy]ethyl]amine, ethyl bis(2,4-di-tert-butyl-6-methylphenyl)phosphite, and tris(2,4-di-tert-butylphenyl)phosphite. Commercially available antioxidants include, for example, ADK STAB AO-20, ADK STAB AO-30, ADK STAB AO-40, ADK STAB AO-50, ADK STAB AO-50F, ADK STAB AO-60, ADK STAB AO-60G, ADK STAB AO-80, ADK STAB AO-330 (manufactured by ADEKA Corporation), and JP-650 (manufactured by Johoku Chemical Industry Co., Ltd.). Antioxidants include the compounds described in paragraphs 0023 to 0048 of Japanese Patent No. 6268967, the compounds described in WO 2017 / 006600, the compounds described in WO 2017 / 164024, and the compounds described in Korean Patent Publication No. 10-2019-0059371. The content of the antioxidant in the total solid content of the photocurable composition is preferably 0.01 to 20 mass %, more preferably 0.3 to 15 mass %. Only one type of antioxidant may be used, or two or more types may be used. When two or more types are used, it is preferable that the total amount thereof is within the above range.

[0238] <<Other Components>> The photocurable composition of the present invention may contain, as necessary, a sensitizer, a plasticizer, and other auxiliaries (e.g., conductive particles, fillers, antifoaming agents, flame retardants, leveling agents, release promoters, fragrances, surface tension modifiers, chain transfer agents, etc.). By appropriately incorporating these components, properties such as film physical properties can be adjusted. As these components, the compound described in paragraph 0182 of WO 2022 / 085485, the compound having two or more triethoxysilyl groups described in JP 2023-180607 A, and the like can be used.

[0239] The photocurable composition of the present invention may contain a metal oxide in order to adjust the refractive index of the resulting film. Examples of the metal oxide include TiO ２ , ZrO ２ , Al ２ O ３ , SiO ２ The primary particle size of the metal oxide is preferably 1 to 100 nm, more preferably 3 to 70 nm, and even more preferably 5 to 50 nm. The metal oxide may have a core-shell structure. In this case, the core may be hollow.

[0240] The photocurable composition of the present invention may contain a light resistance improver. Examples of the light resistance improver include the compounds described in paragraph 0183 of WO 2022 / 085485.

[0241] It is also preferable that the photocurable composition of the present invention is substantially free of terephthalic acid esters. Here, "substantially free" means that the content of terephthalic acid esters in the total amount of the photocurable composition is 1,000 ppb by mass or less, more preferably 100 ppb by mass or less, and particularly preferably zero.

[0242] In view of environmental regulations, the photocurable composition of the present invention preferably has a melamine content of 10,000 ppm by mass or less.

[0243] The photocurable composition of the present invention preferably has a free metal content of 100 ppm or less, more preferably 50 ppm or less. The free halogen content is preferably 100 ppm or less, more preferably 50 ppm or less. Methods for reducing the free metals and halogens in the photocurable composition include washing with ion-exchanged water, filtration, ultrafiltration, and purification with ion-exchange resins.

[0244] From the standpoint of environmental regulations, the use of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts may be restricted. When the content of the above-mentioned compounds in the photocurable composition of the present invention is reduced, the content of perfluoroalkyl sulfonic acids (particularly perfluoroalkyl sulfonic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts, and perfluoroalkyl carboxylic acids (particularly perfluoroalkyl carboxylic acids having a perfluoroalkyl group with 6 to 8 carbon atoms) and their salts is preferably in the range of 0.01 ppb to 1000 ppb, more preferably in the range of 0.05 ppb to 500 ppb, and even more preferably in the range of 0.1 ppb to 300 ppb, relative to the total solids content of the photocurable composition. The photocurable composition of the present invention may be substantially free of perfluoroalkyl sulfonic acids and their salts, and perfluoroalkyl carboxylic acids and their salts. For example, by using a compound that can replace perfluoroalkyl sulfonic acid and its salt, and a compound that can replace perfluoroalkyl carboxylic acid and its salt, a photocurable composition that is substantially free of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt may be selected. Examples of compounds that can replace restricted compounds include compounds that are exempt from restrictions due to differences in the number of carbon atoms in the perfluoroalkyl group. However, the above does not preclude the use of perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt. The photocurable composition of the present invention may contain perfluoroalkyl sulfonic acid and its salt, and perfluoroalkyl carboxylic acid and its salt, within the maximum allowable range.

[0245] The water content of the photocurable composition of the present invention is usually 3% by mass or less, preferably 0.01 to 1.5% by mass, and more preferably 0.1 to 1.0% by mass. The water content can be measured by the Karl Fischer method.

[0246] The photocurable composition of the present invention can be used by adjusting its viscosity for the purposes of adjusting the film surface state (flatness, etc.), film thickness, etc. The viscosity value can be appropriately selected as needed, but is preferably 0.3 mPa·s to 50 mPa·s, and more preferably 0.5 mPa·s to 20 mPa·s at 25°C. The viscosity can be measured, for example, using a cone-plate type viscometer at a temperature adjusted to 25°C.

[0247] <<Storage Container>> The container for storing the photocurable composition is not particularly limited, and any known container can be used. Furthermore, the container described in paragraph 0187 of WO 2022 / 085485 can be used as the storage container.

[0248] <Method for preparing photocurable composition> The photocurable composition of the present invention can be prepared by mixing the above-mentioned components. When preparing the photocurable composition, all components may be simultaneously dissolved and / or dispersed in a solvent to prepare the photocurable composition, or, if necessary, each component may be prepared as two or more appropriate solutions or dispersions, which are mixed at the time of use (application) to prepare the photocurable composition.

[0249] The preparation of the photocurable composition preferably includes a process for dispersing the pigment. In the process for dispersing the pigment, mechanical forces used to disperse the pigment include compression, squeezing, impact, shear, and cavitation. Specific examples of these processes include a bead mill, a sand mill, a roll mill, a ball mill, a paint shaker, a microfluidizer, a high-speed impeller, a sand grinder, a flow jet mixer, high-pressure wet atomization, and ultrasonic dispersion. Furthermore, when grinding the pigment in a sand mill (bead mill), it is preferable to use small-diameter beads, increase the bead packing ratio, or otherwise increase the grinding efficiency under such conditions. Furthermore, it is preferable to remove coarse particles after the grinding process by filtration, centrifugation, or the like. In addition, the process and disperser for dispersing pigments can be suitably used, for example, the process and disperser described in "Dispersion Technology Encyclopedia," published by Joho Kiko Co., Ltd., July 15, 2005, or "Comprehensive Data Collection of Dispersion Technology and Industrial Applications Focused on Suspension (Solid / Liquid Dispersion System)," published by the Management Development Center Publishing Department, October 10, 1978, or paragraph 0022 of JP 2015-157893 A. In addition, in the process for dispersing pigments, particle refinement may be performed in a salt milling process. For details of the materials, equipment, processing conditions, etc. used in the salt milling process, see, for example, JP 2015-194521 A and JP 2012-046629 A. Examples of materials for beads used in dispersion include zirconia, agate, quartz, titania, tungsten carbide, silicon nitride, alumina, stainless steel, and glass. The beads may also be made of an inorganic compound having a Mohs hardness of at least 2. The photocurable composition may contain 1 to 10,000 ppm of the beads.

[0250] When preparing the photocurable composition, it is preferable to filter the photocurable composition with a filter for the purpose of removing foreign matter, reducing defects, etc. Examples of the types of filters and filtration methods used for filtration include the filters and filtration methods described in paragraphs 0196 to 0199 of WO 2022 / 085485.

[0251] <Film> The film of the present invention is a film obtained by curing the above-described photocurable composition of the present invention. The film of the present invention can be used for optical filters such as color filters, infrared transmission filters, and infrared cut filters.

[0252] The thickness of the film of the present invention can be adjusted appropriately depending on the purpose. For example, the thickness is preferably 20 μm or less, more preferably 10 μm or less, and even more preferably 5 μm or less. The lower limit of the thickness is preferably 0.1 μm or more, more preferably 0.2 μm or more, and even more preferably 0.3 μm or more.

[0253] When the film of the present invention is used as a color filter, the film of the present invention preferably has a green, red, blue, cyan, magenta, or yellow hue. The film of the present invention can also be preferably used as a color pixel of a color filter. Examples of the color pixel include a red pixel, a green pixel, a blue pixel, a magenta pixel, a cyan pixel, and a yellow pixel.

[0254] <Pixel Manufacturing Method> A pixel manufacturing method using the photocurable composition of the present invention will be described. The pixel manufacturing method includes the steps of forming a composition layer on a support using the photocurable composition of the present invention, exposing the composition layer to light in a pattern, and developing and removing the unexposed areas of the composition layer. If necessary, a step of drying the composition layer (pre-baking step) and a step of heat-treating the developed pattern (pixel) (post-baking step) may also be provided.

[0255] In the step of forming a composition layer, a composition layer is formed on a support using the photocurable composition of the present invention. The support is not particularly limited and can be appropriately selected depending on the application. Examples include a glass substrate and a silicon substrate, with a silicon substrate being preferred. The silicon substrate may also be formed with a charge-coupled device (CCD), a complementary metal-oxide semiconductor (CMOS), a transparent conductive film, or the like. A black matrix is ​​sometimes formed on the silicon substrate to isolate each pixel. The silicon substrate may also be provided with an underlayer to improve adhesion with an upper layer, prevent diffusion of substances, or flatten the substrate surface. The surface contact angle of the underlayer is preferably 20 to 70° when measured with diiodomethane. It is also preferably 30 to 80° when measured with water.

[0256] Known methods can be used as the coating method for the photocurable composition. For example, a dropping method (drop casting); a slit coating method; a spray method; a roll coating method; a rotary coating method (spin coating); a casting coating method; a slit and spin method; a pre-wetting method (for example, the method described in JP 2009-145395 A); inkjet (for example, on-demand method, piezo method, thermal method), various printing methods such as nozzle jet ejection printing, flexographic printing, screen printing, gravure printing, reverse offset printing, metal mask printing; a transfer method using a mold or the like; a nanoimprint method, etc. can be mentioned. In addition, the coating method described in paragraph 0207 of WO 2022 / 085485 A can also be used.

[0257] The composition layer formed on the support may be dried (prebaked). When a film is produced by a low-temperature process, prebaking may not be performed. When prebaking is performed, the prebaking temperature is preferably 150°C or lower, more preferably 120°C or lower, and even more preferably 110°C or lower. The lower limit can be, for example, 50°C or higher, or can also be 80°C or higher. The prebaking time is preferably 10 to 300 seconds, more preferably 40 to 250 seconds, and even more preferably 80 to 220 seconds. Prebaking can be performed using a hot plate, an oven, or the like.

[0258] Next, the composition layer is exposed to light in a pattern (exposure step). For example, the composition layer can be exposed to light in a pattern by using a stepper exposure machine, a scanner exposure machine, or the like, through a mask having a predetermined mask pattern. This allows the exposed portion to be cured.

[0259] Examples of radiation (light) that can be used for exposure include g-line and i-line. Light with a wavelength of 150 to 300 nm can also be used. Examples of light with a wavelength of 150 to 300 nm include KrF line (wavelength 248 nm) and ArF line (wavelength 193 nm), with KrF line (wavelength 248 nm) being preferred. Light with a wavelength of 150 to 300 nm is preferably excimer laser light with a wavelength of 150 to 300 nm. A long-wavelength light source of 300 nm or more can also be used for exposure.

[0260] The exposure may be performed by continuous irradiation with light or by pulsed irradiation (pulse exposure), which is an exposure method in which light is repeatedly irradiated and paused in a short cycle (for example, on the order of milliseconds or less).

[0261] The irradiation amount (exposure amount) is, for example, 0.03 to 2.5 J / cm ２ is preferred, and 0.05 to 1.0 J / cm ２ The oxygen concentration during exposure can be appropriately selected. In addition to being performed in the atmosphere, exposure may be performed in a low-oxygen atmosphere with an oxygen concentration of 19% by volume or less (e.g., 15% by volume, 5% by volume, or substantially oxygen-free), or in a high-oxygen atmosphere with an oxygen concentration of more than 21% by volume (e.g., 22% by volume, 30% by volume, or 50% by volume). The exposure illuminance can be appropriately set, and is usually 1000 W / m ２ ~100000W / m ２ (For example, 5000 W / m ２ , 15000W / m ２ , or 35,000 W / m ２ The oxygen concentration and exposure illuminance may be appropriately combined. For example, an oxygen concentration of 10% by volume and an illuminance of 10,000 W / m ２, oxygen concentration 35% by volume, illuminance 20,000 W / m ２ etc.

[0262] Next, the unexposed portions of the composition layer are developed and removed to form a pattern (pixels). The unexposed portions of the composition layer can be developed and removed using a developer. As a result, the unexposed portions of the composition layer in the exposure step are dissolved into the developer, leaving only the photocured portions. The temperature of the developer is preferably, for example, 20 to 30°C. The development time is preferably 20 to 180 seconds. In addition, to improve residue removability, the process of shaking off the developer every 60 seconds and then supplying fresh developer may be repeated several times.

[0263] Examples of the developer include organic solvents and alkaline developers, and alkaline developers are preferably used. Regarding the developer and the washing (rinsing) method after development, the developer and washing method described in paragraph 0214 of WO 2022 / 085485 can be used.

[0264] After development and drying, it is preferable to perform additional exposure treatment or heating treatment (post-baking). The additional exposure treatment or post-baking is a post-development curing treatment to ensure complete curing. The heating temperature in post-baking is, for example, preferably 100 to 300°C, more preferably 200 to 270°C. Post-baking can be performed continuously or batchwise using a heating means such as a hot plate, convection oven (hot air circulation dryer), or high-frequency heater to achieve the above conditions for the developed film. When additional exposure treatment is performed, it is preferable that the light used for exposure has a wavelength of 400 nm or less. The additional exposure treatment may also be performed by the method described in Korean Patent Publication No. 10-2017-0122130.

[0265] <Optical Filter> The optical filter of the present invention includes the above-described film of the present invention. Types of optical filters include color filters, infrared cut filters, and infrared transmission filters, and a color filter is preferred. The color filter preferably has the film of the present invention as its pixel, and more preferably has the film of the present invention as a colored pixel.

[0266] The optical filter may have a protective layer provided on the surface of the film of the present invention. By providing a protective layer, various functions can be imparted, such as oxygen blocking, low reflectivity, hydrophilicity / hydrophobicity, and blocking of light of specific wavelengths (ultraviolet rays, infrared rays, etc.). The thickness of the protective layer is preferably 0.01 to 10 μm, more preferably 0.1 to 5 μm. Methods for forming the protective layer include a method of applying a resin composition for forming the protective layer, a chemical vapor deposition method, and a method of attaching a molded resin with an adhesive. Components constituting the protective layer include (meth)acrylic resin, ene-thiol resin, polycarbonate resin, polyether resin, polyarylate resin, polysulfone resin, polyethersulfone resin, polyphenylene resin, polyarylene ether phosphine oxide resin, polyimide resin, polyamideimide resin, polyolefin resin, cyclic olefin resin, polyester resin, styrene resin, polyol resin, polyvinylidene chloride resin, melamine resin, urethane resin, aramid resin, polyamide resin, alkyd resin, epoxy resin, modified silicone resin, fluororesin, polyacrylonitrile resin, cellulose resin, Si, C, W, Al ２ O ３ , Mo, SiO ２ , Si ２ N ４ For example, in the case of a protective layer intended to block oxygen, the protective layer may contain a polyol resin and SiO ２ and Si ２ N ４ In the case of a protective layer intended to reduce reflection, the protective layer preferably contains a (meth)acrylic resin and a fluorine resin.

[0267] When forming a protective layer by applying a resin composition, known methods such as spin coating, casting, screen printing, and inkjet printing can be used as the method for applying the resin composition. Known organic solvents (e.g., propylene glycol 1-monomethyl ether 2-acetate, cyclopentanone, ethyl lactate, etc.) can be used as the organic solvent contained in the resin composition. When forming the protective layer by chemical vapor deposition, known chemical vapor deposition methods (thermal chemical vapor deposition, plasma chemical vapor deposition, photochemical vapor deposition) can be used as the chemical vapor deposition method.

[0268] The protective layer may contain additives such as organic or inorganic fine particles, absorbers for light of specific wavelengths (e.g., ultraviolet light, infrared light, etc.), refractive index adjusters, antioxidants, adhesives, and surfactants, as needed. Examples of organic or inorganic fine particles include polymeric fine particles (e.g., silicone resin fine particles, polystyrene fine particles, and melamine resin fine particles), titanium oxide, zinc oxide, zirconium oxide, indium oxide, aluminum oxide, titanium nitride, titanium oxynitride, magnesium fluoride, hollow silica, silica, calcium carbonate, and barium sulfate. Known absorbers for light of specific wavelengths can be used. The content of these additives can be adjusted as appropriate, but is preferably 0.1 to 70% by mass, and more preferably 1 to 60% by mass, of the total mass of the protective layer.

[0269] As the protective layer, the protective layers described in paragraphs 0073 to 0092 of JP-A-2017-151176 can also be used.

[0270] The optical filter may have a structure in which each pixel is embedded in a space partitioned by partition walls, for example, in a grid pattern.

[0271] <Solid-state imaging device> The solid-state imaging device of the present invention has the above-described film of the present invention. The configuration of the solid-state imaging device is not particularly limited as long as it has the film of the present invention and functions as a solid-state imaging device, but examples thereof include the following configurations.

[0272] The substrate includes a plurality of photodiodes constituting a light-receiving area of ​​a solid-state imaging device (such as a CCD (charge-coupled device) image sensor or a CMOS (complementary metal-oxide semiconductor) image sensor) and transfer electrodes made of polysilicon or the like. A light-shielding film is formed on the photodiodes and transfer electrodes, with only the light-receiving portions of the photodiodes exposed. A device protection film made of silicon nitride or the like is formed on the light-shielding film so as to cover the entire light-shielding film and the light-receiving portions of the photodiodes. A color filter is also provided on the device protection film. Furthermore, the device protection film may include a light-collecting means (e.g., a microlens, etc.; the same applies hereinafter) below the color filter (on the side closer to the substrate), or on the color filter. The color filter may have a structure in which each color pixel is embedded in a space partitioned by partition walls, for example, in a grid pattern. In this case, the partition walls preferably have a lower refractive index than the color pixels. Examples of imaging devices having such a structure include those described in JP 2012-227478 A, JP 2014-179577 A, and WO 2018 / 043654 A. Furthermore, as shown in JP 2019-211559 A, an ultraviolet absorbing layer may be provided within the structure of the solid-state imaging element to improve light resistance. An imaging device equipped with the solid-state imaging element of the present invention can be used for digital cameras, electronic devices with imaging functions (such as mobile phones), as well as in-vehicle cameras and surveillance cameras.

[0273] <Image Display Device> The image display device of the present invention has the above-described film of the present invention. Examples of image display devices include liquid crystal display devices and organic electroluminescence display devices. Definitions of image display devices and details of each image display device are described, for example, in "Electronic Display Devices" (written by Akio Sasaki, published by Kogyo Chosakai Co., Ltd. in 1990) and "Display Devices" (written by Nobuaki Ibuki, published by Sangyo Tosho Co., Ltd. in 1989). Liquid crystal display devices are described, for example, in "Next Generation Liquid Crystal Display Technology" (edited by Tatsuo Uchida, published by Kogyo Chosakai Co., Ltd. in 1994). There are no particular limitations on the liquid crystal display device to which the present invention can be applied, and the present invention can be applied to various types of liquid crystal display devices described in the above-mentioned "Next Generation Liquid Crystal Display Technology."

[0274] The present invention will be explained in more detail below with reference to examples. The materials, amounts used, ratios, treatment details, treatment procedures, etc. shown in the following examples can be changed as appropriate without departing from the spirit of the present invention. Therefore, the scope of the present invention is not limited to the specific examples shown below. In the structural formula shown below, iPr represents an isopropyl group, and Ph represents a phenyl group.

[0275] Synthesis Examples Synthesis Example 1 To a 100 mL three-neck flask were added 15.0 g (25.9 mmol) of compound mm2 having the structure below as a raw material polyfunctional monomer, 1.88 g (7.8 mmol) of compound am11 having the structure below as a raw material amine, and 39.4 g of propylene glycol monomethyl ether acetate, and the mixture was heated and stirred at 50° C. for 6 hours to obtain 56.3 g (yield 100%) of a 30 mass % propylene glycol monomethyl ether acetate solution of amine monomer M21.

[0276] Amine monomers M1 to M3, M21 to M25, M31 to M38, and M48 to M57 were synthesized in the same manner as in Synthesis Example 1-1, except that the types and proportions of the raw material polyfunctional monomer and raw material amine were changed.

[0277] Synthesis Example 2 To a 100 mL three-neck flask were added 15.0 g (35.0 mmol) of compound mm3 having the following structure as a raw material polyfunctional monomer, 3.24 g (17.5 mmol) of compound am5 having the following structure as a raw material amine, and 42.6 g of propylene glycol monomethyl ether, and the mixture was heated and stirred at 50° C. for 24 hours, thereby obtaining 60.8 g (yield 100%) of a 30 mass % propylene glycol monomethyl ether solution of amine monomer M8.

[0278] Amine monomers M4 to M7, M9 to M20, M26 to M30, and M39 to M47 were synthesized in the same manner as in Synthesis Example 2-1, except that the types and proportions of the raw material polyfunctional monomers and raw material amines were changed.

[0279] Synthesis Example 3: 15.0 g (0.104 mol) of 4-hydroxybutyl acrylate and 6.10 g (0.052 mol) of 6-amino-1-hexanol were added to a 100 ml three-neck flask and heated with stirring at 50°C for 24 hours. The resulting reaction mixture was cooled to room temperature, and 32.4 g of dimethylacetamide was added. After the internal temperature was reduced to 10°C or below by ice cooling, 15.5 g (0.172 mol) of acrylic acid chloride was added dropwise over 30 minutes. 48.6 g of distilled water was then added to remove excess acrylic acid chloride, and the mixture was separated using 77.8 g of ethyl acetate. The resulting ethyl acetate layer was washed successively with saturated aqueous sodium bicarbonate, distilled water, and saturated saline to remove by-products such as acrylic acid and dimethylacetamide. The ethyl acetate layer was then concentrated under reduced pressure using an evaporator to obtain 20.0 g of amine monomer M167 (yield: 67.7%).

[0280] Amine monomers M168 to M184, M190 to M199, and M202 to M223 were synthesized in the same manner.

[0281] Synthesis Example 4: 15.0 g (0.104 mol) of 4-hydroxybutyl acrylate and 6.10 g (0.052 mol) of 6-amino-1-hexanol were added to a 100 ml three-neck flask and heated with stirring at 50°C for 24 hours. 0.11 g of Neostan U-600 (manufactured by Nitto Kasei Co., Ltd.) and 0.061 g of 2,2,6,6-tetramethylpiperidine 1-oxyl (TEMPO) were added to the resulting reaction mixture, and then 15.74 g (0.1115 mol) of 2-isocyanatoethyl acrylate was added dropwise over 1 hour so that the internal temperature remained within 50°C ± 5°C, yielding 36.8 g (yield 100.0%) of amine monomer M185. Amine monomers M186 to M189 and M200 to M201 were synthesized in the same manner.

[0282] Synthesis Example 5 To a 200 ml three-necked flask were added 7.40 g (0.0386 mol) of 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride and 22.8 g of tetrahydrofuran (THF), followed by ice-cooling to 5°C. Then, 2.50 g (0.0107 mol) of 3,3',3''-nitrilotripropionic acid, 8.25 g (0.032 mol) of 12-hydroxydodecyl acrylate, and 4.71 g (0.0386 mol) of 4-dimethylaminopyridine were added, followed by stirring at 5°C for 30 minutes. The temperature was then raised to room temperature, and the mixture was stirred for 24 hours. The reaction solution was then concentrated under reduced pressure using an evaporator, thereby distilling off the THF solvent. Then, 46 g of ethyl acetate was added, followed by washing with saturated aqueous sodium bicarbonate, distilled water, and saturated saline, in that order, to remove by-products. The ethyl acetate layer was then concentrated under reduced pressure using an evaporator to obtain 1.1 g (yield 10.8%) of amine monomer M225.

[0283] Amine monomers M224 and M226 to M237 were synthesized in the same manner.

[0284] Synthesis Example 6: 5.0 g (0.035 mol) of 4-hydroxybutyl acrylate and 2.03 g (0.017 mol) of 6-amino-1-hexanol were added to a 100 ml three-neck flask and heated with stirring at 50°C for 24 hours to synthesize an amino group-containing polyfunctional alcohol. The resulting reaction product (amino group-containing polyfunctional alcohol) was cooled to room temperature, and then 18.4 g (0.0959 mol) of 1-(3-dimethylaminopropyl)-3-ethylcarbodiimide hydrochloride and 41.7 g of THF were added, followed by ice-cooling to 5°C. Thereafter, 8.0 g (0.0266 mol) of Aronix M-5300 (manufactured by Toagosei Co., Ltd.), 3.56 g (0.0088 mol) of the amino group-containing polyfunctional alcohol, and 11.7 g (0.0959 mol) of 4-dimethylaminopyridine were added, and the mixture was stirred at 5°C for 30 minutes. The temperature was then raised to room temperature, and the mixture was stirred for 24 hours. The reaction solution was then concentrated under reduced pressure using an evaporator, and the THF solvent was removed. 83 g of ethyl acetate was then added, and the mixture was washed with saturated aqueous sodium bicarbonate, distilled water, and saturated saline, in that order, to remove by-products. The ethyl acetate layer was then concentrated under reduced pressure using an evaporator, yielding 10.0 g of amine monomer M238 (yield 39.6%).

[0285] Amine monomers M239 to M256 were synthesized in the same manner.

[0286] (Raw Material Polyfunctional Monomers) mm1 to mm9, mm29, mm101 to mm156: Compounds with the following structure. mm10 to mm28: A mixture of compound a and compound b with the following structure. The mixing ratios (molar ratios) are as follows. To prepare mm19, 15.0 g (25.9 mmol) of dipentaerythritol hexaacrylate, 0.11 g (2.83 mmol) of sodium hydroxide, and 49.6 g of water were added to a 100 mL three-neck flask, and the mixture was heated and stirred at 90°C for 6 hours. After the reaction was completed, separation and purification was performed using ethyl acetate and water, and the ethyl acetate layer was concentrated using an evaporator to obtain 14.1 g (95% yield) of the hydroxyl group-containing monomer mm19. mm10 to mm18 and mm20 to mm28 were synthesized using the same method as for producing mm19.

[0287] (Raw material amines) am1 to mm54: Compounds having the following structure

[0288] (Regarding amine monomers M1 to M57 and M101 to M256) Amine monomers M1 to M38 and M101 to M256 each contain the compound shown below as a main component as a reaction product. Amine monomers M39 to M57 each contain a mixture of compound a and compound b shown below as a reaction product as a main component. The mixing ratios (molar ratios) are as follows:

[0289] The pKaH, amine value, C=C value (ethylenically unsaturated bond-containing group value), and hydroxyl value of the amine monomers M1 to M57 and M101 to M256 are as follows. The amine value, C=C value, and hydroxyl value of the amine monomers M1 to M57 are theoretical values ​​calculated from the raw materials used in the synthesis. The following table shows the R １ The structure of the portion corresponding to １ The pKaH of the amine monomers M1 to M57 and M101 to M256 is shown in the "Structure" column. The pKaH values ​​of the amine monomers M1 to M57 and M101 to M256 are shown in the "Structure" column. The pKaH values ​​were calculated according to the method described in A Web Server for Small Molecule pKa Prediction Using a Graph-Convolutional Neural Network J. Chem. Inf. Model. 2021, 61, 7, 3159-3165.

[0290] R1-1 to R1-25 and r1-1 to r1-26 are groups with the structures shown below. In the structural formulas below, * indicates a bond. The ClogP value of each group is also shown. The ClogP value of each group was calculated by replacing the bond with a hydrogen atom.

[0291] <Preparation of Pigment Dispersions> A mixture of the materials listed in the table below was mixed and dispersed for 3 hours using a bead mill (using 0.1 mm diameter zirconia beads), and then further dispersed using a NANO-3000-10 high-pressure disperser equipped with a pressure reducing mechanism (manufactured by Nippon BEE Co., Ltd.) at a pressure of 2000 MPa and a flow rate of 500 g / min. This dispersion process was repeated 10 times to obtain each pigment dispersion. The average particle size (nm) and viscosity value (mPa s) of the pigment in each pigment dispersion are also recorded. The average particle size of the pigment was measured by dynamic light scattering using a particle size measuring device (nanoSAQLA, manufactured by Otsuka Electronics Co., Ltd.). The viscosity of the pigment dispersion was measured using a viscometer (RE-85L, manufactured by Toki Sangyo Co., Ltd.) by adjusting the temperature of the pigment dispersion to 25°C.

[0292]

[0293]

[0294] The details of the materials listed with the abbreviations in the table above are as follows: (Colorants) PR254: C.I. Pigment Red 254 (diketopyrrolopyrrole compound, red pigment) PR272: C.I. Pigment Red 272 (diketopyrrolopyrrole compound, red pigment) PY139: C.I. Pigment Yellow 139 (isoindoline compound, yellow pigment) PY150: C.I. Pigment Yellow 150 (azobarbituric acid compound, yellow pigment) PY185: C.I. Pigment Yellow 150 (isoindoline compound, yellow pigment) PG36: C.I. Pigment Green 36 (phthalocyanine compound, green pigment) PG58: C.I. Pigment Green 58 (phthalocyanine compound, green pigment) PB15:6: C.I. Pigment Blue 15:6 (phthalocyanine compound, blue pigment) PV23: C.I. Pigment Violet 23 (dioxazine compound, purple pigment) PBk32: C.I. Pigment Black 32 (perylene compound, organic black pigment) CB1: Carbon black (black pigment, Mitsubishi Chemical Corporation, #2300) TB1: Titanium black (black pigment, Mitsubishi Materials Corporation, Titanium Black 10S) TB2: Titanium black (black pigment, Ako Kasei Co., Ltd., Tilac D) IR colorant 1: Compound of the following structure (infrared absorbing pigment)

[0295] Derivative 1: Compound having the following structure Derivative 2: Compound having the following structure Derivative 3: Compound having the following structure Derivative 4: Compound of the following structure Derivative 5: Compound of the following structure Derivative 6: Compound of the following structure Derivative 7: Compound of the following structure Derivative 8: Compound of the following structure Derivative 9: Compound of the following structure Derivative 10: Compound having the following structure (n=1) Derivative 11: Compound of the following structure Derivative 12: Compound of the following structure

[0296] (Resins) P1: Plysurf A208F (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., a resin having a phosphate group (pKa = approximately 2), terminal acid group type) P2: Jeffamine M-2070 (manufactured by Tomoe Engineering Co., Ltd., methoxypoly(oxyethylene / oxypropylene)-2-propylamine)

[0297] (Solvents) Solvent 1: Propylene glycol monomethyl ether acetate Solvent 2: Cyclopentanone Solvent 3: 1-methoxy-2-propanol

[0298] <Preparation of Photocurable Composition> The materials were mixed in the proportions shown below and filtered through a nylon filter with a pore size of 0.45 μm (manufactured by Nippon Pall Co., Ltd.) to prepare a photocurable composition. In the table below, the content of the polymerizable monomer in the total solid content of the photocurable composition is shown in the "Monomer concentration" column, and the content of the photopolymerization initiator in the total solid content of the photocurable composition is shown in the "Initiator concentration" column.

[0299]

[0300]

[0301]

[0302]

[0303]

[0304]

[0305]

[0306]

[0307]

[0308]

[0309]

[0310] Details of the materials listed with abbreviations in the table above are as follows: (Pigment dispersions) R1 to R9, Y1, Y2, G1 to G11, B1 to B7, Cy1, Cy2, IR1, IR2, Bk1 to Bk4: the above-mentioned pigment dispersions R1 to R9, Y1, Y2, G1 to G11, B1 to B7, Cy1, Cy2, IR1, IR2, Bk1 to Bk4

[0311] (Polymerizable Monomers) M1 to M57, M101 to M256: the above-mentioned amine monomers M1 to M57 m1: KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.) m2: OGSOL EA-0300 (manufactured by Osaka Gas Chemicals Co., Ltd.) m3: pentaerythritol tetraacrylate m4: dipentaerythritol pentaacrylate m5: dipentaerythritol hexaacrylate m6: NK Ester A-DPH-12E (manufactured by Shin-Nakamura Chemical Co., Ltd.) m7: KAYARAD DPCA-20 (manufactured by Nippon Kayaku Co., Ltd.) m8: KAYARAD DPCA-120 (manufactured by Nippon Kayaku Co., Ltd.) m9: bisphenol EO-modified (n≈10) diacrylate m10: polyethylene glycol diacrylate (n≒9) m11: trimethylolpropane triacrylate CM1: compound having the following structure (comparison compound)

[0312] (Binder) b1: Resin having the following structure (the numerical values ​​attached to the main chain are the molar ratios of repeating units; weight average molecular weight 11,000, acid value 70 mg KOH / g, C=C value 1.1 mmol / g) b2: Resin having the following structure (the number attached to the main chain is the molar ratio of the repeating unit, and the number attached to the side chain is the number of repeating units. Weight average molecular weight: 18,000, acid value: 61.8 mg KOH / g, C=C value: 0.525 mmol / g)

[0313] (Photopolymerization initiator) I1: Irgacure OXE02 (manufactured by BASF, oxime compound)

[0314] (Surfactant) W1: KF-6000 (Shin-Etsu Chemical Co., Ltd., silicone surfactant)

[0315] (Polymerization inhibitor) A1: p-methoxyphenol

[0316] (Thermal crosslinking agent) T1: Compound having the following structure

[0317] (Additive) X1: Compound having the following structure

[0318] (Dye) Dye 1: Compound having the following structure (xanthene dye, m=3, n=3, weight average molecular weight: 7000)

[0319] (Solvents) Solvent 1: Propylene glycol monomethyl ether acetate (PGMEA) Solvent 2: Cyclopentanone Solvent 3: 1-methoxy-2-propanol

[0320] <Evaluation> (Sensitivity Evaluation) CT-4000L (manufactured by FUJIFILM Electronic Materials Co., Ltd.) was applied to an 8-inch (20.32 cm) silicon wafer using a spin coater so that the thickness after post-baking would be 0.1 μm, and the wafer was heated using a hot plate at 220°C for 300 seconds to form an undercoat layer, thereby obtaining a silicon wafer (support) with an undercoat layer. Next, a photocurable composition was applied by spin coating so that the film thickness after post-baking would be 0.5 μm. Next, the wafer was heated at 100°C for 2 minutes using a hot plate. Next, using an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Inc.), the wafer was exposed to light with a wavelength of 365 nm at a specific exposure dose through a 1.0 μm square Bayer pattern mask. Next, the exposed composition layer was developed using a developing system (Act8 manufactured by Tokyo Electron). A 0.15% by mass aqueous solution of tetramethylammonium hydroxide (TMAH) was used as the developer, and shower development was performed at 23°C for 60 seconds. Thereafter, the wafer was rinsed with a spin shower using pure water, then spin-dried, and then heat-treated (post-baked) for 5 minutes using a hot plate at 200°C to form a pattern (pixel). The silicon wafer on which the pixels were formed was divided and platinum was evaporated, and then a cross-sectional scanning electron microscope (SEM) image of the pixel was obtained using a scanning electron microscope. The obtained pattern was observed while changing the specific exposure dose, and the minimum exposure dose required to resolve a square pattern with a side length of 1.0 μm was determined, and the sensitivity was evaluated according to the following evaluation criteria. -Evaluation Criteria- A: The minimum exposure dose was 100 mJ / cm. ２ B: The minimum exposure dose was less than 100 mJ / cm ２ More than 200mJ / cm ２ C: The minimum exposure amount was less than 200 mJ / cm ２ More than 500mJ / cm ２ D: The minimum exposure dose was less than 500 mJ / cm ２ More than 1000mJ / cm ２ E: The minimum exposure dose was less than 1000 mJ / cm ２ That was all

[0321] (Evaluation of Adhesion) The photocurable composition was applied to an 8-inch (20.32 cm) silicon wafer by spin coating so that the film thickness after post-baking would be 0.5 μm. Then, the wafer was pre-baked at 100° C. for 2 minutes using a hot plate. Next, an i-line stepper exposure system FPA-3000i5+ (manufactured by Canon Inc.) was used to apply 200 mJ / cm 2 through a mask having a Bayer pattern that forms a predetermined pixel (pattern) size. ２ The exposure was performed at an exposure dose of 0.7 μm square, 0.8 μm square, 0.9 μm square, 1.0 μm square, 1.1 μm square, 1.2 μm square, 1.3 μm square, 1.4 μm square, 1.5 μm square, 1.6 μm square, 1.7 μm square, 2.0 μm square, 3.0 μm square, 5.0 μm square, and 10.0 μm square. Next, puddle development was performed at 23°C for 60 seconds using a 0.3% by mass aqueous solution of tetramethylammonium hydroxide (TMAH). After that, the substrate was rinsed with pure water using a spin shower. Next, the substrate was heated (post-baked) at 200°C for 5 minutes using a hot plate to form a pattern (pixel). Using a high-resolution FEB length measurement device (HITACHI CD-SEM) S9380II (manufactured by Hitachi High-Tech Corporation), patterns of 0.7 μm square, 0.8 μm square, 0.9 μm square, 1.0 μm square, 1.1 μm square, 1.2 μm square, 1.3 μm square, 1.4 μm square, 1.5 μm square, 1.6 μm square, 1.7 μm square, 2.0 μm square, 3.0 μm square, 5.0 μm square, and 10.0 μm square were observed, and the smallest pattern size at which a pattern was formed without peeling was taken as the minimum adhesion line width. A smaller minimum adhesion line width means better adhesion. -Evaluation criteria- A: The minimum contact line width is 1.2 μm square or less. B: The minimum contact line width is greater than 1.2 μm square and less than 1.3 μm square. C: The minimum contact line width is greater than 1.3 μm square and less than 1.4 μm square. D: The minimum contact line width is greater than 1.4 μm square and less than 1.6 μm square. E: The minimum contact line width is greater than 1.6 μm square.

[0322]

[0323]

[0324] As shown in the above table, the examples were excellent in the evaluation of sensitivity and adhesion.

[0325] Films obtained from the photocurable compositions described in the examples can be suitably used in optical filters, solid-state imaging devices, and image display devices.

[0326] In Example 1, even when Resin P1 in Pigment Dispersion Liquid R1 was replaced with Resins P3 to P9, the same effects as in Example 1 were obtained. Resin P3: Plysurf A212C (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., resin having phosphate groups (pKa = approx. 2), terminal acid group type) Resin P4: Plysurf A215C (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., resin having phosphate groups (pKa = approx. 2), terminal acid group type) Resin P5: Plysurf A219B (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., resin having phosphate groups (pKa = approx. 2), terminal acid group type) Resin P6: Plysurf H-3606 (manufactured by Dai-ichi Kogyo Seiyaku Co., Ltd., resin having carboxy groups (pKa = approx. 4.5), terminal acid group type) Resin P7: resin of the following structure (resin having sulfo groups (pKa = approx. 2), terminal acid group type) Resin P8: Resin having the following structure (the numerical value attached to the main chain indicates the mass ratio of the repeating unit. Weight-average molecular weight: 24,000) Resin P9: Resin having the following structure (the numerical value attached to the main chain indicates the mass ratio of the repeating unit. Weight-average molecular weight: 24,000)

[0327] In Example 9, even when Resin P2 was replaced with Resin P10, Resin P11, or Resin P12 in the pigment dispersion R9, the same effects as in Example 9 were obtained. Resin P10: Jeffamine M-1000 (Tomoe Engineering Co., Ltd., methoxypoly(oxyethylene / oxypropylene)-2-propylamine). Resin P11: Jeffamine M-3085 (Tomoe Engineering Co., Ltd., methoxypoly(oxyethylene / oxypropylene)-2-propylamine). Resin P12: A resin obtained by reacting 7.44 parts by mass of polyethyleneimine (molecular weight 300), 83.34 parts by mass of compound pp12a having the following structure, and 9.22 parts by mass of compound pp12b having the following structure (acid value 44.6 mg KOH / g, amine value 38.9 mg KOH / g, molecular weight 4032). Resin P12 is a resin having a structure represented by formula pp12.

[0328] In Example 1, even when Derivative 1 in the pigment dispersion liquid R1 was replaced with Derivatives 13 to 18 (compounds having the following structures), the same effects as in Example 1 were obtained.

[0329] In Example 9, even when Derivative 2 in Pigment Dispersion Liquid R9 was replaced with Derivatives 19 to 28 (compounds having the following structures), the same effects as in Example 9 were obtained.

[0330] In Example 1, even when the binder b1 was changed to the above-mentioned binder b2 or a resin synthesized in accordance with the method described in Synthesis Example P-1 described in paragraph 0291 of WO 2018 / 037812, the same effect as in Example 1 was obtained.

[0331] In Example 13, even when the thermal curing agent T1 was changed to the thermal curing agent T2 or T3 (compounds having the following structure), the same effect as in Example 13 was obtained.

[0332] In Example 1, even when the photopolymerization initiator I1 was changed to photopolymerization initiators I2 to I9 (compounds having the following structures), the same effect was obtained.

[0333] In Example 1, the same effect was obtained even when surfactant W1 was replaced with surfactant W2 or surfactant W3. Surfactant W2: A compound having the structure shown below (weight average molecular weight = 14,000, % indicating the proportion of repeating units is mol %, fluorine-based surfactant). Surfactant W3: PolyFox PF6320 (manufactured by OMNOVA, fluorine-based surfactant)

[0334] In Example 1, even when the polymerization inhibitor A1 was changed to the polymerization inhibitor A2 or the polymerization inhibitor A3 (compounds having the following structure), the same effect was obtained.

[0335] In Examples 98 to 102, the same effect was obtained even when Additive X1 was replaced with Additive X2 (a compound having the following structure).

[0336] In Examples 99 to 102, the same effect was obtained even when dye Dey1 was replaced with dye Dey2 (a compound having the following structure).

Claims

1. A photocurable composition comprising a polymerizable monomer and a photopolymerization initiator, wherein the polymerizable monomer comprises a compound represented by formula (1); In formula (1), n1 and n2 each independently represent 1 or 2, n1+n2 is 3, m represents an integer of 1 to 5, and A １ represents a group represented by formula (A-1), and L １ represents an (m+1)-valent linking group; Y １ represents —O— or —NH—; １ represents a hydrocarbon group which may have a substituent, and the substituent is a group constituted of at least one element selected from the group consisting of a hydrogen atom, a carbon atom, a nitrogen atom, an oxygen atom, a sulfur atom, and a halogen atom, and R １ and L １ may be bonded, R ２ represents a hydrogen atom or a substituent, and when n1 is 2, there are a plurality of R １ may be the same or different, R １ When n2 is 2, a plurality of A １ , L １ , Y １ , R ２ and m may be the same or different, and when m is 2 or more, a plurality of A １ may be the same or different; In formula (A-1), R ａ１ represents a hydrogen atom or a substituent, and Y ａ１ represents —O— or —NH—, and * represents a bond.

2. R in the formula (1) １ The photocurable composition according to claim 1 , wherein R is an unsubstituted alkyl group having 8 or more carbon atoms.

3. R ​​in the formula (1) １ 2. The photocurable composition according to claim 1, wherein the ClogP value is 3 to 12.

4. L in the formula (1) １ The photocurable composition according to claim 1 or 2, wherein comprises an alkyleneoxy group.

5. The photocurable composition according to claim 1 or 2, wherein the compound represented by formula (1) contains 3 to 10 groups represented by formula (A-1).

6. The photocurable composition according to claim 1 or 2, wherein the compound represented by formula (1) has a pKaH of 7.5 or more.

7. The photocurable composition according to claim 1 or 2, wherein n1 is 1 and n2 is 2 in formula (1).

8. The photocurable composition according to claim 1 or 2, wherein n1 in formula (1) is 1, n2 is 2, and m is 2 or 3, or n1 in formula (1) is 2, n2 is 1, and m is 3 or 4.

9. The photocurable composition according to claim 1 or 2, further comprising a colorant.

10. A photocurable composition according to claim 1 or 2, wherein the total content of the polymerizable monomer and the photopolymerization initiator in the total solid content of the photocurable composition is 20 mass% or less.

11. A film obtained using the photocurable composition according to claim 1 or 2.

12. An optical filter comprising the film of claim 11.

13. A solid-state imaging device having the film according to claim 11.

14. An image display device comprising the film according to claim 11.

Images