Substrate processing apparatus

Abstract

Disclosed in the present application is a substrate processing apparatus, comprising a substrate retaining mechanism, a plurality of protective covers, a plurality of lifting mechanisms, and a plurality of sealing members, wherein the substrate retaining mechanism is configured to retain a substrate; the plurality of protective covers are sequentially radially arranged around the substrate retaining mechanism and are configured to respectively and independently receive a chemical solution ejected from the substrate; the plurality of lifting mechanisms are configured to respectively drive the plurality of protective covers to ascend to a raised position or descend to a lowered position; and the plurality of sealing members are respectively arranged between adjacent protective covers. The substrate processing apparatus is configured such that when two adjacent protective covers are both in the raised position or in the lowered position, the two adjacent protective covers are both in contact with the corresponding sealing members, such that the two adjacent protective covers are in a closed state. The present application can prevent the purity of the chemical solution received by the plurality of protective covers from being affected by cross-contamination.

Description

Substrate processing device TECHNICAL FIELD

[0001] The present application relates to the technical field of semiconductor manufacturing, and in particular to a substrate processing device. BACKGROUND

[0002] With the continuous improvement of process requirements, the requirements for cleaning semiconductor substrates are also increasing. When a substrate processing device processes a single substrate, multiple chemicals are used. The substrate holding mechanism of the substrate processing device supports the substrate and can rotate with the substrate. The chemicals on the substrate will be thrown to the surrounding under the action of centrifugal force and will be caught by the protective cover for recycling and recycling.

[0003] At present, the substrate processing device includes multiple protective covers, for example, a first protective cover and a second protective cover are included in the multiple protective covers. The first protective cover and the second protective cover are sequentially and radially arranged around the substrate holding mechanism from the inside to the outside, and are used to independently receive the chemicals thrown from the substrate. However, there are similar situations: when the first protective cover collects the corresponding chemicals, the splashed chemicals are easy to flow into the gap between the first protective cover and the second protective cover, which will reduce the purity of the chemicals collected by the second protective cover in the subsequent process. Not only will it affect the recycling rate of the chemicals, but also it will have an adverse effect on the substrate in the substrate processing. SUMMARY

[0004] The purpose of the present application is to provide a substrate processing device to solve the problem of the purity of the chemicals received by the multiple protective covers being affected by the flow of the chemicals in the prior art.

[0005] To solve the above problems, the present application provides a substrate processing device, comprising:

[0006] a substrate holding mechanism for holding a substrate;

[0007] a plurality of protective covers sequentially and radially arranged around the substrate holding mechanism for independently receiving chemicals thrown from the substrate;

[0008] a plurality of lifting mechanisms for driving the plurality of protective covers to rise to an upper position or to fall to a lower position;

[0009] a plurality of sealing elements arranged between adjacent protective covers;

[0010] The substrate processing device is configured such that when two adjacent protective covers are in the upper position or the lower position, the two adjacent protective covers are in contact with the corresponding sealing elements, so that the two adjacent protective covers are in a closed state.

[0011] The present application provides a substrate processing device, comprising:

[0012] a substrate holding mechanism for holding a substrate;

[0013] a plurality of protective covers including a first protective cover and a second protective cover, the first protective cover and the second protective cover being radially arranged around the substrate holding mechanism in sequence from inside to outside, for respectively and independently receiving the liquid chemical splashed from the substrate, the first protective cover including a first barb extending upward from a front end of a top wall of the first protective cover;

[0014] The substrate processing device is further configured to:

[0015] When the first protective cover and the second protective cover are both in the raised position or the lowered position, in the vertical direction, an upper edge of the first barb is not lower than an upper edge of a top wall of the second protective cover.

[0016] In the substrate processing device provided by the present application, the sealing member is configured to enable the two adjacent protective covers in the raised position or the lowered position to be in a closed state, so as to prevent external liquid chemical from entering between the two adjacent protective covers, and when the two adjacent protective covers are subsequently in an open state to collect liquid chemical, the purity of the liquid chemical is not affected by splashed liquid chemical, thereby improving the recycling rate of the corresponding liquid chemical and preventing adverse effects on the substrate during substrate processing.

[0017] In the substrate processing device provided by the present application, the first protective cover includes a first barb extending upward from a front end of a top wall of the first protective cover, and when the adjacent first protective cover and second protective cover are both in the raised position or the lowered position, the first barb can block splashed liquid chemical, thereby preventing splashed liquid chemical from entering between the first protective cover and the second protective cover to a certain extent, which is beneficial to ensure the purity of the liquid chemical collected by the second protective cover subsequently, thereby improving the recycling rate of the liquid chemical and preventing adverse effects on the substrate during substrate processing.

[0018] Other features and corresponding advantages of the present application are described in the latter part of the specification and it should be understood that at least some of the advantages are apparent from the description of the present application.

[0019] SUMMARY

[0020] The features and performances of the present application are further described by the following embodiments and the accompanying drawings.

[0021] FIGS. 1-3 are structural schematic diagrams of a substrate processing device according to Embodiment 1 of the present application;

[0022] FIGS. 4a-4d are partial structural schematic diagrams of various configuration modes of a plurality of protective covers according to Embodiment 1 of the present application;

[0023] FIGS. 5a and 5b are structural schematic diagrams of a protective cover according to Embodiment 1 of the present application;

[0024] Fig. 6 is a schematic view of a partial structure of a plurality of protective covers according to Embodiment 1 of the present application;

[0025] Figs. 7 to 9 are schematic views of a substrate processing apparatus according to Embodiment 2 of the present application;

[0026] Fig. 10 is a schematic view of a partial structure of a plurality of protective covers according to Embodiment 2 of the present application;

[0027] Figs. 11a and 11b are schematic views of a protective cover according to Embodiment 2 of the present application; and

[0028] Fig. 12 is a schematic view of a partial structure of a plurality of protective covers according to Embodiment 2 of the present application.

[0029] Preferred embodiments of the present application

[0030] The present application will now be described in detail with specific reference to particular embodiments thereof. It is noted that the description of the embodiments is intended to be illustrative, and not to limit the scope of the application, as defined by the appended claims. Those of ordinary skill in the art will readily recognize a number of means and methods similar to those described but using any number of alternative techniques, while still obtaining at least some of the benefits to be achieved over the current technologies. Accordingly, the particular embodiments described are shown by way of example, and it should be understood that the application is not limited by the particulars shown or described herein. As such, any and all embodiments falling within the scope of the independent claims should be covered by the present application.

[0031] It is to be noted that, in this specification, like numbers and letters indicate like elements throughout the several views of the drawings, and that, in the description of the drawings, identical numbers and letters refer to elements in different ones of the several views. It will be understood that when a particular element is designated by several identical numbers in one or several figures, the reference designations are not meant to limit the number of such elements in the drawings.

[0032] The technical solutions of the present application will be described clearly and completely below with reference to the drawings. Obviously, the described embodiments are only some of the embodiments of the present application, rather than all the embodiments. Based on the embodiments of the present application, all other embodiments obtained by those of ordinary skill in the art without creative efforts fall within the scope of the present application.

[0033] In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In addition, the terms "first", "second", "third" are only for the purpose of description, and cannot be understood as indicating or implying relative importance.

[0034] In the description of the present application, it should be noted that unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the communication inside two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0035] In order to make the purpose, technical scheme and advantages of the present application clearer, the embodiments of the present application will be further described in detail below with reference to the drawings.

[0036] Embodiment 1:

[0037] Figures 1 to 3 are structural schematic diagrams of a substrate processing device according to an embodiment of the present application. In Figure 1, the first protective cover 21, the second protective cover 22 and the third protective cover 23 are all in the raised position, and the first protective cover 21 is used to receive the liquid medicine splashed from the substrate 10; in Figure 2, the first protective cover 21 is in the lowered position, and the second protective cover 22 and the third protective cover 23 are in the raised position, and the second protective cover 22 is used to receive the liquid medicine splashed from the substrate 10; in Figure 3, the first protective cover 21 and the second protective cover 22 are both in the lowered position, and the third protective cover 23 is in the raised position, and the third protective cover 23 is used to receive the liquid medicine splashed from the substrate 10. When the first protective cover 21, the second protective cover 22 and the third protective cover 23 are all in the lowered position, the substrate processing device is in standby state.

[0038] Referring to FIGS. 1-3, the present application provides a substrate processing device, which comprises a substrate holding mechanism 1, a plurality of protective covers 2, a plurality of lifting mechanisms 3 and a plurality of sealing members 4. The substrate holding mechanism 1 comprises a chuck 11, a rotating shaft 12 and a base 13, the chuck 11 is used to clamp a substrate 10, the chuck 11 is connected with the rotating shaft 12, the rotating shaft 12 is assembled on the base 13 and used to drive the chuck 11 to rotate, the substrate 10 rotates with the chuck 11, and liquid medicine on the substrate 10 is thrown out under the action of centrifugal force. The plurality of protective covers 2 are radially arranged around the substrate holding mechanism 1 in sequence and used to respectively and independently receive the liquid medicine thrown out from the substrate 10, the plurality of lifting mechanisms 3 are used to respectively drive the plurality of protective covers 2 to move to an upper position or a lower position. The plurality of sealing members 4 are respectively arranged between adjacent protective covers 2. The substrate processing device is configured such that when two adjacent protective covers 2 are at the upper position or the lower position, the two adjacent protective covers 2 are close to each other, at this time, the two adjacent protective covers 2 are in contact with the corresponding sealing members 4, so that the two adjacent protective covers 2 are in a closed state, thereby preventing liquid medicine and water vapor from entering and ensuring that the purity of the recovered liquid medicine is not affected by liquid channeling.

[0039] In some embodiments, the plurality of protective covers 2 comprises a first protective cover 21 and a second protective cover 22, the first protective cover 21 and the second protective cover 22 are radially arranged around the substrate holding mechanism 1 in sequence from inside to outside. The plurality of lifting mechanisms 3 comprises a first lifting mechanism 31 and a second lifting mechanism 32, which are used to respectively drive the first protective cover 21 and the second protective cover 22 to move to the upper position or the lower position, in the example shown in FIG. 1, the first lifting mechanism 31 and the second lifting mechanism 32 each have two. The plurality of sealing members 4 comprises a first sealing member 41, which is arranged between the first protective cover 21 and the second protective cover 22. When the first protective cover 21 and the second protective cover 22 are at the upper position (as shown in FIG. 1) or the lower position (as shown in FIG. 3), the first protective cover 21 and the second protective cover 22 are close to each other, at this time, the first protective cover 21 and the second protective cover 22 are in contact with the first sealing member 41, so that the first protective cover 21 and the second protective cover 22 are in a closed state, thereby preventing liquid medicine and water vapor from entering and ensuring that the purity of the recovered liquid medicine when the first protective cover 21 and the second protective cover 22 are in an open state is not affected by liquid channeling.

[0040] In some embodiments, as shown in FIG. 1, the plurality of protective covers 2 further comprises a third protective cover 23, which is arranged around the outer periphery of the second protective cover 22, and the plurality of lifting mechanisms 3 further comprises a third lifting mechanism 33 for driving the third protective cover 23 to move to the raised position or the lowered position. In the example shown in FIG. 1, the third lifting mechanism 33 has two. The plurality of sealing members 4 further comprises a second sealing member 42. When the second protective cover 22 and the third protective cover 23 are both in the raised position (as shown in FIG. 1) or the lowered position (not shown), the second protective cover 22 and the third protective cover 23 are close to each other, and at this time, the second protective cover 22 and the third protective cover 23 are both in contact with the second sealing member 42, so that the second protective cover 22 and the third protective cover 23 are in a closed state, thereby preventing liquid and water vapor from entering, and ensuring that the purity of the recovered liquid when the second protective cover 22 and the third protective cover 23 are in the open state is not affected by the liquid.

[0041] Specifically, the first sealing member 41 is fixed to the front end of the outer side of the top wall 211 of the first protective cover 21, wherein the outer side of the top wall 211 is the side of the top wall 211 facing the second protective cover 22, and the front end of the outer side of the top wall 211 is the end of the outer side of the top wall 211 close to the axis of the rotating shaft 12. Alternatively, the first sealing member 41 is fixed to the front end of the inner side of the top wall 221 of the second protective cover 22, wherein the inner side of the top wall 221 is the side of the top wall 221 facing the first protective cover 21, and the front end of the inner side of the top wall 221 is the end of the inner side of the top wall 221 close to the axis of the rotating shaft 12.

[0042] The second sealing member 42 is fixed to the front end of the outer side of the top wall 221 of the second protective cover 22, wherein the outer side of the top wall 221 is the side of the top wall 221 facing the third protective cover 23, and the front end of the outer side of the top wall 221 is the end of the outer side of the top wall 221 close to the axis of the rotating shaft 12. Alternatively, the second sealing member 42 is fixed to the front end of the inner side of the top wall 231 of the third protective cover 23, wherein the inner side of the top wall 231 is the side of the top wall 231 facing the second protective cover 22, and the front end of the inner side of the top wall 231 is the end of the inner side of the top wall 231 close to the axis of the rotating shaft 12. In some embodiments, the first sealing member 41 and the second sealing member 42 are, for example, sealing rings.

[0043] In the example shown in FIGS. 1-3, the first protective cover 21 is located in the innermost circle of the plurality of protective covers 2, the second protective cover 22 is located in the middle circle of the plurality of protective covers 2, and the third protective cover 23 is located in the outermost circle of the plurality of protective covers 2. In other embodiments, at least two protective covers 2, such as a fourth protective cover, a fifth protective cover, and a sixth protective cover, can be further arranged between the first protective cover 21 and the third protective cover 23. In this case, a sealing member 4 is arranged between any two adjacent protective covers 2, and the number of sealing members 4 between any two adjacent protective covers 2 is not limited and can be one or more.

[0044] In some embodiments, referring to FIGS. 1-3, each of the protective covers 2 is respectively configured with a collection groove 214, 224, 234 and further includes a top wall 211, 221, 231 and a side wall 212, 222, 232 connected to each other. The side wall 212, 222, 232 is arranged substantially vertically, and the top wall 211, 221, 231 is arranged obliquely. Specifically, the first protective cover 21 is configured with the first collection groove 214 formed at the outer periphery of the base 13, and the side wall 212 of the first protective cover 21 extends downward from the lower end of the top wall 211 into the first collection groove 214; the second protective cover 22 is configured with the second collection groove 224 formed at the outer periphery of the first protective cover 21, and the side wall 222 of the second protective cover 22 extends downward from the lower end of the top wall 221 into the second collection groove 224; the third protective cover 23 is configured with the third collection groove 234 formed at the outer periphery of the second protective cover 22, and the side wall 232 of the third protective cover 23 extends downward from the lower end of the top wall 231 into the third collection groove 234. The first collection groove 214, the second collection groove 224, and the third collection groove 234 are annular.

[0045] Referring to FIG. 1, during the substrate processing, if the innermost first protective cover 21 is used to receive the liquid chemical splashed from the substrate 10, the first lifting mechanism 31 drives the first protective cover 21 to move to the raised position, and the second lifting mechanism 32 and the third lifting mechanism 33 also drive the second protective cover 22 and the third protective cover 23 to move to the raised position, respectively. When the chuck 11 holding the substrate 10 rotates, the liquid chemical on the substrate 10 is splashed to the first protective cover 21 under the centrifugal force, and the liquid chemical flows along the side wall 212 of the first protective cover 21 to the first collection groove 214 and is discharged from the first collection groove 214. In this process, the gap entrance between the first protective cover 21 and the second protective cover 22 is sealed by the first sealing member 41, and the gap entrance between the second protective cover 22 and the third protective cover 23 is sealed by the second sealing member 42, both of which can prevent the liquid chemical from leaking in. As shown in FIG. 2, when the subsequent second protective cover 22 receives another liquid chemical splashed from the substrate 10, the purity of the another liquid chemical collected by the second collection groove 224 of the second protective cover 22 is not affected by the liquid chemical, and the purity of the liquid chemical can be maintained at a high level, thereby increasing the number of recycling times. Similarly, as shown in FIG. 3, the purity of the liquid chemical collected by the third collection groove 234 of the subsequent third protective cover 23 can also be unaffected by the liquid chemical, and the purity of the liquid chemical can be maintained at a high level.

[0046] In addition, by configuring the sealing member 4, the present application can prevent the top walls 211, 221, 231 of two adjacent protective covers 2 from colliding in surface contact, and further prevent residual liquid medicine on the two top walls 211, 221, 231 from splashing due to the collision. For example, as shown in FIG. 1, during the process of driving the first protective cover 21 to rise to the same rising position as the second protective cover 22 and the third protective cover 23 by the first lifting mechanism 31, because of the existence of the first sealing member 41, the outer side of the top wall 211 of the first protective cover 21 and the inner side of the top wall 221 of the second protective cover 22 will not collide in surface contact, and further will not cause the liquid medicine to splash due to the collision. Similarly, because of the existence of the second sealing member 42, the outer side of the top wall 221 of the second protective cover 22 and the inner side of the top wall 231 of the third protective cover 23 will also not collide in surface contact, and further will not cause the liquid medicine to splash due to the collision.

[0047] FIGS. 4a-4d are schematic diagrams of partial structures of various configuration modes of the plurality of protective covers according to the embodiment 1 of the present application.

[0048] In some embodiments, referring to FIG. 4a, when the plurality of protective covers 2 includes the first protective cover 21 and the second protective cover 22, a first sealing member 41 is arranged between the first protective cover 21 and the second protective cover 22. The second protective cover 22 includes a second barb 226 extending downward from the front end of the top wall 221 of the second protective cover 22. In the example shown in FIG. 4a, the substrate processing device is configured such that, when the first protective cover 21 and the second protective cover 22 are both moved to the rising position or the falling position, in the vertical direction, the lower edge of the second barb 226 is not higher than the upper edge of the top wall 211 of the first protective cover 21, for blocking the liquid medicine from entering the gap between the first protective cover 21 and the second protective cover 22.

[0049] In some embodiments, referring to FIG. 4b, when the plurality of protective covers 2 include the first protective cover 21, the second protective cover 22, and the third protective cover 23, a first seal 41 is arranged between the first protective cover 21 and the second protective cover 22, and a second seal 42 is arranged between the second protective cover 22 and the third protective cover 23. The second protective cover 22 includes a second barb 226, and the third protective cover 23 includes a third barb 236. The second barb 226 extends downward from the front end of the top wall 221 of the second protective cover 22, and the third barb 236 extends downward from the front end of the top wall 231 of the third protective cover 23. In the example shown in FIG. 4b, the substrate processing device is configured such that, when the first protective cover 21 and the second protective cover 22 are both moved to the raised position or the lowered position, in the vertical direction, the lower edge of the second barb 226 is not higher than the upper edge of the top wall 211 of the first protective cover 21, for blocking the liquid medicine from entering the gap between the first protective cover 21 and the second protective cover 22, and when the second protective cover 22 and the third protective cover 23 are both moved to the raised position or the lowered position, in the vertical direction, the lower edge of the third barb 236 is not higher than the upper edge of the top wall 221 of the second protective cover 22, for blocking the liquid medicine from entering the gap between the second protective cover 22 and the third protective cover 23. In the example shown in FIG. 4c, the second barb 226 further extends upward from the front end of the top wall 221 of the second protective cover 22, that is, the second barb 226 extends upward and downward from the front end of the top wall 221 respectively, in this case, as shown in FIG. 4c, the lower edge of the third barb 236 is not higher than the upper edge of the second barb 226, which can block the liquid medicine from entering the gap between the second protective cover 22 and the third protective cover 23, it should be noted that, during the lifting of the protective cover 2, it should be ensured that the upper edge of the second barb 226 shown in FIG. 4c does not collide with the third protective cover 23. In other embodiments, in the case where the second barb 226 extends upward and downward from the front end of the top wall 221 respectively, the second barb 226 can also block the liquid medicine from entering the gap between the second protective cover 22 and the third protective cover 23, so the third barb 236 can be selected to be omitted, as shown in FIG. 4d. c

[0050] In this embodiment, when the first protective cover 21 and the second protective cover 22 are close to each other, the second barb 226 can partially or completely block the entrance of the gap between the first protective cover 21 and the second protective cover 22. When the second protective cover 22 and the third protective cover 23 are close to each other, the third barb 236 can partially or completely block the entrance of the gap between the second protective cover 22 and the third protective cover 23. The basic idea of this embodiment is to improve the liquid channeling problem by arranging the seal and the downwardly extending barb, and the barb and the design parameters of the barb can be designed as needed without changing the basic idea.

[0051] ​In the example shown in FIGS. 1-3, the second barb 226 and the third barb 236 extend vertically downward, and the angles between the extending directions of the second barb 226 and the third barb 236 and the vertically downward direction are both zero.

[0052] FIGS. 5a and 5b are structural schematic diagrams of a protective cover according to an embodiment of the present application.

[0053] In the example shown in FIG. 5a, the second barb 226 and the third barb 236 extend toward the axis of the substrate holding mechanism 1, and the angles between the extending directions of the second barb 226 and the third barb 236 and the vertically downward direction are both first predetermined angles, and the first predetermined angles a satisfy 0° < a ≤ 60°.

[0054] In the example shown in FIG. 5b, the second barb 226 and the third barb 236 extend away from the axis of the substrate holding mechanism 1, and the angles between the extending directions of the second barb 226 and the third barb 236 and the vertically downward direction are both first predetermined angles, and the first predetermined angles a satisfy 0° < a ≤ 45°.

[0055] The design parameters of the second barb 226 and the third barb 236 need to satisfy the requirements of preventing liquid from leaking and avoiding interference between the protective covers 2 when they are lifted.

[0056] In addition, referring to FIG. 6, which is a partial structural schematic diagram of a plurality of protective covers according to an embodiment of the present application, the aforementioned sealing member (e.g., the second sealing member 42) can also be arranged between the second barb 226 and the third barb 236, and also plays a role of preventing liquid from leaking.

[0057] In some embodiments, referring to FIGS. 1-3, the substrate processing device further includes a liquid receiving tray 5 fixed to the outer periphery of the substrate holding mechanism 1, specifically, fixed to the susceptor 13. The liquid receiving tray 5 includes a liquid discharge opening and a liquid discharge pipe 51 in communication with the liquid discharge opening, for discharging liquid in the liquid receiving tray 5.

[0058] In some embodiments, referring to FIGS. 1-3, the substrate processing device further includes a barrier 60 arranged between the front end of the top wall 211 of the first protective cover 21 and the upper end of the liquid receiving tray 5, and the substrate processing device is further configured such that when the first protective cover 21 is in the lowered position, the front end of the top wall 211 of the first protective cover 21 and the upper end of the liquid receiving tray 5 are both in contact with the barrier 60, so that liquid and water vapor splashed can be prevented from leaking into the gap between the first protective cover 21 and the liquid receiving tray 5. In this embodiment, the barrier 60 can be the same as the aforementioned sealing member 4, for example, a sealing ring.

[0059] In some embodiments, referring to FIGS. 1-3, the first protective cover 21 includes a first barb 216 extending downward from a front end of the top wall 211 of the first protective cover 21. The substrate processing device is further configured such that, when the first protective cover 21 is in the lowered position, the first barb 216 tightly engages with the upper end of the liquid receiving tray 5, preventing splashed liquid from entering the first collection groove 214 when the second protective cover 22 or the third protective cover 23 receives the liquid, so that the purity of the liquid collected by the first collection groove 214 meets the requirements for recycling, thereby reducing the cost of the liquid.

[0060] The first barb 216 has similar design principles as the second barb 226 and the third barb 236. The design parameters of the first barb 216 need to meet the requirements of preventing liquid from entering and avoiding interference with the liquid receiving tray 5 when the first protective cover 21 is raised or lowered. In addition, as shown in FIG. 6, the first seal 41 can also be arranged between the first barb 216 and the second barb 226, which also plays a role in preventing liquid from entering.

[0061] For example, in a substrate processing process, the first protective cover 21 can be used to receive and recycle HF / HNO3 (a mixture of hydrofluoric acid and nitric acid), and the second protective cover 22 can be used to receive and recycle HF (hydrofluoric acid). Referring to FIG. 1, when the first protective cover 21 receives the HF / HNO3 liquid, if the HF / HNO3 liquid splashes, the HF / HNO3 liquid will be blocked outside the barb 226 of the second protective cover 22 and outside the first seal 41, and will not enter the gap between the first protective cover 21 and the second protective cover 22 to affect the purity of the subsequent received HF liquid. Otherwise, if the HF / HNO3 liquid enters the gap between the first protective cover 21 and the second protective cover 22, it will mix with the HF liquid in the second collection groove 224, resulting in a small amount of HNO3 liquid in the recycled HF liquid. After the etching of the HF liquid on the substrate 10, such as the oxide layer, the HF / HNO3 liquid will have an unnecessary chemical reaction with the silicon substrate of the substrate 10, damaging the silicon substrate and causing a large adverse effect on the subsequent process.

[0062] In some embodiments, referring to FIGS. 1-3, the substrate processing device further includes a nozzle 7 for supplying liquid to the substrate 10 and a recycling unit 8 connected to the nozzle 7 and the collection grooves 214, 224, 234 of the plurality of protective covers 2 for independently recycling the liquid discharged from each collection groove 214, 224, 234 and supplying the corresponding liquid to the nozzle 7. The nozzle 7 can supply different liquids to the substrate 10. The nozzle 7 can be implemented in a known manner, and therefore the detailed description of the nozzle 7 is omitted.

[0063] The recovery unit 8 is, for example, a chemical distribution system (CDS). The first collection tank 214, the second collection tank 224, and the third collection tank 234 are respectively connected to the recovery unit 8 for recovering the chemical liquid. A first control valve 28 is arranged between each of the three collection tanks 214, 224, 234 and the recovery unit 8, and can be an electric valve or a manual valve. The recovery unit 8 includes a plurality of storage tanks (not shown) for independently recovering the chemical liquid discharged from each of the collection tanks 214, 224, 234, and when the three collection tanks 214, 224, 234 respectively recover different chemical liquids, the different chemical liquids are recovered into different storage tanks.

[0064] The first collection tank 214, the second collection tank 224, and the third collection tank 234 are also respectively connected to the plant service system 9 for directly discharging the received waste liquid. A second control valve 29 is arranged between each of the collection tanks 214, 224, 234 and the plant service system 9, and can be an electric valve or a manual valve. The liquid receiving tray 5 is connected to the plant service system 9. Since part of the chemical liquid flows into the liquid receiving tray 5 when the first protective cover 21, the second protective cover 22, and the third protective cover 23 respectively receive the corresponding chemical liquid, the mixed chemical liquid in the liquid receiving tray 5 is treated as waste liquid, and the waste liquid is directly discharged to the plant service system 9 through a liquid discharge port and a liquid discharge pipe 51. In the embodiment, each protective cover 2 can choose to recover or directly discharge the received chemical liquid, which is specifically set according to process requirements.

[0065] Embodiment 2

[0066] FIGS. 7-9 are structural schematic diagrams of a substrate processing device according to Embodiment 2 of the present application.

[0067] Referring to FIGS. 7-9, compared with Embodiment 1, Embodiment 2 is different in that the plurality of protective covers 2 include the first protective cover 21, the second protective cover 22, and the third protective cover 23, the first protective cover 21 includes a first barb 216', which extends upward from the front end of the top wall 211 of the first protective cover 21, and the second protective cover 22 includes a second barb 226', which extends upward from the front end of the top wall 221 of the second protective cover 22. In the example shown in FIGS. 7-9, the substrate processing device is configured such that when the first protective cover 21 and the second protective cover 22 are both moved to an upper position or a lower position, in the vertical direction, the upper edge of the first barb 216' is not lower than the upper edge of the top wall 221 of the second protective cover 22, and when the second protective cover 22 and the third protective cover 23 are both moved to the upper position or the lower position, in the vertical direction, the upper edge of the second barb 226' is not lower than the upper edge of the top wall 231 of the third protective cover 23.

[0068] Referring to Fig. 7, when the first shield 21 is in the raised position to receive the liquid chemical splashed from the substrate 10, the first barb 216' can block the splashed liquid chemical from flowing into the gap between the first shield 21 and the second shield 22 and into the second collection groove 224, and the second barb 226' can also block the splashed liquid chemical from flowing into the gap between the second shield 22 and the third shield 23 and into the third collection groove 234. Referring to Fig. 8, when the second shield 22 is in the raised position to receive the liquid chemical splashed from the substrate 10, the second barb 226' can block the splashed liquid chemical from flowing into the gap between the second shield 22 and the third shield 23 and into the third collection groove 234.

[0069] In addition, in the present embodiment, referring to Fig. 7, when the first shield 21 is in the raised position, the first barb 216' extends only upward, and the structure of the first barb 216' itself does not reduce the maximum vertical distance h between the front end of the top wall 211 of the first shield 21 and the substrate 10, and when the liquid chemical on the substrate 10 splashes toward the first shield 21, the liquid chemical between the first shield 21 and the substrate 10 will not be splashed back to the surface of the substrate 10 due to the first barb 216'. Similarly, the second barb 226' shown in Fig. 8 extends only upward, and the liquid chemical between the second shield 22 and the substrate 10 will not be splashed back to the surface of the substrate 10 due to the second barb 226'. Therefore, the substrate processing device of the present embodiment can prevent liquid chemical from flowing into the gap between the shields 2 and the substrate 10, and does not reduce the vertical distance between the shields 2 and the substrate 10, which is beneficial for the shields 2 to receive the liquid chemical. In the present embodiment, because the third shield 23 at the outermost position can prevent the splashed liquid chemical from flowing into the gap between the third shield 23 and the second shield 22 due to the second barb 226', the third shield 23 at the outermost position can not include a third barb extending upward.

[0070] Fig. 10 is a schematic diagram of a partial structure of a configuration of a plurality of shields according to Embodiment 2 of the present application.

[0071] In some embodiments, referring to Fig. 10, when the plurality of shields 2 include the first shield 21, the second shield 22, and the third shield 23, the first shield 21 includes the first barb 216', and the second shield 22 includes the second barb 226' extending upward and downward from the front end of the top wall 221 of the second shield 22. In this case, as shown in Fig. 10, the upper edge of the first barb 216' is not lower than the lower edge of the second barb 226', which can at least block the liquid chemical from flowing into the gap between the first shield 21 and the second shield 22. It should be noted that the lower edge of the second barb 226' should not collide with the first shield 21 during the lifting and lowering of the shields 2.

[0072] In some embodiments, the first barb 216' and the second barb 226' extend in a direction that forms a zero angle with the vertical upward direction.

[0073] FIGS. 11a and 11b are schematic diagrams of a protective cover according to an embodiment of the present application.

[0074] In the example shown in FIG. 11a, the first barb 216' and the second barb 226' extend toward the axis of the substrate holding mechanism 1, and the first barb 216' and the second barb 226' extend in a direction that forms a second predetermined angle a' with the vertical upward direction, where 0° < a' ≤ 60°.

[0075] In the example shown in FIG. 11b, the first barb 216' and the second barb 226' extend away from the axis of the substrate holding mechanism 1, and the first barb 216' and the second barb 226' extend in a direction that forms a second predetermined angle a' with the vertical upward direction, where 0° < a' ≤ 45°.

[0076] The design of the first barb 216' and the second barb 226' needs to meet the requirements of preventing liquid from leaking in, while avoiding interference when the protective covers 2 are raised or lowered.

[0077] In some embodiments, the substrate processing apparatus is further configured such that, when the first protective cover 21 and the second protective cover 22 are both in the raised position or the lowered position, the upper edge of the first barb 216' is higher than the upper edge of the second barb 226'. For example, as shown in FIG. 9, when the third protective cover 23 is in the raised position to receive liquid thrown off from the substrate 10, the first protective cover 21 and the second protective cover 22 are both in the lowered position. Because the upper edge of the first barb 216' is higher than the upper edge of the second barb 226', when liquid on the substrate 10 is thrown toward the third protective cover 23, the height of the first barb 216' can block some of the liquid from entering the gap between the first protective cover 21 and the second protective cover 22, reducing the amount of liquid that falls into the gap. Note that, when the substrate processing apparatus is in operation, if more than two protective covers 2 are in the lowered position, it is preferable that the upper edges of the barbs of the more than two protective covers 2 (including the upper edge of the first barb 216' and the upper edge of the second barb 226') gradually decrease from the inside to the outside in the radial direction of the substrate 10. This is more consistent with the landing path of the liquid than if the upper edges of the barbs are flush, and reduces the amount of liquid that falls into the gap between adjacent protective covers 2. Thus, in this embodiment, by providing the first barb 216' and the second barb 226' that extend upward, liquid leakage can be prevented when the first protective cover 21 and the second protective cover 22 are both in the raised position, and the amount of liquid that falls into the gap between the first protective cover 21 and the second protective cover 22 can be reduced when the first protective cover 21 and the second protective cover 22 are both in the lowered position.

[0078] In some embodiments, the seal 4 in Embodiment 1 is provided between each protective cover 2. In other embodiments, the seal 4 is not provided between each protective cover 2.

[0079] In some embodiments, the plurality of protective covers 2 has two, a first protective cover 21 and a second protective cover 22, which are radially arranged around the substrate holding mechanism in sequence from inside to outside, for respectively receiving the liquid medicine splashed from the substrate 10. The first protective cover 21 includes a first barb 216' extending upward from the front end of the top wall 211 of the first protective cover 21. Since the second protective cover 22 belongs to the outermost circle, no upwardly extending barb is provided. In the example shown in FIG. 12, when the first protective cover 21 and the second protective cover 22 are both moved to the raised position or the lowered position, in the vertical direction, the upper edge of the first barb 216' is not lower than the upper edge of the top wall 221 of the second protective cover 22, so as to block the gap entrance between the first protective cover 21 and the second protective cover 22, preventing the splashed liquid medicine from leaking.

[0080] In the present embodiment, when the first protective cover 21 and the second protective cover 22 are close to each other, the first barb 216' can partially or completely block the gap entrance between the first protective cover 21 and the second protective cover 22. When the second protective cover 22 and the third protective cover 23 are close to each other, the second barb 226' can partially or completely block the gap entrance between the second protective cover 22 and the third protective cover 23. The basic idea of the present embodiment is to improve the liquid leakage problem by providing an upwardly extending barb, and without changing the basic idea, the barb and the barb design parameters can be designed as needed.

[0081] In the present application, the number of protective covers 2 can be increased according to actual process requirements, and the types of liquid medicine can be more, to adapt to more complex and advanced substrate processing processes.

[0082] The above describes the embodiments of the present application, but the present application is not limited to the above-described embodiments, and various modifications can be made without departing from the spirit of the present application.

[0083] Finally, it should be noted that: the above embodiments are only used to illustrate the technical solutions of the present application, and are not limited thereto; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: it can still modify the technical solutions recorded in the foregoing embodiments, or make equivalent replacement to part or all of the technical features; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present application.

Claims

1. A substrate processing apparatus characterized by comprising: The substrate processing device comprises: a substrate holding mechanism for holding a substrate; a plurality of protective covers radially arranged around the substrate holding mechanism for respectively receiving liquid ejected from the substrate; a plurality of lifting mechanisms for respectively driving the plurality of protective covers to ascend to an ascending position or descend to a descending position; a plurality of sealing members respectively arranged between adjacent protective covers; the substrate processing device is configured to make two adjacent protective covers contact the corresponding sealing members when the two adjacent protective covers are in the ascending position or the descending position, so that the two adjacent protective covers are in a closed state.

2. The substrate processing apparatus according to claim 1, wherein The plurality of protective covers comprises: a first protective cover and a second protective cover radially arranged around the substrate holding mechanism from inside to outside; the plurality of sealing members comprises a first sealing member arranged between the first protective cover and the second protective cover.

3. The substrate processing apparatus according to claim 2, wherein The second protective cover comprises a second barb extending downward from the front end of the top wall of the second protective cover.

4. The substrate processing apparatus according to claim 3, wherein The plurality of protective covers further comprises: a third protective cover arranged around the outer periphery of the second protective cover; the plurality of sealing members further comprises a second sealing member arranged between the second protective cover and the third protective cover.

5. The substrate processing apparatus according to claim 4, wherein The third protective cover comprises a third barb extending downward from the front end of the top wall of the third protective cover.

6. The substrate processing apparatus according to claim 4 or 5, characterized by The second barb further extends upward from the front end of the top wall of the second protective cover.

7. The substrate processing apparatus according to claim 5, wherein The angle between the extending direction of the second barb and the vertical downward direction is zero.

8. The substrate processing apparatus according to claim 5, wherein The second barb and the third barb extend toward the axis of the substrate holding mechanism, and the extending direction of the second barb and the third barb respectively forms a first predetermined angle with the vertical downward direction, and the first predetermined angle α is in the range of 0°<α≤60°; or The second barb and the third barb extend away from the axis of the substrate holding mechanism, and the extending direction of the second barb and the third barb respectively forms a first predetermined angle with the vertical downward direction, and the first predetermined angle α is in the range of 0°<α≤45°.

9. The substrate processing apparatus according to claim 1, wherein Further comprising: a liquid receiving tray fixed to the outer periphery of the substrate holding mechanism, and the liquid receiving tray comprises a liquid discharge port and a liquid discharge pipe in communication with the liquid discharge port for discharging liquid in the liquid receiving tray.

10. The substrate processing apparatus according to claim 9, wherein The plurality of protective covers comprises a first protective cover closest to the liquid receiving tray, and the substrate processing device further comprises: a blocking member arranged between the front end of the top wall of the first protective cover and the upper end of the liquid receiving tray; the substrate processing device is further configured to make the top wall of the first protective cover and the upper end of the liquid receiving tray contact the blocking member when the first protective cover is in the descending position.

11. The substrate processing apparatus according to claim 10, wherein The first protective cover comprises a first barb extending downward from the front end of the top wall of the first protective cover; the substrate processing device is further configured to make the first barb tightly engage with the upper end of the liquid receiving tray when the first protective cover is in the descending position.

12. The substrate processing apparatus according to claim 2, wherein The first protective cover comprises a first barb extending upward from a front end of a top wall of the first protective cover.

13. The substrate processing apparatus according to claim 12, wherein The plurality of protective covers further comprises: A third protective cover surrounding an outer periphery of the second protective cover; The plurality of sealing members further comprises a second sealing member disposed between the second protective cover and the third protective cover.

14. The substrate processing apparatus according to claim 13, wherein The second protective cover comprises a second barb extending upward from a front end of a top wall of the second protective cover.

15. The substrate processing apparatus according to claim 14, wherein The second barb further extends downward from the front end of the top wall of the second protective cover.

16. The substrate processing apparatus of claim 14, wherein An included angle between an extending direction of the first barb and a vertical upward direction is zero.

17. The substrate processing apparatus of claim 14, wherein The first barb and the second barb extend toward an axis of the substrate holding mechanism, and an extending direction of the first barb and the second barb respectively forms a second predetermined included angle with a vertical upward direction, the second predetermined included angle α' ranges from 0°<α'≤60°; or, the first barb and the second barb extend away from the axis of the substrate holding mechanism, and an extending direction of the first barb and the second barb respectively forms a second predetermined included angle with a vertical upward direction, the second predetermined included angle α' ranges from 0°<α'≤45°.

18. The substrate processing apparatus of claim 14, wherein The substrate processing device is configured such that, when the first protective cover and the second protective cover are both in the raised position or the lowered position, an upper edge of the first barb is higher than an upper edge of the second barb.

19. The substrate processing apparatus of claim 1, wherein The plurality of protective covers are respectively provided with collection grooves. The substrate processing device further comprises: A nozzle for supplying a chemical liquid to a substrate; A recovery unit connecting the nozzle and the collection grooves of the plurality of protective covers, the recovery unit comprising a plurality of liquid storage grooves for respectively and independently recovering the chemical liquid discharged from each of the collection grooves and supplying the corresponding chemical liquid to the nozzle.

20. A substrate processing apparatus, comprising: Comprises: A substrate holding mechanism for holding a substrate; A plurality of protective covers comprising a first protective cover and a second protective cover, the first protective cover and the second protective cover radially surrounding the substrate holding mechanism from inside to outside, for respectively and independently receiving chemical liquid splashed from the substrate, the first protective cover comprising a first barb extending upward from a front end of a top wall of the first protective cover.

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