System for particulate and microbiological depletion and inactivation of goods

Abstract

The invention relates to a system (100) for the particulate depletion and microbiological depletion and / or microbiological inactivation of goods (150), in particular of the surfaces thereof. The system (100) comprises a cleaning chamber (101) in which the goods (150) can be placed. An access opening (102) of the cleaning chamber (101) can be closed during operation to prevent access. An eddy current system (104) directs a turbulent flow (107) of a cleaning fluid into the cleaning chamber (101) in order to swirl up particles on the goods item (150). A displacement flow system directs a continuous, low-turbulence displacement flow (108) of a cleaning fluid in a predetermined flow direction through the cleaning chamber in order to remove the swirled-up particles from the goods item (150). A UV radiation source (106) radiates UV radiation having a wavelength range of 100 nm to 280 nm into the cleaning chamber (101) for microbiological inactivation. A control device (110) automatically controls a predetermined cleaning procedure.

Description

[0001] System for the particulate and microbiological removal and inactivation of goods

[0002] Technical field

[0003] The present invention relates to a system and a method for the particulate removal and microbiological removal and / or microbiological inactivation of goods.

[0004] Background of the invention

[0005] In environments such as those used in the production of pharmaceuticals, food, or semiconductors, it is essential that goods are cleaned before being introduced into production or storage areas. This cleaning process must remove both dirt particles and microbiological substances or germs. High demands are placed on the cleaning performance of the equipment when goods are transferred from one environment to, for example, a cleanroom.

[0006] For example, microbiological degradation / inactivation can be carried out using UVC radiation. It is also known to remove particles from the surface of the goods being passed through using compressed air pulses. However, it is extremely complex to efficiently perform the various cleaning processes, i.e., for example, the irradiation of the goods together with the aerodynamic removal of particles from the surface of the goods to be cleaned. Description of the invention

[0007] It is an object of the present invention to provide a depletion system for the efficient execution of various cleaning processes of a product to be cleaned, which can be operated effectively and at the same time in an energy-saving manner.

[0008] This task is solved by a system for the particulate removal and microbiological removal and / or microbiological inactivation of goods and a method according to the subject matter of the independent claims.

[0009] According to a first aspect of the present invention, a system for the particulate removal and microbiological removal and / or microbiological inactivation of goods, in particular their surfaces, is described. The system comprises a cleaning chamber in which the goods can be placed, the cleaning chamber having an access opening for handling the goods with respect to the cleaning chamber (i.e., for inserting them into and removing them from the cleaning chamber). The access opening can be closed, in particular locked, to prevent access during operation.

[0010] Furthermore, the system features an eddy current system coupled to the cleaning chamber in such a way that a turbulent flow of a cleaning fluid, in particular air, can enter the cleaning chamber to agitate particles on the goods. The system also features a displacement flow system coupled to the cleaning chamber in such a way that a continuous, low-turbulence displacement flow of a cleaning fluid, in particular air, can flow through the cleaning chamber in a predetermined direction (i.e., from top to bottom (or vice versa) or from one side to the opposite side) to remove the agitated particles from the goods. The displacement flow, for example, exhibits a quality according to H14 when entering the cleaning chamber.Furthermore, the system has a UV radiation source which is coupled to the cleaning chamber in such a way that UV radiation with a wavelength range of 100 nm to 280 nm can be introduced into the cleaning chamber for microbiological inactivation.

[0011] The system also features a control device configured to automatically control at least the eddy current system, the displacement flow system and the UV radiation source in a predetermined cleaning sequence.

[0012] According to a further aspect of the present invention, a method for the particulate removal and microbiological inactivation of goods, in particular their surfaces, using a system described above, is explained. According to the method, the goods are arranged in the cleaning chamber section, and the cleaning chamber is sealed. A turbulent flow of cleaning fluid is introduced into the cleaning chamber to agitate particles on the goods. Furthermore, a continuous, low-turbulence displacement flow of cleaning fluid is introduced to remove the agitated particles from the goods. Additionally, the goods are irradiated with UV radiation with a wavelength range of 100 nm to 280 nm within the cleaning chamber for microbiological inactivation. The control device regulates the eddy current system, the displacement flow system, and the UV radiation source in a predetermined cleaning sequence.

[0013] The cleaning room will consist of appropriate interior walls, i.e.

[0014] The cleaning chamber is formed by side walls, ceiling walls, and floor areas, and encloses an internal cleaning volume in which the goods can be placed for decontamination or inactivation. The cleaning chamber can be bounded, for example, laterally, top, or bottom by the walls of a building within which it is located. In particular, the cleaning chamber can be entirely formed by appropriate panels or walls and thus defined independently of a building wall. The cleaning chamber can, for example, be fixed and immobilized within a building. Alternatively, the cleaning chamber can also be designed as a mobile cleaning chamber and installed at various operating locations and / or integrated into a transport mechanism (e.g., a vehicle).The cleaning chamber can, for example, have various connections for the eddy current system, the displacement flow system, or the UV radiation source. Alternatively, the listed components or systems can also be attached directly to or integrated into the cleaning chamber. The cleaning volume formed inside is sealed from the environment by the walls of the cleaning chamber, in particular hermetically sealed. The cleaning chamber is designed such that appropriate inlet openings into the cleaning volume and corresponding outlet openings for the cleaning fluid are provided.

[0015] The cleaning chamber is designed to accommodate both the goods to be cleaned and system components. The interior cleaning volume is sufficiently large to allow the goods to be processed and moved through. The cleaning chamber has at least one opening for feeding goods (feed opening) and, in one example below, another opening for removing goods. During the cleaning process, access to the containment or cleaning chamber is closed to personnel, preferably locked and secured. The cleaning fluid can be, for example, a gaseous fluid (such as air), an aerosol (such as air with aerosols of a cleaning agent), or a liquid fluid. The cleaning fluid can also be introduced into the cleaning chamber in a ribbon-like fashion, i.e., using an eddy current system or a displacement flow system.

[0016] The access opening to the cleaning room is designed to be selectively closed, in particular lockable, for example by means of a locking device. For instance, a pivoting door or a flap device can be provided as a locking device to selectively open the second opening. Furthermore, the access opening can have a separate airlock device, so that the goods are first introduced into the airlock device, then the surrounding atmosphere is removed from the airlock device, and only then is it possible to introduce the goods into the cleaning room.

[0017] Furthermore, the locking device can be controlled by the control unit, so that the control unit can automatically open or close the access opening.

[0018] The vortex system is, for example, located externally to the cleaning chamber or, alternatively, integrated within it. The vortex system includes, for example, a fluid source for the cleaning fluid. Furthermore, the vortex system includes a conveying device, such as a pump, to supply the appropriately printed cleaning fluid to the cleaning chamber. The vortex system directs the printed cleaning fluid to the cleaning chamber, where corresponding vortex elements are located. These include, for example, nozzle openings formed in the wall of the cleaning chamber or flow probes projecting into the cleaning volume, with corresponding flow nozzles at their ends. The vortex system is designed to generate a turbulent flow of the cleaning fluid. For this purpose, the vortex system may include corresponding vortex elements, so-called vortex generators, to generate this turbulent flow.Furthermore, the eddy current system can, for example, introduce pulses of turbulent cleaning fluid into the cleaning volume in a sequential manner. Sound-dampening elements can also be incorporated to reduce the noise level of the turbulent flow. The turbulent flow of the cleaning fluid improves particle dislodging upon contact with the surface of the item being cleaned, as the turbulent flow causes shear forces, for example, to detach the particles from the surface and swirl them into the cleaning volume.

[0019] The displacement flow system is, for example, located externally to the cleaning chamber or, alternatively, integrated within it. The displacement flow system includes, for example, a fluid source for the cleaning fluid. Furthermore, the displacement flow system includes a conveying device, such as a pump or fan, to supply the appropriately printed cleaning fluid to the cleaning chamber. The displacement flow system directs the printed cleaning fluid to the cleaning chamber, where corresponding inlet elements, such as nozzle openings formed in the wall of the cleaning chamber or flow probes projecting into the cleaning volume, are located. These probes are fitted with corresponding flow nozzles at their ends. The displacement flow system is designed to generate a continuous, low-turbulence displacement flow of the cleaning fluid.Ideally, the displacement flow is a laminar flow with minimal eddies and turbulence. To achieve this, the displacement flow system incorporates flow elements designed to generate a flow with minimal turbulence. For example, flow straighteners (laminarizers) can be used in the displacement flow's feed channel to create a directed, low-turbulence flow. This low-turbulence displacement flow can be directed precisely along a specific path through the cleaning volume, such as from a ceiling area of ​​the cleaning chamber towards a floor area. The low-turbulence displacement flow allows particles within the cleaning volume to be selectively transported to a predetermined location within the cleaning chamber. Specifically, particles stirred up by the vortex flow system can be removed by means of the displacement flow.The eddy current system and the displacement flow system can be operated simultaneously or alternatively sequentially, so that first the eddy current system of the turbulent flow stirs up the particles and subsequently the displacement flow of the displacement flow system carries away the stirred-up particles.

[0020] The cleaning fluid for the eddy current system and the displacement flow system can, for example, consist of one and the same cleaning fluid, such as air. Alternatively, different cleaning fluids can be used for the eddy current system and the displacement flow system.

[0021] In particular, the cleaning fluid for the displacement flow is introduced with a quality of H14. This means that the displacement flow, for example, before entering the cleaning volume, passes through and is cleaned by a HEPA H14 filter. A HEPA H14 filter is characterized in particular by a particle separation efficiency of 99.995% for particle sizes of 0.1 to 0.2 pm and can comply with DIN 1946-4 Part 4 (alternatively EN 1822). The UV radiation source is configured to emit UV radiation, in particular UVC radiation, into the cleaning volume, especially towards the goods, in order to achieve microbiological inactivation of the goods or their surface. In particular, the UV radiation source is configured to emit UV radiation with a wavelength range of 100 nm to 280 nm, especially 150 nm to 250 nm.UV-C radiation is capable of killing and / or inactivating bacteria, germs, fungi, and viruses. UV-C radiation can be used for surface disinfection of goods, disinfection of the air within the cleaning area, and / or inactivation of at least some microorganisms. The inactivation effect of the UV radiation can be precisely adjusted by the control unit through the irradiation duration and dose. The UV radiation source can also be an LED to emit focused UV radiation onto the goods.

[0022] The control unit is connected to the eddy current system, the displacement flow system and the UV radiation source via signal technology.

[0023] Furthermore, the control unit can also be coupled to the closing device of the access openings to selectively open or close the access opening. Accordingly, the control unit is configured to send control commands or control signals to the above-mentioned devices.

[0024] The system components are transmitted and controlled accordingly. A specific cleaning sequence can be predefined for the control unit. The control unit, for example, has a processor that can generate corresponding control signals for the system components based on the cleaning sequence. The control unit can be connected to a remote central control system via a network (e.g., via the internet or cloud-based), either wired or wirelessly. A cleaning sequence can then be automatically predefined by controlling the control unit. The control unit may also have a database unit in which one or more different cleaning sequences are stored. Depending on the item being cleaned, the control unit can automatically decide which specific cleaning sequence should be performed.A cleaning sequence defines, for example, the performance of the eddy current system, the displacement flow system, and the UV radiation source. Furthermore, the cleaning sequence defines the order in which these systems operate. The control unit can then automatically control the system components simultaneously or sequentially, depending on the predefined cleaning sequence.

[0025] By using compressed air (cleaning fluid) as a turbulent airflow to blow off the surface of the goods, the particles lying on or lightly adhering to it are stirred up. The control unit can regulate the power of the vortex system in such a way that the stirred-up particles do not re-colonize already cleaned areas of the goods while still achieving sufficient removal efficiency.

[0026] The directed, low-turbulence displacement flow (DV) is directed by the displacement flow system across a large portion of the interior or cleaning volume of the cleaning chamber of the particle removal system. This ensures that the suspended particles are removed (and largely do not settle back onto the goods or the environment). Using a predominantly low-turbulence displacement flow can achieve both energy savings (air conveyance under laminar and / or low-turbulence conditions is more energy-efficient than under turbulent flow conditions) and a reliable removal effect of the suspended particles. By using removal air of at least H14 quality (e.g., via upstream H14 filters), it can be ensured that the interior of the particle removal system is not contaminated or flooded with foreign substances.

[0027] The described system and process for particulate removal and microbiological removal and / or microbiological inactivation of goods provides a semi- or fully automated system for combined particulate removal with microbiological removal / inactivation, particularly using UVC radiation. Due to the precise coordination of the individual system components, such as the introduction of turbulent flow, displacement flow, and the precise activation of UV radiation, the removal process or the corresponding cleaning sequence can be designed efficiently. This ensures that, for example, despite energy-saving measures, the removal performance remains high and a defined removal rate can be achieved.

[0028] According to an exemplary embodiment, the cleaning chamber further comprises an unloading opening such that the goods can be conveyed into the cleaning chamber through the access opening and out through the unloading opening. The unloading opening can, for example, be arranged on the same side of the cleaning chamber as the access opening. Alternatively, the unloading opening can be arranged on different sides of the access opening. Thus, for example, the cleaning chamber can be accessible from different environments, allowing, for instance, the introduction of soiled goods from one side and the discharge of cleaned goods from another. The unloading opening can also have a closing device that selectively closes the cleaning chamber. In an exemplary embodiment, the closing device can also be selectively controlled by the control unit, particularly depending on the cleaning process.According to an exemplary embodiment, the eddy current system is configured such that the turbulent flow can enter the cleaning chamber with a pressurized fluid system at a maximum pressure of more than 1 bar, in particular more than 2 bar, preferably more than 4 bar, and / or that the maximum fluid flow rate for the turbulent flow through the cleaning chamber is more than 10 Nl / min, in particular more than 25 Nl / min, preferably more than 50 Nl / min. It has been found that it is optimal to generate the turbulent airflow with a compressed air system (e.g., a compressor) of the eddy current system at a maximum pressure of more than 1 bar, in particular more than 2 bar, preferably more than 4 bar, and / or to configure a maximum airflow rate for the turbulent airflow of more than 10 Nl / min, in particular more than 25 Nl / min, preferably more than 50 Nl / min. The unit Nl / min describes the standard volumetric flow rate.Under these conditions, the ratio of energy input for air supply to particle removal effect can be optimal.

[0029] According to an exemplary embodiment, the eddy current system is configured such that the turbulent flow reaches a maximum velocity of over 10 m / s, in particular over 20 m / s, preferably over 50 m / s, in the cleaning chamber, and / or that the turbulent fluid flow can be pulsed into the cleaning chamber. The turbulent airflow can be directed at the product at a maximum velocity of over 10 m / s, in particular over 20 m / s, preferably over 50 m / s, and can especially be pulsed. Pulsing the airflow allows for better depletion because the modulation of the turbulent flow (above a certain minimum modulation range, which can be generated with the high airflow velocities mentioned above) results in an improved depletion effect.

[0030] According to an exemplary embodiment, the displacement flow system is configured such that the low-turbulence displacement flow passes through the cleaning chamber at an average velocity of less than 2 m / s, in particular less than 1 m / s, preferably less than 0.5 m / s. Particularly favorable ratios between energy input for generating the displacement flow and particle removal performance in the ambient air of the goods or in the cleaning volume were achieved when the low-turbulence displacement flow maintained an average velocity of less than 2 m / s, in particular less than 1 m / s, preferably less than 0.5 m / s, over a greater distance.

[0031] According to an exemplary embodiment, the eddy current system is configured such that the material experiences a wall shear stress of >1 Pa, particularly >3 Pa, and more specifically >5 Pa, during particle removal by the turbulent fluid flow. By using, for example, suitable nozzles, it can be achieved that the material experiences a wall shear stress of >1 Pa, particularly >3 Pa, and preferably >5 Pa, during particle removal by the turbulent (air) flow. This wall shear stress ensures that the desired minimum removal effect occurs and that the partial task of particle removal is reliably accomplished.

[0032] According to an exemplary embodiment, the eddy current system has nozzles for the outflow of the turbulent fluid flow,

[0033] The nozzles are specifically configured to expel the turbulent fluid flow using a Venturi effect. The design of the outlet openings on the wall of the cleaning chamber also offers optimization possibilities for the turbulent (air) flow. An improved removal effect is achieved when these outlet openings are equipped with nozzles. Additionally, the nozzles can be Venturi nozzles, allowing for an increase in blow-off performance based on the Venturi effect without increasing the energy consumption of the compressed air, thus indirectly reducing energy consumption.

[0034] According to an exemplary embodiment, the system further comprises an ionization device designed to ionize the low-turbulence displacement flow before or upon entry into the cleaning chamber. This results in fewer or no static charges forming on the surface of the goods, which could potentially lead to particle adhesion due to static charges and / or increased resuspension due to electrostatic repulsion forces (particle-particle, but also particle-wall, particle-goods).

[0035] According to an exemplary embodiment, the cleaning chamber has a surface area configured to exhibit, when UV radiation is emitted and 3x3 mm areas are measured, a surface roughness (Ra) of <0.5 mm, particularly <100 micrometers, and more preferably <20 micrometers, and / or a roughness depth (Rz) of <0.8 mm, particularly <0.2 mm, and more preferably <0.08 mm. The internal surfaces of the cleaning chamber, which are illuminated by UV radiation, are designed to have a suitable reflective effect for the UV radiation. It was found that surfaces which, when 3x3 mm areas were measured, predominantly exhibit both a surface roughness (Ra) of <0.5 mm (particularly <100 micrometers, preferably <20 micrometers) and a roughness depth (Rz) of <0.8 mm (particularly <0.2 mm, preferably <0.08 mm).The walls (0.8 mm) reflect sufficiently strongly to maintain the minimum UV radiation dose on the product surface. According to an exemplary embodiment, the cleaning chamber has at least one reflector oriented such that the reflected UV radiation is predominantly emitted past the UV source. To reduce the heat generated by the UV source (and thus extend its lifespan), it is advantageous for the walls and / or reflectors to be oriented and / or constructed in such a way that the reflected UV radiation is predominantly emitted past the UV source. This can be achieved through a suitable reflector shape and / or wall construction.

[0036] According to an exemplary embodiment, the UV radiation source comprises a UV lamp and a reflector element, wherein the UV lamp has a first region oriented towards the goods and a second, rearward region facing away from the cleaning area. The reflector element has a concave reflection area arranged relative to the UV lamp such that UV light emitted by the UV lamp in the rearward region can be reflected by the reflector element towards the cleaning area. Furthermore, the reflector element has a convex reflection area such that the UV radiation reflected in the convex reflection area is predominantly emitted past the UV lamp.

[0037] The UV lamp can, for example, be rod-shaped with a round cross-section. The UV lamp emits UV radiation completely. The reflector element has a reflective surface to reflect UV radiation. The rear section of the UV lamp, specifically half its circumference, is enclosed by the reflector element. The reflector element essentially forms a halved, elongated sleeve that extends along the length of the UV lamp and is positioned at a distance from it. The majority of the reflector element consists of a concave reflective surface, so that UV rays are reflected from this surface and directed back towards the product. The concave surface has a curvature that prevents direct reflection (180°) back to the UV lamp.In the area of ​​the reflective element where a reflection of the UV radiation would strike the UV lamp, a convex reflection zone is formed. In other words, a raised area with a convex shape is created in the concave reflection zone, at which the UV rays are reflected in such a way that they pass by the UV lamp. This reduces damage, such as premature aging of the UV lamp.

[0038] According to an exemplary embodiment, the UV radiation source is configured such that, during an inactivation cycle, the difference between the highest and lowest applied UV energy of the UV radiation in 90% of the cleaning chamber's volume is no more than eight times, in particular no more than four times, and furthermore, in particular no more than two times, the UV energy. The reflective walls of the cleaning chamber, the reflectors arranged on the walls of the cleaning chamber, the arrangement of the UV radiation source (which, for example, comprises a plurality of UV lamps), and the design of the cleaning chamber's surface profile are configured such that the UV radiation dose generated by the UV radiation source over a certain period and acting on the goods is as uniform and constant as possible. In other words, the radiation intensity is adjusted within the claimed range of variation.To ensure microbiological inactivation, a defined minimum dose is necessary. Any dose higher than this minimum dose represents a form of energy waste, which can be reduced by the measures described. These measures have resulted in the difference between the highest and lowest applied UV dose not exceeding 8, particularly not exceeding 4, and preferably not exceeding 2, in 90% of the product volume of the decontamination system and / or the product surface.

[0039] According to an exemplary embodiment, the UV radiation source is configured to emit UV radiation with a power of more than 10 W, in particular more than 20 W, and further, in particular, more than 50 W. Furthermore, the UV radiation source can be configured to emit UV radiation with a principal emission wavelength between 200 nm and 280 nm, in particular between 230 nm and 272 nm, and further, in particular, between 245 nm and 265 nm. A desired minimum irradiation dose of 100 mJ / cm² is achieved. 2For irradiation of the product surface, it is advantageous if the UV radiation source has a power output of more than 10 W, particularly more than 20 W, and preferably more than 50 W, as the efficiency of the UV radiation source increases with higher power. Additionally, microbiological inactivation is particularly effective if the main emission wavelength of the UV source is between 200 nm and 280 nm, particularly between 230 nm and 272 nm, and preferably between 245 nm and 265 nm. This allows for rapid inactivation without excessively long cycle times for this subtask. Insufficient radiation power allows microorganisms to multiply again during irradiation, necessitating an even higher dose (for the same inactivation effect), which would again represent a waste of energy.

[0040] According to an exemplary embodiment, a filter device is provided which is designed such that cleaning fluid discharged from the cleaning chamber can be filtered to a quality at least equivalent to H14, wherein the filter device in particular comprises an H14 HEPA filter. If the air discharged from the cleaning system to the environment and / or the exhaust system has a quality equivalent to H14 (i.e., an H14 HEPA filter is interposed), the exhaust air from the system for low-turbulence displacement flow (and thus also indirectly the exhaust air of the pulsed turbulent flow from the cleaning nozzles) can be discharged without environmental pollution.

[0041] According to an exemplary embodiment, the eddy current system is designed such that the fluid turnover of the cleaning fluid during turbulent flow is greater than 30 m³. 3 / h (volume flow rate), especially greater than 50m³ 3 / h, especially greater than 100m 3 / h. By using a high volume flow rate for turbulent flow during the blow-off of the product surface, it can be ensured that the soluble particles are reliably stirred up (and subsequently removed with the directed TAV).

[0042] The overall energy balance showed that a shorter but more intense turbulent flow (higher volume flow rate) is energetically more efficient than turbulent flow with a lower volume flow rate that circulates through the cleaning volume over a longer period. Particularly good results were achieved when the air turnover or volume flow rate of the turbulent flow in the vortex system exceeded 30 m³ / h. 3 / h especially larger than 50m 3 / h, especially greater than 100m 3 / h is.

[0043] According to an exemplary embodiment, the cleaning process can be controlled by the control device in such a way that

[0044] a) first, by means of the eddy current system, the turbulent flow of the cleaning fluid, in particular with a pulsed turbulent fluid flow, can be introduced into the cleaning chamber in order to stir up particles on the goods,

[0045] b) the continuous, low-turbulence displacement flow of the cleaning fluid can then flow through the cleaning chamber in a predetermined direction by means of the displacement flow system in order to remove the suspended particles from the goods, and

[0046] c) then, by means of the UV radiation source, the UV radiation can be introduced into the cleaning room for surface decontamination of the goods with UV radiation.

[0047] The control unit is configured to implement automated control of the purification system. The control unit manages the aforementioned system components, in particular the sequencing of the individual steps in the cleaning process. Controlling the cleaning process also affects the ratio between cleaning performance and overall energy consumption. Through control by the control unit, purification can be carried out in several steps. For example, the control unit manages the UV light source and the eddy current system such that, prior to microbiological purification with radiation, particulate purification is performed using a turbulent fluid flow, specifically a pulsed turbulent flow (airflow).Furthermore, the control unit regulates the displacement flow system in such a way that a chamber cleaning of the cleaning chamber or cleaning volume with continuous, low-turbulence displacement flow takes place between particle removal with the turbulent flow and radiation decontamination. This cleaning pause between blow-off with the turbulent airflow and microbiological inactivation ensures that resuspended particles do not settle back onto the goods and thus shade surface areas, which would reduce the inactivation efficiency (and thus require more UV radiation and therefore more primary energy for the necessary inactivation). The same applies to air turbidity caused by resuspended particles in the case of operation without this pause.

[0048] 'Depletion pause'. According to another exemplary embodiment, the UV radiation source is configured to irradiate surface segments of the goods with a minimum UV radiation energy of 100 mJ / cm², in particular at least 200 mJ / cm², and further, in particular at least 400 mJ / cm². It has proven to be particularly energy-efficient if, after particle depletion, the depletion system irradiates the essential surface segments of the goods with a minimum UV energy of 100 mJ / cm², in particular at least 200 mJ / cm², and further, in particular at least 400 mJ / cm². This energy control can be implemented adaptively by means of the control device. In this context, adaptive means that the exposure time or the UV intensity is controlled based on the dose measurement. A radiation source, in particular, can change its emission power during its lifetime.This (automatic) adaptation ensures that the primary energy used is minimized.

[0049] According to another exemplary embodiment, the UV radiation source includes a radiation sensor configured to measure the UV radiation energy of the UV radiation emitted by the UV radiation source. In particular, the control device is coupled to the UV radiation energy in such a way that the UV radiation source can be controlled based on the measured UV radiation energy. The radiation sensor measures the radiation dose and / or ensures that this radiation dose has been delivered with the aforementioned minimum energy. The radiation sensor is an electronic sensor that, for example, implements the adaptive principle described above through implicit control by means of the control device, particularly in real time.It is therefore advantageous to monitor, by means of an (electronic) radiation sensor, that the radiation source delivers the intended power, in particular that several radiation sensors monitor the radiation power / dose (redundancy) and / or that a radiation sensor is regularly checked for its functionality (functional reliability).

[0050] According to another exemplary embodiment, the cleaning room has at least one interior wall facing the interior volume of the cleaning room, wherein the at least one interior wall is, in particular, at least partially made of glass, aluminum, and / or stainless steel. Additionally or alternatively, at least one interior wall can, in particular, have a multi-layered construction. Glass, aluminum, or stainless steel have proven to be particularly suitable (with regard to reflection and embodied energy for the construction of the system) for the interior walls of the cleaning room facing the goods. In particular, if these walls consist of multi-layered material, embodied energy (i.e., energy for the production of the system) can be saved. Multi-layered material can be sandwich constructions made of different materials and / or sandwich panels made of the same material (e.g., ALUCORE®).with cavities in the internal structure.

[0051] According to another exemplary embodiment, the cleaning chamber has at least one inner wall which is at least partially covered by a cover made at least partially of glass, aluminum, and / or stainless steel. Since plastics age rapidly, become brittle, and / or exhibit increased plasticizer release under the influence of high UV radiation (which can continue even after the UV radiation source is switched off and thus form reflection-reducing deposits on the surfaces), it is advantageous if the essential (plastic) components on the inside of the cleaning chamber have a cover, in particular one made of glass, aluminum, or stainless steel. Such a cover can reduce both the radiation exposure and the introduction of plastic particles into the interior.

[0052] According to another exemplary embodiment, the cleaning chamber has an airlock device by means of which the cleaning chamber can be selectively accessed or closed off via the access opening and / or the discharge opening. The airlock device is designed, in particular, to provide a barrier-free transition and / or a drive-over transition. The airlock device can, for example, form a sealed intermediate area in which the goods are initially placed. Subsequently, the atmosphere in this intermediate area can be extracted so that the access opening towards the cleaning volume can then be opened, thus preventing the atmosphere in the cleaning chamber from being contaminated by the air from which the goods are introduced.For example, the airlock device can have two opposing locking flaps that can be selectively opened or closed, particularly by means of a control unit, to allow goods to be introduced into the intermediate area. The locking flaps can be sealed with gaskets, for example, selectively inflatable gaskets. The control unit can have a vent in the intermediate area to extract the atmosphere present there. This prevents contamination of the cleaning chamber when goods are introduced. For the integration or automation of the cleaning process, it has proven advantageous to use the airlock device described above, and in particular to implement this airlock device with a threshold-free and / or drive-over locking system. This allows the cleaning chamber to be, for example,The cleaning room can be loaded and / or unloaded using a pallet truck or a forklift as a conveying system (as described in detail below). According to another exemplary embodiment, the cleaning room is designed such that the access opening and the unloading opening are located opposite each other (i.e., on opposite wall areas or interior walls) to provide a tunnel system. This allows the goods to be efficiently conveyed from a first area through the cleaning room to a second area, for example, a cleanroom. For instance, a conveying system (as described in detail below) can be easily installed in such a tunnel system. Thus, a conveyor belt or manipulator of the conveying system can transport the goods through the cleaning room even during the cleaning process.Accordingly, the control unit can control the conveyor system, enabling fully automated integration of the transport and cleaning of the goods.

[0053] For example, a continuous or sequential pseudo-continuous conveying of the goods can be implemented, whereby the conveyor belt of the conveying system stops intermittently during partial process steps, for example to open or close access points (e.g., the lock control, cleaning by vortex flow, displacement flow and / or subsequent UV irradiation using a UV radiation source).

[0054] According to another exemplary embodiment, the control device is configured to measure or determine the operating time of the UV radiation source and, in particular, at least one additional measurement parameter from the group consisting of current, voltage, temperature, radiation intensity, switching cycles, initial start-up time, age of the radiation source, and vibrations. Based on the operating time of the UV radiation source and the at least one additional parameter, the control device is configured to initiate preventive maintenance, in particular a replacement, of the UV radiation source (106). According to another exemplary embodiment, the control device is configured to monitor the temperature of the UV radiation source, in particular the surface temperature of the UV radiation source.For example, a specific temperature limit can be set for the UV radiation source, whereby the control unit takes countermeasures, such as deactivating the radiation source, if the limit is exceeded for a certain value or duration. It has proven advantageous to monitor the temperature of a UV radiation source, particularly the surface temperature; preferably, all temperatures of all UV lamps within the UV radiation source are monitored. This has the advantage that when irradiating a highly reflective product (e.g., aluminum pouches), the reflected UV radiation does not additionally heat the radiation source beyond a certain limit, potentially causing it to overheat.

[0055] According to another exemplary embodiment, the control unit has a manually operated emergency shutdown device, wherein the emergency shutdown device is configured to switch off the UV radiation source, mechanically release access through the access opening and / or the discharge opening, and / or deactivate the eddy current system and / or the displacement flow system. The control unit is configured, for example, to monitor the closure status of the access opening and / or the discharge opening (103) during operation. To achieve a high level of safety for people in the vicinity, it is advantageous for the system to have a particularly manual emergency shutdown option, which, for example, switches off the UV radiation source, stops the mechanical movement of the goods, releases access, and / or stops the turbulent airflow; preferably, that (additionally) the access points are monitored for closure during the depletion process.

[0056] According to another exemplary embodiment, the system includes a conveying system for conveying the goods, in particular continuously or discontinuously, through the access opening and / or through the discharge opening. The control unit is specifically configured to control the conveying system.

[0057] The conveyor system is designed to transport goods into and out of the cleaning area. Specifically, the conveyor system can be designed to transport goods within the cleaning area. It can be configured to transport goods continuously, i.e., at a constant speed, or sequentially or discontinuously. The conveyor system can, for example, include one or more manipulators (such as robot arms) to grasp the goods and move them from a starting point to a destination. The manipulator can have a mechanical gripper, a magnetic gripper, or a vacuum gripper to grasp the goods. Furthermore, the conveyor system can include a conveyor track that, for example, extends through the openings of the cleaning area and runs through its entirety. The goods can be transported along the conveyor track in the direction of travel.The conveyor system can, for example, consist of a roller conveyor, a belt conveyor, or a compressed air conveying system. Depending on the cleaning process, the control unit can regulate the conveyor system and transport the goods to a designated location.

[0058] According to another exemplary embodiment, the system comprises a carrier system on which the goods can be placed, wherein the carrier system is designed to load and / or unload the goods into the cleaning chamber. The carrier system is, in particular, a basket or a pallet that can be conveyed by means of the conveyor system. The conveyor system comprises, in particular, a manipulator for handling the carrier system and / or a conveyor belt on which the carrier system can be placed. The control unit is configured to control the conveyor system with respect to the carrier system. For loading the cleaning chamber, it has proven advantageous if the goods are loaded and / or unloaded into the cleaning chamber on a carrier system. The carrier system comprises, for example, a basket or a pallet.Furthermore, multiple items can be placed on a single carrier system, such as a pallet, allowing the conveyor system to transport several items simultaneously, thus increasing efficiency. This eliminates the need to individually feed and unload each item.

[0059] According to another exemplary embodiment, the support system is designed such that all sides of the goods are accessible to the displacement flow and / or the turbulent flow. In particular, the support system is designed such that at least five sides of the goods are accessible to the displacement flow and / or the turbulent flow to more than 90%, in particular more than 95%, and further, in particular more than 98%, and a further side (for example, the bottom of the goods, which rests on the support system) is accessible to the displacement flow and / or the turbulent flow to more than 50%, in particular more than 70%, and further, in particular more than 90%. This can be achieved, for example, with UV-permeable baskets, with support devices on columns, etc. Alternatively, the goods can also be moved with a manipulator. For example, the support system can form a support area for the goods.The contact area cannot be fully formed.

[0060] For example, the support area can have a grid structure. Furthermore, the support area can have two spaced-apart thin support rods between which the appropriate flow (displacement flow or turbulent flow) of the cleaning fluid can reach the base of the item. Depletion / inactivation is particularly challenging for the base of an item being cleaned. A suitable support system allows maximum access for compressed air and UV radiation.

[0061] According to another exemplary embodiment, the cleaning chamber can be installed between a first and a second room area. The first and second room areas are designed to handle different particle quantities per square meter. 3to exhibit air and / or different concentrations of active organisms in the air. The cleaning room must be installed in such a way that the room is ventilated, particularly between the first and second room areas, and that leakage rates through the cleaning room are less than 1.2 l / (m³). 2 *s), especially less than 0.2 l / (m²) 2 *s), furthermore, in particular less than 0.05 l / (m²) 2 ) amount, and furthermore, in particular, that the maximum room air leakage rate can be provided up to a differential pressure of 40 Pa between the first room area and the second room area.

[0062] The first and second spatial areas are, for example, rooms or hall sections whose atmospheres are separated. The cleaning room according to the invention can be installed in a transition area and, due to its structural and functional design, forms a reliable barrier between the two spaces. Using the removal system, contaminated goods can thus be introduced from the first spatial area into the cleaning room and cleaned. The cleaned goods are then transferred to the second spatial area, which can, for example, be a cleaner room (cleanroom). These goods are thus cleaned for the second spatial area with a lower particle load, preventing contamination of the cleaner area. The removal system or the cleaning room can provide a sufficiently airtight separation between the two areas.The room air leakage rates described above between the two room areas can be achieved through appropriate sealing. For leakage rate measurement, the area covered by the system according to the invention (e.g., the area of ​​the passage between two room areas or the area of ​​the access or discharge opening of the cleaning room) between the two areas can be used as a reference area.

[0063] According to another exemplary embodiment, the eddy current system is configured to move an outlet opening, in particular a nozzle, for turbulent cleaning fluid relative to the product during the inflow of the turbulent flow. Specifically, an outlet opening, in particular the nozzle, and / or the product are movable for this purpose, and the control device is configured to control the movement of the outlet opening and / or the movement of the product (relative to the outlet opening). For example, the outlet opening, in which, for instance, a controllable nozzle is arranged, can be moved by means of a mechanical actuator during the cleaning process, so that the outlet opening for turbulent air (e.g., a nozzle) experiences relative movement to the product during cleaning. For this purpose, the outlet opening (nozzle) and / or the product can be moved. This allows an automation system, for example, toThe process involves moving a nozzle along the surface of the product to optimally remove particles. Alternatively, the product can be moved along a nozzle using a conveying system (e.g., a manipulator or conveyor belt).

[0064] According to another exemplary embodiment, the system includes a motion device for moving the UV radiation source and / or a UV radiation steering system for the UV radiation source relative to the product during microbiological inactivation, wherein the control unit is configured to control the motion device. The motion device includes, for example, a joint or linear system to which, for example, one or more articulated arms movably attach the UV radiation source to an inner wall of the cleaning chamber. The joint system can be controlled, for example, by means of an electric actuator. The control unit can send corresponding control commands for this purpose.

[0065] The UV radiation guidance system is configured to control the direction of the UV radiation. The UV radiation guidance system includes, for example, a light guide, a mirror, and / or a lens system. The UV radiation guidance system can be moved relative to the product and, for example, also relative to the UV radiation source, by means of a movement device, so that the UV radiation can be directed to a desired location on the product.

[0066] The motion device can thus move the UV radiation source and / or the UV radiation guidance system (e.g., its lens systems) and / or the goods. This allows an automation system, for example, with the UV radiation source or a UV radiation guidance system, to deliver a high dose rate precisely along a surface of the goods, thereby optimally inactivating them microbiologically. Alternatively, the goods can be moved along a (static) UV radiation source or within the desired area of ​​a light guidance system using a conveyor belt. In an exemplary embodiment, a nozzle of the eddy current system can also be coupled to the motion device, so that both subsystems, i.e., the UV radiation source and the eddy current system, can be moved by one and the same actuator.

[0067] According to another exemplary embodiment, the movement device for the UV radiation source and / or the UV radiation steering system has at least one degree of freedom, wherein the control device is configured to control the movement device depending on the nature of the goods. The movement device for the UV radiation source or the UV radiation steering system controls it along at least one degree of freedom. The control device can control the movement device in such a way that, for example, the contour of a product is followed to enable complete UV irradiation or cleaning.In particular, the motion control of the movement device can be used to adjust the distance to the UV radiation source, for example due to different radiation intensity or a constant surface profile of the goods, in order to enable a constant dose rate input on the surface of the goods, which in turn reduces the necessary energy consumption.

[0068] According to another exemplary embodiment, the system includes a sensor system configured to determine the position of the goods in the cleaning chamber and / or to determine the goods' geometric dimensions. The sensor system includes, for example, an optical sensor, in particular a camera and / or a 3D sensor, for determining optical data regarding the position of the goods in the cleaning chamber and / or the goods' geometric dimensions. The control unit is configured, based on the optical data, to control the loading and / or unloading of the cleaning chamber with respect to the cleaning chamber and / or the cleaning process. The control unit is configured, in particular, to control the position of the goods in the cleaning chamber and / or the geometric dimensions of the goods and / or the cleaning process by means of object recognition, artificial intelligence, and / or measurement of the goods using the sensor system.

[0069] According to another exemplary embodiment, the conveyor system is configured to separate the goods from a multitude of unsorted and / or irregularly arranged goods located outside the cleaning chamber and place them in the cleaning chamber before loading. The control unit regulates the conveyor system such that, based on the optical data from the sensor system, a multitude of goods can be placed in the cleaning chamber. The control unit regulates the cleaning process, in particular the movement of the eddy current system, the displacement flow system, and / or the UV radiation source, based on the arrangement of the goods in the cleaning chamber.

[0070] The sensor system can also include other sensor types, such as a distance sensor, a mechanical touch sensor (pushbutton), or an infrared sensor. The sensor data (e.g.,

[0071] Parameters measured using pushbuttons, optical sensors, camera images, video data, and 3D sensors are acquired and processed by the system's control unit. Based on these measured parameters, the control unit can then optimize the loading and / or unloading of the depletion system or cleaning chamber, and / or the cleaning process (optimization of the depletion cycle).

[0072] Additionally, object recognition, AI and / or measurement using the control unit that controls the conveyor system can separate the goods from an unsorted and / or irregular arrangement and / or accumulation of goods, so that no prior sorting of the goods is necessary.

[0073] Furthermore, based on the measured parameters, the control unit can use the sensor system to influence, control, and / or regulate the position, distance, cycle time, speed, and / or intensity of the goods or the cleaning process. The control unit can use the sensor parameters to control the position of the goods, the outlet for turbulent air, and / or the UV radiation source and / or its light distribution.

[0074] In summary, the present invention provides a semi-automatic, and in particular a fully automatic, system for cleaning the surface of a product by removing particles using compressed air pulses (eddy current system), removing particles using directed TAV (displacement flow system), and performing microbiological removal / inactivation using UVC radiation (UV radiation source).

[0075] Furthermore, the cleaning process can be designed in such a way that the inner walls of the cleaning room are constructed in such a way that UV rays are specifically and appropriately reflected within the cleaning room on the inner walls and other components, so that the radiation yield on the surface of goods is maximized.

[0076] It should be noted that the embodiments described here represent only a limited selection of possible embodiments of the invention. It is possible to combine the features of individual embodiments in a suitable manner, so that a multitude of different embodiments are considered to be obviously disclosed to the person skilled in the art with regard to the embodiments explicitly described here. In particular, some embodiments of the invention are described by apparatus claims and other embodiments by method claims. However, it will become immediately clear to the person skilled in the art upon reading this application that, unless explicitly stated otherwise, in addition to a combination of features belonging to one type of subject matter, any combination of features belonging to different types of subject matter is also possible. Brief description of the drawings

[0077] For further explanation and better understanding of the present invention, exemplary embodiments are described in more detail below with reference to the accompanying drawings.

[0078] Fig. 1 shows a schematic representation of a system for particulate removal and microbiological removal and / or microbiological inactivation of goods according to an embodiment of the present invention.

[0079] Fig. 2 shows a schematic representation of a system for the particulate removal and microbiological removal and / or microbiological inactivation of goods, wherein the cleaning room has a first cleaning room section and a further cleaning room section, according to an embodiment of the present invention.

[0080] Fig. 3 shows a schematic representation of a UV radiation source with a reflection area according to an embodiment of the present invention.

[0081] Fig. 4 shows a schematic representation of the beam paths of UV radiation in a UV radiation source according to Fig. 3. Detailed description of exemplary implementations.

[0082] Identical or similar components in different figures are identified by the same reference numbers. The representations in the figures are schematic.

[0083] Fig. 1 shows a system 100 for the particulate removal and microbiological removal and / or microbiological inactivation of goods 150, in particular their surfaces. The system 100 has a cleaning chamber 101 in which the goods 150 can be placed. An access opening 102 of the cleaning chamber 101 can be closed to prevent entry during operation. An eddy current system 104 directs a turbulent flow 107 of a cleaning fluid into the cleaning chamber 101 to agitate particles on the goods 150. A displacement flow system directs a continuous, low-turbulence displacement flow 108 of a cleaning fluid through the cleaning chamber in a predetermined flow direction to remove the agitated particles from the goods 150. A UV radiation source 106 emits UV radiation with a wavelength range of 100 nm to 280 nm into the cleaning room 101 for microbiological inactivation.A control unit 110 automatically controls a predefined cleaning sequence.

[0084] Fig. 1 shows a system 100 for the particulate removal and microbiological removal and / or microbiological inactivation of goods 150, in particular their surfaces. The system 100 has a cleaning chamber 101 in which the goods 150 can be placed. An access opening 102 of the cleaning chamber 101 can be closed to prevent entry during operation. An eddy current system 104 directs a turbulent flow 107 of a cleaning fluid into the cleaning chamber 101 to agitate particles on the goods 150. A displacement flow system directs a continuous, low-turbulence displacement flow 108 of a cleaning fluid through the cleaning chamber in a predetermined flow direction to remove the agitated particles from the goods 150. A UV radiation source 106 emits UV radiation with a wavelength range of 100 nm to 280 nm into the cleaning room 101 for microbiological inactivation.A control unit 110 automatically controls a predefined cleaning sequence.

[0085] The cleaning room 101 is formed from corresponding side walls, ceiling walls and floor areas and encloses an inner cleaning volume in which the goods 150 are placed for depletion or

[0086] Inactivation can be placed. In particular, the cleaning chamber 101 can be entirely formed by appropriate panels or walls and thus be defined independently of a building wall. The eddy current system 104, the displacement flow system 105, and the UV radiation source 106 are arranged on or integrated into the cleaning chamber 101. The cleaning volume formed inside is sealed off from the environment by the wall of the cleaning chamber 101. The interior of the cleaning volume is dimensioned sufficiently large to allow the goods 150 to pass through and be processed. The cleaning chamber 101 has at least one access opening 102 for feeding goods 150 and, in the example shown, an unloading opening 103 for removing goods 150, whereby access to the cleaning chamber 101 is closed to people during the depletion process.

[0087] The access opening 102 of the cleaning chamber 101 is designed to be selectively closed, for example by means of a closing device. For instance, a pivoting door or a flap device can be provided as a closing device to selectively open the second opening. Furthermore, the access opening 102 and / or the discharge opening 103 can have a separate airlock 114, so that the goods 150 are first introduced into the airlock 114, then the surrounding atmosphere is removed from the airlock 114, and only then can the goods 150 be introduced into the cleaning chamber 101. Similarly, the goods 150 can be discharged from the cleaning chamber through the airlock 114 at the discharge opening 103.The control unit 110 controls the closing device and the sluice device 114, so that a loading and unloading process of the cleaning room 101 can be carried out automatically.

[0088] The airlock device 114 is designed, in particular, to provide a threshold-free transition and / or a drive-over transition. The airlock device 114 can, for example, form a sealed intermediate area in which the goods 150 are initially placed. The atmosphere in this intermediate area can then be extracted so that the access opening 102 towards the cleaning volume can be opened, thus preventing the atmosphere in the cleaning chamber 101 from being contaminated by air from which the goods 150 are introduced. For example, the airlock device 114 can have two opposing closing flaps that can be selectively opened or closed, in particular by means of the control unit 110, to introduce goods 150 into the intermediate area. This allows the cleaning chamber 101 to be loaded and / or unloaded, for example, using a pallet truck or a forklift as a conveying system 115.

[0089] The vortex system 104 is arranged at the cleaning chamber 101. The vortex system 104 has a fluid source for the cleaning fluid. Furthermore, the vortex system has a conveying device, for example, a pump, to supply appropriately printed cleaning fluid to the cleaning chamber 101. The vortex system 104 delivers the printed cleaning fluid to the cleaning chamber 101, in which corresponding vortex elements, for example, nozzles 109 in the wall of the cleaning chamber 101 or in certain support structures, are arranged. The vortex system 104 is designed to generate a turbulent flow 107 of the cleaning fluid. The vortex system 104 can, for example, introduce pulses of turbulent flow 107 into the cleaning volume sequentially. By means of the turbulent flow 107 of the cleaning fluid, 150 particles are dislodged upon contact with the surface of the goods to be cleaned.

[0090] The displacement flow system 105 is arranged in the cleaning chamber 101. The displacement flow system 105 has a fluid source for the cleaning fluid. Furthermore, the displacement flow system 105 has a conveying device, for example, a pump, to supply appropriately printed cleaning fluid to the cleaning chamber 101. The displacement flow system 105 delivers the printed cleaning fluid to the cleaning chamber 101, in which corresponding inlet elements, for example, nozzle openings 123 formed in the wall of the cleaning chamber 101, are arranged. The displacement flow system 105 is designed to generate a continuous, low-turbulence displacement flow 108 of the cleaning fluid. In particular, the displacement flow 108 is ideally a laminar flow with as little eddy current or turbulence as possible.For this purpose, the displacement flow system 105 incorporates corresponding flow elements that generate a flow with minimal turbulence. For example, flow straighteners can be used in the feed channel of the displacement flow 108 to generate a directed, low-turbulence flow. The low-turbulence displacement flow 108 is directed along a specific path from the ceiling area towards the floor area of ​​the cleaning chamber 101. The low-turbulence displacement flow 108 then carries particles from the cleaning volume through the floor area of ​​the cleaning chamber 101. The vortex flow system 104 and the displacement flow system 105 can be operated simultaneously or sequentially.

[0091] In particular, the cleaning fluid for the displacement flow 108 is introduced with a quality according to H 14. This means that the displacement flow 108, for example, before entering the cleaning volume, passes through a HEPA filter H14 and is cleaned by it.

[0092] The UV radiation source 106 is configured to emit UV radiation, in particular UVC radiation, into the cleaning volume, especially towards the goods 150, in order to achieve microbiological inactivation of the goods 150 or their surface. Specifically, the UV radiation source 106 is configured to emit UV radiation with a wavelength range of 100 nm to 280 nm. The depletion effect of the UV radiation can be precisely adjusted by the control unit 110 by means of the irradiation duration and the irradiation dose.

[0093] The control unit 110 is connected via signaling to the eddy current system 104, the displacement flow system, and the UV radiation source 106. Furthermore, the control unit 110 can also be coupled to the closing device of the access opening 102 and discharge opening 103 in order to selectively open or close the openings 102.

[0094] Accordingly, the control unit 110 is configured to transmit control commands or control signals to the system components listed above and to control them accordingly. A specific cleaning sequence can be predefined for the control unit 110. Similarly, a cleaning sequence can be automatically predefined by controlling the control unit 110. The control unit 110 also has, for example, a database unit in which one or more different cleaning sequences are stored. For example, depending on the item 150 to be cleaned, the control unit 110 can automatically decide which specific cleaning sequence should be carried out. A cleaning sequence defines, for example, the performance of the eddy current system 104, the displacement flow system 105, and the UV radiation source 106.Furthermore, the cleaning process defines the sequence of the eddy current system 104, the displacement flow system 105, and the UV radiation source 106 in relation to each other. The control unit 110 can automatically control the system components simultaneously or sequentially, depending on the predefined cleaning process.

[0095] By using compressed air (cleaning fluid) as a turbulent airflow to blow the surface of the product 150 onto the surface, the particles lying on or slightly adhering to it are stirred up. The control device 110 can control the power of the eddy current system 104 in such a way that the power of the turbulent flow 107 does not cause the stirred-up particles to re-colonize already cleaned areas of the product 150, while still achieving a sufficient removal rate.

[0096] The cleaning room 101 is designed such that the access opening 102 and the discharge opening 103 are located opposite each other (i.e., on opposite wall areas or interior walls) to provide a tunnel system. This allows the goods 150 to be efficiently conveyed from a first area 118 through the cleaning room 101 to a second area 119, for example, a cleanroom. The first area 118 and the second area 119 are designed to allow different particle counts / m³. 3 Air and / or varying concentrations of active organisms in the air. The cleaning room 101 is to be installed, in particular between the first room area 118 and the second room area 119, in such a way that room air leakage rates through the cleaning room 101 are less than 1.2 l / (m³). 2*s) and / or that the maximum room ventilation leakage rate can be provided up to a differential pressure of 40 Pa between the first room area 118 and the second room area 119.

[0097] The first room area 118 and the second room area 119, for example, constitute rooms or hall areas whose atmospheres are separated. The cleaning room 101 according to the invention can be installed in a transition area. By means of the decontamination system, contaminated goods 150 can thus be introduced from a first room area 118 into the cleaning room 101 and cleaned. The cleaned goods 150 are then fed to the second room area 119, which can, for example, be a cleaner room (cleanroom). This goods 150 are thus cleaned for the second room area 119 with a lower particle load, so that no contamination of the cleaner area occurs. The decontamination system or the cleaning room 101 can form a sufficiently airtight separation between the two areas. By means of appropriate seals, the room air leakage rates described above between the two room areas can be achieved.For leakage rate measurement, the area covered by the system 100 (100) according to the invention (e.g., the area of ​​the passage between two room areas or the area of ​​the access opening 102 or the discharge opening 103 of the cleaning room 101) between the two areas can be used as a reference area.

[0098] The eddy current system 104 has nozzles 109 for the outflow of the turbulent fluid flow, wherein the nozzles 109 are in particular configured to outflow the turbulent fluid flow by means of a Venturi effect.

[0099] Furthermore, an ionization device 111 is provided, which is designed to ionize the low-turbulence displacement flow 108 before or upon entry into the cleaning chamber 101. This ensures that fewer or no static charges form on the surface of the goods 150, which could potentially lead to the adhesion of particles due to static charges.

[0100] Cleaning chamber 101 has a surface area configured to exhibit a surface roughness (Ra) of <0.5 mm when UV radiation is emitted across 3x3 mm areas. The internal surfaces of cleaning chamber 101, which are illuminated by UV radiation, are designed to provide a suitable reflective effect for the UV radiation.

[0101] The cleaning room 101 also has reflectors 112 which are aligned in such a way that the reflected UV radiation is mostly radiated past the UV radiation source 106.

[0102] The UV radiation source 106 is designed to emit UV radiation with a power output exceeding 10 W. Furthermore, the UV radiation source 106 emits UV radiation with a principal emission wavelength between 200 nm and 280 nm.

[0103] Furthermore, a filter device 120 is provided, which is designed such that the cleaning fluid discharged from the cleaning chamber 101 can be filtered to a quality at least equivalent to H14. The filter device 120 includes an H14 HEPA filter. In the example shown, the filter device 120 is located in the floor area. The filter device includes, for example, a blower to extract and filter the atmosphere from the cleaning volume.

[0104] The eddy current system 104 generates a fluid turnover of the turbulent flow 107 of greater than 30m 3 / h (volume flow rate). By using a high volume flow rate for the turbulent flow 107 during the blowing off of the surface of the product 150, it can be ensured that the soluble particles are reliably stirred up (and subsequently removed with the directed TAV).

[0105] The UV radiation source 106 has a radiation sensor 122, which is configured to measure the UV radiation energy of the UV radiation emitted by the UV radiation source 106. The control unit 110 is coupled to the UV radiation energy such that the UV radiation source 106 can be controlled based on the measured UV radiation energy. The radiation sensor 122 measures the radiation dose and / or ensures that this radiation dose has been delivered with the aforementioned minimum energy.

[0106] The cleaning room 101 has interior walls 113 facing the interior volume of the cleaning room 101. The interior walls 113 are at least partially made of glass, aluminum, and / or stainless steel, which have been shown to be particularly suitable with regard to reflection and embodied energy. The interior walls 113 can also be at least partially covered by a cover, which is at least partially made of glass, aluminum, and / or stainless steel.

[0107] According to another exemplary embodiment, the control device 110 is configured to measure the operating time of the UV radiation source 106 and, in particular, at least one additional measurement parameter from the group consisting of current, voltage, temperature, radiation intensity, switching cycles, initial start-up time, age of the radiation source, and vibrations. The control device 110 is thus configured to initiate preventive maintenance, in particular a replacement, of the UV radiation source 106 based on the operating time of the UV radiation source 106 and the at least one additional parameter. The control device 110 also monitors the temperature of the UV radiation source 106, in particular the surface temperature of the UV radiation source 106. For example, a specific limit value for the temperature of the UV radiation source 106 can be specified, whereby the control device 110 initiates preventive maintenance, in particular a replacement, of the UV radiation source 106 if the limit value is exceeded by a certain value.implements countermeasures, such as deactivating the radiation source, over a certain period of time.

[0108] The control unit 110 further comprises a manually operated emergency shutdown device, the emergency shutdown device being configured to switch off the UV radiation source 106, to mechanically release access through the access opening 102 and / or the discharge opening 103, and / or to deactivate the vortex flow system 104 and / or the displacement flow system. The control unit 110 is configured to monitor the closure status of the access opening 102 and / or the discharge opening 103 during operation.

[0109] System 100 further comprises a conveying system 115 for conveying the goods 150, in particular continuously or discontinuously, through the access opening 102 and / or through the discharge opening 103. The control unit 110 is configured, in particular, to control the conveying system 115. The conveying system 115 is designed to convey the goods 150 into and out of the cleaning room 101. In particular, the conveying system 115 may be configured to convey the goods 150 within the cleaning room 101.

[0110] The conveyor system 115 according to the embodiment shown in Fig. 1 has one or more manipulators 124 (for example, robot arms) to grip the goods 150 and move them from an origin to a destination. The manipulator 124 can have a mechanical gripper, a magnetic gripper, or a vacuum gripper to grip the goods 150. Depending on the cleaning process, the control unit 110 can control the conveyor system 115 and, depending on the cleaning process, transport the goods 150 to a designated location.

[0111] System 100 includes a carrier system 116 on which the goods 150 can be placed, the carrier system 116 being designed to transport and / or remove the goods 150 on the carrier system 116 into the cleaning room 101. The carrier system 116 is, in particular, a basket or a pallet which can be transported by means of the conveyor system 115.

[0112] The control unit 110 is configured to control the conveyor system 115 in relation to the carrier system 116. For loading the cleaning room 101, it has proven advantageous if the goods 150 are loaded into and / or unloaded from the cleaning room 101 on a carrier system 116.

[0113] The support system 116 is designed such that all sides of the product 150 can be exposed to the displacement flow 108 and / or the turbulent flow 107. This can be achieved, for example, with UV-permeable baskets or with support structures on columns. Alternatively, the product 150 can also be moved with a manipulator.

[0114] The eddy current system 104 has a movable or positionable outlet opening, in particular a movable nozzle 109, for turbulent cleaning fluid during the inflow of the turbulent flow 107 relative to the product 150. The control device 110 is configured to control the movement of the outlet opening and / or the movement of the product 150 (relative to the outlet opening). The controllable nozzle 109 can be moved by means of a mechanical actuator during the cleaning process, so that the outlet opening for turbulent air experiences relative movement relative to the product 150 during cleaning. The system 100 can further include a movement device for moving the UV radiation source 106 and / or a UV radiation steering system for the UV radiation source 106 relative to the product 150 during microbiological inactivation, the control device 110 being configured to control the movement device.The movement device has, for example, a joint system to which, for example, articulated arms can movably attach the UV radiation source 106 to the inner wall 113 of the cleaning room 101.

[0115] The UV radiation guidance system comprises, for example, a light guide, a mirror, and / or a lens system. The UV radiation guidance system is movable relative to the product 150 and, for example, also relative to the UV radiation source 106 by means of the movement device, so that the UV radiation can be directed to a desired location on the product 150. The movement device can thus move the UV radiation source 106 and / or the UV radiation guidance system (e.g., its lens systems) and / or the product 150. In an exemplary embodiment, a nozzle 109 of the eddy current system 104 can also be coupled to the movement device, so that both subsystems, i.e., the UV radiation source 106 and the eddy current system 104, can be moved by means of one and the same actuator.

[0116] Furthermore, system 100 includes a sensor system 121, which is configured to determine the position of the goods 150 in the cleaning room 101 and / or to determine the geometric dimensions of the goods 150. The sensor system 121 includes, for example, an optical sensor, in particular a camera and / or a 3D sensor, for determining optical data regarding the position of the goods 150 in the cleaning room 101 and / or the geometric dimensions of the goods 150. The control unit 110 is configured, based on the optical data, to control the loading and / or unloading of the cleaning room 101 with respect to the cleaning room 101 and / or the cleaning process.The control unit 110 is configured, in particular by means of object recognition, artificial intelligence and / or measurement of the goods 150 by means of the sensor system 121, to control the position of the goods 150 in the cleaning room 101 and / or the geometric dimensions of the goods 150 and / or the cleaning process. The sensor system 121 may also include a distance sensor, a mechanical touch sensor (pushbutton) or an infrared sensor to determine a specific position of the goods 150.

[0117] The manipulator 124 is configured to separate the goods 150 from a multitude of unsorted and / or irregularly arranged goods 150 located outside the cleaning room 101 and place them in the cleaning room 101 before loading it. The control unit 110 controls the conveyor system 115 such that, based on the optical data from the sensor system 121, a multitude of goods 150 can be placed in the cleaning room 101. The control unit 110 controls the cleaning process, in particular the movement of the eddy current system 104, the displacement flow system 105, and / or the UV radiation source 106, based on the arrangement of the goods 150 in the cleaning room 101.

[0118] Furthermore, the control unit 110 can, based on the measured parameters, influence and / or control and / or regulate a position, a distance, a cycle time, a speed and / or an intensity of the goods 150 or of the cleaning process using the sensor system 121.

[0119] With the illustrated system 100, the control unit 110 first controls the manipulator 124 of the conveyor system 115 at the entrance of the access opening 102 of the cleaning chamber 101. The manipulator 124 picks up an item 150 individually or an item 150 on a carrier system 116. The item 150 can be placed in an airlock device 114 to purify the atmosphere of the first chamber area 118. Subsequently, the item 150 is placed inside the cleaning volume, for example by means of a manipulator 124 located within the cleaning chamber 101.

[0120] Subsequently, the turbulent flow 107 of the cleaning fluid, in particular with a pulsed turbulent fluid flow, is introduced into the cleaning chamber 101 by means of the eddy current system 104 in order to stir up particles on the goods 150.

[0121] Afterwards or simultaneously, the continuous, low-turbulence displacement flow 108 of the cleaning fluid is directed in a predetermined flow direction from a basin area towards the bottom area of ​​the cleaning room 101 by means of the displacement flow system in order to remove the stirred-up particles from the goods 150.

[0122] Afterwards or simultaneously, the UV radiation is applied to the cleaning room 101 by means of the UV radiation source 106 for surface decontamination of the goods 150 with UV radiation.

[0123] The cleaned goods 150 can then be gripped by a further manipulator 124 of the conveying system 115 through the discharge opening 103, in which a further sluice device 114 may be arranged, and transported into the second room area 119, which is, for example, a cleanroom.

[0124] The control unit 110 is configured to implement automated control of the purification system. The control unit 110 controls the individual steps of the cleaning process. Fig. 2 shows a schematic representation of the system 100 for the particulate purification and microbiological purification and / or microbiological inactivation of goods 150. The system 100 has the same system components as in the embodiment shown in Fig. 1, with the cleaning chamber 101 and the conveying system 115 being configured alternatively.

[0125] In particular, the cleaning room 101 is designed with a first cleaning room section 201 and a subsequent further cleaning room section 202. The conveying system 115 has a conveyor belt 117 which conveys the goods 150 along a conveying direction from the first room area 118 through the access opening 102 into the first cleaning room section 201, then transfers the goods 150 from the first cleaning room section 201 into the further cleaning room section 202 and subsequently conveys them through the discharge opening 103 into the second room area 119.

[0126] The conveyor belt 117, for example, extends through the access opening 102 and the discharge opening 103 of the cleaning room 101 and runs through the entire cleaning room 101. The conveyor belt 117 can, for example, be a roller conveyor, a belt conveyor, or a pneumatic conveying system. Depending on the cleaning process, the control unit 110 can control the conveying system 115 and, depending on the cleaning process, transport the goods 150 to a designated location.

[0127] The conveying system 115 can also include a manipulator 124 to, for example, convey the goods 150 onto the carrier system 116 or directly onto the conveyor belt 117.

[0128] By means of the conveyor belt 117, a continuous or sequential pseudo-continuous conveying of the goods 150 can be implemented, whereby the conveyor belt 117 of the conveying system 115 stops intermittently during partial process steps, for example to open or close access points (e.g. the sluice devices 114), cleaning by vortex flow 107, displacement flow 108 and / or subsequent UV irradiation by means of the UV radiation source 106.

[0129] The product 150 can initially be transferred to the first cleaning chamber section 201. This first cleaning chamber section 201 contains, among other things, the eddy current system 104 and the displacement flow system 105. As the product 150 passes through the first cleaning chamber section 201 continuously or sequentially, it is exposed to the turbulent flow 107 to loosen particles. Simultaneously or subsequently, the displacement flow 108 can carry the loosened particles towards the floor area, where a filter device 120 filters the exhaust air. A sensor system 121 can detect the position of the product 150 in the first cleaning chamber section 201, allowing the connected control unit 110 to influence the cleaning process based on the position data.

[0130] After passing through the first cleaning chamber section 201, the goods 150 are transferred by means of the conveyor belt 117 to the subsequent cleaning chamber section 202, which is downstream in the conveying direction. In this subsequent cleaning chamber section 202, the UV radiation source with one or more lamps is arranged, for example, on a side or top inner wall 113, to treat the goods 150 with UV radiation. A radiation sensor 122 of the sensor system 121 can measure the radiation dose accordingly, so that the coupled control unit 110 can influence the cleaning process based on the measurement data.

[0131] In the further cleaning chamber section 202, reflectors 112 can also be provided to reflect the UV radiation. The reflectors 112 are designed such that the UV radiation is largely reflected past the UV radiation source 106.

[0132] After particulate removal and microbiological removal and microbiological inactivation, especially of the surfaces of the 150 items passing through, these are transported further by conveyor belt 117 into the second room area 119.

[0133] Fig. 3 shows a schematic representation of a UV radiation source 106 with a reflection area according to an embodiment of the present invention. Fig. 4 shows corresponding beam paths of UV radiation in a UV radiation source 106 according to Fig. 3.

[0134] The UV radiation source 106 comprises a UV lamp 301 and a reflector element 302, wherein the UV lamp 301 has a first area I, which is oriented towards the goods 150, and a rearward second area II, which is turned away from the cleaning chamber 101 (see Fig. 4). The UV lamp 301 is rod-shaped with a round cross-section. The UV lamp 301 emits UV radiation completely.

[0135] The reflector element 302 has a concave reflection area 303, which is arranged relative to the UV lamp such that UV light emitted by the UV lamp 301 in the rear area II can be reflected by the reflector element 302 towards cleaning chamber 101. Furthermore, the reflector element 302 has a convex reflection area 304 such that the UV radiation reflected in the convex reflection area 304 is predominantly emitted past the UV lamp 301.

[0136] The reflector element 302 has a reflective surface for reflecting UV radiation. The rear second section of the UV lamp 301, specifically half its circumference, is enclosed by the reflector element 302. The reflector element 302 essentially forms a halved, elongated sleeve that extends along the longitudinal direction of the UV lamp 301 and is positioned at a distance from it. The majority of the reflector element 302 is formed by the concave reflection area 303, such that UV rays are reflected by the concave reflection area 303 and radiated back towards the product 150. The concave reflection area 303 has a curvature that prevents direct reflection (180°) back to the UV lamp.

[0137] As shown in Fig. 4, in the area of ​​the reflection element 302 where a reflection of the UV radiation would strike the UV light source 301, the convex reflection area 304 is formed. In the concave reflection area 303, a raised area with a convex shape is formed, at which the UV rays are reflected in such a way that they largely pass by the UV light source.

[0138] It should also be noted that "comprehensive" does not exclude any other elements or steps, and "a" or "an" does not exclude a plurality. Furthermore, it should be noted that features or steps described with reference to one of the above embodiments may also be used in combination with other features or steps of other embodiments described above. Reference numerals in the claims are not to be considered as limitations. List of reference numerals:

[0139] 100 System 201 first cleaning room section 101 cleaning room 202 further

[0140] 102 Access opening Cleaning room section

[0141] 103 Discharge opening

[0142] 104 Eddy current system 301 UV light source

[0143] 105 Displacement flow system 302 Reflector element

[0144] 106 UV radiation source 303 concave reflection region 107 turbulent flow 304 convex reflection region 108 displacement flow

[0145] 109 nozzles I first area

[0146] 110 Control unit II second area

[0147] 111 ionization facility

[0148] 112 Reflector

[0149] 113 Interior wall

[0150] 114 Lock device

[0151] 115 Conveyor system

[0152] 116 Carrier system

[0153] 117 Conveyor belt

[0154] 118 first room area

[0155] 119 second room area

[0156] 120 filter device

[0157] 121 Sensor system

[0158] 122 Radiation sensor

[0159] 123 nozzle openings

[0160] 124 Manipulator

[0161] 150 goods

Claims

Patent claims 1. System (100) for the particulate removal and microbiological removal and / or microbiological inactivation of goods (150), in particular their surfaces, comprising the system (100) a cleaning room (101) in which the goods (150) can be placed, wherein the cleaning room (101) has an access opening (102) for handling the goods (150) in relation to the cleaning room (101), wherein the access opening (102) can be closed, in particular locked, to prevent access during operation, a vortex flow system (104) which is coupled to the cleaning chamber (101) in such a way that a turbulent flow (107) of a cleaning fluid, in particular air, can flow into the cleaning chamber (101) in order to stir up particles on the goods (150), a displacement flow system coupled to the cleaning chamber (101) in such a way that a continuous, low-turbulence displacement flow (108) of a cleaning fluid, in particular air, can flow through the cleaning chamber (101) in a predetermined flow direction in order to remove the suspended particles from the goods (150); a UV radiation source (106) coupled to the cleaning chamber (101) in such a way that UV radiation with a wavelength range of 100 nm to 280 nm can be introduced into the cleaning chamber (101) for microbiological inactivation. a control device (110) which is configured to automatically control at least the eddy current system (104), the displacement flow system and the UV radiation source (106) in a predetermined cleaning sequence.

2. System (100) according to claim 1, wherein the displacement flow (108) when entering the cleaning chamber (101) has a quality according to H14.

3. System (100) according to claim 1, wherein the cleaning room (101) further has an unloading opening (103) such that the goods (150) can be conveyed into the cleaning room (101) through the access opening (102) and out through the unloading opening (103).

4. System (100) according to any one of claims 1 to 3, wherein the eddy current system (104) is configured such that that the turbulent flow (107) with a pressure fluid system of more than 1 bar, in particular more than 2 bar, preferably more than 4 bar maximum pressure, can flow into the cleaning chamber (101) and / or that the maximum fluid flow rate for the turbulent flow (107) is more than 10 Nl / min, in particular more than 25 Nl / min, preferably more than 50 Nl / min through the cleaning chamber (101), and / or that the turbulent flow (107) reaches a maximum velocity of over 10 m / s, in particular over 20 m / s, preferably over 50 m / s in the cleaning chamber (101) and / or that the turbulent flow (107) can be pulsed into the cleaning chamber (101).

5. System (100) according to any one of claims 1 to 4, wherein the displacement flow system is configured such that that the low-turbulence displacement flow (108) can flow through the cleaning chamber (101) at a mean velocity of less than 2 m / s, in particular less than 1 m / s, preferably less than 0.5 m / s.

6. System (100) according to any one of claims 1 to 5, wherein the eddy current system (104) is configured such that the product (150) is subjected to particle removal by the turbulent fluid flow predominantly experiences a wall shear stress of >1 Pa, in particular >3 Pa, and further in particular >5 Pa.

7. System (100) according to any one of claims 1 to 6, wherein the eddy current system (104) has nozzles (109) for the outflow of the turbulent fluid flow, wherein the nozzles (109) are in particular configured to expel the turbulent fluid flow by means of a Venturi effect.

8. System (100) according to any one of claims 1 to 7, further comprising an ionization device (111) which is configured to ionize the low-turbulence displacement flow (108) before or upon entry into the cleaning chamber (101).

9. System (100) according to any one of claims 1 to 8, wherein the cleaning chamber (101) has a surface area which is configured, when UV radiation is emitted, to have a surface roughness (Ra) of <0.5 mm, in particular <100 micrometers, and further in particular <20 micrometers, and / or a roughness depth (Rz) of <0.8 mm, in particular <0.2 mm and further in particular <0.08 mm.

10. System (100) according to any one of claims 1 to 9, the cleaning room (101) has a surface area such that reflected UV radiation is mostly emitted past the UV source, wherein the cleaning chamber (101) in particular has at least one reflector (112) which are oriented such that the reflected UV radiation is predominantly emitted past the UV source.

11. System (100) according to any one of claims 1 to 10, wherein the UV radiation source (106) comprises a UV lamp (301) and a reflector element (302), wherein the UV lamp (301) has a first area (I) which is directed towards the goods (150) and a rear second area (II) which is turned away from the cleaning room (101), wherein the reflector element (302) has a concave reflection area (303) which is arranged relative to the UV lamp such that UV light emitted by the UV lamp (301) in the rear area (II) can be reflected by the reflector element (302) in the direction of the cleaning chamber (101), wherein the reflector element (302) has a convex reflection area (304) such that the UV radiation reflected in the convex reflection area (304) is predominantly emitted past the UV light source (301).

12. System (100) according to any one of claims 1 to 11, wherein the UV radiation source (106) is configured such that during an inactivation cycle, the difference between the highest and lowest introduced UV energy of the UV radiation is not more than 8 times, in particular not more than 4 times, and further in particular not more than 2 times, in 90% of the volume of the cleaning chamber (101).

13. System (100) according to any one of claims 1 to 12, wherein the UV radiation source (106) is configured to emit UV radiation with a power of more than 10W, in particular more than 20W, and further in particular more than 50W, and / or wherein the UV radiation source (106) is configured to emit UV radiation with a principal emission wavelength between 200nm and 280nm, in particular between 230nm and 272nm, and further in particular between 245 and 265nm.

14. System (100) according to one of claims 1 to 13, further comprising a filter device (120) which is designed such that cleaning fluid discharged from the cleaning chamber (101) can be filtered in such a way that the discharged cleaning fluid has a quality at least according to H14, wherein the filter device (120) in particular comprises an H14 HEPA filter.

15. System (100) according to any one of claims 1 to 14, wherein the eddy current system (104) is designed such that the fluid turnover of the cleaning fluid during the turbulent flow (108) is greater than 30m 3 / h, especially larger than 50m 3 / h, especially greater than 100m 3 / h is.

16. System (100) according to any one of claims 1 to 15, wherein the cleaning process can be controlled by means of the control device (110) in such a way that first, the turbulent flow (107) of the cleaning fluid, in particular with a pulsed turbulent fluid flow, can be introduced into the cleaning chamber (101) by means of the eddy current system (104) in order to stir up particles on the goods (150), then, by means of the displacement flow system, the continuous, low-turbulence displacement flow (108) of the cleaning fluid can flow through the cleaning chamber (101) in a predetermined flow direction in order to remove the suspended particles from the goods (150), and then, by means of the UV radiation source (106), the UV radiation can be introduced into the cleaning chamber (101) for surface decontamination of the goods (150) with UV radiation.

17. System (100) according to one of claim 1 or claims 3 to 16, wherein the UV radiation source (106) is configured to provide surface segments of the goods (150) with at least a UV radiation energy of 100mJ / cm² 2 , in particular at least 200mJ / cm²2 , furthermore, in particular at least 400mJ / cm² 2 to irradiate.

18. System (100) according to any one of claims 1 to 17, wherein in particular the UV radiation source (106) has a radiation sensor (122) which is configured to measure UV radiation energy of the UV radiation emitted by the UV radiation source (106), wherein in particular the control device (110) is coupled to the UV radiation energy in such a way that the UV radiation source (106) can be controlled based on the measured UV radiation energy.

19. System (100) according to any one of claims 1 to 18, wherein the cleaning room (101) has at least one inner wall (113) which is directed towards the inner volume of the cleaning room (101), wherein the at least one inner wall (113) is in particular at least partially made of glass, aluminium and / or stainless steel, wherein at least one interior wall (113) has in particular a multi-layered construction.

20. System (100) according to any one of claims 1 to 19, wherein the cleaning room (101) has at least one interior wall (113) which is at least partially covered by a cover, the cover is at least partially made of glass, aluminum and / or stainless steel.

21. System (100) according to any one of claims 1 to 20, wherein the cleaning chamber (101) has an airlock device (114) by means of which the cleaning chamber (101) can be selectively accessed or closed through the access opening (102) and / or the discharge opening (103), wherein the lock device (114) is designed in particular such that a threshold-free transition and / or a traversable transition can be provided.

22. System (100) according to any one of claims 1 to 21, wherein the cleaning room (101) is designed in particular such that the access opening (102) and the unloading opening (103) are opposite each other in order to provide a tunnel system.

23. System (100) according to any one of claims 1 to 22, wherein the control device (110) is configured to measure the operating time of the UV radiation source (106) and in particular at least one additional measurement parameter from the group consisting of current, voltage, temperature, radiation intensity, switching-on cycles, initial start-up time, age of the radiation source, vibrations, wherein the control device (110) is configured based on the operating time of the UV radiation source (106) and at least one other parameter to initiate preventive maintenance, in particular a replacement, of the UV radiation source (106).

24. System (100) according to any one of claims 1 to 23, wherein the control device (110) is configured to monitor the temperature of the UV radiation source (106), in particular the surface temperature of the UV radiation source (106).

25. System (100) according to any one of claims 1 to 24, wherein the control device (110) has a manually operated emergency shutdown device, wherein the emergency switching device is configured to switch off the UV radiation source (106), to mechanically release access through the access opening (102) and / or the discharge opening (103) and / or the to deactivate the eddy current system (104) and / or the displacement flow system, wherein in particular the control device (110) is configured to monitor the closure status of the access opening (102) and / or the discharge opening (103) during operation.

26. System (100) according to one of claims 1 to 25, further comprising a conveying system (115) for conveying the goods (150) through the access opening (102) and / or through the discharge opening (103), in particular continuously or discontinuously. in particular the control unit (110) is configured to control the conveying system (115).

27. System (100) according to claim 26, further comprising a carrier system (116) on which the goods (150) can be placed, wherein the carrier system (116) is designed to introduce and / or remove the goods (150) on the carrier system (116) into the cleaning room (101), wherein the carrier system (116) is in particular a basket or a pallet which can be conveyed by means of the conveying system (115), wherein the conveying system (115) in particular comprises a manipulator for handling the carrier system (116) and / or a conveyor belt (117) on which the carrier system (116) can be placed, wherein the control unit (110) is configured to control the conveying system (115) in relation to the carrier system (116).

28. System (100) according to claim 27, wherein the carrier system (116) is designed such that all sides of the product (150) can be contacted with the displacement flow (108) and / or the turbulent flow (107), wherein the support system (116) is designed in particular such that at least five sides of the product (150) are accessible to the displacement flow (108) and / or the turbulent flow (107) to more than 90%, in particular more than 95%, and further in particular more than 98%, and a further side is accessible to the displacement flow (108) and / or the turbulent flow (107) to more than 50%, in particular more than 70%, and further in particular more than 90%.

29. System (100) according to any one of claims 1 to 28, wherein the cleaning room (101) can be installed between a first room area (118) and a second room area (119), wherein the first spatial region (118) and the second spatial region (119) are formed, different particle quantities / m³ 3 air and / or different concentrations of active organisms in the air, wherein in particular the cleaning room (101) can be installed between the first room area (118) and the second room area (119) in such a way that the room is ventilated and the leakage rates through the cleaning room (101) are less than 1.2 l / (m³). 2 *s), especially less than 0.2 l / (m²) 2 *s), furthermore, in particular less than 0.05 l / (m²) 2 ) amount, furthermore in particular that the maximum Ra around ventilation leakage rate can be provided up to a differential pressure of 40 Pa between the first room area (118) and the second room area (119).

30. System (100) according to any one of claims 1 to 29, wherein the eddy current system (104) is configured to move an outlet opening, in particular a nozzle (109), for turbulent cleaning fluid during the inflow of the turbulent flow (107) towards the product (150), wherein in particular an outlet opening, especially the nozzle (109), and / or the goods (150) are movable, wherein the control device (110) is configured to control the movement of the outlet opening and / or the movement of the goods (150).

31. System (100) according to any one of claims 1 to 30, further comprising a movement device for moving the UV radiation source (106) and / or a UV radiation steering system for the UV radiation source (106) relative to the goods (150) during microbiological inactivation, wherein the control unit (110) is configured to control the motion device.

32. System (100) according to claim 31, wherein the movement device for the UV radiation source (106) and / or the UV radiation steering system has at least one degree of freedom, wherein the control device (110) is configured to control the movement device depending on the nature of the goods (150).

33. System (100) according to any one of claims 1 to 32, further comprising a sensor system (121) configured to determine the position of the goods (150) in the cleaning room (101) and / or to determine the geometric dimensions of the goods (150), wherein the sensor system (121) comprises an optical sensor, in particular a camera and / or a 3D sensor, for determining optical data regarding the position of the goods (150) in the cleaning room (101) and / or the geometric dimensions of the goods (150), wherein the control device (110) is configured, based on the optical data, to control the loading and / or unloading of the cleaning room (101) with the goods (150) with respect to the cleaning room (101) and / or the cleaning process, wherein the control device (110) is configured, in particular by means of object recognition, artificial intelligence and / or measurement of the goods (150) to control the position of the goods (150) in the cleaning room (101) and / or the geometric dimensions of the goods (150) and / or the cleaning process by means of the sensor system (121).

34. System (100) according to claim 27 or claim 33, wherein the conveying system (115) is configured to separate the goods (150) from a large number of unsorted and / or irregularly arranged goods (150) outside the cleaning room (101) and place them in the cleaning room (101) prior to loading, wherein the control device (110) controls the conveying system (115) such that, based on the optical data of the sensor system (121), a plurality of goods (150) can be placed in the cleaning room (101), wherein the control device (110) controls the cleaning process, in particular a movement of the eddy current system (104), the displacement flow system and / or the UV radiation source (106) based on the arrangement of the goods (150) in the cleaning room (101).

35. Method for the particulate removal and microbiological inactivation of goods (150), in particular their surfaces, with a system (100) according to any one of claims 1 to 34, comprising the method: Arranging the goods (150) in the cleaning room (101), closing the cleaning room (101), Inflow of the turbulent flow (107) of the cleaning fluid into the cleaning chamber (101) to agitate particles on the item (150), inflow of the continuous, low-turbulence displacement flow (108) of the cleaning fluid to remove the agitated particles from the item (150), Irradiation of the goods (150) for microbiological inactivation with UV radiation with a wavelength range of 100 nm to 280 nm of the goods (150) in the cleaning room (101), wherein the control device (110), the eddy current system (104), the displacement flow system and the UV radiation source (106) control in a predetermined cleaning sequence.

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