Static thin film devolatilizer and use thereof
By combining a static film devolatilizer and a screw extruder, the problem of removing volatiles from high-viscosity polymer fluids has been solved, achieving low-energy consumption and high-efficiency devolatilization, which is particularly suitable for polymer fluids with viscosity ranging from 50 to 10000 Pa·s.
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- BEIJING GUODA HENGTAI TECHNOLOGY & TRADE CO LTD
- Filing Date
- 2025-09-25
- Publication Date
- 2026-05-07
AI Technical Summary
Existing technologies struggle to efficiently remove volatiles from highly viscous polymer fluids, especially at higher temperatures, resulting in high energy consumption and poor devolatilization performance.
A static film devolatilizer was designed, which adopts a static multi-layer film structure. It uses the material's own gravity and pressure difference to form a film, extracts volatiles through a vacuum system, and further removes residual volatiles by combining with a screw extruder.
It achieves low-energy and high-efficiency removal of volatiles from high-viscosity fluids, and is especially suitable for polymers with viscosity of 50 to 10000 Pa·s. The devolatilization effect is better than that of existing technologies, and the volatile content is reduced to less than 0.1%.
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Figure CN2025123821_07052026_PF_FP_ABST
Abstract
Description
Static thin film devourer and its applications Technical Field
[0001] This invention belongs to the field of chemical engineering and relates to devolatilizers for multi-component fluids and their applications. Specifically, it relates to membrane devolatilizers for high-viscosity polymer fluids and their applications, and more specifically, to static membrane devolatilizers for high-viscosity polymer fluids and their applications. Background Technology
[0002] Global chemical production is enormous, with most products manufactured using solution, slurry, precipitation, emulsion, suspension, or bulk liquid-phase methods. During production, it's essential to separate the product from the solvent or monomer. If the solvent or monomer has a relatively low melting point and doesn't decompose or react under appropriate heating conditions, a devolatilizer is typically used to separate the solvent, monomer, and oligomers from the product. Therefore, devolatilizers are crucial, as their effectiveness directly impacts product quality, energy consumption, environmental impact, and economic benefits. This is particularly true in the polymer manufacturing industry, where polymer materials exhibit high viscosity even at high temperatures, making devolatilization difficult and requiring highly efficient devolatilizers.
[0003] Based on the static and dynamic states of the devolatilization process, devolatilization devices are classified into static and dynamic devolatilization devices. Static devolatilizers rely on the material's own gravity to transport the material during the devolatilization process. Dynamic devolatilizers rely on the operation of other equipment components in contact with the material to transport it. In other words, dynamic devolatilizers typically use rotating equipment to drive the polymer material to form a film within the devolatilizer. This rotational film formation increases the gas-liquid interface renewal rate within the devolatilizer, enhancing the polymer's mass and heat transfer efficiency and strengthening the devolatilization process. Currently, based on the devolatilization principle, static devolatilizers mainly include flash evaporators, film-type devolatilizers, or strip-type devolatilizers. Static devolatilizers are mainly used for devolatilization of polymers with low viscosity and high flowability. Flash evaporators are suitable for devolatilization of polymers with viscosity below 100 Pa·s. Film-type devolatilizers are suitable for devolatilization of polymers with viscosity less than 100 Pa·s. Strip-type devolatilizers are mainly used for foaming devolatilization of polymers with viscosity above 100 Pa·s. Dynamic devolatilizers are divided into rotary film devolatilizers and scraper-type rotary film devolatilizers. Scraper-type rotary film devolatilizers use a motor to drive a scraper on a rotating shaft to rotate along the inner wall of the devolatilizer. The polymer material is fed from the wall and, under the pushing force of the scraper, is coated into a thin film on the inner wall of the devolatilizer. Scraper-type rotary film devolatilizers have a wide applicable viscosity range and can handle polymer melts up to 10,000 Pa·s. However, due to rotation, energy consumption is very high. Horizontal surface renewal devolatilizers mainly include horizontal disc reactors and horizontal cage devolatilizers, and are suitable for polymer material viscosities ranging from 5 to 300 Pa·s. Exhaust extrusion type devolatilizers are screw extruders, mainly including single-screw extruders, twin-screw extruders, and multi-screw extruders. Summary of the Invention
[0004] The inventors of this invention, Lei Jianlan and Huang Sihuang, had a serendipitous inspiration: a glass roof with a suitable slope forms a thin film on the roof during rain, and the area of this film is much larger than that of rainwater falling directly to the ground. The glass roof is static, and the rainwater forms a film on it. Based on this, we creatively designed and manufactured a static film stripper. The static film stripper disclosed in this invention is a static single-layer film stripper or a static multi-layer film stripper. The surface of the film plate of the static film stripper is flat, trapezoidal, wavy, or uniformly raised, preferably flat. The shape of the film plate of the static film stripper is fan-shaped, rectangular, square, or circular. Each layer of film plate completely or partially covers the static film stripper, wherein the partial coverage means that the area of each layer of film plate is one-fifth to four-fifths of the maximum cross-sectional area of the static film stripper. One end of each layer of film plate is fixed. The membrane plate is mounted on a support column at one end and fixed to the inner wall of the devolatilizer at the other. The distance between each membrane plate and the inlet material distributor can be varied according to the viscosity characteristics of the material. Each membrane plate has holes near or in contact with the inner wall of the devolatilizer. The size of the holes can vary according to the required material flow rate or viscosity. The holes can be circular, elliptical, rectangular, or square, and each membrane plate can have one or more holes. In a static multilayer membrane devolatilizer, the membrane plates between layers can be staggered, or the lower membrane plate can be installed directly below the upper membrane plate. Volatile matter is extracted from the top of the static membrane devolatilizer by a vacuum system. The melted material after volatile matter removal flows into the storage area of the static membrane devolatilizer, and is then directly fed into the next operating unit from the bottom of the storage area or by a transfer pump.
[0005] This invention is based on our company's high-tech research and development foundation. We accidentally discovered and created a static film devolatilizer for high-viscosity material fluids. The static film devolatilizer of this invention has excellent devolatilization effect and low energy consumption. It is most suitable for high-viscosity polymer fluids or melts with viscosity of 50-10000 Pa·s. In particular, it is most effective in processing high-viscosity POE fluids produced by solution polymerization with a solid content of 8-30% (volatile matter mass content of 70-92%). The volatile matter mass content of the devolatilized POE fluid is about 5%. The material is pumped from the lower part of the static film devolatilizer's storage area into a screw extruder, where the volatile matter in the material melt is further removed to obtain a product with less than 0.1% volatile matter. High-viscosity fluids or melts produced by solution processing, slurry processing, precipitation processing, emulsion processing, or liquid-phase bulk processing are all suitable for devolatilization using the static thin-film devolatilizer disclosed in this invention, which has a better devolatilization effect than other existing devolatilizers on the market. Static devolatilization using the static thin-film devolatilizer of this invention results in low energy consumption. In the static thin-film devolatilizer of this invention, the high-viscosity fluid or melt material enters the static thin-film devolatilizer after exiting the material inlet and passing through the material distributor. It diffuses to the upper surface of each thin film layer through the material distributor. The thin film plates have a certain inclination, and with the help of gravity, the material fluid continues to diffuse on the film surface. Due to the large pressure difference between the material inlet and the static thin-film devolatilizer, the material fluid instantly bubbles, the bubble film ruptures, and the volatiles are extracted by the vacuum system and discharged from the top outlet of the static thin-film devolatilizer. The operating pressure of the high-viscosity fluid or melt material at the inlet of the static thin-film devolatilizer and in the material distributor is 1-10 MPa; the operating pressure inside the static thin-film devolatilizer is 0.1-0.8 MPa. Currently, there is no publicly available information on static thin-film devolatilization devices in China or abroad. The static thin-film devolatilization device disclosed in this invention is an original technology. The disclosure of this invention demonstrates to the world that my country has created a static thin-film devolatilization device and achieved high-level technological self-reliance.
[0006] The purpose of this invention is to provide a static thin film devolatilization device and its application, wherein the static thin film devolatilization device is a static single-layer thin film devolatilization device or a static multi-layer thin film devolatilization device; wherein the static multi-layer thin film devolatilization device is a static double-layer thin film devolatilization device, a static triple-layer thin film devolatilization device, a static quadruple-layer thin film devolatilization device, a static five-layer thin film devolatilization device, or more layers; wherein the shape of the static thin film devolatilization device is a circular kettle type, a circular tower type, a square tower type, a square kettle type, or other shapes; wherein the static thin film devolatilization device is installed vertically or horizontally.
[0007] The purpose of this invention is to provide a static film devolatilizer, wherein the film plates of the static film devolatilizer are circular, fan-shaped, rectangular, or square. Each layer of film plates completely or partially covers the entire interior of the static film devolatilizer, wherein partial coverage means that the area of each layer of film plates is one-quarter to four-fifths of the maximum cross-sectional area of the static film devolatilizer. Each film plate in the same layer is either tightly connected or spaced 3-50 cm apart. One end of each film plate is fixedly mounted on a support column, and the other end is fixedly mounted on the inner wall of the devolatilizer. The distance between each film plate and the inlet material distributor can be varied according to the viscosity characteristics of the material. Holes are provided near or in contact with the inner wall of the devolatilizer at each film plate, and the size of the holes can be adjusted as needed. The material flow rate or viscosity varies, and the shape of the holes can be circular, elliptical, rectangular, square, or other irregular shapes. Each film plate can have one or more holes, and the diameter of each circular hole is 5-50 cm. The film plates in the static multilayer film devolatilizer can be staggered or the lower film plate can be installed directly below the upper film plate. Each film plate in the same layer can be tightly connected or spaced 3-50 cm apart. Volatile matter is extracted from the top of the static film devolatilizer by a vacuum system. The melt material after the volatile matter is removed flows into the storage area of the static film devolatilizer and is then directly fed into the next operating unit from the bottom of the storage area or by a transfer pump.
[0008] The purpose of this invention is to apply the static thin film devolatilizer to the devolatilization of high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s produced by solution method, slurry method, precipitation method, emulsion method, liquid phase bulk method or suspension method, wherein the volatile content of the high-viscosity fluid or high-viscosity melt is between 10 and 95%.
[0009] A static thin-film devolatilization device, wherein the static thin-film devolatilization device is a static single-layer thin-film devolatilization device or a static multi-layer thin-film devolatilization device; wherein the static multi-layer thin-film devolatilization device is a static double-layer thin-film devolatilization device, a static triple-layer thin-film devolatilization device, a static quadruple-layer thin-film devolatilization device, a static five-layer thin-film devolatilization device, or more layers; wherein the shape of the static thin-film devolatilization device is cylindrical or square, preferably a circular kettle type, a circular tower type, a square tower type, a square kettle type, or other shapes; wherein the static thin-film devolatilization device is installed vertically or horizontally; wherein the static single-layer thin-film devolatilization device is the first static thin-film devolatilization device. Membrane devolatilization unit; wherein the static double-layer membrane devolatilization unit is a second static membrane devolatilization unit, the upper and lower membrane plates are installed in staggered positions, or partially staggered, or completely staggered, or the lower membrane plate is installed directly below the upper membrane plate, and there is a material distributor for each of the upper and lower layers, and the material melt after devolatilization in the upper and lower layers falls directly into the storage area of the devolatilization unit; wherein the static double-layer membrane devolatilization unit is a third static membrane devolatilization unit, the upper and lower membrane plates are installed in such a way that the lower membrane plate is installed directly below the upper membrane plate, the material fluid falling from the upper membrane plate falls onto the lower membrane plate, and after being devolatilized again by the lower membrane plate, falls into the storage area of the devolatilization unit; wherein The first, second, or third static thin-film devolatilizer is suitable for devolatilizing high-viscosity fluids or melts with a viscosity of 50–10000 Pa·s produced by solution processing, slurry processing, precipitation processing, emulsion processing, liquid-phase bulk processing, or suspension processing, wherein the volatile matter content of the high-viscosity fluid or melt is between 10% and 95% by mass. The devolatilization principle and technology of the first, second, and third static thin-film devolatilizers are the same. After the high-viscosity fluid or melt material exits from the material inlet of the static thin-film devolatilizer through the material distributor, it is subjected to gravity... A material film is formed on the upper surface of the film plate. Due to the large pressure difference between the material fluid inlet and the static film devourer, the material fluid instantly bubbles, the bubble film ruptures, and the volatiles are extracted by the vacuum system and discharged from the top outlet of the static film devourer. The operating pressure of the high-viscosity fluid or high-viscosity melt in the material fluid inlet and the material distributor is 0.5-10 MPa, preferably 1-10 MPa. The operating pressure in the static film devourer is 0.1-1 MPa, preferably 0.1-0.8 MPa. The pressure difference is the difference between the operating pressure of the high-viscosity fluid or high-viscosity melt in the material distributor and the operating pressure in the static film devourer.
[0010] A static film devourer, wherein the upper surface of the film plate of the static film devourer is flat, trapezoidal, wavy, or uniformly raised, preferably flat, and the film plate of the static film devourer is a film plate; the shape of the film plate 4 of the static film devourer is fan-shaped, rectangular, circular, square, double-arc, or other irregular shape; the thickness of the film plate of the static film devourer is determined by the force borne by the film plate during operation, and the weight of the film plate itself is reduced as much as possible while ensuring normal operation, and the thickness of the film plate is 0.2cm-20cm; the film plate with a trapezoidal, wavy, or uniformly raised upper surface is a film plate 5.
[0011] A static film devolatilizer, wherein each layer of the static film devolatilizer is completely or partially covered by a film plate inside the static film devolatilizer, wherein the partial coverage is such that the area of each layer of film plate is one-fifth to four-fifths of the maximum cross-sectional area of the static film devolatilizer, and each film plate in the same layer is tightly connected or spaced 3-50cm apart.
[0012] A static film devolatilizer, wherein each film plate of the static film devolatilizer is fixedly mounted on a support column at one end and fixedly mounted on the inner wall of the devolatilizer at the other end;
[0013] A static film devourer, wherein the distance between each film plate of the static film devourer and the inlet material distributor can vary according to the viscosity characteristics of the material, and the distance between each film plate and the inlet material distributor is 3cm-8m, preferably 3cm-5m;
[0014] A static film devourer, wherein the inclination of each film plate of the static film devourer is 1-60 degrees, wherein the inclination is the angle between the installed film plate and the horizontal plane;
[0015] A static film devolatilizer, wherein each film plate of the static film devolatilizer has holes near or in contact with the inner wall of the devolatilizer. The size of the holes can vary according to the flow rate or viscosity of the material to be processed. The shape of the holes is circular, elliptical, rectangular, square or other irregular shape. Each film plate has one or more holes, and the diameter of each circular hole is 5-100cm, preferably 5-50cm.
[0016] A static multilayer film devolatilizer, wherein the film plates between layers are installed in a staggered, partially staggered, or completely staggered manner, or the lower film plate is installed directly below the upper film plate; each film plate in the same layer is tightly connected or the film plates are spaced 3-50cm apart.
[0017] A static thin-film devolatilizer, wherein the distance between the thin-film layers in the static multilayer thin-film devolatilizer is not less than 10cm but not more than half the height of the devolatilizer;
[0018] A static thin-film devourer, wherein each thin-film plate of the static thin-film devourer is made of stainless steel, aluminum, aluminum alloy, glass, ceramic, other metals or other alloys, or a composite of multiple such materials;
[0019] Static thin-film devolatilizer, wherein the volume of the static thin-film devolatilizer is 1L-500m³. 3 ;
[0020] A static thin-film devolatilizer, wherein the components of the static thin-film devolatilizer, excluding the thin-film plate, are made of stainless steel, aluminum, aluminum alloy, glass, ceramic, other metals or other alloys or polymer materials, or a composite of multiple such materials;
[0021] A static thin-film devolatilizer, wherein the static thin-film devolatilizer is applied to the devolatilization of high-viscosity fluids or high-viscosity melts with a viscosity of 10 to 10000 Pa·s produced by solution method, slurry method, precipitation method, emulsion method, liquid phase bulk method or suspension method; the operating pressure of the reactor for the production by solution method, slurry method, precipitation method, emulsion method, liquid phase bulk method or suspension method is 0.5-10 MPa, preferably 1-10 MPa.
[0022] A static thin-film devourer, wherein the static thin-film devourer is used for devouring of high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s, and the operating temperature is 100-350℃.
[0023] A static film devourer, wherein the static film devourer is used for devouring high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s, and the operating temperature is 100-350℃. The operating temperature inside the static film devourer is constant temperature, variable temperature, or different temperatures controlled in different areas.
[0024] A static thin-film devolatilizer is used for devolatilization of high-viscosity fluids or melts with a viscosity of 50–10000 Pa·s. The operating pressure of the static thin-film devolatilizer is 0.1–1 MPa. After removing volatiles, a material melt with a volatile content of less than 6% by mass is obtained. The volatiles are solvents, residual monomers, low-molecular-weight polymers, or low-molecular-weight organic compounds.
[0025] A static thin-film devolatilizer, wherein the static thin-film devolatilizer is used for devolatilization of high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s, and the average residence time is 5 min to 200 min;
[0026] A static film devourer, wherein the static film devourer is used for devouring of high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s, and the material flow rate at the inlet is 0.5 L / h to 350 tons / h;
[0027] A static thin-film devourer, wherein the volatiles in the static thin-film devourer are removed from the top of the static thin-film devourer and extracted by a vacuum system;
[0028] In a static thin-film devolatilizer, the melt of material after volatile matter has been removed by the static thin-film devolatilizer flows into the storage area of the static thin-film devolatilizer and is then directly fed into the next operating unit from the bottom of the storage area of the static thin-film devolatilizer or by a conveying pump.
[0029] In a static thin-film devolatilizer, the melt of material after volatiles are removed by the static thin-film devolatilizer flows into the storage area of the static thin-film devolatilizer, wherein the storage area is one-thirtieth to three-tenths of the volume of the static thin-film devolatilizer.
[0030] A static film devolatilizer is used for devolatilization of high-viscosity fluids or melts with a viscosity of 10–10000 Pa·s. The molten material after volatile matter removal flows into the storage area of the static film devolatilizer, and is then directly fed from the bottom of the storage area or pumped into the next operating unit. The next operating unit is a screw extruder, injection molding equipment, other molding equipment, or a storage tank. The screw extruder is a single-screw extruder, a twin-screw extruder, or a multi-screw extruder. After exiting the screw extruder, the molten material is cooled with cold water, pelletized, dried, packaged, and stored.
[0031] A static film devolatilizer is used for devolatilization of high-viscosity fluids or melts with a viscosity of 50–10000 Pa·s. The material melt after volatile matter removal flows into the storage area of the static film devolatilizer and is then directly fed into the next operating unit from the bottom of the storage area or by a conveying pump. The next operating unit is a screw extruder, which is divided into 2–8 sections from the feed inlet to the outlet. The operating temperature of each section is different or the same, and the operating temperature is 100–350°C.
[0032] A static film devolatilizer is used for devolatilization of high-viscosity fluids or melts with a viscosity of 50–10000 Pa·s. The material melt after volatile matter removal flows into the storage area of the static film devolatilizer and is then pumped from the lower part of the storage area to the next operating unit, which is a screw extruder. The screw extruder is divided into 2–8 sections from the feed inlet to the outlet. Starting from the feed inlet, the first 1–7 sections are evacuated to further remove volatile matter from the material melt, obtaining a product with a volatile matter content of less than 0.1%.
[0033] The static thin film devourer, and its operation procedure are as follows:
[0034] (1) Turn on the heat source, and heat the first static film devourer or 2 or 3 to 100-350℃. The top outlet of the static film devourer is connected to the vacuum system and is in normal condition.
[0035] (2) The material distributor is turned on. The high-viscosity fluid or high-viscosity melt material sent from the reactor enters the static film devolatilizer through the material fluid inlet at the top of the devolatilizer. The operating pressure of the high-viscosity fluid or high-viscosity melt material in the material fluid inlet of the static film devolatilizer and the material distributor is 0.5-10 MPa, preferably 1-10 MPa. The material temperature is maintained between 100-350°C. The volatile content in the high-viscosity fluid or high-viscosity melt entering the static film devolatilizer inlet is between 10-95%. The material is sprayed onto the film plate by the material distributor to form a thin layer of material on the film plate. The volatiles are removed to obtain a material melt with a volatile content of less than 6%. The operating pressure in the static film devolatilizer is 0.1-1 MPa, preferably 0.1-0.8 MPa.
[0036] (3) The material fluid after the volatile matter is removed falls into the storage area of the static film devolatilizer. The material melt is directly discharged from the bottom outlet of the static film devolatilizer and directly fed into or sent by a conveying pump into the next operating unit. The next operating unit is a screw extruder or other molding equipment or storage tank. The temperature of the storage area of the static film devolatilizer is 100-350℃. The screw extruder is divided into 2-8 sections from the feed inlet to the outlet. Starting from the feed inlet, the first 1-7 sections are vacuumed to further remove the volatile matter in the material melt and obtain a product with less than 0.1% volatile matter. The screw extruder is divided into 2-8 sections from the feed inlet to the outlet. The operating temperature of each section is different or the same. The operating temperature is 100-350℃. Attached Figure Description
[0037] Figure 1 shows the first type of static thin film devourer.
[0038] Figure 2 shows the second type of static thin film devourer.
[0039] Figure 3 shows the third type of static thin film devourer.
[0040] Figure 4 shows a planar thin film plate.
[0041] Figure 5 shows one embodiment of the film plate, where the upper surface can be a protrusion: 1: material fluid inlet; 2: material distributor; 3: volatile matter outlet; 4: support column; 5: film plate; 6: material falling into the storage tank area; 7: heating jacket; material melt outlet; 9: storage tank area; 10: fan-shaped film plate; 11: rectangular film plate; 12: rectangular hole in the full film plate; 13: circular hole in the film plate. Detailed Implementation
[0042] The present invention will be further described below with reference to specific embodiments, but the scope of protection of the present invention is not limited to the following embodiments.
[0043] Example 1
[0044] (1) Turn on the heat source. The first static thin film degasser maintains a temperature of 185°C. The top outlet of the static thin film degasser is connected to the vacuum system and is in normal condition.
[0045] (2) Turn on the material distributor. The volatile content of the POE solution coming out of the reactor is 85%. It is sent into the material fluid inlet of the static film devolatilizer by the transfer pump at a flow rate of 5L / h and a pressure of 5MPa. The POE solution material is sprayed onto the film plate by the material distributor and the temperature is maintained at 185℃. The POE solution flows downward on the film plate due to gravity, forming a thin layer of POE solution. The volatiles are removed to obtain POE melt with a volatile content of less than 4.5%. The operating pressure in the static film devolatilizer is 0.5MPa.
[0046] (3) The POE melt after volatile matter removal falls into the storage area of the static film devolatilizer. The POE melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 185℃. The POE melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by the conveying pump. The twin-screw extruder is divided into 3 sections from the feed port to the outlet. Starting from the feed port, the first 2 sections are vacuumed to further remove volatile matter from the POE melt, obtaining a product with less than 0.035% volatile matter. The twin-screw extruder is divided into 3 sections from the feed port to the outlet. The operating temperature of the first section is 170℃, the operating temperature of the second section is 170℃, and the operating temperature of the third section is 160℃.
[0047] Example 2
[0048] (1) Turn on the heat source. The first static thin film devourer maintains a temperature of 165°C. The top outlet of the static thin film devourer is connected to the vacuum system and is in normal condition.
[0049] (2) The material distributor is turned on. The volatile content of the SBS solution coming out of the reactor is 83%. It is sent into the material fluid inlet of the static film devolatilizer by the transfer pump at a flow rate of 34 tons / h and a pressure of 3 MPa. The SBS solution is sprayed onto the film plate by the material distributor and the temperature is maintained at 165°C. The SBS solution flows downward on the film plate due to gravity, forming a thin layer of SBS solution. The volatiles are removed to obtain SBS melt with a volatile content of less than 5.5%. The operating pressure in the static film devolatilizer is 0.45 MPa.
[0050] (3) The SBS melt after volatile matter removal falls into the storage area of the static film devolatilizer. The SBS melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 170°C. The SBS melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by the conveying pump. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. Starting from the feed port, the first 4 sections are vacuumed to further remove volatile matter from the SBS melt, obtaining a product with less than 0.045% volatile matter. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. The operating temperature of the first section is 170°C, the operating temperature of the second section is 175°C, the operating temperature of the third section is 185°C, the operating temperature of the fourth section is 175°C, and the operating temperature of the fifth section is 175°C.
[0051] Example 3
[0052] (1) Turn on the heat source. The first static thin film degasser maintains a temperature of 180°C. The top outlet of the static thin film degasser is connected to the vacuum system and is in normal condition.
[0053] (2) The material distributor is turned on. The volatile content of the POE solution coming out of the reactor is 82%. It is sent into the material fluid inlet of the static film devolatilizer by the transfer pump at a flow rate of 68 tons / h. The pressure is 4.5 MPa and the temperature is maintained at 180°C. The POE solution is sprayed onto the film plate by the material distributor. The POE solution flows downward on the film plate due to gravity, forming a thin layer of POE solution. The volatiles are removed to obtain POE melt with a volatile content of less than 4.1%. The operating pressure in the static film devolatilizer is 0.45 MPa.
[0054] (3) The POE melt after volatile matter removal falls into the storage area of the static film devolatilizer. The POE melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 180℃. The POE melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by a conveying pump. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. Starting from the feed port, the first 4 sections are vacuumed to further remove volatile matter from the POE melt, obtaining a product with less than 0.043% volatile matter. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. The operating temperature of the first section is 175℃, the operating temperature of the second section is 185℃, the operating temperature of the third section is 180℃, the operating temperature of the fourth section is 180℃, and the operating temperature of the fifth section is 175℃.
[0055] Example 4
[0056] (1) Turn on the heat source. The first static thin film degasser maintains a temperature of 190°C. The top outlet of the static thin film degasser is connected to the vacuum system and is in normal condition.
[0057] (2) The material distributor is turned on. The volatile content of the styrene-butadiene rubber solution coming out of the reactor is 86%. It is sent into the material fluid inlet of the static film devolatilizer by the transfer pump at a flow rate of 36 tons / h and a pressure of 3 MPa. The temperature is maintained at 190°C. The styrene-butadiene rubber solution is sprayed onto the film plate by the material distributor. The styrene-butadiene rubber solution flows downward on the film plate due to gravity, forming a thin layer of styrene-butadiene rubber solution. The volatiles are removed to obtain styrene-butadiene rubber melt with a volatile content of less than 6%. The operating pressure in the static film devolatilizer is 0.35 MPa.
[0058] (3) The styrene-butadiene rubber melt after the removal of volatiles falls into the storage area of the static film devolatilizer. The styrene-butadiene rubber melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 190℃. The styrene-butadiene rubber melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by a conveying pump. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. Starting from the feed port, the first 4 sections are vacuumed to further remove volatiles from the styrene-butadiene rubber melt, obtaining a product with less than 0.055% volatiles. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. The operating temperature of the first section is 190℃, the operating temperature of the second section is 185℃, the operating temperature of the third section is 185℃, the operating temperature of the fourth section is 180℃, and the operating temperature of the fifth section is 175℃.
[0059] Example 5
[0060] (1) Turn on the heat source. The first static thin film devourer maintains a temperature of 175°C. The top outlet of the static thin film devourer is connected to the vacuum system and is in normal condition.
[0061] (2) The material distributor is turned on. The volatile content of the ethylene-styrene copolymer solution coming out of the reactor is 87%. It is sent into the material fluid inlet of the static film devourer at a flow rate of 30 tons / h by the transfer pump. The pressure is 2.5 MPa and the temperature is maintained at 175°C. The ethylene-styrene copolymer solution is sprayed onto the film plate by the material distributor. The ethylene-styrene copolymer solution flows downward on the film plate due to gravity, forming a thin layer of ethylene-styrene copolymer solution. The volatiles are removed to obtain an ethylene-styrene copolymer melt with a volatile content of less than 5.5%. The operating pressure in the static film devourer is 0.25 MPa.
[0062] (3) The ethylene-styrene copolymer melt after volatile matter removal falls into the storage area of the static film devolatilizer. The ethylene-styrene copolymer melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 175°C. The ethylene-styrene copolymer melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and is sent to the inlet of the twin-screw extruder by a conveying pump. The twin-screw extruder is divided into 4 sections from the feed inlet to the outlet. Starting from the feed inlet, the first 3 sections are vacuumed to further remove volatile matter from the ethylene-styrene copolymer melt, obtaining a product with less than 0.052% volatile matter. The twin-screw extruder is divided into 4 sections from the feed inlet to the outlet. The operating temperature of the first section is 175°C, the operating temperature of the second section is 185°C, the operating temperature of the third section is 180°C, and the operating temperature of the fourth section is 180°C.
[0063] Example 6
[0064] (1) Turn on the heat source. The first static thin film devourer maintains a temperature of 220°C. The top outlet of the static thin film devourer is connected to the vacuum system and is in normal condition.
[0065] (2) The material distributor is turned on. The volatile content of the propylene-based elastomer solution coming out of the reactor is 85%. It is sent into the material fluid inlet of the static film devolatilizer by the transfer pump at a flow rate of 35 tons / h and a pressure of 3 MPa. The temperature is maintained at 200°C. The propylene-based elastomer solution is sprayed onto the film plate by the material distributor. The propylene-based elastomer solution flows downward on the film plate due to gravity, forming a thin layer of propylene-based elastomer solution. The volatiles are removed to obtain a propylene-based elastomer melt with a volatile content of less than 5%. The operating pressure inside the static film devolatilizer is 0.5 MPa.
[0066] (3) The propylene-based elastomer melt after volatile matter removal falls into the storage area of the static film devolatilizer. The propylene-based elastomer melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 200℃. The propylene-based elastomer melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by a conveying pump. The twin-screw extruder is divided into 5 sections from the feed inlet to the outlet. Starting from the feed inlet, the first 4 sections are vacuumed to further remove volatile matter from the propylene-based elastomer melt, obtaining a product with less than 0.046% volatile matter. The twin-screw extruder is divided into 5 sections from the feed inlet to the outlet. The operating temperature of the first section is 200℃, the operating temperature of the second section is 220℃, the operating temperature of the third section is 220℃, the operating temperature of the fourth section is 210℃, and the operating temperature of the fifth section is 210℃.
[0067] Example 7
[0068] (1) Turn on the heat source, maintain the temperature of the second static thin film devourer at 180°C, and connect the top outlet of the static thin film devourer to the vacuum system, which is in normal condition;
[0069] (2) Turn on the two material distributors. The volatile content of the POE solution coming out of the reactor is 85%. It is sent into the material fluid inlet of the static film devolatilizer by the transfer pump at a flow rate of 135 tons / h and a pressure of 6 MPa. The temperature is maintained at 180°C. The POE solution is sprayed onto the film plate by the material distributor. The POE solution flows downward on the film plate due to gravity, forming a thin layer of POE solution. The volatiles are removed to obtain POE melt with a volatile content of less than 4.5%. The internal operating pressure of the static film devolatilizer is 0.55 MPa.
[0070] (3) The POE melt after volatile matter removal falls into the storage area of the static film devolatilizer. The POE melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 180℃. The POE melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by a conveying pump. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. Starting from the feed port, the first 4 sections are vacuumed to further remove volatile matter from the POE melt, obtaining a product with less than 0.043% volatile matter. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. The operating temperature of the first section is 175℃, the operating temperature of the second section is 185℃, the operating temperature of the third section is 180℃, the operating temperature of the fourth section is 180℃, and the operating temperature of the fifth section is 175℃.
[0071] Example 8
[0072] (1) Turn on the heat source. The third static thin film devourer maintains a temperature of 180°C. The top outlet of the static thin film devourer is connected to the vacuum system and is in normal condition.
[0073] (2) The material distributor is turned on. The volatile content of the POE solution coming out of the reactor is 85%. It is sent into the material fluid inlet of the static film devolatilizer by the transfer pump at a flow rate of 68 tons / h and a pressure of 5 MPa. The temperature is maintained at 180°C. The POE solution is sprayed onto the film plate by the material distributor. The POE solution flows downward on the film plate due to gravity, forming a thin layer of POE solution. The volatiles are removed to obtain POE melt with less than 4% volatiles. The operating pressure inside the static film devolatilizer is 0.45 MPa.
[0074] (3) The POE melt after volatile matter removal falls into the storage area of the static film devolatilizer. The POE melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 180℃. The POE melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by a conveying pump. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. Starting from the feed port, the first 4 sections are vacuumed to further remove volatile matter from the POE melt, obtaining a product with less than 0.043% volatile matter. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. The operating temperature of the first section is 175℃, the operating temperature of the second section is 185℃, the operating temperature of the third section is 180℃, the operating temperature of the fourth section is 180℃, and the operating temperature of the fifth section is 175℃.
[0075] Example 9
[0076] (1) Turn on the heat source. The first static thin film degasser maintains a temperature of 180°C. The top outlet of the static thin film degasser is connected to the vacuum system and is in normal condition.
[0077] (2) The material distributor is turned on. The volatile content of the POE solution coming out of the reactor is 90%. It is sent into the material fluid inlet of the static film devourer by the transfer pump at a flow rate of 68 tons / h and a pressure of 4 MPa. The temperature is maintained at 180°C. The POE solution is sprayed onto the film plate by the material distributor. The POE solution flows downward on the film plate due to gravity, forming a thin layer of POE solution. The volatiles are removed to obtain POE melt with a volatile content of less than 4.3%. The operating pressure inside the static film devourer is 0.5 MPa.
[0078] (3) The POE melt after volatile matter removal falls into the storage area of the static film devolatilizer. The POE melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 180℃. The POE melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by a conveying pump. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. Starting from the feed port, the first 4 sections are vacuumed to further remove volatile matter from the POE melt, obtaining a product with less than 0.043% volatile matter. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. The operating temperature of the first section is 175℃, the operating temperature of the second section is 185℃, the operating temperature of the third section is 180℃, the operating temperature of the fourth section is 180℃, and the operating temperature of the fifth section is 175℃.
[0079] Example 10
[0080] (1) Turn on the heat source. The first static thin film degasser maintains a temperature of 180°C. The top outlet of the static thin film degasser is connected to the vacuum system and is in normal condition.
[0081] (2) The material distributor is turned on. The volatile content of the POE solution coming out of the reactor is 80%. It is sent into the material fluid inlet of the static film devourer by the transfer pump at a flow rate of 68 tons / h. The pressure is 3.8 MPa and the temperature is maintained at 180°C. The POE solution is sprayed onto the film plate by the material distributor. The POE solution flows downward on the film plate due to gravity, forming a thin layer of POE solution. The volatiles are removed to obtain POE melt with a volatile content of less than 4.2%. The operating pressure in the static film devourer is 0.43 MPa.
[0082] (3) The POE melt after volatile matter removal falls into the storage area of the static film devolatilizer. The POE melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 185℃. The POE melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by the conveying pump. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. Starting from the feed port, the first 4 sections are vacuumed to further remove volatile matter from the POE melt, obtaining a product with less than 0.041% volatile matter. The twin-screw extruder is divided into 5 sections from the feed port to the outlet. The operating temperature of the first section is 175℃, the operating temperature of the second section is 185℃, the operating temperature of the third section is 180℃, the operating temperature of the fourth section is 180℃, and the operating temperature of the fifth section is 175℃.
[0083] Example 11
[0084] (1) Turn on the heat source. The first static thin film degasser maintains a temperature of 240°C. The top outlet of the static thin film degasser is connected to the vacuum system and is in normal condition.
[0085] (2) The material distributor is turned on. The volatile content of the ABS solution coming out of the reactor is 15%. It is sent into the material fluid inlet of the static film devourer by the transfer pump at a flow rate of 20 tons / h. The pressure is 2MPa and the temperature is maintained at 240℃. The ABS solution is sprayed onto the film plate by the material distributor. The ABS solution flows downward on the film plate due to gravity, forming a thin layer of ABS solution. The volatiles are removed to obtain ABS melt with a volatile content of less than 3.8%. The operating pressure in the static film devourer is 0.3MPa.
[0086] (3) The ABS melt after volatile matter removal falls into the storage area of the static film devolatilizer. The ABS melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 240℃. The ABS melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by the conveying pump. The twin-screw extruder is divided into 4 sections from the feed port to the outlet. Starting from the feed port, the first 3 sections are vacuumed to further remove volatile matter from the ABS melt, obtaining a product with less than 0.033% volatile matter. The twin-screw extruder is divided into 4 sections from the feed port to the outlet. The operating temperature of the first section is 240℃, the operating temperature of the second section is 255℃, the operating temperature of the third section is 230℃, and the operating temperature of the fourth section is 230℃.
[0087] Example 12
[0088] (1) Turn on the heat source. The first static thin film devourer maintains a temperature of 330°C. The top outlet of the static thin film devourer is connected to the vacuum system and is in normal condition.
[0089] (2) The material distributor is turned on. The volatile content of the SPS solution material coming out of the reactor is 11%. It is sent into the material fluid inlet of the static film devolatilizer by the transfer pump at a flow rate of 20 tons / h. The pressure is 2.5 MPa and the temperature is maintained at 330℃. The SPS solution material is sprayed onto the film plate by the material distributor. The SPS material flows downward on the film plate due to gravity, forming a thin layer of SPS material. The volatiles are removed to obtain SPS melt with less than 3.1% volatiles. The operating pressure in the static film devolatilizer is 0.35 MPa.
[0090] (3) The sPS melt after volatile matter removal falls into the storage area of the static film devolatilizer. The sPS melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 330℃. The sPS melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and sent to the inlet of the twin-screw extruder by a conveying pump. The twin-screw extruder is divided into 3 sections from the feed inlet to the outlet. Starting from the feed inlet, the first two sections are vacuumed to further remove volatile matter from the sPS melt, obtaining a product with less than 0.031% volatile matter. The twin-screw extruder is divided into 3 sections from the feed inlet to the outlet. The operating temperature of the first section is 320℃, the operating temperature of the second section is 320℃, and the operating temperature of the third section is 330℃.
[0091] Example 13
[0092] (1) Turn on the heat source. The first static thin film devourer maintains a temperature of 330°C. The top outlet of the static thin film devourer is connected to the vacuum system and is in normal condition.
[0093] (2) Turn on the material distributor. The volatile content of the SPS solution material coming out of the reactor is 20%. It is sent into the material fluid inlet of the static film devolatilizer by the transfer pump at a flow rate of 10 tons / h. The pressure is 3MPa and the temperature is maintained at 330℃. The SPS solution material is sprayed onto the film plate by the material distributor. The SPS material flows downward on the film plate due to gravity, forming a thin layer of SPS material. The volatiles are removed to obtain SPS melt with a volatile content of less than 4.3%. The operating pressure in the static film devolatilizer is 0.5MPa.
[0094] (3) The sPS melt after volatile matter removal falls into the storage area of the static film devolatilizer. The sPS melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 320℃. The sPS melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and directly fed into the inlet of the single screw extruder. The single screw extruder is divided into two sections between the feed inlet and the outlet. Starting from the feed inlet, the first section is evacuated to further remove volatile matter from the sPS melt, obtaining a product with less than 0.051% volatile matter. The single screw extruder is divided into two sections between the feed inlet and the outlet. The operating temperature of the first section is 320℃ and the operating temperature of the second section is 320℃.
[0095] Example 14
[0096] (1) Turn on the heat source. The first static thin film degasser maintains a temperature of 240°C. The top outlet of the static thin film degasser is connected to the vacuum system and is in normal condition.
[0097] (2) The material distributor is turned on. The volatile matter content of the ethylene propylene rubber solution material coming out of the reactor is 80%. It is sent into the material fluid inlet of the static film devolatilizer by the conveying pump at a flow rate of 35 tons / h. The pressure is 3MPa and the temperature is maintained at 240℃. The ethylene propylene rubber solution is sprayed onto the film plate by the material distributor. The ethylene propylene rubber material flows downward on the film plate due to gravity, forming a thin layer of ethylene propylene rubber material. The volatile matter is removed to obtain ethylene propylene rubber melt with a volatile matter content of less than 4.3%. The operating pressure in the static film devolatilizer is 0.5MPa.
[0098] (3) The ethylene propylene rubber melt after the volatile matter is removed falls into the storage area of the static film devolatilizer. The ethylene propylene rubber melt is discharged from the bottom outlet of the static film devolatilizer. The temperature of the storage area of the static film devolatilizer is 240℃. The ethylene propylene rubber melt is discharged from the bottom outlet of the storage area of the static film devolatilizer and is sent into the ethylene propylene rubber storage tank by a transfer pump.
Claims
1. A static thin-film devolatilizer, characterized in that, The static film devolatilizer is either a static single-layer film devolatilizer or a static multi-layer film devolatilizer; the shape of the static film devolatilizer is a circular kettle type, a circular tower type, a square tower type, or a square kettle type. High-viscosity fluids or melts with a viscosity of 50–10000 Pa·s exit the static film devolatilizer through the material distributor. Under the influence of gravity, a thin film forms on the surface of the film plate. Due to the pressure difference between the material inlet and the static film devolatilizer, the material fluid bubbles, the bubble film ruptures, and the volatiles are extracted by the vacuum system and discharged from the top outlet of the static film devolatilizer. The operating pressure of the high-viscosity fluid or melt in the material inlet and the material distributor is 1–10 MPa; the operating pressure in the static film devolatilizer is 0.1–0.8 MPa. The static film devolatilizer is a static multilayer film devolatilizer, in which the film plates of the upper and lower layers are installed in staggered positions, either partially or completely; or the lower film plate is installed directly below the upper film plate, and there is a material distributor for both the upper and lower layers, and the material melt after devolatilization in the upper and lower layers falls directly into the storage area of the devolatilizer. The shape of the membrane plate is fan-shaped, rectangular, or circular, and there can be multiple membrane plates; the thickness of the membrane plate is 0.2cm-20cm; the static membrane devolatilizer is characterized by each layer of membrane plates being completely or partially covered inside the device, wherein the partial coverage means that the area of each layer of membrane plates is one-fifth to four-fifths of the maximum cross-sectional area of the static membrane devolatilizer; when there are multiple membrane plates, each membrane plate in the same layer is tightly connected or spaced 3-50cm apart; each layer of membrane plate in the static membrane devolatilizer is fixedly mounted at one end on a support column and at the other end on the inner wall of the devolatilizer; the inclination angle of each membrane plate in the static membrane devolatilizer is 1-60 degrees, wherein the inclination angle is the angle between the membrane plate and the horizontal plane; The static thin film devolatilizer has holes near or in contact with the inner wall of the devolatilizer for each thin film plate; The static thin-film devolatilizer is used for devolatilization of high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s, and the operating temperature is 100-350℃. The volatile content of the high-viscosity fluid or high-viscosity melt is between 10% and 95%.
2. The static thin-film devolatilizer according to claim 1, characterized in that, The distance between each film plate of the static film devourer and the material distributor is 3cm-5m.
3. The static thin-film devolatilizer according to claim 1, characterized in that, A static thin film devolatilizer and its application are characterized in that the size of the holes can vary according to the amount of material flowing in or the viscosity of the material to be processed, and the shape of the holes is circular, elliptical, rectangular or square, and each thin film plate has one or more holes, with the diameter of each circular hole being 5-50 cm.
4. The static thin-film devolatilizer according to claim 1, characterized in that, In the static multilayer thin film devolatilizer, the thin film plates between the layers are staggered or the lower thin film plate is installed directly below the upper thin film plate; each thin film plate in the same layer is tightly connected or the thin film plates are spaced 3-50cm apart.
5. The static thin-film devolatilizer according to claim 1, characterized in that, The volume of the static thin film devourer is 1L-500m³. 3 .
6. The static thin-film devolatilizer according to claim 1, characterized in that, The static thin-film devolatilizer is used for devolatilization of high-viscosity fluids or melts with a viscosity of 50–10000 Pa·s produced by solution method, slurry method, precipitation method, emulsion method, liquid phase bulk method, or suspension method; the operating pressure of the reactor produced by solution method, slurry method, precipitation method, emulsion method, liquid phase bulk method, or suspension method is 0.5–10 MPa, and a material melt with a volatile content of less than 6% by mass is obtained after the removal of volatiles; the volatiles are solvents, monomers, or oligomers.
7. The static thin-film devolatilizer according to claim 1, characterized in that, The static thin-film devolatilizer is used for devolatilization of high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s. The operating temperature is 100-350℃, which can be constant temperature, variable temperature, or different temperatures controlled in different areas.
8. The static thin-film devolatilizer according to claim 1, characterized in that, The static film devolatilizer is used for devolatilization of high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s, and the operating pressure of the static film devolatilizer is 0.1-0.8 MPa.
9. The static thin-film devolatilizer according to claim 1, characterized in that, The static thin-film devolatilizer is used for devolatilization of high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s, and the average residence time is 5 min to 200 min.
10. The static thin film devolatilizer according to claim 1, characterized in that, The static thin-film devolatilizer is used for devolatilization of high-viscosity fluids or high-viscosity melts with a viscosity of 50 to 10000 Pa·s, and the material flow rate at the inlet is 0.5 L / h to 350 tons / h.
11. The static thin-film devolatilizer according to claim 1, characterized in that, The volatiles in the static thin film devolatilizer are discharged from the top of the static thin film devolatilizer and extracted by a vacuum system.
12. The static thin-film devolatilizer according to claim 1, characterized in that, After the volatiles are removed by the static thin-film devolatilizer, the melted material flows into the storage area of the static thin-film devolatilizer, and is then directly fed into the next operating unit from the bottom of the storage area or by a conveying pump.
13. The static thin-film devolatilizer according to claim 1, characterized in that, After the volatiles are removed by the static thin-film devolatilizer, the melt of the material flows into the storage area of the static thin-film devolatilizer, wherein the storage area is one-thirtieth to three-tenths of the volume of the static thin-film devolatilizer.
14. The static thin-film devolatilizer according to claim 1, characterized in that, The static film devolatilizer is used for devolatilization of high-viscosity fluids or melts with a viscosity of 50–10000 Pa·s. The material melt after volatile matter removal flows into the storage area of the static film devolatilizer and is then directly fed into the next operating unit from the bottom of the storage area or by a conveying pump. The next operating unit is a screw extruder, injection molding equipment, or storage tank. The screw extruder is a single-screw extruder, a twin-screw extruder, or a multi-screw extruder. After the material melt exits from the screw extruder outlet, it is cooled with cold water, pelletized, dried, packaged, and stored.
15. The static thin-film devolatilizer according to claim 15, characterized in that, The static film devolatilizer is used for devolatilization of high-viscosity fluids or melts with a viscosity of 50 to 10000 Pa·s. The material melt after the volatiles are removed flows into the storage area of the static film devolatilizer and is then pumped from the bottom of the storage area to the next operating unit by a conveying pump. The next operating unit is a screw extruder, an injection molding machine, or a storage tank. The next operating unit is a screw extruder, which is divided into 3-8 sections from the feed inlet to the outlet. The operating temperature of each section is different or the same, and the operating temperature is 100-350℃.
16. The static thin-film devolatilizer according to claim 1, characterized in that, The static film devolatilizer is used for devolatilization of high-viscosity fluids or melts with a viscosity of 50 to 10000 Pa·s. The material melt after the volatile matter is removed flows into the storage area of the static film devolatilizer and is then pumped from the bottom of the storage area of the static film devolatilizer into the next operating unit. The next operating unit is a screw extruder. The screw extruder is divided into 2-8 sections from the feed inlet to the outlet. Starting from the feed inlet, the first 1-7 sections are evacuated to further remove the volatile matter in the material melt and obtain a product with a volatile matter mass content of less than 0.1%.
17. The static thin-film devolatilizer according to claim 1, characterized in that, The operation procedure of the static thin film devourer is as follows: (1) Turn on the heat source and heat the static film devourer to 100-350℃. The top outlet of the static film devourer is connected to the vacuum system and is in normal condition. (2) The material distributor is turned on. The high-viscosity fluid or high-viscosity melt material sent from the reactor enters the static film devolatilizer through the material fluid inlet at the top of the devolatilizer. The operating pressure of the high-viscosity fluid or high-viscosity melt material in the material fluid inlet of the static film devolatilizer and the material distributor is 1-10 MPa. The material temperature is maintained between 100-350℃. The volatile content of the high-viscosity fluid or high-viscosity melt entering the static film devolatilizer inlet is between 10-95%. The material is sprayed onto the film plate by the material distributor, forming a thin layer of material on the film plate to remove the volatiles and obtain a material melt with a volatile mass content of less than 6%. The operating pressure in the static film devolatilizer is 0.1-0.8 MPa. (3) The material fluid after the volatile matter is removed falls into the storage area of the static film devolatilizer. The material melt is discharged from the bottom outlet of the static film devolatilizer and is directly fed into or sent by a conveying pump into the next operating unit. The next operating unit is a screw extruder or a storage tank. The temperature of the storage area of the static film devolatilizer is 100-350℃. The screw extruder is divided into 2-8 sections from the feed inlet to the outlet. Starting from the feed inlet, the first 1-7 sections are vacuumed to remove the volatile matter in the material melt and obtain a product with less than 0.1% volatile matter. The screw extruder is divided into 2-8 sections from the feed inlet to the outlet. The operating temperature of each section is the same or different. The operating temperature is 100-350℃.
Citation Information
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