Waste gas treatment process and device

WO2026113603A1PCT designated stage Publication Date: 2026-06-04SHANGHAI SECOND POLYTECHNIC UNIVERSITY

Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
SHANGHAI SECOND POLYTECHNIC UNIVERSITY
Filing Date
2025-09-22
Publication Date
2026-06-04

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Abstract

The present invention relates to the technical field of waste gas treatment, in particular to a waste gas treatment process and device. The device comprises a waste gas filter cylinder, an acid scrubber, an alkali scrubber, ultraviolet decomposition devices arranged in parallel, and an adsorption tower. After being filtered by the waste gas filter cylinder, waste gas is first absorbed by the acid scrubber and the alkali scrubber and then undergoes ultraviolet photolytic oxidation, and excess ozone is absorbed to achieve the effect of thoroughly degrading malodorous gases, such that the waste gas can meet emission standards. The process has high treatment efficiency and low operating costs, and does not cause secondary pollution to the environment. Furthermore, the waste gas filter cylinder uses the cooperation of a cleaning assembly and knocking blocks to clean a filter plate, thereby preventing the filter plate from being blocked, and further improving the waste gas treatment efficiency; and when support frames in the ultraviolet decomposition devices rotate, a plurality of partition plates are driven to rotate to further agitate the waste gas in a housing, such that the waste gas comes into full contact with ultraviolet light, thereby further improving the ultraviolet photolysis efficiency of the waste gas.
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