High density ion production using a dusty plasma
WO2026117751A1PCT designated stage Publication Date: 2026-06-04THE BOARD OF TRUSTEES OF THE UNIV OF ILLINOIS
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- THE BOARD OF TRUSTEES OF THE UNIV OF ILLINOIS
- Filing Date
- 2025-11-26
- Publication Date
- 2026-06-04
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Figure US2025057380_04062026_PF_FP_ABST
Abstract
A system comprising includes a confinement device comprising a target plasma confined in a chamber. The system also includes an ion source device coupled with the confinement device having an ion source plasma confined in the ion source device. The ion source plasma comprises a dusty plasma having dust particles formed from a solid material dispersed and suspended in the ion source plasma. The system additionally includes an ionization enhancement device configured to enhance production of ions from the dust particles suspended in the ion source plasma. A coupling between the confinement device and the ion source device is configured such that the ions produced from the dust particles travel towards the confinement device and are injected from the ion source device into the chamber of the confinement device, causing a fusion reaction to occur in the target plasma of the confinement device.
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