High density ion production using a dusty plasma

WO2026117751A1PCT designated stage Publication Date: 2026-06-04THE BOARD OF TRUSTEES OF THE UNIV OF ILLINOIS

Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
THE BOARD OF TRUSTEES OF THE UNIV OF ILLINOIS
Filing Date
2025-11-26
Publication Date
2026-06-04

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Abstract

A system comprising includes a confinement device comprising a target plasma confined in a chamber. The system also includes an ion source device coupled with the confinement device having an ion source plasma confined in the ion source device. The ion source plasma comprises a dusty plasma having dust particles formed from a solid material dispersed and suspended in the ion source plasma. The system additionally includes an ionization enhancement device configured to enhance production of ions from the dust particles suspended in the ion source plasma. A coupling between the confinement device and the ion source device is configured such that the ions produced from the dust particles travel towards the confinement device and are injected from the ion source device into the chamber of the confinement device, causing a fusion reaction to occur in the target plasma of the confinement device.
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