Preparation method for fluorine-doped tin oxide film
By adjusting the number of deposition processes and using a specific gas source to prepare fluorine-doped tin oxide films in an atomic layer deposition apparatus, the problems of insufficient thickness and uniformity in the prior art have been solved, achieving precise control and improved uniformity.
WO2026138920A1PCT designated stage Publication Date: 2026-07-02JIANGSU MICROVIA NANO EQUIP TECH CO LTD
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- JIANGSU MICROVIA NANO EQUIP TECH CO LTD
- Filing Date
- 2025-12-24
- Publication Date
- 2026-07-02
AI Technical Summary
Technical Problem
Existing technologies cannot precisely control the thickness and uniformity of fluorine-doped tin oxide films, thus failing to meet the requirements of different operating conditions.
Method used
By adjusting the number of deposition cycles, the number of tin oxide film sub-depositions, and the number of fluoride sub-depositions in an atomic layer deposition apparatus, and by using specific tin, fluorine, and oxygen sources, multiple cyclic deposition processes can be performed to control film thickness and uniformity.
Benefits of technology
This technology enables precise control of the thickness of fluorine-doped tin oxide films and significantly improves film uniformity, thereby reducing thickness variations.
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Smart Images
Figure CN2025145350_02072026_PF_FP_ABST
Abstract
The present application provides a preparation method for a fluorine-doped tin oxide film, comprising the following steps: placing a substrate in a deposition apparatus; and performing at least one deposition treatment, wherein each deposition treatment independently comprises performing at least one tin oxide film sub-deposition treatment and at least one fluoride sub-deposition treatment. The present application allows for precise control of the thickness of a fluorine-doped tin oxide film by changing the number of deposition treatments, the number of tin oxide film sub-deposition treatments, and the number of fluoride sub-deposition treatments; and in addition, the film exhibits good uniformity and minimal thickness difference.
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