Electrode device for biostimulation and biodata collection, and manufacturing method therefor
Patent Information
- Application Number
- PCT/KR2026/002554
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-10-31
- Filing Date
- 2026-02-11
- Publication Date
- 2026-08-27
Smart Images

Figure KR2026002554_27082026_PF_FP_ABST
Abstract
Description
Electrode device for biostimulation and biodata collection and method for manufacturing the same
[0001] The present invention relates to an electrode device for performing electrical stimulation on various biological parts, such as humans or animals, or for measuring physiological signals from biological parts, and a method for manufacturing the same.
[0002] Various electrode devices are being utilized for the treatment and diagnosis of various lesions, as well as for various biological tests.
[0003] These electrode devices perform electrical stimulation on the body by contacting or being adjacent to various target sites of the body. Furthermore, based on the biological feedback generated by the aforementioned electrical stimulation, follow-up measures for various treatments, diagnoses, and research can be performed. In addition, the electrode devices measure various physiological signals from various target sites of the body.
[0004] In addition, electrode devices can be utilized in various ways, such as invasive, minimally invasive, and non-invasive types, depending on the specific purpose of use.
[0005] As an example of the electrode device described above, prior Korean Patent Publication No. 10-2017-0127967 discloses an electrode device module for light stimulation and an electrode device system equipped with the same. The aforementioned prior art discloses an electrode device for performing additional light stimulation on nerve cells, etc.
[0006] Meanwhile, the major components of biomedical electrode devices, such as the aforementioned contact electrodes and various connecting wires, may need to have extremely fine sizes as required. However, mass-producing electrode devices of such micro-sized dimensions requires significant process complexity.
[0007] As part of solving the aforementioned problem, the present invention aims to provide an electrode device for biostimulation and biodata collection that can be mass-produced even with fine size specifications, and a method for manufacturing the same.
[0008] The electrode device for biostimulation and biodata collection according to the present invention is characterized by comprising: a base portion comprising at least one polymer material; an electrical pattern portion formed on the upper surface of the base portion and comprising at least one wiring pattern and at least one electrode pattern; an insulating layer covering at least the electrical pattern portion; and an electrode exposure portion formed on the insulating layer to expose the electrode pattern to the outside.
[0009] In addition, the above-mentioned electric pattern portion is characterized as being laser-induced graphene.
[0010] In addition, the above base portion is characterized by including a carbon precursor polymer.
[0011] In addition, the insulating layer is characterized by including a silicone lubricant.
[0012] A method for manufacturing an electrode device according to the present invention comprises: a base fixing step in which a base portion is fixed to an upper surface of a substrate; a pattern forming step in which at least two electrical pattern portions are formed, each comprising at least one wiring pattern and at least one electrode pattern, by performing a laser-induced graphene process on the upper surface of the base portion; an insulation treatment step in which an insulating layer is formed on the upper surface of the base portion and the electrical pattern portions; an electrode exposure step in which at least a portion of the electrode pattern is exposed to the outside by selectively removing portions of the insulating layer facing the electrode pattern by a laser; a cutting step in which at least two cutting patterns are formed that surround the outer side of each electrical pattern portion, have a cutting depth from the upper surface of the insulating layer to at least the bottom surface of the base portion, and have an outer shape corresponding to the long axis edge of the electrode device; and a separation step in which at least two electrode devices are manufactured by separating the inner portions of each cutting pattern from the substrate.
[0013] In addition, the base fixing step is characterized in that the base part is fixed to the substrate by forming an adhesive layer between the substrate and the base part, and the separation step is characterized in that the electrode devices are separated from the substrate by removing the adhesive layer.
[0014] In addition, the separation step is characterized in that the adhesive layer is received and selectively removed.
[0015] In addition, the base portion comprises a carbon precursor polymer, and the insulating layer comprises a silicone lubricant.
[0016] According to the present invention, electrical patterns such as fine wiring / electrodes in an electrode device are formed rapidly and precisely by a laser-induced graphene process.
[0017] In addition, through laser-based cutting and disassembly processes, multiple electrode devices are integrally separated from the manufacturing substrate, thereby further improving mass production capabilities.
[0018] FIG. 1 is a drawing showing an embodiment of a neural probe according to the present invention.
[0019] FIG. 2 is a flowchart showing an embodiment of a method for manufacturing a nerve probe according to the present invention.
[0020] Figure 3 is a plan view showing the base fixing step illustrated in Figure 2.
[0021] Figure 4 is a cross-sectional view taken from the 4-4' direction shown in Figure 3.
[0022] Figure 5 is a plan view showing the pattern formation step illustrated in Figure 2.
[0023] Figure 6 is a cross-sectional view taken from the 6-6' direction shown in Figure 5.
[0024] Figure 7 is a plan view showing the insulation processing step illustrated in Figure 2.
[0025] Figure 8 is a cross-sectional view taken from the 8-8' direction shown in Figure 7.
[0026] FIG. 9 is a plan view showing the electrode exposure step illustrated in FIG. 2.
[0027] FIG. 10 is a cross-sectional view taken from the 10-10' direction as shown in FIG. 9.
[0028] FIG. 11 is a plan view showing the cutting step illustrated in FIG. 2.
[0029] FIG. 12 is a cross-sectional view taken from the 12-12' direction shown in FIG. 11.
[0030] FIG. 13 is a cross-sectional view showing the state in which the separation step shown in FIG. 2 is performed based on the state shown in FIG. 12.
[0031] FIG. 14 is a plan view showing the separated neural probes in the state shown in FIG. 12.
[0032] FIG. 15 is a micrograph showing electrode devices according to an embodiment of the present invention.
[0033] FIG. 16 is a scanning electron microscope image showing electrode devices according to embodiments of the present invention.
[0034] FIG. 17 is a graph showing the results of Raman spectroscopic analysis of electrode devices according to embodiments of the present invention.
[0035] FIG. 18 is a graph showing the change in relative resistance measured in a bent state of electrode devices according to embodiments of the present invention.
[0036] FIG. 19 is a graph showing the cyclic voltammetry test results of electrode devices according to embodiments of the present invention.
[0037] FIG. 20 is a graph showing the probe test results of an electrode device according to an embodiment of the present invention.
[0038] FIG. 21 is a graph showing the insertion strength test results of an electrode device according to an embodiment of the present invention.
[0039] FIG. 22 is a micrograph showing an electrode device according to Example 2 of the present invention.
[0040] FIG. 23 is a micrograph showing an electrode device according to Example 3 of the present invention.
[0041] Figure 24 is a graph showing the EEG test results of the electrode device according to Example 2 of the present invention.
[0042] FIG. 25 is a graph showing the ECoG test results of the electrode device according to Example 3 of the present invention.
[0043] Prior to a detailed description of the present invention, specific details for implementing the invention are included in the embodiments and drawings described below. Additionally, identical reference numerals throughout the specification refer to identical components. Furthermore, singular expressions in this specification include plural forms unless specifically stated otherwise.
[0044] Hereinafter, an electrode device for biological stimulation and biological data collection and a method for manufacturing the same according to the present invention will be described with reference to the drawings.
[0045] FIG. 1 is a diagram showing an embodiment of an electrode device for biostimulation and biodata collection according to the present invention. FIG. 2 is a flowchart showing an embodiment of a method for manufacturing an electrode device for biostimulation and biodata collection according to the present invention.
[0046] Referring to FIG. 1, the electrode device (1000) according to the present invention includes an electrode installation part (10) and a connector body (20).
[0047] Various electrodes / wiring for stimulation / measurement are installed in the electrode installation section (10). The electrode installation section (10) is used to contact or be adjacent to a target area of the body. In addition, the electrode installation section (10) is formed in a multi-layer structure to ensure rigidity, flexibility, insulation, etc.
[0048] Here, the electrode mounting portion (10) is depicted in a pointed shape for invasive use, such as a type of probe, but the present invention is not limited thereto. That is, depending on the purpose of use, the electrode mounting portion (10) can be used non-invasively or minimally invasively and can have various structures / shapes.
[0049] And, the connector body (20) is coupled to the remaining end of the electrode installation part (10).
[0050] Additionally, the connector body (20) is equipped with additional wiring, electrodes, connectors, etc. that are electrically connected to the wiring / electrodes, etc. of the electrode installation part (10). For example, the connector body (20) side supplies / transmits power to the electrode installation part (10) side. Furthermore, various signals generated / measured at the electrode installation part (10) side can be transmitted to the outside through the connector body (20) side. Additionally, various external signals can be transmitted to the electrode installation part (10) side through the connector body (20) side.
[0051] Additionally, the connector body (20) is electrically connected to at least one of a separate power supply and a separate signal processing device. The connector body (20) can mediate the power / signal / control flow / process between the separate power supply / processing device and the electrode installation part (10). Here, the separate signal processing device can be selected from a laptop, desktop, tablet, smart device, PDA, and various other unmentioned computing means.
[0052] Additionally, a separate chip, printed circuit board, etc. may be additionally installed in the connector body (20).
[0053] And, in order to implement the above-described purpose / function, at least the electrode installation portion (10) includes at least a base portion (100), an electrical pattern portion (200), an insulating layer (300), and an electrode exposure portion (400).
[0054] And, referring further to FIG. 2, the manufacturing method of the electrode device (1000) described above includes a base fixing step (S100), a pattern forming step (S200), an insulation treatment step (S300), an electrode exposure step (S400), a cutting step (S500), and a separation step (S600).
[0055] FIG. 3 is a plan view showing the base fixing step illustrated in FIG. 2. FIG. 4 is a cross-sectional view taken from the 4-4' direction illustrated in FIG. 3.
[0056] Referring further to FIGS. 3 and 4, the base portion (100) is fixed on the substrate (SB) through the base fixing step (S100).
[0057] For example, an adhesive material may be provided on the upper surface of a substrate (SB) to form an adhesive layer (ST). Then, a base portion (100) may be attached to the upper surface of the adhesive layer (ST).
[0058] Here, the substrate (SB) can be selected from glass, aluminum, silicon, and various other materials.
[0059] In addition, the adhesive layer (ST) may be provided from tape attachment, liquid application, deposition, and various other articles / methods. Preferably, the adhesive layer (ST) may be water-soluble.
[0060] In addition, the base portion (100) may be a material suitable for the Laser-Induced Graphene (LIG) process. For example, the base portion (100) may be selected from polyimide (PI), Kevlar, and various polymers / fibers / organic materials that can be utilized as carbon precursors. Here, in the case of polyimide, it possesses various advantages such as significant flexibility, biocompatibility, and ease of processing.
[0061] In addition, the planar area and shape of the base portion (100) may correspond to the number of electrode devices (1000) to be manufactured simultaneously in a single process. The base portion (100) may be provided by various methods such as film attachment, spraying, coating, deposition, etc.
[0062] FIG. 5 is a plan view showing the pattern formation step illustrated in FIG. 2. FIG. 6 is a cross-sectional view taken from the 6-6' direction illustrated in FIG. 5.
[0063] Next, referring further to FIGS. 5 and 6, a plurality of the electric pattern portions (200) are formed on the upper surface of the base portion (100) through the pattern forming step (S200).
[0064] More specifically, a laser-induced graphene process is performed by irradiating a laser (L) onto the upper surface of the base portion (100). Accordingly, the upper surface portion of the base portion (100) irradiated with the laser (L) is grapheneized and formed into the electrical pattern portion (200).
[0065] Here, the laser (L) can be selected from various carbon-based lasers, such as a carbon dioxide (CO2) laser. Additionally, multiple laser (L) facilities may be provided. Furthermore, the number of laser (L) facilities operating simultaneously may be selected in various ways.
[0066] Additionally, each electrical pattern section (200) includes at least a wiring pattern (210) and an electrode pattern (220).
[0067] The above wiring pattern (210) is responsible for power supply, signal transmission and reception, etc., in the use of the electrode device (1000).
[0068] Furthermore, the electrode pattern (220) is connected to the wiring pattern (210) to receive power necessary for operation. Additionally, the electrode pattern (220) is in close contact with the living organism. Furthermore, the electrode pattern (220) applies electrical stimulation to the living organism. Additionally, the electrode pattern (220) measures various electrical and physiological signals from the living organism.
[0069] Here, corresponding to the design of the individual electrode device (1000), the shape and dimensions of each electrical pattern section (200) can be selected in various ways. In addition, the number of wiring patterns (210) and electrode patterns (220) in each electrical pattern section (200) can be selected in various ways.
[0070] In addition, corresponding to the number of electrode devices (1000) to be manufactured in a single process, a plurality of mutually spaced electrical pattern portions (200) may be formed on the surface of the base portion (100).
[0071] Additionally, the upper surface of the electric pattern section (200) is depicted as having a height substantially equal to that of the upper surface of the base section (100), but this is merely an example for illustrative purposes. Furthermore, the upper surface of the electric pattern section (200) may be higher or lower than the upper surface of the base section (100).
[0072] FIG. 7 is a plan view showing the insulation process step illustrated in FIG. 2. FIG. 8 is a cross-sectional view taken from the 8-8' direction illustrated in FIG. 7.
[0073] Next, referring further to FIGS. 7 and FIGS. 8, the insulating layer (300) is formed on the upper surface of the base portion (100) and the electrical pattern portion (200) through the insulating treatment step (S300).
[0074] More specifically, various insulating materials are covered on the upper surfaces of the base part (100) and the electric pattern part (200).
[0075] For example, the insulating layer (300) may be selected from Parylenes, polyamides, silicones, polycarbonates, polystyrene, polyurethane, SU-8, Poly(methyl methacrylate (PMMA), Zotek, and various other silicone / polymer materials. Additionally, the insulating layer (300) may have at least one of lubricity, flexibility, and biocompatibility / bio-inorganic properties.
[0076] Additionally, the insulating layer (300) can be formed through spraying, spin coating, deposition, and various other processes. Furthermore, if a liquid material is used as the insulating layer (300) material, additional thermal / photocuring processes may be performed.
[0077] The insulating layer (300) insulates the electrical pattern portion (200) provided therebelow. Additionally, by the base portion (100) and the insulating layer (300) being in close contact with both sides of the thickness of the electrical pattern portion (200), physical / electrical damage / short circuits, etc., of the electrical pattern portion (200) are prevented.
[0078] FIG. 9 is a plan view showing the electrode exposure step illustrated in FIG. 2. FIG. 10 is a cross-sectional view taken from the 10-10' direction illustrated in FIG. 9.
[0079] Next, referring further to FIGS. 9 and FIGS. 10, through the electrode exposure step (S400), the electrode exposure portion (400) is formed on the insulating layer (300), thereby allowing the electrode pattern (220) to be exposed to the outside.
[0080] More specifically, a plurality of electrode exposure portions (400) can be formed by selectively removing portions facing each electrode pattern (220) in the insulating layer (300). That is, the electrode exposure portions (400) can be formed as an opening structure, such as a groove, in the insulating layer (300).
[0081] Additionally, in the process of removing the insulating layer (300), cutting, laser, and various other means may be selected. Preferably, the laser (L) equipment used in the pattern formation step (S200) is used as is in the electrode exposure step (S400), thereby improving process efficiency and simplifying process equipment.
[0082] Through the electrode exposure step (S400) described above, only the electrode pattern (220) in the electrical pattern portion (200) is selectively exposed to the outside to come into contact with the body. Meanwhile, the wiring pattern (210) remains in an insulated state.
[0083] Here, referring to the drawings, the upper surface of the electrode pattern (220) is embedded in the inner side of the electrode exposure portion (400), and the upper surface of the electrode pattern (220) has a height that is virtually equal to the bottom surface of the insulating layer (300), but this is merely an example for explanation.
[0084] As another example, the upper surface of the electrode pattern (220) may be positioned higher than the bottom surface of the insulating layer (300).
[0085] That is, the upper surface of the electrode pattern (220) may be located between the bottom surface of the insulating layer (300) and the upper surface of the insulating layer (300). Additionally, the upper surface of the electrode pattern (220) may be located at an angle to the upper surface of the insulating layer (300) or higher than the upper surface of the insulating layer (300). To implement these other examples, at least some of the portions of the insulating layer (300) where a laser is irradiated may be formed of laser-induced graphene. That is, the thickness / height of the electrode pattern (220) may be extended to correspond to at least some of the thickness of the insulating layer (300) located above it.
[0086] FIG. 11 is a plan view showing the cutting step illustrated in FIG. 2. FIG. 12 is a cross-sectional view taken from the 12-12' direction illustrated in FIG. 11.
[0087] Next, referring further to FIGS. 11 and FIGS. 12, through the cutting step (S500), the long axis edge of each electrical pattern part (200) is separated / partitioned from the insulating layer (300) and the base part (100).
[0088] More specifically, a plurality of cut patterns (CL) corresponding to the long axis edge of the electrode device (1000) are formed on the upper surface of the insulating layer (300). Additionally, each cut pattern (CL) is formed to surround each electrical pattern part (200). Various means, such as a laser (L), can be selected for this cutting process. Furthermore, the depth of the cut patterns (CL) may be at least up to the bottom surface of the base part (100).
[0089] That is, the above-mentioned cutting pattern (CL) defines the outline of each electrode device (1000).
[0090] Accordingly, the long axis edge side of each electrode device (1000) is separated from the insulating layer (300), and only the bottom surface of each electrode device (1000) remains fixed to the substrate (SB).
[0091] FIG. 13 is a cross-sectional view showing the state in which the separation step shown in FIG. 2 is performed based on the state shown in FIG. 12. FIG. 14 is a plan view showing the electrode devices separated in the state shown in FIG. 12.
[0092] Next, referring further to FIGS. 13 and 14, the separation step (S600) is performed so that the bottom surface of each cut pattern (CL) is separated from the substrate (SB) and the adhesive layer (ST). Accordingly, a plurality of electrode devices (1000) are manufactured simultaneously.
[0093] More specifically, when the adhesive layer (ST) comes into contact with moisture such as water, only the adhesive layer (ST) can be selectively removed in a water-soluble manner.
[0094] By the above-described acceptance process, the adhesive layer (ST) is removed from at least the bottom surface of each cut pattern (CL). Accordingly, the inner portions of each cut pattern (CL) are separated from the substrate (SB). Thus, a plurality of electrode devices (1000) are separated from the substrate (SB).
[0095] Additionally, the above-described manufacturing method was explained based only on the electrode installation part (10) of the electrode device (1000), but this is merely an example for explanation purposes. That is, the above-described manufacturing method can be similarly applied to the process for manufacturing the connector body (20). Furthermore, the above-described manufacturing method can be similarly applied to the process for manufacturing the electrode installation part (10) and the connector body (20) as a single unit.
[0096] For example, the electrode installation part (10) and the connector body (20) can be manufactured integrally by the manufacturing method described above. To this end, a base part (100) may also be provided at a position corresponding to the connector body (20). Additionally, components corresponding to an electrical pattern part (200), an insulating layer (300), and an electrode exposure part (400) may be formed at a position corresponding to the connector body (20). Furthermore, a cutting step (S500) and a separation step (S600) may be performed to correspond to the integral shape of the electrode installation part (10) and the connector body (20).
[0097] Additionally, as an example for simultaneously manufacturing a plurality of electrode devices (1000), two electrode devices (1000) each having two electrode installation parts (10) have been described and illustrated. However, due to the characteristics of the manufacturing method in which various patterns / shapes are determined by a laser, the number of electrode devices (1000) manufactured simultaneously, the number of electrode installation parts (10) in each electrode device (1000), and the differences in appearance of each electrode device (1000) can be selected in various ways.
[0098] In addition, at each of the steps described above, the incident width / diameter of the laser (L), light intensity, incident time, etc., can be selected in various ways in accordance with the design of the electrode device (1000).
[0099] Additionally, after the electrode exposure step (S400), an additional electrode material may be attached to the upper surface of the electrode pattern (220) exposed to the outside of the electrode exposure portion (400). For example, gold, platinum, tin, copper, and various other additional electrode materials may be selected. Additionally, the additional electrode material may be selected from conductive polymer materials as well as metals. Furthermore, the additional electrode material may be attached by electroplating, deposition, spraying, spin coating, masking, or various other methods.
[0100]
[0101] [Example 1-1]
[0102] Based on the aforementioned manufacturing method, an electrode device (1000) according to the present embodiment was manufactured. In the present embodiment, the insulation treatment step (S300) and the electrode exposure step (S400) were not performed, so an electrode device (1000) was manufactured having only a base part (100) and an electrical pattern part (200). That is, in the present embodiment, all outer surfaces of the electrical pattern part (200) are exposed to the outside. Furthermore, the details of the manufacturing method applied to the present embodiment are as follows.
[0103]
[0104] Item Value Area of substrate (SB): 52 mm x 76 mm Material of substrate (SB): Glass Type of adhesive layer (ST): Double-sided tape Thickness of base part (100): 50 μm Type of base part (100): Polyimide film
[0105] First, materials as shown in the table above were prepared to perform the base fixing step (S100). That is, the glass substrate (SB) and the PI base part (100) were attached to the upper and lower surfaces of the double-sided tape, thereby fixing the base part (100) to the substrate (SB).
[0106] Next, the laser device settings for performing the pattern formation step (S200) are as shown in the table below.
[0107] Item Value Laser Wavelength 10.6 μm Laser Beam Diameter 100 μm Laser Output 4.7 W Scan Speed 50 mm / s
[0108] Next, an electrode device (1000) according to the present embodiment was manufactured by sequentially performing a cutting step (S500) using a laser and a separation step (S600) by solution. At this time, the shape of the cutting pattern (CL) in the cutting step (S500) was set to correspond to a nerve probe. Thus, a plurality of electrode devices (1000) having a nerve probe structure were manufactured according to the present embodiment.
[0109]
[0110] [Example 1-2]
[0111] The electrode device (1000) according to the present embodiment additionally performs an insulation treatment step (S300) compared to the above-described embodiment 1-1. Accordingly, the electrode device (1000) according to the present embodiment additionally provides an insulation layer (300). Here, since the electrode exposure step (S400) is not performed, the entire electrical pattern portion (200) including the electrode pattern (220) is not exposed to the outside.
[0112] In addition, to form the insulating layer (300) in this embodiment, a silicon (Si)-based biocompatible lubricant (LYNK Solution, LYNK SOLUTEC, Korea) was spray-coated onto the upper surface of the base portion (100) and the electrical pattern portion (200). Subsequently, the insulating layer (300) was finally formed by heat-curing the lubricant in a 190°C oven for 2 hours.
[0113]
[0114] [Examples 1-3]
[0115] FIG. 15 is a micrograph showing electrode devices according to an embodiment of the present invention.
[0116] The electrode device (1000) according to the present embodiment additionally performs an electrode exposure step (S400) using a laser compared to the above-described embodiment 1-2. Accordingly, in the electrical pattern portion (200) according to the present embodiment, only the upper surface of each electrode pattern (220) is selectively exposed to the outside of the insulating layer (300).
[0117] Additionally, referring further to FIG. 15, in the cutting step (S500), a plurality of cutting patterns (CL) are selected to have mutually identical neural probe shapes, thereby manufacturing a plurality of electrode devices (1000).
[0118]
[0119] [Test Example 1-1]
[0120] FIG. 16 is a scanning electron microscope image showing electrode devices according to embodiments of the present invention.
[0121] Referring further to FIG. 16, electrode devices (1000) according to the above-described Examples 1-1 to 1-3 were photographed using a scanning electron microscope.
[0122] As a result, it was confirmed that the base portion (100) in Example 1-1 has a smooth surface characteristic of polyimide (PI). Additionally, it was confirmed that the electrical pattern portion (200) in Example 1-1 has an irregular surface due to the porous structure characteristic of laser-induced graphene (LIG).
[0123] And, it was confirmed that the insulating layer (300) in Example 1-2 smoothly covers the surfaces of Example 1-1.
[0124] And, in the case of Examples 1-3, it was confirmed that a hole-shaped electrode exposure portion (400) was smoothly formed on the central side of the electrode pattern (220).
[0125] In this way, it has been clearly confirmed that each manufacturing step of the present invention can be smoothly implemented.
[0126]
[0127] [Test Example 1-2]
[0128] FIG. 17 is a graph showing the results of Raman spectroscopic analysis of electrode devices according to embodiments of the present invention.
[0129] Referring further to FIG. 17, Raman spectroscopic analysis was performed on the electrode devices (1000) according to the above-described Examples 1-1 and 1-3.
[0130] More specifically, Raman spectroscopic analysis was performed on the upper outer surface in Examples 1-1 and 1-3. Additionally, as indicated by AB in FIG. 17, a Raman spectroscopic analysis range was selected along the horizontal direction of the three-strand wiring patterns (210).
[0131] As a result of the analysis, in the case of Example 1-1, the spacing between the three graphene / carbon peaks was confirmed to substantially match the actual spacing of the wiring patterns (210). In this respect, it was confirmed that the laser is a means to form the electrical pattern portion (200) quickly and precisely.
[0132] Furthermore, in the case of Examples 1-3, a uniform silicon peak was observed throughout the entire analysis range. In this regard, it was confirmed that the silicon-based lubricating material can completely seal the other materials underneath it.
[0133]
[0134] [Test Example 1-3]
[0135] FIG. 18 is a graph showing the change in relative resistance measured in a bent state of electrode devices according to embodiments of the present invention.
[0136] Referring further to FIG. 18, a change in relative resistance was measured under conditions where bending stress is applied to the electrode devices (1000) according to the above-described Examples 1-1 and 1-3. Here, the change in relative resistance is defined as the rate of change in resistance when the electrode device (1000) is bent compared to when it is flat.
[0137] And, separate fixtures having radius of curvature such as 100, 75, 50, 25, and 10 mm were provided to bend the electrode devices (1000). And, as each electrode device (1000) was pressed against each fixture, each electrode device (1000) was bent to correspond to the fixtures.
[0138] As a result of the measurement, it was confirmed that in the case of Example 1-1, the relative resistance value increased significantly even with relatively little bending. On the other hand, in the case of Example 1-3, it was confirmed that no substantial change in relative resistance occurred across the entire measurement range.
[0139] In this regard, it was confirmed that physical / electrical damage / short circuits of the electric pattern portion (200) are significantly prevented by the insulating layer (300) adhering to both sides of the thickness / height of the electric pattern portion (200) together with the base portion (100). Additionally, it was confirmed that the cured Si-based lubricant provides excellent flexibility and airtightness / adhesion, similar to polyimide.
[0140]
[0141] [Test Example 1-4]
[0142] FIG. 19 is a graph showing the cyclic voltammetry test results of electrode devices according to embodiments of the present invention.
[0143] Referring further to FIG. 19, a cyclic voltammetry test was performed on the electrode devices (1000) according to the above-described Examples 1-1 to 1-3.
[0144] More specifically, the specific target on which the test is performed is selected as the electrode pattern (220) of each electrode device (1000). Here, in the case of Example 1-2 where the electrode pattern (220) is not exposed to the outside, the test execution location is selected as the surface of the insulating layer (300) facing coaxially with the upper part of the electrode pattern (220).
[0145] As a result of the test, no substantial change in current density was measured in the electrode device (1000) of Example 1-2. In this respect, it was confirmed that the insulating layer (300) provides excellent insulation.
[0146] In addition, it was confirmed that in the case of the electrode devices (1000) of Examples 1-1 and 1-3, the change in current density due to oxidation / reduction proceeds in a similar manner. In this respect, it was confirmed that laser-induced graphene provides excellent electrical performance. Furthermore, it was confirmed that the electrode exposure portion (400) effectively exposes the electrode pattern (220) to the outside.
[0147]
[0148] [Test Example 1-5]
[0149] FIG. 20 is a graph showing the probe test results of an electrode device according to an embodiment of the present invention.
[0150] Referring further to FIG. 20, after the skull of an anesthetized mouse was incised, an electrode device (1000) according to Example 1-3 was inserted into the CA1 region of the hippocampus. Here, the eight channels of the electrode device (1000) represent eight electrode patterns (220).
[0151] As a result of the test, it was confirmed that various spike signals with distinct waveforms and amplitudes were stably recorded. In particular, cluster analysis was performed on specific spike regions in channels 2 and 8, and multiple individual neuron signals were classified / identified.
[0152]
[0153] [Test Example 1-6]
[0154] FIG. 21 is a graph showing the insertion strength test results of an electrode device according to an embodiment of the present invention.
[0155] Referring further to FIG. 21, an insertion strength test was performed on the electrode device (1000) according to Example 1-3.
[0156] More specifically, the electrode device (1000) according to Examples 1-3 was repeatedly inserted 1 / 10 / 100 times into a 0.9% agarose brain phantom. In addition, the impedance in each insertion state was measured.
[0157] As a result of the test, it was confirmed that even if the electrode device (1000) is inserted 100 times repeatedly, the change in impedance in the electrical pattern part (200) is minimal.
[0158] That is, it was confirmed that even if the electrode device (1000) is inserted multiple times, physical / electrical damage / short circuit of the electrical pattern part (200) does not actually occur.
[0159]
[0160] [Example 2]
[0161] FIG. 22 is a micrograph showing an electrode device according to Example 2 of the present invention.
[0162] The electrode device (1000) according to the present embodiment was manufactured in a manner corresponding to the aforementioned embodiments 1-3. However, as shown in FIG. 22, in the cutting step (S500) of the present embodiment, the shape of the cutting pattern (CL) and the electrodes / wiring was set to be like an EEG (Electroencephalography) terminal. Accordingly, the electrode device (1000) according to the present embodiment was manufactured in the same form and for the same purpose as the EEG.
[0163]
[0164] [Example 3]
[0165] FIG. 23 is a micrograph showing an electrode device according to Example 3 of the present invention.
[0166] The electrode device (1000) according to the present embodiment was manufactured in a manner corresponding to the aforementioned embodiments 1-3. However, as shown in FIG. 23, in the cutting step (S500) of the present embodiment, the shape of the cutting pattern (CL) and the electrodes / wiring was set to be like an ECoG (Electrocorticogram) terminal. Accordingly, the electrode device (1000) according to the present embodiment was manufactured in the same form and for the same use as the ECoG.
[0167]
[0168] [Test Example 2]
[0169] Figure 24 is a graph showing the EEG test results of the electrode device according to Example 2 of the present invention.
[0170] Referring further to FIG. 24, an electrode device (1000) according to Example 2 was attached to the scalp of an anesthetized mouse. Then, brain waves were measured before and after the euthanasia of the mouse, respectively.
[0171] The test results showed that various physiological signals, such as low-frequency rhythms and intermittent spikes, were measured while the anesthetized mice were alive. Immediately after the mice were euthanized, these physiological signals rapidly decreased and were confirmed to disappear completely.
[0172]
[0173] [Test Example 3]
[0174] FIG. 25 is a graph showing the ECoG test results of the electrode device according to Example 3 of the present invention.
[0175] Referring further to FIG. 25, the skull of an anesthetized mouse was incised. Then, an electrode device (1000) according to Example 3 was attached to the surface of the cerebral cortex. Then, brain waves were measured for each of the time before and after euthanasia of the mouse.
[0176] The test results showed that various physiological signals were measured at high voltage intensities while the anesthetized mice were alive. Immediately after the mice were euthanized, these physiological signals rapidly decreased and were confirmed to disappear completely.
[0177]
[0178] Here, the application targets of the above-described embodiments / test examples are set for the brain / nerves. However, the electrode device according to the present invention may also be used in the heart / lungs / joints and various other biological tissues. Furthermore, the electrode device according to the present invention may be manufactured in various shapes and applications in addition to the examples of probes / EEG / ECoG described above.
[0179]
[0180] As described above, the main technical concept of the present invention relates to an electrode device for biological stimulation and biological data collection and a method for manufacturing the same. Furthermore, the embodiments described above with reference to the drawings are merely partial embodiments, and the scope of the present invention should be determined based on the patent claims. In addition, the scope of the present invention extends to various equivalent embodiments that can be derived.
Claims
1. A base portion comprising at least one type of polymer material; An electrical pattern portion formed on the upper surface of the base portion and comprising at least one wiring pattern and at least one electrode pattern; At least an insulating layer covering the above-mentioned electrical pattern portion; and An electrode device for biostimulation and biodata collection, characterized by including an electrode exposure portion formed in the insulating layer to expose the electrode pattern to the outside.
2. In Paragraph 1, The above electrical pattern section is, Electrode device for biostimulation and biodata collection characterized by being laser-induced graphene.
3. In Paragraph 2, The above base part is, Electrode device for biostimulation and biodata collection characterized by including a carbon precursor polymer.
4. In Paragraph 1, The above insulating layer is, Electrode device for biostimulation and biodata collection characterized by including a silicone lubricant.
5. A base fixing step in which a base part is fixed to the upper surface of the substrate; A pattern formation step in which a laser-induced graphene process is performed on the upper surface of the base portion, thereby forming at least two electrical pattern portions, each comprising at least one wiring pattern and at least one electrode pattern; An insulation treatment step in which an insulating layer is formed on the upper surface of the base portion and the electrical pattern portions; An electrode exposure step in which portions of the insulating layer facing the electrode pattern are selectively removed by a laser, thereby exposing at least a portion of the electrode pattern to the outside; A cutting step in which at least two cutting patterns are formed, each wrapping the outer side of each of the above-mentioned electrical pattern portions, having a cutting depth from the upper surface of the insulating layer to at least the bottom surface of the base portion, and having an outer shape corresponding to the long axis edge of the electrode device; and A method for manufacturing an electrode device for biostimulation and biodata collection, characterized by including a separation step in which at least two electrode devices are manufactured by separating the inner portions of each of the above-mentioned incision patterns from the substrate.
6. In Paragraph 5, The above base fixing step is, An adhesive layer is formed between the substrate and the base portion, thereby fixing the base portion to the substrate, and The above separation step is, A method for manufacturing an electrode device for biostimulation and biodata collection, characterized in that the electrode devices are separated from the substrate by removing the adhesive layer.
7. In Paragraph 6, The above separation step is, A method for manufacturing an electrode device for biostimulation and biodata collection, characterized in that the adhesive layer is accepted and selectively removed.
8. In Paragraph 5, The above base part is, Includes carbon precursor polymer, The above insulating layer is, A method for manufacturing an electrode device for biostimulation and biodata collection, characterized by including a silicone lubricant.