The invention discloses a secondary printing alignment method of a silicon solar cell. The method includes the following steps that a, a first screen printing plate with a first locating identification mark group is provided; b, the first screen printing plate is used for conducting primary printing through a first printing machine to obtain a silicon wafer with a first locating pattern group, and the first locating pattern group is matched with the first locating identification mark group; c, a second screen printing plate with a second locating identification mark group is provided, second locating marks of the second locating identification mark group correspond to first locating identification marks of the first locating identification mark group one by one; d, the second screen printing plate is used for conducting secondary printing on the silicon wafer printed for the first time in the step b) through a second printing machine, a silicon wafer with a second locating pattern group is obtained, the silicon wafer is also provided with the first locating pattern group, and the second locating pattern group is matched with the second locating identification mark group. By means of the method, precision and numerical valve location of locating patterns in secondary printing can be achieved, artificial randomness and numerical value judgment errors are removed, aligning precision is improved, overstriking ratio of silk-screen printing is reduced, and production yield is improved.