Display panel, preparation method thereof and display device

Abstract

The embodiment of the invention provides a display panel, a preparation method of the display panel and a display device. The light emitting efficiency of the light emitting side of the display panel is improved. The display panel comprises: a substrate; the pixel definition layer is positioned on one side of the substrate; the first dimming layer is located on the side, away from the substrate, of the pixel definition layer, the orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate, and the first dimming layer comprises a plurality of hole structures; the second dimming layer is located on the side, away from the substrate, of the first dimming layer, the hole structure is filled with the second dimming layer, and the refractive index of the second dimming layer is larger than that of the first dimming layer. Therefore, the concentration of the light emitted by the light-emitting unit is enhanced, the light brightness of the light-emitting side is improved, the light-emitting efficiency of the light-emitting side is improved, and the light extraction capability is enhanced.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a method for preparing the same, and a display device. Background Art

[0002] Active-Matrix Organic Light-Emitting Diode (AMOLED) products experience a phenomenon in which light gradually weakens as different film layers accumulate, and the light-emitting efficiency on the light-emitting side is low. Summary of the invention

[0003] In view of this, the embodiments of the present application provide a display panel and a method for manufacturing the same, and a display device, so as to improve the light extraction efficiency of the light extraction side of the display panel.

[0004] In a first aspect, an embodiment of the present application provides a display panel, comprising: a substrate; a pixel definition layer, located on one side of the substrate; a first dimming layer, located on a side of the pixel definition layer away from the substrate, the orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate, the first dimming layer comprises a plurality of hole structures; and a second dimming layer, located on a side of the first dimming layer away from the substrate, the second dimming layer fills the hole structure, and the refractive index of the second dimming layer is greater than the refractive index of the first dimming layer.

[0005] Preferably, the pixel definition layer encloses a plurality of pixel opening areas, and the orthographic projection of the hole structure on the substrate at least covers the orthographic projection of the pixel opening on the substrate; preferably, the hole structure includes one hole, and the orthographic projection of the hole on the substrate covers the orthographic projection of the pixel opening on the substrate; or, the hole structure includes a plurality of spaced holes, and the orthographic projections of the plurality of holes on the substrate and the orthographic projections of the gaps between adjacent holes on the substrate cover the orthographic projection of the pixel opening on the substrate; preferably, the hole is hexagonal in shape.

[0006] Preferably, the material of the first dimming layer includes inorganic material; preferably, the first dimming layer includes a graphene crystal film; preferably, the graphene crystal film includes a three-dimensional porous structure; preferably, the pore size range of the graphene crystal film is 1nm to 20μm; preferably, the thickness range of the first dimming layer is 1μm to 1mm; preferably, the refractive index range of the first dimming layer is 1 to 1.55.

[0007] Preferably, the material of the second dimming layer includes an inorganic material or an organic material; preferably, the material of the second dimming layer includes porous titanium dioxide.

[0008] Preferably, the pixel definition layer encloses a plurality of pixel openings; the display panel further comprises: a light-emitting device layer, the light-emitting device layer comprises a plurality of light-emitting units, at least a portion of the light-emitting units are located within the pixel openings; preferably, the display panel further comprises: an encapsulation layer, the encapsulation layer is located between the pixel definition layer and the first dimming layer; preferably, the display panel further comprises a touch layer, the touch layer is located between the encapsulation layer and the first dimming layer.

[0009] Preferably, the display panel further comprises: a barrier layer, wherein the barrier layer is located between the first dimming layer and the second dimming layer.

[0010] Preferably, the material of the barrier layer is different from the material of the first dimming layer and the second dimming layer; preferably, the material of the first dimming layer and / or the material of the second dimming layer includes organic material; preferably, the material of the barrier layer includes silicon nitride.

[0011] In a second aspect, an embodiment of the present application also provides a method for preparing a display panel, which is used to prepare the above-mentioned display panel, the method comprising: providing a substrate; preparing a pixel definition layer on one side of the substrate; preparing a first dimming layer on a side of the pixel definition layer away from the substrate, the orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate, and the first dimming layer includes a plurality of hole structures; and preparing a second dimming layer on a side of the first dimming layer away from the substrate, the second dimming layer fills the hole structure, and the refractive index of the second dimming layer is greater than the refractive index of the first dimming layer.

[0012] Preferably, the first dimming layer includes a graphene crystal film, and the first dimming layer is prepared on the side of the pixel definition layer away from the substrate, including: forming a polyimide precursor layer on the side of the pixel definition layer away from the substrate; in-situ inducing the polyimide precursor layer using an energy source to obtain the first dimming layer; preferably, the energy source includes at least one of a high-energy electron beam and a laser; preferably, after providing a substrate and before preparing the pixel definition layer on one side of the substrate, the method further includes: preparing a first electrode layer on the substrate, the first electrode layer including a plurality of first electrodes arranged at intervals, the pixel definition layer enclosing a plurality of pixel openings, and the pixel openings exposing a portion of the first electrode; preparing the pixel definition layer on one side of the substrate The method further comprises: preparing a light-emitting functional layer and a second electrode layer in sequence on the side of the pixel definition layer away from the substrate, the first electrode layer, the light-emitting functional layer and the second electrode layer constitute a light-emitting device layer, the light-emitting device layer comprises a plurality of light-emitting units, and at least part of the light-emitting units are located in the pixel opening; preferably, after preparing the light-emitting functional layer and the second electrode layer in sequence on the side of the pixel definition layer away from the substrate, and before preparing the first dimming layer on the side of the pixel definition layer away from the substrate, the method further comprises: forming an encapsulation layer on the side of the pixel definition layer away from the substrate; and forming a touch layer on the side of the encapsulation layer away from the substrate.

[0013] In a third aspect, an embodiment of the present application further provides a display device, comprising: the above-mentioned display panel.

[0014] Through the above technical solution, a first dimming layer and a second dimming layer are set, and the large-angle light emitted by the light-emitting unit is incident on the second dimming layer via the first dimming layer, and then reaches the interface between the second dimming layer and the first dimming layer. The light is totally reflected at the interface between the second dimming layer and the first dimming layer, and the light is gathered in a direction perpendicular to the substrate, thereby ensuring that the large-angle light can be emitted from the light-emitting side, enhancing the concentration of the light emitted by the light-emitting unit, improving the brightness of the light on the light-emitting side, improving the light extraction efficiency on the light-emitting side, and enhancing the light extraction capability. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the structure of a display panel provided in one embodiment of the present application.

[0016] Figure 2 It is a schematic diagram of the structure of a display panel provided in another embodiment of the present application.

[0017] Figure 3 yes Figure 1 A top view of the hole structure in the display panel is shown.

[0018] Figure 4 It is a structural schematic diagram of a display panel provided in yet another embodiment of the present application.

[0019] Figure 5 yes Figure 4 A top view of the hole structure in the display panel is shown.

[0020] Figure 6 It is a structural schematic diagram of a display panel provided in yet another embodiment of the present application.

[0021] Figure 7 It is a structural schematic diagram of a display panel provided in yet another embodiment of the present application.

[0022] Figure 8 It is a schematic diagram of a process of manufacturing a display panel provided in one embodiment of the present application.

[0023] Fig. 9 It is a schematic diagram of the structure of a display device provided in one embodiment of the present application. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the present application to clearly and completely describe the technical solutions in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0025] In AMOLED products, as the thickness of the film layer accumulates, the distance from the light-emitting side to the pixel light-emitting unit becomes farther and farther, and the light on the light-emitting side gradually weakens, resulting in low light efficiency.

[0026] Embodiments of the present application provide a display panel and a method for manufacturing the same, and a display device, so as to improve the light extraction efficiency of the light extraction side of the display panel.

[0027] Figure 1 is a schematic diagram of the structure of a display panel provided by an embodiment of the present application. Figure 1 As shown, the display panel includes a substrate 10 , a pixel definition layer 20 , a light emitting device layer 30 , an encapsulation layer 40 , a first dimming layer 50 and a second dimming layer 60 .

[0028] The substrate 10 may be an array substrate. The array substrate may be a thin film transistor (TFT) array substrate. For example, the array substrate may be a low temperature polysilicon (LTPS) TFT array substrate, an amorphous silicon TFT (a-Si) TFT array substrate, or an oxide TFT array substrate. Preferably, the substrate 10 includes a rigid substrate or a flexible substrate.

[0029] The pixel definition layer 20 is located on one side of the substrate 10. The pixel definition layer 20 encloses a plurality of pixel openings P1. In the embodiment of the present application, the pixel definition layer 20 includes an organic material or an inorganic material, which is not limited in the present application. For the convenience of explaining the present application, Figure 1 Only three pixel openings P1 are shown in the figure. It can be understood that the display panel of the present application includes multiple pixel openings P1.

[0030] The light-emitting device layer 30 includes a plurality of light-emitting units 300, at least part of which is located in the pixel opening P1. The light-emitting unit 300 includes a first electrode 301, a light-emitting functional unit 302, and a second electrode 303 which are sequentially stacked in a direction away from the substrate 10. Specifically, the first electrode 301 is located between the substrate 10 and the pixel definition layer 20, and the pixel opening P1 exposes part of the first electrode 301. The light-emitting functional unit 302 is located on the side of the first electrode 301 away from the substrate 10, and at least part of the light-emitting functional unit 302 covers the exposed first electrode 301, and the second electrode 303 is located on the side of the light-emitting functional unit 302 away from the substrate 10, and the second electrode 303 covers the light-emitting functional unit 302. In the embodiment of the present application, the first electrode 301 may be an anode, and the second electrode 303 may be a cathode; or, the first electrode 301 may be a cathode, and the second electrode 303 may be an anode.

[0031] The light-emitting functional unit 302 includes a hole injection layer, an electron injection layer, a hole transport layer, an electron transport layer, an electron blocking layer, a hole blocking layer, and an electroluminescent layer stacked in sequence. If the first electrode 301 is an anode and the second electrode 303 is a cathode, the light-emitting functional unit 302 can emit light due to the combination of holes provided from the first electrode 301 and electrons provided from the second electrode 303. When a voltage is applied to the anode and the cathode, electrons can migrate from the cathode to the electroluminescent layer through the electron transport layer, and holes can migrate from the anode to the electroluminescent layer through the hole transport layer. After the electrons and holes meet in the electroluminescent layer, they can form excitons, which transfer energy to the light-emitting molecules in the electroluminescent layer under the action of the electric field, so that the light-emitting molecules emit visible light, which is emitted through the cathode, so that the light-emitting unit 300 can emit light.

[0032] The encapsulation layer 40 is located on a side of the pixel definition layer 20 away from the substrate 10 .

[0033] The first dimming layer 50 is located on a side of the encapsulation layer 40 away from the substrate 10. The first dimming layer 50 includes a plurality of hole structures P2.

[0034] Preferably, the material of the first dimming layer 50 includes an inorganic material. Preferably, the first dimming layer 50 includes a graphene crystal film, the graphene crystal film includes a three-dimensional porous structure, and the pore size of the graphene crystal film ranges from 1nm to 220μm. Specifically, the pore size of the graphene crystal film is 1nm, 50nm, 100nm, 200nm, 300nm, 400nm, 500nm, 600nm, 700nm, 800nm, 1μm, 5μm, 10μm, 15μm, 20μm, etc. The thickness of the first dimming layer 50 or the graphene crystal film ranges from 1μm to 1mm. Specifically, the thickness of the first dimming layer 50 is 1 μm, 10 μm, 50 μm, 100 μm, 200 μm, 300 um, 400 um, 500 μm, 600 μm, 660 μm, 700 μm, 800 μm, 900 μm, 1 mm. The refractive index of the first dimming layer 50 ranges from 1 to 1.55. Exemplarily, the refractive index of the first dimming layer 50 is 1, 1.2, 1.25, 1.3, 1.35, 1.4, 1.45, 1.5, 1.55. In an embodiment of the present application, the refractive index of the first dimming layer 50 can be adjusted by the thickness of the graphene crystal film, and the thickness of the first dimming layer or the graphene crystal film can be adjusted according to the energy source used. For example, the type of energy source can be changed, or the intensity of the energy source can be changed. By adjusting the thickness and refractive index of the graphene crystal film, it is possible to adapt to the needs of different film structures, select the appropriate thickness and refractive index according to actual conditions, and thus maximize the light output efficiency of the light output side.

[0035] In the embodiment of the present application, the hole structure P2 includes a hole structure of a graphene crystal film. In the embodiment of the present application, the orthographic projection of the hole structure P2 on the substrate 10 at least covers the orthographic projection of the pixel opening P1 on the substrate 10. Figure 1 As shown, the orthographic projection range of any hole structure P2 on the substrate 10 coincides with the orthographic projection range of the corresponding pixel opening P1 on the substrate 10. Figure 2 As shown, the orthographic projection range of any hole structure P2 on the substrate 10 is larger than the orthographic projection range of the pixel opening P1 on the substrate 10. In this way, more light can be totally reflected at the interface of the first dimming layer 50 and the second dimming layer 60 so as to move toward the direction perpendicular to the substrate 10, thereby improving the light extraction efficiency on the light extraction side. In the embodiment of the present application, the cross-sectional shape of the pixel opening P1 may be the same as or different from the cross-sectional shape of the hole structure P2, and the present application does not limit this.

[0036] Continue to refer Figure 1 In the embodiment of the present application, since the graphene crystal film is a porous structure, there is a certain distance between adjacent light-emitting units. Therefore, there may also be a hole structure P2 in the non-pixel opening area on the pixel definition layer. This hole structure does not affect the light transmission of the light-emitting unit. It can be understood that Figure 1 The hole structures in the figure are only examples, and the number of hole structures may vary depending on the distance between adjacent light-emitting units. For example, the non-pixel opening area on the pixel definition layer may include 0, 1, 2 or 3 hole structures P2.

[0037] The second dimming layer 60 is located on a side of the first dimming layer 50 away from the substrate 10 . The second dimming layer 60 is filled with a plurality of hole structures P2 . The refractive index of the second dimming layer 60 is greater than that of the first dimming layer 50 .

[0038] In the embodiment of the present application, the material of the second dimming layer 60 includes an inorganic material or an organic material. For example, the material of the second dimming layer 60 includes porous titanium dioxide. When the material of the second dimming layer 60 includes an organic material, a metal oxide, such as zirconium oxide, may be added to the organic material to increase the refractive index of the second dimming layer 60.

[0039] In the embodiment of the present application, without changing the preparation process between the substrate 10 and the encapsulation layer 40, the first dimming layer 50 is prepared on the side of the encapsulation layer 40 away from the substrate 10, and the preparation process is simple. Moreover, the first dimming layer 50 is arranged on the side of the encapsulation layer 40 away from the substrate 10, which also avoids the first dimming layer 50 and the second dimming layer 60 being too far away from the light-emitting unit 300, causing the part of the light emitted by the light-emitting unit 300 that deviates from the direction perpendicular to the substrate 10 to be lost because it cannot pass through the first dimming layer 40, thereby being more conducive to improving the light extraction efficiency of the light-emitting side. Secondly, by setting the first dimming layer 50 and the second dimming layer 60, the large-angle light emitted by the light-emitting unit 300 can be totally reflected at the interface of the first dimming layer 50 and the second dimming layer 60, and the light is gathered in the direction perpendicular to the substrate, thereby ensuring that the large-angle light can be emitted from the light-emitting side, enhancing the concentration of the light emitted by the light-emitting unit, improving the light brightness on the light-emitting side, improving the light extraction efficiency on the light-emitting side, and enhancing the light extraction capability. In addition, the material of the first dimming layer 50 includes a graphene crystal film. Graphene has low light absorption, and the hexagonal hole structure of graphene can converge light based on Fraunhofer diffraction, which is conducive to the light emitting from the light emitting side, further improving the light emitting efficiency of the light emitting side. In addition, when preparing the graphene crystal film, the thickness and refractive index of the graphene crystal film can be adjusted, and the hole structure can be formed without using a mask plate, simplifying the preparation process. In addition, the material of the first dimming layer 50 includes a graphene crystal film, and the material of the second dimming layer 60 includes an inorganic material or an organic material, which is beneficial to the stability of the structure composed of the first dimming layer 50 and the second dimming layer 60. Compared with the use of two organic materials, it can avoid the mutual dissolution of organic materials and the collapse of the film structure, which affects the light extraction capability. In addition, the refractive index of the graphene crystal film is relatively low, which can increase the refractive index difference between the first dimming layer 50 and the second dimming layer 60, making it easier for light to be totally reflected at the interface between the first dimming layer 50 and the second dimming layer 60, so that more light can be gathered in a direction perpendicular to the substrate 10, thereby further improving the light extraction efficiency on the light output side and further enhancing the light extraction capability.

[0040] In an embodiment of the present application, the encapsulation layer 40 may include two inorganic layers and one organic layer, and the organic layer is located between the two inorganic layers to form a sandwich structure including inorganic layer / organic layer / inorganic layer. Among them, in an embodiment of the present application, the organic layer can be prepared by inkjet printing (Ink Jet Printing, IJP) technology. Specifically, the organic layer has fluidity at a preset temperature, and the IJP technology is used to set it in the enclosed area, and wait for it to be leveled and solidified, which can further block the invasion of water and oxygen and improve the encapsulation effect. The two inorganic layers can be formed by chemical vapor deposition (Chemical Vapor Deposition, CVD).

[0041] In the embodiment of the present application, in the sandwich structure, the encapsulation layer 40 may include only one organic layer or multiple organic layers, and there is no limitation on this.

[0042] In addition, in the embodiment of the present application, the encapsulation layer 40 may adopt a multi-layer inorganic layer structure, or other forms of structures including overlapping organic layers and inorganic layers, in addition to the sandwich structure of inorganic layer / organic layer / inorganic layer. Preferably, the encapsulation layer 40 includes at least one organic layer and at least one inorganic layer alternately stacked in sequence to improve the encapsulation effect.

[0043] In the embodiment of the present application, the material of the inorganic layer constituting the encapsulation layer may be silicon nitride (SiNx), silicon oxide (SiOx), silicon oxynitride (SiON), aluminum oxide (Al2O3), etc. Preferably, the material of the inorganic layer constituting the encapsulation layer may be silicon nitride, which has a good effect of blocking water and oxygen, and can further improve the encapsulation effect. The material of the organic layer may be one or a combination of polyvinyl alcohol, polyurethane acrylate polymer, and polyimide resin, but the present application is not limited thereto.

[0044] Figure 3 yes Figure 1 A top view of the hole structure in the display panel is shown. Figure 1 and Figure 3 As shown, the hole structure P2 includes a hole P210, and the orthographic projection of the hole P210 on the substrate 10 covers the orthographic projection of the pixel opening P1 on the substrate. The side wall 501 of the hole structure P2 is tilted relative to the substrate 10, and the inclination angle of the side wall 501 of the hole structure P2 relative to the substrate 10 is 60° to 90°, for example, 60°, 70°, 80°, 90°. Within this angle range, the light can be totally reflected at the interface of the first dimming layer 50 and the second dimming layer 60, thereby improving the light extraction efficiency.

[0045] Figure 4 It is a structural schematic diagram of a display panel provided in yet another embodiment of the present application. Figure 5 yes Figure 4 A top view of the hole structure in the display panel is shown. Figure 4 and Figure 5 As shown, the hole structure P2 includes a plurality of holes P220 arranged at intervals, and the orthographic projections of the plurality of holes P220 on the substrate 10 and the orthographic projections of the gaps between adjacent holes P220 on the substrate 10 cover the orthographic projections of the pixel opening P1 on the substrate 10. Since the material of the first dimming layer 50 includes a graphene crystal film, the shape of the hole is hexagonal, and the hexagonal hole is conducive to the convergence of light, so that the light is gathered in a direction perpendicular to the substrate 10, further improving the light extraction efficiency. It can be understood that Figure 5The number of pore structures in the graphene is only an example, and the number and size of the graphene pore structures can be adjusted. In the embodiment of the present application, the side wall of the pore structure P2 is perpendicular to the substrate 10. It can be understood that the side wall of the pore structure P2 may not be perpendicular to the substrate 10. Specifically, the inclination angle of the side wall of the pore structure P2 relative to the substrate 10 is 60° to 90°.

[0046] Figure 6 It is a structural schematic diagram of a display panel provided in yet another embodiment of the present application. Figure 6 The display panel shown is Figure 1 The difference between the display panels shown is that Figure 6 The display panel shown further includes a touch layer 70 . The touch layer 70 is located between the encapsulation layer 40 and the first dimming layer 50 .

[0047] In addition, the first dimming layer 50 can also be located on the side of the other film layers away from the substrate 10, and there is no restriction on this. In the embodiment of the present application, as long as the orthographic projection of the first dimming layer 50 on the pixel definition layer 20 covers the side of the pixel definition layer 20 away from the substrate 10, in other words, as long as the first dimming layer 50 is located above the pixel definition layer 20 in the direction perpendicular to the substrate 10, so that the first dimming layer 50 and the second dimming layer 60 can adjust the optical path of the light emitted by the pixel light-emitting unit 30. Under the condition of meeting the technical concept of the technical solution provided in the embodiment of the present application, the closer the distance between the first dimming layer 50 and the second dimming layer 60 and the pixel light-emitting unit 30 is, the more conducive it is to improve the light output efficiency of the light output side.

[0048] Figure 7 It is a structural schematic diagram of a display panel provided in yet another embodiment of the present application. Figure 4 The display panel shown is Figure 1 The difference between the display panels shown is that Figure 4 The display panel shown also includes a barrier layer 80. The barrier layer 80 is located between the first dimming layer 50 and the second dimming layer 60. The material of the barrier layer 80 is different from the material of the first dimming layer 50 and the second dimming layer 60. The material of the first dimming layer 50 and / or the material of the second dimming layer 60 includes an organic material, and the material of the barrier layer includes an inorganic material, for example, silicon nitride. By providing the barrier layer 80, the mutual dissolution between the first dimming layer 50 and the second dimming layer 60 can be avoided, which is beneficial to maintaining the structural stability of the first dimming layer 50 and the second dimming layer 60, and is beneficial to improving the light output efficiency of the light output side.

[0049] In this embodiment, the material of the first dimming layer 50 includes an organic material, and the hole structure of the first dimming layer 50 can be formed by patterning. For example, the material of the first dimming layer 50 is formed on the side of the encapsulation layer 40 away from the substrate 10, and then the material of the first dimming layer 50 is patterned to obtain a plurality of hole structures P2.

[0050] In a second aspect, an embodiment of the present application provides a method for preparing a display panel, which is used to prepare the above-mentioned display panel.

[0051] Figure 8 FIG. 1 is a flow chart of a method for manufacturing a display panel provided in an embodiment of the present application. Figure 7 As shown, the method includes the following steps.

[0052] Step S801, providing a substrate.

[0053] Step S802: preparing a pixel definition layer on one side of the substrate.

[0054] The present application embodiment does not limit the method for preparing the pixel definition layer, as long as the pixel definition layer can be obtained. Preferably, an insulating material layer is formed on one side of the substrate, and the insulating material layer is patterned to obtain the pixel definition layer.

[0055] Preferably, before step S802, the method further includes: preparing a first electrode layer on the substrate. The first electrode layer includes a plurality of first electrodes arranged at intervals, and the pixel definition layer encloses a plurality of pixel openings, and the pixel openings expose a portion of the first electrodes. After step S802, the method further includes: sequentially preparing a light-emitting functional layer and a second electrode layer on a side of the pixel definition layer away from the substrate, the first electrode layer, the light-emitting functional layer and the second electrode layer constitute a light-emitting device layer, and the light-emitting device layer includes a plurality of light-emitting units, and at least a portion of the light-emitting units are located in the pixel openings.

[0056] Step S803 , preparing a first dimming layer on a side of the pixel definition layer away from the substrate.

[0057] Preferably, the orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate. The first dimming layer includes a plurality of hole structures.

[0058] Preferably, in an embodiment of the present application, the first dimming layer includes a graphene crystal film. Preferably, a polyimide precursor layer is formed on the side of the pixel definition layer away from the substrate; the polyimide precursor layer is in-situ induced using an energy source to obtain the first dimming layer. Preferably, the energy source includes at least one of a high-energy electron beam and a laser, preferably a high-energy electron beam. In an embodiment of the present application, graphene crystal films of different thicknesses can be prepared by changing the type of energy source or changing the energy of the energy source. In this method, there is no need to use a mask plate for patterning to obtain a plurality of hole structures, which simplifies the preparation process. In addition, graphene has high flexibility, which is beneficial to the stability of the first dimming layer.

[0059] Preferably, the material of the first dimming layer includes an organic material, and the method for preparing the first dimming layer includes: forming the material of the first dimming layer on the side of the pixel definition layer away from the substrate, and patterning the material of the first dimming layer to obtain the first dimming layer. Preferably, in the method, after the first dimming layer is prepared, the method also includes forming a barrier layer on the side of the first dimming layer away from the substrate.

[0060] Preferably, before step S803, the method further comprises: forming an encapsulation layer on a side of the pixel definition layer away from the substrate; and forming a touch layer on a side of the encapsulation layer away from the substrate.

[0061] Step S804 , preparing a second dimming layer on a side of the first dimming layer away from the substrate.

[0062] The second dimming layer is filled with the hole structure, and the refractive index of the second dimming layer is greater than the refractive index of the first dimming layer.

[0063] In a third aspect, an embodiment of the present application provides a display device.

[0064] Fig. 9 is a schematic diagram of the structure of a display device provided by an embodiment of the present application. Fig. 9 As shown, the display device 900 is a product with an image display function. For example, the display device 900 can be used to display static images, such as pictures or photos. The display device 900 can also be used to display dynamic images, such as videos.

[0065] The display device 900 may be a laptop computer, a mobile phone, a handheld or portable computer, a camera, a camcorder, a vehicle-mounted smart central control screen, a calculator, a smart watch, a GPS navigator, an electronic photo, an electronic billboard or sign, a projector, etc.

[0066] The display device 900 includes a display panel provided by any of the above embodiments, which may be an organic light emitting diode display panel or a quantum dot electroluminescent display panel.

[0067] In addition, the display device 900 may also have functions such as taking pictures, recording videos, fingerprint recognition, and face recognition. Accordingly, the display device 900 also includes at least one functional module for implementing the above functions, such as an under-screen camera, an under-screen fingerprint recognition sensor, and the like.

[0068] The material of the first dimming layer 50 of the present application may include a graphene crystal film. Graphene has low light absorption, and the hexagonal hole structure of graphene can converge light based on Fraunhofer diffraction, which is conducive to the light emitting from the light emitting side, further improving the light emitting efficiency of the light emitting side. In addition, when preparing the graphene crystal film, the thickness and refractive index of the graphene crystal film can be adjusted, and the hole structure can be formed without using a mask plate, simplifying the preparation process. In addition, the material of the first dimming layer 50 includes a graphene crystal film, and the material of the second dimming layer 60 includes an inorganic material or an organic material, which is beneficial to the stability of the structure composed of the first dimming layer 50 and the second dimming layer 60. Compared with the use of two organic materials, it can avoid the mutual dissolution of organic materials and the collapse of the film structure, which affects the light extraction capability. In addition, the refractive index of the graphene crystal film is relatively low, which can increase the refractive index difference between the first dimming layer 50 and the second dimming layer 60, making it easier for light to be totally reflected at the interface between the first dimming layer 50 and the second dimming layer 60, so that more light can be gathered in a direction perpendicular to the substrate 10, thereby further improving the light extraction efficiency on the light output side and further enhancing the light extraction capability.

[0069] The basic principles of the present application are described above in conjunction with specific embodiments. However, it should be noted that the advantages, strengths, effects, etc. mentioned in the present application are only examples and not limitations, and it cannot be considered that these advantages, strengths, effects, etc. are required by each embodiment of the present application. In addition, the specific details disclosed above are only for the purpose of illustration and ease of understanding, not for limitation, and the above details do not limit the present application to being implemented by adopting the above specific details.

[0070] The words such as "including", "comprising", "having" and the like mentioned in this application are open words, meaning "including but not limited to", and can be used interchangeably therewith. The words "or" and "and" used herein mean the words "and / or" and can be used interchangeably therewith, unless the context clearly indicates otherwise. The word "such as" used herein means the phrase "such as but not limited to", and can be used interchangeably therewith.

[0071] It should be understood that the qualifiers "first", "second", "third" and "fourth" used in the description of the embodiments of the present invention are only used to more clearly illustrate the technical solutions and cannot be used to limit the scope of protection of the present invention.

[0072] The above description has been given for the purpose of illustration and description. In addition, this description is not intended to limit the embodiments of the present application to the forms disclosed herein. Although multiple example aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, changes, additions and sub-combinations thereof.

Claims

1. A display panel, characterized in that: include: substrate; A pixel definition layer, located on one side of the substrate; A first dimming layer is located on a side of the pixel definition layer away from the substrate, the orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate, and the first dimming layer includes a plurality of hole structures; as well as The second dimming layer is located on a side of the first dimming layer away from the substrate, the second dimming layer fills the hole structure, and the refractive index of the second dimming layer is greater than the refractive index of the first dimming layer.

2. The display panel according to claim 1, characterized in that: The pixel definition layer encloses a plurality of pixel openings, and the orthographic projection of the hole structure on the substrate at least covers the orthographic projection of the pixel openings on the substrate; Preferably, the hole structure comprises a hole, and the orthographic projection of the hole on the substrate covers the orthographic projection of the pixel opening on the substrate; or, The hole structure comprises a plurality of holes arranged at intervals, and the orthographic projections of the plurality of holes on the substrate and the orthographic projections of the gaps between adjacent holes on the substrate cover the orthographic projections of the pixel openings on the substrate; Preferably, the hole is hexagonal in shape.

3. The display panel according to claim 1, characterized in that: The material of the first dimming layer includes inorganic material; Preferably, the first dimming layer includes a graphene crystal film; Preferably, the graphene crystal film comprises a three-dimensional porous structure; Preferably, the pore size of the graphene crystal membrane ranges from 1 nm to 20 μm; Preferably, the thickness of the first dimming layer is in the range of 1 μm to 1 mm; Preferably, the refractive index of the first dimming layer is in the range of 1 to 1.

55.

4. The display panel according to claim 1, characterized in that: The material of the second dimming layer includes inorganic material or organic material; Preferably, the material of the second dimming layer includes porous titanium dioxide.

5. The display panel according to claim 1, characterized in that: The pixel definition layer encloses a plurality of pixel openings; The display panel further comprises: a light emitting device layer, the light emitting device layer comprising a plurality of light emitting units, at least a portion of the light emitting units being located within the pixel opening; Preferably, the display panel further comprises: an encapsulation layer, wherein the encapsulation layer is located between the pixel definition layer and the first dimming layer; Preferably, the display panel further includes a touch layer, and the touch layer is located between the encapsulation layer and the first dimming layer.

6. The display panel according to claim 1, characterized in that: Also includes: A barrier layer, wherein the barrier layer is located between the first dimming layer and the second dimming layer.

7. The display panel according to claim 6, characterized in that: The material of the barrier layer is different from the materials of the first dimming layer and the second dimming layer; Preferably, the material of the first dimming layer and / or the material of the second dimming layer comprises an organic material; Preferably, the material of the barrier layer includes silicon nitride.

8. A method for preparing a display panel, characterized in that: For preparing a display panel according to any one of claims 1 to 5, the method comprising: providing a substrate; preparing a pixel definition layer on one side of the substrate; Preparing a first dimming layer on a side of the pixel definition layer away from the substrate, wherein the orthographic projection of the first dimming layer on the substrate covers the orthographic projection of the pixel definition layer on the substrate, and the first dimming layer comprises a plurality of hole structures; and A second dimming layer is prepared on a side of the first dimming layer away from the substrate, the second dimming layer fills the hole structure, and the refractive index of the second dimming layer is greater than the refractive index of the first dimming layer.

9. The method for preparing a display panel according to claim 8, characterized in that: The first dimming layer includes a graphene crystal film, and the first dimming layer is prepared on a side of the pixel definition layer away from the substrate, including: forming a polyimide precursor layer on a side of the pixel definition layer away from the substrate; Inducing the polyimide precursor layer in situ by using an energy source to obtain the first dimming layer; Preferably, the energy source includes at least one of a high-energy electron beam and a laser; Preferably, after providing a substrate and before preparing a pixel definition layer on one side of the substrate, the method further comprises: preparing a first electrode layer on the substrate, the first electrode layer comprising a plurality of first electrodes arranged at intervals, the pixel definition layer enclosing a plurality of pixel openings, the pixel openings exposing portions of the first electrodes; After preparing the pixel definition layer on one side of the substrate and before preparing the first dimming layer on the side of the pixel definition layer away from the substrate, the method further comprises: sequentially preparing a light-emitting function layer and a second electrode layer on the side of the pixel definition layer away from the substrate, the first electrode layer, the light-emitting function layer and the second electrode layer forming a light-emitting device layer, the light-emitting device layer comprising a plurality of light-emitting units, at least part of which is located in the pixel opening; Preferably, after preparing the light-emitting functional layer and the second electrode layer in sequence on the side of the pixel definition layer away from the substrate, and before preparing the first dimming layer on the side of the pixel definition layer away from the substrate, the method further includes: forming an encapsulation layer on the side of the pixel definition layer away from the substrate; and forming a touch layer on the side of the encapsulation layer away from the substrate.

10. A display device, characterized in that: include: The display panel according to any one of claims 1 to 7.

Images