Clamping device for magnetron sputtering coating

Abstract

The invention relates to the field of magnetron sputtering devices, in particular to a clamping device for magnetron sputtering coating, which comprises a clamping seat, the center of the upper surface of the clamping seat is provided with a coating groove for placing a sample, and the clamping seat is provided with permanent magnet areas positioned on two sides of the coating groove. A plurality of first permanent magnets with N poles facing the upper surface of the clamping base are arranged in one permanent magnet area, and a plurality of first permanent magnets with S poles facing the upper surface of the clamping base are arranged in the other permanent magnet area. The two permanent magnets I with opposite polarities in the permanent magnet regions on the two sides of the clamping seat form an arched magnetic field line from N pole to S pole above the coating groove; after the sample is installed, electrons emitted into the film coating groove in all directions can be deflected under the action of the magnetic field lines and cannot be directly emitted into the film coating groove, so that the temperature rise of the clamping seat is reduced, and the film coating quality of the sample is ensured.

Description

Technical Field

[0001] The present application relates to the field of magnetron sputtering devices, and in particular to a clamping device for magnetron sputtering coating. Background Art

[0002] As an important method in the field of vacuum coating, vacuum magnetron sputtering coating has a very wide range of applications. The coating substrates include metals, glass, ceramics, plastic films, etc. According to the process conditions, a variety of films can be prepared, such as: optical films, decorative films, protective films, electromagnetic shielding films and other functional films.

[0003] During magnetron sputtering coating, the sample holder is in the plasma area or facing the plasma area. The high-temperature electrons and positive ions in the plasma area move in opposite directions under the action of the electric field; the mass of electrons is much smaller than that of positive ions, so the movement speed of electrons is much faster than that of positive ions, and they often reach the sample surface faster than positive ions to bombard the sample; the speed difference between the two ions generates an additional accelerating electric field in the plasma area, intensifying the energy of the electron bombardment; this bombardment effect is all manifested in the form of heat, causing the temperature of the holder to rise, and then the temperature of the sample to rise.

[0004] As the coating process takes longer, the temperature rise effect will accumulate, and temperature-sensitive devices will be easily damaged, which will also affect the quality of the film. Summary of the invention

[0005] In order to ensure the quality of coating, the present application provides a clamping device for magnetron sputtering coating.

[0006] The clamping device for magnetron sputtering coating provided in this application adopts the following technical solution: A clamping device for magnetron sputtering coating comprises a clamping seat, a coating groove for placing samples is provided at the center of the upper surface of the clamping seat, and permanent magnetic areas are provided on the clamping seat at both sides of the coating groove, wherein one of the permanent magnetic areas is provided with a plurality of permanent magnets with N poles facing the upper surface of the clamping seat, and the other permanent magnetic area is provided with a plurality of permanent magnets with S poles facing the upper surface of the clamping seat.

[0007] By adopting the above technical solution, two permanent magnets with opposite polarities in the permanent magnetic areas on both sides of the clamping seat form an arched magnetic field line from the N pole to the S pole above the coating tank; after the sample is installed, the electrons shot into the coating tank in all directions will be deflected by the magnetic field lines and cannot be directly shot into the coating tank, thereby reducing the temperature rise of the clamping seat and ensuring the coating quality of the sample.

[0008] Preferably, a linear distribution line is provided in the permanent magnet zone, the permanent magnet 1 is distributed along the distribution line, a plurality of rotation grooves are opened in the permanent magnet zone along the distribution line, a permanent magnet 2 is rotatably connected in the rotation groove with the distribution line as the rotation axis, and the polarity distribution direction of the permanent magnet 1 and the permanent magnet 2 in the same permanent magnet zone is the same.

[0009] By adopting the above technical scheme, the environment and requirements of different samples during film coating are different, and the density and intensity of electron bombardment are also different. Therefore, when coating different samples, the density of the magnetic field lines formed is also different. The denser the magnetic field lines, the thicker the protection area formed, and the better the effect of preventing bombardment. When denser magnetic field lines are needed, the operator rotates the permanent magnet two so that the direction of the permanent magnet two is consistent with the direction of the permanent magnet one. At this time, the permanent magnet one and the permanent magnet two in the two permanent magnetic regions can form an arched magnetic field line, so that the magnetic field line is denser. Similarly, the operator rotates the permanent magnet two so that it is perpendicular to the direction of the permanent magnet one, and the polarity of the permanent magnet two is toward the side of the clamping seat. At this time, the corresponding permanent magnets in the two permanent magnetic regions can no longer form an arched magnetic field line above the coating groove, thereby reducing the distribution of the magnetic field lines. The operator can adjust the density of the magnetic field lines according to the needs of the sample to improve the scope of use.

[0010] Preferably, the permanent magnets 2 in the two permanent magnet zones correspond one to one and are symmetrically distributed on both sides of the coating groove, and a control groove located below the coating groove is provided between the two opposite rotating grooves in the two permanent magnet zones, and a rotating shaft is rotatably connected in the rotating groove, and the lower end of the permanent magnet 2 is rotatably connected to the rotating shaft, and control rods are slidably connected to the two ends of the control groove, and the two control rods are respectively connected to the two rotating shafts, and the control rods and the rotating shaft are connected by an inclined connecting rod.

[0011] By adopting the above technical solution, the operator turns the control lever, and the control lever drives the rotating shaft to rotate through the connecting rod, thereby driving the permanent magnet 2 to rotate and changing the direction of the permanent magnet 2.

[0012] Preferably, a deformation spring made of memory metal is provided between the two control rods, the length of the deformation spring when the temperature is higher is greater than the length of the deformation spring when the temperature is lower, and a heat conducting plate is provided under the coating tank, and the heat conducting plate is connected to the deformation spring.

[0013] By adopting the above technical solution, when the temperature of the clamping seat rises, it means that the bombardment of electrons is more obvious, that is, the protection of the magnetic field lines against electron bombardment is weaker. At this time, the clamping seat transfers heat to the heat conducting plate, and the heat conducting plate transfers heat to the deformable spring. The deformable spring becomes longer due to heat, pushing the two control rods outward. The control rod drives the permanent magnet 2 to rotate through the connecting rod, so that the direction of the permanent magnet 2 is consistent with the direction of the permanent magnet 1, thereby strengthening the density of the magnetic field lines and improving the protection effect against electron bombardment. The clamping seat can adjust the density of the magnetic field lines according to the temperature rise of the clamping seat during use, which is convenient to use.

[0014] Preferably, a reset torsion spring is provided on the rotating shaft. When the reset torsion spring is in a natural state, the end of the permanent magnet 2 away from the rotating shaft is located on the side of the clamping seat. The elastic force of the reset torsion spring is smaller than the elastic force of the deformation spring at a higher temperature but larger than the elastic force of the deformation spring at the bottom temperature.

[0015] By adopting the above technical solution, when the temperature of the clamping seat rises, the deformed spring overcomes the elastic force of the reset torsion spring to rotate the permanent magnet 2; when the temperature of the clamping seat is low, the reset torsion spring drives the end of the permanent magnet 2 to be located on the side of the clamping seat, and the permanent magnet 2 is automatically reset, which is easy to use.

[0016] Preferably, a plurality of heat dissipation holes facing the heat conduction plate are provided under the clamping seat, and two baffles for opening and closing the heat dissipation holes are slidably connected in the heat dissipation holes, and the two baffles are respectively connected to two control rods. When the deformable spring is at a higher temperature, the two baffles move away from each other and the heat dissipation holes are opened; when the deformable spring is at a lower temperature, the two baffles contact each other and the heat dissipation holes are closed.

[0017] By adopting the above technical solution, when the temperature of the clamping seat increases, the deformed spring becomes longer, the control rod slides, and the permanent magnet rotates to strengthen the density of the magnetic field lines. When the control rod slides, the baffle plate slides at the same time, the heat dissipation hole is opened to face the heat conduction plate, the heat conduction plate and the coating tank are cooled, the temperature of the clamping seat is reduced as soon as possible, and the coating quality of the sample in the coating tank is guaranteed.

[0018] Preferably, the length of the connecting rod is smaller than the length of the second permanent magnet.

[0019] By adopting the above technical solution, the length of the connecting rod is shorter. When the connecting rod drives the rotating shaft to rotate, a smaller stroke of the connecting rod can make the permanent magnet 2 rotate over a larger range, which is convenient for use.

[0020] Preferably, a plurality of mounting holes are provided in the permanent magnet region, the permanent magnet 1 is penetrated in the mounting holes, an adsorption magnet is provided at the bottom of the mounting hole, and the polarity of the adsorption magnet toward the permanent magnet 1 is the same as the polarity of the upper end of the permanent magnet 1.

[0021] By adopting the above technical solution, the permanent magnet 1 is installed on the clamping seat by adsorbing the magnet, which is convenient for disassembly and assembly.

[0022] In summary, this application includes the following beneficial technical effects: By setting the permanent magnets one and two, magnetic field lines from the N pole to the S pole are formed above the coating tank, forming an arched protection area. The electrons shot toward the coating tank in all directions will be deflected in the arched protection area and cannot be directly shot toward the coating tank, which effectively improves the temperature rise problem of the coating. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] Figure 1 It is a schematic diagram of the overall structure of the embodiment; Figure 2 is a schematic diagram of the connection between the permanent magnet 1 and the clamping seat in the embodiment; Figure 3 Schematic diagram of the connection between the permanent magnet 2 and the clamping seat in the embodiment.

[0024] Description of reference numerals: 1. Clamping seat; 11. Coating slot; 12. Permanent magnetic area; 13. Rotation slot; 14. Control slot; 15. Heat dissipation hole; 16. Mounting hole; 17. Adsorption magnet; 2. Permanent magnet 1; 3. Permanent magnet 2; 4. Rotating shaft; 5. Control rod; 51. Connecting rod; 6. Deformation spring; 7. Heat conduction plate; 8. Baffle. DETAILED DESCRIPTION

[0025] The present application is further described in detail below in conjunction with all the accompanying drawings. Example

[0026] The present application embodiment discloses a clamping device for magnetron sputtering coating, referring to Figure 1 , including a clamping seat 1, a coating groove 11 for placing a sample is opened in the center of the clamping seat 1, and permanent magnetic areas 12 are set on both sides of the coating groove 11 on the clamping seat 1. The polarities of the upper surfaces of the two permanent magnetic areas 12 are opposite, one is the N pole and the other is the S pole. An arched magnetic field line located above the coating groove 11 is formed between the two permanent magnetic areas 12. The magnetic field lines constitute an arched protection area, and the electrons emitted from all directions to the coating groove 11 will be deflected in the arched protection area and cannot be directly emitted to the coating groove 11, which effectively improves the temperature rise problem of the coating.

[0027] Reference Figure 1 and Figure 2 A straight distribution line is provided in the permanent magnet area 12, and a plurality of mounting holes 16 are opened along the distribution line. An adsorption magnet 17 is provided at the bottom of the mounting hole 16. A permanent magnet 2 is placed in the mounting hole 16. The polarity of the permanent magnet 2 toward the adsorption magnet 17 is opposite to the polarity of the adsorption magnet 17 toward the permanent magnet. The adsorption magnet 17 adsorbs and fixes the permanent magnet 2, and is easy to disassemble and assemble.

[0028] Reference Figure 1 and Figure 2 In one permanent magnetic zone 12, the N poles of all permanent magnets 2 face the upper surface of the clamping seat 1, and in the other permanent magnetic zone 12, the S poles of all permanent magnets 2 face the upper surface of the clamping seat 1. The permanent magnets 2 in the two permanent magnetic zones 12 are symmetrically distributed with the axis of the coating tank 11 as the center line, thereby forming an arched magnetic field line.

[0029] Reference Figures 1 to 3 , a plurality of rotating grooves 13 are provided along the distribution line in the permanent magnet area 12, and the rotating grooves 13 are provided between two adjacent permanent magnets 1 2. A rotating shaft 4 is rotatably connected in the rotating groove 13, and the rotating shaft 4 is parallel to the distribution line. A permanent magnet 2 3 is fixed on the rotating shaft 4, and the polarity of the end of the permanent magnet 2 3 away from the rotating shaft 4 is the same as the polarity of the upper end of the permanent magnet 1 2 in the same permanent magnet area 12. The permanent magnet 2 3 rotates around the rotating shaft 4, and the end of the permanent magnet 2 3 can rotate from the side of the clamping seat 1 to the upper surface of the clamping seat 1, and can also rotate from the upper surface of the clamping seat 1 to the side of the clamping seat 1.

[0030] Reference Figures 1 to 3 , when the end of the permanent magnet 2 3 is located on the upper surface of the clamping seat 1, the permanent magnet 1 2 and the permanent magnet 2 3 in the two permanent magnet regions 12 can form an arched magnetic field line, thereby making the magnetic field line denser. Similarly, when the operator rotates the permanent magnet 2 3 so that its end is located on the side of the clamping seat 1, the corresponding permanent magnets 2 3 in the two permanent magnet regions 12 can no longer form an arched magnetic field line above the coating groove 11, thereby reducing the distribution of the magnetic field line. The operator can adjust the density of the magnetic field line according to the needs of the sample to increase the scope of use.

[0031] Reference Figures 1 to 3 The rotating grooves 13 in the two permanent magnet regions 12 are symmetrically distributed with the axis of the coating groove 11 as the center line. A control groove 14 is provided in the clamping seat 1 between the two symmetrically distributed rotating grooves 13, and the control groove 14 is located below the coating groove 11. The coating groove 11 and the control groove 14 are separated by a heat conducting plate 7. A deformation spring 6 made of memory metal, such as nickel-titanium alloy, is horizontally provided in the control groove 14. The middle position of the deformation spring 6 is fixedly connected to the heat conducting plate 7.

[0032] Reference Figures 1 to 3, the length of the deformation spring 6 when the temperature is high is greater than the length of the deformation spring 6 when the temperature is low. Here, the high temperature of the deformation spring 6 means that the temperature exceeds the temperature threshold when the deformation spring 6 is deformed, and the low temperature means that the temperature is lower than the threshold when the deformation spring 6 is deformed. The deformation spring 6 is made of a memory alloy, and when the temperature does not exceed its own deformation threshold, it will stably maintain a certain state. When the temperature exceeds the threshold, the characteristics of the memory alloy cause the deformation spring 6 to deform rapidly and its own length to increase.

[0033] Reference Figures 1 to 3 A control rod 5 is fixed to each end of the deformation spring 6, and the ends of the two control rods 5 away from the deformation spring 6 are respectively located in the rotation grooves 13 on both sides of the deformation spring 6. The ends of the control rod 5 away from the deformation spring 6 are hinged with an inclined connecting rod 51, and the ends of the connecting rod 51 away from the control rod 5 are hingedly connected to the edge of the rotating shaft 4. The length of the connecting rod 51 is less than the length of the permanent magnet 2 3. When the temperature of the clamping seat 1 or the sample rises, the deformation spring 6 becomes longer due to the heat, thereby pushing the control rods 5 at both ends. The control rods 5 drive the rotating shaft 4 to rotate through the connecting rod 51, and the ends of the permanent magnet 2 3 are turned to the upper surface of the clamping seat 1, thereby enhancing the distribution of the magnetic field lines, improving the protection effect against electron bombardment, and preventing the temperature of the clamping seat 1 from continuing to rise.

[0034] Reference Figures 1 to 3 , the control groove 14 forms a heat dissipation hole 15 on the lower surface of the clamping seat 1, and the heat dissipation hole 15 is directly opposite to the heat conducting plate 7. Two baffles 8 for opening and closing the heat dissipation hole 15 are slidably connected in the heat dissipation hole 15, and the two baffles 8 are respectively connected to the two control rods 5. When the deformation spring 6 is at a higher temperature, the two baffles 8 are separated from each other, and the heat dissipation hole 15 is opened to dissipate heat for the heat conducting plate 7, so as to reduce the temperature of the clamping seat 1 and the sample as soon as possible to avoid affecting the coating quality; when the deformation spring 6 is at a lower temperature, the two baffles 8 are in conflict with each other, and the heat dissipation hole 15 is closed.

[0035] Reference Figures 1 to 3 , a reset torsion spring is provided on the rotating shaft 4. When the reset torsion spring is in a natural state, the end of the permanent magnet 2 3 away from the rotating shaft 4 is located on the side of the clamping seat 1. The elastic force of the reset torsion spring is less than the elastic force of the deformation spring 6 at a higher temperature but greater than the elastic force of the deformation spring 6 at the bottom temperature. The reset torsion spring resets the permanent magnet 2 3. When the temperature is low, the end of the permanent magnet 2 3 is located on the side of the clamping seat 1. When the temperature rises, the permanent magnet 2 3 can still rotate so that its end is located on the upper surface of the clamping seat 1 to strengthen the magnetic field lines.

[0036] The implementation principle of the clamping device for magnetron sputtering coating in the embodiment of the present application is: the sample to be coated is placed in the coating tank 11. During coating, an arched magnetic field line is formed between the two permanent magnetic regions 12 above the coating tank 11. The magnetic field line constitutes a protection area. The electrons emitted toward the coating tank 11 in all directions will be deflected in the arched protection area and cannot be directly emitted toward the coating tank 11, thereby effectively improving the temperature rise problem of the coating.

[0037] The above are all preferred embodiments of the present application, and the protection scope of the present application is not limited thereto. Therefore, any equivalent changes made according to the structure, shape, and principle of the present application should be included in the protection scope of the present application.

Claims

1. A clamping device for magnetron sputtering coating, comprising a clamping seat (1), characterized in that: A coating groove (11) for placing a sample is provided at the center of the upper surface of the clamping seat (1), and permanent magnetic areas (12) are provided on the clamping seat (1) at both sides of the coating groove (11), wherein one of the permanent magnetic areas (12) is provided with a plurality of permanent magnets (2) with N poles facing the upper surface of the clamping seat (1), and the other permanent magnetic area (12) is provided with a plurality of permanent magnets (2) with S poles facing the upper surface of the clamping seat (1).

2. The clamping device for magnetron sputtering coating according to claim 1, characterized in that: A linear distribution line is provided in the permanent magnet region (12), the permanent magnet one (2) is distributed along the distribution line, a plurality of rotation slots (13) are provided in the permanent magnet region (12) along the distribution line, a permanent magnet two (3) is rotatably connected in the rotation slot (13) with the distribution line as a rotation axis, and the polarity distribution directions of the permanent magnet one (2) and the permanent magnet two (3) in the same permanent magnet region (12) are the same.

3. The clamping device for magnetron sputtering coating according to claim 2, characterized in that: The permanent magnets (3) in the two permanent magnet regions (12) correspond to each other and are symmetrically distributed on both sides of the coating groove (11). A control groove (14) located below the coating groove (11) is provided between the two rotating grooves (13) facing each other in the two permanent magnet regions (12). A rotating shaft (4) is rotatably connected in the rotating groove (13). The lower end of the permanent magnet (3) is rotatably connected to the rotating shaft (4). Control rods (5) are slidably connected at both ends of the control groove (14). The two control rods (5) are respectively connected to the two rotating shafts (4). The control rods (5) are connected to the rotating shaft (4) via an inclined connecting rod (51).

4. The clamping device for magnetron sputtering coating according to claim 3 is characterized in that: A deformation spring (6) made of memory metal is provided between the two control rods (5), the length of the deformation spring (6) when the temperature is higher is greater than the length of the deformation spring (6) when the temperature is lower, and a heat conduction plate (7) is provided below the coating tank (11), the heat conduction plate (7) being connected to the deformation spring (6).

5. The clamping device for magnetron sputtering coating according to claim 4, characterized in that: The rotating shaft (4) is provided with a return torsion spring. When the return torsion spring is in a natural state, the end of the second permanent magnet (3) away from the rotating shaft (4) is located on the side of the clamping seat (1). The elastic force of the return torsion spring is smaller than the elastic force of the deformation spring (6) at a higher temperature but larger than the elastic force of the deformation spring (6) at the bottom temperature.

6. The clamping device for magnetron sputtering coating according to claim 4, characterized in that: A plurality of heat dissipation holes (15) facing the heat conducting plate (7) are provided below the clamping seat (1). Two baffles (8) for opening and closing the heat dissipation holes (15) are slidably connected inside the heat dissipation holes (15). The two baffles (8) are respectively connected to two control rods (5). When the deformable spring (6) is at a higher temperature, the two baffles (8) move away from each other and the heat dissipation holes (15) are opened; when the deformable spring (6) is at a lower temperature, the two baffles (8) contact each other and the heat dissipation holes (15) are closed.

7. The clamping device for magnetron sputtering coating according to claim 3, characterized in that: The length of the connecting rod (51) is smaller than the length of the second permanent magnet (3).

8. The clamping device for magnetron sputtering coating according to claim 1, characterized in that: A plurality of mounting holes (16) are provided in the permanent magnet region (12), the permanent magnet one (2) is inserted into the mounting hole (16), an adsorption magnet (17) is provided at the bottom of the mounting hole (16), and the polarity of the adsorption magnet (17) facing the permanent magnet one (2) is the same as the polarity of the upper end of the permanent magnet one (2).

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