Auxiliary gas subsection adjusting device, system and method of cathode device

By setting up communication pipes and segmented valves in the auxiliary gas pipeline of the cathode device, flexible adjustment of the segmented auxiliary gas pipeline is achieved, solving the problem of deterioration of membrane uniformity during use, and improving production efficiency and product yield.

CN119663201APending Publication Date: 2025-03-21CHINA TRIUMPH INT ENG CO LTD
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Patent Information

Application Number
CN202411619700.9
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-11-13
Publication Date
2025-03-21

AI Technical Summary

Technical Problem

In magnetron sputtering technology, it is difficult to adjust the auxiliary gas segmentation of the cathode device flexibly, resulting in the film uniformity gradually deterioration during use. Especially in the middle and late stages of the use of the target material, it is difficult to adjust the uniformity by adjusting the auxiliary gas flow on both sides, resulting in a decrease in product yield.

Method used

By providing a first communication pipeline and a second communication pipeline in the auxiliary gas pipeline, as well as a first segmented valve and a second segmented valve, grouping and segmenting adjustment of the air outlets of the auxiliary gas pipeline can be realized, flexibly changing the number and position of the segments, and quickly adjusting the affected area of ​​the auxiliary gas.

Benefits of technology

It realizes rapid adjustment of film uniformity, improves production efficiency, reduces production costs, and improves product yield.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention provides an auxiliary gas subsection adjusting device, system and method of a cathode device, and relates to the technical field of cathode film layer preparation, the auxiliary gas subsection adjusting device is characterized in that a gas inlet of an auxiliary gas pipeline is communicated with a plurality of gas outlets of the auxiliary gas pipeline through multi-stage two-way auxiliary gas branch pipes, the gas inlets of the two-way auxiliary gas branch pipes are provided with first subsection valves, and the second subsection valves are provided with second subsection valves; each gas outlet of the two-way auxiliary gas branch pipe is provided with a second subsection valve; the plurality of first communicating pipelines are used for communicating the adjacent gas outlets between the two-stage auxiliary gas branch pipes of each first stage, and second sectional valves are arranged at the two ends of each first communicating pipeline; each first communicating pipeline is connected with the gas inlet of the adjacent first-stage two-way auxiliary gas branch pipe through a second communicating pipeline, and a first sectional valve is arranged on each second communicating pipeline; the air outlets of the auxiliary air pipeline are grouped by controlling the on-off of the first sectional valves and the second sectional valves, so that the segmentation of the auxiliary air pipeline is adjusted. The device has the beneficial effect that the auxiliary gas influence area can be quickly adjusted.
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Description

Technical Field

[0001] The present invention relates to the technical field of cathode film preparation, and in particular to an auxiliary gas segmented adjustment device, system and method for a cathode device. Background Art

[0002] At present, magnetron sputtering technology has been applied in more and more fields. The cathode is the core equipment for magnetron sputtering film preparation, and the uniformity of the film is an important indicator for evaluating the quality of the film. The uniformity of the film is the result of the influence of many factors, including the arrangement of the pump exhaust port, the arrangement of the cathode's own magnetic field, and the design of the gas distribution system structure.

[0003] Cathode sputtering requires the introduction of sputtering gas and reaction gas, and how to evenly distribute the introduced process gas around the cathode target is a difficult point. The industry generally adopts two channels for main gas and auxiliary gas to pass around the target, and mostly adopts a binary gas distribution method, that is, the gas inlet is divided into two, two into four, four into eight... Limited by the width of the target and space limitations, it is generally divided into thirty-two or sixty-four gas outlets. The process gas pipeline from the gas inlet to each gas outlet is of equal length, so in theory the gas is evenly distributed. The auxiliary gas pipeline is usually used as one of the important means to adjust the uniformity of the film layer. In the field of magnetron sputtering, the auxiliary gas pipeline can generally be divided into 3-11 sections for gas distribution according to the width of the cathode. After the auxiliary gas is segmented, the number of segments cannot be adjusted.

[0004] When preparing the film layer, if there are uneven areas, the corresponding auxiliary gas intake amount can be adjusted to achieve the purpose of adjusting the uniformity of the film layer. However, the uniformity is constantly changing during the use cycle of a target material, especially in the middle and late stages of the target material use, the uniformity of the film layer will deteriorate, and most of the time, unevenness will appear at the junction of the auxiliary gas segments. At this time, it is difficult to adjust the uniformity to the target range by adjusting the auxiliary gas intake amount on both sides, which will cause the product uniformity to deteriorate in the middle and late stages of production, making it difficult to adjust the uniformity of the film layer, and the yield rate will be low. When this happens, the method of breaking the air and adjusting the magnetic field is generally used multiple times to adjust the uniformity of the film layer. This method is time-consuming and labor-intensive, and increases production costs. Summary of the invention

[0005] In view of the problems existing in the prior art, the present invention provides an auxiliary gas segmented adjustment device for a cathode device, characterized in that it comprises:

[0006] A valve island device, wherein the process gas is input into the air inlet of the valve island device, and each air outlet of the valve island device is correspondingly connected to the air inlet of the main gas pipeline and the air inlet of the auxiliary gas pipeline through a plurality of connecting pipelines;

[0007] The air inlet of the auxiliary air pipeline is connected to its multiple air outlets through a multi-stage two-stage auxiliary air branch pipe, and the air inlet of each first-stage two-stage auxiliary air branch pipe is provided with a first segment valve, and each air outlet of each first-stage two-stage auxiliary air branch pipe is provided with a second segment valve;

[0008] A plurality of first connecting pipes, used to connect the adjacent gas outlets between the two auxiliary gas branches of each first stage, and the second segment valves are provided at both ends of each of the first connecting pipes;

[0009] A plurality of second communicating pipes, used to connect each of the communicating pipes with the air inlet of the adjacent first-stage two-branch auxiliary air branch pipe, and each of the second communicating pipes is provided with a first segmented valve;

[0010] By controlling the on and off of each of the first segment valves and the second segment valves, the gas outlets of the auxiliary gas pipeline are grouped to complete the adjustment of the segmentation of the auxiliary gas pipeline.

[0011] Preferably, the air inlet of the main air pipeline and its multiple air outlets are connected through a multi-stage two-way main air branch pipe, and the number of the air outlets of the main air pipeline is equal to the number of the air outlets of the auxiliary air pipeline and their positions correspond.

[0012] Preferably, a plurality of ventilation channels are formed between the air inlet of the auxiliary air pipeline and each of its own air outlets by a multi-stage two-way auxiliary air branch pipe, and the length of each of the ventilation channels is equal.

[0013] Preferably, a flow meter is provided on each of the connecting pipelines of the valve island device connected to the air inlet of the auxiliary air pipeline.

[0014] Preferably, the cathode device comprises:

[0015] A cavity, wherein a target material is placed in the cavity, the main gas pipeline and the auxiliary gas pipeline are arranged on both sides of the target material, and the top cover of the cavity is provided with a cover plate;

[0016] The valve island device and each of the connecting pipelines are arranged on the atmosphere side of the cover plate, and each of the connecting pipelines connects the main gas pipeline and the auxiliary gas pipeline in the cavity.

[0017] Preferably, a sealing ring is provided at the connection between the cover plate and the cavity, so that the cavity becomes a sealed environment.

[0018] Preferably, a fixing plate is further provided on the vacuum side of the cover plate, the fixing plate surrounds two sides of the target material, and the main gas pipeline and the auxiliary gas pipeline are fixed on the fixing plate.

[0019] The present invention also provides an auxiliary gas segmented adjustment system for a cathode device, comprising the auxiliary gas segmented adjustment device, including:

[0020] A storage module, used for storing the preset opening and closing states of each first segment valve and each second segment valve of the auxiliary gas segment adjustment device in each production stage of preparing the target material film layer;

[0021] A segmentation adjustment module connects each of the first segmentation valves and each of the second segmentation valves, and is used to adjust the real-time opening and closing states of each of the first segmentation valves and each of the second segmentation valves to the preset opening and closing states of each of the first segmentation valves and each of the second segmentation valves corresponding to the current production stage during the production process of the film layer of the target material, so as to complete the grouping of the various gas outlets of the auxiliary gas pipeline to complete the adjustment of the segmentation of the auxiliary gas pipeline.

[0022] The present invention also provides a method for adjusting the auxiliary gas in sections of a cathode device, which is applied to the auxiliary gas in sections adjusting system, and comprises:

[0023] Step S1, the auxiliary gas segmented adjustment system obtains the current production stage in real time during the production process of preparing the target material film layer;

[0024] Step S2, the auxiliary gas segmentation adjustment system adjusts the real-time opening and closing states of each of the first segmentation valves and each of the second segmentation valves to the preset opening and closing states of each of the first segmentation valves and each of the second segmentation valves corresponding to the current production stage, and completes grouping of the various gas outlets of the auxiliary gas pipeline to complete the adjustment of the segmentation of the auxiliary gas pipeline.

[0025] The above technical solution has the following advantages or beneficial effects: by arranging the first connecting pipe and the second connecting pipe as well as the first segmented valve and the second segmented valve in the auxiliary gas pipeline, the number and position of segments in the auxiliary gas pipeline can be flexibly changed, the auxiliary gas influence area can be quickly adjusted, and the uniformity of the film layer can be adjusted conveniently and quickly, saving time and effort and improving production efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 It is a front view of an auxiliary gas segmentation adjustment device of a cathode device in a preferred embodiment of the present invention;

[0027] Figure 2 It is a structural schematic diagram of a main gas pipeline in a side view of an auxiliary gas segmented adjustment device of a cathode device in a preferred embodiment of the present invention;

[0028] Figure 3 This is a schematic diagram of the structure of the two auxiliary gas branches provided in the auxiliary gas pipeline in a preferred embodiment of the present invention;

[0029] Figure 4This is a schematic diagram of the structure of the first connecting pipe and the second connecting pipe provided on the auxiliary gas pipeline in a preferred embodiment of the present invention.

[0030] Figure 5 This is a structural schematic diagram of a first segmented valve and a second segmented valve provided on the auxiliary gas pipeline in a preferred embodiment of the present invention;

[0031] Figure 6 This is a schematic diagram of a structure in which the auxiliary gas pipeline is divided into 9 sections in a preferred embodiment of the present invention.

[0032] Figure 7 This is a schematic diagram of a structure in which the auxiliary gas pipeline is divided into 8 sections in a preferred embodiment of the present invention.

[0033] Figure 8 This is a schematic diagram of a structure in which the auxiliary gas pipeline is divided into 7 sections in a preferred embodiment of the present invention;

[0034] Fig. 9 It is a structural schematic diagram of an auxiliary gas segmented adjustment system of a cathode device in a preferred embodiment of the present invention;

[0035] Fig.10 The figure is a flow chart of a method for adjusting auxiliary gas in stages of a cathode device in a preferred embodiment of the present invention. DETAILED DESCRIPTION

[0036] The present invention is described in detail below in conjunction with the accompanying drawings and specific embodiments. The present invention is not limited to this embodiment, and other embodiments may also fall within the scope of the present invention as long as they conform to the gist of the present invention.

[0037] In a preferred embodiment of the present invention, based on the above problems existing in the prior art, a cathode device auxiliary gas segmentation adjustment device is provided, characterized in that it comprises:

[0038] A valve island device 1, wherein the process gas is inputted into the air inlet of the valve island device 1, and each air outlet of the valve island device 1 is correspondingly connected to the air inlet of the main gas pipeline 3 and the air inlet of the auxiliary gas pipeline 4 through a plurality of connecting pipelines 2;

[0039] The air inlet of the auxiliary air pipeline 4 is connected to its multiple air outlets through a multi-stage two-stage auxiliary air branch pipe 41. The air inlet of each first-stage two-stage auxiliary air branch pipe 41 is provided with a first segment valve 200, and each air outlet of each first-stage two-stage auxiliary air branch pipe 41 is provided with a second segment valve 300.

[0040] A plurality of first connecting pipes 5 are used to connect the adjacent gas outlets between the two auxiliary gas branches 41 of each first stage, and a second segment valve 300 is provided at both ends of each first connecting pipe 5;

[0041] A plurality of second communicating pipes 6, used to connect each first communicating pipe 5 with the air inlet of the adjacent first-stage two-branch auxiliary air branch pipe 41, and each second communicating pipe 6 is provided with a first segmented valve 200;

[0042] By controlling the on and off of each of the first segment valves 200 and the second segment valves 300 , the gas outlets of the auxiliary gas pipeline 4 are grouped, thereby completing the segmentation of the auxiliary gas pipeline 4 .

[0043] Furthermore, in this embodiment, the cathode device includes:

[0044] A cavity 7, in which a target material 8 is placed, a main gas pipeline 3 and an auxiliary gas pipeline 4 are provided on both sides of the target material 8, and a cover plate 9 is provided on the top cover of the cavity;

[0045] The valve island device 1 and each connecting pipeline 2 are arranged on the atmosphere side of the cover plate 9, and each connecting pipeline 2 connects the main gas pipeline 3 and the auxiliary gas pipeline 4 in the cavity.

[0046] In a preferred embodiment of the present invention, a fixing plate 10 is further provided on the vacuum side of the cover plate 9 . The fixing plate 10 surrounds both sides of the target material 8 , and the main gas pipeline 3 and the auxiliary gas pipeline 4 are fixed on the fixing plate 10 .

[0047] Furthermore, in this embodiment, a sealing ring is provided at the connection between the cover plate 9 and the cavity 7, so that the cavity becomes a sealed environment.

[0048] Specifically, in this embodiment, Figure 1 The figure shows the front view of the auxiliary gas segment adjustment device. Figure 1 The lower part of the cavity 7 is provided with a cover plate 9 on the upper part of the cavity 7. The cover plate 9 and the lower cavity 7 form a sealed space, in which a cathode target material 8 for preparing a film layer is placed. A main gas pipeline 3 and an auxiliary gas pipeline 4 are provided on both sides of the cathode target material 8 to spray the cathode target material 8 with process gas.

[0049] Furthermore, in this embodiment, the air inlet of the main air pipeline 3 and its multiple air outlets are connected through a multi-stage two-way main air branch pipe 31, and the number of air outlets of the main air pipeline 3 is equal to the number of air outlets of the auxiliary air pipeline 4 and their positions correspond.

[0050] Specifically, Figure 2 The figure shows a side view of the auxiliary gas segment adjustment device ( Figure 2 Only the main gas pipeline is shown, and the auxiliary gas pipeline is not shown). The upper side of the cover plate 9 is the atmosphere side. A valve island device 1 is arranged on the cover plate 9. The air inlet of the valve island device 1 is connected to the external process gas delivery equipment through a pipeline. The air outlet of the valve island device 1 is connected to the main gas pipeline 3 and the auxiliary gas pipeline 4 through a plurality of connecting pipelines 2. In this embodiment, there are a total of 10 connecting pipelines 2, two of which are connected to the main gas pipeline 3, and eight are connected to the auxiliary gas pipeline 4. Figure 2 It can be seen that the air inlet of the main air pipeline 3 is connected to multiple air outlets through a multi-stage two-branch main air branch pipe 31. In this embodiment, the main air pipeline 3 has 64 air outlets in total, so a five-stage two-branch main air branch pipe 31 (2 5 =64), and the lengths of the multiple ventilation channels formed by the multi-stage two-way main gas branch pipes 31 between the air inlet of the main gas pipeline 3 and each of its own air outlets are equal to ensure that the gas content ejected from each air outlet is equal.

[0051] Further, such as Figure 3 The figure shows a side view of the auxiliary gas segment adjustment device ( Figure 3 Only the auxiliary gas pipeline is shown, and the main gas pipeline is not shown). The number and setting position of the gas outlets of the auxiliary gas pipeline 4 and the gas outlets of the main gas pipeline 3 are the same. It can be seen from the figure that 8 connecting pipelines 2 are connected to the 8 gas inlets of the auxiliary gas pipeline 4, and each gas inlet is connected to 8 gas outlets (2 3 =8), which means Figure 3 The auxiliary gas pipeline is divided into 8 sections, each with 8 gas outlets. This method will result in the inability to adjust the number of sections after the auxiliary gas is segmented. It is impossible to adjust the auxiliary gas flow on both sides, and it is difficult to adjust the uniformity within the target range, resulting in poor uniformity of the product in the middle and late stages of production, difficulty in adjusting the uniformity of the film layer, and low yield rate.

[0052] So further, Figure 4 As shown in Figure 3 On the basis of the invention, a plurality of first communicating pipes 42 and second communicating pipes 43 are added.

[0053] Further, if Figure 5 As shown, in Figure 4 On the basis of, the air inlet of each first-stage two-division auxiliary air branch pipe is provided with a first segmented valve, and each air outlet of each first-stage two-division auxiliary air branch pipe is provided with a second segmented valve; and both ends of each first connecting pipe are provided with a second segmented valve; and each second connecting pipe is provided with a first segmented valve; Figure 5 The first segment valves are numbered 201-216 from left to right, and the second segment valves are numbered 301-330 from left to right;

[0054] In one embodiment, Figure 6 As shown in , the auxiliary gas pipeline needs to be divided into 9 sections in the early stage of production. At this time, the segmentation of the auxiliary gas pipeline is adjusted by changing the opening and closing states of each first segment valve and the second segment valve. Specifically:

[0055] Open the first section valves 201, 203, 205, 207, 210, 212, 214, 216, the second section valves 303, 304, 307, 308, 311, 312, 315, 316, 319, 320, 323, 324, 327 and 328, and close all other valves.

[0056] At this time, the auxiliary gas pipeline is divided into 9 sections, which are framed and numbered 01-09. Sections 1 and 9 contain 4 gas outlets, and sections 2, 3, 4, 5, 6, 7, and 8 contain 8 gas outlets. At this time, the auxiliary gas pipeline can control the amount of auxiliary gas in 9 areas on the target surface, and the control distance ratio is 1:2:2:2:2:2:2:2:1.

[0057] In one embodiment, Figure 7 As shown in , the auxiliary gas pipeline needs to be divided into 8 sections in the middle of production. At this time, the sections of the auxiliary gas pipeline are adjusted by changing the opening and closing states of the first section valve and the second section valve. Specifically:

[0058] Open the first section valves 202, 204, 206, 208, 209, 211, 213, 215, the second section valves 301, 302, 305, 306, 309, 310, 313, 314, 317, 318, 321, 322, 325, 326, 329 and 330, and close all other valves.

[0059] At this time, the auxiliary gas pipeline is divided into 8 sections, which are framed and numbered 01-08, and each section of the auxiliary gas contains 8 gas outlets. At this time, the auxiliary gas pipeline can control the auxiliary gas flow rate in 8 areas on the target surface, and the control distance ratio is 1:1:1:1:1:1:1:1, and each section of the auxiliary gas covers the boundary area of ​​each section when the auxiliary gas pipeline is divided into 9 sections.

[0060] In one embodiment, Figure 8 As shown in , the auxiliary gas pipeline needs to be divided into 7 sections in the later stage of production. At this time, the sectioning of the auxiliary gas pipeline is adjusted by changing the opening and closing states of each first section valve and the second section valve. Specifically:

[0061] Open the first section valves 11, 12, 202, 204, 206, 208, 209, 211, 213, 215, the second section valves 301, 302, 305, 306, 309, 310, 313, 314, 317, 318, 321, 322, 325, 326, 329 and 330, and close all other valves.

[0062] At this time, the auxiliary gas pipeline is divided into 7 sections, which are framed and numbered 01-07. Sections 1, 2, 3, 5, 6 and 7 contain 8 gas outlets, and section 4 contains 16 gas outlets. In this way, the auxiliary gas pipeline can control the amount of auxiliary gas in 7 areas on the target surface, and the control distance ratio is 1:1:1:2:1:1:1.

[0063] In combination with all the aforementioned embodiments, the binary gas distribution principle must also be followed when changing the number of auxiliary gas segments, and the length of the pipelines from the air inlet to each outlet must be equal. According to the adjustment method of the present invention, it can be extended to other auxiliary gas pipeline segment numbers. In actual production, in the embodiment of the present invention, 9-segment gas distribution is used in the early stage of production. In the middle and late stages of target material use, when the uniformity of the film layer at the junction of the auxiliary gas segments deteriorates and cannot be adjusted, the method of the present invention is used to change the auxiliary gas segment to 8-segment gas distribution and 7-segment gas distribution, so that the auxiliary gas affected area can be quickly adjusted, and the uniformity of the film layer can be adjusted quickly and conveniently, saving time and effort, and improving production efficiency.

[0064] In a preferred embodiment of the present invention, multiple ventilation channels are formed between the air inlet of the auxiliary air pipeline 4 and each of its own air outlets by a multi-stage two-way auxiliary air branch pipe 41, and the length of each ventilation channel is equal.

[0065] Specifically, in this embodiment, the length of each ventilation channel is equal in order to allow the process gas to reach the gas outlet of the auxiliary gas pipeline evenly.

[0066] In a preferred embodiment of the present invention, a flow meter is provided on each connecting pipeline of the valve island device connected to the air inlet of the auxiliary air pipeline.

[0067] Specifically, in this embodiment, a flow meter is provided to accurately control the amount of process gas introduced into the main gas pipeline and the auxiliary gas pipeline.

[0068] The present invention also provides a cathode device auxiliary gas segmentation adjustment system, comprising the auxiliary gas segmentation adjustment device, such as Fig. 9 As shown, including:

[0069] Storage module 001, used to store the preset opening and closing states of each first segment valve and each second segment valve of the auxiliary gas segment adjustment device in each production stage of preparing the target material film layer;

[0070] The segmentation adjustment module 002 connects each first segmentation valve and each second segmentation valve, and is used to adjust the real-time opening and closing states of each first segmentation valve and each second segmentation valve to the preset opening and closing states of each first segmentation valve and each second segmentation valve corresponding to the current production stage during the production process of the film layer of the target material, so as to complete the grouping of each gas outlet of the auxiliary gas pipeline to complete the segmentation adjustment of the auxiliary gas pipeline.

[0071] Specifically, the auxiliary gas segmented adjustment system in this embodiment stores the preset opening and closing states of each first segmented valve and each second segmented valve in each production stage; the preset opening and closing states can be obtained by the staff according to their experience during the production process.

[0072] When the auxiliary gas pipeline segment needs to be adjusted, the opening and closing states of each valve are changed to adjust the number of auxiliary gas pipeline segments. The control can be performed in the manner described in the above embodiment.

[0073] The present invention also provides a cathode device auxiliary gas segmentation adjustment method, which is applied to the auxiliary gas segmentation adjustment system, such as Fig.10 As shown, including:

[0074] Step S1, the auxiliary gas segmented adjustment system obtains the current production stage in real time during the production process of preparing the target material film layer;

[0075] Step S2, the auxiliary gas segmentation adjustment system adjusts the real-time opening and closing states of each first segmentation valve and each second segmentation valve to the preset opening and closing states of each first segmentation valve and each second segmentation valve corresponding to the current production stage, and completes the grouping of each gas outlet of the auxiliary gas pipeline to complete the adjustment of the segmentation of the auxiliary gas pipeline.

[0076] The above are only preferred embodiments of the present invention, and are not intended to limit the implementation methods and protection scope of the present invention. Those skilled in the art should be aware that all solutions obtained by equivalent substitutions and obvious changes made using the contents of this specification and illustrations should be included in the protection scope of the present invention.

Claims

1. An auxiliary gas segmentation adjustment device for a cathode device, characterized in that: include: A valve island device, wherein the process gas is input into the air inlet of the valve island device, and each air outlet of the valve island device is correspondingly connected to the air inlet of the main gas pipeline and the air inlet of the auxiliary gas pipeline through a plurality of connecting pipelines; The air inlet of the auxiliary air pipeline is connected to its multiple air outlets through a multi-stage two-stage auxiliary air branch pipe, and the air inlet of each first-stage two-stage auxiliary air branch pipe is provided with a first segment valve, and each air outlet of each first-stage two-stage auxiliary air branch pipe is provided with a second segment valve; A plurality of first connecting pipes, used to connect the adjacent gas outlets between the two auxiliary gas branches of each first stage, and the second segment valves are provided at both ends of each of the first connecting pipes; A plurality of second communicating pipes, used to connect each of the first communicating pipes with the air inlet of the adjacent first-stage two-branch auxiliary air branch pipe, and each of the second communicating pipes is provided with a first segmented valve; By controlling the on and off of each of the first segment valves and the second segment valves, the gas outlets of the auxiliary gas pipeline are grouped to complete the adjustment of the segmentation of the auxiliary gas pipeline.

2. The auxiliary gas segment adjustment device according to claim 1, characterized in that: The air inlet of the main air pipeline is connected to its multiple air outlets through a multi-stage two-way main air branch pipe. The number of the air outlets of the main air pipeline is equal to the number of the air outlets of the auxiliary air pipeline and their positions correspond.

3. The auxiliary gas segment adjustment device according to claim 1, characterized in that: Multiple ventilation channels are formed between the air inlet of the auxiliary air pipeline and each of its own air outlets by multi-stage two-way auxiliary air branch pipes, and the length of each ventilation channel is equal.

4. The auxiliary gas segment adjustment device according to claim 1, characterized in that: A flow meter is provided on each of the connecting pipelines of the valve island device connected to the air inlet of the auxiliary air pipeline.

5. The auxiliary gas segmented adjustment device according to claim 1, characterized in that: The cathode device comprises: A cavity, wherein a target material is placed in the cavity, the main gas pipeline and the auxiliary gas pipeline are arranged on both sides of the target material, and the top cover of the cavity is provided with a cover plate; The valve island device and each of the connecting pipelines are arranged on the atmosphere side of the cover plate, and each of the connecting pipelines connects the main gas pipeline and the auxiliary gas pipeline in the cavity.

6. The auxiliary gas segmented adjustment device according to claim 5, characterized in that: A sealing ring is provided at the connection between the cover plate and the cavity, so that the cavity becomes a sealed environment.

7. The auxiliary gas segmented adjustment device according to claim 5, characterized in that: A fixing plate is also provided on the vacuum side of the cover plate. The fixing plate surrounds both sides of the target material. The main gas pipeline and the auxiliary gas pipeline are fixed on the fixing plate.

8. An auxiliary gas segmented adjustment system for a cathode device, characterized in that: The auxiliary gas segment adjustment device according to any one of claims 1 to 7 comprises: A storage module, used for storing the preset opening and closing states of each first segment valve and each second segment valve of the auxiliary gas segment adjustment device in each production stage of preparing the target material film layer; A segmentation adjustment module connects each of the first segmentation valves and each of the second segmentation valves, and is used to adjust the real-time opening and closing states of each of the first segmentation valves and each of the second segmentation valves to the preset opening and closing states of each of the first segmentation valves and each of the second segmentation valves corresponding to the current production stage during the production process of the film layer of the target material, so as to complete the grouping of the various gas outlets of the auxiliary gas pipeline to complete the adjustment of the segmentation of the auxiliary gas pipeline.

9. A method for adjusting the auxiliary gas of a cathode device in stages, characterized in that: The auxiliary gas staged adjustment system as claimed in claim 8 comprises: Step S1, the auxiliary gas segmented adjustment system obtains the current production stage in real time during the production process of preparing the target material film layer; Step S2, the auxiliary gas segmentation adjustment system adjusts the real-time opening and closing states of each of the first segmentation valves and each of the second segmentation valves to the real-time opening and closing states of each of the first segmentation valves and each of the second segmentation valves corresponding to the current production stage. The preset opening and closing state of the second segmented valve is used to complete the grouping of the various gas outlets of the auxiliary gas pipeline. To complete the segmentation of the auxiliary gas pipeline.