Platform support and high-precision marble platform
By designing a platform bracket with thermal deformation release function, the deformation problem caused by thermal expansion in the marble platform in a low temperature environment is solved, and the effect of maintaining the precision of the tabletop while high stiffness and precise positioning of the support is achieved.
Patent Information
- Application Number
- CN202510077635.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-01-17
- Publication Date
- 2025-03-28
- Estimated Expiration
- 2045-01-17
AI Technical Summary
When used in low temperature environments, the existing platform brackets cannot effectively deal with the problem of mismatch between the thermal expansion coefficients of the marble platform and the bracket, resulting in deformation of the marble platform due to overconstraint and the tabletop accuracy is reduced.
A platform bracket is designed, including a frame, a rigid support assembly, a mobile support assembly and a balanced support assembly. Through the combination of a linear guide rail slide mechanism and a balanced support assembly, it achieves a thermal deformation release function while accurately positioning the support.
When the temperature changes significantly, the marble platform can be deformed freely to avoid thermal stress, thereby effectively ensuring the tabletop accuracy of the marble platform and is suitable for low-temperature installation and adjustment of space optical cameras and other equipment.
Smart Images

Figure CN119713067A_ABST
Abstract
Description
Technical Field
[0001] The invention relates to the technical field of mechanical engineering, and specifically provides a platform bracket and a high-precision marble platform. Background Art
[0002] The high-precision marble platform provides a high-precision and high-stability adjustment benchmark for the adjustment and testing of the optical system of the space camera. It is an important and indispensable equipment for the adjustment and testing of the optical system of the space camera. The high-precision marble platform usually consists of a marble platform and a platform bracket. For space optical cameras working at room temperature, they are usually adjusted at room temperature. The marble platform is used at room temperature, and the bracket only needs to maintain the table surface accuracy under small temperature fluctuations. For space optical cameras working at low temperatures, they are usually adjusted at low temperatures, and the marble platform also needs to be used in low temperature environments. Since the marble platform is usually manufactured at room temperature, when used in a low temperature environment, the bracket needs to maintain the table surface accuracy under large temperature fluctuations.
[0003] At present, the existing platform brackets mainly include rigid brackets and air-floating vibration isolation brackets. Rigid brackets are generally supported at three points. Since there is a large friction between the support points and the contact surface of the marble platform, it can be considered that each support point constrains the translational freedom of the marble platform in the plane. Air-floating vibration isolation brackets are generally supported at multiple points. Similarly, it can be considered that each support point constrains the translational freedom of the marble platform in the plane.
[0004] When used in a low-temperature environment that deviates significantly from the manufacturing temperature, the bracket will generate a large thermal stress on the marble platform due to the mismatch in thermal expansion coefficients between the marble platform and the platform bracket, and the marble platform will also generate a large thermal stress. However, both the rigid bracket and the air-floating vibration isolation bracket are non-kinematic supports, and there is no thermal stress release measure, which causes the marble platform to deform greatly due to over-constraint, and the tabletop accuracy is greatly reduced. Summary of the invention
[0005] In order to solve the above problems, the present invention provides a platform bracket and a high-precision marble platform, wherein the platform bracket can provide high rigidity and precise positioning support while having a thermal deformation release function, so that when the temperature changes drastically, the marble platform can deform freely to avoid thermal stress, thereby effectively ensuring the table top accuracy of the marble platform.
[0006] A platform bracket provided by the present invention is used for supporting a marble platform, and specifically includes a frame, a rigid support assembly, a mobile support assembly and a balancing support assembly. The rigid support assembly is arranged on a first side of the frame, and the rigid support assembly is used to constrain the translational movement of the marble platform in the directions of the X-axis, the Y-axis and the Z-axis; the mobile support assembly is arranged on the first side of the frame, and the mobile support assembly is used to constrain the translational movement of the marble platform in the directions of the Y-axis and the Z-axis; the balancing support assembly is arranged on the second side of the frame, and the balancing support assembly is used to constrain the translational movement of the marble platform in the direction of the Z-axis.
[0007] Preferably, the rigid support assembly includes a first base connected to the frame.
[0008] Preferably, the movable support assembly includes a first linear guide slider mechanism, the first linear guide slider mechanism includes a first guide rail and a first slider, the first guide rail is connected to the frame along the X-axis direction, and the first slider is slidably connected to the first guide rail.
[0009] Preferably, the balancing support assembly includes a second linear guide slider mechanism, a crossbeam and a third linear guide slider mechanism, the second linear guide slider mechanism includes a second guide rail and a second slider, the second guide rail is connected to the frame along the Y-axis direction, and the second slider is slidably connected to the second guide rail; the crossbeam is arranged above the second slider; two third linear guide slider mechanisms are arranged on both sides of the crossbeam, the third linear guide slider mechanism includes a third guide rail and a third slider, the third guide rail is connected to the crossbeam along the X-axis direction, and the third slider is slidably connected to the third guide rail.
[0010] Preferably, the balancing support assembly also includes a connecting member and a rotating shaft, the connecting member is connected to the top of the second slider; a first connecting hole is opened on the connecting member, a second connecting hole is opened on the beam, and the rotating shaft passes through the first connecting hole and the second connecting hole so that the beam can rotate around the rotating shaft.
[0011] Preferably, the upper surfaces of the first base, the first slider and the two third sliders are located in the same plane; and the centers of the first base, the first slider and the two third sliders are respectively located at the four vertices of the rectangle.
[0012] Preferably, the platform bracket further includes a first rubber pad, a second rubber pad and a third rubber pad, the first rubber pad is connected to the top of the first base; the second rubber pad is connected to the top of the first slider; the third rubber pad is connected to the top of the third slider.
[0013] The present invention provides a high-precision marble platform, which specifically comprises a marble platform and a platform bracket provided in the embodiment of the first aspect, wherein the marble platform is arranged above the platform bracket.
[0014] Compared with the prior art, the present invention can achieve the following beneficial effects: a platform bracket, used for supporting a marble platform, specifically comprising a frame, a rigid support assembly, a mobile support assembly and a balanced support assembly, wherein the rigid support assembly is arranged on the first side of the frame, and the rigid support assembly is used to constrain the translational movement of the marble platform in the directions of the X-axis, the Y-axis and the Z-axis; the mobile support assembly is arranged on the first side of the frame, and the mobile support assembly is used to constrain the translational movement of the marble platform in the directions of the Y-axis and the Z-axis; the balanced support assembly is arranged on the second side of the frame, and the balanced support assembly is used to constrain the translational movement of the marble platform in the direction of the Z-axis. Thus, while providing high rigidity and precise positioning support, the present invention can also have a thermal deformation release function, so that when the temperature changes greatly, the marble platform can be deformed freely to avoid thermal stress, thereby effectively ensuring the tabletop accuracy of the marble platform.
[0015] Among them, by setting a first base to fix and support the marble platform, setting a first linear guide slider mechanism to release thermal deformation along the X-axis direction, setting a second linear guide slider mechanism to release thermal deformation along the Y-axis direction, and setting a third linear guide slider mechanism to release thermal deformation along the X-axis direction, it is possible to avoid the platform bracket from generating thermal stress on the marble platform and causing deformation.
[0016] Among them, by setting a crossbeam in the balancing support assembly, the balancing support assembly can be expanded from a single support point to two support points. By setting a rotating shaft, the crossbeam forms a lever mechanism, thereby stably supporting the marble platform and preventing the marble platform from being deformed too much under the action of gravity.
[0017] Among them, by arranging the first rubber pad, the second rubber pad and the third rubber pad to directly contact the marble platform and provide support, it can be approximately considered that the first rubber pad, the second rubber pad and the third rubber pad are fixedly connected to the marble platform, thereby forming a kinematic positioning support, so that when the temperature changes drastically, the marble platform can be deformed freely, effectively ensuring the table top accuracy of the marble platform. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] Figure 1 It is a schematic diagram of the structure of the Kelvin motion positioning support; Figure 2 is a structural schematic diagram of a platform bracket provided by an embodiment of the present invention; Figure 3 It is a structural schematic diagram of a high-precision marble platform provided by an embodiment of the present invention.
[0019] Reference numerals include: 1 frame, 2 rigid support assembly, 21 first base, 22 first rubber pad, 3 movable support assembly, 31 first guide rail, 32 first slider, 33 second rubber pad, 4 balance support assembly, 411 second guide rail, 412 second slider, 42 crossbeam, 431 third guide rail, 432 third slider, 44 connecting piece, 45 rotating shaft, 46 third rubber pad, 100 marble platform, 200 platform bracket. DETAILED DESCRIPTION
[0020] In order to make the purpose, technical scheme and advantages of the present invention clearer, the present invention is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and do not constitute a limitation of the present invention. Wherein similar elements in different embodiments use associated similar element numbers. In the following embodiments, many detailed descriptions are to enable the present invention to be better understood. However, those skilled in the art can easily recognize that some of the features can be omitted in different situations, or can be replaced by other elements, materials, methods. In some cases, some operations related to the present invention are not shown or described in the specification, this is to avoid the core part of the present invention being overwhelmed by too much description, and for those skilled in the art, it is not necessary to describe these related operations in detail, and they can fully understand the related operations according to the description in the specification and the general technical knowledge in the art.
[0021] It should be noted that, in the absence of conflict, the embodiments of the present invention and the features in the embodiments can be combined with each other to form various implementation methods. At the same time, the steps or actions in the method description can also be interchanged or adjusted in a manner that is obvious to those skilled in the art. Therefore, the various sequences in the specification and the drawings are only for the purpose of clearly describing a certain embodiment and are not meant to be a necessary sequence, unless otherwise specified that a certain sequence must be followed.
[0022] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", etc. are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of the present invention, unless otherwise specified, the meaning of "multiple" is two or more.
[0023] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood by specific circumstances.
[0024] The present invention will be described in detail below with reference to the accompanying drawings and in combination with embodiments. The first side and the second side refer to two opposite sides of the frame 1; the directions of the X-axis, the Y-axis and the Z-axis are as follows: Figure 2 As shown in the markings.
[0025] It can be understood that, ideally, the platform bracket should accurately limit the six degrees of freedom of the marble platform, namely, the translational freedom along the X-axis, Y-axis and Z-axis directions, and the rotational freedom centered on the X-axis, Y-axis and Z-axis, so that the marble platform is neither under-constrained nor over-constrained, thereby ensuring the surface accuracy of the marble platform.
[0026] like Figure 1 As shown, the Kelvin motion positioning support is a typical kinematic positioning support structure based on the precise constraint theory. It adopts the method of spherical and flat surface matching and is composed of ball-socket connection, ball-V-groove connection, and ball-plane connection. The Kelvin motion positioning support has good repeatability and micro-dynamic stability, but the contact area is point contact, and the structure is not closed, the rigidity is poor, the processing cost is high, and the processing accuracy requirements are high. Based on the Kelvin motion positioning support, the present invention provides a platform bracket and a high-precision marble platform.
[0027] like Figure 2 As shown, a platform bracket provided according to an embodiment of the first aspect of the present invention is used to support a marble platform, and specifically includes a frame 1, a rigid support assembly 2, a mobile support assembly 3 and a balanced support assembly 4. The rigid support assembly 2 is fixedly arranged on the first side of the frame 1. The function of the rigid support assembly 2 can refer to the ball-socket connection of the Kelvin motion positioning support, and is used to constrain the translational movement of the marble platform in the X-axis, Y-axis and Z-axis directions. The mobile support assembly 3 is fixedly arranged on the first side of the frame 1. The function of the mobile support assembly 3 can refer to the ball-V-groove connection of the Kelvin motion positioning support, and is used to constrain the translational movement of the marble platform in the Y-axis and Z-axis directions. The balanced support assembly 4 is fixedly arranged on the second side of the frame 1. The function of the balanced support assembly 4 can refer to the ball-plane connection of the Kelvin motion positioning support, and is used to constrain the translational movement of the marble platform in the Z-axis direction. As a result, it can have a thermal deformation release function while having high rigidity and precise positioning support, so that when the temperature changes greatly, the marble platform can be deformed freely to avoid thermal stress, thereby effectively ensuring the table surface accuracy of the marble platform, and then adapting to the needs of low-temperature adjustment of equipment such as space optical cameras.
[0028] Specifically, the present invention expands the three-point support of the Kelvin motion positioning support to a four-point support by setting a rigid support component 2, a mobile support component 3 and a balancing support component 4, while complying with the kinematic positioning support structure, thereby achieving stable and precise restriction of the six degrees of freedom of the marble platform.
[0029] In some embodiments, the frame 1 adopts a frame 1 structure with a cubic outer contour, and the rigid support component 2, the movable support component 3 and the balancing support component 4 are installed on both sides of the frame 1 and are respectively located at the three vertices of an equilateral triangle, so as to stably and accurately support the marble platform.
[0030] like Figure 2 As shown, the rigid support assembly 2 includes a first base 21, which is connected to the frame 1 and is used to fix and support the marble platform.
[0031] like Figure 2 As shown, the movable support assembly 3 includes a first linear guide slider mechanism, which includes a first guide rail 31 and a first slider 32. The first guide rail 31 is connected to the frame 1 along the X-axis direction, and the first slider 32 is slidably connected to the first guide rail 31, so that the first slider 32 can also move translationally along the X-axis direction when supporting the marble platform, thereby releasing the thermal deformation of the marble platform along the X-axis direction and avoiding thermal stress.
[0032] like Figure 2As shown, the balance support assembly 4 includes a second linear guide slider mechanism, a crossbeam 42 and a third linear guide slider mechanism. The second linear guide slider mechanism includes a second guide rail 411 and a second slider 412, the second guide rail 411 is connected to the frame 1 along the Y-axis direction, and the second slider 412 is slidably connected to the second guide rail 411, so that when supporting the marble platform, the balance support assembly 4 can also translate along the Y-axis direction as a whole, thereby releasing the thermal deformation of the marble platform along the Y-axis direction and avoiding thermal stress.
[0033] like Figure 2 As shown, the crossbeam 42 is arranged above the second slider 412, and two third linear guide slider mechanisms are arranged on both sides of the crossbeam 42. The third linear guide slider mechanism includes a third guide rail 431 and a third slider 432. The third guide rail 431 is connected to the crossbeam 42 along the X-axis direction, and the third slider 432 is slidably connected to the third guide rail 431, so that the third slider 432 can also move translationally along the X-axis direction when supporting the marble platform, thereby releasing the thermal deformation of the marble platform along the X-axis direction and avoiding thermal stress.
[0034] That is to say, the third slider 432 can not only translate along the X-axis direction on the third guide rail 431 , but also translate along the Y-axis direction along with the overall balancing support assembly 4 .
[0035] Among them, by setting a crossbeam 42 in the balancing support assembly 4 and setting the third linear guide slider mechanism on both sides of the crossbeam 42, the single ball-plane support point in the Kelvin motion positioning support structure can be expanded to two support points distributed on both sides of the crossbeam 42, so that the platform bracket can stably support the marble platform.
[0036] like Figure 2 As shown, the balance support assembly 4 also includes a connecting member 44 and a rotating shaft 45. The connecting member 44 is connected to the upper side of the second slider 412, a first connecting hole is formed on the connecting member 44, a second connecting hole is formed on the crossbeam 42, and the rotating shaft 45 is passed through the first connecting hole and the second connecting hole, so that the crossbeam 42 can rotate around the rotating shaft 45, that is, the crossbeam 42 can rotate around the Y-axis direction.
[0037] Specifically, by setting the rotating shaft 45 in the balancing support assembly 4, the beam 42 forms a lever mechanism above the second slider 412 to balance the deformation of the marble platform in the pitch direction and avoid excessive deformation of the marble platform under the action of gravity.
[0038] That is to say, by setting a crossbeam 42 in the balancing support assembly 4 and setting a third linear guide slider mechanism on both sides of the crossbeam 42, the three-point support of the Kelvin motion positioning support structure can be expanded to four-point support without over-constraining the marble platform, thereby avoiding the problem of excessive and uneven force on each support point in the three-point support structure and reducing the deformation of the marble platform under the action of gravity.
[0039] like Figure 2 As shown, the upper surfaces of the first base 21, the first slider 32 and the two third sliders 432 are located in the same plane, so that the marble platform above the platform bracket can be in a horizontal state. The centers of the first base 21, the first slider 32 and the two third sliders 432 are respectively located at the four vertices of the rectangle, so that the platform bracket can stably support the marble platform.
[0040] like Figure 2 As shown, the platform bracket also includes a first rubber pad 22, a second rubber pad 33 and a third rubber pad 46. The first rubber pad 22 is connected to the top of the first base 21, the second rubber pad 33 is connected to the top of the first slider 32, and the third rubber pad 46 is connected to the top of the third slider 432, for directly contacting the marble platform and providing support.
[0041] Among them, due to the large mass of the marble platform and the large friction coefficient between the rubber and the marble platform, under the action of gravity, it can be considered that the first rubber pad 22, the second rubber pad 33 and the third rubber pad 46 are fixedly connected to the marble platform. In other words, by setting the rigid support component 2, the mobile support component 3 and the balance support component 4, and rationally arranging the first linear guide slider mechanism, the second linear guide slider mechanism and the third linear guide slider mechanism, it is possible to form a kinematic positioning support for the marble platform, so that when the temperature changes greatly, the marble platform can be deformed freely to avoid thermal stress, thereby effectively ensuring the tabletop accuracy of the marble platform.
[0042] like Figure 3 As shown, a high-precision marble platform provided according to an embodiment of the second aspect of the present invention specifically includes a marble platform 100 and a platform bracket 200 provided in the embodiment of the first aspect, wherein the marble platform 100 is arranged above the platform bracket 200. Thus, while providing high rigidity and precise positioning support, the marble platform 100 has a thermal deformation release function, so that when the temperature changes greatly, the marble platform 100 can be deformed freely to avoid thermal stress, thereby effectively ensuring the table surface accuracy of the marble platform 100, and further meeting the needs of low-temperature assembly and adjustment of equipment such as space optical cameras.
[0043] Although the embodiments of the present invention have been shown and described above, it is understood that the above embodiments are exemplary and cannot be understood as limiting the present invention. Those skilled in the art may change, modify, replace and modify the above embodiments within the scope of the present invention.
[0044] The above specific implementations of the present invention do not constitute a limitation on the protection scope of the present invention. Any other corresponding changes and modifications made based on the technical concept of the present invention should be included in the protection scope of the claims of the present invention.
Claims
1. A platform bracket, used to support a marble platform, characterized in that: include: Framework (1); A rigid support assembly (2), the rigid support assembly (2) being arranged on a first side of the frame (1), the rigid support assembly (2) being used to constrain the translational movement of the marble platform in the directions of the X-axis, the Y-axis and the Z-axis; A movable support assembly (3), the movable support assembly (3) being arranged on a first side of the frame (1), and the movable support assembly (3) being used to constrain the translational movement of the marble platform in the Y-axis and Z-axis directions; A balancing support assembly (4), wherein the balancing support assembly (4) is arranged on the second side of the frame (1), and the balancing support assembly (4) is used to constrain the translational movement of the marble platform in the Z-axis direction.
2. The platform bracket according to claim 1, characterized in that: The rigid support assembly (2) comprises: A first base (21), wherein the first base (21) is connected to the frame (1).
3. The platform bracket according to claim 2, characterized in that: The mobile support assembly (3) comprises: A first linear guide rail and slider mechanism, the first linear guide rail and slider mechanism comprises a first guide rail (31) and a first slider (32), the first guide rail (31) is connected to the frame (1) along the X-axis direction, and the first slider (32) is slidably connected to the first guide rail (31).
4. The platform bracket according to claim 3, characterized in that: The balance support assembly (4) comprises: A second linear guide rail and slider mechanism, the second linear guide rail and slider mechanism comprising a second guide rail (411) and a second slider (412), the second guide rail (411) being connected to the frame (1) along the Y-axis direction, and the second slider (412) being slidably connected to the second guide rail (411); A crossbeam (42), wherein the crossbeam (42) is disposed above the second sliding block (412); A third linear guide slider mechanism, two of the third linear guide slider mechanisms are arranged on both sides of the crossbeam (42), the third linear guide slider mechanism comprises a third guide rail (431) and a third slider (432), the third guide rail (431) is connected to the crossbeam (42) along the X-axis direction, and the third slider (432) is slidably connected to the third guide rail (431).
5. The platform bracket according to claim 4, characterized in that: The balance support assembly (4) further comprises: A connecting member (44), the connecting member (44) being connected to an upper portion of the second sliding block (412); A rotating shaft (45), a first connecting hole is formed on the connecting member (44), a second connecting hole is formed on the crossbeam (42), and the rotating shaft (45) passes through the first connecting hole and the second connecting hole so that the crossbeam (42) can rotate around the rotating shaft (45).
6. The platform support according to claim 4, characterized in that: The upper surfaces of the first base (21), the first sliding block (32) and the two third sliding blocks (432) are located in the same plane; The centers of the first base (21), the first sliding block (32) and the two third sliding blocks (432) are respectively located at the four vertices of the rectangle.
7. The platform support according to claim 4, characterized in that: Also includes: A first rubber pad (22), the first rubber pad (22) being connected to the top of the first base (21); A second rubber pad (33), the second rubber pad (33) being connected to an upper portion of the first sliding block (32); A third rubber pad (46), the third rubber pad (46) is connected above the third sliding block (432).
8. A high-precision marble platform, characterized in that: include: Marble Platform (100); And according to the platform support (200) according to any one of claims 1 to 7, the marble platform (100) is arranged above the platform support (200).
Citation Information
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