Method and device for efficiently preparing plasma activated water

Abstract

The invention discloses a method and device for efficiently preparing plasma activated water, and relates to the technical field of preparation of plasma activated water, and the method comprises the following steps: introducing bubbles on the surface of liquid to increase the contact area of a gas-liquid interface; plasma discharge is generated at a gas-liquid interface by adopting a creeping discharge technology, and a plasma activated substance formed during discharge fully reacts with gas in the bubbles; the energy distribution in the activation process is optimized through the guidance of the external magnetic field on the plasma and the synergistic cooperation of the temperature, and the activation and purification of the liquid to be treated are realized by introducing bubbles on the surface of the liquid and combining with the creeping discharge technology. According to the property and the treatment requirement of the liquid, proper liquid to be treated is selected and injected into the liquid container. The distribution and density of the plasmas are controlled through the adjustable magnetic field, so that surface discharge is more uniform and stable, the energy loss is effectively reduced, and the activity of the plasmas is enhanced.

Description

Technical Field

[0001] The invention relates to the technical field of preparation of plasma activated water, in particular to a method and a device for efficiently preparing plasma activated water. Background Art

[0002] Plasma-activated water is a new type of active water with a high redox potential. It can effectively kill pathogens and degrade harmful substances. Therefore, it has broad application prospects in the fields of sterilization and disinfection, fruit and vegetable washing and preservation, and sewage treatment. Studies have shown that the active ingredients produced during plasma discharge, such as O2⁻, O3, O•, NO, NO2, ONOO⁻, etc., will interact with water molecules to generate HNO2·H2O2, H2O2, HNO2, HNO3 and other substances with strong oxidizing properties. These active substances can effectively oxidize and decompose organic pollutants and pathogens, thereby improving the efficiency of water treatment. However, the traditional plasma-activated water preparation technology has several limitations and needs to be improved.

[0003] Bubbling discharge is a technology that significantly increases the effective contact area of ​​the gas-liquid interface by allowing bubbles to rise in a liquid. When the plasma is discharged along the bubble channel, the plasma can directly act on the gas-liquid interface, avoiding the quenching phenomenon of short-lived active particles in traditional methods, and greatly improving the interaction efficiency between the plasma and the liquid phase. In addition, the surface discharge technology can also produce local high-efficiency plasma at the gas-liquid interface, enhancing the effect of the plasma. Through the combination of bubbling discharge and surface discharge technology, the area of ​​the gas-liquid interface is greatly increased, and at the same time, the plasma discharge is more concentrated in the upper part of the liquid phase, reducing energy waste. Therefore, there is an urgent need for a technical means that can fully utilize plasma active species and effectively reduce energy consumption. The applicant has designed a method and device for efficiently preparing plasma-activated water that combines bubbling discharge with surface discharge and produces a synergistic effect with temperature and magnetic field. Summary of the invention

[0004] The object of the present invention is to provide a method and device for efficiently preparing plasma activated water to solve the problems raised in the above background technology.

[0005] In order to solve the above technical problems, the present invention provides the following technical solution: a method for efficiently preparing plasma activated water, comprising the following steps: Introducing bubbles on the liquid surface to increase the contact area of ​​the gas-liquid interface; The surface discharge technology is used to generate plasma discharge at the gas-liquid interface. The plasma activated substances formed during the discharge fully react with the gas in the bubble. The guidance of the plasma by the external magnetic field and the temperature work together to optimize the energy distribution during the activation process.

[0006] According to the above technical solution, before introducing bubbles onto the liquid surface, the plasma source first ionizes the gas into plasma and introduces the gas into the solution to be treated in the form of bubbles for the first activation.

[0007] A device for efficiently preparing plasma activated water comprises a circulating water system, a magnetron plasma electrode plate, a bubbling generating device and a supporting device, wherein: The circulating water system is composed of a liquid container, a sealed water tank, a water inlet pipe, a water outlet pipe and a water pump. The two ends of the water outlet pipe are respectively connected to the liquid container and the sealed water tank. The water pump is connected to the liquid container through the water inlet pipe, and the water pump is connected to the sealed water tank through the water pipe. A magnetron plasma electrode plate is disposed above the liquid container and controls the distribution and density of the plasma through a magnetic field, so that the plasma discharge along the surface is more uniform; The bubbling generating device is arranged on the outer surfaces of both sides of the liquid container, and is used to form tiny bubbles in the liquid to produce a cavitation effect; The supporting device comprises a base, the base is provided with a slide rail, a slidable fixing frame is movably connected to the slide rail, and the liquid container is fixedly connected to the sliding fixing frame.

[0008] According to the above technical solution, the magnetron plasma electrode plate includes a discharge electrode assembly for generating an electric field and a magnetic field enhancement assembly for increasing the electric field strength generated by the discharge electrode assembly. The magnetron plasma electrode plate is fixedly connected above the liquid container via a metal threaded column.

[0009] According to the above technical solution, the discharge electrode assembly includes a high-voltage electrode, a dielectric layer and a grounding electrode, the grounding electrode is in contact with the liquid container, the dielectric layer is arranged on the upper surface of the grounding electrode, and the high-voltage electrode is arranged on the upper surface of the dielectric layer.

[0010] According to the above technical solution, the magnetic field enhancement component includes a silicone plate sleeve arranged above the high-voltage electrode, the silicone plate sleeve is provided with an annular mounting groove, and a current-controllable electromagnet is installed in the annular mounting groove.

[0011] According to the above technical solution, a cooling system is also included. The cold zone system is composed of a bellows, a heat dissipation fan and a semiconductor refrigeration sheet. The magnetron plasma electrode plate is arranged inside the bellows. The semiconductor refrigeration sheet is tightly attached to the surface of the high-voltage electrode, the dielectric layer and the silicone plate sleeve, and thermal conductive silicone grease is applied therebetween. The heat dissipation fan is installed on one side of the bellows.

[0012] According to the above technical solution, the bubbling generating device includes two ultrasonic oscillators, and the ultrasonic oscillators are fixed to the outer surfaces of both sides of the liquid container.

[0013] According to the above technical solution, a plasma source is also included, and the plasma source includes an ionization chamber, which is connected to the sealed water tank through an air guide tube, and a hydrophobic microporous plate is arranged between the air guide tube and the sealed water tank. An air inlet is penetrated through the side wall of the ionization chamber, and a dielectric barrier discharge electrode plate is fixedly connected to the upper surface of the ionization chamber.

[0014] Compared with the prior art, the beneficial effects achieved by the present invention are as follows: the device activates and purifies the liquid to be treated by introducing bubbles on the liquid surface and combining it with the surface discharge technology. According to the properties of the liquid and the treatment requirements, a suitable liquid to be treated is selected and injected into the liquid container. The distribution and density of the plasma are controlled by an adjustable magnetic field, making the surface discharge more uniform and stable, effectively reducing energy loss and enhancing the activity of the plasma. The device is equipped with a temperature control system and a circulating water system, which can accurately adjust the liquid temperature and maintain the continuous fluidity of the liquid. Further improve the treatment effect.

[0015] Compared with the prior art, the present invention has the following advantages: 1. The present invention adopts bubbling discharge combined with surface discharge technology. After the bubbles are introduced on the liquid surface, a wide gas-liquid interface is formed. The bubbles and liquid in the discharge area are in full contact, which greatly improves the discharge efficiency of the plasma. Through this method, the energy utilization efficiency is significantly improved, and an efficient activation effect can be achieved at a lower energy consumption.

[0016] 2. The magnetron plasma electrode plate controls the distribution and density of plasma through the magnetic field, making the discharge more uniform and avoiding local energy loss. At the same time, the enhanced effect of the magnetic field during the discharge process further expands the contact area between the plasma and the liquid, enhances the activation effect of the gas-liquid interface, and thus improves the production efficiency of plasma-activated water.

[0017] 3. The magnetic field enhancement component is used in the magnetron plasma electrode plate. The annular magnetic core is made of soft magnetic material iron silicon alloy, and the copper wire with high conductivity and high temperature resistance is used to make the magnetic field strength stable and adjustable, and the hysteresis loss is reduced, which helps to stably control the generation of plasma activated water under different conditions. The magnetic field control circuit further optimizes the magnetic field strength through an adjustable DC power supply to adapt to different processing requirements.

[0018] 4. The bubbling device uses an ultrasonic oscillator to generate tiny bubbles and enhances the discharge effect through the cavitation effect. This design makes the bubbles evenly distributed, greatly increases the gas-liquid interface, and the plasma can more efficiently activate the liquid on the bubble surface, thereby significantly improving the reaction efficiency of the gas-liquid interface.

[0019] 5. The flow rate regulating device of the circulating water system enables the water flow rate to be precisely controlled, and combined with the local deceleration zone or flow diffusion zone, it further optimizes the energy transfer efficiency and ensures the uniformity of activated water. The circulation system not only enhances the full contact between plasma and liquid, but also evenly distributes heat through water circulation to reduce local overheating or overcooling.

[0020] 6. The temperature control system effectively adjusts the temperature of the liquid so that the liquid works within the specified temperature range, and works in synergy with the bubbling device and the circulating water system to significantly improve the preparation efficiency of plasma-activated water and keep the entire device running stably within a wide range of ambient temperatures.

[0021] 7. The cooling system integrates cooling fans and semiconductor cooling sheets to cool the magnetron plasma electrode plates, keep the electrode plate temperature stable, and effectively maintain the stable generation of plasma. Excessive temperature will cause arc instability and plasma density fluctuations, thus affecting the treatment effect. The cooling system ensures the stability and consistency of plasma generation through temperature control, improving treatment efficiency and quality.

[0022] 8. The device adopts a modular design, including a support system, a magnetron plasma electrode plate, a bubbling device, a temperature control system, a cooling system and a circulating water system. Each module can be disassembled and assembled independently, which is convenient for maintenance and cleaning. In addition, the structural design between modules improves the adaptability of the equipment, and can flexibly adjust the processing conditions according to different needs, with a wide range of application scenarios. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The accompanying drawings are used to provide a further understanding of the present invention and constitute a part of the specification. Together with the embodiments of the present invention, they are used to explain the present invention and do not constitute a limitation of the present invention. In the accompanying drawings: Figure 1 It is a schematic diagram of the main structure of the present invention; Figure 2 It is a schematic diagram of the structure of the magnetically controlled electrode plate and cooling system of the device of the present invention; Figure 3 It is a schematic diagram of the structure of the plasma source of the present invention; Figure 4 It is a schematic diagram of the connection diagram of the device of the present invention; In the figure: 1-liquid container, 2-water inlet pipe, 3-water outlet pipe, 4-slide rail, 5-slidable fixing frame, 6-base, 7-ultrasonic oscillator, 8-metal threaded column, 9-sealed water tank, 10-water pipe, 11-water pump, 12-ground electrode, 13-semiconductor cooling plate, 14-high voltage electrode, 15-silica gel plate sleeve, 16-current controllable electromagnet, 17-bellows, 18-cooling fan, 19-dielectric barrier discharge electrode plate, 20-ionization chamber, 21-air inlet, 22-air guide tube, 23-hydrophobic microporous plate, 24-high voltage power supply, 25-semiconductor cooling plate power supply, 26-adjustable DC power supply, 27-high voltage probe, 28-oscilloscope, 29-safety resistor, 30-high voltage power supply, 31-ultrasonic oscillator power supply, 32-air supply system, 33-temperature control system. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0025] See also Figure 1-3 The present invention provides a technical solution: a method for efficiently preparing plasma activated water, comprising the following steps: Introducing bubbles on the liquid surface increases the contact area of ​​the gas-liquid interface and significantly improves the reaction efficiency of the gas-liquid interface; The surface discharge technology is used to generate plasma discharge at the gas-liquid interface. The plasma activated substances formed during the discharge fully react with the gas in the bubbles, thereby greatly improving the water body activation effect; The guidance of the plasma by the external magnetic field and the coordinated cooperation of the temperature optimize the energy distribution during the activation process, making the plasma discharge more stable and uniform, thereby greatly improving the energy utilization efficiency; Specifically, before introducing bubbles on the liquid surface, the plasma source first ionizes the gas into plasma and introduces it into the solution to be treated in the form of bubbles for the first activation. The liquid activated once is then activated for the second time through the above steps, which makes the activation more complete and the effect better. A device for efficiently preparing plasma activated water comprises a circulating water system, a magnetron plasma electrode plate, a bubbling generating device and a supporting device, wherein the circulating water system comprises a liquid container 1, a sealed water tank 9, a water inlet pipe 2, a water outlet pipe 3 and a water pump 11, wherein both ends of the water outlet pipe 3 are respectively connected to the liquid container 1 and the sealed water tank 9, the water pump 11 is connected to the liquid container 1 through the water inlet pipe 2, and the water pump 11 is connected to the sealed water tank 9 through a water pipe 10, and the circulating water system is provided with a flow rate regulating device, which controls the water flow rate and combines with a local deceleration zone to further optimize the energy transfer efficiency in the plasma discharge process and ensure the uniformity of the activated water; The circulating water system is used to place the plasma activated water obtained after the first activation inside the liquid container 1, and maintain a constant water flow in the liquid container 1. The system provides a constant water flow through the water pump 11 to ensure that the liquid in the liquid container 1 can flow and renew continuously. The water pipe of the circulating water system is connected to the reserved interface of the liquid container 1, and is fixed on both sides of the liquid container 1 by a snap-fit ​​method. Compared with threaded or welded connections, the snap-fit ​​method can evenly distribute the force and avoid stress concentration at the interface between the water pipe and the container, thereby reducing the risk of breakage or damage and extending the service life of the equipment. The circulating water system adopts a closed circulation design, and a closed loop is formed between the liquid container 1 and the external water source to avoid the entry of external pollutants and maintain the purity of the activated water. The water pipe material for the circulating water system to communicate with the liquid container 1 is selected from quartz glass, which can easily observe the state and flow of the liquid, which is conducive to monitoring and controlling the experimental conditions and timely discovering problems. In addition, quartz glass has high thermal stability and a low thermal expansion coefficient, and is suitable for high temperature or rapid temperature rise and fall application scenarios.

[0026] The water inlet pipe 2 and the water outlet pipe 3 are customized with flange connection interfaces, which are sealed with a sealing ring in the middle and connected to the water pump by bolts to fix the flange. The design of the flange interface enables the connection parts to be easily disassembled and reinstalled, which is convenient for maintenance, cleaning and replacement of equipment.

[0027] The magnetron plasma electrode plate is arranged above the liquid container 1, and controls the distribution and density of the plasma through the magnetic field, so that the plasma discharge along the surface is more uniform; the bubbling generating device is arranged on the outer surfaces of both sides of the liquid container 1, and is used to form tiny bubbles in the liquid to produce a cavitation effect; the supporting device includes a base 6, and the base 6 is provided with a slide rail 4, and a slidable fixed frame 5 is movably connected to the slide rail 4, and the liquid container 1 is fixedly connected to the slidable fixed frame 5. The liquid container 1 is installed on the slidable fixed frame 5, and the slide rail 4 provides a sliding path for adjusting the position of the liquid container 1 and responding to changes in the container size. The liquid container 1 is made of quartz glass or ceramic materials. These materials have excellent high temperature resistance and corrosion resistance, and can effectively resist the high temperature and high pressure environment generated during the plasma discharge process, ensuring the stability and safety of the experiment; in addition, the structure of the liquid container is designed as a cube, which is convenient for controlling the liquid flow and plasma distribution, thereby improving the accuracy and efficiency of the experiment; It also includes a temperature control system 33, which is used to adjust the temperature of the liquid to be treated, keep the liquid working within a specified temperature range and cooperate with the bubbling generating device and the circulating water system. The temperature control system 33 is integrated with the circulating water system. Through water circulation, heat is evenly distributed to the entire liquid system, reducing local overheating or overcooling and reducing energy consumption. The temperature control system 33 monitors the liquid temperature in real time through a temperature sensor, and adjusts the working state of the heating or cooling device according to the set temperature range to ensure that the liquid temperature is stable within the specified range, thereby further optimizing the preparation process of activated water.

[0028] Specifically, the magnetron plasma electrode plate is installed above the liquid container, and the distribution and density of the plasma are controlled by the magnetic field, so that the plasma discharge along the surface is more uniform, while reducing energy loss and increasing the contact area between the plasma and the liquid, thereby enhancing the activation effect of the gas-liquid interface. The magnetron plasma electrode plate includes a discharge electrode assembly for generating an electric field and a magnetic field enhancement assembly for increasing the electric field strength generated by the discharge electrode assembly. The magnetron plasma electrode plate is fixedly connected to the top of the liquid container 1 through a metal threaded column 8; Specifically, the discharge electrode assembly includes a high-voltage electrode 14, a dielectric layer and a grounding electrode 12. The grounding electrode 12 is in contact with the liquid container 1. The dielectric layer is arranged on the upper surface of the grounding electrode 12. The high-voltage electrode 14 is arranged on the upper surface of the dielectric layer. The high-voltage electrode 14 uses a high-concentration sodium chloride solution as the high-voltage electrode, and the solution is contained in an insulating quartz glass container; the high-voltage electrode 14 is immersed in a conductive liquid through an electrode wire to connect a high-voltage power supply, and the high-voltage electrode 14, the dielectric layer, and the grounding electrode 12 form a "sandwich" structure. This structure can effectively transmit high-voltage electric energy. The dielectric layer forms an insulating barrier between the electrodes, which can prevent current short circuit and ensure electric field concentration. The grounding electrode 12 adopts a concentric circle grid design; the electric surface presents a series of evenly spaced annular structures that expand from the center to the outside. The concentric circle grid can produce a relatively uniform electric field distribution on the electrode surface. The electric field strength gradually decreases from the center to the outside. This smooth transition reduces the phenomenon of excessive local electric field, reduces the risk of local breakdown or excessive discharge, and enhances the stability of discharge.

[0029] The grounding electrode adopts a concentric circle grid design; the surface of the electrode presents a series of evenly spaced ring structures extending outward from the center; Specifically, the magnetic field enhancement assembly includes a silicone plate sleeve 15 arranged above the high-voltage electrode 14, and an annular mounting groove is arranged on the silicone plate sleeve 15. A current-controllable electromagnet 16 is installed in the annular mounting groove. The direction of the magnetic field formed is parallel to the direction of the electric field generated by the discharge electrode assembly. The current-controllable electromagnet 16 controls the magnetic field strength by adjusting the input current. It is wound with high-conductivity, high-temperature-resistant copper wire. The iron core uses a soft magnetic material, iron-silicon alloy, as the core of the magnet. The smooth surface of the silicone plate sleeve 15 with an annular mounting groove is on the same side as the high-voltage electrode 14. The annular mounting groove is used to ensure that the silicone plate sleeve 15 is tightly fitted to the outside of the current-controllable electromagnet 16, provide effective sealing, and provide additional electrical insulation protection, reduce the risk of leakage, short circuit or electrical failure, and improve the operating safety of the equipment; Specifically, it also includes a cooling system, the cold zone system is composed of a bellows 17, a cooling fan 18 and a semiconductor cooling sheet 13, the magnetron plasma electrode plate is arranged inside the bellows 17, the semiconductor cooling sheet 13 is closely attached to the surface of the high-voltage electrode 14, the dielectric layer and the silicone plate sleeve 15, and thermal conductive silicone grease is applied therebetween, and the cooling fan 18 is installed on one side of the bellows 17; Specifically, the bubbling device includes two ultrasonic oscillators 7, which are fixed to the outer surfaces of both sides of the liquid container 1, and form tiny bubbles in the liquid through high-frequency vibration to produce a cavitation effect. When the bubbles pass through the liquid surface, an additional gas-liquid interface is provided to promote the generation of plasma on the bubble surface, further improving the activation effect. The bubbling device is located on the same side as the water flow opening of the circulation system, and the water inlet and outlet are located at the bottom and the top respectively, which helps to evenly distribute the bubbles and maintain a stable bubble generation effect.

[0030] The bubbling generating device is located on the side wall of the liquid container and is used to uniformly introduce bubbles into the liquid, thus avoiding the problem of excessive concentration of bubbles caused by bottom installation, and is conducive to increasing the contact area between gas and liquid; Specifically, it also includes a plasma source, which includes an ionization chamber 20, which is connected to the sealed water tank 9 through an air duct 22, and a hydrophobic microporous plate 23 is arranged between the air duct 22 and the sealed water tank 9. The side wall of the ionization chamber 20 is penetrated with an air inlet 21, and the upper surface of the ionization chamber 20 is fixedly connected with a dielectric barrier discharge electrode plate 19. The electrode plate 19 of the dielectric barrier discharge and the ionization chamber 20 are used to ionize the gas into plasma. The electrode plate 19 that generates the dielectric barrier discharge enables the gas molecules to obtain enough energy to be ionized, thereby generating plasma. And a grounding electrode with a hexagonal structure is designed to increase the discharge area and improve the gas ionization efficiency. The ionization chamber 20 uses high temperature and voltage resistant insulating materials to ensure that the high voltage electric field will not cause equipment breakdown or uneven discharge. At the same time, the ionization chamber 20 has a closed structure to avoid the escape of high-energy particles during the ionization process and ensure safe operation. The edge of the dielectric barrier discharge electrode plate 19 in contact with the ionization chamber 20 uses thermal conductive silicone, which can effectively prevent gas leakage. The electrode plate and the ionization chamber are tightly fixed together with bolts. The electrode plate 19 for generating dielectric barrier discharge includes a high voltage electrode, a dielectric layer and a grounding electrode. The grounding electrode is designed as a hexagonal structure to increase the discharge area and improve the gas ionization efficiency; In addition, the ionization chamber 20 is designed with three air inlets 21 and one air outlet. The air inlet 21 is connected to the air supply system 32 through an air pipe, and the air outlet is connected to the hydrophobic microporous plate 23 through an air guide pipe 22. Multiple air inlets allow the gas to be evenly distributed in the ionization chamber, avoiding the phenomenon of airflow concentration caused by a single air inlet. A semiconductor cooling sheet is attached to the outside of the ionization chamber 20, and thermal conductive silicone grease is applied between them. The electrode plates are kept working within a suitable temperature range to ensure stable generation and efficient operation of plasma.

[0031] The gas supply system 32 is directly connected to the plasma source, and the gas is stably delivered to the ionization chamber 20 at a predetermined flow rate and pressure. The gas is ionized into plasma under the action of the high-frequency electric field, and enters the solution to be treated in the form of bubbles through the gas guide tube 22 and the hydrophobic microporous plate 23 to complete the first activation. The hydrophobic microporous plate 23 is made of porous ceramics, which have high mechanical strength and high temperature resistance and are suitable for use in high temperature or high pressure environments. The gas supply system 32 includes an airflow control valve and a flowmeter, which is directly connected to the plasma source and can stably deliver the gas to the ionization chamber at a predetermined flow rate and pressure.

[0032] The plasma source generates plasma through the air outlet and the air guide pipe 22 to the hydrophobic microporous plate 23, and enters the sealed water tank 9 containing the solution to be treated in the form of bubbles, and the plasma activated water is obtained to complete the first activation. The air guide pipe 22 and the hydrophobic microporous plate 23 are equipped with a pair of flanges at the interface, and the flanges at both ends are fixed with bolts. A sealing gasket is added in the middle to ensure the sealing performance. The hydrophobic microporous plate 23 is inserted into the sealed water tank 9, and silica gel is applied at the edge to effectively prevent the leakage of liquid and gas.

[0033] like Figure 3 As shown, the high-voltage electrode 14 and the electrode plate 19 of the dielectric barrier discharge are connected to the high-voltage power supply 30, and a high-voltage probe 20 is arranged between the two. The metal threaded column 8 is connected to the connected safety resistor 29, and the safety resistor 29 is connected to the ground wire; the tip of the high-voltage probe 27 is connected to the measurement point of the high-voltage electrode 14 and the electrode plate 19 of the dielectric barrier discharge, and the BNC connector of the high-voltage probe 27 is inserted into the input channel of the oscilloscope 28, and the high-voltage probe 27 is grounded; the ground end of the oscilloscope 28 is connected to the two ends of the safety resistor 29 through the grounding alligator clip and the probe hook. The current controllable electromagnet 16 is connected to the adjustable DC power supply 26. The sealed water tank 9 is built in the temperature control system 33. The semiconductor cooling plate 13 is connected to the semiconductor cooling plate power supply 25. The cooling fan 18 is connected to the cooling fan power supply 24. The air inlet 21 is connected to the air supply system 32, and the ultrasonic oscillator is connected to the ultrasonic oscillator power supply 31.

[0034] When the present invention is used, according to the properties of the liquid to be treated and the treatment requirements, a suitable working liquid is selected, and then the plasma source, the gas supply system 32, the temperature control system 33, the circulating water system, the electromagnet, the bubbling generating device and the cooling system are turned on in sequence. During operation, the gas supply system 32 places the gas in the ionization chamber 20, and the plasma source ionizes the gas into plasma, which is introduced into the solution to be treated in the form of bubbles through the hydrophobic microporous plate 23 for the first activation. Subsequently, the circulating water system places the plasma activated water obtained after the first activation in the liquid container 1, and forms bubbles on the surface of the liquid through the high-frequency vibration of the bubbling generating device. The plasma generated by the magnetron plasma electrode plate is fully in contact with the gas-liquid interface formed by the bubbles to complete the second activation. At the same time, the circulating water system maintains the dynamic flow of the solution to be treated, ensuring that the liquid continuously passes through the plasma area, thereby improving the treatment efficiency. The temperature control system 33 continuously monitors and adjusts the temperature of the solution to ensure that the temperature is stable within the set range to avoid overheating or overcooling affecting the reaction effect. When the treatment process enters a stable state, the cooling system is started to maintain the normal operating temperature of the equipment to prevent the system from overheating due to long-term work. At the same time, the water pump 11 accurately controls the circulation speed of the liquid by adjusting the flow rate to ensure the stability and controllability of the treatment process. The entire system works in coordination so that the liquid to be treated is efficiently treated through the action of plasma during the circulation process, and finally achieves the expected treatment effect. After the second activation is completed, the high-voltage power supply 30, the current-controllable electromagnet 16, the bubbling device, the circulating water system and the temperature control system 33 are turned off in sequence. The active components generated during the plasma discharge process, such as O2⁻, O3, O•, NO, NO2, ONOO⁻, etc., will interact with water molecules to generate HNO2·H2O2, H2O2, HNO2, HNO3 and other substances with strong oxidizing properties. The oxides produced by these active substances and water molecules can also adjust the pH value of the water body, effectively oxidize and decompose organic pollutants and pathogens, thereby improving the efficiency of water quality treatment.

[0035] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0036] Finally, it should be noted that the above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or replace some of the technical features therein by equivalents. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A method for efficiently preparing plasma activated water, characterized in that: The following steps are included: Introducing bubbles on the liquid surface to increase the contact area of ​​the gas-liquid interface; The surface discharge technology is used to generate plasma discharge at the gas-liquid interface. The plasma activated substances formed during the discharge fully react with the gas in the bubble. The guidance of the plasma by the external magnetic field and the temperature work together to optimize the energy distribution during the activation process.

2. A method for efficiently preparing plasma activated water according to claim 1, characterized in that: Before introducing bubbles on the liquid surface, the plasma source ionizes the gas into plasma and introduces it into the solution to be treated in the form of bubbles for the first activation.

3. A device for efficiently preparing plasma activated water, characterized in that: It includes a circulating water system, a magnetron plasma electrode plate, a bubbling generating device and a supporting device, wherein: A circulating water system, comprising a liquid container (1), a sealed water tank (9), a water inlet pipe (2), a water outlet pipe (3) and a water pump (11), wherein both ends of the water outlet pipe (3) are respectively connected to the liquid container (1) and the sealed water tank (9), the water pump (11) is connected to the liquid container (1) via the water inlet pipe (2), and the water pump (11) is connected to the sealed water tank (9) via a water pipe (10); A magnetron plasma electrode plate is arranged above the liquid container (1) and controls the distribution and density of the plasma through a magnetic field, so that the plasma discharge along the surface is more uniform; Bubble generating devices are arranged on the outer surfaces of both sides of the liquid container (1) and are used to form tiny bubbles in the liquid to produce a cavitation effect; The support device comprises a base (6), the base (6) is provided with a slide rail (4), the slide rail (4) is movably connected to a slidable fixing frame (5), and the liquid container (1) is fixedly connected to the slidable fixing frame (5).

4. A device for efficiently preparing plasma activated water according to claim 3, characterized in that: The magnetron plasma electrode plate comprises a discharge electrode assembly for generating an electric field and a magnetic field enhancement assembly for increasing the intensity of the electric field generated by the discharge electrode assembly. The magnetron plasma electrode plate is fixedly connected to the top of the liquid container (1) via a metal threaded column (8).

5. A device for efficiently preparing plasma activated water according to claim 4, characterized in that: The discharge electrode assembly comprises a high-voltage electrode (14), a dielectric layer and a grounding electrode (12); the grounding electrode (12) is in contact with the liquid container (1); the dielectric layer is arranged on the upper surface of the grounding electrode (12); and the high-voltage electrode (14) is arranged on the upper surface of the dielectric layer.

6. A device for efficiently preparing plasma activated water according to claim 5, characterized in that: The magnetic field enhancement component comprises a silicone plate sleeve (15) arranged above the high-voltage electrode (14), the silicone plate sleeve (15) being provided with an annular mounting groove, and a current-controllable electromagnet (16) being installed in the annular mounting groove.

7. A device for efficiently preparing plasma activated water according to claim 6, characterized in that: The invention also comprises a cooling system, wherein the cold zone system comprises a bellows (17), a heat dissipation fan (18) and a semiconductor cooling sheet (13), wherein the magnetron plasma electrode plate is arranged inside the bellows (17), the semiconductor cooling sheet (13) is closely attached to the surface of the high-voltage electrode (14), the dielectric layer and the silicone plate sleeve (15), and thermal conductive silicone grease is applied therebetween, and the heat dissipation fan (18) is installed on one side of the bellows (17).

8. A device for efficiently preparing plasma activated water according to claim 3, characterized in that: The bubbling generating device comprises two ultrasonic oscillators (7), and the ultrasonic oscillators (7) are fixed to the outer surfaces of both sides of the liquid container (1).

9. A device for efficiently preparing plasma-activated water according to any one of claims 3 to 8, characterized in that: The invention also comprises a plasma source, the plasma source comprising an ionization chamber (20), the ionization chamber (20) being connected to the sealed water tank (9) via an air guide tube (22), a hydrophobic microporous plate (23) being arranged between the air guide tube (22) and the sealed water tank (9), an air inlet (21) being arranged through the side wall of the ionization chamber (20), and a dielectric barrier discharge electrode plate (19) being fixedly connected to the upper surface of the ionization chamber (20).

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