An advanced composite target for X-ray sources and its preparation method

Abstract

This invention relates to the technical field, specifically to an advanced composite target material for X-ray sources and its preparation method, comprising: S1, selecting a substrate and a substrate platen, cleaning the substrate and substrate platen, and then performing vacuum drying; S2, placing the vacuum-dried substrate on a special fixture, sputtering an inner thin film onto the inner surface of the substrate, and then forming an outer thin film onto the outer surface of the substrate using sputtering or chemical vapor deposition, to obtain a coated substrate; S3, vacuum brazing the coated substrate and the vacuum-dried substrate platen together, controlling the brazing temperature within the range of 450-550℃, to obtain the composite target material. This composite target material exhibits excellent performance, effectively balancing heat uniformity and heat dissipation efficiency, and conducting and diffusing the heat concentrated at the focal point in the X and Y directions; it solves the problems of poor heat uniformity and poor heat dissipation in existing target materials.

Description

Technical Field

[0001] This invention relates to the field of X-ray source manufacturing technology, and in particular to an advanced composite target material for X-ray sources and its preparation method. Background Technology

[0002] X-ray sources, also known as X-ray tubes, are an indispensable core component of X-ray detection equipment. Their primary function is to emit X-rays, and their performance directly affects the detection quality and efficiency of the equipment. X-ray sources mainly include two structural types: open-tube and closed-tube. In open-tube X-ray sources, electrons are directly struck on the target material, allowing the emitted X-rays to penetrate the sample directly. Open-tube X-ray sources also include vacuum pumps and vacuum valves, allowing for the replacement of the cathode and anode when the source is damaged and requires repair. The target material used in open-tube X-ray sources is one of the core components, significantly influencing the source's performance, primarily in terms of X-ray power density and X-ray transmittance. Therefore, the performance requirements for the target material in open-tube X-ray sources mainly focus on both withstanding higher power densities and maintaining high X-ray transmittance. Furthermore, as a structural component of the open-tube X-ray source, the target material also needs to possess sufficient strength. Existing targets for open-tube X-ray sources are typically manufactured by directly depositing a tungsten film onto a single substrate. The chosen substrate is generally a metallic or non-metallic material with relatively good X-ray transmittance and considerable strength and heat resistance, such as beryllium, aluminum, and diamond. While these targets are simple in structure, they suffer from drawbacks such as poor omnidirectional heat dissipation and inadequate heat transfer due to limitations in the physical properties of the substrate material itself. For example, although beryllium metal has good heat resistance and excellent X-ray transmittance, its thermal conductivity is generally poor, and beryllium metal... The materials themselves have a certain degree of toxicity; aluminum metal has good thermal conductivity, but its heat resistance is not ideal; diamond has excellent heat resistance and relatively good X-ray transmission, and its thermal conductivity is also excellent, but its excellent thermal conductivity is only reflected in the X-direction, while its thermal conductivity in the Y-direction is relatively poor. At the same time, the cost of diamond is also very high. This limits the power density that the target surface of these materials can withstand, making them prone to ablation; and when the focal point reaches below micrometers, these targets cannot meet the requirements for long-term and high-power use; thus limiting the application range of open-tube X-ray sources.

[0003] This invention provides an advanced composite target material for X-ray sources and its preparation method, in order to solve the problems of poor heat uniformity and poor heat dissipation of existing target materials in the prior art. Summary of the Invention

[0004] The purpose of this invention is to provide an advanced composite target material for X-ray sources and its preparation method, so as to solve the problems of poor heat uniformity and poor heat dissipation of existing target materials in the prior art.

[0005] The technical solution of this invention is: a method for preparing an advanced composite target for X-ray sources, comprising the following steps:

[0006] S1. Select a substrate and substrate plate according to a certain size and shape, clean the substrate and substrate plate, and then perform vacuum drying; the substrate and the substrate plate are both made of aluminum metal or aluminum alloy.

[0007] S2. Place the vacuum-dried substrate on a special tooling and sputter an inner thin film onto the inner surface of the substrate. Then, form an outer thin film onto the outer surface of the substrate using sputtering or chemical vapor deposition to obtain the coated substrate. The inner thin film is a pure tungsten film, and the outer thin film is a graphite film or a graphene film.

[0008] S3. Vacuum brazing is performed between the coated substrate and the vacuum-dried substrate platen, with the brazing temperature controlled within the range of 450-550℃, to obtain the composite target material.

[0009] Preferably, the aluminum alloy material is any one of aluminum-silicon alloy, zinc-aluminum alloy, zirconium-aluminum alloy, and titanium-aluminum alloy; the outer surface of the substrate plate is provided with a fin-like structure;

[0010] In step S2, the sputtering method is any one or more of radio frequency sputtering, magnetron sputtering, ion beam sputtering, and focused heavy ion sputtering;

[0011] The thickness of the substrate between the inner side of the substrate on which the inner film is sputtered and the outer side on which the outer film is formed is 0.5-1 mm.

[0012] Preferably, a transition layer is further provided between the inner film and the substrate; the thickness of the transition layer is 8-12 nm.

[0013] The transition layer is made of copper.

[0014] Preferably, the thickness of the inner film is 1-3µm.

[0015] Preferably, the outer thin film is a graphene film; the graphene film is a CVD graphene film prepared by chemical vapor deposition or a PVD graphene film prepared by magnetron sputtering.

[0016] The thickness of the PVD graphene film is 1-3µm; the thickness of the CVD graphene film is 100-500nm.

[0017] Preferably, the outer film is a graphite film; the thickness of the graphite film is 1-3µm.

[0018] Preferably, in step S1, the cleaning process includes the following steps:

[0019] a. The substrate and the substrate plate are pre-cleaned with alcohol;

[0020] b. Place the pre-cleaned substrate and the substrate plate into a three-dimensional ultrasonic cleaner, clean with an alkaline cleaning agent, control the cleaning temperature in the range of 50-70℃, clean for 30-50 minutes, rinse with clean water, and then use deionized water for ultrasonic cleaning, control the cleaning temperature in the range of 50-70℃, and control the cleaning time in the range of 20-30 minutes.

[0021] c. Clean again with an alkaline cleaning agent, with the cleaning temperature controlled within the range of 50-70℃. After cleaning for 20-30 minutes, rinse with clean water. Then, use acetone for three-dimensional ultrasonic cleaning, with the cleaning temperature controlled within the range of 50-70℃ and the cleaning time controlled within the range of 10-20 minutes.

[0022] Preferably, in step S1, the drying temperature of the vacuum drying process is 100-110℃, and the drying time is 60-70 minutes.

[0023] The present invention also provides an advanced composite target for X-ray sources, which is prepared by the above-described preparation method.

[0024] Compared with the prior art, the advantages of the present invention are:

[0025] (1) The present invention provides an advanced composite target material for X-ray sources and its preparation method. The advanced composite target material for X-ray sources is a multi-layer composite structure prepared by using aluminum metal or aluminum alloy as the substrate and substrate plate, and forming a thin film on both the inner and outer surfaces of the substrate. It has excellent performance and can effectively balance heat uniformity and heat dissipation efficiency. It can quickly and uniformly conduct and diffuse the heat concentrated at the focal point to the X and Y directions, and quickly dissipate the heat to the surrounding air through the fin structure on the substrate plate. It avoids the phenomenon of excessive local heat at the focal point and ablation caused by the continuous accumulation of heat due to untimely heat conduction and diffusion as the target power increases. It enables the target surface to withstand higher target power and expands the application scenarios of this type of open tube X-ray source. At the same time, since the material of the substrate and substrate plate and the price of raw materials are low, it can effectively reduce its production cost. The production process is simple to operate and the quality is controllable, which is conducive to mass production. It solves the problems of poor heat uniformity and poor heat dissipation of existing target materials in the prior art.

[0026] (2) The present invention provides an advanced composite target material for X-ray sources and its preparation method. The advanced composite target material for X-ray sources uses aluminum metal or aluminum alloy as the substrate, a substrate plate and a pure tungsten film as the inner film. Both aluminum and pure tungsten film have good vertical thermal conductivity and can conduct and diffuse heat at the focal point in the Y direction. At the same time, a graphite film or graphene film is used as the outer film. With the help of its good horizontal thermal conductivity, heat is conducted and diffused in the X direction. The heat is quickly dissipated into the surrounding air through the fin structure on the substrate plate. This makes the advanced composite target material for X-ray sources have high uniform heat dissipation efficiency and heat dissipation efficiency.

[0027] (3) The present invention provides an advanced composite target for X-ray sources and its preparation method, wherein a transition layer is provided between the inner side of the substrate and the inner film, which can improve the bonding strength between the inner film and the substrate, thereby improving the performance of the advanced composite target for X-ray sources. Attached Figure Description

[0028] The present invention will be further described below with reference to the accompanying drawings and embodiments:

[0029] Figure 1 This is a top view of the advanced composite target material for X-ray sources described in this invention;

[0030] Figure 2 This is a cross-sectional view of the advanced composite target material for X-ray sources described in this invention along the top view BB direction;

[0031] Figure 3 This is an enlarged view of part P in the cross-sectional view of the advanced composite X-ray source target material described in this invention along the BB direction of the top view;

[0032] The components are: 1. Substrate; 2. Inner film; 3. Outer film; 4. Substrate pressing plate. Detailed Implementation

[0033] The present invention will be further described in detail below with reference to specific embodiments.

[0034] Example 1

[0035] S1, such as Figure 1As shown, an aluminum substrate with grooves on its inner side is selected as substrate 1, and an aluminum pressure plate with a fin-like structure on its upper surface is selected as substrate pressure plate 4. The dimensions of the aluminum substrate and the aluminum pressure plate are matched. Furthermore, the thickness of the aluminum substrate between the bottom surface of the groove on the inner side of the aluminum substrate and the corresponding outer surface is 0.5 mm. Then, the aluminum substrate and aluminum pressure plate are pre-cleaned with alcohol. Next, both the aluminum substrate and aluminum pressure plate are placed in a three-dimensional ultrasonic cleaner for cleaning. During the cleaning process, an alkaline cleaning agent is first used, and the cleaning temperature is controlled at approximately 60℃. After cleaning for 50 minutes, clean water is used to further clean the substrate. Rinse; then, use deionized water for ultrasonic cleaning at a temperature of approximately 60℃ for 30 minutes; next, use an alkaline cleaning agent for cleaning at a temperature of approximately 50℃ for 30 minutes, followed by rinsing with clean water; finally, use acetone for three-dimensional ultrasonic cleaning at a temperature of approximately 50℃ for 20 minutes; after cleaning, transfer the aluminum substrate and aluminum plate to a drying oven for vacuum drying, ensuring the oven temperature remains between 100-110℃ and the drying time is controlled within 60-70 minutes.

[0036] S2. Place the vacuum-dried aluminum substrate on a special fixture, and use magnetron sputtering to deposit a 2µm thick pure tungsten film, i.e., inner film 2, on the bottom surface of the groove located on the inner side of the aluminum substrate. Then, use magnetron sputtering again to deposit a 1.5µm thick PVD graphene film, i.e., outer film 3, on the outer side of the aluminum substrate. Figure 2 , Figure 3 As shown, the aluminum substrate after coating is obtained.

[0037] S3. Vacuum brazing is performed between the coated aluminum substrate and the vacuum-dried aluminum pressure plate, with the brazing temperature controlled within the range of 450-550℃, to obtain an advanced composite target material for X-ray sources.

[0038] In this embodiment, both the substrate and the substrate platen are made of aluminum. In other embodiments, the substrate and the substrate platen can be made of different materials; for example, the substrate may be made of aluminum, and the substrate platen may be made of aluminum alloy, etc. To control variables, in this embodiment and the following embodiments, the substrate and the substrate platen use the same structural shape as in this embodiment, and the thickness of the substrate between the inner surface with the inner film and the outer surface with the outer film is 0.5 mm. In other embodiments, the thickness of the substrate between the inner surface with the inner film and the outer surface with the outer film should be in the range of 0.3-1.5 mm, and preferably in the range of 0.5-1 mm. Furthermore, the structure of the substrate and the substrate platen can also be designed into other shapes according to actual usage requirements. Additionally, in this embodiment or other embodiments, an insulating layer needs to be sputtered onto the outer surface of the substrate platen.

[0039] Example 2

[0040] S1. Select aluminum substrate and aluminum platen with the same structure and thickness as in Example 1 as the substrate and substrate platen, respectively. First, pre-clean the aluminum substrate and aluminum platen with alcohol. Then, place both the aluminum substrate and aluminum platen into a three-dimensional ultrasonic cleaner for cleaning. During the cleaning process, first use an alkaline cleaning agent, controlling the cleaning temperature at approximately 55°C. After cleaning for 50 minutes, rinse with clean water. Next, use deionized water for ultrasonic cleaning, controlling the cleaning temperature at approximately 55°C for 30 minutes. Then, use an alkaline cleaning agent again, controlling the cleaning temperature at approximately 60°C. After cleaning for 30 minutes, rinse with clean water. Finally, use acetone for three-dimensional ultrasonic cleaning, controlling the cleaning temperature at approximately 60°C for 20 minutes. After cleaning, transfer the aluminum substrate and aluminum platen to a drying oven for vacuum drying. During the drying process, ensure the drying oven temperature is within the range of 100-110°C. The drying time should be controlled within the range of 60-70 minutes.

[0041] S2. Place the vacuum-dried aluminum substrate on a special fixture and use magnetron sputtering to deposit a 2µm thick pure tungsten film on the bottom surface of the groove set on the inner side of the aluminum substrate. Then, use magnetron sputtering again to deposit a 2µm thick PVD graphene film on the outer side of the aluminum substrate to obtain the coated aluminum substrate.

[0042] S3. Vacuum brazing is performed between the coated aluminum substrate and the vacuum-dried aluminum pressure plate, with the brazing temperature controlled within the range of 450-550℃, to obtain an advanced composite target material for X-ray sources.

[0043] Example 3

[0044] S1. Select aluminum substrate and aluminum platen with the same structure and thickness as in Example 1 as the substrate and substrate platen, respectively. Then, pre-clean the aluminum substrate and aluminum platen with alcohol. Next, place both the aluminum substrate and aluminum platen into a three-dimensional ultrasonic cleaner for cleaning. During the cleaning process, first use an alkaline cleaning agent, controlling the cleaning temperature at approximately 70°C. After cleaning for 50 minutes, rinse with clean water. Then, use deionized water for ultrasonic cleaning, controlling the cleaning temperature at approximately 70°C for 30 minutes. Next, use an alkaline cleaning agent again, controlling the cleaning temperature at approximately 60°C. After cleaning for 30 minutes, rinse with clean water. Finally, use acetone for three-dimensional ultrasonic cleaning, controlling the cleaning temperature at approximately 60°C for 20 minutes. After cleaning, transfer the aluminum substrate and aluminum platen to a drying oven for vacuum drying. During the drying process, ensure the drying oven temperature is within the range of 100-110°C. The drying time should be controlled within the range of 60-70 minutes.

[0045] S2. Place the vacuum-dried aluminum substrate on a special fixture and use magnetron sputtering to deposit a 2.5µm thick pure tungsten film on the bottom surface of the groove set on the inner side of the aluminum substrate. Then, use chemical vapor deposition to deposit a 300nm thick CVD graphene film on the outer side of the aluminum substrate to obtain the coated aluminum substrate.

[0046] S3. Vacuum brazing is performed between the coated aluminum substrate and the vacuum-dried aluminum pressure plate, with the brazing temperature controlled within the range of 450-550℃, to obtain an advanced composite target material for X-ray sources.

[0047] Example 4

[0048] S1. Select aluminum substrate and aluminum platen with the same structure and thickness as in Example 1 as the substrate and substrate platen, respectively. First, pre-clean the aluminum substrate and aluminum platen with alcohol. Then, place both the aluminum substrate and aluminum platen into a three-dimensional ultrasonic cleaner for cleaning. During the cleaning process, first use an alkaline cleaning agent, controlling the cleaning temperature at approximately 60°C. After cleaning for 50 minutes, rinse with clean water. Next, use deionized water for ultrasonic cleaning, controlling the cleaning temperature at approximately 60°C for 30 minutes. Then, use an alkaline cleaning agent again, controlling the cleaning temperature at approximately 50°C. After cleaning for 30 minutes, rinse with clean water. Finally, use acetone for three-dimensional ultrasonic cleaning, controlling the cleaning temperature at approximately 50°C for 20 minutes. After cleaning, transfer the aluminum substrate and aluminum platen to a drying oven for vacuum drying. During the drying process, ensure the drying oven temperature is within the range of 100-110°C. The drying time should be controlled within the range of 60-70 minutes.

[0049] S2. Place the vacuum-dried aluminum substrate on a special fixture. First, use magnetron sputtering to deposit a 10nm thick pure copper film on the bottom surface of the groove on the inner side of the aluminum substrate as a transition layer. Then, use magnetron sputtering to deposit a 2.5µm thick pure tungsten film on the transition layer. After that, use chemical vapor deposition to deposit a 300nm thick CVD graphene film on the outer side of the aluminum substrate to obtain the coated aluminum substrate.

[0050] S3. Vacuum brazing is performed between the coated aluminum substrate and the vacuum-dried aluminum pressure plate, with the brazing temperature controlled within the range of 450-550℃, to obtain an advanced composite target material for X-ray sources. In this embodiment, a 10nm thick pure copper film is deposited between the substrate and the inner film as a transition layer to improve the bonding strength between the inner film and the substrate; in other embodiments, the thickness of the transition layer should be in the range of 8-12nm; the material of the transition layer can also be other metals or alloys.

[0051] Example 5

[0052] S1. Select a silicon-aluminum alloy substrate and a silicon-aluminum alloy pressure plate with the same structure as in Example 1, respectively, as the substrate and the substrate pressure plate. The size of the silicon-aluminum alloy substrate matches the size of the silicon-aluminum alloy pressure plate. Furthermore, the thickness of the silicon-aluminum alloy substrate between the bottom surface of the groove on the inner side of the silicon-aluminum alloy substrate and its corresponding outer surface is 0.5 mm. Then, pre-clean the silicon-aluminum alloy substrate and the silicon-aluminum alloy pressure plate with alcohol. Next, place both the silicon-aluminum alloy substrate and the silicon-aluminum alloy pressure plate into a three-dimensional ultrasonic cleaner for cleaning. During the cleaning process, first use an alkaline cleaning agent, and control the cleaning temperature at approximately 60°C. After cleaning for 50 minutes, then... The substrate is rinsed with clean water; then, it is ultrasonically cleaned with deionized water at a temperature of approximately 60°C for 30 minutes; next, it is cleaned again with an alkaline cleaning agent at a temperature of approximately 50°C for 30 minutes, followed by rinsing with clean water; finally, it is ultrasonically cleaned with acetone at a temperature of approximately 50°C for 20 minutes; after cleaning, the silicon-aluminum alloy substrate and silicon-aluminum alloy plate are transferred to a drying oven for vacuum drying, ensuring the oven temperature remains between 100-110°C and the drying time is controlled within 60-70 minutes.

[0053] S2. Place the vacuum-dried silicon-aluminum alloy substrate on a special tooling and use magnetron sputtering to deposit a 2µm thick pure tungsten film on the bottom surface of the groove set on the inner side of the silicon-aluminum alloy substrate. Then, use magnetron sputtering again to deposit a 2µm thick PVD graphene film on the outer side of the silicon-aluminum alloy substrate to obtain the coated aluminum substrate.

[0054] S3. Vacuum brazing is performed between the coated silicon-aluminum alloy substrate and the vacuum-dried silicon-aluminum alloy pressure plate. The brazing temperature is controlled within the range of 450-550℃ to obtain an advanced composite target material for X-ray sources.

[0055] Example 6

[0056] S1. Select aluminum substrate and aluminum pressure plate with the same structure as in Example 1 as the substrate and substrate pressure plate, respectively. The size of the aluminum substrate matches the size of the aluminum pressure plate. Furthermore, the thickness of the aluminum substrate between the bottom surface of the groove on the inner side of the aluminum substrate and its corresponding outer surface is 0.5 mm. Then, pre-clean the aluminum substrate and aluminum pressure plate with alcohol. Next, place both the aluminum substrate and aluminum pressure plate into a three-dimensional ultrasonic cleaner for cleaning. During the cleaning process, first use an alkaline cleaning agent, and control the cleaning temperature at approximately 65°C. After cleaning for 50 minutes, rinse with clean water. Next, ultrasonic cleaning is performed using deionized water at a temperature of approximately 65°C for 30 minutes. Afterward, an alkaline cleaning agent is used for cleaning at a temperature of approximately 60°C for 30 minutes, followed by rinsing with clean water. Finally, acetone is used for three-dimensional ultrasonic cleaning at a temperature of approximately 60°C for 20 minutes. After cleaning, the aluminum substrate and aluminum plate are transferred to a drying oven for vacuum drying. During drying, the oven temperature must be maintained between 100-110°C, and the drying time must be controlled within 60-70 minutes.

[0057] S2. Place the vacuum-dried aluminum substrate on a special fixture. First, use magnetron sputtering to deposit a 10nm thick pure copper film on the bottom surface of the groove on the inner side of the aluminum substrate as a transition layer. Then, use magnetron sputtering to deposit a 2µm thick pure tungsten film on the transition layer. After that, use magnetron sputtering to deposit a 2µm thick PVD graphene film on the outer side of the aluminum substrate to obtain the coated aluminum substrate.

[0058] S3. Vacuum brazing is performed between the coated aluminum substrate and the vacuum-dried aluminum pressure plate, with the brazing temperature controlled within the range of 450-550℃, to obtain an advanced composite target material for X-ray sources.

[0059] Example 7

[0060] S1. Select aluminum substrate and aluminum pressure plate with the same structure as in Example 1 as the substrate and substrate pressure plate, respectively. The size of the aluminum substrate matches the size of the aluminum pressure plate. Furthermore, the thickness of the aluminum substrate between the bottom surface of the groove on the inner side of the aluminum substrate and its corresponding outer surface is 0.5 mm. Then, pre-clean the aluminum substrate and aluminum pressure plate with alcohol. Next, place both the aluminum substrate and aluminum pressure plate into a three-dimensional ultrasonic cleaner for cleaning. During the cleaning process, first use an alkaline cleaning agent, and control the cleaning temperature at approximately 65°C. After cleaning for 50 minutes, rinse with clean water. Next, ultrasonic cleaning is performed using deionized water at a temperature of approximately 65°C for 30 minutes. Afterward, an alkaline cleaning agent is used for cleaning at a temperature of approximately 60°C for 30 minutes, followed by rinsing with clean water. Finally, acetone is used for three-dimensional ultrasonic cleaning at a temperature of approximately 60°C for 20 minutes. After cleaning, the aluminum substrate and aluminum plate are transferred to a drying oven for vacuum drying. During drying, the oven temperature must be maintained between 100-110°C, and the drying time must be controlled within 60-70 minutes.

[0061] S2. Place the vacuum-dried aluminum substrate on a special fixture. First, use magnetron sputtering to deposit a 1µm thick diamond layer on the bottom surface of the groove set on the inner side of the aluminum substrate. Then, use magnetron sputtering to deposit a 2µm thick pure tungsten film on the diamond. After that, use magnetron sputtering to deposit a 2µm thick PVD graphene film on the outer side of the aluminum substrate to obtain the coated aluminum substrate.

[0062] S3. Vacuum brazing is performed between the coated aluminum substrate and the vacuum-dried aluminum pressure plate, with the brazing temperature controlled within the range of 450-550℃, to obtain an advanced composite target material for X-ray sources.

[0063] Comparative Example 1

[0064] Pure tungsten was selected as the X-ray source target.

[0065] Comparative Example 2

[0066] Pure diamond target material was selected as the X-ray source target material.

[0067] To evaluate the performance of the advanced composite X-ray source targets prepared in Examples 1-7 and the X-ray source targets in Comparative Examples 1-2, the advanced composite X-ray source targets and the X-ray source targets were placed on a testing instrument for testing. Testing began with a power of 8W, and the power was increased by 2W for each subsequent test. By continuously increasing the power, the maximum target power that the target could withstand was determined. Simultaneously, to reduce testing errors, five advanced composite X-ray source target samples were prepared under the same conditions to evaluate their performance. After each power increase test, the samples were observed. If there was obvious film peeling or burning, the film was considered to have failed. The maximum withstandable target power was equated to the target performance. That is, the higher the average maximum withstandable power value of all advanced composite X-ray source target samples prepared in each example, the better the performance of the advanced composite X-ray source target. The test data are shown in Table 1.

[0068] Table 1. Average maximum withstand power of X-ray source targets in different embodiments and comparative examples

[0069]

[0070] As shown in Table 1, the average maximum target power tolerated by the X-ray source composite targets prepared in Examples 1-7 is greater than 15W. Furthermore, comparing Examples 1-7 with Comparative Example 1, the average maximum target power tolerated by the X-ray source composite targets prepared in Examples 1-7 is significantly higher than that of the pure tungsten target in Comparative Example 1, indicating that the performance of the X-ray source composite targets prepared in Examples 1-7 is significantly better than that of the pure tungsten target in Comparative Example 1. Comparing Examples 1-7 with Comparative Example 2, the average maximum target power tolerated by the X-ray source composite targets prepared in Examples 1-7 is significantly higher than that of the pure tungsten target in Comparative Example 1. The average maximum withstand power of the target material can reach a level comparable to or higher than that of the pure diamond target material in Comparative Example 2, indicating that the performance of the X-ray source composite target material prepared in Examples 1-7 is comparable to or slightly better than that of the pure diamond target material. However, diamond is expensive, while the substrate and other raw materials used in the preparation of the X-ray source composite target material in Examples 1-7 are cheaper than diamond, which can effectively save production costs. In addition, the preparation process is simple, the product quality is controllable, and it is easy to mass-produce.

[0071] Compared with Example 2, the average maximum withstand power of the X-ray source composite target prepared in Example 2 is significantly higher than that of the X-ray source composite target prepared in Example 1. This indicates that increasing the thickness of the outer film can effectively improve the heat uniformity and heat dissipation efficiency of the X-ray source composite target. Specifically, it can quickly and uniformly conduct and diffuse the heat concentrated at the focal point in the X-ray direction, and rapidly dissipate the heat into the surrounding air through the fin structure on the substrate plate, avoiding the phenomenon of continuous heat accumulation and ablation caused by untimely heat conduction and diffusion as the target power increases. Comparing Example 3 with Example 4 and Example 6 with Example 2, it can be seen that setting a transition layer between the inner film and the substrate can improve the bonding performance between the inner film and the substrate, thereby improving the performance of the X-ray source composite target. Comparing Example 7 with Examples 1-6, it can be seen that due to the good thermal conductivity and permeability of diamond, the X-ray source composite target prepared in Example 7 can also achieve good performance. However, the high price of diamond will significantly increase production costs. In summary, by using aluminum metal or aluminum alloy as the substrate, and depositing an outer thin film by magnetron sputtering or chemical vapor deposition on the outer surface of the substrate, and depositing an inner thin film by magnetron sputtering on the inner surface of the substrate, an X-ray source composite target material can be prepared. This material has excellent performance, low production cost, and controllable quality.

[0072] The above embodiments are merely illustrative of the technical concept and features of the present invention, intended to enable those skilled in the art to understand the content of the present invention and implement it accordingly, and should not be construed as limiting the scope of protection of the present invention. It will be apparent to those skilled in the art that the present invention is not limited to the details of the above exemplary embodiments, and that the present invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the present invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects. The scope of the present invention is defined by the appended claims rather than the foregoing description, and thus all changes falling within the meaning and scope of the equivalents of the claims are intended to be included within the present invention.

Claims

1. A method of producing an advanced composite target for an X-ray source, characterized by, The method comprises the following steps: S1, selecting a base material with a groove on the inner side and a base material pressing plate with a fin-shaped structure on the outer side, and cleaning the base material and the base material pressing plate, and then performing vacuum drying treatment; the base material and the base material pressing plate are both made of aluminum metal material or aluminum alloy material; S2, placing the vacuum-dried base material on a special tool, sputtering a layer of inner film on the inner side of the base material in a sputtering manner, and then forming a layer of outer film on the outer side of the base material in a sputtering manner or a chemical vapor deposition process to obtain a coated base material; the inner film is a pure tungsten film; the outer film is a graphite film or a graphene film; a transition layer is further arranged between the inner film and the base material; the thickness of the transition layer is 8-12 nm; the material of the transition layer is copper metal; S3, vacuum brazing the coated base material and the vacuum-dried base material pressing plate, with the brazing temperature controlled within the range of 450-550 DEG C, to obtain a composite target material.

2. The method of claim 1, wherein the method further comprises: The aluminum alloy material is any one of aluminum-silicon alloy, zinc-aluminum alloy, zirconium-aluminum alloy, and titanium-aluminum alloy; ​ In step S2, the sputtering method is any one or more of radio frequency sputtering, magnetron sputtering, ion beam sputtering, and focused heavy ion sputtering; The thickness of the base material between the inner side with the inner film sputtered thereon and the outer side with the outer film formed thereon is 0.5-1 mm.

3. The method of claim 1, wherein the method further comprises: The thickness of the inner film is 1-3 µm. ​ 4. The method of claim 1, wherein the method further comprises: The outer film is a graphene film; the graphene film is a CVD graphene film prepared by a chemical vapor deposition process or a PVD graphene film prepared by a magnetron sputtering process; The thickness of the PVD graphene film is 1-3 µm; the thickness of the CVD graphene film is 100-500 nm.

5. The method of claim 1, wherein the method further comprises: The outer film is a graphite film; the thickness of the graphite film is 1-3 µm. ​ 6. The method of claim 1, wherein the method further comprises: In step S1, the cleaning process comprises the following steps: a, pre-washing the base material and the base material pressing plate with alcohol; b, placing the pre-washed base material and base material pressing plate into a three-dimensional ultrasonic cleaner, cleaning with an alkaline cleaning agent, with the cleaning temperature controlled within the range of 50-70 DEG C, cleaning for 30-50 min, then rinsing with clean water, and then ultrasonic cleaning with deionized water, with the cleaning temperature controlled within the range of 50-70 DEG C and the cleaning time controlled within the range of 20-30 min; c, cleaning again with an alkaline cleaning agent, with the cleaning temperature controlled within the range of 50-70 DEG C, cleaning for 20-30 min, then rinsing with clean water, and then three-dimensional ultrasonic cleaning with acetone, with the cleaning temperature controlled within the range of 50-70 DEG C and the cleaning time controlled within the range of 10-20 min.

7. The method of claim 1, wherein the method further comprises: In step S1, the drying temperature of the vacuum drying treatment is 100-110 DEG C, and the drying time is 60-70 min. ​ 8. An advanced composite target for an X-ray source, characterized in that Prepared by the preparation method of any one of claims 1-7.

Images