Chip layout image processing method and device, electronic equipment and storage medium

Abstract

The embodiment of the invention provides a chip layout image processing method and device, electronic equipment and a storage medium, and the method comprises the steps: determining a basic structure type corresponding to a target graph according to the line segment position information in an obtained chip layout image; and determining a refined structure type corresponding to the target graph according to the line segment position information and the line segment angle information. And performing rule inspection on the target graph based on standard structure parameters preset for the refined structure type. The defect that only a graph parallel to the transverse axis direction or the longitudinal axis direction of a two-dimensional rectangular plane coordinate system or a graph with a specific bevel edge angle can be recognized at the present stage is effectively overcome and solved, and then the inspection precision and the inspection efficiency of design rule inspection or mask rule inspection are remarkably improved. The practicability and reliability of the rule checking process and the subsequent image adjusting process for the target graph are improved to a certain extent, so that the performance and the yield of the finally produced chip are powerfully guaranteed.

Description

Technical Field

[0001] This application belongs to the technical field of semiconductor integrated circuits, and particularly relates to a method, device, electronic device, and storage medium for chip layout image processing. Background Art

[0002] In the technical field of semiconductor integrated circuits, Design Rule Check (DRC) and Mask Rule Check (MRC) are important processing steps in the chip physical circuit verification process.

[0003] Currently, whether it is the design rule check process for chip layouts or the mask rule check process for chip mask images, most can only perform specific recognition and rule checks on graphics parallel to the horizontal or vertical axis directions of the two-dimensional plane rectangular coordinate system, with strong limitations and unable to accurately identify the graphic structures of chip graphics in the image. Such problems will lead to a reduction in the accuracy of design rule checks or mask rule checks, and further affect the production efficiency and practicality of chips. Summary of the Invention

[0004] Embodiments of this application provide a method, device, electronic device, and storage medium for chip layout image processing to effectively improve the accuracy of rule checks.

[0005] In a first aspect, embodiments of this application provide a method for chip layout image processing, including:

[0006] Obtain a chip layout image, where the chip layout image contains at least one target graphic to be recognized;

[0007] Determine the basic structure type corresponding to the target graphic according to the line segment position information in the chip layout image;

[0008] Determine the refined structure type corresponding to the target graphic on the basis of the basic structure type according to the line segment position information and the line segment angle information in the chip layout image;

[0009] Perform rule checks on the target graphics in the chip layout image based on the standard structure parameters preset for the refined structure type.

[0010] In a second aspect, embodiments of this application provide a chip layout image processing device, including:

[0011] An acquisition unit, configured to obtain a chip layout image, where the chip layout image contains at least one target graphic to be recognized;

[0012] A basic structure determination unit, configured to determine the basic structure type corresponding to the target graphic according to the line segment position information in the chip layout image;

[0013] A refinement structure determination unit, configured to determine the refinement structure type corresponding to the target pattern on the basis of the basic structure type according to the line segment position information and the line segment angle information in the chip layout image;

[0014] An image inspection unit, configured to perform a rule inspection on the target pattern in the chip layout image based on the standard structure parameters preset for the refinement structure type.

[0015] In a third aspect, an embodiment of the present application provides an electronic device, which includes a processor, a memory, and a program or instruction stored on the memory and executable on the processor. When the program or instruction is executed by the processor, the steps of the chip layout image processing method according to any one of the embodiments of the present application are implemented.

[0016] In a fourth aspect, an embodiment of the present application provides a readable storage medium, on which a program or instruction is stored. When the program or instruction is executed by a processor, the steps of the chip layout image processing method according to any one of the embodiments of the present application are implemented.

[0017] In a fifth aspect, an embodiment of the present application provides a computer program product. When the instructions in the computer program product are executed by a processor of an electronic device, the electronic device can execute the steps of the chip layout image processing method according to any one of the embodiments of the present application.

[0018] The technical solutions provided by the embodiments of the present application at least bring the following beneficial effects:

[0019] The technical solutions provided by the embodiments of the present application can, when performing a design rule inspection or a mask rule inspection, determine the basic structure type and the refinement structure type corresponding to the target pattern based on the line segment position information in the chip layout image. In this process, the arbitrary line segment angle and the existence and influence of the hypotenuse in the graphic structure are fully considered and combined. Based on the refinement structure type and the corresponding standard structure parameters, the rule inspection of the target pattern in the chip layout image can be accurately performed, so that the recognition accuracy of the target pattern with a hypotenuse in the structure is significantly improved, and to a certain extent, the practicability and reliability of the rule inspection process and the subsequent image adjustment process are also improved, ensuring the performance and yield of the finally produced chip.

[0020] It should be understood that the above general description and the following detailed description are only exemplary and explanatory, and cannot limit the present application. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] To more clearly illustrate the technical solutions of the embodiments of the present application, the following will briefly introduce the drawings required to be used in the embodiments of the present application. For those of ordinary skill in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0022] Figure 1 Schematic flowchart of a method for processing chip layout images provided by an embodiment of the present application;

[0023] Figure 2(a) is one of the schematic diagrams of the basic structure type corresponding to a target graphic provided by an embodiment of the present application;

[0024] Figure 2(b) is another schematic diagram of the basic structure type corresponding to a target graphic provided by an embodiment of the present application;

[0025] Figure 2(c) is the third schematic diagram of the basic structure type corresponding to a target graphic provided by an embodiment of the present application;

[0026] Figure 3 Schematic diagram of a target graphic with a concave-convex part in the shape of a quadrilateral provided by an embodiment of the present application;

[0027] Figure 4(a) is one of the schematic diagrams of a target graphic with a concave-convex part in the shape of a triangle provided by an embodiment of the present application;

[0028] Figure 4(b) is another schematic diagram of a target graphic with a concave-convex part in the shape of a triangle provided by an embodiment of the present application;

[0029] Figure 5 Schematic diagram of a target graphic with a refined structure type of a rectangular structure provided by an embodiment of the present application;

[0030] Figure 6 Schematic diagram of a target graphic with a refined structure type of a non-rectangular quadrilateral structure provided by an embodiment of the present application;

[0031] Figure 7 Schematic diagram of a target graphic with a refined structure type of a triangular structure provided by an embodiment of the present application;

[0032] Figure 8(a) is one of the schematic diagrams of the refined structure type corresponding to a target graphic with a stepped structure provided by an embodiment of the present application;

[0033] Figure 8(b) is another schematic diagram of the refined structure type corresponding to a target graphic with a stepped structure provided by an embodiment of the present application;

[0034] Figure 9Schematic diagram showing the manifestation form of standard structure parameters in a target figure with a refined structure type of triangular structure provided by an embodiment of the present application;

[0035] Figure 10(a) is one of the schematic diagrams showing the rule check results corresponding to a target figure provided by an embodiment of the present application;

[0036] Figure 10(b) is another schematic diagram showing the rule check results corresponding to a target figure provided by an embodiment of the present application;

[0037] Figure 10(c) is yet another schematic diagram showing the rule check results corresponding to a target figure provided by an embodiment of the present application;

[0038] Figure 10(d) is still another schematic diagram showing the rule check results corresponding to a target figure provided by an embodiment of the present application;

[0039] Figure 10(e) is also a schematic diagram showing the rule check results corresponding to a target figure provided by an embodiment of the present application;

[0040] Figure 11 Schematic flowchart showing a process for determining chip inspection rules provided by an embodiment of the present application;

[0041] Figure 12 Schematic diagram showing the structure of a chip layout image processing device provided by another embodiment of the present application;

[0042] Figure 13 Schematic diagram showing the structure of a chip layout image processing device provided by still another embodiment of the present application. Detailed implementation manners

[0043] The features and exemplary embodiments of various aspects of the present application will be described in detail below. To make the objectives, technical solutions and advantages of the present application clearer and more understandable, the present application will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain the present application, rather than to limit the present application. For those skilled in the art, the present application can be implemented without some of these specific details. The following description of the embodiments is only intended to provide a better understanding of the present application by showing examples of the present application.

[0044] It should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprising", "including" or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device comprising a series of elements not only includes those elements, but also includes other elements not expressly listed, or also includes elements inherent in such process, method, article or device. Without further limitation, an element defined by the statement "comprising..." does not exclude the presence of additional identical elements in the process, method, article or device comprising the element.

[0045] In the field of chip R & D and manufacturing, Design Rule Check (DRC) and Mask Rule Check (MRC) are respectively used to ensure that the patterns on the chip layout and mask conform to the manufacturing standards.

[0046] However, there are limitations in the current rule checking. Most of them can only identify and perform rule checking on graphic structures parallel to the horizontal or vertical axis directions of the two-dimensional plane rectangular coordinate system. Even if it is possible to identify graphic structures containing hypotenuses, specific angles need to be preset. A hypotenuse can be simply understood as a line segment that is not parallel to the horizontal or vertical axis directions of the two-dimensional plane rectangular coordinate system of the image. The occurrence of such problems greatly limits the application scope and checking accuracy of rule checking, and is very likely to cause potential problems in the chip layout image to not be discovered in time. It not only affects the accuracy of the rule checking process, but may also reduce the chip production efficiency and yield, and have a negative impact on the performance and reliability of the finally produced chips.

[0047] Based on the technical problems mentioned in the above content, embodiments of the present application provide a method, device, electronic device and storage medium for processing chip layout images. Specifically, according to the line segment position information in the obtained chip layout image, the basic structure type corresponding to the target graphic can be determined, and further, based on the line segment position information and the line segment angle information, the refined structure type corresponding to the target graphic can be determined on the basis of the basic structure type, fully considering the existence and influence of oblique line segments at any angle in the graphic structure.

[0048] Then, according to the preset standard structure parameters, rule checking can be performed on the target graphics in the chip layout image, effectively overcoming and solving the defect that only graphics parallel to the horizontal or vertical axis direction of the two-dimensional plane rectangular coordinate system or graphics with a specific hypotenuse angle can be recognized at the present stage. Furthermore, the checking accuracy and efficiency of the design rule checking or mask rule checking process can be significantly improved. To a certain extent, the practicability and reliability of the subsequent image adjustment process can also be improved, ensuring the performance and yield of the produced chips.

[0049] Among them, regarding the execution entity adopted in the embodiments of the present application, specifically, it can be a terminal device for performing the design rule checking process or the mask rule checking process, such as a desktop computer, a laptop computer, etc., or a remote device, such as a server, etc. In addition, the execution entity adopted in the embodiments of the present application can also be an execution entity in the form of software, such as a client installed in a terminal device, a software program, etc. The execution entity applying the technical solution of this embodiment is not strictly limited and can be flexibly selected according to the actual application scenario and requirements.

[0050] It should be noted that the specific application scenarios corresponding to the chip layout image processing method, device, electronic device, and storage medium provided in the embodiments of the present application are not strictly limited in the present application and can be determined according to actual needs. For the convenience of understanding, the following gives an example of the specific application scenarios of the chip layout image processing method, device, electronic device, and storage medium provided in the embodiments of the present application.

[0051] For example, when performing design rule checking on a chip layout image, the technical solution provided in the embodiments of the present application can accurately identify the target graphics of the chip layout, and accurately determine the refined structure type to which the target graphics belong by analyzing the line segment position relationship and angle between the line segments constituting the target graphics. Further, according to the corresponding standard structure parameters, rule checking can be performed on the target graphics.

[0052] The processing result of the design rule checking process can be used to indicate whether the target graphics in the chip layout image conform to the corresponding layout design rules. In this application scenario, the technical solution provided in the embodiments of the present application can effectively ensure that the target graphics involving different line segment angles and oblique graphics in the chip layout can be accurately identified and checked, so that there will be no problem of missing graphic checks or unstandardized graphics not being discovered in time during the design rule checking process. Furthermore, the processing efficiency and practicability of the subsequent image correction process based on the design rule checking result can also be significantly improved, providing strong safety and performance guarantees for the chips produced subsequently.

[0053] It should be noted that the application scenarios described in the embodiments of the present application above are for more clearly illustrating the technical solutions of the embodiments of the present application, and do not constitute a limitation on the technical solutions provided by the embodiments of the present application. As known to those of ordinary skill in the art, with the emergence of new application scenarios, the technical solutions provided by the embodiments of the present application are equally applicable to similar technical problems. The chip layout image processing method provided by the embodiments of the present application can be applied to various application scenarios that require identifying or performing rule checks on different graphic structures in an image.

[0054] Figure 1 FIG. 4 is a schematic flowchart of a chip layout image processing method provided by an embodiment of the present application.

[0055] As Figure 1 shown in FIG. 4, the chip layout image processing method provided by the embodiments of the present application includes steps S101 to S104.

[0056] S101: Obtain a chip layout image.

[0057] In step S101, the execution subject applying the technical solution provided by the embodiments of the present application can obtain a chip layout image for performing rule checks.

[0058] Among them, the specific image content and image category corresponding to the chip layout image are not strictly limited in the embodiments of the present application. It can be, for example, an image of a chip design layout for design rule checking, or a chip mask image for mask rule checking, etc. The chip layout image can be flexibly selected according to the actual scenario and requirements.

[0059] In addition, the chip layout image may include at least one target graphic. In the embodiments provided by the present application, the refined structure types corresponding to target graphics of different structures are also diverse.

[0060] Therefore, in the embodiments provided by the present application, the refined structure types corresponding to multiple target graphics involved in a single chip layout image can be completely the same or not completely the same. Rule checks can be performed on target graphics covering multiple refined structure types for a single chip layout image. The specific types and quantities of the refined structure types targeted during a single rule check process can be flexibly restricted according to different chip layout images and application scenarios.

[0061] S102: Determine the basic structure type corresponding to the target graphic according to the line segment position information in the chip layout image.

[0062] Through step S102, the technical solution provided by the embodiments of the present application can determine the basic structure type corresponding to the target graphic according to the line segment position information corresponding to each line segment in the chip layout image obtained through the above steps.

[0063] Among them, the line segment position information can specifically be used to represent the positional relationship and connection situation among the line segments in the chip layout image.

[0064] The determination process and implementation method of the line segment position information are not strictly limited in the embodiments of this application. For example, it can be to identify the line segment position information corresponding to each line segment in the chip layout image through a pre-trained image recognition model, such as a Convolutional Neural Network (CNN), or it can also be to accurately determine the line segment position information corresponding to each line segment in the chip layout image through a preset edge algorithm, such as Canny Edge Detection, etc., and can be flexibly adjusted according to the actual application scenario and requirements.

[0065] The basic structure type is specifically used to represent the coarsening structure category corresponding to the target graphic, and specifically can include but is not limited to a convex structure, a concave structure, a stepped structure, etc.

[0066] In an embodiment provided by this application, according to the line segment position information in the chip layout image, the positional relationship among multiple line segments in the target graphic and the type of angle formed among multiple line segments can be determined. Among them, the angle type can specifically include at least a convex angle and a concave angle.

[0067] Among them, a convex angle can specifically be an angle formed by any two line segments in a polygon composed of multiple line segments, where the interior angle is less than 180 degrees, and a concave angle can specifically be an angle formed by any two line segments in a polygon composed of multiple line segments, where the interior angle is greater than 180 degrees. The interior angle can specifically be understood as the angle formed by two adjacent sides inside the graphic in the polygon.

[0068] Then, according to the positional relationship among multiple line segments and the type of angle formed among multiple line segments, the basic structure type corresponding to the target graphic can be determined.

[0069] Regarding the determination process of the convex structure and the concave structure, in an embodiment provided by this application, according to the positional relationship among multiple line segments in the target graphic, multiple line segments forming the concave and convex parts in the target graphic can be determined. The shortest line segment among the two line segments connecting the multiple line segments forming the concave and convex parts to the non-concave and convex part of the chip layout image is used as the shorter side, and at the same time, the adjacent side of the shorter side connected to the non-concave and convex part is determined. The non-concave and convex part refers to other image areas in the chip layout image except the target graphic.

[0070] Then, according to the type of the angle between the shorter side and the adjacent side, determine whether the basic structure type corresponding to the target figure is a convex structure or a concave structure. If the lengths of the two line segments connected to the non-convex and non-concave part in the target figure are the same, one of the two line segments and the adjacent side corresponding to the connection with the non-convex and non-concave part can be randomly selected, and the basic structure type can be judged according to the type of the formed angle.

[0071] Among them, if it is determined that the internal angle formed by the shorter side and the adjacent side is greater than 180 degrees, that is, the angle type is a concave angle, and it is determined that there is only a single and unique convex and concave part in the target figure, then it can be determined that the basic structure type corresponding to the target figure is a convex structure.

[0072] If it is determined that the internal angle formed by the shorter side and the adjacent side is less than 180 degrees, that is, the angle type is a convex angle, and it is determined that there is only a single and unique convex and concave part in the target figure, then it can be determined that the basic structure type corresponding to the target figure is a concave structure.

[0073] In addition, regarding the determination process of the stepped structure, in an embodiment provided by the present application, when it is determined from the line segment position information in the chip layout image that there are at least four continuously adjacent line segments with continuously changing directions in the chip layout image, and the adjacent line segments connected before and after each line segment are distributed on different sides of the line segment, it can be determined that the basic structure type corresponding to the target figure composed of multiple line segments is a stepped structure.

[0074] Among them, being continuously adjacent and having continuously changing directions can be understood as that the line segments are connected to each other, the end point of each line segment is the starting point of the next line segment, and no two adjacent line segments are parallel and there is an angular relationship.

[0075] Through the above determination process of the basic structure type of the target figure, accurately determine the basic structure type corresponding to a single or multiple target figures in the chip layout image. Through category division, the subsequent rule checking process for the target figure is effectively simplified, the rule checking efficiency and accuracy are effectively improved, and to a certain extent, the accuracy of the subsequent determination process of the refined structure type is also improved.

[0076] To facilitate the understanding of the determination processes of the above convex structure, concave structure, and stepped structure, the following uses a schematic diagram of the basic structure type corresponding to a target figure to explain, as shown in Figures 2(a), 2(b), and 2(c).

[0077] Figures 2(a), 2(b), and 2(c) are schematic diagrams of the basic structure type corresponding to a target figure provided by an embodiment of the present application.

[0078] Figure 2(a) is a schematic diagram of a convex structure taking the refined structure type of the target pattern as a rectangular structure in the embodiment of the present application. As can be seen from Figure 2(a), the angle formed between the shorter side B1 of the concave and convex part in the target pattern and the adjacent side C1 connected to the non-concave and convex part in the chip layout image is a concave angle. Based on this, it can be determined that the target pattern similar to that in Figure 2(a) is a convex structure.

[0079] Figure 2(b) is a schematic diagram of a concave structure taking the refined structure type of the target pattern as a rectangular structure in the embodiment of the present application. As can be seen from Figure 2(b), the angle formed between the shorter side B1 of the concave and convex part in the target pattern and the adjacent side C1 connected to the non-concave and convex part in the chip layout image is a convex angle. Based on this, it can be determined that the target pattern similar to that in Figure 2(a) is a concave structure.

[0080] It should be noted that there is no requirement for the angle formed between the longer side (B2 in Figure 2(a) and Figure 2(b)) of the concave and convex part in the target pattern and the adjacent side (C2 in Figure 2(a) and Figure 2(b)) connected to the non-concave and convex part, which can be a concave angle or a convex angle, and it has no influence on the judgment of the convex structure or the concave structure in the basic structure type. The corresponding parts shown in Figure 2(a) and Figure 2(b) are only for illustration and understanding, and there is no strict limitation.

[0081] Figure 2(c) is a schematic diagram of a stepped structure taking the refined structure type of the target pattern as a right-angled stepped structure in the embodiment of the present application. As can be seen from Figure 2(c), the line segments B, C, D, and E in the target pattern are connected to each other, and the direction changes continuously, and the front and rear connecting line segments corresponding to each line segment are distributed on different sides of the line segment. For example, the front line segment A and the rear line segment C of the line segment B in Figure 2(c) are distributed on different sides of the line segment B. Based on this, it can be determined that the target pattern similar to that in Figure 2(c) is a stepped structure.

[0082] S103: Based on the line segment position information and the line segment angle information in the chip layout image, determine the refined structure type corresponding to the target pattern on the basis of the basic structure type.

[0083] The technical solution provided by the embodiment of the present application can, through step S103, determine the refined structure type corresponding to the target pattern on the basis of the basic structure type determined in step S102 according to the line segment position information and the line segment angle information in the chip layout image.

[0084] Among them, the line segment angle information can specifically be used to represent the angle size formed between the line segments in the chip layout image.

[0085] The refined structure type can be specifically used to represent the structural categories obtained by further refining the target figure on the basis of the basic structure type, and can specifically include, but are not limited to: rectangular structures, non-rectangular quadrilateral structures, triangular structures, etc. under the refinement of convex and concave structures, right-angled step structures and hypotenuse step structures, etc. under the refinement of stepped structures.

[0086] In an embodiment provided by the present application, when it is determined through the above step S102 that the basic structure type of the target figure is a convex structure or a concave structure, the shape of the convex and concave parts corresponding to the target figure can be determined according to the number of line segments included in the target figure and the positional relationship between multiple line segments.

[0087] Among them, the shape of the convex and concave parts is used to represent the shape type of the convex part corresponding to the target figure of the convex structure or the concave part corresponding to the target figure of the concave structure, and can specifically include, but are not limited to, shape types such as quadrilaterals and triangles.

[0088] Regarding the determination process of the shape of the convex and concave parts being a quadrilateral, in one embodiment, when it is determined that the convex and concave parts of the target figure are formed by connecting three line segments, and the two line segments among the three line segments that are connected to the non-convex and concave parts of the chip design figure are simultaneously distributed on the same side of the line segment that is not connected to the non-convex and concave parts of the chip design figure, it can be determined that the shape of the convex and concave parts corresponding to the target figure is a quadrilateral.

[0089] To facilitate understanding of the specific determination process when the shape of the convex and concave parts corresponding to the target figure is a quadrilateral, the following will be explained with reference to a schematic diagram of a target figure with a quadrilateral shape of the convex and concave parts on the basis of the basic structure type being a convex structure, as Figure 3 shown in.

[0090] Figure 3 This is a schematic diagram of a target figure with a quadrilateral shape of the convex and concave parts provided by an embodiment of the present application.

[0091] As Figure 3 shown in, the convex and concave parts in the target figure are formed by connecting line segment A, line segment B1, and line segment B2, and it can be clearly seen that the number of line segments is three. Figure 3 Among the three line segments that make up the convex and concave parts in the target figure, the two line segments that are connected to the non-convex and concave parts (line segment C1 and line segment C2) of the chip design figure are line segment B1 and line segment B2, and the line segment that is not connected to the non-convex and concave parts of the chip design figure is line segment A.

[0092] From Figure 3 it can be clearly seen that the line segments B1 and B2 connected to the non-convex and concave parts are distributed on the same side of the unconnected line segment A. Based on this, it can be determined that the shape of the convex and concave parts corresponding to the target figure similar to Figure 3 is a quadrilateral.

[0093] In addition, regarding the determination process of the concave-convex part with a triangular shape, when it is determined that the concave-convex part of the target figure is composed of two line segments connected, and the front and rear line segments connected to any one of the two line segments are respectively on different sides of that line segment, it can be determined that the shape of the concave-convex part corresponding to the target figure is a triangle.

[0094] To facilitate understanding of the specific determination process when the shape of the concave-convex part corresponding to the target figure is a triangle, the following will be explained with a schematic diagram of a target figure with a concave-convex part in the shape of a triangle based on the basic structure type being a convex structure, as shown in Fig. 4(a).

[0095] Fig. 4(a) and Fig. 4(b) are schematic diagrams of a target figure with a concave-convex part in the shape of a triangle provided by an embodiment of the present application.

[0096] As shown in Fig. 4(a), the concave-convex part in the target figure is formed by connecting line segment A and line segment B, and the number of line segments is two. It can be clearly seen from Fig. 4(a) that the front and rear line segments (line segment B and line segment C1) connected to line segment A are respectively on different sides of line segment A. Based on this, it can be determined that the shape of the concave-convex part corresponding to the target figure similar to that shown in Fig. 4(a) is a triangle.

[0097] It should be noted additionally that when the shape of the concave-convex part is a triangle, it is only necessary for any one of the two line segments forming the concave-convex part to meet the above judgment condition, and there is no strict limitation on the positions of the front and rear line segments connected to the other line segment, which can be on the same side or different sides of that line segment. The case of different sides can be referred to Fig. 4(a), and the case of the same side can be referred to Fig. 4(b).

[0098] As shown in Fig. 4(b), similar to Fig. 4(a), the concave-convex part in the target figure is formed by connecting line segment A and line segment B, and the front and rear line segments (line segment B and line segment C1) connected to line segment A are respectively on different sides of line segment A. Different from Fig. 4(a), in Fig. 4(b), the front and rear line segments (line segment A and line segment C2) connected to line segment B are both on the same side of line segment B. In this case, it can be determined that the shape of the concave-convex part corresponding to the target figure similar to that shown in Fig. 4(b) is a triangle.

[0099] Furthermore, according to the line segment angle information in the chip layout image and the shape of the concave-convex part corresponding to the target figure determined by the above process with the basic structure type being a convex structure or a concave structure, the refined structure type corresponding to the target figure can be further determined.

[0100] When the shapes of the concave and convex parts corresponding to the target figure are different, the determination process of the corresponding refined structure type also differs. The following separately describes the different refined structure types corresponding to different shapes of concave and convex parts.

[0101] In an embodiment provided by the present application, when the shape of the concave and convex part corresponding to the target figure determined to be a convex structure or a concave structure through the above process is a quadrilateral, based on the line segment position information and line segment angle information in the chip layout image, the refined structure type corresponding to the target figure can be further determined on the basis that the shape of the concave and convex part corresponding to the target figure is a quadrilateral.

[0102] Specifically, according to the line segment position information, it can be judged whether the upper side and the lower side of the quadrilateral of the target figure with a quadrilateral-shaped concave and convex part are parallel, and at the same time, it is also necessary to judge whether the side of the quadrilateral of the target shape is perpendicular to the upper side and the lower side of the quadrilateral.

[0103] Among them, the upper side of the quadrilateral can specifically refer to the side formed by the two protruding or concave endpoints in the concave and convex part shape of the quadrilateral, that is, the line segment with the farthest shortest straight-line distance from the non-concave and convex part image other than the target figure in the chip layout image in the target figure. And the lower side of the quadrilateral can specifically refer to the side formed by the two non-protruding or non-concave endpoints in the concave and convex part shape of the quadrilateral.

[0104] If it is determined that the target figure simultaneously satisfies the above two judgment conditions, that is, the upper side and the lower side of the quadrilateral are parallel, and the side of the quadrilateral is perpendicular to the upper side and the lower side of the quadrilateral, it can be determined that the refined structure type corresponding to the target figure is a rectangular structure (rectangular structure or square structure). An example of a target figure with a refined structure type of a rectangular structure can be referred to Figure 5 as shown in.

[0105] Figure 5 is a schematic diagram of a target figure with a refined structure type of a rectangular structure provided by an embodiment of the present application.

[0106] As Figure 5 shown in, the shape of the concave and convex part of the target figure is a quadrilateral. The upper side of the quadrilateral is A, the sides of the quadrilateral are B1 and B2, and the lower side of the quadrilateral can be the extension line of the side connecting the shorter side of the quadrilateral of the target figure to the non-concave and convex part of the chip design figure to the line segment formed by the side connecting the longer side of the quadrilateral to the non-concave and convex part, that is, Figure 5 C’ shown in.

[0107] It can be seen from Figure 5 that the upper side A of the quadrilateral is parallel to the lower side C of the quadrilateral, and the sides B1 and B2 of the quadrilateral are both perpendicular to the upper side A and the lower side C of the quadrilateral. The concave and convex part formed by the four sides is a rectangle, similar toFigure 5 The refined structure type of the target figure shown can be determined to be a rectangular structure.

[0108] In addition, when at least one side of the quadrilateral of the target shape is not perpendicular to the upper side and the lower side of the quadrilateral, considering that there may also be a certain angular relationship between the upper side and the lower side of the quadrilateral, and the angle between the upper side and the lower side of the quadrilateral may be caused by other reasons such as design errors, etc., so when the angular relationship is small enough or negligible, it should also be regarded as approximately parallel between the upper side and the lower side of the quadrilateral.

[0109] Based on the above description, according to the above line segment angle information, the included angle size between the upper side and the lower side of the quadrilateral can be determined, and further, according to the included angle size between the upper side and the lower side of the quadrilateral and the preset line segment angle threshold, it is judged whether the refined structure type corresponding to the target figure is a non-rectangular quadrilateral structure.

[0110] When it is determined that at least one side of the quadrilateral of the target shape is not perpendicular to the upper side and the lower side of the quadrilateral, if the included angle size between the upper side and the lower side of the quadrilateral is not greater than the preset line segment angle threshold, or the upper side and the lower side of the quadrilateral are parallel, it is determined that the refined structure type corresponding to the target figure is a non-rectangular quadrilateral structure.

[0111] Among them, the non-rectangular quadrilateral structure can be further refined into different types. When the sides of the quadrilateral are not parallel, the refined structure type corresponding to the target figure can be a trapezoidal structure, and the trapezoidal structure can further determine whether it is a right trapezoidal structure according to whether any side of the quadrilateral is perpendicular to the upper side or the lower side of the quadrilateral.

[0112] To facilitate understanding of the specific manifestation form of the refined structure type being a non-rectangular quadrilateral structure, the following takes the target figure with the refined structure type being a trapezoidal structure as an example for explanation, as Figure 6 shown.

[0113] Figure 6 It is a schematic diagram of a target figure with a refined structure type being a non-rectangular quadrilateral structure provided by an embodiment of the present application.

[0114] As Figure 6 shown, the concave and convex part shape of the target figure is a quadrilateral, the upper side of the quadrilateral is A, and the sides of the quadrilateral are B1 and B2. Similarly, Figure 5 , Figure 6 in the target figure corresponding quadrilateral lower side can be the extension line of the side of the shorter quadrilateral of the target figure connected to the non-concave and convex part to the line segment formed by the side of the longer quadrilateral connected to the non-concave and convex part, that is, Figure 6 C’ shown.

[0115] As can be seen from Figure 6 , the sides B1 and B2 of the quadrilateral of the target figure are not perpendicular to the upper side A and the lower side C' of the quadrilateral, and the upper side A and the lower side C' of the quadrilateral are not parallel either. At this time, when determining the size of the included angle between the upper side A and the lower side C' of the quadrilateral, that is, the included angle α formed by the extension lines of the two sides, and it is not greater than the preset line segment angle threshold, it can be determined that the target figure similar to Figure 6 shown in is a non-rectangular quadrilateral structure.

[0116] According to the positional relationship of the sides, the more refined types of the non-rectangular quadrilateral structure can be further determined. For example Figure 6 the sides B1 and B2 of the quadrilateral of the target figure in are not parallel, and it can be determined that the target figure similar to Figure 6 shown in is a trapezoidal structure in the non-rectangular quadrilateral structure. If one side of a quadrilateral is perpendicular to the upper side or the lower side of the quadrilateral, the trapezoidal structure can be further refined into a right trapezoidal structure.

[0117] Through the above process of determining the refined structure types of the target figures with the concave-convex parts shaped as quadrilaterals, the refined structure types corresponding to the target figures containing different line segment positional relationships and different line segment angles formed between line segments are accurately determined. The influence of the oblique line segments and different line segment angles on the target figures is fully considered, effectively making the accuracy and efficiency of the subsequent rule checking process of the target figures significantly improved, and facilitating the implementation of the subsequent graphic optimization process for the chip layout image.

[0118] In addition to the above content, regarding the process of determining the refined structure types of the target figures when the concave-convex parts corresponding to the target figures are shaped as triangles, in an embodiment provided in the present application, when it is determined through the above process that the concave-convex parts of the target figures with the basic structure types of convex structures or concave structures are shaped as triangles, based on the line segment position information and line segment angle information in the chip layout image, the refined structure types corresponding to the target figures can be further determined on the basis that the concave-convex parts corresponding to the target figures are shaped as triangles.

[0119] Specifically, according to the line segment angle information in the chip layout image, it can be judged whether the included angle formed by the extension lines of the two line segments adjacent to the concave-convex part of the target figure in the non-concave-convex part of the chip layout image is not greater than the preset line segment angle threshold.

[0120] When it is determined that the included angle formed between the extension lines of two line segments adjacent to the concave and convex part of the target figure is not greater than a preset line segment angle threshold, or when the two line segments adjacent to the concave and convex part of the target figure are parallel, it can be determined that the refinement structure type corresponding to the target figure with a triangular concave and convex part shape is a triangular structure. An example of a target figure with a refinement structure type of a triangular structure can be referred to Figure 7 as shown in.

[0121] Figure 7 FIG. is a schematic diagram of a target figure with a refinement structure type of a triangular structure provided by an embodiment of the present application.

[0122] As Figure 7 shown in, the concave and convex part of the target figure is composed of line segment A and line segment B. The two line segments adjacent to the non-concave and convex part and the concave and convex part of the target figure in the chip layout image are C1 and C2 respectively. The included angle between the corresponding extension line of line segment C1 and C2 is Figure 7 α shown in.

[0123] When it is determined that the included angle α formed between line segments C1 and C2 is not greater than the preset line segment angle threshold, or line segments C1 and C2 can also be parallel, it can be determined that the refinement structure type corresponding to the target figure with a concave and convex part shape similar to Figure 7 shown in and with a triangular concave and convex part shape is a triangular structure. Except for the above situations, the refinement structure type of the target figure with a triangular concave and convex part shape with other line segment positional relationships and angle sizes will not be determined as a triangular structure.

[0124] Through the above determination process of the refinement structure type for the target figure with a triangular concave and convex part shape, it is possible to accurately determine the refinement structure type corresponding to the target figure with a triangular concave and convex part shape and including different line segment positional relationships and different line segment angles formed between line segments. It fully considers the influence of oblique line segments and different line segment angles on the triangular target figure, effectively improving the accuracy and efficiency of the rule check for the target figure, ensuring the accuracy and effectiveness of the rule check process, and significantly enhancing the usability and reliability of the produced chip.

[0125] It should be noted that in the embodiments provided in the present application, the specific size of the line segment angle threshold involved in the determination process of the refinement structure type of the target figure with a concave and convex part shape of either a quadrilateral or a triangle is not strictly limited. In order to ensure the graphic accuracy, the line segment angle threshold can be set as small as possible, such as 3°, 5°, etc. The specific size of the line segment angle threshold can be flexibly set according to the actual application scenario or the specific type and content of the chip layout image.

[0126] In addition, for the target graphics with concave-convex parts shaped like quadrilaterals and the target graphics with concave-convex parts shaped like triangles, when determining the refined structure type, the line segment angle thresholds based on the two concave-convex part shapes can be exactly the same, or can be set differently respectively, and can be flexibly adjusted according to actual needs.

[0127] Through the above processing process, the refined structure types corresponding to the target graphics determined to be convex structures or concave structures with different concave-convex part shapes are accurately and effectively determined, effectively improving the inspection accuracy and inspection efficiency during subsequent rule checking for the target graphics, and further ensuring the complete function and normal use of the produced chips.

[0128] In addition to the above processing process for determining the refined structure type corresponding to the target graphics of convex structures or concave structures, in an embodiment provided in the present application, for the target graphics of stepped structures, according to the line segment position information corresponding to each line segment in the target graphics, the refined structure type corresponding to the target graphics of stepped structures can be determined.

[0129] Specifically, it is determined whether multiple line segments constituting the stepped structure in the target graphics are all line segments parallel to the horizontal axis direction or the vertical axis direction of the two-dimensional plane rectangular coordinate system with the center point of the chip layout image as the coordinate origin. It can be simply understood as determining whether multiple line segments constituting the stepped structure are all horizontal line segments or vertical line segments.

[0130] When it is determined that all line segments in the target graphics are parallel to the horizontal axis direction or the vertical axis direction of the coordinate system, it means that all line segments are perpendicular to each other. In this case, the refined structure type corresponding to the target graphics of the stepped structure can be determined to be a right-angled stepped structure.

[0131] When it is determined that at least one line segment among multiple line segments of the target graphics is not parallel to the horizontal axis direction and the vertical axis direction of the coordinate system, it means that there are oblique line segments in the target graphics of the stepped structure, and at the same time, it means that there may be at least one non-right angle in the target graphics of the stepped structure. In this case, the refined structure type corresponding to the target graphics of the stepped structure can be determined to be a beveled stepped structure.

[0132] To facilitate the understanding of the determination process of the refined structure type corresponding to the target graphics of the stepped structure, the following is an explanatory illustration with a schematic diagram of the refined structure type corresponding to a target graphics of a stepped structure, for easy understanding, as shown in Figures 8(a) and 8(b).

[0133] Figures 8(a) and 8(b) are schematic diagrams of the refined structure type corresponding to a target graphics of a stepped structure provided in an embodiment of the present application.

[0134] Figure 8(a) is a schematic diagram of the refined structure type of the target pattern with a stepped structure being a right-angled stepped structure. The target pattern in Figure 8(a) consists of line segments A, B, C, D, E, and F. It can be seen that line segments A, C, and E are horizontal line segments parallel to the horizontal axis direction of the coordinate system, and line segments B, D, and F are vertical line segments parallel to the vertical axis direction of the coordinate system. The multiple line segments in the target pattern are all perpendicular to each other. Based on this, it can be determined that the refined structure type of the target pattern similar to that in Figure 8(a) is a right-angled stepped structure.

[0135] Figure 8(b) is a schematic diagram of the refined structure type of the target pattern with a stepped structure being an inclined stepped structure. The target pattern in Figure 8(a) consists of line segments A, B, C, D, E, and F. It can be seen that although line segments A, B, and F are horizontal or vertical line segments parallel to the horizontal axis direction or the vertical axis direction of the coordinate system, line segments C, D, and E are all inclined line segments not parallel to the horizontal axis direction and the vertical axis direction of the coordinate system and have a certain angle with respect to the horizontal axis direction or the vertical axis direction of the coordinate system. Based on this, the refined structure type of the target pattern similar to that in Figure 8(b) can be determined to be an inclined stepped structure.

[0136] Through the above determination process of the refined structure type of the target pattern with a stepped structure, different types of stepped structures of the target pattern can be accurately and efficiently determined. The influence of the inclined line segments on the target pattern is fully considered during the determination process, which significantly improves the accuracy and processing efficiency of the subsequent rule checking process, and further ensures the practicality and reliability of the produced chips.

[0137] S104: Based on the standard structure parameters preset for the refined structure type, perform rule checking on the target pattern in the chip layout image.

[0138] In step S104, after determining the refined structure type corresponding to the target pattern through the above steps, rule checking can be performed on at least one target pattern in the chip layout image according to the standard structure parameters preset for the refined structure type corresponding to the target pattern, and the rule checking result corresponding to the target pattern can be obtained. Among them, the standard structure parameters are specifically used to represent the parameter requirements corresponding to the target patterns of different refined structure types.

[0139] The rule checking process can be regarded as accurately identifying the target patterns in the chip layout image that meet the standard structure parameters of the refined structure type, and the rule checking result can be used to represent the recognition result of the target patterns that meet the parameter requirements in the standard structure parameters.

[0140] It should be noted that in the embodiments provided in this application, different refined structure types correspond to different standard structure parameter contents. Specifically, for target graphics with refined structure types of rectangular structures and non-rectangular quadrilateral structures, the standard structure parameters can be the length and width of the target graphics. Among them, the width can specifically be the length of the upper side of the quadrilateral of the target graphic, and the length is the shortest straight-line distance from the upper side of the quadrilateral to the lower side of the quadrilateral.

[0141] For target graphics with a refined structure type of triangular structure, the standard structure parameters can also be the length and width of the target graphic, but the specific contents of the length and width are different. The length corresponding to the target graphic of the triangular structure can be the shortest vertical distance from the intersection of the two sides of the concave and convex parts of the triangle constituting the target graphic to the non-concave and convex part of the chip layout image, and the width can be the straight-line distance between the intersection of the two line segments connected to the concave and convex parts in the chip layout image and the two line segments constituting the concave and convex parts.

[0142] To facilitate understanding of the specific manifestation form of the standard structure parameters of the target graphic with a refined structure type of triangular structure, the following is an explanation based on an example of a target graphic with a refined structure type of triangular structure, as Figure 9 shown.

[0143] Figure 9 FIG. is a schematic diagram of the manifestation form of a standard structure parameter in a target graphic with a refined structure type of triangular structure provided by an embodiment of the present application.

[0144] As Figure 9 shown, the concave and convex part of the target graphic of the triangular structure is composed of line segments A and B, and the line segments connected to the concave and convex part in the chip layout image are line segments C1 and C2. Take the shortest vertical distance from the intersection of the line segments of the concave and convex part (i.e., the Figure 9 c point shown) to line segments C1 and C2 as the length of the target graphic, that is, the Figure 9 straight-line vertical distance from the c point to the extension line of C2 in.

[0145] In addition, the distance between the intersections of the extension lines of line segments C1 and C2 connected to the concave and convex part and line segments A and B respectively is taken as the width of the target graphic. Specifically, as Figure 9 shown, the intersection of line segment C1 and line segment B is b, the intersection of line segment C2 and line segment A is a, and the width of the target graphic is the straight-line distance between intersection point a and intersection point b.

[0146] For target graphics with refined structure types of right-angled step structures and beveled step structures, the standard structure parameters can be the length sizes of each line segment constituting the step structure in the target graphic, and the included angle sizes formed between two line segments.

[0147] Regarding the specific processing procedure for performing a rule check on a target graphic, in an embodiment provided by the present application, an image area where the target graphic that meets the parameter criteria in the standard structure parameters can be determined according to the standard structure parameters preset for the refined structure type corresponding to the target graphic in the chip layout image.

[0148] Then, by performing a marking process on the image area where the target graphic is located, a marked chip layout image can be obtained, and the marked chip layout image can be used as the rule check result corresponding to the target graphic. The specific processing method of the above marking process is not strictly limited in the embodiments provided by the present application. For example, special marking display can be performed on the image area where the target graphic is located, or it can be other marking methods sufficient to indicate the image area where the target graphic is located in the chip layout image, and can be flexibly set according to the actual application scenario and requirements.

[0149] It should be noted that, in the embodiments provided by the present application, specific recognition and rule checking can be performed on the target graphic that meets the parameter requirements based on the preset standard structure parameters. It can be by adjusting the standard structure parameters to perform parameter matching for different target graphics respectively, and performing a marking process after determining that the parameter requirements are met. In other embodiments, a certain range of standard structure parameters can also be set, or the specific numerical value or range of the standard structure parameters can also be not set, and directly mark the target graphic corresponding to a single or multiple refined structure types.

[0150] Through the above process of determining the rule check result corresponding to the target graphic, a rule check result with a relatively strong visualization degree for the target graphic in the chip layout image can be successfully determined, and accurate recognition and marking are performed on the target graphic that meets the parameter requirements in the chip layout image.

[0151] During the previous process of determining the refined structure type, the influence of the oblique line segment and the line segment angle on the graphic structure was fully considered, effectively improving the detection accuracy and coverage range in the rule check process. Through the marking process, the area where the target graphic is located in the chip layout image can be accurately and effectively represented, so that the processing efficiency and processing accuracy during subsequent graphic adjustment are also improved, and to a certain extent, the production efficiency and yield of the chip are also improved.

[0152] To facilitate understanding of the specific manifestation form of the rule check result corresponding to the above target graphic, the following will be explained with reference to the schematic diagrams of the rule check result corresponding to the target graphic, and reference can be made to those shown in FIG. 10(a), FIG. 10(b), and FIG. 10(c).

[0153] FIG. 10(a), FIG. 10(b), FIG. 10(c), FIG. 10(d), and FIG. 10(e) are schematic diagrams of the rule check results corresponding to a target pattern provided by an embodiment of the present application.

[0154] Among them, FIG. 10(a) is a schematic diagram of the rule check results corresponding to a target pattern with a refined structure type of a rectangular structure, FIG. 10(b) is a schematic diagram of the rule check results corresponding to a target pattern with a refined structure type of a non-rectangular quadrilateral structure (trapezoidal structure), and FIG. 10(c) is a schematic diagram of the rule check results corresponding to a target pattern with a refined structure type of a triangular structure.

[0155] In the three images of FIG. 10(a), FIG. 10(b), and FIG. 10(c), special marking processing is performed on the convex parts of the target pattern, and the marked chip layout image is used as the rule check result of the target pattern.

[0156] In addition, FIG. 10(d) is a schematic diagram of the rule check results corresponding to a target pattern with a refined structure type of a right-angled step structure, and FIG. 10(e) is a schematic diagram of the rule check results corresponding to a target pattern with a refined structure type of an oblique step structure.

[0157] In the two figures of FIG. 10(d) and FIG. 10(e), special bold marking processing is performed on the line segments forming the stepped structure in the target pattern, and the marked chip layout image is used as the rule check result of the target pattern.

[0158] It should be noted that the marking forms in the above images are only for understanding and are not strictly limited. The texture patterns and colors used for special markings of different refined structure types can also be different, so as to facilitate classification and other processing during subsequent image adjustment.

[0159] Regarding the specific check categories corresponding to the rule check process, in an embodiment provided by the present application, when the chip layout image is a design layout image, design rule checks can be performed on the target patterns in the chip design patterns of the design layout image based on the standard structure parameters preset for the refined structure types. The determined design rule check results can be used for subsequent optimization and adjustment of the target patterns in the design layout image.

[0160] Through the technical solution provided by the embodiment of the present application, the design rule check of the design layout image can be efficiently realized. Moreover, in the design rule check process, the influence of the oblique line segments and the included angles between different line segments in the target image on the graphic structure is fully considered, effectively improving the accuracy and practicality of the design rule check process, facilitating subsequent graphic adjustment of the chip design layout, and providing a strong guarantee for the performance and practicality of the produced chips.

[0161] In addition, in another embodiment provided by the present application, when the chip layout image is a chip mask image, based on the standard structure parameters preset for the refined structure type, mask rule checking can be performed on the target graphics in the chip design graphics that are the chip mask image. The determined mask rule checking result can be used for subsequent optimization and adjustment of the target graphics in the chip layout image.

[0162] Through the above process, efficient mask rule checking of the chip mask image can be achieved. The technical solution provided by the present application fully considers the influence of the oblique line segments and the included angle between different line segments on the graphic structure of the mask pattern during the mask rule checking process, and also conducts refined classification on the graphic structure containing oblique line segments, effectively improving the accuracy and processing efficiency of the mask rule checking process, facilitating subsequent optimization and adjustment of the chip mask pattern, and providing a strong guarantee for the performance and practicality of the chips produced in the subsequent production process.

[0163] In addition to the above content, in another embodiment provided in this specification, when determining the rule checking result corresponding to the target graphics, it is also possible to judge whether additional marking processing needs to be performed on the rule checking result according to the distribution of the oblique line segments (i.e., not parallel to the horizontal and vertical directions of the coordinate system in the chip layout image) in the target graphics.

[0164] Specifically, when it is determined that the target graphics contain oblique line segments, additional marking processing can be performed on the rule checking result corresponding to the target graphics, that is, the marked chip layout image obtained through the above steps. The additional marking is used to indicate that the target graphics in the chip layout image contain oblique line segments that may need to be corrected.

[0165] In the embodiments of the present application, there is no strict limitation on how to specifically process the chip layout image with additional marking. It can be to send the chip layout image with additional marking as a prompt message to relevant personnel so that the relevant personnel can actively judge whether it is necessary to correct the oblique line segments in the target graphics of the chip layout image. It can also be to directly correct the oblique line segments in the chip layout image with additional marking. The specific processing process of the chip layout image with additional marking can be flexibly adjusted according to the actual application scenario and requirements.

[0166] Through the above process of performing additional marking on the rule checking result of the target graphics with oblique line segments, the target graphics that may need to be corrected can be accurately marked to play a prompting role in subsequent graphic adjustment, improving the processing efficiency and effect of rule checking and image adjustment, and providing a strong guarantee for the yield and practicality of the chips produced.

[0167] The above content is the specific implementation process of a method for processing chip layout images provided by this application. The above-mentioned multiple steps can also be implemented through preset chip inspection rules. For the specific determination process of chip inspection rules, reference can be made to Figure 11 as shown in

[0168] Figure 11 FIG.

[0169] As Figure 11 shown in

[0170] S1101: Determine the basic structure type targeted by the chip inspection rules.

[0171] In step S1101, the category of the basic structure type can be selected and set first, and the corresponding inspection rules can be specified according to the basic structure type.

[0172] In the subsequent process of rule inspection, the execution entity of this application embodiment can directly determine the basic structure type corresponding to the target pattern in the chip layout image based on the inspection rules for the basic structure type set in the chip inspection rules.

[0173] S1102: Determine the refined structure type that is further refined on the basic structure type in the chip inspection rules.

[0174] In step S1102, the refined structure type that is further refined on the basic structure type can be determined in advance. The inspection rules corresponding to the refined structure type can preset line segment position relationship rules, line segment angle thresholds, etc.

[0175] According to the chip inspection rules determined through this step, when performing rule inspection on the target pattern in the chip layout image subsequently, the refined structure type corresponding to the target pattern of different structures can be accurately determined.

[0176] S1103: Set standard structure parameters for each refined structure type.

[0177] In step S1103, after determining the inspection rules for the refined structure type through step S1102, the corresponding standard structure parameters can be set for each refined structure type in the chip inspection rules, so that when performing rule inspection according to the chip inspection rules subsequently, the target pattern that meets the parameter requirements can be accurately identified.

[0178] By further setting the structural parameters through this step, the rule checking process for the target graphics can be made more targeted, and the processing efficiency and accuracy of the rule checking process can also be improved.

[0179] S1104: Define the output method for region marking of the target graphics that meet the standard structural parameters, and determine the chip inspection rules.

[0180] In step S1104, the specific form of the output result during subsequent image recognition according to the chip inspection rules can be set. Specifically, it can be in the form of special marking of the graphic area of the target graphics as described in the above steps, as the rule checking result corresponding to the target graphics. Through the improvement of the chip inspection rules in this step, it helps to perform rule checking on the chip layout image according to the chip inspection rules and can process more efficiently and accurately during subsequent graphic correction.

[0181] The above is the specific implementation manner of the chip layout image processing method provided by the embodiments of the present application. The technical solution provided by the embodiments of the present application can fully consider the influence of any-angle oblique line segments and line segment angles in the graphic structure on the structure of the target graphics when determining the refined structure type corresponding to the target graphics during the design rule checking or mask rule checking process.

[0182] Through the technical solution provided by the embodiments of the present application, when performing rule checking on the chip layout or chip mask image, it can effectively eliminate the defect in the current technology that can only identify graphics parallel to the horizontal or vertical axis direction of the two-dimensional plane rectangular coordinate system or graphics with a specific hypotenuse angle, and significantly improve the inspection accuracy and inspection efficiency of the design rule checking or mask rule checking. And to a certain extent, the technical solution provided by the embodiments of the present application also improves the practicality and reliability of the rule checking process and the subsequent image adjustment process, effectively guaranteeing the performance and yield rate of the finally produced chips.

[0183] Based on the chip layout image processing method provided in the above embodiments, correspondingly, the present application also provides a specific implementation manner of a chip layout image processing device. Please refer to the following embodiments.

[0184] Figure 12 The structural schematic diagram of a chip layout image processing device provided by another embodiment of the present application. The chip layout image processing device 1200 includes: an acquisition unit 1201, a basic structure determination unit 1202, a refined structure determination unit 1203, and an image inspection unit 1204.

[0185] The acquisition unit 1201 is used to acquire a chip layout image, and the chip layout image contains at least one target graphic to be recognized;

[0186] A basic structure determination unit 1202, configured to determine the type of basic structure corresponding to a target pattern according to the line segment position information in the chip layout image;

[0187] A refinement structure determination unit 1203, configured to determine the type of refinement structure corresponding to the target pattern based on the line segment position information and the line segment angle information in the chip layout image on the basis of the basic structure type;

[0188] An image inspection unit 1204, configured to perform a rule check on the target pattern in the chip layout image based on the standard structure parameters preset for the refinement structure type.

[0189] In the embodiments provided in this application, the above device can, when performing a design rule check or a mask rule check, determine the type of basic structure and the type of refinement structure corresponding to the target pattern based on the line segment position information in the chip layout image. During the processing, the existence and influence of the hypotenuse at any angle in the graphic structure are fully considered and combined.

[0190] In addition, based on the refinement structure type and the corresponding standard structure parameters, the rule check on the target pattern in the chip layout image can be accurately performed, so that the recognition accuracy of the target pattern with a hypotenuse in the structure is significantly improved. To a certain extent, the practicality and reliability of the rule check process and the subsequent image adjustment process are also improved, ensuring the performance and yield of the finally produced chip.

[0191] In one embodiment, the basic structure type includes at least one of a convex structure, a concave structure, and a stepped structure. The stepped structure is a graphic structure composed of at least four continuously adjacent line segments with continuously changing directions, and the two adjacent line segments before and after each line segment are distributed on different sides of the line segment;

[0192] Specifically, the above basic structure determination unit 1202 is configured to determine the positional relationship between multiple line segments in the target pattern and the type of included angle formed between the multiple line segments according to the line segment position information. The included angle type includes at least a convex angle and a concave angle. The convex angle is an included angle formed by any two line segments among the multiple line segments with an interior angle less than 180 degrees, and the concave angle is an included angle formed by any two line segments among the multiple line segments with an interior angle greater than 180 degrees;

[0193] Determine the type of basic structure corresponding to the target pattern according to the positional relationship and included angle type between the multiple line segments.

[0194] In one embodiment, the refinement structure type includes a rectangular structure, a non-rectangular quadrilateral structure, and a triangular structure;

[0195] Specifically, when the basic structure type is a convex structure or a concave structure, the above-mentioned refinement structure determination unit 1203 is configured to determine the concave and convex part shapes corresponding to the target pattern according to the number of line segments in the target pattern and the positional relationship between multiple line segments, and the concave and convex part shapes include quadrilaterals and triangles;

[0196] According to the line segment angle information and the concave and convex part shapes in the chip layout image, determine the refinement structure type corresponding to the target pattern, and the line segment angle information is used to represent the magnitude of the angle formed between line segments in the chip layout image.

[0197] In one embodiment, specifically, when the concave and convex part shape is a quadrilateral, the above-mentioned refinement structure determination unit 1203 is configured to determine whether the upper side and the lower side of the quadrilateral are parallel, and whether both side edges of the quadrilateral are perpendicular to the upper side and the lower side of the quadrilateral. The edge formed by the two non-convex or non-concave endpoints in the concave and convex part shape is the lower side, and the edge formed by the two convex or concave endpoints is the upper side;

[0198] If so, determine that the refinement structure type corresponding to the target pattern is a rectangular structure;

[0199] If at least one side edge of the quadrilateral is not perpendicular to the upper side and the lower side of the quadrilateral, when determining that the angle formed between the upper side and the lower side of the quadrilateral is not greater than a preset line segment angle threshold, determine that the refinement structure type corresponding to the target pattern is a non-rectangular quadrilateral structure.

[0200] In one embodiment, specifically, when the concave and convex part shape is a triangle, the above-mentioned refinement structure determination unit 1203 is configured to determine whether the angle between two line segments adjacent to the concave and convex part of the target pattern is not greater than a preset line segment angle threshold;

[0201] If so, determine that the refinement structure type corresponding to the target pattern is a triangular structure.

[0202] In one embodiment, the refinement structure types further include a right-angle step structure and a hypotenuse step structure;

[0203] Specifically, when the basic structure type is a step structure, the above-mentioned refinement structure determination unit 1203 is configured to determine whether multiple line segments in the target pattern are all line segments parallel to the horizontal axis direction or the vertical axis direction of the two-dimensional plane rectangular coordinate system with any point in the chip layout image as the origin according to the line segment position information and the line segment angle information in the chip layout image;

[0204] If so, determine that the refinement structure type corresponding to the target pattern is a right-angle step structure, and the right-angle step structure is a graphic structure composed of at least four continuously adjacent line segments parallel to the horizontal axis direction or the vertical axis direction with continuously changing directions, and the two adjacent line segments before and after each line segment parallel to the horizontal axis direction or the vertical axis direction are distributed on different sides of the line segment;

[0205] If not, determine that the refined structure type corresponding to the target graphic is a bevel step structure; the bevel step structure is a graphic structure composed of at least four continuously adjacent and continuously changing oblique line segments, and the two adjacent line segments before and after each oblique line segment are distributed on different sides of the oblique line segment, and the oblique line segment is a line segment that is not parallel to the horizontal axis direction and the vertical axis direction.

[0206] In one embodiment, the above image inspection unit 1204 is specifically configured to determine an image area of the target graphic in the chip layout image as the target area based on the standard structure parameters preset according to the refined structure type;

[0207] Perform a marking process on the target area, and use the chip layout image after the marking process as the rule inspection result corresponding to the target graphic.

[0208] In one embodiment, the chip layout image is a design layout image;

[0209] The above image recognition unit 1204 is specifically configured to perform a design rule inspection on the target graphic in the design layout image based on the standard structure parameters preset according to the refined structure type.

[0210] In one embodiment, the chip layout image is a chip mask image;

[0211] The above image recognition unit 1204 is specifically configured to perform a mask rule inspection on the target graphic in the chip mask image based on the standard structure parameters preset according to the refined structure type.

[0212] Figure 13 It is a schematic structural diagram of a chip layout image processing device provided by another embodiment of the present application.

[0213] In the chip layout image processing device, a processor 1301 and a memory 1302 storing computer program instructions may be included.

[0214] Specifically, the above processor 1301 may include a central processing unit (CPU), or an application specific integrated circuit (ASIC), or one or more integrated circuits configured to implement the embodiments of the present application.

[0215] The memory 1302 may include a mass storage for data or instructions. By way of example and not limitation, the memory 1302 may include a hard disk drive (HDD), a floppy disk drive, a flash memory, an optical disk, a magneto-optical disk, a magnetic tape, or a universal serial bus (USB) drive, or a combination of two or more of these. Where appropriate, the memory 1302 may include removable or non-removable (or fixed) media. Where appropriate, the memory 1302 may be internal or external to the integrated gateway disaster recovery device. In a particular embodiment, the memory 1302 is a non-volatile solid-state memory.

[0216] In a particular embodiment, the memory 1302 includes a read-only memory (ROM). Where appropriate, the ROM may be a mask-programmed ROM, a programmable ROM (PROM), an erasable PROM (EPROM), an electrically erasable PROM (EEPROM), an electrically rewritable ROM (EAROM), or a flash memory, or a combination of two or more of these.

[0217] The processor 1301 reads and executes the computer program instructions stored in the memory 1302 to implement any one of the chip layout image processing methods in the above embodiments.

[0218] In one example, the chip layout image processing device may further include a communication interface 1303 and a bus 1310. Among them, as Figure 13 shown, the processor 1301, the memory 1302, and the communication interface 1303 are connected through the bus 1310 to complete communication with each other.

[0219] The communication interface 1303 is mainly used to implement communication between the various modules, devices, units, and / or devices in the embodiments of the present application.

[0220] The bus 1310 includes hardware, software, or both, and couples the components of the online data flow metering device to each other. By way of example and not limitation, the bus may include an Accelerated Graphics Port (AGP) or other graphics bus, an Enhanced Industry Standard Architecture (EISA) bus, a Front Side Bus (FSB), a HyperTransport (HT) interconnect, an Industry Standard Architecture (ISA) bus, an InfiniBand interconnect, a Low Pin Count (LPC) bus, a memory bus, a MicroChannel Architecture (MCA) bus, a Peripheral Component Interconnect (PCI) bus, a PCI-Express (PCI-X) bus, a Serial Advanced Technology Attachment (SATA) bus, a Video Electronics Standards Association Local (VLB) bus, or other suitable buses or a combination of two or more of these. Where appropriate, the bus 1310 may include one or more buses. Although the embodiments of the present application describe and illustrate specific buses, the present application contemplates any suitable bus or interconnect.

[0221] In addition, in combination with the chip layout image processing method in the above embodiments, the embodiments of the present application can be implemented by providing a computer storage medium. Computer program instructions are stored on the computer storage medium; when the computer program instructions are executed by a processor, any one of the chip layout image processing methods in the above embodiments is implemented.

[0222] The embodiments of the present application also provide a computer program product, including a computer program, and when the computer program is executed by a processor, any one of the chip layout image processing methods in the above embodiments is implemented.

[0223] It should be clear that the present application is not limited to the specific configurations and processes described above and illustrated in the figures. For the sake of brevity, the detailed description of known methods is omitted here. In the above embodiments, several specific steps are described and illustrated as examples. However, the method process of the present application is not limited to the specific steps described and illustrated, and those skilled in the art can make various changes, modifications, and additions, or change the order between steps after understanding the spirit of the present application.

[0224] The functional blocks shown in the above-described structural block diagrams can be implemented as hardware, software, firmware, or a combination thereof. When implemented in hardware, it can be, for example, an electronic circuit, an application specific integrated circuit (ASIC), appropriate firmware, a plug-in, a functional card, and so on. When implemented in software, the elements of the present application are programs or code segments for performing the required tasks. The program or code segment can be stored in a machine-readable medium or transmitted over a transmission medium or communication link via a data signal carried in a carrier wave. A "machine-readable medium" can include any medium that can store or transmit information. Examples of machine-readable media include electronic circuits, semiconductor memory devices, ROM, flash memory, erasable ROM (EROM), floppy disks, CD-ROMs, optical disks, hard disks, fiber optic media, radio frequency (RF) links, and so on. The code segment can be downloaded via a computer network such as the Internet, an intranet, and so on.

[0225] It should also be noted that the exemplary embodiments mentioned in the present application describe some methods or systems based on a series of steps or devices. However, the present application is not limited to the order of the above steps, that is, the steps can be executed in the order mentioned in the embodiments, can be different from the order in the embodiments, or several steps can be executed simultaneously.

[0226] Aspects of the present disclosure have been described above with reference to the flowcharts and / or block diagrams of methods, apparatuses (systems), and computer program products according to embodiments of the present disclosure. It should be understood that each block in the flowcharts and / or block diagrams, and the combinations of blocks in the flowcharts and / or block diagrams, can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general purpose computer, a special purpose computer, or other programmable data processing device to produce a machine, such that the instructions executed by the processor of the computer or other programmable data processing device enable the implementation of the functions / actions specified in one or more blocks of the flowcharts and / or block diagrams. Such a processor can be, but is not limited to, a general purpose processor, a special purpose processor, a special application processor, or a field programmable logic circuit. It is also understood that each block in the block diagrams and / or flowcharts, and the combinations of blocks in the block diagrams and / or flowcharts, can also be implemented by dedicated hardware performing the specified functions or actions, or by a combination of dedicated hardware and computer instructions.

[0227] As described above, this is only the specific implementation manner of the present application. Those skilled in the art can clearly understand that for the convenience and brevity of description, the specific working processes of the systems, modules, and units described above can refer to the corresponding processes in the foregoing method embodiments, and will not be elaborated herein. It should be understood that the protection scope of the present application is not limited thereto. Any person skilled in the art within the technical scope disclosed by the present application can easily think of various equivalent modifications or substitutions, and these modifications or substitutions should all be covered within the protection scope of the present application.

Claims

1. A method for processing chip layout images, characterized in that, Including: Obtain a chip layout image, where the chip layout image contains at least one target pattern to be recognized; Determine the basic structure type corresponding to the target pattern according to the line segment position information in the chip layout image; Based on the line segment position information and the line segment angle information in the chip layout image, determine the refined structure type corresponding to the target pattern on the basis of the basic structure type; Perform a rule check on the target pattern in the chip layout image based on the standard structure parameters preset for the refined structure type.

2. The method according to claim 1, wherein The basic structure type includes at least one of a convex structure, a concave structure, and a stepped structure. The stepped structure is a graphic structure composed of at least four continuously adjacent line segments with continuously changing directions, and the two adjacent line segments before and after each line segment are distributed on different sides of this line segment; Determine the basic structure type corresponding to the target pattern according to the line segment position information in the chip layout image, including: According to the line segment position information, determine the positional relationship between multiple line segments in the target pattern and the type of included angle formed between the multiple line segments. The type of included angle includes a convex angle and a concave angle. The convex angle is an included angle with an interior angle less than 180 degrees formed by any two line segments among the multiple line segments, and the concave angle is an included angle with an interior angle greater than 180 degrees formed by any two line segments among the multiple line segments; Determine the basic structure type corresponding to the target pattern according to the positional relationship and included angle type between the multiple line segments.

3. The method according to claim 2, characterized in that The refined structure type includes a rectangular structure, a non-rectangular quadrilateral structure, and a triangular structure; Based on the line segment position information and the line segment angle information in the chip layout image, determine the refined structure type corresponding to the target pattern on the basis of the basic structure type, including: When the basic structure type is the convex structure or the concave structure, determine the shape of the convex or concave part corresponding to the target pattern according to the number of line segments in the target pattern and the positional relationship between the multiple line segments. The shape of the convex or concave part includes a quadrilateral and a triangle; Determine the refined structure type corresponding to the target pattern according to the line segment angle information in the chip layout image and the shape of the convex or concave part. The line segment angle information is used to represent the magnitude of the angle formed between line segments in the chip layout image.

4. The method according to claim 3, characterized in that, Determine the refined structure type corresponding to the target pattern according to the line segment angle information in the chip layout image and the shape of the convex or concave part, including: When the shape of the convex or concave part is a quadrilateral, determine whether the upper side and the lower side of the quadrilateral are parallel, and whether both side edges of the quadrilateral are perpendicular to the upper side and the lower side of the quadrilateral. The side formed by the two non-convex or non-concave endpoints in the shape of the convex or concave part is the lower side, and the side formed by the two convex or concave endpoints is the upper side; If so, determine that the refined structure type corresponding to the target pattern is the rectangular structure; If at least one side of the quadrilateral is not perpendicular to the upper and lower sides of the quadrilateral, when the angle formed between the upper and lower sides of the quadrilateral is less than or equal to a preset line segment angle threshold, determine that the refined structure type corresponding to the target figure is the non-rectangular quadrilateral structure.

5. The method according to claim 3, characterized in that, Determine the refined structure type corresponding to the target figure according to the line segment angle information and the concave-convex part shape in the chip layout image, including: When the concave-convex part shape is the triangle, determine whether the angles of two line segments adjacent to the concave-convex part of the target figure are not greater than the preset line segment angle threshold; If so, determine that the refined structure type corresponding to the target figure is the triangle structure.

6. The method according to claim 2, wherein The refined structure type also includes a right-angle step structure and a bevel step structure; Determine the refined structure type corresponding to the target figure on the basis of the basic structure type according to the line segment position information and the line segment angle information in the chip layout image, including: When the basic structure type is the step structure, determine whether all the line segments in the target figure are line segments parallel to the horizontal axis direction or the vertical axis direction of the two-dimensional plane rectangular coordinate system with any point in the chip layout image as the origin; If so, determine that the refined structure type corresponding to the target figure is the right-angle step structure, and the right-angle step structure is a graphic structure composed of at least four continuously adjacent and continuously changing-direction line segments parallel to the horizontal axis direction or the vertical axis direction, and the two adjacent line segments before and after each line segment parallel to the horizontal axis direction or the vertical axis direction are distributed on different sides of this line segment; If not, determine that the refined structure type corresponding to the target figure is the bevel step structure; the bevel step structure is a graphic structure composed of at least four continuously adjacent and continuously changing-direction oblique line segments, and the two adjacent line segments before and after each oblique line segment are distributed on different sides of this oblique line segment, and the oblique line segment is not parallel to the horizontal axis direction and the vertical axis direction.

7. The method according to claim 1, characterized in that Perform a rule check on the target figure in the chip layout image based on the standard structure parameters preset for the refined structure type, including: Based on the standard structure parameters preset for the refined structure type, determine the image area of the target figure in the chip layout image as the target area; Perform a marking process on the target area, and use the chip layout image after the marking process as the rule check result corresponding to the target figure.

8. The method according to claim 1, characterized in that, The chip layout image is a design layout image; Perform a rule check on the target figure in the chip layout image based on the standard structure parameters preset for the refined structure type, including: Perform a design rule check on the target figure in the design layout image based on the standard structure parameters preset for the refined structure type.

9. The method according to claim 1, wherein The chip layout image is a chip mask image; Perform a rule check on the target figure in the chip layout image based on the standard structure parameters preset for the refined structure type, including: Based on the standard structure parameters preset according to the refined structure type, mask rule checking is performed on the target pattern in the chip mask image.

10. A computer program product, characterized in that, When the instructions in the computer program product are executed by a processor of an electronic device, the electronic device is caused to execute the chip layout image processing method according to any one of claims 1-8.

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