Silicon wafer marking method and silicon wafer
By generating QR codes on the surface of the silicon wafer and adjusting laser parameters in real time, the problem of inability to bind information and low efficiency of silicon wafer marking equipment is solved, and efficient and clean silicon wafer coding is achieved.
Patent Information
- Application Number
- CN202510804534.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-06-16
- Publication Date
- 2025-09-05
AI Technical Summary
Existing silicon wafer marking equipment cannot achieve the binding of QR codes and silicon wafer information, the marking efficiency is low, and the lack of dust removal mechanisms lead to silicon wafer contamination.
The fly dynamic marking laser is used to generate a QR code on the surface of the silicon wafer, and the information is restored by decoding the module, combined with the vacuum cleaner module to remove silicon powder, and the central control module adjusts the laser parameters in real time to ensure the coding quality.
The binding of silicon wafer QR code and information has been achieved, the marking efficiency and quality have been improved, the pollution of silicon wafers has been reduced, and the accuracy and consistency of coding have been ensured.
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Figure CN120587684A_ABST
Abstract
Citation Information
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