Preparation method of iron-chromium-aluminum alloy and electric heating element

Abstract

The invention provides a preparation method of an iron-chromium-aluminum alloy and an electric heating element. The preparation method comprises the following steps: preparing an alloy base material from an iron-chromium-aluminum alloy raw material; carrying out surface pretreatment on the alloy base material; injecting a non-metal ion source into the alloy base material; carrying out rapid thermal annealing treatment on the alloy base material after ion implantation to prepare the iron-chromium-aluminum alloy; the electric heating element is formed by processing the iron-chromium-aluminum alloy, and the iron-chromium-aluminum alloy is manufactured by adopting the preparation method. According to the preparation method of the iron-chromium-aluminum alloy, the non-metal ion source is doped into the iron-chromium-aluminum alloy base material through the ion implantation process, vacancy clusters are introduced below the surface layer of the alloy base material, and the nano defects are stabilized and homogenized in combination with the rapid heat treatment technology; the electron scattering mechanism of the iron-chromium-aluminum alloy is effectively regulated and controlled, the resistivity is remarkably improved, and the TCR is highly stable.

Description

Technical Field

[0001] This application relates to the field of structural optimization technology of alloy materials, specifically to a method for preparing an iron-chromium-aluminum alloy and an electric heating element. Background Technology

[0002] As the core heating element of an electronic atomizing device, the heating element is generally made of alloy materials such as iron-chromium-aluminum alloy (FeCrAl), nickel-chromium alloy, and titanium alloy. The resistivity of the alloy material directly affects the power and heating efficiency of the heating element. It is necessary to precisely match the requirements of the battery and control system to achieve rapid heating and ideal vapor generation.

[0003] However, traditional methods for optimizing the structure of alloy materials, such as simple composition adjustments or conventional heat treatment, often fail to achieve synergistic optimization of the two key electrical parameters: resistivity and total resistance coefficient (TCR). Especially in electronic atomization device applications where high purity and microstructure consistency of alloy materials are required, how to more precisely control the intrinsic electrical properties of materials has become a pressing technical challenge. Summary of the Invention

[0004] This application provides a method for preparing an iron-chromium-aluminum alloy and an electric heating element to synergistically optimize the resistivity and TCR (temperature coefficient of resistance) of the alloy material. The method for preparing the iron-chromium-aluminum alloy provided in this application effectively controls the electron scattering mechanism of the iron-chromium-aluminum alloy, thereby achieving a significant increase in resistivity and a high degree of stability in TCR (temperature coefficient of resistance).

[0005] In some embodiments of this application, a method for preparing an iron-chromium-aluminum alloy is provided. The method includes: forming an iron-chromium-aluminum alloy raw material into an alloy substrate with a predetermined shape; performing surface pretreatment on the alloy substrate to remove the oxide layer and / or residual stress on the surface of the alloy substrate; implanting a non-metallic ion source into the alloy substrate to introduce vacancy clusters at a predetermined depth below the surface of the alloy substrate; and performing rapid thermal annealing on the ion-implanted alloy substrate to obtain the iron-chromium-aluminum alloy.

[0006] In some embodiments, surface pretreatment of the alloy substrate further includes removing contaminants and rough layers from the surface of the alloy substrate.

[0007] In some embodiments, the shape of the alloy substrate includes any one of the following: sheet-like, plate-like, block-like, column-like, filament-like, mesh-like, or a combination of at least two of these shapes;

[0008] The interior of the alloy substrate may be solid or at least partially hollow.

[0009] In some embodiments, the surface pretreatment includes one or more of polishing, surface cleaning, and pre-annealing.

[0010] In some embodiments, the polishing process includes one or more of mechanical polishing, chemical polishing, and electrochemical polishing.

[0011] In some embodiments, the non-metallic ion source is selected from one or more inert gas ions.

[0012] In some embodiments, the implantation energy of the non-metallic ion source is between 50 keV and 150 keV, and the implantation dose is between 2 × 10⁻⁶. 15 ions / cm 2 ~8×10 15 ions / cm 2 .

[0013] In some embodiments, the non-metallic ion source includes neon ions, wherein the neon ion implantation energy is 50 keV and the implantation dose is 2 × 10⁻⁶. 15 ions / cm 2 The injection temperature is between 20°C and 30°C; and / or, the non-metallic ion source includes argon ions, wherein the argon ion injection energy is 100 keV and the injection dose is 5 × 10⁻⁶. 15 ions / cm 2 The injection temperature is between 20°C and 30°C; and / or, the non-metallic ion source includes krypton ions, wherein the injection energy of the krypton ions is 150 keV and the injection dose is 8 × 10⁻⁶. 15 ions / cm 2 The injection temperature is between 90℃ and 100℃.

[0014] In some embodiments, the rapid thermal annealing treatment of the ion-implanted alloy substrate includes: heating the alloy substrate at a rate of 50°C / s to 100°C / s; annealing the alloy substrate when the temperature reaches 900°C to 1000°C, and holding it at the preset annealing temperature for 30s to 60s; wherein the annealing process before holding is carried out in a flowing inert gas, and the alloy substrate after holding is cooled in nitrogen or an inert gas.

[0015] In some embodiments, the iron-chromium-aluminum alloy raw material includes 021CrAl6.

[0016] In some embodiments of this application, an electrothermal element is provided, which is applied in an atomizing device to atomize an atomizing matrix and generate an aerosol. The electrothermal element is formed from an iron-chromium-aluminum alloy, which is manufactured using any of the iron-chromium-aluminum alloy preparation methods described above.

[0017] The method for preparing iron-chromium-aluminum alloy provided in this application involves doping a non-metallic ion source into an iron-chromium-aluminum alloy substrate using a high-energy ion implantation process. This process introduces precisely controllable vacancy clusters at a predetermined depth below the surface of the alloy substrate. Combined with rapid heat treatment technology, these nano-defects are stabilized and homogenized, thereby effectively controlling the electron scattering mechanism of the iron-chromium-aluminum alloy. This results in a significant increase in resistivity and a high degree of stability in the TCR (temperature coefficient of resistance). Attached Figure Description

[0018] The present invention will be further described below with reference to the accompanying drawings and embodiments. In the accompanying drawings:

[0019] Figure 1 This is a schematic diagram of the preparation process of an iron-chromium-aluminum alloy according to one embodiment of this application;

[0020] Figure 2 This is a schematic diagram of the process of rapid thermal annealing of the alloy substrate after ion implantation in one embodiment of the preparation method of iron-chromium-aluminum alloy of this application. Detailed Implementation

[0021] The technical solution of this application will be further described in detail below through specific embodiments. In the following embodiments, many details are described in order to enable this application to be better understood. However, those skilled in the art will readily recognize that some features may be omitted in different situations, or may be replaced by their components, materials, or methods.

[0022] Please see Figure 1 In some embodiments of this application, a method for preparing an iron-chromium-aluminum alloy is provided, the method comprising:

[0023] Iron-chromium-aluminum alloy raw materials are made into alloy substrates with a preset shape, wherein the preset shape refers to a solid shape with a preset shape and occupying a certain space.

[0024] The obtained alloy substrate is subjected to surface pretreatment to remove the oxide layer and residual stress on the surface of the alloy substrate.

[0025] A non-metallic ion source is implanted into the pretreated alloy substrate using an ion implantation process to introduce vacancy clusters at a predetermined depth below the surface of the alloy substrate.

[0026] Iron-chromium-aluminum alloys were prepared by rapid thermal annealing (RTA) on the ion-implanted alloy substrate.

[0027] The method for preparing iron-chromium-aluminum alloy provided in this application actively introduces vacancy clusters into the surface of the pre-treated alloy substrate through a high-energy ion implantation process, rather than relying on traditional alloy material structure optimization methods (such as simple composition adjustment or conventional heat treatment). This method controls the resistivity from the perspective of electron scattering mechanism, effectively avoiding the increase in material brittleness caused by traditional alloy material structure optimization methods.

[0028] Furthermore, the method of this application combines rapid heat treatment with annealing of the ion-implanted alloy substrate, thereby stabilizing and homogenizing the actively introduced defects. This effectively regulates the electron scattering mechanism of the iron-chromium-aluminum alloy, resulting in a significant increase in resistivity and high stability of the TCR (temperature coefficient of resistance). This solves the technical problem that traditional alloy material structural optimization methods struggle to achieve synergistic optimization of these two key electrical parameters. The iron-chromium-aluminum alloy prepared using the method of this application achieves a significant increase in alloy material resistivity and high stability of the TCR, making it suitable for use in the heating elements of electronic atomization devices where high purity and microstructure consistency of the alloy material are required.

[0029] In some embodiments, surface pretreatment of the alloy substrate further includes removing contaminants and rough layers from the surface of the alloy substrate. For example, polishing or surface cleaning can be used to remove dust, impurities, oil, and other contaminants from the surface of the alloy substrate, and to remove the rough layer from the surface of the alloy substrate, so that the surface roughness of the alloy substrate meets the requirements of the subsequent high-energy ion implantation process.

[0030] In some embodiments, the alloy substrate in the method of this application has the shape of any one of the following: sheet-like, plate-like, block-like, column-like, filament-like, mesh-like, or a combination of at least two of these shapes. The interior of the alloy substrate may be solid or at least partially hollow.

[0031] The specific shape of the alloy substrate can be selected according to the specific field and application scenario where the iron-chromium-aluminum alloy is to be applied, or it can be selected to facilitate subsequent surface pretreatment, high-energy particle injection and other steps. This application does not limit this.

[0032] In some embodiments, surface pretreatment includes one or more of polishing, surface cleaning, and pre-annealing. After polishing and surface cleaning, dust, impurities, oil, and other contaminants are thoroughly removed from the alloy substrate surface, along with the rough layer and oxide layer. This ensures that the surface roughness of the alloy substrate meets the requirements of subsequent high-energy ion implantation processes, guaranteeing the introduction of precisely controllable vacancy clusters at a predetermined depth on the alloy substrate surface. After pre-annealing, residual stress in the alloy substrate is thoroughly removed to prevent increased material brittleness and ensure the smooth progress of subsequent high-energy ion implantation and rapid heat treatment steps.

[0033] Among the surface pretreatment methods such as polishing, surface cleaning, and pre-annealing, only one method can be selected, or at least two methods can be selected. When multiple methods are used to pretreat the alloy substrate, the order of each treatment method can be freely chosen. This application does not limit this. The surface pretreatment steps can thoroughly remove surface contaminants, rough layers, oxide layers, and residual stress from the alloy substrate, so that the pretreated alloy substrate meets the requirements of subsequent high-energy particle injection and rapid heat treatment processes.

[0034] Contaminants such as oil and dust can alter the trajectory of high-energy particles, leading to uneven injection depth and dose distribution, and creating localized "blind spots" or over-injection areas. By removing contaminants from the surface of the alloy substrate to be injected with high-energy particles, the injection depth and dose distribution can be made more uniform, and the injection efficiency can be improved to reduce energy loss during the injection process.

[0035] Furthermore, by removing the rough layer on the surface of the alloy substrate to be injected with high-energy particles, the scattering probability of high-energy particles on the surface of the alloy substrate is reduced, thereby avoiding random fluctuations in the injected dose in space and improving uniformity.

[0036] The oxide layer on the surface of the alloy substrate to be injected with high-energy particles is removed to avoid slowing down the particle injection rate or to avoid blocking particle penetration, which would result in insufficient injection layer thickness.

[0037] Furthermore, by removing residual stress from the surface of the alloy substrate to be implanted with high-energy particles, the residual stress can be prevented from altering the material's lattice constant, affecting the particle diffusion rate within the lattice, and causing the implantation depth to deviate from the design value. Simultaneously, it can also prevent preferential plastic deformation in high residual stress regions, which could absorb some particle energy and reduce implantation efficiency.

[0038] In some embodiments, the surface cleaning process includes: ultrasonically cleaning the alloy substrate in acetone and ethanol for 15 minutes each, followed by rinsing with deionized water and drying. The surface cleaning process can be performed after polishing. Acetone and ethanol, as organic solvents, combined with ultrasonic cleaning, can effectively remove water-insoluble organic impurities (such as oil) from the surface of the alloy substrate. Furthermore, acetone and ethanol do not chemically react with the alloy substrate and can completely evaporate during subsequent drying, avoiding the adverse effects of solvent residue on subsequent high-energy ion implantation and rapid thermal treatment steps.

[0039] In some embodiments, the polishing process in the surface pretreatment step includes one or more of mechanical polishing, chemical polishing, and electrochemical polishing. Polishing the alloy substrate effectively removes surface defects such as rough layers and oxide layers, making the substrate surface smoother and more even to meet the process requirements of subsequent processing steps. In actual manufacturing, a suitable polishing method can be selected based on the specific material of the alloy substrate, surface contaminants, surface roughness, and other actual conditions; this application does not impose any limitations on this.

[0040] Among the polishing methods of mechanical polishing, chemical polishing, and electrochemical polishing, only one method can be selected, or at least two methods can be selected. Each method can be performed only once or repeatedly. When multiple methods are used to polish the alloy substrate, the order and number of repetitions of each method can be freely selected. This application does not limit this. As long as the surface contaminants, rough layer, and oxide layer of the alloy substrate can be completely removed through the polishing process, the pre-treated alloy substrate can meet the requirements of subsequent high-energy particle injection and rapid heat treatment processes.

[0041] In some embodiments, the non-metallic ion source in the high-energy ion implantation process is selected from one or more inert gas ions. Inert gas ions include helium ions, neon ions, argon ions, krypton ions, xenon ions, and radon ions. Compared with active ions of other types of ion sources (such as C, N, B, etc.), the modification mechanism of inert gas ions relies more on physical defect reinforcement than chemical bonding reinforcement, which can avoid the introduction of brittle phases due to chemical reactions.

[0042] Inert gas ion implantation, through the physical interaction between high-energy ions and the surface of the alloy substrate, produces structural changes such as lattice distortion, defects, and amorphization. It can introduce precisely controllable vacancy clusters at a predetermined depth on the surface of the alloy substrate, which can hinder grain growth at high temperatures (pinning grain boundaries), improve the surface resistance to thermal deformation of the alloy substrate, thereby improving the surface hardness, wear resistance, corrosion resistance, and fatigue resistance of the alloy substrate, and achieving a significant increase in the resistivity of the alloy substrate and a high degree of stability of TCR (temperature coefficient of resistance).

[0043] In some embodiments, the implantation energy of the non-metallic ion source is between 50 keV and 150 keV, and the implantation dose is between 2 × 10⁻⁶. 15 ions / cm 2 ~8×10 15 ions / cm 2 The injection process can be carried out in a vacuum environment. Non-metallic ions are accelerated in a high-voltage electric field to obtain high energy (50keV~150keV), which gives the high-energy non-metallic ions enough kinetic energy to penetrate the surface of the alloy substrate. The ion penetration depth is generally in the nanometer to micrometer range, and the specific penetration depth depends on the ion energy and the density of the alloy substrate.

[0044] When inert gas ions are used as a non-metallic ion source, the high-energy inert gas ions undergo elastic collisions with atoms in the alloy substrate lattice, transferring kinetic energy to the target atoms. This causes the target atoms to detach from their original lattice positions, forming "vacancies," while the inert gas ions themselves gradually decelerate due to energy loss. Numerous collisions generate dense point defects (vacancies, interstitial atoms), dislocations, and even lattice distortions, ultimately forming a non-equilibrium defect structure. Inert gas ions, due to high-dose injection, aggregate to form nanoscale vacancy clusters.

[0045] In some embodiments, the non-metallic ion source includes neon ions, and the neon ion injection energy is 50 keV and the injection dose is 2 × 10⁻⁶. 15 ions / cm 2 The injection temperature is between 20℃ and 30℃.

[0046] Alternatively, in some embodiments, the non-metallic ion source includes argon ions, with an implantation energy of 100 keV and an implantation dose of 5 × 10⁻⁶. 15 ions / cm 2 The injection temperature is between 20℃ and 30℃.

[0047] Alternatively, in some embodiments, the non-metallic ion source includes krypton ions, with an implantation energy of 150 keV and an implantation dose of 8 × 10⁻⁶. 15 ions / cm 2 The injection temperature is between 90℃ and 100℃.

[0048] The method for preparing iron-chromium-aluminum alloy provided in this application optimizes the ion implantation energy and implantation metering according to the properties of different inert gas ions, and optimizes the ion implantation temperature according to the properties of different inert gas ions, which further promotes the uniform formation of vacancy clusters of different inert gas ions and effectively reduces the anisotropy of defects generated during the implantation of different inert gas ions.

[0049] Please see Figure 2In some embodiments, the ion-implanted alloy substrate is subjected to rapid thermal annealing treatment, including: heating the ion-implanted alloy substrate at 50°C / s to 100°C / s; annealing the alloy substrate when the temperature reaches 900°C to 1000°C, and holding it at the preset annealing temperature for 30s to 60s.

[0050] The annealing process before heat preservation is carried out in a flowing inert gas, and the alloy substrate after heat preservation is cooled in nitrogen or an inert gas.

[0051] The selection of inert gas can be consistent with the selection of inert gas ions; or, the selection of inert gas can be inconsistent with the selection of inert gas ions; or, the selection of inert gas can be partially consistent with and partially inconsistent with the selection of inert gas ions.

[0052] The method for preparing the iron-chromium-aluminum alloy provided in this application employs a rapid thermal annealing (RTA) process to anneal the ion-implanted alloy substrate. Furthermore, the method optimizes and improves the control of the heating rate and annealing temperature in the annealing process. This effectively solves the problems of lattice distortion, stress concentration, and poor defect stability caused by the introduction of vacancy defects after ion implantation. It promotes the recombination and stabilization of vacancy defects introduced into the alloy substrate, thoroughly releases residual stress in the alloy substrate, optimizes the overall performance of the alloy substrate, and ultimately obtains an iron-chromium-aluminum alloy with synergistic optimization of the two key electrical parameters: resistivity and TCR (temperature coefficient of resistance).

[0053] In some embodiments, the iron-chromium-aluminum alloy raw material includes 021CrAl6, which is a low-cost ferritic stainless steel alloy material that combines corrosion resistance and certain high-temperature performance, suitable for industrial and civil applications in moderately corrosive environments and non-extreme high-temperature environments.

[0054] This application uses 021CrAl6 as the raw material for an iron-chromium-aluminum alloy. After forming the alloy substrate into a predetermined shape, it is surface modified using the aforementioned surface pretreatment process, high-energy ion implantation process, and rapid heat treatment process. Finally, an iron-chromium-aluminum alloy with synergistic optimization of the two key electrical parameters, resistivity and TCR (temperature coefficient of resistance), is obtained. The obtained iron-chromium-aluminum alloy not only has better surface hardness, wear resistance, corrosion resistance, and fatigue resistance, but also achieves a significant increase in the resistivity of the alloy material and a high degree of stability in the TCR. It can be used in the heating elements of electronic atomization devices with high requirements for alloy material purity and microstructure consistency.

[0055] In some embodiments of this application, an electric heating element is provided, which is applied in an atomizing device to atomize the atomizing medium and generate an aerosol. The electric heating element is formed by processing an iron-chromium-aluminum alloy, which is manufactured using any of the iron-chromium-aluminum alloy preparation methods described above. This results in the electric heating element not only having better surface hardness, wear resistance, corrosion resistance, and fatigue resistance, but also achieving a significant increase in the resistivity of the alloy material and a high degree of stability in the TCR (temperature coefficient of resistance).

[0056] A stable TCR ensures that the heating element of the atomizer maintains a consistent heating power under different vaping frequencies and durations, preventing drastic temperature changes during operation. This results in a stable vapor production and flavor, helps avoid localized overheating or underheating of the heating element during operation, and significantly improves user experience and safety.

[0057] The technical solutions of this application are further illustrated below through several specific embodiments and comparative examples. The technical details disclosed in each specific embodiment are only used to illustrate the technical solutions of this application and are not intended to limit the technical solutions of this application. The parameters of the following steps can be adaptively adjusted according to actual needs. The parameters are only illustrative and not the only limitation.

[0058] For example, a method for preparing an iron-chromium-aluminum alloy is provided, comprising the following steps:

[0059] S1. Sample Preparation: A plate-shaped alloy substrate made of 021CrAl6 iron-chromium-aluminum alloy material is selected and cut into samples of suitable size. For example, the plate-shaped alloy substrate can be cut into samples with a length of 10mm, a width of 10mm, and a thickness of 0.1mm. The cut plate-shaped alloy substrate samples undergo surface pretreatment. Mechanical polishing can be used to grind the surface of the plate-shaped alloy substrate sample to a mirror finish to remove the rough layer and oxide layer on the sample surface. Then, the polished alloy substrate sample is ultrasonically cleaned in acetone and ethanol for 15 minutes each to thoroughly remove contaminants from the sample surface. Finally, the sample is rinsed with deionized water and dried.

[0060] S2. High-energy ion implantation: The pre-treated plate-shaped alloy substrate sample is fixed on the sample stage of the ion implanter, ensuring that the ion beam can uniformly bombard the surface of the plate-shaped alloy substrate sample. A non-metallic ion source is implanted into the pre-treated plate-shaped alloy substrate sample using ion implantation technology. The non-metallic ion source selected is argon ions (Ar). + The preset injection energy is 100 keV, and the ion beam current density is controlled at approximately 1 μA / cm². 2 The injection dose is preset to 5×10 15 ions / cm 2The injection process was carried out at room temperature (approximately 20℃~30℃) and under high vacuum. By controlling the above parameters, an average density of approximately 5×10⁻⁶ was formed beneath the surface of the plate-shaped alloy substrate sample. 18 cm -3 Empty clusters.

[0061] S3. Rapid Heat Treatment (RTA): The plate-shaped alloy substrate sample, after high-energy ion implantation, is rapidly transferred to a rapid heat treatment device for rapid thermal annealing. The preset annealing program is as follows: the heating rate is controlled at approximately 50–100 °C / s, the preset annealing temperature is set to 950 °C, and the temperature is held for 45 seconds after reaching the preset annealing temperature. The entire rapid heat treatment is carried out under a flowing nitrogen atmosphere (N2, purity ≥99.999%). After the holding period, the alloy substrate sample is rapidly cooled in a nitrogen atmosphere to obtain the modified iron-chromium-aluminum alloy sample I.

[0062] S4. Performance characterization: The resistivity and TCR of the iron-chromium-aluminum alloy sample I obtained after the S1-S3 steps were tested. The test results showed that the resistivity of the iron-chromium-aluminum alloy sample I could be increased to about 175 μΩ·cm, and the TCR change was controlled within ±3%.

[0063] Furthermore, a method for preparing an iron-chromium-aluminum alloy is also provided, comprising the following steps:

[0064] S1. Sample Preparation: A 0.1mm diameter filament alloy substrate was prepared from 021CrAl6 iron-chromium-aluminum alloy material and cut into appropriately sized samples. The cut filament alloy substrate samples underwent surface pretreatment. Electrochemical polishing was used to achieve a smooth surface, removing the rough layer, oxide layer, and contaminants. The samples were then pre-annealed in an inert atmosphere to remove residual stress. Finally, the samples were rinsed with deionized water and dried.

[0065] S2. High-energy ion implantation: The surface-pretreated filamentary alloy substrate sample is fixed on the sample stage of the ion implanter, ensuring that the ion beam can uniformly bombard the surface of the filamentary alloy substrate sample. A non-metallic ion source is implanted into the surface-pretreated filamentary alloy substrate sample using ion implantation technology. The non-metallic ion source selected is krypton ions (Kr). + The preset injection energy is 150 keV, and the preset injection dose is 8 × 10⁻⁶. 15 ions / cm 2To promote initial defect nucleation, the sample stage temperature can be maintained at 100°C during the implantation process, and the implantation process can be carried out in a high vacuum environment. By controlling these parameters, an average density of approximately 1×10⁻⁶ can be formed beneath the surface of the filamentous alloy substrate sample. 19 cm -3 Empty clusters.

[0066] S3. Rapid Thermal Treatment (RTA): The high-energy ion-implanted filamentary alloy substrate sample is rapidly transferred to a rapid thermal treatment device for rapid thermal annealing. The preset annealing program is as follows: the heating rate is controlled at approximately 80℃ / s, the preset annealing temperature is set to 900℃, and the temperature is held for 60 seconds after reaching the preset annealing temperature. The entire rapid thermal treatment is carried out under a flowing argon atmosphere (Ar, purity ≥99.999%). After the holding period, the filamentary alloy substrate sample is rapidly cooled in an argon atmosphere to obtain the modified iron-chromium-aluminum alloy sample II.

[0067] S4. Performance characterization: The resistivity and TCR of the iron-chromium-aluminum alloy sample II prepared after the S1-S3 steps were tested. The test results showed that the resistivity of the iron-chromium-aluminum alloy sample II could be increased to about 180 μΩ·cm, and the TCR change was controlled within ±4%.

[0068] Furthermore, a method for preparing an iron-chromium-aluminum alloy is also provided, comprising the following steps:

[0069] S1. Sample Preparation: Select 021CrAl 6 iron-chromium-aluminum alloy material to make a sheet (foil or sheet) alloy substrate with a thickness of 0.1mm. Cut or etch the sheet alloy substrate into a specific shape (such as a mesh) and a suitable size. Perform surface pretreatment on the prepared alloy substrate sample. Ultrasonic cleaning can be used to clean the surface of the alloy substrate sample to remove oil and other contaminants. If necessary, a light chemical polishing method can be used to treat the surface of the alloy substrate sample to a smooth finish to remove the rough layer, oxide layer, etc. Finally, rinse the sample with deionized water and dry it.

[0070] S2. High-energy ion implantation: The pre-treated alloy substrate sample of a specific shape is fixed on the sample stage of the ion implanter, ensuring that the ion beam can uniformly bombard the surface of the sample. A non-metallic ion source is implanted into the pre-treated alloy substrate sample using ion implantation. The non-metallic ion source selected is neon ions (Ne...). + The preset implantation energy is 50 keV (which can be adjusted according to the thickness of the alloy substrate sample with a specific shape to ensure that ion implantation mainly affects the near-surface region of the material), and the preset implantation dose is 2 × 10⁻⁶. 15ions / cm 2 The injection process was carried out at room temperature (approximately 20℃~30℃) and under high vacuum. By controlling these parameters, an average density of approximately 8×10⁻⁶ was formed beneath the surface of alloy substrate samples of a specific shape. 18 cm -3 Empty clusters.

[0071] S3. Rapid Heat Treatment (RTA): A high-energy ion-implanted alloy substrate sample of a specific shape is rapidly transferred to a rapid heat treatment apparatus for rapid thermal annealing. The preset annealing program is as follows: heating rate controlled at approximately 100°C / s, preset annealing temperature set at 1000°C, and holding at the preset annealing temperature for 30 seconds after reaching the preset annealing temperature. The entire rapid heat treatment process is conducted in a high-purity vacuum (e.g., better than 1×10⁻⁶). -4 The process is carried out under conditions of Pa or in a protective atmosphere of flowing high-purity inert gas (such as argon) to avoid oxidation or contamination of the sample at high temperatures. After the heat treatment is completed, the alloy substrate sample of a specific shape is rapidly cooled in the same atmosphere to obtain the modified iron-chromium-aluminum alloy sample III.

[0072] S4. Performance characterization: The resistivity and TCR of the iron-chromium-aluminum alloy sample III obtained after the S1-S3 steps were tested. The test results showed that the resistivity of the iron-chromium-aluminum alloy sample III could be increased to about 170 μΩ·cm, and the TCR change was controlled within ±5%.

[0073] Furthermore, a method for preparing an iron-chromium-aluminum alloy includes the following steps:

[0074] S1. Sample Preparation: Select 021CrAl 6 iron-chromium-aluminum alloy material to make a sheet (foil or sheet) alloy substrate with a thickness of 0.1mm. Cut or etch the sheet alloy substrate into a specific shape (such as a mesh) and a sample of appropriate size. Perform surface pretreatment on the prepared alloy substrate sample. Ultrasonic cleaning can be used to clean the surface of the alloy substrate sample to remove oil and other contaminants. If necessary, a slight chemical polishing method can also be used to treat the surface of the alloy substrate sample to a smooth finish to remove the rough layer, oxide layer, etc. Finally, rinse the sample with deionized water and blow dry to obtain iron-chromium-aluminum alloy sample IV.

[0075] S2. Performance characterization: The resistivity and TCR of the iron-chromium-aluminum alloy sample IV prepared after step S1 were tested. The test results are shown in Table 1 below.

[0076] Experimental group Resistivity (μΩ·cm) TCR (ppm / ℃) Iron-chromium-aluminum alloy sample I 175 37～43 Iron-chromium-aluminum alloy sample II 180 36～44 Iron-chromium-aluminum alloy sample III 170 35～45 Iron-chromium-aluminum alloy sample IV 140 40

[0077] Table 1 - Performance test results of iron-chromium-aluminum alloy samples prepared in each embodiment and comparative example

[0078] As can be seen from the test results in Table 1, the iron-chromium-aluminum alloy samples I-III prepared using the technical solution of this application have a relatively higher resistivity compared to the iron-chromium-aluminum alloy sample IV prepared without the technical solution of this application. Furthermore, the TCR change is controlled within ±3% to ±5%, achieving a significant increase in resistivity and a highly stable temperature coefficient of resistance. This effectively suppresses the TCR drift of the iron-chromium-aluminum alloy, meeting the high requirements of the heating element for resistivity and TCR consistency. Consequently, the heating element manufactured using the iron-chromium-aluminum alloy prepared using the technical solution of this application has relatively better electrothermal performance. When the heating element prepared using the technical solution of this application is applied to an atomizing device, it ensures that the heating power of the heating element remains consistent under different inhalation frequencies and durations, thereby providing a stable amount of vapor and flavor. It also helps to avoid problems such as localized overheating or insufficient heating of the heating element, significantly improving user experience and safety.

[0079] The above examples illustrate the technical solution of this application only to aid in understanding its content and are not intended to limit the scope of this application. Those skilled in the art to which this application pertains can make several simple deductions, modifications, or substitutions based on the ideas presented in this application.

Claims

1. A method for preparing an iron-chromium-aluminum alloy, characterized in that, The method includes: Iron-chromium-aluminum alloy raw materials are made into alloy substrates with a predetermined shape; The alloy substrate is subjected to surface pretreatment to remove the oxide layer and / or residual stress on the surface of the alloy substrate; A non-metallic ion source is injected into the alloy substrate to introduce vacancy clusters at a predetermined depth below the surface of the alloy substrate. The iron-chromium-aluminum alloy was obtained by rapidly annealing the ion-implanted alloy substrate.

2. The method for preparing the iron-chromium-aluminum alloy according to claim 1, characterized in that, The alloy substrate may be any one of the following shapes: sheet, plate, block, column, filament, mesh, or a combination of at least two of these shapes; The interior of the alloy substrate may be solid or at least partially hollow.

3. The method for preparing the iron-chromium-aluminum alloy according to claim 1, characterized in that, The surface pretreatment includes one or more of the following: polishing, surface cleaning, and pre-annealing.

4. The method for preparing the iron-chromium-aluminum alloy according to claim 3, characterized in that, The polishing process includes one or more of mechanical polishing, chemical polishing, and electrochemical polishing.

5. The method for preparing the iron-chromium-aluminum alloy according to claim 1, characterized in that, The non-metallic ion source is selected from one or more inert gas ions.

6. The method for preparing the iron-chromium-aluminum alloy according to claim 5, characterized in that, The non-metallic ion source has an injection energy of 50 keV to 150 keV and an injection dose of 2 × 10⁻⁶. 15 ions / cm 2 ~8×10 15 ions / cm 2 .

7. The method for preparing the iron-chromium-aluminum alloy according to claim 6, characterized in that, The non-metallic ion source includes neon ions, and the implantation energy of the neon ions is 50 keV and the implantation dose is 2 × 10⁻⁶. 15 ions / cm 2 The injection temperature is between 20℃ and 30℃; And / or, the non-metallic ion source includes argon ions, wherein the argon ion injection energy is 100 keV and the injection dose is 5 × 10⁻⁶. 15 ions / cm 2 The injection temperature is between 20℃ and 30℃; And / or, the non-metallic ion source includes krypton ions, wherein the implantation energy of the krypton ions is 150 keV and the implantation dose is 8 × 10⁻⁶. 15 ions / cm 2 The injection temperature is between 90℃ and 100℃.

8. The method for preparing the iron-chromium-aluminum alloy according to claim 5, characterized in that, The rapid thermal annealing treatment of the alloy substrate after ion implantation includes: The alloy substrate is heated at a rate of 50℃ / s to 100℃ / s. When the temperature of the alloy substrate reaches 900℃~1000℃, the alloy substrate is annealed, and after reaching the preset annealing temperature, it is held for 30S~60S. The annealing process before heat preservation is carried out in a flowing inert gas, and the alloy substrate after heat preservation is cooled in nitrogen or an inert gas.

9. The method for preparing the iron-chromium-aluminum alloy according to any one of claims 1-8, characterized in that, The iron-chromium-aluminum alloy raw material includes: 021CrAl6.

10. An electrothermal element, used in an atomizing device, for atomizing an atomizing matrix and generating an aerosol, characterized in that, The heating element is formed from an iron-chromium-aluminum alloy, which is manufactured using the preparation method of the iron-chromium-aluminum alloy according to any one of claims 1-9.

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