Window assembly, monitoring device and semiconductor process equipment

Abstract

The application discloses a window assembly, a monitoring device and a semiconductor process equipment, and belongs to the technical field of semiconductors. The window assembly comprises a mounting base, a protective window and an observation window. The mounting base is provided with a light transmission channel. The protective window is arranged in the light transmission channel. A first end of the light transmission channel is used for being opposite to a monitoring hole of a process chamber of the semiconductor process equipment. The observation window is connected with the mounting base and is opposite to a second end of the light transmission channel. The mounting base is further provided with at least two voltage stabilizing channels. The voltage stabilizing channels are symmetrically arranged on two sides of an axis of the light transmission channel. The protective window divides the light transmission channel into a first channel part and a second channel part. First ends of the voltage stabilizing channels are in communication with the first channel part. Second ends of the voltage stabilizing channels are in communication with the second channel part. The monitoring device comprises the above-mentioned window assembly and a signal processor. The signal processor is connected with the window assembly, and a signal interface of the signal processor is opposite to the observation window.

Description

Technical Field

[0001] This application belongs to the field of semiconductor technology, specifically relating to a window component, a monitoring device, and semiconductor process equipment. Background Technology

[0002] In the manufacturing process of integrated circuits, etching machines are essential semiconductor process equipment. As the etching process gradually shrinks and the wafer film structure becomes increasingly complex, the control and monitoring of the etching process becomes indispensable.

[0003] In related technologies, monitoring devices for semiconductor process equipment mainly utilize the OES (Optical Emission Spectroscopy) method to collect the spectrum of plasma during the etching process. By analyzing the spectrum, real-time monitoring of the plasma can be achieved.

[0004] Specifically, the monitoring device includes a connected viewing window assembly and a signal analysis device. The viewing window assembly includes a quartz sleeve, an observation window, and a protective window. The quartz sleeve has a light-transmitting channel for the glow light to pass through. The protective window is located within the light-transmitting channel. One end of the quartz sleeve is opposite to and connected to a monitoring hole in the process chamber. The observation window is connected to the other end of the quartz sleeve. The glow light in the process chamber passes sequentially through the monitoring hole, the protective window, and the observation window to reach the signal analysis device, so that the signal analysis device can collect the glow light. The signal analysis device then analyzes the glow light to monitor the process in real time.

[0005] However, during the cyclic purging process of the process chamber in semiconductor process equipment, the air pressure inside the process chamber changes. The quartz sleeve is affected by the pumping and venting processes, and the window assembly is prone to swaying along the axial direction of the quartz sleeve. The end of the quartz sleeve is prone to collision and damage, resulting in excessive particulate matter in the process chamber, which is detrimental to the process effect. Summary of the Invention

[0006] The purpose of this application is to provide a window assembly, a monitoring device, and a semiconductor process equipment that can solve the problem in the related art where the window assembly shakes due to changes in the air pressure of the process chamber, leading to collisions and damage, resulting in excessive particulate matter in the process chamber.

[0007] In a first aspect, embodiments of this application provide a window assembly applied to a monitoring device for semiconductor process equipment. The window assembly includes a mounting base, a protective window, and an observation window. The mounting base is provided with a light-transmitting channel, and the protective window is disposed within the light-transmitting channel. A first end of the light-transmitting channel is used to face a monitoring hole provided in the process chamber of the semiconductor process equipment. The observation window is connected to the mounting base, and the observation window is opposite to a second end of the light-transmitting channel. The mounting base is also provided with at least two voltage stabilizing channels, each voltage stabilizing channel being symmetrically arranged on both sides of the axis of the light-transmitting channel. The protective window divides the light-transmitting channel into a first channel section and a second channel section. The first end of each voltage stabilizing channel is connected to the first channel section, and the second end of each voltage stabilizing channel is connected to the second channel section.

[0008] Secondly, embodiments of this application also provide a monitoring device, including the aforementioned window component and signal processor, wherein the signal processor is connected to the window component, and the signal interface of the signal processor is opposite to the observation window.

[0009] Thirdly, embodiments of this application also provide a semiconductor process apparatus, including a process chamber and the aforementioned monitoring device, wherein the chamber wall of the process chamber is provided with a monitoring hole, and the monitoring hole is opposite to and communicates with the light-transmitting channel.

[0010] In this embodiment, the monitoring device has symmetrically arranged pressure-stabilizing channels in the window assembly. Each pressure-stabilizing channel connects the two sides of the protective window. When the air pressure in the process chamber changes, the gas enters the first channel section of the light-transmitting channel through the monitoring hole. Since the first channel section and the second channel section are connected through the pressure-stabilizing channel, the gas in the first channel section will also enter the second channel section through the pressure-stabilizing channel, thus achieving air pressure balance on both sides of the protective window.

[0011] Furthermore, at least two pressure-stabilizing channels are symmetrically arranged about the axis of the light-transmitting channel. During the process chamber's air pressure changes, i.e., during the process chamber's cyclic purging, the at least two pressure-stabilizing channels enable the gas in the light-transmitting channel to flow. Specifically, the airflow flows from one pressure-stabilizing channel into the second channel section, and can further flow back into the first channel section through the symmetrically arranged other pressure-stabilizing channel, achieving airflow circulation. This effectively ensures air pressure balance on both sides of the protective window, prevents the window assembly from swaying along the axis of the light-transmitting channel, and thus avoids collisions and wear at the end of the mounting base. It also prevents particles generated by collisions and wear from entering the process chamber, thus avoiding excessive particulate matter levels in the process chamber and improving the process effect. Attached Figure Description

[0012] Figure 1 This is one of the cross-sectional views of the chamber wall and monitoring device of the process chamber disclosed in the embodiments of this application; Figure 2 This is a second cross-sectional view of the chamber wall and monitoring device of the process chamber disclosed in the embodiments of this application; Figure 3 This is a diagram showing the interaction between the monitoring device and the process chamber when the air pressure in the process chamber changes, as disclosed in the embodiments of this application. Figure 4This is an exploded view of the quartz sleeve, protective window, and pressure-reducing component disclosed in the embodiments of this application; Figure 5 This is a schematic diagram of the structure of the quartz sleeve disclosed in the embodiments of this application; Figure 6 This is a schematic diagram of the pressure-relieving component disclosed in the embodiments of this application.

[0013] Explanation of reference numerals in the attached figures: 10-Window Components 100-Mounting base, 110-Quartz base, 110a-Mounting channel, 120-Quartz sleeve, 121-Light transmission channel, 1211-First channel section, 1212-Second channel section, 122-Voltage stabilizing channel, 1221-First voltage stabilizing channel, 1222-Second voltage stabilizing channel, 122a-Notch, 122b-First through hole, 122c-Second through hole, 123-Limiting groove, 124-Annular groove 200 - Protective window, 210 - First mounting flange 300-Observation Window 400 - Pressure-relieving sleeve, 410 - Third through hole, 420 - Limiting protrusion 500-Seals 20 - Signal processor, 21 - Second mounting flange S - Process chamber, S1 - Monitoring port. Detailed Implementation

[0014] The technical solutions of the embodiments of this application will be clearly described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application are within the scope of protection of this application.

[0015] The terms "first," "second," etc., used in the specification and claims of this application are used to distinguish similar objects and not to describe a specific order or sequence. It should be understood that such use of data can be interchanged where appropriate so that embodiments of this application can be implemented in orders other than those illustrated or described herein, and the objects distinguished by "first," "second," etc., are generally of the same class and the number of objects is not limited; for example, a first object can be one or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.

[0016] The window component, monitoring device, and semiconductor process equipment provided in this application will be described in detail below with reference to the accompanying drawings and through specific embodiments and application scenarios.

[0017] Please refer to Figures 1-6 The window component 10 disclosed in this application is applied to a monitoring device for semiconductor process equipment. The monitoring device includes a signal processor 20. The window component 10 can be used in conjunction with the signal processor 20 to monitor the process in the process chamber S in real time.

[0018] Figure 1 The image shown is one of the cross-sectional views of the wall of the process chamber and the monitoring device. This is a cross-sectional view of the wall of the process chamber and the monitoring device viewed from a top angle. The cutting plane is a plane passing through the axis of the viewing window assembly 10 and is a horizontal plane. Figure 2 The second cross-sectional view shown is of the wall of the process chamber and the monitoring device. Figure 1 The sectional view along direction AA, that is, the sectional view of the process chamber wall and monitoring device as viewed from the front, has a cutting plane that passes through the axis of the viewing window assembly 10, and the cutting plane is a vertical plane. Therefore Figure 1 sectional angle and Figure 2 The cross-sectional angles differ by 90°.

[0019] It should be noted that the axis of the window assembly 10 is the same as the axis of the quartz sleeve 120 mentioned later.

[0020] refer to Figures 1-3 As shown, the viewing window assembly 10 includes a mounting base 100, a protective window 200, and an observation window 300. The mounting base 100 serves as the mounting foundation for the protective window 200 and the observation window 300. Both the protective window 200 and the observation window 300 are disposed on the mounting base 100. The protective window 200 protects the observation window 300 from the influence of plasma within the process chamber S. Specifically, the mounting base 100 has a light-transmitting channel 121, and the protective window 200 is disposed within the light-transmitting channel 121. The first end of the light-transmitting channel 121 is aligned with a monitoring hole S1 provided in the process chamber S of the semiconductor process equipment, and the second end of the light-transmitting channel 121 can be aligned with the observation window 300. Thus, after the glow discharge from the process chamber S enters the light-transmitting channel 121 through the monitoring hole S1, it passes sequentially through the protective window 200 and the observation window 300 to reach the signal processor 20.

[0021] Optionally, the protective window 200 can be an integral structure or a split structure; the structure of the protective window 200 is adapted to the structure of the light transmission channel 121. The light transmission channel 121 can be a circular channel and the protective window 200 can be a circular structure, or the light transmission channel 121 can be a square channel and the protective window 200 can be a square structure. The protective window 200 and the mounting base 100 can be connected in a non-detachable manner by welding, bonding or other methods, or the protective window 200 can be confined within the light transmission channel 121 by other components to achieve relative fixation between the protective window 200 and the mounting base 100.

[0022] The observation window 300 can be square, circular, or other shapes; the specific shape of the observation window 300 is not limited in this embodiment. The observation window 300 is connected to the mounting base 100 and is opposite to the second end of the light-transmitting channel 121. Optionally, the observation window 300 closes the opening at the second end of the light-transmitting channel 121. The window assembly 10 also includes a first mounting flange 210, which is used to fix the observation window 300 to the mounting base 100. The first mounting flange 210 and the mounting base 100 can be connected by bolts or other fasteners to achieve relative fixation between the observation window 300 and the mounting base 100.

[0023] refer to Figure 2 and Figure 3 As shown, the mounting base 100 is also provided with at least two voltage stabilizing channels 122. Each voltage stabilizing channel 122 is symmetrically arranged on both sides of the axis of the light-transmitting channel 121, that is, the voltage stabilizing channel 122 is symmetrical about the axis of the light-transmitting channel 121. Optionally, the number of voltage stabilizing channels 122 can be two, namely the first voltage stabilizing channel 1221 and the second voltage stabilizing channel 1222 mentioned below, or the number of voltage stabilizing channels 122 can be four, six, etc. The embodiments of this application do not limit the number of voltage stabilizing channels 122, as long as the symmetrical position of each voltage stabilizing channel 122 about the axis of the light-transmitting channel 121 is ensured.

[0024] The protective window 200 divides the light-transmitting channel 121 into a first channel portion 1211 and a second channel portion 1212. The first channel portion 1211 and the second channel portion 1212 are spaces on opposite sides of the protective window 200. The first end of each pressure-stabilizing channel 122 is connected to the first channel portion 1211, and the second end of each pressure-stabilizing channel 122 is connected to the second channel portion 1212. That is to say, among the two pressure-stabilizing channels 122 that are symmetrical about the axis of the light-transmitting channel 121, the first channel portion 1211 is connected to the second channel portion 1212 through one of the pressure-stabilizing channels 122, and the first channel portion 1211 is also connected to the second channel portion 1212 through the other pressure-stabilizing channel 122.

[0025] When the air pressure inside the process chamber S changes, gas enters the first channel portion 1211 of the light-transmitting channel 121 through the monitoring hole S1. Since the first channel portion 1211 and the second channel portion 1212 are connected through the pressure-stabilizing channel 122, the gas in the first channel portion 1211 also enters the second channel portion 1212 through the pressure-stabilizing channel 122, achieving air pressure balance on both sides of the protective window 200. Moreover, the airflow in the first channel portion 1211 flows from one of the pressure-stabilizing channels 122 to the second channel portion 1212, and can further flow back to the first channel portion 1211 through the other symmetrically arranged pressure-stabilizing channel 122, achieving airflow circulation. This effectively ensures air pressure balance on both sides of the protective window 200, prevents the window assembly 10 from swaying along the axial direction of the light-transmitting channel 121, and thus prevents collisions and wear at the end of the mounting base 100. This also prevents particles generated by collisions and wear from entering the process chamber S and causing excessive particle counts in the process chamber S, which is beneficial for improving process efficiency.

[0026] More specifically, refer to Figure 3 As shown, in the direction perpendicular to the axis of the light-transmitting channel 121, the air extraction port and air release port of the process chamber S are located on both sides of the axis of the light-transmitting channel 121, respectively. The areas P1 and P2 selected by the dashed lines are the pressure areas in the air extraction state and the air release state, respectively. The duration of the air extraction process and the air release process is the same (which can be two minutes). When the process chamber S is in the air extraction state or the air release state, the window assembly 10 will generate a pressure difference in the direction perpendicular to the axis of the light-transmitting channel 121. Then, the airflow in the first channel section 1211 flows from one of the pressure-stabilizing channels 122 to the second channel section 1212, and further flows back to the first channel section 1211 through the other symmetrically arranged pressure-stabilizing channel 122. This airflow circulation process is beneficial to the air pressure balance in the direction perpendicular to the axis of the light-transmitting channel 121. Moreover, the airflow circulation is the same when the process chamber S is in the air extraction state and when the process chamber S is in the air release state, avoiding air pressure changes when switching between the air extraction state and the air release state, which is beneficial to maintaining pressure balance.

[0027] In an optional embodiment, refer to Figure 2 and Figure 3 As shown, at least two voltage-stabilized channels 122 include a first voltage-stabilized channel 1221 and a second voltage-stabilized channel 1222. The first voltage-stabilized channel 1221 and the second voltage-stabilized channel 1222 are symmetrically arranged about the axis of the light-transmitting channel 121, and the structures of the first voltage-stabilized channel 1221 and the second voltage-stabilized channel 1222 are symmetrical about the axis of the light-transmitting channel 121. That is to say, the structures of the first voltage-stabilized channel 1221 and the second voltage-stabilized channel 1222 are the same.

[0028] In this embodiment, the first pressure-stabilizing channel 1221 and the second pressure-stabilizing channel 1222 are not only symmetrical about the axis of the light-transmitting channel 121, but their structures are also symmetrical about the axis of the light-transmitting channel 121. Therefore, when the air pressure in the process chamber S changes, the airflow entering the first channel section 1211 flows from the first pressure-stabilizing channel 1221 to the second channel section 1212, and further flows back to the first channel section 1211 via the second pressure-stabilizing channel 1222. Since the first pressure-stabilizing channel 1221 and the second pressure-stabilizing channel 1222... The structure of 2 is symmetrical. The airflow from the first pressure stabilizing channel 1221 flows more smoothly into the second pressure stabilizing channel 1222 through the second channel 1212, realizing smoother airflow circulation. This can more effectively ensure the air pressure balance on both sides of the protective window 200, further preventing the window assembly 10 from swaying along the axial direction of the light transmission channel 121. This also prevents collisions and wear at the end of the mounting base 100, and prevents particles generated by collisions and wear from entering the process chamber S, thus avoiding excessive particle content in the process chamber S and improving the process effect.

[0029] Of course, in other embodiments, the first voltage stabilizing channel 1221 and the second voltage stabilizing channel 1222 are only symmetrical about the axis of the light transmission channel 121. The structures of the first voltage stabilizing channel 1221 and the second voltage stabilizing channel 1222 are not symmetrical about the axis of the light transmission channel 121. That is to say, the structures of the first voltage stabilizing channel 1221 and the second voltage stabilizing channel 1222 are different.

[0030] In the alternative solutions of this application, refer to Figure 2 and Figure 3 As shown, the mounting base 100 includes a quartz base 110 and a quartz sleeve 120. The quartz base 110 has a mounting channel 110a, and the quartz sleeve 120 is disposed within the mounting channel 110a, forming a light-transmitting channel 121. Optionally, the structure of the quartz sleeve 120 and the mounting channel 110a can be adapted to each other. The mounting channel 110a can be a circular channel, and the quartz sleeve 120 can be a circular sleeve; alternatively, the mounting channel 110a can be a square channel, and the quartz sleeve 120 can be a square sleeve. The embodiments of this application do not limit the structure of the quartz sleeve 120 and the mounting channel 110a.

[0031] The observation window 300 is located at the end of the light-transmitting channel 121 and is connected to the quartz base 110, so that the observation window 300 and the second end of the light-transmitting channel 121 are opposite each other. Optionally, the observation window 300 is connected to the quartz base 110 through the first mounting flange 210.

[0032] refer to Figure 4As shown, the outer wall surface of the quartz sleeve 120 is provided with a notch 122a, which forms a communication channel with the quartz sleeve 120. Optionally, the notch 122a can be opened at the end of the quartz sleeve 120, or the notch 122a can be opened at the middle position of the quartz sleeve 120.

[0033] The quartz sleeve 120 is also provided with a first through hole 122b and a second through hole 122c, which are respectively connected to the notch 122a. The first through hole 122b and the second through hole 122c can be square holes, circular holes, etc., and the specific shapes of the first through hole 122b and the second through hole 122c are not limited in this embodiment. Optionally, the first through hole 122b and the second through hole 122c can both be formed on the surface of the notch 122a, and the notch 122a extends along the axial direction of the quartz sleeve 120 to facilitate the further formation of the first through hole 122b and the second through hole 122c.

[0034] Furthermore, the first through hole 122b communicates with the first channel portion 1211, and the second through hole 122c communicates with the second channel portion 1212. That is, the first through hole 122b is located on the first side of the protective window 200, and the second through hole 122c is located on the second side of the protective window 200. The first side and the second side are opposite sides of the protective window 200, respectively. The first through hole 122b, the communicating channel, and the second through hole 122c form a pressure stabilizing channel 122. The airflow in the first channel portion 1211 flows sequentially through the first through hole 122b, the communicating channel, and the second through hole 122c into the second channel portion 1212.

[0035] Optionally, both the first voltage-stabilizing channel 1221 and the second voltage-stabilizing channel 1222 include a first through hole 122b, a connecting channel, and a second through hole 122c connected in sequence. The airflow in the first channel portion 1211 flows sequentially through the first through hole 122b, the connecting channel, and the second through hole 122c of the first voltage-stabilizing channel 1221 into the second channel portion 1212, and then flows back into the first channel portion 1211 through the second through hole 122c, the connecting channel, and the first through hole 122b of the second voltage-stabilizing channel 1222, thereby realizing airflow circulation.

[0036] In this embodiment, the mounting base 100 adopts a split structure, and the light-transmitting channel 121 is directly formed by the quartz sleeve 120, eliminating the need to separately open the light-transmitting channel 121. Moreover, a notch 122a, a first through hole 122b, and a second through hole 122c are opened on the outer wall surface of the quartz sleeve 120, so that the notch 122a directly cooperates with the quartz base body 110 to form a connecting channel connecting the first through hole 122b and the second through hole 122c, thereby forming a voltage stabilizing channel 122. It is not necessary to separately open the voltage stabilizing channel 122 on the integrated mounting base 100, which helps to simplify the design process of the voltage stabilizing channel 122 and reduce the process difficulty.

[0037] Of course, in other embodiments, the mounting base 100 may be an integral structure, and a light-transmitting channel 121 and a voltage-stabilizing channel 122 may be separately provided on the mounting base 100.

[0038] In one optional embodiment, the first through hole 122b and the second through hole 122c have different structures, and their flow areas are not equal. Optionally, one of the first through hole 122b and the second through hole 122c can be a square hole and the other can be a circular hole, with different structures to achieve unequal flow areas.

[0039] In another embodiment, the first through hole 122b and the second through hole 122c have the same structure and equal flow areas. Optionally, both the first through hole 122b and the second through hole 122c are circular holes with equal diameters to achieve equal flow areas; or, both the first through hole 122b and the second through hole 122c are square holes with equal side lengths to achieve equal flow areas.

[0040] Optionally, the notch 122a can be 10mm long and 6mm wide, the distance between the surface of the notch 122a and the axis of the light-transmitting channel 121 is 40mm, and the diameter of the first through hole 122b and the second through hole 122c can be 4mm.

[0041] With this configuration, as the airflow flows sequentially through the first through hole 122b, the connecting channel, and the second through hole 122c, or sequentially through the second through hole 122c, the connecting channel, and the first through hole 122b, the flow area of ​​the airflow before entering the connecting channel and after exiting the connecting channel is equal, and the airflow experiences equal resistance. This is more conducive to the smooth flow of the airflow through the entire pressure stabilizing channel 122, enabling smoother airflow circulation and more effectively ensuring the air pressure balance on both sides of the protective window 200.

[0042] In an optional embodiment, refer to Figures 1-4 As shown, the window assembly 10 also includes a seal 500, which is disposed between the quartz base 110 and the quartz sleeve 120 to seal the gap between them. Optionally, the seal 500 extends circumferentially along the quartz sleeve 120. The seal 500 can be a sealing ring, which is fitted around the periphery of the quartz sleeve 120 to increase the sealing area in the circumferential direction of the quartz sleeve 120. The material of the seal 500 can be, but is not limited to, rubber. Further optionally, the outer wall surface of the quartz sleeve 120 is provided with a sealing groove, and the sealing ring is disposed in the sealing groove.

[0043] In this embodiment, the window assembly 10 is equipped with a sealing element 500 to seal the gap between the quartz sleeve 120 and the quartz base 110, which helps to improve the sealing performance of the installation channel 110a and ensures that the glow light can smoothly enter the light transmission channel 121.

[0044] In the alternative solutions of this application, refer to Figures 1-3 As shown, the viewing window assembly 10 also includes a pressure-relieving member, which is used to install the protective window 200 and relieve the pressure borne by the protective window 200. The second channel portion 1212 is closer to the viewing window 300 than the first channel portion 1211. That is, the first channel portion 1211 is farther away from the viewing window 300, and the second channel portion 1212 is closer to the viewing window 300. The pressure-relieving member is disposed in the second channel portion 1212.

[0045] Along the axial direction of the light-transmitting channel 121, the first end of the pressure-relieving component abuts against the protective window 200, and the second end of the pressure-relieving component protrudes from the end face of the quartz sleeve 120, so that the second end of the pressure-relieving component abuts against the observation window 300, avoiding direct contact between the end face of the quartz sleeve 120 and the observation window 300. Optionally, the second end of the pressure-relieving component protrudes 0.4mm from the end face of the quartz sleeve 120.

[0046] Optionally, the light-transmitting channel 121 is provided with a stepped structure, the first side of the protective window 200 abuts against the stepped structure, and the first end of the pressure-relieving member abuts against the second side of the protective window 200.

[0047] The pressure-relieving component can be made of resin, specifically PTFE (Polytetrafluoroethylene) or PEEK (…). Polyetheretherketone (PEEK) is a material that can prevent the infrared and ultraviolet rays generated during the process from affecting the pressure relief components. Of course, other materials can also be used for the pressure relief components.

[0048] In this embodiment, by adding a pressure-relief component, the protective window 200 is abutted against the quartz sleeve 120, and the protective window 200 is directly installed, thus fixing the protective window 200 relative to the quartz sleeve 120 without the need for other complicated installation procedures. Moreover, the end of the pressure-relief component protrudes from the end face of the quartz sleeve 120, and the pressure-relief component directly abuts against the protective window 200, avoiding direct contact between the quartz sleeve 120 and the observation window 300. This prevents particles generated by the collision and wear between the quartz sleeve 120 and the observation window 300 from affecting the process, which is beneficial to improving the process effect.

[0049] Of course, in other embodiments, the window assembly 10 may not have a pressure relief component, and the protective window 200 may be installed in the light transmission channel 121 in other ways.

[0050] In a further embodiment, reference is made to... Figure 4 and Figure 6 As shown, the pressure-relieving component is a pressure-relieving sleeve 400. The outer wall surface of the pressure-relieving sleeve 400 transitions with the inner wall surface of the quartz sleeve 120. Moreover, the pressure-relieving sleeve 400 is provided with multiple third through holes 410, each of which corresponds to a second through hole 122c. Each third through hole 410 is opposite to a corresponding second through hole 122c, and each second through hole 122c is connected to the second channel portion 1212 through the corresponding third through hole 410. Thus, the airflow in the first channel portion 1211 enters the second channel portion 1212 through the pressure-stabilizing channel 122 and the third through hole 410, or the airflow in the second channel portion 1212 flows back to the first channel portion 1211 through the third through hole 410 and the pressure-stabilizing channel 122.

[0051] Optionally, the third through hole 410 has the same structure and flow area as the second through hole 122c. The shape of both the second through hole 122c and the third through hole 410 can be circular holes, and the diameter of both the second through hole 122c and the third through hole 410 is 4mm.

[0052] In this embodiment, the pressure-relief component adopts a sleeve structure. Therefore, in the circumferential direction of the quartz sleeve 120, the contact area between the pressure-relief sleeve 400 and the protective window 200 is increased, which is beneficial for the stable installation of the protective window 200 and prevents the protective window 200 from shaking. At the same time, the contact area between the pressure-relief sleeve 400 and the observation window 300 is increased, which effectively prevents contact between various positions of the quartz sleeve 120 and the observation window 300. This avoids the impact of particles generated by the collision and wear between the quartz sleeve 120 and the observation window 300 on the process, and is conducive to further improving the process effect.

[0053] Of course, in other embodiments, the pressure relief component may not use a sleeve structure, and the pressure relief component may also have other structures.

[0054] In an alternative embodiment of this application, at least one of the pressure-reducing sleeve 400 and the quartz sleeve 120 is provided with a limiting structure, which limits the relative position of the pressure-reducing sleeve 400 and the quartz sleeve 120 in the circumferential direction of the quartz sleeve 120, so that the third through hole 410 is opposite to the second through hole 122c.

[0055] Optionally, only the pressure-relieving sleeve 400 or only the quartz sleeve 120 may have a limiting structure. Further, the limiting structure may be a connecting adhesive, connecting the pressure-relieving sleeve 400 and the quartz sleeve 120 to achieve relative fixation of the two in the circumferential direction of the quartz sleeve 120, so that the third through hole 410 is opposite to the second through hole 122c. Alternatively, both the pressure-relieving sleeve 400 and the quartz sleeve 120 may have limiting structures. One of the pressure-relieving sleeve 400 and the quartz sleeve 120 may have a slide rail, and the other may have a slider. The slide rail extends axially along the light-transmitting channel 121, and the slide rail and slider slide in cooperation, limiting the relative position of the pressure-relieving sleeve 400 and the quartz sleeve 120 in the circumferential direction of the quartz sleeve 120, so that the third through hole 410 is opposite to the second through hole 122c. Of course, other forms of limiting structures may also be used.

[0056] In this embodiment, a limiting structure is added to restrict the relative positions of the pressure-reducing sleeve 400 and the quartz sleeve 120 in the circumferential direction of the quartz sleeve 120. This prevents the pressure-reducing sleeve 400 from extending into the quartz sleeve 120 and rotating relative to the quartz sleeve 120, ensuring that the third through hole 410 and the second through hole 122c are accurately aligned, and preventing the pressure-reducing sleeve 400 from affecting the airflow process.

[0057] In a further embodiment, reference is made to... Figure 4 As shown, both the pressure-relieving sleeve 400 and the quartz sleeve 120 are provided with limiting structures. The limiting structures include limiting protrusions 420 and limiting grooves 123. One of the outer wall surface of the pressure-relieving sleeve 400 and the inner wall surface of the quartz sleeve 120 is provided with a limiting protrusion 420, and the other is provided with a limiting groove 123. Specifically, the outer wall surface of the pressure-relieving sleeve 400 is provided with a limiting protrusion 420, and the limiting protrusion 420 and the pressure-relieving sleeve 400 can be an integral structure. The inner wall surface of the quartz sleeve 120 is provided with a limiting groove 123; or, the outer wall surface of the pressure-relieving sleeve 400 is provided with a limiting groove 123, and the inner wall surface of the quartz sleeve 120 is provided with a limiting protrusion 420, and the limiting protrusion 420 and the quartz sleeve 120 can be an integral structure. The limiting groove 123 extends circumferentially along the quartz sleeve 120, and the limiting protrusion 420 extends into the limiting groove 123, and the limiting protrusion 420 and the limiting groove 123 are in a limiting engagement with each other in the circumferential direction of the quartz sleeve 120.

[0058] The limiting protrusion 420 and the limiting groove 123 are structurally compatible. The shape of the limiting protrusion 420 and the limiting groove 123 can be a square structure, a circular structure, an arc structure, etc. The specific structure of the limiting protrusion 420 and the limiting groove 123 is not limited in this application embodiment.

[0059] Optionally, the limiting protrusion 420 is a square protrusion, and the limiting groove 123 is a square groove. The length of the limiting protrusion 420 can be 10mm, the width can be 2.8mm, and the height can be 3mm. The length of the limiting groove 123 can be 10mm, the width can be 3mm, and the height can be 3mm. The width of the limiting protrusion 420 is 0.2mm less than the width of the limiting groove 123, so as to ensure that the limiting protrusion 420 can smoothly extend into the limiting groove 123.

[0060] In this embodiment, the limiting protrusion 420 and the limiting groove 123 serve as limiting structures. Only one of the pressure-relieving sleeve 400 and the quartz sleeve 120 needs to have the limiting protrusion 420, and the other needs to have the limiting groove 123. The limiting structure is simple and does not require additional components as limiting structures, which helps to reduce the number of parts and simplify the limiting structure. Moreover, the limiting protrusion 420 can achieve limiting by extending into the limiting groove 123. The limiting operation is simple and also facilitates the installation and removal of the pressure-relieving sleeve 400 and the protective window 200.

[0061] In an optional embodiment, refer to Figures 1-3 As shown, the inner wall surface of the quartz sleeve 120 is provided with an annular groove 124, which is connected to the light-transmitting channel 121. Specifically, the annular groove 124 is connected to the first channel portion 1211. The annular groove 124 can be used as a force point when disassembling the quartz sleeve 120, making it easier for the quartz sleeve 120 to be taken out from the installation channel 110a of the quartz base 110.

[0062] Based on the window component 10 disclosed in this application, refer to Figure 1 and Figure 2 As shown in the embodiments, this application also discloses a monitoring device, which includes the window component 10 and the signal processor 20 in the above embodiments. The signal processor 20 is connected to the window component 10, and the signal interface of the signal processor 20 is opposite to the observation window 300. The signal processor 20 includes a signal amplifier.

[0063] Optionally, the monitoring device also includes a second mounting flange 21, which fixes the signal processor 20 to the first mounting flange 210, so as to achieve relative fixation between the signal processor 20 and the observation window 300.

[0064] In this embodiment, the monitoring device uses the aforementioned window assembly 10. The window assembly 10 has a pressure stabilizing channel 122, which connects the two sides of the protective window 200. At least two symmetrically arranged pressure stabilizing channels 122 are used to achieve airflow circulation, effectively ensuring the air pressure balance on both sides of the protective window 200. This prevents the window assembly 10 from swaying along the axial direction of the light-transmitting channel 121, thereby preventing collisions and wear at the end of the mounting base 100. It also prevents particles generated by collisions and wear from entering the process chamber S, which would cause the particle count in the process chamber S to exceed the standard, thus improving the process effect.

[0065] Based on the monitoring device disclosed in this application, with reference to Figure 1 and Figure 2 As shown in the embodiments of this application, a semiconductor process apparatus is also disclosed. The semiconductor process apparatus includes the monitoring device in the above embodiments and a process chamber S. The cavity wall of the process chamber S is provided with a monitoring hole S1, which is opposite to and connected to the light transmission channel 121.

[0066] Optionally, the monitoring hole S1 can be opened on the side wall of the process chamber S, and the shape of the light transmission channel 121 can be the same as or different from the shape of the monitoring hole S1; the quartz base 110 can only be opposite to the side wall of the process chamber S, and the two are not connected, so that the monitoring hole S1 and the light transmission channel 121 are opposite and connected. Alternatively, the quartz base 110 can be fixed to the outer side wall of the process chamber S by other components to realize that the monitoring hole S1 and the light transmission channel 121 are opposite and connected.

[0067] In this embodiment, the semiconductor process equipment uses the monitoring device described above to achieve spatial communication and air pressure balance on both sides of the protective window 200, preventing the window assembly 10 from swaying along the axial direction of the light transmission channel 121, thereby preventing collisions and wear at the end of the mounting base 100, and preventing particles generated by collisions and wear from entering the process chamber S and causing the particle count in the process chamber S to exceed the standard, which is beneficial to improving the process effect.

[0068] The embodiments of this application have been described above with reference to the accompanying drawings. However, this application is not limited to the specific embodiments described above. The specific embodiments described above are merely illustrative and not restrictive. Those skilled in the art can make many other forms under the guidance of this application without departing from the spirit and scope of the claims, and all of these forms are within the protection scope of this application.

Claims

1. A window assembly, applied to a monitoring device for semiconductor process equipment, characterized in that, The viewing window assembly (10) includes a mounting base (100), a protective window (200), and an observation window (300). The mounting base (100) is provided with a light-transmitting channel (121). The protective window (200) is disposed in the light-transmitting channel (121). The first end of the light-transmitting channel (121) is used to be opposite to the monitoring hole (S1) provided in the process chamber (S) of the semiconductor process equipment. The observation window (300) is connected to the mounting base (100), and the observation window (300) is opposite to the second end of the light-transmitting channel (121). The mounting base (100) is also provided with at least two voltage stabilizing channels (122). Each voltage stabilizing channel (122) is symmetrically arranged on both sides of the axis of the light-transmitting channel (121). The protective window (200) divides the light-transmitting channel (121) into a first channel portion (1211) and a second channel portion (1212). The first end of each voltage stabilizing channel (122) is connected to the first channel portion (1211), and the second end of each voltage stabilizing channel (122) is connected to the second channel portion (1212).

2. The window component according to claim 1, characterized in that, The at least two voltage-stabilizing channels (122) include a first voltage-stabilizing channel (1221) and a second voltage-stabilizing channel (1222). The first voltage-stabilizing channel (1221) and the second voltage-stabilizing channel (1222) are symmetrically arranged about the axis of the light-transmitting channel (121), and the structures of the first voltage-stabilizing channel (1221) and the second voltage-stabilizing channel (1222) are symmetrical about the axis of the light-transmitting channel (121).

3. The window component according to claim 1, characterized in that, The mounting base (100) includes a quartz base (110) and a quartz sleeve (120). The quartz base (110) has an installation channel (110a), and the quartz sleeve (120) is disposed within the installation channel (110a), forming the light-transmitting channel (121). The observation window (300) is connected to the quartz base (110). The outer wall surface of the quartz sleeve (120) is provided with a notch (122a), the notch (122a) and the quartz base (110) form a communicating channel. The quartz sleeve (120) is also provided with a first through hole (122b) and a second through hole (122c). The first through hole (122b) and the second through hole (122c) are respectively connected to the notch (122a), and the first through hole (122b) is connected to the first channel portion (1211), and the second through hole (122c) is connected to the second channel portion (1212). The first through hole (122b), the communicating channel and the second through hole (122c) form the voltage stabilizing channel (122).

4. The window component according to claim 3, characterized in that, The first through hole (122b) and the second through hole (122c) have the same structure and the same flow area.

5. The window component according to claim 3, characterized in that, The viewing window assembly (10) further includes a pressure-relieving member, wherein the second channel portion (1212) is closer to the viewing window (300) relative to the first channel portion (1211), and the pressure-relieving member is disposed within the second channel portion (1212). Along the axial direction of the light-transmitting channel (121), the first end of the pressure-relieving member abuts against the protective window (200), and the second end of the pressure-relieving member protrudes from the end face of the quartz sleeve (120) so that the second end of the pressure-relieving member abuts against the observation window (300).

6. The window component according to claim 5, characterized in that, The pressure-relieving component is a pressure-relieving sleeve (400). The outer wall surface of the pressure-relieving sleeve (400) is transitionally fitted with the inner wall surface of the quartz sleeve (120). The pressure-relieving sleeve (400) is provided with a plurality of third through holes (410). The third through holes (410) correspond one-to-one with the second through holes (122c). Each third through hole (410) is opposite to the corresponding second through hole (122c). Each second through hole (122c) is connected to the second channel portion (1212) through the corresponding third through hole (410).

7. The window component according to claim 6, characterized in that, At least one of the pressure-relieving sleeve (400) and the quartz sleeve (120) is provided with a limiting structure, which restricts the relative position of the pressure-relieving sleeve (400) and the quartz sleeve (120) in the circumferential direction of the quartz sleeve (120) so that the third through hole (410) is opposite to the second through hole (122c).

8. The window component according to claim 7, characterized in that, The limiting structure includes a limiting protrusion (420) and a limiting groove (123). The limiting protrusion (420) is provided on one of the outer wall surface of the pressure-relieving sleeve (400) and the inner wall surface of the quartz sleeve (120), and the limiting groove (123) is provided on the other. The limiting groove (123) extends circumferentially along the quartz sleeve (120), and the limiting protrusion (420) extends into the limiting groove (123). The limiting protrusion (420) and the limiting groove (123) are in a limiting engagement with each other in the circumferential direction of the quartz sleeve (120).

9. A monitoring device, characterized in that, Includes the window assembly (10) and signal processor (20) as described in any one of claims 1-8, wherein the signal processor (20) is connected to the window assembly (10) and the signal interface of the signal processor (20) is opposite to the viewing window (300).

10. A semiconductor process apparatus, characterized in that, The device includes a process chamber (S) and the monitoring device as described in claim 9. The process chamber (S) has a monitoring hole (S1) on its wall, and the monitoring hole (S1) is opposite to and connected to the light-transmitting channel (121).

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