Device for engraving complex textures of glass and engraving method thereof

Abstract

The invention relates to the technical field of laser engraving, and discloses a device for engraving complex textures of glass and an engraving method thereof.The device comprises a nano-structure preparation module used for constructing a nano-particle structure corresponding to glass to be engraved; the process planning module is used for generating a laser engraving path and key laser parameters of the to-be-engraved glass; the signal monitoring module is used for synchronously monitoring a plasma optical signal corresponding to the nano-particle structure in the initial carving texture forming process; the optimization control module is used for generating an online control instruction set and a self-adaptive parameter optimization strategy of the glass to be engraved; and the online correction module is used for carrying out precision correction processing on the initial carving texture based on an online control instruction set and a self-adaptive parameter optimization strategy. According to the method, the texture form of glass carving can be accurately controlled on the microscopic scale, and the overall carving level of glass complex textures is improved.

Description

Technical Field

[0001] This invention relates to the field of laser engraving technology, and more particularly to an apparatus and method for engraving complex textures on glass. Background Technology

[0002] Glass engraving refers to the process of creating patterns or textures with rich layers and a three-dimensional feel on the surface or inside of glass by removing or modifying materials. It is a key technology for shaping intricate patterns and unique tactile sensations in glass, directly determining the artistry and added value of the work, and holds an important position in the glass processing field.

[0003] Currently, the most commonly used glass texture engraving method is CNC precision engraving. This method uses a computer-controlled diamond cutter to precisely mill the glass surface and create a three-dimensional pattern based on a preset digital model. Although it can create three-dimensional shapes on the accessible glass surface, it cannot precisely process the interior of the glass or specific micro-areas in a non-contact state, resulting in its overall engraving level of complex glass textures remaining only at the macroscopic and surface level. Summary of the Invention

[0004] The present invention provides an apparatus and method for engraving complex textures in glass. Its main purpose is to precisely control the texture morphology of glass engraving at the microscale and improve the overall engraving level of complex glass textures.

[0005] To achieve the above objectives, the present invention provides an apparatus for engraving complex textures on glass, comprising: A nanostructure fabrication module is used to obtain a glass substrate for the glass to be etched, and to construct a nanoparticle structure corresponding to the glass to be etched on the glass substrate. The process planning module is used to call the 3D texture design model of the glass to be etched and identify the plasma resonance characteristics of the nanoparticle structure in order to generate the laser engraving path and key laser parameters of the glass to be etched. The signal monitoring module is used to perform initial laser engraving on the glass to be engraved according to the key laser parameters and the laser engraving path to obtain an initial engraved texture. During the formation of the initial engraved texture, the plasma light signal corresponding to the nanoparticle structure is monitored simultaneously. The optimization control module is used to analyze the expected standard signal of the 3D texture design model, and combine the expected standard signal with the plasma spectral signal to generate an online control instruction set and adaptive parameter optimization strategy for the glass to be sculpted. The online correction module is used to perform accuracy correction processing on the initial sculpted texture based on the online control instruction set and the adaptive parameter optimization strategy to obtain the target texture sculpting result.

[0006] Optionally, constructing the nanoparticle structure corresponding to the glass to be etched on the glass substrate includes: The glass substrate is subjected to surface cleaning and activation treatment to obtain the target substrate surface; Obtain the laser engraving wavelength preset for the glass to be engraved, so as to prepare the nanoparticle growth solution corresponding to the glass substrate; The nanoparticle growth solution is spin-coated onto the surface of the target substrate to form an initial nanoparticle film. Annealing the initial nanoparticle film yields a nanoparticle assembly. The plasma resonance spectrum of the nanoparticle assembly was measured, and the peak wavelength in the plasma resonance spectrum was extracted. Based on the laser engraving wavelength and the peak wavelength, the nanoparticle structure corresponding to the glass to be engraved is selected from the set of nanoparticles.

[0007] Optionally, obtaining the laser engraving wavelength preset for the glass to be engraved, in order to prepare the nanoparticle growth solution corresponding to the glass substrate, includes: The surface chemical properties of the glass substrate are analyzed in order to select the noble metal precursor corresponding to the glass substrate; Based on the reduction potential characteristics of the noble metal precursor, the morphology control agent and reducing agent corresponding to the glass substrate are selected. Based on the laser engraving wavelength, determine the plasma resonance peak wavelength corresponding to the glass substrate; Based on the chemical properties of the noble metal precursor and the wavelength of the plasma resonance peak, the molar concentration ratio of the morphology control agent to the noble metal precursor is defined. Based on the molar concentration ratio, the noble metal precursor, the morphology control agent, and the reducing agent are placed in a preset solvent system for mixing and reaction to obtain a nanoparticle growth solution.

[0008] Optionally, the step of calling the 3D texture design model of the glass to be etched and identifying the plasmon resonance characteristics of the nanoparticle structure to generate the laser engraving path of the glass to be etched includes: The 3D texture design model is triangulated to obtain a discrete surface model; Calculate the normal vector of each vertex in the discrete surface model to construct the surface orientation vector field of the glass to be sculpted; Based on the plasma resonance characteristics, the effective range of the laser on the glass to be etched is determined; Extract the surface curvature feature parameters of the surface orientation vector field; Based on the effective range of the laser and the surface curvature characteristic parameters, a set of focal paths is generated for the glass to be etched. Interference verification and path smoothing optimization are performed on the focal path set to obtain the laser engraving path of the glass to be engraved.

[0009] Optionally, generating the focal path set of the glass to be etched based on the effective range of the laser and the surface curvature characteristic parameters includes: Based on the surface curvature characteristic parameters, the high curvature characteristic region and the flat region of the glass to be etched are identified. The reference path spacing corresponding to the flat area is determined based on the lateral dimension of the effective range of the laser. Based on the baseline path spacing, adaptive path encryption processing is performed in the high curvature feature region to obtain an encrypted path subset, and equal-spacing path planning processing is performed in the flat region to obtain a baseline path subset. The encrypted path subset and the baseline path subset are combined to generate the focal path set of the glass to be etched.

[0010] Optionally, the step of simultaneously monitoring the plasma optical signal corresponding to the nanoparticle structure during the initial engraving texture formation process includes: Identify the formation area of ​​the initial engraved texture, and set the optical signal acquisition array corresponding to the nanoparticle structure in the formation area; An optical fiber spectral probe corresponding to the nanoparticle structure is configured in the optical signal acquisition array. Based on the fiber optic spectral probe, the original plasma spectrum of the nanoparticle structure under stimulated emission during laser engraving is acquired in real time. The original plasma spectrum is normalized to obtain a normalized plasma spectrum; Extract the characteristic optical parameters of the standardized plasma spectrum; The engraving state parameters of the nanoparticle structure during the initial engraving texture formation process are measured in real time. Establish a real-time mapping relationship between the characteristic optical parameters and the carving state parameters; Based on the real-time mapping relationship, the plasma optical signal corresponding to the nanoparticle structure is monitored synchronously.

[0011] Optionally, the step of combining the expected standard signal with the plasma spectral signal to generate the online control command set for the glass to be etched includes: Extract the target resonance peak position and intensity reference value from the expected standard signal; Identify the real-time resonance peak position and intensity detection value in the plasma spectral signal; Calculate the first offset between the real-time resonance peak position and the target resonance peak position, and the second offset between the intensity detection value and the intensity reference value; Based on the first comparison result between the first offset and the preset wavelength tolerance, and the second comparison result between the second offset and the preset intensity tolerance, an adaptive control command for the process state of the glass to be etched is generated. Based on the changing trend of the first offset, a feedforward control command for the focal position of the glass to be etched is generated. The process state adaptive control command and the focus position feedforward control command are integrated to generate an online control command set for the glass to be etched.

[0012] Optionally, generating the adaptive control command for the process state of the glass to be etched based on the first comparison result of the first offset and the preset wavelength tolerance, and the second comparison result of the second offset and the preset intensity tolerance, includes: Based on the first comparison result and the second comparison result, the graded response threshold of the glass to be engraved is defined; Based on the graded response threshold, a multi-parameter collaborative decision matrix is ​​established for the glass to be etched. Identify the current offset state of the glass to be etched, and based on the current offset state and the multi-parameter collaborative decision matrix, determine the laser power adjustment amount and scanning speed adjustment amount of the glass to be etched; Based on the laser power adjustment amount and the scanning speed adjustment amount, an adaptive control command for the process state of the glass to be etched is generated.

[0013] Optionally, the adaptive parameter optimization strategy for generating the glass to be etched by combining the expected standard signal with the plasma spectral signal includes: Identify the overall deviation of the plasma spectral signal from the expected standard signal and its time-varying rate; Based on the overall deviation and the time-varying rate, calculate the critical margin of process instability of the glass to be etched; Based on the aforementioned process instability critical margin, the strategy triggering conditions for the glass to be etched are set. Configure the multi-objective optimization parameter set of the glass to be sculpted according to the strategy triggering conditions; Based on the strategy triggering conditions and the multi-objective optimization parameter set, an adaptive parameter optimization strategy is generated for the glass to be sculpted.

[0014] Compared to the prior art, this invention, by acquiring a glass substrate to be etched and constructing a nanoparticle structure corresponding to the glass to be etched on the glass substrate, can transform the macroscopic glass texture engraving laser processing process into a nanoscale high-precision processing process, achieving complex texture morphology highly consistent with the 3D design model. Furthermore, by calling the 3D texture design model of the glass to be etched and identifying the plasmonic resonance characteristics of the nanoparticle structure to generate the laser engraving path and key laser parameters of the glass to be etched, this invention can transform the virtual design into executable physical processing instructions, achieving nanoscale spatiotemporal control of laser energy. This ensures the precision and reliability of the complex texture engraving process on glass. In this embodiment, the initial laser engraving of the glass to be engraved is performed according to the key laser parameters and the laser engraving path to obtain the initial engraved texture. This provides a measurable physical benchmark and feedback control basis for subsequent nanoscale precision closed-loop correction based on plasma optical signals. Furthermore, this embodiment, by simultaneously monitoring the plasma optical signal corresponding to the nanoparticle structure during the initial engraved texture formation process, can capture the changes in the physical effects of laser-matter interaction in real time, converting the energy state during processing into a quantifiable optical signal, providing a basis for subsequent online evaluation. This invention provides direct process data support for estimating engraving accuracy. By analyzing the expected standard signal of the 3D texture design model and combining it with the plasma spectral signal, an online control instruction set for the glass to be engraved is generated. This ensures real-time capture of engraving accuracy deviations and provides a quantifiable control benchmark for the nanoscale thermal engraving process, improving the precision of laser energy control during glass engraving. Furthermore, by combining the expected standard signal with the plasma spectral signal, an adaptive parameter optimization strategy for the glass to be engraved is generated. This strategy can proactively optimize parameters based on the dynamic deviation between the real-time process state and the target model. By adjusting the core parameters of the laser device, the optimal processing window can be maintained autonomously in complex engraving environments, ensuring the consistency of precision in nanoscale texture formation. Finally, this embodiment of the invention performs precision correction processing on the initial engraved texture based on the online control instruction set and the adaptive parameter optimization strategy to obtain the target texture engraving result. This effectively achieves precise control of the morphology and internal three-dimensional structure processing of complex glass textures at the nanoscale, while providing closed-loop intelligent decision support for process optimization and quality control of glass micro-nano engraving. This fundamentally solves the technical limitations of traditional CNC precision engraving methods, which rely on physical contact and macroscopic processing and cannot handle internal structures and microscopic features. Therefore, the device and engraving method for complex glass texture engraving provided by this embodiment of the invention can precisely control the texture morphology of glass engraving at the microscale, improving the overall engraving level of complex glass textures. Attached Figure Description

[0015] Figure 1 A functional block diagram of an apparatus for engraving complex textures on glass, provided in an embodiment of the present invention; Figure 2 A schematic diagram of a laser engraving principle for an apparatus for engraving complex textures on glass, provided in an embodiment of the present invention; Figure 3 This is a flowchart illustrating an apparatus and engraving method for engraving complex textures on glass, as provided in an embodiment of the present invention.

[0016] The objectives, features, and advantages of this invention will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0017] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0018] Furthermore, the timing of the steps in the following method embodiments is merely an example and not a strict limitation.

[0019] In practice, the server-side equipment deployed in a device for engraving complex glass textures may consist of one or more devices. The aforementioned device for engraving complex glass textures can be implemented as a business instance, a virtual machine, or hardware devices. For example, this device can be implemented as a business instance deployed on one or more devices in a cloud node. Simply put, this device for engraving complex glass textures can be understood as software deployed on a cloud node, used to provide glass texture engraving services to various user terminals. Alternatively, this device can also be implemented as a virtual machine deployed on one or more devices in a cloud node. This virtual machine contains application software for managing various user terminals. Alternatively, this device can also be implemented as a server composed of numerous identical or different types of hardware devices, with one or more hardware devices configured to provide glass texture engraving services to various user terminals.

[0020] In terms of implementation, the device for engraving complex glass textures and the user terminal are mutually compatible. That is, if the device for engraving complex glass textures is implemented as an application installed on a cloud service platform, then the user terminal is implemented as a client that establishes a communication connection with the application; or if the device for engraving complex glass textures is implemented as a website, then the user terminal is implemented as a webpage; or if the device for engraving complex glass textures is implemented as a cloud service platform, then the user terminal is implemented as a mini-program in an instant messaging application.

[0021] Reference Figure 1 The image shows an apparatus for engraving complex textures on glass according to an embodiment of the present invention. The apparatus includes: The device 100 for engraving complex textures in glass according to the present invention can be set up in a cloud server. In terms of implementation, it can be used as one or more service devices, or as an application installed in the cloud (e.g., a server for engraving complex textures in glass, a server cluster, etc.), or it can be developed into a website. Depending on the functions implemented, the device 100 for engraving complex textures in glass includes a nanostructure fabrication module 101, a process planning module 102, a signal monitoring module 103, an optimization control module 104, and an online correction module 105.

[0022] In this embodiment of the invention, in the tracking process for engraving complex glass textures, each of the above-mentioned modules can be implemented independently and called upon other modules. This "calling" can be understood as a module connecting to multiple modules of another type and providing corresponding services to those connected modules. In the device for engraving complex glass textures provided by this embodiment of the invention, the applicability of the architecture for engraving complex glass textures can be adjusted by adding modules and directly calling them without modifying the program code, achieving cluster-based horizontal expansion to quickly and flexibly expand the device for engraving complex glass textures. In practical applications, the above-mentioned modules can be set in the same device or different devices, or they can be set in a virtual device, such as a service instance in a cloud server.

[0023] The following describes, with reference to specific embodiments, the various components of an apparatus for engraving complex textures on glass and the specific workflow.

[0024] The nanostructure preparation module 101 is used to obtain a glass substrate for the glass to be etched, and to construct a nanoparticle structure corresponding to the glass to be etched on the glass substrate.

[0025] This invention provides an embodiment of the invention that obtains a glass substrate for engraving glass and constructs a nanoparticle structure corresponding to the glass to be engraved on the glass substrate. This transforms the laser processing of macroscopic glass texture engraving into a high-precision nanoscale processing process, achieving a complex texture morphology that is highly consistent with the 3D design model.

[0026] The glass to be etched refers to a glass product that requires micro-nano-level texturing in specific micro-regions on its interior or surface; the glass substrate refers to the basic part of the glass to be etched, which serves as the main support for the etching process; and the nanoparticle structure refers to a functional unit that is oriented and constructed in a specific region of the glass substrate and can efficiently convert incident laser energy into a nanoscale local thermal field.

[0027] As an embodiment of the present invention, constructing the nanoparticle structure corresponding to the glass to be etched on the glass substrate includes: The glass substrate is subjected to surface cleaning and activation treatment to obtain the target substrate surface; Obtain the laser engraving wavelength preset for the glass to be engraved, so as to prepare the nanoparticle growth solution corresponding to the glass substrate; The nanoparticle growth solution is spin-coated onto the surface of the target substrate to form an initial nanoparticle film. Annealing the initial nanoparticle film yields a nanoparticle assembly. The plasma resonance spectrum of the nanoparticle assembly was measured, and the peak wavelength in the plasma resonance spectrum was extracted. Based on the laser engraving wavelength and the peak wavelength, the nanoparticle structure corresponding to the glass to be engraved is selected from the set of nanoparticles.

[0028] The surface cleaning refers to the process of removing contaminants and adsorbed layers from the surface of the glass substrate; the activation treatment refers to the process of transforming the surface of the glass substrate from an inert state to an active state through chemical modification; the laser engraving wavelength refers to a specific wavelength of a laser beam preset for engraving nanoscale textures on the glass; the nanoparticle growth solution refers to a liquid mixture used to grow nanoparticles of specific composition, morphology, and size on the surface of the glass substrate; the initial nanoparticle film refers to a discontinuous or continuous film layer formed after coating the target substrate surface with the nanoparticle growth solution without subsequent treatment; the annealing treatment refers to a heat treatment process performed on the initial nanoparticle film under a controlled atmosphere and temperature environment, aiming to promote the crystallization and coarsening of nanoparticles and strengthen their interfacial bonding with the glass substrate; the nanoparticle aggregate refers to a group of nanoparticles with specific size distribution and morphological characteristics formed on the surface of the glass substrate after the annealing treatment; the plasma resonance spectrum refers to the characteristic spectrum of the intensity of scattered or absorbed light changing with wavelength when the nanoparticle aggregate is irradiated by incident light; the peak wavelength refers to the wavelength corresponding to the maximum light absorption intensity in the plasma resonance spectrum.

[0029] Optionally, a substrate cleaning machine equipped with a megohmonic generator can be used to perform surface cleaning on the glass substrate; a tube furnace annealing device can be used to perform annealing on the initial nanoparticle film; the plasmonic resonance spectrum of the nanoparticle set can be measured by a UV-Vis-NIR spectrophotometer; and the nanoparticle structure corresponding to the glass to be etched can be screened from the nanoparticle set using a K-means clustering algorithm.

[0030] In another embodiment of the present invention, obtaining a preset laser engraving wavelength for the glass to be engraved, in order to prepare a nanoparticle growth solution corresponding to the glass substrate, includes: The surface chemical properties of the glass substrate are analyzed in order to select the noble metal precursor corresponding to the glass substrate; Based on the reduction potential characteristics of the noble metal precursor, the morphology control agent and reducing agent corresponding to the glass substrate are selected. Based on the laser engraving wavelength, determine the plasma resonance peak wavelength corresponding to the glass substrate; Based on the chemical properties of the noble metal precursor and the wavelength of the plasma resonance peak, the molar concentration ratio of the morphology control agent to the noble metal precursor is defined. Based on the molar concentration ratio, the noble metal precursor, the morphology control agent, and the reducing agent are placed in a preset solvent system for mixing and reaction to obtain a nanoparticle growth solution.

[0031] The surface chemical properties specifically include the inherent attributes of the glass substrate surface, such as chemical composition, functional group type, charge properties, hydrophilicity / hydrophobicity, and chemical reactivity. The noble metal precursor refers to a raw material containing ions or compounds that can be reduced to noble metals such as gold, silver, palladium, and platinum. For example, the precursor for gold can be chloroauric acid, and the precursor for silver can be silver nitrate. The reduction potential characteristic refers to the electrode potential required for the metal ions in the noble metal precursor to be reduced to metal atoms. The morphology control agent refers to a surfactant or polymer that can selectively adsorb onto specific crystal faces of nanoparticles and regulate their anisotropic growth, such as hexadecyltrimethylammonium bromide (CTAB). The reducing agent refers to a chemical reagent in the nanoparticle growth solution that can provide electrons to reduce noble metal ions to zero-valent metal atoms, such as sodium borohydride (NaB). ) or ascorbic acid ( The plasma resonance peak wavelength refers to the peak wavelength in the plasma resonance spectrum corresponding to the surface plasma resonance generated when nanoparticles aggregate in a fixed material, size, and surrounding medium. The chemical properties refer to the chemical composition, ionic valence state, solubility, stability, reactivity with other reagents, and decomposition temperature of the noble metal precursor. The molar concentration ratio refers to the ratio between the amount of morphology control agent and the amount of noble metal precursor in the nanoparticle growth solution. The preset solvent system refers to a liquid phase environment composed of one or more solvents, predetermined based on the solubility characteristics of the noble metal precursor, morphology control agent, and reducing agent. For example, the liquid phase environment can be deionized water, ethanol, or a mixture thereof. The mixing reaction refers to the process of adding the noble metal precursor, morphology control agent, and reducing agent to the preset solvent system in a preset ratio, and then, through stirring, heating, or pH adjustment, causing a chemical reaction among the components to ultimately form the nanoparticle growth solution.

[0032] The process planning module 102 is used to call the 3D texture design model of the glass to be etched and identify the plasma resonance characteristics of the nanoparticle structure in order to generate the laser engraving path and key laser parameters of the glass to be etched.

[0033] This invention, by calling the 3D texture design model of the glass to be etched and identifying the plasma resonance characteristics of the nanoparticle structure, can achieve precise matching between etch energy and texture morphology, avoiding damage to the glass substrate caused by insufficient etch precision due to energy mismatch or energy overload. The 3D texture design model refers to a digital model constructed using 3D modeling software to characterize the three-dimensional morphology of the target texture on or inside the glass to be etched. The plasma resonance characteristics refer to the inherent physical property of the nanoparticle structure undergoing collective electron oscillation under laser irradiation of a specific wavelength, thereby selectively absorbing and scattering light energy.

[0034] Optionally, the 3D texture design model of the glass to be sculpted can be called through a 3D model file parsing interface; the plasma resonance characteristics of the nanoparticle structure can be identified through the Mie scattering theory model.

[0035] Furthermore, this embodiment of the invention, by calling the 3D texture design model of the glass to be etched and identifying the plasma resonance characteristics of the nanoparticle structure, generates the laser engraving path and key laser parameters for the glass to be etched. This transforms the virtual design into executable physical processing instructions, enabling nanoscale spatiotemporal control of laser energy, thereby ensuring the accuracy and reliability of the glass complex texture engraving process. The laser engraving path refers to the spatial motion trajectory of the laser focus generated based on the geometric data of the 3D texture design model; the key laser parameters refer to the set of laser operating parameters that match the plasma resonance characteristics of the nanoparticle structure, including laser wavelength, pulse energy, repetition frequency, scanning speed, and focal size.

[0036] Optionally, the key laser parameters of the glass to be etched can be generated using a surface plasmon resonance theoretical model.

[0037] As an embodiment of the present invention, the step of calling the 3D texture design model of the glass to be etched and identifying the plasmon resonance characteristics of the nanoparticle structure to generate the laser engraving path of the glass to be etched includes: The 3D texture design model is triangulated to obtain a discrete surface model; Calculate the normal vector of each vertex in the discrete surface model to construct the surface orientation vector field of the glass to be sculpted; Based on the plasma resonance characteristics, the effective range of the laser on the glass to be etched is determined; Extract the surface curvature feature parameters of the surface orientation vector field; Based on the effective range of the laser and the surface curvature characteristic parameters, a set of focal paths is generated for the glass to be etched. Interference verification and path smoothing optimization are performed on the focal path set to obtain the laser engraving path of the glass to be engraved.

[0038] The triangular meshing process refers to the computational process of approximating the continuous surface of the 3D texture design model as a set of connected triangular facets; the normal vector refers to a three-dimensional vector defined on each vertex or triangular facet of the discrete surface model, perpendicular to the local tangent plane of that point; the surface orientation vector field refers to the set composed of the normal vectors of all points on the discrete surface model; the effective laser range refers to the maximum spatial region where laser energy can be effectively absorbed and induce nanoscale modification of the glass material; and the surface curvature characteristic parameter refers to the geometric parameters used to quantitatively describe the degree of curvature of the glass surface to be etched. This includes, but is not limited to, Gaussian curvature, average curvature, principal curvature, and rate of change of curvature; the focal path set refers to a collection of multiple scanning paths of the laser focus to cover all target texture areas of the glass to be etched; the interference verification process refers to the process of detecting spatial conflicts between each path in the focal path set to verify whether there are problems such as overlap, intersection, insufficient spacing, or paths exceeding the area to be etched; the path smoothing optimization process refers to the process of correcting sharp corners, sharp bends, or discontinuous segments in the focal path set, and making the motion trajectory of the laser focus continuous and smooth by inserting transition curves or adjusting the coordinates of path nodes.

[0039] Optionally, the 3D texture design model can be triangulated using the Delaunay triangulation algorithm; the normal vector of each vertex in the discrete surface model can be calculated using a neighborhood surface normal averaging algorithm based on the included angle weighting; and the focal path set can be subjected to interference verification using a spatial collision detection algorithm.

[0040] As another embodiment of the present invention, generating the focal path set of the glass to be etched based on the effective range of the laser and the surface curvature characteristic parameters includes: Based on the surface curvature characteristic parameters, the high curvature characteristic region and the flat region of the glass to be etched are identified. The reference path spacing corresponding to the flat area is determined based on the lateral dimension of the effective range of the laser. Based on the baseline path spacing, adaptive path encryption processing is performed in the high curvature feature region to obtain an encrypted path subset, and equal-spacing path planning processing is performed in the flat region to obtain a baseline path subset. The encrypted path subset and the baseline path subset are combined to generate the focal path set of the glass to be etched.

[0041] The high curvature feature region refers to the area on the glass surface to be etched where the curvature value is significantly higher than a set threshold, typically corresponding to the ridges, valleys, edges, and other parts of the texture with drastic shape changes; the flat region refers to the area on the glass surface to be etched where the curvature value is lower than the set threshold, typically corresponding to the parts of the texture with gentle changes; the lateral dimension refers to the maximum dimension of the effective laser range in a plane perpendicular to the laser incident direction; the reference path spacing refers to the preset distance between two adjacent paths when planning the scanning path in a flat region; the adaptive path densification processing refers to the process of dynamically reducing the path spacing and increasing the path density in the high curvature feature region based on the local curvature value; the equal-spacing path planning processing refers to the process of arranging the scanning paths in parallel or at a fixed angle according to the reference path spacing in the flat region.

[0042] Optionally, the high curvature feature region and the flat region of the glass to be engraved can be identified by a region growing algorithm; the equidistant path planning process of the flat region can be performed using a parallel section path generation algorithm in computer numerical control machining; the adaptive path encryption process of the high curvature feature region can be achieved by a spatial adaptive subdivision algorithm based on a quadtree.

[0043] The signal monitoring module 103 is used to perform initial laser engraving on the glass to be engraved according to the key laser parameters and the laser engraving path to obtain an initial engraved texture. During the formation of the initial engraved texture, the plasma light signal corresponding to the nanoparticle structure is monitored simultaneously.

[0044] This invention provides an initial engraving texture by performing initial laser engraving on the glass to be engraved according to the key laser parameters and the laser engraving path. This can provide a measurable physical benchmark and feedback control basis for subsequent nanoscale precision closed-loop correction based on plasma optical signals. The initial engraving texture refers to the preliminary texture morphology formed on the glass surface or at a preset depth after the first laser engraving is performed on the glass to be engraved, which is covered with a specific nanoparticle structure, according to the generated key laser parameters and the laser engraving path.

[0045] To more intuitively demonstrate the key components involved in performing laser engraving, please refer to [link / reference]. Figure 2 The diagram shown is a schematic diagram of a laser engraving principle of an apparatus for engraving complex textures on glass according to an embodiment of the present invention. The diagram illustrates how a laser generates laser light and focuses the laser beam through optical components such as a power supply, a reflector, and a lens, and finally performs engraving operations on the surface of a glass product on a machine tool. This can make abstract technical principles concrete and visual.

[0046] Furthermore, in this embodiment of the invention, by simultaneously monitoring the plasma optical signal corresponding to the nanoparticle structure during the initial engraving texture formation process, the physical effect changes of the interaction between laser and matter can be captured in real time, and the energy state during the processing can be converted into a quantifiable optical signal, providing direct process data support for subsequent online evaluation of engraving accuracy. The plasma optical signal refers to the optical signal corresponding to the changes in light radiation, light scattering or light absorption that occur when the laser interacts with the nanoparticle structure on the surface of the glass to be engraved during the initial engraving texture formation process, due to the surface plasma resonance effect generated by the laser energy excitation of free electrons on the nanoparticle surface.

[0047] As an embodiment of the present invention, the step of synchronously monitoring the plasma optical signal corresponding to the nanoparticle structure during the initial engraving texture formation process includes: Identify the formation area of ​​the initial engraved texture, and set the optical signal acquisition array corresponding to the nanoparticle structure in the formation area; An optical fiber spectral probe corresponding to the nanoparticle structure is configured in the optical signal acquisition array. Based on the fiber optic spectral probe, the original plasma spectrum of the nanoparticle structure under stimulated emission during laser engraving is acquired in real time. The original plasma spectrum is normalized to obtain a normalized plasma spectrum; Extract the characteristic optical parameters of the standardized plasma spectrum; The engraving state parameters of the nanoparticle structure during the initial engraving texture formation process are measured in real time. Establish a real-time mapping relationship between the characteristic optical parameters and the carving state parameters; Based on the real-time mapping relationship, the plasma optical signal corresponding to the nanoparticle structure is monitored synchronously.

[0048] The forming region refers to a specific spatial area on or inside the glass surface to be engraved, where initial laser engraving is underway and the initial engraved texture is gradually taking shape. The optical signal acquisition array refers to a set of multiple optical signal acquisition positions arranged according to a preset spatial distribution rule within the forming region. The fiber optic spectral probe is a fiber optic sensing element used to receive and transmit optical signals. Stimulated emission refers to the physical process in which the electrons inside the nanoparticle structure are excited and transition back to the ground state after absorbing the light energy during the laser engraving process, releasing photons with a specific wavelength. The raw plasma spectrum refers to the spectral data of the unprocessed plasma light signal directly acquired by the fiber optic spectral probe. The normalized plasma spectrum refers to the raw plasma spectrum after dark noise subtraction, spectral response correction, and intensity normalization. The data obtained after a series of preprocessing steps are spectral data that can be used for quantitative analysis. The characteristic optical parameters refer to key parameters extracted from standardized plasma spectra that characterize the plasma resonance characteristics and engraving state of nanoparticle structures, including but not limited to the peak wavelength, resonance peak intensity, full width at half maximum (FWHM), integrated light intensity, and peak wavelength shift of the plasma resonance peak. The engraving state parameters refer to physical quantities that directly or indirectly characterize the material modification state during the formation of the initial engraved texture, specifically including material removal rate, heat-affected zone depth, and surface roughness. The real-time mapping relationship refers to the dynamic quantitative correspondence between the characteristic optical parameters and the engraving state parameters. This relationship can be updated in real time during the engraving process, and the corresponding engraving state parameters can be quickly deduced based on the currently acquired characteristic optical parameters, achieving the goal of indirectly monitoring the engraving effect through spectral signals.

[0049] Optionally, the characteristic optical parameters of the standardized plasma spectrum can be extracted using a Gaussian fitting algorithm; the real-time mapping relationship between the characteristic optical parameters and the engraving state parameters can be established using a multiple linear regression algorithm.

[0050] The optimization control module 104 is used to analyze the expected standard signal of the 3D texture design model, and combine the expected standard signal with the plasma spectral signal to generate an online control instruction set and adaptive parameter optimization strategy for the glass to be sculpted.

[0051] This invention, through analyzing the expected standard signal of the 3D texture design model and combining it with the plasma spectral signal, generates an online control instruction set for the glass to be engraved. This ensures real-time capture of engraving accuracy deviations and provides a quantifiable control benchmark for the nanoscale thermal engraving process, thereby improving the precision of laser energy control during glass engraving.

[0052] The expected standard signal refers to the theoretical value of the plasma spectrum that should be generated under ideal carving conditions, obtained in advance through optical simulation calculation based on the geometric features and material physical properties of the 3D texture design model; the online control instruction set refers to the execution instructions generated based on the real-time deviation between the plasma spectrum signal and the expected standard signal, used to immediately adjust the laser processing device.

[0053] As an embodiment of the present invention, the step of combining the expected standard signal and the plasma spectral signal to generate an online control instruction set for the glass to be etched includes: Extract the target resonance peak position and intensity reference value from the expected standard signal; Identify the real-time resonance peak position and intensity detection value in the plasma spectral signal; Calculate the first offset between the real-time resonance peak position and the target resonance peak position, and the second offset between the intensity detection value and the intensity reference value; Based on the first comparison result between the first offset and the preset wavelength tolerance, and the second comparison result between the second offset and the preset intensity tolerance, an adaptive control command for the process state of the glass to be etched is generated. Based on the changing trend of the first offset, a feedforward control command for the focal position of the glass to be etched is generated. The process state adaptive control command and the focus position feedforward control command are integrated to generate an online control command set for the glass to be etched.

[0054] Wherein, the target resonance peak position refers to the center wavelength of the plasma resonance peak that characterizes the ideal nanoparticle resonance state, as preset; the intensity reference value refers to the intensity of the ideal plasma resonance peak corresponding to the target resonance peak position; the real-time resonance peak position refers to the center wavelength of the plasma resonance peak actually identified from the currently acquired plasma spectral signal; the intensity detection value refers to the actual plasma resonance peak intensity corresponding to the real-time resonance peak position from the currently acquired plasma spectral signal; the first offset refers to the numerical difference between the real-time resonance peak position and the target resonance peak position; the second offset refers to the numerical difference between the intensity detection value and the intensity reference value; and the preset wavelength tolerance refers to the allowable wavelength for achieving a qualified engraving effect. The first offset is the maximum absolute value range of the first offset; the first comparison result is a qualitative conclusion obtained by comparing the absolute value of the first offset with the preset wavelength tolerance; the preset intensity tolerance is the maximum absolute value range of the second offset allowed to achieve a qualified engraving effect; the second comparison result is a qualitative conclusion obtained by comparing the absolute value of the second offset with the preset intensity tolerance; the process state adaptive control instruction is a set of instructions used to adjust the laser power and scanning speed in real time, aiming to stabilize the engraving process state within the expected range; the change trend includes the direction and rate of change of the first offset over a period of time; the focus position feedforward control instruction is an instruction used to adjust the spatial position of the laser focus in advance to compensate for the expected deviation.

[0055] Optionally, the focus position feedforward control command of the glass to be etched can be generated using a model prediction controller.

[0056] As another embodiment of the present invention, the step of generating an adaptive control command for the process state of the glass to be etched based on the first comparison result of the first offset and the preset wavelength tolerance, and the second comparison result of the second offset and the preset intensity tolerance, includes: Based on the first comparison result and the second comparison result, the graded response threshold of the glass to be engraved is defined; Based on the graded response threshold, a multi-parameter collaborative decision matrix is ​​established for the glass to be etched. Identify the current offset state of the glass to be etched, and based on the current offset state and the multi-parameter collaborative decision matrix, determine the laser power adjustment amount and scanning speed adjustment amount of the glass to be etched; Based on the laser power adjustment amount and the scanning speed adjustment amount, an adaptive control command for the process state of the glass to be etched is generated.

[0057] The graded response threshold refers to multiple offset judgment thresholds based on the severity of the first and second comparison results. For example, warning thresholds, correction thresholds, and intervention thresholds can be set. The multi-parameter collaborative decision matrix is ​​a matrix model constructed with the first comparison result as the row and the second comparison result as the column to determine the laser parameter adjustment strategy. Each cell in the matrix corresponds to a set of peak position-intensity offset combinations. The current offset state refers to the combination state of the peak position offset level corresponding to the first offset and the intensity offset level corresponding to the second offset at the current engraving moment. The laser power adjustment amount refers to the value determined from the multi-parameter collaborative decision matrix based on the current offset state, which requires changing the laser output power. The scanning speed adjustment amount refers to the value determined from the multi-parameter collaborative decision matrix based on the current offset state, which requires changing the laser scanning speed.

[0058] Optionally, the graded response threshold of the glass to be etched can be defined by a reinforcement learning algorithm; the multi-parameter collaborative decision matrix of the glass to be etched can be established using response surface methodology.

[0059] Furthermore, this embodiment of the invention generates an adaptive parameter optimization strategy for the glass to be etched by combining the expected standard signal and the plasma spectral signal. This strategy can proactively adjust the core parameters of the laser device based on the dynamic deviation between the real-time process state and the target model, thereby autonomously maintaining the optimal processing window in a complex engraving environment and ensuring the consistency of precision in nanoscale texture formation. The adaptive parameter optimization strategy refers to a set of decision rules established based on historical processing data and real-time signal trends for proactively adjusting laser process parameters.

[0060] As an embodiment of the present invention, the adaptive parameter optimization strategy for generating the glass to be etched by combining the expected standard signal and the plasma spectral signal includes: Identify the overall deviation of the plasma spectral signal from the expected standard signal and its time-varying rate; Based on the overall deviation and the time-varying rate, calculate the critical margin of process instability of the glass to be etched; Based on the aforementioned process instability critical margin, the strategy triggering conditions for the glass to be etched are set. Configure the multi-objective optimization parameter set of the glass to be sculpted according to the strategy triggering conditions; Based on the strategy triggering conditions and the multi-objective optimization parameter set, an adaptive parameter optimization strategy is generated for the glass to be sculpted.

[0061] Wherein, the comprehensive deviation is a dimensionless scalar used to quantify the overall difference between the plasma spectral signal and the expected standard signal, which can be calculated by the vector norm of the real-time plasma spectrum and the expected standard signal, and its value is a real number greater than or equal to 0; the time-varying rate is the rate of change of the comprehensive deviation over time; the process instability critical margin is a dimensionless measure characterizing how much safe space the current engraving process state is from the instability boundary, ranging from 0 to 1. The closer the value is to 1, the more stable the process is; the closer it is to 0, the closer the process is to the instability critical point; the strategy triggering condition is a set of decision rules preset based on the numerical range of the process instability critical margin to initiate different levels of parameter optimization strategies. For example, the strategy triggering condition can be defined as follows: when the process instability critical margin > 0.8, a fine-tuning strategy is triggered; when 0.5 < the process instability critical margin < 0.8, a correction strategy is triggered; and when the process instability critical margin < 0.5, an intervention strategy is triggered. The multi-objective optimization parameter set refers to a set of candidate laser process parameters configured to simultaneously optimize multiple competing process objectives in the strategy triggering condition, such as engraving accuracy, efficiency, and surface quality.

[0062] Optionally, the strategy triggering condition of the glass to be etched can be set by a fuzzy logic controller; the multi-objective optimization parameter set of the glass to be etched can be configured using a multi-objective particle swarm optimization algorithm.

[0063] For example, the critical margin for process instability of the glass to be etched is calculated using the following formula. It should be noted that this calculation method is only one possible method and does not affect the implementation of the basic scheme above:

[0064] in, This indicates the critical margin for process instability of the glass to be engraved. This indicates the initial stability of the glass to be engraved. Indicates the overall deviation. Represents the deviation characteristic coefficient. Indicates the time-varying rate. Represents the rate characteristic coefficient. , These represent the coupling weight coefficients.

[0065] It should be explained that the deviation characteristic coefficient refers to a dimensionless proportionality coefficient that measures the impact of a calibrated overall deviation on device stability. It can be determined by analyzing the statistical distribution of spectral deviations of qualified and failed samples in a historical process database, and its value typically ranges from 0.5 to 2.0. For example, for an engraving process with a precision requirement of ±2nm, an early warning is triggered when a wavelength offset reaches 3nm; in this case, the deviation characteristic coefficient can be set to 1.5. If the process tolerance is tightened to ±1nm, it needs to be adjusted to 0.8. The rate characteristic coefficient refers to a dimensionless proportionality coefficient that measures the impact of a calibrated time-varying rate on device stability, and its value typically ranges from 0.1 to 5.0. For example, in heat-sensitive glass engraving, intervention is required when the deviation increases by 0.3 per second, at which point the rate characteristic coefficient is set to 1.0; for materials with high thermal inertia, this can be relaxed to 3.0. Optionally, the rate characteristic coefficient can be determined by analyzing the critical rate of state change in process instability cases; the coupling weight coefficient refers to a pair of dimensionless coefficients that respectively adjust the weights of the overall deviation and the time-varying rate in their combined influence on device stability, used to quantify the relative contribution of static deviation and dynamic trend to the total instability risk. For example, when > When the deviation is high, it indicates that the device stability focuses more on the tolerance to static deviations; conversely, it focuses more on the sensitivity to the trend of state changes. Optionally, the coupling weight coefficient can be determined by a multi-objective optimization algorithm combined with expert experience, and must satisfy the constraint condition α+β=1. It should be noted that the above formula can accurately reflect the nonlinear abrupt change characteristics of the glass engraving process from stability to instability. For example, when the deviation... When the rate of change R is small, the margin M decreases slowly; once D or R exceeds... and Once a certain threshold is reached, the margin M will decrease sharply.

[0066] The online correction module 105 is used to perform precision correction processing on the initial engraved texture based on the online control instruction set and the adaptive parameter optimization strategy to obtain the target texture engraving result.

[0067] This invention, through the online control instruction set and the adaptive parameter optimization strategy, performs precision correction processing on the initial engraved texture to obtain the target texture engraving result. It can effectively achieve morphological precision control and internal three-dimensional structure processing of complex glass textures at the nanoscale. At the same time, it provides closed-loop intelligent decision support for process optimization and quality control of glass micro-nano engraving, fundamentally solving the technical limitations of traditional CNC precision engraving methods that cannot handle internal structures and micro-features due to reliance on physical contact and macro-processing.

[0068] The target texture engraving result refers to the final glass product obtained after the accuracy correction process, which conforms to the geometric shape and physical property requirements of the 3D texture design model. Optionally, the accuracy correction process of the initial engraved texture can be achieved through an iterative learning control algorithm. For example, laser power, scanning speed, and pulse overlap rate can be used as control variables, and plasma resonance peak position shift, spectral intensity attenuation rate, and texture depth deviation can be used as accuracy indicators. Through multiple rounds of processing iterative learning, the contribution weight of each variable to the overall accuracy can be determined. Then, combined with the feedback data from the real-time spectral monitoring device, the weighted control command can be mapped to the parameter adjustment sequence of the laser, which can dynamically achieve a successive approximation from the initial rough texture to the target nanometer precision.

[0069] Compared to the prior art, this invention, by acquiring a glass substrate to be etched and constructing a nanoparticle structure corresponding to the glass to be etched on the glass substrate, can transform the macroscopic glass texture engraving laser processing process into a nanoscale high-precision processing process, achieving complex texture morphology highly consistent with the 3D design model. Furthermore, by calling the 3D texture design model of the glass to be etched and identifying the plasmonic resonance characteristics of the nanoparticle structure to generate the laser engraving path and key laser parameters of the glass to be etched, this invention can transform the virtual design into executable physical processing instructions, achieving nanoscale spatiotemporal control of laser energy. This ensures the precision and reliability of the complex texture engraving process on glass. In this embodiment, the initial laser engraving of the glass to be engraved is performed according to the key laser parameters and the laser engraving path to obtain the initial engraved texture. This provides a measurable physical benchmark and feedback control basis for subsequent nanoscale precision closed-loop correction based on plasma optical signals. Furthermore, this embodiment, by simultaneously monitoring the plasma optical signal corresponding to the nanoparticle structure during the initial engraved texture formation process, can capture the changes in the physical effects of laser-matter interaction in real time, converting the energy state during processing into a quantifiable optical signal, providing a basis for subsequent online evaluation. This invention provides direct process data support for estimating engraving accuracy. By analyzing the expected standard signal of the 3D texture design model and combining it with the plasma spectral signal, an online control instruction set for the glass to be engraved is generated. This ensures real-time capture of engraving accuracy deviations and provides a quantifiable control benchmark for the nanoscale thermal engraving process, improving the precision of laser energy control during glass engraving. Furthermore, by combining the expected standard signal with the plasma spectral signal, an adaptive parameter optimization strategy for the glass to be engraved is generated. This strategy can proactively optimize parameters based on the dynamic deviation between the real-time process state and the target model. By adjusting the core parameters of the laser device, the optimal processing window can be maintained autonomously in complex engraving environments, ensuring the consistency of precision in nanoscale texture formation. Finally, this embodiment of the invention performs precision correction processing on the initial engraved texture based on the online control instruction set and the adaptive parameter optimization strategy to obtain the target texture engraving result. This effectively achieves precise control of the morphology and internal three-dimensional structure processing of complex glass textures at the nanoscale, while providing closed-loop intelligent decision support for process optimization and quality control of glass micro-nano engraving. This fundamentally solves the technical limitations of traditional CNC precision engraving methods, which rely on physical contact and macroscopic processing and cannot handle internal structures and microscopic features. Therefore, the device and engraving method for complex glass texture engraving provided by this embodiment of the invention can precisely control the texture morphology of glass engraving at the microscale, improving the overall engraving level of complex glass textures.

[0070] like Figure 3 The diagram shown is a flowchart illustrating an apparatus and engraving method for engraving complex textures on glass according to an embodiment of the present invention. In this embodiment, the engraving method for engraving complex textures on glass includes: S1. Obtain a glass substrate for the glass to be etched, and construct a nanoparticle structure corresponding to the glass to be etched on the glass substrate; S2. Call the 3D texture design model of the glass to be etched and identify the plasma resonance characteristics of the nanoparticle structure to generate the laser engraving path and key laser parameters of the glass to be etched. S3. Based on the key laser parameters and the laser engraving path, perform initial laser engraving on the glass to be engraved to obtain an initial engraving texture. During the formation of the initial engraving texture, the plasma light signal corresponding to the nanoparticle structure is monitored simultaneously. S4. Analyze the expected standard signal of the 3D texture design model, and combine the expected standard signal with the plasma spectrum signal to generate the online control instruction set and adaptive parameter optimization strategy for the glass to be sculpted. S5. Based on the online control instruction set and the adaptive parameter optimization strategy, the initial engraved texture is subjected to precision correction processing to obtain the target texture engraving result.

[0071] In the several embodiments provided by this invention, it should be understood that the provided apparatus and method can be implemented in other ways. For example, the apparatus embodiments described above are merely illustrative; for example, the division of modules is merely a logical functional division, and other division methods may be used in actual implementation.

[0072] Furthermore, the functional modules in the various embodiments of the present invention can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit. The integrated unit can be implemented in hardware or in the form of hardware plus software functional modules.

[0073] Finally, it should be noted that in the above embodiments, each embodiment can be combined with each other or independent. Deleting any one of them will not affect the technical implementation of other embodiments. The above embodiments are only used to illustrate the technical solutions of the present invention and not to limit it. Although the present invention has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention.

Claims

1. A device for engraving complex textures on glass, characterized in that, The device includes: A nanostructure fabrication module is used to obtain a glass substrate for the glass to be etched, and to construct a nanoparticle structure corresponding to the glass to be etched on the glass substrate. The process planning module is used to call the 3D texture design model of the glass to be etched and identify the plasma resonance characteristics of the nanoparticle structure in order to generate the laser engraving path and key laser parameters of the glass to be etched. The signal monitoring module is used to perform initial laser engraving on the glass to be engraved according to the key laser parameters and the laser engraving path to obtain an initial engraved texture. During the formation of the initial engraved texture, the plasma light signal corresponding to the nanoparticle structure is monitored simultaneously. The optimization control module is used to analyze the expected standard signal of the 3D texture design model, and combine the expected standard signal with the plasma spectral signal to generate an online control instruction set and adaptive parameter optimization strategy for the glass to be sculpted. The online correction module is used to perform accuracy correction processing on the initial sculpted texture based on the online control instruction set and the adaptive parameter optimization strategy to obtain the target texture sculpting result.

2. The apparatus for engraving complex textures on glass as described in claim 1, characterized in that, The process of constructing the nanoparticle structure corresponding to the glass to be etched on the glass substrate includes: The glass substrate is subjected to surface cleaning and activation treatment to obtain the target substrate surface; Obtain the laser engraving wavelength preset for the glass to be engraved, so as to prepare the nanoparticle growth solution corresponding to the glass substrate; The nanoparticle growth solution is spin-coated onto the surface of the target substrate to form an initial nanoparticle film. Annealing the initial nanoparticle film yields a nanoparticle assembly. The plasma resonance spectrum of the nanoparticle assembly was measured, and the peak wavelength in the plasma resonance spectrum was extracted. Based on the laser engraving wavelength and the peak wavelength, the nanoparticle structure corresponding to the glass to be engraved is selected from the set of nanoparticles.

3. The apparatus for engraving complex textures on glass as described in claim 2, characterized in that, The step of obtaining a preset laser engraving wavelength for the glass to be engraved, in order to prepare a nanoparticle growth solution corresponding to the glass substrate, includes: The surface chemical properties of the glass substrate are analyzed in order to select the noble metal precursor corresponding to the glass substrate; Based on the reduction potential characteristics of the noble metal precursor, the morphology control agent and reducing agent corresponding to the glass substrate are selected. Based on the laser engraving wavelength, determine the plasma resonance peak wavelength corresponding to the glass substrate; Based on the chemical properties of the noble metal precursor and the wavelength of the plasma resonance peak, the molar concentration ratio of the morphology control agent to the noble metal precursor is defined. Based on the molar concentration ratio, the noble metal precursor, the morphology control agent, and the reducing agent are placed in a preset solvent system for mixing and reaction to obtain a nanoparticle growth solution.

4. The apparatus for engraving complex textures on glass as described in claim 1, characterized in that, The step of calling the 3D texture design model of the glass to be etched and identifying the plasmon resonance characteristics of the nanoparticle structure to generate the laser engraving path of the glass to be etched includes: The 3D texture design model is triangulated to obtain a discrete surface model; Calculate the normal vector of each vertex in the discrete surface model to construct the surface orientation vector field of the glass to be sculpted; Based on the plasma resonance characteristics, the effective range of the laser on the glass to be etched is determined; Extract the surface curvature feature parameters of the surface orientation vector field; Based on the effective range of the laser and the surface curvature characteristic parameters, a set of focal paths is generated for the glass to be etched. Interference verification and path smoothing optimization are performed on the focal path set to obtain the laser engraving path of the glass to be engraved.

5. The apparatus for engraving complex textures on glass as described in claim 4, characterized in that, The step of generating the focal path set of the glass to be etched based on the effective range of the laser and the surface curvature characteristic parameters includes: Based on the surface curvature characteristic parameters, the high curvature characteristic region and the flat region of the glass to be etched are identified. The reference path spacing corresponding to the flat area is determined based on the lateral dimension of the effective range of the laser. Based on the baseline path spacing, adaptive path encryption processing is performed in the high curvature feature region to obtain an encrypted path subset, and equal-spacing path planning processing is performed in the flat region to obtain a baseline path subset. The encrypted path subset and the baseline path subset are combined to generate the focal path set of the glass to be etched.

6. The apparatus for engraving complex textures on glass as described in claim 1, characterized in that, The process of simultaneously monitoring the plasma optical signal corresponding to the nanoparticle structure during the initial engraving texture formation includes: Identify the formation area of ​​the initial engraved texture, and set the optical signal acquisition array corresponding to the nanoparticle structure in the formation area; An optical fiber spectral probe corresponding to the nanoparticle structure is configured in the optical signal acquisition array. Based on the fiber optic spectral probe, the original plasma spectrum of the nanoparticle structure under stimulated emission during laser engraving is acquired in real time. The original plasma spectrum is normalized to obtain a normalized plasma spectrum; Extract the characteristic optical parameters of the standardized plasma spectrum; The engraving state parameters of the nanoparticle structure during the initial engraving texture formation process are measured in real time. Establish a real-time mapping relationship between the characteristic optical parameters and the carving state parameters; Based on the real-time mapping relationship, the plasma optical signal corresponding to the nanoparticle structure is monitored synchronously.

7. The apparatus for engraving complex textures on glass as described in claim 1, characterized in that, The step of combining the expected standard signal and the plasma spectral signal to generate an online control command set for the glass to be etched includes: Extract the target resonance peak position and intensity reference value from the expected standard signal; Identify the real-time resonance peak position and intensity detection value in the plasma spectral signal; Calculate the first offset between the real-time resonance peak position and the target resonance peak position, and the second offset between the intensity detection value and the intensity reference value; Based on the first comparison result between the first offset and the preset wavelength tolerance, and the second comparison result between the second offset and the preset intensity tolerance, an adaptive control command for the process state of the glass to be etched is generated. Based on the changing trend of the first offset, a feedforward control command for the focal position of the glass to be etched is generated. The process state adaptive control command and the focus position feedforward control command are integrated to generate an online control command set for the glass to be etched.

8. The apparatus for engraving complex textures on glass as described in claim 7, characterized in that, The process state adaptive control command for the glass to be etched is generated based on the first comparison result of the first offset and the preset wavelength tolerance, and the second comparison result of the second offset and the preset intensity tolerance, including: Based on the first comparison result and the second comparison result, the graded response threshold of the glass to be engraved is defined; Based on the graded response threshold, a multi-parameter collaborative decision matrix is ​​established for the glass to be etched. Identify the current offset state of the glass to be etched, and based on the current offset state and the multi-parameter collaborative decision matrix, determine the laser power adjustment amount and scanning speed adjustment amount of the glass to be etched; Based on the laser power adjustment amount and the scanning speed adjustment amount, an adaptive control command for the process state of the glass to be etched is generated.

9. The apparatus for engraving complex textures on glass as described in claim 1, characterized in that, The adaptive parameter optimization strategy for generating the glass to be etched by combining the expected standard signal and the plasma spectral signal includes: Identify the overall deviation of the plasma spectral signal from the expected standard signal and its time-varying rate; Based on the overall deviation and the time-varying rate, calculate the critical margin of process instability of the glass to be etched; Based on the aforementioned process instability critical margin, the strategy triggering conditions for the glass to be etched are set. Configure the multi-objective optimization parameter set of the glass to be sculpted according to the strategy triggering conditions; Based on the strategy triggering conditions and the multi-objective optimization parameter set, an adaptive parameter optimization strategy is generated for the glass to be sculpted.

10. An apparatus and method for engraving complex textures in glass, employing the apparatus for engraving complex textures in glass as described in any one of claims 1-9, characterized in that, The engraving method includes: Obtain a glass substrate for the glass to be etched, and construct a nanoparticle structure corresponding to the glass to be etched on the glass substrate; The 3D texture design model of the glass to be etched is invoked, and the plasma resonance characteristics of the nanoparticle structure are identified to generate the laser engraving path and key laser parameters of the glass to be etched. Based on the key laser parameters and the laser engraving path, the initial laser engraving of the glass to be engraved is performed to obtain the initial engraved texture. During the formation of the initial engraved texture, the plasma light signal corresponding to the nanoparticle structure is monitored simultaneously. The expected standard signal of the 3D texture design model is analyzed, and the expected standard signal is combined with the plasma spectral signal to generate an online control instruction set and adaptive parameter optimization strategy for the glass to be sculpted. Based on the online control instruction set and the adaptive parameter optimization strategy, the initial sculpted texture is subjected to precision correction processing to obtain the target texture sculpting result.

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