Particle source assembly and particle beam equipment

Abstract

The embodiment of the invention provides a particle source assembly and particle beam equipment, relates to the technical field of charged particle beam processing and detection equipment, and is used for improving the degree of freedom of beam state adjustment of charged particle beams. The particle source assembly comprises a particle source, an adjustable diaphragm and a collimating lens device which are arranged along a first direction. Wherein the particle source is used for generating a charged particle beam which is emitted towards the adjustable diaphragm along a first direction; the adjustable diaphragm is positioned in a transmission path of the charged particle beam, and the size of a diaphragm hole is adjustable, so that the beam size of the charged particle beam is adjusted; the collimating lens device is used for collimating the charged particle beam emitted from the adjustable diaphragm, and the position of the collimating main plane in the first direction is adjustable. The particle source assembly can be applied to particle beam equipment.

Description

Technical Field

[0001] This application relates to the technical field of charged particle beam processing and detection equipment, and in particular to a particle source component and a particle beam device. Background Technology

[0002] Particle beam equipment refers to devices that use charged particle beams, such as electron beams or ion beams, as working particles. Examples include electron beam inspection (EBI) equipment, electron beam lithography (EBL) equipment, focused-ion-beam (FIB) equipment, and ion implantation equipment. All of these particle beam devices include a particle source for generating the charged particle beam.

[0003] In different application scenarios, particle beam devices have different requirements for the beam state of charged particle beams. Therefore, the particle source needs to have the ability to adjust the beam state of charged particle beams. However, the particle sources in related technologies have relatively limited adjustment capabilities for the beam state of charged particle beams, with low degrees of freedom. Summary of the Invention

[0004] This application provides a particle source component and a particle beam device to improve the degree of freedom in adjusting the beam state of a charged particle beam.

[0005] To achieve the above objectives, the embodiments of this application adopt the following technical solutions:

[0006] In a first aspect, embodiments of this application provide a particle source assembly, which includes a particle source, an adjustable aperture, and a collimating lens device arranged along a first direction; wherein the particle source is used to generate a charged particle beam emitted along the first direction toward the adjustable aperture.

[0007] The adjustable aperture is located in the path of the charged particle beam. The size of the aperture is adjustable to adjust the beam current of the charged particle beam.

[0008] The collimating lens device is used to collimate a beam of charged particles emitted from an adjustable aperture, and the position of the collimating principal plane is adjustable in the first direction.

[0009] In the particle source assembly provided in this application embodiment, the adjustable aperture can adjust the beam current of the charged particle beam by changing the size of the aperture opening located in the transmission path of the charged particle beam. The collimating lens device can adjust the beam current density and beam current area of ​​the charged particle beam by controlling the position of the collimating principal plane in the first direction. Through the cooperation of the adjustable aperture and the collimating lens device, the beam current size, beam current area, and beam current density of the charged particle beam can be adjusted synchronously, with a high degree of freedom in adjustment, which can be adapted to a variety of different application scenarios.

[0010] In some embodiments, the particle source assembly includes a lens structure having a lens cavity, and the collimating lens device includes at least two collimating lenses arranged in a first direction in the lens cavity; each of the at least two collimating lenses is used to focus a charged particle beam, and the focusing power is adjustable; each collimating lens has a collimating working state for the charged particle beam.

[0011] In the particle source assembly provided in this application embodiment, the collimating lens device designed above can achieve the purpose of adjusting the position of the collimating principal plane in the first direction by controlling the focusing power and distribution ratio of each collimating lens; and has the advantages of simple control and fast response speed.

[0012] In some embodiments, the collimating lens device further includes a first driving device mounted on the lens barrel structure, the first driving device being used to drive the collimating lens to move along a first direction. This design can change the relative positional relationship of each collimating lens in the collimating lens device, thereby facilitating the expansion of the adjustment range for the collimating principal plane, and further expanding the adjustment range for the beam state of the charged particle beam.

[0013] In some embodiments, the collimating lens is an electromagnetic lens or an electrostatic lens, and at least two collimating lenses may be of the same or different types. This design overcomes the limitations of collimating lens selection, thus adapting to different application scenarios.

[0014] In some embodiments, at least two collimating lenses include an electromagnetic lens, the electromagnetic lens including a magnetic yoke and an excitation coil, the magnetic yoke being an annular shell with a first axis as its central axis, the first axis being parallel to a first direction; the magnetic yoke having a lens aperture at the location of the first axis.

[0015] The magnetic yoke has an annular cavity surrounding the lens aperture and a pole shoe opening communicating with the annular cavity. The pole shoe opening is located in the inner annular portion of the magnetic yoke near the lens aperture. The excitation coil is located in the annular cavity. The size of the pole shoe opening in the magnetic yoke is adjustable in a first direction.

[0016] This design allows for online optimization of aberrations by adjusting the size of the pole shoe opening, while also expanding the adjustment range for aligning with the principal plane, thereby expanding the adjustment range for the beam state of the charged particle beam.

[0017] In some implementations, the magnetic yoke includes a first portion and a second portion located on both sides of the pole shoe opening in a first direction; in the outer ring portion opposite to the pole shoe opening, the first portion and the second portion respectively include a first outer ring portion and a second outer ring portion; the second outer ring portion is sleeved on the outer periphery of the first outer ring portion by a threaded structure around the first axis.

[0018] The collimating lens device also includes a second driving device disposed on the lens barrel structure, which is used to drive the second part to rotate relative to the first part about the first axis.

[0019] In the particle source assembly provided in this application embodiment, the electromagnetic lens designed above can change the size of the pole shoe opening by driving the rotation of a part of the structure without affecting the magnetic yoke function in the electromagnetic lens.

[0020] In some embodiments, the second driving device includes a second driving shaft and a second transmission mechanism, wherein the second driving shaft passes through the lens barrel structure along a third axis and is rotatable about the third axis relative to the lens barrel structure; the second driving shaft includes an input end located outside the lens barrel cavity and an output end located inside the lens barrel cavity; wherein the third axis is perpendicular to the first axis.

[0021] The second transmission mechanism includes a third bevel gear and a fourth bevel gear that mesh with each other. The third bevel gear is located at the output end of the second drive shaft, and the fourth bevel gear is located on the second part.

[0022] In the particle source assembly provided in this application embodiment, the electromagnetic lens and second driving device designed above can realize the function of adjusting the size of the pole shoe opening, and have advantages such as simple structure and ease of implementation. In addition, the power input of the second driving device can be manual input or input from a motor, thereby adapting to different application scenarios.

[0023] In some embodiments, the particle source assembly includes a lens structure having a lens barrel cavity, and the collimating lens device includes a collimating lens disposed in the lens barrel cavity. The collimating lens is used to focus a charged particle beam, and the focusing power is adjustable. The collimating lens has a collimating working state for the charged particle beam.

[0024] The collimating lens device also includes a first driving device mounted on the lens barrel structure, which is used to drive the collimating lens to move along a first direction.

[0025] In the particle source assembly provided in this application embodiment, the collimating lens device may include a first-stage collimating lens. By driving the first-stage collimating lens to move in a first direction, the position of the collimating principal plane in the first direction is changed. This design has advantages such as simple structure and small footprint.

[0026] In some embodiments, the first driving device includes a movable mounting structure, a first drive shaft, and a first transmission mechanism. The movable mounting structure is disposed within the lens barrel cavity and connected to the lens barrel structure via a threaded structure around a first axis; the second axis is perpendicular to the first axis.

[0027] The first drive shaft passes through the lens barrel structure along the second axis and is rotatable about the second axis relative to the lens barrel structure; the second drive shaft includes an input end located outside the lens barrel cavity and an output end located inside the lens barrel cavity. The first transmission mechanism includes a meshing first bevel gear and a second bevel gear, the first bevel gear being disposed at the output end of the first drive shaft, and the second bevel gear being disposed on the movable mounting structure.

[0028] In the particle source assembly provided in this application embodiment, the first driving device with the above-described design can realize the function of adjusting the position of the collimating lens in the first direction, and has advantages such as simple structure and ease of implementation. Furthermore, the power input of the first driving device can be manual input or input from a motor, thereby adapting to different application scenarios.

[0029] In some embodiments, the adjustable aperture includes an aperture plate and an aperture driving device. The aperture plate is provided with a plurality of aperture holes of different sizes. The aperture driving device is connected to the aperture plate and is used to drive the aperture plate to move. During the movement, the aperture plate has a working state in which any aperture hole is located in the charged particle beam transmission path.

[0030] In the particle source assembly provided in this application embodiment, the adjustable aperture designed above can be used to move apertures of different sizes to the transmission position of the charged particle beam by driving the aperture plate to move, thereby obtaining a charged particle beam with a specified beam area and beam size according to the requirements; and it has the advantages of simple structure and easy implementation.

[0031] In some embodiments, the aperture plate is a plate-shaped structure perpendicular to the first direction; the plurality of aperture holes in the aperture plate are arranged in a one-dimensional array parallel to the second direction, or arranged in a two-dimensional array.

[0032] The aperture driving device drives the aperture plate to move along a second direction and a third direction; wherein the second direction and the third direction are perpendicular to each other and are both parallel to the aperture plate.

[0033] In the adjustable aperture using the above design, the aperture plate can be arranged with different numbers, sizes and arrays of aperture holes according to requirements to adapt to different application scenarios, such as different adjustment ranges for beam size.

[0034] In some embodiments, the adjustable aperture includes an aperture assembly and an aperture driving device. The aperture assembly includes a mounting base and a plurality of apertures. The plurality of apertures in the aperture assembly surround to form an aperture hole located in the charged particle beam transmission path, and the apertures are movable relative to the mounting base. During the movement of the apertures relative to the mounting base, the size of the aperture hole changes.

[0035] The aperture drive device is connected to the aperture plate assembly and is used to drive the multiple aperture plates in the aperture plate assembly to move relative to the mounting base.

[0036] In the particle source assembly provided in this application embodiment, the adjustable aperture designed above can ensure the alignment accuracy between the aperture and the charged particle beam transmission path during the adjustment of the aperture size.

[0037] In some embodiments, the particle source assembly further includes a beam splitting device disposed between the collimating lens device and the adjustable aperture, or disposed on the side of the collimating lens device away from the adjustable aperture along a first direction; the beam splitting device includes a beam splitting aperture array formed by arranging a plurality of beam splitting apertures, the beam splitting aperture array being used to split the charged particle beam into a plurality of sub-particle beams.

[0038] In the particle source component provided in the embodiments of this application, multiple sub-particle beams can be generated by a beam splitting device, thereby adapting to multi-particle beam application scenarios.

[0039] In some embodiments, the beams in the beam-splitter array are arranged in a one-dimensional array or a two-dimensional array in a plane perpendicular to the first direction.

[0040] In the beam splitting device using the above design, the beam splitting device can arrange different numbers and different arrays of beam splitting holes according to the beam splitting requirements to adapt to different application scenarios.

[0041] Secondly, embodiments of this application also provide a particle beam device, which includes the particle source assembly described in any embodiment of the first aspect. The particle source assembly is used to generate a charged particle beam. The particle beam device also includes a sample stage and an imaging system. The sample stage is disposed on one side of the particle source assembly and is used to hold a sample. The imaging system is disposed between the particle source assembly and the particle source assembly and is used to focus the charged particle beam onto the sample on the sample stage.

[0042] In some embodiments, the imaging system includes at least one condenser lens for focusing a beam of charged particles; the imaging system also includes an objective lens disposed between the sample stage and the condenser lens for focusing the beam of charged particles onto a sample on the sample stage.

[0043] In some embodiments, the particle source component includes a beam splitting device for generating multiple sub-particle beams; the focusing lens includes a microlens array, the microlens array including microlenses disposed corresponding to the sub-particle beams.

[0044] In some embodiments, the particle beam device is an electron beam lithography device, an electron beam detection device, a focused ion beam device, or an ion implantation device; the electron beam detection device is a scanning electron microscope, a transmission electron microscope, or a scanning transmission electron microscope.

[0045] The technical effects that the particle beam device provided in this application embodiment can achieve are the same as those that the particle source component in any of the above embodiments can achieve, and will not be repeated here. Attached Figure Description

[0046] Figure 1 This is a schematic diagram of the structure of a particle source component provided in an embodiment of this application;

[0047] Figure 2 This is a schematic diagram of the structure of an electron gun provided in an embodiment of this application;

[0048] Figure 3 This is a schematic diagram of an adjustable aperture provided in an embodiment of this application;

[0049] Figure 4 This is a schematic diagram of another adjustable aperture provided in an embodiment of this application;

[0050] Figure 5 for Figure 1 Schematic diagram of the collimating lens device in different embodiments Figure 1 ;

[0051] Figure 6 for Figure 1 Schematic diagram of the collimating lens device in different embodiments Figure 2 ;

[0052] Figure 7 A schematic diagram illustrating the principle of adjusting the collimation principal plane using the collimating lens device provided in the embodiments of this application;

[0053] Figure 8 A partial schematic diagram of another particle source component provided in an embodiment of this application at the position of the collimating lens device;

[0054] Figure 9A schematic diagram illustrating the cooperation between the electromagnetic lens and the second driving device provided in the embodiments of this application;

[0055] Figure 10 A partial schematic diagram of another particle source component provided in an embodiment of this application at the position of the collimating lens device;

[0056] Figure 11 This is a schematic diagram of the structure of a beam splitter device provided in an embodiment of this application;

[0057] Figure 12 A schematic diagram of a particle source component in different working states provided in an embodiment of this application;

[0058] Figure 13 This is a schematic diagram of the structure of a particle beam device provided in an embodiment of this application. Detailed Implementation

[0059] The technical solutions of the embodiments of this application will now be described with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of them.

[0060] In the following embodiments of this application, the terms "first," "second," etc., are used for descriptive convenience only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, a feature defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "a plurality of" means two or more.

[0061] In the embodiments of this application, "upper", "lower", "left" and "right" are not limited to the orientation of the components in the accompanying drawings. It should be understood that these directional terms can be relative concepts, used for relative description and clarification, and can change accordingly depending on the orientation of the components in the accompanying drawings.

[0062] In the embodiments of this application, unless the context otherwise requires, the term "comprising" is interpreted as open and encompassing throughout the specification and claims, meaning "including, but not limited to." In the description of the specification, terms such as "one embodiment," "some embodiments," "exemplary embodiment," "exemplarily," or "some examples" are intended to indicate that a particular feature, structure, material, or characteristic associated with that embodiment or example is included in at least one embodiment or example of this application. The illustrative representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics mentioned may be included in any suitable manner in any one or more embodiments or examples.

[0063] As used herein, “about,” “approximately,” or “approximately” includes the stated value and the average value within an acceptable range of deviation from the given value, wherein the acceptable range of deviation is determined by a person skilled in the art taking into account the measurement under discussion and the error associated with the measurement of the given quantity (i.e., the limitations of the measurement system).

[0064] As used herein, “parallel,” “perpendicular,” and “equal” include the described situation and situations that are similar to the described situation, within an acceptable range of deviation, which is determined by those skilled in the art taking into account the measurement under discussion and the error associated with the measurement of a particular quantity (i.e., the limitations of the measurement system). For example, “parallel” includes absolute parallelism and approximate parallelism, where an acceptable range of deviation for approximate parallelism may be, for example, within 5°; “perpendicular” includes absolute perpendicularity and approximate perpendicularity, where an acceptable range of deviation for approximate perpendicularity may also be, for example, within 5°; “equal” includes absolute equality and approximate equality, where an acceptable range of deviation for approximate equality may be, for example, a difference between the two equals being less than or equal to 5% of either one.

[0065] It should be understood that when a layer or element is referred to as being on another layer or substrate, it can mean that the layer or element is directly on the other layer or substrate, or that there is an intermediate layer between the layer or element and the other layer or substrate.

[0066] Exemplary embodiments are described in this application with reference to cross-sectional views and / or plan views and / or equivalent circuit diagrams, which are idealized exemplary drawings. In the drawings, the thickness of layers and regions is enlarged for clarity. Therefore, variations in shape relative to the drawings are contemplated due to, for example, manufacturing techniques and / or tolerances. Thus, exemplary embodiments should not be construed as being limited to the shapes of the regions shown herein, but rather include shape deviations due to, for example, manufacturing processes. For example, etched regions shown as rectangular would typically have curved features. Therefore, the regions shown in the drawings are schematic in nature, and their shapes are not intended to show the actual shapes of the regions of the device, nor are they intended to limit the scope of the exemplary embodiments.

[0067] This application provides a particle source component that can be applied in particle beam equipment to provide a charged particle beam with adjustable beam current state, adapting to the requirements of the particle beam equipment in different application scenarios. The charged particle beam can be an electron beam or an ion beam, etc., and the beam current state of the charged particle beam includes parameters characterizing the characteristics of the charged particle beam, such as beam current magnitude, beam current density, beam current area, and divergence angle. A particle beam equipment refers to a device that uses charged particle beams, such as electron beam inspection (EBI) equipment, electron beam lithography (EBL) equipment, focused-ion-beam (FIB) equipment, and ion implantation equipment.

[0068] The following description will use a charged particle beam as an example to illustrate the particle source component provided in the embodiments of this application, which is used to generate an electron beam with an adjustable beam state.

[0069] like Figure 1 As shown, the particle source assembly 1 includes a particle source 2 arranged along a first direction X, an adjustable aperture 4, a collimating lens device 5, and a beam splitter 6. The particle source 2 is used to generate an electron beam 3 with an initial beam state, which includes limitations on beam size, beam density, beam area, and divergence angle. The initial beam state of the electron beam 3 is related to the particle source 2 used. When the particle source 2 is used to generate the electron beam 3, it can also be referred to as an electron source.

[0070] Particle source 2 may include an electron gun, which can be a thermionic electron gun or a field-emission electron gun. The field-emission electron gun further includes a thermionic field-emission electron gun and a cold field-emission electron gun. For example, such as... Figure 2 As shown, the electron gun 8 is a thermal field emission electron gun, including a filament (cathode) 81, an extraction electrode (first anode) 82, and an accelerating electrode (second anode) 83; wherein, the filament (cathode) is used to generate electrons, the extraction electrode (first anode) 82 is used to extract the electrons generated by the filament (cathode) 81 to form an electron beam 3; and the accelerating electrode (second anode) 83 is used to accelerate the electron beam 3.

[0071] In this paper, the optical axis of the electron beam 3 generated by particle source 2 (electron gun 8) is referred to as the first optical axis, which is parallel to the first direction X. That is to say, the electron beam 3 generated by particle source 2 (electron gun 8) with an initial beam state is emitted along the first direction X.

[0072] Please continue to refer to this. Figure 1The adjustable aperture 4 in the particle source assembly 1 is disposed on one side of the particle source 2 along the first direction X, and is located downstream of the particle source 2 in the electron beam 3 transmission path. It should be noted that the description of B being downstream of A in the electron beam 3 transmission path refers to the electron beam 3 passing through A first and then B during transmission in the particle source assembly 1. In this embodiment, the electron beam 3 is transmitted along the first direction X, and A and B are arranged along the first direction X. When A is the particle source 2, B is located on the electron beam 3 emission side of A; when A is another structure located on the electron beam 3 emission side of the particle source 2, B is farther away from the particle source 2 relative to A.

[0073] like Figure 3 As shown, the adjustable aperture 4 includes an aperture plate 41 and an aperture driving device 42. The aperture plate 41 is a plate-shaped structure perpendicular to the first direction X, and has multiple aperture holes 43 of different diameters. Figure 3 As shown in parts (a) and (b), multiple aperture holes 43 of different sizes can be arranged in a one-dimensional array along the second direction Y on the aperture plate 41, or they can be arranged in a two-dimensional array along different directions on the aperture plate 41, for example, arranged in multiple rows and columns along the second direction Y and the third direction Z. The second direction Y and the third direction Z are perpendicular to each other and parallel to the aperture plate 41, that is, both are perpendicular to the first direction X.

[0074] Please combine Figure 1 The aperture driving device 42 is used to drive the aperture plate 41 to move in a plane perpendicular to the first direction X. During the movement of the aperture plate 41, the aperture hole 43 with any aperture size is located in the electron beam 3 transmission path. It can be seen that the adjustable aperture 4 has different adjustable working states, and the aperture size of the aperture hole 43 located in the electron beam 3 transmission path is different in different working states.

[0075] The aperture 43 is located in the transmission path of the electron beam 3, meaning that at least a portion of the beam cross-section of the electron beam 3 is aligned with the aperture 43, and at least a portion of the electron beam 3 will fall within the aperture 43. It should be noted that when describing the relationship between the aperture 43 and the electron beam 3 in this article, it refers to the relationship between the aperture 43 and the electron beam 3 at the location of the aperture 43.

[0076] In this embodiment, the aperture 43 being located in the transmission path of the electron beam 3 means that the center of the aperture 43 is aligned with the optical axis (first optical axis) of the electron beam 3; that is, the center of the beam cross-section of the electron beam 3 coincides with the center of the aperture 43. In this case, when the size of the aperture 43 is smaller than the beam cross-section of the electron beam 3, a portion of the electron beam 3 will fall into the aperture 43, and a portion will fall outside the aperture 43. The portion of the electron beam 3 falling into the aperture 43 will continue to be transmitted through the aperture 43, and the beam cross-section of this portion matches that of the aperture 43, with the beam area being the same as the area of ​​the aperture 43. The portion of the electron beam 3 falling outside the aperture 43 will be blocked by the outer peripheral structure of the aperture 43 and cannot pass through it.

[0077] It can be seen that a portion with the same shape as the aperture 43 can be cut from the electron beam 3 through the aperture 43, thereby achieving the purpose of adjusting the beam current area of ​​the electron beam 3; when the beam current density is constant, the beam current size can be adjusted by adjusting the beam current area.

[0078] Furthermore, when the size of the aperture 43 is larger than or equal to the beam cross-section of the electron beam 3, the entire electron beam 3 will fall within the aperture 43 and continue to propagate through it. The aperture 43 will not affect the beam area of ​​the electron beam 3. Based on this, among the multiple apertures 43 with different diameters on the aperture plate 41, the size of the largest aperture 43 should be set to not exceed the beam cross-section of the electron beam 3.

[0079] The aperture driving device 42 can determine the driving mode according to the arrangement of the aperture holes 43 on the aperture plate 41. For example, when the aperture holes 43 on the aperture plate 41 are arranged in a one-dimensional array parallel to the second direction Y, the aperture driving device 42 can drive the aperture plate 41 to move along the second direction Y. When the aperture holes 43 on the aperture plate 41 are arranged in a two-dimensional array, the aperture driving device 42 can drive the aperture plate 41 to move along the second direction Y and the third direction Z.

[0080] When the aperture holes 43 on the aperture plate 41 are arranged in a one-dimensional array parallel to the second direction Y, the aperture driving device 42 can also drive the aperture plate 41 to move along the second direction Y and the third direction Z at the same time, so as to ensure the accuracy of the movement position of the aperture holes 43 when driving aperture holes 43 of different sizes to move into the transmission path of the electron beam 3.

[0081] The control method for the aperture drive device 42 can be automatic or manual. The power source for the aperture drive device 42 can be a motor or a piezoelectric device, or it can be driven manually.

[0082] In the above embodiments, the adjustable aperture 4, driven by the aperture driving device 42 to move the aperture plate 41, enables aperture holes 43 of different sizes to move into the electron beam 3 transmission path, thereby changing the aperture size of the aperture holes 43 located in the electron beam 3 transmission path. This achieves the purpose of adjusting the beam area and beam current of the electron beam 3 to adapt to different application scenarios. For example, in high beam current (large beam current) application scenarios, a larger aperture aperture 43 can be driven into the electron beam 3 transmission path, while in low beam current (small beam current) application scenarios, a smaller aperture aperture 43 can be driven into the electron beam 3 transmission path.

[0083] However, the adjustable aperture 4 provided in this application embodiment is not limited to the above structure. For example, in some embodiments, such as Figure 4 As shown in parts (a) and (b), the adjustable aperture 4 includes an aperture assembly 44 and an aperture driving device 42. The aperture assembly 44 includes a mounting base 441 and at least two apertures 442 mounted on the mounting base 441. The apertures 442 in the aperture assembly 44 can be combined to form an aperture 43 located in the electron beam 3 transmission path, and the apertures 442 are movable relative to the mounting base 441. During the movement of the apertures 442 relative to the mounting base 441, the combined aperture 43 has different aperture sizes. The aperture driving device 42 in the adjustable aperture 4 is used to drive the apertures 442 in the aperture assembly 44 to move, thereby changing the size of the aperture 43.

[0084] It can be seen that the adjustable aperture 4 in this embodiment has an adjustable working state. In different working states, the size of the aperture 43 in the transmission path of the electron beam 3 is different, thereby achieving the purpose of adjusting the beam area and beam size of the electron beam 3.

[0085] As can be seen from the above description, in the particle source component 1 provided in this application embodiment, the adjustable aperture 4 has different adjustable operating states. In different operating states, the size of the aperture 43 of the adjustable aperture 4 in the electron beam 3 transmission path is different, thereby allowing the beam area and beam current of the electron beam 3 to be adjusted by controlling the operating state of the adjustable aperture 4. However, the size of the aperture 43 in the electron beam 3 transmission path does not affect the divergence angle and beam current density of the electron beam 3.

[0086] Please continue to refer to this. Figure 1The collimating lens device 5 in the particle source assembly 1 is located on the side of the adjustable aperture 4 away from the particle source 2 along the first direction X, that is, downstream of the adjustable aperture 4 in the electron beam 3 transmission path. This collimating lens device 5 is used to collimate the electron beam 3. It should be noted that when describing the relationship between the collimating lens device 5 and the electron beam 3 in this document, it refers to the relationship between the collimating lens device 5 and the electron beam 3 at the location of the collimating lens device 5. As can be seen from the above description, the electron beam 3 at the location of the collimating lens device 5 is the electron beam 3 emitted from the adjustable aperture 4 and transmitted to the location of the collimating lens device 5.

[0087] In the particle source assembly 1 provided in this application embodiment, the collimating principal plane P of the collimating lens device 5 for collimating the electron beam 3 is adjustable in the first direction X (i.e., the transmission direction of the electron beam 3). The principal plane is a plane introduced in optical analysis to simplify analysis and represent the properties of a lens. It can be simply understood as the lens's effect on the incident light occurring at the location of the principal plane, and the incident light changing after passing through the principal plane. For the collimating lens device 5 in this application embodiment, the collimating principal plane P is used to characterize the transition position of the electron beam 3 from a divergent state to a collimated state during the collimation process by the collimating lens device 5. That is, the divergent electron beam 3 is converted to a collimated state after passing through the collimating principal plane P.

[0088] By employing the collimating lens device 5 with the aforementioned characteristics, the electron beam 3 can be collimated; furthermore, the beam area and beam density of the electron beam 3 can be adjusted by changing the position of the collimating principal plane P in the first direction X. The principle by which the collimating lens device 5 adjusts the beam area and beam state of the electron beam 3 is briefly explained below:

[0089] The electron beam 3 generated by particle source 2 is in a divergent state with a non-zero divergence angle. After passing through the adjustable aperture 4, although the beam area and beam magnitude change, the electron beam 3 remains in a divergent state, and the divergence angle remains unchanged, i.e., the beam density does not change. During the transmission of the electron beam 3 from the adjustable aperture 4 along the first direction X toward the collimating lens device 5, as the transmission distance of the electron beam 3 increases, the beam magnitude and divergence angle of the electron beam 3 do not change, but the beam area increases, and correspondingly, the beam density decreases with the increase of the beam area. The above changes of the electron beam 3 stop when it reaches the collimating principal plane P of the collimating lens device 5. Since the beam state of the electron beam 3 after collimation by the collimating lens device 5 is related to the beam state of the electron beam 3 before collimation, the position of the collimating principal plane P affects the beam area and beam density of the collimated electron beam 3.

[0090] For example, when the collimating principal plane P is positioned close to the adjustable aperture 4 in the first direction X, the electron beam 3 collimated by the collimating lens device 5 has a smaller beam area and a larger beam density. As another example, when the collimating principal plane P is positioned far from the adjustable aperture 4 in the first direction X, the electron beam 3 collimated by the collimating lens device 5 has a larger beam area and a smaller beam density.

[0091] In the particle source component 1 provided in this application embodiment, any collimating lens device 5 capable of achieving the above functions can be used.

[0092] In this embodiment, as Figure 1 , Figure 5 and Figure 6 As shown, the collimating lens device 5 includes two stages of collimating lenses arranged along the first direction X, namely a first-stage collimating lens 51 and a second-stage collimating lens 52. The first-stage collimating lens 51 is closer to the adjustable aperture 4 than the second-stage collimating lens 52. In the transmission path of the electron beam 3, the second-stage collimating lens 52 is located downstream of the first-stage collimating lens 51.

[0093] like Figure 5 and Figure 6 As shown, the first-stage collimating lens 51 can be either a voltage-excited electrostatic lens 10 or a current-excited electromagnetic lens 9. The second-stage collimating lens 52 can also be either an electrostatic lens 10 or an electromagnetic lens 9. The lens types of the first-stage collimating lens 51 and the second-stage collimating lens 52 can be the same or different.

[0094] For example, such as Figure 5 As shown in part (a), both the first-stage collimating lens 51 and the second-stage collimating lens 52 can be electromagnetic lenses 9. Another example is... Figure 5 As shown in part (b), the first-stage collimating lens 51 can be an electromagnetic lens 9, and the second-stage collimating lens 52 can be an electrostatic lens 10. As another example, such as... Figure 6 As shown in part (a), both the first-stage collimating lens 51 and the second-stage collimating lens 52 can be electrostatic lenses 10. As another example, such as... Figure 6 As shown in part (b), the first collimating lens 51 can be an electrostatic lens 10, and the second collimating lens 52 can be an electromagnetic lens 9.

[0095] Both the first-stage collimating lens 51 and the second-stage collimating lens 52 can focus the electron beam 3, and the focusing power is adjustable. Here, the focusing power represents the focusing ability of the electrostatic lens 10 and the electromagnetic lens 9 on the electron beam 3. The higher the focusing power, the greater the focusing ability on the electron beam 3; the lower the focusing power, the less the focusing ability on the electron beam 3. During the focusing power adjustment process, both the first-stage collimating lens 51 and the second-stage collimating lens 52 have the ability to collimate the electron beam 3 independently.

[0096] In this embodiment, by controlling the focusing power of the first-stage collimating lens 51 and the second-stage collimating lens 52, the first-stage collimating lens 51 and the second-stage collimating lens 52 can jointly achieve the effect of collimating the diverging electron beam 3. Furthermore, the position of the collimating principal plane P in the first direction X can be changed by controlling the focusing power distribution ratio of the first-stage collimating lens 51 and the second-stage collimating lens 52.

[0097] For example, such as Figure 7 As shown in section (a), when the focusing power of the first-stage collimating lens 51 is not zero and the focusing power of the second-stage collimating lens 52 is zero, the collimating principal plane P of the collimating lens device 5, i.e., the collimating principal plane P of the first-stage collimating lens 51, is located near the adjustable aperture 4 in the first direction X. Based on the above description of the collimating principal plane P, it can be seen that in this case, the collimating lens device 5 can obtain an electron beam 3 with a smaller beam area and a larger beam density. In this paper, the position of the collimating principal plane P in this case is defined as the first position, and the beam density, beam size, and beam area of ​​the electron beam 3 obtained by the collimating lens device 5 are defined as the first beam density, the first beam size, and the first beam density, respectively.

[0098] For example, such as Figure 7 As shown in section (b), when the focusing power of the first-stage collimating lens 51 is 0 and the focusing power of the second-stage collimating lens 52 is not 0, the collimating principal plane P of the collimating lens device 5, i.e., the collimating principal plane P of the second-stage collimating lens 52, is located away from the adjustable aperture 4 in the first direction X. Based on the above description of the collimating principal plane P, it can be seen that in this case, the collimating lens device 5 can obtain an electron beam 3 with a larger beam area and a smaller beam density. In this paper, the position of the collimating principal plane P in this case is defined as the second position, and the beam density, beam magnitude, and beam area of ​​the electron beam 3 obtained by the collimating lens device 5 are defined as the second beam density, the second beam magnitude, and the second beam density, respectively. In the first direction X, the second position is farther from the adjustable aperture than the first position, the second beam magnitude is equal to the first beam magnitude, the second beam area is larger than the first beam area, and the second beam density is smaller than the first beam density.

[0099] For example, when the focusing power of both the first-stage collimating lens 51 and the second-stage collimating lens 52 is not zero, the position of the collimating principal plane P of the collimating lens device 5 is defined as the third position. The beam current density, beam current magnitude, and beam current area of ​​the electron beam 3 obtained through the collimating lens device 5 are defined as the third beam current density, the third beam current magnitude, and the third beam current density, respectively. In the first direction X, the third position is located between the first position and the second position. The third beam current magnitude, the second beam current magnitude, and the first beam current magnitude are equal. The third beam current area is greater than the first beam current area but smaller than the second beam current area. The third beam current density is less than the first beam current density but greater than the second beam current density. Furthermore, by adjusting the focusing power distribution ratio of the first-stage collimating lens 51 and the second-stage collimating lens 52, the third position can be adjusted along the first direction X between the first position and the second position; the third beam current area can be adjusted between the first beam current area and the second beam current area; and the third beam current density can be adjusted between the second beam current density and the first beam current density.

[0100] In some other embodiments, the collimating lens device 5 includes a multi-stage collimating lens arranged along the first direction X. The multi-stage collimating lens can be three or more stages. Each stage of the collimating lens can be an electrostatic lens 10 or an electromagnetic lens 9, and the types of different stages of collimating lenses can be the same or different. When the collimating lens device 5 uses a multi-stage collimating lens, its working principle can be referred to the description above regarding a two-stage collimating lens. Compared to the two-stage collimating lens scheme, using a multi-stage collimating lens provides a larger adjustment range for the collimating principal plane P, thereby allowing for a larger adjustment range for the beam area and beam density of the electron beam 3.

[0101] As can be seen from the above description of the collimating lens device 5, the collimating lens device 5 is provided with two or more collimating lenses, and by adjusting the focusing power of each collimating lens, the collimation of the electron beam 3 and the position of the collimating principal plane P in the first direction X can be achieved, thereby adjusting the beam area and beam density of the electron beam 3.

[0102] like Figure 8 As shown, the particle source assembly 1 provided in this embodiment further includes a lens barrel structure 11. The lens barrel structure 11 can be a cylindrical structure with a first axis L1 as its central axis. The first axis L1 is parallel to the first direction X and coincides with the optical axis (first optical axis) of the electron beam 3. The lens barrel structure 11 surrounds and forms a lens barrel cavity 12 with the first axis L1 as its central axis, and the lens barrel cavity 12 extends along the first direction X. The collimating lenses of each stage in the collimating lens device 5 are arranged and installed in the lens barrel cavity 12 of the lens barrel structure 11 along the first direction X.

[0103] In some embodiments, such as Figure 8As shown, the collimating lens device 5 may further include a first driving device 16, which is disposed on the lens barrel structure 11 and is used to drive the first-stage collimating lens in the collimating lens device 5 to move in the first direction X. By driving the collimating lens to move in the first direction X, the relative positional relationship between the collimating lenses of each stage in the collimating lens device 5 can be changed, for example, the distance between two adjacent collimating lenses in the first direction X can be increased or decreased; thereby, it is beneficial to expand the adjustment range of the collimating lens device 5 for the collimating principal plane P; and further beneficial to expand the adjustment range of the collimating lens device 5 for the beam area and beam density of the electron beam 3.

[0104] For example, such as Figure 8 As shown, the collimating lens device 5 includes a first-stage collimating lens 51 and a second-stage collimating lens 52 arranged in the first direction X. Both the first-stage collimating lens 51 and the second-stage collimating lens 52 are disposed in the lens barrel cavity 12 of the lens barrel structure 11. The first-stage collimating lens 51 is mounted on the lens barrel structure 11 through a fixed mounting structure 17. The first driving device 16 is connected to the second-stage collimating lens 52 and is used to drive the second-stage collimating lens 52 to move in the first direction X.

[0105] Please continue to refer to this. Figure 8 The first driving device 16 may include a movable mounting structure 13, a first drive shaft 15, and a first transmission mechanism 14. The movable mounting structure 13 is an annular structure with the first axis L1 as its central axis. The movable mounting structure 13 has a beam hole at its center, i.e., at the location of the first axis L1. The movable mounting structure 13 also has a third threaded structure extending around the first axis L1 on its outer annular surface.

[0106] The barrel wall of the lens structure 11 is provided with a fourth thread structure extending around the first axis L1. The movable mounting structure 13 is installed in the lens cavity 12 of the lens structure 11 through the threaded engagement of the third thread structure and the fourth thread structure. The beam hole on the movable mounting structure 13 is located in the transmission path of the electron beam 3, and the electron beam 3 passes through the movable mounting structure 13 through the beam hole.

[0107] Through the threaded engagement of the third and fourth threaded structures, during the rotation of the movable mounting part relative to the lens barrel structure 11 around the first axis L1, the movable mounting part moves relative to the lens barrel structure 11 in the first direction X, thereby achieving the purpose of driving the second-stage collimating lens 52 to move in the first direction X.

[0108] Please continue to refer to this. Figure 8The first drive shaft 15 is a shaft structure with the second axis L2 as its central axis. The second axis L2 is perpendicular to the first direction X, for example, parallel to the second direction Y. The first drive shaft 15 penetrates the lens barrel structure 11 in a direction parallel to the second axis L2. While penetrating the lens barrel structure 11, the first drive shaft 15 can rotate relative to the lens barrel structure 11 about the second axis L2.

[0109] The first drive shaft 15 includes an input end located outside the lens barrel cavity 12 and an output end located inside the lens barrel cavity 12. The input end and the output end are located at both ends of the first drive shaft 15 along the second axis L2. The input end of the first drive shaft 15 is used to receive the power input that drives the first drive shaft 15 to rotate around the second axis L2. This power input can be manual operation or input from a power source such as a motor. The output end of the first drive shaft 15 is connected to the first transmission mechanism 14 and is used to transmit the power input at the input end to the first transmission mechanism 14.

[0110] The first transmission mechanism 14 is connected to both the first drive shaft 15 and the movable mounting structure 13, and is used to convert the rotation of the first drive shaft 15 about the second axis L2 into the rotation of the movable mounting structure 13 about the first axis L1. The first transmission mechanism 14 can adopt any transmission scheme that can achieve the above function. For example, the first transmission mechanism 14 may include a meshing first bevel gear and a second bevel gear, with the first bevel gear disposed at the output end of the first drive shaft 15 and the second bevel gear disposed on the movable mounting structure 13.

[0111] In the first drive device 16 with the above structure, the first drive shaft 15 is driven to rotate around the second axis L2. The first drive shaft 15 can drive the movable mounting structure 13 to rotate around the first axis L1 relative to the lens barrel structure 11 through the first transmission mechanism 14. With the help of the threaded engagement of the third thread structure and the fourth thread structure, the movable mounting part moves relative to the lens barrel structure 11 in the first direction X during the rotation of the movable mounting part relative to the lens barrel structure 11 around the first axis L1; thereby achieving the purpose of driving the second collimating lens 52 to move in the first direction X.

[0112] When the collimating lens device 5 includes two or more collimating lenses, a first driving device 16 can be used to drive one of the collimating lenses to move in the first direction X, or multiple first driving devices 16 can be used to drive multiple collimating lenses to move in the first direction X respectively. This is beneficial to further expand the adjustment range of the collimating lens device 5 to the collimating principal plane P; and further beneficial to further expand the adjustment range of the beam area and beam density of the electron beam 3.

[0113] As can be seen from the above description of the collimating lens device 5, in the particle source assembly 1 provided in this application embodiment, the collimating lens in the collimating lens device 5 can be an electromagnetic lens 9. For example... Figure 9 As shown, the electromagnetic lens 9 includes a magnetic yoke 91 and an excitation coil 94. The magnetic yoke 91 is an annular shell with a first axis L1 as its central axis. The magnetic yoke 91 has a lens aperture at its center, i.e., at the location of the first axis L1. When the electromagnetic lens 9 is installed in the lens cavity 12 of the lens structure 11, the lens aperture is located in the transmission path of the electron beam 3, thus allowing the electron beam 3 to pass normally through the electromagnetic lens 9.

[0114] A magnetic yoke 91 surrounds an annular cavity 95 forming a ring around the lens aperture, and an annular gap, i.e., a pole shoe opening 96, is provided in the inner ring portion near the lens aperture. The pole shoe opening 96 communicates with the annular cavity 95. An excitation coil 94 is disposed in the annular cavity 95 of the magnetic yoke 91 and can generate a magnetic field under current excitation. The magnetic yoke 91 is used to guide the magnetic field and act on the electron beam 3 in the lens aperture through the pole shoe opening 96. The size of the pole shoe opening 96 should affect the performance of the electromagnetic lens 9.

[0115] In some embodiments, such as Figure 9 As shown, the magnetic yoke 91 includes a first portion 92 and a second portion 93 located on both sides of the pole shoe opening 96 in the first direction X. In the outer ring portion opposite to the pole shoe opening 96, the first portion 92 includes a first outer ring portion, and the second portion 93 includes a second outer ring portion, which is sleeved on the outer periphery of the first outer ring portion. The relative positions of the first portion 92 and the second portion 93 in the first direction X are adjustable. Due to the sleeved design of the second outer ring portion and the first outer ring portion, changing the relative positions of the first portion 92 and the second portion 93 in the first direction X will not affect the normal function of the magnetic yoke 91, but will change the size of the pole shoe opening 96.

[0116] The collimating lens device 5 also includes a second driving device 18 disposed on the lens barrel structure 11. The second driving device 18 is used to change the relative position of the first part 92 and the second part 93 in the first direction X, thereby changing the size of the pole shoe opening 96. By adjusting the size of the pole shoe opening 96, the performance of the electromagnetic lens 9 can be adjusted, which is beneficial for online optimization of aberrations; furthermore, when the position of the collimating principal plane P is adjusted, the adjustment range of the beam area and beam density of the electron beam 3 can be expanded.

[0117] For example, such as Figure 9As shown, the first part 92 is mounted on the lens barrel structure 11 via a fixed mounting structure 17. A first threaded structure is provided on the outer circumferential surface of the first outer ring, extending around the first axis L1. A second threaded structure is provided on the inner wall surface of the second outer ring near the first outer ring, extending around the first axis L1. Through the threaded engagement of the first and second threaded structures, the first part 92 and the second part 93 are connected by a sleeve. Furthermore, during the rotation of the second part 93 relative to the first part 92 around the first axis L1, the second part 93 moves relative to the first part 92 in the first direction X. This allows for the adjustment of the relative position of the first part 92 and the second part 93 in the first direction X, which in turn allows for the adjustment of the size of the pole shoe opening 96.

[0118] Please continue to refer to this. Figure 9 The second drive device 18 may include a second drive shaft 19 and a second transmission mechanism 20. The second drive shaft 19 is a shaft structure with a third axis L3 as its central axis. The third axis L3 is perpendicular to the first direction X, for example, parallel to the second direction Y. The second drive shaft 19 passes through the lens barrel structure 11 in a direction parallel to the third axis L3. While passing through the lens barrel structure 11, the second drive shaft 19 is capable of rotating relative to the lens barrel structure 11 about the third axis L3.

[0119] The second drive shaft 19 includes an input end located outside the lens barrel cavity 12 and an output end located inside the lens barrel cavity 12. The input end and the output end are located at both ends of the second drive shaft 19 along the third axis L3. The input end of the second drive shaft 19 is used to receive the power input that drives the second drive shaft 19 to rotate around the third axis L3. This power input can be manual operation or input from a power source such as a motor. The output end of the second drive shaft 19 is connected to the second transmission mechanism 20 and is used to transmit the power input from the input end to the second transmission mechanism 20.

[0120] The second transmission mechanism 20 is connected to both the second drive shaft 19 and the second part 93, and is used to convert the rotation of the second drive shaft 19 about the third axis L3 into the rotation of the second part 93 about the first axis L1. The second transmission mechanism 20 can adopt any transmission scheme that can achieve the above function. For example, the second transmission mechanism 20 may include a meshing third bevel gear and a fourth bevel gear, with the third bevel gear disposed at the output end of the second drive shaft 19 and the fourth bevel gear disposed on the second part 93, for example, on the outer side of the second outer ring.

[0121] In the second drive device 18 with the above structure, the second drive shaft 19 is driven to rotate around the third axis L3. The second drive shaft 19 can drive the second part 93 to rotate relative to the first part 92 around the first axis L1 through the second transmission mechanism 20. With the help of the threaded engagement of the first thread structure and the second thread structure, the second part 93 moves relative to the first part 92 in the first direction X during the rotation of the second part 93 relative to the first part 92 around the first axis L1. The purpose of adjusting the relative position of the first part 92 and the second part 93 in the first direction X is to achieve the purpose of adjusting the size of the pole shoe opening 96.

[0122] In some embodiments, the collimating lens device 5 may be provided with a first driving device 16 and a second driving device 18 at the same time. The first driving device 16 and the second driving device 18 may drive different collimating lenses or act on the same collimating lens.

[0123] For example, such as Figure 10 As shown, the collimating lens device 5 includes a first-stage collimating lens 51 and a second-stage collimating lens 52 arranged in the first direction X. Both the first-stage collimating lens 51 and the second-stage collimating lens 52 are electromagnetic lenses 9. The collimating lens device 5 is provided with a second driving device 18 that acts on the first-stage collimating lens 51. The first part 92 of the magnetic yoke 91 in the first-stage collimating lens 51 is connected to the fixed mounting structure 17, and the second part 93 is connected to the second driving device 18.

[0124] The collimating lens device 5 is also provided with a first driving device 16 and a second collimating lens acting on the second-stage collimating lens 52. The first part 92 of the magnetic yoke 91 in the first-stage collimating lens 51 is connected to the movable mounting structure 13 in the first driving device 16, and the second part 93 is connected to the second driving device 18.

[0125] The collimating lens device 5 designed above allows for more flexible adjustment of the collimating lens device 5. This design enables online optimization of aberrations and expands the adjustment range of the collimating principal plane P, thereby facilitating the expansion of the adjustment range of the beam area and beam density of the electron beam 3.

[0126] In some embodiments, the collimating lens device 5 includes a primary collimating lens and a first driving device 16. The collimating lens can be a voltage-excited electrostatic lens 10 or a current-excited electromagnetic lens 9. The collimating lens is used to focus the electron beam 3, and the focusing power is adjustable. During the focusing power adjustment process, the collimating lens has a working state capable of collimating the electron beam 3 independently. Therefore, it can be seen that the collimating principal plane P of the collimating lens device 5 is the same as the collimating principal plane P of the collimating lens.

[0127] The first driving device 16 is used to drive the collimating lens to move in the first direction X, thereby achieving the purpose of adjusting the position of the collimating principal plane P in the first direction. The first driving device 16 can adopt the scheme in the above embodiments, which will not be described again here.

[0128] As can be seen from the above description of the collimating lens device 5, in the particle source assembly 1 provided in this application embodiment, the collimating lens device 5 is used to collimate the electron beam 3, and the position of the collimating principal plane P for collimating the electron beam 3 in the first direction X is adjustable. This design allows for both collimation of the electron beam 3 and adjustment of the beam area and beam density of the electron beam 3.

[0129] In addition, by controlling the cooperation between the collimating lens device 5 and the adjustable aperture 4, the electron beam 3 can be adjusted in terms of beam density, beam area and beam size, making the adjustment of the electron beam 3 more comprehensive and adaptable to a variety of different application scenarios.

[0130] For example, by controlling the collimating lens device 5 and the adjustable aperture 4, a larger aperture 43 is positioned in the transmission path of the electron beam 3, causing the collimating principal plane P to be located away from the particle source 2; thus, an electron beam 3 with a fourth beam area, a fourth beam density, and a fourth beam size is obtained. By controlling the collimating lens device 5 and the adjustable aperture 4, a smaller aperture 43 is positioned in the transmission path of the electron beam 3, causing the collimating principal plane P to be located closer to the particle source 2; thus, an electron beam 3 with a fifth beam area, a fifth beam density, and a fifth beam size is obtained. The fifth beam area is equal to the fourth beam area, but the fifth beam density is not equal to the fourth beam density, and the fifth beam size is not equal to the fourth beam size. It can be seen that by controlling the interaction between the collimating lens device 5 and the adjustable aperture 4, electron beams 3 with different beam densities and beam sizes can be formed with the same beam area.

[0131] Please continue to refer to this. Figure 1 The beam splitting device 6 in the particle source assembly 1 is located on the side of the collimating lens device 5 away from the adjustable aperture 4 along the first direction X, that is, downstream of the collimating lens device 5 in the electron beam 3 transmission path.

[0132] The beam splitter 6 includes an array of beam-splitting apertures formed using micro-electro-mechanical systems (MEMS) or mechanical processes, such as... Figure 11As shown in parts (a) and (b), the beam-splitting aperture array includes a plurality of beam-splitting apertures 61 arranged in a plane perpendicular to the first direction X. The plurality of beam-splitting apertures 61 can be arranged in a one-dimensional array or a two-dimensional array. The function of the beam-splitting apertures 61 is the same as that of the aperture 43. When the electron beam 3 emitted from the collimating lens device 5 passes through the beam-splitting device 6, the beam-splitting device 6 can split the electron beam 3 into a plurality of sub-electron beams 7 with smaller beam areas that match the beam-splitting aperture array.

[0133] For example, when the beam-splitting array is a one-dimensional array, the electron beam 3 emitted from the collimating lens device 5 can be split into multiple sub-electron beams 7 arranged on the same straight line. As another example, when the beam-splitting array is a two-dimensional array, the electron beam 3 emitted from the collimating lens device 5 can be split into multiple sub-electron beams 7 arranged in a plane. In this case, the particle source component 1 can also be called a surface electron beam source.

[0134] In this paper, the optical axis of the sub-electron beam 7 is referred to as the second optical axis. Since the electron beam 3 incident on the beam splitting device 6, that is, the electron emitted from the collimating lens device 5, is set to a collimated state, the second optical axes of the multiple sub-electron beams 7 after being split by the beam splitting device 6 are all parallel to the first direction X. In other words, they all propagate in a direction parallel to the first direction X.

[0135] For ease of description, the area covered by all sub-electron beams 7 after beam splitting is defined as the beam spot area, which is the same as the beam current area of ​​the electron beam 3 emitted from the collimating lens device 5. Furthermore, after beam splitting by the beam splitter 6, the beam current area of ​​the sub-electron beam 7 is the same as the size of the beam splitting aperture 61, and the beam current density of the sub-electron beam 7 is the same as the beam current density of the electron beam 3 emitted from the collimating lens device 5; the beam current magnitude of the sub-electron beam 7 is related to its beam current area and beam current density. Based on this, by controlling the adjustable aperture 4 and the collimating lens device 5, the working states of the adjustable aperture 4 and the collimating lens device 5 can be coordinated to adjust the beam current state of the electron beam 3 emitted from the collimating lens device 5, i.e., the electron beam 3 incident on the beam splitter 6; thereby, the beam current states of the multiple sub-electron beams 7 generated by the beam splitter 6 can be adjusted, such as the beam spot area, the beam current magnitude, and the beam current density of the sub-electron beams 7.

[0136] For example, such as Figure 12 As shown in section (a), by controlling the adjustable aperture 4, the smaller aperture 43 is positioned within the transmission path of the electron beam 3, and the collimating principal plane P of the collimating lens device 5 is controlled to be positioned away from the adjustable aperture 4, for example... Figure 7 The state shown in part (b) is as follows; under this condition, multiple sub-electron beams 7 with a large beam spot area, a large number of sub-electron beams 7, and a low beam current density of each sub-electron beam 7 can be obtained.

[0137] like Figure 12 As shown in section (b), by controlling the adjustable aperture 4, the larger aperture 43 is positioned within the transmission path of the electron beam 3, and the collimating principal plane P of the collimating lens device 5 is positioned close to the adjustable aperture 4. For example... Figure 7 The state shown in part (a) is as follows; under this condition, multiple sub-electron beams 7 with a large beam spot area, a large number of sub-electron beams 7, and a high beam current density of each sub-electron beam 7 can be obtained.

[0138] like Figure 12 As shown in section (c), by controlling the adjustable aperture 4, the smaller aperture 43 is positioned within the transmission path of the electron beam 3, and the collimating principal plane P of the collimating lens device 5 is positioned close to the adjustable aperture 4. For example... Figure 7 The state shown in part (a) is such that, under this condition, multiple sub-electron beams 7 with a smaller beam spot area, fewer sub-electron beams 7, and higher beam current density of a single sub-electron beam 7 can be obtained.

[0139] like Figure 12 As shown in section (d), by controlling the adjustable aperture 4, the larger aperture 43 is positioned within the transmission path of the electron beam 3, and the collimating principal plane P of the collimating lens device 5 is controlled to be positioned away from the adjustable aperture 4, for example... Figure 7 The state shown in section (b) is such that multiple sub-electron beams 7 with a larger beam area, more sub-electron beams 7, and lower beam current density of a single sub-electron beam 7 can be obtained.

[0140] Therefore, it can be seen that the particle source component 1 provided in this application embodiment can form multiple collimated sub-electron beams 7 that propagate in the same direction, which can adapt to the requirements of particle beam equipment for multiple electron beams 3. Furthermore, by controlling the adjustable aperture 4 and the collimating lens device 5, the working states of the adjustable aperture 4 and the collimating lens device 5 can be coordinated to adjust the beam spot area and the beam current size and beam current density of the sub-electron beams 7, which is beneficial for adapting to different application scenarios.

[0141] In some embodiments, the beam splitter 6 can be disposed between the adjustable aperture 4 and the collimating lens device 5. In this case, the particle source assembly 1 performs the same function as in the above embodiments and can achieve the same technical effect.

[0142] In some other embodiments, the beam splitter 6 may be omitted. In this case, the particle source assembly 1 is a single-beam system capable of forming a single electron beam 3. By controlling the adjustable aperture 4 and the collimating lens device 5, the beam size, beam area and beam density of the electron beam 3 can be adjusted, which can adapt to different application scenarios.

[0143] In the above embodiments, taking the charged particle beam as an electron beam 3 and the particle source component 1 used to generate an electron beam 3 with adjustable beam state as an example, the particle source component 1 provided in this application embodiment will be described exemplarily. The particle source component 1 provided in this application embodiment can also be used to generate an ion beam with adjustable beam state. Its principle for adjusting the beam state is the same as that of the electron beam 3, and will not be repeated here. Similarly, the particle source component 1 can also generate multiple sub-ion beams. In this document, the sub-ion beams and sub-electron beams 7 are collectively referred to as sub-particle beams.

[0144] This application also provides a particle beam device, which refers to a device that uses charged particle beams such as electron beams or ion beams as working particles, such as electron beam detection devices, electron beam lithography devices, focused ion beam devices, and ion implantation devices. Among them, electron beam detection devices include scanning electron microscopes (SEM), transmission electron microscopes (TEM), and scanning transmission electron microscopes (STEM).

[0145] like Figure 13 As shown, the particle beam device 100 includes a particle source assembly 1, a sample stage 120, and an imaging system 110. The particle source assembly 1 adopts the scheme provided in the above embodiment to generate multiple sub-particle beams 130. The sample stage 120 is disposed on one side of the particle source assembly 1 and is used to hold the sample. The imaging system 110 includes a focusing lens 111 and an objective lens 112. The focusing lens 111 is used to focus the sub-particle beams 130, and the focusing lens 111 can be configured with one or more stages. The objective lens 112 focuses the sub-particle beams 130 emitted from the focusing lens 111 onto the sample on the sample stage 120.

[0146] In this embodiment, the focusing lens 111 may include a microlens array, which includes a plurality of microlenses disposed corresponding to the sub-particle beam 130. The microlenses are used to focus the corresponding sub-particle beam 130.

[0147] In some embodiments, the imaging system 110 may also include a scanning device and an astigmatism correction device, etc.

[0148] When the particle beam device 100 is an electron beam detection device, the imaging system 110 focuses the electron beam onto the sample on the sample stage 120. The electron beam interacts with the sample, generating detection signals used to characterize the physical and chemical features of the sample, such as secondary electrons, backscattered electrons, absorbed electrons, Auger electrons, cathodoluminescence, and characteristic X-rays (XRD). The electronic device also includes a detection system, which includes detectors for detecting at least one of the detection signals. Based on the detection results of the detection system, information about the physical and chemical characteristics of the sample, such as morphology and composition, can be obtained.

[0149] This application also provides another particle beam device, which differs from the particle beam device in the above embodiments in that it uses a particle source component. The particle source component employs the scheme provided in the above embodiments to generate a single particle beam. Other parts of the particle beam device can be adapted by referring to the above embodiments.

[0150] The above description is merely a specific embodiment of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. A particle source component, characterized in that, The particle source assembly includes a particle source, an adjustable aperture, and a collimating lens device arranged along a first direction. The particle source is used to generate a beam of charged particles emitted along a first direction toward the adjustable aperture. The adjustable aperture is located in the charged particle beam transmission path and its size is adjustable, which is used to adjust the beam current of the charged particle beam. The collimating lens device is used to collimate the charged particle beam emitted from the adjustable aperture, and the position of the collimating principal plane in the first direction is adjustable.

2. The particle source component according to claim 1, characterized in that, The particle source assembly includes a lens barrel structure with a lens barrel cavity, and the collimating lens device includes at least two collimating lenses arranged in the lens barrel cavity along the first direction. Each of the at least two collimating lenses is used to focus the charged particle beam, and the focusing power is adjustable; each collimating lens has a working state for collimating the charged particle beam.

3. The particle source component according to claim 2, characterized in that, The collimating lens device further includes a first driving device mounted on the lens barrel structure, the first driving device being used to drive the collimating lens to move along the first direction.

4. The particle source assembly according to claim 2 or 3, characterized in that, The collimating lens is an electromagnetic lens or an electrostatic lens, and the collimating lenses in the at least two levels may be of the same or different types.

5. The particle source assembly according to any one of claims 2 to 4, characterized in that, The at least two collimating lenses include an electromagnetic lens, which includes a magnetic yoke and an excitation coil. The magnetic yoke is an annular shell with a first axis as its central axis, and the first axis is parallel to the first direction. The magnetic yoke has a lens aperture at the location of the first axis. The magnetic yoke has an annular cavity surrounding the lens aperture and a pole shoe opening communicating with the annular cavity. The pole shoe opening is located in the inner annular portion of the magnetic yoke near the lens aperture. The excitation coil is located in the annular cavity. The size of the pole shoe opening in the magnetic yoke is adjustable in the first direction.

6. The particle source assembly according to claim 5, characterized in that, The magnetic yoke includes a first portion and a second portion located on both sides of the pole shoe opening in the first direction; in the outer ring portion opposite to the pole shoe opening, the first portion and the second portion respectively include a first outer ring portion and a second outer ring portion; the second outer ring portion is sleeved on the outer periphery of the first outer ring portion by a threaded structure around the first axis; The collimating lens device further includes a second driving device disposed on the lens barrel structure, the second driving device being used to drive the second part to rotate relative to the first part about the first axis.

7. The particle source component according to claim 6, characterized in that, The second driving device includes: A second drive shaft passes through the lens barrel structure along a third axis and is rotatable about the third axis relative to the lens barrel structure; the second drive shaft includes an input end located outside the lens barrel cavity and an output end located inside the lens barrel cavity; and The second transmission mechanism includes a meshing third bevel gear and a fourth bevel gear, wherein the third bevel gear is disposed at the output end of the second drive shaft and the fourth bevel gear is disposed on the second part; The third axis is perpendicular to the first axis.

8. The particle source component according to claim 1, characterized in that, The particle source assembly includes a lens structure with a lens barrel cavity, and the collimating lens device includes a collimating lens disposed in the lens barrel cavity. The collimating lens is used to focus the charged particle beam, and the focusing power is adjustable. The collimating lens has a working state of collimating the charged particle beam. The collimating lens device further includes a first driving device mounted on the lens barrel structure, the first driving device being used to drive the collimating lens to move along the first direction.

9. The particle source assembly according to any one of claims 3 to 8, characterized in that, The first driving device includes: A movable mounting structure is disposed in the lens barrel cavity and connected to the lens barrel structure via a threaded structure around the first axis; A first drive shaft passes through the lens barrel structure along a second axis and is rotatable about the second axis relative to the lens barrel structure; a second drive shaft includes an input end located outside the lens barrel cavity and an output end located inside the lens barrel cavity; and A first transmission mechanism, comprising a meshing first bevel gear and a second bevel gear, wherein the first bevel gear is disposed at the output end of the first drive shaft and the second bevel gear is disposed on the movable mounting structure; The second axis is perpendicular to the first axis.

10. The particle source assembly according to any one of claims 1 to 9, characterized in that, The adjustable aperture includes an aperture plate and an aperture driving device, wherein the aperture plate is provided with a plurality of aperture holes of different sizes; The aperture driving device is connected to the aperture plate and is used to drive the aperture plate to move; During its movement, the aperture plate is in a working state in which any of the aperture holes is located in the charged particle beam transmission path.

11. The particle source assembly according to claim 10, characterized in that, The aperture plate is a plate-shaped structure perpendicular to the first direction; The aperture plate has multiple aperture holes arranged in a one-dimensional array parallel to the second direction, or arranged in a two-dimensional array. The aperture driving device drives the aperture plate to move along the second direction and the third direction; The second direction and the third direction are perpendicular to each other and are both parallel to the aperture plate.

12. The particle source assembly according to any one of claims 1 to 9, characterized in that, The adjustable aperture includes an aperture assembly and an aperture driving device. The aperture assembly includes a mounting base and multiple apertures. The multiple apertures in the aperture assembly surround and form an aperture hole located in the charged particle beam transmission path. The apertures are movable relative to the mounting base. The size of the aperture hole changes during the movement of the apertures relative to the mounting base. The aperture driving device is connected to the aperture plate assembly and is used to drive multiple aperture plates in the aperture plate assembly to move relative to the mounting base.

13. The particle source assembly according to any one of claims 1 to 12, characterized in that, The particle source assembly further includes a beam splitting device, which is disposed between the collimating lens device and the adjustable aperture, or disposed on the side of the collimating lens device away from the adjustable aperture along the first direction; The beam splitting device includes a beam splitting aperture array formed by arranging multiple beam splitting apertures, which is used to split the charged particle beam into multiple sub-particle beams.

14. The particle source assembly according to claim 13, characterized in that, In a plane perpendicular to the first direction, the beam-splitters in the beam-splitter array are arranged in a one-dimensional array or a two-dimensional array.

15. A particle beam device, characterized in that, include: The particle source assembly as claimed in any one of claims 1 to 14, wherein the particle source assembly is used to generate a beam of charged particles; A sample stage, which is disposed on one side of the particle source assembly, is used to hold the sample; as well as An imaging system, disposed between the particle source assembly and the particle source assembly, is used to focus the charged particle beam onto the sample on the sample stage.

16. The particle beam apparatus according to claim 15, characterized in that, The imaging system includes: At least one focusing lens, the focusing lens being used to focus the charged particle beam; and An objective lens, disposed between the sample stage and the focusing lens, is used to focus the charged particle beam onto the sample on the sample stage.

17. The particle beam device according to claim 16, characterized in that, The particle source assembly includes a beam splitting device for generating multiple sub-particle beams; The focusing lens includes a microlens array, which includes microlenses arranged corresponding to the sub-particle beam.

18. The particle beam apparatus according to any one of claims 15 to 17, characterized in that, The particle beam equipment is an electron beam lithography equipment, an electron beam detection equipment, a focused ion beam equipment, or an ion implantation equipment; The electron beam detection equipment includes a scanning electron microscope, a transmission electron microscope, and a scanning transmission electron microscope.

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