Nanometer groove array and manufacturing method and application thereof
The fabrication of 8 nm periodic and 4 nm wide nanogroove arrays using ssDNA self-assembly technology solves the problem of instability in nanoscale fabrication in existing technologies, and realizes efficient and environmentally friendly nanogroove array manufacturing, which is applicable to semiconductor devices, nanophotonic devices, optoelectronics and nanoquantum electrodynamics.
Patent Information
- Application Number
- CN202511490235.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-10-17
- Publication Date
- 2026-01-23
- Estimated Expiration
- 2045-10-17
AI Technical Summary
Existing technologies struggle to fabricate nanogroove arrays with regular morphology and consistent periods at the nanoscale, especially nanogroove arrays below 10 nm. Furthermore, existing methods suffer from high equipment costs and unstable fabrication processes.
Using single-stranded DNA (ssDNA) self-assembly technology, ssDNA bricks with specific base sequences are designed and self-assembled in solution using the complementary pairing principle to form a nanogroove array. The groove spacing is controlled to be less than 10 nm, and gradient annealing and centrifugation purification steps are used to ensure the stability and consistency of the array.
The method achieves efficient fabrication of nanogroove arrays with 8 nm period and 4 nm width, reduces assembly defects, improves array fabrication yield and structural consistency, is suitable for applications with stringent precision requirements, and is simple, environmentally friendly and efficient.