Quartz crucible with low bubble expansion rate and preparation method thereof
By using coarse and fine quartz sand combined with a high-vacuum melting process in the preparation of quartz crucibles, the problem of removing surface bubbles from quartz crucibles was solved, resulting in quartz crucibles with low bubble expansion rates, which improved the quality and yield of monocrystalline silicon.
Patent Information
- Application Number
- CN202610577214.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-28
- Publication Date
- 2026-06-26
AI Technical Summary
Existing methods for preparing quartz crucibles cannot effectively remove bubbles from the crucible surface. This causes the bubbles to expand and burst at high temperatures, releasing impurities that contaminate the silicon melt and affect the quality and yield of monocrystalline silicon.
Coarse-grained quartz sand is used to form the bubble layer in the crucible, while fine-grained quartz sand forms the transparent layer. Combined with high-vacuum melting technology and different melting power stages, the bubbles are gradually removed through centrifugal molding and vacuum pump extraction to form a dense and uniform structure.
It significantly reduces surface bubbles in the quartz crucible, lowers the bubble expansion rate, improves the quality and yield of monocrystalline silicon, and provides a fundamental guarantee for the growth of ultra-high quality, ultra-low defect density monocrystalline silicon.