Process chambers and semiconductor processing equipment

Abstract

The application discloses a process chamber and a semiconductor process equipment, and relates to the semiconductor field. The process chamber comprises a cavity, an inner liner, a support and a plurality of adjusting components. The top of the cavity is provided with a window. The inner liner is arranged at the window and can move in the horizontal direction relative to the window. The support is arranged at the window and can move in the horizontal direction relative to the window. The support is arranged on the inner liner and connected with the inner liner. The plurality of adjusting components are arranged at the window along the circumference of the cavity. Each adjusting component is connected with at least one of the inner liner and the support. Each adjusting component can move in the horizontal direction to drive at least one of the inner liner and the support to move in the horizontal direction for position adjustment. The application can at least solve the problem of poor sealing between the inner liner, the adjusting support and the cavity.

Description

Technical Field

[0001] This application belongs to the field of semiconductor technology, specifically relating to a process chamber and semiconductor process equipment. Background Technology

[0002] The liner and adjustment bracket are key components of the etching machine. They provide a suitable process environment for the process, including providing appropriate flow fields, process temperatures, and vacuum levels.

[0003] In related technologies, the mating of locating pins and pin holes is used to achieve the installation of the liner and adjusting bracket with the cavity. However, due to certain errors in the machining accuracy of the locating pin position, and the positional errors of the pin holes on the liner and adjusting bracket, the sealing performance of the assembly between the liner, adjusting bracket, and cavity is affected, which in turn has a certain impact on the process. Summary of the Invention

[0004] The purpose of this application is to provide a process chamber and semiconductor process equipment that can at least solve the problem of poor sealing between the liner, adjustment bracket and chamber.

[0005] To solve the above-mentioned technical problems, this application is implemented as follows: This application provides a process chamber, including: a chamber body, an inner liner, a support, and multiple adjustment components; The cavity is provided with a window at its top; The lining is located at the window and can move horizontally relative to the window; The bracket is located at the window and can move relative to the window in the horizontal direction; the bracket is located on the lining and connected to the lining. Multiple adjustment components are disposed at the window along the circumference of the cavity. Each adjustment component is connected to at least one of the lining and the support, and each adjustment component is movable in the horizontal direction to move at least one of the lining and the support in the horizontal direction for position adjustment.

[0006] This application also provides a semiconductor process apparatus, including the aforementioned process chamber.

[0007] In this embodiment, multiple adjustment components can be used to adjust the position of the liner in the horizontal direction to achieve liner positioning. These same components can also be used to adjust the position of the bracket in the horizontal direction to achieve bracket positioning. This ensures the assembly accuracy between the liner, bracket, and cavity. Compared to the use of positioning pins and holes in related technologies, the positioning accuracy in this application is higher, overcoming problems such as poor sealing performance and assembly abnormalities caused by machining errors and assembly errors in positioning pins and holes. This improves the symmetry of the environment within the process cavity, enhances the uniformity of the fluid within the process cavity, and consequently improves process uniformity. Attached Figure Description

[0008] Figure 1 This is a first schematic diagram of the process chamber disclosed in the embodiments of this application; Figure 2 This is a second schematic diagram of the process chamber disclosed in the embodiments of this application; Figure 3 for Figure 2 The first enlarged view of part A in the middle; Figure 4 for Figure 2 The second enlarged view of section A in the middle; Figure 5 This is a first schematic diagram of the cavity disclosed in the embodiments of this application; Figure 6 This is a second schematic diagram of the cavity disclosed in the embodiments of this application; Figure 7 This is a third schematic diagram of the cavity disclosed in the embodiments of this application; Figure 8 for Figure 7 A magnified view of a section at point B in the middle; Figure 9 This is a partial schematic diagram of the assembly of the cavity, the first adjusting member, and the second adjusting member disclosed in an embodiment of this application; Figure 10 This application discloses a schematic diagram of the structure of the first adjusting member and the second adjusting member according to an embodiment; Figure 11 This is a schematic diagram of the structure of the first adjusting member disclosed in an embodiment of this application; Figure 12 This is a schematic diagram of the structure of the second adjusting member disclosed in an embodiment of this application; Figure 13 This is a partial schematic diagram of the assembly of the cavity and the first adjusting member disclosed in an embodiment of this application.

[0009] Explanation of reference numerals in the attached figures: 10-Cavity; 11-Window; 12-Sink; 13-Mounting through hole; 14-Through groove; 15-First graduation line; 20 - Inner lining; 21 - First cylindrical structure; 22 - Outer edge structure; 30-Support; 31-Second tubular structure; 32-Third tubular structure; 33-Ring structure; 40 - Adjustment component; 41-First adjusting component; 411-Annular groove; 412-Second scale line; 42-Second adjusting component; 421-Slot; 422-Inclined surface; 51 - First sealing ring; 52 - Second sealing ring. Detailed Implementation

[0010] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0011] The terms "first," "second," etc., used in the specification and claims of this application are used to distinguish similar objects and not to describe a specific order or sequence. It should be understood that such use of data can be interchanged where appropriate so that embodiments of this application can be implemented in orders other than those illustrated or described herein, and the objects distinguished by "first," "second," etc., are generally of the same class and the number of objects is not limited; for example, a first object can be one or more. Furthermore, in the specification and claims, "and / or" indicates at least one of the connected objects, and the character " / " generally indicates that the preceding and following objects are in an "or" relationship.

[0012] The embodiments of this application will be described in detail below with reference to the accompanying drawings and specific examples and application scenarios.

[0013] In related technologies, the liner and adjusting bracket of the process chamber are installed on the upper end face of the chamber using the fit of locating pins and pin holes, and the locating pins are used to position the liner and adjusting bracket in the horizontal direction. Considering that the wall thickness of the liner is relatively thin, about 6 mm, and the wall thickness of the adjusting bracket is relatively thin, about 10 mm, in order to ensure a uniform flow field distribution inside the chamber, good coaxiality between the parts inside the chamber and the inner wall of the chamber is required. Therefore, the fit clearance between the pin holes of the liner and the adjusting bracket and the locating pin is small, about 0.2 mm to 0.4 mm.

[0014] Because the machining accuracy of the locating pins has a certain margin of error, and the machining accuracy of the pin holes on the inner liner and adjusting bracket also has a certain margin of error, the following problems will occur: 1. If the clearance between the pin hole and the locating pin is too small, interference will occur between the pin hole and the pin when the liner and the adjusting bracket expand due to heat, resulting in deformation of the sealing surface and affecting the sealing performance. 2. The inner liner is a thin-walled part, which requires high pin hole position accuracy. During machining, thin-walled parts are prone to deformation and cannot achieve the specified pin hole position accuracy. Furthermore, due to the presence of machining errors in the positioning pins and pin holes, it is impossible to ensure that the inner liner and the adjusting bracket are properly positioned during installation, resulting in abnormal contact in the sealing area and affecting the sealing performance. 3. Due to the out-of-tolerance position and inner diameter of the pin holes in some of the inner liners, the assemblers excessively squeezed the inner liners during installation, which further worsened the deformation of the sealing area and thus exacerbated the deterioration of the sealing performance. 4. Relying solely on vacuum force to achieve a seal between the liner and the adjusting bracket is problematic. If the adjusting bracket is installed under atmospheric conditions, it may become misaligned due to pin hole interference. Vacuum force may not be able to overcome this interference, resulting in an uneven sealing surface. Consequently, the sealing performance at certain locations between the adjusting bracket and the liner may not meet the process requirements.

[0015] Based on the above, this application discloses a process chamber that can effectively alleviate the aforementioned problems. (Reference) Figures 1 to 13 The disclosed process chamber includes a cavity 10, a liner 20, a support 30, and multiple adjustment components 40.

[0016] The cavity 10 is a basic component that can provide an installation base for the liner 20, the bracket 30, the adjustment component 40, etc. The cavity 10, the liner 20 and the bracket 30 are all key components of the process chamber, which can provide a suitable process environment for the process, including providing a suitable flow field, process temperature and vacuum degree.

[0017] refer to Figure 1 , Figure 2 , Figures 5 to 7 In some embodiments, the top of the cavity 10 may be provided with a window 11, and the liner 20 and the bracket 30 are both provided at the window 11. Furthermore, the liner 20 and the cavity 10, the bracket 30 and the cavity 10, and the bracket 30 and the liner 20 may be sealed to ensure the airtightness of the process chamber.

[0018] The inner liner 20 is located at the window 11 and can move relative to the window 11 in the horizontal direction to adjust the positional accuracy of the inner liner 20 in the horizontal direction, ensure the coaxiality of the inner liner 20 and the cavity 10, thereby improving the structural symmetry of the process cavity in the horizontal direction, which is conducive to improving the uniformity of the flow field distribution in the process cavity and improving the process effect.

[0019] The bracket 30 is located at the window 11 and is horizontal. The bracket 30 can move relative to the window 11 to adjust the positional accuracy of the bracket 30 in the horizontal direction, ensuring the coaxiality of the bracket 30 and the cavity 10, thereby improving the structural symmetry of the process cavity in the horizontal direction, which is conducive to improving the uniformity of the flow field distribution in the process cavity and improving the process effect.

[0020] Furthermore, the bracket 30 is disposed on and connected to the inner liner 20. On one hand, it serves to limit and fix the inner liner 20, ensuring that the inner liner 20 assembled into the cavity 10 will not move arbitrarily. On the other hand, it also ensures a good seal between the bracket 30 and the inner liner 20, thereby improving the overall sealing performance of the process chamber. Optionally, the bracket 30 can abut against the inner liner 20 to press the inner liner 20 firmly against the window 11 of the cavity 10, ensuring the stability of the inner liner 20.

[0021] Multiple adjustment components 40 are arranged around the cavity 10 at the window 11. Each adjustment component 40 is connected to at least one of the liner 20 and the bracket 30, and each adjustment component 40 can move in the horizontal direction to drive at least one of the liner 20 and the bracket 30 to move in the horizontal direction for position adjustment.

[0022] Optionally, multiple adjustment components 40 can abut against the outer peripheral wall of the liner 20 respectively, so as to adjust the position of the liner 20 in the horizontal direction through the cooperation of multiple adjustment components 40, to ensure the positional accuracy of the liner 20 in the horizontal direction, and further ensure the coaxiality between the liner 20 and the cavity 10.

[0023] Multiple adjustment components 40 can also abut against the outer peripheral wall of the bracket 30 respectively, so as to adjust the position of the bracket 30 in the horizontal direction through the cooperation of multiple adjustment components 40, to ensure the positional accuracy of the bracket 30 in the horizontal direction, and further ensure the coaxiality between the bracket 30 and the cavity 10.

[0024] Of course, the multiple adjustment components 40 can also abut against the outer peripheral wall of the inner liner 20 and the outer peripheral wall of the bracket 30 respectively, so as to adjust the position of the inner liner 20 and the bracket 30 in the horizontal direction respectively through the cooperation of the multiple adjustment components 40, so as to ensure the positional accuracy of the inner liner 20 and the bracket 30 in the horizontal direction, and further ensure the coaxiality between the inner liner 20 and the bracket 30 and the cavity 10.

[0025] For example, the adjustment components 40 can be two, three, four, etc., and of course, other quantities are also possible, without specific limitation here. For instance, in some embodiments, the adjustment components 40 can be evenly distributed in the circumferential direction of the cavity, thereby improving the uniformity of the adjustment of the liner 20 position; in some embodiments, the adjustment components 40 can be symmetrically arranged, such as... Figure 1As shown, there can be four adjustment components 40, which are distributed in pairs relative to each other in the circumferential direction of the cavity 10, thereby enabling the adjustment of the liner 20 in two orthogonal horizontal directions, and bidirectional adjustment in each horizontal direction.

[0026] It should be noted that after adjusting the horizontal position accuracy of at least one of the liner 20 and the bracket 30, the adjusting component 40 can be returned to its original position to separate the adjusting component 40 from at least one of the liner 20 and the bracket 30, so as to prevent the adjusting component 40 from restricting the expansion of at least one of the liner 20 and the bracket 30 due to high temperature during the process.

[0027] This embodiment of the application utilizes multiple adjusting components 40 to achieve horizontal positioning of the inner liner 20, and can accommodate the centering of inner liners 20 with different machining tolerances. The multiple adjusting components 40 can also achieve horizontal positioning of the bracket 30, and can accommodate the centering of brackets 30 with different machining tolerances. Therefore, the assembly accuracy between the inner liner 20, bracket 30, and cavity 10 can be guaranteed. Compared to the use of locating pins and locating holes in related technologies, this embodiment of the application offers higher positioning accuracy, overcoming problems such as poor sealing performance and assembly abnormalities caused by machining errors and assembly errors of locating pins and locating holes. This is beneficial for improving the symmetry of the environment within the process cavity, improving the uniformity of the fluid within the process cavity, and thus improving process uniformity.

[0028] refer to Figure 3 , Figure 4 and Figure 9 In some embodiments, the adjustment assembly 40 may include a first adjustment member 41, which is movably connected to the cavity 10 and abuts against the liner 20. Optionally, the first adjustment member 41 and the cavity 10 may be slidably connected, rotatably connected, or slidably and rotatably connected, etc., and the specific connection may be selected according to the actual working conditions.

[0029] In some embodiments, the cavity 10 may be provided with a plurality of first sliding grooves, which are distributed circumferentially along the cavity 10. Each first sliding groove extends from the edge to the center of the cavity 10. The first adjusting member 41 is slidably connected to the corresponding first sliding groove so that the first adjusting member 41 can slide along the edge to the center of the cavity 10, thereby abutting or separating the first adjusting member 41 from the inner liner 20, so as to adjust the position of the inner liner 20 in the horizontal direction and ensure the positional accuracy of the inner liner 20.

[0030] In other embodiments, the first adjusting member 41 of each adjusting component 40 can be rotatably connected to the end face of the cavity 10 via a rotating shaft, and the rotating shaft extends along the axial direction of the cavity 10. In this way, the first adjusting member 41 can rotate relative to the cavity 10 around the rotating shaft to abut or separate from the liner 20, so as to adjust the position of the liner 20 in the horizontal direction and ensure the positional accuracy of the liner 20.

[0031] In some embodiments, the first adjusting member 41 of each adjusting assembly 40 can both rotate and move relative to the cavity 10. Specifically, the cavity 10 may be provided with multiple threaded holes distributed circumferentially along the cavity 10, each threaded hole extending from the edge to the center of the cavity 10. The first adjusting member 41 is threadedly connected to the corresponding threaded hole. Thus, by rotating the first adjusting member 41, the first adjusting member 41 can abut or separate from the liner 20, so as to adjust the position of the liner 20 in the horizontal direction and ensure the positional accuracy of the liner 20.

[0032] Optionally, the first adjusting member 41 can be a set screw, and its outer wall can be machined with a fine thread with a pitch of 0.5 mm; correspondingly, the threaded hole has a fine thread with a pitch of 0.5 mm.

[0033] To achieve position adjustment of the bracket 30, such as Figure 3 , Figure 4 and Figure 9 As shown, the adjustment assembly 40 may further include a second adjustment member 42, which is movably disposed in the cavity 10 along the direction from the edge to the center of the cavity 10 and connected to the first adjustment member 41. The second adjustment member 42 can abut against the bracket 30. Optionally, the second adjustment member 42 can move relative to the cavity 10 along a straight line or a curve, and the movement of the second adjustment member 42 is adapted to the movement of the first adjustment member 41 to avoid motion interference.

[0034] In some embodiments, the cavity 10 may be provided with a plurality of second sliding grooves, which are distributed circumferentially along the cavity 10. Each second sliding groove extends in a straight line or curve along the edge to the center of the cavity 10. The second adjusting member 42 is slidably connected to the corresponding second sliding groove so that the second adjusting member 42 can slide along the edge to the center of the cavity 10, thereby abutting or separating the second adjusting member 42 from the bracket 30, so as to adjust the position of the bracket 30 in the horizontal direction and ensure the positional accuracy of the bracket 30.

[0035] To accommodate the liner 20 and the bracket 30 into the cavity 10, a recess 12 may be provided on the top end face of the cavity 10, such as... Figures 3 to 9As shown, the sink 12 is connected to the window 11 and is located on the outer periphery of the window 11. In this way, a stepped structure can be formed on the top of the cavity 10 to facilitate the support and restraint of the liner 20 and the bracket 30.

[0036] A portion of the liner 20 is disposed around the window 11 to cover part of the inner wall of the cavity 10, so as to prevent process product particles from adhering to the inner wall of the cavity 10 during the process and contaminating the cavity 10; and, a first gap exists between a portion of the liner 20 and the inner wall of the cavity 10 to ensure that a portion of the liner 20 can move horizontally within the window 11 and prevent motion interference.

[0037] Another part of the liner 20 is arranged around the sink 12 and abuts against the bottom wall of the sink 12. Furthermore, the other part of the liner 20 also has a second gap with the sink wall of the sink 12. In this way, the sink 12 can accommodate the other part of the liner 20 and ensure that the other part of the liner 20 can move horizontally in the sink 12 to prevent motion interference.

[0038] In order to apply a force to the liner 20 and move it horizontally, the wall of the settling tank 12 may be provided with mounting through holes 13, such as... Figure 3 and Figure 4 As shown, the first adjusting member 41 is movably disposed in the mounting through hole 13, and one end of the first adjusting member 41 extending out of the mounting through hole 13 abuts against the inner liner 20. Based on this, by moving the first adjusting member 41 along the edge to the center of the cavity 10 to abut or separate from another part of the inner liner 20, the position of the inner liner 20 can be adjusted in the horizontal direction.

[0039] Optionally, the mounting through hole 13 can be a regular through hole. In this case, the mounting through hole 13 has the same function as the first sliding groove mentioned above, so as to ensure that the first adjusting member 41 can move along the edge of the cavity 10 to the center. Alternatively, the mounting through hole 13 can be a threaded hole. In this case, the first adjusting member 41 and the mounting through hole 13 can be threadedly connected to ensure that the first adjusting member 41 can move along the edge of the cavity 10 to the center while rotating.

[0040] A portion of the support 30 is arranged around the settling tank 12 and abuts against the inner liner 20. This ensures the sealing of the connection between the support 30 and the inner liner 20 and covers the tank wall of the settling tank 12 to prevent process product particles from adhering to the tank wall of the settling tank 12, thereby improving the cleanliness of the cavity 10. Furthermore, a portion of the support 30 has a third gap with the tank wall of the settling tank 12 to ensure that a portion of the support 30 can move horizontally within the settling tank 12 and prevent motion interference.

[0041] Another part of the support 30 is arranged around the end face of the groove of the sink 12 so as to bear the load of the other part of the support 30 through the end face of the groove.

[0042] In order to apply force to the bracket 30 and move it horizontally, a through groove 14 can be provided between the end face of the groove opening of the countersunk 12 and the mounting through hole 13, such as... Figures 3 to 9 As shown, the through groove 14 extends from the edge to the center of the cavity 10. At least a portion of the second adjusting member 42 is slidably disposed in the through groove 14, and one end of the second adjusting member 42 extending out of the through groove 14 abuts against the bracket 30. Based on this, by moving the second adjusting member 42 along the through groove 14 to abut or separate from another part of the bracket 30, the position of the bracket 30 can be adjusted in the horizontal direction.

[0043] Optionally, the cavity 10 may also be provided with a third sliding groove, which is located inside the mounting through hole 13 and outside the recess 12, and communicates with the mounting through hole 13. The top of the third sliding groove is connected to the through groove 14. The part of the second adjusting member 42 that is connected to the first adjusting member 41 is slidably provided in the third sliding groove so as to play a certain guiding role for the second adjusting member 42.

[0044] To achieve the connection between the first adjusting member 41 and the second adjusting member 42, the first adjusting member 41 is threadedly connected to the mounting through hole 13. The outer wall of the first adjusting member 41 may be provided with an annular groove 411. Correspondingly, the second adjusting member 42 may be provided with a retaining groove 421. The retaining groove 421 engages with the annular groove 411, and the bottom of the retaining groove 421 abuts against the bottom of the annular groove 411, so that the second adjusting member 42 and the first adjusting member 41 are rotatably connected. Based on this configuration, the two side walls of the annular groove 411 can respectively limit the movement of the second adjusting member 42, ensuring that the first adjusting member 41 can drive the second adjusting member 42 to move in the direction from the edge to the center of the cavity 10. Furthermore, through the engaging engagement of the retaining groove 421 and the annular groove 411, the rotation of the first adjusting member 41 relative to the second adjusting member 42 can also be ensured, preventing the second adjusting member 42 from obstructing the rotation of the first adjusting member 41.

[0045] Optionally, the width of the annular groove 411 of the first adjusting member 41 and the thickness of the second adjusting member 42 at the slot 421 can be the same to prevent the second adjusting member 42 from moving relative to the first adjusting member 41 and affecting the positioning accuracy.

[0046] refer to Figure 3 and Figure 4In some embodiments, the inner liner 20 may include a first cylindrical structure 21 and an outer edge structure 22. The outer edge structure 22 is disposed at the end of the first cylindrical structure 21 and surrounds the outer periphery of the first cylindrical structure 21. The first cylindrical structure 21 is disposed inside the window 11, and the outer edge structure 22 can abut against the adjustment component 40. Based on this arrangement, the inner wall of the cavity 10 can be covered by the first cylindrical structure 21 to prevent process product particles from adhering to the inner wall of the cavity 10. The outer edge structure 22 can overlap the bottom of the settling tank 12 to ensure the installation stability of the inner liner 20.

[0047] Optionally, the first cylindrical structure 21 and the outer edge structure 22 can be fixedly connected or be an integral structure. For example, the first cylindrical structure 21 can be a cylindrical structure, and the outer edge structure 22 can be a circular ring structure. In some more specific embodiments, the longitudinal section of the inner liner 20 can be L-shaped.

[0048] In addition, the first adjusting member 41 can abut against the outer periphery of the outer edge structure 22 to drive the inner liner 20 to move in the horizontal direction; of course, the first adjusting member 41 can also be separated from the outer edge structure 22 to prevent the first adjusting member 41 from interfering with the thermal expansion of the outer edge structure 22.

[0049] refer to Figure 3 and Figure 4 In some embodiments, the support 30 may include a second cylindrical structure 31, a third cylindrical structure 32 and an annular structure 33, wherein the inner edge of the annular structure 33 is located on the outer wall of one end of the second cylindrical structure 31, the outer edge of the annular structure 33 is located on the inner wall of one end of the third cylindrical structure 32, and the second cylindrical structure 31 and the third cylindrical structure 32 are located on opposite sides of the annular structure 33.

[0050] Optionally, the annular structure 33 can be fixedly connected to the second cylindrical structure 31 and the third cylindrical structure 32, respectively; alternatively, the annular structure 33, the second cylindrical structure 31, and the third cylindrical structure 32 can be an integral structure. For example, both the second cylindrical structure 31 and the third cylindrical structure 32 can be cylindrical structures, and the annular structure 33 can be a circular ring structure. In some more specific embodiments, the longitudinal cross-section of the support 30 can be Z-shaped.

[0051] After the bracket 30 is installed into the cavity 10, the second cylindrical structure 31 abuts against the outer edge structure 22 in the vertical direction to ensure the sealing between the bracket 30 and the inner liner 20; the side of the annular structure 33 facing the second cylindrical structure 31 abuts against the end face of the cavity 10 (i.e., the end face where the groove of the sink 12 is located) to provide support for the bracket 30 through the end face of the cavity 10.

[0052] Furthermore, the connection between the annular structure 33 and the third cylindrical structure 32 can abut against the adjusting assembly 40, so that the support 30 can be moved horizontally by the second adjusting member 42 of the adjusting assembly 40. Alternatively, the third cylindrical structure 32 can abut against the adjusting assembly 40, and the support 30 can also be moved horizontally by the second adjusting member 42 of the adjusting assembly 40.

[0053] refer to Figure 3 , Figure 4 , Figure 9 and Figure 10 In some embodiments, the end of the second adjusting member 42 extending out of the through groove 14 may be provided with an inclined surface 422. This inclined surface 422 abuts against the connection between the annular structure 33 and the third cylindrical structure 32. In this way, the bracket 30 can be moved horizontally by the abutting between the inclined surface 422 and the connection, thereby adjusting the horizontal position of the bracket 30. It should be noted that by providing the inclined surface 422, the contact effect between the second adjusting member 42 and the connection can be better, preventing the second adjusting member 42 from slipping off the bracket 30 and affecting the adjustment of the horizontal position of the bracket 30.

[0054] To further improve sealing performance, the process chamber may also include a first sealing ring 51, such as... Figure 3 and Figure 4 As shown, the first sealing ring 51 is sealed between the outer edge structure 22 and the end face of the window 11, thus ensuring the sealing of the contact area between the inner liner 20 and the cavity 10.

[0055] Optionally, at least one of the bottom of the settling tank 12 and the side of its outer edge facing the bottom of the settling tank may be provided with a first mounting groove, at least a portion of the first sealing ring 51 is embedded in the first mounting groove, and the first sealing ring 51 is compressed to provide a further sealing effect. It should be noted here that the bottom of the settling tank 12 is the end face of the window 11.

[0056] The process chamber may also include a second sealing ring 52, such as Figure 3 and Figure 4 As shown, the second sealing ring 52 is sealed between the outer edge structure 22 and the second cylindrical structure 31, thus ensuring the sealing of the contact area between the inner liner 20 and the bracket 30.

[0057] Optionally, at least one of the end face of the second cylindrical structure 31 facing away from the annular structure 33 and the end face of the outer edge structure 22 facing the bracket 30 may be provided with a second mounting groove, at least a portion of the second sealing ring 52 is embedded in the second mounting groove, and the second sealing ring 52 is compressed to play a further sealing role.

[0058] For example, the first sealing ring 51 and the second sealing ring 52 can each be a perfluorinated sealing ring with a wire diameter of 5.33 mm. Of course, they can also be other sizes and other materials, which are not specifically limited here.

[0059] refer to Figure 13 In some embodiments, the top of the cavity 10 may be provided with a first scale line 15, which is correspondingly provided with the first adjusting member 41 in the axial direction of the cavity 10. The first scale line may be provided radially along the inner lining to show the movement distance of the first adjusting member 41 in the direction from the edge to the center of the cavity 10. For example, the first scale line may be provided along the edge of the top of the cavity near the through groove 14, so that the movement distance of the first adjusting member 41 in the direction from the edge to the center of the cavity 10 can be reflected by the sliding of the edge of the second adjusting member 42 relative to the first scale line.

[0060] Additionally, a second scale line 412 may be provided on the outer periphery of the first adjusting member 41. The second scale line 412 is used to display the movement distance of the first adjusting member 41 in the direction from the edge to the center of the cavity 10. The scale of the second scale line is related to the thread pitch of the first adjusting member, so that by rotating the first adjusting member, the second scale line of the first adjusting member can rotate relative to the fixed mark point corresponding to the top of the cavity, and the angle of rotation (reflected on the scale line as the number of divisions) reflects the movement distance of the first adjusting member 41 in the direction from the edge to the center of the cavity 10. It should be noted here that the reading at the first scale line 15 shows the movement distance or position of the second adjusting member 42. Since the first adjusting member 41 can drive the second adjusting member 42 to move in the direction from the edge to the center of the cavity 10, the first adjusting member 41 and the second adjusting member 42 can move synchronously in this direction. Therefore, the first scale line 15 can also be used to display the movement distance or position of the first adjusting member 41.

[0061] For example, the outer periphery of the first adjusting member 41 can be divided into 50 equal divisions. The first adjusting member 41 can be provided with a fine thread with a pitch of 0.5 mm, and the threaded hole of the cavity 10 can have a fine thread with a pitch of 0.5 mm. When the first adjusting member 41 is screwed into the threaded hole, it is equivalent to a micrometer. When the first adjusting member 41 is screwed in one turn, its end moves forward or backward by 0.5 mm; when the first adjusting member 41 rotates one division, it is equivalent to the head of the cavity 10 moving forward or backward by 0.5 / 50 = 0.01 mm.

[0062] Based on the above-mentioned process chamber, this application also discloses a semiconductor process apparatus, which includes the above-mentioned process chamber.

[0063] In this embodiment of the application, the process of installing the liner 20 and the bracket 30 into the cavity 10 is as follows: In the initial state, the assembly relationship between cavity 10 and first adjusting member 41 is as follows: Figure 4 As shown, at this time, the 0-mark line on the circumference of the head of the first adjusting member 41 coincides exactly with the arrow on the cavity 10, as shown. Figure 13 As shown, the first adjusting member 41 abuts against the step provided in the cavity 10, so as to limit the first adjusting member 41 by means of the step. In this case, the inner liner 20 is dropped into the cavity 10, and the initial positioning is done by visual inspection, so that the inner liner 20 is approximately installed in the center of the cavity 10.

[0064] Rotating at least a portion of the first adjustment member 41 among the multiple adjustment components 40, the distance the first adjustment member 41 advances is represented by the reading at the first scale line 15 + the reading of the first adjustment member 41 at the second scale line 412 × 0.01 + the estimated thousandths place. When the reading at the first scale line 15 is the same as the reading at the second scale line 412, it indicates that the liner 20 has fallen into the center position of the cavity 10.

[0065] Assemble and adjust bracket 30, such as Figure 9 As shown, the second adjusting member 42 has an inclined surface 422. Since the position of the second adjusting member 42 has already been determined, the bracket 30 is positioned directly based on the inclined surfaces 422 of each of the multiple second adjusting members 42. It should be noted that the bracket 30 can be used as the installation medium for the subsequent media window. When the first adjusting member 41 is unscrewed, the second adjusting member 42 comes out together. If the first adjusting member 41 is not unscrewed, the inner liner 20 and the bracket 30 will deform due to heat during use. The first adjusting member 41 will interfere with the inner liner 20, and the second adjusting member 42 will interfere with the bracket 30, causing the surfaces of the inner liner 20 and the bracket 30 to deform. This can easily cause the sealing surface to be misaligned. Therefore, choosing to unscrew the first adjusting member 41 can minimize the interference between the inner liner 20 and the bracket 30 during their respective thermal expansion processes.

[0066] Considering issues such as machining accuracy, and for ease of installation, both the bracket 30 and the inner liner 20 need to have a certain mating distance with the cavity 10. The bracket 30 and the inner liner 20 can be directly positioned by the positioning components. After the process chamber is evacuated, the first adjusting component 41 and the second adjusting component 42 are screwed out. The downward pressure of the vacuum is about 25,000 N. This force is relatively large. Even if the first adjusting component 41 and the second adjusting component 42 no longer contact the inner liner 20 and the bracket 30, the inner liner 20 and the bracket 30 will not move. That is, after evacuation, there will be no displacement change between the inner liner 20, the bracket 30 and the cavity 10.

[0067] Based on the above steps, the installation and precise positioning of the cavity 10, liner 20, and bracket 30 were completed, achieving a positioning accuracy in the tens of millions level. This is significantly higher than the conventional positioning achieved using positioning pins and holes, and it allows for the quantification of positioning accuracy, which is beneficial for the visualization of assembly accuracy. This is of great significance for improving the symmetry of the internal environment of the cavity 10, improving the fluid uniformity of the vacuum surface, and improving the etching uniformity. It also avoids interference deformation of components during installation, which is of great significance for improving and protecting the flatness of the sealing surface. Furthermore, it can accommodate the alignment of liners 20 with different machining tolerances, as long as the reading of the first scale line 15 is equal to the reading of the second scale line 412.

[0068] The embodiments of this application have been described above with reference to the accompanying drawings. However, this application is not limited to the specific embodiments described above. The specific embodiments described above are merely illustrative and not restrictive. Those skilled in the art can make many other forms under the guidance of this application without departing from the spirit and scope of the claims, and all of these forms are within the protection scope of this application.

Claims

1. A process chamber, characterized in that, include: Cavity (10), liner (20), support (30) and multiple adjustment components (40); The cavity (10) is provided with a window (11) at the top. The lining (20) is located at the window (11) and can move horizontally relative to the window (11); The bracket (30) is located at the window (11) and can move relative to the window (11) in the horizontal direction. The bracket (30) is located on the liner (20) and connected to the liner (20). Multiple adjustment components (40) are disposed at the window (11) along the circumference of the cavity (10). Each adjustment component (40) is connected to at least one of the liner (20) and the bracket (30), and each adjustment component (40) is movable in the horizontal direction to drive at least one of the liner (20) and the bracket (30) to move in the horizontal direction for position adjustment.

2. The process chamber according to claim 1, characterized in that, The adjustment assembly (40) includes a first adjustment member (41) which is movably connected to the cavity (10) and abuts against the liner (20).

3. The process chamber according to claim 2, characterized in that, The adjustment assembly (40) further includes a second adjustment member (42), which is movably disposed in the cavity (10) along the direction from the edge to the center of the cavity (10) and is connected to the first adjustment member (41); The second adjusting member (42) can abut against the bracket (30).

4. The process chamber according to claim 3, characterized in that, The top end face of the cavity (10) is provided with a recess (12) that communicates with the window (11), and the recess (12) is located at the outer periphery of the window (11); A portion of the liner (20) is disposed around the window (11) and has a first gap with the inner wall of the cavity (10); another portion of the liner (20) is disposed around the sink (12) and has a second gap with the sink (12) wall. A portion of the bracket (30) is arranged around the sink (12), has a third gap with the wall of the sink (12), and abuts against the liner (20). Another portion of the bracket (30) is arranged around the end face where the opening of the sink (12) is located. The wall of the settling tank (12) is provided with a mounting through hole (13), the first adjusting member (41) is movably provided in the mounting through hole (13), and one end of the first adjusting member (41) extending out of the mounting through hole (13) abuts against the inner lining (20); A through groove (14) is provided between the end face of the groove opening of the sink (12) and the mounting through hole (13). The through groove (14) extends from the edge of the cavity (10) to the center. At least part of the second adjusting member (42) is slidably disposed in the through groove (14), and one end of the second adjusting member (42) extending out of the through groove (14) abuts against the bracket (30).

5. The process chamber according to claim 4, characterized in that, The first adjusting member (41) is threadedly connected to the mounting through hole (13), and the outer wall of the first adjusting member (41) is provided with an annular groove (411). The second adjusting member (42) is provided with a slot (421), which is engaged with the annular groove (411) so that the second adjusting member (42) is rotatably connected with the first adjusting member (41).

6. The process chamber according to claim 4, characterized in that, The second adjusting member (42) has an inclined surface (422) at one end extending out of the through groove (14); The inclined surface (422) can abut against the bracket (30).

7. The process chamber according to any one of claims 1 to 6, characterized in that, The inner liner (20) includes a first cylindrical structure (21) and an outer edge structure (22). The outer edge structure (22) is located at the end of the first cylindrical structure (21) and surrounds the outer periphery of the first cylindrical structure (21). The first cylindrical structure (21) is located inside the window (11). The outer edge structure (22) can abut against the adjustment component (40).

8. The process chamber according to claim 7, characterized in that, The support (30) includes a second cylindrical structure (31), a third cylindrical structure (32) and an annular structure (33). The inner edge of the annular structure (33) is located on the outer wall of one end of the second cylindrical structure (31), and the outer edge of the annular structure (33) is located on the inner wall of one end of the third cylindrical structure (32). The second cylindrical structure (31) and the third cylindrical structure (32) are located on opposite sides of the annular structure (33). The second cylindrical structure (31) abuts against the outer edge structure (22) in the vertical direction, and the annular structure (33) abuts against the end face of the cavity (10) on the side facing the second cylindrical structure (31). The connection between the annular structure (33) and the third cylindrical structure (32), or the third cylindrical structure (32) and the adjusting component (40) may abut against each other.

9. The process chamber according to claim 8, characterized in that, The process chamber also includes a first sealing ring (51) and a second sealing ring (52); The first sealing ring (51) is sealed to the end face of the outer edge structure (22) and the window (11); The second sealing ring (52) is sealed between the outer edge structure (22) and the second cylindrical structure (31).

10. The process chamber according to any one of claims 3 to 6, characterized in that, The top of the cavity (10) is provided with a first scale line (15), which is arranged radially along the inner lining (20) to indicate the movement distance of the first adjusting member (41) in the direction from the edge to the center of the cavity (10); and / or, The outer periphery of the first adjusting member (41) is provided with a second scale line (412), which is used to show the movement distance of the first adjusting member (41) in the direction from the edge to the center of the cavity (10).

11. A semiconductor process apparatus, characterized in that, Includes the process chamber as described in any one of claims 1 to 10.

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