Graphene transfer device for different substrates
By designing an automated graphene transfer device, the mechanized transfer of graphene films is achieved using multiple cleaning units and liquid level sensors, solving the problem of manual operation dependence in the existing technology, and achieving efficient production and cost of large-area graphene films reduce.
Patent Information
- Application Number
- CN202420854334.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-04-23
- Publication Date
- 2024-12-13
- Estimated Expiration
- 2034-04-23
AI Technical Summary
The existing graphene wet transfer technology relies heavily on manual operations, resulting in high cost and low efficiency, making it difficult to achieve high-efficiency mass production of large-area graphene, and cannot meet the market demand for large-area graphene.
A graphene transfer device for different substrates is designed. Through the combination of tank and cylinder, multiple cleaning units and sensors are arranged to realize automated cleaning and mechanized transfer. The cylinder is driven by sliders and guide rails, combining liquid The position sensor and cylinder control the liquid level to automatically complete the cleaning and drying process.
It realizes batch automatic cleaning and transfer of large-area graphene films, significantly reduces production costs, reduces manpower and material resources, improves material use efficiency, simplifies processes, and meets the production needs of industrial large-area graphene.
Smart Images

Figure CN222159757U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of graphene production, in particular to a graphene transfer device for different substrates. Background Art
[0002] At present, the production process of silicon-based graphene film is: the stacked structure including PMMA / graphene / copper foil is placed in an ammonium persulfate ((NH4)2S2O8) solution to etch copper. After the etching is completed, the remaining sample is repeatedly rinsed with deionized water to remove the residual ammonium persulfate in the graphene; after the cleaning is completed, the sample is slowly fished out with a clean silicon substrate to ensure that the PMMA and graphene film are flatly attached to the silicon substrate; after being fished out, the sample is dried; after the attachment and drying are completed, the sample is repeatedly washed with acetone, alcohol, and deionized water in turn to remove PMMA and other impurities. After the above steps are completed, a secondary drying process is performed to finally obtain a finished silicon-based graphene film.
[0003] However, the current graphene wet transfer technology is heavily dependent on manual operation, which not only consumes a lot of manpower and material resources, but also makes it difficult to achieve efficient mass production in a factory environment. The cost transfer rate is closely related to the proficiency and consistency of manual operation, which limits the further improvement of the finished product transfer rate.
[0004] Although the existing graphene wet transfer technology may show a higher transfer rate when processing smaller area samples, as the market demand for large-area graphene increases, the demand for large-scale industrial graphene transfer equipment is becoming increasingly urgent. Therefore, it is necessary to develop efficient transfer technology that can process large-area graphene, expand the large-area graphene transfer path in industrial applications, and meet market demand. Utility Model Content
[0005] The purpose of the utility model is to provide a graphene transfer device for different substrates, mechanize a series of steps of graphene wet transfer, use a machine to complete graphene transfer, and be able to automatically clean copper-based graphene films in large-scale batches to obtain silicon-based graphene films, solving the current problem of lack of large-area silicon-based graphene film production on the market, and the production process relies on manual operation and requires a lot of manpower and material resources. It meets the market demand for large-area silicon-based graphene films, provides a new idea and solution for large-area graphene transfer in industrial applications, reduces manpower and material resources, realizes the optimal utilization of production materials, significantly simplifies traditional complex processes, and effectively improves the efficiency of material use, thereby greatly reducing production costs.
[0006] To achieve the above-mentioned purpose, the utility model provides a graphene transfer device for different substrates, including a trough body and a cylinder body slidably arranged on the trough body, the interior of the trough body is divided into multiple processing units by a partition assembly, the partition assembly is configured as an upper plate body and a lower plate body, the lower plate body is configured as a sealing plate body, the upper plate body is configured as an opening and closing plate door, the bottom of the cylinder body is higher than the top of the lower plate body; the cylinder body includes a cylinder body and a bottom cover connected to the lower end of the cylinder body by a snap.
[0007] Preferably, guide rails are provided on both side edges of the top of the trough body, at least two connecting arms extend outward from the top of the cylinder, the connecting arms are connected to the cylinder by screws, and a slider is provided at the bottom of the outer end of the connecting arm by thread or other means, and the slider is slidably connected to the guide rails.
[0008] Preferably, the processing units are arranged from left to right in sequence as a ferric nitrate cleaning unit, a first deionized water cleaning unit, a packaging unit, a first drying cleaning unit, an acetone cleaning unit, a deionized water transition unit, an alcohol cleaning unit, a second deionized water cleaning unit and a second drying cleaning unit.
[0009] Preferably, a lifting rod is provided at the bottom of the packaging unit, a support plate is provided on the lifting rod, a bottom cover is placed on the support plate, and the bottom cover is covered with the bottom of the cylinder transferred thereto by the pushing action of the lifting rod.
[0010] Preferably, a heating element is provided at the bottom of each of the first drying and cleaning unit and the second drying and cleaning unit.
[0011] Preferably, a cover plate is provided on the top of the first drying and cleaning unit, the acetone cleaning unit, the alcohol cleaning unit and the second drying and cleaning unit, and an extending end of the cover plate is connected to the bottom of the trough body through a cylinder, and the cylinder drives the cover plate to cover or detach from the top of the drying and cleaning unit.
[0012] Preferably, a transition unit is provided between the first drying and cleaning unit and the acetone cleaning unit, and between the second deionized water cleaning unit and the second drying and cleaning unit. The transition unit is used to adjust the time for the silicon-based graphene film finished product to flow to the next cleaning unit, and to ensure that acetone, alcohol and dangerous drying areas are at a certain distance and protected.
[0013] Preferably, the opening and closing panel door includes a first leaf door and a second leaf door arranged on the left and right, the first leaf door and the second leaf door are connected to the inner walls of both sides of the trough body by spring hinges, the first leaf door and the second leaf door are connected by an automatic closing structure, when the cylinder device and the second leaf door are squeezed, the second leaf door will be pushed open by the cylinder device, when the rotation angle of the second leaf door is greater than 95 degrees, the second leaf door will automatically rebound to its original position, and the automatic closing structure is a hydraulic buffer structure or a damping buffer structure.
[0014] Preferably, low water level sensors, middle water level sensors and high water level sensors are correspondingly arranged at the bottom, middle and top of the processing unit. When the liquid level is at the low water level sensor, the liquid will continue to flow in; when it is at the high water level sensor, the liquid will stop flowing in; and repeated cleaning steps are achieved through the cooperation of the high water level sensor and the middle water level sensor.
[0015] Therefore, the utility model adopts a graphene transfer device for different substrates with the above structure, and a plurality of cleaning units are arranged in the tank body, and different cleaning liquids are loaded in the cleaning units according to the cleaning sequence to complete various cleaning procedures; wherein the cylinder body is hung on the two side edges of the tank body, so that the product floating in the cleaning liquid can be placed exactly in the cylinder body, and the cylinder body surrounds and protects the product to avoid collision and damage to the product during the cleaning process, and the cylinder body moves along the tank body under the drive of the slider, so that the product in the cylinder body can be moved along the tank body for cleaning; and the spacing component The bottom is a sealing plate that can effectively contain the cleaning liquid, and the upper part of the sealing plate is an opening and closing door. When the cleaning liquid is first injected into the cleaning tank to the liquid level where the water level sensor is located (higher than the bottom of the cylinder body by at most 10mm, and the liquid level intersects with the cylinder body), the product floats in the cleaning liquid and can be placed in the enclosed area of the cylinder body. By controlling the liquid level difference of adjacent units, the opening and closing door can be smoothly opened when the cylinder moves to enter the next cleaning unit. This not only enables the cleaning unit to be loaded with cleaning liquid, but also enables the cylinder to smoothly bring the product on the cleaning tank to the next cleaning unit.
[0016] The technical solution of the utility model is further described in detail below through the accompanying drawings and embodiments. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 It is a structural schematic diagram of the graphene transfer device of the utility model;
[0018] Figure 2 is a cross-sectional view of the graphene transfer device of the utility model;
[0019] Figure 3 It is a schematic diagram of the working state of the cylinder and the bottom cover of the utility model;
[0020] Figure 4It is a structural schematic diagram of the cylinder of the utility model;
[0021] Figure 5 It is a structural schematic diagram of the packaging unit of the utility model;
[0022] Figure 6 It is an enlarged view of part of the structure of the utility model;
[0023] Figure 7 It is a structural schematic diagram of the water level sensor of the utility model;
[0024] Reference numerals:
[0025] 1. Trough body; 2. Cylinder body; 3. Sealing plate body; 4. Opening and closing plate door; 5. Guide rail; 6. Connecting arm; 7. Sliding block; 8. Ferric nitrate cleaning unit; 9. First deionized water cleaning unit; 10. Packaging unit; 11. First drying and cleaning unit; 12. Acetone cleaning unit; 13. Deionized water transition unit; 14. Alcohol cleaning unit; 15. Second deionized water cleaning unit; 16. Second drying and cleaning unit; 17. Lifting rod; 18. Bottom cover; 19. Heating element; 20. Cover plate; 21. Cylinder; 22. Transition unit; 23. Low water level sensor; 24. Middle water level sensor; 25. High water level sensor; 26. Support plate. DETAILED DESCRIPTION
[0026] The technical solution of the utility model is further described below through the accompanying drawings and embodiments.
[0027] Unless otherwise defined, the technical terms or scientific terms used in the present invention shall have the usual meanings understood by persons with ordinary skills in the field to which the present invention belongs. The words "first", "second" and similar words used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. Words such as "include" or "comprise" and the like mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Words such as "connect" or "connected" and the like are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.
[0028] Example
[0029] like Figure 1-7As shown, the utility model provides a graphene transfer device for different substrates, including a tank body and a cylinder body 2 slidably arranged on the tank body 1, the tank body 1 has a certain length, and the inside of the tank body 1 is divided into multiple processing units by a partition assembly. During the cleaning process, moving along the tank body 1, it can go through several cleaning units to complete the cleaning of each program.
[0030] The partition assembly is configured as an upper plate body and a lower plate body, the lower plate body is configured as a sealing plate body 3, the upper plate body is configured as an opening and closing plate door 4, the opening and closing plate door 4 includes a first leaf door and a second leaf door arranged on the left and right, the first leaf door and the second leaf door are both connected to the inner walls of both sides of the tank body 1 through spring hinges and screws, and the first leaf door and the second leaf door are connected through an automatic closing structure, the automatic closing structure is a hydraulic buffer structure or a damping buffer structure, when the opening and closing angle of the leaf door is greater than 95°, if there is no obstacle, the door will automatically rebound and close to the initial position. The lower part of the configuration is a sealing plate for forming a space for accommodating cleaning liquid, and the upper plate body can be opened and closed so that the items on the cleaning unit can pass through the opening and closing plate door 4 to the next cleaning unit.
[0031] The bottom of the cylinder 2 is higher than the top of the lower plate, and is used to place products (the initial product copper-based graphene film, the intermediate product graphene film containing only PMMA coating, and the finished silicon-based graphene film). Guide rails 5 are arranged on the edges of both sides of the top of the tank body 1, and at least two connecting arms 6 extend outward from the top of the cylinder 2. The connecting arms are fixed to the cylinder by screws. The connecting arms are straight arms, so that the tank body 1 can be stably hung at a height to ensure that the tank body 1 can move stably and avoid the tank body 1 from tilting. The bottom of the outer end of the connecting arm 6 is connected to the slider 7 by screws or other means, and the slider 7 is slidably connected to the guide rail 5. The cylinder 2 is hung on the top of the tank body 1 and can move along the edge of the tank body 1, so that the cylinder 2 can effectively move along the tank body 1. Through time adjustment, it drives the product in the cylinder 2 to pass through each process step and stay for a corresponding working time. It is the main control part in the device.
[0032] In addition, by controlling the bottom of the cylinder 2 to be combined with the cylinder body of the cylinder 2 through the buckle, the cylinder 2 can enter the next processing unit completely and smoothly. In addition, the water level sensor is set at a position higher than the lower plate and at most 10 mm higher than the bottom of the cylinder body. It is considered that this is the water level line that facilitates the movement of the cylinder 2. The water level in the processing unit is controlled to reach this water level line, so that the product can just float to this position, so as to flow to the next processing unit with the cylinder 2.
[0033] The processing units are arranged from left to right as ferric nitrate cleaning unit 8, first deionized water cleaning unit 9, encapsulation unit 10, first drying cleaning unit 11, acetone cleaning unit 12, deionized water transition unit 13, alcohol cleaning unit 14, second deionized water cleaning unit 15 and second drying cleaning unit 16; the arrangement of the cleaning units is mainly based on the consideration of each cleaning process.
[0034] A lifting rod 17 is provided at the bottom of the packaging unit 10, and a support plate 26 is detachably provided on the lifting rod 17 by bolts or other means, and a bottom cover 18 is placed on the support plate 26. The bottom cover 18 is snap-fitted with the bottom of the cylinder 2 transferred thereto by the pushing action of the lifting rod 17. Before the cylinder 2 and the product enter the drying unit, the lifting rod 17 pushes the bottom cover 18 on it to the bottom cover box of the cylinder 2, and the bottom cover 18 can be fixed to the bottom of the cylinder 2 by snap-fitting. Under the support of the bottom cover 18, the product can be drained in the cylinder 2, and the graphene and the silicon wafer are attached due to the gravity factor, and then the drying unit of the next step is carried out to dry the product.
[0035] A heating element 19 is disposed at the bottom of each of the first drying and cleaning unit 11 and the second drying and cleaning unit 16 . The heating element is a heating rod or a heating wire.
[0036] The tops of the first drying and cleaning unit 11, the acetone cleaning unit 12, the alcohol cleaning unit 14, and the second drying and cleaning unit 16 are all provided with a cover plate 20, and the extended end of the cover plate 20 is connected to a cylinder 21, and the cylinder 21 drives the cover plate 20 to cover or detach the top of the drying and cleaning unit. The cover plate 20 is used to form a sealed space with the cleaning unit, which is convenient for drying, and sealed drying is achieved. After the drying and heating are completed, the heat is dissipated. In this process, a lifting push rod is used to control the cover plate 20 to realize the automation of the heating system during the preparation and completion of heating. Minimize the volatilization of related cleaning liquids such as acetone and alcohol. Among them, the telescopic function of the cylinder 21 is to control the cover plate 20 to cover or detach.
[0037] A transition unit 22 is provided between the first drying and cleaning unit 11 and the acetone cleaning unit 12, and between the second deionized water cleaning unit 15 and the second drying and cleaning unit 16. The transition unit 22 is used to adjust the time for the silicon-based graphene film finished product to flow to the next cleaning unit, and to keep a certain distance and protection between the acetone and alcohol and the dangerous drying area. When the product needs to go from one cleaning unit to the next, if the two cleaning units are close to each other, the cleaning liquids between the adjacent cleaning units will be confused and contaminated. After the cleaning steps of the ferric nitrate solution, the acetone solution, and the alcohol solution are completed, a cleaning unit containing a deionized water solution is connected. The deionized water solution is flexibly updated through the set middle water level sensor, which greatly reduces the pollution to the next cleaning unit.
[0038] The bottom, middle and top of the processing unit are correspondingly provided with a low water level sensor 23, a middle water level sensor 24 and a high water level sensor 25. When the liquid level is at the low water level sensor 23, the liquid will continue to flow in; when it is at the high water level sensor 24, the liquid will stop flowing in; the high water level sensor 25 and the middle water level sensor 24 cooperate to achieve repeated cleaning steps. The low water level sensor 23 at the bottom is used to sense the lowest water level to avoid the lowest water level, which cannot meet the cleaning requirements, and water will enter when the low water level is reached. The middle water level sensor 24 is used to warn that the liquid that starts to drop from the high water level needs to be replaced after reaching the middle water level. The high water level sensor 25 is used to warn to stop injecting water.
[0039] When the device is in use, the sample is first placed in the cylinder, and the initial position of the cylinder is the ferric nitrate cleaning unit. By injecting ferric nitrate solution into the ferric nitrate cleaning unit, the sample floats and is located in the cylinder. After the cleaning is completed, the cylinder moves to the next unit for operation through the drive of the guide rail and the liquid level difference between the units. When in the packaging unit, when the cylinder is concentric with the bottom cover, the lifting rod controls the support plate to rise, so that the bottom cover and the cylinder are snap-connected. At this time, the sample is still in the cylinder, and the graphene on the bottom cover is fitted with the sample by controlling the liquid level to drop. After the connection and fitting are completed, it continues to move to the next unit. During the whole process, the liquid level in the unit is controlled to ensure that the sample is always below the liquid surface of the solution.
[0040] The liquid level sensor, submersible pump and stop valve are modified and used in combination. By setting the height of the three probes of the liquid level sensor, the water can be automatically fed in and stopped. By modifying and cooperating the submersible pump and the stop valve, the liquid pool is controlled to drain after a certain reaction time, and the problem of liquid backflow is effectively prevented. For ferric nitrate solution, acetone solution and alcohol solution, the method of circular storage and utilization is adopted, and the extracted liquid is used for the cleaning of the next product. When the operation is performed for the fifth time, the liquid in the pool is replaced (refer to the size of the four-inch product transfer, so it is set to 5 times. The larger the liquid pool, the more times); for deionized water, the method of first cleaning and secondary utilization is adopted. The liquid flowing out during the first cleaning is regarded as waste liquid and disposed of, and the second and third circulation storage and utilization are used. When the operation is performed for the fifth time (refer to the size of the four-inch product transfer), the liquid in the pool is replaced. Two liquid recycling methods reduce waste liquid generation and reduce operating costs. All components in the entire device are electrically connected to the controller, and the controller controls the entire device for automatic cleaning.
[0041] Therefore, the utility model adopts a graphene transfer device for different substrates with the above-mentioned structure, mechanizes a series of steps of graphene wet transfer, uses a machine to complete the graphene transfer, and can automatically clean large-area copper-based graphene films in batches to obtain large-area silicon-based graphene films, providing a new idea and solution for large-area graphene transfer in industrial applications, and solving the current problem of relying on manual operation and requiring a lot of manpower and material resources.
[0042] Finally, it should be noted that the above embodiments are only used to illustrate the technical solution of the utility model rather than to limit it. Although the utility model has been described in detail with reference to the preferred embodiments, ordinary technicians in this field should understand that they can still modify or replace the technical solution of the utility model with equivalents, and these modifications or equivalent replacements cannot cause the modified technical solution to deviate from the spirit and scope of the technical solution of the utility model.
Claims
1. A graphene transfer device for different substrates, characterized in that: It includes a trough body and a cylinder body slidably arranged on the trough body, the interior of the trough body is divided into multiple processing units by a partition assembly, the partition assembly is configured as an upper plate body and a lower plate body, the lower plate body is configured as a sealing plate body, and the upper plate body is configured as an opening and closing plate door; the bottom of the cylinder body is higher than the top of the lower plate body; the cylinder body includes a cylinder body and a bottom cover connected to the lower end of the cylinder body.
2. The graphene transfer device for different substrates according to claim 1, characterized in that: Guide rails are arranged on both side edges of the top of the trough body, at least two connecting arms extend outward from the top of the cylinder body, and a sliding block is arranged at the bottom of the outer end of the connecting arm, and the sliding block is slidably connected to the guide rails.
3. The graphene transfer device for different substrates according to claim 2, characterized in that: The processing units are arranged from left to right in sequence as a ferric nitrate cleaning unit, a first deionized water cleaning unit, a packaging unit, a first drying cleaning unit, an acetone cleaning unit, a deionized water transition unit, an alcohol cleaning unit, a second deionized water cleaning unit and a second drying cleaning unit.
4. The graphene transfer device for different substrates according to claim 3, characterized in that: A lifting rod is arranged at the bottom of the packaging unit, a supporting plate is arranged on the lifting rod, and a bottom cover is placed on the supporting plate.
5. The graphene transfer device for different substrates according to claim 4, characterized in that: A heating element is disposed at the bottom of each of the first drying and cleaning unit and the second drying and cleaning unit.
6. The graphene transfer device for different substrates according to claim 5, characterized in that: The tops of the first drying and cleaning unit, the acetone cleaning unit, the alcohol cleaning unit and the second drying and cleaning unit are all provided with a cover plate, and the extended end of the cover plate is connected to the bottom of the tank body through a cylinder.
7. The graphene transfer device for different substrates according to claim 6, characterized in that: A transition unit is provided between the first drying and cleaning unit and the acetone cleaning unit, and between the second deionized water cleaning unit and the second drying and cleaning unit.
8. The graphene transfer device for different substrates according to claim 7, characterized in that: The opening and closing panel door includes a first leaf door and a second leaf door arranged on the left and right. The first leaf door and the second leaf door are connected to the inner walls of both sides of the trough body through spring hinges. The first leaf door and the second leaf door are connected by an automatic closing structure, and the automatic closing structure is a hydraulic buffer structure or a damping buffer structure.
